JP2011221415A - Color display device and method for producing the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a color display device capable of changing a hue at a desired position by changing potential or pressure, and to provide a method for producing the color display device.SOLUTION: The color display device is provided with: display device base material; a drive layer formed as a pattern in pixel units on one surface of the display device base material; and a photonic crystal material layer formed on the surface on which the drive layer of the display device base material is formed or on the opposite surface. The hue of the photonic crystal material layer is changed reversibly and for individual pixel unit by changing a potential generated by driving respective patterns of the drive layer. The photonic crystal material layer is composed to be sectioned into islands of which each size is smaller than that of the pixel.

Description

  The present invention relates to an invention of a color display device (for example, color electronic paper or a color pressure-sensitive switch product) that can be used for electronic devices such as mobile phones and PDAs, communication devices, electronic books, and signage.

  Conventionally, as an invention of a color display device, a method of laminating an electrophoretic layer and a color filter layer (Patent Document 2) or the like has been studied, but this is to color-display by blocking pixels of unnecessary colors. As a result, there was a problem that the color was dim and the screen was darkened. Therefore, recently, as a method for solving this problem, a method of changing the color of each pixel itself by changing the driving potential by using a photonic crystal material (Patent Document 1) has been studied. For example, as shown in FIG. 9, a display device substrate 90, a drive layer 8 patterned in units of 50 pixels on one side of the display device substrate 90, and the drive layer 8 of the display device substrate 90 A potential change caused by driving the patterns 80 and 81 of the drive layer 8 by having a structure including a layer 110 made of a photonic crystal material formed entirely on a surface opposite to the formed surface. As a result, the thickness of the layer 110 made of the photonic crystal material changes, and the color display device 200 is obtained in which the refractive index changes and the color of the reflected light reversibly changes in units of 50 pixels. And in the Example of patent document 1, about the layer which consists of polyferrocenylsilane which is an example of a photonic crystal material, it is disclosed that one pixel 50 changes to blue, green, and red according to the change of electric potential. ing. In addition to the change in potential, such a photonic crystal material has a layer 110 made of the photonic crystal material whose thickness changes depending on the change in pressure. It is also possible to obtain a color display device 200 whose color changes reversibly in units of 50 pixels.

JP-T-2006-504984 JP 2003-280044 A

  However, the method of changing the color of each pixel itself by changing the driving potential does not cause a problem when displaying the entire screen with a single solid color, but when driving a full color display, each pixel is driven. Alternatively, not only the loaded potential, but also the influence of the potential driven on the surrounding pixels, each pixel does not necessarily have the desired color, and the color of each pixel changes over time. There was a problem. Similarly, the method of changing the color of each pixel itself by changing the pressure applied does not cause a problem when a single color solid is displayed by applying pressure to the entire screen, but the pressure is applied to a part of the screen. When applying color to display the color of that part, not only the part where pressure is applied, but also the surrounding part is affected by the applied pressure, so the color is changed only to the desired part. There is a problem that the color of each pixel changes over time.

  The present inventors solved the above-mentioned problems by the following invention. That is, according to the first aspect of the present invention, the display device substrate, the drive layer patterned in pixel units on one side of the display device substrate, and the surface on which the drive layer of the display device substrate is formed Or a photonic crystal material layer formed on the opposite surface, and a color display in which the color of the photonic crystal material layer reversibly changes pixel by pixel due to a change in potential generated by driving each pattern of the drive layer There is provided a color display device, wherein the photonic crystal material layer is divided into islands having a size equal to or smaller than a pixel size. According to a second aspect of the present invention, there is provided the color display device according to the first aspect, wherein the size of the divided island is 1/4 to 1/1000 of the pixel size.

  According to the third aspect of the present invention, the photonic crystal material layer is provided on one side of the display device base material, and the color of the photonic crystal material layer is pressed by a change in pressure applied to the photonic crystal material layer. A color display device that is reversibly changed in a manner that the photonic crystal material layer is divided into islands that are smaller than or equal to the tip size of a medium to which pressure is applied. To do. Further, according to the fourth aspect of the present invention, the color display device according to the third aspect, wherein the size of the divided islands is ¼ to 1/1000 of the tip size of the medium to which pressure is applied. I will provide a.

  According to a fifth aspect of the present invention, there is provided the color display device according to any one of the first to fourth aspects, wherein the islands configured to be separated are completely separated and independent. Moreover, according to the 6th aspect of this invention, the color display device in any one of the 1st-5th aspect with which the islands comprised by the said division | segmentation are connected in part is provided. According to a seventh aspect of the present invention, the brightness of the display device substrate is 0 to 4 in the Munsell color system based on JIS-Z-8721: 1993. A color display device according to any of the aspects is provided.

  According to the eighth aspect of the present invention, there is provided a method for manufacturing the color display device according to any one of the first to seventh aspects, wherein the method of dividing the photonic crystal material layer into islands is by nanoimprint processing. A method for manufacturing a color display device is provided. According to a ninth aspect of the present invention, there is provided a method of manufacturing a color display device according to any one of the first to seventh aspects, wherein the method of dividing the photonic crystal material layer into islands is a color by photolithography. A method for manufacturing a display device is provided.

  According to a tenth aspect of the present invention, there is provided a method of manufacturing a color display device according to any one of the first to ninth aspects, wherein the display is performed by transferring the island-shaped photonic crystal material layer by a transfer method. A method for producing a color display device formed on a device substrate is provided.

  The color display device according to the first aspect includes a display device base material, a drive layer patterned in pixel units on one side of the display device base material, and a surface of the display device base material on which the drive layer is formed or the opposite side. A photonic crystal material layer formed on a surface, and a color display device in which the color of the photonic crystal material layer reversibly changes pixel by pixel due to a change in potential generated by driving each pattern of the drive layer The photonic crystal material layer is divided into islands having a size equal to or smaller than a pixel size. Therefore, the peripheral pixels of each pixel are hardly affected by the driven potential, and there is an effect that a desired color can be obtained even when full color display is performed. In addition, the color of each pixel can be prevented from changing over time.

  The color display device according to the second aspect is characterized in that a size of the divided island is 1/4 to 1/1000 of a pixel size. Accordingly, since the size of each of the divided islands of the photonic crystal material layer is considerably smaller than the size of each pixel, a desired layer can be obtained without aligning the drive layer and the photonic crystal material layer. There is an effect that color display is possible.

  The color display device according to the third aspect includes a photonic crystal material layer on one side of a display device substrate, and the color of the photonic crystal material layer is reversible in a pressing region by a change in pressure applied to the photonic crystal material layer. The photonic crystal material layer is formed by dividing the photonic crystal material layer into islands having a size equal to or less than the tip size of the medium to which pressure is applied. Therefore, when pressure is applied to a part of the display surface to display the color of the pressed area, the pressure applied to the pressed area hardly affects the surroundings, and only the pressed area is changed to a desired color. It is also possible to prevent the color of each pixel from changing over time.

  The color display device according to the fourth aspect is characterized in that the size of the divided islands is ¼ to 1/1000 of the size of one pressing area. Accordingly, since the size of the island formed by dividing each of the photonic crystal material layers is considerably smaller than the size of the medium to which the pressure is applied, only the portion where the pressure is applied can be set to a desired color. There is an effect that can be done.

  In the color display device of the seventh aspect of the present invention, the brightness of the display device substrate is 0 to 4 in the Munsell color system based on JIS-Z-8721: 1993. Therefore, there is an effect that the color of the photonic crystal material layer can be developed more clearly.

  Further, the color display device manufacturing method according to the eighth aspect and the ninth aspect is characterized in that the method of dividing the photonic crystal material layer into islands is nanoimprinting or photolithography. Therefore, since the size of the island of the photonic crystal material layer can be processed to be considerably small, there is an effect that a finer color display device can be obtained.

  Moreover, the manufacturing method of the color display device according to the tenth aspect is characterized in that the island-shaped photonic crystal material layer is formed on the display device substrate by a transfer method. That is, a transfer sheet is prepared by sequentially forming a photonic crystal material layer and an island-shaped adhesive layer on a substrate sheet having releasability, and the transfer sheet is laminated on a display device substrate, and then released from the mold The base sheet having the property is peeled to form an island-shaped adhesive layer and an island-patterned photonic crystal material layer on the display device substrate. Therefore, the photonic crystal material layer can be formed on a base sheet having releasability by roll-to-roll, and can be easily patterned in an island shape, so that the productivity is greatly improved.

It is the schematic perspective view which showed the structural example of the color display device of this invention, and shows the example of the structure in which the layer from which a color changes is formed in the island form which became completely separated and independent. It is the schematic sectional drawing which cut | disconnected FIG. 1 by the AA line. It is the schematic sectional drawing which showed the structural example of the color display device of this invention, and shows the example of the structure where a part of layer from which a color changes connects and is formed in island shape. It is a schematic sectional drawing which showed the structural example of the color display device of this invention, and shows the example of the structure where each island of the layer from which a color changes, and the pattern of a drive layer have produced position shift. FIG. 2 is a schematic cross-sectional view showing an example of a manufacturing method of the color display device shown in FIG. 1, in which a photonic crystal material layer and an island-shaped adhesive layer are sequentially formed on a substrate sheet having releasability The process which created is shown. FIG. 2 is a schematic cross-sectional view showing an example of a manufacturing method of the color display device shown in FIG. 1, showing a step in which a part of the photonic crystal material layer is removed by etching using the adhesive layer as a resist. It is the schematic sectional drawing which showed an example of the manufacturing method of the color display device shown in FIG. 1, and shows the process which laminated | stacked the transfer sheet on the display device base material. FIG. 2 is a schematic cross-sectional view showing an example of a manufacturing method of the color display device shown in FIG. 1, in which an adhesive layer and islands patterned on islands on a display device substrate by peeling a substrate sheet having transfer releasability A process of transferring and forming a photonic crystal material layer patterned in a shape is shown. It is the schematic sectional drawing which showed the structural example of the color display device of a prior art. It is the schematic perspective view which showed the structural example of the color display device of this invention, and shows the example of the structure in which the layer from which a color changes is formed in the island form which became completely separated and independent. It is the schematic sectional drawing which cut | disconnected FIG. 10 by the AA line. It is the schematic sectional drawing which showed the structural example of the color display device of this invention, and shows the example of the structure where a part of layer from which a color changes connects and is formed in island shape. FIG. 11 is a schematic cross-sectional view showing an example of a method for manufacturing the color display device shown in FIG. 10, in which a photonic crystal material layer and an island-shaped adhesive layer are sequentially formed on a substrate sheet having releasability. The process which created is shown. FIG. 11 is a schematic cross-sectional view showing an example of a method for manufacturing the color display device shown in FIG. 10, showing a step in which a part of the photonic crystal material layer is removed by etching using the adhesive layer as a resist. It is a schematic sectional drawing which showed an example of the manufacturing method of the color display device shown in FIG. 10, and shows the process which laminated | stacked the transfer sheet on the display device base material. It is the schematic sectional drawing which showed an example of the manufacturing method of the color display device shown in FIG. A process of transferring and forming a photonic crystal material layer patterned in a shape is shown.

  The color display device of the present invention will be described below. The color display device 1 shown in FIG. 1 has a photonic layer in which a drive layer 8 is patterned on the back surface of a display device substrate 90 in units of 50 pixels, and is divided into islands having a size equal to or smaller than the size of each pixel 50 on the front surface. A crystalline material layer 10 is formed. The size of each pixel 50 is determined by the patterns 80 and 81 of the drive layer 8. FIG. 2 is a schematic sectional view of the color display device 1 taken along line AA. In FIG. 2, the photonic crystal material layer 10 is divided into islands 15, 16, 17, 18, 19, and 20 by grooves 28, and the islands 15, 16, 17, and 18 are included in one pixel.

  In the color display device 200 shown in FIG. 10, a photonic crystal material layer 210 is formed on the surface of the display device substrate 290 and is divided into islands having a size equal to or smaller than the tip size of the medium 250 to which pressure is applied by the grooves 228. Yes. FIG. 10 is a schematic cross-sectional view of the color display device 200 taken along line AA. In FIG. 10, the photonic crystal material layer 210 is divided into islands 215, 216, 217, 218, 219, and 220 by a groove 228, and the islands 215, 216, 217, and 218 are included in one pressing region 250.

  Examples of the display device substrates 90 and 290 include various glasses such as silicate glass, acrylic glass, chalcogen glass, and organic glass, and various plastic films such as polyester, urethane, acrylic, and vinyl chloride. It may be a material. Further, it may be transparent or colored. However, the display device base material 90 needs to be transparent when the back photonic crystal material layer 10 is seen through the drive layer 8 and the display device base material 90 from the drive layer 8 side described later, When viewed from the photonic crystal material layer 10 side, it is desirable that the material is colored with a concealing black or the like. In addition, the display device base material 290 needs to be transparent when viewing the back photonic crystal material layer 210 through the display device base material 290, and when viewed from the photonic crystal material layer 210 side. It is desirable to have a color such as black that is concealing. The reason for making black is that if there is a base material having a lightness of 0 to 4 in the Munsell color system based on JIS-Z-8721: 1993 behind the photonic crystal material layers 10 and 210, the photonic crystal material layer This is because the effect of being able to develop the color of the color more clearly is obtained.

  Examples of the drive layer 8 include a thin film transistor (TFT) and a metal insulator metal (MIM) made of an inorganic material such as amorphous silicon or an organic material such as pentacene, but other materials may also be used. When the drive layer 8 is made of a transparent material (for example, a transparent oxide semiconductor material such as zinc oxide, tin oxide, indium oxide, copper oxide, nickel oxide), the front surface of the photonic crystal material layer 10 The photonic crystal material layer 10 behind can also be seen through the drive layer 8.

  Examples of the material of the photonic crystal material layer 10 whose color is changed by a change in potential include polyferrocenylsilane materials such as the substituted sila-1-ferrocenophan of Patent Document 1 described above. Other materials may be used as long as they change. As a product of a specific material whose color changes due to such a potential change, there is P-ink of OPALUX. Examples of the material of the photonic crystal material layer 210 whose color changes with a change in pressure include various synthetic rubber materials such as acrylic, silicon, and urethane resins, but other materials can be used as long as the color changes with a change in pressure. It may be a material. Examples of specific materials for which the color changes due to such a pressure change include OPALUX Elast-ink ID, Elast-ink XR, Color Sketch, Press 2, Peel & Reveal.

  The photonic crystal material layers 10 and 210 can be formed by a normal printing method such as an offset printing method, a gravure printing method, a screen printing method, a method using various coaters, spin coating, painting, vacuum deposition, sputtering, etc. It is preferable to use an ion plating method, a plating method, or the like. The thickness of the photonic crystal material layer 10 is preferably formed in the range of 0.05 to 200 μm. If the thickness of the photonic crystal material layers 10 and 210 is less than 0.05 μm, defects such as pinholes tend to occur, and even if the thickness is increased to more than 200 μm, the effect is not improved and productivity is reduced. It is. In the drawing, the photonic crystal material layer 10 is provided on the surface of the display device substrate 90 opposite to the surface on which the drive layer 8 is formed, but the photonic crystal material layer 10 is displayed. You may provide in the surface in which the drive layer 8 of the device base material 90 was formed.

  Then, a groove 28 is formed in the photonic crystal material layer 10 whose color changes according to a change in potential, and in the cross-sectional view shown in FIG. 2, islands 15, 16, 17, 18, 19 less than the size of each pixel 50 are formed. , 20 are divided into independent structures. With this structure, when the drive layer 8 is driven to change the potential, the photonic crystal material layer 10 on the islands 15, 16, 17, and 18 has only a change in potential generated in the pattern 80. The influence of the potential change caused by the adjacent pattern 81 is blocked by the groove 28.

  Therefore, the photonic crystal material layer 10 of the islands 15, 16, 17, and 18 is generated in the pattern 80 even if the change in potential generated in the pattern 80 is significantly different from the change in potential generated in the adjacent pattern 81. The color changes only by a change in potential, and the color of the photonic crystal material layer 10 on the islands 19 and 20 changes only by a change in potential generated in the pattern 81. As a result, each pixel 50 can be independently changed to a desired color, and if this is applied to the entire screen, the color display device 1 capable of full color control can be obtained.

  Similarly, a groove 228 is formed in the photonic crystal material layer 210 whose color changes with a change in pressure. In the cross-sectional view shown in FIG. 11, islands 215, 216, 217, and 218 that are equal to or smaller than the tip size of the medium 280 to which pressure is applied. , 219 and 220, each having an independent structure. With such a structure, when the photonic crystal material layer 210 is pressed with the tip of the medium 280 and pressure is applied to the pressing region 250 including the islands 215, 216, 217, and 218, the islands 215 and 216 are applied. , 217, and 218, the thickness of the photonic crystal material layer 210 is affected only by the pressure change caused by the pressing. On the other hand, the influence on the islands 219 and 220 in the vicinity of the pressing region 250 is blocked by the groove 228.

  Therefore, even if the photonic crystal material layer 210 is pressed with a fairly strong pressure, only the photonic crystal material layer 210 of the islands 215, 216, 217, and 218 is thinned by the change in pressure and the color changes. The color of the photonic crystal material layer 210 on the islands 219 and 220 does not change. As a result, only the pressing area 250 can be changed to a desired color.

  2 and 11, the islands 15, 16, 17, 18, 19, and 20 and the islands 215, 216, 217, 218, 219, and 220 are formed completely separately and independently. Although shown, a structure in which a part is connected (see FIGS. 3 and 12) is also included in the scope of rights. In other words, if the islands 15, 16, 17, 18, 19, and 20 are formed so as to be separated by the groove 28 to the extent that they do not receive the potential change generated in the adjacent pattern 81, the other shapes are not limited. It is. Further, if the islands 215, 216, 217, 218, 219, and 220 are formed so as to be separated by the groove 228 to the extent that the pressure region 250 does not receive the pressure change caused by the medium 280 to which pressure is applied, other than that This means that the shape is not limited. In the case of an island structure in which a part is connected as shown in FIGS. 3 and 12, a protective layer or the like is formed on the photonic crystal material layers 10 and 210, and the protective layer and the display device base materials 90 and 290 are closely attached Is bad, there is an advantage that the photonic crystal material layers 10 and 210 serve as an anchor layer for helping the adhesion between them.

  The size (length) of each island is desirably 1/4 or smaller than the size (length) of the pixel 50 as shown in FIGS. The reason is that when the islands 15, 16, 17, and 18 and the pattern 80 of the drive layer 8 are manufactured to be displaced as shown in FIG. 4, the island 18 has the potential of the pattern 80 of the drive layer 8. Although not only the change but also the influence of the change in the potential of the pattern 81, the desired color cannot be controlled, but the photonic crystal material layer 10 on the islands 15, 16, and 17 only changes the potential generated in the pattern 80. This is because the color can be changed and controlled to a desired color, so that one pixel 50 can be controlled to a desired color within an allowable range.

  In other words, by making the size of each island 1/4 or smaller than the size of the pixel 50, the desired color display can be achieved without aligning the drive layer 8 and the photonic crystal material layer 10. Because there is. However, the reason why the size of each island is made smaller than 1/1000 of the size of the pixel 50 is that there is a problem in productivity because it is necessary to form so many grooves 28 and to reduce the width of each groove. The effect will not increase. Therefore, the size of the island is preferably ¼ to 1/1000 of the size of the pixel 50.

  Similarly, it is desirable that the size (length) of the island shown in FIGS. 11 and 12 is 1/4 or smaller than the tip size of the medium 280 to which pressure is applied. The reason is that, as shown in FIG. 13, when the pressure position of the medium 280 to which pressure is applied is shifted and the pressure of the medium 280 to which pressure is applied is applied to a part of the island 219, the island 219 is also discolored. However, if the size of the island is sufficiently small, the pressure can be blocked by the groove 228, so that only the portion to which the pressure is applied can be made a desired color. When the medium 280 to which pressure is applied is a finger, the contact area for normal operation is approximately 7 mm in diameter, and the contact area for light touch is 4 mm in diameter. Further, the medium 280 may be appropriately determined depending on the application, and for example, pressure can be applied with the palm of a hand.

  The thickness of the photonic crystal material layers 10 and 210 is preferably formed within a range of 0.1 to 200 μm. If the thickness of the layers 10 and 210 whose color changes is less than 0.1 μm, defects such as pinholes tend to occur, and even if the thickness is increased beyond 200 μm, the effect is not improved and productivity is reduced. It is.

  The widths of the grooves 28 and 228 are preferably set in the range of 0.02 to 200 μm. If the width of the grooves 28 and 228 is larger than 200 μm, the grooves 28 and 228 are visible to the viewer, which is not preferable in terms of appearance design. If the width of the grooves 28 and 228 is less than 0.02 μm, there is a problem in productivity. This is because there is no effect. The depth of the grooves 28 and 228 is preferably in the range of ¼ to 1/1 of the thickness of the photonic crystal material layers 10 and 210. This is because if there is a division less than ¼ of the thickness of the photonic crystal material layer 10, it is likely to be affected by the potential change occurring in the adjacent pattern 81. In addition, if the thickness is less than ¼ of the thickness of the photonic crystal material layer 210, the neighboring islands 219 and 220 are likely to be affected by the pressure by the medium 280 that applies pressure.

  Grooves 28 and 228 are formed in the photonic crystal material layers 10 and 210, and the structure is divided into islands 15, 16, 17, 18, 19, and 20 and islands 215, 216, 217, 218, 219, and 220. Examples thereof include nanoimprint processing and photolithography, but other methods may be used.

  Specifically, a nanoimprint mold having a shape obtained by inverting the shapes of the desired groove 28 and islands 15, 16, 17, 18, 19, 20 and the groove 228 and islands 215, 216, 217, 218, 219, 220 is prepared. Then, it is set on the photonic crystal material layers 10 and 210, and is formed by a so-called room temperature nanoimprint method or thermal nanoimprint method in which the material is pressed at a constant pressure while applying room temperature or heat. Alternatively, if the photonic crystal material layers 10 and 210 can be made into an ultraviolet curable type, they may be formed by a so-called UV nanoimprint method in which the photonic crystal material layers 10 and 210 are hardened by being pressed with a slightly weak pressure and irradiated with ultraviolet rays to have a predetermined shape. Good.

  Alternatively, a layer that is hardened or solubilized with ionizing radiation may be formed, exposed with ionizing radiation, developed, and then etched using the photonic crystal material layers 10 and 210 as an etching resist. Examples of ionizing radiation include visible light, ultraviolet light, infrared light, electron beam, X-ray, and gamma ray. Examples of the material that can be cured by ionizing radiation include resists such as calixarene, and examples of the material that can be solubilized by ionizing radiation include resin resists such as acrylic, pyrimidine, and novolac.

  Etching is preferably an anisotropic etching method. Anisotropic etching is etching having a property of suppressing etching with respect to the orientation in the film surface direction. Specifically, oxygen, argon, fluorine For example, a dry etching method using plasma such as a system gas can be used. After the etching, the etching resist may be peeled off. Examples of the stripper include alkali resist strippers such as sodium hydroxide and aqueous potassium hydroxide, and organic solvents such as toluene.

  In the nanoimprint process or photolithography, a very narrow and deep (high aspect ratio) fine groove can be formed. Accordingly, since the size of the island of the layer in which the color changes can be processed to be considerably small, there is an effect that a finer color display device can be obtained.

  Further, the photonic crystal material layer 10 whose color is changed by a change in potential may be directly formed on the display device substrate 90, but the photonic crystal material layer 10 and the islands are formed on the base sheet 60 having releasability. A transfer sheet 65 in which adhesive layers 70 patterned in a shape are sequentially formed (see FIG. 5), and a part of the photonic crystal material layer 10 is removed by etching using the adhesive layer 70 as a resist (see FIG. 6). Next, the transfer sheet 65 is laminated on the display device base material 90 on which the drive layer 8 is formed on the back surface (see FIG. 7), and then the base sheet 60 having releasability is peeled to form the drive layer 8 on the back surface. The island-shaped adhesive layer 70 and the island-shaped photonic crystal material layer 10 may be transferred and formed on the display device substrate 90 (see FIG. 8).

  Similarly, the photonic crystal material layer 210 whose color is changed by a change in pressure may be directly formed on the display device substrate 290, but the photonic crystal material layer 210 and the photonic crystal material layer 210 on the substrate sheet 60 having releasability. A transfer sheet 265 in which the adhesive layer 70 patterned in an island shape is sequentially formed is created (see FIG. 13), and a part of the photonic crystal material layer 210 is etched away using the adhesive layer 70 as a resist (see FIG. 14). Then, the transfer sheet 265 is laminated on the display device base material 290 (see FIG. 15), and then the base sheet 60 having releasability is peeled off to form the island-shaped adhesive layer 70 and the island shape on the display device base material 290 The photonic crystal material layer 210 may be transferred and formed (see FIG. 16).

  In these methods, the photonic crystal material layers 10 and 210 can be formed in a roll-to-roll manner with a wide width on the substrate sheet 60 having releasability, and can be easily patterned in an island shape, so that productivity is greatly improved. There is an effect.

  As the base sheet 60 having releasability, 5-800 μm acrylic, polycarbonate, polyester, polybutylene terephthalate having a surface coated with a resin such as fluorine, silicon, melamine, polypropylene, polyamide, polyurethane, polyvinyl chloride, polyvinyl chloride. Examples thereof include resin films such as vinyl chloride.

  Examples of the adhesive layer 70 include layers made of acrylic, urethane, vinyl, and rubber resins. General-purpose printing methods such as gravure, screen, and offset, methods using various coaters, methods such as painting and dipping It is good to form with. As a method for patterning the adhesive layer 70 in an island shape, the above-described photolithography or the like may be used. As the etching method, the aforementioned anisotropic etching method or the like may be used. It should be noted that only the portion of the photonic crystal material layers 10 and 210 where the adhesive layer 70 is formed is transferred while leaving the portion of the photonic crystal material layers 10 and 210 where the adhesive layer 70 is not formed on the base sheet 60. If possible, the step of etching the photonic crystal material layers 10 and 210 (that is, the steps of FIGS. 6 and 14) may be omitted using the adhesive layer as a resist. Alternatively, a part of the photonic crystal material layers 10 and 210 may be separately etched away with a resist and patterned into an island shape, and then the adhesive layer 70 may be formed over the entire surface.

  Examples of the transfer method include a thermal transfer method in which a heated pad is pressed, a dry laminate method in which adhesion is performed through another laminate adhesive layer, and a simultaneous molding transfer method.

  A 25 μm polyethylene terephthalate film coated with silicon resin is prepared as a substrate sheet having releasability, and a 2 μm thick photonic crystal material layer (trade name: P-ink of OPALUX Co., Ltd.) is formed on the substrate sheet having releasability. ), An adhesive layer made of novolac resin having a thickness of 1 μm was sequentially formed on the entire surface by gravure printing.

Next, a photomask patterned in the shape of a square island having a size of 2500 μm ² separated by a groove having a width of 5 μm is placed on the adhesive layer, exposed to exposure light from a metal halide lamp light source and developed with tetramethylammonium hydroxide, and the adhesive layer Was patterned into islands. Next, dry etching was performed to obtain a transfer sheet in which the color changing layer was also patterned in an island shape.

  Next, the above transfer sheet is laminated on a display device substrate made of a black polyester film having a thickness of 2 mm in which a TFT drive layer made of pentacene having a pixel size of 200 μm square is formed on the back surface, and heated to 200 ° C. The silicon pad was pressed with a pressure of 2 atm for 2 seconds. After cooling, when the substrate sheet having the releasability of the transfer sheet was peeled off, a color display device was obtained in which island-like island-like photonic crystal material layers and adhesive layers were transferred and formed on the display device substrate. .

  When the obtained color display device was driven by changing the potential in the range of −1, 6V to + 2V, the color of the photonic crystal material layer changed according to the change of the potential. Although the color change layer and the TFT drive layer were slightly misaligned, there was no effect on the color display of each pixel and desired full color display was possible. It was possible to do.

  A 25 μm polyethylene terephthalate film coated with silicon resin is prepared as a substrate sheet having releasability, and a 2 μm thick photonic crystal material layer (trade name: Elast-inkID manufactured by OPALUX, Inc.) is formed on the substrate sheet having releasability. ), An adhesive layer made of novolac resin having a thickness of 1 μm was sequentially formed on the entire surface by gravure printing.

Next, a photomask patterned in the shape of a square island having a size of 2500 μm ² separated by a groove having a width of 5 μm is placed on the adhesive layer, exposed to exposure light from a metal halide lamp light source and developed with tetramethylammonium hydroxide, and the adhesive layer Was patterned into islands. Next, dry etching was performed to obtain a transfer sheet in which the color changing layer was also patterned in an island shape.

  Next, the transfer sheet was laminated on a display device substrate made of a black polyester film having a thickness of 2 mm, and pressed with a silicon pad heated to 200 ° C. for 2 seconds at a pressure of 2 atm. After cooling, when the substrate sheet having the releasability of the transfer sheet was peeled off, a color display device was obtained in which island-like island-like photonic crystal material layers and adhesive layers were transferred and formed on the display device substrate. .

When the pressure was changed with the finger in the range of 0-20 kg / cm < ² > with respect to the obtained color display device, the color of the photonic crystal material layer changed according to the change of the pressure. Although the test was performed with various pressing positions changed, the color display was not affected and desired color display was possible, and it was possible to apply to color pressure-sensitive switch products.

1,100,200 Color display device 8 Drive layer 10,210 Photonic crystal material layer 15, 16, 17, 18, 19, 20 Island 215, 216, 217, 218, 219, 220 below each pixel size Island 28, 228 Groove 50 Pixel 60 Releasable base sheet 65, 265 Transfer sheet 70 Adhesive layer 80, 81 Drive layer pattern 90, 290 Display device substrate 110 Layer 250 made of photonic crystal material Press area 280 Medium for applying pressure

Claims (10)

  A display device substrate, a drive layer patterned in pixel units on one side of the display device substrate, and a photonic crystal material formed on the surface of the display device substrate on which the drive layer is formed or on the opposite surface A color display device in which the color of the photonic crystal material layer reversibly changes pixel by pixel due to a change in potential generated by driving each pattern of the drive layer, the photonic crystal material layer A color display device characterized in that is configured by being divided into islands having a size equal to or smaller than the pixel size.   2. The color display device according to claim 1, wherein a size of the divided island is ¼ to 1/1000 of a pixel size.   A color display device comprising a photonic crystal material layer on one side of a display device substrate, wherein the color of the photonic crystal material layer reversibly changes in a pressing region by a change in pressure applied to the photonic crystal material layer. The color display device is characterized in that the photonic crystal material layer is divided into islands having a size equal to or smaller than the tip size of a medium to which pressure is applied.   4. The color display device according to claim 3, wherein a size of the divided island is ¼ to 1/1000 of a tip size of a medium to which pressure is applied.   The color display device according to any one of claims 1 to 4, wherein the islands configured to be separated are completely separated and independent.   The color display device according to any one of claims 1 to 5, wherein the divided islands are connected in part.   The color display device according to any one of the first to sixth aspects, wherein the brightness of the display device substrate is 0 to 4 in the Munsell color system based on JIS-Z-8721: 1993.   A method for manufacturing a color display device according to any one of claims 1 to 7, wherein the method of dividing the photonic crystal material layer into islands is by nanoimprinting. .   8. A method of manufacturing a color display device according to claim 1, wherein the method of dividing the photonic crystal material layer into islands is by photolithography. .   10. A method of manufacturing a color display device according to claim 1, wherein the island-shaped photonic crystal material layer is formed on the display device substrate by a transfer method. A method for manufacturing a color display device.

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