JP2011124295A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2011124295A5 JP2011124295A5 JP2009279037A JP2009279037A JP2011124295A5 JP 2011124295 A5 JP2011124295 A5 JP 2011124295A5 JP 2009279037 A JP2009279037 A JP 2009279037A JP 2009279037 A JP2009279037 A JP 2009279037A JP 2011124295 A5 JP2011124295 A5 JP 2011124295A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Description
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009279037A JP2011124295A (en) | 2009-12-09 | 2009-12-09 | Plasma processing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009279037A JP2011124295A (en) | 2009-12-09 | 2009-12-09 | Plasma processing apparatus |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013218795A Division JP5640135B2 (en) | 2013-10-22 | 2013-10-22 | Plasma processing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011124295A JP2011124295A (en) | 2011-06-23 |
| JP2011124295A5 true JP2011124295A5 (en) | 2012-12-20 |
Family
ID=44287921
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009279037A Pending JP2011124295A (en) | 2009-12-09 | 2009-12-09 | Plasma processing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2011124295A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7169786B2 (en) * | 2018-06-25 | 2022-11-11 | 東京エレクトロン株式会社 | maintenance equipment |
| KR20240000530A (en) * | 2021-04-27 | 2024-01-02 | 도쿄엘렉트론가부시키가이샤 | tabernacle device |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07142444A (en) * | 1993-11-12 | 1995-06-02 | Hitachi Ltd | Microwave plasma processing system and method |
| JP4394778B2 (en) * | 1999-09-22 | 2010-01-06 | 東京エレクトロン株式会社 | Plasma processing apparatus and plasma processing method |
| JP4047616B2 (en) * | 2002-04-03 | 2008-02-13 | 東京エレクトロン株式会社 | Plasma processing apparatus and plasma processing method |
| JP2005056994A (en) * | 2003-08-01 | 2005-03-03 | Saginomiya Seisakusho Inc | Plasma treatment apparatus |
| JP4584572B2 (en) * | 2003-12-22 | 2010-11-24 | 株式会社日立ハイテクノロジーズ | Plasma processing apparatus and processing method |
| JP2007103697A (en) * | 2005-10-05 | 2007-04-19 | Hitachi Kokusai Electric Inc | Substrate processing device |
| JP4827083B2 (en) * | 2006-02-27 | 2011-11-30 | 東京エレクトロン株式会社 | Plasma etching apparatus and plasma etching method |
-
2009
- 2009-12-09 JP JP2009279037A patent/JP2011124295A/en active Pending