JP2011167613A - Method of forming coated film and method of manufacturing coated film laminate - Google Patents

Method of forming coated film and method of manufacturing coated film laminate Download PDF

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JP2011167613A
JP2011167613A JP2010032714A JP2010032714A JP2011167613A JP 2011167613 A JP2011167613 A JP 2011167613A JP 2010032714 A JP2010032714 A JP 2010032714A JP 2010032714 A JP2010032714 A JP 2010032714A JP 2011167613 A JP2011167613 A JP 2011167613A
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coating
die
base material
lip surface
coating liquid
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JP5564975B2 (en
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Susumu Taguchi
将 田口
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Mitsubishi Chemical Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of forming coated film for taking an allowance range of a gap between a die and a base material large in coated film formation by slot coating, and to provide a method of manufacturing coated film laminate. <P>SOLUTION: The method of forming coated film includes: a step of arranging a sheet-like base material on a roller having a diameter D (mm); a step of causing the roller to rotate; and a step of supplying coating liquid from the die to the surface of the base material rotating while following up the roller, wherein the die has an upstream side lip surface as a surface capable of retaining the coating liquid between the die and the base material and a downstream side lip surface which is arranged more on the downstream side in the rotation direction from the upstream side lip surface and is a surface capable of retaining the coating liquid between the die and the base material, an interval that ejects the coating liquid is formed between the upstream side lip surface and the downstream side lip surface and the length of the upstream side lip surface in the roller rotation direction is 2.0-0.02D (mm). <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は、ダイを使用したスロット塗布により基材表面に塗膜を形成する方法および、塗膜積層体の製造方法に関する。   The present invention relates to a method for forming a coating film on a substrate surface by slot coating using a die and a method for manufacturing a coating film laminate.

電子写真感光体、太陽電池、およびカラーフィルター等の光学機能フィルターのような、基材上に所定の機能を有する塗膜が形成されてその機能を発揮する塗膜積層体が多くの機器に用いられている。基材上に塗膜を形成する方法は、当該塗膜の特性等に応じて様々な方法が提案されている。   A coating layered product in which a coating film having a predetermined function is formed on a base material, such as an electrophotographic photosensitive member, a solar cell, and an optical functional filter such as a color filter, is used in many devices. It has been. Various methods for forming a coating film on a substrate have been proposed according to the characteristics of the coating film.

かかる塗膜の形成方法のうちの1つに、スロット塗布による塗膜の形成方法がある。これは、液状である塗布液を供給するダイを平面状やロール状等の基材に対向させるとともに、相対的に一方向へ走行させつつ基材表面に塗布液を供給する方法である。すなわち、基材の走行方向の上流側に位置する上流側リップと下流側に位置する下流側リップとを有するリップによって塗布液吐出口が形成されたダイを用い、リップと基材表面との間に一定の間隔を保持して塗布液吐出口から塗布液を吐出することにより、基材表面に所定の膜厚の塗布膜を形成する。   One of such methods for forming a coating film is a method for forming a coating film by slot coating. This is a method in which a die for supplying a liquid coating liquid is opposed to a planar or roll-shaped substrate, and the coating liquid is supplied to the surface of the substrate while traveling relatively in one direction. That is, using a die in which a coating liquid discharge port is formed by a lip having an upstream lip located on the upstream side in the running direction of the substrate and a downstream lip located on the downstream side, between the lip and the substrate surface A coating film having a predetermined film thickness is formed on the surface of the substrate by discharging the coating liquid from the coating liquid discharge port while maintaining a certain interval.

このようなスロット塗布による塗布方法が特許文献1、および特許文献2に開示されている。これら文献では、ここに記載の条件を満たすことにより、塗布欠陥を抑制したり、塗布速度を向上させたりすることができる。   Patent document 1 and patent document 2 disclose such a coating method by slot coating. In these documents, application defects can be suppressed or application speed can be improved by satisfying the conditions described herein.

特開2004−216298号公報JP 2004-216298 A 特開2003−10773号公報JP 2003-10773 A

上記したようにスロット塗布による塗膜形成方法では、ダイと基材との間隔を所定の範囲内に保持しておく必要がある。この間隔が小さすぎると該間隔内に存する塗布液の内圧が上がり、液だれが生じてしまう。逆にこの間隔が大きすぎると雰囲気中の空気を巻き込こんでしまう。いずれの場合も適切な塗膜を形成することができず、これを回避するために、間隔の制御は重要である。   As described above, in the method of forming a coating film by slot coating, it is necessary to keep the distance between the die and the substrate within a predetermined range. If this interval is too small, the internal pressure of the coating solution existing in the interval increases, and dripping occurs. Conversely, if this distance is too large, air in the atmosphere will be entrained. In either case, an appropriate coating film cannot be formed, and in order to avoid this, control of the interval is important.

しかしながら、特許文献1や特許文献2に記載されるような従来の技術では、上記不具合を回避するための許容される間隔の範囲が狭かった。そのため、間隔制御のための手間が大きいことや、幅が広い基材に塗膜を形成する(塗布する)際に全幅に亘って間隔を許容範囲内に収めることが困難であるという問題があった。   However, in the conventional techniques described in Patent Document 1 and Patent Document 2, the range of allowable intervals for avoiding the above-described problems has been narrow. For this reason, there is a problem that it takes a lot of time and effort to control the distance, and it is difficult to keep the distance within an allowable range over the entire width when a coating film is formed (applied) on a wide substrate. It was.

そこで、本発明は上記問題点に鑑み、スロット塗布による塗膜形成において、ダイと基材との間隙の許容範囲を大きく取ることができる塗膜形成方法、および塗膜積層体の製造方法を提供することを課題とする。   Accordingly, in view of the above problems, the present invention provides a method for forming a coating film and a method for manufacturing a coating film laminate that can provide a large allowable range of the gap between the die and the substrate in forming a coating film by slot coating. The task is to do.

以下、本発明について説明する。ここではわかりやすさのため括弧書きにて図面の参照符号を付すが、本発明はこれに限定されるものではない。   The present invention will be described below. Here, for ease of understanding, reference numerals of the drawings are given in parentheses, but the present invention is not limited to this.

請求項1に記載の発明は、直径D(mm)のロール上にシート状の基材(1)を配置し、ロールを回転させ、ロールに追随して回転する基材表面にダイ(10)から塗布液(2)を供給して塗膜を形成する方法であって、ダイは、基材との間に塗布液を保持可能な面である上流側リップ面(11a)と、上流側リップ面よりも回転の方向下流側に配置され、基材との間に塗布液を保持可能な面である下流側リップ面(12a)と、を有し、上流側リップ面と下流側リップ面との間には塗布液が吐出する間隔(G)が形成されており、上流側リップ面の、ロール回転方向の長さが2.0(mm)以上、0.02D(mm)以下である塗膜形成方法である。   According to the first aspect of the present invention, a sheet-like base material (1) is arranged on a roll having a diameter D (mm), the roll is rotated, and the die (10) is rotated on the surface of the base material following the roll. The coating liquid (2) is supplied from the substrate to form a coating film, the die having an upstream lip surface (11a) which is a surface capable of holding the coating liquid between the substrate and the upstream lip A downstream lip surface (12a) that is disposed downstream of the surface in the direction of rotation and is capable of holding the coating liquid between the substrate and the upstream lip surface and the downstream lip surface; A gap (G) at which the coating liquid is discharged is formed between the two, and the length of the upstream lip surface in the roll rotation direction is 2.0 (mm) or more and 0.02 D (mm) or less. This is a film forming method.

請求項2に記載の発明は、請求項1に記載の塗膜形成方法において、上流側リップ面(11a)の、ロール回転方向の長さが、下流側リップ面(12a)の当該長さよりも長いことを特徴とする。   The invention according to claim 2 is the coating film forming method according to claim 1, wherein the length of the upstream lip surface (11a) in the roll rotation direction is longer than the length of the downstream lip surface (12a). Characterized by its long length.

請求項3に記載の発明は、請求項1又は2に記載の塗膜形成方法において、塗膜幅が1000(mm)以上であることを特徴とする。   A third aspect of the present invention is the coating film forming method according to the first or second aspect, wherein the coating film width is 1000 (mm) or more.

請求項4に記載の発明は、請求項1〜3のいずれか一項に記載の塗膜形成方法により基材上に塗膜を塗布する工程、および塗布された塗膜を乾燥する工程を含む塗膜積層体の製造方法である。   Invention of Claim 4 includes the process of apply | coating a coating film on a base material by the coating-film formation method as described in any one of Claims 1-3, and the process of drying the apply | coated coating film. It is a manufacturing method of a coating-film laminated body.

本発明によれば、スロット塗布による塗膜形成において、ダイと基材との間隙の許容範囲を大きく取ることができる。これにより、当該間隔の制御を容易とし、さらに、より幅広の基材への塗布も適切に行うことが可能となる。   According to the present invention, in forming a coating film by slot coating, a large allowable range of the gap between the die and the substrate can be obtained. As a result, the control of the interval can be facilitated, and furthermore, application to a wider base material can be appropriately performed.

1つの実施形態に係る塗膜形成方法のうち、用いられるダイの形状を模式的に表した断面図である。It is sectional drawing which represented typically the shape of the die | dye used among the coating-film formation methods which concern on one embodiment. 図1における各種寸法や位置関係の記号を表した図である。FIG. 2 is a diagram showing symbols for various dimensions and positional relationships in FIG. 1.

本発明の上記した作用および利得は、次に説明する発明を実施するための形態から明らかにされる。以下本発明を図面に示す実施形態に基づき説明する。ただし本発明はこれら実施形態に限定されるものではない。   The above-mentioned operation and gain of the present invention will be clarified from the following embodiments for carrying out the invention. Hereinafter, the present invention will be described based on embodiments shown in the drawings. However, the present invention is not limited to these embodiments.

図1は、1つの実施形態に係る塗膜形成方法に用いられるダイ10の構造を模式的に表わす断面図である。図1には、塗膜が形成される基材1、及び塗膜となる塗布液2も併せて表わしている。ダイ10は、図1に表れる断面を概ね維持して紙面奥/手前方向に延在している。また、図2にはダイ10やその配置に関する各寸法等の記号を表した。   FIG. 1 is a cross-sectional view schematically showing the structure of a die 10 used in a coating film forming method according to one embodiment. FIG. 1 also shows a base material 1 on which a coating film is formed, and a coating liquid 2 to be a coating film. The die 10 extends substantially in the back / front direction of the drawing while maintaining the cross section shown in FIG. Further, FIG. 2 shows symbols such as dimensions related to the die 10 and its arrangement.

ダイ10は、上流側リップ11と、塗膜が形成される方向に対して上流側リップ11の下流側に配置される下流側リップ12とを備えている。上流側リップ11と下流側リップ12との間には間隙Gが形成されている。   The die 10 includes an upstream lip 11 and a downstream lip 12 disposed on the downstream side of the upstream lip 11 with respect to the direction in which the coating film is formed. A gap G is formed between the upstream lip 11 and the downstream lip 12.

上流側リップ11は図1、図2からわかるように、上流側リップ面11a、傾斜面11bおよび間隙形成面11cを備えている。
上流側リップ面11aは、基材1に対向して配置される長さtの面である。上流側リップ面11aは、図2に示したように基材1と距離dの間隙を有して位置づけられる。上流側リップ面11aは、ダイ10と基材1が相対的に移動して塗布液2を塗布する際に、少なくとも一部が塗布液2に接し、ここに塗布液2を保持可能とする面である。
傾斜面11bは、上流側リップ面11aの上流側端部から折れ曲がるように配置される面で、上流側リップ面11aに対してθの角度を有している。
間隙形成面11cは、上流側リップ面11aの下流側端部から略垂直に形成された面で、後述する下流側リップ12の間隙形成面12dとの間で間隙Gを形成する。
As can be seen from FIGS. 1 and 2, the upstream lip 11 includes an upstream lip surface 11a, an inclined surface 11b, and a gap forming surface 11c.
The upstream lip surface 11 a is a surface having a length t 1 disposed to face the base material 1. Upstream lip surface 11a is positioned with a gap of the substrate 1 and the distance d 1 as shown in FIG. The upstream lip surface 11a is a surface that allows at least a part of the upstream lip surface 11a to be in contact with the coating liquid 2 when the die 10 and the substrate 1 are moved relative to each other to apply the coating liquid 2, and hold the coating liquid 2 here. It is.
The inclined surface 11b is a surface to be arranged so bent from the upstream end of the upstream lip surface 11a, has an angle of theta 1 to the upstream side lip surface 11a.
The gap forming surface 11c is a surface formed substantially perpendicularly from the downstream end of the upstream lip surface 11a, and forms a gap G with a gap forming surface 12d of the downstream lip 12 described later.

上流側リップ面11aの長さtは、2.0(mm)以上で、0.02D(mm)以下とする。ここでDは基材1が配置されるロールの直径(mm)である。tを2.0(mm)より小さくすると、上流側リップ面11aと基材1との距離(d)を近付けることによる液圧上昇に起因する液だれが生じやくなり、dの許容範囲が狭くなる。一方、tが0.02D(mm)より大きくなると、ロールの曲率によりリップ面が徐々にロール面から離れるため、その意味がなくなって無駄が生じるので好ましくない。例えばロールとリップ面との間隔調整の際に無駄な部分が邪魔になったり、リップ自体の重量が増す等の不具合を生じることがある。 The length t 1 of the upstream lip surface 11a is 2.0 (mm) or more and 0.02 D (mm) or less. Here, D is the diameter (mm) of the roll on which the substrate 1 is disposed. When t 1 is smaller than 2.0 (mm), the dripping due to the increase in the hydraulic pressure due to the distance (d 1 ) between the upstream lip surface 11a and the base material 1 is likely to occur, and the tolerance of d 1 The range becomes narrower. On the other hand, if t 1 is larger than 0.02 D (mm), the lip surface gradually moves away from the roll surface due to the curvature of the roll. For example, when adjusting the distance between the roll and the lip surface, a wasteful part may become an obstacle and the lip itself may increase in weight.

間隙dは、上流側リップ面11aと基材1との間隙の大きさであり、これが適切な範囲内にあることが必要である。適切なdの範囲が大きければ間隙の制御が容易になる。また、適切なdの範囲が大きいことにより、幅方向(図1における紙面奥/手前方向)に広い基材においてもダイの位置調整を行いやすくなり、局部的に適切な塗布条件から外れる不具合を減らすことができる。例えば塗膜幅が1000mm以上のような場合にも不具合なく塗布をすることが可能となる。適切なdの具体的範囲はtにより変動するが、tが上記した範囲にあることにより、従来に比べてこの範囲を大きくすることが可能である。
なお、間隙dが適切な範囲より大きくなると塗布液中に空気を巻き込む可能性が高くなる。一方、間隙dが適切な範囲より小さくなると塗布液の内圧が高くなり、液だれが生ずる。
Gap d 1 is the size of the gap between the upstream lip surface 11a and the substrate 1, which is required to be within an appropriate range. If the appropriate range of d 1 is large, the control of the gap becomes easy. In addition, since the appropriate range of d 1 is large, it is easy to adjust the position of the die even on a substrate that is wide in the width direction (backward / frontward direction in FIG. 1), and the problem of deviating from appropriate application conditions locally. Can be reduced. For example, even when the coating film width is 1000 mm or more, the coating can be performed without any trouble. Specifically appropriate range of d 1 to be used depend upon t 1 but, by t 1 is in the range described above, it is possible to increase this range as compared with the prior art.
Incidentally, it may involve air increases in the coating solution gap d 1 is larger than the appropriate range. On the other hand, the internal pressure of the coating liquid gap d 1 is smaller than the appropriate range is increased, dripping occurs.

θは、上流側リップの傾斜面11bが、塗布液2に接することのないように、塗布液2が上流側リップ面11aに接する部位が前進した場合でも、その前進を抑止できる角度を有していればよい。 θ 1 has an angle that can prevent the advancement of the inclined surface 11b of the upstream lip even when the portion where the coating liquid 2 is in contact with the upstream lip surface 11a moves forward so that the inclined surface 11b does not contact the coating liquid 2. If you do.

下流側リップ12は図1、図2からわかるように、下流側リップ面12a、第一傾斜面12b、第二傾斜面12c、および間隙形成面12dを備えている。
下流側リップ面12aは、基材1に対向して配置される長さtの面である。下流側リップ面12aは、図2に示したように基材1と距離dの間隙を有して位置づけられる。下流側リップ面12aは、ダイ10と基材1が相対的に移動して塗布液2を塗布する際に、塗布液2に接し、ここに塗布液2を保持可能とする面である。
第一傾斜面12bは、下流側リップ面12aの下流側端部から折れ曲がるように配置される面で、下流側リップ面12aに対してθの角度を有している。
第二傾斜面12cは、第一傾斜面12bの端部から折れ曲がるように配置される面で、第一傾斜面12bに対してθの角度を有している。
間隙形成面12dは、下流側リップ面12aの上流側端部から略垂直に形成された面で、上記した上流側リップ11の間隙形成面11cとの間で間隙Gを形成する。
As shown in FIGS. 1 and 2, the downstream lip 12 includes a downstream lip surface 12a, a first inclined surface 12b, a second inclined surface 12c, and a gap forming surface 12d.
The downstream lip surface 12 a is a surface having a length t 2 that is disposed to face the base material 1. Downstream lip surface 12a is positioned with a gap of the substrate 1 and the distance d 2 as shown in FIG. The downstream lip surface 12a is a surface that comes into contact with and can hold the coating liquid 2 when the die 10 and the substrate 1 move relatively to apply the coating liquid 2.
First inclined surface 12b is a surface to be arranged so bent from the downstream end of the downstream lip surface 12a, has an angle of theta 2 with respect to the downstream lip surface 12a.
The 2nd inclined surface 12c is a surface arrange | positioned so that it may bend from the edge part of the 1st inclined surface 12b, and has the angle of (theta) 3 with respect to the 1st inclined surface 12b.
The gap forming surface 12d is a surface formed substantially perpendicularly from the upstream end of the downstream lip surface 12a, and forms a gap G with the gap forming surface 11c of the upstream lip 11 described above.

下流側リップ面12aの長さtは、下流側リップ面12aと基材1との間に保持される塗布液2を安定した量で保持する観点から、短い方が好ましい。ただし短すぎると加工が困難であったり、熱変形を起こしやすいことがあるので、1.0mm〜1.5mm程度であることが好ましい。また、下流側リップ面12aの長さtは、上面側リップ面tより短いことが好ましい。これにより、液だれが発生する可能性を低減することができる。 The length t 2 of the downstream side lip surface 12a, from the viewpoint of maintaining a stable amount of the coating solution 2 to be held between the downstream side lip surface 12a and the substrate 1, is preferably short. However, if it is too short, processing may be difficult or thermal deformation may occur easily, and therefore, it is preferably about 1.0 mm to 1.5 mm. The length t 2 of the downstream side lip surface 12a is preferably shorter than the top side lip surface t 1. As a result, the possibility of dripping can be reduced.

間隙dは、これが大きすぎると下流側リップ面12aのエッジ部で塗布液が必要以上に離脱しやすくなり、塗布面が乱れる可能性が高くなる。一方、間隙dが小さすぎると下流側リップ面12aと基体1との間の塗布液の液圧が高くなり、上流側リップ面11a側に塗布液が増えて液だれが生じ易くなる。 Gap d 2, this tends to leave more than necessary the coating liquid at the edge of too large downstream lip surface 12a, is likely to coated surface is disturbed. On the other hand, the liquid pressure of the coating liquid between the gap d 2 is too small and the downstream lip surface 12a and the substrate 1 becomes high, dripping is likely to occur on the upstream side lip surface 11a side is increasing coating solution.

θは、下流側リップ面12aと第一傾斜面12bとの境界で塗布液2の界面が形成されるような傾斜とされる。これにより、塗布液2が安定し、形成される塗膜の平滑性が向上したり、ダイ10の汚れを防止することが可能になる。
θの角度の具体的な範囲は、塗布液2の粘度や塗布条件によって最適化されるため限定されないが、鈍角(下流側リップ面12aと第一傾斜面12bとのなす角のうち、下流側リップ12の内部側が鋭角)または90°であることが好ましい。その中でも加工のしやすさの観点から90°がさらに好ましい。
θ 2 is inclined such that the interface of the coating liquid 2 is formed at the boundary between the downstream lip surface 12a and the first inclined surface 12b. Thereby, the coating liquid 2 is stabilized, the smoothness of the coating film to be formed can be improved, and the dirt of the die 10 can be prevented.
The specific range of the angle θ 2 is not limited because it is optimized depending on the viscosity of the coating liquid 2 and the coating conditions, but an obtuse angle (the downstream of the angles formed by the downstream lip surface 12a and the first inclined surface 12b). It is preferable that the inner side of the side lip 12 has an acute angle) or 90 °. Among these, 90 ° is more preferable from the viewpoint of ease of processing.

θは大きすぎると下流側リップ12の剛性が低下し、逆に小さすぎると重量が大きくなるのでこれを考慮して適切な角度が設定される。 If θ 3 is too large, the rigidity of the downstream lip 12 decreases. Conversely, if θ 3 is too small, the weight increases. Therefore, an appropriate angle is set in consideration of this.

間隙形成面11c、12d間に形成される間隙Gは、不図示の塗布液流路および中間的な塗布液貯留部としてのマニホールドに連通し、塗布液吐出口を形成する。間隙Gの間隔の大きさは、塗布液2の粘度や塗布条件、目的とする塗布液の膜厚等によって適宜変更可能であり限定されない。例えば、粘度が低い塗布液を速い速度で塗布する目的の場合、塗布液が吐出する位置において間隙Gの大きさは10μm〜200μmであるとよい。間隔Gが狭すぎると機械精度の問題により一定の間隔形成が困難な傾向にあるとともに、異物による閉塞を生じる場合があり、間隔Gが広すぎると、マニホールドの塗布液貯留部の体積が大きくなるため、液の滞留が起こり易い傾向にある。   A gap G formed between the gap forming surfaces 11c and 12d communicates with a coating liquid flow path (not shown) and a manifold as an intermediate coating liquid storage section to form a coating liquid discharge port. The size of the gap G can be appropriately changed according to the viscosity of the coating liquid 2, the coating conditions, the film thickness of the target coating liquid, and the like, and is not limited. For example, in the case of applying a coating solution having a low viscosity at a high speed, the size of the gap G is preferably 10 μm to 200 μm at the position where the coating solution is discharged. If the gap G is too narrow, it may be difficult to form a constant gap due to a problem of mechanical accuracy, and may be clogged with foreign matter. If the gap G is too wide, the volume of the coating liquid reservoir of the manifold increases. Therefore, the liquid tends to stay.

ダイ10の材質は、特に限定されることはないが、例えば、金属、セラミックス、ガラス、鉱物、熱硬化性樹脂、熱可塑性樹脂やそれらの複合体等が使用される。また、ダイ10はリップ部分と他の部分で分割可能な構造であってもよく、その場合には、リップ部分の材質がその他の部分と異なっていてもよい。さらに、ダイの表面、特にリップ面、傾斜面、間隙形成面は、塗布液との関係をより好ましいものとするために親水化処理、疎水化処理などの化学的処理や、平滑処理、研磨処理、粗面化処理などの物理的処理がされていてもよい。   The material of the die 10 is not particularly limited, and for example, metal, ceramics, glass, mineral, thermosetting resin, thermoplastic resin, a composite thereof, or the like is used. The die 10 may have a structure that can be divided into a lip portion and another portion. In this case, the material of the lip portion may be different from the other portions. Furthermore, the surface of the die, particularly the lip surface, the inclined surface, and the gap forming surface are chemically treated such as a hydrophilic treatment and a hydrophobic treatment, a smooth treatment, and a polishing treatment in order to make the relationship with the coating solution more preferable. Further, physical processing such as surface roughening may be performed.

塗膜が形成される基材1の材質は特に限定されることはないが、例えば、ガラス、金属、半導体、セラミックス、熱硬化性樹脂、熱可塑性樹脂、鉱物やそれらの複合体等が挙げられる。また、基材の表面は平滑であっても凹凸があってもよい。凹凸の程度はその段差が乾燥(または固化)塗膜の厚みに対して概ね10倍程度まで良好な塗膜が得られる。凹凸としては、格子、隔壁、バンプ、スペーサー、画素パターン、回路パターン等による凹凸を挙げることができる。さらに基材1は、必要に応じて、塗布直後は塗布層を形成しているものの、所定時間経過後は塗布液を含浸、浸透又は吸収するような材質、構造であってもよい。   The material of the substrate 1 on which the coating film is formed is not particularly limited, and examples thereof include glass, metal, semiconductor, ceramics, thermosetting resin, thermoplastic resin, mineral, and composites thereof. . The surface of the substrate may be smooth or uneven. As for the degree of unevenness, a good coating film is obtained in which the level difference is approximately 10 times the dry (or solidified) coating film thickness. Examples of the irregularities include irregularities due to a lattice, partition walls, bumps, spacers, pixel patterns, circuit patterns, and the like. Furthermore, although the base material 1 forms the coating layer immediately after application | coating as needed, the base material 1 may be the material and structure which impregnates, osmose | permeates or absorbs a coating liquid after progress for a predetermined time.

塗膜の材料となる塗布液2は、必要とされる機能を有し、基材1の表面を被覆可能なものであれば、特に組成が限定されるものではないが、例えば、有機溶剤系や水系などの溶剤、ポリマーなどのバインダー、顔料や染料などの着色剤、感光剤、セラミックス粉などの充填剤、導電性付与剤、増粘剤、界面活性剤、表面改質剤、発泡剤、硬化剤、強化剤、柔軟剤などの添加剤等を挙げることができる。   The coating solution 2 as a material for the coating film is not particularly limited in composition as long as it has a required function and can cover the surface of the substrate 1. Solvents such as water and water, binders such as polymers, colorants such as pigments and dyes, photosensitive agents, fillers such as ceramic powder, conductivity imparting agents, thickeners, surfactants, surface modifiers, foaming agents, Examples thereof include additives such as curing agents, reinforcing agents, and softening agents.

塗布液2の性状も特に限定されず、均一な溶液のほか、懸濁液、スラリー状、ペースト状など種々の性状のものを用いることができ、さらには気泡を含むものであってもよい。また、塗布液2は粘弾性を有するものであってもよい。
塗布液2の粘度は、塗布液2の組成や塗布条件、目的とする塗布膜厚等によって適宜変更可能であるが、通常、塗布する条件での粘度が1cp〜1000cp、好ましくは2cp〜500cp、より好ましくは3cp〜100cpである。粘度が大きいときには可能な塗布速度の上限が小さくなる。また、粘度が小さすぎると、液ダレ等が起こり易い傾向にある。
The properties of the coating liquid 2 are not particularly limited, and various properties such as a suspension, a slurry, and a paste can be used in addition to a uniform solution, and further, bubbles may be included. Moreover, the coating liquid 2 may have viscoelasticity.
The viscosity of the coating solution 2 can be appropriately changed depending on the composition and coating conditions of the coating solution 2, the target coating film thickness, and the like. Usually, the viscosity under the coating conditions is 1 cp to 1000 cp, preferably 2 cp to 500 cp, More preferably, it is 3 cp-100 cp. When the viscosity is large, the upper limit of possible coating speed is small. On the other hand, if the viscosity is too small, dripping or the like tends to occur.

次に、1つの実施形態にかかる塗膜形成方法を含む塗膜積層体の製造方法について説明する。
図1、図2からわかるように、当該製造方法では、回転するロール上に配置された基材1表面にダイ10の間隔G(塗布液吐出口)から塗布液2を供給して、該塗布液を所定の厚さで基材1上に積層させる。詳しくは次の通りである。
Next, the manufacturing method of the coating-film laminated body containing the coating-film formation method concerning one embodiment is demonstrated.
As can be seen from FIGS. 1 and 2, in the manufacturing method, the coating liquid 2 is supplied from the gap G (coating liquid discharge port) of the die 10 to the surface of the substrate 1 arranged on a rotating roll, and the coating is performed. A liquid is laminated | stacked on the base material 1 by predetermined thickness. Details are as follows.

ダイ10と基材1との間隔を塗布液2の特性および目的とする塗膜の膜厚に応じて設定した後、塗布液2をダイ10の塗布液吐出口から押し出す。
塗布液2は、塗布液吐出口から押し出され、基材1とリップ面11a、12aとの間に保持される。
After the interval between the die 10 and the substrate 1 is set according to the characteristics of the coating liquid 2 and the film thickness of the target coating film, the coating liquid 2 is pushed out from the coating liquid discharge port of the die 10.
The coating liquid 2 is pushed out from the coating liquid discharge port and is held between the base material 1 and the lip surfaces 11a and 12a.

ここで、基材1とダイ10との間隔は塗布液2の粘度や塗布条件、目的とする塗膜厚等によって適宜変更され限定されない。本発明ではダイ10の上流側リップ面11aを上記したような長さ(t)としている。これにより、上流側リップ面11aと基材1との間に保持される塗布液2の内圧が大きくても該塗布液2を適切に保持することが可能である。従って、従来に比べ、ダイ10と基材1とが近づいて配置されても液だれの発生が起こりにくい。また、これは、適切に塗膜形成ができる間隔の許容範囲を広げることができることも意味し、幅が広い基材への塗膜形成の際に、該幅方向における間隔の変動が大きくても適切に塗膜を形成することが可能となる。例えば塗膜幅が1000mm以上のような場合にも適切に塗布をすることが可能となる。従来は、当該間隔の許容範囲が狭く、幅が広い基材に適切に塗膜形成をすることが困難であった。 Here, the distance between the substrate 1 and the die 10 is appropriately changed depending on the viscosity of the coating liquid 2, the coating conditions, the target coating thickness, and the like, and is not limited. In the present invention, the upstream side lip surface 11a of the die 10 has the length (t 1 ) as described above. Thereby, even if the internal pressure of the coating liquid 2 hold | maintained between the upstream lip surface 11a and the base material 1 is large, it is possible to hold | maintain this coating liquid 2 appropriately. Therefore, even when the die 10 and the base material 1 are arranged close to each other, dripping is less likely to occur. This also means that it is possible to widen the permissible range of the interval at which the coating film can be formed properly, and even when the variation in the spacing in the width direction is large when the coating film is formed on a wide substrate. An appropriate coating film can be formed. For example, even when the coating film width is 1000 mm or more, it is possible to apply appropriately. Conventionally, it has been difficult to appropriately form a coating film on a substrate having a narrow tolerance and a wide width.

また、基材1はロール上に配置されているので、ロールと概ね同じ曲率を有している。従って、基材1は、上流側リップ面11aおよび下流側リップ面12aの間でこれらに最も近づく点(奥行き方向を考えると線)がある。ロールの曲率と実際の設備における取り付け時の傾斜などとを考慮すると、当該最も近づく点(線)は、上流側リップ面11aのいずれかの位置であることが好ましい。   Moreover, since the base material 1 is arrange | positioned on a roll, it has the curvature substantially the same as a roll. Therefore, the base material 1 has a point (a line when considering the depth direction) that is closest to the upstream lip surface 11a and the downstream lip surface 12a. In consideration of the curvature of the roll and the inclination at the time of installation in actual equipment, the closest point (line) is preferably at any position on the upstream lip surface 11a.

塗布液2が基材1に接触し、上流側リップ11と基材1、下流側リップ12と基材1との間に各々界面が形成された後、ロールを回転させることによって塗布が開始される。基材1とダイ10との相対的移動は、ダイ10と基材1のうち一方が固定されていても、双方が相対的に移動するものであってもよい。基材1とダイ10との間隔は移動の最中に変化させることもできる。このように変化させることによって、ダイ10と基材1との間に保持される塗布液2をより安定させ、塗布膜の平滑性を向上させることが可能である。この場合にも本発明では、上記したように許容される範囲が広げられているので、この調整の機会を減らすことや、調整を容易とすることができる。   After the coating liquid 2 comes into contact with the base material 1 and an interface is formed between the upstream lip 11 and the base material 1, and between the downstream lip 12 and the base material 1, coating is started by rotating the roll. The The relative movement between the base material 1 and the die 10 may be such that either the die 10 or the base material 1 is fixed or the both move relatively. The distance between the substrate 1 and the die 10 can be changed during the movement. By changing in this way, it is possible to make the coating liquid 2 held between the die 10 and the substrate 1 more stable and improve the smoothness of the coating film. Also in this case, in the present invention, since the allowable range is widened as described above, the adjustment opportunity can be reduced or the adjustment can be facilitated.

このような方法とは逆に、あらかじめ基材1とダイ10との相対的移動を開始した後、塗布液2を塗布液供給口から供給開始することもできる。   Contrary to this method, after the relative movement between the substrate 1 and the die 10 is started in advance, the supply of the coating liquid 2 can be started from the coating liquid supply port.

塗布操作の終了は、通常、基材1表面における目的部位に塗布液2が塗布された時点で、塗布液2の供給を停止することにより行う。その際には、基材1とダイ10との間隔を広げてもよいが、この操作は相対的な移動を止めてから行っても、相対的な移動中に行ってもよい。塗布終了の際に基材1とダイ10との間隔を広げることにより、液切れが良好となる傾向にあり、さらには、塗膜端部の平滑性が向上したり、ダイの汚れ防止性が向上する場合がある。   The application operation is usually terminated by stopping the supply of the application liquid 2 when the application liquid 2 is applied to the target site on the surface of the substrate 1. In that case, although the space | interval of the base material 1 and the die | dye 10 may be expanded, this operation may be performed after stopping a relative movement or may be performed during a relative movement. By extending the distance between the base material 1 and the die 10 at the end of coating, the liquid breakage tends to be good, and the smoothness of the coating film edge is improved, and the stain resistance of the die is improved. May improve.

基材1とダイ10との間隔に対する塗膜の膜厚の好ましい比率は、通常0.01〜0.5である。膜厚の比率がこの範囲を越える場合は塗膜の平滑性が悪化する場合があり、また、この範囲未満では、安定な塗布状態が得られる塗布スピードの上限が小さくなり生産性が低下する傾向にある。好ましくは0.05〜0.4である。   A preferred ratio of the film thickness of the coating film to the distance between the substrate 1 and the die 10 is usually 0.01 to 0.5. If the film thickness ratio exceeds this range, the smoothness of the coating film may deteriorate, and if it is less than this range, the upper limit of the coating speed at which a stable coating state can be obtained becomes smaller and the productivity tends to decrease. It is in. Preferably it is 0.05-0.4.

塗布中の基材1とダイ10との相対的な移動速度は限定されないが、通常、0.005m/秒〜1m/秒である。塗布速度がこの範囲を越えると液枯れが生じやすい傾向にあり、一方、この範囲未満では生産性が低下する傾向にあり望ましくない。好ましくは0.01m/秒〜0.5m/秒である。   Although the relative moving speed of the base material 1 and the die 10 during coating is not limited, it is usually 0.005 m / sec to 1 m / sec. If the coating speed exceeds this range, the liquid is liable to dry out. On the other hand, if the coating speed is less than this range, the productivity tends to decrease, which is not desirable. Preferably, it is 0.01 m / second to 0.5 m / second.

塗布する際の塗布液2の温度は限定されず、塗布液2の塗布が可能な程度に流動性がある状態であればよい。   The temperature of the coating liquid 2 at the time of application | coating is not limited, What is necessary is just a fluid state to the extent that application | coating of the coating liquid 2 is possible.

塗布後の塗布液2は、通常、ホットプレート、IRオーブン、コンベクションオーブン、減圧乾燥機、加熱減圧乾燥機等を使用して乾燥される。乾燥温度は、塗布液の組成や粘度、塗膜の膜厚等によって最適化されるため限定されないが、通常、20℃〜200℃、好ましくは25℃〜150℃の範囲である。また、乾燥時間も限定されないが、通常1秒〜100秒、好ましくは5秒〜60秒の範囲である。塗布液が自己反応性や自己硬化性の化合物であったり、溶剤を含まないものである場合は、自然放置乾燥や自然冷却等により固化塗膜を形成することもできる。乾燥後の膜厚は、通常0.1μm〜100μm、好ましくは0.5μm〜50μmの範囲である。   The coating solution 2 after coating is usually dried using a hot plate, an IR oven, a convection oven, a vacuum dryer, a heating vacuum dryer or the like. The drying temperature is not limited because it is optimized by the composition and viscosity of the coating solution, the film thickness of the coating film, etc., but is usually in the range of 20 ° C to 200 ° C, preferably 25 ° C to 150 ° C. Also, the drying time is not limited, but is usually in the range of 1 second to 100 seconds, preferably 5 seconds to 60 seconds. When the coating solution is a self-reactive or self-curing compound or does not contain a solvent, a solidified coating film can be formed by natural standing drying or natural cooling. The film thickness after drying is usually in the range of 0.1 μm to 100 μm, preferably 0.5 μm to 50 μm.

実施例では、ダイ、基材の条件を変更し、適切に塗膜形成可能な上流側リップ面と基材との間隔(図2のd)の許容範囲を調べた。以下に説明する。 In the examples, the conditions of the die and the base material were changed, and the allowable range of the distance (d 1 in FIG. 2) between the upstream lip surface and the base material capable of appropriately forming a coating film was examined. This will be described below.

表1にダイの形状、ロール直径、ロール周速を示した。表1で用いた記号は図2と同じ意味としている。   Table 1 shows the die shape, roll diameter, and roll peripheral speed. The symbols used in Table 1 have the same meaning as in FIG.

Figure 2011167613
Figure 2011167613

その他の条件は次の通りである。基材としては100μm厚のPET(ポリエチレンテレフタレート)製シートを用いた。塗布液は、Scを20質量%含有したPCr液(CPH−PCr)および、TLが質量30%、THFが70質量%である溶媒とした。塗布液の粘度は140cPであった。   Other conditions are as follows. As the substrate, a PET (polyethylene terephthalate) sheet having a thickness of 100 μm was used. The coating solution was a PCr solution (CPH-PCr) containing 20% by mass of Sc and a solvent having a TL of 30% by mass and THF of 70% by mass. The viscosity of the coating solution was 140 cP.

塗布液の吐出方向はスロット(間隔G)の延長方向がロールの中心となるように設定した。塗布後の乾燥は、常温で40秒放置した後、100℃で30秒、さらに140℃で60秒間の条件で雰囲気中に晒すことによりおこなった。乾燥後の塗膜の膜厚は20μm(平均)となるようにした。   The discharge direction of the coating liquid was set such that the extending direction of the slot (interval G) was the center of the roll. Drying after coating was carried out by leaving it to stand in an atmosphere at room temperature for 40 seconds and then at 100 ° C. for 30 seconds and further at 140 ° C. for 60 seconds. The thickness of the coating after drying was set to 20 μm (average).

以上のような各条件にて、ダイと基材との間隔を変更し、塗膜の状態を観察し該間隔の上限および下限を調べた。表2に結果を示す。表2では、不具合を生じない最大のd、および不具合を生じない最小のdを理由とともに示し、最大dと最小dとの差によりダイの適切な可動範囲を明らかにした。 Under the above conditions, the distance between the die and the base material was changed, the state of the coating film was observed, and the upper and lower limits of the distance were examined. Table 2 shows the results. Table 2 shows the maximum d 1 does not cause a problem, and a minimum of d 1 that does not cause a problem with reason, revealed the appropriate movable range of the die by the difference between the maximum d 1 and a minimum d 1.

Figure 2011167613
Figure 2011167613

表2からわかるように、No.1〜No.4では、特に最小dにおいて良好な結果を得ることができる。すなわち、「最大d−最小d」で示したように、ダイの適切な可動範囲を広くすることができる。 As can be seen from Table 2, no. 1-No. 4, good results can be obtained especially at the minimum d 1 . That is, as indicated by “maximum d 1 -minimum d 1 ”, an appropriate movable range of the die can be widened.

以上、現時点において実践的であり、かつ好ましいと思われる実施形態に関連して本発明を説明したが、本発明は、本願明細書中に開示された実施形態に限定されるものではなく、特許請求の範囲および明細書全体から読み取れる発明の要旨あるいは思想に反しない範囲で適宜変更可能であり、そのような変更を伴う塗膜形成方法、および塗膜積層体の製造方法もまた本発明の技術的範囲に包含されるものとして理解されなければならない。   Although the present invention has been described with reference to embodiments that are presently practical and preferred, the present invention is not limited to the embodiments disclosed herein, The invention can be changed as appropriate without departing from the scope or spirit of the invention that can be read from the claims and the entire specification, and a coating film forming method involving such a change, and a coating film laminate manufacturing method are also disclosed in the present invention. Should be understood as being included in the scope.

1 基材
2 塗布液
10 ダイ
11 上流側リップ
12 下流側リップ
DESCRIPTION OF SYMBOLS 1 Base material 2 Coating liquid 10 Die 11 Upstream lip 12 Downstream lip

Claims (4)

直径D(mm)のロール上にシート状の基材を配置し、前記ロールを回転させ、前記ロールに追随して回転する前記基材表面にダイから塗布液を供給して塗膜を形成する方法であって、
前記ダイは、前記基材との間に前記塗布液を保持可能な面である上流側リップ面と、
前記上流側リップ面よりも前記回転の方向下流側に配置され、前記基材との間に前記塗布液を保持可能な面である下流側リップ面と、を有し、
前記上流側リップ面と前記下流側リップ面との間には前記塗布液が吐出する間隔が形成されており、
前記上流側リップ面の、前記ロール回転方向の長さが2.0(mm)以上、0.02D(mm)以下である塗膜形成方法。
A sheet-like base material is placed on a roll having a diameter D (mm), the roll is rotated, and a coating liquid is formed by supplying a coating solution from a die onto the surface of the base material that rotates following the roll. A method,
The die has an upstream lip surface that is a surface capable of holding the coating liquid between the base and the die;
A downstream lip surface that is disposed on the downstream side in the rotation direction from the upstream lip surface and is a surface capable of holding the coating liquid between the base material and the lip surface;
An interval is formed between the upstream lip surface and the downstream lip surface to discharge the coating liquid,
The coating film formation method whose length of the said roll rotation direction of the said upstream lip surface is 2.0 (mm) or more and 0.02D (mm) or less.
前記上流側リップ面の、前記ロール回転方向の長さが、前記下流側リップ面の当該長さよりも長いことを特徴とする請求項1に記載の塗膜形成方法。   The coating film forming method according to claim 1, wherein a length of the upstream lip surface in the roll rotation direction is longer than the length of the downstream lip surface. 塗膜幅が1000(mm)以上であることを特徴とする請求項1又は2に記載の塗膜形成方法。   The coating film forming method according to claim 1 or 2, wherein the coating film width is 1000 (mm) or more. 請求項1〜3のいずれか一項に記載の塗膜形成方法により前記基材上に塗膜を塗布する工程、および前記塗布された塗膜を乾燥する工程を含む塗膜積層体の製造方法。   The manufacturing method of the coating-film laminated body including the process of apply | coating a coating film on the said base material by the coating-film formation method as described in any one of Claims 1-3, and the process of drying the said apply | coated coating film. .
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