JP2012117988A5 - - Google Patents

Description

BRIEF DESCRIPTION OF THE DRAWINGS The schematic block diagram of the contact site | part measuring apparatus which is one Example of this invention. The figure which shows an example of the shape of the contact site | part between two objects used as a measuring object in the contact site | part measuring apparatus of a present Example. The figure which shows an example of the two-dimensional intensity distribution image in the state which pressed one object on the other. The figure which shows the procedure of the measuring method using the contact site | part measuring apparatus of a present Example. The figure which shows an example of the two-dimensional intensity distribution image by measurement . It shows an example of a two-dimensional intensity distribution image according to the actual measurement. The figure which shows the relationship between the gap | interval d by measurement, and the emitted X-ray intensity when changing the gap | interval d. The figure which shows the theoretical simulation calculation result of the diffraction pattern on a detection surface when the contact site | part shape of a measuring object is Fig.2 (a), and gap | interval size is 1 micrometer. The figure which shows the theoretical simulation calculation result of the diffraction pattern on a detection surface in case the contact site | part shape of a measuring object is Fig.2 (a), and gap | interval size is 30 nm. The figure which shows the theoretical simulation calculation result of the diffraction pattern on a detection surface in case the contact part shape of a measuring object is FIG.2 (b), and gap | interval size is 1 micrometer. The figure which shows the theoretical simulation calculation result of the diffraction pattern on a detection surface in case the contact part shape of a measuring object is FIG.2 (b), and gap | interval size is 30 nm.

FIG. 2A shows a configuration in which two objects having a triangular cross section and extending in the Y direction in the drawing are in contact with each other when their tops are viewed macroscopically. 8 and 9 is obtained by assuming a contact portion having a shape shown in FIG. 2 (a), FIG. 8 is the case the gap of both objects of 1 [mu] m, 9 when the gap between both objects of 30n m it is a diffraction intensity pattern.

FIG. 2 (b) shows a configuration in which two objects having a semicircular top and extending in the Y direction in the drawing are in contact with each other when the tops are viewed macroscopically. It is. 10 and 11 is obtained by assuming a contact portion having a shape shown in FIG. 2 (b), FIG. 10 when the gap between both objects of 1 [mu] m, 11 when the gap between both objects of 30n m it is a diffraction intensity pattern. The most different point from the calculation for the shape shown in FIG. 2A is that total reflection needs to be considered.

It is clear from the above calculation results, although the degree varies depending on the shape of both objects sandwiching the contact site, even gap size of about 30n m, X-ray of a sufficient intensity to detect its gap width Appearing with a moderate spread width in the same direction. Therefore, if the X-rays that progress while spreading are accurately extracted, it is possible to estimate the gap size based on the X-ray intensity integrated value obtained therefrom. The shape of the diffraction intensity pattern is quite specific depending on the shapes of both objects sandwiching the contact site. Therefore, for example, if a two-dimensional X-ray detector is arranged in the X-ray reachable range and the spatial distribution of X-ray intensity is measured, the surface shape of the object can be estimated from the intensity distribution.

As shown in FIG. 1, in the contact part measuring apparatus of the present embodiment, X-rays 2 and X-rays emitted from the X-ray source 2 are efficiently collected in the X-ray shielding chamber 1 to be substantially parallel light. Multi-capillary X-ray lens 3 to be measured, measurement object 4 including first object 4A and second object 4B, and X-rays emitted from the vicinity of the contact portion of measurement object 4 upon receiving X-ray irradiation are two-dimensionally displayed. A two-dimensional X-ray detector 5 is provided for detection. On the other hand, a data processing unit 6 embodied by a personal computer or the like is provided outside the X-ray shielding chamber 1 in order to process detection data obtained by the two-dimensional X-ray detector 5. The two-dimensional X-ray detector 5 is a position-sensitive detector that can determine the position of X-rays incident in a predetermined two-dimensional range. Therefore, from the two-dimensional X-ray detector 5 to the data processing unit 6, position information data of X-rays incident on the two-dimensional detection surface of the detector 5 (for example, data indicating a position address on the detection surface) and X-ray intensity data at each position on the detection surface is output.

As shown in FIG. 1, even when the first object 4A and the second object 4B are in contact with each other, there are fine irregularities on the surfaces of the objects 4A and 4B, the influence of foreign matter attached to the surface, etc. Due to this, there is a very small gap. For this reason, when the X-rays as described above are irradiated to this contact site, X-rays that pass through while being mainly reflected by the gap (hereinafter referred to as “passing X-rays”) are emitted from the opposite side. In addition, X-rays diffracted by fine uneven edges and crystals on the surfaces of the objects 4A and 4B (hereinafter referred to as “diffracted X-rays”) are also emitted from the opposite side and scattered by the surfaces of the objects 4A and 4B. A ray (hereinafter referred to as “scattered X-ray”) is also emitted. Furthermore, even if the X-ray incident angle is less than or equal to the total reflection critical angle at the contact site, the X-ray incident angle exceeds the total reflection critical angle at a position slightly away from the contact site, and the contact site is also microscopic. In some cases, the incident angle of some X-rays may exceed the total reflection critical angle. Therefore, the characteristic X-rays peculiar to the substance are also emitted from the objects by the excitation action of the X-rays entering the objects 4A and 4B. Such various types of X-rays travel while spreading from the contact area and reach the detection surface of the two-dimensional X-ray detector 5 .

In general, the intensity of transmitted X-rays is the highest, but the intensity of diffracted X-rays and scattered X-rays is considerably high. However, at the detection surface position of the two-dimensional X-ray detector 5 , the passing X-rays are within a relatively narrow range reflecting the size of the minute gap at the contact site, whereas the spread of diffracted X-rays and scattered X-rays is in contact. It is greatly influenced by the surface shapes of the objects 4A and 4B near the part. In the apparatus of the present embodiment, even when diffracted X-rays and scattered X-rays are emitted while greatly spreading, most of the X-rays are received by the two-dimensional X-ray detector 5 to obtain position information data and X-ray intensity data. be able to.

The actual example of a two-dimensional X-ray intensity distribution image slit opening width d is obtained a slit is 6μm and 1μm as measured by the contact portion measuring device 5, shown in FIG. It can be seen that even with a slit opening width of 1 μm, a horizontal strip (line) image corresponding to the slit opening is clearly obtained. As described above, in such a case, a band-shaped detection window extending in the horizontal direction may be set. Further, even when the slit opening width becomes narrower, a signal having a sufficient strength for calculating the opening width can be extracted by setting an appropriate detection window by increasing the integration time.

1 ... X-ray shielding room
2 ... X-ray source 3 ... Multicapillary X-ray lens 4 ... Measurement object 4A ... First object 4B ... Second object 5 ... Two-dimensional X-ray detector 6 ... Data processing unit 61 ... Two-dimensional X-ray intensity distribution creation unit 62 ... Analysis processing section