JP2012115724A - Dust-treating apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a dust-treating apparatus that reliably catches dust contained in air to be treated.SOLUTION: The dust-treating apparatus including a treatment tank storing a dust-catching liquid; a partition wall that divides the treatment tank into an air introducing chamber for introducing air to be treated and a dust-separating chamber, and includes a communication port provided in the lower part thereof to connect the air introducing chamber with the dust-separating chamber; and a means for supplying a dust-catching liquid to spray it into the chamber. The air introducing chamber communicates with a dust-generating source, and the dust-separating chamber communicates with an air-discharge means. The dust-separating chamber includes an agitation plate for agitating the dust-catching liquid flowing thereinto from the air introducing chamber through the communication port in the partition wall. The means for supplying a dust-catching liquid sprays the dust-catching liquid, i.e., a mixture of water and a foamable liquid.

Description

  The present invention relates to a dust processing apparatus for processing dust generated when processing by a processing apparatus such as a laser processing apparatus or a polishing apparatus.

  In the semiconductor device manufacturing process, a plurality of regions are partitioned by dividing lines called streets arranged in a lattice pattern on the surface of a semiconductor substrate having a substantially disk shape, and devices such as ICs, LSIs, etc. are partitioned in these partitioned regions. Form. Then, the semiconductor wafer is cut along the streets to divide the region in which the device is formed to manufacture individual devices. In addition, optical device wafers in which light-receiving elements such as photodiodes and light-emitting elements such as laser diodes are stacked on the surface of the sapphire substrate are also divided into optical devices such as individual photodiodes and laser diodes by cutting along the streets. And widely used in electrical equipment.

  As a method of dividing the wafer such as the semiconductor wafer or the optical device wafer described above along the street, a laser processing groove is formed by irradiating a pulse laser beam along the street formed on the wafer, and along the laser processing groove. The method of breaking is practically used.

  As described above, when a wafer, which is a workpiece, is irradiated with a laser beam, debris is generated, and dust containing the debris is scattered. Therefore, it is necessary to process the dust. As a device for treating this dust, a wet dust treatment device has been put into practical use. This wet dust processing apparatus includes a processing tank for storing a dust trapping liquid, a communication port that divides the processing tank into a processing air introduction chamber and a dust separation chamber, and communicates the processing air introduction chamber and the dust separation chamber in the lower part. The processing air introduction chamber communicates with the dust generation source, and the dust separation chamber communicates with the exhaust means. (For example, see Patent Document 1 and Patent Document 2.)

JP 2000-237521 A JP-A-2005-32937

  Thus, in the dust processing apparatus disclosed in the above-mentioned patent document, dust contained in the processing air introduced into the processing air introduction chamber cannot be reliably captured, and is not always satisfactory.

  This invention is made | formed in view of the said fact, The main technical subject is to provide the dust processing apparatus which can capture | acquire the dust contained in process air reliably.

In order to solve the above-mentioned main technical problem, according to the present invention, a processing tank for storing the dust trapping liquid, the processing tank is divided into a processing air introduction chamber and a dust separation chamber, and the processing air introduction chamber and the dust are formed in the lower part. A partition wall having a communication port communicating with the separation chamber and a dust trapping liquid supply means for spraying the dust trapping liquid to the processing air introduction chamber are provided, and the processing air introduction chamber communicates with the dust generation source. , In the dust treatment apparatus that communicates the dust separation chamber with the exhaust means,
The dust separation chamber is provided with a stirring plate for stirring the dust trapping liquid flowing from the processing air introduction chamber side through the communication port of the partition wall,
The dust trapping liquid supply means sprays a dust trapping liquid in which a liquid that is foamed into water is mixed.
A dust treatment apparatus is provided.

  The foamed liquid mixed in the dust trapping liquid is made of a surfactant.

  In the dust treatment apparatus according to the present invention, the dust trapping liquid supply means for spraying the dust trapping liquid into the processing air introduction chamber sprays the dust trapping liquid mixed with the liquid that becomes foamed in water. The dust trapping liquid that has flowed into the dust separation chamber through the communication port becomes foamed by the stirring action of the stirring plate, and the surface area increases. Thus, the dust trapping liquid that is foamed and has an increased surface area reliably and efficiently adheres to the dust in the processing air sucked into the dust separation chamber. Therefore, dust in the processing air can be reliably captured.

1 is a cross-sectional view of a dust treatment apparatus configured according to the present invention.

  DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, preferred embodiments of a dust treatment apparatus configured according to the invention will be described in detail with reference to the accompanying drawings.

  FIG. 1 shows a cross-sectional view of a dust treatment apparatus constructed in accordance with the present invention. The dust processing apparatus shown in FIG. 1 includes a processing tank 2 that stores a dust trapping liquid. The treatment tank 2 includes a bottom wall 21, a side wall 22, and an upper wall 23. In the processing tank 2, a partition wall 3 is provided that partitions the processing tank into a processing air introduction chamber 2a and a dust separation chamber 2b. A communication port 31 that communicates between the processing air introduction chamber 2a and the dust separation chamber 2b is provided below the partition wall 3.

  A processing air introduction port 231 is provided in the upper wall 23 forming the processing air introduction chamber 2a, and this processing air introduction port 231 communicates with a processing apparatus (not shown) as a dust generation source. The dust processing apparatus in the illustrated embodiment includes dust trapping liquid supply means 5 for spraying the dust trapping liquid to the processing air introduction chamber 2a. The dust trapping liquid supply means 5 includes a water tank 51 that stores water as dust trapping liquid, a pump 53 that sends the water stored in the water tank 51 through a delivery pipe 52, and a pump 53 that delivers the water. And a dust trapping liquid supply pipe 54 for supplying the treated water to the processing air introduction chamber 2a. The dust trapping liquid supply pipe 54 is disposed on the upper wall 23 forming the processing air introduction chamber 2a, and a spray nozzle 55 for spraying the dust trapping liquid in a mist form is provided at the lower end in FIG. Yes. The dust trapping liquid supply means 5 configured as described above includes a surfactant supply means 56 that mixes a surfactant as a liquid that foams into the water sent to the delivery pipe 52.

  In the dust separation chamber 2b, a stirring plate 6 is disposed to face the communication port 31 of the partition wall 3. The stirring plate 6 is provided with a curved concave portion 61 for stirring the dust trapping liquid flowing into the dust separation chamber 2b through the communication port 31 at the lower portion, and a flow hole 62 is provided below the curved concave portion 61. Yes.

  Moreover, the water level maintenance pipe 7 for maintaining the water level of the dust trapping liquid stored in the dust separation chamber 2b is disposed in the dust separation chamber 2b. One end (upper end) of the water level maintaining pipe 7 is opened at a predetermined height from the bottom wall 21 of the treatment tank 2, and the other end penetrates the bottom wall 21 and is connected to a drain means (not shown).

  Further, in the dust separation chamber 2b, a water level stabilizing plate 8 for stabilizing the water level is disposed between the stirring plate 6 and the water level maintaining pipe 7. The lower end of the water level stabilizing plate 8 is positioned at a position between the bottom wall 21 of the processing tank 2 and one end (upper end) of the water level maintaining pipe 7, and the upper end is connected to the upper wall 23 of the processing tank 2. . The water level stabilizing plate 8 is provided with an opening 81 that communicates the upper portion of the dust separation chamber 2b and the exhaust chamber 2c formed at the upper portion of the region where the water level maintaining pipe 7 is disposed.

  A discharge port 232 is provided in the upper wall 23 constituting the exhaust chamber 2c, and the discharge port 232 is connected to the blower 9.

The dust treatment apparatus in the illustrated embodiment is configured as described above, and the operation thereof will be described below.
In order to process dust generated by a processing device (not shown) as a dust generating source communicated with the processing air introduction port 231 provided in the upper wall 23 of the processing tank 2, the blower 9 is operated and a dust trapping liquid is operated. The pump 53 of the supply means 5 is operated. When the blower 9 operates, the air in the dust separation chamber 2b is sucked through the exhaust chamber 2c and the opening 81 of the water level stabilizing plate 8. As a result, the processing air and the dust trapping liquid 10 in the processing air introduction chamber 2a of the processing tank 2 are introduced into the dust separation chamber 2b through the communication port 31 of the partition wall 3, and the processing air containing the dust is processed from the processing air introduction port 231. Air is sucked into the processing air introduction chamber 2a. Further, in the processing air introduction chamber 2a, dust mixed with a surfactant as a liquid that foams into water from the spray nozzle 55 provided at the lower end of the dust trapping liquid supply pipe 54 constituting the dust trapping liquid supply means 5 is used. Capture liquid is sprayed. As a result, water droplets adhere to the dust in the processing air sucked into the processing air introduction chamber 2a and flow into the dust separation chamber 2b through the communication port 31 of the partition wall 3, and part of the dust is accommodated in the processing tank 2. It comes into contact with the dust trapping liquid 10 and falls. On the other hand, the dust trapping liquid 10 that has flowed into the dust separation chamber 2b through the communication port 31 of the partition wall 3 is swung upward along the curved concave portion 61 of the stirring plate 6 and becomes foamy by this stirring action to increase the surface area. To do. The dust trapping liquid that is foamed and has an increased surface area in this way reliably and efficiently captures dust in the processing air sucked into the dust separation chamber 2b from the processing air introduction chamber 2a through the communication port 31.

  Dust in the processing air sucked into the dust separation chamber 2b adheres to water droplets, a part of the dust falls along the partition wall 3 to the dust trapping liquid 10, and the rest moves over the stirring plate 6 together with the processing air to the water level stabilization plate. Invade between 8 and 8. And the dust adhering to a water droplet falls to the dust capture | acquisition liquid 10 as it is, or falls to the dust capture | acquisition liquid 10 through the partition wall 3 and the water level stabilization board 8. FIG. In this way, the processing air removed by the dust adhering to the water droplets dropping into the dust trapping liquid 10 is guided to the exhaust chamber 2c through the opening 81 provided in the water level stabilizing plate 8, and is sent from the discharge port 232 to the blower. 9 is discharged.

  The dust trapping liquid stored in the dust separation chamber 2 b of the treatment tank 2 is discharged through the water level maintenance pipe 7 when the water level reaches the upper end of the water level maintenance pipe 7. Further, since the water level stabilizing plate 8 for stabilizing the water level is disposed between the stirring plate 6 and the water level maintaining pipe 7 in the dust separation chamber 2b, the water level in the region where the water level maintaining pipe 7 is located. Is stable.

  As described above, in the dust processing apparatus in the illustrated embodiment, the dust trapping liquid supply means 5 for spraying the dust trapping liquid to the processing air introduction chamber 2a has a dust trapping liquid mixed with a liquid that becomes foamed in water. Since the spraying is performed, the dust trapping liquid that has flowed into the dust separation chamber 2b through the communication port 31 of the partition wall 3 becomes foamed by the stirring action of the stirring plate 6 and the surface area is increased. In this way, the dust trapping liquid that is foamed and has an increased surface area reliably and efficiently captures dust in the processing air sucked into the dust separation chamber 2b.

2: treatment tank 2a: treatment air introduction chamber 2b: dust separation chamber 3: partition wall 31: communication port 5: dust trapping liquid supply means 51: water tank 53: pump 54: dust trapping liquid supply pipe 55: spray nozzle 56: Surfactant supply means 6: Stirring plate 7: Water level maintaining pipe 8: Water level stabilizing plate 9: Blower

Claims (2)

A processing tank for storing the dust trapping liquid; a partition wall that divides the processing tank into a processing air introduction chamber and a dust separation chamber and includes a communication port that communicates the processing air introduction chamber and the dust separation chamber at the bottom; In a dust treatment apparatus comprising dust trapping liquid supply means for spraying dust trapping liquid to the processing air introduction chamber, communicating the processing air introduction chamber to a dust generating source, and communicating the dust separation chamber to exhaust means ,
The dust separation chamber is provided with a stirring plate for stirring the dust trapping liquid flowing from the processing air introduction chamber side through the communication port of the partition wall,
The dust trapping liquid supply means sprays a dust trapping liquid in which a liquid that is foamed into water is mixed.
The dust processing apparatus characterized by the above-mentioned.   The dust treatment apparatus according to claim 1, wherein the foamed liquid mixed in the dust trapping liquid is made of a surfactant.

Images