JP2012027009A - Surface shape measurement method by interference fringe model adaptation and device therefor - Google Patents

Surface shape measurement method by interference fringe model adaptation and device therefor Download PDF

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JP2012027009A
JP2012027009A JP2011129799A JP2011129799A JP2012027009A JP 2012027009 A JP2012027009 A JP 2012027009A JP 2011129799 A JP2011129799 A JP 2011129799A JP 2011129799 A JP2011129799 A JP 2011129799A JP 2012027009 A JP2012027009 A JP 2012027009A
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Katsuichi Kitagawa
克一 北川
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Toray Engineering Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To accurately measure the surface shape and surface height of a measurement object.SOLUTION: The heights of respective points are obtained by using the single color light (B, G, R) of a plurality of wavelengths and performing adaptation to an interference fringe model from interference images obtained from a measurement object surface and a reference surface indicated by luminance of each wavelength number with an average luminance, an interference modulation degree and the height of the point as unknown parameters.

Description

本発明は、半導体ウエハ、液晶パネル、プラズマディスプレーパネル、磁性体フィルム、ガラス基板、金属膜などの微少な高さ変化を有する測定対象物の表面形状や表面高さを波長の異なる光干渉によって、測定する三次元形状表面測定方法およびその装置に関するものである。 In the present invention, the surface shape and surface height of a measurement object having a slight height change, such as a semiconductor wafer, a liquid crystal panel, a plasma display panel, a magnetic film, a glass substrate, and a metal film, are obtained by optical interference with different wavelengths. The present invention relates to a three-dimensional surface measurement method and apparatus for measuring.

従来から、表面形状や表面高さの測定方法として、光源の分岐手段を介して測定対象面と参照面に単色光を照射し、測定対象面と参照面の両方から反射して同一光路を戻る反射光によって生じる干渉縞の強度値に基づいて、測定対象面の表面形状や表面高さを求めるキャリア縞導入法などがあった。   Conventionally, as a method for measuring the surface shape and the surface height, monochromatic light is irradiated to the measurement target surface and the reference surface via the light source branching means, reflected from both the measurement target surface and the reference surface, and returned to the same optical path. There has been a carrier fringe introduction method for obtaining the surface shape and surface height of the surface to be measured based on the intensity value of interference fringes generated by reflected light.

上記方法は、図16に示すように測定光学系に傾けた参照面を設け、ほぼ一定周期の干渉縞を導入し、その干渉画像を解析して、高さを求めるものである(例えば、特許文献1参照)。また、光源の複数波長を利用して、測定レンジを拡大する手法がある(例えば、特許文献2参照)。   In the above method, as shown in FIG. 16, an inclined reference surface is provided on the measurement optical system, interference fringes with a substantially constant period are introduced, and the interference image is analyzed to obtain the height (for example, patents). Reference 1). In addition, there is a method of expanding the measurement range using a plurality of wavelengths of the light source (see, for example, Patent Document 2).

WO2007/088789A1WO2007 / 088789A1 特開2008−209404号JP 2008-209404 A

精密工学会、Vol.75,No2,pp.273−277,2009Japan Society for Precision Engineering, Vol. 75, No2, pp. 273-277, 2009 VIEW2008ビジョン技術の実利用ワークショップ講演論文集,pp.5−10VIEW 2008 Workshop on practical use of vision technology, pp. 5-10 精密工学会2008年秋季大会学術講演会講演論文集、pp.179−180,2008/9Proc. Of the Japan Society for Precision Engineering 2008 Autumn Conference, pp. 179-180, 2008/9

前記背景技術に記載のキャリア縞導入法では、測定光学系の参照面を傾け形成されるほぼ一定周期の干渉縞を導入し、該干渉画像を解析して高さを求める手法であった。しかし、前記背景技術には下記の問題点があった。   In the carrier fringe introduction method described in the background art, an interference fringe having a substantially constant period formed by tilting the reference surface of the measurement optical system is introduced, and the height is obtained by analyzing the interference image. However, the background art has the following problems.

例えば、測定対象面の表面形状や表面高さに対し、導入した干渉縞が密でその観察が困難な程度の急峻な凹凸の傾斜領域が存在すると、その領域の高さを正しく測定できない。すなわち、測定対象物の表面形状や表面高さの凹凸の測定可能な傾斜角度が、参照面の傾斜角度により形成され導入する干渉縞(キャリア縞)の周期により制限された。   For example, if the introduced interference fringes are dense with respect to the surface shape and height of the surface to be measured and there is a steep uneven slope region that is difficult to observe, the height of that region cannot be measured correctly. That is, the measurable inclination angle of the surface shape and surface height unevenness of the measurement object is limited by the period of interference fringes (carrier fringes) formed and introduced by the inclination angle of the reference surface.

また、表面形状や表面高さを求めるために、測定対象面の該測定点の傾斜領域の輝度情報を使用するので、水平方向の分解能が低下し、表面形状の段差付近では正しい測定値が得られない。従い、測定対象面の表面形状や表面高さの細かな凹凸情報が失われてしまう。   In addition, since the luminance information of the inclined area of the measurement point on the measurement target surface is used to determine the surface shape and surface height, the horizontal resolution is reduced, and a correct measurement value is obtained near the step of the surface shape. I can't. Accordingly, the fine unevenness information of the surface shape and surface height of the measurement target surface is lost.

また、測定光学系の参照面を傾けることにより形成される干渉縞を導入し、その干渉縞画像を解析して高さを求める場合、参照面の傾斜により、焦点深度の範囲を越える部分の干渉縞がぼやけて正確な測定ができなくなってしまう。   In addition, when introducing interference fringes formed by tilting the reference surface of the measurement optical system and analyzing the interference fringe image to obtain the height, interference of the part exceeding the depth of focus range due to the tilt of the reference surface The stripes are blurred and accurate measurement cannot be performed.

さらには、測定データが複数あるような多波長の場合、正確な干渉縞の周波数推定や多波長アンラッピングなど、複雑な計算処理を必要とする。等々の問題があった。   Furthermore, in the case of multiple wavelengths having a plurality of measurement data, complicated calculation processing such as accurate interference fringe frequency estimation and multiple wavelength unwrapping is required. And so on.

本願発明は、上記の様にキャリア縞の導入を用いて測定するのではなく、該キャリア縞の導入を不要とした一括測定法である点で、背景技術とは異なる三次元形状測定方法および装置に関するものである。以下に当該発明を用いて、前記課題を解決するための手段について記述する。   The present invention is not a measurement using introduction of carrier fringes as described above, but a three-dimensional shape measurement method and apparatus different from the background art in that it is a collective measurement method that eliminates the need for introduction of carrier fringes. It is about. Means for solving the above problems will be described below using the present invention.

本願の第1の発明は、「2波長ないし3波長以上からなる複数の波長の単色光を測定対象面と参照面に照射し、両面からの反射光の干渉により得られる干渉画像から、2波長の場合は前記画像内の互いに異なる4点以上、3波長以上の場合は3点以上を選択し、前記各点における干渉輝度信号に、波長番号jの波長をλ(j)、波長番号jの平均輝度をa(j)、干渉変調度をb(j)、点iの高さをz(i)として、
点iにおける波長番号jの輝度g(i,j)が、
g(i,j)=a(j)[1+b(j)*cos{4πz(i)/λ(j)}]
であらわされる干渉縞モデルを適合することにより、前記各点iの高さz(i)、各波長番号j番号jの平均輝度a(j)および干渉変調度b(j)を求めることを特徴とする表面形状測定」方法およびその方法を用いた装置である。
According to the first invention of the present application, “from the interference image obtained by irradiating the measurement target surface and the reference surface with monochromatic light having a plurality of wavelengths consisting of two wavelengths or more than three wavelengths and interference of reflected light from both surfaces, two wavelengths In the case of 4 or more different from each other in the image, 3 or more points are selected in the case of 3 wavelengths or more, and the wavelength of the wavelength number j is λ (j) and the wavelength number j Assuming that the average luminance is a (j), the degree of interference modulation is b (j), and the height of point i is z (i)
The luminance g (i, j) of wavelength number j at point i is
g (i, j) = a (j) [1 + b (j) * cos {4πz (i) / λ (j)}]
The height z (i) of each point i, the average luminance a (j) of each wavelength number j number j, and the degree of interference modulation b (j) are obtained by fitting the interference fringe model represented by A surface shape measurement method and an apparatus using the method.

すなわち、背景技術に記載の従来のキャリア縞導入法と異なり、干渉画像から2種類以上m種類の波長を用いて撮像した干渉画像から、波長の種類が2種類の場合は4点以上、また、波長の種類が3種類以上の場合は3点以上の各点毎の干渉輝度信号を選択して、前記干渉輝度信号に干渉縞モデルを最小自乗適合(フィッティング)して各点の高さを一括して求める方法及び該方法を用いて測定できる装置に関する発明である。   That is, unlike the conventional carrier fringe introduction method described in the background art, from an interference image captured using two or more types of wavelengths from the interference image, when there are two types of wavelengths, four or more points, When there are three or more types of wavelengths, select an interference luminance signal for each of three or more points, and fit the interference fringe model to the interference luminance signal with a least-squares fit (fitting) to collectively set the height of each point. It is invention regarding the method which calculates | requires by this, and the apparatus which can be measured using this method.

第2の発明は、「前記選択された点以外の箇所点kの高さを、前記得られたパラメータである波長番号jの平均輝度a(j)および干渉変調度b(j)を用いて、各波長番号の輝度信号g(k,j)から点kにおける波長番号jの位相φ(k,j)を
φ(k,j)=cos−1[{g(k,j)/a(j)−1}/b(j)]
により求め、
得られた波長番号jごとの複数の位相から前記各点kの高さz(k)を求めることを特徴とする表面形状測定」方法およびその方法を用いた装置である。
According to a second aspect of the present invention, “the height of the location point k other than the selected point is determined by using the average luminance a (j) and the degree of interference modulation b (j) of the wavelength number j, which are the obtained parameters. , The phase φ (k, j) of the wavelength number j at the point k from the luminance signal g (k, j) of each wavelength number is expressed as φ (k, j) = cos −1 [{g (k, j) / a ( j) -1} / b (j)]
Sought by
A surface shape measurement method characterized in that the height z (k) of each point k is obtained from a plurality of obtained phases for each wavelength number j, and an apparatus using the method.

すなわち、第1の発明に示す「最小自乗適合」として、干渉縞モデルと干渉画像から得られた干渉輝度信号との誤差が最小となるような未知パラメータを求めて、干渉画像の各点の表面形状や表面高さを求める方法及びその方法を用いた装置に関する発明である。   That is, as the “least square fit” shown in the first invention, an unknown parameter that minimizes the error between the interference fringe model and the interference luminance signal obtained from the interference image is obtained, and the surface of each point of the interference image is obtained. The present invention relates to a method for obtaining a shape and a surface height, and an apparatus using the method.

また、測定対象物の表面形状や表面高さを求めるに際し、本願の第1の発明および第2の発明を用いて、測定対象物の表面形状や表面高さを求める方法およびその装置を用いることにより、測定対象面の各点の高さを効率良く測定することができる。   Further, when determining the surface shape and surface height of the measurement object, the method and apparatus for determining the surface shape and surface height of the measurement object are used using the first and second inventions of the present application. Thus, the height of each point on the measurement target surface can be measured efficiently.

本願発明の方法およびその方法を用いた装置によれば、キャリア縞を導入しないので、測定対象面に在る凹凸の測定できる範囲が、参照面の傾斜角度により制限されることは無い。   According to the method of the present invention and the apparatus using the method, since carrier fringes are not introduced, the range in which the unevenness on the measurement target surface can be measured is not limited by the inclination angle of the reference surface.

また、測定対象面の測定する各点の高さ、輝度や干渉変調度の未知パラメータを干渉縞モデルから最小自乗適合で求めるので、前記キャリア縞を導入法のように測定時に隣接点の影響を受けることがない。   Also, unknown parameters such as the height, brightness, and interferometric modulation degree of each measurement point on the measurement target surface are obtained from the interference fringe model by least squares fitting. I do not receive it.

本願では、測定対象面の測定する各点の高さを含む輝度や干渉変調度を未知パラメータとして、あらわされる干渉縞モデルから最小自乗適合を用いて前記各点の高さを求めたが、その他例えばロバスト推定方法など他の方法で高さを求めることもできる。   In the present application, the brightness of each point to be measured on the measurement target surface and the degree of interference modulation are used as unknown parameters, and the height of each point is obtained using least squares fitting from the interference fringe model represented. For example, the height can be obtained by other methods such as a robust estimation method.

さらに、本願方法およびその方法を用いた装置では、参照面を傾斜させる必要が無く、焦点深度の範囲を越える部分の縞がぼける現象を回避して表面形状測定をすることができる。また、測定対象面の表面形状や表面高さの凹凸に急峻な高さの差が存在しても、表面形状測定をすることができる。   Furthermore, in the method of the present application and the apparatus using the method, it is not necessary to incline the reference surface, and the surface shape measurement can be performed while avoiding the phenomenon that the fringes in the portion exceeding the range of the focal depth are blurred. Further, even if there is a steep difference in height between the surface shape and surface height of the surface to be measured, the surface shape can be measured.

また、本願発明の方法およびそれを用いた装置によれば、周波数推定や多波長アンラッピングなどの複雑な計算処理が不要になり、一括最小自乗適合を実施するだけで測定対象物の表面形状や表面高さを精度良く測定できるというメリットがある。   In addition, according to the method of the present invention and the apparatus using the same, complicated calculation processing such as frequency estimation and multi-wavelength unwrapping is not required, and the surface shape of the measurement object or There is an advantage that the surface height can be measured accurately.

本願発明に係る表面形状測定装置の概略構成を示す図。The figure which shows schematic structure of the surface shape measuring apparatus which concerns on this invention. 本願発明の計算手順のフローチャート。The flowchart of the calculation procedure of this invention. 実施例1の表面形状測定の測定対象モデル。FIG. 3 is a measurement target model for surface shape measurement of Example 1. FIG. 実施例1の3波長個々の干渉画像。The interference image of each of the three wavelengths in Example 1. 実施例1の3波長3点適合結果の高さグラフ。FIG. 3 is a height graph showing a result of three-wavelength three-point matching in Example 1. 実施例1の波長Bの各点の観測値と初期値と推定値の輝度を示すグラフ。6 is a graph showing the observed value, the initial value, and the luminance of the estimated value at each point of wavelength B in Example 1. 実施例1の波長Gの各点の観測値と初期値と推定値の輝度を示すグラフ。6 is a graph showing observed values, initial values, and estimated values of brightness at each point of wavelength G in Example 1. FIG. 実施例1の波長Rの各点の観測値と初期値と推定値の輝度を示すグラフ。6 is a graph showing the observed value, initial value, and estimated value of brightness at each point of wavelength R in Example 1. FIG. 実施例1の点P1の観測値と初期値と推定値の輝度を示すグラフ。The graph which shows the luminance of the observed value of the point P1 of Example 1, an initial value, and an estimated value. 実施例1の点P2の観測値と初期値と推定値の輝度を示すグラフ。The graph which shows the brightness | luminance of the observed value of the point P2 of Example 1, an initial value, and an estimated value. 実施例1の点P3の観測値と初期値と推定値の輝度を示すグラフ。The graph which shows the brightness | luminance of the observed value of the point P3 of Example 1, an initial value, and an estimated value. 本願発明の選択点以外の点の高さ計算手順のフローチャート。The flowchart of the height calculation procedure of points other than the selection point of this invention. 実施例3の50点の各位置の輝度を示すグラフ。10 is a graph showing the luminance at each of the 50 points in Example 3. 実施例3の50点の各位置の位相を示すグラフ。10 is a graph showing the phase at each of 50 positions in Example 3. 実施例3の50点の各位置の高さを示すグラフ。The graph which shows the height of each position of 50 points | pieces of Example 3. FIG. 従来のキャリア縞導入による一括干渉測定光学系の装置概要図。The apparatus outline figure of the collective interference measurement optical system by the introduction of the conventional carrier fringe.

以下、図面を参照して、本発明の実施例を説明する。図1は、本発明の実施例に係る表面形状測定装置の概略構成を示す図である。本願の表面形状測定装置は、半導体ウエハ、液晶パネル、プラズマディスプレイパネル、磁性体フィルム、ガラス基板または金属膜などの表面に微細な凹凸を有する測定対象物30に複数の特定波長帯域の単色光を照射し撮像する光学系ユニット1と、光学系ユニット1を制御する制御系ユニット2と、測定対象物30を載置保持する保持テーブル40とを備える。   Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a diagram showing a schematic configuration of a surface shape measuring apparatus according to an embodiment of the present invention. The surface shape measuring apparatus of the present application applies monochromatic light in a plurality of specific wavelength bands to a measurement object 30 having fine irregularities on the surface of a semiconductor wafer, a liquid crystal panel, a plasma display panel, a magnetic film, a glass substrate or a metal film. The optical system unit 1 which irradiates and images, the control system unit 2 which controls the optical system unit 1, and the holding table 40 which mounts and holds the measurement object 30 are provided.

光学系ユニット1は、測定対象面30Aおよび参照面15に向けて複数の異なる波長からなる単色光を照明光として出力する照明装置10と、各単色光を平行光にするコリメートレンズ11と照明光を測定対象物30の方向にハーフミラー13を通じて反射するとともに測定対象物30の方向からの反射光を通過させるハーフミラー13と、ハーフミラー13で反射され、対物レンズ14を通過してきた単色光を測定対象面30Aと参照面15へ分岐するビームスプリッタ17と、参照光と測定光とがまとめられて発生する干渉を結像する結像レンズ18と、干渉画像を撮像する撮像装置(CCD)19とを備えている。   The optical system unit 1 includes an illumination device 10 that outputs monochromatic light having a plurality of different wavelengths as illumination light toward the measurement target surface 30 </ b> A and the reference surface 15, a collimator lens 11 that collimates each monochromatic light, and illumination light. Is reflected through the half mirror 13 in the direction of the measurement object 30 and allows the reflected light from the direction of the measurement object 30 to pass through, and the monochromatic light reflected by the half mirror 13 and passing through the objective lens 14. A beam splitter 17 that branches to the measurement target surface 30A and the reference surface 15, an imaging lens 18 that forms an interference generated by combining the reference light and the measurement light, and an imaging device (CCD) 19 that captures the interference image. And.

本実施例の照明装置10は、異なる2種類以上の波長の単色光が出力できる例えばLED(Light Emitting Diode)が利用され、例えば次の種類の波長の単色光を出力する。光源波長番号1は、「青」の単色光である波長λB=470nm、光源波長番号2は、「緑」の単色光である波長λG=560nmおよび光源波長番号3は、「赤」の単色光である波長λR=600nmである。   The lighting device 10 of the present embodiment uses, for example, an LED (Light Emitting Diode) that can output monochromatic light of two or more different wavelengths, and outputs monochromatic light of the following types of wavelengths, for example. The light source wavelength number 1 is the wavelength λB = 470 nm, which is “blue” monochromatic light, the light source wavelength number 2 is the wavelength λG = 560 nm, which is the monochromatic light of “green”, and the light source wavelength number 3 is the monochromatic light of “red”. The wavelength λR is 600 nm.

ハーフミラー13は、コリメートレンズ11からの平行光を測定対象物30に向けて反射する一方、測定対象物30と参照面15から戻ってきた反射光を通過させたものである。対物レンズ14は、入射してきた光を測定対象面30Aおよび参照面15に集光するためのレンズである。   The half mirror 13 reflects the parallel light from the collimating lens 11 toward the measurement object 30 and allows the reflected light returned from the measurement object 30 and the reference surface 15 to pass therethrough. The objective lens 14 is a lens for condensing incident light on the measurement target surface 30 </ b> A and the reference surface 15.

ビームスプリッタ17は、照明光を参照面15で反射される参照光と、測定対象面30Aで反射させる測定光とに分ける。また、各面で反射して同一光路を戻る参照光と測定光が、干渉を生じさせる。   The beam splitter 17 divides the illumination light into reference light reflected by the reference surface 15 and measurement light reflected by the measurement target surface 30A. Further, the reference light and the measurement light that are reflected from each surface and return on the same optical path cause interference.

参照面15は表面が鏡面加工されており、参照光の進行方向に対して直角に取り付けられている。該参照面15によって反射された参照光は、ビームスプリッタ17によって反射されるようになっている。また、ビームスプリッタ17を通過した測定光は、測定対象面30A上の焦点に向けて集光され、測定対象面30Aで反射する。該反射した測定光は、該ビームスプリッタ17を通過する。   The reference surface 15 has a mirror-finished surface and is attached at right angles to the traveling direction of the reference light. The reference light reflected by the reference surface 15 is reflected by the beam splitter 17. In addition, the measurement light that has passed through the beam splitter 17 is collected toward the focal point on the measurement target surface 30A and reflected by the measurement target surface 30A. The reflected measurement light passes through the beam splitter 17.

ビームスプリッタ17で、参照光と測定光とが再びまとまる。この時、参照面15とビームスプリッタ17との間の距離L1と、ビームスプリッタ17と測定対象面30Aとの間の距離L2との差によって、光路差が生じる。該光路差に応じて干渉が発生する。   The reference beam and the measurement beam are combined again by the beam splitter 17. At this time, an optical path difference is caused by the difference between the distance L1 between the reference surface 15 and the beam splitter 17 and the distance L2 between the beam splitter 17 and the measurement target surface 30A. Interference occurs according to the optical path difference.

撮像装置19は、干渉による輝度の空間的な変動を画像として撮像する。該撮像した画像データは、制御系ユニット2のメモリ21に格納される。   The imaging device 19 captures a spatial variation in luminance due to interference as an image. The captured image data is stored in the memory 21 of the control system unit 2.

本実施例における撮像装置19としては、波長の異なる複数の単色光の2次元の輝度を個々に検出できる構成であれば良く、例えば、カラーフィルタを備えたCCD固体撮像素子、MOSイメージセンサおよびCMOSイメージセンサなどが用いられる。   The imaging device 19 in the present embodiment may be configured to be able to individually detect the two-dimensional luminance of a plurality of monochromatic lights having different wavelengths. For example, a CCD solid-state imaging device including a color filter, a MOS image sensor, and a CMOS An image sensor or the like is used.

制御系ユニット2は、表面形状測定装置全体の統括的な制御や、所定の演算処理をおこなうためのCPU20と、CPU20によって逐次収集された画像データや演算結果などの各種のデータおよびプログラムなどを記憶するメモリ21と、サンプリングタイミングや撮像エリアなどその他の設定情報を入力するマウスやキーボードなどからなる入力部22と、測定対象面30Aの画像などを表示するモニタ23とを備える。   The control system unit 2 stores the overall control of the entire surface shape measuring apparatus and a CPU 20 for performing predetermined arithmetic processing, and various data and programs such as image data and arithmetic results sequentially collected by the CPU 20. And an input unit 22 including a mouse and a keyboard for inputting other setting information such as a sampling timing and an imaging area, and a monitor 23 for displaying an image of the measurement target surface 30A.

CPU20は、いわゆる中央演算処理装置であって、撮像装置19で撮像した干渉光の画像データに基づいて、測定対象面30Aの表面高さを求める演算処理をおこなう。さらに、CPU20には、モニタ23とキーボードやマウスなどの入力部22を配備し、各種の設定情報の入力をおこなう。また、モニタ23には、測定対象面30Aの表面観察画像や凹凸形状などが数値や画像として表示される。   The CPU 20 is a so-called central processing unit, and performs arithmetic processing for obtaining the surface height of the measurement target surface 30A based on the image data of the interference light imaged by the imaging device 19. Further, the CPU 20 is provided with a monitor 23 and an input unit 22 such as a keyboard and a mouse, and inputs various setting information. Further, on the monitor 23, a surface observation image, a concavo-convex shape or the like of the measurement target surface 30A is displayed as a numerical value or an image.

以下、本実施例の特徴部分である図1の表面形状測定装置を用いて行われる本願発明の処理を図2に示すフローチャートに従って説明する。   Hereinafter, the processing of the present invention performed using the surface shape measuring apparatus of FIG. 1 which is a characteristic part of the present embodiment will be described with reference to the flowchart shown in FIG.

まず、測定対象面30Aを2種類以上の波長を用いて波長毎に番号を設け波長番号毎に撮像した干渉画像を取得する。続いて、個々の該干渉画像から、波長の種類が2種類の場合は4点以上、また、波長の種類が3種類の場合は、3点以上の干渉輝度信号を選択し、その輝度信号に干渉縞モデルを最小自乗適合する(フィッティングする)ことにより、各点の高さを一括して計算する。尚、ここに記載の最小自乗適合とは、干渉縞モデルと観測値の誤差が最小になるような未知パラメータを求めることを意味する。すなわち、以下の式(3)で表現される誤差自乗和fを最小にするように各パラメータを求める。   First, the measurement target surface 30A is provided with a number for each wavelength using two or more types of wavelengths, and an interference image captured for each wavelength number is acquired. Subsequently, from each of the interference images, when there are two types of wavelengths, four or more points are selected, and when there are three types of wavelengths, three or more points are selected as the luminance signals. By fitting the interference fringe model to the least squares (fitting), the height of each point is calculated at once. Note that the least square fit described here means obtaining an unknown parameter that minimizes the error between the interference fringe model and the observed value. That is, each parameter is determined so as to minimize the error square sum f expressed by the following equation (3).

上記の干渉縞モデルは、
g(i,j)=a(j)[1+b(j)*cos{4πz(i)/λ(j)}] ・・(2)
ただし、g(i,j)=点iにおける波長番号jの輝度。 a(j)=波長番号jの平均輝度。 b(j)=波長番号jの干渉変調度。 z(i)=点iの高さ。 λ(j)=波長番号jの波長 で示すことができる。
The above interference fringe model is
g (i, j) = a (j) [1 + b (j) * cos {4πz (i) / λ (j)}] (2)
Where g (i, j) = luminance of wavelength number j at point i. a (j) = average luminance of wavelength number j. b (j) = interference modulation degree of wavelength number j. z (i) = height of point i. λ (j) = wavelength with wavelength number j.

当該干渉縞モデルでは、波長番号jの平均輝度a(j)と干渉変調度b(j)の2つのパラメータが、各点で変わらず、波長番号jのみに依存すると仮定する。尚、当該仮定は測定対象面30Aの材質が一定ならば、ほぼ成立する。   In the interference fringe model, it is assumed that the two parameters of the average luminance a (j) and the degree of interference modulation b (j) of the wavelength number j do not change at each point and depend only on the wavelength number j. This assumption is almost valid if the material of the measurement target surface 30A is constant.

また、誤差自乗和をfとし、式(3)で定義する。   Further, the error sum of squares is defined as f, and is defined by Expression (3).

f=ΣΣ[g(i,j)−gij] ・・・・・・・(3)
ただし、g(i,j)=式(2)で示す干渉縞モデル関数値。 gij=観測輝度値 ΣΣは、波長番号jと観測点iに関する総和である。
f = ΣΣ [g (i, j) −gij] 2 (3)
However, g (i, j) = interference fringe model function value shown by Formula (2). g ij = observation luminance value ΣΣ is the sum of the wavelength number j and the observation point i.

波長の数をm個、点の数をn個とすると、未知パラメータ数は、a(j)とb(j)がそれぞれm個,g(i,j)がn個の時(2m+n)個となる。1点からm個の輝度信号が得られるから、最小自乗適合により未知パラメータが求められる条件は、
m*n≧2m+n ・・・・・・・・・・・・・・・(4)
従い、必要なn点の数は、n≧2m/(m−1)点となる。 すなわち、必要条件として、m=2の場合は、n≧4 m=3の場合は、n≧3 が成り立つ。
If the number of wavelengths is m and the number of points is n, the number of unknown parameters is (2m + n) when a (j) and b (j) are m and g (i, j) is n, respectively. It becomes. Since m luminance signals can be obtained from one point, the condition for obtaining an unknown parameter by least squares fit is as follows:
m * n ≧ 2m + n (4)
Therefore, the number of necessary n points is n ≧ 2 m / (m−1) points. That is, as a necessary condition, when m = 2, n ≧ 4, and when m = 3, n ≧ 3 holds.

ここで、上記式(4)の等号が成立する場合、すなわちm=2,n=4またはm=3,n=3の場合は、厳密には最小自乗問題ではなく、(2m+n)元の非線形連立方程式となる。また、等号が成立しない場合は、非線形最小自乗問題となる。   Here, when the equal sign of the above equation (4) holds, that is, when m = 2, n = 4 or m = 3, n = 3, strictly speaking, it is not a least square problem, and (2m + n) element It becomes a nonlinear simultaneous equation. Further, when the equal sign is not established, a nonlinear least square problem is caused.

上記の様に、最小自乗適合は、非線形連立方程式あるいは非線形最小自乗問題となるが、この解法には、最急降下法などがあり、多くの市販ソフトウエアパッケージに内蔵されているソフトウエアを利用して解くことができる。例えば、マイクロソフト社製エクセル(登録商標)には、ソルバー(登録商標)と云う名のソフトウエアがあり、本願においても当該ソフトウエアを利用した。   As described above, the least squares fit is a nonlinear simultaneous equation or a nonlinear least squares problem. This solution includes the steepest descent method, which uses software built into many commercial software packages. Can be solved. For example, Excel (registered trademark) manufactured by Microsoft Corporation has software named Solver (registered trademark), and this software is also used in the present application.

上記の最小自乗適合では、未知パラメータ数が大きくなると計算負荷が大きくなる。従い、測定対象面の撮像画面から有効な点を選択して、最小自乗適合に使用するn点を数個から数十個に制限することが実務的である。故に、実際に有効点の選択時、最小自乗適合に使用するn点の数を数個から数十個に制限すると良い。また、有効な点の選択時には、輝度の異なる点を選択することが必須である。また、測定対象面30Aが平坦で撮像画像内の輝度の変化が小さい場合は、参照面15あるいは測定対象面30Aを傾けて、輝度変化が大きくなるようにしておこなう方が好ましい。   In the above least squares fit, the calculation load increases as the number of unknown parameters increases. Therefore, it is practical to select effective points from the imaging screen of the measurement target surface and limit the n points used for least squares fitting from several to several tens. Therefore, when actually selecting effective points, the number of n points used for least squares fit should be limited to several to several tens. Further, when selecting an effective point, it is essential to select a point having a different luminance. In addition, when the measurement target surface 30A is flat and the change in luminance in the captured image is small, it is preferable that the reference surface 15 or the measurement target surface 30A is tilted to increase the luminance change.

次に、最小自乗適合に使用したn点(i=1,2,・・・・n)以外の点(k点)の高さを求める場合について説明する。最小自乗適合に使用したn点以外の点の高さを求める場合は、最小自乗適合で得られた干渉縞モデルのパラメータである波長番号jの時の平均輝度a(j)と干渉変調度b(j)を用いて、輝度から位相φを求め、多波長アンラッピングをおこなうことにより求めることができる。   Next, a case where the heights of points (k points) other than the n points (i = 1, 2,... N) used for least squares fitting will be described. When obtaining the heights of points other than the n point used for the least-squares fit, the average luminance a (j) at the wavelength number j, which is a parameter of the interference fringe model obtained by the least-squares fit, and the interference modulation degree b Using (j), it is possible to obtain the phase φ from the luminance and perform multi-wavelength unwrapping.

以下に具体的な計算方法について述べる。
前記式(2)の右辺第2項の括弧内は、点iにおける波長番号jの位相φ(i,j)を表し、
φ(i,j)=4πz(i)/λ(j) ・・・・・・・・・・・・・・(5)式(5)を式(2)に代入して、式(6)とする。
A specific calculation method is described below.
The parentheses in the second term on the right side of the equation (2) represent the phase φ (i, j) of the wavelength number j at the point i,
φ (i, j) = 4πz (i) / λ (j) (5) Substituting equation (5) into equation (2), equation (6) ).

g(i,j)=a(j)[1+b(j)*cos{φ(i,j)}] ・・・(6)式(6)より、
φ(i,j)=cos−1[{g(i,j)/a(j)−1}/b(j)]・・(7)ここで、式(7)の逆余弦関数cos−1の値域は、[0,π]とする。
よって、点iにおける波長番号jの輝度から得られる高さ候補z(i,j)は、式(5)と逆余弦関数方程式の一般解表現から、
z(i,j)=[±φ(i,j)/4π+N(i,j)/2]*λ(j)・・(8) ただし、N(i,j)は縞次数(整数)である。
g (i, j) = a (j) [1 + b (j) * cos {φ (i, j)}] (6) From equation (6),
φ (i, j) = cos −1 [{g (i, j) / a (j) −1} / b (j)] (7) where the inverse cosine function cos− of the equation (7) The range of 1 is [0, π].
Therefore, the height candidate z (i, j) obtained from the luminance of the wavelength number j at the point i is expressed by the general solution expression of the equation (5) and the inverse cosine function equation:
z (i, j) = [± φ (i, j) / 4π + N (i, j) / 2] * λ (j) (8) where N (i, j) is the fringe order (integer) is there.

上記で得られた高さ候補から「合致法」と呼ばれる手法により、縞次数N(i,j)を決定して、各波長の高さ候補z(i,j)を求め、以下の式から最終的な高さを求める
(例えば、非特許文献2、非特許文献3参照)。
すなわち、
z(i)=Σz(i,j)/m
ただし、Σは、波長番号j=1〜mに関する総和であり、右辺は高さ候補値の平均値に相当する。
The fringe order N (i, j) is determined from the height candidates obtained above by a technique called “matching method”, and the height candidates z (i, j) of the respective wavelengths are obtained. The final height is obtained (see, for example, Non-Patent Document 2 and Non-Patent Document 3).
That is,
z (i) = Σz (i, j) / m
However, (SIGMA) is the sum total regarding wavelength number j = 1-m, and a right side is equivalent to the average value of a height candidate value.

また、同一材質からなる別の測定対象面30Aの表面形状や表面高さをさらに測定する場合には、最初の干渉画像に本願記載の手法を適用し、得られた干渉縞モデルのパラメータである波長番号jの時の平均輝度a(j)と干渉変調度b(j)を2回目以降の干渉画像にも適用して高さを求めることもできる。これにより高さ測定の高速化が図れる。   Further, when the surface shape and surface height of another measurement target surface 30A made of the same material are further measured, the method described in the present application is applied to the first interference image, and the obtained interference fringe model parameters are obtained. The height can be obtained by applying the average luminance a (j) and the interference modulation degree b (j) at the wavelength number j to the second and subsequent interference images. As a result, the speed of the height measurement can be increased.

次に、最小自乗適合の場合の初期値の設定について記述する。最小自乗適合の場合局所的極小値(以下ローカルミニマムと記載する)が多数存在するため、初期値を適正に設定する必要がある。前記パラメータとしての波長番号jの時の平均輝度a(j)と干渉変調度b(j)の設定に関しては、本願記載の実施例では、下記の方法を用いた。
すなわち、平均輝度a(j)は、輝度値の平均とし、干渉変調度b(j)は、輝度値の最大と最小の差を2a(j)で除した値をそれぞれの初期値の値とした。また、各点の高さについては、各点の予想高さを「初期値」として設定した。
Next, the setting of the initial value in the case of least squares fit is described. In the case of least squares fit, there are a large number of local minimum values (hereinafter referred to as local minimums), so the initial value must be set appropriately. Regarding the setting of the average luminance a (j) and the interferometric modulation factor b (j) at the wavelength number j as the parameter, the following method was used in the examples described in the present application.
That is, the average luminance a (j) is an average of the luminance values, and the interferometric modulation degree b (j) is obtained by dividing the difference between the maximum and minimum luminance values by 2a (j) as the initial value. did. For the height of each point, the expected height of each point was set as the “initial value”.

前記設定した予想高さの初期値が真の値から離れている場合、いわゆるローカルミニマムに陥り正しい高さが得られなくなる現象を生じる。当該現象時の対策として、複数の高さの初期値を準備し最小自乗適合をおこない、それらの結果から最小自乗適合の誤差が最小の値を推定値として採用するようにした。   When the initial value of the set expected height is far from the true value, a phenomenon occurs in which a correct height cannot be obtained due to a so-called local minimum. As countermeasures against this phenomenon, a plurality of initial height values were prepared and least squares fitting was performed, and the value with the least error of least square fitting was adopted as an estimated value from these results.

以下、本実施例の特徴部分である表面形状測定装置全体でおこなわれる処理を図2に示すフローチャートに沿って説明する。尚、本願の実施例1ないし実施例3においては、共通の条件として、光の3原色のRGBからなる3種類の波長に合わせた波長を用いて実施した。つまり、一般に云われる青色波長B=470nm、緑色波長G=560nmおよび赤色波長R=600nmを用いた。さらに、干渉信号パラメータとして、平均輝度a=100、干渉変調度b=1に規格化して、高さ測定をおこなった。   Hereinafter, processing performed by the entire surface shape measuring apparatus which is a characteristic part of the present embodiment will be described with reference to a flowchart shown in FIG. In Examples 1 to 3 of the present application, as common conditions, the wavelength was adjusted to three kinds of wavelengths composed of RGB of the three primary colors of light. That is, generally used blue wavelength B = 470 nm, green wavelength G = 560 nm, and red wavelength R = 600 nm were used. Further, height measurement was performed by standardizing the average luminance a = 100 and the interference modulation degree b = 1 as interference signal parameters.

[実施例1]
<ステップS1> 多波長画像取得
実施例1として、複数の波長、当該実施例の場合、3種類のカラー(青・緑・赤)に合う3種類の波長(470,560,600nm)を使用し、測定点として3点を選択し、理論データへ適合した。測定対象物30の測定対象面30Aの推定対象モデルは、図3に示すように、

曲率半径: 1mm、 画素サイズ:50×50画素、 画素サイズ:1μm、 突起サイズ:4μm×4μm、 突起高さ: 50nm

である突起付き球面を用いた。
[Example 1]
<Step S1> As the multi-wavelength image acquisition example 1, a plurality of wavelengths, in the case of this example, three types of wavelengths (470, 560, 600 nm) suitable for three types of colors (blue, green, red) are used. Three points were selected as measurement points and fitted to the theoretical data. The estimation target model of the measurement target surface 30A of the measurement target 30 is as shown in FIG.

Curvature radius: 1 mm, Pixel size: 50 × 50 pixels, Pixel size: 1 μm, Projection size: 4 μm × 4 μm, Projection height: 50 nm

A spherical surface with protrusions was used.

3種類の波長の干渉画像を光学系ユニット1の撮像装置19にて撮像し、制御系ユニット2のCPU20に送付しメモリ21に格納した。当該3種類の波長の干渉画像を図4に示す。   The interference images of three types of wavelengths were picked up by the image pickup device 19 of the optical system unit 1, sent to the CPU 20 of the control system unit 2, and stored in the memory 21. The interference images of the three types of wavelengths are shown in FIG.

<ステップS2> 使用データ選択
図4に示した3種類の波長の干渉画像について、干渉画像の縦軸をY軸、横軸をX軸として、座標が、P1(X1,Y1)=(5,25)、P2(X2,Y2)=(15,25)およびP3(X3,Y3)=(25,25)の3点を選択した。各種類の波長の干渉縞画像から、選択した各点P1〜P3の観測値をメモリ21から抽出した。各選択点の高さ真値と観測値(輝度)を表1に示した。また、表面形状測定対象の推定対象モデルの干渉信号パラメータは、各点で変わらず波長のみに依存すると仮定し、それぞれ平均輝度a=100、干渉変調度b=1とした。

Figure 2012027009
表1

<ステップS3> 初期値設定
次に、各点(この場合3点)の高さに初期値を設定する。ただ、初期値が真値から離れている場合、ローカルミニマムに陥って、正しい高さが得られなくなる恐れがある。従い、初期値設定においては、予め予想される高さを持って想定し設定する。例えば、当該実施例で測定しようとしている対象モデルの測定対称面30Aについては、真値から約5%低く推定された場合を想定し、下記表2aの様に設定した。 <Step S2> Usage Data Selection For the interference images of the three types of wavelengths shown in FIG. 4, the coordinates are P1 (X1, Y1) = (5, with the vertical axis of the interference image as the Y axis and the horizontal axis as the X axis. 25), P2 (X2, Y2) = (15,25) and P3 (X3, Y3) = (25,25) were selected. The observed values of the selected points P1 to P3 were extracted from the memory 21 from the interference fringe images of each type of wavelength. Table 1 shows the true height and the observed value (brightness) of each selected point. Further, it is assumed that the interference signal parameter of the estimation target model of the surface shape measurement target does not change at each point and depends only on the wavelength, and the average luminance a = 100 and the interference modulation degree b = 1, respectively.

Figure 2012027009
Table 1

<Step S3> Initial value setting Next, an initial value is set to the height of each point (three points in this case). However, if the initial value is far from the true value, it may fall into a local minimum and the correct height may not be obtained. Therefore, in the initial value setting, it is assumed and set with an expected height. For example, the measurement symmetry plane 30A of the target model to be measured in this example is set as shown in Table 2a below, assuming a case where it is estimated about 5% lower than the true value.

また、各波長番号jの時の平均輝度a(j)と干渉変調度b(j)の初期値設定に関しては、平均輝度a(j)は、観測輝度値の平均とし、干渉変調度b(j)は、観測輝度値の最大と最小の差を2×a(j)で除した値とし、表2bのように設定した。

Figure 2012027009
表2a

Figure 2012027009
表2b

<ステップS4> 適合計算
次ステップとして、設定した初期値の値を制御系ユニット2の入力部22から入力し、CPU20にて、前出の様にマイクロソフト社製エクセル(登録商標)のソルバー(登録商標)なるソフトウエアを用いて適合計算をおこなうことにより、本願実施例の干渉縞の図4から、干渉縞パラメータと高さを推定値として取得する。 Further, regarding the initial value setting of the average luminance a (j) and the interference modulation degree b (j) at each wavelength number j, the average luminance a (j) is the average of the observed luminance values, and the interference modulation degree b ( j) is the value obtained by dividing the difference between the maximum and minimum observed luminance values by 2 × a (j), and is set as shown in Table 2b.

Figure 2012027009
Table 2a

Figure 2012027009
Table 2b

<Step S4> As the next step of the adaptation calculation, the set initial value is input from the input unit 22 of the control system unit 2, and the CPU 20 solves the Excel (registered trademark) solver (registered trademark) as described above. By performing the adaptation calculation using software (trademark), the interference fringe parameters and the height are obtained as estimated values from FIG. 4 of the interference fringes of the present embodiment.

<ステップS5> 各点毎の高さ算出
図5に示すように、各選択点P1〜P3の各初期値からスタートして得られた推定値は、それぞれ該真値に合致し、誤差としてはゼロという結果が得られた。
<Step S5> Height calculation for each point As shown in FIG. 5, the estimated values obtained by starting from the initial values of the selected points P1 to P3 match the true values, respectively. A result of zero was obtained.

また、上記3種類の波長、3点の観測値へ適合した場合の3点の位置ごとの輝度推定結果をグラフで示すと、図6、図7および図8となった。図6は、波長B(470nm)の場合を示しており、3点P1,P2およびP3に対し、初期値を50,88および56とした場合、適合後の推定値が47,57,110と観測値と合致した結果となり誤差はゼロであった。   Moreover, when the brightness | luminance estimation result for every position of 3 points | pieces when adapting to the said 3 types of wavelengths and 3 observation values is shown with a graph, it became FIG.6, FIG.7 and FIG.8. FIG. 6 shows the case of the wavelength B (470 nm). When the initial values are set to 50, 88, and 56 for the three points P1, P2, and P3, the estimated values after adaptation are 47, 57, and 110, respectively. The result was consistent with the observed value and the error was zero.

図7は、波長G(560nm)の場合を示しており、3点P1,P2およびP3に対し、初期値を69,109および108と設定した場合、適合後の推定値と観測値が合致した結果となり、同様に誤差はゼロであった。図8は、波長R(600nm)の場合を示しており、3点P1,P2およびP3に対し、初期値を113,109および110とした場合、適合後の推定値と観測値が合致した結果となり、同様に誤差はゼロであったことを示している。   FIG. 7 shows the case of the wavelength G (560 nm). When the initial values are set to 69, 109, and 108 with respect to the three points P1, P2, and P3, the estimated value after the matching and the observed value match. As a result, the error was zero as well. FIG. 8 shows the case of the wavelength R (600 nm). When the initial values are 113, 109, and 110 for the three points P1, P2, and P3, the result of matching the estimated value after the match with the observed value. Similarly, the error is zero.

上記適合計算後の結果に基づき、得られた高さは、3点P1,P2およびP3それぞれに、設定した初期値では、それぞれ371,518および618の結果に対し、適合計算後の推定値は、各点ごとに、Z(P1)=390,Z(P2)=545およびZ(P3)=650となり、図5に示すように、高さ真値と高さ推定値が一致し誤差もゼロであった。   Based on the results after the fitting calculation, the obtained heights are the three points P1, P2 and P3, respectively. With the initial values set, the estimated values after the fitting calculation are 371, 518 and 618, respectively. For each point, Z (P1) = 390, Z (P2) = 545, and Z (P3) = 650, and as shown in FIG. Met.

次に、上記実施結果をもとに、上記3点の各波長の種類ごとの輝度をグラフで示すと図9、図10および図11となった。図9は点P1における各3種類の波長ごとの輝度を示し、この場合でも、観測値と適合計算後の推定値とが一致していることがわかる。図10は点P2における各波長の種類ごとの輝度をグラフで示し、この場合でも、観測値と適合計算後の推定値とが一致していることがわかる。さらに、図11は、点P3における波長の種類ごとの輝度をグラフで示し、この場合でも、観測値と適合計算後の推定値とが一致していることがわかる。   Next, based on the above-described results, the luminance for each type of each of the three wavelengths is shown as a graph in FIG. 9, FIG. 10, and FIG. FIG. 9 shows the luminance for each of the three types of wavelengths at the point P1, and even in this case, it can be seen that the observed value and the estimated value after the matching calculation match. FIG. 10 is a graph showing the luminance of each wavelength type at the point P2, and it can be seen that the observed value and the estimated value after the calculation of matching are also in this case. Further, FIG. 11 is a graph showing the luminance for each type of wavelength at the point P3. Even in this case, it can be seen that the observed value and the estimated value after the matching calculation match.

<ステップS6> 全点の高さ算出完了
上記各選択点すべての各高さz(i)が求まったことにより、当該表面形状測定が完了したことになる。
<Step S6> Completion of Height Calculation of All Points When the heights z (i) of all the selected points are obtained, the surface shape measurement is completed.

[実施例2]
次に、適合試算するために選択した点以外の点(k点)の高さを求めるには、実施例1にて、最小自乗適合によって得られた干渉縞モデルのパラメータである波長番号jの時の平均輝度a(j)及び干渉変調度b(j)を用いて、他の点の測定輝度から求めた位相を用いて高さを求める。
[Example 2]
Next, in order to obtain the height of a point (point k) other than the point selected for the fitting trial calculation, the wavelength number j that is a parameter of the interference fringe model obtained by the least square fitting in the first embodiment is used. Using the average luminance a (j) and the interferometric modulation factor b (j), the height is obtained using the phase obtained from the measured luminance at other points.

例として、適合で得られた干渉縞モデルのパラメータである、波長番号jの時の平均輝度a(j)及び干渉変調度b(j)を用いて、位相を求め「合致法」を用いて輝度計算から高さを計算した事例を図12に示すフローチャートに従って説明する。この場合、図12のステップS1から、ステップS4までは、実施例1にて説明したとおりである。以下ステップS55から説明する。   As an example, the phase is obtained using the average luminance a (j) and the interference modulation degree b (j) at the wavelength number j, which are parameters of the interference fringe model obtained by fitting, and the “matching method” is used. An example of calculating the height from the luminance calculation will be described with reference to the flowchart shown in FIG. In this case, steps S1 to S4 in FIG. 12 are as described in the first embodiment. Hereinafter, it demonstrates from step S55.

<ステップS55> 選択点以外の点の抽出
実施例1と同一の干渉画像から、選択点以外の点の高さを求めた。ここで、実施例1にて選択した点以外の点として、図4に示すように点P4(1,25)を選択して例示する。
<Step S55> Extraction of points other than selected points From the same interference image as in Example 1, the heights of points other than the selected points were obtained. Here, as a point other than the point selected in the first embodiment, a point P4 (1, 25) is selected and illustrated as shown in FIG.

<ステップS66> 位相計算
点P4(X4,Y4)=(1,25)における各波長に対応した位相(単位:ラジアン)を前記式(7)により求める。該結果を表3に示す。

Figure 2012027009
表3
<ステップS77> アンラッピング
さらに、上記各波長ごとに得られた位相の値から、前記式(8)および式(9)を用いて高さ計算をおこなう。この時、前記計算結果の位相から干渉次数を変えた高さ候補値を選択する。干渉次数を変えた高さ候補値の一覧を求める、この場合の次数の計算範囲は、予想高さに基づき決定する。この場合、高さ範囲が0〜700nmと仮定した。上記からの干渉次数を変えた高さ候補値計算結果を表4に示す。

Figure 2012027009
表4

<ステップS88> 高さの選定
次に、干渉次数を変えた高さ候補値計算結果から、最近傍の波長間の合致誤差が最も小さい組み合わせを探索する。この場合、[(最大値)−(最小値)]を用いて、値が最小にある干渉次数を選択した。表4によれば、干渉次数=+1の場合、合致誤差が「0」であるので、この時の高さ300nmを採用した。結果として、この値は、真値に一致する。以上が、「合致法」に基づく適合に使用した点以外の高さとしての当初選択したn点以外の点(k点)P4(1,25)の高さを求めた事例である。 <Step S66> Phase calculation The phase (unit: radians) corresponding to each wavelength at the point P4 (X4, Y4) = (1, 25) is obtained by the above equation (7). The results are shown in Table 3.

Figure 2012027009
Table 3
<Step S77> Unwrapping Further, the height calculation is performed from the phase value obtained for each wavelength using the equations (8) and (9). At this time, a height candidate value is selected by changing the interference order from the phase of the calculation result. A list of height candidate values with different interference orders is obtained, and the calculation range of the orders in this case is determined based on the expected height. In this case, the height range was assumed to be 0 to 700 nm. Table 4 shows the height candidate value calculation results obtained by changing the interference order from the above.

Figure 2012027009
Table 4

<Step S88> Selection of Height Next, a combination with the smallest matching error between the nearest wavelengths is searched from the calculation result of the height candidate value with the interference order changed. In this case, using [(maximum value) − (minimum value)], the interference order having the minimum value was selected. According to Table 4, when the interference order is +1, since the matching error is “0”, the height of 300 nm at this time is adopted. As a result, this value matches the true value. The above is an example in which the height of the point (k point) P4 (1, 25) other than the n point initially selected as the height other than the point used for the matching based on the “matching method” is obtained.

[実施例3]
次に、同様にして、同じ最小自乗適合結果を用いて、参照輝度信号が多数ある例として50点の場合の実施例とその結果を示す。実施例2にて新たに選択した点(k点)P4(X4,Y4)=(1,25)の高さを求めた事例と同様に、座標(x=1〜50,y=25)の50点について「合致法」を用いて高さを求めた。
[Example 3]
Next, in the same manner, an example in which there are 50 reference luminance signals using the same least squares fit result and an example of the result in the case of 50 points will be shown. Similarly to the case where the height of the point (k point) P4 (X4, Y4) = (1,25) newly selected in Example 2 is obtained, the coordinates (x = 1 to 50, y = 25) The height was determined using the “match method” for 50 points.

各点の波長の種類ごとの輝度データを図13、各点の波長ごとの位相データを図14および各点の高さを図15に示す。この場合も全点で正しい推定ができている。特に、球面の頂点の部分(図の水平軸中央)のエッジ部の急峻な突起部分の段差が、鈍り無く測定されているが、これは、従来技術のキャリア縞導入法ではできなかったところが改善された測定結果である。   FIG. 13 shows the luminance data for each type of wavelength at each point, FIG. 14 shows the phase data for each wavelength at each point, and FIG. 15 shows the height of each point. In this case as well, correct estimation is made at all points. In particular, the step of the steep protrusion at the edge of the spherical apex (the center of the horizontal axis in the figure) is measured without dullness, but this is an improvement that was not possible with the conventional carrier fringe introduction method. Is a measured result.

本願発明の干渉縞モデルを適合することにより各点の高さを一括して計算する表面形状や表面高さ測定では、従来のキャリア縞導入法に比較して多くの利点が得られる。まず、キャリア縞を導入しないので、測定対象物上の突起部分などを含む場合でも従来法にあった様な参照面の傾斜角度に制限されることなく表面形状や表面高さが測定ができる。   By adapting the interference fringe model of the present invention, the surface shape and the surface height measurement that collectively calculate the height of each point have many advantages over the conventional carrier fringe introduction method. First, since carrier fringes are not introduced, the surface shape and the surface height can be measured without being restricted by the inclination angle of the reference surface as in the conventional method even when a protrusion on the object to be measured is included.

特に、測定対象面上に、導入した干渉縞が消える程度の突起部分など急峻な傾斜領域があった場合の測定時にも、従来法にあった様な参照面の傾斜角度に制限されるということなどなく表面形状や表面高さが測定ができる。   In particular, even when there is a steep slope area such as a protrusion on the surface to be measured where the introduced interference fringes disappear, it is limited to the tilt angle of the reference surface as in the conventional method. The surface shape and surface height can be measured.

各点の高さを未知パラメータとして、最小自乗適合で求めるので隣接点間の影響が無く水平方向の分解能低下は無い。従い、段差付近でも正しい測定値が得られる。   Since the height of each point is determined as an unknown parameter by least square fitting, there is no influence between adjacent points and there is no reduction in resolution in the horizontal direction. Therefore, the correct measured value can be obtained even near the step.

周波数推定や多波長アンラッピングなどの複雑な計算処理が不要であり、一括して最小自乗適合を実施するだけで、測定対象物の表面形状や表面高さを測定することができる。   Complex calculation processing such as frequency estimation and multi-wavelength unwrapping is not required, and the surface shape and surface height of the measurement object can be measured only by performing least squares fitting together.

1・・・光学系ユニット
30・・測定対象物
30A・測定対象面
2・・・制御系ユニット
40・・保持テーブル
15・・参照面
10・・照明装置
11・・コリメートレンズ
13・・ハーフミラー
14・・対物レンズ
17・・ビームスプリッタ
18・・結像レンズ
19・・撮像装置
10・・光源
20・・CPU
21・・メモリ
22・・入力部
23・・モニタ
L1・・距離1
L2・・距離2
DESCRIPTION OF SYMBOLS 1 ... Optical system unit 30 ... Object to be measured 30A Measurement surface 2 ... Control system unit 40 ... Holding table 15 ... Reference surface 10 ... Illuminating device 11 ... Collimating lens 13 ... Half mirror 14. Objective lens 17 Beam splitter 18 Imaging lens 19 Imaging device 10 Light source 20 CPU
21..Memory 22..Input unit 23..Monitor L1..Distance 1
L2 ... Distance 2

Claims (8)

2波長ないし3波長以上からなる複数の波長の単色光を測定対象面と参照面に照射し、両面からの反射光の干渉により得られる干渉画像から、2波長の場合は前記画像内の互いに異なる4点以上、3波長以上の場合は3点以上を選択し、前記各点における干渉輝度信号に、波長番号jの波長をλ(j)、波長番号jの平均輝度をa(j)、干渉変調度をb(j)、点iの高さをz(i)として、
点iにおける波長番号jの輝度g(i,j)が、
g(i,j)=a(j)[1+b(j)*cos{4πz(i)/λ(j)}]
であらわされる干渉縞モデルを適合することにより、前記各点iの高さz(i)、
各波長番号jの平均輝度a(j)および干渉変調度b(j)を求めることを特徴とする表面形状測定方法。
From the interference image obtained by irradiating the measurement target surface and the reference surface with monochromatic light having a plurality of wavelengths consisting of two wavelengths or three or more wavelengths and interference of reflected light from both surfaces, in the case of two wavelengths, they are different from each other in the image. If there are 4 points or more and 3 wavelengths or more, select 3 points or more, and the interference luminance signal at each point is λ (j) as the wavelength of wavelength number j, a (j) as the average luminance of wavelength number j, and interference The modulation degree is b (j) and the height of the point i is z (i).
The luminance g (i, j) of wavelength number j at point i is
g (i, j) = a (j) [1 + b (j) * cos {4πz (i) / λ (j)}]
By fitting an interference fringe model expressed by: height z (i) of each point i,
A surface shape measuring method, wherein an average luminance a (j) and an interference modulation degree b (j) of each wavelength number j are obtained.
前記選択された点以外の箇所点kの高さを、前記得られたパラメータである波長番号jの平均輝度a(j)および干渉変調度b(j)を用いて、各波長番号の輝度信号g(k,j)から点kにおける波長番号jの位相φ(k,j)を
φ(k,j)=cos−1[{g(k,j)/a(j)−1}/b(j)]
により求め、
得られた波長番号jごとの複数の位相から前記各点kの高さz(k)を求めることを特徴とする請求項1に記載の表面形状測定方法。
Using the average luminance a (j) and the degree of interference modulation b (j) of the wavelength number j, which are the obtained parameters, the height of the location point k other than the selected point, the luminance signal of each wavelength number The phase φ (k, j) of wavelength number j at point k from g (k, j) is changed to φ (k, j) = cos −1 [{g (k, j) / a (j) −1} / b (J)]
Sought by
2. The surface shape measuring method according to claim 1, wherein the height z (k) of each point k is obtained from a plurality of phases obtained for each wavelength number j.
撮像光学手段を用いて2波長ないし3波長以上からなる複数の波長の単色光を測定対象面と参照面に照射し両面からの反射光の干渉により得られる干渉画像から、2波長の場合は前記画像内の互いに異なる4点以上、3波長以上の場合は3点以上を選択し、制御系ユニットを用いて前記各点における干渉輝度信号に、波長番号jの波長をλ(j)、波長番号jの平均輝度をa(j)、干渉変調度をb(j)、点iの高さをz(i)として、点iにおける波長番号jの輝度g(i,j)が、
g(i,j)=a(j)[1+b(j)*cos{4πz(i)/λ(j)}]
であらわされる干渉縞モデルを適合したすることにより、前記各点iの高さz(i)、各波長番号jの平均輝度a(j)および干渉変調度b(j)を求めることを特徴とする表面形状測定装置。
From the interference image obtained by irradiating the measurement target surface and the reference surface with monochromatic light having a plurality of wavelengths consisting of two wavelengths or three or more wavelengths using the imaging optical means and interference of reflected light from both surfaces, If there are four or more different points in the image and three or more wavelengths, select three or more points, and use the control unit to set the wavelength of wavelength number j to λ (j) and the wavelength number to the interference luminance signal at each point. The average luminance of j is a (j), the degree of interference modulation is b (j), the height of point i is z (i), and the luminance g (i, j) of wavelength number j at point i is
g (i, j) = a (j) [1 + b (j) * cos {4πz (i) / λ (j)}]
The height z (i) of each point i, the average luminance a (j) and the degree of interference modulation b (j) of each wavelength number j are obtained by adapting the interference fringe model expressed by Surface shape measuring device.
前記選択された点以外の箇所点kの高さを、前記得られたパラメータである波長番号jの平均輝度をa(j)および干渉変調度をb(j)を用いて、各波長の輝度信号g(k、j)から点kにおける波長番号jの位相φ(k,j)を
φ(k,j)=cos−1[{g(k,j)/a(j)−1}/b(j)]
により求め、得られた波長番号jごとの複数の位相から前記各点kの高さz(k)を求めることを特徴とする請求項3に記載の表面形状測定装置。
Using the height of the point k other than the selected point, the average brightness of the obtained parameter wavelength number j as a (j) and the degree of interference modulation as b (j), the brightness of each wavelength The phase φ (k, j) of the wavelength number j at the point k from the signal g (k, j) is changed to φ (k, j) = cos −1 [{g (k, j) / a (j) −1} / b (j)]
The surface shape measuring device according to claim 3, wherein the height z (k) of each point k is obtained from a plurality of phases obtained for each wavelength number j.
2波長ないし3波長以上からなる複数の波長の単色光を測定対象面と参照面からの反射光から得られる干渉画像から、2波長の場合は前記画像内の互いに重なる4点以上、3波長以上の場合は3点以上を選択し、前記各点における干渉輝度信号の、波長番号jの波長がλ(j)であり、且つ、未知パラメータが波長番号jの平均輝度a(j)、干渉変調度b(j)および点iの高さz(i)としたとき、
点iにおける波長番号jの輝度g(i,j)が、
g(i,j)=a(j)[1+b(j)*cos{4πz(i)/λ(j)}]
であらわされる干渉縞モデルを適合したi×j個の式から、前記各点iの高さz(i)、各波長番号jの平均輝度a(j)および干渉変調度b(j)を求めることを特徴とする表面形状測定方法。
From the interference image obtained from the reflected light from the measurement object surface and the reference surface, monochromatic light having a plurality of wavelengths consisting of two to three wavelengths or more, four points or more, three wavelengths or more overlapping each other in the image in the case of two wavelengths In this case, three or more points are selected, and the wavelength of wavelength number j of the interference luminance signal at each point is λ (j), and the unknown parameter is the average luminance a (j) of wavelength number j and interference modulation. Degree b (j) and the height z (i) of point i,
The luminance g (i, j) of wavelength number j at point i is
g (i, j) = a (j) [1 + b (j) * cos {4πz (i) / λ (j)}]
The height z (i) of each point i, the average luminance a (j) of each wavelength number j, and the degree of interference modulation b (j) are obtained from i × j equations that fit the interference fringe model expressed by A surface shape measuring method characterized by the above.
前記選択された点以外の箇所点kの高さを、前記得られたパラメータである波長番号jの平均輝度a(j)および干渉変調度b(j)としたとき、各波長番号ごとの、輝度から点kにおける波長番号jの位相φ(k,j)が、
φ(k,j)=cos−1[{g(k,j)/a(j)−1}/b(j)]
であらわされるとき、
得られた波長番号jごとの複数の位相から前記各点kの高さz(k)、各波長番号jの平均輝度a(j)および干渉変調度b(j)を求めることを特徴とする請求項5に記載の表面形状測定方法。
When the height of the location point k other than the selected point is defined as the average luminance a (j) and the interferometric modulation factor b (j) of the wavelength number j that are the obtained parameters, for each wavelength number, From the luminance, the phase φ (k, j) of the wavelength number j at the point k is
φ (k, j) = cos −1 [{g (k, j) / a (j) −1} / b (j)]
When expressed
A height z (k) of each point k, an average luminance a (j) and an interference modulation degree b (j) of each wavelength number j are obtained from a plurality of phases obtained for each wavelength number j. The surface shape measuring method according to claim 5.
撮像光学手段を用いて2波長ないし3波長以上からなる複数の波長の単色光を測定対象面と参照面から得られる干渉画像を、2波長の場合は前記画像内の互いに重なる4点以上、3波長以上の場合は3点以上を選択し、制御系ユニットを用いて前記各点における干渉輝度信号の、波長番号jの波長がλ(j)であり、且つ、未知パラメータが波長番号jの平均輝度a(j)、干渉変調度b(j)および点iの高さz(i)としたとき、
点iにおける波長番号jの輝度g(i,j)が、
g(i,j)=a(j)[1+b(j)*cos{4πz(i)/λ(j)}]
であらわされる干渉縞モデルを適合したi×j個の式から、前記各点iの高さz(i)、各波長番号jの平均輝度a(j)および干渉変調度b(j)を
を求めることを特徴とする表面形状測定装置。
In the case of two wavelengths, interference images obtained by using imaging optical means to obtain monochromatic light having a plurality of wavelengths of two wavelengths or three or more wavelengths from the measurement target surface and the reference surface are four or more overlapping points in the image. If the wavelength is greater than or equal to the wavelength, select three or more points, and the wavelength of wavelength number j of the interference luminance signal at each point using the control system unit is λ (j), and the unknown parameter is the average of wavelength number j When the luminance a (j), the interferometric modulation degree b (j), and the height z (i) of the point i are given,
The luminance g (i, j) of wavelength number j at point i is
g (i, j) = a (j) [1 + b (j) * cos {4πz (i) / λ (j)}]
The height z (i) of each point i, the average luminance a (j) of each wavelength number j, and the degree of interference modulation b (j) are obtained from i × j equations that fit the interference fringe model expressed by A surface shape measuring device characterized by being obtained.
前記選択された点以外の箇所点kの高さを、前記得られたパラメータである波長番号jの平均輝度a(j)および干渉変調度b(j)としたとき、各波長ごとに、輝度から点kにおける波長番号jの位相φ(k,j)が、
φ(k,j)=cos−1[{g(k,j)/a(j)−1}/b(j)]
であらわされるとき、
得られた波長番号jごとの複数の位相から前記各点kの高さz(k)、各波長番号jの平均輝度a(j)および干渉変調度b(j)を求めることを特徴とする請求項7に記載の表面形状測定装置。
When the height of the location point k other than the selected point is defined as the average luminance a (j) and the interferometric modulation factor b (j) of the wavelength number j as the obtained parameters, the luminance for each wavelength. To the phase k of the wavelength number j at point k is
φ (k, j) = cos −1 [{g (k, j) / a (j) −1} / b (j)]
When expressed
A height z (k) of each point k, an average luminance a (j) and an interference modulation degree b (j) of each wavelength number j are obtained from a plurality of phases obtained for each wavelength number j. The surface shape measuring apparatus according to claim 7.
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JP2014006242A (en) * 2012-05-31 2014-01-16 Toray Eng Co Ltd Film shape measurement method for thin film
JP2014085112A (en) * 2012-10-19 2014-05-12 Toray Eng Co Ltd Calculation method of crosstalk correction coefficient and film thickness measurement device of transparent film having calculation function of crosstalk correction coefficient
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