JP2011521105A5 - - Google Patents
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- Publication number
- JP2011521105A5 JP2011521105A5 JP2011509483A JP2011509483A JP2011521105A5 JP 2011521105 A5 JP2011521105 A5 JP 2011521105A5 JP 2011509483 A JP2011509483 A JP 2011509483A JP 2011509483 A JP2011509483 A JP 2011509483A JP 2011521105 A5 JP2011521105 A5 JP 2011521105A5
- Authority
- JP
- Japan
- Prior art keywords
- coating
- substrate
- tungsten
- percent
- percentage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011248 coating agent Substances 0.000 claims 3
- 238000000576 coating method Methods 0.000 claims 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 2
- 229910052721 tungsten Inorganic materials 0.000 claims 2
- 239000010937 tungsten Substances 0.000 claims 2
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N oxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims 1
Claims (1)
前記基板上に形成されるコーティングであって、前記コーティングが第１部分及び第２部分を有し、前記第２部分がニッケル、タングステン、及び酸素を含み、前記第２部分に含まれるタングステンの重量百分率が１〜２０パーセントである、前記コーティングとを備える、物品。 A substrate,
A coating formed on the substrate, wherein the coating has a first portion and a second portion, the second portion includes nickel, tungsten, and oxygen, and the weight of tungsten contained in the second portion. An article comprising the coating, wherein the percentage is 1 to 20 percent.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/120,564 | 2008-05-14 | ||
| US12/120,568 | 2008-05-14 | ||
| US12/120,564 US20090286103A1 (en) | 2008-05-14 | 2008-05-14 | Coated articles and related methods |
| US12/120,568 US20090283410A1 (en) | 2008-05-14 | 2008-05-14 | Coated articles and related methods |
| PCT/US2009/002961 WO2009139866A2 (en) | 2008-05-14 | 2009-05-13 | Coated articles and related methods |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011521105A JP2011521105A (en) | 2011-07-21 |
| JP2011521105A5 true JP2011521105A5 (en) | 2012-05-24 |
| JP5675590B2 JP5675590B2 (en) | 2015-02-25 |
Family
ID=40941913
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011509483A Expired - Fee Related JP5675590B2 (en) | 2008-05-14 | 2009-05-13 | Coated article and associated method |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP2310555A2 (en) |
| JP (1) | JP5675590B2 (en) |
| CN (1) | CN102089464A (en) |
| CA (1) | CA2725579A1 (en) |
| WO (1) | WO2009139866A2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB201211769D0 (en) * | 2011-12-09 | 2012-08-15 | Karsten Mfg Corp | Divot tools and methods of making tools |
| US8529381B2 (en) * | 2011-10-14 | 2013-09-10 | Karsten Manufacturing Corporation | Divot tools and methods of making divot tools |
| JP6103050B2 (en) * | 2013-05-20 | 2017-03-29 | ソニー株式会社 | Manufacturing method of plating film |
| CN103668370A (en) * | 2013-12-19 | 2014-03-26 | 潮州市连思科技发展有限公司 | Method for pulse plating of disk |
| WO2017011640A1 (en) * | 2015-07-15 | 2017-01-19 | Xtalic Corporation | Electrodeposition methods and coated components |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58212840A (en) * | 1982-06-03 | 1983-12-10 | Mishima Kosan Co Ltd | Casting mold for continuous casting |
| JPH08119645A (en) * | 1994-10-27 | 1996-05-14 | Asahi Glass Co Ltd | Mold for glass formation and formation of glass product for cathode-ray tube |
| JP2001055927A (en) * | 1999-08-12 | 2001-02-27 | Osaka Gas Co Ltd | Member for turbine combustion part |
| US7425255B2 (en) * | 2005-06-07 | 2008-09-16 | Massachusetts Institute Of Technology | Method for producing alloy deposits and controlling the nanostructure thereof using negative current pulsing electro-deposition |
-
2009
- 2009-05-13 CA CA2725579A patent/CA2725579A1/en not_active Abandoned
- 2009-05-13 WO PCT/US2009/002961 patent/WO2009139866A2/en active Application Filing
- 2009-05-13 CN CN2009801279283A patent/CN102089464A/en active Pending
- 2009-05-13 EP EP09746953A patent/EP2310555A2/en not_active Withdrawn
- 2009-05-13 JP JP2011509483A patent/JP5675590B2/en not_active Expired - Fee Related
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