JP2011506094A - 触媒すすフィルタのための不動態化しない被覆法 - Google Patents
触媒すすフィルタのための不動態化しない被覆法 Download PDFInfo
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- JP2011506094A JP2011506094A JP2010539615A JP2010539615A JP2011506094A JP 2011506094 A JP2011506094 A JP 2011506094A JP 2010539615 A JP2010539615 A JP 2010539615A JP 2010539615 A JP2010539615 A JP 2010539615A JP 2011506094 A JP2011506094 A JP 2011506094A
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- GLAYWTQUVABFHB-DFWYDOINSA-N NC(CC(C(=O)O)C(=O)O)C(=O)O.N[C@@H](CC(C(=O)O)C(=O)O)C(=O)O Chemical compound NC(CC(C(=O)O)C(=O)O)C(=O)O.N[C@@H](CC(C(=O)O)C(=O)O)C(=O)O GLAYWTQUVABFHB-DFWYDOINSA-N 0.000 description 1
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- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
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- ZOQOMVWXXWHKGT-UHFFFAOYSA-N benzene-1,3,5-tricarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=CC(C(O)=O)=C1.OC(=O)C1=CC(C(O)=O)=CC(C(O)=O)=C1 ZOQOMVWXXWHKGT-UHFFFAOYSA-N 0.000 description 1
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- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
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- 235000011087 fumaric acid Nutrition 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- XEUHNWODXVYLFD-UHFFFAOYSA-N heptanedioic acid Chemical compound OC(=O)CCCCCC(O)=O.OC(=O)CCCCCC(O)=O XEUHNWODXVYLFD-UHFFFAOYSA-N 0.000 description 1
- 239000008241 heterogeneous mixture Substances 0.000 description 1
- YVSCCMNRWFOKDU-UHFFFAOYSA-N hexanedioic acid Chemical compound OC(=O)CCCCC(O)=O.OC(=O)CCCCC(O)=O YVSCCMNRWFOKDU-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
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- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
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- WPBWJEYRHXACLR-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O.OC(=O)CCCCCCCC(O)=O WPBWJEYRHXACLR-UHFFFAOYSA-N 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- NIFHFRBCEUSGEE-UHFFFAOYSA-N oxalic acid Chemical compound OC(=O)C(O)=O.OC(=O)C(O)=O NIFHFRBCEUSGEE-UHFFFAOYSA-N 0.000 description 1
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- YKEKYBOBVREARV-UHFFFAOYSA-N pentanedioic acid Chemical compound OC(=O)CCCC(O)=O.OC(=O)CCCC(O)=O YKEKYBOBVREARV-UHFFFAOYSA-N 0.000 description 1
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- ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical compound CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 description 1
- 229910052611 pyroxene Inorganic materials 0.000 description 1
- 239000013074 reference sample Substances 0.000 description 1
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
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- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
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Abstract
【選択図】図3
Description
試料A
当該基板は、58%の空隙率、23μmの平均孔径(MPS)、300/in2のセル密度、および12ミルの壁厚を有するSiC壁流基板である。当該フィルタ基板は、34mm×34mm×150mmの寸法を有する正方形の切片である。
本試料は、下記の例外を除いては試料Aと同一である。PtおよびPdを浸透させた後、その粉末を500℃で2時間焼成した。その粉砕したスラリーのpHが4.0に到達するように、粉砕の前に酒石酸を添加した。
試料C
本試料のために用いたフィルタ基板は、52%の空隙率、23μmの平均孔径(MPS)、300/in2のセル密度、および12ミルの壁厚を有するSiC壁流基板である。当該フィルタ基板は、34mm×34mm×150mmの寸法を有する正方形の切片である。
試料G
当該基板は、52%の空隙率、23μmの平均孔径(MPS)、300/in2のセル密度、および12ミルの壁厚を有するSiC壁流基板である。当該フィルタ基板は、34mm×34mm×150mmの寸法を有する正方形の切片である。
試料Hは、貴金属の浸透段階を除いては試料Gと同一である。Ptの浸透後、酒石酸(1.5%のシリカ/アルミナ粉末の7重量%)を溶液状態でその粉末に添加し、その後、試料Gの場合と同様にPdの浸透が続いた。そのスラリーの最終的なpHは3.5であった。
試料Iは、貴金属の浸透段階を除いては試料Gと同一である。PtおよびPdの両方の浸透段階の後、酒石酸(1.5%のシリカ/アルミナ粉末の7重量%)を溶液状態でその粉末に添加した。そのスラリーの最終的なpHは3.6であった。
試料Jは、下記の例外を除いては試料Gと同一である。PtおよびPdを浸透させた後、その粉末を450℃で1時間焼成した。その粉砕したスラリーのpHが4.0に到達するように、粉砕の前に酒石酸を添加した。
試料Kは、酒石酸の代わりにクエン酸を用いたことを除いては試料Jと同一である。そのスラリーの最終的なpHは3.6であった。
試料Lは、酒石酸の代わりに硝酸を用いたことを除いては試料Jと同一である。そのスラリーの最終的なpHは4.1であった。
試料Mは、酒石酸の代わりに酢酸を用いたことを除いては試料Jと同一である。そのスラリーの最終的なpHは4.0であった。
試料N〜試料Sのためのフィルタ基板は、51%の空隙率、14〜15μmのMPS、300cpsi、および13ミルの壁厚を有するチタン酸アルミニウムでできている。当該基板は、2インチ×6インチの周囲の寸法を有する。当該触媒すすフィルタは同一の組成を有する(試料Sを除く):50g/ft3のPGM(重量において、Pt/Pd=2:1)、1.5%のシリカ/アルミナの1.5/100の担持体、0.1g/in3のβ沸石。粒径の分布も同一であり、D90<5μm[90%が5μm未満]である。
試料Gに用いた方法と同一の標準的な方法によって試料Nを作成した。
試料Hと同一の方法を用いて試料Oを作成した。
2つの変更を除いては、試料Jと同一の方法を用いて試料Pを作成した。1つの変更は、その粉末の焼成を400℃で1時間行ったことであり、2つ目の変更は、そのスラリーの最終的なpHを5.0に調整したことである。
酒石酸の代わりにクエン酸を用いたことを除いては、試料Oと同一の方法を用いて試料Qを作成した。
酒石酸の代わりにクエン酸を用いたことを除いては、試料Pと同一の方法を用いて試料Rを作成した。
試料Sはいかなる貴金属も含んでいない。1.5%のシリカ/アルミナの1.5/100が唯一の成分である。その粉末を酒石酸で粉砕し、5.5のpHを得た。
試料T〜試料Yを菫青石のフィルタ基板上で作成し、この基板は、50%の空隙率、19μmのMPS、300cpsi/15ミルのセル形状を有する。当該基板は、直径2インチ、および長さ6インチの周囲の試料核である。これらの試料は下記の触媒組成を有する:50g/ft3のPGM(重量において、Pt/Pd=2:1)、0.5g/in3の1.5%のシリカ/アルミナ、0.1g/in3のβ沸石。
試料Tは、試料Gと同一の方法を用いて作成した参照試料である。
Ptの浸透後に5%の酒石酸を添加したことを除いては、試料Hと同一の方法を用いて試料Uを作成した。
7%の酒石酸を用いたことを除いては、試料Vは試料Uと同一である。
9%の酒石酸を用いたことを除いては、試料Wは試料Vと同一である。
試料Xは、貴金属の浸透段階を除いては試料Gと同一である。連続したPtおよびPdの浸透の後、その粉末を400℃で1時間焼成した。酒石酸(その担持体の7重量%に相当)を、粉砕の前にそのスラリーに添加した。
酒石酸の代わりにクエン酸を用いたことを除いては、試料Yは試料Xと同一である。
Clに基づいて1,000ppmのCOと420ppmの炭化水素、10%のO2、および10%の水を含む供給物を有する流反応器システムにおいて、当該触媒すすフィルタの試料を試験した。当該炭化水素は、全てClに基づいて、120ppmのプロペン、80ppmのトルエン、200ppmのデカン、および20ppmのメタンを含む。当該試験の空間速度は35,000/時であった。当該システムは、CO分析器、HC分析器、CO2分析器、ならびにFTIR分光器、および質量分光器を備えており、これらを用いて触媒の転化効率を決定した。最初に触媒を当該供給物で90℃にて飽和させた。90℃での90秒の安定処理の後、その温度を20℃/分で300℃まで徐々に増加させた。反応物および生成物の濃度を連続的に監視および記録した。COおよび合計の炭化水素(THC)の転化を、供給物における濃度(当該触媒を通さない)と、当該触媒を通過した後に得られた濃度との間の相対的差異として何度も計算した。試験前に、空気および10%の蒸気を流しながら、当該試料を装置内にて700℃で4時間経時させた。
Claims (15)
- 触媒ウォッシュコートで被覆した壁流基板を製造する方法であって、以下のステップ、
少なくとも1種の貴金属を耐熱性金属酸化物に付着させるステップ、
前記耐熱性金属酸化物の担持体、貴金属、および、少なくとも2種の酸性基を有する有機酸を含むスラリーを調製するステップ、
前記浸透した耐熱性金属酸化物の担持体の粒径を減少させるために前記スラリーを粉砕するステップ、
軸方向に拡張している複数の流路に形成される気体浸透性壁を有する壁流基板を提供するステップ、及び
前記壁流基板を前記粉砕したスラリーでウォッシュコートするステップ、
を含み、且つ前記流路は、それぞれが一端で塞がれており、及び互いに隣接して対となる流路は、相互に反対側の端で塞がれていることを特徴とする方法。 - 前記有機酸が粉砕の前に添加される、請求項1に記載の方法。
- 前記有機酸が粉砕の最中に添加される、請求項1に記載の方法。
- 前記ウォッシュコートするステップが、不動態化層の非存在下において前記基板上で直接実施される、請求項1に記載の方法。
- 前記少なくとも1種の貴金属が、白金、パラジウム、ルテニウム、インジウム、ロジウム、およびこれらの混合物から成る群から選択される、請求項1に記載の方法。
- 前記有機酸が2種類以上のカルボン酸基を含む、請求項1に記載の方法。
- 前記2種類以上の酸性基を有する有機酸が、酒石酸、クエン酸、n−アセチルグルタミン酸、アジピン酸、α−ケトグルタル酸、アスパラギン酸、アゼライン酸、樟脳酸、カルボキシグルタミン酸、クエン酸、ジクロタル酸、ジメルカプトコハク酸、フマル酸、グルタコン酸、グルタミン酸、グルタル酸、イソフタル酸、イタコン酸、マレイン酸、リンゴ酸、マロン酸、メサコン酸、メソキサル酸、3−メチルグルタコン酸、シュウ酸、オキサロ酢酸、フタル酸、フタル酸類、ピメリン酸、セバシン酸、コルク酸、コハク酸、タルトロン酸、テレフタル酸、トラウマチン酸、トリメシン酸、カルボキシグルタミン酸塩、これらの誘導体、およびこれらの混合物から成る群から選択される、請求項6に記載の方法。
- 前記有機酸が酒石酸である、請求項1に記載の方法。
- 前記少なくとも1種の貴金属が白金とパラジウムの混合物である、請求項1に記載の方法。
- 前記耐熱性金属酸化物の担持体が、アルミナ上のケイ素、沸石、およびこれらの混合物から成る群から選択される、請求項1に記載の方法。
- 前記壁流基板が、炭化ケイ素、チタン酸アルミニウム、菫青石、およびこれらの混合物から成る群から選択される物質でできている、請求項1に記載の方法。
- 前記粉砕するステップが、少なくとも約90%の前記浸透した耐熱性金属酸化物の担持体の粒径を約5μm未満に減少させる、請求項1に記載の方法。
- 前記粉砕するステップが、少なくとも約90%の前記浸透した耐熱性金属酸化物の担持体の粒径を約4μm未満に減少させる、請求項1に記載の方法。
- 不動態化層を有しない触媒被覆壁流基板を製造する方法であって、
少なくとも1種の貴金属で耐熱性金属酸化物の担持体を浸透させるステップと、
前記浸透した耐熱性金属酸化物の担持体、および、少なくとも2種類の酸性基を有する有機酸を含むスラリーを生み出すステップと、
前記浸透した耐熱性金属酸化物の担持体の粒径を減少させるためにそのスラリーを粉砕するステップと、
軸方向に拡張している複数の流路に形成される気体浸透性壁を有する壁流基板を提供するステップと、
最初に不動態化層をその壁流基板に付着させることなく、前記壁流基板をその粉砕したスラリーでウォッシュコートするステップとを含み、且つ前記流路は、それぞれが一端で塞がれており、及び互いに隣接して対となる流路は、相互に反対側の端で塞がれていることを特徴とする方法。 - チタン酸アルミニウム、菫青石、炭化ケイ素又はこれらを組合わせた材料から形成された壁流基板を有し、
該壁流基板は炭化水素、CO、およびNOxを転化するために使用される触媒物質のワッシュコートを有する触媒すすフィルタであって、
前記ワッシュコートは、基板とワッシュコートの間に不動態化層を有することなく、直接的に壁流基板に施され
壁流基板は、軸方向に拡張している複数の流路に形成される気体浸透性壁を有し、
前記流路は、それぞれが一端で塞がれており、及び互いに隣接して対となる流路は、相互に反対側の端で塞がれており、及び
ワッシュコートを有する壁流基板の焼成において、110℃〜140℃の温度範囲で示す炭化水素、CO、およびNOxの転化が、基板とワッシュコートの間に不動態化層を有する同様の触媒すすフィルターの炭化水素、CO、およびNOxの転化よりも大きいことを特徴とする触媒すすフィルタ。
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