JP2012094828A - Transparent conductive film composition for solar battery and transparent conductive film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a transparent conductive film composition used in a wet coating method for solar battery and a transparent conductive film prepared from the composition, and particularly to provide a transparent conductive film capable of enhancing generation efficiency of a thin-film solar battery by increasing a difference between a refraction factor of a transparent conductive film and that of a photoelectric conversion layer, thus increasing reflected light on an interface between the transparent conductive film and the photoelectric conversion layer and using increased return light to the photoelectric conversion layer, and to provide a transparent conductive film composition capable of forming the transparent conductive film.SOLUTION: The transparent conductive film composition for a solar battery includes conductive oxide particles; anisotropic hollow silica particles each having an average grain diameter of 1-50 nm; and binder. The anisotropic hollow silica particles of 2-35 pts.mass is included in the conductive oxide particles and anisotropic hollow silica particles of a total of 100 pts.mass.

Description

  The present invention relates to a transparent conductive film composition and a transparent conductive film. In more detail, it is related with the composition for transparent conductive films for solar cells, and a transparent conductive film.

  Currently, clean energy is being researched, developed and put into practical use from the standpoint of environmental protection, and solar cells are attracting attention because of the inexhaustible and non-polluting nature of sunlight as an energy source. Conventionally, single-crystal silicon or polycrystalline silicon bulk solar cells have been used for solar cells. However, since the bulk solar cells are high in production cost and low in productivity, the solar cells save as much silicon as possible. The development of is urgent.

  Therefore, development of a thin film solar cell using a semiconductor such as amorphous silicon having a thickness of, for example, 0.3 to 2 μm has been vigorously performed. This thin-film solar cell has the advantage that it is thin, lightweight, low-cost, and easy to increase in area because it has a structure in which a semiconductor layer of an amount necessary for photoelectric conversion is formed on a glass substrate or a heat-resistant plastic substrate. is there.

  Thin-film solar cells have a superstrate structure and a substrate structure, and the superstrate type structure allows sunlight to enter from the translucent substrate side. Therefore, the order is usually substrate-transparent electrode-photoelectric conversion layer-backside electrode. The structure formed by is taken.

  In this thin-film solar cell, the electrodes and the reflective film are conventionally formed by a vacuum film-forming method such as sputtering, but in general, a large cost is required for the introduction, maintenance, and operation of a large-scale vacuum film-forming apparatus. . In order to improve this point, there is a technique for forming a transparent conductive film and a conductive reflective film by a wet coating method, which is a cheaper manufacturing method, using a composition for transparent conductive film and a composition for conductive reflective film. (Patent Document 1).

JP 2009-88489 A

  This invention makes it a subject to improve the transparent conductive film manufactured by said wet coating method. The inventors have improved the composition for transparent conductive film, and increased the difference between the refractive index of the transparent conductive film used in the wet coating method and the refractive index of the photoelectric conversion layer, thereby producing a transparent conductive film-photoelectric conversion. It has been found that the reflected light at the layer interface increases, and the power generation efficiency of the thin film solar cell can be improved by the increased return light to the photoelectric conversion layer. A similar technique can be applied to a substrate type thin film solar cell and a bulk silicon solar cell.

The present invention relates to a composition for a transparent conductive film for a solar cell and the transparent conductive film, which have solved the above problems with the following configuration.
(1) The conductive oxide particles, the average particle diameter: 1 to 50 nm of anisotropic hollow silica particles, and a binder, the total of the conductive oxide particles and anisotropic hollow silica particles being 100 parts by mass On the other hand, the composition for transparent conductive films for solar cells characterized by including 2-35 mass parts of anisotropic hollow silica particles.
(2) conductive oxide particles, average particle diameter: 1 to 50 nm of anisotropic hollow silica particles, and a binder, the total of 100 parts by weight of the conductive oxide particles and anisotropic hollow silica particles On the other hand, the composition for transparent conductive films for a super straight type thin film solar cell characterized by containing 2-35 mass parts of anisotropic hollow silica particles.
(3) The composition for a transparent conductive film for a super straight type thin film solar cell according to (2), wherein the binder is a polymer type binder and / or a non-polymer type binder that is cured by heating.
(4) The above (3) description, wherein the non-polymer type binder is at least one selected from the group consisting of metal soaps, metal complexes, metal alkoxides, halosilanes, 2-alkoxyethanol, β-diketone, and alkyl acetate. The composition for transparent conductive films for super straight type thin film solar cells.
(5) The conductive oxide particles, the average particle diameter: 1 to 50 nm of anisotropic hollow silica particles, and a cured binder, the total of the conductive oxide particles and the anisotropic hollow silica particles being 100 masses The transparent conductive film for super straight type thin film solar cells, characterized by containing 2 to 35 parts by mass of anisotropic hollow silica particles with respect to the part.
(6) The conductive oxide particles, the average particle diameter: 1 to 50 nm of anisotropic hollow silica particles, and a cured binder, the total of the conductive oxide particles and the anisotropic hollow silica particles being 100 masses The transparent conductive film for super straight type thin film solar cells, characterized by containing 2 to 35 parts by mass of anisotropic hollow silica particles with respect to the part.
(7) The transparent conductive film for super straight type thin film solar cells according to (6), wherein the binder is a polymer type binder and / or a non-polymer type binder.
(8) The above (7) description, wherein the non-polymer type binder is at least one selected from the group consisting of metal soap, metal complex, metal alkoxide, halosilane, 2-alkoxyethanol, β-diketone, and alkyl acetate. Transparent conductive film for super straight type thin film solar cells.
(9) A super straight type thin film solar cell including the transparent conductive film for a super straight type thin film solar cell according to any one of (6) to (8).
(10) A method for producing a transparent conductive film of a superstrate thin film solar cell comprising a substrate, a transparent electrode layer, a photoelectric conversion layer, and a transparent conductive film in this order, wherein the above (2) After applying the composition for transparent conductive film according to any one of (4) by a wet coating method to form a transparent conductive coating film, the substrate having the transparent conductive coating film is baked to form a transparent conductive film. A method for producing a transparent conductive film to be formed.
(11) The wet coating method is a spray coating method, a dispenser coating method, a spin coating method, a knife coating method, a slit coating method, an inkjet coating method, a die coating method, a screen printing method, an offset printing method, or a gravure printing method. The method for producing a transparent conductive film according to (10) above.

  The composition for transparent conductive film of the present invention (1) can be applied and baked on the photoelectric conversion layer by a wet coating method, and the refraction of the obtained transparent conductive film depends on the content of anisotropic hollow silica particles. The rate can be reduced. That is, the difference between the refractive index of the transparent conductive film and the refractive index of the photoelectric conversion layer increases, the reflected light at the transparent conductive film-photoelectric conversion layer interface increases, and the increased return light to the photoelectric conversion layer, A transparent conductive film capable of improving the power generation efficiency of the thin film solar cell can be easily obtained.

  According to the present invention (5), reflected light at the transparent conductive film-photoelectric conversion layer interface increases, and a thin film solar cell with improved power generation efficiency can be obtained easily by the increased return light to the photoelectric conversion layer. Can do.

  According to the present invention (10), a transparent conductive film can be formed without using expensive vacuum equipment, and a thin-film solar cell with high power generation efficiency can be manufactured easily and at low cost.

It is a schematic diagram of the cross section of the super straight type thin film solar cell using the transparent conductive film of this invention. It is a schematic diagram of the cross section of the substrate type thin film solar cell using the transparent conductive film of this invention.

  Hereinafter, the present invention will be specifically described based on embodiments. Unless otherwise indicated, “%” means “% by mass” unless otherwise specified.

[Composition for transparent conductive film for solar cell]
The composition for transparent conductive film for solar cells of the present invention (hereinafter referred to as “transparent conductive film composition”) includes conductive oxide particles, anisotropic hollow silica particles having an average particle size of 1 to 50 nm, And 2 to 35 parts by mass of anisotropic hollow silica particles with respect to a total of 100 parts by mass of conductive oxide particles and anisotropic hollow silica particles. This composition for transparent conductive films is suitable for a thin film solar cell, and particularly suitable for a super straight type thin film solar cell.

  The conductive oxide particles are made of ITO (Indium Tin Oxide), tin oxide powder of ATO (Antimony Tin Oxide) or Al, Co, Fe, In, Sn, and Ti. Zinc oxide powder containing at least one metal selected from the group is preferred, among which ITO, ATO, AZO (Aluminum Zinc Oxide), IZO (Indium Zinc Oxide), TZO (Tin Zinc Oxide) is more preferable. The average particle diameter of the conductive oxide fine particles is preferably in the range of 10 to 100 nm in order to maintain stability in the dispersion medium, and more preferably in the range of 20 to 60 nm. More preferably, it is in the range of 25 to 50 nm. Here, the average particle diameter is measured by using the BET method by specific surface measurement by QUANTACHROME AUTOSORB-1.

The anisotropic hollow silica particles have an average particle size of 1 to 50 nm, preferably 9 to 50 nm. This is because if the average particle size is smaller than 1 nm, the stability of the particles is insufficient, so that secondary agglomeration is likely to occur, and it is difficult to prepare a sample. Here, the average particle diameter of the anisotropic hollow silica particles was measured with a laser diffraction / scattering particle size distribution analyzer (manufactured by Horiba, Ltd./LA-950), and the particle diameter reference was calculated as the number. 50% average particle diameter (D ₅₀ ). The number-based average particle diameter measured by the laser diffraction / scattering particle size distribution analyzer is the particle diameter of any 50 particles in an image observed with a scanning electron microscope (S-4300 and SU-8000 manufactured by Hitachi High-Technologies). Is approximately the same as the average particle diameter when actually measured. Whether the shape is anisotropic or spherical is an image observed with the above-mentioned scanning electron microscope, and the identified aspect ratio (major axis / minor axis) is 1.5 or more. Identify. Moreover, the average particle diameter of anisotropic hollow silica particles means the average value of the diameter (major axis) of anisotropic hollow silica particles. The aspect ratio (major axis / minor axis) of the anisotropic hollow silica particles is preferably in the range of 1.5 to 5. The minor axis is preferably in the range of 0.5 to 30 nm, and particularly preferably in the range of 0.5 to 20 nm.

  The anisotropic hollow silica particles have good wettability with the photoelectric conversion layer, can reduce the thickness unevenness of the film, and lower the refractive index of the transparent conductive film after curing. In FIG. 1, the schematic diagram of the cross section of the super straight type thin film solar cell using the transparent conductive film of this invention is shown. The super straight type thin film battery 1 includes a base material 10, a transparent electrode layer 13, a photoelectric conversion layer 12, a transparent conductive film 11, and a conductive reflective film 14, and sunlight enters from the substrate 10 side. Most of the incident sunlight is reflected by the conductive reflective film 14 and returns to the photoelectric conversion layer 12 to improve the conversion efficiency. Here, sunlight is also reflected at the interface between the transparent conductive film 11 and the photoelectric conversion layer 12, and the transparent conductive film 11 using the composition for transparent conductive film of the present invention has a low refractive index. The reflected light at the interface between the film 11 and the photoelectric conversion layer 12 can be increased, and the power generation efficiency of the thin film solar cell can be improved. Moreover, the schematic diagram of the cross section of the substrate type thin film solar cell using the transparent conductive film of this invention is shown in FIG. The substrate type thin film battery 2 includes a base material 20, a conductive reflective film 24, a transparent conductive film 21, a photoelectric conversion layer 22, and a transparent electrode layer 23 in this order, and sunlight enters from the transparent electrode layer 23 side. Most of the incident sunlight is reflected by the conductive reflective film 24 and returns to the photoelectric conversion layer 22 to improve the conversion efficiency. Also in the case of a substrate type thin film battery, sunlight is reflected also at the interface between the photoelectric conversion layer 22 and the transparent conductive film 21, and the transparent conductive film 21 using the composition for transparent conductive film of the present invention has a refractive index. Therefore, the reflected light at the interface between the photoelectric conversion layer 22 and the transparent conductive film 21 can be increased, and the power generation efficiency of the thin film solar cell can be improved. Note that it is preferable to form a through hole 25 in the substrate 20 and to electrically connect the conductive reflective film 24 and the collector electrode layer 26 because it is easy to extract electric power generated from the thin film solar cell.

  The binder is preferably a composition containing one or both of a polymer type binder and a non-polymer type binder that are cured by heating. Examples of the polymer binder include acrylic resin, polycarbonate, polyester, alkyd resin, polyurethane, acrylic urethane, polystyrene, polyacetal, polyamide, polyvinyl alcohol, polyvinyl acetate, cellulose, and siloxane polymer. The polymer type binder should contain aluminum, silicon, titanium, chromium, manganese, iron, cobalt, nickel, silver, copper, zinc, molybdenum or tin metal soap, metal complex, or hydrolyzate of metal alkoxide. Is preferred. Examples of the non-polymer type binder include metal soap, metal complex, metal alkoxide, halosilanes, 2-alkoxyethanol, β-diketone, and alkyl acetate. The metal contained in the metal soap, metal complex, or metal alkoxide is preferably aluminum, silicon, titanium, chromium, manganese, iron, cobalt, nickel, silver, copper, zinc, molybdenum, tin, indium, or antimony. More preferred are alkoxides of silicon and aluminum (for example, tetraethoxysilane, tetramethoxysilane, aluminum ethoxide, and aluminum isopropoxide). These polymer-type binders and non-polymer-type binders are cured by heating, thereby enabling formation of a transparent conductive film having a low haze ratio and volume resistivity at low temperatures. The metal alkoxide may be a hydrolyzate or a dehydrated product.

When the metal alkoxide is to be cured, together with moisture for initiating the hydrolysis reaction, as a catalyst, an acid such as hydrochloric acid, nitric acid, phosphoric acid (H ₃ PO ₄ ), hydrofluoric acid, ammonia water, aqueous sodium hydroxide solution, etc. It is preferable to contain an alkali. From the standpoints that the catalyst is apt to volatilize and hardly remain after heat curing, halogen does not remain, P or the like which is weak in water resistance does not remain, or an alkali metal salt such as Na does not remain. More preferred. In the case of nitric acid, since N remains and acts as a donor even if it diffuses into the underlying photoelectric conversion layer (n-type), the conversion efficiency of the photoelectric conversion layer is not low, but rather the conversion efficiency is high. Can be.

  The composition for transparent conductive film contains 98 to 65 parts by mass of conductive oxide particles, preferably 95 to 70 parts by mass with respect to 100 parts by mass in total of the conductive oxide particles and anisotropic hollow silica particles. Including. This is because if the upper limit is exceeded, the adhesiveness is lowered, and if it is less than the lower limit, the conductivity is lowered.

  2 to 35 parts by mass, preferably 5 to 30 parts by mass of anisotropic hollow silica particles are contained with respect to 100 parts by mass in total of the conductive oxide particles and the anisotropic hollow silica particles. This is because the refractive index of the transparent conductive film after curing cannot be sufficiently lowered below the lower limit, and the conductivity decreases below the upper limit.

  The content of these binders is 5 to 50 parts by mass with respect to 100 parts by mass of solid content (conductive oxide particles, anisotropic hollow silica particles, and binder) in the composition for transparent conductive film. Preferably, it is more preferable in it being 10-30 mass parts. Moreover, when using a metal alkoxide as a binder and nitric acid as a catalyst, the curing rate of the binder and the remaining amount of nitric acid are 0.03 to 3 parts by mass of nitric acid with respect to 100 parts by mass of the metal alkoxide. It is preferable from the viewpoint. If the amount of nitric acid as the catalyst is small, the polymerization rate of the hydrolyzate of the metal alkoxide as the binder is slowed down, and if the amount of water required for hydrolysis is insufficient, a strong transparent conductive film can be obtained. There is a risk of being lost. In addition, in the case of a hydrolysis solution having a network structure with a high degree of polymerization at the time of curing by firing, it is considered that the stress applied when shrinking is in a form that assists the contact between the conductive particles. : It is preferable in water being 10-120 mass parts with respect to 100 mass parts.

  It is preferable to add a coupling agent to the composition for transparent conductive films according to the other components used. It is composed of conductive fine particles, anisotropic hollow silica particles and binder, and a transparent conductive film formed from the composition for transparent conductive film, and a photoelectric conversion layer or a conductive reflective film laminated on the substrate. This is for improving the adhesiveness. Examples of the coupling agent include a silane coupling agent, an aluminum coupling agent, and a titanium coupling agent. The content of the coupling agent is 0 based on 100 parts by mass of solid content (conductive oxide particles, anisotropic hollow silica particles, binder, silane coupling agent, etc.) in the composition for transparent conductive film. 2 to 5 parts by mass is preferable, and 0.5 to 2 parts by mass is more preferable.

  The composition for transparent conductive film preferably contains a dispersion medium in order to improve film formation. As a dispersion medium, water; alcohols such as methanol, ethanol, isopropyl alcohol and butanol; ketones such as acetone, methyl ethyl ketone, cyclohexanone and isophorone; hydrocarbons such as toluene, xylene, hexane and cyclohexane; N, N-dimethyl Examples include amides such as formamide and N, N-dimethylacetamide; sulfoxides such as dimethyl sulfoxide; glycols such as ethylene glycol; glycol ethers such as ethyl cellosolve and the like. In order to obtain good film formability, the content of the dispersion medium is preferably 65 to 99 parts by mass with respect to 100 parts by mass of the transparent conductive film composition.

  Moreover, it is preferable to add a low resistance agent, a water-soluble cellulose derivative, etc. according to the component to be used. The low resistance agent is preferably one or more selected from the group consisting of cobalt, iron, indium, nickel, lead, tin, titanium and zinc mineral salts and organic acid salts. For example, a mixture of nickel acetate and ferric chloride, zinc naphthenate, a mixture of tin octylate and antimony chloride, a mixture of indium nitrate and lead acetate, a mixture of titanium acetyl acetate and cobalt octylate and the like can be mentioned. The content of these low resistance agents is preferably 0.2 to 15 parts by mass with respect to 100 parts by mass of the conductive oxide powder. Although the water-soluble cellulose derivative is a non-ionizing surfactant, it has a very high ability to disperse the conductive oxide powder even when added in a small amount compared to other surfactants, and by adding the water-soluble cellulose derivative, The transparency of the formed transparent conductive film is also improved. Examples of the water-soluble cellulose derivative include hydroxypropyl cellulose and hydroxypropyl methylcellulose. The addition amount of the water-soluble cellulose derivative is preferably 0.2 to 5 parts by mass with respect to 100 parts by mass of the conductive oxide powder.

  The composition for transparent conductive film is prepared by mixing desired components with a paint shaker, a ball mill, a sand mill, a centrimill, a triple roll, etc. in a conventional manner, and dispersing conductive oxide particles, anisotropic hollow silica particles, and the like. Can be manufactured. Of course, it can also be produced by a normal stirring operation.

[Transparent conductive film for solar cells]
The transparent conductive film for solar cells of the present invention (hereinafter referred to as a transparent conductive film) includes conductive oxide particles, anisotropic hollow silica particles having an average particle size of 1 to 50 nm, and a cured binder, 2 to 35 parts by mass of anisotropic hollow silica particles are included with respect to a total of 100 parts by mass of conductive oxide particles and anisotropic hollow silica particles. This transparent conductive film is suitable for a thin film solar cell, and particularly suitable for a super straight type thin film solar cell.

  The conductive oxide particles and the anisotropic hollow silica are as described above, and the cured binder is obtained by curing the above binder. That is, the transparent conductive film is obtained by curing the above-described composition for transparent conductive film.

  The method for producing a transparent conductive film of the present invention is a method for producing a transparent conductive film of a super-straight type thin film solar cell comprising a base, a transparent electrode layer, a photoelectric conversion layer, and a transparent conductive film in this order. On the layer, the composition for transparent conductive film is applied by a wet coating method to form a transparent conductive coating film, and then the substrate having the transparent conductive coating film is baked to form a transparent conductive film.

  First, the said transparent conductive film composition is apply | coated by the wet coating method on the photoelectric converting layer of a superstrate type thin film solar cell provided with a base material, a transparent electrode layer, a photoelectric converting layer, and a transparent conductive film in this order. . Application | coating here is carried out so that the thickness of the transparent conductive film after baking may be 0.03-0.5 micrometer, Preferably it is 0.05-0.1 micrometer. Subsequently, the coating film is dried at a temperature of 20 to 120 ° C., preferably 25 to 60 ° C., for 1 to 30 minutes, preferably 2 to 10 minutes. In this way, a transparent conductive coating film is formed. Here, the reason for applying the transparent conductive film composition so that the thickness of the transparent conductive film after firing is in the range of 0.03 to 0.5 μm is that the thickness after firing is less than 0.03 μm, or This is because if the thickness exceeds 0.5 μm, the effect of increasing reflection cannot be obtained sufficiently.

  The base material is either a light-transmitting substrate made of glass, ceramics or a polymer material, or two or more light-transmitting laminates selected from the group consisting of glass, ceramics, a polymer material and silicon. Can be used. Examples of the polymer substrate include a film substrate formed of an organic polymer such as polyimide resin, polyethylene resin, PET (polyethylene terephthalate) resin, polybutylene terephthalate resin, and epoxy resin. Examples of the photoelectric conversion layer include a crystalline single crystal type or a polycrystalline type, an amorphous type, a compound type, or a hybrid type in which a single crystal type or a combination of a polycrystalline type and an amorphous type is used. ITO, tin oxide or the like can be used for the transparent electrode layer. The method for forming the transparent electrode layer and the photoelectric conversion layer on the substrate is not particularly limited, and may be a known method such as a vacuum film forming method. As shown in FIG. 1, when the conductive reflective film 24 is formed on the transparent conductive film 11, the conductive reflective film 14 reflects sunlight incident from the substrate 10 side, and the photoelectric conversion layer 12. The conversion efficiency can be improved. This conductive reflective film is preferably an Ag nanoparticle sintered body, which can be formed by applying a composition for conductive reflective film containing Ag nanoparticles by a wet coating method and then baking the composition. However, it may be formed by a vacuum film forming method or the like.

  Further, the wet coating method may be any one of a spray coating method, a dispenser coating method, a spin coating method, a knife coating method, a slit coating method, an inkjet coating method, a screen printing method, an offset printing method, or a die coating method. Although it is preferable, the present invention is not limited to this, and any method can be used.

  The spray coating method is a method in which a transparent conductive film composition is formed into a mist by compressed air and applied to a substrate, or a transparent conductive film composition itself is pressurized and formed into a mist to be applied to a substrate. The coating method is, for example, a method in which a composition for a transparent conductive film is placed in a syringe, and the transparent conductive film composition is ejected from a fine nozzle at the tip of the syringe by pushing a piston of the syringe and applied to a substrate. . The spin coating method is a method in which a transparent conductive film composition is dropped onto a rotating substrate, and the dropped transparent conductive film composition is spread on the periphery of the substrate by its centrifugal force. Provides a base material with a predetermined gap from the tip of the knife so that it can move in the horizontal direction, and supplies the composition for transparent conductive film on the base material upstream of the knife, so that the base material is placed downstream. It is a method of moving horizontally. The slit coating method is a method in which a transparent conductive film composition is allowed to flow out of a narrow slit and applied onto a substrate, and the inkjet coating method is performed by filling a commercially available ink jet printer ink cartridge with the transparent conductive film composition. , A method of inkjet printing on a substrate. The screen printing method is a method in which a transparent conductive film composition is transferred to a substrate through a plate image formed thereon using wrinkles as a pattern indicating material. In the offset printing method, the composition for transparent conductive film attached to the plate is not directly attached to the substrate, but is transferred from the plate to a rubber sheet once, and then transferred from the rubber sheet to the substrate again. This is a printing method that utilizes the water repellency of water. The die coating method is a method in which the composition for a transparent conductive film supplied into a die is distributed by a manifold and extruded onto a thin film from a slit, and the surface of a traveling substrate is applied. The die coating method includes a slot coat method, a slide coat method, and a curtain coat method.

  Finally, the substrate having the transparent conductive coating is placed in the atmosphere or in an inert gas atmosphere such as nitrogen or argon at a temperature of 130 to 400 ° C., preferably 150 to 350 ° C., preferably 5 to 60 minutes, preferably Hold for 15-40 minutes and fire.

  The reason why the firing temperature of the base material having the coating film is in the range of 130 to 400 ° C. is that when the temperature is less than 130 ° C., the surface resistance value of the transparent conductive film becomes too high. On the other hand, when the temperature exceeds 400 ° C., the merit in production such as a low temperature process cannot be utilized, that is, the manufacturing cost increases and the productivity decreases. In particular, amorphous silicon, microcrystalline silicon, or a hybrid silicon solar cell using these is relatively weak against heat, and the conversion efficiency is lowered by the firing process.

  The reason why the firing time of the substrate having the coating film is set in the range of 5 to 60 minutes is that when the firing time is less than the lower limit, the surface resistance value of the transparent conductive film becomes too high. If the firing time exceeds the upper limit, the manufacturing cost will increase more than necessary, resulting in a decrease in productivity, and a problem that the conversion efficiency of the solar battery cell will be reduced.

  As described above, the transparent conductive film of the present invention can be formed. As described above, the manufacturing method of the present invention can eliminate a process using a vacuum film-forming method such as a vacuum deposition method or a sputtering method as much as possible by using a wet coating method. Can be manufactured.

  Hereinafter, the present invention will be described in detail by way of examples, but the present invention is not limited thereto.

Zirconia beads (microhaika, manufactured by Showa Shell Sekiyu KK) with a total diameter of 60 g and placed in a 100 cm ³ glass bottle so as to have the composition shown in Tables 1 to 3 (the numerical values indicate parts by mass) : The composition for transparent conductive films of Examples 1-21 and Comparative Examples 1-5 was produced by disperse | distributing for 6 hours with a paint shaker using 100g. Table 4 shows the shape of the anisotropic hollow silica particles used. Here, SiO ₂ binding agent 1-7 was used as the binder, and was prepared as follows.

[SiO ₂ binder 1]
Using a four-neck flask made of 500 cm ³ glass, add 140 g of tetraethoxysilane and 140 g of ethyl alcohol, and stir a solution of 1.7 g of 60% nitric acid in 120 g of pure water at a time. In addition, it was then produced by reacting at 50 ° C. for 3 hours.

[SiO ₂ binder 2]
Using a 500 cm ³ glass four-necked flask, add 85 g of tetraethoxysilane and 100 g of ethyl alcohol and stir a solution of 0.09 g of 60% nitric acid in 110 g of pure water at room temperature while stirring. The tube pump was used for 10 to 15 minutes. Thereafter, a mixed solution of 45 g of aluminum tri-sec-butoxide and 60 g of ethyl alcohol mixed in advance was added to the obtained mixed solution over a period of 10 to 15 minutes using a tube pump. . The mixture was stirred at room temperature for about 30 minutes and then reacted at 50 ° C. for 3 hours.

[SiO ₂ binder 3]
Using a four-necked flask made of 500 cm ³ glass, add 115 g of tetraethoxysilane and 175 g of ethyl alcohol and stir a solution of 1.4 g of 35% hydrochloric acid in 110 g of pure water at a time. In addition, it was produced by reacting at 45 ° C. for 3 hours.

[SiO ₂ binder 4]
Using a four-necked flask made of 500 cm ³ glass, add 130 g of tetraethoxysilane and 145 g of ethyl alcohol and stir a solution of 1.25 g of 30% aqueous ammonia in 124 g of pure water while stirring. And then reacted at 45 ° C. for 3 hours.

[SiO ₂ binder 5]
Using a 500 cm ³ glass four-necked flask, 90 g of tetraethoxysilane and 100 g of ethyl alcohol were added, and 0.9 g of 60% nitric acid was dissolved in 110 g of pure water at room temperature while stirring. The solution was charged over a period of 10-15 minutes. Thereafter, a mixed solution of 40 g of aluminum tri-sec-butoxide and 60 g of ethyl alcohol mixed in advance was added to the obtained mixed solution over a period of 10 to 15 minutes. The mixture was stirred at room temperature for about 30 minutes and then reacted at 50 ° C. for 3 hours.

[SiO ₂ binder 6]
Using a four-necked flask made of 500 cm ³ glass, add 125 g of tetraethoxysilane and 160 g of ethyl alcohol, and stir a solution of 0.6 g of 60% nitric acid in 115 g of pure water at a time. In addition, it was then produced by reacting at 50 ° C. for 3 hours.

[SiO ₂ binder 7]
Using a four-neck flask made of 500 cm ³ glass, add 145 g of tetraethoxysilane and 140 g of ethyl alcohol, and stir a solution of 0.015 g of 60% nitric acid in 115 g of pure water at a time. In addition, it was then produced by reacting at 50 ° C. for 3 hours.

[Coupling agent]
Vinyltriethoxysilane was used as the silane coupling agent. For the titanium coupling agent, the formula (1):

The titanium coupling agent which has the dialkyl pyrophosphite group represented by these was used.

[Mixed solvent]
The mixed solvent 1 is a mixture of isopropanol, ethanol and N, N-dimethylformamide (mass ratio 4: 2: 1), and the mixed solvent 2 is a mixture of ethanol and butanol (mass ratio 98: 2). Using.

[Non-polymer type binder]
The non-polymer type binder 1 is a mixture of 2-n-butoxyethanol and 3-isopropyl-2,4-pentanedione, and the non-polymer type binder 2 is 2,2-dimethyl-3,5-hexanedione. And non-polymer binder 3 is a mixture of 2-isobutoxyethanol, 2-hexyloxyethanol and n-propyl acetate (mass ratio 4: 1: 1). Was used.

[Examples 1 to 21]
In Example 1, first, as shown in Table 1 below, 98 pairs of ITO powder having an average particle diameter of 25 nm and anisotropic hollow silica particles 1 as conductive oxide powder were added to IPA serving as a dispersion medium. 2 and the SiO ₂ binder 1 as a binder were mixed at a ratio of 30% by mass with respect to 70% by mass of solid particles in which conductive oxide particles and anisotropic hollow silica particles 1 were combined. .

  In Example 2, in ethanol as a dispersion medium, an ATO powder having an average particle size of 40 nm and anisotropic hollow silica particles 2 as a conductive oxide powder in a ratio of 95: 5 and a non-polymer type as a binder The binder 1 was mixed at a ratio of 10% by mass with respect to 90% by mass of solid particles of the conductive oxide particles and the anisotropic hollow silica particles 2 combined.

In Example 3, in TPA powder serving as a dispersion medium, TZO powder having an average particle size of 30 nm and anisotropic hollow silica particles 3 as a conductive oxide powder at a ratio of 92: 8 and SiO ₂ bonding as a binder. The agent 2 was mixed at a ratio of 30% by mass with respect to 70% by mass of the solid particles in which the conductive oxide particles and the anisotropic hollow silica particles 3 were combined.

In Example 4, in an ethanol serving as a dispersion medium, ITO powder having an average particle diameter of 30 nm and anisotropic hollow silica particles 2 as a conductive oxide powder are in a ratio of 92 to 8, and SiO ₂ bond as a binder. The agent 7 was mixed at a ratio of 25% by mass with respect to 75% by mass of the solid particles: the conductive oxide particles and the anisotropic hollow silica particles 2 combined.

In Example 5, an ITO powder having an average particle size of 35 nm and anisotropic hollow silica particles 1 as conductive oxide powder in a mixed solvent 1 serving as a dispersion medium in a ratio of 90:10 and SiO as a binder. _{The 2} binder 6 was mixed at a ratio of 20% by mass with respect to 80% by mass of the solid particles obtained by combining the conductive oxide particles and the anisotropic hollow silica particles 1.

In Example 6, in ethanol as a dispersion medium, ITO powder having an average particle diameter of 40 nm and anisotropic hollow silica particles 2 as a conductive oxide powder were mixed at a ratio of 90:10 and SiO ₂ bond as a binder. Agent 2 was mixed at a ratio of 20% by mass with respect to 80% by mass of solid particles of the conductive oxide particles and anisotropic hollow silica particles 2 combined.

  In Example 7, in ethanol as a dispersion medium, ITO powder having an average particle diameter of 25 nm and anisotropic hollow silica particles 3 as a conductive oxide powder in a ratio of 85:15, and a non-polymer type binder as a binder 1, dialkyl pyrophosphite further represented by the chemical formula (1) at a ratio of 30% by mass to 70% by mass of solid particles obtained by combining conductive oxide particles and anisotropic hollow silica particles 3 The titanium coupling agent having a group is a combination of conductive oxide particles, anisotropic hollow silica particles 3 and a binder component, which are solid matter after coating film formation: 99.5% by mass, It mixed in the ratio of 0.5 mass%.

  In Example 8, ATO powder having an average particle size of 50 nm and anisotropic hollow silica particles 2 as conductive oxide powder in a mixed solvent 2 serving as a dispersion medium at a ratio of 85:15 and non-binder as a binder The polymer-type binder 2 was mixed at a ratio of 30% by mass with respect to 70% by mass of solid particles obtained by combining the conductive oxide particles and the anisotropic hollow silica particles 2.

In Example 9, in the mixed solvent 1 serving as a dispersion medium, ATO powder having an average particle diameter of 30 nm as a conductive oxide powder and anisotropic hollow silica particles 3 in a ratio of 85:15, and SiO as a binder. _{2 The} binder 3 was mixed at a ratio of 15% by mass with respect to 85% by mass of the solid particles obtained by combining the conductive oxide particles and the anisotropic hollow silica particles 3.

In Example 10, ITO powder having an average particle diameter of 40 nm and anisotropic hollow silica particles 1 were mixed as a conductive oxide powder in a mixed solvent 2 serving as a dispersion medium at a ratio of 82:18 and SiO 2 as a binder. _{2 The} binder 4 was mixed at a ratio of 30% by mass with respect to 70% by mass of solid particles obtained by combining the conductive oxide particles and the anisotropic hollow silica particles 1.

In Example 11, in the mixed solvent 2 serving as a dispersion medium, ITO powder having an average particle diameter of 35 nm and anisotropic hollow silica particles 1 as a conductive oxide powder were mixed at a ratio of 82:18 and SiO as a binder. _Two binders 5 were mixed at a ratio of 25% by mass with respect to 75% by mass of solid particles obtained by combining conductive oxide particles and anisotropic hollow silica particles 1.

In Example 12, in an ethanol serving as a dispersion medium, ITO powder having an average particle diameter of 30 nm and anisotropic hollow silica particles 3 as a conductive oxide powder are in a ratio of 80 to 20, and SiO ₂ bond as a binder. The agent 6 is a solid particle comprising the conductive oxide particles and the anisotropic hollow silica particles 3: a ratio of 25% by mass to 75% by mass, and a silane coupling agent (manufactured by Shin-Etsu Silicone Co., Ltd.) KBE-1003) is a composition in which the conductive oxide particles, the anisotropic hollow silica particles 3 and the binder component, which are solids after coating formation, are combined: 99.3% by mass, It mixed in the ratio of the mass%.

In Example 13, in IPA serving as a dispersion medium, IZO powder having an average particle diameter of 25 nm and anisotropic hollow silica particles 1 as a conductive oxide powder in a ratio of 80:20 and SiO ₂ bond as a binder Agent 1 was mixed at a ratio of 25% by mass with respect to 75% by mass of solid particles obtained by combining conductive oxide particles and anisotropic hollow silica particles 1.

  In Example 14, in butanol as a dispersion medium, ITO powder having an average particle diameter of 25 nm and anisotropic hollow silica particles 2 as a conductive oxide powder in a ratio of 80 to 20 and a non-polymer type as a binder The binder 3 was mixed at a ratio of 10% by mass with respect to 90% by mass of solid particles of the conductive oxide particles and the anisotropic hollow silica particles 2 combined.

In Example 15, in IPA serving as a dispersion medium, IZO powder having an average particle diameter of 25 nm and anisotropic hollow silica particles 1 as a conductive oxide powder in a ratio of 80:20, and SiO ₂ bond as a binder. Agent 3 was mixed at a ratio of 25% by mass with respect to 75% by mass of solid particles of the conductive oxide particles and anisotropic hollow silica particles 1 combined.

In Example 16, in the mixed solvent 1 serving as a dispersion medium, IZO powder having an average particle diameter of 25 nm and anisotropic hollow silica particles 2 as a conductive oxide powder were mixed at a ratio of 78 to 22 and SiO 2 as a binder. _{The 2} binder 5 was mixed at a ratio of 30% by mass with respect to 70% by mass of the solid particles obtained by combining the conductive oxide particles and the anisotropic hollow silica particles 2.

  In Example 17, in a mixed solvent 1 serving as a dispersion medium, TZO powder having an average particle size of 30 nm and anisotropic hollow silica particles 1 as a conductive oxide powder were used at a ratio of 77:23, and as a binder. The polymer-type binder 2 was mixed at a ratio of 15% by mass with respect to 85% by mass of the solid particles obtained by combining the conductive oxide particles and the anisotropic hollow silica particles 1.

In Example 18, in a mixed solvent 1 serving as a dispersion medium, ITO powder having an average particle diameter of 50 nm and anisotropic hollow silica particles 2 as a conductive oxide powder were mixed at a ratio of 70:30 and SiO as a binder. ₂ Binder 2 was mixed at a ratio of 15% by mass with respect to 85% by mass of solid particles obtained by combining conductive oxide particles and anisotropic hollow silica particles 2.

In Example 19, in an IPA serving as a dispersion medium, an ATO powder having an average particle size of 40 nm and an anisotropic hollow silica particle 3 as a conductive oxide powder are in a ratio of 65 to 35, and a SiO ₂ bond as a binder. The agent 7 was mixed at a ratio of 30% by mass with respect to 70% by mass of the solid particles: the conductive oxide particles and the anisotropic hollow silica particles 3 combined.

In Example 20, in IPA serving as a dispersion medium, ITO powder having an average particle diameter of 25 nm and anisotropic hollow silica particles 5 as a conductive oxide powder are in a ratio of 98 to 2, and SiO ₂ bond as a binder. Agent 1 was mixed at a ratio of 30% by mass with respect to 70% by mass of solid particles in which conductive oxide particles and anisotropic hollow silica particles 5 were combined.

In Example 21, in IPA serving as a dispersion medium, ITO powder having an average particle diameter of 25 nm and anisotropic hollow silica particles 1 as conductive oxide powders were in a ratio of 85:15, and SiO ₂ bonds were used as a binder. Agent 1 was mixed at a ratio of 25% by mass with respect to 75% by mass of solid particles obtained by combining conductive oxide particles and anisotropic hollow silica particles 1.

[Comparative Examples 1-5]
In Comparative Example 1, in IPA serving as a dispersion medium, ITO powder having an average particle size of 25 nm as conductive oxide powder, and SiO ₂ binder 1 as binder are used with respect to conductive oxide particles: 70% by mass. , 30% by mass.

In Comparative Example 2, in IPA serving as a dispersion medium, ITO powder having an average particle diameter of 25 nm and anisotropic hollow silica particles 2 as a conductive oxide powder are in a ratio of 99: 1 and SiO ₂ bond as a binder. Agent 1 was mixed at a ratio of 25% by mass with respect to 75% by mass of solid particles in which conductive oxide particles and anisotropic hollow silica particles were combined.

In Comparative Example 3, in IPA serving as a dispersion medium, ITO powder having an average particle diameter of 25 nm and anisotropic hollow silica particles 3 as a conductive oxide powder were mixed at a ratio of 63 to 37, and SiO ₂ bonds as a binder. Agent 1 was mixed at a ratio of 30% by mass with respect to 70% by mass of solid particles of conductive oxide particles and anisotropic hollow silica particles 3 combined.

In Comparative Example 4, ITO powder having an average particle diameter of 25 nm and anisotropic hollow silica particles 1 as conductive oxide powder in an ethanol serving as a dispersion medium in a ratio of 50:50 and SiO ₂ bond as a binder. Agent 1 was mixed at a ratio of 25% by mass with respect to 75% by mass of solid particles obtained by combining conductive oxide particles and anisotropic hollow silica particles 1.

In Comparative Example 5, ITO powder having an average particle diameter of 25 nm and anisotropic hollow silica particles 4 were mixed as a conductive oxide powder in a mixed solvent 1 serving as a dispersion medium at a ratio of 80:20 and SiO as a binder. ₂ Binder 1 was mixed at a ratio of 30% by mass with respect to 70% by mass of solid particles in which conductive oxide particles and anisotropic hollow silica particles 4 were combined.

[Evaluation of refractive index of composition for transparent conductive film]
About refractive index evaluation, about the composition for transparent conductive films shown in Examples 1-21, Comparative Examples 1-5, with respect to the glass substrate whose optical constant is known, the wet coating method (spin coating method, die coating method, After forming the transparent electrode film by spray coating method or offset printing method), the transparent conductive film having a thickness of 0.05 to 0.2 μm was formed by baking at 160 to 220 ° C. for 20 to 60 minutes. The film was measured using a spectroscopic ellipsometry apparatus (JA Woollam Japan Co., Ltd. M-2000), data was analyzed for the transparent electrode film portion, and the optical constant was determined. From the analyzed optical constant, a value of 633 nm was taken as the refractive index. Tables 1 to 3 show these results.

[Evaluation of composition for transparent conductive film in super straight type thin film solar cell]
As shown in FIG. 1, first, a glass substrate having an SiO ₂ layer (not shown) having a thickness of 50 nm formed on one main surface is prepared as a substrate 10, and an uneven texture is formed on the surface of this SiO ₂ layer. In addition, a surface electrode layer (SnO ₂ film) having a thickness of 800 nm doped with F (fluorine) was formed as the transparent electrode layer 13. The transparent electrode layer 13 was patterned using a laser processing method to form an array, and wirings for electrically connecting them were formed. Next, the photoelectric conversion layer 12 was formed on the transparent electrode layer 13 using a plasma CVD method. In this embodiment, the photoelectric conversion layer 12 includes p-type a-Si: H (amorphous unit price silicon), i-type a-Si (amorphous silicon), and n-type μc-Si in this order from the substrate 10 side. A film made of (microcrystalline silicon carbide) was laminated. The photoelectric conversion layer 12 was patterned using a laser processing method. This was utilized for the evaluation of the composition for transparent conductive films shown in Examples as a super straight type thin film solar cell in which film formation had already progressed.

  About the composition for transparent conductive films shown in Examples 1-21 and Comparative Examples 1-5, the thickness after baking is 0.01-0 with respect to the super straight type thin film solar cell in which film-forming has already progressed. After applying by wet coating method (spin coating method, die coating method, spray coating method, offset printing method) so as to be 5 μm, it is dried at a low temperature of 25-60 ° C. for 5 minutes to form a transparent conductive film 11 was formed. Tables 1 to 3 show coating methods. Tables 1 to 3 show the film thickness after firing of the transparent conductive film 11. Here, the film thickness was measured by cross-sectional observation using a scanning electron microscope (SEM, apparatus names: S-4300, SU-8000) manufactured by Hitachi High-Technologies.

  Next, the conductive reflective film composition prepared by the following method on this transparent conductive film 11 was applied by a wet coating method so that the thickness after firing was 0.05 to 2.0 μm, and then the temperature was changed. The conductive reflective film 14 was formed by drying at a low temperature of 25 to 60 ° C. for 5 minutes and then baking at 160 to 220 ° C. for 20 to 60 minutes. In addition, the preparation method of the composition for electroconductive reflective films was as follows.

  First, silver nitrate was dissolved in deionized water to prepare a metal ion aqueous solution. In addition, sodium citrate was dissolved in deionized water to prepare a sodium citrate aqueous solution having a concentration of 26% by weight. Reduction in which aqueous ferric sulfate is directly added and dissolved in this sodium citrate aqueous solution in a nitrogen gas stream maintained at 35 ° C. to contain citrate ions and ferrous ions in a molar ratio of 3: 2. An aqueous agent solution was prepared. Next, with the nitrogen gas stream maintained at 35 ° C., a magnetic stirrer stirrer is placed in the reducing agent aqueous solution, the stirrer is rotated at a rotation speed of 100 rpm, and the reducing agent aqueous solution is stirred, The metal salt aqueous solution was dropped into the reducing agent aqueous solution and synthesized. Here, the amount of the metal salt aqueous solution added to the reducing agent aqueous solution is adjusted so that the concentration of each solution is adjusted to 1/10 or less of the amount of the reducing agent aqueous solution. The reaction temperature was maintained at 40 ° C. The mixing ratio of the reducing agent aqueous solution and the metal salt aqueous solution was adjusted so that the equivalent of ferrous ions added as a reducing agent was three times the equivalent of metal ions. After the addition of the aqueous metal salt solution to the reducing agent aqueous solution was completed, stirring of the mixed solution was continued for an additional 15 minutes to generate metal particles inside the mixed solution to obtain a metal particle dispersion in which the metal particles were dispersed. The pH of the metal particle dispersion was 5.5, and the stoichiometric amount of metal particles in the dispersion was 5 g / liter. The obtained dispersion was allowed to stand at room temperature, thereby precipitating metal particles in the dispersion and separating aggregates of the precipitated metal particles by decantation. Deionized water was added to the separated metal agglomerated to form a dispersion, subjected to desalting treatment by ultrafiltration, and further subjected to substitution washing with methanol, whereby the metal (silver) content was set to 50% by mass. Thereafter, using a centrifuge, the centrifugal force of the centrifuge is adjusted to separate relatively large silver particles having a particle size of more than 100 nm, whereby silver nanoparticles having a primary particle diameter of 10 to 50 nm are separated. Was adjusted to contain 71% by number average. That is, the ratio of the silver nanoparticles occupying the range of the primary particle diameter of 10 to 50 nm with respect to 100% of all silver nanoparticles on the number average was adjusted to 71%. The obtained silver nanoparticles were chemically modified with an organic main chain protective agent having a carbon skeleton of 3 carbon atoms.

  Next, 10 parts by mass of the obtained metal nanoparticles were dispersed by adding to 90 parts by mass of a mixed solution containing water, ethanol and methanol. Further, 4% by mass of polyvinylpyrrolidone, 1% by mass of silver citrate, and 95% by mass of the metal nanoparticles are added to the dispersion as additives, so that the composition for conductive reflective film is added. Got.

  Next, in evaluating the power generation efficiency as a solar battery cell, the solar battery cell in which the composition for the reinforcing film is already formed as a reinforcing film on the conductive reflective film 14 to the conductive reflective film by the die coating apparatus. After the solvent was removed from the coating film for reinforcing film by vacuum drying so that the thickness after baking of the composition for reinforcing film was 350 nm, the solar battery cell was placed in a hot air drying furnace. Holding at 20 ° C. for 20 minutes, the coating film for reinforcing film was thermally cured to obtain a reinforcing film for conductive reflective film. In addition, the preparation method of the composition for reinforcing films was as follows.

First, 8% by mass of ITO particles having an average particle diameter of 25 nm as conductive oxide fine particles, 2% by mass of titanium coupling agent having a dialkylpyrophosphite group as a coupling agent, and a mixture of ethanol and butanol as a dispersion medium The liquid (mass ratio 98: 2) was mixed with 90% by mass and stirred at room temperature at a rotation speed of 800 rpm for 1 hour. Next, 60 g of this mixture was placed in a 100 cc glass bottle and dispersed with a paint shaker for 6 hours using 100 g of zirconia beads having a diameter of 0.3 mm (manufactured by Showa Shell Sekiyu KK: Microhaika) to prepare a dispersion of ITO particles. . Here, the titanium coupling agent having a dialkylpyrophosphite group is represented by the chemical formula (1) given in the above embodiment. The SiO ₂ binder was prepared in the same manner as the SiO ₂ binder 1 described above. Next, 4% by mass of the dispersion liquid of ITO particles was mixed with 86% by mass of ethanol as a dispersion medium, and then the SiO ₂ binder 1 was further mixed at 10% by mass to obtain a base liquid of the composition for reinforcing film. After that, 95% by mass of this base solution and 5% by mass of fumed silica dispersion as an additive are mixed, and dispersed and mixed at room temperature for 10 minutes by an ultrasonic vibrator, and the mixture is thoroughly blended to form a reinforcing membrane. A coating liquid, which is a composition for use, was prepared.

  The solar battery cell formed up to the reinforcing film for the conductive reflective film is obtained by lasering the photoelectric conversion layer 12, the transparent conductive film 11 formed thereon, the conductive reflective film 14, and the conductive reflective film reinforcing film. Patterning was performed using a processing method.

  Solar cell evaluation methods include output characteristics and short-circuit current when lead wiring is performed on a processed substrate that has been patterned using a laser processing method and an IV characteristic curve is confirmed (Jsc) Using a photoelectric conversion layer obtained by the same production method as in the examples, a super straight type solar cell in which a transparent conductive film, a conductive reflective film, and a reinforcing film were all formed by a sputtering method was defined as 100. Relative output evaluation was performed. Tables 1 to 3 show these results.

Here, as shown in FIG. 1, a super straight type solar cell formed entirely by sputtering is a glass substrate in which an SiO ₂ layer (not shown) having a thickness of 50 nm is first formed on one main surface. Was prepared as a substrate 10, and a surface electrode layer (SnO ₂ film) 13 having an uneven texture on the surface and doped with F (fluorine) was formed on the SiO ₂ layer. The transparent electrode layer 13 was patterned using a laser processing method to form an array, and wirings for electrically connecting them were formed. Next, the photoelectric conversion layer 12 was formed on the transparent electrode layer 13 using a plasma CVD method. In this embodiment, the photoelectric conversion layer 12 includes p-type a-Si: H (amorphous silicon, thickness: 40 nm), i-type a-Si (amorphous silicon, thickness) in this order from the substrate 10 side. : 200 nm) and n-type μc-Si (microcrystalline silicon, thickness: 40 nm), the photoelectric conversion layer 12 obtained by laminating the films is patterned using a laser processing method, and then magnetron in-line sputtering is performed. A transparent conductive film (ZnO layer) 11 having a thickness of 80 nm and a conductive reflective film (silver electrode layer) 14 having a thickness of 200 nm are sequentially formed on the photoelectric conversion layer 12 using an apparatus.

  When fine anisotropic hollow silica particles having an average particle diameter of 1 to 50 nm are contained in the transparent conductive film, the adhesion may be lowered. For adhesion evaluation, solar cells in which film formation has already progressed for the compositions for transparent conductive films shown in Examples 1 to 21 and Comparative Examples 1 to 5 by a method according to the tape test (JIS K-5600). After the transparent electrode film 11 and the conductive reflective film 14 are formed on the cell, the composite film is formed on the solar battery cell by baking at 160 to 220 ° C. for 20 to 60 minutes. On the other hand, when the tape was brought into close contact and peeled, evaluation was made in three stages: excellent, acceptable, and impossible depending on the degree of film peeling or turning up. The case where the film-formed product does not stick to the tape side and only the adhesive tape is peeled off is excellent, and the case where the peeling of the adhesive tape and the state in which the photoelectric conversion layer 12 serving as the substrate is exposed is mixed is permitted. The case where the entire surface of the photoelectric conversion layer 12 as a base material was exposed by peeling was regarded as impossible. Tables 1 to 3 show these results.

  As is clear from Table 1, in all of Examples 1 to 21, the refractive index is low, the adhesion is good, the relative power generation efficiency is extremely high as 114 to 126%, and the relative short-circuit current is also high as 105 to 114%. It was. In particular, Example 21 had the highest relative power generation efficiency and relative short-circuit current, and good adhesion. On the other hand, in Comparative Example 1 that does not include anisotropic hollow silica particles and Comparative Example 2 that includes only 1 part by mass of anisotropic hollow silica particles, the refractive index is high, and both the relative power generation efficiency and the relative short-circuit current density are high. About 100%. In Comparative Example 3 containing 37 parts by mass of anisotropic hollow silica particles and Comparative Example 4 containing 50 parts by mass, both the relative power generation efficiency and the relative short-circuit current density were low. In Comparative Example 5 where the average particle diameter of the anisotropic hollow silica particles was large, the adhesion was poor, and both the relative power generation efficiency and the relative short-circuit current density were low.

<Example 22>
In Example 20, first, ITO powder having an average particle size of 25 nm and anisotropic hollow silica particles 1 having an average particle size of 9 nm as conductive oxide powder in IPA serving as a dispersion medium in a ratio of 98 to 2. Further, the SiO ₂ binder 1 as a binder was mixed at a ratio of 30% by mass with respect to 70% by mass of solid particles obtained by combining conductive oxide particles and colloidal silica particles. Here, the dispersion medium (IPA) was used in a ratio of 72.3 mass% with respect to the transparent conductive film composition.

<Example 23>
In Example 21, in ethanol serving as a dispersion medium, ITO powder having an average particle diameter of 30 nm and anisotropic hollow silica particles 1 having an average particle diameter of 9 nm as a conductive oxide powder were in a ratio of 92 to 8, As a binder, the SiO ₂ binder 7 was mixed at a ratio of 25% by mass with respect to 75% by mass of solid particles obtained by combining conductive oxide particles and colloidal silica particles. Here, the dispersion medium (IPA) was used in a ratio of 72.3 mass% with respect to the transparent conductive film composition.

<Comparative Example 6>
In Comparative Example 6, in IPA serving as a dispersion medium, ITO powder having an average particle size of 25 nm as conductive oxide powder, and SiO ₂ binder 1 as binder are used with respect to conductive oxide particles: 70% by mass. , 30% by mass. Here, the dispersion medium (IPA) was used in a ratio of 72.3 mass% with respect to the transparent conductive film composition.

[Evaluation of composition for transparent conductive film in substrate type thin film solar cell]
As shown in FIG. 2, a polyimide resin film substrate having a length of 100 mm, a width of 100 mm, and a thickness of 50 μm was prepared as the base material 20, and a through hole 25 having a diameter of 100 μm was formed in the film substrate 20. . First, the collector electrode layer 26 (thickness: 200 nm) made of Ag was formed on the lower surface of the film substrate by sputtering. At this time, the through hole 25 was also filled with an energizing member made of Ag. Next, after applying the conductive reflective film composition on the upper surface of the base material 20 by a wet coating method (screen printing method), the film substrate is put into a hot air circulating furnace and held at a temperature of 200 ° C. for 30 minutes. Then, the conductive reflective film 24 was baked to obtain a substrate-type thin film solar cell in which film formation had already progressed. Note that the thickness of the conductive reflective film 24 after firing was 200 nm.

  Next, the composition for transparent conductive film of Examples 22 and 23 and Comparative Example 6 on the conductive reflective film 24 is applied to the substrate-type thin film solar cell in which film formation has already progressed. After coating, the transparent conductive film 21 was formed on the solar cell by drying at a temperature of 50 ° C. for 5 minutes and then baking at 180 ° C. for 30 minutes. The film thickness after baking of the transparent conductive film 21 was Example 22: 0.1 μm, Example 23: 0.13 μm, and Comparative Example 6: 0.1 μm.

  The formed transparent conductive film 21 and conductive reflective film 24 were formed into an array by patterning using a laser processing method, and wirings were formed so that they could be electrically interconnected. Next, the photoelectric conversion layer 22 was formed on the transparent electrode layer 21 using a plasma CVD method. The photoelectric conversion layer 22 includes n-type μc-Si (microcrystalline silicon carbide), i-type a-Si (amorphous silicon), and p-type a-Si: H (amorphous unit price) in order from the substrate 20 side. It was obtained by laminating films made of silicon. The photoelectric conversion layer 22 was patterned using a laser processing method.

Further, on the photoelectric conversion layer 22, a surface electrode layer (SnO ₂ film) having a thickness of 800 nm and having an uneven texture on the surface and doped with F (fluorine) was formed as the transparent electrode layer 23. The transparent electrode layer 23 was patterned using a laser processing method to form an array, and wirings for electrically connecting them were formed to obtain a substrate type thin film solar cell.

  The relative power generation efficiency and short circuit current (Jsc) of the obtained substrate type thin film solar cell were evaluated in the same manner as the super straight type solar cell. Here, relative output evaluation is performed with a substrate-type thin film solar cell in which all of the base material 20, the conductive reflective film 24, the transparent conductive film 21, the photoelectric conversion layer 22, and the transparent electrode layer 23 are produced by sputtering as 100. went.

  In Example 22, the relative power generation efficiency was improved to 112% and the relative short-circuit current density to 104%. In Example 23, the relative power generation efficiency was improved by 115% and the relative short-circuit current density by 104%. On the other hand, in Comparative Example 6, the relative power generation efficiency was 98%, and the relative short-circuit current density was 101%, which was lower than in Examples 20 and 21.

  As described above, the composition for transparent conductive film of the present invention can be applied and baked on the photoelectric conversion layer by a wet coating method, and the obtained transparent conductive film can be obtained depending on the content of anisotropic hollow silica particles. The refractive index of can be adjusted. Therefore, a transparent conductive film capable of improving the power generation efficiency of the thin film solar cell can be easily obtained.

DESCRIPTION OF SYMBOLS 1 Super straight type thin film solar cell 2 Substrate type thin film solar cell 10, 20 Base material 11, 21 Transparent conductive film 12, 22 Photoelectric conversion layer 13, 23 Transparent electrode layer 14, 24 Conductive reflective film 25 Through hole 26 Collector electrode layer

Claims (11)

  Conductive oxide particles, an average particle diameter: 1-50 nm anisotropic hollow silica particles, and a binder, with respect to a total of 100 parts by mass of the conductive oxide particles and anisotropic hollow silica particles, A composition for a transparent conductive film for solar cells, comprising 2 to 35 parts by mass of anisotropic hollow silica particles.   Conductive oxide particles, an average particle diameter: 1-50 nm anisotropic hollow silica particles, and a binder, with respect to a total of 100 parts by mass of the conductive oxide particles and anisotropic hollow silica particles, A composition for a transparent conductive film for a super straight type thin film solar cell, comprising 2 to 35 parts by mass of anisotropic hollow silica particles.   The composition for transparent conductive films for super straight type thin film solar cells according to claim 2, wherein the binder is a polymer type binder and / or a non-polymer type binder that is cured by heating.   The super straight type according to claim 3, wherein the non-polymer type binder is at least one selected from the group consisting of metal soaps, metal complexes, metal alkoxides, halosilanes, 2-alkoxyethanol, β-diketone, and alkyl acetate. The composition for transparent conductive films for thin film solar cells.   Including a conductive oxide particle, a spherical anisotropic hollow silica particle having an average particle diameter of 1 to 50 nm, and a cured binder, the total amount of the conductive oxide particle and the anisotropic hollow silica particle is 100 parts by mass. On the other hand, the transparent conductive film for solar cells characterized by including 2-35 mass parts of anisotropic hollow silica particles.   Including a conductive oxide particle, a spherical anisotropic hollow silica particle having an average particle diameter of 1 to 50 nm, and a cured binder, the total amount of the conductive oxide particle and the anisotropic hollow silica particle is 100 parts by mass. On the other hand, the transparent conductive film for super straight type thin film solar cells characterized by containing 2-35 mass parts of anisotropic hollow silica particles.   The transparent conductive film for super straight type thin film solar cells according to claim 6, wherein the binder is a polymer type binder and / or a non-polymer type binder.   The super straight type according to claim 7, wherein the non-polymer type binder is at least one selected from the group consisting of metal soap, metal complex, metal alkoxide, halosilanes, 2-alkoxyethanol, β-diketone, and alkyl acetate. Transparent conductive film for thin film solar cells.   A super straight type thin film solar cell comprising the transparent conductive film for a super straight type thin film solar cell according to any one of claims 6 to 8.   It is a manufacturing method of the transparent conductive film of a super straight type thin film solar cell provided with a base material, a transparent electrode layer, a photoelectric conversion layer, and a transparent conductive film in this order, and any one of Claims 1-3 on a photoelectric conversion layer The transparent conductive film composition according to claim 1 is applied by a wet coating method to form a transparent conductive film, and then a substrate having the transparent conductive film is baked to form a transparent conductive film. Manufacturing method of electrically conductive film.   The wet coating method is a spray coating method, a dispenser coating method, a spin coating method, a knife coating method, a slit coating method, an inkjet coating method, a die coating method, a screen printing method, an offset printing method, or a gravure printing method. The manufacturing method of the transparent conductive film of 10.