JP2011223422A - Physical quantity sensor and microphone - Google Patents

Physical quantity sensor and microphone Download PDF

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JP2011223422A
JP2011223422A JP2010091791A JP2010091791A JP2011223422A JP 2011223422 A JP2011223422 A JP 2011223422A JP 2010091791 A JP2010091791 A JP 2010091791A JP 2010091791 A JP2010091791 A JP 2010091791A JP 2011223422 A JP2011223422 A JP 2011223422A
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JP5429013B2 (en
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Shuichi Sawada
修一 澤田
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Yamaha Corp
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Abstract

PROBLEM TO BE SOLVED: To provide a magnetic field detection type physical quantity sensor that is improved in detection sensitivity, and a microphone.SOLUTION: In a microphone 1 comprising a magnetic field generation unit 10 which generates a magnetic field to be detected, a magnetic field detection unit 4 which outputs an electric signal corresponding to a first directional component Hx of the magnetic field to be detected, and a vibrating thin film 3 which vibrates the magnetic field generation unit 10 and magnetic field detection unit 4 relatively in a second direction (y) crossing a first direction (x) according to vibration input from the outside, the magnetic field generation unit 10 comprises a first magnetic field generation unit 11 which is arranged on one side of the magnetic field detection unit 4 in the second direction y and generates a first magnetic field H1 between a pair of magnetic poles, and a second magnetic field generation unit 13 which is arranged on the other side of the magnetic field detection unit 4 in the second direction y and generates a second magnetic field H2 between the pair of magnetic poles. Consequently, the magnetic field to be detected which is a composite magnetic field of the first magnetic field H1 and second magnetic field H2 whose first directional components are opposite in direction is generated between the first magnetic field generation unit 11 and second magnetic field generation unit 13.

Description

本発明は、変位、速度、加速度等の物理量を検出する物理量センサ、並びに、音波を検出するマイクロフォンに関する。   The present invention relates to a physical quantity sensor that detects physical quantities such as displacement, velocity, and acceleration, and a microphone that detects sound waves.

従来より、外力に応じて生じる材料自身の物理的な変化を電気信号に変換して、変位、速度、加速度等を検出する物理量センサが数多く提案されている。この物理量センサは様々な分野で応用されており、例えばその応用例の1つとして、音波を検出するマイクロフォンが知られている。   2. Description of the Related Art Conventionally, many physical quantity sensors have been proposed that detect a displacement, speed, acceleration, and the like by converting a physical change of a material itself generated according to an external force into an electric signal. This physical quantity sensor is applied in various fields. For example, a microphone that detects a sound wave is known as one of the application examples.

このマイクロフォンとしては、音波による振動膜の変位に伴う静電容量変化を電気信号として出力するコンデンサ型が最も多く使用されている。近年、これをMEMS(Micro Electro Mechanical Systems)技術を用いて小型化する試みも行なわれているが、振動膜面積が小さくなるとコンデンサ容量が減少するため音波の検出感度が低下してしまう。したがって、小型化と高S/N化とを両立することができない。   As this microphone, a capacitor type that outputs a change in electrostatic capacity accompanying the displacement of the diaphragm due to sound waves as an electric signal is most often used. In recent years, attempts have been made to reduce the size by using MEMS (Micro Electro Mechanical Systems) technology. However, when the diaphragm area is reduced, the capacitance of the capacitor is reduced, so that the detection sensitivity of sound waves is lowered. Therefore, it is impossible to achieve both size reduction and high S / N ratio.

このコンデンサ型のマイクロフォンに対して、振動膜とともに変位する磁気抵抗素子により磁界強度を検出する磁界検出型のマイクロフォンが提案されている(例えば特許文献1参照)。このマイクロフォンは、図22(a)に示すように、傾斜磁界を形成する一対の磁石と、音波に応答して磁気抵抗素子及び磁石を相対移動させる振動膜とを備えた構成とされており、磁気抵抗素子と磁石との相対移動に伴って磁気抵抗素子周囲の磁界が変化した際に、当該磁気抵抗素子の抵抗の変動が電気信号として出力されるようになっている。   In contrast to this condenser microphone, a magnetic field detection microphone has been proposed in which the magnetic field strength is detected by a magnetoresistive element that is displaced together with the vibrating membrane (see, for example, Patent Document 1). As shown in FIG. 22A, this microphone is configured to include a pair of magnets that form a gradient magnetic field, and a vibration film that relatively moves the magnetoresistive element and the magnet in response to sound waves. When the magnetic field around the magnetoresistive element changes with relative movement between the magnetoresistive element and the magnet, the change in resistance of the magnetoresistive element is output as an electrical signal.

特開平8−84398号公報JP-A-8-84398

ところで、上記特許文献1に記載のマイクロフォンにおいて検出感度を向上させるには、磁気抵抗素子を傾斜磁界の磁界勾配が急峻な箇所に配置することが好ましい。この点、磁気抵抗素子を磁石に近接させて配置すれば、磁気抵抗素子周囲の傾斜磁界の磁界勾配が大きくなり、検出感度の向上を図ることができるとも考えられる。ところが、磁気抵抗素子を磁石に近接させると、磁気抵抗素子周囲の磁界強度の増大に伴って磁気抵抗素子の抵抗変化率が小さくなり、かえって磁界強度の検出感度が低下してしまう。一方、一対の磁石間の距離を短くすればこれら磁石近傍の磁場勾配を大きくすることはできるが、磁場勾配の大きな領域では磁界強度も大きくなり、やはり検出感度の向上を図ることはできない。また、磁気抵抗素子周囲の磁界強度があまりに大きくなれば、磁気抵抗素子が磁気的に飽和して磁界強度を検出することができなくなってしまう。さらに、磁気抵抗素子が飽和しないよう磁極から離して設置すると、磁界勾配が小さくなって感度がとれなくなってしまう。
本発明は上記課題に鑑みてなされたものであって、検出感度の向上を図ることの可能な磁界検出型の物理量センサ及びマイクロフォンを提供することを目的とする。
By the way, in order to improve the detection sensitivity in the microphone described in Patent Document 1, it is preferable to dispose the magnetoresistive element at a location where the magnetic field gradient of the gradient magnetic field is steep. In this regard, if the magnetoresistive element is arranged close to the magnet, it is considered that the magnetic field gradient of the gradient magnetic field around the magnetoresistive element is increased and the detection sensitivity can be improved. However, when the magnetoresistive element is brought close to the magnet, the rate of change in resistance of the magnetoresistive element decreases as the magnetic field intensity around the magnetoresistive element increases, and the detection sensitivity of the magnetic field intensity decreases. On the other hand, if the distance between the pair of magnets is shortened, the magnetic field gradient in the vicinity of these magnets can be increased, but the magnetic field strength also increases in a region where the magnetic field gradient is large, and the detection sensitivity cannot be improved. If the magnetic field strength around the magnetoresistive element becomes too large, the magnetoresistive element is magnetically saturated and the magnetic field strength cannot be detected. Further, if the magnetoresistive element is placed away from the magnetic pole so as not to saturate, the magnetic field gradient becomes small and sensitivity cannot be obtained.
The present invention has been made in view of the above problems, and an object of the present invention is to provide a magnetic field detection type physical quantity sensor and a microphone capable of improving detection sensitivity.

上記課題を解決するために、この発明は以下の手段を提案している。
即ち、本発明に係る物理量センサは、空間に被検出磁界を形成する磁界形成部と、前記被検出磁界の第1方向成分に応じた電気信号を出力する磁界検出部と、外部からの変位入力に応じて、前記第1方向と交差する第2方向に前記磁界形成部と前記磁界検出部とを相対変位させる可動部とを備えた物理量センサであって、前記磁界形成部が、前記磁界検出部の前記第2方向一方側に配置された磁極間に第1磁界を発生する第1磁界発生部と、前記磁界検出部の前記第2方向他方側に配置された磁極間に第2磁界を発生する第2磁界発生部とを備え、前記被検出磁界は、前記第1磁界発生部と前記第2磁界発生部との間における前記第1磁界と前記第2磁界との合成磁界であって、該被検出磁界における前記第1磁界及び前記第2磁界のそれぞれの前記第1方向成分が互いに逆向きとされていることを特徴とする。
このような構成の物理量センサによれば、第1磁界及び第2磁界のそれぞれの第1方向成分は、それぞれの磁界発生部から遠ざかるに従って小さくなる磁界勾配を有する傾斜磁界となる。そして、第1磁界及び第2磁界のそれぞれの第1方向成分が互いに逆向きとされているので、第1磁界と第2磁界との合成磁界である被検出磁界の第1方向成分は、各磁界発生部の近傍において磁界強度が最も大きい逆向きの磁界となる。そのため、被検出磁界の第1方向成分の磁界勾配は急峻になる。これにより、磁界検出部が変位した際に検出する磁界強度の変化量を大きくすることができる。また、第1方向成分は各磁界発生部の中間付近においてゼロとなるので、磁界強度の低い範囲に磁界検出部を配置することができ、検出感度が高い領域で磁界検出部を使用することができる。したがって、物理量センサの検出感度の向上を図ることが可能となる。
In order to solve the above problems, the present invention proposes the following means.
That is, the physical quantity sensor according to the present invention includes a magnetic field forming unit that forms a detected magnetic field in space, a magnetic field detecting unit that outputs an electric signal corresponding to a first direction component of the detected magnetic field, and an external displacement input. And a movable part that relatively displaces the magnetic field forming unit and the magnetic field detecting unit in a second direction intersecting the first direction, wherein the magnetic field forming unit is configured to detect the magnetic field. A second magnetic field is generated between a first magnetic field generating unit that generates a first magnetic field between magnetic poles disposed on one side in the second direction of the magnetic field and a magnetic field that is disposed on the other side in the second direction of the magnetic field detecting unit. A second magnetic field generating unit, and the detected magnetic field is a combined magnetic field of the first magnetic field and the second magnetic field between the first magnetic field generating unit and the second magnetic field generating unit. Each of the first magnetic field and the second magnetic field in the detected magnetic field Wherein the first direction component of is opposite to each other.
According to the physical quantity sensor having such a configuration, each first direction component of the first magnetic field and the second magnetic field becomes a gradient magnetic field having a magnetic field gradient that decreases as the distance from the magnetic field generation unit increases. Since the first direction components of the first magnetic field and the second magnetic field are opposite to each other, the first direction component of the detected magnetic field, which is a combined magnetic field of the first magnetic field and the second magnetic field, is In the vicinity of the magnetic field generating portion, the magnetic field is the reverse magnetic field having the largest magnetic field strength. Therefore, the magnetic field gradient of the first direction component of the detected magnetic field becomes steep. Thereby, the amount of change in the magnetic field strength detected when the magnetic field detector is displaced can be increased. In addition, since the first direction component is zero near the middle of each magnetic field generation unit, the magnetic field detection unit can be arranged in a range where the magnetic field strength is low, and the magnetic field detection unit can be used in a region where detection sensitivity is high. it can. Therefore, it is possible to improve the detection sensitivity of the physical quantity sensor.

また、本発明に係る物理量センサにおいては、前記被検出磁界内に、前記第1磁界と前記第2磁界とが相殺されることにより前記被検出磁界の第1方向成分が0となる磁界ゼロ点が形成され、前記磁界検出部が前記磁界形成部に対して相対変位する際の前記磁界検出部の軌跡上に、前記磁界ゼロ点が含まれていることを特徴とする。
これにより、磁界強度が最も低い領域に磁界検出部を配置することになるため、周囲の磁界強度が高くなるに従って検出感度が低下してしまう磁界検出部を検出感度高く使用することができる。これに伴って、磁界検出部の配置箇所の磁界強度と磁界検出部が磁気的に飽和する磁界強度との差を大きくとることができるため、検出可能な磁界強度の範囲を広くすることができる。
In the physical quantity sensor according to the present invention, a magnetic field zero point at which a first direction component of the detected magnetic field becomes 0 by canceling out the first magnetic field and the second magnetic field in the detected magnetic field. And the magnetic field zero point is included on the locus of the magnetic field detection unit when the magnetic field detection unit is relatively displaced with respect to the magnetic field formation unit.
As a result, the magnetic field detection unit is arranged in the region where the magnetic field strength is the lowest, so that the magnetic field detection unit whose detection sensitivity decreases as the surrounding magnetic field strength increases can be used with high detection sensitivity. Accordingly, the difference between the magnetic field intensity at the location where the magnetic field detection unit is disposed and the magnetic field intensity at which the magnetic field detection unit is magnetically saturated can be increased, so that the range of detectable magnetic field intensity can be widened. .

さらに、本発明に係る物理量センサにおいては、前記第1磁界発生部における一対の前記磁極は、前記第2方向一方側に位置する第1磁気ギャップを介して対向配置され、前記第2磁界発生部における一対の前記磁極は、前記第2方向他方側に位置する第2磁気ギャップを介して対向配置されており、前記磁界検出部が、前記第2方向矢視において、前記第1磁気ギャップ及び第2磁気ギャップのギャップ内に位置していることを特徴とする。
これにより、第1磁気ギャップからの漏洩磁界である第1磁界と第2磁気ギャップからの漏洩磁界である第2磁界とによって被検出磁界が形成され、この被検出磁界における第1方向成分の磁界勾配が急峻かつ磁界強度の小さい領域に磁界検出部を配置することになるため、検出感度をより向上させることができる。
Furthermore, in the physical quantity sensor according to the present invention, the pair of magnetic poles in the first magnetic field generation unit are arranged to face each other via a first magnetic gap located on one side in the second direction, and the second magnetic field generation unit The pair of magnetic poles in FIG. 2 are disposed to face each other via a second magnetic gap located on the other side in the second direction, and the magnetic field detection unit is configured so that the first magnetic gap and the second It is located within the gap of two magnetic gaps.
As a result, a detected magnetic field is formed by the first magnetic field that is the leakage magnetic field from the first magnetic gap and the second magnetic field that is the leakage magnetic field from the second magnetic gap, and the magnetic field of the first direction component in this detected magnetic field. Since the magnetic field detector is arranged in a region where the gradient is steep and the magnetic field strength is small, the detection sensitivity can be further improved.

また、本発明に係る物理量センサにおいて、前記第1方向は、前記第1磁界発生部及び前記第2磁界発生部のそれぞれの一対の前記磁極の離間方向であって、前記第2方向は、前記第1方向に直交する方向であることを特徴とする。
これにより、第1磁界及び第2磁界それぞれの第1方向成分の磁界強度を最大とすることができるため、これら第1磁界及び第2磁界が互いに相殺されることで、被検出磁界の磁界勾配をより大きくすることが可能となる。また、この磁界勾配は、第1方向に直交する第1磁界発生部及び第2磁界発生部の離間方向において最も急峻となるため、当該方向を磁界検出部が相対移動する第2方向とすることで、磁界強度の検出感度をより向上させることができる。
In the physical quantity sensor according to the present invention, the first direction is a separation direction of the pair of magnetic poles of the first magnetic field generation unit and the second magnetic field generation unit, and the second direction is the The direction is perpendicular to the first direction.
Thereby, since the magnetic field intensity of the first direction component of each of the first magnetic field and the second magnetic field can be maximized, the first magnetic field and the second magnetic field cancel each other, so that the magnetic field gradient of the detected magnetic field Can be made larger. In addition, this magnetic field gradient is the steepest in the separation direction of the first magnetic field generation unit and the second magnetic field generation unit orthogonal to the first direction, so that the direction is the second direction in which the magnetic field detection unit relatively moves. Thus, the detection sensitivity of the magnetic field strength can be further improved.

本発明に係るマイクロフォンは、上記いずれかに記載の物理量センサを用いたマイクロフォンであって、前記可動部は、前記磁界形成部及び前記磁界検出部のいずれか一方に対して前記第2方向に相対振動可能に張架された振動薄膜であって、前記第1磁界発生部及び第2磁界発生部は、それぞれ前記振動薄膜に沿って配置される一対の磁性体薄膜からなり、前記磁界形成部及び前記磁界検出部のいずれか他方が前記振動薄膜に固着されていることを特徴とする。
このような構成のマイクロフォンによれば、上記物理量センサを用いているため、磁界形成部と磁界検出部とが相対移動した際に、磁界検出部によって感度高く磁界変化を検出することができる。また、可動部及び磁界発生部がそれぞれ薄膜から構成されているため、MEMS技術を用いて容易に製造することができ、製造コストの削減や品質の安定化、製造効率向上を図ることができる。
The microphone according to the present invention is a microphone using the physical quantity sensor according to any one of the above, wherein the movable portion is relative to the second direction with respect to any one of the magnetic field forming portion and the magnetic field detecting portion. A vibration thin film stretched so as to vibrate, wherein the first magnetic field generation unit and the second magnetic field generation unit are each composed of a pair of magnetic thin films disposed along the vibration thin film, Any one of the magnetic field detection units is fixed to the vibration thin film.
According to the microphone having such a configuration, since the physical quantity sensor is used, a magnetic field change can be detected with high sensitivity by the magnetic field detection unit when the magnetic field forming unit and the magnetic field detection unit are relatively moved. In addition, since the movable part and the magnetic field generating part are each composed of a thin film, it can be easily manufactured using the MEMS technology, and the manufacturing cost can be reduced, the quality can be stabilized, and the manufacturing efficiency can be improved.

本発明の物理量センサによれば、磁界検出部の検出対象となる被検出磁界の第1方向成分の磁界勾配を急峻なものすることで、磁界検出部が変位した際に検出する磁界強度の変化量を大きくすることができる。また、磁界検出部が配置される範囲の磁界強度を低く抑えることができるため、検出感度が高い領域で磁界検出部を使用することができる。これによって、物理量センサの検出感度を向上させることが可能となる。また、本発明のマイクロフォンによれば、磁界検出部によって感度高く磁界変化を検出することができるため、この磁界変化に基づいて高い感度で音波を検出することが可能となる。   According to the physical quantity sensor of the present invention, by changing the magnetic field gradient of the first direction component of the detected magnetic field to be detected by the magnetic field detector, the change in the magnetic field strength detected when the magnetic field detector is displaced is changed. The amount can be increased. In addition, since the magnetic field intensity in the range where the magnetic field detection unit is disposed can be kept low, the magnetic field detection unit can be used in a region where detection sensitivity is high. As a result, the detection sensitivity of the physical quantity sensor can be improved. Also, according to the microphone of the present invention, the magnetic field change can be detected with high sensitivity by the magnetic field detection unit, so that it is possible to detect sound waves with high sensitivity based on this magnetic field change.

第1実施形態のマイクロフォンの平面図である。It is a top view of the microphone of a 1st embodiment. 図1のA−A断面図である。It is AA sectional drawing of FIG. 第1実施形態の磁界形成部が構成する磁気回路の模式図である。It is a schematic diagram of the magnetic circuit which the magnetic field formation part of 1st Embodiment comprises. 第1実施形態のマイクロフォンの製造方法を説明する図である。It is a figure explaining the manufacturing method of the microphone of a 1st embodiment. 第1実施形態のマイクロフォンの製造方法を説明する図である。It is a figure explaining the manufacturing method of the microphone of a 1st embodiment. 第1実施形態のマイクロフォンの製造方法を説明する図である。It is a figure explaining the manufacturing method of the microphone of a 1st embodiment. 第1磁界及び第2磁界により形成される被検出磁界を説明する図である。It is a figure explaining the to-be-detected magnetic field formed of a 1st magnetic field and a 2nd magnetic field. 磁気抵抗素子周囲の磁界強度と抵抗変化率との関係を示すグラフである。It is a graph which shows the relationship between the magnetic field intensity around a magnetoresistive element, and resistance change rate. 第2実施形態のマイクロフォンの平面図である。It is a top view of the microphone of a 2nd embodiment. 図9のA−A断面図である。It is AA sectional drawing of FIG. 第2実施形態のマイクロフォンの製造方法を説明する図である。It is a figure explaining the manufacturing method of the microphone of a 2nd embodiment. 変形例のマイクロフォンの平面図である。It is a top view of the microphone of a modification. 図12のA−A断面図である。It is AA sectional drawing of FIG. 磁界形成部の他の構成を示す模式図である。It is a schematic diagram which shows the other structure of a magnetic field formation part. 磁界形成部の他の構成を示す模式図である。It is a schematic diagram which shows the other structure of a magnetic field formation part. 磁界形成部の他の構成を示す模式図である。It is a schematic diagram which shows the other structure of a magnetic field formation part. 磁界形成部の他の構成を示す模式図である。It is a schematic diagram which shows the other structure of a magnetic field formation part. 磁界形成部の他の構成を示す平面図である。It is a top view which shows the other structure of a magnetic field formation part. 磁界形成部の他の構成を示す模式図である。It is a schematic diagram which shows the other structure of a magnetic field formation part. 磁界形成部の他の構成を示す模式平面図である。It is a schematic plan view which shows the other structure of a magnetic field formation part. 実施例の(a)構成を示す模式図、(b)磁界勾配を示すグラフである。(A) The schematic diagram which shows a structure of an Example, (b) It is a graph which shows a magnetic field gradient. 比較例の(a)構成を示す模式図、(b)磁界勾配を示すグラフである。It is the schematic diagram which shows the (a) structure of a comparative example, (b) It is a graph which shows a magnetic field gradient.

次に図1〜図8を参照して第1実施形態に係るマイクロフォンについて説明する。図1及び図2に示すように、本実施形態に係るマイクロフォン1は、ベースとなる支持基板2と、該支持基板2上に配置された磁界形成部10と、該磁界形成部10に一体に形成された振動薄膜(可動部)3と、該振動薄膜3上に固着された磁界検出部4とを備えている。即ち、このマイクロフォン1は、音波に応じた振動薄膜3の変位を磁界検出部4によって電気信号に変換することで、当該音波を検出する構成とされている。
なお、以下では、図1及び図2における左右方向を第1方向x、該第1方向xに直交する図1の紙面奥行き方向(図2の上下方向)を第2方向yと称する。
Next, the microphone according to the first embodiment will be described with reference to FIGS. As shown in FIG. 1 and FIG. 2, the microphone 1 according to the present embodiment is integrated with a support substrate 2 as a base, a magnetic field forming unit 10 disposed on the support substrate 2, and the magnetic field forming unit 10. A formed vibration thin film (movable part) 3 and a magnetic field detector 4 fixed on the vibration thin film 3 are provided. That is, the microphone 1 is configured to detect the sound wave by converting the displacement of the vibration thin film 3 according to the sound wave into an electric signal by the magnetic field detection unit 4.
In the following description, the left-right direction in FIGS. 1 and 2 is referred to as a first direction x, and the depth direction in FIG. 1 (vertical direction in FIG. 2) perpendicular to the first direction x is referred to as a second direction y.

支持基板2は、シリコン基板から形成されており、その平面視中央には第2方向yに貫通する貫通孔2a(図2参照)が形成されている。
磁界形成部10は、詳しくは図2に示すように、第1磁気ギャップG1を介して対向配置された一対の永久磁石12A,12Bからなる第1磁界発生部11と、第2磁気ギャップG2を介して対向配置された一対のヨーク14A,14Bからなる第2磁界発生部13と、これら第1磁界発生部11と第2磁界発生部13とを接続する一対の接続ヨーク15A,15Bとから構成されている。
The support substrate 2 is formed of a silicon substrate, and a through hole 2a (see FIG. 2) penetrating in the second direction y is formed in the center in plan view.
As shown in detail in FIG. 2, the magnetic field forming unit 10 includes a first magnetic field generating unit 11 composed of a pair of permanent magnets 12A and 12B arranged to face each other via a first magnetic gap G1, and a second magnetic gap G2. And a pair of connecting yokes 15A and 15B for connecting the first magnetic field generating unit 11 and the second magnetic field generating unit 13 to each other. Has been.

永久磁石12A,12Bは、平面視矩形薄膜状をなして第1方向xに延在するように配置されており、第1方向x一方側(図1及び図2における左側)の永久磁石12AはN極を第1磁気ギャップG1側に向け、第1方向x他方側(図1及び図2における右側)に配置された永久磁石12BはS極を第1磁気ギャップG1側に向けて配置されており、即ち、一対の磁極の対向方向が第1方向xに沿うように配置されている。また、これら一対の永久磁石12A,12Bは、第1磁気ギャップG1側の端部が反対側の端部に比べて一段高くなるように屈曲して形成されている。   The permanent magnets 12A and 12B are arranged so as to form a rectangular thin film in plan view and extend in the first direction x, and the permanent magnet 12A on one side in the first direction x (left side in FIGS. 1 and 2) is The permanent magnet 12B arranged in the first direction x the other side (the right side in FIGS. 1 and 2) is arranged with the north pole facing the first magnetic gap G1 and the south pole facing the first magnetic gap G1. That is, the opposing direction of the pair of magnetic poles is arranged along the first direction x. The pair of permanent magnets 12A and 12B are formed to be bent so that the end on the first magnetic gap G1 side is one step higher than the end on the opposite side.

ヨーク14A,14Bは、例えばNi−Fe合金等の軟磁性体からなり、平面視にて上記永久磁石12A,12Bと略同一形状の矩形薄膜状をなして、第1方向xに延在するように配置されている。また、これらヨーク14A,14Bは、永久磁石12A,12Bに対して第2方向yに重なるように支持基板2上に配置されている。   The yokes 14A and 14B are made of a soft magnetic material such as a Ni-Fe alloy, for example, and form a rectangular thin film having substantially the same shape as the permanent magnets 12A and 12B in plan view, and extend in the first direction x. Is arranged. The yokes 14A and 14B are arranged on the support substrate 2 so as to overlap the permanent magnets 12A and 12B in the second direction y.

接続ヨーク15A,15Bは、上記ヨーク14A,14Bと同様に例えばNi−Fe合金等の軟磁性体からなる薄膜状の部材であって、一方の接続ヨーク15Aは、永久磁石12A及びヨーク14Aをその第1方向x一方側において第2方向yに接続しており、他方の接続ヨーク15Bは、永久磁石12B及びヨーク14Bをその第1方向x他方側において第2方向yに接続している。これにより、支持基板2上には、ヨーク14A,14B、接続ヨーク15A,15B及び永久磁石12A,12Bがこの順序で積層されるように配置されている。また、接続ヨーク15A,15Bの厚みと上記永久磁石12A,12Bの屈曲によって、第1磁気ギャップG1と第2磁気ギャップG2とが第2方向yに離間して配置される。   The connecting yokes 15A and 15B are thin film members made of a soft magnetic material such as a Ni-Fe alloy, for example, like the yokes 14A and 14B. One connecting yoke 15A includes the permanent magnet 12A and the yoke 14A. The first direction x is connected in the second direction y on one side, and the other connection yoke 15B connects the permanent magnet 12B and the yoke 14B in the second direction y on the other side in the first direction x. Thereby, on the support substrate 2, the yokes 14A and 14B, the connection yokes 15A and 15B, and the permanent magnets 12A and 12B are arranged to be laminated in this order. Further, the first magnetic gap G1 and the second magnetic gap G2 are spaced apart in the second direction y by the thickness of the connecting yokes 15A and 15B and the bending of the permanent magnets 12A and 12B.

このような磁界形成部10においては、図3に示すように、永久磁石12A,12Bが生じさせる磁界が接続ヨーク15A,15B及びヨーク14A,14Bを通過することにより、これら永久磁石12A,12B、接続ヨーク15A,15B及びヨーク14A,14Bを磁路とした磁気回路が構成されている。これによって、第1磁気ギャップG1からは、永久磁石12AのN極と永久磁石12BのS極との一組の磁極による第1磁界H1が漏洩磁界として発生する。また、第2磁気ギャップG2からは、ヨーク14Aに生じたS極とヨーク14Bに生じたN極との一組の磁極による第2磁界H2が漏洩磁界として発生する。   In such a magnetic field forming unit 10, as shown in FIG. 3, the magnetic fields generated by the permanent magnets 12A and 12B pass through the connecting yokes 15A and 15B and the yokes 14A and 14B, so that these permanent magnets 12A and 12B, A magnetic circuit using the connecting yokes 15A and 15B and the yokes 14A and 14B as magnetic paths is configured. As a result, a first magnetic field H1 is generated from the first magnetic gap G1 as a leakage magnetic field by a pair of magnetic poles of the N pole of the permanent magnet 12A and the S pole of the permanent magnet 12B. Further, from the second magnetic gap G2, a second magnetic field H2 is generated as a leakage magnetic field by a pair of magnetic poles of the S pole generated in the yoke 14A and the N pole generated in the yoke 14B.

振動薄膜3は、図1及び図2に示すように、例えばアルミナ等の可撓性を有する平面視円形の薄膜から構成されており、該円形の周縁一部が磁界形成部10における一対の接続ヨーク15A,15B上面及び支持基板2の上面に固着されている。これにより、振動薄膜3は第1磁界発生部11と第2磁界発生部13との間において、磁界形成部10に対して第2方向yに相対振動可能とされる。   As shown in FIGS. 1 and 2, the vibration thin film 3 is made of a flexible thin film having a circular shape in plan view, such as alumina, and a part of the circular periphery is a pair of connections in the magnetic field forming unit 10. The upper surfaces of the yokes 15A and 15B and the upper surface of the support substrate 2 are fixed. Thereby, the vibration thin film 3 can be relatively vibrated in the second direction y with respect to the magnetic field forming unit 10 between the first magnetic field generation unit 11 and the second magnetic field generation unit 13.

磁界検出部4は、図1及び図2に示すように、特定方向の磁界強度の変化に応じて電気抵抗が変動する磁気抵抗素子4aと、支持基板2上に形成された一対の電極パッド4b,4bと、これら電極パッド4b,4bと磁気抵抗素子4aとを電気的に接続する一対のリード部4c,4cとを備えている。磁気抵抗素子4aとしては、MR(Magneto−resistive)素子、GMR(Giant Magneto−resistive)素子、TMR(Tunnel−type Magneto−resistive)素子、ホール素子等、種々のものを使用することができる。この磁気抵抗素子4aは、振動薄膜3の第2方向yを向く面における第1磁気ギャップG1及び第2磁気ギャップG2に対応する箇所に固着されており、即ち、磁気抵抗素子4aは第2方向y矢視において(第2方向yから見た際に)第1磁気ギャップG1及び第2磁気ギャップG2のそれぞれのギャップ内に位置するように配置されている。これにより、磁気抵抗素子4aの第2方向y一方側(図2における上側)に第1磁界発生部11の第1磁気ギャップG1が位置し、第2方向y他方側(図2における下側)に第2磁界発生部13の第2磁気ギャップG2が位置する。また、上記特定方向は第1方向xに一致しており、即ち、磁気抵抗素子4aは、第1方向xの磁界変化によって抵抗変化率が変動するように配置されている。   As shown in FIGS. 1 and 2, the magnetic field detector 4 includes a magnetoresistive element 4 a whose electric resistance varies according to a change in magnetic field strength in a specific direction, and a pair of electrode pads 4 b formed on the support substrate 2. , 4b and a pair of lead portions 4c, 4c for electrically connecting the electrode pads 4b, 4b and the magnetoresistive element 4a. As the magnetoresistive element 4a, various elements such as MR (Magneto-resistive) element, GMR (Giant Magneto-resistive) element, TMR (Tunnel-type Magneto-resistive) element, and Hall element can be used. The magnetoresistive element 4a is fixed to a portion corresponding to the first magnetic gap G1 and the second magnetic gap G2 on the surface of the vibration thin film 3 facing the second direction y. That is, the magnetoresistive element 4a is fixed in the second direction. As viewed in the direction of the arrow y (when viewed from the second direction y), the first magnetic gap G1 and the second magnetic gap G2 are disposed so as to be positioned in the respective gaps. As a result, the first magnetic gap G1 of the first magnetic field generator 11 is located on one side in the second direction y (upper side in FIG. 2) of the magnetoresistive element 4a, and the other side in the second direction y (lower side in FIG. 2). 2nd magnetic gap G2 of the 2nd magnetic field generation part 13 is located in. The specific direction coincides with the first direction x, that is, the magnetoresistive element 4a is arranged such that the rate of change in resistance fluctuates due to a magnetic field change in the first direction x.

この磁気抵抗素子4aには一定のバイアス電流が通電されており、この際の磁気抵抗素子4aの出力電圧がリード部4c,4c及び電極パッド4b,4bを介して電気信号として外部に取り出される。そして、磁気抵抗素子4a周囲の第1方向xの磁界強度が変化した際には、磁気抵抗素子4aの抵抗変化率が変動し、当該抵抗変化率の変動が出力電圧として取り出されることで磁界強度の変化を検出することとしている。また、磁気抵抗素子4aは、図3に示すように、詳細は後述する磁界ゼロ点Pに配置されており、第1磁界発生部11と第2磁界発生部13との間における磁界を被検出磁界として、該被検出磁界の第1方向成分Hxを検出する。   A constant bias current is applied to the magnetoresistive element 4a, and the output voltage of the magnetoresistive element 4a at this time is extracted to the outside as an electrical signal through the lead portions 4c and 4c and the electrode pads 4b and 4b. When the magnetic field strength in the first direction x around the magnetoresistive element 4a changes, the resistance change rate of the magnetoresistive element 4a changes, and the change in the resistance change rate is taken out as an output voltage. It is going to detect the change of. Further, as shown in FIG. 3, the magnetoresistive element 4a is disposed at a magnetic field zero point P, which will be described in detail later, and detects a magnetic field between the first magnetic field generating unit 11 and the second magnetic field generating unit 13. As a magnetic field, a first direction component Hx of the detected magnetic field is detected.

次にマイクロフォン1のMEMS技術による製造方法を図4〜図6を参照して説明する。なお、図4〜図6の各図において、上図は平面図を下図は縦断面図を示している。初めに、シリコン基板からなる支持基板2を準備し(図4(a))、該支持基板2上面にDeep−RIEによってエッチングを施すことにより凹部2bを形成する(図4(b))。その後、凹部2b内にFe−Ni合金からなる軟磁性体薄膜(磁性体薄膜)の一対のヨーク14A,14Bを形成し(図4(c))、これらヨーク14A,14B上に接続ヨーク15A,15Bを形成する(図4(d))。次いで、凹部2b内に平面視円形をなす第1犠牲膜21をCuにて形成し(図4(e))、該第1犠牲膜21及び接続ヨーク15A,15Bの上面に平坦化研磨を施す(図4(f))。   Next, a manufacturing method of the microphone 1 by the MEMS technology will be described with reference to FIGS. In addition, in each figure of FIGS. 4-6, the upper figure shows the top view and the lower figure has shown the longitudinal cross-sectional view. First, a support substrate 2 made of a silicon substrate is prepared (FIG. 4A), and a recess 2b is formed on the upper surface of the support substrate 2 by deep-RIE etching (FIG. 4B). Thereafter, a pair of yokes 14A, 14B of a soft magnetic thin film (magnetic thin film) made of Fe—Ni alloy is formed in the recess 2b (FIG. 4C), and the connecting yoke 15A, 14B is formed on these yokes 14A, 14B. 15B is formed (FIG. 4D). Next, a first sacrificial film 21 having a circular shape in plan view is formed in Cu in the recess 2b (FIG. 4E), and planarization polishing is performed on the upper surfaces of the first sacrificial film 21 and the connecting yokes 15A and 15B. (FIG. 4 (f)).

そして、第1犠牲膜21上にこれよりも大径の円形をなす振動薄膜3をアルミナにて形成する(図5(a))。この際、振動薄膜3の下面の一部は接続ヨーク15A,15B上に固着される。次いで、Cu−Au合金からなる電極パッド4b,4b及びリード部4c,4cを形成し(図5(b))、振動薄膜3上面中央にスピンバルブ型の磁気抵抗素子4aを形成する(図5(c))。その後、接続ヨーク15A,15B上面にレジスト膜22を形成した後、上面全体にメッキ下地用スパッタCu23aを形成し(図5(d))、上面全体にCuにて第2犠牲膜23を形成する(図5(e))。   Then, the vibration thin film 3 having a larger diameter than this is formed on the first sacrificial film 21 with alumina (FIG. 5A). At this time, a part of the lower surface of the vibration thin film 3 is fixed on the connection yokes 15A and 15B. Next, electrode pads 4b and 4b and lead portions 4c and 4c made of Cu—Au alloy are formed (FIG. 5B), and a spin valve type magnetoresistive element 4a is formed at the center of the upper surface of the vibration thin film 3 (FIG. 5). (C)). Thereafter, a resist film 22 is formed on the upper surfaces of the connection yokes 15A and 15B, and then a plating base sputter Cu 23a is formed on the entire upper surface (FIG. 5D), and a second sacrificial film 23 is formed of Cu on the entire upper surface. (FIG. 5 (e)).

続いて、レジスト膜22を除去して、第2犠牲膜23上面に平坦化研磨を施す(図6(a))。その後、接続ヨーク15A,15B及び第2犠牲膜23上に、CoCrPtからなる薄膜状の一対の強磁性体薄膜(磁性体薄膜)24をスパッタリングにより形成し(図6(b))、第1方向xに磁界を印加することにより、強磁性体薄膜24に着磁を施して一対の永久磁石12A,12Bとする(図6(c))。次いで、支持基板2の下面からDeep−RIEによってエッチングを施すことにより貫通孔2aを形成し(図6(d))、その後、第1犠牲膜21及び第2犠牲膜23を除去する(図6(e))。これにより、本実施形態のマイクロフォン1を得ることができる。なお、マイクロフォン1は、上述したMEMS技術を用いた製造方法により支持基板2上に単一の磁界形成部10及び磁界検出部4が製造されてもよいが、同じくMEMS技術を用いて1つの支持基板2上において磁界形成部10及び磁界検出部4を多数連ねた状態で製造することもできる。これにより、製造コストの削減や製造効率向上を図ることができる。   Subsequently, the resist film 22 is removed, and planarization polishing is performed on the upper surface of the second sacrificial film 23 (FIG. 6A). Thereafter, a pair of thin ferromagnetic thin films (magnetic thin films) 24 made of CoCrPt is formed on the connection yokes 15A and 15B and the second sacrificial film 23 by sputtering (FIG. 6B), and the first direction. By applying a magnetic field to x, the ferromagnetic thin film 24 is magnetized to form a pair of permanent magnets 12A and 12B (FIG. 6C). Next, through-holes 2a are formed by etching from the lower surface of the support substrate 2 by Deep-RIE (FIG. 6D), and then the first sacrificial film 21 and the second sacrificial film 23 are removed (FIG. 6). (E)). Thereby, the microphone 1 of this embodiment can be obtained. In the microphone 1, the single magnetic field forming unit 10 and the magnetic field detection unit 4 may be manufactured on the support substrate 2 by the manufacturing method using the MEMS technology described above. It can also be manufactured in a state where a large number of magnetic field forming units 10 and magnetic field detecting units 4 are connected on the substrate 2. Thereby, reduction of manufacturing cost and improvement of manufacturing efficiency can be aimed at.

上記構成のマイクロフォン1においては、音波が振動薄膜3に伝達されると該振動薄膜3が第2方向yに振動する。この際、振動薄膜3の振動に伴って磁界検出部4の磁気抵抗素子4aが第2方向yに変位する。そして、被検出磁界の第1方向成分Hxの磁界強度に基づく磁気抵抗素子4aの抵抗変化率の変動が、出力電圧として電極パッド4b,4bから取り出され、この出力電圧に基づいて音波の検出が行なわれる。   In the microphone 1 configured as described above, when the sound wave is transmitted to the vibration thin film 3, the vibration thin film 3 vibrates in the second direction y. At this time, the magnetoresistive element 4 a of the magnetic field detector 4 is displaced in the second direction y with the vibration of the vibration thin film 3. Then, a change in the resistance change rate of the magnetoresistive element 4a based on the magnetic field strength of the first direction component Hx of the detected magnetic field is taken out from the electrode pads 4b and 4b as an output voltage, and sound waves are detected based on this output voltage. Done.

ここで、上記磁気抵抗素子4aにより検出される被検出磁界の第1方向成分Hxについて、図7を用いて説明する。図7(a)に示すように、第1磁界H1の第1方向成分H1xと第2磁界H2の第1方向成分H2xとは互いに逆向きとなる。また、第1磁界H1の第1方向成分H1xは、第1磁気ギャップG1中において最大となり、第2方向y他方側(図7における下方側)に向かうに従って磁界強度が小さくなる傾斜磁界となる。同様に、第2磁界H2の第1方向成分H2xは、第2磁気ギャップG2中において最大となり、第2方向y一方側(図7における上側)に向かうに従って磁界強度が小さくなる傾斜磁界となる。即ち、第1磁界H1の第1方向成分H1xと第2磁界H2の第1方向成分H2xとは、磁界勾配及び磁界の方向が互いに逆向きとなる。   Here, the first direction component Hx of the detected magnetic field detected by the magnetoresistive element 4a will be described with reference to FIG. As shown in FIG. 7A, the first direction component H1x of the first magnetic field H1 and the first direction component H2x of the second magnetic field H2 are opposite to each other. In addition, the first direction component H1x of the first magnetic field H1 becomes a maximum in the first magnetic gap G1, and becomes a gradient magnetic field in which the magnetic field strength decreases toward the other side in the second direction y (the lower side in FIG. 7). Similarly, the first direction component H2x of the second magnetic field H2 becomes a maximum in the second magnetic gap G2, and becomes a gradient magnetic field in which the magnetic field strength decreases toward one side in the second direction y (upper side in FIG. 7). That is, the first direction component H1x of the first magnetic field H1 and the first direction component H2x of the second magnetic field H2 have a magnetic field gradient and a magnetic field direction opposite to each other.

したがって、第1磁界H1の第1方向成分H1xと第2磁界H2の第1方向成分H2xとの合成磁界である被検出磁界の第1方向成分Hxは、逆向きの磁界勾配を有する磁界が互いに干渉し合うことにより、第1磁界H1単独又は第2磁界H2単独の場合よりも、被検出磁界の第1方向成分Hxの第2方向yにおける磁界勾配を急峻なものとすることができる。   Therefore, the first direction component Hx of the detected magnetic field, which is a combined magnetic field of the first direction component H1x of the first magnetic field H1 and the first direction component H2x of the second magnetic field H2, has a magnetic field having a reverse magnetic field gradient. By interfering with each other, the magnetic field gradient in the second direction y of the first direction component Hx of the detected magnetic field can be made steeper than in the case of the first magnetic field H1 alone or the second magnetic field H2.

また、第1磁界H1の第1方向成分H1xと第2磁界H2の第1方向成分H2xとが互いに相殺されることにより、これらの合成磁界である被検出磁界の第1方向成分Hxの絶対値は、第1磁界H1単独あるいは第2磁界H2単独の場合と比較して小さくなる。さらに、第1磁気ギャップG1と第2磁気ギャップG2との間には、第1磁界H1の第1方向成分H1xと第2磁界H2の第1方向成分H2xが互いに等しく打ち消し合うことにより、被検出磁界の第1方向成分Hxが0となる磁界ゼロ点Pが形成される。   Further, the first direction component H1x of the first magnetic field H1 and the first direction component H2x of the second magnetic field H2 cancel each other, so that the absolute value of the first direction component Hx of the detected magnetic field, which is a composite magnetic field of these. Is smaller than that of the first magnetic field H1 alone or the second magnetic field H2 alone. Further, between the first magnetic gap G1 and the second magnetic gap G2, the first direction component H1x of the first magnetic field H1 and the first direction component H2x of the second magnetic field H2 cancel each other out equally, thereby detecting the detection target. A magnetic field zero point P where the first direction component Hx of the magnetic field is 0 is formed.

以上のように、マイクロフォン1においては、被検出磁界の第1方向成分Hxの磁界勾配を急峻なものとすることができる。これにより、磁気抵抗素子4aが単位長さだけ変位した際における磁界強度の変化量を大きくすることができるため、音波の検出感度を向上させることが可能となる。
また、一般に磁気抵抗素子4aは、例えば図8に示すように、周囲の磁界強度の絶対値が増大するに連れて抵抗変化率が小さくなるため検出感度が低下し、磁界強度があまりに大きくなれば磁気的に飽和して磁界強度を検出することができなくなってしまう。これに対して、マイクロフォン1においては、上記のように被検出磁界の第1方向成分Hxの磁界強度の絶対値を低く抑えることができるため、磁気抵抗素子4aを検出感度の高い領域で使用することができ、音波の検出感度を向上させることが可能となる。また、磁気抵抗素子4aが磁気的に飽和しにくくなるため、検出可能な磁界強度の範囲を広くすることができる。
As described above, in the microphone 1, the magnetic field gradient of the first direction component Hx of the detected magnetic field can be made steep. As a result, the amount of change in the magnetic field strength when the magnetoresistive element 4a is displaced by the unit length can be increased, so that the detection sensitivity of the sound wave can be improved.
In general, as shown in FIG. 8, for example, as shown in FIG. 8, the magnetoresistive element 4a has a decreasing rate of resistance as the absolute value of the surrounding magnetic field strength increases, so that the detection sensitivity decreases, and the magnetic field strength becomes too high. It becomes magnetically saturated and the magnetic field strength cannot be detected. On the other hand, in the microphone 1, since the absolute value of the magnetic field strength of the first direction component Hx of the detected magnetic field can be kept low as described above, the magnetoresistive element 4a is used in a region with high detection sensitivity. It is possible to improve the detection sensitivity of sound waves. In addition, since the magnetoresistive element 4a is less likely to be magnetically saturated, the range of detectable magnetic field strength can be widened.

また、特に本実施形態においては、磁気抵抗素子4aを被検出磁界の第1方向成分Hxの磁界強度が0となる磁界ゼロ点P上に配置したので、磁気抵抗素子4aが振動薄膜3とともに変位する際に印加される磁界強度を最小限に抑えることができる。これにより、磁気抵抗素子4aの抵抗変化率を高く維持することができるため、磁界検出感度をより向上させることが可能となる。また、磁気抵抗素子4aの配置箇所の磁界強度と磁気抵抗素子4aが磁気的に飽和する磁界強度との差を大きくとることができるため、検出可能な磁界強度の範囲をより広くすることができる。   In particular, in the present embodiment, the magnetoresistive element 4a is disposed on the magnetic field zero point P at which the magnetic field strength of the first direction component Hx of the detected magnetic field becomes zero. In this case, the magnetic field strength applied can be minimized. Thereby, since the resistance change rate of the magnetoresistive element 4a can be maintained high, the magnetic field detection sensitivity can be further improved. In addition, since the difference between the magnetic field intensity at the location where the magnetoresistive element 4a is disposed and the magnetic field intensity at which the magnetoresistive element 4a is magnetically saturated can be increased, the range of detectable magnetic field intensity can be broadened. .

さらに、第1磁界発生部11において第1磁気ギャップG1を介して対向する一対の磁極の離間方向が第1方向xと一致し、さらに、第2磁界発生部13において第2磁気ギャップG2を介して対向する一対の磁極の離間方向が第1方向xと一致しているため、第1磁界H1及び第2磁界H2それぞれの第1方向成分H1x,H2xの磁界強度を最大とすることができる。また、この場合、磁界勾配は第1方向xに直交する第2方向yにおいて最も急峻となるため、磁気抵抗素子4aが変位する第2方向yを第1方向xに直交する方向とすることで、磁界強度の検出感度をより向上させることができる。
また、振動薄膜3や磁界形成部10がそれぞれ薄膜から構成されているため、MEMS技術を用いてマイクロフォン1を容易に製造することができ、製造コストの削減や製造効率向上を図ることができる。
Further, the separation direction of the pair of magnetic poles facing each other through the first magnetic gap G1 in the first magnetic field generation unit 11 coincides with the first direction x, and further, in the second magnetic field generation unit 13 through the second magnetic gap G2. Since the separation direction of the pair of magnetic poles facing each other coincides with the first direction x, the magnetic field strengths of the first direction components H1x and H2x of the first magnetic field H1 and the second magnetic field H2 can be maximized. In this case, since the magnetic field gradient is steepest in the second direction y orthogonal to the first direction x, the second direction y in which the magnetoresistive element 4a is displaced is set to a direction orthogonal to the first direction x. Further, the detection sensitivity of the magnetic field strength can be further improved.
Moreover, since the vibration thin film 3 and the magnetic field formation part 10 are each comprised from the thin film, the microphone 1 can be easily manufactured using MEMS technology, and reduction of manufacturing cost and improvement of manufacturing efficiency can be aimed at.

次に、図9から図11を参照して、第2実施形態に係るマイクロフォンについて説明する。なお、この第2実施形態においては第1実施形態と同様の構成要素には同一の符号を付して詳細な説明を省略する。
図9及び図10に示すように、第2実施形態のマイクロフォン30における磁界形成部40は、一対の永久磁石12A,12Bからなる第1磁界発生部11と、一対のヨーク14A,14Bからなる第2磁界発生部13が、直接的に第2方向yに積層された構成とされている。これにより、第1磁気ギャップG1と第2磁気ギャップG2とは永久磁石12A,12Bの上記屈曲のみによって第2方向yに離間して配置される。
Next, a microphone according to the second embodiment will be described with reference to FIGS. 9 to 11. In the second embodiment, the same components as those in the first embodiment are denoted by the same reference numerals, and detailed description thereof is omitted.
As shown in FIGS. 9 and 10, the magnetic field forming unit 40 in the microphone 30 of the second embodiment includes a first magnetic field generating unit 11 including a pair of permanent magnets 12A and 12B and a first magnetic field generating unit 11 including a pair of yokes 14A and 14B. The two magnetic field generators 13 are directly stacked in the second direction y. Thus, the first magnetic gap G1 and the second magnetic gap G2 are spaced apart in the second direction y only by the bending of the permanent magnets 12A and 12B.

また、磁界形成部40は、平面視中央に貫通孔32aを備えたヨーク土台32を介して支持基板2上に配置されており、支持基板2とヨーク土台32との間に周縁部を挟み込むようにして振動薄膜(可動部)33が設けられている。この振動薄膜33は平面視円形をなしており、その中央部には、第2方向y一方側(図10における上側)に円錐台状に盛り上がるようにして素子載置部33aが設けられている。この素子載置部33aの第2方向y一方側の面に磁気抵抗素子4aが載置される。   The magnetic field forming unit 40 is disposed on the support substrate 2 via a yoke base 32 having a through hole 32a in the center in plan view, and a peripheral portion is sandwiched between the support substrate 2 and the yoke base 32. A vibration thin film (movable part) 33 is provided. The vibration thin film 33 has a circular shape in plan view, and an element placement portion 33a is provided at the center of the vibration thin film 33 so as to rise in a truncated cone shape on one side in the second direction y (upper side in FIG. 10). . The magnetoresistive element 4a is placed on the surface of the element placement portion 33a on one side in the second direction y.

次に上記構成のマイクロフォン30の製造方法の一例について図11を参照して説明する。初めに、シリコン基板からなる支持基板2を準備し、該支持基板2上にCuからなる円錐台状をなす第1犠牲膜41を形成し、支持基板2及び第1犠牲膜41上全域にアルミナからなる振動薄膜33を形成する(図11(a))。次いで、振動薄膜33上にヨーク土台32を積層して、振動薄膜33の素子載置部33a上に磁気抵抗素子4aを設け、さらに電極パッド4b,4b及びリード部4c,4cを形成する(図11(b))。   Next, an example of a method for manufacturing the microphone 30 having the above configuration will be described with reference to FIG. First, a support substrate 2 made of a silicon substrate is prepared, a first sacrificial film 41 having a truncated cone shape made of Cu is formed on the support substrate 2, and alumina is formed on the entire area of the support substrate 2 and the first sacrificial film 41. A vibration thin film 33 is formed (FIG. 11A). Next, the yoke base 32 is laminated on the vibration thin film 33, the magnetoresistive element 4a is provided on the element mounting portion 33a of the vibration thin film 33, and the electrode pads 4b and 4b and the lead portions 4c and 4c are formed (FIG. 11 (b)).

その後、ヨーク土台32と同様の高さまでCuからなる第2犠牲膜42を形成するとともにヨーク土台32上に軟磁性体薄膜(磁性体薄膜)のヨーク14A,14Bを形成し、これらヨーク14A,14B上にレジスト43を形成した状態で、上面全域にCuにて第3犠牲膜44を形成する(図11(c))。かかる後、レジスト43を除去してから第3犠牲膜44上に平坦化研磨を施し、CoCrPtからなる一対の強磁性体薄膜(磁性体薄膜)45をスパッタリングにより形成する(図11(d))。   Thereafter, a second sacrificial film 42 made of Cu is formed to the same height as the yoke base 32, and yokes 14A and 14B of soft magnetic thin films (magnetic thin films) are formed on the yoke base 32, and these yokes 14A and 14B are formed. With the resist 43 formed thereon, a third sacrificial film 44 is formed of Cu over the entire upper surface (FIG. 11C). After this, the resist 43 is removed, and then the third sacrificial film 44 is planarized and polished to form a pair of ferromagnetic thin films (magnetic thin films) 45 made of CoCrPt by sputtering (FIG. 11D). .

そして、支持基板2の下面からDeep−RIEによってエッチングを施すことにより貫通孔2aを形成し、第1方向xに磁界を印加することにより、強磁性体薄膜45に着磁を施して一対の永久磁石12A,12Bとし、第1犠牲膜41、第2犠牲膜42及び第3犠牲膜44を除去する(図11(e))。これにより、本実施形態のマイクロフォン30を得ることができる。
このような構成の第2実施形態のマイクロフォン30においても、第1実施形態と同様、被検出磁界の第1方向成分Hxの磁界勾配を大きくしながら磁界強度の絶対値を低く抑えることができるため、磁気抵抗素子4aによる磁界検出感度を高めて、音波の検出感度を向上させることができる。
Then, through-holes 2a are formed by etching from the lower surface of the support substrate 2 by Deep-RIE, and a magnetic field is applied in the first direction x, whereby the ferromagnetic thin film 45 is magnetized to form a pair of permanent magnets. Using the magnets 12A and 12B, the first sacrificial film 41, the second sacrificial film 42, and the third sacrificial film 44 are removed (FIG. 11E). Thereby, the microphone 30 of this embodiment can be obtained.
In the microphone 30 of the second embodiment having such a configuration, the absolute value of the magnetic field strength can be kept low while increasing the magnetic field gradient of the first direction component Hx of the detected magnetic field, as in the first embodiment. The sensitivity of detecting sound waves can be improved by increasing the magnetic field detection sensitivity of the magnetoresistive element 4a.

以上、実施形態のマイクロフォン1,30について説明したが、本発明はこれに限定されることなく、その発明の技術的思想を逸脱しない範囲で適宜変更可能である。
例えば、変形例として、図12及び図13に示すように磁界形成部60(図13参照)が磁気抵抗素子4aに対して変位する構成とされたマイクロフォン50であってもよい。このマイクロフォン50においては、支持基板2上にヨークメッキ51が形成されており、該ヨークメッキ51上面に平面視円形をなす振動薄膜52の周縁が固着され、この振動薄膜52の第2方向y他方側を向く面の中央に磁界形成部60が固着されている。磁界形成部60は、第2実施形態と同様、一対の永久磁石12A,12Bからなる第1磁界発生部11と一対のヨーク14A,14Bからなる第2磁界発生部13が直接的に上下に積層された構成とされている。また、支持基板2の中央には磁気抵抗素子4aを載置するための素子載置部2bが形成されており、これにより磁界形成部60における第1磁気ギャップG1と第2磁気ギャップG2との間の領域に磁気抵抗素子4aが位置することになる。
The microphones 1 and 30 of the embodiment have been described above, but the present invention is not limited to this, and can be appropriately changed without departing from the technical idea of the invention.
For example, as a modified example, the microphone 50 may be configured such that the magnetic field forming unit 60 (see FIG. 13) is displaced with respect to the magnetoresistive element 4a as shown in FIGS. In this microphone 50, a yoke plating 51 is formed on the support substrate 2, and the periphery of the vibration thin film 52 having a circular shape in plan view is fixed to the upper surface of the yoke plating 51, and the other direction y of the vibration thin film 52 in the second direction y is fixed. A magnetic field forming unit 60 is fixed to the center of the surface facing the side. As in the second embodiment, the magnetic field forming unit 60 includes a first magnetic field generation unit 11 composed of a pair of permanent magnets 12A and 12B and a second magnetic field generation unit 13 composed of a pair of yokes 14A and 14B, which are directly stacked vertically. It is set as the structure. In addition, an element mounting portion 2b for mounting the magnetoresistive element 4a is formed at the center of the support substrate 2, whereby the first magnetic gap G1 and the second magnetic gap G2 in the magnetic field forming portion 60 are formed. The magnetoresistive element 4a is located in the area between.

このマイクロフォン50においては、音波により振動薄膜52が第2方向yに振動するのに伴って、磁界形成部60が第2方向yに変位する。すると、支持基板2側に設けられた磁気抵抗素子4aの周囲の磁界が変化して、電気抵抗変動に基く電圧変化が電気信号として取り出される。これによっても、実施形態のマイクロフォン1,30と同様、磁気抵抗素子4aによる磁界検出感度を高めて、音波の検出感度を向上させることができる。   In the microphone 50, the magnetic field forming unit 60 is displaced in the second direction y as the vibration thin film 52 vibrates in the second direction y by sound waves. Then, the magnetic field around the magnetoresistive element 4a provided on the support substrate 2 side changes, and a voltage change based on the electric resistance variation is taken out as an electric signal. Also by this, like the microphones 1 and 30 of the embodiment, the magnetic field detection sensitivity by the magnetoresistive element 4a can be increased, and the sound wave detection sensitivity can be improved.

なお、実施形態においては、第2方向yが第1方向xに直交する方向とされていたが、第2方向yは少なくとも第1方向xに交差している方向であればよい。
さらに、磁気抵抗素子4aは必ずしも磁界ゼロ点Pに配置されてなくともよいが、磁気抵抗素子4a周囲の磁界強度を最小限に抑えるには、磁気抵抗素子4aの振幅の範囲内に、即ち、磁気抵抗素子4aが磁界形成部10に対して変位する際の該磁気抵抗素子4aの軌跡上に磁界ゼロ点Pが含まれるように配置されていることが好ましい。
In the embodiment, the second direction y is a direction orthogonal to the first direction x, but the second direction y may be a direction that intersects at least the first direction x.
Furthermore, although the magnetoresistive element 4a does not necessarily have to be arranged at the magnetic field zero point P, in order to minimize the magnetic field intensity around the magnetoresistive element 4a, it is within the range of the amplitude of the magnetoresistive element 4a, that is, It is preferable that the magnetic resistance element 4a is disposed so that the magnetic field zero point P is included on the locus of the magnetoresistive element 4a when the magnetic resistance element 4a is displaced with respect to the magnetic field forming unit 10.

また、磁界形成部10の構成としては、図14に示すような種々の構成を採用することができる。即ち、図14(a)に示すように、第1磁界発生部11が一対の永久磁石71,71から構成され、第2磁界発生部が一対のヨーク72,72から構成されていてもよい。また、図14(b)に示すように、第1磁界発生部11及び第2磁界発生部13が一対の永久磁石71,71から構成されていてもよい。さらに、図14(c)に示すように、第1磁界発生部11が一対の永久磁石71,71からなり、第2磁界発生部13が永久磁石71及びヨーク72からなるものであってもよい。また、図14(d),(e)に示すように、第1磁界発生部11及び第2磁界発生部13それぞれが永久磁石71とヨーク72とからなるものであってもよい。さらにまた、図14(f)に示すように、第1磁界発生部11が永久磁石71及びヨーク72からなり、第2磁界発生部13が一対のヨーク72,72からなるものであってもよい。   Moreover, as a structure of the magnetic field formation part 10, various structures as shown in FIG. 14 are employable. That is, as shown in FIG. 14A, the first magnetic field generator 11 may be composed of a pair of permanent magnets 71, 71, and the second magnetic field generator may be composed of a pair of yokes 72, 72. As shown in FIG. 14B, the first magnetic field generator 11 and the second magnetic field generator 13 may be composed of a pair of permanent magnets 71 and 71. Further, as shown in FIG. 14C, the first magnetic field generator 11 may be composed of a pair of permanent magnets 71, 71, and the second magnetic field generator 13 may be composed of a permanent magnet 71 and a yoke 72. . 14D and 14E, each of the first magnetic field generation unit 11 and the second magnetic field generation unit 13 may include a permanent magnet 71 and a yoke 72. Furthermore, as shown in FIG. 14 (f), the first magnetic field generator 11 may be composed of a permanent magnet 71 and a yoke 72, and the second magnetic field generator 13 may be composed of a pair of yokes 72, 72. .

また、磁界形成部10においては、図15に示すように接続ヨーク15A,15Bを設けずに、永久磁石71やヨーク72を離間させて配置した構成であってもよい。即ち、図15(a)に示すように、第1磁界発生部11及び第2磁界発生部13がそれぞれ一対の永久磁石71,71からなる構成であってもよい。また、図15(b)に示すように、第1磁界発生部11が一対の永久磁石71からなり、第2磁界発生部13が永久磁石71及びヨーク72からなる構成であってもよい。さらに、図15(c)に示すように、第1磁界発生部11及び第2磁界発生部13それぞれが永久磁石71及びヨーク72からなるものであってもよい。   Further, the magnetic field forming unit 10 may have a configuration in which the permanent magnet 71 and the yoke 72 are arranged apart from each other without providing the connection yokes 15A and 15B as shown in FIG. That is, as shown in FIG. 15A, the first magnetic field generator 11 and the second magnetic field generator 13 may be configured by a pair of permanent magnets 71 and 71, respectively. Further, as shown in FIG. 15B, the first magnetic field generator 11 may be composed of a pair of permanent magnets 71, and the second magnetic field generator 13 may be composed of a permanent magnet 71 and a yoke 72. Further, as shown in FIG. 15C, the first magnetic field generator 11 and the second magnetic field generator 13 may each include a permanent magnet 71 and a yoke 72.

なお、磁界形成部10においては、図16に示すように、永久磁石71をその分極方向が第2方向yに沿うように配置した構成であってもよい。
即ち、図16(a)に示すように、第1磁界発生部11及び第2磁界発生部13がそれぞれ分極方向を第2方向yに沿わせて対向配置した一対の永久磁石71,71から構成されていてもよい。また、この際、図16(b)に示すように、第1磁界発生部11の永久磁石71と第2磁界発生部13の永久磁石71同士が接続ヨーク73により連結されていてもよい。さらに、図16(c)のように、一部の永久磁石71に代えてヨーク72を配置してもよい。
図14〜図16の各図に示した構成の場合であっても、方向及び磁界勾配が互いに逆向きの第1磁界H1の第1方向成分H1x及び第2磁界H2の第2方向成分H2xを形成することができ、磁界勾配が急峻かつ磁界強度の絶対値の小さい被検出磁界の第1方向成分Hxを形成することが可能となる。
In addition, in the magnetic field formation part 10, as shown in FIG. 16, the structure which has arrange | positioned the permanent magnet 71 so that the polarization direction may follow the 2nd direction y may be sufficient.
That is, as shown in FIG. 16A, the first magnetic field generating unit 11 and the second magnetic field generating unit 13 are each composed of a pair of permanent magnets 71 and 71 arranged to face each other with the polarization direction along the second direction y. May be. At this time, as shown in FIG. 16 (b), the permanent magnet 71 of the first magnetic field generation unit 11 and the permanent magnet 71 of the second magnetic field generation unit 13 may be connected by a connection yoke 73. Further, as shown in FIG. 16C, a yoke 72 may be arranged in place of some permanent magnets 71.
14 to 16, the first direction component H1x of the first magnetic field H1 and the second direction component H2x of the second magnetic field H2 whose directions and magnetic field gradients are opposite to each other are obtained. The first direction component Hx of the detected magnetic field having a steep magnetic field gradient and a small absolute value of the magnetic field strength can be formed.

さらに、第1磁気ギャップG1及び第2磁気ギャップG2のそれぞれにおける磁極間距離(第1磁気ギャップG1及び第2磁気ギャップG2のそれぞれの第1方向xの寸法)と、第1磁気ギャップG1及び第2磁気ギャップG2の第2方向yの離間距離とは、同一寸法に設定されていることがより好ましい。これにより、被検出磁界の第1方向成分Hxの磁界勾配を最も急峻なものとすることができる。
また、実施形態のマイクロフォン1,30においては、磁界形成部10,40に永久磁石12A,12Bを用いたが、これに代えて電磁石を用いた構成であってもよい。
Furthermore, the distance between the magnetic poles in each of the first magnetic gap G1 and the second magnetic gap G2 (the dimension in the first direction x of each of the first magnetic gap G1 and the second magnetic gap G2), the first magnetic gap G1, and the second magnetic gap G1. The separation distance in the second direction y of the two magnetic gaps G2 is more preferably set to the same dimension. Thereby, the magnetic field gradient of the first direction component Hx of the detected magnetic field can be made the steepest.
In the microphones 1 and 30 of the embodiment, the permanent magnets 12A and 12B are used for the magnetic field forming units 10 and 40, but an electromagnet may be used instead.

さらに、例えば図17に示すように、第1磁界発生部11の永久磁石12A,12Bにおける第1磁気ギャップG1に臨む先端、及び、第2磁界発生部13のヨーク14A,14Bにおける第2磁気ギャップG2に臨む先端が、磁気抵抗素子4aに向かって尖った形状をなしているものであってもよい。この場合、第1磁界H1及び第2磁界H2が集中することで磁界強度が大きくなるため、被検出磁界の第1方向成分Hxの磁界勾配をより大きくすることができる。   Further, for example, as shown in FIG. 17, the tips of the permanent magnets 12A and 12B of the first magnetic field generator 11 facing the first magnetic gap G1 and the second magnetic gaps of the yokes 14A and 14B of the second magnetic field generator 13 are provided. The tip facing G2 may have a sharp shape toward the magnetoresistive element 4a. In this case, since the magnetic field strength is increased by the concentration of the first magnetic field H1 and the second magnetic field H2, the magnetic field gradient of the first direction component Hx of the detected magnetic field can be further increased.

さらにまた、例えば図18に示すように、第1磁界発生部11の永久磁石12A,12Bにおける第1磁気ギャップG1に臨む先端を、平面視にて幅狭とした構成であってもよい。また、同様に第2磁界発生部13のヨーク14A,14Bにおける第2磁気ギャップG2に臨む端部を幅狭した構成であってもよい。これによっても、磁界を集中させることで被検出磁界の第1方向成分Hxの磁界勾配を大きくすることができる。
また、例えば図19に示すように、磁界形成部10において、第1磁界発生部11及び第2磁界発生部13それぞれが単一の永久磁石71からなり、これら永久磁石71が分極方向を互いに逆向きとして配置された構成であってもよい。この場合であっても、図19(a)に示すように、永久磁石71,71の外部に互いに方向及び磁界勾配が逆向きの第1磁界H1の第1方向成分H1x及び第2磁界H2の第2方向成分H2xを形成することができる。したがって、図19(b)に示すように、磁界勾配が大きく、かつ、磁界強度の絶対値の低い被検出磁界の第1方向成分Hxを形成することができる。
Furthermore, for example, as shown in FIG. 18, the tip of the permanent magnets 12 </ b> A and 12 </ b> B of the first magnetic field generation unit 11 that faces the first magnetic gap G <b> 1 may be narrow in plan view. Similarly, the end of the second magnetic field generator 13 facing the second magnetic gap G2 in the yokes 14A and 14B may be narrowed. Also by this, the magnetic field gradient of the first direction component Hx of the detected magnetic field can be increased by concentrating the magnetic field.
For example, as shown in FIG. 19, in the magnetic field forming unit 10, each of the first magnetic field generating unit 11 and the second magnetic field generating unit 13 is composed of a single permanent magnet 71, and these permanent magnets 71 have opposite polarization directions. It may be a configuration arranged as a direction. Even in this case, as shown in FIG. 19 (a), the first direction component H1x of the first magnetic field H1 and the second magnetic field H2 of the first magnetic field H1 whose directions and magnetic field gradients are opposite to each other outside the permanent magnets 71 and 71. A second direction component H2x can be formed. Accordingly, as shown in FIG. 19B, the first direction component Hx of the detected magnetic field having a large magnetic field gradient and a low absolute value of the magnetic field strength can be formed.

さらに、例えば図20に示すように、第1磁気ギャップG1の対向方向と第2磁気ギャップG2の対向方向とが平面視において交差していてもよい。この場合であっても、第1磁界H1の第1方向成分H1x及び第2磁界H2の第2方向成分H2xは、それぞれ方向及び磁界勾配が逆向きとなる。したがって、被検出磁界の第1方向成分Hxの磁界勾配を大きくすることができる。
さらに、磁界検出部4における磁気抵抗素子4aに代えてホール素子やフラックスゲート等の磁気センサを用いてもよい。そして、本発明はマイクロフォン1,30,50に限らず、加速度センサ、角速度センサ、圧力センサ、振動センサ、変位センサ等のあらゆる物理量センサに広く適用することが可能である。
Furthermore, for example, as shown in FIG. 20, the facing direction of the first magnetic gap G1 and the facing direction of the second magnetic gap G2 may intersect in plan view. Even in this case, the first direction component H1x of the first magnetic field H1 and the second direction component H2x of the second magnetic field H2 have opposite directions and magnetic field gradients, respectively. Therefore, the magnetic field gradient of the first direction component Hx of the detected magnetic field can be increased.
Furthermore, a magnetic sensor such as a Hall element or a flux gate may be used in place of the magnetoresistive element 4a in the magnetic field detection unit 4. The present invention is not limited to the microphones 1, 30, and 50, and can be widely applied to all physical quantity sensors such as an acceleration sensor, an angular velocity sensor, a pressure sensor, a vibration sensor, and a displacement sensor.

本発明のマイクロフォンの効果について評価シミュレーションを行った。
(実施例)
図21(a)に示すように、永久磁石81a,81bの磁極(一方のN極と他方のS極)間距離を2xdμmとして第1方向xに対向配置し、第1磁界発生部81を構成した。また、第1磁界発生部81の第2方向y(y方向)他方側に2ydμm離間した箇所に、一対の永久磁石82a,82bの磁極(一方のS極と他方のN極)を第1方向xに対向配置させて第2磁界発生部82を構成し、接続ヨーク83により第1磁界発生部81と接続した。そして、磁気抵抗素子84を第2方向yに変位させた際の第1方向xの磁界強度を測定した。その結果を図21(b)に示す。
An evaluation simulation was performed on the effect of the microphone of the present invention.
(Example)
As shown in FIG. 21 (a), the distance between the magnetic poles (one N pole and the other S pole) of the permanent magnets 81a and 81b is set to be 2xdμm and is opposed to the first direction x to constitute the first magnetic field generating unit 81. did. In addition, the magnetic poles (one S pole and the other N pole) of the pair of permanent magnets 82a and 82b are placed in the first direction at a location 2 yd μm apart on the other side in the second direction y (y direction) of the first magnetic field generator 81. A second magnetic field generation unit 82 was configured to be disposed opposite to x, and connected to the first magnetic field generation unit 81 by a connection yoke 83. Then, the magnetic field strength in the first direction x when the magnetoresistive element 84 was displaced in the second direction y was measured. The result is shown in FIG.

(比較例)
図22(a)に示すように、永久磁石85,86を第1方向xに2xdμmの間隔をあけて配置した。そして、磁気抵抗素子84を永久磁石85,86の磁極面から第2方向yにydμm離間させて磁気抵抗素子84を配置し、第2方向yに磁気抵抗素子84を変位させた際の第1方向xの磁界強度を測定した。その結果を図22(b)に示す。なお、この比較例及び上記実施例においては、(xd,yd)=(1.5μm,1.5μm),(2.5μm,2.5μm)として測定を行なった。
(Comparative example)
As shown in FIG. 22A, the permanent magnets 85 and 86 are arranged in the first direction x with an interval of 2 × dμm. Then, the magnetoresistive element 84 is disposed by separating the magnetoresistive element 84 from the magnetic pole surfaces of the permanent magnets 85 and 86 by yd μm in the second direction y, and the magnetoresistive element 84 is displaced in the second direction y. The magnetic field strength in the direction x was measured. The result is shown in FIG. In this comparative example and the above example, the measurement was performed with (xd, yd) = (1.5 μm, 1.5 μm), (2.5 μm, 2.5 μm).

(実施例及び比較例の評価)
図21(b)及び図22(b)から、実施例の方が比較例に比べて磁界勾配が大きくなったことが分かる。また、磁気抵抗素子84の周囲の磁界勾配の絶対値は、比較例に比べて実施例の方が非常に小さい値を示すことが分かる。さらに、比較例では永久磁石85,86間の距離を短くした場合でも磁気抵抗素子84の配置箇所の磁界強度は大きいが、実施例においては永久磁石81a,81b、82a,82b間の距離に関わらず磁気抵抗素子84の配置箇所の磁界強度は0となった。したがって、本発明に対応する実施例においては、磁界勾配の増大及び磁界強度の低減を両立できることが判明した。これにより、実施形態において前述した作用効果を立証することができた。
(Evaluation of Examples and Comparative Examples)
From FIG. 21B and FIG. 22B, it can be seen that the magnetic field gradient is greater in the example than in the comparative example. Also, it can be seen that the absolute value of the magnetic field gradient around the magnetoresistive element 84 is much smaller in the example than in the comparative example. Furthermore, in the comparative example, even when the distance between the permanent magnets 85 and 86 is shortened, the magnetic field strength at the location where the magnetoresistive element 84 is arranged is large. However, in the embodiment, regardless of the distance between the permanent magnets 81a, 81b, 82a and 82b. The magnetic field intensity at the location where the magnetoresistive element 84 was disposed was zero. Therefore, it has been found that the embodiment corresponding to the present invention can achieve both an increase in magnetic field gradient and a decrease in magnetic field strength. Thereby, the operation and effect described above in the embodiment could be verified.

1…マイクロフォン、3…振動薄膜(可動部)、4…磁界検出部、4a…磁気抵抗素子、10…磁界形成部、11…第1磁界発生部、12A…永久磁石、12B…永久磁石、13…第2磁界発生部、14A…ヨーク、14B…ヨーク、15A…接続ヨーク、15B…接続ヨーク、30…マイクロフォン、33…振動薄膜(可動部)、40…磁界形成部、50…マイクロフォン、52…振動薄膜(可動部)、60…磁界形成部、71…永久磁石、72…ヨーク、73…接続ヨーク、81…第1磁界発生部、81a…永久磁石、81b…永久磁石、82…第2磁界発生部、82a…永久磁石、82b…永久磁石、83…接続ヨーク、84…磁気抵抗素子、85…永久磁石、86…永久磁石、G1…第1磁気ギャップ、G2…第2磁気ギャップ、H1…第1磁界、H1x…第1磁界の第1方向成分、H2…第2磁界、H2x…第2磁界の第1方向成分、Hx…被検出磁界の第1方向成分、P…磁界ゼロ点、x…第1方向、y…第2方向 DESCRIPTION OF SYMBOLS 1 ... Microphone, 3 ... Vibration thin film (movable part), 4 ... Magnetic field detection part, 4a ... Magnetoresistive element, 10 ... Magnetic field formation part, 11 ... 1st magnetic field generation part, 12A ... Permanent magnet, 12B ... Permanent magnet, 13 2nd magnetic field generation part, 14A ... Yoke, 14B ... Yoke, 15A ... Connection yoke, 15B ... Connection yoke, 30 ... Microphone, 33 ... Vibration thin film (movable part), 40 ... Magnetic field formation part, 50 ... Microphone, 52 ... Vibration thin film (movable part), 60 ... magnetic field forming part, 71 ... permanent magnet, 72 ... yoke, 73 ... connection yoke, 81 ... first magnetic field generating part, 81a ... permanent magnet, 81b ... permanent magnet, 82 ... second magnetic field Generating part, 82a ... permanent magnet, 82b ... permanent magnet, 83 ... connecting yoke, 84 ... magnetoresistive element, 85 ... permanent magnet, 86 ... permanent magnet, G1 ... first magnetic gap, G2 ... second magnetic gap, H ... 1st magnetic field, H1x ... 1st direction component of 1st magnetic field, H2 ... 2nd magnetic field, H2x ... 1st direction component of 2nd magnetic field, Hx ... 1st direction component of detected magnetic field, P ... Magnetic field zero point, x ... first direction, y ... second direction

Claims (5)

空間に被検出磁界を形成する磁界形成部と、
前記被検出磁界の第1方向成分に応じた電気信号を出力する磁界検出部と、
外部からの変位入力に応じて、前記第1方向と交差する第2方向に前記磁界形成部と前記磁界検出部とを相対変位させる可動部とを備えた物理量センサであって、
前記磁界形成部が、
前記磁界検出部の前記第2方向一方側に配置された磁極間に第1磁界を発生する第1磁界発生部と、
前記磁界検出部の前記第2方向他方側に配置された磁極間に第2磁界を発生する第2磁界発生部とを備え、
前記被検出磁界は、前記第1磁界発生部と前記第2磁界発生部との間における前記第1磁界と前記第2磁界との合成磁界であって、該被検出磁界における前記第1磁界及び前記第2磁界のそれぞれの前記第1方向成分が互いに逆向きとされていることを特徴とする物理量センサ。
A magnetic field forming unit for forming a detected magnetic field in space;
A magnetic field detector that outputs an electrical signal corresponding to a first direction component of the detected magnetic field;
A physical quantity sensor comprising a movable unit that relatively displaces the magnetic field forming unit and the magnetic field detection unit in a second direction intersecting the first direction in response to an external displacement input,
The magnetic field forming part is
A first magnetic field generator that generates a first magnetic field between magnetic poles disposed on one side in the second direction of the magnetic field detector;
A second magnetic field generator for generating a second magnetic field between the magnetic poles arranged on the other side in the second direction of the magnetic field detector,
The detected magnetic field is a combined magnetic field of the first magnetic field and the second magnetic field between the first magnetic field generating unit and the second magnetic field generating unit, and the first magnetic field in the detected magnetic field and The physical quantity sensor, wherein the first direction components of the second magnetic field are opposite to each other.
前記被検出磁界内に、前記第1磁界と前記第2磁界とが相殺されることにより前記被検出磁界の第1方向成分が0となる磁界ゼロ点が形成され、
前記磁界検出部が前記磁界形成部に対して相対変位する際の前記磁界検出部の軌跡上に、前記磁界ゼロ点が含まれていることを特徴とする請求項1に記載の物理量センサ。
In the detected magnetic field, a magnetic field zero point where the first direction component of the detected magnetic field becomes 0 is formed by canceling out the first magnetic field and the second magnetic field,
The physical quantity sensor according to claim 1, wherein the magnetic field zero point is included on a locus of the magnetic field detection unit when the magnetic field detection unit is relatively displaced with respect to the magnetic field forming unit.
前記第1磁界発生部における一対の前記磁極は、前記第2方向一方側に位置する第1磁気ギャップを介して対向配置され、
前記第2磁界発生部における一対の前記磁極は、前記第2方向他方側に位置する第2磁気ギャップを介して対向配置されており、
前記磁界検出部が、前記第2方向矢視において、前記第1磁気ギャップ及び前記第2磁気ギャップのギャップ内に位置していることを特徴とする請求項1又は2に記載の物理量センサ。
The pair of magnetic poles in the first magnetic field generation unit are disposed to face each other via a first magnetic gap located on one side in the second direction,
The pair of magnetic poles in the second magnetic field generation unit are disposed to face each other via a second magnetic gap located on the other side in the second direction,
3. The physical quantity sensor according to claim 1, wherein the magnetic field detection unit is located in a gap between the first magnetic gap and the second magnetic gap in the second direction arrow.
前記第1方向は、前記第1磁界発生部及び前記第2磁界発生部のそれぞれにおける一対の前記磁極の離間方向であって、
前記第2方向は、前記第1方向に直交する方向であることを特徴とする請求項1から3のいずれか一項に記載の物理量センサ。
The first direction is a separation direction of a pair of the magnetic poles in each of the first magnetic field generation unit and the second magnetic field generation unit,
The physical quantity sensor according to any one of claims 1 to 3, wherein the second direction is a direction orthogonal to the first direction.
請求項1から4のいずれか一項に記載の物理量センサを用いたマイクロフォンであって、
前記可動部は、前記磁界形成部及び前記磁界検出部のいずれか一方に対して前記第2方向に相対振動可能に張架された振動薄膜であって、
前記第1磁界発生部及び第2磁界発生部は、それぞれ前記振動薄膜に沿って配置される一対の磁性体薄膜からなり、
前記磁界形成部及び前記磁界検出部のいずれか他方が前記振動薄膜に固着されていることを特徴とするマイクロフォン。
A microphone using the physical quantity sensor according to any one of claims 1 to 4,
The movable part is a vibration thin film stretched to be capable of relative vibration in the second direction with respect to either the magnetic field forming part or the magnetic field detection part,
Each of the first magnetic field generation unit and the second magnetic field generation unit includes a pair of magnetic thin films disposed along the vibration thin film,
One of the magnetic field formation part and the magnetic field detection part is fixed to the vibration thin film.
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