JP2012114536A - Piezoelectric vibrator - Google Patents

Piezoelectric vibrator Download PDF

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JP2012114536A
JP2012114536A JP2010259781A JP2010259781A JP2012114536A JP 2012114536 A JP2012114536 A JP 2012114536A JP 2010259781 A JP2010259781 A JP 2010259781A JP 2010259781 A JP2010259781 A JP 2010259781A JP 2012114536 A JP2012114536 A JP 2012114536A
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metal layer
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JP5472058B2 (en
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Tadataka Koga
忠孝 古賀
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Daishinku Corp
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Abstract

PROBLEM TO BE SOLVED: To provide a piezoelectric vibrator that can implement a more reliable electrode structure keeping electrical characteristics intact while stabilizing bonding strength of a tin-based low melting point brazing metal.SOLUTION: In the piezoelectric vibrator which has a base 2 for airtight termination embedded with lead terminals 21, 22 and a piezoelectric vibrating reed 1 provided with excitation electrodes 13, 14 and electrode pads 17, 18 and in which the electrode pads of the piezoelectric vibrating reed are electromechanically bonded to tip portions of the lead terminals with a tin-based low melting point brazing metal to mount the piezoelectric vibrating reed on the base, the excitation electrodes and the electrode pads comprise the same conductive metal layer formed on an upper surface of the same base metal layer, the excitation electrodes are formed with a tin layer interposed between the base metal layer and the conductive metal layer, and the electrode pads are formed with an alloy layer comprising the base metal and conductive metal interposed between the base metal layer and the conductive metal layer.

Description

本発明は、圧電振動子に関するものである。   The present invention relates to a piezoelectric vibrator.

圧電振動子は、通信機器の基準発振源、あるいはマイクロコンピュータのクロック源として用いられる。例えば特許文献1に示すようなシリンダー型の圧電振動子では、金属製のシェルに絶縁ガラスが充填され、当該絶縁ガラスにリード端子が貫通固定されたベースを用い、ベース上面に圧電振動片を取着し、キャップをベースに圧入することにより、圧電振動片等を気密封止する構成である。このような圧電振動片とリード端子(ベースの接合部)との接合には、圧電振動片に対する熱的な悪影響を与えないようにするため、350℃以下のはんだ材や低融点金属ろう材が用いられている。   The piezoelectric vibrator is used as a reference oscillation source of communication equipment or a clock source of a microcomputer. For example, in a cylinder-type piezoelectric vibrator as shown in Patent Document 1, a base made by filling a metal shell with insulating glass and having lead terminals penetrated and fixed to the insulating glass is used. The piezoelectric vibrating piece and the like are hermetically sealed by wearing and press-fitting the cap into the base. In joining such a piezoelectric vibrating piece and a lead terminal (base joint), a solder material or a low melting point metal brazing material of 350 ° C. or lower is used so as not to adversely affect the piezoelectric vibrating piece. It is used.

特開平1−68007号JP-A-1-68007

錫(Sn)を主成分とするはんだ材や低融点金属ろう材による接合構成では、比較的低融点で圧電振動片にダメージを与えないものが多く、ヌレ性や接合強度も高く、クラックなどが生じにくいといった優位点があるものの、電極材料によって接合強度がばらついたり、電気的特性にも影響が生じやすいといった問題点あった。例えばクロム(Cr)やニッケル(Ni)など水晶などに対して密着性の高い下地電極膜の上面に、銀(Ag)や金(Au)などの導通性の高い表面電極膜を構成した電極に対して、錫(Sn)を主成分とするはんだ材や低融点金属ろう材を用いると、下地電極膜と表面電極膜との金属間結合力に比べて、表面電極膜とはんだ材や金属ろう材との金属間結合力が非常に強くなり、接合後に下地電極膜と表面電極膜の間の膜剥がれが生じることがあった。このため圧電振動子の接合部分における耐衝撃性能が著しく低下し、導通不良を招く可能性があった。また前記錫によって表面電極膜のくわれ現象が早められたり、前記錫が経年変化とともに表面電極膜中で拡散することによる電気的特性の劣化を生じさせることもあった。   In the joining configuration with a solder material mainly composed of tin (Sn) or a low melting point metal brazing material, there are many that are relatively low melting point and do not damage the piezoelectric vibrating piece, and have high sag and joining strength, cracks, etc. Although there is an advantage that it does not easily occur, there is a problem that the bonding strength varies depending on the electrode material and the electrical characteristics are easily affected. For example, an electrode having a highly conductive surface electrode film such as silver (Ag) or gold (Au) on the upper surface of a base electrode film having high adhesion to quartz or the like such as chromium (Cr) or nickel (Ni). On the other hand, when a solder material or a low melting point metal brazing material containing tin (Sn) as a main component is used, the surface electrode film and the solder material or the metal brazing are compared with the intermetallic bonding force between the base electrode film and the surface electrode film. In some cases, the metal-to-metal bonding force with the material becomes very strong, and film peeling occurs between the base electrode film and the surface electrode film after bonding. For this reason, the impact resistance performance at the joint portion of the piezoelectric vibrator is remarkably lowered, which may lead to poor conduction. In addition, the tin phenomenon of the surface electrode film is accelerated by the tin, and the electrical characteristics may be deteriorated due to the diffusion of the tin in the surface electrode film with aging.

なお、近年の電子部品の鉛フリー要請により、上述の圧電振動子においても鉛フリー製品が求められている。このような要請に対応して、圧電振動片を支持するはんだ材や低融点金属ろう材も鉛フリー製品が採用されるようになっている。このような錫を主成分とする鉛フリー製品では、上述した問題点がより顕著となっているのが現状である。   In addition, with the recent lead-free request for electronic components, lead-free products are also required for the above-described piezoelectric vibrators. In response to such demands, lead-free products have been adopted for solder materials and low melting point metal brazing materials that support piezoelectric vibrating reeds. In such a lead-free product containing tin as a main component, the above-described problems are more conspicuous.

本発明は上記問題点を解決するためになされたもので、錫系の低融点金属ろう材による接合強度を安定させながら、電気的特性の劣化させることがないより信頼性の高い電極構造が得られる圧電振動子を提供することを目的とする。   The present invention has been made to solve the above-mentioned problems, and a more reliable electrode structure that does not deteriorate the electrical characteristics while stabilizing the bonding strength of the tin-based low melting point metal brazing material is obtained. An object of the present invention is to provide a piezoelectric vibrator.

本発明は、上記目的を達成するためになされたもので、請求項1に示すように、ベースと、励振電極と電極パッドが形成された圧電振動片とを有し、前記ベースの圧電振動片接合部と圧電振動片の電極パッドとを錫系の低融点金属ろう材により電気機械的に接合してベースに圧電振動片を搭載してなる圧電振動子であって、前記励振電極と電極パッドとは下地金属層の上面に導電金属層が形成され、前記励振電極は前記下地金属層と前記導電金属層の間に錫層が介在した状態で形成され、前記電極パッドは前記下地金属層と前記導電金属層との間に当該下地金属と導電金属からなる合金層が介在した状態で形成されていることを特徴とする。   The present invention has been made in order to achieve the above object, and has a base and a piezoelectric vibrating piece in which an excitation electrode and an electrode pad are formed, and the piezoelectric vibrating piece of the base is provided. A piezoelectric vibrator having a piezoelectric vibration piece mounted on a base by electromechanically joining a joint portion and an electrode pad of the piezoelectric vibration piece with a tin-based low melting point metal brazing material, wherein the excitation electrode and the electrode pad And a conductive metal layer is formed on the upper surface of the base metal layer, the excitation electrode is formed with a tin layer interposed between the base metal layer and the conductive metal layer, and the electrode pad is connected to the base metal layer. An alloy layer made of the base metal and the conductive metal is interposed between the conductive metal layer and the conductive metal layer.

上記構成によれば、前記励振電極は前記下地金属層と前記導電金属層の間に錫層が介在した状態で形成されていることで、軟質の錫層が導電金属層による圧電振動片の振動への悪影響を和らげ、結果として直列共振抵抗値(CI値)を向上させることができる。
前記電極パッドは前記下地金属層と前記導電金属層との間に当該下地金属と導電金属からなる合金層が介在した状態で形成されていることで、前記合金層が前記下地金属層と前記導電金属層との金属間結合を向上させる介在層として機能することができる。結果として、錫系の低融点金属ろう材による接合後に下地電極膜と表面電極膜の間の膜剥がれが生じることがなくなり、耐衝撃性能を高める。また電極パッドの領域の導電金属層の下には錫層が存在していないため、錫によって表面電極膜のくわれ現象が抑えられ、前記錫が経年変化とともに表面電極膜中で拡散することによる電気的特性の劣化を生じさせることも抑制される。
According to the above configuration, the excitation electrode is formed in a state where the tin layer is interposed between the base metal layer and the conductive metal layer, so that the soft tin layer is vibrated by the conductive metal layer. As a result, the series resonance resistance value (CI value) can be improved.
The electrode pad is formed in a state where an alloy layer composed of the base metal and the conductive metal is interposed between the base metal layer and the conductive metal layer, so that the alloy layer is formed of the base metal layer and the conductive metal layer. It can function as an intervening layer that improves the intermetallic bond with the metal layer. As a result, film peeling between the base electrode film and the surface electrode film does not occur after bonding with the tin-based low melting point metal brazing material, and the impact resistance performance is improved. In addition, since there is no tin layer under the conductive metal layer in the electrode pad region, the phenomenon of the cracking of the surface electrode film is suppressed by tin, and the tin diffuses in the surface electrode film with aging. It is also possible to suppress deterioration of electrical characteristics.

また請求項2に示すように、ベースと、励振電極と電極パッドが形成された圧電振動片とを有し、前記ベースの圧電振動片接合部と圧電振動片の電極パッドとを錫系の低融点金属ろう材により電気機械的に接合してベースに圧電振動片を搭載してなる圧電振動子であって、前記圧電振動片が2つの主面と2つの側面とを有した基部とこの基部一端部から突出し、2つの主面と2つの側面とを有する複数本の脚部とから構成され、前記励振電極と電極パッドとは下地金属層の上面に導電金属層が形成され、前記基部と脚部の側面に形成された励振電極は前記下地金属層と前記導電金属層の間に錫層が介在した状態で形成され、前記基部と脚部の主面に形成された励振電極と電極パッドは前記下地金属層と前記導電金属層との間に当該下地金属と導電金属からなる合金層が介在した状態で形成されていることを特徴とする。   According to a second aspect of the present invention, there is provided a base and a piezoelectric vibrating piece on which an excitation electrode and an electrode pad are formed, and the piezoelectric vibrating piece joint of the base and the electrode pad of the piezoelectric vibrating piece are made of a tin-based low A piezoelectric vibrator formed by electromechanically joining a melting point metal brazing material and mounting a piezoelectric vibrating piece on a base, the piezoelectric vibrating piece having a base portion having two main surfaces and two side surfaces, and the base portion A plurality of legs protruding from one end and having two main surfaces and two side surfaces, the excitation electrode and the electrode pad are formed with a conductive metal layer on an upper surface of a base metal layer, and the base The excitation electrode formed on the side surface of the leg is formed with a tin layer interposed between the base metal layer and the conductive metal layer, and the excitation electrode and electrode pad formed on the main surface of the base and the leg Is between the base metal layer and the conductive metal layer and the base metal Wherein the alloy layer made of a conductive metal is formed in a state interposed.

上記構成によれば、前記基部と脚部の2つの側面に形成された励振電極は前記下地金属層と前記導電金属層の間に錫層が介在した状態で形成されていることで、軟質の錫層が導電金属層による圧電振動片の振動への悪影響を和らげ、結果として直列共振抵抗値(CI値)を向上させることができる。
特に複数の脚部が側面方向に屈曲振動してなる音叉圧電型振動片では、主面の励振電極よりも側面の励振電極による影響が強くなる傾向にあり、直列共振抵抗値(CI値)の向上に関係する。
前記基部と脚部の2つの主面に形成された励振電極と電極パッドは前記下地金属層と前記導電金属層との間に当該下地金属と導電金属からなる合金層が介在した状態で形成されていることで、前記合金層が前記下地金属層と前記導電金属層との金属間結合を向上させる介在層として機能することができる。結果として、錫系の低融点金属ろう材による接合後に下地電極膜と表面電極膜の間の膜剥がれが生じることがなくなり、耐衝撃性能を高める。また電極パッドの領域の導電金属層の下には錫層が存在していないため、錫によって表面電極膜のくわれ現象が抑えられ、前記錫が経年変化とともに表面電極膜中で拡散することによる電気的特性の劣化を生じさせることも抑制される。
特に複数の脚部が側面方向に屈曲振動してなる音叉圧電型振動片では、上述のような接合の信頼性を高めながら、基部の主面に形成された電極パッドで、リード端子と錫系の低融点金属ろう材により電気機械的に接合することができるため、音叉型圧電振動片の振動も阻害しにくい保持形態とすることができる。
According to the above configuration, the excitation electrode formed on the two side surfaces of the base portion and the leg portion is formed in a state in which a tin layer is interposed between the base metal layer and the conductive metal layer. The tin layer can alleviate the adverse effect of the conductive metal layer on the vibration of the piezoelectric vibrating piece, and as a result, the series resonance resistance value (CI value) can be improved.
In particular, in a tuning fork piezoelectric vibrating piece in which a plurality of legs flexurally vibrate in the lateral direction, the influence of the side excitation electrode tends to be stronger than the main surface excitation electrode, and the series resonance resistance value (CI value) Related to improvement.
The excitation electrode and electrode pad formed on the two main surfaces of the base and the leg are formed with an alloy layer made of the base metal and the conductive metal interposed between the base metal layer and the conductive metal layer. Therefore, the alloy layer can function as an intervening layer that improves the intermetallic bond between the base metal layer and the conductive metal layer. As a result, film peeling between the base electrode film and the surface electrode film does not occur after bonding with the tin-based low melting point metal brazing material, and the impact resistance performance is improved. In addition, since there is no tin layer under the conductive metal layer in the electrode pad region, the phenomenon of the cracking of the surface electrode film is suppressed by tin, and the tin diffuses in the surface electrode film with aging. It is also possible to suppress deterioration of electrical characteristics.
In particular, in a tuning fork piezoelectric vibrating piece in which a plurality of legs are bent and vibrated in the lateral direction, the lead terminal and the tin-based electrode pad are formed on the main surface of the base while improving the reliability of the bonding as described above. Since the low melting point metal brazing material can be electromechanically joined, it is possible to provide a holding form in which the vibration of the tuning fork type piezoelectric vibrating piece is hardly hindered.

また請求項3に示すように、上記構成において、前記励振電極と電極パッドとはお互いが離間した状態で形成し、接続電極は前記離間した励振電極と電極パッドとの上面に一部が重なった状態でお互いを接続するとともに、前記励振電極と電極パッドより低融点金属ろう材の濡れ性の低い電極膜で形成してもよい。   According to a third aspect of the present invention, in the above configuration, the excitation electrode and the electrode pad are formed in a state of being separated from each other, and the connection electrode partially overlaps the upper surfaces of the separated excitation electrode and the electrode pad. The electrodes may be connected to each other in a state, and may be formed of an electrode film having a lower wettability of the low melting point metal brazing material than the excitation electrode and the electrode pad.

上記構成によれば、上述の作用効果に加え、前記錫が経年変化とともに励振電極に拡散することによる電気的特性の劣化を生じさせることも抑制される。錫系の低融点金属ろう材が前記電極パッド内でのみ濡れ拡がり、ベースの圧電振動片接合部との接合強度も安定する。   According to the said structure, in addition to the above-mentioned effect, it is suppressed that the said tin causes the deterioration of the electrical property by diffusing to an excitation electrode with a secular change. The tin-based low melting point metal brazing material spreads only in the electrode pad, and the bonding strength with the piezoelectric vibrating piece bonding portion of the base is also stabilized.

本発明によれば、錫系の低融点金属ろう材による接合強度を安定させながら、電気的特性の劣化させることがなく、しかも圧電振動片の直列共振抵抗値を向上させることができるより信頼性の高い電極構造が得られる圧電振動子を提供することができる。   According to the present invention, it is possible to improve the series resonance resistance value of the piezoelectric vibrating piece without deteriorating the electrical characteristics while stabilizing the bonding strength of the tin-based low melting point metal brazing material, and more reliable. It is possible to provide a piezoelectric vibrator capable of obtaining a high electrode structure.

本発明による実施形態を示す音叉型圧電振動子の分解側面図。The exploded side view of the tuning fork type piezoelectric vibrator showing the embodiment by the present invention. 図1のX−X線に沿った断面図。Sectional drawing along the XX line of FIG. 図1のY−Y線に沿った断面図。Sectional drawing along the YY line | wire of FIG. 図1の圧電振動片をベースに搭載した状態の斜視図。The perspective view of the state which mounted the piezoelectric vibrating piece of FIG. 1 in the base. 図1の変形例を示す圧電振動片をベースに搭載した状態の斜視図。The perspective view of the state which mounted in the base the piezoelectric vibrating piece which shows the modification of FIG. 図1の変形例を示す圧電振動片の斜視図。The perspective view of the piezoelectric vibrating piece which shows the modification of FIG. 他の実施形態を示す圧電振動片の斜視図。The perspective view of the piezoelectric vibrating piece which shows other embodiment. 図7のZ−Z線に沿った断面図。Sectional drawing along the ZZ line | wire of FIG.

以下、本発明による好ましい実施形態について音叉型圧電振動子を例にとり、図面に基づいて説明する。本発明の音叉型圧電振動子は、音叉型振動片(圧電振動片)1と、この音叉型振動片が搭載され接合されるリード端子21,22(22については図示せず)を有するベース2と、音叉型振動片1とリード端子21,22とを接合する錫系の低融点金属ろう材としての鉛フリーはんだ材H、図示しないキャップとから構成されている。   Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings, taking a tuning fork type piezoelectric vibrator as an example. The tuning fork type piezoelectric vibrator of the present invention includes a tuning fork type vibration piece (piezoelectric vibration piece) 1 and a base 2 having lead terminals 21 and 22 (22 not shown) on which the tuning fork type vibration piece is mounted and joined. And a lead-free solder material H as a tin-based low melting point metal brazing material for joining the tuning fork type vibrating piece 1 and the lead terminals 21 and 22 and a cap (not shown).

音叉型振動片1は、水晶からなりXYカットやNTカットなどの屈曲振動する切断角度のものが用いられ、基部10と当該基部の一端部側101から同一方向へ平行にのびる2本の脚部11,12を構成している。基部10は脚部11,12とつながる2つの主面103,104と2つの側面105,106とを有している。脚部11,12には異極の励振電極である第1励振電極13と第2励振電極14とが形成されている。脚部11には表裏主面に第1励振電極13a,13bと両側面に第2励振電極14c,14dが形成され、脚部12には表裏主面に第2励振電極14a,14bと両側面に第1励振電極13c,13dが形成されている。このうち脚部11の表裏主面の第1励振電極13a,13bと脚部12の両側面の第1励振電極13c,13dとが後述する引き回し電極により同極で共通接続され、脚部12の表裏主面の第2励振電極14a,14bと脚部11の両側面の第2励振電極14c,14dとが後述する引き回し電極により同極で共通接続されている。   The tuning fork type vibrating piece 1 is made of crystal and has a cutting angle with bending vibration such as XY cut or NT cut, and two legs extending in parallel in the same direction from the base 10 and one end side 101 of the base. 11 and 12 are configured. The base portion 10 has two main surfaces 103 and 104 connected to the leg portions 11 and 12 and two side surfaces 105 and 106. A first excitation electrode 13 and a second excitation electrode 14, which are excitation electrodes of different polarities, are formed on the legs 11 and 12. The leg portion 11 is formed with first excitation electrodes 13a and 13b on the front and back main surfaces and second excitation electrodes 14c and 14d on both side surfaces. The leg portion 12 has the second excitation electrodes 14a and 14b and both side surfaces on the front and back main surfaces. First excitation electrodes 13c and 13d are formed. Of these, the first excitation electrodes 13a and 13b on the front and back main surfaces of the leg portion 11 and the first excitation electrodes 13c and 13d on both side surfaces of the leg portion 12 are connected in common with the same polarity by the routing electrodes described later. The second excitation electrodes 14a and 14b on the front and back main surfaces and the second excitation electrodes 14c and 14d on both side surfaces of the leg 11 are connected in common with the same polarity by routing electrodes to be described later.

基部10には表裏主面に後述するベース2のリード端子21,22(圧電振動片接合部)と後述する鉛フリーはんだ材Hを用いて導電接合されるとともに前記第1励振電極と第2励振電極とを個別に導出する電極パッド17,18が基部の主面103,104のうち他端部側102の端部に接した状態かあるいは端部近傍(基部他端部あたり)に形成されている。図1では基部端部近傍に形成している。また、図1に示すように、これらの電極パッド17,18のうち基部の一端部側101(音叉型振動片の基部の脚部側)の端部位置Aは、側面の励振電極13d,14c(14cについては図示せず)のうち基部の他端部側(音叉型振動片の底面側)102の端部位置Bに対して基部の他端部側(音叉型振動片の底面側)102の位置に配置している。   The base 10 is conductively bonded to the front and back main surfaces by using lead terminals 21 and 22 (piezoelectric vibrating piece bonding portions) of the base 2 to be described later and a lead-free solder material H to be described later, and the first excitation electrode and the second excitation. The electrode pads 17 and 18 for individually deriving the electrodes are formed in a state of being in contact with the end of the other end side 102 of the main surfaces 103 and 104 of the base or in the vicinity of the end (per other end of the base). Yes. In FIG. 1, it forms near the base end. Further, as shown in FIG. 1, among these electrode pads 17 and 18, the end position A on the one end side 101 of the base (the leg side of the base of the tuning-fork type vibration piece) is the side excitation electrodes 13d and 14c. The other end side of the base (the bottom side of the tuning-fork type vibration piece) 102 with respect to the end position B of the other end side (the bottom side of the tuning fork type vibration piece) 102 of the base part (not shown for 14c) It is arranged at the position.

上述の各励振電極と各電極パッドとはお互いが離間した状態で以下に説明する複数の引き回し電極と接続電極により共通接続されている。また図1に示す音叉型振動片1の基部10を下側に配置した状態から表裏反転した状態に配置される裏面側の各電極は、図1に示す表面側の各電極と同様の配置や同様の形状で構成しているので、反転させた際に同位置に配置される電極については図中括弧書きで補足的に記載している。   Each excitation electrode and each electrode pad described above are connected in common by a plurality of routing electrodes and connection electrodes described below in a state of being separated from each other. Further, each electrode on the back side arranged in a state where the base portion 10 of the tuning fork type vibrating piece 1 shown in FIG. 1 is placed on the bottom side is reversed, and the same arrangement as each electrode on the front side shown in FIG. Since the electrodes have the same shape, the electrodes arranged at the same position when reversed are supplementarily described in parentheses in the figure.

第1励振電極13は脚部11の表裏主面の第1励振電極13a,13bと脚部12の両側面の第1励振電極13c,13dにより構成されており、脚部11,12から離間した基部10に形成された電極パッド17へと導出されている。このうち表裏主面の第1励振電極13aと第1励振電極13bとは脚部11の先端付近に形成された引き回し電極15a,15bにより接続されており、第1励振電極13aと第1励振電極13cとは脚部12の付根付近に形成された引き回し電極15cにより接続され、第1励振電極13aと第1励振電極13dとは基部10に形成された接続電極15d,15eおよび電極パッド17により接続されている。   The first excitation electrode 13 is composed of first excitation electrodes 13 a and 13 b on the front and back main surfaces of the leg 11 and first excitation electrodes 13 c and 13 d on both sides of the leg 12, and is separated from the legs 11 and 12. It is led out to the electrode pad 17 formed on the base 10. Among these, the first excitation electrode 13a and the first excitation electrode 13b on the front and back main surfaces are connected by routing electrodes 15a and 15b formed near the tip of the leg portion 11, and the first excitation electrode 13a and the first excitation electrode are connected. 13c is connected by a lead-out electrode 15c formed near the root of the leg 12, and the first excitation electrode 13a and the first excitation electrode 13d are connected by connection electrodes 15d and 15e formed on the base 10 and an electrode pad 17. Has been.

接続電極15dは離間した第1励振電極13aと電極パッド17との上面に一部が重なった状態でお互いを接続しており、接続電極15eはお互いに離間した側面106の第1励振電極13dと主面103の電極パッド17との上面に一部が重なった状態でお互いを接続している。   The connection electrode 15d is connected to the first excitation electrode 13a and the electrode pad 17 which are separated from each other in a state of being partially overlapped with each other, and the connection electrode 15e is connected to the first excitation electrode 13d on the side surface 106 which is separated from each other. The main surfaces 103 are connected to each other in a state where a part of the upper surface of the main surface 103 and the electrode pad 17 overlaps.

接続電極15eは基部の主面103から側面106に面方向が変更された状態で形成されているとともに、基部の他端部側102の側面106にはその他端部に接した状態かあるいはその他端部近傍に(基部他端部あたりに)接続電極15eのみが形成されている。図1では接続電極15eを基部他端部近傍に形成している。接続電極15eはつまり音叉型振動片の基部の他端部側102では、その主面103の端部近傍に電極パッド17と接続電極15eの重なり部分のみが形成された端子領域を構成し、その側面106の端部近傍に接続電極15eのみが形成された端子領域を構成している。   The connection electrode 15e is formed in a state where the surface direction is changed from the main surface 103 of the base portion to the side surface 106, and the side surface 106 on the other end portion side 102 of the base portion is in contact with the other end portion or the other end portion. Only the connection electrode 15e is formed in the vicinity of the portion (around the other end of the base). In FIG. 1, the connection electrode 15e is formed in the vicinity of the other end of the base. That is, the connection electrode 15e constitutes a terminal region in which only the overlapping portion of the electrode pad 17 and the connection electrode 15e is formed in the vicinity of the end of the main surface 103 on the other end portion side 102 of the base of the tuning fork type vibrating piece, A terminal region in which only the connection electrode 15e is formed in the vicinity of the end of the side surface 106 is formed.

第2励振電極14は脚部12の表裏主面の第2励振電極14a,14bと脚部11の両側面の第2励振電極14c,14dにより構成されており、脚部11,12から離間した基部10に形成された電極パッド18へと導出されている。このうち表裏主面の第2励振電極14aと第2励振電極14bとは脚部12の先端付近に形成された引き回し電極16a,16bにより接続されており、第2励振電極14bと第2励振電極14dとは脚部11の付根付近に形成された引き回し電極16c(図示せず)により接続され、第2励振電極14bと第2励振電極14cとは基部10に形成された接続電極16d,16eおよび電極パッド18(図示せず)により接続されている。   The second excitation electrode 14 includes second excitation electrodes 14 a and 14 b on the front and back main surfaces of the leg portion 12 and second excitation electrodes 14 c and 14 d on both side surfaces of the leg portion 11, and is separated from the leg portions 11 and 12. It is led out to the electrode pad 18 formed on the base 10. Among these, the second excitation electrode 14a and the second excitation electrode 14b on the front and back main surfaces are connected by routing electrodes 16a and 16b formed near the tip of the leg portion 12, and the second excitation electrode 14b and the second excitation electrode are connected. 14d is connected by a routing electrode 16c (not shown) formed near the root of the leg 11, and the second excitation electrode 14b and the second excitation electrode 14c are connected to the connection electrodes 16d, 16e formed on the base 10, and They are connected by electrode pads 18 (not shown).

接続電極16d(図示せず)は離間した第2励振電極14bと電極パッド18との上面に一部が重なった状態でお互いを接続しており、接続電極16eはお互いに離間した側面105の第2励振電極14cと主面104の電極パッド18との上面に一部が重なった状態でお互いを接続している。   The connection electrode 16d (not shown) connects the second excitation electrode 14b and the electrode pad 18 that are separated from each other in a state of being partially overlapped with each other, and the connection electrode 16e is connected to the second side electrode 105 that is spaced from each other. The two excitation electrodes 14c and the electrode pads 18 on the main surface 104 are connected to each other in a state of being partially overlapped.

接続電極16eは基部の主面104から側面105に面方向が変更された状態で形成されているとともに、基部の他端部側102の側面105にはその他端部に接した状態かあるいはその他端部近傍に(他端部あたりに)接続電極16eのみが形成されている。つまり音叉型振動片の基部の他端部側102では、その主面104の端部近傍に電極パッド18と接続電極16eの重なり部分のみが形成された端子領域を構成し、その側面105の端部近傍に接続電極16eのみが形成された端子領域を構成している。   The connection electrode 16e is formed in a state where the surface direction is changed from the main surface 104 of the base portion to the side surface 105, and the side surface 105 on the other end portion side 102 of the base portion is in contact with the other end portion or the other end portion. Only the connection electrode 16e is formed in the vicinity of the portion (around the other end). That is, on the other end portion side 102 of the base of the tuning-fork type resonator element, a terminal region in which only the overlapping portion of the electrode pad 18 and the connection electrode 16e is formed in the vicinity of the end portion of the main surface 104 is formed. A terminal region is formed in which only the connection electrode 16e is formed in the vicinity of the portion.

上述の各励振電極や各引き回し電極は、図2に示すように、マスク治具を用いるパターンニングによる手法やフォトリソグラフィー技術によるメタルエッチングなどによる手法で形成される。例えば、クロム(Cr)やニッケル(Ni)など水晶などに対して密着性の高い下地金属層M1が形成され、その上面に錫(Sn)層M2が形成され、その上面に銀(Ag)や金(Au)などの導通性の高い導電金属層M3が形成された少なくとも3層以上の金属薄膜であり、真空蒸着法やスパッタリング法などにより形成されている。なお、導電金属層としては銀(Ag)が導電性能とコスト面で優れて望ましく、これにクロム(Cr)の下地金属層と、錫(Sn)の中間層を組み合わせたものが、直列共振抵抗値(CI値)を劣化させることなくコストも抑制することができるので、最も好ましい最適材料の組み合わせとなる。本形態では前記下地金属層と錫(Sn)層の間に、これら下地金属と錫(Sn)の合金層M4が形成された4層構成としている。この構成では下地金属層と錫(Sn)層との金属間接合をさらに高めることができ、膜剥がれの悪影響をなくすより望ましい形態としている。なお、本形態に限らず、前記錫(Sn)層と導電金属層の間には、これら錫(Sn)層と導電金属の合金層がさらに形成された5層構成としてもよい。この構成では錫(Sn)層と導電金属層との金属間接合をさらに高めることができる。   As shown in FIG. 2, each of the excitation electrodes and the routing electrodes described above is formed by a patterning method using a mask jig or a metal etching method using a photolithography technique. For example, a base metal layer M1 having high adhesion to quartz or the like such as chromium (Cr) or nickel (Ni) is formed, a tin (Sn) layer M2 is formed on the upper surface, and silver (Ag) or It is a metal thin film of at least three layers on which a conductive metal layer M3 having high conductivity such as gold (Au) is formed, and is formed by a vacuum deposition method, a sputtering method, or the like. As the conductive metal layer, silver (Ag) is desirable in terms of conductive performance and cost, and a combination of a chromium (Cr) base metal layer and a tin (Sn) intermediate layer is a series resonance resistance. Since the cost can be suppressed without deteriorating the value (CI value), it is the most preferable combination of optimum materials. In this embodiment, a four-layer structure in which an alloy layer M4 of these base metal and tin (Sn) is formed between the base metal layer and the tin (Sn) layer. With this configuration, the metal-to-metal bonding between the base metal layer and the tin (Sn) layer can be further enhanced, and this is a more desirable form that eliminates the adverse effects of film peeling. Note that the present invention is not limited to this embodiment, and a five-layer structure in which an alloy layer of the tin (Sn) layer and the conductive metal is further formed between the tin (Sn) layer and the conductive metal layer. In this configuration, the intermetallic bonding between the tin (Sn) layer and the conductive metal layer can be further enhanced.

これに対して、図3に示すように、各電極パッド17,18は、同様の手法で、例えば、クロム(Cr)やニッケル(Ni)など水晶などに対して密着性の高い下地金属層M1が形成され、最上面に銀(Ag)や金(Au)などの導通性の高い導電金属層M3が形成されるとともに、前記下地金属層と前記導電金属層との間に、これら下地金属と導電金属の合金層M5が介在した状態で形成された3層構成の金属薄膜である。なお、導電金属層としては銀(Ag)が導電性能とコスト面で優れて望ましく、これにクロム(Cr)の下地金属層と、これら合金層の中間層を含めた組み合わせたものが、直列共振抵抗値(CI値)を劣化させることなくコストも抑制することができるので、最も好ましい最適材料の組み合わせとなる。   On the other hand, as shown in FIG. 3, each electrode pad 17, 18 is a base metal layer M <b> 1 having high adhesion to a crystal such as chromium (Cr) or nickel (Ni) by the same method. And a conductive metal layer M3 having high conductivity such as silver (Ag) or gold (Au) is formed on the uppermost surface, and between the base metal layer and the conductive metal layer, the base metal and It is a metal thin film having a three-layer structure formed with a conductive metal alloy layer M5 interposed therebetween. As the conductive metal layer, silver (Ag) is desirable in terms of conductive performance and cost, and a combination of this including a base metal layer of chromium (Cr) and an intermediate layer of these alloy layers is a series resonance. Since the cost can be suppressed without deteriorating the resistance value (CI value), the most preferable combination of optimum materials is obtained.

また、一部図3に示すように、接続電極15d,15e,16d,16e(15d,16dについては図示せず)は、マスク治具を用いる手法で、例えば、クロム(Cr)の電極層M6のみから構成された単層構成の金属薄膜であり、真空蒸着法やスパッタリング法などにより形成されている。これは後述する錫系の鉛フリーはんだ材Hの濡れ性の低い電極膜として形成されている。   Further, as shown in FIG. 3 in part, the connection electrodes 15d, 15e, 16d, and 16e (not shown for 15d and 16d) are a technique using a mask jig, for example, a chromium (Cr) electrode layer M6. It is a single-layered metal thin film composed of only this, and is formed by a vacuum deposition method or a sputtering method. This is formed as an electrode film having low wettability of a tin-based lead-free solder material H described later.

ベース2は、金属製のシェルと、当該シェル内に充填された絶縁ガラスと、当該絶縁ガラスに貫通固定されたリード端子21,22とからなる。シェルは例えば42アロイを基体としており、上下に貫通した円筒形状を有している。なお、このシェルの材料は42アロイ以外に、コバールあるいは鉄ニッケル系合金を用いてもよい。   The base 2 includes a metal shell, an insulating glass filled in the shell, and lead terminals 21 and 22 that are fixed through the insulating glass. The shell has, for example, a 42 alloy base and has a cylindrical shape penetrating vertically. In addition to the 42 alloy, Kovar or iron nickel alloy may be used as the material of the shell.

リード端子21,22は例えばコバールを基体とし、線状に加工されている。これらリード端子は前記シェル内に所定の間隔をもって貫通配置されている。シェル内に充填された絶縁ガラスは例えばホウケイ酸ガラスからなり、前記シェルとリード端子21,22とを各々電気的に独立させた状態で固定されている。   The lead terminals 21 and 22 are processed into a linear shape using, for example, Kovar as a base. These lead terminals are disposed through the shell with a predetermined interval. The insulating glass filled in the shell is made of, for example, borosilicate glass, and is fixed in a state where the shell and the lead terminals 21 and 22 are electrically independent from each other.

ベースのシェルおよびリード端子21,22の表面には次の金属膜が形成される。シェルの基体表面およびリード端子の基体表面には、図示していないが、それぞれCu層からなる下地金属層が形成され、その上面にはSn−Cu層が形成されている。上記Cu層は例えば2〜5μmの厚さで形成され、上記Sn−Cu層は9〜15μmの厚さで形成される。これら層厚は一例であり、実施形態により適宜調整変更すればよい。なお、下地金属層としてNi層を用いてもよい。このようなSn−Cu層により鉛フリー(無鉛)対応ができ、また耐熱性を確保することができる。   The following metal films are formed on the surface of the base shell and the lead terminals 21 and 22. Although not shown, a base metal layer made of a Cu layer is formed on the surface of the shell substrate and the lead terminal substrate, and an Sn—Cu layer is formed on the upper surface thereof. The Cu layer is formed with a thickness of 2 to 5 μm, for example, and the Sn—Cu layer is formed with a thickness of 9 to 15 μm. These layer thicknesses are examples, and may be adjusted and changed as appropriate according to the embodiment. A Ni layer may be used as the base metal layer. Such a Sn—Cu layer can cope with lead-free (lead-free) and can secure heat resistance.

図4に示すように、このようなベース2のリード端子のインナー側21a,22aには前記音叉型水晶振動子片1が電気的機械的に接合される。すなわち基部10に形成された電極パッド17,18とリード端子のインナー側21a,22aとがSn−3Ag−0.5Cu等の錫系の鉛フリーはんだ材Hを用いたろう付け等により導電接合される。なお、鉛フリーはんだ材としては錫系の鉛フリー金属ろう材以外に他の材料のものでもよく、さらにはんだ材以外の錫系の鉛フリー低融点金属ろう材であってもよい。本発明では銀(Ag)や金(Au)の上部電極からなる導電性の高い電極膜に対して拡散する現象が生じやすくなる錫(Sn)を主成分として構成される鉛フリーはんだ材や鉛フリー低融点金属ろう材を用いる場合に好適である。   As shown in FIG. 4, the tuning fork type crystal resonator element 1 is electrically and mechanically joined to the inner sides 21 a and 22 a of the lead terminals of the base 2. That is, the electrode pads 17 and 18 formed on the base portion 10 and the inner sides 21a and 22a of the lead terminals are conductively joined by brazing using a tin-based lead-free solder material H such as Sn-3Ag-0.5Cu. . In addition to the tin-based lead-free metal brazing material, other materials may be used as the lead-free solder material, and a tin-based lead-free low melting point metal brazing material other than the solder material may be used. In the present invention, a lead-free solder material composed mainly of tin (Sn) that easily causes a diffusion phenomenon to a highly conductive electrode film made of an upper electrode of silver (Ag) or gold (Au) or lead It is suitable when a free low melting point metal brazing material is used.

また上述の実施形態に限ることなく、ベースのリード端子のインナー側21a,22a(ベースの圧電振動片接合部)と音叉型水晶振動子片1と接合構成については、上述の実施形態に限ることなく、図5に示すようにシリコーン系樹脂やエポキシ系樹脂、イミド系樹脂などの絶縁性樹脂接着剤Jにより音叉型水晶振動片の基部10の他端部側102とベース2の平面部分20との隙間の一部を埋めるようにお互いを接合することで、機械的な接合強度のさらなる補強を実現した構成としてもよい。   In addition, the inner side 21a, 22a (base piezoelectric vibrating piece bonding portion) of the base lead terminal and the tuning fork type crystal resonator piece 1 are not limited to the above-described embodiment, and the bonding configuration is limited to the above-described embodiment. As shown in FIG. 5, the other end side 102 of the base 10 of the tuning-fork type crystal vibrating piece and the flat portion 20 of the base 2 are formed by an insulating resin adhesive J such as a silicone resin, an epoxy resin, or an imide resin. It is good also as a structure which implement | achieved the further reinforcement of mechanical joining strength by joining each other so that a part of clearance gap may be filled.

図示しないキャップは洋白(Cu−Ni−Zn系合金)からなり、有底の円筒状を有している。キャップの外周および内周面にはニッケル層が3〜9μmの厚さでメッキ等の手段により形成されている。   The cap (not shown) is made of white (Cu—Ni—Zn alloy) and has a bottomed cylindrical shape. A nickel layer having a thickness of 3 to 9 μm is formed on the outer and inner peripheral surfaces of the cap by means such as plating.

キャップの内径は前記ベースのシェル部分よりも若干小さく設計されており、例えば2〜5%小さな内径に設定されている。このようなキャップを真空雰囲気中で前記音叉型振動片1を被覆し、キャップ開口部をベース2に圧入することにより、ベース2とキャップが強く密着しキャップ内部が真空状態に保たれた気密封止を行うことができる。   The inner diameter of the cap is designed to be slightly smaller than the shell portion of the base, and is set to an inner diameter that is, for example, 2 to 5% smaller. Such a cap is covered with the tuning-fork type resonator element 1 in a vacuum atmosphere, and the cap opening is press-fitted into the base 2 so that the base 2 and the cap are in close contact with each other and the inside of the cap is kept in a vacuum state. Can be stopped.

本発明では、前記接続電極を、銀(Ag)や金(Au)の上部電極からなる導電性の高い電極膜により構成された励振電極13,14と電極パッド17,18に対して、クロム(Cr)の電極層のみからなる錫系の鉛フリー低融点金属ろう材の濡れ性の低い電極膜により構成されている。ここで、励振電極13,14と電極パッド17,18の一部と重なった状態でお互いを接続する接続電極の構成としては、上述の実施形態に限ることなく、図6に示されているような接続構成でもよい。   In the present invention, the connection electrode is made of chromium (external electrode) with respect to the excitation electrodes 13 and 14 and the electrode pads 17 and 18 made of a highly conductive electrode film made of an upper electrode made of silver (Ag) or gold (Au). It is constituted by an electrode film having low wettability of a tin-based lead-free low melting point metal brazing material composed only of an electrode layer of (Cr). Here, the configuration of the connection electrode that connects the excitation electrodes 13 and 14 and a part of the electrode pads 17 and 18 with each other is not limited to the above-described embodiment, but as shown in FIG. A simple connection configuration may be used.

図6では、前記接続電極15d,15eと電極パッド17の重なり領域151d,151eは、電極パッド17から音叉型振動片の振動領域である励振電極13,14の形成された領域に近接しない方向の基部10の幅方向のみで重なるように構成されている。また前記接続電極16d,16eと電極パッド18の重なり領域161d,161e(図示せず)は、電極パッド18から音叉型振動片の振動領域である励振電極13,14の形成された領域に近接しない方向の基部10の幅方向のみで重なるように構成されている。すなわち電極パッド17,18の基部の一端部側101の上端部からはみ出した状態で前記重なり領域151d,151e,161d,161e(161dと161eについて図示せず)が形成されないように配置されている。加えて接続電極15d,16dも電極パッド17,18より小さく、かつ基部の一端部側101の上端部からもはみ出さないように小さく形成されている。また図6では、電極パッド17,18とは直接接続されず、表裏主面の励振電極(図では13a)から両側面の励振電極(図では13d)へ直接接続する接続電極15i(16i)が別途形成されている。   In FIG. 6, the overlapping regions 151 d and 151 e of the connection electrodes 15 d and 15 e and the electrode pad 17 are in a direction not close to the region where the excitation electrodes 13 and 14, which are the vibration regions of the tuning fork type resonator element, are formed from the electrode pad 17. It is comprised so that it may overlap only in the width direction of the base 10. In addition, the overlapping regions 161d and 161e (not shown) of the connection electrodes 16d and 16e and the electrode pad 18 are not close to the region where the excitation electrodes 13 and 14 that are the vibration regions of the tuning fork type resonator element are formed from the electrode pad 18. It is comprised so that it may overlap only in the width direction of the base 10 of a direction. In other words, the overlapping regions 151d, 151e, 161d, 161e (161d and 161e are not shown) are formed so as not to protrude from the upper end of the one end side 101 of the base of the electrode pads 17, 18. In addition, the connection electrodes 15d and 16d are also formed smaller than the electrode pads 17 and 18 so as not to protrude from the upper end portion on the one end side 101 of the base portion. In FIG. 6, the connection electrodes 15 i (16 i) that are not directly connected to the electrode pads 17 and 18 but are directly connected from the excitation electrodes (13 a in the drawing) on the front and back main surfaces to the excitation electrodes (13 d in the drawing) on both sides. It is formed separately.

上記実施形態により、励振電極13,14と電極パッド17,18とは同じ金属材料であるクロムやニッケルの下地金属層M1上面に同じ金属材料である銀や金の導電金属層M3で形成されていることで、電極材料の増加、および電極形成に伴う工程の増加をなくしてより安価な電極構成とすることができる。励振電極13,14は下地金属層M1と導電金属層M3の間に錫層M2が介在した状態で形成されていることで、
軟質の錫層M2が導電金属層M3による音叉型振動片1の振動の悪影響を和らげ、結果として直列共振抵抗値(CI値)を向上させることができる。電極パッド17,18は下地金属層M1と導電金属層M3との間に前記下地金属材料のクロムやニッケルと前記導電金属材料の銀や金からなる合金層M5が介在した状態で形成されていることで、合金層M5が下地金属層M1と導電金属層M3との金属間結合を向上させる介在層として機能することができる。結果として、錫系の低融点金属ろう材(Sn−3Ag−0.5Cu等の錫系の鉛フリーはんだ材H)による接合後に、下地金属層M1と表面の導電金属層M3の間の膜剥がれが生じることがなくなり、耐衝撃性能を高める。また電極パッド17,18の領域の導電金属層M3の下には錫層M2が存在していないため、錫によって表面の導電金属層M3のくわれ現象が抑えられ、前記錫が経年変化とともに表面の導電金属層M3で拡散することによる電気的特性の劣化を生じさせることも抑制される。
According to the above-described embodiment, the excitation electrodes 13 and 14 and the electrode pads 17 and 18 are formed of the same metal material on the base metal layer M1 of chromium or nickel as the conductive metal layer M3 of silver or gold which is the same metal material. Therefore, an increase in the electrode material and an increase in the process accompanying the electrode formation can be eliminated, and a cheaper electrode configuration can be obtained. The excitation electrodes 13 and 14 are formed with the tin layer M2 interposed between the base metal layer M1 and the conductive metal layer M3.
The soft tin layer M2 can alleviate the adverse effect of the vibration of the tuning fork type resonator element 1 due to the conductive metal layer M3, and as a result, the series resonance resistance value (CI value) can be improved. The electrode pads 17 and 18 are formed with an alloy layer M5 made of chromium or nickel as the base metal material and silver or gold as the conductive metal material interposed between the base metal layer M1 and the conductive metal layer M3. Thus, the alloy layer M5 can function as an intervening layer that improves the intermetallic bond between the base metal layer M1 and the conductive metal layer M3. As a result, after joining with a tin-based low melting point metal brazing material (tin-based lead-free solder material H such as Sn-3Ag-0.5Cu), film peeling between the base metal layer M1 and the conductive metal layer M3 on the surface No longer occurs, improving impact resistance. In addition, since the tin layer M2 does not exist under the conductive metal layer M3 in the region of the electrode pads 17 and 18, the phenomenon that the conductive metal layer M3 on the surface is crushed by tin is suppressed. It is also possible to suppress deterioration of electrical characteristics due to diffusion in the conductive metal layer M3.

励振電極13,14と電極パッド17,18とはお互いが離間した状態で形成し、接続電極15d,15e,16d,16eは前記離間した励振電極13,14と電極パッド17,18との上面に一部が重なった状態でお互いを接続するとともに、励振電極13,14と電極パッド17,18より錫系の低融点金属ろう材(Sn−3Ag−0.5Cu等の錫系の鉛フリーはんだ材H)の濡れ性の低いクロムの電極層M6のみから構成で形成しているため、前記錫が経年変化とともに励振電極13,14に拡散することによる電気的特性の劣化を生じさせることも抑制される。錫系の低融点金属ろう材(Sn−3Ag−0.5Cu等の錫系の鉛フリーはんだ材H)が電極パッド17,18内でのみ濡れ拡がり、リード端子21,22との接合強度も安定する。特に図6に示す実施形態では、接続電極と電極パッドとの重なり領域151d,151e,161d,161eが、電極パッド17,18から圧電振動片の振動領域である励振電極13,14の形成された領域に近接しない方向の基部10の幅方向のみで重なるように構成されているので、前記重なり領域の電極パッドと接続電極との界面に錫系の低融点金属ろう材(Sn−3Ag−0.5Cu等の錫系の鉛フリーはんだ材H)が拡散しても、圧電振動子の振動を阻害することがなく、より一層圧電振動子の電気的特性の劣化をなくすことができる。   The excitation electrodes 13 and 14 and the electrode pads 17 and 18 are formed so as to be separated from each other, and the connection electrodes 15d, 15e, 16d, and 16e are formed on the upper surfaces of the separated excitation electrodes 13 and 14 and the electrode pads 17 and 18, respectively. Connected to each other in a partially overlapped state, and a tin-based low-melting-point metal brazing material (tin-based lead-free solder material such as Sn-3Ag-0.5Cu) from the excitation electrodes 13, 14 and the electrode pads 17, 18 H) Since the electrode layer M6 is composed only of the chrome electrode layer M6 having low wettability, the deterioration of electrical characteristics due to diffusion of the tin to the excitation electrodes 13 and 14 with aging is also suppressed. The Tin-based low melting point metal brazing material (tin-based lead-free solder material H such as Sn-3Ag-0.5Cu) wets and spreads only within the electrode pads 17 and 18, and the bonding strength to the lead terminals 21 and 22 is also stable. To do. In particular, in the embodiment shown in FIG. 6, the overlapping regions 151 d, 151 e, 161 d, 161 e between the connection electrodes and the electrode pads are formed from the electrode pads 17, 18 to the excitation electrodes 13, 14 that are the vibration regions of the piezoelectric vibrating piece. Since it is configured to overlap only in the width direction of the base portion 10 in a direction not close to the region, a tin-based low melting point metal brazing material (Sn-3Ag-0. Even if tin-based lead-free solder material H) such as 5Cu diffuses, the vibration of the piezoelectric vibrator is not hindered, and the electrical characteristics of the piezoelectric vibrator can be further prevented from deteriorating.

さらに音叉型振動片の基部10は主面103,104と側面105,106とを有しており、電極パッド17,18は基部の主面103,104のみに形成され、基部の他端部側102の側面105,106には接続電極15e,16eのみが形成されているので、接続電極15e,16eは電極パッド17,18と側面の励振電極13d,14cとを接続するだけでなく、主面103から側面106あるいは主面104から側面105に面方向が変更されているため、錫系の低融点金属ろう材(Sn−3Ag−0.5Cu等の錫系の鉛フリーはんだ材H)の濡れ拡がりをさらに抑えることができる。   Further, the base 10 of the tuning fork type resonator element has main surfaces 103 and 104 and side surfaces 105 and 106, and the electrode pads 17 and 18 are formed only on the main surfaces 103 and 104 of the base, and the other end side of the base. Since only the connection electrodes 15e and 16e are formed on the side surfaces 105 and 106 of the 102, the connection electrodes 15e and 16e not only connect the electrode pads 17 and 18 and the excitation electrodes 13d and 14c on the side surfaces, but also the main surface. Since the surface direction is changed from 103 to the side surface 106 or from the main surface 104 to the side surface 105, wetting of the tin-based low melting point metal brazing material (tin-based lead-free solder material H such as Sn-3Ag-0.5Cu) Expansion can be further suppressed.

またこの側面の接続電極15e,16eを電極パッド17,18が存在しない基部の他端部側102の側面に形成された第2電極パッド(端子領域)として活用することができるため、基部の主面103,104に形成された電極パッド17,18と、基部の側面105,106に形成された第2電極パッドとしての接続電極15e,16eとを端子として用途に応じて使い分けることができる。例えば機械加工による音叉型振動片1であれば、ベースに搭載する前に音叉型振動片の脚部先端を研削して各脚部の重量バランスを整えながら周波数の粗調整を行う自動バランサー工程がある。この工程を実施する際、クロムからなる傷に強い第2電極パッドとしての接続電極15e,16eのみに治具の電極端子を接触させることができ、リード端子21,22に接合されるとともに、銀や金を主成分とした導電性の高い電極パッド17,18を傷つけることがない。ベースのリード端子21,22に音叉型振動片1を固着する際に、無傷で導通性能の優れた電極パッド17,18を接合することができる。   Further, since the connection electrodes 15e and 16e on the side surfaces can be used as second electrode pads (terminal regions) formed on the side surface on the other end side 102 of the base portion where the electrode pads 17 and 18 are not present, The electrode pads 17 and 18 formed on the surfaces 103 and 104 and the connection electrodes 15e and 16e as the second electrode pads formed on the side surfaces 105 and 106 of the base can be properly used as terminals depending on the application. For example, in the case of a tuning-fork type vibrating piece 1 by machining, an automatic balancer process is performed in which the frequency of the tuning-fork type vibrating piece is roughly adjusted by grinding the tip of the leg of the tuning-fork type vibrating piece and adjusting the weight balance of each leg before mounting on the base. is there. When carrying out this process, the electrode terminals of the jig can be brought into contact only with the connection electrodes 15e and 16e as second electrode pads that are resistant to scratches made of chromium, and are joined to the lead terminals 21 and 22 and silver. The highly conductive electrode pads 17 and 18 mainly composed of metal are not damaged. When the tuning fork type resonator element 1 is fixed to the lead terminals 21 and 22 of the base, the electrode pads 17 and 18 that are intact and have excellent conduction performance can be joined.

また電極パッド17,18のうち基部の一端部側101の端部位置をAとし、側面の励振電極13d,14cのうち基部の他端部側102の端部位置をBとした場合、前記Bの位置に対して前記Aの位置を基部の他端部側102の位置に配置しているので、錫系の低融点金属ろう材(Sn−3Ag−0.5Cu等の錫系の鉛フリーはんだ材H)の濡れ拡がりを側面の励振電極13d,14cの形成領域に到らせることなく、接続電極15e,16eで確実にせき止めることができるので、音叉型圧電振動子の振動を阻害することがより一層抑制され、音叉型圧電振動子の電気的特性の劣化をなくすのにさらに好ましい。   In addition, when the end position on the one end side 101 of the base portion of the electrode pads 17 and 18 is A, and the end position on the other end side 102 of the base portion of the side excitation electrodes 13d and 14c is B, B Since the position A is located at the position of the other end 102 side of the base, a tin-based low melting point metal brazing material (tin-based lead-free solder such as Sn-3Ag-0.5Cu) Since the wetting and spreading of the material H) can be reliably stopped by the connection electrodes 15e and 16e without reaching the formation region of the excitation electrodes 13d and 14c on the side surfaces, the vibration of the tuning fork type piezoelectric vibrator can be inhibited. This is further suppressed, and is more preferable for eliminating the deterioration of the electrical characteristics of the tuning fork type piezoelectric vibrator.

また接続電極15d,15e,16d,16eがクロムで構成されているため、硬質で鉛フリー低融点金属ろう材Hの濡れ拡がりにくい材料とすることができ、はんだ拡散防止と端子接触による傷にも強い好ましい電極材料となる。   Further, since the connection electrodes 15d, 15e, 16d, and 16e are made of chromium, it is possible to make the material hard and difficult to wet and spread the lead-free low melting point metal brazing material H. It is a strong and preferable electrode material.

次に、他の実施形態について図7,図8に基づいて説明する。なお基本構成は上記実施形態と同様であるため、同番号を付すことで説明の一部を割愛するとともに、相違点についてのみ説明する。   Next, another embodiment will be described with reference to FIGS. Since the basic configuration is the same as that of the above-described embodiment, a part of the description is omitted by assigning the same number, and only the difference will be described.

本実施形態では、基部10と脚部11,12の2つの側面に形成された励振電極13c,13d,14c,14dと引き回し電極15a,15b,16a,16bは、例えば、クロム(Cr)やニッケル(Ni)など水晶などに対して密着性の高い下地金属層M1が形成され、その上面に前記下地金属と錫(Sn)の合金層M4が形成され、その上面に錫(Sn)層M2が形成され、その上面に銀(Ag)や金(Au)などの導通性の高い導電金属層M3が形成され4層の金属薄膜として構成している。   In the present embodiment, the excitation electrodes 13c, 13d, 14c, 14d formed on the two side surfaces of the base 10 and the legs 11, 12 and the routing electrodes 15a, 15b, 16a, 16b are made of, for example, chromium (Cr) or nickel A base metal layer M1 having high adhesion to quartz or the like such as (Ni) is formed, an alloy layer M4 of the base metal and tin (Sn) is formed on the top surface, and a tin (Sn) layer M2 is formed on the top surface. A conductive metal layer M3 having high conductivity such as silver (Ag) or gold (Au) is formed on the upper surface thereof to form a four-layer metal thin film.

また、基部10と脚部11,12の2つの主面に形成された励振電極13a,13b,14a,14bと引き回し電極15a,15b,16a,16b、電極パッド17,18は、例えば、クロム(Cr)やニッケル(Ni)など水晶などに対して密着性の高い下地金属層M1が形成され、最上面に銀(Ag)や金(Au)などの導通性の高い導電金属層M3が形成されるとともに、前記下地金属層と前記導電金属層との間に、これら下地金属と導電金属の合金層M5が介在した状態で形成された3層の金属薄膜として構成している。   The excitation electrodes 13a, 13b, 14a, 14b formed on the two main surfaces of the base 10 and the legs 11, 12 and the routing electrodes 15a, 15b, 16a, 16b and the electrode pads 17, 18 are made of, for example, chromium ( A base metal layer M1 having high adhesion to crystal such as Cr) or nickel (Ni) is formed, and a conductive metal layer M3 having high conductivity such as silver (Ag) or gold (Au) is formed on the top surface. In addition, it is configured as a three-layer metal thin film formed with an alloy layer M5 of the base metal and conductive metal interposed between the base metal layer and the conductive metal layer.

また、接続電極15d,15e,16d,16e(15d,16dについては図示せず)は、例えば、クロム(Cr)の電極層M6のみの単層の金属薄膜として構成している。これらの電極形成は、マスク治具を用いるパターンニングによる手法で真空蒸着法やスパッタリング法などにより形成されている。   Further, the connection electrodes 15d, 15e, 16d, and 16e (15d and 16d are not shown) are configured as, for example, a single-layer metal thin film having only a chromium (Cr) electrode layer M6. These electrodes are formed by a vacuum deposition method or a sputtering method by a patterning method using a mask jig.

上記他の実施形態により、励振電極13,14と電極パッド17,18とは同じ金属材料であるクロム(Cr)やニッケル(Ni)の下地金属層M1上面に同じ金属材料である銀(Ag)や金(Au)の導電金属層M3で形成されていることで、電極材料の増加、および電極形成に伴う工程の増加をなくしてより安価な電極構成とすることができる。基部10と脚部11,12の2つの側面に形成された励振電極13c,13d,14c,14dと引き回し電極15a,15b,16a,16bは、下地金属層M1と導電金属層M3の間に錫(Sn)層M2が介在した状態で形成されていることで、軟質の錫層M2が導電金属層M3による音叉型振動片1の振動の悪影響を和らげ、結果として直列共振抵抗値(CI値)を向上させることができる。特に脚部11,12が側面方向に屈曲振動してなる音叉圧電型振動片1では、主面の励振電極13a,13b,14a,14bよりも側面の励振電極13c,13d,14c,14dによる影響が強くなる傾向にあり、必要最小限の材料変更により直列共振抵抗値(CI値)の向上させることができる。基部10と脚部11,12の2つの主面に形成された励振電極13a,13b,14a,14bと引き回し電極15a,15b,16a,16b、電極パッド17,18は、下地金属層M1と導電金属層M3との間に前記下地金属材料のクロム(Cr)やニッケル(Ni)と前記導電金属材料の銀(Ag)や金(Au)からなる合金層M5が介在した状態で形成されていることで、合金層M5が下地金属層M1と導電金属層M3との金属間結合を向上させる介在層として機能することができる。結果として、錫系の低融点金属ろう材(Sn−3Ag−0.5Cu等の錫系の鉛フリーはんだ材H)による接合後に、下地金属層M1と表面の導電金属層M3の間の膜剥がれが生じることがなくなり、耐衝撃性能を高める。また電極パッド17,18の領域の導電金属層M3の下には錫層M2が存在していないため、錫(Sn)によって表面の導電金属層M3のくわれ現象が抑えられ、前記錫(Sn)が経年変化とともに表面の導電金属層M3で拡散することによる電気的特性の劣化を生じさせることも抑制される。特に脚部11,12が側面方向に屈曲振動してなる音叉圧電型振動片1では、上述のような接合の信頼性を高めながら、基部10の2つの主面103,104に形成された電極パッド17,18で、リード端子21,22と錫系の低融点金属ろう材(Sn−3Ag−0.5Cu等の錫系の鉛フリーはんだ材H)により電気機械的に接合することができるため、音叉型圧電振動片1の振動も阻害しにくい保持形態とすることができる。なお、上記実施形態と同様の構成部分については、上記実施形態と同様の効果を有するとともに変形例で開示した内容についても適用できる。   According to the other embodiment, the excitation electrodes 13 and 14 and the electrode pads 17 and 18 are silver (Ag) which is the same metal material on the upper surface of the base metal layer M1 of chromium (Cr) or nickel (Ni) which is the same metal material. By forming the conductive metal layer M3 of metal gold (Au), it is possible to obtain an inexpensive electrode configuration without an increase in the electrode material and an increase in the steps accompanying the electrode formation. Excitation electrodes 13c, 13d, 14c and 14d formed on the two side surfaces of the base 10 and the legs 11 and 12 and the lead-out electrodes 15a, 15b, 16a and 16b are formed between the base metal layer M1 and the conductive metal layer M3. Since the (Sn) layer M2 is formed, the soft tin layer M2 reduces the adverse effect of the vibration of the tuning-fork type resonator element 1 due to the conductive metal layer M3, resulting in a series resonance resistance value (CI value). Can be improved. In particular, in the tuning-fork piezoelectric vibrating piece 1 in which the legs 11 and 12 are bent and vibrated in the lateral direction, the influence of the excitation electrodes 13c, 13d, 14c, and 14d on the side surface is greater than the excitation electrodes 13a, 13b, 14a, and 14b on the main surface. The series resonance resistance value (CI value) can be improved by changing the necessary minimum material. Excitation electrodes 13a, 13b, 14a, 14b formed on the two main surfaces of the base 10 and the legs 11, 12 and the lead-out electrodes 15a, 15b, 16a, 16b, the electrode pads 17, 18 are electrically conductive with the underlying metal layer M1. An alloy layer M5 made of chromium (Cr) or nickel (Ni) as the base metal material and silver (Ag) or gold (Au) as the conductive metal material is interposed between the metal layer M3 and the metal layer M3. Thus, the alloy layer M5 can function as an intervening layer that improves the intermetallic bond between the base metal layer M1 and the conductive metal layer M3. As a result, after joining with a tin-based low melting point metal brazing material (tin-based lead-free solder material H such as Sn-3Ag-0.5Cu), film peeling between the base metal layer M1 and the conductive metal layer M3 on the surface No longer occurs, improving impact resistance. In addition, since the tin layer M2 does not exist under the conductive metal layer M3 in the region of the electrode pads 17 and 18, the phenomenon that the conductive metal layer M3 on the surface is bitten by tin (Sn) is suppressed, and the tin (Sn ) Is also prevented from being deteriorated in the electrical characteristics due to diffusion in the conductive metal layer M3 on the surface with aging. In particular, in the tuning fork piezoelectric resonator element 1 in which the leg portions 11 and 12 are bent and vibrated in the lateral direction, the electrodes formed on the two main surfaces 103 and 104 of the base portion 10 while improving the reliability of the bonding as described above. The pads 17 and 18 can be electromechanically joined to the lead terminals 21 and 22 by a tin-based low melting point metal brazing material (tin-based lead-free solder material H such as Sn-3Ag-0.5Cu). Further, the holding form in which the vibration of the tuning fork type piezoelectric vibrating piece 1 is not easily inhibited can be obtained. In addition, about the component similar to the said embodiment, while having the effect similar to the said embodiment, it can apply also about the content disclosed by the modification.

なお、本発明は、その精神や主旨または主要な特徴から逸脱することなく、他のいろいろな形で実施することができる。そのため、上述の実施例はあらゆる点で単なる例示にすぎず、限定的に解釈してはならない。本発明の範囲は特許請求の範囲によって示すものであって、明細書本文には、なんら拘束されない。さらに、特許請求の範囲の均等範囲に属する変形や変更は、全て本発明の範囲内のものである。屈曲振動してなる音叉型振動片に限らず他の形状、他の振動モードの圧電振動片にも適用できる。またリードタイプの圧電振動子に限らず、表面実装型の圧電振動子にも適用できる。   It should be noted that the present invention can be implemented in various other forms without departing from the spirit, gist, or main features. For this reason, the above-described embodiment is merely an example in all respects and should not be interpreted in a limited manner. The scope of the present invention is indicated by the claims, and is not restricted by the text of the specification. Further, all modifications and changes belonging to the equivalent scope of the claims are within the scope of the present invention. The present invention can be applied not only to a tuning-fork-type vibrating piece formed by bending vibration but also to a piezoelectric vibrating piece having other shapes and vibration modes. Further, the present invention can be applied not only to lead type piezoelectric vibrators but also to surface mount type piezoelectric vibrators.

水晶振動子等の圧電振動デバイスの量産に適用できる。   It can be applied to mass production of piezoelectric vibration devices such as crystal resonators.

1 音叉型振動片
2 ベース
1 Tuning fork type resonator element 2 Base

Claims (3)

ベースと、励振電極と電極パッドが形成された圧電振動片とを有し、前記ベースの圧電振動片接合部と圧電振動片の電極パッドとを錫系の低融点金属ろう材により電気機械的に接合してベースに圧電振動片を搭載してなる圧電振動子であって、
前記励振電極と電極パッドとは下地金属層の上面に導電金属層が形成され、
前記励振電極は前記下地金属層と前記導電金属層の間に錫層が介在した状態で形成され、
前記電極パッドは前記下地金属層と前記導電金属層との間に当該下地金属と導電金属からなる合金層が介在した状態で形成されていることを特徴とする圧電振動子。
A base, a piezoelectric vibrating piece on which an excitation electrode and an electrode pad are formed, and the piezoelectric vibrating piece joint of the base and the electrode pad of the piezoelectric vibrating piece are electromechanically connected by a tin-based low melting point metal brazing material A piezoelectric vibrator formed by bonding and mounting a piezoelectric vibrating piece on a base,
The excitation electrode and the electrode pad have a conductive metal layer formed on the upper surface of the base metal layer,
The excitation electrode is formed with a tin layer interposed between the base metal layer and the conductive metal layer,
The piezoelectric vibrator is characterized in that the electrode pad is formed with an alloy layer made of the base metal and the conductive metal interposed between the base metal layer and the conductive metal layer.
ベースと、励振電極と電極パッドが形成された圧電振動片とを有し、前記ベースの圧電振動片接合部と圧電振動片の電極パッドとを錫系の低融点金属ろう材により電気機械的に接合してベースに圧電振動片を搭載してなる圧電振動子であって、
前記圧電振動片が2つの主面と2つの側面とを有した基部とこの基部一端部から突出し、2つの主面と2つの側面とを有する複数本の脚部とから構成され、
前記励振電極と電極パッドとは下地金属層の上面に導電金属層が形成され、
前記基部と脚部の側面に形成された励振電極は前記下地金属層と前記導電金属層の間に錫層が介在した状態で形成され、
前記基部と脚部の主面に形成された励振電極と電極パッドは前記下地金属層と前記導電金属層との間に当該下地金属と導電金属からなる合金層が介在した状態で形成されていることを特徴とする圧電振動子。
A base, a piezoelectric vibrating piece on which an excitation electrode and an electrode pad are formed, and the piezoelectric vibrating piece joint of the base and the electrode pad of the piezoelectric vibrating piece are electromechanically connected by a tin-based low melting point metal brazing material A piezoelectric vibrator formed by bonding and mounting a piezoelectric vibrating piece on a base,
The piezoelectric vibrating piece is composed of a base portion having two main surfaces and two side surfaces, and a plurality of legs protruding from one end of the base portion and having two main surfaces and two side surfaces,
The excitation electrode and the electrode pad have a conductive metal layer formed on the upper surface of the base metal layer,
Excitation electrodes formed on the side surfaces of the base and the leg are formed with a tin layer interposed between the base metal layer and the conductive metal layer,
The excitation electrodes and electrode pads formed on the main surfaces of the base and the leg are formed with an alloy layer made of the base metal and the conductive metal interposed between the base metal layer and the conductive metal layer. A piezoelectric vibrator characterized by that.
前記励振電極と電極パッドとはお互いが離間した状態で形成し、接続電極は前記離間した励振電極と電極パッドとの上面に一部が重なった状態でお互いを接続するとともに、前記励振電極と電極パッドより前記低融点金属ろう材の濡れ性の低い電極膜で形成されたことを特徴とする特許請求項1、または特許請求項2記載の圧電振動子。 The excitation electrode and the electrode pad are formed in a state of being separated from each other, and the connection electrode is connected to each other in a state where a part of the connection electrode is overlapped with the upper surface of the separated excitation electrode and the electrode pad. 3. The piezoelectric vibrator according to claim 1, wherein the low-melting-point metal brazing material is formed of an electrode film having lower wettability than a pad.
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Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57125510A (en) * 1981-01-29 1982-08-04 Matsushima Kogyo Co Ltd Quartz oscillator
JPH02298110A (en) * 1989-05-11 1990-12-10 Seiko Epson Corp Crystal resonator
JPH0993068A (en) * 1995-09-27 1997-04-04 Citizen Watch Co Ltd Electrode forming method for tuning fork type crystal piece
JPH11284485A (en) * 1998-03-30 1999-10-15 Miyota Kk Piezoelectric resonator
JP2001345656A (en) * 2000-06-02 2001-12-14 Seiko Epson Corp Method of manufacturing crystal vibrator and crystal device
JP2003224444A (en) * 2002-01-30 2003-08-08 Miyota Kk Piezoelectric vibrator and production method for the vibrator
JP2003332876A (en) * 2002-05-14 2003-11-21 Nippon Dempa Kogyo Co Ltd Crystal vibrator, and its holding structure
JP2004364019A (en) * 2003-06-05 2004-12-24 Seiko Epson Corp Piezoelectric vibration chip, piezoelectric vibrator, piezoelectric oscillator, gyroscope sensor, electronic apparatus, and manufacturing method
JP2005136575A (en) * 2003-10-29 2005-05-26 Seiko Epson Corp Piezoelectric vibrating piece, structure of excitation electrode thereof, electrode forming method, piezoelectric device, cellular telephone device employing piezoelectric device and electronic equipment employing piezoelectric device
JP2007037003A (en) * 2005-07-29 2007-02-08 Citizen Miyota Co Ltd Piezoelectric vibrator

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57125510A (en) * 1981-01-29 1982-08-04 Matsushima Kogyo Co Ltd Quartz oscillator
JPH02298110A (en) * 1989-05-11 1990-12-10 Seiko Epson Corp Crystal resonator
JPH0993068A (en) * 1995-09-27 1997-04-04 Citizen Watch Co Ltd Electrode forming method for tuning fork type crystal piece
JPH11284485A (en) * 1998-03-30 1999-10-15 Miyota Kk Piezoelectric resonator
JP2001345656A (en) * 2000-06-02 2001-12-14 Seiko Epson Corp Method of manufacturing crystal vibrator and crystal device
JP2003224444A (en) * 2002-01-30 2003-08-08 Miyota Kk Piezoelectric vibrator and production method for the vibrator
JP2003332876A (en) * 2002-05-14 2003-11-21 Nippon Dempa Kogyo Co Ltd Crystal vibrator, and its holding structure
JP2004364019A (en) * 2003-06-05 2004-12-24 Seiko Epson Corp Piezoelectric vibration chip, piezoelectric vibrator, piezoelectric oscillator, gyroscope sensor, electronic apparatus, and manufacturing method
JP2005136575A (en) * 2003-10-29 2005-05-26 Seiko Epson Corp Piezoelectric vibrating piece, structure of excitation electrode thereof, electrode forming method, piezoelectric device, cellular telephone device employing piezoelectric device and electronic equipment employing piezoelectric device
JP2007037003A (en) * 2005-07-29 2007-02-08 Citizen Miyota Co Ltd Piezoelectric vibrator

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