JP2012056955A5 - - Google Patents
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- JP2012056955A5 JP2012056955A5 JP2011239702A JP2011239702A JP2012056955A5 JP 2012056955 A5 JP2012056955 A5 JP 2012056955A5 JP 2011239702 A JP2011239702 A JP 2011239702A JP 2011239702 A JP2011239702 A JP 2011239702A JP 2012056955 A5 JP2012056955 A5 JP 2012056955A5
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Description
(式中、R1はアダマンタン骨格を有する炭素数20以下の脂肪族環式基(但し、カルボニル基を有する基を除く。)であり、nは0または1〜5の整数を表し、R2は水素原子、又は炭素数20以下の低級アルキル基を表す。)で示されることを特徴とする。
(In the formula, R 1 having 20 or less of an aliphatic cyclic group with a carbon having an adamantane skeleton (However, an exception to a group having a carbonyl group.), N represents an integer of 0 or 1 to 5, R 2 is characterized in that it is represented by.) represents a hydrogen atom, or of 20 or less lower alkyl group having a carbon.
Claims (1)
で示される化合物。 The following general formula (2)
A compound represented by
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011239702A JP5461503B2 (en) | 2004-02-20 | 2011-10-31 | New compounds |
Applications Claiming Priority (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004045522 | 2004-02-20 | ||
JP2004045522 | 2004-02-20 | ||
JP2004134585 | 2004-04-28 | ||
JP2004134585 | 2004-04-28 | ||
JP2004179475 | 2004-06-17 | ||
JP2004179475 | 2004-06-17 | ||
JP2004252474 | 2004-08-31 | ||
JP2004252474 | 2004-08-31 | ||
JP2011239702A JP5461503B2 (en) | 2004-02-20 | 2011-10-31 | New compounds |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004316960A Division JP2006096965A (en) | 2004-02-20 | 2004-10-29 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2012056955A JP2012056955A (en) | 2012-03-22 |
JP2012056955A5 true JP2012056955A5 (en) | 2012-05-10 |
JP5461503B2 JP5461503B2 (en) | 2014-04-02 |
Family
ID=44593845
Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011111663A Active JP5461472B2 (en) | 2004-02-20 | 2011-05-18 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING THE POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN |
JP2011111661A Active JP5778985B2 (en) | 2004-02-20 | 2011-05-18 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING THE POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN |
JP2011111662A Active JP5588396B2 (en) | 2004-02-20 | 2011-05-18 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING THE POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN |
JP2011239702A Active JP5461503B2 (en) | 2004-02-20 | 2011-10-31 | New compounds |
Family Applications Before (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011111663A Active JP5461472B2 (en) | 2004-02-20 | 2011-05-18 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING THE POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN |
JP2011111661A Active JP5778985B2 (en) | 2004-02-20 | 2011-05-18 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING THE POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN |
JP2011111662A Active JP5588396B2 (en) | 2004-02-20 | 2011-05-18 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING THE POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN |
Country Status (1)
Country | Link |
---|---|
JP (4) | JP5461472B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5856991B2 (en) * | 2012-05-21 | 2016-02-10 | 富士フイルム株式会社 | Chemically amplified resist composition, negative chemically amplified resist composition, resist film using the same, resist-coated mask blanks, photomask manufacturing method and pattern forming method, and electronic device manufacturing method |
JP2014156530A (en) * | 2013-02-15 | 2014-08-28 | Dic Corp | Fluorine-based surfactant and positive resist composition |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001318465A (en) * | 2000-05-11 | 2001-11-16 | Fuji Photo Film Co Ltd | Positive type photoresist composition |
JP2002139838A (en) * | 2000-10-31 | 2002-05-17 | Fuji Photo Film Co Ltd | Positive type resist composition |
CN1255467C (en) * | 2001-03-31 | 2006-05-10 | Adms技术株式会社 | Protective film composition for cylindrical shock insulator of liquid crystal display element |
JP2002351079A (en) * | 2001-05-24 | 2002-12-04 | Fuji Photo Film Co Ltd | Positive type resist composition |
KR20020090489A (en) * | 2001-05-28 | 2002-12-05 | 금호석유화학 주식회사 | Polymer for resist and formulation material using the same |
JP4083399B2 (en) * | 2001-07-24 | 2008-04-30 | セントラル硝子株式会社 | Fluorine-containing polymerizable monomer and polymer compound using the same |
JP4522628B2 (en) * | 2001-11-28 | 2010-08-11 | 信越化学工業株式会社 | New ester compounds |
JP4030313B2 (en) * | 2002-01-18 | 2008-01-09 | 三菱レイヨン株式会社 | Method for producing adamantane derivative |
JP2004220009A (en) * | 2002-12-28 | 2004-08-05 | Jsr Corp | Radiation sensitive resin composition |
JP2005017729A (en) * | 2003-06-26 | 2005-01-20 | Fuji Photo Film Co Ltd | Positive resist composition |
JP4258645B2 (en) * | 2003-10-23 | 2009-04-30 | 信越化学工業株式会社 | Polymer compound, resist material, and pattern forming method |
JP2005189712A (en) * | 2003-12-26 | 2005-07-14 | Fuji Photo Film Co Ltd | Positive resist composition and pattern forming method using the same |
JP4525912B2 (en) * | 2004-01-30 | 2010-08-18 | 信越化学工業株式会社 | Polymer compound, resist material, and pattern forming method |
JP4651283B2 (en) * | 2004-02-04 | 2011-03-16 | ダイセル化学工業株式会社 | Unsaturated carboxylic acid hemiacetal ester, polymer compound, and resin composition for photoresist |
JP2005234449A (en) * | 2004-02-23 | 2005-09-02 | Fuji Photo Film Co Ltd | Positive resist composition and pattern forming method using the same |
WO2005111097A1 (en) * | 2004-05-18 | 2005-11-24 | Idemitsu Kosan Co., Ltd. | Adamantane derivative, method for producing same and photosensitive material for photoresist |
-
2011
- 2011-05-18 JP JP2011111663A patent/JP5461472B2/en active Active
- 2011-05-18 JP JP2011111661A patent/JP5778985B2/en active Active
- 2011-05-18 JP JP2011111662A patent/JP5588396B2/en active Active
- 2011-10-31 JP JP2011239702A patent/JP5461503B2/en active Active
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