JP2011094111A - Aromatic polysulfone resin and membrane thereof - Google Patents

Aromatic polysulfone resin and membrane thereof Download PDF

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JP2011094111A
JP2011094111A JP2010204071A JP2010204071A JP2011094111A JP 2011094111 A JP2011094111 A JP 2011094111A JP 2010204071 A JP2010204071 A JP 2010204071A JP 2010204071 A JP2010204071 A JP 2010204071A JP 2011094111 A JP2011094111 A JP 2011094111A
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polysulfone resin
aromatic polysulfone
aromatic
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membrane
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JP5703645B2 (en
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Yusaku Obinata
雄作 小日向
Hiroshi Harada
博史 原田
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Sumitomo Chemical Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L81/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen or carbon only; Compositions of polysulfones; Compositions of derivatives of such polymers
    • C08L81/06Polysulfones; Polyethersulfones
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D67/00Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0002Organic membrane manufacture
    • B01D67/0009Organic membrane manufacture by phase separation, sol-gel transition, evaporation or solvent quenching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D67/00Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0081After-treatment of organic or inorganic membranes
    • B01D67/0095Drying
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D69/00Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
    • B01D69/02Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor characterised by their properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D71/00Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/06Organic material
    • B01D71/66Polymers having sulfur in the main chain, with or without nitrogen, oxygen or carbon only
    • B01D71/68Polysulfones; Polyethersulfones
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2323/00Details relating to membrane preparation
    • B01D2323/34Use of radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2325/00Details relating to properties of membranes
    • B01D2325/20Specific permeability or cut-off range
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2381/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen, or carbon only; Polysulfones; Derivatives of such polymers
    • C08J2381/06Polysulfones; Polyethersulfones

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Polyethers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide an aromatic polysulfone resin excellent in toughness and suitable as a raw material of membranes including a porous membrane. <P>SOLUTION: The aromatic polysulfone resin has reduced viscosity of 0.55-0.65 dL/g, preferably 0.58-0.62 dL/g, a number-average molecular weight (Mn) of 22,000 or higher, preferably 23,500 or higher, and a ratio of weight-average molecular weight (Mw) to number-average molecular weight (Mn) of 2.54 or less, preferably 2.50 or less. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は、膜の材料として好適な芳香族ポリスルホン樹脂、及びこれを用いてなる膜に関する。   The present invention relates to an aromatic polysulfone resin suitable as a membrane material and a membrane using the same.

芳香族ポリスルホン樹脂は、耐熱性や耐薬品性に優れることから、各種用途に用いられている。その用途の1つとして、限外濾過や精密濾過等の濾過に用いられる多孔質膜の材料が挙げられ、例えば、特開2006−230459号公報(特許文献1)には、多孔質中空糸膜の材料として、芳香族ポリスルホン樹脂を用いることが記載されており、具体的には、還元粘度が0.36、0.48又は0.52である芳香族ポリスルホン樹脂を用いた例が示されている。   Aromatic polysulfone resins are used in various applications because of their excellent heat resistance and chemical resistance. One of the applications is a porous membrane material used for filtration such as ultrafiltration and microfiltration. For example, JP 2006-230459 A (Patent Document 1) discloses a porous hollow fiber membrane. As the material, it is described that an aromatic polysulfone resin is used, and specifically, an example using an aromatic polysulfone resin having a reduced viscosity of 0.36, 0.48, or 0.52 is shown. Yes.

特開2006−230459号公報JP 2006-230459 A

濾過に長時間使用することにより目詰まりが生じ、濾過効率が低下した多孔質膜は、通常、その目詰まりを解消すべく、空気や水を逆流させることにより洗浄されるが、従来の芳香族ポリスルホン樹脂を材料とする多孔質膜は、芳香族ポリスルホン樹脂の靭性が必ずしも十分でないため、洗浄の際に過大な圧力がかかると、切れや裂け等の破損が生じることがある。そこで、本発明の目的は、靭性が高く、多孔質膜をはじめとする膜の材料として好適な芳香族ポリスルホン樹脂を提供することにある。   Porous membranes that have been clogged by prolonged use for filtration and have reduced filtration efficiency are usually washed by backflowing air or water to eliminate the clogging. A porous membrane made of a polysulfone resin does not necessarily have sufficient toughness of an aromatic polysulfone resin. Therefore, if excessive pressure is applied during cleaning, breakage such as cutting or tearing may occur. Accordingly, an object of the present invention is to provide an aromatic polysulfone resin having high toughness and suitable as a material for a membrane including a porous membrane.

前記目的を達成するため、本発明は、還元粘度が0.55〜0.65dL/gであり、数平均分子量(Mn)が22000以上であり、数平均分子量(Mn)に対する重量平均分子量(Mw)の比の値が2.54以下であることを特徴とする芳香族ポリスルホン樹脂を提供する。また、本発明によれば、前記芳香族ポリスルホン樹脂を含む膜も提供される。   In order to achieve the above object, the present invention has a reduced viscosity of 0.55 to 0.65 dL / g, a number average molecular weight (Mn) of 22,000 or more, and a weight average molecular weight (Mw) relative to the number average molecular weight (Mn). ) Ratio value is 2.54 or less, an aromatic polysulfone resin is provided. Moreover, according to this invention, the film | membrane containing the said aromatic polysulfone resin is also provided.

本発明の芳香族ポリスルホン樹脂は、靭性が高いので、多孔質膜をはじめとする膜の材料として好適に用いられる。   Since the aromatic polysulfone resin of the present invention has high toughness, it is suitably used as a material for membranes including porous membranes.

芳香族ポリスルホン樹脂は、2価の芳香族基(芳香族化合物から、その芳香環に結合した水素原子を2個除いてなる残基)及びスルホニル基(−SO2−)を含む繰返し単位を有する樹脂である。本発明の芳香族ポリスルホン樹脂は、耐熱性や耐薬品性の点から、繰返し単位が、下記式(1)で表される繰返し単位(以下、「繰返し単位(1)」ということがある)を有することが好ましく、さらに、下記式(2)で表される繰返し単位(以下、「繰返し単位(2)」ということがある)や、下記式(3)で表される繰返し単位(以下、「繰返し単位(3)」ということがある)等の他の繰返し単位を有していてもよい。本発明の芳香族ポリスルホン樹脂は、繰返し単位(1)を、全繰返し単位の合計に対して、50〜100モル%有することが好ましく、80〜100モル%有することがより好ましい。 The aromatic polysulfone resin has a repeating unit containing a divalent aromatic group (residue obtained by removing two hydrogen atoms bonded to the aromatic ring from an aromatic compound) and a sulfonyl group (—SO 2 —). Resin. In the aromatic polysulfone resin of the present invention, from the viewpoint of heat resistance and chemical resistance, the repeating unit is a repeating unit represented by the following formula (1) (hereinafter sometimes referred to as “repeating unit (1)”). The repeating unit represented by the following formula (2) (hereinafter sometimes referred to as “repeating unit (2)”) or the repeating unit represented by the following formula (3) (hereinafter referred to as “ Other repeating units such as “repeating unit (3)” may be included. The aromatic polysulfone resin of the present invention preferably has 50 to 100 mol%, more preferably 80 to 100 mol% of the repeating unit (1) with respect to the total of all repeating units.

−Ph1−SO2−Ph2−O− (1) -Ph 1 -SO 2 -Ph 2 -O- ( 1)

(Ph1及びPh2は、それぞれ独立に、フェニレン基を表す。前記フェニレン基にある水素原子は、それぞれ独立に、アルキル基、アリール基又はハロゲン原子で置換されていてもよい。) (Ph 1 and Ph 2 each independently represent a phenylene group. The hydrogen atoms in the phenylene group may each independently be substituted with an alkyl group, an aryl group, or a halogen atom.)

−Ph3−R−Ph4−O− (2) -Ph 3 -R-Ph 4 -O- (2)

(Ph3及びPh4は、それぞれ独立に、フェニレン基を表す。前記フェニレン基にある水素原子は、それぞれ独立に、アルキル基、アリール基又はハロゲン原子で置換されていてもよい。Rは、アルキリデン基、酸素原子又は硫黄原子を表す。) (Ph 3 and Ph 4 each independently represent a phenylene group. The hydrogen atoms in the phenylene group may each independently be substituted with an alkyl group, an aryl group or a halogen atom. R represents an alkylidene. Represents a group, oxygen atom or sulfur atom.)

−(Ph5)n−O− (3) -(Ph 5 ) n -O- (3)

(Ph5は、フェニレン基を表す。前記フェニレン基にある水素原子は、それぞれ独立に、アルキル基、アリール基又はハロゲン原子で置換されていてもよい。nは、1〜3の整数を表す。nが2以上である場合、複数存在するPh5は、互いに同一であっても異なっていてもよい。) (Ph 5 represents a phenylene group. Each hydrogen atom in the phenylene group may be independently substituted with an alkyl group, an aryl group or a halogen atom. N represents an integer of 1 to 3. When n is 2 or more, a plurality of Ph 5 may be the same or different from each other.)

Ph1〜Ph5のいずれかで表されるフェニレン基は、p−フェニレン基であってもよいし、m−フェニレン基であってもよいし、o−フェニレン基であってもよいが、p−フェニレン基であることが好ましい。前記フェニレン基にある水素原子を置換していてもよいアルキル基の例としては、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、イソブチル基、s−ブチル基及びt−ブチル基が挙げられ、その炭素数は、通常1〜5である。前記フェニレン基にある水素原子を置換してもよいアリール基の例としては、フェニル基、1−ナフチル基、2−ナフチル基及びp−トルイル基が挙げられ、その炭素数は、通常6〜15である。Rで表されるアルキリデン基の例としては、メチレン基、エチリデン基、イソプロピリデン基及び1−ブチリデン基が挙げられ、その炭素数は、通常1〜5である。 The phenylene group represented by any of Ph 1 to Ph 5 may be a p-phenylene group, an m-phenylene group, or an o-phenylene group. -A phenylene group is preferred. Examples of the alkyl group which may substitute a hydrogen atom in the phenylene group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, an s-butyl group, and a t-butyl group. A butyl group is mentioned, The carbon number is 1-5 normally. Examples of the aryl group that may substitute a hydrogen atom in the phenylene group include a phenyl group, a 1-naphthyl group, a 2-naphthyl group, and a p-toluyl group, and the number of carbon atoms is usually 6-15. It is. Examples of the alkylidene group represented by R include a methylene group, an ethylidene group, an isopropylidene group, and a 1-butylidene group, and the number of carbon atoms is usually 1-5.

本発明の芳香族ポリスルホン樹脂は、還元粘度が0.55〜0.65dL/gであり、好ましくは0.58〜0.62dL/gである。還元粘度が前記範囲外であると、芳香族ポリスルホン樹脂の靭性が不十分となる。また、還元粘度が前記上限を超えると、芳香族ポリスルホン樹脂の加工性が不十分となる。   The aromatic polysulfone resin of the present invention has a reduced viscosity of 0.55 to 0.65 dL / g, preferably 0.58 to 0.62 dL / g. When the reduced viscosity is outside the above range, the toughness of the aromatic polysulfone resin becomes insufficient. On the other hand, when the reduced viscosity exceeds the upper limit, the processability of the aromatic polysulfone resin becomes insufficient.

また、本発明の芳香族ポリスルホン樹脂は、数平均分子量(Mn)が22000以上であり、好ましくは23500以上である。Mnが前記下限に満たないと、芳香族ポリスルホン樹脂の靭性が不十分となる。なお、Mnの上限は、適宜調整されるが、芳香族ポリスルホン樹脂の加工性の点から、通常30000であり、好ましくは27000である。   The aromatic polysulfone resin of the present invention has a number average molecular weight (Mn) of 22000 or more, preferably 23500 or more. If Mn is less than the lower limit, the toughness of the aromatic polysulfone resin becomes insufficient. In addition, although the upper limit of Mn is adjusted suitably, from the point of the workability of aromatic polysulfone resin, it is 30000 normally, Preferably it is 27000.

さらに、本発明の芳香族ポリスルホン樹脂は、数平均分子量(Mn)に対する重量平均分子量(Mw)の比の値(Mw/Mn)が2.54以下であり、好ましくは2.50以下である。Mw/Mnが前記上限を超えると、芳香族ポリスルホン樹脂の靭性が不十分となる。なお、Mw/Mnの下限は、理論上1であり、1に近いほど、好ましい。   Furthermore, the value (Mw / Mn) of the ratio of the weight average molecular weight (Mw) to the number average molecular weight (Mn) of the aromatic polysulfone resin of the present invention is 2.54 or less, preferably 2.50 or less. When Mw / Mn exceeds the upper limit, the toughness of the aromatic polysulfone resin becomes insufficient. In addition, the minimum of Mw / Mn is 1 theoretically, and it is so preferable that it is close to 1.

芳香族ポリスルホン樹脂は、対応する芳香族ジハロゲノスルホン化合物と芳香族ジヒドロキシ化合物とを、塩基として炭酸のアルカリ金属塩を用いて、有機極性溶媒中で重縮合させることにより、好適に製造することができる。例えば、繰返し単位(1)を有する樹脂は、芳香族ジハロゲノスルホン化合物として下記式(4)で表される化合物(以下、「化合物(4)」ということがある)を用い、芳香族ジヒドロキシ化合物として下記式(5)で表される化合物(以下、「化合物(5)」ということがある)を用いることにより、好適に製造することができる。また、繰返し単位(1)と繰返し単位(2)とを有する樹脂は、芳香族ジハロゲノスルホン化合物として化合物(4)を用い、芳香族ジヒドロキシ化合物として下記式(6)で表される化合物(以下、「化合物(6)」ということがある)を用いることにより、好適に製造することができる。また、繰返し単位(1)と繰返し単位(3)とを有する樹脂は、芳香族ジハロゲノスルホン化合物として化合物(4)を用い、芳香族ジヒドロキシ化合物として下記式(7)で表される化合物(以下、「化合物(7)」ということがある)を用いることにより、好適に製造することができる。   The aromatic polysulfone resin can be suitably produced by polycondensing a corresponding aromatic dihalogenosulfone compound and an aromatic dihydroxy compound in an organic polar solvent using an alkali metal carbonate as a base. it can. For example, a resin having a repeating unit (1) uses a compound represented by the following formula (4) as an aromatic dihalogenosulfone compound (hereinafter sometimes referred to as “compound (4)”), and an aromatic dihydroxy compound. Can be preferably produced by using a compound represented by the following formula (5) (hereinafter sometimes referred to as “compound (5)”). The resin having the repeating unit (1) and the repeating unit (2) uses the compound (4) as the aromatic dihalogenosulfone compound, and the compound represented by the following formula (6) as the aromatic dihydroxy compound (hereinafter referred to as the aromatic dihydroxy compound). , Sometimes referred to as “compound (6)”. In addition, the resin having the repeating unit (1) and the repeating unit (3) uses the compound (4) as the aromatic dihalogenosulfone compound and the compound represented by the following formula (7) as the aromatic dihydroxy compound (hereinafter referred to as the aromatic dihydroxy compound). , Sometimes referred to as “compound (7)”).

1−Ph1−SO2−Ph2−X2 (4) X 1 -Ph 1 -SO 2 -Ph 2 -X 2 (4)

(X1及びX2は、それぞれ独立に、ハロゲン原子を表す。Ph1及びPh2は、前記と同義である。) (X 1 and X 2 each independently represent a halogen atom. Ph 1 and Ph 2 are as defined above.)

HO−Ph1−SO2−Ph2−OH (5) HO—Ph 1 —SO 2 —Ph 2 —OH (5)

(Ph1及びPh2は、前記と同義である。) (Ph 1 and Ph 2 are as defined above.)

HO−Ph3−R−Ph4−OH (6) HO-Ph 3 -R-Ph 4 -OH (6)

(Ph3、Ph4及びRは、前記と同義である。) (Ph 3 , Ph 4 and R are as defined above.)

HO−(Ph5)n−OH (7) HO— (Ph 5 ) n —OH (7)

(Ph5及びnは、前記と同義である。) (Ph 5 and n are as defined above.)

化合物(4)の例としては、ビス(4−クロロフェニル)スルホン及び4−クロロフェニル−3’,4’−ジクロロフェニルスルホンが挙げられる。化合物(5)の例としては、ビス(4−ヒドロキシフェニル)スルホン、ビス(4−ヒドロキシ−3,5−ジメチルフェニル)スルホン及びビス(4−ヒドロキシ−3−フェニルフェニル)スルホンが挙げられる。化合物(6)の例としては、2,2−ビス(4−ヒドロキシフェニル)プロパン、2,2−ビス(4−ヒドロキシフェニル)ヘキサフルオロプロパン、ビス(4−ヒドロキシフェニル)スルフィド、ビス(4−ヒドロキシ−3−メチルフェニル)スルフィド及びビス(4−ヒドロキシフェニル)エーテルが挙げられる。化合物(7)の例としては、ヒドロキノン、レゾルシン、カテコール、フェニルヒドロキノン、4,4’−ジヒドロキシビフェニル、2,2’−ジヒドロキシビフェニル、3,5,3’,5’−テトラメチル−4,4’−ジヒドロキシビフェニル、2,2’−ジフェニル−4,4’−ジヒドロキシビフェニル及び4,4’’’−ジヒドロキシ−p−クオターフェニルが挙げられる。   Examples of compound (4) include bis (4-chlorophenyl) sulfone and 4-chlorophenyl-3 ', 4'-dichlorophenylsulfone. Examples of the compound (5) include bis (4-hydroxyphenyl) sulfone, bis (4-hydroxy-3,5-dimethylphenyl) sulfone, and bis (4-hydroxy-3-phenylphenyl) sulfone. Examples of the compound (6) include 2,2-bis (4-hydroxyphenyl) propane, 2,2-bis (4-hydroxyphenyl) hexafluoropropane, bis (4-hydroxyphenyl) sulfide, bis (4- Hydroxy-3-methylphenyl) sulfide and bis (4-hydroxyphenyl) ether. Examples of the compound (7) include hydroquinone, resorcin, catechol, phenylhydroquinone, 4,4′-dihydroxybiphenyl, 2,2′-dihydroxybiphenyl, 3,5,3 ′, 5′-tetramethyl-4,4. Examples include '-dihydroxybiphenyl, 2,2'-diphenyl-4,4'-dihydroxybiphenyl, and 4,4' ''-dihydroxy-p-quarterphenyl.

なお、化合物(4)以外の芳香族ジハロゲノスルホン化合物の例としては、4,4’−ビス(4−クロロフェニルスルホニル)ビフェニルが挙げられる。また、芳香族ジハロゲノスルホン化合物及び/又は芳香族ジヒドロキシ化合物の全部又は一部に代えて、4−ヒドロキシ−4’−(4−クロロフェニルスルホニル)ビフェニル等の分子中にハロゲノ基及びヒドロキシル基を有する化合物を用いることもできる。   Examples of aromatic dihalogenosulfone compounds other than compound (4) include 4,4'-bis (4-chlorophenylsulfonyl) biphenyl. Moreover, it replaces with all or one part of an aromatic dihalogeno sulfone compound and / or an aromatic dihydroxy compound, and has halogeno groups and hydroxyl groups in molecules, such as 4-hydroxy-4 '-(4-chlorophenylsulfonyl) biphenyl. Compounds can also be used.

炭酸のアルカリ金属塩は、正塩である炭酸アルカリであってもよいし、酸性塩である重炭酸アルカリ(炭酸水素アルカリ)であってもよいし、両者の混合物であってもよい。炭酸アルカリとしては、炭酸ナトリウムや炭酸カリウムが好ましく用いられ、重炭酸アルカリとしては、重炭酸ナトリウムや重炭酸カリウムが好ましく用いられる。   The alkali metal carbonate may be an alkali carbonate that is a normal salt, an alkali bicarbonate (an alkali hydrogen carbonate) that is an acidic salt, or a mixture of both. As the alkali carbonate, sodium carbonate or potassium carbonate is preferably used, and as the alkali bicarbonate, sodium bicarbonate or potassium bicarbonate is preferably used.

有機極性溶媒としては、例えば、ジメチルスルホキシド、1−メチル−2−ピロリドン、スルホラン(1,1−ジオキソチラン)、1,3-ジメチル−2−イミダゾリジノン、1,3−ジエチル−2−イミダゾリジノン、ジメチルスルホン、ジエチルスルホン、ジイソプロピルスルホン及びジフェニルスルホンが挙げられる。   Examples of the organic polar solvent include dimethyl sulfoxide, 1-methyl-2-pyrrolidone, sulfolane (1,1-dioxothyrane), 1,3-dimethyl-2-imidazolidinone, 1,3-diethyl-2-imidazolidi. Non, dimethyl sulfone, diethyl sulfone, diisopropyl sulfone and diphenyl sulfone can be mentioned.

芳香族ジハロゲノスルホン化合物の使用量は、芳香族ジヒドロキシ化合物に対して、通常95〜110モル%であり、好ましくは100〜105モル%である。目的とする反応は、芳香族ジハロゲノスルホン化合物と芳香族ジヒドロキシ化合物との脱ハロゲン化水素重縮合であり、仮に副反応が生じなければ、両者のモル比が1:1に近いほど、すなわち芳香族ジハロゲノスルホン化合物の使用量が芳香族ジヒドロキシ化合物に対して100モル%に近いほど、得られる芳香族ポリスルホン樹脂は、重合度が高くなり、その結果、還元粘度が高くなり、Mnが大きくなり、Mw/Mnが小さくなる傾向にあるが、実際は、副生する水酸化アルカリ等により、ハロゲノ基のヒドロキシル基への置換反応や解重合等の副反応が生じ、この副反応により、得られる芳香族ポリスルホン樹脂の重合度が低下するので、この副反応の度合いも考慮して、前記所定の還元粘度、Mn及びMw/Mnを有する芳香族ポリスルホン樹脂が得られるように、芳香族ジハロゲノスルホン化合物の使用量を調整する必要がある。   The usage-amount of an aromatic dihalogeno sulfone compound is 95-110 mol% normally with respect to an aromatic dihydroxy compound, Preferably it is 100-105 mol%. The target reaction is dehydrohalogenated polycondensation of an aromatic dihalogenosulfone compound and an aromatic dihydroxy compound. If no side reaction occurs, the closer the molar ratio of the two is to 1: 1, that is, the aromatic As the amount of the aromatic dihalogenosulfone compound used is closer to 100 mol% with respect to the aromatic dihydroxy compound, the resulting aromatic polysulfone resin has a higher degree of polymerization, resulting in higher reduced viscosity and higher Mn. Mw / Mn tends to be small, but in fact, side reaction such as substitution reaction of halogeno group to hydroxyl group or depolymerization occurs due to by-produced alkali hydroxide or the like. Since the degree of polymerization of the aromatic polysulfone resin is reduced, the degree of this side reaction is also taken into consideration and the aromatic polymer having the predetermined reduced viscosity, Mn, and Mw / Mn. As sulfone resin can be obtained, it is necessary to adjust the amount of the aromatic dihalogenosulfone compound.

炭酸のアルカリ金属塩の使用量は、芳香族ジヒドロキシ化合物のヒドロキシル基に対して、アルカリ金属として、通常95〜115モル%であり、好ましくは100〜110モル%である。仮に副反応が生じなければ、炭酸のアルカリ金属塩の使用量が多いほど、目的とする重縮合が速やかに進行するので、得られる芳香族ポリスルホン樹脂は、重合度が高くなり、その結果、還元粘度が高くなり、Mnが大きくなり、Mw/Mnが小さくなる傾向にあるが、実際は、炭酸のアルカリ金属塩の使用量が多いほど、前記同様の副反応が生じ易くなり、この副反応により、得られる芳香族ポリスルホン樹脂の重合度が低下するので、この副反応の度合いも考慮して、前記所定の還元粘度、Mn及びMw/Mnを有する芳香族ポリスルホン樹脂が得られるように、炭酸のアルカリ金属塩の使用量を調整する必要がある。   The usage-amount of the alkali metal salt of carbonic acid is 95-115 mol% normally as an alkali metal with respect to the hydroxyl group of an aromatic dihydroxy compound, Preferably it is 100-110 mol%. If no side reaction occurs, the greater the amount of alkali metal carbonate used, the faster the desired polycondensation will proceed, and the resulting aromatic polysulfone resin will have a higher degree of polymerization, resulting in reduction. Viscosity increases, Mn increases, and Mw / Mn tends to decrease, but in fact, the larger the amount of alkali metal salt of carbonic acid used, the easier the side reaction similar to the above occurs. Since the degree of polymerization of the resulting aromatic polysulfone resin is reduced, the degree of this side reaction is also taken into consideration so that the aromatic polysulfone resin having the predetermined reduced viscosity, Mn and Mw / Mn can be obtained. It is necessary to adjust the amount of metal salt used.

典型的な芳香族ポリスルホン樹脂の製造方法では、第1段階として、芳香族ジハロゲノスルホン化合物と芳香族ジヒドロキシ化合物とを有機極性溶媒に溶解させ、第2段階として、第1段階で得られた溶液に、炭酸のアルカリ金属塩を加えて、芳香族ジハロゲノスルホン化合物と芳香族ジヒドロキシ化合物とを重縮合させ、第3段階として、第2段階で得られた反応混合物から、未反応の炭酸のアルカリ金属塩、副生したハロゲン化アルカリ、及び有機極性溶媒を除去して、芳香族ポリスルホン樹脂を取得する。   In a typical process for producing an aromatic polysulfone resin, as a first step, an aromatic dihalogenosulfone compound and an aromatic dihydroxy compound are dissolved in an organic polar solvent, and as a second step, a solution obtained in the first step An alkali metal salt of carbonic acid is added to polycondensate the aromatic dihalogenosulfone compound and the aromatic dihydroxy compound. As a third step, an unreacted carbonic acid alkali is obtained from the reaction mixture obtained in the second step. An aromatic polysulfone resin is obtained by removing the metal salt, the by-produced alkali halide, and the organic polar solvent.

第1段階の溶解温度は、通常40〜180℃である。また、第2段階の重縮合温度は、通常180〜400℃である。仮に副反応が生じなければ、重縮合温度が高いほど、目的とする重縮合が速やかに進行するので、得られる芳香族ポリスルホン樹脂は、重合度が高くなり、その結果、還元粘度が高くなり、Mnが大きくなり、Mw/Mnが小さくなる傾向にあるが、実際は、重縮合温度が高いほど、前記同様の副反応が生じ易くなり、この副反応により、得られる芳香族ポリスルホン樹脂の重合度が低下するので、この副反応の度合いも考慮して、前記所定の還元粘度、Mn及びMw/Mnを有する芳香族ポリスルホン樹脂が得られるように、重縮合温度を調整する必要がある。   The melting temperature in the first stage is usually 40 to 180 ° C. The polycondensation temperature in the second stage is usually 180 to 400 ° C. If no side reaction occurs, the higher the polycondensation temperature, the faster the target polycondensation proceeds, so the resulting aromatic polysulfone resin has a higher degree of polymerization, resulting in a higher reduced viscosity, Although Mn tends to increase and Mw / Mn tends to decrease, in fact, the higher the polycondensation temperature, the more likely the side reaction similar to the above occurs, and this side reaction causes the degree of polymerization of the aromatic polysulfone resin to be obtained. Therefore, it is necessary to adjust the polycondensation temperature so that the aromatic polysulfone resin having the predetermined reduced viscosity, Mn and Mw / Mn can be obtained in consideration of the degree of this side reaction.

また、第2段階の重縮合は、通常、副生する水を除去しながら徐々に昇温し、有機極性溶媒の還流温度に達した後、さらに通常1〜50時間、好ましくは10〜30時間保温することにより行うのがよい。仮に副反応が生じなければ、重縮合時間が長いほど、目的とする重縮合が進むので、得られる芳香族ポリスルホン樹脂は、重合度が高くなり、その結果、還元粘度が高くなり、Mnが大きくなり、Mw/Mnが小さくなる傾向にあるが、実際は、重縮合時間が長いほど、前記同様の副反応も進み、この副反応により、得られる芳香族ポリスルホン樹脂の重合度が低下するので、この副反応の度合いも考慮して、前記所定の還元粘度、Mn及びMw/Mnを有する芳香族ポリスルホン樹脂が得られるように、重縮合時間を調整する必要がある。   In the second stage polycondensation, usually, the temperature is gradually raised while removing by-product water, and after reaching the reflux temperature of the organic polar solvent, it is usually 1 to 50 hours, preferably 10 to 30 hours. It is better to keep it warm. If no side reaction occurs, the longer the polycondensation time, the more the target polycondensation proceeds. Therefore, the resulting aromatic polysulfone resin has a higher degree of polymerization, resulting in a higher reduced viscosity and a higher Mn. Mw / Mn tends to decrease, but in fact, the longer the polycondensation time, the more the same side reaction proceeds, and this side reaction reduces the degree of polymerization of the resulting aromatic polysulfone resin. In consideration of the degree of side reaction, it is necessary to adjust the polycondensation time so that the aromatic polysulfone resin having the predetermined reduced viscosity, Mn and Mw / Mn can be obtained.

第3段階では、まず、第2段階で得られた反応混合物から、未反応の炭酸のアルカリ金属塩、及び副生したハロゲン化アルカリを、濾過や遠心分離等で除去することにより、芳香族ポリスルホン樹脂が有機極性溶媒に溶解してなる溶液を得ることができる。次いで、この溶液から、有機極性溶媒を除去することにより、芳香族ポリスルホン樹脂を得ることができる。有機極性溶媒の除去は、前記溶液から直接、有機極性溶媒を留去することにより行ってもよいし、前記溶液を芳香族ポリスルホン樹脂の貧溶媒と混合して、芳香族ポリスルホン樹脂を析出させ、濾過や遠心分離等で分離することにより行ってもよい。   In the third stage, the aromatic polysulfone is first removed from the reaction mixture obtained in the second stage by removing unreacted alkali metal salt of carbonic acid and by-produced alkali halide by filtration or centrifugation. A solution in which the resin is dissolved in an organic polar solvent can be obtained. Subsequently, an aromatic polysulfone resin can be obtained by removing the organic polar solvent from this solution. The removal of the organic polar solvent may be carried out by directly distilling off the organic polar solvent from the solution, or the solution is mixed with a poor solvent for the aromatic polysulfone resin to precipitate the aromatic polysulfone resin. You may carry out by isolate | separating by filtration, centrifugation, etc.

芳香族ポリスルホン樹脂の貧溶媒としては、例えば、メタノール、エタノール、イソプロピルアルコール、ヘキサン、ヘプタン及び水が挙げられ、除去し易いことからメタノールが好ましい。   Examples of the poor solvent for the aromatic polysulfone resin include methanol, ethanol, isopropyl alcohol, hexane, heptane, and water, and methanol is preferable because it can be easily removed.

また、比較的高融点の有機極性溶媒が重合溶媒として用いられる場合には、第2段階で得られた反応混合物を冷却固化させた後、粉砕し、得られた粉体から、水を用いて、未反応の炭酸のアルカリ金属塩、及び副生したハロゲン化アルカリを抽出除去すると共に、芳香族ポリスルホン樹脂に対して溶解力を持たず、かつ、有機極性溶媒に対して溶解力をもつ溶媒を用いて、有機極性溶媒を抽出除去することも可能である。   When a relatively high melting point organic polar solvent is used as a polymerization solvent, the reaction mixture obtained in the second stage is cooled and solidified, and then pulverized. From the obtained powder, water is used. In addition, an alkali metal salt of unreacted carbonic acid and a by-produced alkali halide are extracted and removed, and a solvent that does not have solubility in aromatic polysulfone resin and has solubility in organic polar solvent. It is also possible to extract and remove the organic polar solvent.

前記粉体の体積平均粒径は、抽出効率及び抽出時の作業性の点から、好ましくは200〜2000μmであり、より好ましくは250〜1500μmであり、さらに好ましくは300〜1000μmである。あまり大きいと、抽出効率が悪く、あまり小さいと、抽出の際に固結したり、抽出後に濾過や乾燥を行う際に目詰まりを起こしたりするため、好ましくない。   The volume average particle diameter of the powder is preferably 200 to 2000 μm, more preferably 250 to 1500 μm, and further preferably 300 to 1000 μm from the viewpoint of extraction efficiency and workability during extraction. If it is too large, the extraction efficiency is poor, and if it is too small, it is not preferred because it solidifies during extraction or clogs when filtering or drying after extraction.

抽出溶媒としては、例えば重合溶媒にジフェニルスルホンを使用した場合、アセトンとメタノールの混合溶媒を用いることができる。ここで、アセトンとメタノールの混合比は、通常、抽出効率と芳香族ポリスルホン樹脂粉体の固着性から決められる。   As the extraction solvent, for example, when diphenyl sulfone is used as the polymerization solvent, a mixed solvent of acetone and methanol can be used. Here, the mixing ratio of acetone and methanol is usually determined from the extraction efficiency and the sticking property of the aromatic polysulfone resin powder.

また、別の典型的な芳香族ポリスルホン樹脂の製造方法では、第1段階として、芳香族ジヒドロキシ化合物と炭酸のアルカリ金属塩とを有機極性溶媒中で反応させ、副生する水を除去し、第2段階として、第1段階で得られた反応混合物に、芳香族ジハロゲノスルホン化合物を加えて、重縮合を行い、第3段階として、先と同様、第2段階で得られた反応混合物から、未反応の炭酸のアルカリ金属塩、副生したハロゲン化アルカリ、及び有機極性溶媒を除去して、芳香族ポリスルホン樹脂を取得する。   In another typical method for producing an aromatic polysulfone resin, as a first step, an aromatic dihydroxy compound and an alkali metal carbonate are reacted in an organic polar solvent to remove by-product water, As the second stage, an aromatic dihalogenosulfone compound is added to the reaction mixture obtained in the first stage to perform polycondensation, and as the third stage, from the reaction mixture obtained in the second stage as described above, Unreacted alkali metal salt of carbonic acid, by-produced alkali halide and organic polar solvent are removed to obtain an aromatic polysulfone resin.

なお、この別法において、第1段階では、副生する水を除去するために、水と共沸する有機溶媒を加えて、共沸脱水を行ってもよい。水と共沸する有機溶媒としては、例えば、ベンゼン、クロロベンゼン、トルエン、メチルイソブチルケトン、ヘキサン及びシクロヘキサンが挙げられる。共沸脱水の温度は、通常70〜200℃である。   In this alternative method, in the first stage, an azeotropic dehydration may be performed by adding an organic solvent azeotropic with water in order to remove by-product water. Examples of the organic solvent azeotropic with water include benzene, chlorobenzene, toluene, methyl isobutyl ketone, hexane and cyclohexane. The temperature of azeotropic dehydration is usually 70 to 200 ° C.

また、この別法において、第2段階の重縮合温度は通常40〜180℃であり、先と同様、副反応の度合いも考慮して、前記所定の還元粘度、Mn及びMw/Mnを有する芳香族ポリスルホン樹脂が得られるように、重縮合温度や重縮合時間を調整する必要がある。   In this alternative method, the polycondensation temperature in the second stage is usually 40 to 180 ° C., and the fragrance having the predetermined reduced viscosity, Mn, and Mw / Mn is taken into consideration in the same manner as described above in consideration of the degree of side reaction. It is necessary to adjust the polycondensation temperature and the polycondensation time so that the group polysulfone resin can be obtained.

こうして得られる本発明の芳香族ポリスルホン樹脂は、靭性が高いことから、各種用途に用いることができ、特に多孔質膜をはじめとする膜の材料として好適に用いることができる。   The aromatic polysulfone resin of the present invention thus obtained has high toughness, and therefore can be used for various applications, and can be particularly suitably used as a material for membranes including porous membranes.

本発明の芳香族ポリスルホン樹脂を含む膜は、例えば、平膜であってもよいし、管状膜であってもよいし、中空糸膜であってもよく、また、単層膜であってもよいし、多層膜であってもよい。なお、多層膜である場合、本発明の芳香族ポリスルホン樹脂を含む層のみを2層以上有する多層膜であってもよいし、本発明の芳香族ポリスルホン樹脂を含む層を1層以上有し、かつ他の層を1層以上有する多層膜であってもよい。   The membrane containing the aromatic polysulfone resin of the present invention may be, for example, a flat membrane, a tubular membrane, a hollow fiber membrane, or a single layer membrane. It may be a multilayer film. In addition, when it is a multilayer film, it may be a multilayer film having only two or more layers containing the aromatic polysulfone resin of the present invention, or may have one or more layers containing the aromatic polysulfone resin of the present invention, Further, it may be a multilayer film having one or more other layers.

膜の製造は、公知の方法を適宜採用することができ、多孔質膜の製造は、例えば、芳香族ポリスルホン樹脂を溶媒に溶解させ、この溶液を所定の形状に押し出し、エアギャップを介して乾湿式で、又はエアギャップを介さずに湿式で、凝固液に導入して、相分離及び脱溶媒することにより行ってもよいし、芳香族ポリスルホン樹脂を溶媒に溶解させ、この溶液を所定の形状の基材に流延し、凝固液に浸漬して、相分離及び脱溶媒することにより行ってもよい。また、非多孔質膜の製造は、例えば、芳香族ポリスルホン樹脂を溶融させ、所定の形状に押し出すことにより行ってもよいし、芳香族ポリスルホン樹脂を溶融させ、所定の形状の基材に流延することにより行ってもよいし、芳香族ポリスルホン樹脂を溶媒に溶解させ、この溶液を所定の形状の基材に流延し、脱溶媒することにより行ってもよい。   For the production of the membrane, known methods can be appropriately employed. For the production of the porous membrane, for example, an aromatic polysulfone resin is dissolved in a solvent, this solution is extruded into a predetermined shape, and dried and wetted through an air gap. It may be carried out by introducing into a coagulating liquid by a formula or wet without passing through an air gap, and by performing phase separation and desolvation, or by dissolving an aromatic polysulfone resin in a solvent, It may be carried out by casting it on a base material, immersing it in a coagulation liquid, phase separation and desolvation. The non-porous membrane may be produced, for example, by melting an aromatic polysulfone resin and extruding it into a predetermined shape, or by melting the aromatic polysulfone resin and casting it onto a substrate having a predetermined shape. Alternatively, it may be performed by dissolving the aromatic polysulfone resin in a solvent, casting the solution on a substrate having a predetermined shape, and removing the solvent.

また、多孔質膜として中空糸膜を製造する場合、前記溶液を紡糸原液とし、芯鞘型の二重環状ノズルを用いて、鞘側より前記溶液を吐出させると共に、芯側より凝固液(以下、「内部凝固液」ということがある)又は気体を吐出させ、これらをエアギャップを介して又は介さずに、凝固液(以下、「外部凝固液」ということがある)中に導入することが好ましい。   Further, when producing a hollow fiber membrane as a porous membrane, the solution is used as a spinning stock solution, and a core-sheath type double annular nozzle is used to discharge the solution from the sheath side, and a coagulating liquid (hereinafter referred to as the core side). , Sometimes referred to as “internal coagulating liquid”) or by discharging gas and introducing them into the coagulating liquid (hereinafter also referred to as “external coagulating liquid”) with or without an air gap. preferable.

前記溶液の調製に用いられる芳香族ポリスルホン樹脂の良溶媒(以下、単に「良溶媒」ということがある)としては、例えば、N−メチルピロリドン、N,N−ジメチルホルムアミド及びN,N−ジメチルアセトアミドが挙げられる。また、特に多孔質膜を製造する場合、前記溶液には、芳香族ポリエステル樹脂及び良溶媒以外の成分、例えば、親水性高分子、芳香族ポリスルホン樹脂の貧溶媒(以下、単に「貧溶媒」ということがある)、膨潤剤を含有させてもよい。前記溶液に親水性高分子を含有させることにより、透水性に優れ、水系流体の限外濾過や精密濾過等の濾過に好適に用いられる多孔質膜を得ることができる。なお、前記溶液に貧溶媒や膨潤剤を含有させない場合は、良溶媒としてN,N−ジメチルアセトアミドを用いることが好ましい。   Examples of the good solvent for the aromatic polysulfone resin used in the preparation of the solution (hereinafter sometimes simply referred to as “good solvent”) include N-methylpyrrolidone, N, N-dimethylformamide, and N, N-dimethylacetamide. Is mentioned. In particular, when producing a porous membrane, the solution contains components other than the aromatic polyester resin and the good solvent, such as a poor solvent for the hydrophilic polymer and the aromatic polysulfone resin (hereinafter simply referred to as “poor solvent”). In some cases, a swelling agent may be contained. By containing a hydrophilic polymer in the solution, a porous membrane that is excellent in water permeability and can be suitably used for filtration such as ultrafiltration or microfiltration of an aqueous fluid can be obtained. In addition, when a poor solvent or a swelling agent is not contained in the solution, it is preferable to use N, N-dimethylacetamide as a good solvent.

親水性高分子としては、例えば、ポリビニルピロリドン、ポリエチレングリコールやポリプロピレングリコール等のポリアルキレングリコール、ポリビニルアルコール、ポリヒドロキシエチルアクリレートやポリヒドロキシエチルメタクリレート等のポリヒドロキシアルキル(メタ)アクリレート、ポリアクリルアミド及びポリエチレンイミンが挙げられ、必要に応じてそれらの2種以上を用いてもよい。中でもポリビニルピロリドン、特に分子量が100万〜300万の高分子量ポリビニルピロリドンを用いると、その含有量が少なくても、前記溶液の増粘効果を高めることができるので好ましい。   Examples of hydrophilic polymers include polyvinyl pyrrolidone, polyalkylene glycols such as polyethylene glycol and polypropylene glycol, polyvinyl alcohol, polyhydroxyalkyl (meth) acrylates such as polyhydroxyethyl acrylate and polyhydroxyethyl methacrylate, polyacrylamide and polyethyleneimine. And two or more of them may be used as necessary. Among them, it is preferable to use polyvinyl pyrrolidone, particularly high molecular weight polyvinyl pyrrolidone having a molecular weight of 1,000,000 to 3,000,000 because the thickening effect of the solution can be enhanced even if its content is small.

親水性高分子の使用量は、芳香族ポリスルホン樹脂100重量部に対して、通常5〜40重量部であり、好ましくは15〜30重量部である。親水性高分子の使用量があまり少ないと、得られる多孔質膜の透水性が不十分になり、あまり多いと、得られる多孔質膜の耐熱性や耐薬品性、さらには靭性が不十分となる。   The usage-amount of a hydrophilic polymer is 5-40 weight part normally with respect to 100 weight part of aromatic polysulfone resin, Preferably it is 15-30 weight part. If the amount of the hydrophilic polymer used is too small, the water permeability of the resulting porous membrane will be insufficient, and if it is too large, the heat resistance, chemical resistance, and toughness of the resulting porous membrane will be insufficient. Become.

膨潤剤としては、例えば、エチレングリコール、ジエチレングリコール、トリエチレングリコール等のエチレングリコール類が挙げられ、除去し易いことからエチレングリコールが好ましい。   Examples of the swelling agent include ethylene glycols such as ethylene glycol, diethylene glycol, and triethylene glycol, and ethylene glycol is preferable because it can be easily removed.

凝固液としては、貧溶媒や、貧溶媒と良溶媒との混合溶媒を用いることができるが、凝固液として、貧溶媒と良溶媒との混合溶媒を用いると、これらの混合比を調節することにより、得られる多孔質膜の孔径や孔径分布を調節することができるので好ましく、特に内部凝固液、外部凝固液、共に、貧溶媒である水と良溶媒であるN,N−ジメチルアセトアミドとの混合溶媒を用いた場合、これらの効果を効率よく引き出すことができる。また、この混合溶媒を用いることにより、その後の溶媒回収も容易に行うことができる。   As the coagulation liquid, a poor solvent or a mixed solvent of a poor solvent and a good solvent can be used, but when a mixed solvent of a poor solvent and a good solvent is used as the coagulation liquid, the mixing ratio thereof can be adjusted. The pore size and pore size distribution of the resulting porous membrane can be adjusted, and in particular, both the internal coagulating liquid and the external coagulating liquid are composed of water as a poor solvent and N, N-dimethylacetamide as a good solvent. When a mixed solvent is used, these effects can be efficiently extracted. Further, by using this mixed solvent, subsequent solvent recovery can be easily performed.

前記溶液に親水性高分子を含有させて多孔質膜を製造する場合、得られる多孔質膜には、必要に応じて、多孔質膜中の親水性高分子を不溶化処理するために、熱処理や放射線処理を行なってもよい。熱処理や放射線処理を行うことにより、親水性高分子が架橋して、多孔質膜中に固定されるため、多孔質膜を濾過膜として使用する際、親水性高分子が濾液中に溶出するのを防止することができる。   When a porous membrane is produced by adding a hydrophilic polymer to the solution, the obtained porous membrane may be subjected to heat treatment or insolubility treatment to insolubilize the hydrophilic polymer in the porous membrane, if necessary. Radiation treatment may be performed. By performing heat treatment or radiation treatment, the hydrophilic polymer is cross-linked and fixed in the porous membrane, so when using the porous membrane as a filtration membrane, the hydrophilic polymer is eluted in the filtrate. Can be prevented.

熱処理や放射線処理は、多孔質膜が、形状や構造、機械的特性等において、著しく変化しない範囲であって、かつ親水性高分子が架橋するのに十分な条件で行うことが好ましく、どちらか一方のみの処理を行ってもよいし、その両方の処理を行ってもよい。   The heat treatment or radiation treatment is preferably performed under conditions in which the porous film is not significantly changed in shape, structure, mechanical properties, etc., and is sufficient for the hydrophilic polymer to be crosslinked. Only one process may be performed, or both processes may be performed.

例えば、親水性高分子としてポリビニルピロリドンを用いて製造した多孔質膜の熱処理は、処理温度150〜190℃で行うことが好ましく、処理時間は、多孔質膜中のポリビニルピロリドンの量により適宜設定される。   For example, the heat treatment of the porous membrane produced using polyvinylpyrrolidone as the hydrophilic polymer is preferably performed at a treatment temperature of 150 to 190 ° C., and the treatment time is appropriately set depending on the amount of polyvinylpyrrolidone in the porous membrane. The

また、多孔質膜の放射線処理は、放射線としてα線、β線、γ線、X線又は電子線を用いて行うことができる。この場合、多孔質膜中に抗酸化剤含有水を含浸した状態で行うことにより、多孔質膜のダメージを効果的に防止することができる。   In addition, the radiation treatment of the porous film can be performed using α rays, β rays, γ rays, X rays, or electron rays as the radiation. In this case, damage to the porous membrane can be effectively prevented by carrying out the treatment in a state where the porous membrane is impregnated with the antioxidant-containing water.

以下、本発明の実施例を示すが、本発明はこれによって限定されるものではない。   Examples of the present invention will be described below, but the present invention is not limited thereto.

〔芳香族ポリスルホン樹脂の還元粘度の測定〕
芳香族ポリスルホン樹脂約1gをN,N−ジメチルホルムアミドに溶解させて、その容量を1dLとし、この溶液の粘度(η)を、オストワルド型粘度管を用いて、25℃で測定した。また、溶媒であるN,N−ジメチルホルムアミドの粘度(η0)を、オストワルド型粘度管を用いて、25℃で測定した。前記溶液の粘度(η)と前記溶媒の粘度(η0)から、比粘性率((η−η0)/η0)を求め、この比粘性率を、前記溶液の濃度(約1g/dL)で割ることにより、芳香族ポリスルホン樹脂の還元粘度(dL/g)を求めた。
(Measurement of reduced viscosity of aromatic polysulfone resin)
About 1 g of the aromatic polysulfone resin was dissolved in N, N-dimethylformamide to make the volume 1 dL, and the viscosity (η) of this solution was measured at 25 ° C. using an Ostwald type viscosity tube. Further, the viscosity (η 0 ) of N, N-dimethylformamide as a solvent was measured at 25 ° C. using an Ostwald type viscosity tube. From the viscosity (η) of the solution and the viscosity (η 0 ) of the solvent, the specific viscosity ((η−η 0 ) / η 0 ) is obtained, and this specific viscosity is calculated as the concentration of the solution (about 1 g / dL). ) To determine the reduced viscosity (dL / g) of the aromatic polysulfone resin.

〔芳香族ポリスルホン樹脂のMn及びMw/Mnの測定〕
下記の条件でゲル浸透クロマトグラフィー(GPC)分析を行い、Mn及びMwを求め、Mw/Mnを算出した(分析数2回の平均値)。
試料:濃度が0.002g/mLである芳香族ポリスルホン樹脂のN,N−ジメチルホルムアミド溶液を50μL注入
カラム:東ソー(株)製「TSKgel GMHHR−H」(7.8mmφ×300mm)を2本連結
カラム温度:40℃
溶離液:N,N−ジメチルホルムアミド
溶離液流量:0.8mL/分
検出器:示差屈折率計(RI)+光散乱光度計(LS)
標準試薬:ポリスチレン
[Measurement of Mn and Mw / Mn of aromatic polysulfone resin]
Gel permeation chromatography (GPC) analysis was performed under the following conditions, Mn and Mw were determined, and Mw / Mn was calculated (average value of the number of analyzes twice).
Sample: 50 μL of N, N-dimethylformamide solution of aromatic polysulfone resin having a concentration of 0.002 g / mL Column: Two “TSKgel GMH HR- H” (7.8 mmφ × 300 mm) manufactured by Tosoh Corporation Connecting column temperature: 40 ° C
Eluent: N, N-dimethylformamide Eluent flow rate: 0.8 mL / min Detector: differential refractometer (RI) + light scattering photometer (LS)
Standard reagent: Polystyrene

〔芳香族ポリスルホン樹脂の靱性の評価〕
芳香族ポリスルホン樹脂膜から、13cm×1cmの試験片を切り出し、MIT耐疲労試験機(東洋精機(株)製)を用いて、曲げ半径0.38mm、荷重4.9Nの条件で屈曲試験を行い、試験片が破断するまでの屈曲回数を求めた(試験数8回の平均値)。
[Evaluation of toughness of aromatic polysulfone resin]
A 13 cm x 1 cm test piece was cut out from the aromatic polysulfone resin membrane and subjected to a bending test using a MIT fatigue resistance tester (manufactured by Toyo Seiki Co., Ltd.) under a bending radius of 0.38 mm and a load of 4.9 N. Then, the number of bending until the test piece broke was obtained (average value of 8 tests).

実施例1
撹拌機、窒素導入管、温度計、及び先端に受器を付したコンデンサーを備えた重合槽に、ビス(4−ヒドロキシフェニル)スルホン500g、ビス(4−クロロフェニル)スルホン589g、及び重合溶媒としてジフェニルスルホン942gを仕込み、系内に窒素ガスを流通させながら180℃まで昇温した。得られた溶液に、炭酸カリウム287gを添加した後、290℃まで徐々に昇温し、290℃でさらに2時間反応させた。得られた反応液を室温まで冷却して固化させ、細かく粉砕した後、温水による洗浄及びアセトンとメタノールの混合溶媒による洗浄を数回行い、次いで150℃で加熱乾燥を行い、末端がクロロ基である芳香族ポリスルホン樹脂を粉末として得た。この芳香族ポリスルホン樹脂の還元粘度、Mn、及びMw/Mnを測定し、結果を表1に示した。
Example 1
In a polymerization tank equipped with a stirrer, a nitrogen introduction tube, a thermometer, and a condenser with a receiver at the tip, 500 g of bis (4-hydroxyphenyl) sulfone, 589 g of bis (4-chlorophenyl) sulfone, and diphenyl as a polymerization solvent 942 g of sulfone was charged, and the temperature was raised to 180 ° C. while flowing nitrogen gas through the system. After adding 287 g of potassium carbonate to the obtained solution, the temperature was gradually raised to 290 ° C., and the mixture was further reacted at 290 ° C. for 2 hours. The obtained reaction solution was cooled to room temperature, solidified, finely pulverized, washed with warm water and washed with a mixed solvent of acetone and methanol several times, then heated and dried at 150 ° C., and the terminal was a chloro group. An aromatic polysulfone resin was obtained as a powder. The reduced viscosity, Mn, and Mw / Mn of this aromatic polysulfone resin were measured, and the results are shown in Table 1.

500mLセパラブルフラスコに、前記芳香族ポリスルホン樹脂75g及びN−メチル−2−ピロリドン225gを入れ、60℃で2時間攪拌して、淡黄色の芳香族ポリスルホン溶液を得た。この溶液をガラス板(厚み3mm)の上にフィルムアプリケーターを用いてキャストし、その表面が乾燥するまで高温熱風乾燥器を用いて60℃で加熱した後、窒素雰囲気下250℃で熱処理して、ガラス板上に厚み46μmの芳香族ポリスルホン樹脂膜を形成した。次いで、ガラス板から芳香族ポリスルホン樹脂膜を剥がし、靭性を評価し、結果を表1に示した。   In a 500 mL separable flask, 75 g of the aromatic polysulfone resin and 225 g of N-methyl-2-pyrrolidone were added and stirred at 60 ° C. for 2 hours to obtain a pale yellow aromatic polysulfone solution. This solution was cast on a glass plate (thickness 3 mm) using a film applicator, heated at 60 ° C. using a high-temperature hot air dryer until the surface was dried, and then heat-treated at 250 ° C. in a nitrogen atmosphere. An aromatic polysulfone resin film having a thickness of 46 μm was formed on a glass plate. Subsequently, the aromatic polysulfone resin film was peeled off from the glass plate, the toughness was evaluated, and the results are shown in Table 1.

比較例1
撹拌機、窒素導入管、温度計、及び先端に受器を付したコンデンサーを備えた重合槽に、ビス(4−ヒドロキシフェニル)スルホン500g、ビス(4−クロロフェニル)スルホン593g、及び重合溶媒としてジフェニルスルホン949gを仕込み、系内に窒素ガスを流通させながら180℃まで昇温した。得られた溶液に、無水炭酸カリウム287gを添加した後、290℃まで徐々に昇温し、290℃でさらに2時間反応させた。得られた反応液を室温まで冷却して固化させ、細かく粉砕した後、温水による洗浄及びアセトンとメタノールの混合溶媒による洗浄を数回行い、次いで150℃で加熱乾燥を行い、末端がクロロ基である芳香族ポリスルホン樹脂を粉末として得た。この芳香族ポリスルホン樹脂の還元粘度、Mn、及びMw/Mnを測定し、結果を表1に示した。
Comparative Example 1
In a polymerization tank equipped with a stirrer, a nitrogen introduction tube, a thermometer, and a condenser with a receiver at the tip, 500 g of bis (4-hydroxyphenyl) sulfone, 593 g of bis (4-chlorophenyl) sulfone, and diphenyl as a polymerization solvent 949 g of sulfone was charged, and the temperature was raised to 180 ° C. while flowing nitrogen gas through the system. After adding 287 g of anhydrous potassium carbonate to the obtained solution, the temperature was gradually raised to 290 ° C., and the mixture was further reacted at 290 ° C. for 2 hours. The obtained reaction solution was cooled to room temperature, solidified, finely pulverized, washed with warm water and washed with a mixed solvent of acetone and methanol several times, then heated and dried at 150 ° C., and the terminal was a chloro group. An aromatic polysulfone resin was obtained as a powder. The reduced viscosity, Mn, and Mw / Mn of this aromatic polysulfone resin were measured, and the results are shown in Table 1.

前記芳香族ポリスルホン樹脂を用いて、実施例1と同様にして芳香族ポリスルホン樹脂膜を得、靭性を評価し、結果を表1に示した。   Using the aromatic polysulfone resin, an aromatic polysulfone resin film was obtained in the same manner as in Example 1, the toughness was evaluated, and the results are shown in Table 1.

比較例2
市販の芳香族ポリスルホン樹脂(BASF社製「Ultrason E6020P」)を用いた。この芳香族ポリスルホン樹脂の還元粘度、Mn、及びMw/Mnを測定し、結果を表1に示した。
Comparative Example 2
A commercially available aromatic polysulfone resin (“Ultrason E6020P” manufactured by BASF) was used. The reduced viscosity, Mn, and Mw / Mn of this aromatic polysulfone resin were measured, and the results are shown in Table 1.

前記芳香族ポリスルホン樹脂を用いて、実施例1と同様にして芳香族ポリスルホン樹脂膜を得、靭性を評価し、結果を表1に示した。   Using the aromatic polysulfone resin, an aromatic polysulfone resin film was obtained in the same manner as in Example 1, the toughness was evaluated, and the results are shown in Table 1.

Figure 2011094111
Figure 2011094111

Claims (4)

還元粘度が0.55〜0.65dL/gであり、数平均分子量(Mn)が22000以上であり、数平均分子量(Mn)に対する重量平均分子量(Mw)の比の値(Mw/Mn)が2.54以下であることを特徴とする芳香族ポリスルホン樹脂。   The reduced viscosity is 0.55 to 0.65 dL / g, the number average molecular weight (Mn) is 22,000 or more, and the value (Mw / Mn) of the ratio of the weight average molecular weight (Mw) to the number average molecular weight (Mn) is An aromatic polysulfone resin having a viscosity of 2.54 or less. 下記式(1)で表される繰返し単位を有する請求項1に記載の芳香族ポリスルホン樹脂。
−Ph1−SO2−Ph2−O− (1)
(Ph1及びPh2は、それぞれ独立に、フェニレン基を表す。前記フェニレン基にある水素原子は、それぞれ独立に、アルキル基、アリール基又はハロゲン原子で置換されていてもよい。)
The aromatic polysulfone resin of Claim 1 which has a repeating unit represented by following formula (1).
-Ph 1 -SO 2 -Ph 2 -O- ( 1)
(Ph 1 and Ph 2 each independently represent a phenylene group. The hydrogen atoms in the phenylene group may each independently be substituted with an alkyl group, an aryl group, or a halogen atom.)
請求項1又は請求項2に記載の芳香族ポリスルホン樹脂を含む膜。   A membrane comprising the aromatic polysulfone resin according to claim 1 or 2. 多孔質膜である請求項3に記載の膜。   The membrane according to claim 3, which is a porous membrane.
JP2010204071A 2009-09-29 2010-09-13 Aromatic polysulfone resin and membrane thereof Active JP5703645B2 (en)

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