JP2011106903A - Sample pretreatment device for fluorescent x-ray analysis, and fluorescent x-ray analysis system including the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a desired fixed amount of dropping and to correctly recover an object to be measured without being affected by the remaining amount of a solution, in a sample pretreatment device in which the object existing on a substrate surface, etc. is dissolved by reactive gas, the solution is dropped on the substrate and moved on the substrate surface while being held by a holder, and the object to be measured is recovered, dried and held on the substrate surface. <P>SOLUTION: In the device, the correlation among the remaining amount of a solution 4, the open time of a valve 82, and the dropping amount of the solution 4, is stored in advance, and the remaining amount of the solution 4 is detected. On the basis of the detected remaining amount of the solution 4 and the correlation, the open time of the valve 82 for dropping the solution 4 is determined. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a sample pretreatment apparatus that melts and drys an object to be measured existing on a substrate surface or the like and holds it on the substrate surface, and a fluorescent X-ray analysis system including the same.

  Conventionally, in order to perform X-ray fluorescence analysis of trace amounts of contaminants adhering to a semiconductor substrate, the substrate is transported from the sample pretreatment device to the fluorescence X-ray analysis device by a transfer device such as a robot hand. There is a system (see Patent Document 1). The sample pretreatment device in this system dissolves the object to be measured present on the surface of the substrate with a reactive gas (hydrogen fluoride), then drops the solution (hydrofluoric acid) on the substrate and holds it with a holder. However, it is moved on the substrate surface, and the object to be measured is recovered and dried and held on the substrate surface.

  In this sample pretreatment device, the correlation between the pressure for dropping the solution, the opening time of the valve for opening and closing the solution flow path, and the amount of the solution dropped is stored in advance, and the pressure for dropping the solution is detected. Based on the detected pressure and the correlation, an opening time of the valve for dropping the solution is determined. Thereby, even if the pressure for dripping the solution fluctuates, a desired constant dripping amount can be obtained and the object to be measured can be collected correctly.

Japanese Patent No. 3629535

  On the other hand, in recent years, there has been a demand to collect and analyze even the object to be measured present on the side surface of the disk-shaped substrate. For this purpose, while dripping the dropped solution slightly out of the outer periphery of the substrate surface, In order not to spill from the side, it must be held and moved by a holding tool. For example, an extremely small amount of error of −10 to + 0% is allowed for an appropriate dropping amount of 100 μL. However, it has been found that the conventional sample pretreatment apparatus may deviate from such severe tolerances when the remaining amount of the solution decreases.

  The present invention has been made in view of such a problem. After the object to be measured existing on the substrate surface or the like is dissolved with a reactive gas, the solution is dropped on the substrate and held on the substrate surface while being held by the holder. In a sample pretreatment apparatus and a fluorescent X-ray analysis system equipped with the sample pretreatment apparatus that moves and collects the object to be measured and then dries and holds it on the substrate surface, a desired constant drop amount can be obtained without being affected by the remaining amount of the solution. An object of the present invention is to provide a device that can be obtained and correctly collects an object to be measured.

  In order to achieve the above object, the sample pretreatment apparatus for fluorescent X-ray analysis according to the first configuration of the present invention exists on the surface of a measurement object existing on the substrate surface or a film formed on the substrate surface or in the film. A gas phase decomposition apparatus that dissolves the object to be measured with a reactive gas in the decomposition chamber and then dries it and holds it on the substrate surface, and the substrate surface while dropping the solution onto the substrate on which the object to be measured exists and holding it with a holder And a sample recovery device for recovering and drying the object to be measured and holding it on the substrate surface, and further comprising the following remaining amount detection means, a valve, and a control device. The remaining amount detecting means detects the remaining amount of the solution in the container storing the solution. The valve opens and closes the flow path of the solution pressurized at a predetermined pressure in the container. The control device stores in advance a correlation between the remaining amount of the solution, the opening time of the valve, and the dropping amount of the solution, and based on the stored correlation and the remaining amount of the solution detected by the remaining amount detecting means. , Determine the opening time of the valve for dripping the solution.

  According to the sample pretreatment apparatus for fluorescent X-ray analysis of the first configuration, the correlation between the remaining amount of the solution, the opening time of the valve, and the dropping amount of the solution is stored in advance, and the remaining amount of the solution is detected and detected. Since the opening time of the valve for dropping the solution is determined based on the remaining amount of the solution and the correlation, a desired constant dropping amount can be obtained without being affected by the remaining amount of the solution, The object to be measured is collected correctly.

  The fluorescent X-ray analysis system of the second configuration of the present invention is a sample pretreatment device for fluorescent X-ray analysis of the first configuration and an object to be measured held on the substrate surface by the vapor phase decomposition device or the sample recovery device. And a fluorescent X-ray analyzer that measures the intensity of fluorescent X-rays generated by irradiating primary X-rays. The X-ray fluorescence analysis system having the second configuration also has the same effects as the sample X-ray fluorescence analysis sample pretreatment apparatus having the first configuration.

It is the schematic which shows the characteristic part of the sample collection | recovery apparatus with which the fluorescent X ray analysis system which is one Embodiment of this invention is provided. (A) is a top view of the sample collection device, and (b) is a front view of the device. (A) is a front view of the holder cleaning means of the sample recovery apparatus, in which the holder is immersed in the cleaning liquid, and (b) is a front view of the same means that sprays the cleaning liquid onto the holder. (A) is a top view of the vapor-phase decomposition apparatus with which the same fluorescent X-ray-analysis system is equipped, (b) is a front view of the apparatus. (A) is a top view of the fluorescent X-ray analysis system, and (b) is a front view of the system. It is a graph which shows an example of the correlation of the residual amount of the solution in the sample collection | recovery apparatus, the open time of a valve, and the dripping amount of a solution. It is a graph which shows another example of the correlation. It is a graph which shows another example of the correlation.

  Hereinafter, a configuration of an X-ray fluorescence analysis system according to an embodiment of the present invention will be described. As shown in a plan view and a front view in which a part of FIGS. 5A and 5B is broken, this fluorescent X-ray analysis system is first a sample pretreatment having a gas phase decomposition apparatus 20 and a sample recovery apparatus 30. The intensity of fluorescent X-rays 44 generated by irradiating the apparatus 10 and the DUT 2 on the substrate 1 placed on the sample stage 41 by irradiating the primary X-ray 43 from the X-ray source 42 is measured by the detecting means 45. An X-ray fluorescence analyzer 40 and a transfer device 50 that transfers the substrate 1 from the sample pretreatment device 10 to the X-ray fluorescence analyzer 40 are provided.

  In this embodiment, a total reflection fluorescent X-ray analyzer 40 that irradiates a sample with primary X-rays at a small incident angle is adopted, and an X-ray source 42 is an X-ray tube, a monochromator, a spectroscopic element, or the like. SSD is used as the detection means 45. The X-ray fluorescence analyzer 40 has a transfer means 46 such as a robot hand, and transfers the substrate 1 between a cassette 47 and a sample stage 41 in the introduction chamber.

  The transfer device 50 is a robot hand whose main body can move back and forth on a rail. The substrate 1 is placed on the hand portion 50a, and the substrate 1 is placed on the cassette base 5 of the fluorescent X-ray analysis system. From the placed cassette 3 (predetermined loading position) to the decomposition chamber 21 or the recovery chamber 31 of the sample pretreatment device 10, from the decomposition chamber 21 to the recovery chamber 31, and from the decomposition chamber 21 or the recovery chamber 31 to the fluorescent X-ray analyzer 40 Are transferred from the cassette 47 in the introduction chamber to the cassette 3 placed on the original cassette table 5. A plurality of cassettes 3 can be placed on the cassette base 5.

  The X-ray fluorescence analysis system is installed so as to penetrate through a wall 8 separating a clean room 6 in which a semiconductor manufacturing apparatus or the like is placed and an analysis chamber 7 for analyzing the semiconductor substrate 1 manufactured therein, and only the cassette table 5 is in the clean room. is there. A shutter (not shown) is provided between the cassette 3 placed on the cassette table 5 and the transport device 50.

  The X-ray fluorescence analysis system uses a common environment (such as a shutter between the cassette 3 placed on the cassette stage 5 and the transport device 50, such as the sample pretreatment device 10, the fluorescent X-ray analysis device 40, the transport device 50, and the transport device 50. A control device 60 such as a computer controlled by software) is provided, for example, in the fluorescent X-ray analysis device 40. Each device is integrally provided in one housing as a whole on a common base.

  Here, the configuration of the vapor phase decomposition apparatus 20 in the sample pretreatment apparatus 10 will be described. The vapor phase decomposition apparatus 20 shown in the plan view and the front view in FIGS. 4 (a) and 4 (b) is an object to be measured existing on the surface of the substrate 1 or the surface of the film formed on the surface of the substrate or the object existing in the film. The measurement object is dissolved in the decomposition chamber 21 by the reactive gas and then dried and held on the surface of the substrate 1. More specifically, the decomposition chamber 21 of the vapor phase decomposition apparatus 20 is a box made of, for example, PTFE (polytetrafluoroethylene, Teflon (registered trademark)), and a hand portion 50a of the transfer apparatus 50 such as a robot hand. Is provided with an inner shutter 21a that can be freely opened and closed. Further, an outer shutter 27 that can be opened and closed is provided on the outer wall of the gas phase decomposition apparatus 20 with a space where the air from the upper recovery chamber 31 flows down from the inner shutter 21a. In the decomposition chamber 21, hydrogen fluoride is introduced as a reactive gas from the pipe 22 a to dissolve an oxide film formed on the surface of the substrate 1, for example, a silicon wafer, and to contaminate the film surface or in the film. An object to be measured such as a substance is dissolved and discharged from the pipe 22b. When no film is formed on the surface of the substrate 1, the object to be measured existing on the surface of the substrate 1 is dissolved.

  The vapor phase decomposition apparatus 20 has decomposition chamber cleaning means 23 for cleaning by flowing ultrapure water as a cleaning liquid into the decomposition chamber 21, that is, a cleaning liquid introduction pipe 23a and a discharge pipe 23b. Also, clean nitrogen as an inert gas is allowed to flow into the decomposition chamber 21 to drive out hydrogen fluoride and to dry droplets generated on the substrate 1, that is, a nitrogen introduction pipe 24a and a discharge pipe. 24b. In the droplet drying means, instead of flowing the inert gas or in addition to flowing the inert gas, the decomposition chamber may be depressurized (evacuated) to dry the droplet generated on the substrate. . In this case, evacuation and introduction of inert gas may be repeated.

  In addition, a substrate base 25 having a narrow taper 25a facing downward is provided on the inner periphery so that the substrate 1 is placed at a predetermined position in the decomposition chamber 21. That is, the substrate base 25 has a ring shape with a part cut away so as not to interfere with the hand unit 50a of the transfer device, and a tapered surface 25a that forms a part of a downwardly conical side surface is formed on the inner periphery. And fixed in the decomposition chamber 21.

  Next, the configuration of the sample recovery device 30 will be described. 2 (a) and 2 (b) show a plan view and a front view of the sample recovery apparatus 30 in a recovery chamber 31 disposed on the decomposition chamber 21 and a solution on the substrate 1 on the surface of which the object to be measured exists. 4 is dropped and moved on the surface of the substrate 1 while being held by the holder 32a, and the object to be measured is recovered and dried and held on the surface of the substrate 1. More specifically, the recovery chamber 31 of the sample recovery device 30 is a box made of, for example, PVC (polyvinyl chloride) provided with the fan 11 and the filter 12 at the top, and is disposed on the decomposition chamber 21. A shutter 31a that can be freely opened and closed is provided on the side of the transport device that faces the hand portion 50a. In the vicinity of the shutter 31a (the range surrounded by the one-dot chain line in FIG. 2A), a large number of punching holes 31b are formed in the bottom plate of the recovery chamber 31 and flow into the recovery chamber 31 via the fan 11 and the filter 12. The clean air thus made flows down to the outside of the inner shutter 21 a of the decomposition chamber 21. The sample collection device 30 includes the following collection liquid moving means 32, collection liquid drying means 33, holder cleaning means 34, and turntable 35.

  The recovery liquid moving means 32 is an arm that moves the holder 32a below the tip of the holder in a circular arc between the outside and the center of the substrate 1 above the substrate 1 placed on the turntable 35. 32a can also be moved in the vertical direction. The holder 32a is, for example, a PTFE nozzle, and a solution (hydrofluoric acid) 4 is supplied from a container described later below the decomposition chamber 21 via a PTFE tube 84 and the like. The turntable 35 rotates the placed substrate 1 within a horizontal plane. That is, the sample recovery device 30 holds a predetermined amount, for example, 100 μL of the solution 4 dropped from the holder 32a to the vicinity of the outer periphery of the substrate 1 while holding the substrate 1 so as to be sandwiched between the holder 32a and the substrate 1 while rotating the substrate 1. The object to be measured existing on the surface of the substrate 1 is recovered by moving the substrate 1 to the center.

  The recovery liquid drying means 33 is an arm that moves a lamp 33 a provided downward at the tip of the recovery liquid drying means 33 in an arc shape between the outside and the center of the substrate 1 above the substrate 1. That is, the sample recovery device 30 moves the lamp 33a above the center of the substrate 1 to heat the solution 4 from which the object to be measured is recovered and dry the object to be measured. Also during the drying, the substrate 1 is rotated in the horizontal plane by the turntable 35.

  As shown in FIG. 3 (a), the holder cleaning means 34 is a container having a bottomed cylindrical inner tank 34a and an outer ring-shaped outer tank 34b. Ultrapure water is used as a cleaning liquid above the inner tank 34a. Is provided with a pipe 34c for overflowing, and a pipe 34d for discharging the overflowed cleaning liquid is provided below the outer tank 34b. In FIG. 2, the sample recovery apparatus 30 moves the holder 32a from the outer periphery of the substrate 1 to the upper side of the inner tank 34a of the holder cleaning means 34 on the outer side by the recovery liquid moving means 32, and FIG. Move up and down. That is, at least the lower end portion of the holder 32a is immersed in the cleaning liquid for cleaning. The supply-side piping 34c is preferably not in contact with the cleaning liquid in the inner tank 34a as shown in order to prevent the contaminants contained in the cleaning liquid in the inner tank 34a after cleaning from flowing. The cleaning may be performed by spraying a cleaning liquid onto the holder 32a. In this case, as shown in FIG. 3B, the supply-side piping 34c is provided with the opening facing upward, and the cleaning liquid is sprayed onto the holder 32a from below.

  Now, a configuration for dropping the solution (hydrofluoric acid) 4 from the holder 32a will be described in detail. As shown in FIG. 1, the sample collection device 30 further includes the following remaining amount detection means 81A, a valve 82, a control device 60, and the like. A nitrogen gas or air line in a semiconductor manufacturing line in which the X-ray fluorescence analysis system is placed passes a tube 84 to the solution 4 stored in the container 83 at a predetermined pressure (for example, a gauge pressure of 0.025). The tube 84 which is a flow path of the pressurized solution 4 is connected to the holder 32a (FIG. 2) which is a nozzle via the valve 82. Yes. The remaining amount detecting means 81A detects the remaining amount of the solution 4 in the container 83. The valve 82 is an electromagnetic valve that opens and closes the flow path of the solution 4 pressurized at a predetermined pressure in the container 83. The control device 60 also serves as the control device 60 (FIG. 5) of the entire fluorescent X-ray analysis system, and stores in advance the correlation between the remaining amount of the solution 4, the opening time of the valve 82, and the amount of dripping of the solution 4. Based on the stored correlation and the remaining amount of the solution detected by the remaining amount detecting means 81A, the opening time of the valve 82 for dropping the solution 4 is determined.

The correlation between the remaining amount detecting means 81A and the remaining amount of the solution 4, the opening time of the valve 82, and the dripping amount of the solution 4 will be described more specifically. For example, when the container 83 is full, that is, the remaining amount of the solution 4 is 500 cc, the correlation between the opening time y ₁ (unit: millisecond) of the valve 82 and the dripping amount x ₁ (unit: cc) of the solution 4 Can be approximated by the following equation (1) as shown in FIG.

y ₁ = 1025x ₁ −1.4 (1)

  On the other hand, when the opening time of the valve 82 is 100 milliseconds, when the correlation between the dripping amount of the solution 4 (unit: cc) and the remaining amount of the solution 4 (unit: cc) is obtained from an experiment, the graph shown in FIG. can get.

  Now, the appropriate drop amount of the solution 4 at one time is 100 μL, that is, 0.1 cc, but as is apparent from FIGS. 6 and 7, when the container 83 is full, that is, the remaining amount of the solution 4 is 500 cc. An appropriate drop amount of 0.1 cc of the solution 4 is obtained with an opening time of the valve 82 of 100 milliseconds, which is set as a reference opening time. Assuming that an appropriate drop amount of 0.1 cc of the solution 4 is maintained, the remaining amount of the solution 4 is 500-0 based on the cumulative number of drops x of the solution 4 from the full state (hereinafter referred to as shot cumulative number x). .1x, in other words, the remaining amount of the solution 4 can be detected as the cumulative number of shots x. The remaining amount detecting means 81A detects the remaining amount of the solution 4 in the container 83 by counting the cumulative number of shots x in this way. In order to maintain an appropriate drop amount of 0.1 cc of the solution 4, it is necessary to increase the opening time of the valve 82 from the reference opening time 100 milliseconds according to the cumulative number of shots x. The constant relationship to be multiplied by the reference opening time in order to lengthen the opening time of is obtained based on the correlation of FIG. 6, that is, the correlation of the expression (1) and FIG. 7, and as shown in FIG. It can be approximated by equation (2).

y = 2.5 × 10 ⁻⁵ × x + 1 (2)

  That is, the opening time t of the valve 82 for maintaining an appropriate dropping amount of the solution 4 of 0.1 cc is expressed by the following equation (3).

t = 100 × (2.5 × 10 ⁻⁵ × x + 1) (3)

  Specifically, the control device 60 stores the equation (3) in advance as a correlation. Based on the stored equation (3) and the remaining amount of the solution detected by the remaining amount detecting means 81A, specifically, the shot cumulative number x counted by the remaining amount detecting means 81A, an appropriate solution The opening time t of the valve 82 for maintaining the dripping amount 0.1 cc of 4 is determined.

  By such control, the amount of one drop is not affected by the remaining amount of the solution 4, and a very small amount of −10 to + 0% (−10 to +0 μl) with respect to an appropriate drop amount of 100 μl. Can be within the error. In this embodiment, the opening time of the valve 82 for obtaining an appropriate dropping amount of 100 μL of the solution 4 when the container 83 is full is set as the reference opening time, but is not limited to this. For example, the remaining amount is full. The opening time of the valve 82 for obtaining an appropriate dropping amount of 100 μL of the solution 4 when the amount becomes half of the reference is set as the reference opening time, and when the remaining amount is more than half full, the opening time of the valve 82 is shortened appropriately. When the remaining amount is less than half of the full, the opening time of the valve 82 may be appropriately lengthened. Also in this case, an extremely small amount of error of −5 to + 5% (−5 to +5 μl) per one dripping amount with respect to an appropriate dripping amount of 100 μl without being affected by the remaining amount of the solution 4 Can fit inside. In addition, the appropriate drop amount of the solution 4 is 100 μl in this embodiment, but may be changed in a range of about 50 to 200 μl depending on the type of the substrate 1 and the solution 4.

  Further, in the above description, the remaining amount detecting means 81A for detecting the remaining amount of the solution 4 in the container 83 by counting the shot cumulative number x is used. Instead, the remaining amount of the solution 4 is used. A level meter that directly detects the remaining amount may be used as the remaining amount detecting means 81B.

  Next, the operation of this fluorescent X-ray analysis system will be described. In this system, there are a plurality of modes as preprocessing and analysis conditions. Here, the operation in the VPD (Vapor Phase Decomposition) mode will be described. The following operations are controlled by the control device 60 of FIG. First, in FIG. 4, the transfer device 50 transfers the substrate 1 from the predetermined loading position to the decomposition chamber 21 and places it on the substrate table 25. When carrying in, the shutters 21a and 27 of the vapor phase decomposition apparatus 20 are automatically opened. Since the substrate base 25 has a narrow taper 25a that is narrowed downward on the inner periphery, even if the substrate 1 is slightly deviated from a predetermined position on the hand portion 50a, the substrate 1 is simply placed on the substrate base 25. Since it is properly positioned so as to slip and fit under its own weight, subsequent collection and analysis are performed accurately.

  Next, hydrogen fluoride is introduced from the pipe 22a into the decomposition chamber 21 that is closed and sealed with the shutters 21a and 27 being dissolved, and the oxide film formed on the surface of the substrate 1 is dissolved and is present on the surface of the film or in the film. The object to be measured such as pollutants is dissolved and discharged from the pipe 22b. When no film is formed on the surface of the substrate 1, the object to be measured existing on the surface of the substrate 1 is dissolved. When introducing hydrogen fluoride, it is preferable that the valve of the discharge-side pipe 22b is opened before the valve of the introduction-side pipe 22a. The vapor phase decomposition with hydrogen fluoride is performed for 10 minutes, for example, depending on the setting.

  When the vapor phase decomposition for a predetermined time is completed, nitrogen is flowed while the inside of the decomposition chamber 21 is exhausted by the droplet drying means 24, hydrogen fluoride is expelled, and droplets generated on the substrate 1 are dried. Thereby, in the subsequent transport, the hand unit 50a of the transport device does not come into contact with the droplets and is not corroded, and the substrate 1 does not slide on the hand unit 50a and the transport is not inaccurate. Further, hydrogen fluoride does not flow into the transfer device 50 side or the fluorescent X-ray analysis device side and cause corrosion or the like. In addition, the decomposing chamber cleaning means 23 periodically cleans the decomposing chamber 21 with ultrapure water. As described above, since the cleaning of the decomposition chamber 21 is also automated, the operation of the system becomes easier.

  Next, the transport device 50 transports the substrate 1 to the collection chamber 31 of FIG. 2 and places it so that the center of the substrate 1 matches the rotation center of the turntable 35. During transport, the shutters 21a, 27, 31a of the vapor phase decomposition apparatus 20 and the sample recovery apparatus 30 are automatically opened and closed. Thus, since the substrate 1 is transported from the decomposition chamber 21 to the recovery chamber 31 by the transport device 50, contamination by humans is avoided and correct analysis can be performed. Subsequently, the sample collection device 30 moves the solution 4 dropped from the holder 32a to the vicinity of the outer periphery of the substrate 1 while moving the substrate 1 to the center while holding the holder 1 with the holder 32a. The object to be measured existing on one surface (the object to be measured held on the surface of the substrate 1 by the vapor phase decomposition apparatus 20) is recovered. Here, the dropping amount of the solution 4 is controlled as described above by the control device 60 of FIG.

  As described above, according to the X-ray fluorescence analysis system of the present embodiment, the correlation between the remaining amount of the solution 4, the opening time of the valve 82, and the dripping amount of the solution 4 is stored in advance and the remaining amount of the solution 4 is detected. Then, since the opening time of the valve 82 for dropping the solution 4 is determined based on the detected remaining amount of the solution 4 and the correlation, a desired value can be obtained without being affected by the remaining amount of the solution 4. A constant drop volume is obtained, for example, within a very small error of −10 to + 0% (−10 to +0 μl) for a suitable drop volume of 100 μl. Therefore, the dropped solution 4 can be held and moved by the holder 32a so that the dropped solution 4 slightly protrudes from the outer periphery of the surface of the substrate 1 and is not spilled from the side surface of the substrate 1. The object to be measured is correctly collected including the object to be measured present on the side surface.

  In addition, the dropping position of the solution 4 and the movement path of the holder 32a in the recovery process are not limited to those described above, and can be variously considered. After the collection, the holder 32a of FIG. 2 is raised and moved up to the upper part of the inner tub 34a of the holder cleaning means 34, and is cleaned by being immersed in a cleaning liquid. As described above, since the cleaning of the holder 32a is also automated, the operation of the system becomes easier.

  Next, the sample recovery device 30 moves the lamp 33a above the center of the substrate 1 and heats the solution 4 from which the object to be measured is recovered to dry the object to be measured. Also during the drying, the substrate 1 is rotated in the horizontal plane by the turntable 35. As a result, the object to be measured does not dry too much on the substrate 1 and does not spread too much, so that more accurate analysis can be performed. In addition, the recovery chamber 31 is disposed on the decomposition chamber 21, and clean air that has flowed into the recovery chamber 31 through the fan 11 and the filter 12 passes through the punching hole 31b to the outside of the inner shutter 21a of the decomposition chamber 21. Since it flows down, the installation area of the entire system becomes sufficiently small, and the collection chamber 31 is kept clean. In addition, as long as the holder 32a is after retreating from above the solution 4 from which the object to be measured is collected, either the cleaning of the holder 32a or the drying of the object to be measured may be performed first or in parallel. May be.

  Next, the transport device 50 transports the substrate 1 from which the object to be measured is collected to the cassette in the introduction chamber of the fluorescent X-ray analyzer. During transport, the shutter 31a of the sample recovery device 30 is automatically opened and closed. Subsequently, the fluorescent X-ray analyzer performs total internal reflection X-ray fluorescence analysis. After the analysis, the substrate 1 is transported to the original predetermined input position by the transport device 50. If the next substrate is collected and the next substrate is simultaneously decomposed during the analysis of the first substrate 1, the entire pretreatment and analysis work can be performed more quickly.

  As described in detail above, according to the sample pretreatment apparatus for fluorescent X-ray analysis of the present invention or the fluorescent X-ray analysis system equipped with the same, a desired constant drop can be obtained without being affected by the remaining amount of the solution. The quantity is obtained and the object to be measured is collected correctly.

1 Substrate 2 Measured Object 4 Solution 10 Sample Pretreatment Device (Gas Phase Decomposition Device and Sample Recovery Device)
20 Gas-phase decomposition apparatus 21 Decomposition chamber 30 Sample collection apparatus 32a Holder 40 Fluorescence X-ray analysis apparatus 43 Primary X-ray 44 Fluorescence X-ray 60 Control devices 81A, 81B Remaining amount detection means 82 Valve 83 Container

Claims (2)

A vapor phase decomposition apparatus for holding a measurement object existing on the substrate surface or a surface of a film formed on the substrate surface or a measurement object existing in the film with a reactive gas in the decomposition chamber and then drying and holding on the substrate surface ,
Fluorescent X equipped with a sample recovery device that drops a solution onto a substrate on which the object to be measured is present and moves it on the surface of the substrate while holding it with a holder, collects the object to be measured, dries it, and holds it on the substrate surface A sample pretreatment device for line analysis,
A remaining amount detecting means for detecting the remaining amount of the solution in the container containing the solution;
A valve for opening and closing the flow path of the solution pressurized at a predetermined pressure in the container;
The correlation between the remaining amount of the solution, the opening time of the valve, and the dropping amount of the solution is stored in advance, and the solution is determined based on the stored correlation and the remaining amount of the solution detected by the remaining amount detecting means. A sample pretreatment device for fluorescent X-ray analysis, comprising: a control device that determines an opening time of the valve for dripping. A sample pretreatment apparatus for fluorescent X-ray analysis according to claim 1;
Fluorescent X-ray provided with an X-ray fluorescence analyzer for measuring the intensity of fluorescent X-rays generated by irradiating the object to be measured held on the substrate surface by the vapor phase decomposition apparatus or the sample recovery apparatus with primary X-rays Analysis system.

Images