JP2011121120A - Projection material for blasting and method of manufacturing the same - Google Patents

Projection material for blasting and method of manufacturing the same Download PDF

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JP2011121120A
JP2011121120A JP2009278101A JP2009278101A JP2011121120A JP 2011121120 A JP2011121120 A JP 2011121120A JP 2009278101 A JP2009278101 A JP 2009278101A JP 2009278101 A JP2009278101 A JP 2009278101A JP 2011121120 A JP2011121120 A JP 2011121120A
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projection material
blasting
abrasive
vinyl chloride
particles
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JP5376242B2 (en
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Masaru Goto
賢 後藤
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Sintokogio Ltd
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Sintokogio Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C11/00Selection of abrasive materials or additives for abrasive blasts

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
  • Cleaning In General (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a projection material for blasting capable of mirror-finishing or smoothening, without producing satin finished surface-like irregularities, the surface of a workpiece in a very shorter time than in the case of conventional techniques such as polishing or the like by abrasive paper or abrasive cloth, and also provide a method of manufacturing the projection material for blasting. <P>SOLUTION: This projection material for blasting is formed by supporting an abrasive material 12 of 1-50 μm on the surfaces of vinyl chloride particles 11 of 10-3,000 μm in diameter. The projection material is manufactured by kneading, while heating, polyvinyl chloride particles, an abrasive material, a plasticizer, and a molding assistant 13. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は被加工面に対し投射材を噴射するブラスト加工において、被加工面の面粗度を小さくし、該被加工面を鏡面、或いは光沢面等とする為の投射材に関する。   The present invention relates to a projection material for reducing the surface roughness of a processed surface and making the processed surface a mirror surface, a glossy surface, or the like in blast processing in which a projection material is sprayed onto the processed surface.

従来、被加工面の面粗度を小さくして、該被加工面を鏡面、或いは光沢面化等とする研磨加工方法としては、研磨紙や研磨布等による研磨や、バフによる研磨や、ラッピングや、回転する砥粒との接触による研磨等が用いられてきた。しかしながら、いずれの研磨方法においても、該被加工面が鏡面または光沢面等に仕上がるまで相当の加工時間が必要であった。そこで、ブラスト加工を該加工に適用し、加工時間の短縮を図る試みが行われている。   Conventionally, as a polishing method for reducing the surface roughness of the processing surface and making the processing surface a mirror surface or a glossy surface, polishing with a polishing paper or a polishing cloth, polishing with a buff, lapping, etc. In addition, polishing by contact with rotating abrasive grains has been used. However, in any of the polishing methods, a considerable processing time is required until the processed surface is finished to a mirror surface or a glossy surface. Therefore, attempts have been made to reduce the processing time by applying blasting to the processing.

ブラスト加工とは、セラミックスや、金属や、樹脂等の投射材を被加工面に噴射することで該被加工面を加工する方法である。短時間で被加工面を加工できるが、投射材の衝突により該被加工面に梨地状の凹凸が形成されやすく、被加工面の鏡面化、或いは光沢面化等には不向きである。   Blasting is a method of processing a surface to be processed by injecting a projection material such as ceramics, metal, or resin onto the surface to be processed. Although the processed surface can be processed in a short time, a satin-like unevenness is likely to be formed on the processed surface due to the collision of the projection material, which is not suitable for making the processed surface into a mirror or glossy surface.

梨地状の凹凸の形成を抑制し、被加工面の鏡面化、或いは光沢面化を行うために、例えば特許文献1にはゼラチンを核体とし、これに砥材と水を含ませた投射材を使用することが提案されている。しかし、ブラスト加工中に、該投射材中の水分が蒸発した結果、被加工面に梨地状の凹凸を形成することとなるため、投射材に定期的に水分を補給することが必要となる。そのため、ブラスト装置が煩雑となる(例えば特許文献2参照)   In order to suppress the formation of textured irregularities and to make the surface to be processed mirror or glossy, for example, Patent Document 1 discloses a projection material in which gelatin is used as a core, and abrasive and water are contained therein. It has been proposed to use However, since the water in the projection material evaporates during blasting, a textured surface unevenness is formed on the surface to be processed, and therefore it is necessary to replenish the projection material with water regularly. Therefore, the blasting apparatus becomes complicated (for example, see Patent Document 2).

また、特許文献3では、ゴムまたは熱可塑性エラストマーに砥材を10〜90質量%混合した投射材を使用することが提案されている。しかし、砥材の含有量が少ない場合は例えば目詰まりにより投射材としての寿命は短く、ブラスト加工装置から頻繁に新品との入れ替えが必要となり効率が悪い。一方、砥材の含有量が多い場合、例えば70質量%以上とした場合は、ゴムまたはエラストマーより砥材が容易に脱落し、新生面が現れることにより前記のような目詰まりが発生せず、投射材としての寿命は長く、連続して良好な研磨能力を有するが、砥材は比較的高価であるため投射材の価格に上昇の要因となる。   In Patent Document 3, it is proposed to use a projection material obtained by mixing 10 to 90% by mass of an abrasive with rubber or a thermoplastic elastomer. However, when the content of the abrasive is small, the life as a projection material is short due to, for example, clogging, and it is necessary to frequently replace it with a new one from a blasting apparatus, resulting in poor efficiency. On the other hand, when the content of the abrasive is large, for example, when it is 70% by mass or more, the abrasive is easily removed from the rubber or elastomer, and the new surface appears, so that the above-mentioned clogging does not occur and the projection is performed. Although it has a long life as a material and has a good polishing ability continuously, the abrasive material is relatively expensive, which increases the price of the projection material.

特開2001−207160JP 2001-207160 A 特開2009−190108JP 2009-190108 A 特開2006−159402JP 2006-159402 A

本発明は、上述の問題点を解決するためになされた物であり、被加工面に梨地状の凹凸の形成を抑制して、該被加工面を鏡面化、或いは光沢面化等をブラスト加工にて行うに際し、研磨能力を維持するための特別な装置を必要とせず、また長時間の使用においても連続して安定した研磨能力を有し、かつ安価な投射材を提供する。   The present invention has been made to solve the above-described problems, and suppresses the formation of matte-like irregularities on the processed surface, and the processed surface is mirror-finished or glossed. Therefore, it is possible to provide a low-cost projection material that does not require a special apparatus for maintaining the polishing ability and has a stable and stable polishing ability even when used for a long time.

上記課題を解決するために、請求項1に記載の発明では、径が10〜3,000μmの塩化ビニル粒子の表面に1〜50μmの砥材を担持させて形成された略球形粒子である、という技術的手段を用いる。   In order to solve the above-mentioned problem, in the invention according to claim 1, the spherical particles are formed by carrying a 1-50 μm abrasive on the surface of vinyl chloride particles having a diameter of 10-3,000 μm, The technical means is used.

請求項1に記載の発明によると、被加工物表面に梨地状の凹凸を形成させることなく、被加工面の鏡面化或いは平滑面化をブラスト加工にて効率よく行うことができる。   According to the first aspect of the present invention, it is possible to efficiently perform mirroring or smoothing of the work surface by blasting without forming a textured unevenness on the work surface.

請求項2に記載の発明では、請求項1に記載のブラスト加工用投射材において、前記塩化ビニル粒子中に可塑剤が70質量%以下の含まれている、という技術的手段を用いる。   The invention according to claim 2 uses the technical means that the plasticizer is contained in the vinyl chloride particles in the blasting projection material according to claim 1 in an amount of 70% by mass or less.

塩化ビニル粒子中に可塑剤が含まれることで、塩化ビニル粒子は軟化する。つまり可塑剤の含有率が高い程塩化ビニル粒子の硬度は低い。被加工面の鏡面化、或いは光沢面化を達成するためには、被加工物の材質および形状に最適な硬さをもつ投射材を使用することが重要である。請求項2に記載の発明の様に該塩化ビニル粒子中に70質量%以下の可塑剤が含まれていることで、被加工物の材質および形状に合わせた硬度をもつ塩化ビニル粒子、ひいては投射材を得ることができる。   By including a plasticizer in the vinyl chloride particles, the vinyl chloride particles are softened. That is, the higher the plasticizer content, the lower the hardness of the vinyl chloride particles. In order to achieve a mirror surface or a glossy surface of the work surface, it is important to use a projection material having the optimum hardness for the material and shape of the work piece. Since the vinyl chloride particles contain 70% by mass or less of a plasticizer as in the invention described in claim 2, the vinyl chloride particles having a hardness matched to the material and shape of the workpiece, and thus projected. A material can be obtained.

請求項3に記載の発明では、請求項1または請求項2に記載のブラスト加工用投射材において、前記塩化ビニル粒子の中心部から表面部に向かって硬度が連続的に軟化されている、という技術的手段を用いる。   According to a third aspect of the invention, in the blasting projection material according to the first or second aspect, the hardness is continuously softened from the central portion of the vinyl chloride particle toward the surface portion. Use technical means.

請求項3に記載の発明によると、投射材の外周面に比べ内部の硬度が硬いので、該投射材が被加工面と衝突する際の衝突エネルギーが大きくなり、高い研磨力を得ることができる。   According to the third aspect of the present invention, since the internal hardness is harder than the outer peripheral surface of the projection material, the collision energy when the projection material collides with the surface to be processed increases, and a high polishing force can be obtained. .

請求項4に記載の発明では、請求項1ないし請求項3のいずれかに記載のブラスト加工用投射材において、前記砥材の担持量が前記投射材の1〜50体積%である、という技術的手段を用いる。   In invention of Claim 4, in the blasting projection material in any one of Claim 1 thru | or 3, the technique that the load of the said abrasive material is 1-50 volume% of the said projection material. Use appropriate means.

請求項4に記載の発明によると、砥材の担持量が前記投射材の1〜50体積%であることによってブラスト加工時に発生する粉塵等が砥材間に入り込むこと(目詰まり)による研磨力の低下を防ぎ、長時間に渡り高い研磨力を維持することができる。   According to the invention described in claim 4, the polishing force due to the dust or the like generated during blasting entering between the abrasives (clogging) when the carrying amount of the abrasive is 1 to 50% by volume of the projection material. Can be prevented and high polishing power can be maintained for a long time.

請求項5に記載の発明では、請求項1ないし請求項4のいずれかに記載のブラスト加工用投射材の製造方法において、塩化ビニル重合体および砥材、さらには必要に応じ可塑剤および/または成形助剤を添加するとともに、60〜200℃で加熱しながら混練することによって製造する、という技術的手段を用いる。   According to a fifth aspect of the present invention, in the method for producing a blasting projection material according to any one of the first to fourth aspects, a vinyl chloride polymer and an abrasive, and further, if necessary, a plasticizer and / or While adding a molding aid, the technical means of producing by kneading while heating at 60 to 200 ° C. is used.

請求項5に記載の発明によると、非常に簡易な方法にてブラスト加工用投射材を得ることができる。   According to the invention described in claim 5, the blasting projection material can be obtained by a very simple method.

請求項6に記載の発明では、請求項5に記載のブラスト加工用投射材の製造方法において、大気圧基準で0.1〜0.8MPaで加圧しながら混練する、という技術的手段を用いる。   In the invention according to claim 6, in the method for producing the blasting projection material according to claim 5, a technical means of kneading while applying pressure at 0.1 to 0.8 MPa on an atmospheric pressure basis is used.

請求項6に記載の発明によると、大気圧基準で0.1〜0.8MPaで加圧しながら混練することで、品質がより安定したブラスト加工用投射材を短時間で得ることができる。   According to the sixth aspect of the invention, a blasting projection material with more stable quality can be obtained in a short time by kneading while pressurizing at 0.1 to 0.8 MPa on the basis of atmospheric pressure.

本発明によれば、研磨紙や研磨布による研磨等の従来技術に比べ、非常に短時間で、被加工物表面に梨地状の凹凸を発生させることなく鏡面化、或いは平結面化することが可能となり、また長時間にわたり高い研磨力を維持できるブラスト加工用投射材を得ることができる。   According to the present invention, compared to conventional techniques such as polishing paper or polishing cloth, the surface of the workpiece can be mirror-finished or flattened without generating textured irregularities in a very short time. In addition, it is possible to obtain a blasting projection material capable of maintaining a high polishing power for a long time.

特に塩化ビニル粒子に含まれる可塑剤の量を適宜選択することで、被加工物の材質および形状に合わせたブラスト加工用の投射材を得ることができる。   In particular, by appropriately selecting the amount of plasticizer contained in the vinyl chloride particles, it is possible to obtain a blasting projection material that matches the material and shape of the workpiece.

また、例えばポリ塩化ビニル粒子といった原料粒子から、ペレット等への成形を必要とせず、非常に簡易な方法にてブラスト加工用投射材を得ることができる。   In addition, a blasting projection material can be obtained by a very simple method without the need to form a pellet or the like from raw material particles such as polyvinyl chloride particles.

また、前記のような簡易な製造工程ばかりでなく、砥材の使用量を比較的少なくできるため、安価にブラスト加工用投射材を得ることができる。   Moreover, since not only the simple manufacturing process as described above but also the amount of abrasive used can be relatively reduced, a blasting projection material can be obtained at low cost.

本発明におけるブラスト加工用投射材の模式図である。It is a schematic diagram of the blasting projection material in the present invention. 砥材の担持状態を示す模式図である。It is a schematic diagram which shows the support state of an abrasive.

原料として、ポリ塩化ビニル粒子(以降、原料粒子)と砥材を使用する。また、添加する可塑剤および形成助剤を必要に応じて使用する。   As raw materials, polyvinyl chloride particles (hereinafter, raw material particles) and abrasives are used. Moreover, the plasticizer and formation adjuvant to add are used as needed.

ポリ塩化ビニル粒子は一般に塩素化したエチレン(Vinyl Chloride Monomer:VCM)より懸濁重合法によって得られる。ポリ塩化ビニルの懸濁重合法は、一般に開始剤および界面活性剤が分散された溶媒中で、界面活性剤により外郭にミセルを形成したVCMを形成され、ミセル中のVCMが成長することで進行する。開始剤はパーオキシエステル系およびジカーボネイト系の水溶性開始剤等が使用される。本実施例における原料粒子も懸濁重合法によって得られたが、本発明は懸濁重合法に限定されずその他公知の手法によって得てもよい。   Polyvinyl chloride particles are generally obtained by suspension polymerization from chlorinated ethylene (VCM). The suspension polymerization method of polyvinyl chloride generally proceeds by forming a VCM with micelles formed by the surfactant in the solvent in which the initiator and the surfactant are dispersed, and growing the VCM in the micelles. To do. As the initiator, peroxyester-based and dicarbonate-based water-soluble initiators are used. The raw material particles in this example were also obtained by suspension polymerization, but the present invention is not limited to suspension polymerization and may be obtained by other known techniques.

可塑剤が含有されることで、塩化ビニル粒子の硬さは柔らかくなる。塩化ビニル粒子の硬さは可塑剤の添加量によって決まる。被加工物の材料および形状により投射材、ひいては塩化ビニル粒子に求められる硬さは異なり、可塑剤の添加量により適宜調整する。本発明において可塑剤を添加する必要がある場合のブラスト加工用投射材に用いる場合の可塑剤の添加量は、塩化ビニル粒子に対し70質量%以下、より好ましくは20〜60%質量%含有させるように添加する。塩化ビニル可塑剤の含有量が70質量%を越えると、塩化ビニル粒子が必要以上に柔らかくなり、たとえ該塩化ビニル粒子表面に砥材を担持させたとしても投射材として必要な硬さは十分に得られず、被加工面に対し十分な衝突エネルギーを得ることができない。その結果、被加工面に対し十分な研磨力を得ることができない。   By containing the plasticizer, the hardness of the vinyl chloride particles becomes soft. The hardness of the vinyl chloride particles is determined by the amount of plasticizer added. Depending on the material and shape of the work piece, the required hardness of the projection material, and thus the vinyl chloride particles, varies and is appropriately adjusted depending on the amount of plasticizer added. In the present invention, the addition amount of the plasticizer when used for the blasting projection material when it is necessary to add a plasticizer is 70% by mass or less, more preferably 20 to 60% by mass with respect to the vinyl chloride particles. Add as follows. When the content of the vinyl chloride plasticizer exceeds 70% by mass, the vinyl chloride particles become unnecessarily soft, and even if the abrasive is supported on the surface of the vinyl chloride particles, the hardness necessary for the projection material is sufficient. It cannot be obtained, and sufficient collision energy cannot be obtained for the surface to be processed. As a result, a sufficient polishing force cannot be obtained for the surface to be processed.

可塑剤は、一般にフタル酸エステル系化合物およびそれに類するもの、およびそれらの化合物物を用いるが、本発明はこれに限定されず、例えばトリトメット酸エステル、脂肪酸エステル、アジピン酸等、公知の物質を用いることができる。   As the plasticizer, phthalic acid ester compounds and the like, and compounds thereof are generally used, but the present invention is not limited thereto, and known materials such as tritometic acid esters, fatty acid esters, adipic acid, and the like are used. be able to.

形成助剤は、本発明の塩化ビニル粒子およびブラスト加工用投射材を形成するために必要に応じ添加する物質である。具体的には、本実施例において、原料粒子内に可塑剤を含浸させるために必要な炭酸カルシウムや、塩化ビニル粒子の形状や組成を安定させる為に必要な各種安定剤(Pb系、Sn系、複合金属石けん系)等が挙げられる。その他、必要に応じ物品および量を適宜選択し用いることができる。   The forming aid is a substance added as necessary to form the vinyl chloride particles and the blasting projection material of the present invention. Specifically, in this embodiment, calcium carbonate necessary for impregnating the plasticizer in the raw material particles and various stabilizers necessary for stabilizing the shape and composition of the vinyl chloride particles (Pb-based, Sn-based). And composite metal soaps). In addition, articles and amounts can be appropriately selected and used as necessary.

砥材は、一般のブラスト加工で用いる投射材や、一般の研磨方法で用いる研磨剤等の中から少なくとも1種類以上選択される。例えば、ホワイトアランダムやガラスやダイヤモンド等をはじめとするセラミックス系や、鉄やステンレス等をはじめとする金属系や、カルシウムの炭酸塩や硫化塩等をはじめとする無機系や、クルミやピーチ等をはじめとする植物系等、PETやPP等をはじめとする樹脂系(ただし、本発明における投射材における核となる塩化ビニルより高硬度のもの)、などが挙げられる。砥材の粒子径は1〜50μm、より好ましくは1〜20μmから選択される。砥材の粒子径が1μmを下回ると被加工面の鏡面化、或いは平滑面化を行うのに必要な研磨能力を得ることができず、50μmを越えると塩化ビニル粒子表面への担持力が弱く、被加工面との衝突により砥材が必要以上に脱落する。   At least one type of abrasive is selected from a projection material used in general blasting, an abrasive used in a general polishing method, and the like. For example, ceramics such as white alundum, glass and diamond, metals such as iron and stainless steel, inorganics such as calcium carbonate and sulfide, walnuts and peaches, etc. And other resin systems such as PET, PP, etc. (however, those having higher hardness than vinyl chloride, which is the core of the projection material in the present invention). The particle diameter of the abrasive is selected from 1 to 50 μm, more preferably from 1 to 20 μm. If the particle diameter of the abrasive is less than 1 μm, the polishing ability necessary for mirroring or smoothing the work surface cannot be obtained, and if it exceeds 50 μm, the supporting force on the surface of the vinyl chloride particles is weak. The abrasive falls off more than necessary due to the collision with the work surface.

砥材を担持する塩化ビニル粒子の径は10〜3,000μm、好ましくは10〜1,000μmより好ましくは50〜300μmから選択される。10μmを下回ると、砥材を十分に担持できないばかりでなく、たとえ担持できたとしてブラスト加工に用いた場合被加工面に対して十分な研磨能力を得ることができない。さらに、ブラスト加工装置では、噴射手段(例えばエアブラスト加工装置における噴射ノズル)により被加工物に向けて噴射された投射材は分級装置(例えばサイクロン式分級装置)により再使用が可能な投射材と、それ以外に分けられ、再使用が可能な投射材は再度噴射手段へ送られ噴射される。該塩化ビニル粒子の径が1μmを下回るものを投射材として使用した場合、前記の様に分級装置にて再使用が可能な投射材を分離することが困難となる。また、3,000μmを上回ると、ブラスト加工時に、投射材が被加工面と衝突する際に被加工面に梨地状の凹凸が形成される。また、前記塩化ビニル粒子は製造方法にもよるが粒子径が1,000μm以下の物が比較的製造が容易である。   The diameter of the vinyl chloride particles carrying the abrasive is selected from 10 to 3,000 μm, preferably 10 to 1,000 μm, more preferably 50 to 300 μm. When the thickness is less than 10 μm, not only the abrasive can not be sufficiently supported, but also when used for blasting as being supported, sufficient polishing ability cannot be obtained for the surface to be processed. Further, in the blast processing apparatus, the projection material injected toward the workpiece by the injection means (for example, the injection nozzle in the air blast processing apparatus) can be reused by the classification apparatus (for example, the cyclone classification apparatus) The projection material which can be divided and reused is sent again to the injection means and injected. When the vinyl chloride particles having a diameter of less than 1 μm are used as the projection material, it becomes difficult to separate the projection material that can be reused by the classifier as described above. On the other hand, when the thickness exceeds 3,000 μm, a satin-like unevenness is formed on the processed surface when the projection material collides with the processed surface during blasting. Moreover, although the said vinyl chloride particle | grain depends on a manufacturing method, a thing with a particle diameter of 1,000 micrometers or less is comparatively easy to manufacture.

前記原料を所定量計量し、混練装置に投入する。混練装置には加熱手段が備えられており、該加熱手段を用いて原料を60〜200℃から選択される温度にて加熱しながら混練を行った。   A predetermined amount of the raw material is weighed and put into a kneading apparatus. The kneading apparatus was equipped with a heating means, and kneading was performed using the heating means while heating the raw material at a temperature selected from 60 to 200 ° C.

加熱を行いながら攪拌を行うことで、原料粒子の表面に砥材が担持される。可塑剤を使用しない場合は原料粒子がそのまま本発明における塩化ビニル粒子となる。原料粒子表面への砥材の担持は、加熱により原料粒子表面が軟化することによって行われる。加熱温度が60℃を下回ると、原料粒子表面の軟化が十分でなく、原料粒子表面に砥材が十分に担持されない。   By performing stirring while heating, the abrasive is supported on the surface of the raw material particles. When a plasticizer is not used, the raw material particles are directly used as vinyl chloride particles in the present invention. The abrasive material is supported on the surface of the raw material particles by softening the surface of the raw material particles by heating. When the heating temperature is lower than 60 ° C., the raw material particle surfaces are not sufficiently softened, and the abrasive is not sufficiently supported on the raw material particle surfaces.

原料として可塑剤を添加した場合は、加熱して混練することで原料粒子の中心に向かって可塑剤が浸透し、本発明における塩化ビニル粒子が形成される。一方、砥材および形成助剤等製造上必要な物質は該粒子の中心部まで浸透することはなく、該粒子表面およびその周辺に担持される。即ち、原料粒子中への可塑剤の含浸と砥材の担持が同一の工程にて行われる。本発明における「粒子表面に砥材が担持された状態」とは、砥材ばかりでなく、前述の通り製造上必要な物質が担持されている場合も含まれる。   When a plasticizer is added as a raw material, the plasticizer penetrates toward the center of the raw material particles by heating and kneading to form vinyl chloride particles in the present invention. On the other hand, substances necessary for production such as abrasives and forming aids do not penetrate to the center of the particles, but are supported on the surface of the particles and the periphery thereof. That is, impregnation of the plasticizer into the raw material particles and loading of the abrasive are performed in the same process. The “state where the abrasive is supported on the particle surface” in the present invention includes not only the abrasive but also a case where a substance necessary for production is supported as described above.

また、加熱温度によって可塑剤が原料粒子中に含浸する速度および量が異なるため、得られる塩化ビニル粒子中の可塑剤の分布が変化する。即ち、低温での混練では可塑剤の含浸の進行は緩やかであり、結果として得られた塩化ビニル粒子は中心部から表面に向かって段階的に柔らかい粒子が得られる。加熱温度が160℃以上で可塑剤は塩化ビニル粒子の中心まで含浸している。しかし、160℃を越えると塩化ビニルの側鎖にある塩素が塩化水素として分解を開始するため、160℃を越える温度で加熱する場合は必要に応じて安定剤を添加する。加熱温度をさらに上昇させ200℃を越えると、塩化ビニルの主鎖の分裂が開始し、物性が大きく変化するので加熱温度は200℃以下とする必要がある。   Further, since the rate and amount of the plasticizer impregnated into the raw material particles differ depending on the heating temperature, the distribution of the plasticizer in the resulting vinyl chloride particles changes. That is, in the kneading at a low temperature, the progress of impregnation with the plasticizer is slow, and as a result, the resulting vinyl chloride particles are softly obtained step by step from the center toward the surface. When the heating temperature is 160 ° C. or higher, the plasticizer is impregnated to the center of the vinyl chloride particles. However, when the temperature exceeds 160 ° C., chlorine in the side chain of vinyl chloride starts to decompose as hydrogen chloride. Therefore, when heating at a temperature exceeding 160 ° C., a stabilizer is added as necessary. If the heating temperature is further raised and exceeds 200 ° C., the main chain of vinyl chloride begins to break and the physical properties change greatly.

前記混練は、大気圧基準で0.1〜0.8MPa、より好ましくは0.1〜0.5MPaに加圧して行う。0.1MPa以上の加圧を行うことによって、前記砥材の担持や、可塑剤を添加した場合には原料粒子中への可塑剤の含浸がより促進されるが、0.8MPaを越えると隣り合う塩化ビニル粒子同士が凝集する等、塩化ビニル粒子の形状が維持できない。   The kneading is performed by pressurizing to 0.1 to 0.8 MPa, more preferably 0.1 to 0.5 MPa on an atmospheric pressure basis. By applying a pressure of 0.1 MPa or more, when the abrasive material is carried or a plasticizer is added, the impregnation of the plasticizer into the raw material particles is further promoted. The shape of the vinyl chloride particles cannot be maintained, for example, the matching vinyl chloride particles aggregate.

また、混練時間によっても原料粒子中への可塑剤の含浸量が変化する。よって、混練時の加熱温度および混練時間を適宜調整することにより、被加工品の材質や形状に最適な硬さおよび研磨力を有する粒子を得ることができる。含浸された可塑剤が塩化ビニル粒子中に均一に分散されている場合、前記粒子はどの部位においても一様な硬さであるが、均一に分散されていない場合は部位によって硬さは異なる。即ち可塑剤は外周部より中心部に向かって含浸するため、可塑剤が前記粒子の中心部まで十分に到達していない場合は、前記粒子の中心部と外周部では可塑剤の含有率に差があり、外周部の方が含有率は高くなる。その結果、前記粒子の中心部に比べ外周部は軟質である。   Also, the amount of plasticizer impregnated in the raw material particles varies depending on the kneading time. Therefore, by appropriately adjusting the heating temperature and kneading time at the time of kneading, particles having the optimum hardness and polishing power for the material and shape of the workpiece can be obtained. When the impregnated plasticizer is uniformly dispersed in the vinyl chloride particles, the particles have a uniform hardness at any part, but when not uniformly dispersed, the hardness varies depending on the part. In other words, since the plasticizer is impregnated from the outer peripheral portion toward the central portion, if the plasticizer does not reach the central portion of the particles sufficiently, there is a difference in the plasticizer content between the central portion and the outer peripheral portion of the particles. And the content rate is higher in the outer peripheral portion. As a result, the outer peripheral portion is softer than the central portion of the particles.

こうして得られた粒子を必要に応じて分級することで、塩化ビニル粒子11の表面に砥材12および製造上必要な物質(本実施形態では形成助剤13)が担持されている図1に示すようなブラスト加工用投射材を得た。なお、分級は篩や風力分級等公知な手法によって行うことができ、方法は特に限定されない。また、該投射材の形状は略球形である。球形であることにより、担持されている砥材は、該投射材表面に対し偏りなく均等に担持されている。   By classifying the particles thus obtained as necessary, the surface of the vinyl chloride particles 11 carries the abrasive 12 and a substance necessary for production (in this embodiment, the forming aid 13) as shown in FIG. A blasting projection material was obtained. The classification can be performed by a known method such as sieving or air classification, and the method is not particularly limited. Further, the shape of the projection material is substantially spherical. Due to the spherical shape, the supported abrasive is supported evenly on the projection material surface without deviation.

得られたブラスト加工用投射材は、砥材が塩化ビニル粒子に対し1〜50体積%、より好ましくは5〜30体積%担持されている。1体積%を下回ると、該投射材表面への砥材の露出量が少なく被加工面に対して十分な研磨力を得ることができない。50体積%を上回ると、該投射材における砥材の量が多くなったことにより全体的な硬度が上昇し、ブラスト加工によって被加工面に梨地状の凹凸を形成、或いは被加工面に傷が生じる。   In the obtained blasting projection material, the abrasive is supported in an amount of 1 to 50% by volume, more preferably 5 to 30% by volume, relative to the vinyl chloride particles. If it is less than 1% by volume, the amount of the abrasive exposed to the surface of the projection material is small, and a sufficient polishing force cannot be obtained on the work surface. When the volume exceeds 50% by volume, the overall hardness increases due to an increase in the amount of abrasive in the projection material, and a matte surface unevenness is formed on the surface to be processed by blasting, or scratches are formed on the surface to be processed. Arise.

なお、本発明における塩化ビニル粒子の表面へ砥材が担持されている状態は、表面のみに担持されているばかりではなく、表面付近にも担持(例えば砥材が積み重ねられて層を形成)している場合も含まれる。具体的には、図2に示すように該投射材の中心部を中心とした、径が少なくとも70%未満の範囲内に砥材が担持されていなければよい。即ち、図2に示すように直径Aμmのブラスト加工用投射材20の中心部を中心に直径0.7×Aμm以上の範囲が塩化ビニル21のみの領域であればよく,残部は塩化ビニルと砥材が共存している領域22である。   In the present invention, the state in which the abrasive is supported on the surface of the vinyl chloride particles is not only supported on the surface, but is also supported near the surface (for example, the abrasive is stacked to form a layer). It is also included. Specifically, as shown in FIG. 2, it is sufficient that the abrasive is not carried within a range where the diameter is at least less than 70% with the central portion of the projection material as the center. That is, as shown in FIG. 2, the range of 0.7 × A μm or more in diameter is about the central portion of the blasting projection material 20 having a diameter of A μm as long as the region is only the vinyl chloride 21, and the remainder is vinyl chloride and abrasive. This is the region 22 where the materials coexist.

こうして得られた投射材を、空気式ブラスト加工装置に投入した。空気式ブラスト装置は、吸引式(重力式)と加圧式(直圧式)があるが、本実施例では吸引式を例に説明する。   The projection material thus obtained was put into a pneumatic blasting apparatus. There are two types of pneumatic blast devices: a suction type (gravity type) and a pressurization type (direct pressure type). In this embodiment, the suction type will be described as an example.

吸引式ブラスト加工装置は、ブラスト加工室、ブラスト加工用ノズル、圧縮空気供給装置、分級装置、集塵装置より構成されている。ブラスト加工室内にセットされたブラスト加工用ノズルに、圧縮空気供給装置により圧縮空気を供給することで、該ノズル内部に負圧(吸引力)が発生する。この負圧の流れに投射材を投入することで、該圧縮空気に投射材が混入され、混合気流となって、該ノズルの噴射口より噴射される。 The suction-type blasting apparatus includes a blasting chamber, a blasting nozzle, a compressed air supply device, a classification device, and a dust collecting device. By supplying compressed air to the blasting nozzle set in the blasting chamber with a compressed air supply device, negative pressure (suction force) is generated inside the nozzle. By injecting the projection material into this negative pressure flow, the projection material is mixed into the compressed air and becomes a mixed air current, which is ejected from the ejection port of the nozzle.

該ノズルは被加工面より所定の距離を離して、被加工面に対し45°に傾斜してセットされている。該ノズルの噴射口より噴射された投射材は被加工面に高速で衝突し、被加工面の研磨が行われる。同時に、該投射材は被加工面との衝突により一部の研磨粒子が脱落する。 The nozzle is set at a predetermined distance from the processing surface and inclined at 45 ° with respect to the processing surface. The projecting material ejected from the nozzle outlet collides with the work surface at high speed, and the work surface is polished. At the same time, some of the abrasive particles fall off due to the collision with the surface to be processed.

噴射された投射材、被加工面の切削物や、該投射材より脱落した研磨粒子等の粉塵、等は分級装置(例えばサイクロン式分級装置)に移送される。そこで、再利用可能な投射材は、投射材ホッパーに移送され、再び該ノズルに投入される。一方、粉塵や再利用できない投射材は集塵機にて捕集される。 The ejected projection material, the cut surface of the work surface, dust such as abrasive particles that have fallen off the projection material, and the like are transferred to a classification device (for example, a cyclone classification device). Therefore, the reusable projection material is transferred to the projection material hopper, and again injected into the nozzle. On the other hand, dust and non-reusable projection material are collected by a dust collector.

被加工面の全体を加工するために、該ノズルもしくは被加工物を移動しながら所定時間投射材の噴射を行った。所定時間噴射した後、投射材の噴射を停止して被加工物をブラスト加工室より取り出し、被加工物をエアブローや水洗等にて洗浄し、鏡面化、もしくは光沢面化の加工が完了する。 In order to process the entire surface to be processed, the projection material was sprayed for a predetermined time while moving the nozzle or the workpiece. After spraying for a predetermined time, the injection of the projection material is stopped, the workpiece is taken out from the blast processing chamber, and the workpiece is washed by air blow, water washing or the like, and the mirror surface processing or gloss surface processing is completed.

(変更例)
本実施形態では、原料粒子としてポリ塩化ビニル粒子を使用したが、ポリ塩化ビニルの共重合体、ポリ塩化ビニルデンの重合体または共重合体、及び可塑剤により可塑化可能である公知の高分子材料を使用することができる。
(Example of change)
In the present embodiment, polyvinyl chloride particles are used as raw material particles, but a known polymer material that can be plasticized by a polyvinyl chloride copolymer, a polyvinylidene polymer or copolymer, and a plasticizer. Can be used.

原料の攪拌の際は大気圧下で行ってもよい。前記砥材の担持速度や、可塑剤を添加した場合における原料粒子中への可塑剤の含浸速度が緩やかとなるため、ブラスト加工用投射材の物性値の細かい調整が可能である。   The stirring of the raw material may be performed under atmospheric pressure. Since the carrying speed of the abrasive and the impregnation speed of the plasticizer into the raw material particles when a plasticizer is added, the physical property value of the blasting projection material can be finely adjusted.

ブラスト加工は空気式に限定されず、例えば羽根車の回転によって投射材を被加工物に衝突させる遠心式等、公知の方法を選択することができる。   The blasting is not limited to the pneumatic method, and a known method such as a centrifugal method in which the projection material collides with the workpiece by the rotation of the impeller can be selected.

該ノズルと被加工面との成す角度は垂直を含む0ないし180°の範囲より任意に設定することができる。   The angle formed by the nozzle and the surface to be processed can be arbitrarily set within a range of 0 to 180 ° including vertical.

(原料)
原料粒子にポリ塩化ビニルの粒子(ZEST 1300Z:新第一塩ビ(株)製)を、可塑剤にフタル酸ジイソノニル(ビニサイザー90:花王(株)製)を、形成助剤に炭酸カルシウム(NS#400:日東粉化工業(株)製)を、砥材にカーボランダム(GC#4000:新東工業(株)製)を使用した。これらを原料とし、混合比を2:3:2:3とした。
(material)
Polyvinyl chloride particles (ZEST 1300Z: manufactured by Shin Daiichi Vinyl Co., Ltd.) are used as raw material particles, diisononyl phthalate (Vinizer 90: manufactured by Kao Corporation) is used as a plasticizer, and calcium carbonate (NS #) is used as a forming aid. 400: manufactured by Nitto Flour Chemical Co., Ltd.) and Carborundum (GC # 4000: manufactured by Shinto Kogyo Co., Ltd.) were used as the abrasive. These were used as raw materials, and the mixing ratio was 2: 3: 2: 3.

(混練条件)
混練は、加圧式混練装置(自作品)を用いた。混練装置の加熱温度を120℃に設定し、混練時の圧力、混練時間を変化させた。具体的には、大気圧下で20分混練して得た試料を実施例1、大気圧下で60分混練して得た試料を実施例2、0.3MPa(大気圧基準)で20分混練して得た試料を実施例3とした。
(Kneading conditions)
For the kneading, a pressure-type kneading apparatus (original work) was used. The heating temperature of the kneading apparatus was set to 120 ° C., and the pressure during kneading and the kneading time were changed. Specifically, a sample obtained by kneading for 20 minutes under atmospheric pressure is Example 1, a sample obtained by kneading for 60 minutes under atmospheric pressure is Example 2, and 20 minutes at 0.3 MPa (atmospheric pressure standard). A sample obtained by kneading was designated as Example 3.

(ブラスト加工)
得られたブラスト投射材を、ブラスト加工装置(MY−30:新東工業(株)製)を用いて、φ40mmの被加工面を持ち、硬さがHRC62(JISG0202)のSK−3C熱処理品に噴射した。なお噴射条件は、噴射圧力は0.3MPa、ノズルと被加工面の距離は100mm、ノズルと被加工面の角度は45度とし、5分間の加工を行った。
(Blasting)
Using the resulting blast projection material, a blasting machine (MY-30: manufactured by Shinto Kogyo Co., Ltd.) has a processed surface of φ40 mm and has a hardness of HRC62 (JISG0202) SK-3C heat-treated product. Jetted. The injection conditions were as follows: the injection pressure was 0.3 MPa, the distance between the nozzle and the surface to be processed was 100 mm, the angle between the nozzle and the surface to be processed was 45 degrees, and the processing was performed for 5 minutes.

(評価)
ブラスト加工後、エアブローおよび水洗等により被加工面の洗浄を行った後、面粗度および光沢度について評価をおこなった。面粗度は表面粗さ計(SURFCOM1500SD:(株)東京精密製)にて算術平均粗さRa、最大高さRy、十点平均粗さRz(JISB0601−1994)の測定をおこなった。光沢度は目視にて行い、未加工品と比較して光沢が増していた場合は○、未加工品と同等の場合は△、未加工品より光沢がなくなっていた場合は×とした。また、面粗度と光沢度を合わせた評価を総合評価とし、未加工品より良好な場合は○、未加工品と同等の場合は△、未加工品より悪い場合は×とした。
(Evaluation)
After blasting, the surface to be processed was cleaned by air blow, water washing, etc., and then the surface roughness and glossiness were evaluated. The surface roughness was measured with a surface roughness meter (SURFCOM 1500SD: manufactured by Tokyo Seimitsu Co., Ltd.) for arithmetic average roughness Ra, maximum height Ry, and ten-point average roughness Rz (JIS B0601-1994). The glossiness was visually evaluated, and it was evaluated as “◯” when the gloss increased compared to the unprocessed product, “Δ” when equal to the unprocessed product, and “X” when the gloss was less than the unprocessed product. Moreover, the evaluation which combined surface roughness and glossiness was made into comprehensive evaluation, and when it was better than an unprocessed product, it was set as ◯, when it was equal to an unprocessed product, and when it was worse than an unprocessed product, it was set as x.

(比較例)
比較例1は前記実施例において、可塑剤を過剰に添加、具体的には塩化ビニル粒子に対し80%となるように添加し、その他の条件は実施例1と同じとした。比較例2は前期実施例において、砥材を塩化ビニル粒子に過剰に担持、具体的にはブラスト加工用投射材において60体積%となるように担持たせ、その他の条件は実施例1と同じとした。比較例3は前記実施例において、混練装置の温度を50℃に設定し、その他の条件は実施例1と同じとした。比較例4は前期実施例において、加圧の圧力を0.9MPaとし、その他の条件は実施例1と同じとした。実施例1〜3および比較例1〜4の実施条件を表1に示す。
(Comparative example)
Comparative Example 1 was the same as in Example 1 except that the plasticizer was added in excess, specifically, 80% with respect to the vinyl chloride particles. In Comparative Example 2, the abrasive material was excessively supported on the vinyl chloride particles in the previous example, and specifically, 60% by volume was supported in the blasting projection material, and other conditions were the same as in Example 1. did. In Comparative Example 3, the temperature of the kneading apparatus was set to 50 ° C. in the above Example, and other conditions were the same as in Example 1. Comparative Example 4 was the same as that in Example 1 in the previous example, except that the pressure applied was 0.9 MPa. The execution conditions of Examples 1 to 3 and Comparative Examples 1 to 4 are shown in Table 1.

(結果)
原料を混練して得られた試料は、実施例1〜3および比較例2では塩化ビニル粒子の表面に砥材が担持された略球形の試料が得られた。比較例1および比較例4では略球形ではなく異形状の粒子となり、砥材の担持も粒子表面に対し均等に担持されておらず、粗密の分布が生じていた。比較例3は略球形であったものの、表面に砥材がほとんど担持されていなかった。
(result)
Samples obtained by kneading the raw materials in Examples 1 to 3 and Comparative Example 2 were substantially spherical samples in which an abrasive was supported on the surface of vinyl chloride particles. In Comparative Example 1 and Comparative Example 4, the particles were not substantially spherical but irregularly shaped, and the abrasive was not evenly supported on the particle surface, resulting in a coarse and dense distribution. Although the comparative example 3 was substantially spherical, the abrasive was hardly carried on the surface.

また、粒子の形態(硬度)は、実施例1および比較例2では塩化ビニル粒子の中心から外周面に向かって連続的に軟質なっている。これは、混練段階において原料粒子の中心部まで可塑剤が十分に含浸しなかったことに起因すると考えられる。これに対し実施例2および実施例3では、塩化ビニル粒子がどの部位においても一様の硬度となっていた。これは、実施例2では原料粒子中に可塑剤が含浸するだけの十分な攪拌時間であったこと、また実施例3では加圧することにより含浸が進行したことによると考えられる。   In addition, in Example 1 and Comparative Example 2, the form (hardness) of the particles is continuously soft from the center of the vinyl chloride particles toward the outer peripheral surface. This is probably because the plasticizer was not sufficiently impregnated to the center of the raw material particles in the kneading stage. On the other hand, in Example 2 and Example 3, the vinyl chloride particles had a uniform hardness at any part. This is considered to be because in Example 2, the stirring time was sufficient for the plasticizer to be impregnated into the raw material particles, and in Example 3, the impregnation proceeded by applying pressure.

塩化ビニル粒子の表面に砥材がされた試料(実施例1〜3および比較例2)を用いてブラスト加工を行った結果を表2に示す。ブラスト加工後の被加工面の面粗度(Ra、Ry、Rz)は、実施例2と実施例3はほぼ同等の結果が得られたが、実施例1はいずれの数値も若干高めであった。しかし、ブラスト加工前に比べ面粗度は改善されていた(未加工品の面粗度Ra、Ry、Rzはそれぞれ0.20μm、2.05μm、1.51μm)。また、光沢度は実施例1〜3いずれも○であったことから、総合評価はいずれも○となった。よって、実施例1のような形態を持つ粒子でも光沢面化或いは平滑面化を目的としたブラスト加工用投射材として好適に用いることができ、被加工品の材質および形状等によっては実施例2および3の様な形態よりも好適に用いることができることが示唆された。一方、比較例では面粗度および光沢度は未加工品より悪化した。これは、砥材の担持量が多いために投射材としては硬度が硬くなりブラスト加工時に、被加工面に梨地状の凹凸を形成したためであると考えられる。   Table 2 shows the results of blasting using samples (Examples 1 to 3 and Comparative Example 2) in which the surface of the vinyl chloride particles is abrasive. As for the surface roughness (Ra, Ry, Rz) of the processed surface after blasting, almost the same results were obtained in Example 2 and Example 3, but Example 1 was slightly higher in all numerical values. It was. However, the surface roughness was improved compared to before blasting (surface roughness Ra, Ry, Rz of the unprocessed product was 0.20 μm, 2.05 μm, and 1.51 μm, respectively). Moreover, since glossiness was ◯ in all of Examples 1 to 3, the overall evaluation was ◯. Therefore, even particles having the form as in Example 1 can be suitably used as a blasting projection material for the purpose of making the surface glossy or smooth, and Example 2 depends on the material and shape of the workpiece. It was suggested that the present invention can be used more favorably than the forms of 3 and 3. On the other hand, in the comparative example, the surface roughness and gloss were worse than those of the unprocessed product. This is considered to be because the projection material has a high hardness due to the large amount of abrasive material carried, and the matte surface unevenness is formed on the surface to be processed during blasting.

本発明によって、研磨紙や研磨布による研磨等の従来技術に比べ、非常に短時間で、被加工物表面に梨地状の凹凸を発生させることなく鏡面化、或いは平滑面化することが可能となった。例えば金型のキャビティー面の鏡面化に適用することができる。金型のキャビティー面は非常に高精度な面を必要としている。また使用するに従って成形材料の焼き付き等が発生する。よって、例えば焼き付き等による成形材料のクリーニングには、従来のショットブラストや表面研磨法などの公知な方法によって行い、その後本発明による鏡面化を行うことができる。もちろん、キャビティー面の残渣の付着力がそれほど強固でなく、本発明の投射材の噴射によって十分に除去が可能であれば、本発明にてクリーニングと鏡面化を同時に行ってもよい。   According to the present invention, it is possible to make a mirror surface or a smooth surface without generating a textured surface unevenness in a very short time compared to conventional techniques such as polishing with polishing paper or polishing cloth. became. For example, it can be applied to mirror the cavity surface of a mold. The cavity surface of the mold requires a highly accurate surface. In addition, seizure of the molding material occurs as it is used. Therefore, for example, the cleaning of the molding material by image sticking or the like can be performed by a known method such as conventional shot blasting or a surface polishing method, and then can be mirror-finished according to the present invention. Of course, if the adhesion of the residue on the cavity surface is not so strong and can be sufficiently removed by spraying the projection material of the present invention, cleaning and mirroring may be performed simultaneously in the present invention.

他の用途として、例えばDLC等の皮膜を施工する際の基材の前処理をはじめ、あらゆる鏡面化、或いは平滑面化の用途に適用することができる。
As other applications, for example, it can be applied to various mirror surface or smooth surface applications, including pretreatment of a base material when a film such as DLC is applied.

11 塩化ビニル粒子
12 砥材
13 形成助剤
11 Vinyl chloride particles 12 Abrasive material 13 Formation aid

Claims (6)

径が10〜3,000μmの塩化ビニル粒子の表面に1〜50μmの砥材を担持させて形成された略球形の粒子であることを特徴とするブラスト加工用投射材。   A projection material for blasting, characterized in that it is a substantially spherical particle formed by supporting a 1-50 μm abrasive on the surface of vinyl chloride particles having a diameter of 10-3,000 μm. 前記塩化ビニル粒子は、70質量%以下の可塑剤が含まれていることを特徴とする請求項1に記載のブラスト加工用投射材。   The blasting projection material according to claim 1, wherein the vinyl chloride particles contain 70% by mass or less of a plasticizer. 前記塩化ビニルは、中心部から表面部に向かって硬度が連続的に軟化されていることを特徴とする請求項1または請求項2に記載のブラスト加工用投射材。   3. The blasting projection material according to claim 1, wherein the vinyl chloride is continuously softened from a central portion toward a surface portion. 4. 前記砥材は、前記塩化ビニル粒子に対し1〜50体積%担持されていることを特徴とする請求項1ないし請求項3のいずれかに記載のブラスト加工用投射材。   The blasting projection material according to any one of claims 1 to 3, wherein the abrasive is supported by 1 to 50% by volume with respect to the vinyl chloride particles. 請求項1ないし4のいずれかに記載のブラスト加工用投射材の製造方法において、ポリ塩化ビニル粒子および砥材、さらには必要に応じ可塑剤および/または成形助剤を添加するとともに、60〜200℃で加熱しながら混練することによって製造することを特徴とするブラスト加工用投射材の製造方法。   5. The method for producing a blasting projection material according to claim 1, wherein polyvinyl chloride particles and an abrasive, and further, if necessary, a plasticizer and / or a molding aid are added, and 60 to 200 A method for producing a blasting projection material, which is produced by kneading while heating at 0 ° C. 請求項5に記載のブラスト加工用投射材の製造方法において、大気圧基準で0.1〜0.8MPaで加圧しながら混練することを特徴とするブラスト加工用投射材の製造方法。
6. The method for producing a blasting projection material according to claim 5, wherein the blasting projection material is kneaded while being pressurized at 0.1 to 0.8 MPa on an atmospheric pressure basis.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3210723A1 (en) * 2016-02-25 2017-08-30 Kamei Tekkousho Ltd. Abrasive materials
WO2021235361A1 (en) * 2020-05-18 2021-11-25 新東工業株式会社 Blasting abrasive and manufacturing method thereof, blasting method, and blasting apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59227970A (en) * 1983-06-10 1984-12-21 Toshiba Corp Abrasive
JP2004243464A (en) * 2003-02-13 2004-09-02 Toshiba Corp Polishing method of large-sized parts and abrasive grain for use in it

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59227970A (en) * 1983-06-10 1984-12-21 Toshiba Corp Abrasive
JP2004243464A (en) * 2003-02-13 2004-09-02 Toshiba Corp Polishing method of large-sized parts and abrasive grain for use in it

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3210723A1 (en) * 2016-02-25 2017-08-30 Kamei Tekkousho Ltd. Abrasive materials
WO2021235361A1 (en) * 2020-05-18 2021-11-25 新東工業株式会社 Blasting abrasive and manufacturing method thereof, blasting method, and blasting apparatus
JP2021181127A (en) * 2020-05-18 2021-11-25 新東工業株式会社 Abrasive material for blasting, manufacturing method therefor, blasting method, and blasting device
JP7447671B2 (en) 2020-05-18 2024-03-12 新東工業株式会社 Abrasive material for blasting, its manufacturing method, blasting method, and blasting device

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