JP2011209250A - Sample introduction device for induction coupling plasma analyzer - Google Patents

Sample introduction device for induction coupling plasma analyzer Download PDF

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JP2011209250A
JP2011209250A JP2010080013A JP2010080013A JP2011209250A JP 2011209250 A JP2011209250 A JP 2011209250A JP 2010080013 A JP2010080013 A JP 2010080013A JP 2010080013 A JP2010080013 A JP 2010080013A JP 2011209250 A JP2011209250 A JP 2011209250A
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sample
solution
sample introduction
sample solution
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Ippei Takasaki
一平 高崎
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Denka Co Ltd
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Denki Kagaku Kogyo KK
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Abstract

PROBLEM TO BE SOLVED: To achieve accurate and rapid qualitative analysis, quantitative analysis, and isotope ratio analysis of an element by preventing pollution (memory effect) caused by a sample solution attached to or accumulated in an induction coupling plasma analyzer or a sample introduction device.SOLUTION: The sample introduction device includes a replaceable sample solution introduction nozzle 23 branched from a sample introduction tube 26, and reduces a memory effect by simultaneously introducing a sample solution and a washing solution. An advantage thereof is that the time required for washing after measurement of the sample solution can be remarkably reduced and further precise element analysis is available.

Description

本発明は、迅速かつ精確な、元素の「定性分析・定量分析・同位体比分析」を可能とした誘導結合プラズマ分析装置用試料導入装置に関するものである。元素の分析の分野において、「定性分析」は試料にどのような元素が含まれるかを測定すること、「定量分析」は試料に含まれる元素の量を測定すること、「同位体比分析」は、試料に含まれるある元素の同位体の存在比を測定することを指す。「同位体比分析」は、広義では定量分析に含まれるが、区別することも多いため、ここでは定量分析とは分けて記した。以下、元素の「定性分析・定量分析・同位体比分析」をまとめて、「元素分析」と呼ぶ。   The present invention relates to a sample introduction device for an inductively coupled plasma analyzer that enables quick and accurate “qualitative analysis / quantitative analysis / isotope ratio analysis” of elements. In the field of elemental analysis, “qualitative analysis” measures what elements are contained in a sample, “quantitative analysis” measures the amount of elements contained in a sample, “isotope ratio analysis” Refers to measuring the abundance ratio of an isotope of a certain element contained in a sample. “Isotope ratio analysis” is included in quantitative analysis in a broad sense, but is often distinguished from it, so it is described separately from quantitative analysis here. Hereinafter, “qualitative analysis / quantitative analysis / isotope ratio analysis” of elements will be collectively referred to as “elemental analysis”.

誘導結合プラズマ分析装置は、溶液中の元素の分析装置であり、光の波長から元素の定性分析を行い、光の強度から定量分析を行う誘導結合プラズマ発光分析装置(以下ICP−AESと呼ぶ)と、イオンの質量から元素の定性分析を行い、イオン計数率やカウント数から定量分析や同位体比分析を行う誘導結合プラズマ質量分析装置(以下ICP−MSと呼ぶ)がある。どちらも、ネブライザ、スプレーチャンバ、プラズマトーチ、ワークコイル、高周波電源、検出器から構成される。ネブライザには試料導入管が繋がっており、試料導入管内に導入された試料溶液や洗浄液は、しごきポンプなどによって送液され、ネブライザに導かれる。ネブライザは、導かれた試料溶液や洗浄液を霧状にして噴霧する働きをしている(以下、試料導入管からネブライザまでをまとめて、特に試料導入装置と呼ぶ)。スプレーチャンバは、噴霧された霧の粒径をふるいわける働きをしている。プラズマトーチの先端にはワークコイルが巻かれており、ワークコイルには高周波電源により高周波電力が印加される。この高周波電力により、プラズマトーチに導入、噴霧された試料溶液や洗浄液は同時に導入されるアルゴンなどのガスと共にプラズマとなる。検出器では光またはイオンから元素分析を行う。   An inductively coupled plasma analyzer is an analyzer of elements in a solution, and performs an inductively coupled plasma emission analyzer (hereinafter referred to as ICP-AES) that performs qualitative analysis of elements from the wavelength of light and performs quantitative analysis from the intensity of light. And an inductively coupled plasma mass spectrometer (hereinafter referred to as ICP-MS) that performs qualitative analysis of elements from the mass of ions and performs quantitative analysis and isotope ratio analysis from ion count rates and counts. Both consist of a nebulizer, spray chamber, plasma torch, work coil, high frequency power supply, and detector. A sample introduction tube is connected to the nebulizer, and the sample solution and the cleaning solution introduced into the sample introduction tube are fed by an ironing pump or the like and guided to the nebulizer. The nebulizer serves to spray the introduced sample solution or cleaning liquid in the form of a mist (hereinafter, the sample introduction tube to the nebulizer are collectively referred to as a sample introduction device). The spray chamber serves to screen the particle size of the atomized mist. A work coil is wound around the tip of the plasma torch, and high frequency power is applied to the work coil by a high frequency power source. By this high frequency power, the sample solution and cleaning liquid introduced and sprayed into the plasma torch become plasma together with a gas such as argon introduced at the same time. The detector performs elemental analysis from light or ions.

従来の技術を図1を用いて説明する。図1において、1は試料溶液、2は洗浄液、3は試料導入管、4は送液用のしごきポンプ、5はネブライザである。試料溶液1または洗浄液2は、試料導入管3を通り、ネブライザ5に達する。試料溶液の測定後は洗浄液容器に試料導入管を入れて洗浄液を噴霧し、十分洗浄した後に試料導入管を再度試料溶液容器に入れ、試料溶液を導入する。すなわち、試料溶液と洗浄液は交互に導入する。   A conventional technique will be described with reference to FIG. In FIG. 1, 1 is a sample solution, 2 is a cleaning liquid, 3 is a sample introduction tube, 4 is a squeezing pump for liquid feeding, and 5 is a nebulizer. The sample solution 1 or the cleaning solution 2 passes through the sample introduction tube 3 and reaches the nebulizer 5. After the measurement of the sample solution, the sample introduction tube is placed in the washing solution container and sprayed with the washing solution. After sufficient washing, the sample introduction tube is again placed in the sample solution vessel and the sample solution is introduced. That is, the sample solution and the cleaning solution are introduced alternately.

しかし、従来の技術には、試料溶液の付着や滞留による、試料導入管および誘導結合プラズマ分析装置の汚染(以下、メモリー効果と呼ぶ)という問題がある。従来の試料導入装置では、試料溶液は試料導入管内を通過し誘導結合プラズマ分析装置に導入されるが、その際にホウ素など一部の元素は、試料導入管や誘導結合プラズマ分析装置内の各部に滞留しやすい。そのため、複数の試料溶液を分析するときには、滞留して残った試料溶液がバックグラウンド強度の上昇を引き起こすなど、以後の試料の分析結果の精確さに悪影響を及ぼしてしまう。   However, the conventional technique has a problem that the sample introduction tube and the inductively coupled plasma analyzer are contaminated (hereinafter referred to as a memory effect) due to adhesion or retention of the sample solution. In the conventional sample introduction device, the sample solution passes through the sample introduction tube and is introduced into the inductively coupled plasma analyzer. At this time, some elements such as boron are part of the sample introduction tube and inductively coupled plasma analyzer. It is easy to stay in. Therefore, when analyzing a plurality of sample solutions, the remaining sample solution causes an increase in background intensity, which adversely affects the accuracy of subsequent analysis results of the sample.

この問題はICP−MSのようなpptレベルの超微量の元素分析を行う装置では特に重大である。このため、従来の試料導入装置では、メモリー効果の抑制のために、試料溶液の測定の度に洗浄液を長時間噴霧する必要があった。   This problem is particularly serious in an apparatus that performs an extremely small amount of elemental analysis at the ppt level, such as ICP-MS. For this reason, in the conventional sample introduction apparatus, it is necessary to spray the cleaning liquid for a long time each time the sample solution is measured in order to suppress the memory effect.

この改善策として、六方バルブやローター等の、試料溶液が滞留しやすい部品を使用しない試料導入装置(特許文献1)や、試料毎に二つのネブライザおよび試料導入管を切換えて用い、一方を使用中に他方を洗浄する試料導入装置(特許文献2)が開示されている。しかしながら、特許文献1の装置では試料導入管へのメモリー効果については対策が取られていない。特許文献2の装置では原理上二つのネブライザが必要となる。また、どちらの装置でもスプレーチャンバ内のメモリー効果については対策とならない。 As a measure to improve this, a sample introduction device (Patent Document 1) that does not use parts such as hexagonal valves and rotors that easily retain sample solutions, or two nebulizers and sample introduction pipes are switched for each sample. A sample introduction device (Patent Document 2) that cleans the other is disclosed. However, the apparatus of Patent Document 1 does not take measures against the memory effect on the sample introduction tube. The device of Patent Document 2 requires two nebulizers in principle. Neither device provides a measure for the memory effect in the spray chamber.

特開平8−055601号公報JP-A-8-055601 特開平5−142124号公報JP-A-5-142124

解決しようとする問題点は、誘導結合プラズマ分析装置によって元素分析を行う上で、迅速さおよび精確さの障害となる、メモリー効果の低減である。   The problem to be solved is a reduction in the memory effect, which is an obstacle to speed and accuracy when elemental analysis is performed by an inductively coupled plasma analyzer.

本発明は、試料溶液と洗浄液を同時に導入することで、メモリー効果の低減を効率的に可能にしたことである。   The present invention is to efficiently reduce the memory effect by introducing the sample solution and the cleaning solution at the same time.

本発明の試料導入装置は、試料導入管から分岐した付けかえ式の試料溶液導入用ノズルを備え、試料溶液と洗浄液を同時に導入するため、メモリー効果を低減する。これにより、試料溶液の測定後、洗浄に要する時間が大幅に削減できるとともに、より精確な元素分析が可能となるという利点がある。   The sample introduction apparatus of the present invention includes a replaceable sample solution introduction nozzle branched from the sample introduction tube, and simultaneously introduces the sample solution and the cleaning solution, thereby reducing the memory effect. Thereby, after measurement of the sample solution, there is an advantage that time required for cleaning can be greatly reduced and more accurate elemental analysis can be performed.

図1は従来の試料導入装置の概略を示した説明図である。FIG. 1 is an explanatory view showing an outline of a conventional sample introduction apparatus. 図2は本発明の試料導入装置の概略を示した説明図である。FIG. 2 is an explanatory view showing an outline of the sample introduction apparatus of the present invention. 図3は従来の試料導入装置と本発明の試料導入装置の洗浄効果を比較した説明図である。FIG. 3 is an explanatory diagram comparing the cleaning effects of the conventional sample introduction apparatus and the sample introduction apparatus of the present invention.

試料溶液と洗浄液を同時に導入するという目的を、最少の部品点数で実現した。図2は、本発明装置の1実施例の概略図であって、21は試料溶液、22は洗浄液、23は付けかえ式のノズル、24は洗浄液送液用のしごきポンプ、25は洗浄液および試料溶液送液用のしごきポンプ、26は試料導入管、27はネブライザである。   The objective of introducing the sample solution and the cleaning solution at the same time was realized with the minimum number of parts. FIG. 2 is a schematic view of an embodiment of the apparatus of the present invention, in which 21 is a sample solution, 22 is a cleaning liquid, 23 is a replaceable nozzle, 24 is a cleaning pump for feeding a cleaning liquid, and 25 is a cleaning liquid and a sample. An ironing pump for solution feeding, 26 is a sample introduction tube, and 27 is a nebulizer.

本発明を使用した誘導結合プラズマ質量分析装置で行う分析の流れを説明する。試料溶液21および洗浄液22は、試料導入管26を通り、ネブライザ27に達する。しごきポンプ24および25によって試料溶液と洗浄液は同時に吸引され、ネブライザに導入される。測定後は、付けかえ式のノズル23を取り外して蓋をすることで、洗浄液のみを導入して経路を洗浄できる。続けて別な試料溶液を測定する場合、信号強度が試料溶液噴霧時の1/500になるまで洗浄液を導入した後に、新しい付けかえ式のノズルを取り付けることで、次の試料溶液が測定可能となる。本発明の主体は試料溶液および洗浄液の導入方法にあるので、ネブライザ以降の経路の説明は省略する。   The flow of analysis performed by the inductively coupled plasma mass spectrometer using the present invention will be described. The sample solution 21 and the cleaning liquid 22 pass through the sample introduction tube 26 and reach the nebulizer 27. The sample solution and the cleaning solution are simultaneously sucked by the squeezing pumps 24 and 25 and introduced into the nebulizer. After the measurement, by removing the replaceable nozzle 23 and closing the lid, the path can be cleaned by introducing only the cleaning liquid. When measuring another sample solution in succession, it is possible to measure the next sample solution by installing a new replaceable nozzle after introducing the cleaning solution until the signal intensity becomes 1/500 of the sample solution spray. Become. Since the main body of the present invention is the method for introducing the sample solution and the cleaning liquid, description of the path after the nebulizer is omitted.

このような試料溶液および洗浄液の導入方法を採用することにより、長時間の洗浄を要することなく、迅速な元素分析が可能となる。さらに、バックグラウンド強度を低減させることができ、精確な元素分析が可能となる。   By adopting such a method of introducing the sample solution and the cleaning liquid, rapid elemental analysis can be performed without requiring long-time cleaning. Furthermore, the background intensity can be reduced, and accurate elemental analysis can be performed.

[実施例1]
試料として、米国の国立標準技術研究所(National Institute of Standards and Technology,NIST)が供給する、ホウ酸の認証標準物質(StandardReference Materials,SRM)、NIST SRM 951aを使用した。ホウ酸粉末を純水に溶かし、ICP−MSに導入された際にB濃度が200ppbとなるよう希釈し、ホウ酸水溶液を調製した。このホウ酸水溶液を試料溶液として、従来の試料導入装置または本発明を使用してICP−MSに約30分間噴霧した後、洗浄液を導入し、信号強度が充分下がるまでに要する洗浄時間を計測した。洗浄液には、ホウ素の洗浄液として知られているマンニトール-アンモニア水溶液を用いた。0.1 Mアンモニア水溶液に0.25質量%のマンニトール濃度になるように調整した。ここでは、信号強度が充分下がったと判断する基準は、信号強度が試料溶液噴霧時の1/500まで下がることとした。測定における実測値を図3に示す。
[Example 1]
As a sample, NIST SRM 951a, a certified reference material for boric acid (Standard Reference Materials, SRM) supplied by National Institute of Standards and Technology, NIST of the United States, was used. Boric acid powder was dissolved in pure water and diluted to have a B concentration of 200 ppb when introduced into ICP-MS to prepare an aqueous boric acid solution. Using this boric acid aqueous solution as a sample solution, spraying the ICP-MS for about 30 minutes using a conventional sample introduction apparatus or the present invention, then introducing the cleaning solution, and measuring the cleaning time required until the signal intensity sufficiently decreases. . As the cleaning liquid, a mannitol-ammonia aqueous solution known as a boron cleaning liquid was used. It adjusted so that it might become a 0.25 mass% mannitol density | concentration in 0.1 M ammonia aqueous solution. Here, the criterion for judging that the signal intensity has sufficiently decreased is that the signal intensity is reduced to 1/500 of the time when the sample solution is sprayed. The actual measurement value in the measurement is shown in FIG.

測定に使用した機器は、横河アナリティカルシステムズ社製ICP−MS4500である。測定条件を以下に示す。
RF出力 : 1340W
RFマッチング : 2V
キャリアガス(Ar) : 1.11L/min
ポンプ流速(測定時) : 0.3mL/min
ポンプ流速(洗浄時) : 0.9mL/min
スプレーチャンバ : スコット型(ポリエチレン製)
スプレーチャンバ温度 : 2℃
ネブライザ : クロスフロー型(ポリエチレン製)
質量分析計 : 四重極型
測定モード : 同位体測定
測定点数 : 1(ピークトップのみ)
The instrument used for the measurement is ICP-MS4500 manufactured by Yokogawa Analytical Systems. The measurement conditions are shown below.
RF output: 1340W
RF matching: 2V
Carrier gas (Ar): 1.11 L / min
Pump flow rate (during measurement): 0.3 mL / min
Pump flow rate (during washing): 0.9 mL / min
Spray chamber: Scott type (polyethylene)
Spray chamber temperature: 2 ° C
Nebulizer: Cross flow type (polyethylene)
Mass spectrometer: Quadrupole measurement mode: Number of measurement points for isotope measurement: 1 (peak top only)

[比較例1]
従来の試料導入装置(図1)を使用した以外は実施例1と同様の条件で信号強度が試料溶液噴霧時の1/500になるまでに要する洗浄時間を計測した。実測値を図3に示す。
[Comparative Example 1]
The cleaning time required until the signal intensity became 1/500 of that during spraying of the sample solution was measured under the same conditions as in Example 1 except that the conventional sample introduction apparatus (FIG. 1) was used. The actual measurement values are shown in FIG.

従来の試料導入装置を使用した場合には、信号強度が試料溶液噴霧時の1/500になるまでに20分以上を要した。一方で、本発明の試料導入装置を使用した場合では、洗浄時間約4分で信号強度が試料溶液噴霧時の1/500まで低下した。以上より、本発明の試料導入装置の利用によって、従来の試料導入装置を使用した場合と比較して、洗浄に要する時間が大幅に削減できることが確認できた。このことは多数の分析試料を迅速に処理することができ、おおいに役立つ。 When a conventional sample introduction apparatus was used, it took 20 minutes or more for the signal intensity to become 1/500 that of the sample solution spray. On the other hand, in the case of using the sample introduction apparatus of the present invention, the signal intensity decreased to 1/500 when the sample solution was sprayed after about 4 minutes of washing time. From the above, it was confirmed that the time required for cleaning can be significantly reduced by using the sample introduction apparatus of the present invention, as compared with the case of using the conventional sample introduction apparatus. This is very useful because it can process a large number of analytical samples quickly.

試料導入管および試料導入管から分岐した付けかえ式のノズルによって、試料溶液と洗浄液を同時に導入でき、メモリー効果の起こりやすい試料の分析用途に適用できる。   A sample solution and a cleaning solution can be introduced simultaneously by a sample introduction tube and a replaceable nozzle branched from the sample introduction tube, which can be applied to analysis of a sample in which a memory effect easily occurs.

1 試料溶液
2 洗浄液
3 しごきポンプ
4 試料導入管
5 ネブライザ
21 試料溶液
22 洗浄液
23 付けかえ式のノズル
24 しごきポンプ(洗浄液送液用)
25 しごきポンプ(洗浄液および試料溶液送液用)
26 試料導入管
27 ネブライザ
DESCRIPTION OF SYMBOLS 1 Sample solution 2 Cleaning liquid 3 Ironing pump 4 Sample introduction pipe 5 Nebulizer 21 Sample solution 22 Cleaning liquid 23 Replacement type nozzle 24 Ironing pump (for liquid supply of cleaning liquid)
25 Ironing pump (for feeding cleaning solution and sample solution)
26 Sample introduction tube 27 Nebulizer

Claims (4)

溶液中の元素の定性分析、定量分析または同位体比分析を行う誘導結合プラズマ分析装置に試料溶液を導入するための装置であり、試料溶液を入れる試料容器と、試料溶液が誘導結合プラズマ分析装置に導入されるまでの経路を洗浄するための洗浄液を入れた洗浄液容器と、洗浄液を吸入して誘導結合プラズマ分析装置に導く試料導入管を備えた、誘導結合プラズマ分析装置用試料導入装置。 A device for introducing a sample solution into an inductively coupled plasma analyzer that performs qualitative analysis, quantitative analysis or isotope ratio analysis of elements in a solution, a sample container for containing the sample solution, and the sample solution being an inductively coupled plasma analyzer A sample introduction device for an inductively coupled plasma analyzer, comprising: a washing solution container containing a washing solution for washing a path until the sample is introduced into the tube; and a sample introduction tube that sucks the washing solution and guides it to the inductively coupled plasma analyzer. 試料導入管から分岐して試料容器に繋がり、試料溶液を吸入して誘導結合プラズマ分析装置に導く、付けかえ式の試料溶液導入用ノズルを備え、試料溶液と洗浄液を同時に導入することを特徴とする請求項1記載の誘導結合プラズマ分析装置用試料導入装置。   Features a replaceable sample solution introduction nozzle that branches from the sample introduction tube, connects to the sample container, sucks the sample solution, and guides it to the inductively coupled plasma analyzer, and simultaneously introduces the sample solution and the cleaning solution. The sample introduction device for an inductively coupled plasma analyzer according to claim 1. 試料導入管について、洗浄液中に浸した一端から試料溶液導入用ノズルを接合する部位までの間と、前記接合部位から試料噴霧器(ネブライザ)に導入するまでの間の2箇所にしごきポンプを備え、洗浄液および洗浄液と試料溶液の導入量を一定に制御可能なことを特徴とする請求項1または2記載の誘導結合プラズマ分析装置用試料導入装置。   About the sample introduction tube, a squeeze pump is provided at two locations between one end immersed in the cleaning liquid and a portion where the nozzle for introducing the sample solution is joined, and between the joined portion and the sample sprayer (nebulizer). The sample introduction apparatus for an inductively coupled plasma analyzer according to claim 1 or 2, wherein the introduction amount of the cleaning liquid and the cleaning liquid and the sample solution can be controlled to be constant. 定性分析または定量分析または同位体比分析の目的元素がホウ素であることを特徴とする請求項1〜3のいずれか一項記載の誘導結合プラズマ分析装置用試料導入装置。
The sample introduction device for an inductively coupled plasma analyzer according to any one of claims 1 to 3, wherein the target element for qualitative analysis, quantitative analysis or isotope ratio analysis is boron.
JP2010080013A 2010-03-31 2010-03-31 Sample introduction device for induction coupling plasma analyzer Pending JP2011209250A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102890113A (en) * 2012-10-09 2013-01-23 浙江大学 Method for abating mercury memory effect in ICP-MS (inductively coupled plasma-mass spectrometry) detection
CN104777155A (en) * 2015-04-15 2015-07-15 武汉上谱分析科技有限责任公司 Rotary channel type laser denudation pool
CN106370717A (en) * 2016-08-24 2017-02-01 战锡林 Method of eliminating mercury memory effect during mercury measurement with inductively coupled plasma mass spectrometer (ICP-MS)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102890113A (en) * 2012-10-09 2013-01-23 浙江大学 Method for abating mercury memory effect in ICP-MS (inductively coupled plasma-mass spectrometry) detection
CN104777155A (en) * 2015-04-15 2015-07-15 武汉上谱分析科技有限责任公司 Rotary channel type laser denudation pool
CN104777155B (en) * 2015-04-15 2017-06-09 武汉上谱分析科技有限责任公司 A kind of rotating channel formula laser ablation pond
CN106370717A (en) * 2016-08-24 2017-02-01 战锡林 Method of eliminating mercury memory effect during mercury measurement with inductively coupled plasma mass spectrometer (ICP-MS)

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