JP2012146813A - Method of manufacturing substrate for mounting electronic element - Google Patents

Method of manufacturing substrate for mounting electronic element Download PDF

Info

Publication number
JP2012146813A
JP2012146813A JP2011003869A JP2011003869A JP2012146813A JP 2012146813 A JP2012146813 A JP 2012146813A JP 2011003869 A JP2011003869 A JP 2011003869A JP 2011003869 A JP2011003869 A JP 2011003869A JP 2012146813 A JP2012146813 A JP 2012146813A
Authority
JP
Japan
Prior art keywords
substrate
manufacturing
wettability
thermal stress
reducing material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011003869A
Other languages
Japanese (ja)
Other versions
JP5671351B2 (en
Inventor
Kazuhiko Minami
和彦 南
Kaiji Sugano
快治 菅野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP2011003869A priority Critical patent/JP5671351B2/en
Publication of JP2012146813A publication Critical patent/JP2012146813A/en
Application granted granted Critical
Publication of JP5671351B2 publication Critical patent/JP5671351B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Abstract

PROBLEM TO BE SOLVED: To braze a ceramic substrate to a heat sink well, in a method of manufacturing a substrate for mounting an electronic element in which the layers containing an aluminum heat sink are collectively brazed.SOLUTION: In the method of a manufacturing a substrate for mounting an electronic element, a circuit layer (13) of metal is overlaid on one surface of a ceramic substrate (11) through a solder (12), while a thermal stress relaxing material (14) of aluminum and a heat sink (15) of aluminum are arranged in stacked manner on the other surface through solders (16)(17), for temporarily assembling a laminate (10) which are collectively brazed simultaneously. Brazing is carried out on the laminate (10) that has been temporarily assembled under such condition as a wettability degradation material (20) which degrades wettability of the solder is stuck to the periphery of a junction part (18) between the ceramic substrate (11) and the thermal stress relaxing material (14).

Description

本発明は、セラミック基板にヒートシンクをろう付することによって放熱性能を付与した電子素子搭載用基板の製造方法に関する。   The present invention relates to a method for manufacturing an electronic element mounting substrate in which heat dissipation performance is provided by brazing a heat sink to a ceramic substrate.

本明細書および特許請求の範囲の記載において、「アルミニウム」の語はアルミニウムおよびその合金の両者を含む意味で用いられる。   In the present specification and claims, the term “aluminum” is used to include both aluminum and its alloys.

電子素子搭載用基板では、チップが発生する熱を効率良く放熱するために、セラミック基板の素子搭載面とは反対側の面にヒートシンクをろう付することがある(特許文献1参照)。   In an electronic element mounting substrate, in order to efficiently dissipate heat generated by a chip, a heat sink may be brazed to the surface of the ceramic substrate opposite to the element mounting surface (see Patent Document 1).

図1はこの種の電子素子搭載用基板の一例であり、電子素子搭載面であるセラミック基板(11)の一方の面にはアルミニウム回路層(13)がろう付され、他方の面にはアルミニウム層(14)を介してアルミニウム製ヒートシンク(15)がろう付されている。   FIG. 1 shows an example of this type of electronic device mounting substrate. An aluminum circuit layer (13) is brazed to one surface of a ceramic substrate (11), which is an electronic device mounting surface, and aluminum is mounted to the other surface. An aluminum heat sink (15) is brazed via the layer (14).

前記ヒートシンク(15)を構成するアルミニウムは、強度維持のためにAl−Mn系合金やAl−Fe系合金が用いられるものがある。また、セラミック基板(11)と高強度のアルミニウム合金で構成されたヒートシンク(15)を直接ろう付すると、通電時の発熱と非通電時の冷却による冷熱サイクルにおいて接合部の剥離やセラミック基板の割れが発生しやすいことから、軟質のアルミニウム層(14)を介在させることによって接合部に発生する熱応力を緩和して剥離の発生を抑制している。また、軽量化による構造変更による応力増加や、冷熱サイクル寿命向上のために、更なる接合界面の耐久性向上が望まれていた。   As the aluminum constituting the heat sink (15), an Al—Mn alloy or an Al—Fe alloy is used to maintain strength. In addition, if the ceramic substrate (11) and the heat sink (15) made of high-strength aluminum alloy are brazed directly, peeling of the joints and cracking of the ceramic substrate will occur during the cooling cycle due to heat generated during energization and cooling during non-energization. Therefore, by causing the soft aluminum layer (14) to intervene, the thermal stress generated at the joint is relaxed to suppress the occurrence of peeling. Further, in order to increase stress due to structural changes due to weight reduction and to improve the thermal cycle life, further improvement in durability of the bonding interface has been desired.

特開2004−153075号公報JP 2004-153075 A

前記電子素子搭載用基板の製造に際しては、アルミニウム回路層(13)とセラミック基板(11)との間、セラミック基板(11)とアルミニウム層(14)との間、アルミニウム層(14)とヒートシンク(15)との間にそれぞれろう材(12)(16)(17)を配置して積層体(10)を仮組し、仮組した積層物(10)を加熱することにより3箇所のろう付が一括して行われる。   When manufacturing the electronic device mounting substrate, the aluminum circuit layer (13) and the ceramic substrate (11), the ceramic substrate (11) and the aluminum layer (14), the aluminum layer (14) and the heat sink ( 15) brazing materials (12), (16), and (17) are placed between them, the laminated body (10) is temporarily assembled, and the temporarily assembled laminated body (10) is heated to braze at three locations. Is performed at once.

この一括ろう付時に、ヒートシンク(15)を構成するアルミニウム合金に由来する元素、例えばMnやFeが離脱して溶融したろう材(16)に混入し、セラミック基板(11)とアルミニウム層(14)との接合界面に侵入することが考えられた。また、従来よりも大きな熱応力が加わった場合でもヒートシンク(15)とアルミニウム層(14)との良好な接合状態が維持されるように、ろう付性と接合界面の耐久性の更なる向上が望まれている。   At the time of this brazing, elements derived from the aluminum alloy constituting the heat sink (15), such as Mn and Fe, are separated into the molten brazing material (16) and mixed with the ceramic substrate (11) and the aluminum layer (14). It was thought that it penetrates into the joint interface. In addition, brazing and durability of the joint interface are further improved so that a good joining state between the heat sink (15) and the aluminum layer (14) is maintained even when a larger thermal stress is applied than before. It is desired.

本発明は、上述した技術背景に鑑み、アルミニウム製ヒートシンクを含む各層を一括ろう付する電子素子搭載用基板の製造方法において、更なるろう付性向上と接合界面の耐久性向上を達成できる技術を提供するものである。   In view of the above-described technical background, the present invention provides a technique for achieving further improvements in brazing and durability of the bonding interface in a method for manufacturing an electronic element mounting substrate that collectively brazes each layer including an aluminum heat sink. It is to provide.

即ち、本発明は下記[1]〜[10]に記載の構成を有する。   That is, this invention has the structure as described in following [1]-[10].

[1]セラミック基板の一方の面に、ろう材を介して金属からなる回路層を重ねて配置するとともに、他方の面に、アルミニウムからなる熱応力緩和材とアルミニウムからなるヒートシンクをそれぞれろう材を介して重ねて配置して積層体を仮組し、これらを同時に一括してろう付する電子素子搭載用基板の製造方法であって、
仮組した積層体において、セラミック基板と熱応力緩和材の接合部の周囲にろう材の濡れ性を低下させる濡れ性低下材を付着させた状態でろう付を行うことを特徴とする電子素子搭載用基板の製造方法。
[1] A circuit layer made of metal is disposed on one surface of a ceramic substrate with a brazing material interposed therebetween, and a thermal stress relaxation material made of aluminum and a heat sink made of aluminum are respectively brazed on the other surface. Is a method of manufacturing a substrate for mounting an electronic device in which a laminated body is temporarily arranged by stacking through, and these are simultaneously brazed together,
Electronic device mounting characterized in that brazing is performed in a state where a wettability reducing material that lowers the wettability of the brazing material is adhered around the joint between the ceramic substrate and the thermal stress relaxation material in the temporarily assembled laminate Manufacturing method for industrial use.

[2]前記熱応力緩和材の外周面とセラミック基板の他方の面とによって入隅部が形成される積層体において、前記入隅部を含む、熱応力緩和材の外周面およびセラミック基板の他方の面に濡れ性低下材を付着させた状態でろう付を行う前項1に記載の電子素子搭載用基板の製造方法。   [2] In the laminate in which the corner portion is formed by the outer circumferential surface of the thermal stress relaxation material and the other surface of the ceramic substrate, the outer circumferential surface of the thermal stress relaxation material and the other of the ceramic substrate including the corner portion. 2. The method for manufacturing a substrate for mounting an electronic element according to 1 above, wherein brazing is performed in a state where a wettability reducing material is adhered to the surface of the electronic element.

[3]前記熱応力緩和材は貫通穴を有するパンチングメタルであり、仮組した積層体において前記貫通穴の周面に濡れ性低下材を付着させた状態でろう付を行う前項1または2に記載の電子素子搭載用基板の製造方法。   [3] The thermal stress relaxation material is a punching metal having a through hole, and brazing is performed in a state where a wettability reducing material is attached to a peripheral surface of the through hole in the temporarily assembled laminated body. The manufacturing method of the board | substrate for electronic element mounting of description.

[4]前記濡れ性低下材はボロンナイトライドおよびカーボンのうちの少なくとも1種である前項1〜3のいずれかに記載の電子素子搭載用基板の製造方法。   [4] The method for manufacturing an electronic element mounting substrate according to any one of [1] to [3], wherein the wettability reducing material is at least one of boron nitride and carbon.

[5]前記濡れ性低下材を有機分散媒に分散させた分散液を塗布することにより濡れ性低下材を付着させる前項4に記載の電子素子搭載用基板の製造方法。   [5] The method for manufacturing a substrate for mounting an electronic element according to [4], wherein the wettability reducing material is adhered by applying a dispersion in which the wettability reducing material is dispersed in an organic dispersion medium.

[6]前記分散液にバインダを加える前項5に記載の電子素子搭載用基板の製造方法。   [6] The method for manufacturing an electronic element mounting substrate as described in 5 above, wherein a binder is added to the dispersion.

[7]前記濡れ性低下材は、加熱による分解生成物であるカーボンが560℃において付着位置に残留する樹脂である前項1〜3のいずれかに記載の電子素子搭載用基板の製造方法。   [7] The method for manufacturing an electronic element mounting substrate according to any one of [1] to [3], wherein the wettability reducing material is a resin in which carbon which is a decomposition product by heating remains at an adhesion position at 560 ° C.

[8]前記樹脂は、エポキシ系樹脂、フェノール系樹脂、アクリル系樹脂のうちの少なくとも1種からなる接着剤である前項7に記載の電子素子搭載用基板の製造方法。   [8] The method for manufacturing a substrate for mounting an electronic element according to [7], wherein the resin is an adhesive made of at least one of an epoxy resin, a phenol resin, and an acrylic resin.

[9]積層体を仮組した後に濡れ性低下材を付与する前項1〜8のいずれかに記載の電子素子搭載用基板の製造方法。   [9] The method for manufacturing an electronic element mounting substrate as described in any one of [1] to [8] above, wherein the wettability reducing material is applied after temporarily assembling the laminate.

[10]仮組前のセラミック基板および熱応力緩和材の一方または両方の相対する面の縁部に濡れ性低下材を付与し、他の部材とともに重ねて積層体を仮組し、仮組した積層体を積層方向に押し付けて濡れ性低下材を積層界面から外部に排出させて接合部の周囲に付着させる前項1〜8のいずれかに記載の電子素子搭載用基板の製造方法。   [10] A wettability reducing material is applied to the edge of one or both opposing surfaces of the ceramic substrate and the thermal stress relaxation material before temporary assembly, and the laminated body is temporarily assembled together with other members, and temporarily assembled. 9. The method for manufacturing a substrate for mounting an electronic element according to any one of 1 to 8 above, wherein the laminate is pressed in the laminating direction to discharge the wettability reducing material to the outside from the laminating interface and adhere to the periphery of the joint.

上記[1]に記載の基板電子素子搭載用基板の製造方法によれば、仮組した積層体のセラミック基板と熱応力緩和材の接合部の周囲に濡れ性低下材が付着しているので、ろう付時に接合部の周囲で溶融したろう材もしくはヒートシンク由来の元素がはじかれる。このため、ヒートシンクから離脱した元素のろう材への侵入が阻止され、ろう材に混入して接合界面に入り込むことができず、前記元素がろう付性を低下させることなく良好なろう付が達成される。ひいては、基板電子素子搭載用基板の使用環境において発熱と冷却が繰り返されて非常に大きな熱応力を受けた場合でも接合界面の剥離が抑制され、冷熱サイクルにおける接合界面の耐久性が向上する。   According to the method for manufacturing a substrate for mounting an electronic device according to [1] above, since the wettability reducing material is attached around the joint portion between the ceramic substrate and the thermal stress relaxation material of the temporarily assembled laminate, At the time of brazing, an element derived from the brazing material or heat sink melted around the joint is repelled. For this reason, the entry of the element detached from the heat sink into the brazing material is prevented, and it is not possible for the element to enter the bonding interface by mixing into the brazing material, thus achieving good brazing without reducing the brazing property of the element. Is done. As a result, even when heat generation and cooling are repeated in a usage environment of the substrate electronic device mounting substrate and a very large thermal stress is applied, peeling of the bonding interface is suppressed, and durability of the bonding interface in a cooling cycle is improved.

上記[2]に記載の発明によれば、熱応力緩和材の寸法がセラミック基板よりも小さく、熱応力緩和材の外周面とセラミック基板の他方の面とによって入隅部が形成される積層体において、上記[1]に記載した効果が得られる。   According to the invention described in [2] above, the laminate in which the size of the thermal stress relaxation material is smaller than that of the ceramic substrate and the corner portion is formed by the outer peripheral surface of the thermal stress relaxation material and the other surface of the ceramic substrate. The effect described in [1] above can be obtained.

上記[3]に記載の発明によれば、熱応力緩和材として用いられるパンチングメタルの貫通穴の周面に濡れ性低下材が付着しているので、ヒートシンクに由来する元素が貫通穴を通じてろう材に混入することが防がれる。   According to the invention described in [3] above, since the wettability reducing material is attached to the peripheral surface of the through hole of the punching metal used as the thermal stress relaxation material, the element derived from the heat sink is brazed through the through hole. It is prevented from being mixed in.

上記[4]に記載の発明によれば、ボロンナイトライドおよび/またはカーボンの濡れ性低下効果により、良好なろう付を達成できる。   According to the invention described in [4] above, good brazing can be achieved due to the boron nitride and / or carbon wettability reducing effect.

上記[5]に記載の発明によれば、ボロンナイトライドおよび/またはカーボンを有機分散媒に分散させた分散液として付与するので、所定の位置に付与することが容易であり、かつ付着量の調節も容易である。   According to the invention described in [5] above, since boron nitride and / or carbon is applied as a dispersion liquid dispersed in an organic dispersion medium, it can be easily applied to a predetermined position and the amount of adhesion can be reduced. Adjustment is also easy.

上記[6]に記載の発明によれば、バインダによって分散液の粘性が高くなるので、塗布時に液だれしにくくなって所要量の濡れ性低下材を容易に付着させることができる。   According to the invention described in [6] above, since the viscosity of the dispersion is increased by the binder, the liquid does not easily drip at the time of application, and a required amount of the wettability reducing material can be easily attached.

上記[7]に記載の発明によれば、560℃において、付着させた樹脂が付着位置に熱分解生成物であるカーボンとして残留しているので、カーボンの濡れ性低下効果によって良好なろう付を達成できる。   According to the invention described in [7] above, at 560 ° C., the adhered resin remains as carbon which is a thermal decomposition product at the adhesion position, so that good brazing is achieved due to the effect of reducing the wettability of carbon. Can be achieved.

上記[8]に記載の発明によれば、ろう付前においては接着剤による仮止め効果によって積層体のハンドリング性が高められ、ろう付時には熱分解生成物であるたカーボンの濡れ性低下効果により、良好なろう付を達成できる。   According to the invention described in [8] above, the handling property of the laminate is improved by the temporary fixing effect by the adhesive before brazing, and the wettability lowering effect of the carbon which is the thermal decomposition product at the time of brazing is increased. Good brazing can be achieved.

上記[9]に記載の発明によれば、積層体の仮組後に塗布するので付着量の調節が容易である。   According to the invention described in [9] above, since the coating is applied after temporary assembly of the laminate, the amount of adhesion can be easily adjusted.

上記[10]に記載の発明によれば、仮組前に濡れ性低下材を全周に付与しなくても押し付けによって全周に付着させることができる。   According to the invention described in [10] above, the wettability reducing material can be attached to the entire circumference by pressing without provision of the wettability reducing material to the entire circumference before temporary assembly.

電子素子搭載用基板とヒートシンクとを仮組した積層体の断面図である。It is sectional drawing of the laminated body which temporarily assembled the electronic element mounting substrate and the heat sink. 図1の部分拡大図であり、濡れ性低下材の付与位置を示す断面図である。It is the elements on larger scale of Drawing 1, and is a sectional view showing the grant position of a wettability reducing material. 積層体の仮組前の部材に濡れ性低下材を付着させた状態を示す斜視図である。It is a perspective view which shows the state which made the wettability reducing material adhere to the member before temporary assembly of a laminated body. 図3Aの部材を用いて仮組した積層体の断面図である。It is sectional drawing of the laminated body temporarily assembled using the member of FIG. 3A. 図3Bの積層体を積層方向に押し付けた状態を示す断面図である。It is sectional drawing which shows the state which pressed the laminated body of FIG. 3B in the lamination direction. 図3A〜3Cの濡れ性低下材の付与方法において、濡れ性低下材の付与位置および広がり領域を示す斜視図である。3A to 3C are perspective views showing the application position and spreading area of the wettability reducing material in the wettability reducing material application method of FIGS. 他のヒートシンクを組み込んだ積層体の断面図である。It is sectional drawing of the laminated body incorporating another heat sink. 熱応力緩和材として用いるパンチングメタルの斜視図である。It is a perspective view of the punching metal used as a thermal stress relaxation material. 図6のパンチングメタルを組み込んだ積層体の断面図である。It is sectional drawing of the laminated body incorporating the punching metal of FIG.

〔積層体の基本構造〕
図1は、本発明にかかる基板電子素子搭載用基板の製造方法において、仮組した積層体の一実施形態を示している。
[Basic structure of laminate]
FIG. 1 shows an embodiment of a temporarily assembled laminate in the method for manufacturing a substrate electronic element mounting substrate according to the present invention.

仮組した積層体(10)において、セラミック基板(11)の一方の面は電子素子搭載面となる面であり、ろう材(12)を介して回路層(13)が重ねられている。前記セラミック基板(11)の他方の面は放熱経路となる面であり、熱応力緩和材(14)を介してヒートシンク(15)とが積層され、セラミック基板(11)と熱応力緩和材(14)との間、熱応力緩和材(14)とヒートシンク(15)との間にはそれぞれろう材(16)(17)が配置されて、図1に示す順に各層が重ねられている。   In the temporarily assembled laminated body (10), one surface of the ceramic substrate (11) is a surface to be an electronic element mounting surface, and the circuit layer (13) is overlaid through the brazing material (12). The other surface of the ceramic substrate (11) is a surface serving as a heat dissipation path, and a heat sink (15) is laminated via a thermal stress relaxation material (14), and the ceramic substrate (11) and the thermal stress relaxation material (14 ), Brazing materials (16) and (17) are arranged between the thermal stress relaxation material (14) and the heat sink (15), respectively, and the layers are stacked in the order shown in FIG.

本発明は、前記積層体(10)を一括ろう付した時に、ヒートシンク(15)に由来する元素がセラミック基板(11)と熱応力緩和材(14)との接合界面に侵入することを阻止することを目的とする。   The present invention prevents elements derived from the heat sink (15) from entering the bonding interface between the ceramic substrate (11) and the thermal stress relaxation material (14) when the laminate (10) is brazed together. For the purpose.

〔積層体を構成する各層の詳細〕
前記積層体(10)を構成する各層の材料は以下のとおりである。
[Details of each layer constituting the laminate]
The material of each layer constituting the laminate (10) is as follows.

回路層(13)を構成する金属としては、導電性が高くかつセラミック基板(11)とろう付可能な金属を用いるものとし、特に高純度アルミニウムを推奨できる。   As the metal constituting the circuit layer (13), a metal having high conductivity and brazing to the ceramic substrate (11) is used, and high purity aluminum can be particularly recommended.

セラミック基板(11)を構成するセラミックとしては、窒化アルミニウム、酸化アルミニウム、窒化ケイ素、酸化ジルコニウム等を例示できる。これらのセラミックは電気絶縁性が優れていることはもとより、熱伝導性が良く放熱性が優れている点で推奨できる。   Examples of the ceramic constituting the ceramic substrate (11) include aluminum nitride, aluminum oxide, silicon nitride, and zirconium oxide. These ceramics are recommended not only because of their excellent electrical insulation, but also because they have good thermal conductivity and excellent heat dissipation.

熱応力緩和材(14)は、剛性の高いセラミック基板(11)とヒートシンク(15)との接合界面に発生する熱応力を緩和するための層であるから、軟質のアルミニウムを用いることが好ましく、特に高純度アルミニウムが好ましい。   Since the thermal stress relieving material (14) is a layer for relieving thermal stress generated at the bonding interface between the ceramic substrate (11) having a high rigidity and the heat sink (15), it is preferable to use soft aluminum. High purity aluminum is particularly preferable.

ヒートシンク(15)を構成するアルミニウムは、強度維持、成形性、耐食性に優れた材料を用いることが好ましく、これらの特性を有するものとして0.5〜1.5質量%のMnを含有するAl−Mn系合金、0.3〜0.6質量%のFeを含有するAl−Fe系合金を推奨できる。また、MnおよびFeはろう材(16)に混入すると金属間化合物を形成してろう付性を低下させる元素であるから、ヒートシンクに由来する元素のろう材(16)への侵入を阻止する本発明を適用する意義が大きい。   As the aluminum constituting the heat sink (15), it is preferable to use a material excellent in strength maintenance, formability, and corrosion resistance, and Al—containing 0.5 to 1.5% by mass of Mn as having these characteristics Mn-based alloys and Al-Fe-based alloys containing 0.3 to 0.6 mass% Fe can be recommended. Also, since Mn and Fe are elements that, when mixed in the brazing material (16), form an intermetallic compound and lower the brazing property, this element prevents the element derived from the heat sink from entering the brazing material (16). The significance of applying the invention is great.

ろう材(12)(16)(17)はAl−Si系合金、Al−Si−Mg系合金等のろう材を用いる。ろう材(12)(16)(17)はろう材箔として層間に配置しても良いし、回路層(13)、熱応力緩和材(14)、ヒートシンク(15)を構成するアルミニウムと一体化したブレージングシートとして用いることもできる。   As the brazing material (12), (16) and (17), a brazing material such as an Al—Si based alloy or an Al—Si—Mg based alloy is used. The brazing material (12), (16), and (17) may be placed between the layers as a brazing material foil, or integrated with the aluminum that constitutes the circuit layer (13), thermal stress relaxation material (14), and heat sink (15) It can also be used as a brazing sheet.

〔濡れ性低下材の付着位置〕
前記積層体(10)において、図2に示すように、セラミック基板(11)と熱応力緩和材(14)との接合部(18)の周囲にろう材の濡れ性を低下させる濡れ性低下材(20)を付与する。濡れ性低下材(20)を付与した状態でろう付加熱すると、接合部(18)の周囲においては溶融したろう材(16)の濡れ性が低下してろう材(16)がはじかれるので、外部からの元素が溶融したろう材(16)とともに接合部(18)の周端部(18a)から内部に侵入することができない。ここで言う外部からの元素とは、ろう付加熱によってヒートシンク(15)を構成するアルミニウム合金から離脱した元素であってMnやFe等が該当する。これらの元素はろう材(16)に混入するとろう付性を低下させる元素であり、セラミック基板(11)と熱応力緩和材(14)との接合部(18)にろう材(16)ととも侵入することを阻止することで良好なろう付を達成できる。そして、セラミック基板(11)と熱応力緩和材(14)とが良好にろう付されることで、基板電子素子搭載用基板の使用環境において発熱と冷却が繰り返されて非常に大きな熱応力を受けた場合でも接合界面の剥離が抑制され、冷熱サイクルにおける接合界面の耐久性が向上する。
[Adhesion position of wettability reducing material]
In the laminate (10), as shown in FIG. 2, a wettability reducing material that reduces the wettability of the brazing material around the joint (18) between the ceramic substrate (11) and the thermal stress relaxation material (14). Grant (20). When brazing heat is applied with the wettability reducing material (20) applied, the wettability of the molten brazing material (16) decreases around the joint (18) and the brazing material (16) is repelled. Together with the brazing material (16) in which the elements from the outside are melted, they cannot enter the inside from the peripheral end (18a) of the joint (18). The element from the outside mentioned here is an element separated from the aluminum alloy constituting the heat sink (15) by brazing heat, and corresponds to Mn, Fe, or the like. These elements are elements that lower the brazeability when mixed in the brazing material (16). The brazing material (16) is attached to the joint (18) between the ceramic substrate (11) and the thermal stress relaxation material (14). Good brazing can be achieved by preventing intrusion. The ceramic substrate (11) and the thermal stress relieving material (14) are brazed well, so that heat and cooling are repeated in the usage environment of the substrate electronic device mounting substrate, and a very large thermal stress is received. Even in this case, peeling of the bonding interface is suppressed, and the durability of the bonding interface in the cooling and heating cycle is improved.

前記濡れ性低下材(20)は、少なくとも接合部(18)の周端部(18a)および周端部(18a)に隣接する部分を覆うように付着していることが好ましい。また、侵入阻止対象の元素はヒートシンク(15)に由来するものであるから、ヒートシンク(15)から接合部(18)の周端部(18a)までの最短経路となる熱応力緩和材(14)の外周面(14a)に付与することが好ましく、さらには接合部(18)の周端部(18a)に隣接するセラミック基板(11)の部分にも付与することが好ましい。図示例の積層体(10)は熱応力緩和材(14)の寸法がセラミック基板(11)よりも小さく、熱応力緩和材(14)の外周面(14a)とセラミック基板(11)の他方の面(11a)(ヒートシンク側の面)とによって入隅部が形成されているので、入隅部を含む熱応力緩和材(14)の外周面(14a)およびセラミック基板(11)の他方の面(11a)に濡れ性低下材(20)を付与することが好ましい。濡れ性低下材(20)は接合部(18)の周囲において周方向に途切れることなく付与することが必要であるが、必ずしも熱応力緩和材(14)の外周面(14a)およびセラミック基板(11)の他方の面(11a)の全体に付与する必要はない。濡れ性低下材(20)が接合部(18)の周端部(18a)を覆い、かつ周端部(18a)に隣接する部分に付与されていれば元素の侵入を阻止できるからである。図2は、熱応力緩和材(14)の外周面(14a)にはその全面に濡れ性低下材(20)を付与し、セラミック基板(11)の他方の面(11a)には接合部(18)に隣接する部分にのみ濡れ性低下材(20を)付与した例を示している。   The wettability reducing material (20) is preferably attached so as to cover at least the peripheral end (18a) and the portion adjacent to the peripheral end (18a) of the joint (18). In addition, since the element to prevent intrusion originates from the heat sink (15), the thermal stress relaxation material (14) that provides the shortest path from the heat sink (15) to the peripheral edge (18a) of the joint (18) It is preferable to apply to the outer peripheral surface (14a) of the ceramic substrate, and it is also preferable to apply to the portion of the ceramic substrate (11) adjacent to the peripheral end portion (18a) of the joint (18). In the illustrated laminate (10), the thermal stress relaxation material (14) has a smaller dimension than the ceramic substrate (11), and the outer peripheral surface (14a) of the thermal stress relaxation material (14) and the other of the ceramic substrate (11). Since the corner is formed by the surface (11a) (surface on the heat sink side), the outer peripheral surface (14a) of the thermal stress relaxation material (14) including the corner and the other surface of the ceramic substrate (11) It is preferable to add a wettability reducing material (20) to (11a). The wettability reducing material (20) needs to be applied without interruption in the circumferential direction around the joint (18), but it is not necessarily the outer peripheral surface (14a) of the thermal stress relaxation material (14) and the ceramic substrate (11 ) On the other side (11a). This is because, when the wettability reducing material (20) covers the peripheral end portion (18a) of the joint portion (18) and is applied to a portion adjacent to the peripheral end portion (18a), entry of elements can be prevented. FIG. 2 shows that the outer peripheral surface (14a) of the thermal stress relaxation material (14) is provided with a wettability reducing material (20) over the entire surface, and the other surface (11a) of the ceramic substrate (11) is joined with a joint ( 18 shows an example in which a wettability reducing material (20) is applied only to a portion adjacent to 18).

〔濡れ性低下材の種類〕
前記濡れ性低下材として、ボロンナイトライド、カーボン、樹脂、接着剤を例示できる。本発明において、「ろう材の濡れが悪い状態」および「ろう材をはじく」とは、ろう材との接触角が90°以上である場合とする。上述した濡れ性低下材はいずれもこの条件を満たしている。
[Types of wettability reducing materials]
Examples of the wettability reducing material include boron nitride, carbon, resin, and adhesive. In the present invention, “the state in which the brazing material is poorly wet” and “the repelling of the brazing material” are cases where the contact angle with the brazing material is 90 ° or more. All of the above-described wettability reducing materials satisfy this condition.

ボロンナイトライドおよびカーボンはどちらもろう材をはじく性質があり、どちらか一方または両方を併用できる。これらの濡れ性低下材の付与方法として、粉末の濡れ性低下材を有機分散媒に分散させた分散液、あるいはバインダを加えて粘性を高めた分散液として付与する方法を推奨できる。この付与方法によれば、所定の位置に付与することが容易であり、かつ付着量の調節も容易である。有機分散媒としては、ポリエチレングリコール、メチルエチルケトン、トルエン、酢酸エチル、シンナー等を例示できる。有機分散媒は水溶性有機分散媒、非水溶性有機分散媒のいずれでも使用できるが、ろう付中に蒸発しにくい非水性のものが好ましい。さらに、分散液にはバインダとして樹脂やワックスを加えても良い。バインダを加えると液の粘性が高まるので、塗布時に液だれしにくくなって所要量の濡れ性低下材を容易に付着させることができる。バインダはアクリル系樹脂が好ましく、分子量は1万〜150万のものが好ましい。   Both boron nitride and carbon have the property of repelling brazing material, and either one or both can be used in combination. As a method for applying these wettability reducing materials, it is possible to recommend a method in which a powder wettability reducing material is dispersed in an organic dispersion medium, or a method in which a binder is added to increase the viscosity. According to this application method, application to a predetermined position is easy, and adjustment of the amount of adhesion is easy. Examples of the organic dispersion medium include polyethylene glycol, methyl ethyl ketone, toluene, ethyl acetate, and thinner. As the organic dispersion medium, either a water-soluble organic dispersion medium or a water-insoluble organic dispersion medium can be used, but a non-aqueous medium that hardly evaporates during brazing is preferable. Further, a resin or wax may be added to the dispersion as a binder. When the binder is added, the viscosity of the liquid increases, so that the liquid does not easily drip at the time of application, and a required amount of the wettability reducing material can be easily attached. The binder is preferably an acrylic resin and preferably has a molecular weight of 10,000 to 1,500,000.

ボロンナイトライドおよびカーボンの付与量は、それぞれ0.1〜20g/mの範囲が好ましい。0.1g/m未満ではろう材の濡れ性を悪くする効果が小さく、20g/mを超える大量付与は不経済である。ボロンナイトライドおよびカーボンの特に好ましい付与量はそれぞれ1〜15g/mである。 The amount of boron nitride and carbon applied is preferably in the range of 0.1 to 20 g / m 2 . If it is less than 0.1 g / m 2 , the effect of worsening the wettability of the brazing material is small, and mass application exceeding 20 g / m 2 is uneconomical. Particularly preferable amounts of boron nitride and carbon are 1 to 15 g / m 2 , respectively.

樹脂はろう付時の加熱によって分解してカーボンを生成し、生成したカーボンは濡れ性低下材として機能する。前記濡れ性低下材はろう付温度に近い高温域において接合部の周囲に存在している必要があるので、加熱分解生成物であるカーボンが樹脂として付着させた位置に残留していることが必要である。具体的にはろう付温度に近い560℃において付着させた位置にカーボンとして残留する樹脂を使用できる。   The resin decomposes by heating during brazing to generate carbon, and the generated carbon functions as a wettability reducing material. Since the wettability reducing material needs to be present around the joint in a high temperature range close to the brazing temperature, it is necessary that carbon, which is a thermal decomposition product, remains at the position where the resin is adhered as a resin. It is. Specifically, it is possible to use a resin that remains as carbon at a position where it adheres at 560 ° C., which is close to the brazing temperature.

接着剤もまた、ろう付時の加熱によって熱分解してカーボンを生成し、560℃において付着位置にカーボンとして残留するので、濡れ性低下材として使用できる。カーボンを生成する接着剤としてエポキシ系樹脂、フェノール系樹脂、アクリル系樹脂等を例示できる。   The adhesive is also thermally decomposed by heating at the time of brazing to generate carbon and remains as carbon at the adhesion position at 560 ° C., so that it can be used as a wettability reducing material. Examples of adhesives that generate carbon include epoxy resins, phenol resins, and acrylic resins.

上述した樹脂および接着剤は必要に応じて溶剤を加えて適宜粘性を調整し、仮組した積層体の所要位置に付与する。樹脂および接着剤の付着量は、それぞれ0.5〜50g/mの範囲が好ましい。0.5g/m未満ではろう材の濡れ性を悪くする効果が小さく、50g/mを超える大量付与は不経済である。樹脂および接着剤の特に好ましい付与量はそれぞれ1〜15g/mである。 The resin and adhesive described above are added to a required position of the temporarily assembled laminate by adjusting the viscosity as appropriate by adding a solvent as necessary. The adhesion amounts of the resin and the adhesive are each preferably in the range of 0.5 to 50 g / m 2 . If it is less than 0.5 g / m 2 , the effect of deteriorating the wettability of the brazing material is small, and mass application exceeding 50 g / m 2 is uneconomical. Particularly preferable application amounts of the resin and the adhesive are 1 to 15 g / m 2 , respectively.

〔濡れ性低下材の付与方法〕
前記濡れ性低下材はろう付時に接合部の周囲に付着していれば良いので付与方法は限定されず、積層体を仮組する前および後のどちらで付与しても良い。
[Method of applying wettability reducing material]
The wettability reducing material only needs to adhere to the periphery of the joint at the time of brazing, so the application method is not limited, and the wettability reducing material may be applied either before or after temporarily assembling the laminate.

仮組した積層体に付与する場合は、液状または粘液状に調製した濡れ性低下材を所要位置に塗布する。仮組後に塗布するので付着量の調節が容易である。図2の積層物(10)の形状であれば、セラミック基板(11)の下面(11a)と熱応力緩和材(14)の外周面(14a)との入隅部を中心にして塗布すれば、接合部(18)の周端部(18a)、および両方の面(11a)(14a)の接合部(18)の周端部(18a)に隣接する部分に付着させることができる。   When applying to a temporarily assembled laminated body, the wettability reducing material prepared in liquid or viscous liquid is applied to a required position. Since it is applied after temporary assembly, the amount of adhesion can be easily adjusted. If the shape of the laminate (10) of FIG. 2 is applied, it is applied around the corner of the bottom surface (11a) of the ceramic substrate (11) and the outer peripheral surface (14a) of the thermal stress relaxation material (14). , The peripheral end portion (18a) of the joint portion (18), and the portion adjacent to the peripheral end portion (18a) of the joint portion (18) of both surfaces (11a) (14a).

濡れ性低下材を付与した後に積層体を仮組する方法として、図3A〜3C示す、以下の方法を推奨できる。   As a method for temporarily assembling the laminate after applying the wettability reducing material, the following methods shown in FIGS. 3A to 3C can be recommended.

(1)図3A
セラミック基板(11)および熱応力緩和材(14)の一方または両方の相対する面(14b)(11a)に、液状または粘液状に調製した濡れ性低下材(20)を付与する。付与位置は両者が重なり合う領域内の縁部とする。図示したセラミック基板(11)の面上の破線は熱応力緩和材(14)が重なる領域を示している。また、濡れ性低下材(20)を均一に塗り広げる必要もなく、周方向に連続している必要もない。例えば、図示例のように点状に付与すれば良い。
(1) FIG. 3A
A wettability reducing material (20) prepared in a liquid or viscous liquid is applied to one or both opposing surfaces (14b) (11a) of the ceramic substrate (11) and the thermal stress relaxation material (14). The application position is the edge in the region where both overlap. The broken line on the surface of the illustrated ceramic substrate (11) indicates a region where the thermal stress relaxation material (14) overlaps. Further, there is no need to spread the wettability reducing material (20) uniformly, and there is no need to continue in the circumferential direction. For example, what is necessary is just to give to dot shape like the example of illustration.

(2)図3B
セラミック基板(11)および熱応力緩和材(14)を他の部材とともに重ねて積層体(10)を仮組する。
(2) FIG. 3B
The ceramic substrate (11) and the thermal stress relaxation material (14) are stacked together with other members to temporarily assemble the laminate (10).

(3)図3C
仮組した積層体(10)を積層方向に押し付ける。この押し付けにより、濡れ性低下材(20)を拡げて周方向に繋げかつ積層界面から外方に押し出して外部に排出させる。外部に押し出された濡れ性低下材(20)は接合部(18)の周端部(18a)およびに接合部(18)の周端部(18a)に隣接する両方の面(11a)(14a)に付着する。図4は熱応力緩和材(14)の上面(セラミック基板に相対する面)(14b)を示す図面であり、点状に付着させた押し付け前の濡れ性低下材(20)を実線で示し、押し付けによって広がった領域を破線で示している。周方向に点在する濡れ性低下材(20)が押し付けによって繋がり、濡れ性低下材(20)が全周に行き亘る。そして、濡れ性低下材(20)は全周で接合界面から外部に排出されて、接合部(18)の周囲に付着する。同様に、セラミック基板(11)の下面(11a)においても濡れ性低下材が押し付けによって広がって全周に行き亘り、かつ接合界面から外部に排出されて接合部(18)の周囲に付着する。なお、積層体(10)を押し付けても接合界面には僅かに濡れ性低下材が残留するが、周端部に近い外縁部でありかつ残留量も微量であるからろう付け性を低下させるには至らない。
(3) FIG. 3C
The temporarily assembled laminated body (10) is pressed in the laminating direction. By this pressing, the wettability reducing material (20) is expanded and connected in the circumferential direction, and is pushed outward from the laminated interface to be discharged to the outside. The wettability-decreasing material (20) extruded to the outside is both the surface (11a) (14a) adjacent to the peripheral end (18a) of the joint (18) and the peripheral end (18a) of the joint (18). ). FIG. 4 is a drawing showing the upper surface (surface facing the ceramic substrate) (14b) of the thermal stress relieving material (14), and shows the wettability reducing material (20) before pressing, which is attached in the form of dots, as a solid line, A region widened by the pressing is indicated by a broken line. The wettability reducing material (20) scattered in the circumferential direction is connected by pressing, and the wettability reducing material (20) reaches the entire circumference. Then, the wettability reducing material (20) is discharged to the outside from the bonding interface over the entire circumference and adheres to the periphery of the bonding portion (18). Similarly, also on the lower surface (11a) of the ceramic substrate (11), the wettability reducing material spreads by pressing and reaches the entire circumference, and is discharged outside from the bonding interface and adheres to the periphery of the bonding portion (18). Even if the laminate (10) is pressed, the wettability-reducing material remains slightly at the joint interface, but the outer edge is close to the peripheral edge and the residual amount is very small. Is not reached.

上記方法によれば、仮組前に濡れ性低下材を全周に付与しなくても押し付けによって全周に付着させることができる。ただし、周方向における仮組前の濡れ性低下材の付与位置は任意であり、全周に付与する場合も本発明に含まれる。   According to the said method, even if it does not provide a wettability reducing material to a perimeter before temporary assembly, it can be made to adhere to a perimeter by pressing. However, the application position of the wettability reducing material before temporary assembly in the circumferential direction is arbitrary, and the case where it is applied to the entire circumference is also included in the present invention.

また、濡れ性低下材がバインダを加えて粘性のある分散液や接着剤である場合は、外部に排出した濡れ性低下材がセラミック基板(11)、ろう材(16)、熱応力緩和材(14)を仮止めすることになるので、積層体(10)のハンドリング性を高めることができる。また、濡れ性低下材によって上記の3層が仮止めされるので、3層を仮止めしてから他の部材やろう材を仮組して積層体を完成させることもできる。このような仮止め効果が得られることから、この付与方法は接着剤や粘性のある分散液に適している。なお、仮組後に濡れ性低下材を追加付与しても良い。   If the wettability reducing material is a viscous dispersion or adhesive with a binder added, the wettability reducing material discharged to the outside is the ceramic substrate (11), brazing material (16), thermal stress relaxation material ( Since 14) is temporarily fixed, the handleability of the laminate (10) can be improved. Further, since the above three layers are temporarily fixed by the wettability reducing material, the laminated body can be completed by temporarily assembling the other members and the brazing material after temporarily fixing the three layers. Since such a temporary fixing effect is obtained, this application method is suitable for an adhesive or a viscous dispersion. In addition, a wettability reducing material may be additionally provided after temporary assembly.

〔ろう付条件〕
仮組した積層体のろう付条件は特に限定されず、真空ろう付、不活性ガス雰囲気中のろう付を例示できる。
[Brazing conditions]
The brazing conditions for the temporarily assembled laminate are not particularly limited, and examples include vacuum brazing and brazing in an inert gas atmosphere.

〔積層体の他の実施形態〕
本発明において、各部材の形状は上述したものに限定されない。
[Other Embodiments of Laminate]
In the present invention, the shape of each member is not limited to that described above.

ヒートシンクはセラミック基板側の外面がフラットであればセラミック基板と広い面積でろう付して高い放熱性能が得られるので、セラミック基板側の面以外の外部形状や内部形状は問わない。ヒートシンクの他の形状として、平板の他方の面にフィンをろう付したヒートシンク、平板の他方の面にフィンを立設したヒートシンク、1つまたは複数の中空部を有するチューブ型ヒートシンク、中空部内にフィンを設けたチューブ型ヒートシンク等を例示できる。ヒートシンクが複数部材を組み立ててろう付することによって完成するものである場合は、仮組したヒートシンクを積層体に組み込み、これらを同時に一括してろう付することもできる。例えば、図5に示した積層体(30)に組み込まれたヒートシンク(31)は、上下の皿状部材(32a)(32b)を合わせることによって中空部(33)を形成し、その中空部(33)内に波状フィン(34)を配置したものである。これらの部材を仮組したヒートシンク(31)は、回路層(13)、セラミック基板(11)、熱応力緩和材(14)、ろう材(12)(16)(17)ともに仮組され、一括してろう付される。   If the heat sink has a flat outer surface on the ceramic substrate side, it can be brazed to a large area with the ceramic substrate to obtain high heat dissipation performance, so any external shape or internal shape other than the surface on the ceramic substrate side can be used. Other shapes of the heat sink include a heat sink in which fins are brazed to the other surface of the flat plate, a heat sink in which fins are erected on the other surface of the flat plate, a tube heat sink having one or more hollow portions, and a fin in the hollow portion For example, a tube-type heat sink provided with the. In the case where the heat sink is completed by assembling and brazing a plurality of members, the temporarily assembled heat sink can be incorporated into the laminated body, and these can be simultaneously brazed together. For example, the heat sink (31) incorporated in the laminated body (30) shown in FIG. 5 forms a hollow part (33) by combining the upper and lower plate-like members (32a) and (32b), and the hollow part ( 33) A wavy fin (34) is arranged in the inside. The heat sink (31) temporarily assembled with these members is temporarily assembled together with the circuit layer (13), ceramic substrate (11), thermal stress relieving material (14), brazing material (12) (16) (17), and And brazed.

また、図6に示すように、熱応力緩和材として、熱応力を吸収させるための貫通穴(42)を穿設したパンチングメタル(41)を使用することがある。図7に示すように、かかるパンチングメタル(41)を用いた積層体(40)においては、ヒートシンク(15)から離脱した元素が貫通穴(42)を通ってろう材(16)に混入するおそれがある。このため、積層体(40)の仮組前にパンチングメタル(41)の貫通穴(42)の周面(42a)にもろう材濡れ防止材を付与しておくことが好ましい。なお、冷熱サイクルによる熱応力の影響は接合部(19)の外周端部(19a)が最も大きく、中心近くは外周端部より(19a)も影響が少なく剥離の発生も少ないため、本発明において、熱応力緩和材としてパンチングメタル(41)を使用する場合でも貫通穴(42)の周面(42a)へのろう材濡れ性低下材の付与は必須条件ではない。積層体(40)において、図7のように、セラミック基板(11)とパンチングメタル(41)の接合部(19)の外周端部(19a)の周囲にろう材濡れ防止材(20)を付与し、貫通穴(42)の周面(42a)にろう材濡れ防止材(20)を付与せずにろう付する場合も本発明の技術的範囲に含まれる。   Further, as shown in FIG. 6, a punching metal (41) having a through hole (42) for absorbing thermal stress may be used as the thermal stress relaxation material. As shown in FIG. 7, in the laminate (40) using such a punching metal (41), the element detached from the heat sink (15) may be mixed into the brazing material (16) through the through hole (42). There is. For this reason, it is preferable to apply a brazing material wetting prevention material to the peripheral surface (42a) of the through hole (42) of the punching metal (41) before the temporary assembly of the laminate (40). In the present invention, the influence of the thermal stress due to the thermal cycle is greatest at the outer peripheral end (19a) of the joint (19), and near the center (19a) is less affected than the outer peripheral end and the occurrence of peeling is small. Even when the punching metal (41) is used as the thermal stress relaxation material, it is not essential to apply the brazing material wettability reducing material to the peripheral surface (42a) of the through hole (42). In the laminated body (40), as shown in FIG. 7, the brazing material wetting prevention material (20) is applied around the outer peripheral end portion (19a) of the joint portion (19) of the ceramic substrate (11) and the punching metal (41). The case where the brazing material wetting prevention material (20) is not applied to the peripheral surface (42a) of the through hole (42) is also included in the technical scope of the present invention.

図1に示す構造の積層体を仮組して一括してろう付するろう付試験を行った。各例において使用する部材および積層体のろう付条件は共通であり、濡れ性低下材とその付与方法のみが異なる。   A brazing test was performed in which the laminated body having the structure shown in FIG. 1 was temporarily assembled and brazed together. The member used in each example and the brazing condition of the laminated body are common, and only the wettability reducing material and the application method thereof are different.

セラミック基板(11)は窒化アルミニウムからなる30mm×30mm×厚さ0.6mmの平板である。回路層(13)は99.99%以上の高純度アルミニウムからなる厚さ0.6mmの板である。熱応力緩和材(14)は99.99%以上の高純度アルミニウムからなり、28mm×28mm×厚さ1.6mmの平板である。ヒートシンク(15)はAl−1質量%Mn合金からなる厚さ5mmの平板である。ろう材(12)(16)(17)はAl−10質量%Si−1質量%Mg合金からなる厚さ30μmの箔である。   The ceramic substrate (11) is a flat plate made of aluminum nitride and having a size of 30 mm × 30 mm × thickness 0.6 mm. The circuit layer (13) is a 0.6 mm thick plate made of 99.99% or more high-purity aluminum. The thermal stress relaxation material (14) is made of high-purity aluminum of 99.99% or more, and is a flat plate of 28 mm × 28 mm × thickness 1.6 mm. The heat sink (15) is a 5 mm thick flat plate made of an Al-1 mass% Mn alloy. The brazing filler metals (12), (16), and (17) are 30 μm thick foils made of an Al-10 mass% Si-1 mass% Mg alloy.

(実施例1、3)
表1に示す濡れ性低下材および有機分散媒で濡れ性低下材濃度が20%の分散液を調製し、仮組した積層体(10)のセラミック基板(11)と熱応力緩和材(14)との入隅部および熱応力緩和材(14)の外周面(14a)に、濡れ性低下材の付着量が10g/mとなるように塗布した。この塗布により、図2に参照されるように、濡れ性低下材(20)を接合部(18)の周端部(18a)、熱応力緩和材(14)の外周面(14a)の全面および周端部(18a)に隣接するセラミック基板(11)の他方の面(11a)の一部に付着した。
(Examples 1 and 3)
A ceramic substrate (11) and a thermal stress relieving material (14) of a laminate (10) prepared by preparing a dispersion having a wettability reducing material concentration of 20% with a wettability reducing material and an organic dispersion medium shown in Table 1. The wettability-reducing material was applied to the inner corner and the outer peripheral surface (14a) of the thermal stress relaxation material (14) so that the adhesion amount of the wettability reducing material was 10 g / m 2 . By this application, as shown in FIG. 2, the wettability reducing material (20) is applied to the peripheral end (18a) of the joint (18), the entire outer peripheral surface (14a) of the thermal stress relaxation material (14), and It adhered to a part of the other surface (11a) of the ceramic substrate (11) adjacent to the peripheral end (18a).

(実施例2、4)
表1に示す濡れ性低下材、有機分散媒、バインダを1:1:1で混合し、仮組した積層体(10)のセラミック基板(11)と熱応力緩和材(14)との入隅部および熱応力緩和材(14)の外周面(14a)に、濡れ性低下材(20)の付着量が10g/mとなるように塗布した。濡れ性低下材(20)の付着位置は実施例1、3と同じである。
(Examples 2 and 4)
The corners of the ceramic substrate (11) and thermal stress relaxation material (14) of the laminated body (10) prepared by mixing the wettability reducing material, organic dispersion medium, and binder shown in Table 1 in a 1: 1: 1 ratio. The wettability reducing material (20) was applied to the outer peripheral surface (14a) of the part and the thermal stress relieving material (14) so that the adhesion amount of the wettability reducing material (20) was 10 g / m 2 . The attachment position of the wettability reducing material (20) is the same as in Examples 1 and 3.

(比較例)
濡れ性低下材を付与しなかった。
(Comparative example)
No wettability reducing material was applied.

(実施例5〜7)
表1に示す濡れ性低下材(接着剤)を仮組した積層体(10)のセラミック基板(11)と熱応力緩和材(14)との入隅部に濡れ性低下材の付着量が10g/mとなるように塗布した。この塗布により、濡れ性低下材(20)が接合部(18)の周端部(18a)、周端部(18a)に隣接する熱応力緩和材(14)の外周面(14a)の一部、周端部(18a)に隣接するセラミック基板(11)の他方の面(11a)の一部に付着した。
(Examples 5-7)
The amount of adhesion of the wettability reducing material to the corner of the ceramic substrate (11) and the thermal stress relaxation material (14) of the laminate (10) temporarily assembled with the wettability reducing material (adhesive) shown in Table 1 is 10 g. / M 2 to apply. By this application, the wettability reducing material (20) becomes part of the outer peripheral surface (14a) of the thermal stress relaxation material (14) adjacent to the peripheral end (18a) of the joint (18) and the peripheral end (18a). Then, it adhered to a part of the other surface (11a) of the ceramic substrate (11) adjacent to the peripheral end portion (18a).

(実施例8)
図3A〜3Cに示すように、仮組前のセラミック基板(11)および熱応力緩和材(14)の相対する面(11a)(14b)に、表2に示す濡れ性低下材(接着材)(20)を点状に付着させ、他の部材とともに重ねて積層体(10)を仮組し、仮組した積層体(10)を積層方向に押し付け、濡れ性低下材(20)を拡げて周方向に繋げかつ積層界面から外部に排出させた。これにより、濡れ性低下材(20)が、接合部(18)の周端部(18a)、周端部(18a)に隣接する熱応力緩和材(14)の外周面(14a)の一部、周端部(18a)に隣接するセラミック基板(11)の他方の面(11a)の一部に付着した。また、濡れ性低下材(20)の付着量は10g/mとなった。
(Example 8)
As shown in FIGS. 3A to 3C, the wettability reducing materials (adhesives) shown in Table 2 are placed on the opposing surfaces (11a) and (14b) of the ceramic substrate (11) and the thermal stress relaxation material (14) before temporary assembly. (20) is attached in the form of dots, stacked with other members to temporarily assemble the laminate (10), press the temporarily assembled laminate (10) in the stacking direction, and expand the wettability reducing material (20) They were connected in the circumferential direction and discharged from the laminated interface to the outside. As a result, the wettability reducing material (20) becomes a part of the outer peripheral surface (14a) of the thermal stress relaxation material (14) adjacent to the peripheral end (18a) of the joint (18) and the peripheral end (18a). Then, it adhered to a part of the other surface (11a) of the ceramic substrate (11) adjacent to the peripheral end portion (18a). Moreover, the adhesion amount of the wettability reducing material (20) was 10 g / m 2 .

各例の仮組した積層体(10)を7×10−4Paの真空中で600℃×20分で真空ろう付した。 The temporarily assembled laminate (10) of each example was vacuum brazed at 600 ° C. for 20 minutes in a vacuum of 7 × 10 −4 Pa.

各ろう付品について、−40℃と125℃の反復を2000サイクル行う冷熱試験を行い、セラミック基板(11)の割れを調べるとともに超音波探傷機によりセラミック基板(11)と熱応力緩和材(14)との接合部における剥離面積を測定し、下記の基準で評価した。剥離面積率とは接合部の全面積に対して剥離が生じた部分の面積の割合である。評価結果を表1に示す。   Each brazed product was subjected to a thermal test in which 2000 cycles of −40 ° C. and 125 ° C. were repeated to check for cracks in the ceramic substrate (11), and the ceramic substrate (11) and thermal stress relieving material (14 ) And the peeled area at the joint part was measured and evaluated according to the following criteria. The peeling area ratio is the ratio of the area of the part where peeling occurs to the total area of the joint. The evaluation results are shown in Table 1.

○:セラミック基板に割れがなく、かつ剥離面積率が3%未満のもの
△:セラミック基板に割れがなく、かつ剥離面積率が3%以上5%未満満のもの
×:セラミック基板に割れが生じたもの、あるいは剥離面積率が5%以上のもの
○: The ceramic substrate is not cracked and the peeled area ratio is less than 3%. Δ: The ceramic substrate is not cracked and the peeled area ratio is 3% or more and less than 5%. ×: The ceramic substrate is cracked. Or with a peeled area ratio of 5% or more

Figure 2012146813
Figure 2012146813

表1より、本発明の方法で製造したろう付品はセラミック基板と熱応力緩和材とが良好にろう付され、かつ冷熱サイクルにおいてもセラミック基板が割れることがなく、かつ接合界面の剥離が抑制された。   From Table 1, the brazed product manufactured by the method of the present invention has the ceramic substrate and the thermal stress relaxation material brazed well, and the ceramic substrate is not cracked even in the thermal cycle, and the peeling at the bonding interface is suppressed. It was done.

本発明はセラミック基板とアルミニウム製ヒートシンクとを同時にろう付する電子素子搭載用基板の製造に好適である。   The present invention is suitable for manufacturing an electronic element mounting substrate in which a ceramic substrate and an aluminum heat sink are brazed simultaneously.

10、30、40…積層体
11…セラミック基板
11a…他方の面
12、16、17…ろう材
13…回路層(アルミニウム回路層)
14…熱応力緩和材(アルミニウム層)
14a、41a…外周面
15、31…ヒートシンク
18、19…接合部
18a、19a…周端部
20…濡れ性低下材
41…パンチングメタル(熱応力緩和材)
42…貫通穴
10, 30, 40 ... Laminated body
11 ... Ceramic substrate
11a… The other side
12, 16, 17 ... brazing material
13 ... circuit layer (aluminum circuit layer)
14 ... Thermal stress relaxation material (aluminum layer)
14a, 41a ... outer peripheral surface
15, 31 ... heat sink
18, 19 ... Junction
18a, 19a ... peripheral edge
20 ... Wetability reducing material
41 ... Punching metal (thermal stress relaxation material)
42 ... through hole

Claims (10)

セラミック基板の一方の面に、ろう材を介して金属からなる回路層を重ねて配置するとともに、他方の面に、アルミニウムからなる熱応力緩和材とアルミニウムからなるヒートシンクをそれぞれろう材を介して重ねて配置して積層体を仮組し、これらを同時に一括してろう付する電子素子搭載用基板の製造方法であって、
仮組した積層体において、セラミック基板と熱応力緩和材の接合部の周囲にろう材の濡れ性を低下させる濡れ性低下材を付着させた状態でろう付を行うことを特徴とする電子素子搭載用基板の製造方法。
A circuit layer made of metal is placed on one side of the ceramic substrate via a brazing material, and a thermal stress relaxation material made of aluminum and a heat sink made of aluminum are placed on the other side with a brazing material. Is a method of manufacturing a substrate for mounting an electronic device in which a laminated body is temporarily assembled and brazed together at the same time,
Electronic device mounting characterized in that brazing is performed in a state where a wettability reducing material that lowers the wettability of the brazing material is adhered around the joint between the ceramic substrate and the thermal stress relaxation material in the temporarily assembled laminate Manufacturing method for industrial use.
前記熱応力緩和材の外周面とセラミック基板の他方の面とによって入隅部が形成される積層体において、前記入隅部を含む、熱応力緩和材の外周面およびセラミック基板の他方の面に濡れ性低下材を付着させた状態でろう付を行う請求項1に記載の電子素子搭載用基板の製造方法。   In the laminate in which the corner portion is formed by the outer peripheral surface of the thermal stress relaxation material and the other surface of the ceramic substrate, the outer peripheral surface of the thermal stress relaxation material and the other surface of the ceramic substrate including the corner portion. The manufacturing method of the board | substrate for electronic element mounting of Claim 1 which brazes in the state which made the wettability reducing material adhere. 前記熱応力緩和材は貫通穴を有するパンチングメタルであり、仮組した積層体において前記貫通穴の周面に濡れ性低下材を付着させた状態でろう付を行う請求項1または2に記載の電子素子搭載用基板の製造方法。   The said thermal stress relaxation material is a punching metal which has a through-hole, and brazes in the state which made the wettability reducing material adhere to the surrounding surface of the said through-hole in the temporarily assembled laminated body. A method for manufacturing an electronic device mounting board. 前記濡れ性低下材はボロンナイトライドおよびカーボンのうちの少なくとも1種である請求項1〜3のいずれかに記載の電子素子搭載用基板の製造方法。   The method for manufacturing a substrate for mounting an electronic element according to any one of claims 1 to 3, wherein the wettability reducing material is at least one of boron nitride and carbon. 前記濡れ性低下材を有機分散媒に分散させた分散液を塗布することにより濡れ性低下材を付着させる請求項4に記載の電子素子搭載用基板の製造方法。   The manufacturing method of the board | substrate for electronic element mounting of Claim 4 which adheres a wettability reducing material by apply | coating the dispersion liquid which disperse | distributed the said wettability reducing material to the organic dispersion medium. 前記分散液にバインダを加える請求項5に記載の電子素子搭載用基板の製造方法。   The manufacturing method of the board | substrate for electronic element mounting of Claim 5 which adds a binder to the said dispersion liquid. 前記濡れ性低下材は、加熱による分解生成物であるカーボンが560℃において付着位置に残留する樹脂である請求項1〜3のいずれかに記載の電子素子搭載用基板の製造方法。   The method of manufacturing a substrate for mounting an electronic device according to any one of claims 1 to 3, wherein the wettability reducing material is a resin in which carbon, which is a decomposition product by heating, remains at an adhesion position at 560 ° C. 前記樹脂は、エポキシ系樹脂、フェノール系樹脂、アクリル系樹脂のうちの少なくとも1種からなる接着剤である請求項7に記載の電子素子搭載用基板の製造方法。   The method for manufacturing a substrate for mounting an electronic element according to claim 7, wherein the resin is an adhesive made of at least one of an epoxy resin, a phenol resin, and an acrylic resin. 積層体を仮組した後に濡れ性低下材を付与する請求項1〜8のいずれかに記載の電子素子搭載用基板の製造方法。   The manufacturing method of the board | substrate for electronic element mounting in any one of Claims 1-8 which provides a wettability reducing material after temporarily assembling a laminated body. 仮組前のセラミック基板および熱応力緩和材の一方または両方の相対する面の縁部に濡れ性低下材を付与し、他の部材とともに重ねて積層体を仮組し、仮組した積層体を積層方向に押し付けて濡れ性低下材を積層界面から外部に排出させて接合部の周囲に付着させる請求項1〜8のいずれかに記載の電子素子搭載用基板の製造方法。   A wettability reducing material is applied to the edge of one or both of the ceramic substrate and the thermal stress relaxation material before temporary assembly, and the laminate is temporarily assembled with other members, and the temporarily assembled laminate is obtained. The method for manufacturing a substrate for mounting an electronic element according to any one of claims 1 to 8, wherein the wettability reducing material is pressed out in a laminating direction to be discharged outside from the laminating interface and adhered to the periphery of the joint.
JP2011003869A 2011-01-12 2011-01-12 Manufacturing method of electronic device mounting substrate Active JP5671351B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011003869A JP5671351B2 (en) 2011-01-12 2011-01-12 Manufacturing method of electronic device mounting substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011003869A JP5671351B2 (en) 2011-01-12 2011-01-12 Manufacturing method of electronic device mounting substrate

Publications (2)

Publication Number Publication Date
JP2012146813A true JP2012146813A (en) 2012-08-02
JP5671351B2 JP5671351B2 (en) 2015-02-18

Family

ID=46790095

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011003869A Active JP5671351B2 (en) 2011-01-12 2011-01-12 Manufacturing method of electronic device mounting substrate

Country Status (1)

Country Link
JP (1) JP5671351B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012094839A (en) * 2010-09-29 2012-05-17 Mitsubishi Materials Corp Substrate for power module, and method for manufacturing substrate for power module with heat sink
JP2016082088A (en) * 2014-10-17 2016-05-16 株式会社Uacj Heat sink with circuit board, and method of manufacturing the same
CN113745169A (en) * 2021-07-23 2021-12-03 中国电子科技集团公司第二十九研究所 Multi-cavity LTCC substrate and packaging box body welding structure and method

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH057070A (en) * 1991-06-24 1993-01-14 Matsushita Electric Ind Co Ltd Solder resistant wettable paste and selective soldering prohibiting method
JPH11163108A (en) * 1997-11-28 1999-06-18 Kyocera Corp Terminal structure
JP2002373955A (en) * 2001-06-13 2002-12-26 Sumitomo Metal Electronics Devices Inc Power module substrate
JP2006216729A (en) * 2005-02-03 2006-08-17 Fuji Electric Device Technology Co Ltd Semiconductor device and manufacturing method thereof
JP2006286897A (en) * 2005-03-31 2006-10-19 Dowa Mining Co Ltd Metal-ceramic bonding substrate
JP2006294699A (en) * 2005-04-06 2006-10-26 Toyota Industries Corp Heat sink
JP2007173405A (en) * 2005-12-20 2007-07-05 Showa Denko Kk Semiconductor module
JP2007311526A (en) * 2006-05-18 2007-11-29 Mitsubishi Materials Corp Power module, substrate thereof, and manufacturing method thereof
JP2009105166A (en) * 2007-10-22 2009-05-14 Toyota Motor Corp Cooling device for semiconductor module
JP2009272424A (en) * 2008-05-07 2009-11-19 Fujikura Ltd Printed circuit board and method of manufacturing the same
JP2011228563A (en) * 2010-04-22 2011-11-10 Showa Denko Kk Method of brazing insulating laminate material
JP2011240374A (en) * 2010-05-19 2011-12-01 Showa Denko Kk Brazing method for insulation laminated material

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH057070A (en) * 1991-06-24 1993-01-14 Matsushita Electric Ind Co Ltd Solder resistant wettable paste and selective soldering prohibiting method
JPH11163108A (en) * 1997-11-28 1999-06-18 Kyocera Corp Terminal structure
JP2002373955A (en) * 2001-06-13 2002-12-26 Sumitomo Metal Electronics Devices Inc Power module substrate
JP2006216729A (en) * 2005-02-03 2006-08-17 Fuji Electric Device Technology Co Ltd Semiconductor device and manufacturing method thereof
JP2006286897A (en) * 2005-03-31 2006-10-19 Dowa Mining Co Ltd Metal-ceramic bonding substrate
JP2006294699A (en) * 2005-04-06 2006-10-26 Toyota Industries Corp Heat sink
JP2007173405A (en) * 2005-12-20 2007-07-05 Showa Denko Kk Semiconductor module
JP2007311526A (en) * 2006-05-18 2007-11-29 Mitsubishi Materials Corp Power module, substrate thereof, and manufacturing method thereof
JP2009105166A (en) * 2007-10-22 2009-05-14 Toyota Motor Corp Cooling device for semiconductor module
JP2009272424A (en) * 2008-05-07 2009-11-19 Fujikura Ltd Printed circuit board and method of manufacturing the same
JP2011228563A (en) * 2010-04-22 2011-11-10 Showa Denko Kk Method of brazing insulating laminate material
JP2011240374A (en) * 2010-05-19 2011-12-01 Showa Denko Kk Brazing method for insulation laminated material

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012094839A (en) * 2010-09-29 2012-05-17 Mitsubishi Materials Corp Substrate for power module, and method for manufacturing substrate for power module with heat sink
JP2016082088A (en) * 2014-10-17 2016-05-16 株式会社Uacj Heat sink with circuit board, and method of manufacturing the same
CN113745169A (en) * 2021-07-23 2021-12-03 中国电子科技集团公司第二十九研究所 Multi-cavity LTCC substrate and packaging box body welding structure and method
CN113745169B (en) * 2021-07-23 2023-10-24 中国电子科技集团公司第二十九研究所 Multi-cavity groove LTCC substrate and packaging box welding structure and method

Also Published As

Publication number Publication date
JP5671351B2 (en) 2015-02-18

Similar Documents

Publication Publication Date Title
JP6323522B2 (en) Power module board with cooler
EP3041042B1 (en) Method of producing bonded body and method of producing power module substrate
KR101720921B1 (en) Power module substrate unit and power module
KR101419627B1 (en) Substrate for power module, and power module
WO2015029810A1 (en) Assembly and power-module substrate
US9648737B2 (en) Bonded body and power module substrate
JPH10270596A (en) Ceramic circuit substrate with heat sink
JP5077102B2 (en) Power module substrate and manufacturing method thereof
JP2002203932A (en) Heat radiation substrate for semiconductor power device and its conductor plate, heat sink material, and brazing material
JP5621698B2 (en) Heating element module and manufacturing method thereof
JP5801639B2 (en) Electronic device mounting board
JP5671351B2 (en) Manufacturing method of electronic device mounting substrate
JP2011035308A (en) Radiator plate, semiconductor device, and method of manufacturing radiator plate
JP6754973B2 (en) Graphite radiator plate
JP2010232366A (en) Device for power electronics
JP6050140B2 (en) Insulating substrate
JP5282075B2 (en) Heat dissipation device
JP6801501B2 (en) Manufacturing method of insulated circuit board
JP6572705B2 (en) Manufacturing method of resistors, resistors
JP5569305B2 (en) Power module substrate and method of manufacturing power module substrate
JP6118583B2 (en) Insulating substrate
JP5854758B2 (en) Electronic device mounting board
WO2016060079A1 (en) Substrate with cooler for power modules and method for producing same
JP6790915B2 (en) Manufacturing method of insulated circuit board
JP5856838B2 (en) Brazing filler metal foil for heat dissipation devices

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20131025

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20140828

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20140924

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20141110

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20141209

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20141219

R150 Certificate of patent or registration of utility model

Ref document number: 5671351

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: R3D02

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313111

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350