JP2012056955A5 - - Google Patents

Download PDF

Info

Publication number
JP2012056955A5
JP2012056955A5 JP2011239702A JP2011239702A JP2012056955A5 JP 2012056955 A5 JP2012056955 A5 JP 2012056955A5 JP 2011239702 A JP2011239702 A JP 2011239702A JP 2011239702 A JP2011239702 A JP 2011239702A JP 2012056955 A5 JP2012056955 A5 JP 2012056955A5
Authority
JP
Japan
Prior art keywords
group
carbon
less
formula
exception
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011239702A
Other languages
Japanese (ja)
Other versions
JP5461503B2 (en
JP2012056955A (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2011239702A priority Critical patent/JP5461503B2/en
Priority claimed from JP2011239702A external-priority patent/JP5461503B2/en
Publication of JP2012056955A publication Critical patent/JP2012056955A/en
Publication of JP2012056955A5 publication Critical patent/JP2012056955A5/ja
Application granted granted Critical
Publication of JP5461503B2 publication Critical patent/JP5461503B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Description

（式中、Ｒ1はアダマンタン骨格を有する炭素数２０以下の脂肪族環式基（但し、カルボニル基を有する基を除く。）であり、ｎは０または１〜５の整数を表し、Ｒ2は水素原子、又は炭素数２０以下の低級アルキル基を表す。）で示されることを特徴とする。
(In the formula, R 1 having 20 or less of an aliphatic cyclic group with a carbon having an adamantane skeleton (However, an exception to a group having a carbonyl group.), N represents an integer of 0 or 1 to 5, R 2 is characterized in that it is represented by.) represents a hydrogen atom, or of 20 or less lower alkyl group having a carbon.

Claims (1)

下記一般式（２）
Figure 2012056955
 （式中、Ｒ1はアダマンタン骨格を有する炭素数２０以下の脂肪族環式基（但し、カルボニル基を有する基を除く。）であり、ｎは０または１〜５の整数を表し、Ｒ2は水素原子、又は炭素数２０以下の低級アルキル基を表す。）
で示される化合物。 The following general formula (2)
Figure 2012056955
 (In the formula, R 1 having 20 or less of an aliphatic cyclic group with a carbon having an adamantane skeleton (However, an exception to a group having a carbonyl group.), N represents an integer of 0 or 1 to 5, R 2 represents a hydrogen atom, or of 20 or less lower alkyl group having a carbon.)
A compound represented by
JP2011239702A 2004-02-20 2011-10-31 New compounds Active JP5461503B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011239702A JP5461503B2 (en) 2004-02-20 2011-10-31 New compounds

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
JP2004045522 2004-02-20
JP2004045522 2004-02-20
JP2004134585 2004-04-28
JP2004134585 2004-04-28
JP2004179475 2004-06-17
JP2004179475 2004-06-17
JP2004252474 2004-08-31
JP2004252474 2004-08-31
JP2011239702A JP5461503B2 (en) 2004-02-20 2011-10-31 New compounds

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2004316960A Division JP2006096965A (en) 2004-02-20 2004-10-29 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern

Publications (3)

Publication Number Publication Date
JP2012056955A JP2012056955A (en) 2012-03-22
JP2012056955A5 true JP2012056955A5 (en) 2012-05-10
JP5461503B2 JP5461503B2 (en) 2014-04-02

Family

ID=44593845

Family Applications (4)

Application Number Title Priority Date Filing Date
JP2011111662A Active JP5588396B2 (en) 2004-02-20 2011-05-18 POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING THE POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN
JP2011111663A Active JP5461472B2 (en) 2004-02-20 2011-05-18 POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING THE POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN
JP2011111661A Active JP5778985B2 (en) 2004-02-20 2011-05-18 POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING THE POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN
JP2011239702A Active JP5461503B2 (en) 2004-02-20 2011-10-31 New compounds

Family Applications Before (3)

Application Number Title Priority Date Filing Date
JP2011111662A Active JP5588396B2 (en) 2004-02-20 2011-05-18 POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING THE POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN
JP2011111663A Active JP5461472B2 (en) 2004-02-20 2011-05-18 POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING THE POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN
JP2011111661A Active JP5778985B2 (en) 2004-02-20 2011-05-18 POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING THE POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN

Country Status (1)

Country Link
JP (4) JP5588396B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5856991B2 (en) * 2012-05-21 2016-02-10 富士フイルム株式会社 Chemically amplified resist composition, negative chemically amplified resist composition, resist film using the same, resist-coated mask blanks, photomask manufacturing method and pattern forming method, and electronic device manufacturing method
JP2014156530A (en) * 2013-02-15 2014-08-28 Dic Corp Fluorine-based surfactant and positive resist composition

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001318465A (en) * 2000-05-11 2001-11-16 Fuji Photo Film Co Ltd Positive type photoresist composition
JP2002139838A (en) * 2000-10-31 2002-05-17 Fuji Photo Film Co Ltd Positive type resist composition
TWI266146B (en) * 2001-03-31 2006-11-11 Samyang Ems Co Ltd Resist composition for column spacer of liquid crystal display element
JP2002351079A (en) * 2001-05-24 2002-12-04 Fuji Photo Film Co Ltd Positive type resist composition
KR20020090489A (en) * 2001-05-28 2002-12-05 금호석유화학 주식회사 Polymer for resist and formulation material using the same
JP4083399B2 (en) * 2001-07-24 2008-04-30 セントラル硝子株式会社 Fluorine-containing polymerizable monomer and polymer compound using the same
JP4522628B2 (en) * 2001-11-28 2010-08-11 信越化学工業株式会社 New ester compounds
JP4030313B2 (en) * 2002-01-18 2008-01-09 三菱レイヨン株式会社 Method for producing adamantane derivative
JP2004220009A (en) * 2002-12-28 2004-08-05 Jsr Corp Radiation sensitive resin composition
JP2005017729A (en) * 2003-06-26 2005-01-20 Fuji Photo Film Co Ltd Positive resist composition
JP4258645B2 (en) * 2003-10-23 2009-04-30 信越化学工業株式会社 Polymer compound, resist material, and pattern forming method
JP2005189712A (en) * 2003-12-26 2005-07-14 Fuji Photo Film Co Ltd Positive resist composition and pattern forming method using the same
JP4525912B2 (en) * 2004-01-30 2010-08-18 信越化学工業株式会社 Polymer compound, resist material, and pattern forming method
JP4651283B2 (en) * 2004-02-04 2011-03-16 ダイセル化学工業株式会社 Unsaturated carboxylic acid hemiacetal ester, polymer compound, and resin composition for photoresist
JP2005234449A (en) * 2004-02-23 2005-09-02 Fuji Photo Film Co Ltd Positive resist composition and pattern forming method using the same
JP4866237B2 (en) * 2004-05-18 2012-02-01 出光興産株式会社 Adamantane derivative, method for producing the same, and photosensitive material for photoresist

Similar Documents

Publication Publication Date Title
JP2013102146A5 (en) Compound
JP2013010749A5 (en) Carbazole compounds
JP2012140458A5 (en)
JP2014029971A5 (en) Organic compounds
JP2011105738A5 (en)
JP2016520672A5 (en)
JP2015522045A5 (en)
JP2011227454A5 (en)
JP2013163667A5 (en)
JP2013010731A5 (en) Heterocyclic compounds
JP2015063518A5 (en) Organic compounds
JP2013541600A5 (en)
JP2015530408A5 (en)
JP2014520090A5 (en)
JP2013532130A5 (en)
JP2012094862A5 (en)
JP2013118368A5 (en) Dibenzo [f, h] quinoxaline compound
JP2014063155A5 (en)
JP2012121883A5 (en) Oxadiazole derivative
JP2016532680A5 (en)
JP2013147490A5 (en) Iridium complex
JP2015518492A5 (en)
JP2012254971A5 (en) Carbazole compounds
JP2014043437A5 (en) Organic compounds
JP2013523912A5 (en)