JP2011222809A5 - Substrate relative position detection method, stacked device manufacturing method and detection device - Google Patents
Substrate relative position detection method, stacked device manufacturing method and detection device Download PDFInfo
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前記第1基板に第1周期で形成された複数の第1導電領域と、前記第2基板に前記第1周期とは異なる第2周期で形成された複数の第2導電領域とを近接させる近接ステップと、
前記複数の第1導電領域のいずれかと前記複数の第2導電領域のいずれかとの複数の組み合わせのそれぞれにおける第1導電領域および第2導電領域の間の電気的特性を測定する測定ステップと、
前記複数の組み合わせの間の前記電気的特性の差に基づいて、前記第1基板と前記第2基板との相対位置を検出する検出ステップと、
を含む基板相対位置検出方法。 A substrate relative position detection method for detecting the relative position of a first substrate and a second substrate superimposed on each other, comprising:
Proximity for bringing a plurality of first conductive regions formed in a first period on the first substrate into proximity with a plurality of second conductive regions formed in a second period different from the first period on the second substrate Step and
Measuring an electrical property between the first conductive region and the second conductive region in each of a plurality of combinations of any of the plurality of first conductive regions and any of the plurality of second conductive regions;
Detecting the relative position of the first substrate and the second substrate based on the difference in the electrical characteristics among the plurality of combinations;
A substrate relative position detection method including:
前記測定ステップは、前記複数の第1導電領域のいずれかと前記複数の第2導電領域のいずれかとの前記複数の組み合わせのそれぞれにおいて、前記第1導電領域および第2導電領域の間の電気的導通の有無を検出することを含む請求項1に記載の基板相対位置検出方法。 The proximity step brings one of the plurality of first conductive regions into contact with any of the plurality of second conductive regions.
In the measurement step, in each of the plurality of combinations of any of the plurality of first conductive regions and any of the plurality of second conductive regions, electrical conduction between the first conductive region and the second conductive region is performed. The substrate relative position detection method according to claim 1, comprising detecting the presence or absence of the substrate.
前記測定ステップは、前記複数の第1導電領域のいずれかと前記複数の第2導電領域のいずれかとの前記複数の組み合わせのそれぞれにおいて、前記第1導電領域および第2導電領域の間の静電容量を検出する請求項1に記載の基板相対位置検出方法。 The proximity step holds the first substrate and the second substrate in a separated state,
In the measurement step, a capacitance between the first conductive region and the second conductive region is provided in each of the plurality of combinations of any of the plurality of first conductive regions and any of the plurality of second conductive regions. The substrate relative position detection method according to claim 1, which detects
前記測定ステップは、前記複数の第1導電領域のいずれかと前記複数の第2導電領域のいずれかとの前記複数の組み合わせのそれぞれにおいて、前記第1導電領域および第2導電領域の間の静電容量を検出する請求項1に記載の基板相対位置検出方法。 The proximity step may include any one of the plurality of first conductive regions and the plurality of second conductive regions through a dielectric layer provided on at least one of the plurality of first conductive regions and the plurality of second conductive regions. Contact with one of the areas,
In the measurement step, a capacitance between the first conductive region and the second conductive region is provided in each of the plurality of combinations of any of the plurality of first conductive regions and any of the plurality of second conductive regions. The substrate relative position detection method according to claim 1, which detects
前記第1大導電領域と前記第2大導電領域と間の電気的特性により前記第1基板と前記第2基板との位置ずれを検出するステップと、
前記位置ずれを検出するステップで検出された位置ずれが前記第1周期および前記第2周期のいずれか大きい方の周期以上であるか否かを判断する判断ステップと、
をさらに含む請求項1から9のいずれか一項に記載の基板相対位置検出方法。 Prior to the measurement step, the second substrate is formed at a position corresponding to a first large conductive region formed on the first substrate and larger than any of the plurality of first conductive regions and the first large conductive region. Measuring an electrical property between a second large conductive region formed and larger than any of the plurality of second conductive regions;
Detecting misalignment between the first substrate and the second substrate based on electrical characteristics between the first large conductive region and the second large conductive region;
A determination step of determining whether or not the positional deviation detected in the step of detecting the positional deviation is equal to or greater than one of the first period and the second period, whichever is larger;
The substrate relative position detection method according to any one of claims 1 to 9, further comprising
前記検出ステップは、前記複数の第1導電領域のいずれかと前記複数の第2導電領域のいずれかとの前記複数の組み合わせの間の前記電気的特性の差、および、前記複数の第3導電領域のいずれかと前記複数の第4導電領域のいずれかとの前記複数の組み合わせ間の前記電気的特性の差に基づいて、前記第1基板と前記第2基板との相対位置を検出する請求項1に記載の基板相対位置検出方法。 The measuring step includes: a plurality of third conductive regions formed on the first substrate so as to be arranged at a third period along a direction orthogonal to the direction in which the plurality of first conductive regions are arranged; In a plurality of combinations with a plurality of fourth conductive regions formed on the second substrate so as to be arranged in a fourth period different from the third period along a direction orthogonal to the direction in which the second conductive regions are arranged Further measure the electrical characteristics,
In the detecting step, a difference between the electrical characteristics between the plurality of combinations of any of the plurality of first conductive regions and any of the plurality of second conductive regions, and a plurality of third conductive regions of the plurality The relative position of a said 1st board | substrate and a said 2nd board | substrate is detected based on the difference of the said electrical property between the said some combination of any and any of the said 4th 4th electrically conductive area. Board relative position detection method.
複数の第1導電領域が第1周期で形成された第1基板と、
複数の第2導電領域が前記第1周期とは異なる第2周期で形成された第2基板と、
前記複数の第1導電領域と前記複数の第2導電領域とが近接した状態で、前記複数の第1導電領域のいずれかと前記複数の第2導電領域のいずれかとの複数の組み合わせのそれぞれにおける第1導電領域および第2導電領域の間の電気的特性を測定する測定部と、
前記複数の組み合わせの間の前記電気的特性の差に基づいて、前記第1基板と前記第2基板との相対位置を検出する検出部と、
を備える検出装置。 A detection device for detecting misalignment of the plurality of substrates aligned by the alignment device that aligns the plurality of substrates bonded to each other;
A first substrate on which a plurality of first conductive regions are formed at a first period;
A second substrate in which a plurality of second conductive regions are formed at a second period different from the first period;
A plurality of combinations of any one of the plurality of first conductive regions and any of the plurality of second conductive regions in a state in which the plurality of first conductive regions and the plurality of second conductive regions are close to each other A measurement unit that measures an electrical characteristic between the first conductive region and the second conductive region;
A detection unit that detects a relative position between the first substrate and the second substrate based on the difference in the electrical characteristics among the plurality of combinations;
A detection device comprising:
前記測定部は、前記複数の第1導電領域のいずれかと前記複数の第2導電領域のいずれかとの前記複数の組み合わせのそれぞれにおいて、前記第1導電領域および第2導電領域の間の静電容量を検出する請求項14に記載の検出装置。 A dielectric layer is provided on at least one of the plurality of first conductive regions and the plurality of second conductive regions, and the plurality of first conductive regions and the plurality of second conductive regions are the dielectric layer. Is contacted via
The measurement unit is a capacitance between the first conductive region and the second conductive region in each of the plurality of combinations of any of the plurality of first conductive regions and any of the plurality of second conductive regions. The detection device according to claim 14, which detects
前記第2基板には、前記複数の第2導電領域のいずれかよりも大きい第2大導電領域が前記第1大導電領域に対応した位置で形成されており、
前記測定部は、前記第1大導電領域と第2大導電領域と間の電気的特性を測定し、
前記検出部は、前記第1大導電領域と前記第2大導電領域と間の電気的特性により前記第1基板と前記第2基板との位置ずれを検出する請求項14から20のいずれか一項に記載の検出装置。 A first large conductive area larger than any of the plurality of first conductive areas is formed on the first substrate,
In the second substrate, a second large conductive area larger than any of the plurality of second conductive areas is formed at a position corresponding to the first large conductive area.
The measurement unit measures an electrical characteristic between the first large conductive region and the second large conductive region;
21. The detection unit according to any one of claims 14 to 20, which detects a positional deviation between the first substrate and the second substrate based on electrical characteristics between the first large conductive region and the second large conductive region. The detection apparatus as described in a term.
前記第2基板には、前記複数の第2導電領域が並ぶ方向に直交する方向に沿って前記第3周期とは異なる第4周期で配置された複数の第4導電領域が形成されており、
前記測定部は、前記複数の第3導電領域と前記複数の第4導電領域との複数の組み合わせにおける電気的特性をさらに測定し、
前記検出部は、前記複数の第1導電領域のいずれかと前記複数の第2導電領域のいずれかとの前記複数の組み合わせ間の前記電気的特性の差、および、前記複数の第3導電領域のいずれかと前記複数の第4導電領域のいずれかとの前記複数の組み合わせ間の前記電気的特性の差に基づいて、前記第1基板と前記第2基板との相対位置を検出する請求項14に記載の検出装置。 In the first substrate, a plurality of third conductive regions are formed at a third period along a direction orthogonal to the direction in which the plurality of first conductive regions are arranged,
A plurality of fourth conductive regions arranged in a fourth period different from the third period are formed on the second substrate along a direction orthogonal to the direction in which the plurality of second conductive regions are arranged,
The measurement unit further measures electrical characteristics of a plurality of combinations of the plurality of third conductive regions and the plurality of fourth conductive regions;
The detection unit is configured to detect a difference in the electrical characteristic between the plurality of combinations of any of the plurality of first conductive regions and any of the plurality of second conductive regions, and any of the plurality of third conductive regions. The relative position of a said 1st board | substrate and a said 2nd board | substrate is detected based on the difference of the said electrical property between the said some combinations with any one of the some 4th electroconductive area | regions. Detection device.
前記第2基板には、前記複数の第2導電領域とは異なる、前記第1基板の前記複数の回路パターンに対応した複数の回路パターンが形成されている請求項14から24のいずれか一項に記載の検出装置。 A plurality of circuit patterns different from the plurality of first conductive regions are formed on the first substrate,
The circuit board according to any one of claims 14 to 24, wherein a plurality of circuit patterns corresponding to the plurality of circuit patterns of the first substrate, which are different from the plurality of second conductive regions, are formed on the second substrate. The detection device according to.
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JP2013182972A (en) * | 2012-03-01 | 2013-09-12 | Tokyo Electron Ltd | Substrate bonding method and semiconductor device |
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