JP2012021209A5 - - Google Patents

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Publication number
JP2012021209A5
JP2012021209A5 JP2010161679A JP2010161679A JP2012021209A5 JP 2012021209 A5 JP2012021209 A5 JP 2012021209A5 JP 2010161679 A JP2010161679 A JP 2010161679A JP 2010161679 A JP2010161679 A JP 2010161679A JP 2012021209 A5 JP2012021209 A5 JP 2012021209A5
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JP
Japan
Prior art keywords
diffusion chamber
communication port
ceiling portion
overlapped
vapor
Prior art date
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Application number
JP2010161679A
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English (en)
Japanese (ja)
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JP2012021209A (ja
JP5735226B2 (ja
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Priority to JP2010161679A priority Critical patent/JP5735226B2/ja
Priority claimed from JP2010161679A external-priority patent/JP5735226B2/ja
Publication of JP2012021209A publication Critical patent/JP2012021209A/ja
Publication of JP2012021209A5 publication Critical patent/JP2012021209A5/ja
Application granted granted Critical
Publication of JP5735226B2 publication Critical patent/JP5735226B2/ja
Active legal-status Critical Current
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JP2010161679A 2010-07-16 2010-07-16 蒸着装置及び蒸着方法 Active JP5735226B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010161679A JP5735226B2 (ja) 2010-07-16 2010-07-16 蒸着装置及び蒸着方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010161679A JP5735226B2 (ja) 2010-07-16 2010-07-16 蒸着装置及び蒸着方法

Publications (3)

Publication Number Publication Date
JP2012021209A JP2012021209A (ja) 2012-02-02
JP2012021209A5 true JP2012021209A5 (cg-RX-API-DMAC10.html) 2013-07-04
JP5735226B2 JP5735226B2 (ja) 2015-06-17

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ID=45775695

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010161679A Active JP5735226B2 (ja) 2010-07-16 2010-07-16 蒸着装置及び蒸着方法

Country Status (1)

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JP (1) JP5735226B2 (cg-RX-API-DMAC10.html)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2595744Y2 (ja) * 1992-05-12 1999-06-02 宮城沖電気株式会社 半導体製造装置
CH687258A5 (de) * 1993-04-22 1996-10-31 Balzers Hochvakuum Gaseinlassanordnung.
JP4239520B2 (ja) * 2002-08-21 2009-03-18 ソニー株式会社 成膜装置およびその製造方法、並びにインジェクタ
JP4450589B2 (ja) * 2003-09-09 2010-04-14 株式会社アルバック 成膜装置
JP2006111926A (ja) * 2004-10-15 2006-04-27 Hitachi Zosen Corp 蒸着装置
JP2006225758A (ja) * 2005-01-21 2006-08-31 Mitsubishi Heavy Ind Ltd 真空蒸着装置
JP4797438B2 (ja) * 2005-05-17 2011-10-19 ソニー株式会社 有機電界発光素子および表示装置
JP5043394B2 (ja) * 2006-09-29 2012-10-10 東京エレクトロン株式会社 蒸着装置およびその運転方法
JP2008184666A (ja) * 2007-01-30 2008-08-14 Phyzchemix Corp 成膜装置
JP5081710B2 (ja) * 2008-04-28 2012-11-28 株式会社アルバック 成膜装置

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