JP2011147902A - Decomposition device for organic halogen compound - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a decomposition device for organic halogen compounds which stabilizes induction plasma and enables stable decomposition of organic halogen compounds. <P>SOLUTION: The decomposition device 10 which decomposes organic halogen compounds supplied into a discharge tube 13 by using induction plasma includes a first gas blowing ring 19 where a first spout hole 18 for spouting a mixed gas of the organic halogen compounds and water vapor along the inner peripheral surface in the form of a spiral flow is formed in the inner peripheral surface, a second gas blowing ring 21 which is disposed above the first gas blowing ring 19 and where a second spout hole 20 for spouting the mixed gas of the organic halogen compounds and the water vapor along the inner peripheral surface in the form of a spiral flow is formed in the inner peripheral surface, and a seal member 23 which is disposed above the second gas blowing ring 21 to seal the upper end of the second gas blowing ring 21 and is equipped with a column portion 22 having a circular cross section, which penetrates the second gas blowing ring 21 and whose tip end reaches the upper position of the inner hole of the first gas blowing ring 19. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

The present invention relates to an organic halogen compound decomposition apparatus for stably performing decomposition of an organic halogen compound by induction plasma.

Organic halogen compounds such as chlorofluorocarbon and trichlorethylene are used in large quantities in a wide range of fields such as solvents and refrigerants. If organic halogen compounds are released into the air, water, or soil after use, they will have a serious environmental impact ( For example, it has been pointed out that it causes destruction of the ozone layer and generation of carcinogenic substances. Therefore, in recent years, it has been proposed to detoxify organic halogen compounds after use by using induction plasma as a heat source (see, for example, Patent Documents 1 to 3).

JP 2001-232180 A JP 2004-216231 A JP 2004-216246 A

However, in the decomposition apparatus of Patent Document 1, the upper flange that covers the upper portion of the discharge tube has a small diameter portion that is slightly smaller in diameter than the inner diameter of the discharge tube, and between the small diameter portion and the inner wall surface of the discharge tube. The object to be treated (organic halogen compound) and the auxiliary agent (water vapor) are respectively supplied to the formed gaps from separate supply lines. For this reason, even if the processing object flowing into the discharge tube can be rectified, when supplying a large amount of the processing object into the discharge tube, it flows into the discharge tube in a state where the processing object and the auxiliary agent are sufficiently mixed. This makes it difficult to stabilize the plasma.

In the decomposition apparatus of Patent Document 2, while supplying argon gas, which is a plasma generation gas, into the plasma torch, a mixed gas of water vapor and chlorofluorocarbon (organohalogen compound) is further supplied into the plasma torch. The plasma is stabilized by adjusting the supply amount. However, the supply amount of the argon gas must be adjusted according to the supply amount of the mixed gas and the composition of the mixed gas, and there is a problem that the operation of the decomposition apparatus becomes complicated.

In the disassembling apparatus of Patent Document 3, a head is attached to an upper flange attached to the upper end portion of the discharge tube via an annular support member to form a gap between the support member and the inner peripheral surface of the support member. The gas to be treated (organic halogen compound) and the auxiliary reaction gas (argon) are swirled along the inner peripheral surface of the support and discharged into the gap and flow into the discharge tube from the gas ejection holes provided in It is configured. However, since the mixing and swirling of the processing object gas and the reaction auxiliary gas are only performed while the processing target gas and the reaction auxiliary gas pass through the gap, the swirling flow in which the processing target gas and the reaction auxiliary gas are sufficiently mixed is performed. In this state, it is difficult to flow into the discharge tube, and there is a problem that it is difficult to stabilize the plasma.

The present invention has been made in view of such circumstances, and an object of the present invention is to provide an organic halogen compound decomposition apparatus capable of stabilizing induction plasma and stably decomposing an organic halogen compound. .

An apparatus for decomposing an organic halogen compound according to the present invention that meets the above-described object is an induction plasma generated in a discharge tube by passing an exciting current through a high-frequency coil wound around the discharge tube supported by upper and lower flanges. The organic halogen compound supplied into the discharge tube via the workpiece supply means attached to the upper flange is decomposed with the heat source as the heat source, and the generated decomposition product is supplied to the treatment means connected to the lower flange. In the halogen compound decomposition apparatus,
The workpiece supply means is attached to an upper portion of the upper flange, and a first ejection hole for ejecting a mixed gas of an organic halogen compound and water vapor as a swirling flow along the inner circumferential surface is provided in the middle of the inner circumferential surface. A first gas blowing ring formed at equal intervals in the circumferential direction of the inner peripheral surface at a height position;
It is disposed above the first gas blowing ring, has the same inner diameter as the first gas blowing ring, and jets a mixed gas of an organic halogen compound and water vapor as a swirling flow along the inner peripheral surface. A second gas blowing ring in which second ejection holes are formed at equal intervals in the circumferential direction of the inner peripheral surface over the upper and lower two stages on the inner peripheral surface;
It is disposed above the second gas blowing ring to seal the upper side of the second gas blowing ring, and a gap is provided between the second gas blowing ring and the inner peripheral surface of the second gas blowing ring. And a sealing member having a circular cylindrical portion having a circular cross section penetrating through the second gas blowing ring and having a tip portion reaching an upper position of the inner hole of the first gas blowing ring.

In the organic halogen compound decomposition apparatus according to the present invention, it is preferable that the diameters of the first and second ejection holes are equal, and that the number of the first and second ejection holes is equal.

In the organic halogen compound decomposition apparatus according to the present invention, it is preferable that the first and second gas blowing rings are held by a ring holder, and the ring holder is sandwiched between the upper flange and the seal member.

In the organic halogen compound decomposition apparatus according to the present invention, it is preferable that an inner diameter of the first and second gas blowing rings is the same as an inner diameter of the discharge tube.

In the organohalogen compound decomposing apparatus according to the present invention, the first and second ejection holes have a diameter range of 1 to 1.3 mm. It is preferable to increase the apertures of the first and second ejection holes.

In the organohalogen compound decomposition apparatus according to the present invention, the organohalogen compound and the organic halogen compound are formed in the gap formed between the inner peripheral surface of the second gas blowing ring and the outer peripheral surface of the cylindrical portion. Since the mixed gas of water vapor is ejected as a swirling flow along the inner peripheral surface of the second gas blowing ring, the mixed gas is swept into the first gas blowing ring as a swirling flow along the inner peripheral surface. Can flow in. Then, with respect to the swirling flow of the mixed gas flowing into the first gas blowing ring, the mixed gas of the organic halogen compound and water vapor is supplied from the first blowing hole to the inner peripheral surface of the first gas blowing ring. Therefore, the mixed state of the organic halogen compound and water vapor is improved, and the swirl flow of the mixed gas can be further stabilized in the first gas blowing ring and can flow into the discharge tube. The induction plasma generated in the discharge tube is stabilized.

In the organohalogen compound decomposition apparatus according to the present invention, when the first and second ejection holes have the same diameter and the same number of first and second ejection holes, the first and second gas injection rings The flow rate of the mixed gas to be injected from the discharge tube as the swirl flow while maintaining the swirl flow formed in the gap in the first gas blowing ring can be made equal. Can be increased.

In the organohalogen compound decomposition apparatus according to the present invention, when the first and second gas blowing rings are held by a ring holder and the ring holder is sandwiched between the upper flange and the seal member, the first and second Installation of the gas blowing ring becomes easy.

In the organohalogen compound decomposition apparatus according to the present invention, when the inner diameters of the first and second gas blowing rings are the same as the inner diameter of the discharge tube, swirling of the mixed gas along the inner wall of the discharge tube in the discharge tube The flow can be easily formed, and the induced plasma in the discharge tube is stabilized.

In the decomposition apparatus for an organic halogen compound according to the present invention, the first and second ejection holes have a diameter range of 1 to 1.3 mm, and the first and the second decomposition holes are increased as the decomposition amount per unit time of the organic halogen compound increases. When the diameter of the second ejection hole is increased, even if the decomposition amount of the organic halogen compound per unit time is changed, the mixed gas of the organic halogen compound and water vapor is first and second within a preset ejection pressure range. In this case, water droplets can be prevented from being generated in the discharge tube to stabilize the induction plasma, and corrosion of the inner wall of the discharge tube due to water droplets can be prevented.

It is sectional drawing of the decomposition | disassembly apparatus of the organic halogen compound which concerns on one embodiment of this invention. (A), (B) is the plane sectional view and the side sectional view of the 1st gas blowing ring provided in the decomposition device of the organic halogen compound. (A), (B) is the plane sectional view and the side sectional view of the 2nd gas blowing ring provided in the decomposition device of the organic halogen compound.

Next, embodiments of the present invention will be described with reference to the accompanying drawings for understanding of the present invention.
As shown in FIGS. 1 to 3, an organic halogen compound decomposition apparatus 10 according to an embodiment of the present invention includes a high frequency coil wound around the discharge tube 13 supported by upper and lower flanges 11 and 12. Organic gas supplied together with water vapor into the discharge tube 13 through the workpiece supply means 15 attached to the upper flange 11 using the induction plasma generated in the discharge tube 13 by flowing an exciting current through the coil 14 as a heat source. A halogen compound (for example, chlorofluorocarbon) is hydrolyzed, and the generated decomposition product is supplied to a processing means (not shown) connected to the lower flange 12. Details will be described below.

The discharge tube 13 is a cylindrical body made of a heat-resistant insulating material such as quartz glass or ceramics. An annular upper flange 11 made of, for example, stainless steel is attached to the upper end of the discharge tube 13 via an O-ring (not shown), and an O-ring (not shown) is attached to the lower end of the discharge tube 13. An annular lower flange 12 made of, for example, stainless steel, which also serves as a base for supporting the discharge tube 13 via, is attached. The high frequency coil 14 wound around the discharge tube 13 is formed of, for example, a copper pipe and is connected to a high frequency power source (not shown).

Here, the processing means (not shown) is connected to the lower flange 12 via a connecting pipe 17 having a mounting flange 16 to burn the combustible decomposition product generated by hydrolysis of the organic halogen compound to make it harmless. The treatment unit, the exhaust gas treatment unit that cools the combustion gas produced in the combustion treatment unit and discharges it into the atmosphere, and the neutralized product obtained by neutralizing the acidic decomposition product produced by hydrolysis of the organic halogen compound with an alkaline solution And a neutralization processing section for discharging the residual liquid. In addition, what is used with the decomposition | disassembly apparatus of the conventional organic halogen compound can be used for a combustion process part, an exhaust gas process part, and a neutralization process part, respectively.

The workpiece supply means 15 is attached to the upper part of the upper flange 11 and has a first ejection hole 18 for ejecting a mixed gas of an organic halogen compound and water vapor as a swirl flow along the inner peripheral surface. The first gas blowing ring 19 is disposed at a height position above the first gas blowing ring 19 and the first gas blowing ring 19 formed at equal intervals in the circumferential direction of the inner peripheral surface. A second ejection hole 20 having the same inner diameter as that 19 and ejecting a mixed gas of an organic halogen compound and water vapor as a swirling flow along the inner peripheral surface extends in two stages on the inner peripheral surface, and the inner peripheral surface thereof. The second gas blowing ring 21 is formed at equal intervals in the circumferential direction. Further, the workpiece supply means 15 is disposed above the second gas blowing ring 21 and seals the upper side of the second gas blowing ring 21, and the inside of the second gas blowing ring 21. A circular cylinder with a circular cross-section that has a gap between it and the peripheral surface, passes through the inner hole of the second gas blowing ring 21, and the tip reaches the upper position in the inner hole of the first gas blowing ring 19. And a sealing member 23 having 22.

As shown in FIGS. 2 (A) and 2 (B), the first gas blowing ring 19 is formed with a first ejection hole 18 for ejecting the mixed gas as a swirling flow along the inner peripheral surface. It has a main body 24 and annular upper and lower collar portions 25 and 26 provided at the upper and lower ends of the ring main body 24, respectively. And angle (theta) which the axial center direction of the 1st ejection hole 18 and the radial direction of the ring main body 24 make is adjusted to 40 to 50 degree | times, for example, 45 degree | times. As shown in FIGS. 3A and 3B, the second gas blowing ring 21 is provided on the ring body 27 in which the second ejection holes 20 are formed, and on the upper and lower ends of the ring body 27. The upper and lower collar portions 28 and 29 are provided respectively. And angle (phi) which the axial center direction of the 2nd ejection hole 20 and the radial direction of the ring main body 27 make is adjusted to 40 to 50 degree | times, for example, 45 degree | times.

The inner diameters of the first and second gas blowing rings 19 and 21 are the same as the inner diameter of the discharge tube 13, the diameters of the first and second ejection holes 18 and 20 are equal, and the first and second ejections The number of holes 18, 20 is equal. Moreover, the aperture diameter range of the 1st and 2nd ejection holes 18 and 20 is 1-1.3 mm. The diameters of the first and second ejection holes 18 and 20 are increased as the amount of decomposition of the organic halogen compound per unit time increases. As a result, even if the decomposition amount per unit time of the organic halogen compound is changed, the mixed gas of the organic halogen compound and water vapor is ejected from the first and second ejection holes 18 and 20 in a preset ejection pressure range, respectively. Can be made.

The ring holder 30 is an annular member that is sandwiched between the upper flange 11 and the seal member 23 and has an inner hole having the same diameter as the inner diameter of the discharge tube 13 at the center. Further, the ring holder 30 is opened to the inner peripheral surface of the ring holder 30 toward the inner hole, and first and second gas blowing rings 19 and 21 are attached to the ring holder 30 via O-rings (not shown), respectively. First and second ring receiving grooves 31 and 32 are formed side by side in the axial direction of the ring holder 30. Gas supply pipes 33 and 34 connected to a mixer (not shown) for producing a mixed gas of an organic halogen compound and water vapor are connected to the bottoms of the first and second ring housing grooves 31 and 32, respectively. Has been. Thereby, in the ring holder 30 to which the first and second gas blowing rings 19 and 21 are attached, the groove bottom portion of the first ring receiving groove 31, the outer peripheral surface of the ring main body 24, and the upper and lower collar portions. The space portion 35 surrounded by 25 and 26, the groove bottom portion of the second ring receiving groove 32, the outer peripheral surface of the ring body 27, and the space portion 36 surrounded by the upper and lower collar portions 28 and 29 are formed. The mixed gas can be supplied into the space portions 35 and 36 through the gas supply pipes 33 and 34, and the mixed gas can be ejected from the first and second ejection holes 18 and 20.

The sealing member 23 is provided with a gap (width Δ) between the inner peripheral surface of the second gas blowing ring 21 and penetrates the inner hole of the second gas blowing ring 21, and the tip portion is the first portion. A cylindrical portion 22 having a circular cross section reaching the upper position of the gas blowing ring 19 and a flange portion 37 attached to the cylindrical portion 22 and abutting against the upper end surface of the ring holder 30 via an O-ring (not shown). . By setting it as such a structure, since the upper end of the clearance gap between the internal peripheral surface of the ring holder 30 and the outer peripheral surface of the cylindrical part 22 is block | closed with the flange part 37, the upper side of the ring holder 30 is sealed. The cylindrical portion may be hollow.

Here, the width Δ of the gap is, for example, in the range of 1 to 5 mm. As the width Δ of the gap is smaller, it becomes easier to form a swirling flow in the gap, and it is easier to form a swirling flow along the inner peripheral surface of the discharge tube 13 in the discharge tube 13, which is formed in the discharge tube 13. The induction plasma can be stabilized. However, if the width Δ of the gap is too narrow, the manufacturing cost of the seal member 23 and the first and second gas blowing rings 19 and 21 will increase, and the first and second gas blowing rings 19 and 21 will have different costs. It becomes difficult to position the cylindrical portion 22 of the seal member 23 with a uniform gap in the inner hole. Further, the resistance when the mixed gas is ejected from the second gas blowing ring 21 becomes large, and the amount of the mixed gas cannot be increased. Therefore, the lower limit of the gap width Δ is set to 1 mm. Further, if the width Δ of the gap is large, it becomes difficult to form a swirling flow in the gap, and it becomes difficult to form a swirling flow along the inner peripheral surface of the discharge tube 13 in the discharge tube 13. In order to stabilize the induction plasma formed in the tube 13, it is necessary to increase the power supplied to the high-frequency coil 14, and the economic efficiency is lowered. For this reason, the upper limit of the gap width Δ is set to 5 mm.

Next, the operation of the organic halogen compound decomposition apparatus 10 according to an embodiment of the present invention will be described.
An organic halogen compound and water vapor are supplied to a mixer to produce a mixed gas, which is supplied to space portions 35 and 36 formed in the ring holder 30 through gas supply pipes 33 and 34. Then, the mixed gas supplied into the space 36 is supplied from the second injection hole 20 of the second gas injection ring 21 to the inner peripheral surface of the second gas injection ring 21 and the outer peripheral surface of the cylindrical portion 22. Are ejected along the inner peripheral surface of the second gas blowing ring 21 in the gap formed between the two. As a result, a swirl flow along the inner peripheral surface of the second gas blowing ring 21 is formed in the gap. Here, since the second ejection holes 20 are formed on the inner peripheral surface of the second gas blowing ring 21 in two upper and lower stages, the mixed gas can be distributed and supplied in the gap. It is possible to prevent the resistance when the mixed gas is ejected from being increased, and to easily form a swirling flow within the gap.

Since the inner diameters of the first and second gas blowing rings 19, 21 and the ring holder 30 are the same, the swirling flow of the mixed gas formed in the gap enters the first gas blowing ring 19 into the first gas blowing ring 19. It flows in as a swirling flow along the inner peripheral surface of the gas blowing ring 19. Further, the mixed gas supplied into the space 35 is ejected from the first ejection hole 18 of the first gas blowing ring 19 along the inner peripheral surface of the first gas blowing ring 19. Here, since the diameters of the first and second ejection holes 18 and 20 are equal and the number of the first and second ejection holes 18 and 20 is equal, the first and second gas blowing rings 19 and 21 The swirl flow (formed by the mixed gas ejected from the second ejection holes 20) flowing into the first gas blowing ring 19 becomes equal to the flow rate of the mixed gas ejected from the first gas blowing ring 19. The mixed gas ejected from the first ejection hole 18 is mixed while being maintained in the blowing ring 19 to form a swirling flow of the mixed gas having a large flow rate in the first gas blowing ring 19. Can do.

Further, the first ejection hole 18 is formed at the same height position on the inner peripheral surface of the first gas blowing ring 19, and with respect to the swirling flow that flows into the first gas blowing ring 19. Since the mixed gas is ejected and mixed from the same height position, the mixed state of the organic halogen compound and water vapor is improved, and the swirling flow of the mixed gas in the first gas blowing ring 19 can be stabilized. it can. Since the inner diameter of the first gas blowing ring 19 is the same as the inner diameter of the discharge tube 13, the swirling flow of the mixed gas flowing into the discharge tube 13 from the first gas blowing ring 19 is A swirling flow of the mixed gas along the inner wall of the tube 13 is obtained. For this reason, the induction plasma generated in the discharge tube 13 can be stabilized.

Moreover, the aperture range of the 1st and 2nd ejection holes 18 and 20 is 1-1.3 mm, and with the increase in the decomposition amount per unit time of the organic halogen compound, the 1st and 2nd ejection holes 18, Increase the caliber of 20. For example, when the decomposition amount of the organic halogen compound per unit time is 30 kg / hour, the diameter of the first and second ejection holes 18 and 20 is 1.1 mm, and the decomposition amount of the organic halogen compound per unit time is In the case of 40 kg / hour, the diameters of the first and second ejection holes 18 and 20 are 1.2 mm. In addition, when the decomposition amount per unit time of the organic halogen compound is increased, the amount of water vapor to be mixed is also increased. The optimum amount of water vapor to be mixed is set in advance for the amount of decomposition of the organic halogen compound per unit time by experiment.

Even if the amount of decomposition of the organic halogen compound per unit time is changed by increasing the diameter of the first and second ejection holes 18 and 20 as the amount of decomposition of the organic halogen compound per unit time increases, A mixed gas of an organic halogen compound and water vapor can be ejected from the first and second ejection holes 18 and 20 within a preset ejection pressure range. As a result, generation of water droplets in the discharge tube 13 is prevented, and corrosion of the inner wall of the discharge tube 13 due to water droplets can be prevented. In addition, since there is no water droplet in the mixed gas, the induction plasma can be stabilized without increasing the power supplied to the high-frequency coil 14, which is economical.

When a mixed gas of an organic halogen compound and water vapor is discharged into the discharge tube 13 as a swirling flow along the inner peripheral surface of the discharge tube 13, the induction plasma generated in the discharge tube 13 is used as a heat source. The organic halogen compound is hydrolyzed. Then, the decomposition product is supplied to the processing means and processed. Here, when the organic halogen compound is Freon R-22, Freon R-22 is decomposed into carbon monoxide and hydrogen which are combustible decomposition products, and hydrogen chloride and hydrogen fluoride which are acidic decomposition products, and combustible decomposition. The product is burned in the combustion processing unit to become carbon dioxide and water, and is released into the atmosphere. In addition, the acidic degradation product is recovered by reacting with, for example, calcium hydroxide to produce calcium chloride and calcium fluoride in the neutralization treatment unit.

When the organic halogen compound is Freon R-12, carbon dioxide and acidic decomposition products hydrogen chloride and hydrogen fluoride are generated, carbon dioxide is released into the atmosphere, and hydrogen chloride and hydrogen fluoride are neutralized. In part, for example, calcium chloride and calcium fluoride are produced by reacting with calcium hydroxide and recovered. Furthermore, when the organic halogen compound is Freon R-134a, carbon monoxide and hydrogen that are flammable decomposition products and hydrogen fluoride that is an acidic decomposition product are generated, and carbon monoxide and hydrogen are burned in the combustion treatment section. Carbon dioxide and water are released into the atmosphere, and hydrogen fluoride is reacted with calcium hydroxide, for example, to generate and recover calcium fluoride in the neutralization processing unit.

As described above, the present invention has been described with reference to the embodiment. However, the present invention is not limited to the configuration described in the above-described embodiment, and the matters described in the scope of claims. Other embodiments and modifications conceivable within the scope are also included.
For example, if the first and second gas injection rings are provided with gas mixture receiving portions, the first gas injection ring is attached to the upper surface of the upper flange via an O-ring without using a ring holder. The second gas blowing ring can be attached to the upper surface of the first gas blowing ring via the O ring, and the seal member can be further attached to the upper surface of the second gas blowing ring via the O ring. .

10: Organic halogen compound decomposition apparatus, 11: upper flange, 12: lower flange, 13: discharge tube, 14: high-frequency coil, 15: workpiece supply means, 16: mounting flange, 17: connecting tube, 18: first 1 injection hole, 19: first gas injection ring, 20: second injection hole, 21: second gas injection ring, 22: cylindrical portion, 23: seal member, 24: ring main body, 25: Upper collar part, 26: Lower collar part, 27: Ring body, 28: Upper collar part, 29: Lower collar part, 30: Ring holder, 31: First ring accommodation groove, 32: Second ring accommodation groove, 33, 34: Gas supply pipe, 35, 36: Space portion, 37: Flange portion

Claims (5)

A workpiece supply means attached to the upper flange using an induction plasma generated in the discharge tube by flowing an exciting current through a high-frequency coil wound outside the discharge tube supported by the upper and lower flanges. In the organic halogen compound decomposition apparatus, the organic halogen compound supplied into the discharge tube via the decomposition is decomposed and the generated decomposition product is supplied to the processing means connected to the lower flange.
The workpiece supply means is attached to an upper portion of the upper flange, and a first ejection hole for ejecting a mixed gas of an organic halogen compound and water vapor as a swirling flow along the inner circumferential surface is provided in the middle of the inner circumferential surface. A first gas blowing ring formed at equal intervals in the circumferential direction of the inner peripheral surface at a height position;
It is disposed above the first gas blowing ring, has the same inner diameter as the first gas blowing ring, and jets a mixed gas of an organic halogen compound and water vapor as a swirling flow along the inner peripheral surface. A second gas blowing ring in which second ejection holes are formed at equal intervals in the circumferential direction of the inner peripheral surface over the upper and lower two stages on the inner peripheral surface;
It is disposed above the second gas blowing ring to seal the upper side of the second gas blowing ring, and a gap is provided between the second gas blowing ring and the inner peripheral surface of the second gas blowing ring. An organic halogen, comprising: a sealing member that includes a cylindrical section that has a circular cross section that penetrates through the second gas blowing ring and has a tip portion reaching an upper position of the inner hole of the first gas blowing ring. Compound decomposition equipment. 2. The organic halogen compound decomposition apparatus according to claim 1, wherein the diameters of the first and second ejection holes are equal, and the numbers of the first and second ejection holes are equal. Disassembly equipment. 3. The organic halogen compound decomposition apparatus according to claim 1, wherein the first and second gas blowing rings are held by a ring holder, and the ring holder is held between the upper flange and the sealing member. An apparatus for decomposing an organic halogen compound. The organic halogen compound decomposition apparatus according to any one of claims 1 to 3, wherein an inner diameter of the first and second gas blowing rings is the same as an inner diameter of the discharge tube. Decomposition equipment for organic halogen compounds. In the decomposition device of the organic halogen compound according to any one of claims 1 to 4, a diameter range of the first and second ejection holes is 1 to 1.3 mm, and the organic halogen compound per unit time. An organic halogen compound decomposition apparatus characterized by increasing the diameters of the first and second ejection holes as the decomposition amount increases.

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