JP2011066215A - Charged particle beam lithography system and method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To make a time required for data processing by a data processing part equal to a time required for data processing by the other data processing part. <P>SOLUTION: In a charged particle beam lithography system 10, a pattern corresponding to a graphic contained in drawing data D is drawn in a drawing region DA on a sample M using a charged particle beam 10a1b. If data processing speed by a data processing part 10b1e1a is higher than that of a data processing part 10b1e3a, the drawing region DA is so divided since a data processing load of data DPB01 in a block frame B01 is larger than that of data DPB05 in a block frame B05 generating block frames B01, ..., B05. The block frame B01 is assigned to the data processing part 10b1e1a, and the block frame B05 is assigned to the data processing part 10b1e3a. The data DPB01 are subjected to data processing by the data processing part 10b1e1a. The data DPB05 are subjected to data processing by the data processing part 10b1e3a while the data are subjected to data processing by the data processing part 10b1e1a in parallel. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a charged particle beam drawing apparatus and drawing method for drawing on a sample a pattern corresponding to a figure included in the drawing data in a charged particle beam.

2. Description of the Related Art Conventionally, a charged particle beam drawing apparatus that divides a drawing area on a sample on which a pattern is drawn with a charged particle beam and creates a plurality of block frames (block areas) is known. Examples of this type of charged particle beam drawing apparatus are described in, for example, paragraph [0018], paragraph [0026], and paragraph [0027] of Patent Document 1.
Further, conventionally, a certain block frame (block) is assigned to a certain data processing unit (CPU), and another block frame is assigned to another data processing unit, and graphic data (pattern data) located in the certain block frame. ) Is processed by a certain data processing unit, and graphic data located in another block frame is processed by another data processing unit in parallel with data processing by a certain data processing unit, and corresponds to the graphic included in the drawing data 2. Description of the Related Art A charged particle beam drawing apparatus that draws a pattern to be drawn on a sample with a charged particle beam is known. Examples of this type of charged particle beam drawing apparatus are described in, for example, paragraphs [0026] and [0054] of Patent Document 2.

JP 2009-64862 A JP 2008-130862 A

  For example, in the conventional charged particle beam drawing apparatus described in Patent Document 1, Patent Document 2, and the like, when parallel processing of drawing data, a plurality of data processing speeds are equal (that is, data processing capabilities are equal). A data processing unit was provided. Therefore, in the conventional charged particle beam drawing apparatus, the time required for processing the graphic data located in a certain block frame assigned to a certain data processing unit and the position in another block frame assigned to another data processing unit In order to equalize the time required to process graphic data, the processing load of graphic data located within a block frame assigned to a data processing unit and the position within another block frame assigned to another data processing unit The processing load of graphic data to be processed was made equal. Specifically, in a conventional charged particle beam drawing apparatus, for example, the number of shots of a charged particle beam necessary for drawing a pattern corresponding to a figure located in a certain block frame assigned to a certain data processing unit, and the like The number of shots of the charged particle beam necessary for drawing a pattern corresponding to a figure located in another block frame assigned to the data processing unit of the same is made equal (see paragraph [0026] of Patent Document 1). .

By the way, even if a plurality of data processing units having the same data processing speed are provided at the time of manufacturing the charged particle beam drawing apparatus, for example, some data processing of the plurality of data processing units at the time of maintenance of the charged particle beam drawing apparatus by parts are exchanged, there is a fact that the data processing speed of the data processing speed and other data processing unit of a data processing unit becomes different.
In addition, even if a plurality of data processing units having the same data processing speed are provided at the time of manufacturing the charged particle beam drawing apparatus, for example, a new data processing unit is added to the charged particle beam drawing apparatus, so that certain data processing is performed. The data processing speed of some data processing units may differ from the data processing speed of other data processing units.

  As described above, when the data processing speed of a certain data processing unit is different from the data processing speed of another data processing unit, the data processing unit is positioned within a certain block frame assigned to a certain data processing unit as in the conventional charged particle beam drawing apparatus. When a certain block frame and another block frame are created such that the processing load of graphic data to be processed is equal to the processing load of graphic data located in another block frame assigned to another data processing unit The time required for data processing of graphic data located in a block frame assigned to a data processing unit is different from the time required for processing graphic data located in another block frame assigned to another data processing unit. End up. As a result, as idle time (waiting time) occurs in one data processing unit or another data processing unit, the total processing time when drawing data is processed by a plurality of data processing units becomes longer. On the other hand, for example, processing of graphic data located in another block frame assigned to another data processing unit after processing of graphic data located in a certain block frame assigned to a certain data processing unit is completed. Before the process is completed, if the next block frame is assigned to a certain data processing unit and graphic data located in the next block frame is processed by a certain data processing unit (that is, an idle time occurs in a certain data processing unit) If this is not done, the buffer capacity for processed data needs to be increased.

In view of the above-described problems, the present invention is located in another block frame assigned to another data processing unit and the time required to process graphic data located in a certain block frame assigned to a certain data processing unit. and an object thereof is to provide a charged particle beam drawing apparatus and a drawing method can equalize the time required for the processing of graphic data.
In detail, the present invention can process graphic data located in a certain block frame allocated to a certain data processing unit even when the data processing rate of a certain data processing unit differs from the data processing rate of another data processing unit. It is an object of the present invention to provide a charged particle beam drawing apparatus and its drawing method capable of equalizing the time required for processing and the time required for processing graphic data located in another block frame assigned to another data processing unit. And

According to one aspect of the present invention, a block frame that creates at least a first block frame and a second block frame by dividing a drawing region on a sample on which a pattern corresponding to a graphic included in drawing data is drawn. In parallel with the data processing by the creation unit, the first data processing unit for data processing of the graphic data located in one block frame of the first block frame and the second block frame, and the first data processing unit, A second data processing unit that processes data of a graphic located in the other block frame of the one block frame and the second block frame, and one of the first block frame and the second block frame is assigned to the first data processing unit A block frame allocating unit that allocates the other of the first block frame and the second block frame to the second data processing unit, and a pattern corresponding to the graphic included in the drawing data. When the data processing speed of the first data processing unit is higher than the data processing speed of the second data processing unit, The first block frame and the second block frame are created so that the data processing load of the graphic data to be processed is higher than the data processing load of the graphic data located in the second block frame. There is provided a charged particle beam drawing apparatus comprising: a management unit that allocates to one data processing unit and allocates a second block frame to the second data processing unit.
Preferably, when i data processing units are provided, a drawing region dividing unit is provided that divides the drawing region on the sample so that i × j block frames are created (i is An integer of 2 or more, j is an integer of 1 or more).

  According to another aspect of the present invention, at least a first block frame and a second block frame are created by dividing a drawing area on a sample on which a pattern corresponding to a graphic included in drawing data is drawn. The first block frame is allocated to one of the first data processing unit and the second data processing unit, and the second block frame is allocated to the other of the first data processing unit and the second data processing unit, and the first data processing unit The graphic data located in the allocated block frame is processed by the first data processing unit, and the graphic data positioned in the block frame allocated to the second data processing unit is processed by the first data processing unit. and the data processed by the second data processing unit in parallel to the processing, the drawing region on the sample by the charged particle beam pattern corresponding to the shapes that are included in the drawing data In the charged particle beam drawing method for drawing, when the data processing speed of the first data processing unit is faster than the data processing speed of the second data processing unit, the data processing load of the graphic data located in the first block frame is increased. The first block frame and the second block frame are created so as to be higher than the data processing load of the graphic data located in the second block frame, the first block frame is assigned to the first data processing unit, and the second A charged particle beam writing method is provided, wherein a block frame is assigned to a second data processing unit.

  According to the present invention, the time required for the data processing of the data of the graphic located in the first block frame allocated to the first data processing unit and the graphic positioned in the second block frame allocated to the second data processing unit The time required for the data processing of the data can be made equal.

1 is a schematic configuration diagram of a charged particle beam drawing apparatus 10. FIG. It is a detailed view of the control computer 10b1 shown in FIG. It is a figure explaining an example of the pattern P which can be drawn on the sample M by one shot of the charged particle beam 10a1b. 6 is a diagram schematically showing an example of a part of drawing data D. FIG. It is a figure explaining the drawing order by which pattern P1, P2, ... is drawn by the charged particle beam 10a1b. It is the figure which showed block frame B01, ..., B36. It is a figure explaining the data processing etc. of data DPB01, .... It is a figure explaining the data processing etc. of data DPB01, .... It is a figure explaining the data processing etc. of data DPB01, .... It is a figure explaining the data processing etc. of data DPB01, .... It is a figure explaining the data processing etc. of data DPB01, .... It is a figure explaining the data processing etc. of data DPB01, .... It is a figure explaining the data processing etc. of data DPB01, .... It is the figure which showed the data processing time of data DPB01. It is the figure which showed the data processing time of data DPB01. It is the figure which showed the data processing time of data DPB01. It is detail drawing of the shot data generation part 10b1g. It is detail drawing of correction | amendment module 10b1j.

  A charged particle beam drawing apparatus according to a first embodiment of the present invention will be described below. FIG. 1 is a schematic configuration diagram of a charged particle beam drawing apparatus 10 according to the first embodiment. FIG. 2 is a detailed view of the control computer 10b1 shown in FIG. In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 1, for example, a charged particle beam 10a1b is irradiated on a sample M such as a mask (blank), a wafer, etc. A drawing unit 10a for drawing a target pattern is provided. In the charged particle beam drawing apparatus 10 of the first embodiment, for example, an electron beam is used as the charged particle beam 10a1b. However, in the charged particle beam drawing apparatus 10 of the second embodiment, instead of the charged particle beam 10a1b, for example, It is also possible to use a charged particle beam other than an electron beam such as an ion beam.

  In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 1, for example, a charged particle gun 10a1a and deflectors 10a1c, 10a1d, which deflect the charged particle beam 10a1b irradiated from the charged particle gun 10a1a, 10a1e and 10a1f and a movable stage 10a2a on which a sample M to be drawn by the charged particle beam 10a1b deflected by the deflectors 10a1c, 10a1d, 10a1e, and 10a1f is placed are provided in the drawing unit 10a. Specifically, for example, the movable stage 10a2a on which the sample M is placed is disposed in the drawing chamber 10a2 that constitutes a part of the drawing unit 10a. For example, the movable stage 10a2a is configured to be movable in the left-right direction in FIG. 1 and the front-rear side direction in FIG. Further, for example, an optical barrel 10a1 constituting a part of the drawing unit 10a includes a charged particle gun 10a1a, deflectors 10a1c, 10a1d, 10a1e, 10a1f, lenses 10a1g, 10a1h, 10a1i, 10a1j, 10a1k, A molding aperture 10a1l and a second molding aperture 10a1m are arranged.

Specifically, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 2, for example, it corresponds to the entire drawing area DA (see FIGS. 5 and 6) on the sample M. When the drawing data D is input to the control computer 10b1, it is read by the reading module 10b1a and stored in the input buffer 10b1b. Next, for example, drawing data D corresponding to the entire drawing area DA on the sample M stored in the input buffer 10b1b is transferred by the distributor (localizer) 10b1d to a plurality of block frames B01, B02,..., B35, B36 (FIG. 6). Reference) Unit data DPB01, DPB02,..., DPB35, DPB36 (see FIGS. 7 to 14) are divided and read. Next, for example, data DPB01, DPB02,..., DPB35, DPB36 in units of a plurality of block frames B01, B02,..., B35, B36 are a plurality of data of a plurality of nodes 10b1e1, 10b1e2, 10b1e3 of the converter module 10b1e from the distributor 10b1d. The processing units (CPU) 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, and 10b1e3b are distributed.
Next, in the charged particle beam drawing apparatus 10 according to the first embodiment, as shown in FIGS. 1 and 2, for example, the data DPB01 in units of block frames B01,... (See FIG. 6) allocated to the data processing unit 10b1e1a. ,... (See FIGS. 8 to 14) are processed by the data processing unit 10b1e1a and converted into internal format data of the drawing apparatus. Further, the data DPB02,... (See FIG. 8 to FIG. 14) in units of the block frame B02,... (See FIG. 6) allocated to the data processing unit 10b1e1b is parallel to the data processing by the data processing unit 10b1e1a. Data is processed by the unit 10b1e1b and converted into drawing apparatus internal format data. Furthermore, the data DPB03,... (See FIG. 8 to FIG. 14) in units of block frames B03,... (See FIG. 6) allocated to the data processing unit 10b1e2a are in parallel with the data processing by the data processing units 10b1e1a, 10b1e1b. Data processing is performed by the data processing unit 10b1e2a and converted into drawing apparatus internal format data. In addition, the data DPB04 (see FIG. 8 to FIG. 14) in units of the block frames B04,... (See FIG. 6) allocated to the data processing unit 10b1e2b are parallel to the data processing by the data processing units 10b1e1a, 10b1e1b, 10b1e2a. Then, data processing is performed by the data processing unit 10b1e2b and converted into drawing apparatus internal format data. Furthermore, the data DPB05,... (See FIGS. 8 to 14) in units of block frames B05,... (See FIG. 6) distributed to the data processing unit 10b1e3a are used for data processing by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b. parallel to, the data processed by the data processing unit 10B1e3a, is converted to the drawing device internal format data. Further, data DPB06,... (See FIG. 8 to FIG. 14) in units of block frames B06,... (See FIG. 6) distributed to the data processing unit 10b1e3b are data by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a. in parallel to the processing, the data processed by the data processing unit 10B1e3b, is converted to the drawing device internal format data.

Next, in the charged particle beam drawing apparatus 10 according to the first embodiment, as illustrated in FIGS. 1 and 2, for example, the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, and 10b1e3b are generated by parallel data processing. The drawing apparatus internal format data DPB01,... (See FIGS. 9 to 14) in units of a plurality of block frames B01,... (See FIG. 6) are stored in the output buffer 10b1f. Next, for example, a plurality of block frame B01,... Unit drawing apparatus internal format data DPB01,... Stored in the output buffer 10b1f is transferred to the shot data generation unit 10b1g. Next, for example, a plurality of block frame B01,..., Unit drawing apparatus internal format data DPB01,... Transferred to the shot data generation unit 10b1g is a plurality of data processing units 10b1g1a,. ), Data is processed in parallel, and shot data for irradiating the charged particle beam 10a1b for drawing a pattern on the sample M is generated. Specifically, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 2, for example, the distributor 10b1d, the converter module 10b1e, the shot data generation unit 10b1g, and the like are managed by the distributed processing management module 10b1c. ing.
Next, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 2, for example, shot data generated by the shot data generation unit 10b1g is sent to the deflection control unit 10b1h, and shot data Based on the above, the deflectors 10a1c, 10a1d, 10a1e, and 10a1f are controlled by the deflection controller 10b1h, and the charged particle beam 10a1b from the charged particle gun 10a1a is irradiated to a desired position on the sample M.

Specifically, in the charged particle beam drawing apparatus 10 according to the first embodiment, as shown in FIGS. 1 and 2, for example, based on shot data generated by the shot data generation unit 10b1g, deflection is performed by the deflection control unit 10b1h. By controlling the blanking deflector 10a1c via the control circuit 10b2, the charged particle beam 10a1b irradiated from the charged particle gun 10a1a is transmitted through the opening 10a1l ′ (see FIG. 3) of the first shaping aperture 10a1l, for example. Whether the sample M is irradiated or the sample M is not irradiated by being blocked by a portion other than the opening 10a1l ′ of the first shaping aperture 10a1l, for example, is switched. That is, in the charged particle beam drawing apparatus 10 of the first embodiment, for example, the irradiation time of the charged particle beam 10a1b can be controlled by controlling the blanking deflector 10a1c.
Further, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 2, for example, based on the shot data generated by the shot data generation unit 10b1g, the deflection control circuit 10b1h performs a deflection control circuit. By controlling the beam size variable deflector 10a1d via 10b3, the charged particle beam 10a1b transmitted through the opening 10a1l ′ (see FIG. 3) of the first shaping aperture 10a1l is deflected by the beam size variable deflector 10a1d. The Next, a part of the charged particle beam 10a1b deflected by the beam size variable deflector 10a1d is transmitted through the opening 10a1m ′ (see FIG. 3) of the second shaping aperture 10a1m. That is, in the charged particle beam drawing apparatus 10 according to the first embodiment, for example, the charge applied to the sample M is adjusted by adjusting the amount and direction of deflection of the charged particle beam 10a1b by the beam size variable deflector 10a1d. The size and shape of the particle beam 10a1b can be adjusted.

An example of the pattern P that can be drawn on the sample M by one shot of the charged particle beam 10a1b by the charged particle beam drawing apparatus 10 of the first embodiment will be described with reference to FIG. In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 3, for example, when a pattern P (see FIG. 3) is drawn on the sample M by the charged particle beam 10a1b, charged particles are drawn. A part of the charged particle beam 10a1b irradiated from the gun 10a1a (see FIG. 1) is transmitted through, for example, a square opening 10a1l ′ (see FIG. 3) of the first shaping aperture 10a1l. As a result, the horizontal sectional shape of the charged particle beam 10a1b transmitted through the opening 10a1l ′ of the first shaping aperture 10a1l becomes, for example, a substantially square shape. Next, a part of the charged particle beam 10a1b transmitted through the opening 10a1l ′ of the first shaping aperture 10a1l is transmitted through the opening 10a1m ′ (see FIG. 3) of the second shaping aperture 10a1m. Further, for example, the charged particle beam 10a1b transmitted through the opening 10a1l ′ of the first shaping aperture 10a1l is deflected by a beam size variable deflector 10a1d (see FIG. 1), thereby opening the opening 10a1m ′ of the second shaping aperture 10a1m. The horizontal cross-sectional shape of the charged particle beam 10a1b to be transmitted can be, for example, rectangular (square or rectangular), or, for example, triangular. Further, for example, by continuing to irradiate a predetermined position on the sample M with a charged particle beam 10a1b transmitted through the opening 10a1m ′ of the second shaping aperture 10a1m for a predetermined irradiation time, the opening of the second shaping aperture 10a1m A pattern P having substantially the same shape as the horizontal sectional shape of the charged particle beam 10a1b transmitted through 10a1m ′ can be drawn on the sample M.
Furthermore, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 2, for example, based on the shot data generated by the shot data generation unit 10b1g, the deflection control circuit 10b1h performs a deflection control circuit. The main deflector 10a1e is controlled via 10b4, and the charged particle beam 10a1b transmitted through the opening 10a1m ′ (see FIG. 3) of the second shaping aperture 10a1m is deflected by the main deflector 10a1e. Further, for example, the charged particles deflected by the main deflector 10a1e by controlling the sub deflector 10a1f via the deflection control circuit 10b5 by the deflection control unit 10b1h based on the shot data generated by the shot data generating unit 10b1g. The beam 10a1b is further deflected by the sub deflector 10a1f. That is, for example, the irradiation position of the charged particle beam 10a1b irradiated on the sample M can be adjusted by adjusting the amount and direction of the charged particle beam 10a1b deflected by the main deflector 10a1e and the sub deflector 10a1f. Further, for example, based on the shot data generated by the shot data generation unit 10b1g of the control computer 10b1 of the control unit 10b, the movement of the movable stage 10a2a is controlled by the stage control unit 10b1i via the stage control circuit 10b6.

In the example shown in FIGS. 1 and 2, for example, obtained by converting CAD data (layout data, design data) created by a semiconductor integrated circuit designer into a format for the charged particle beam drawing apparatus 10. writing data D is input to the control computer 10b1 of the control section 10b of the charged particle beam drawing apparatus 10. Generally, CAD data (layout data, design data) includes a large number of minute patterns. Therefore, the CAD data (layout data, design data) is large in size. Furthermore, when CAD data (layout data, design data) or the like is converted into another format, the data amount of the converted data generally further increases. In view of this, CAD data (layout data, design data) and drawing data D input to the control computer 10b1 of the control unit 10b of the charged particle beam drawing apparatus 10 employ data hierarchization, and the amount of data Is being compressed.
FIG. 4 is a diagram schematically showing an example of a part of the drawing data D shown in FIGS. In the example shown in FIG. 4, the drawing data D (see FIGS. 1 and 2) applied to the charged particle beam drawing apparatus 10 of the first embodiment includes, for example, a chip hierarchy CP and a frame lower than the chip hierarchy CP. It is hierarchized into a hierarchy FR, a block hierarchy BL lower than the frame hierarchy FR, a cell hierarchy CL lower than the block hierarchy BL, and a graphic hierarchy FG lower than the cell hierarchy CL. Specifically, for example, the chip CP1 which is a part of the elements of the chip hierarchy CP corresponds to the three frames FR1, FR2 and FR3 which are part of the elements of the frame hierarchy FR. Also, for example, a frame FR2 that is a part of the elements of the frame hierarchy FR corresponds to 18 blocks BL00,..., BL52 that are a part of the elements of the block hierarchy BL. Further, for example, the block BL21 which is a part of the elements of the block hierarchy BL corresponds to a plurality of cells CLA, CLB, CLC, CLD,. Further, for example, a cell CLA that is a part of the elements of the cell hierarchy CL corresponds to a large number of figures FG1, FG2,. In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1, 2, and 4, the graphic hierarchy FG (see FIG. 4) included in the drawing data D (see FIGS. 1 and 2). Patterns P1, P2,... (See FIG. 5) corresponding to a large number of figures FG1, FG2,... (See FIG. 4) are formed on the sample M (see FIGS. 1 and 5) by the charged particle beam 10a1b (see FIG. 1). Drawing is performed on the drawing area DA (see FIG. 5).

A drawing order in which patterns P1, P2,... Corresponding to the figures FG1, FG2,... Included in the drawing data D are drawn by the charged particle beam 10a1b will be described with reference to FIG. In the example shown in FIG. 5, the drawing area DA on the sample M is virtually divided into, for example, six strip-shaped stripe frames STR1, STR2, STR3, STR4, STR5, STR6. In the example shown in FIG. 5, for example, the charged particle beam 10a1b is scanned in the stripe frame STR1 from the left side of FIG. 5 to the right side of FIG. 5, and is included in the drawing data D (see FIGS. 1 and 2). A pattern (not shown) corresponding to a large number of figures (not shown) is drawn in the stripe frame STR1 on the sample M by the charged particle beam 10a1b. Next, for example, the charged particle beam 10a1b is scanned from the left side of FIG. 5 toward the right side of FIG. 5 in the stripe frame STR2, and a large number of figures FG1, FG2,. corresponding pattern P1, P2, ... are drawn into the stripe frame STR2 on the sample M by the charged particle beam 10A1b. Similarly, a pattern (not shown) corresponding to a large number of figures (not shown) included in the drawing data D is drawn in the stripe frames STR3, STR4, STR5, STR6 on the sample M by the charged particle beam 10a1b. Is done.
Specifically, in the example shown in FIG. 5, for example, when a pattern is drawn in the stripe frame STR1 by the charged particle beam 10a1b, the movable stage 10a2a (see FIG. 1) moves from the right side of FIG. 5 to the left side of FIG. As described above, the movable stage 10a2a is controlled by the stage controller 10b1i (see FIG. 2) via the stage control circuit 10b6 (see FIG. 1). Next, for example, before the patterns P1, P2,... Are drawn in the stripe frame STR2 by the charged particle beam 10a1b, the movable stage 10a2a is moved from the upper left side in FIG. 5 to the lower right side in FIG. 10a2a is controlled. Next, for example, when the patterns P1, P2,... Are drawn in the stripe frame STR2 by the charged particle beam 10a1b, the movable stage 10a2a is controlled so that the movable stage 10a2a moves from the right side of FIG. The

FIG. 6 is a diagram showing block frames B01, B02,..., B35, B36 created by dividing the stripe frames STR1, STR2, STR3, STR4, STR5, STR6 shown in FIG. In the charged particle beam drawing apparatus 10 of the first embodiment, for example, based on the data processing speed of the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, and 10b1e3b (see FIG. 2) of the converter module 10b1e. 10b1c (see FIG. 2) divides the stripe frames STR1, STR2, STR3, STR4, STR5, STR6 (see FIG. 6) to create block frames B01, B02,..., B35, B36 (see FIG. 6). .
Further, in the charged particle beam drawing apparatus 10 of the first embodiment, for example, the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b (see FIG. 2) having a high data processing speed, and the data processing units 10b1e3a, 10b1e3a, 10b1e3b (see FIG. 2) is provided in the converter module 10B1e (see FIG. 2). Specifically, in the example illustrated in FIGS. 2 and 6, for example, the data processing speeds of the data processing units 10b1e1a, 10b1e1b, 10b1e2a, and 10b1e2b are equal to each other, and the data processing speeds of the data processing units 10b1e3a and 10b1e3b are equal to each other. It has become.

  Therefore, in the example shown in FIGS. 2 and 6, for example, the data processing load of the data DPB01 (see FIG. 8) in units of the block frame B01 (see FIG. 6) (that is, the data of the data of the figure located in the block frame B01) Processing load), data processing load of data DPB02 (see FIG. 8) in block frame B02 (see FIG. 6), data processing load of data DPB03 (see FIG. 8) in block frame B03 (see FIG. 6), and The data processing load of the data DPB04 (see FIG. 8) in the block frame B04 (see FIG. 6) unit is the data processing load of the data DPB05 (see FIG. 8) in the block frame B05 (see FIG. 6) unit, and the block frame B06. to be higher than the data processing load (see FIG. 6) unit of data DPB06 (see FIG. 8), the stripe frame STR 1 (see FIG. 6) Block frame B01 is split, B02, B03, B04, B05, B06 is created. Specifically, for example, the time required for the data DPB01 to be processed by the data processor 10b1e1a (see FIG. 8) and the time required for the data DPB02 to be processed by the data processor 10b1e1b (see FIG. 8). And the time required for the data DPB03 to be processed by the data processor 10b1e2a (see FIG. 8), the time required for the data DPB04 to be processed by the data processor 10b1e2b (see FIG. 8), and the data processing Block 10b1e3a (see FIG. 8) and the time required for data DPB05 to be processed by the data processor 10b1e3b (see FIG. 8) and the time required for data DPB06 to be processed by the data processor 10b1e3b (see FIG. 8) Frames B01, B02, B03, B04, 05, B06 is created. Further, the distributed processing management module 10b1c (see FIG. 2) allocates the block frame B01 to the data processing unit 10b1e1a, the block frame B02 to the data processing unit 10b1e1b, and the block frame B03 to the data processing unit 10b1e2a. The block frame B04 is allocated to the data processing unit 10b1e2b, the block frame B05 is allocated to the data processing unit 10b1e3a, and the block frame B06 is allocated to the data processing unit 10b1e3b.

  In the example shown in FIGS. 2 and 6, for example, the data processing load of the data DPB07 (see FIG. 9) in units of the block frame B07 (see FIG. 6) (that is, the data of the graphic data located in the block frame B07) Processing load), data processing load of data DPB08 (see FIG. 9) in block frame B08 (see FIG. 6), data processing load of data DPB09 (see FIG. 9) in block frame B09 (see FIG. 6), and The data processing load of the data DPB10 (see FIG. 9) in the block frame B10 (see FIG. 6) is the data processing load of the data DPB11 (see FIG. 9) in the block frame B11 (see FIG. 6), and the block frame B12. to be higher than the data processing load (see FIG. 6) unit of data DPB12 (see FIG. 9), the stripe frame STR 2 (see FIG. 6) is divided It is block frame B07, B08, B09, B10, B11, B12 are created. Specifically, for example, the time required for the data DPB07 to be processed by the data processor 10b1e1a (see FIG. 9) and the time required for the data DPB08 to be processed by the data processor 10b1e1b (see FIG. 9). The time required for the data DPB09 to be processed by the data processor 10b1e2a (see FIG. 9), the time required for the data DPB10 to be processed by the data processor 10b1e2b (see FIG. 9), and the data processing Block 10b1e3a (see FIG. 9) and the time required for data DPB11 to be processed by the data processor 10b1e3b (see FIG. 9) are equal to the time required for data DPB12 to be processed by the data processor 10b1e3b (see FIG. 9). Frames B07, B08, B09, B10, 11, B12 is created. Further, the distributed processing management module 10b1c (see FIG. 2) assigns the block frame B07 to the data processing unit 10b1e1a, the block frame B08 to the data processing unit 10b1e1b, and the block frame B09 to the data processing unit 10b1e2a. The block frame B10 is assigned to the data processing unit 10b1e2b, the block frame B11 is assigned to the data processing unit 10b1e3a, and the block frame B12 is assigned to the data processing unit 10b1e3b.

  Further, in the examples shown in FIGS. 2 and 6, for example, the data processing load of the data DPB13 (see FIG. 10) in units of the block frame B13 (see FIG. 6) (that is, the data of the graphic data located in the block frame B13) Processing load), data processing load of data DPB 14 (see FIG. 10) in block frame B 14 (see FIG. 10), data processing load of data DPB 15 (see FIG. 10) in block frame B 15 (see FIG. 6), and The data processing load of the data DPB16 (see FIG. 10) in the block frame B16 (see FIG. 6) is the data processing load of the data DPB17 (see FIG. 10) in the block frame B17 (see FIG. 6), and the block frame B18. (See FIG. 6) The stripe frame STR3 (FIG. 6) is set so as to be higher than the data processing load of the unit data DPB 18 (see FIG. 10). Irradiation) is divided block frame B13, B14, B15, B16, B17, B18 are created. Specifically, for example, the time required for data processing of the data DPB 13 by the data processing unit 10b1e1a (see FIG. 10) and the time required for data processing of the data DPB 14 by the data processing unit 10b1e1b (see FIG. 10). And the time required for the data DPB 15 to be processed by the data processor 10b1e2a (see FIG. 10), the time required for the data DPB 16 to be processed by the data processor 10b1e2b (see FIG. 10), and the data processing Block 10b1e3a (refer to FIG. 10) and the time required for data DPB17 to be processed by the data processor 10b1e3b (refer to FIG. 10) are equal to the time required for data DPB18 to be processed by the data processor 10b1e3b (refer to FIG. 10). Frame B13, B14, B1 , B16, B17, B18 is created. Further, the distributed processing management module 10b1c (see FIG. 2) assigns the block frame B13 to the data processing unit 10b1e1a, the block frame B14 to the data processing unit 10b1e1b, and the block frame B15 to the data processing unit 10b1e2a. The block frame B16 is assigned to the data processing unit 10b1e2b, the block frame B17 is assigned to the data processing unit 10b1e3a, and the block frame B18 is assigned to the data processing unit 10b1e3b.

  In the example shown in FIGS. 2 and 6, for example, the data processing load of the data DPB19 (see FIG. 11) in units of the block frame B19 (see FIG. 6) (that is, the data of the graphic data located in the block frame B19) Processing load), data processing load of data DPB20 (see FIG. 11) in block frame B20 (see FIG. 11), data processing load of data DPB21 (see FIG. 11) in block frame B21 (see FIG. 6), and The data processing load of the data DPB22 (see FIG. 11) in the block frame B22 (see FIG. 6) unit is the data processing load of the data DPB23 (see FIG. 11) in the block frame B23 (see FIG. 6) unit, and the block frame B24. to be higher than the data processing load (see FIG. 6) unit of data DPB24 (see FIG. 11), the stripe frame: STR4 (6 Irradiation) is divided block frame B19, B20, B21, B22, B23, B24 are created. Specifically, for example, the time required for data processing of the data DPB 19 by the data processing unit 10b1e1a (see FIG. 11) and the time required for data processing of the data DPB 20 by the data processing unit 10b1e1b (see FIG. 11). And the time required for the data DPB 21 to be processed by the data processor 10b1e2a (see FIG. 11), the time required for the data DPB 22 to be processed by the data processor 10b1e2b (see FIG. 11), and the data processing Block 10b1e3a (see FIG. 11) and the time required for data DPB23 to be processed by the data processor 10b1e3b (see FIG. 11) are equal to the time required for data DPB24 to be processed by the data processor 10b1e3b (see FIG. 11). Frame B19, B20, B2 , B22, B23, B24 is created. Further, the distributed processing management module 10b1c (see FIG. 2) assigns the block frame B19 to the data processing unit 10b1e1a, the block frame B20 to the data processing unit 10b1e1b, and the block frame B21 to the data processing unit 10b1e2a. The block frame B22 is assigned to the data processing unit 10b1e2b, the block frame B23 is assigned to the data processing unit 10b1e3a, and the block frame B24 is assigned to the data processing unit 10b1e3b.

  Further, in the example shown in FIGS. 2 and 6, for example, data processing load of data DPB25 (see FIG. 12) in units of block frame B25 (see FIG. 6) (that is, data of graphic data located in block frame B25) Processing load), data processing load of data DPB 26 (see FIG. 12) in units of block frame B 26 (see FIG. 12), data processing load of data DPB 27 (see FIG. 12) in units of block frame B 27 (see FIG. 6), and The data processing load of the data DPB28 (see FIG. 12) in the block frame B28 (see FIG. 6) unit is the data processing load of the data DPB29 (see FIG. 12) in the block frame B29 (see FIG. 6) unit, and the block frame B30. (See FIG. 6) The stripe frame STR5 (FIG. 6) is set so as to be higher than the data processing load of the unit data DPB 30 (see FIG. 12). Irradiation) is divided block frame B25, B26, B27, B28, B29, B30 are created. Specifically, for example, the time required for data processing of the data DPB 25 by the data processing unit 10b1e1a (see FIG. 12) and the time required for data processing of the data DPB 26 by the data processing unit 10b1e1b (see FIG. 12). And the time required for the data DPB 27 to be processed by the data processor 10b1e2a (see FIG. 12), the time required for the data DPB 28 to be processed by the data processor 10b1e2b (see FIG. 12), and the data processing Block 10b1e3a (see FIG. 12) and the time required for data DPB29 to be processed by the data processor 10b1e3b (see FIG. 12) are equal to the time required for data DPB30 to be processed by the data processor 10b1e3b (see FIG. 12). Frame B25, B26, B2 , B28, B29, B30 is created. Further, the distributed processing management module 10b1c (see FIG. 2) assigns the block frame B25 to the data processing unit 10b1e1a, the block frame B26 to the data processing unit 10b1e1b, and the block frame B27 to the data processing unit 10b1e2a. The block frame B28 is assigned to the data processing unit 10b1e2b, the block frame B29 is assigned to the data processing unit 10b1e3a, and the block frame B30 is assigned to the data processing unit 10b1e3b.

  In the example shown in FIGS. 2 and 6, for example, the data processing load of the data DPB31 (see FIG. 13) in units of the block frame B31 (see FIG. 6) (that is, the data of the graphic data located in the block frame B31) Processing load), data processing load of data DPB 32 (see FIG. 13) in block frame B 32 (see FIG. 13), data processing load of data DPB 33 (see FIG. 13) in block frame B 33 (see FIG. 6), and The data processing load of the data DPB 34 (see FIG. 13) in the block frame B 34 (see FIG. 6) unit is the data processing load of the data DPB 35 (see FIG. 13) in the block frame B 35 (see FIG. 6) unit, and the block frame B 36 to be higher than the data processing load (see FIG. 6) unit of data DPB36 (see FIG. 13), the stripe frame STR6 (6 Irradiation) is divided block frame B31, B32, B33, B34, B35, B36 are created. Specifically, for example, the time required for data processing of the data DPB 31 by the data processing unit 10b1e1a (see FIG. 13) and the time required for data processing of the data DPB 32 by the data processing unit 10b1e1b (see FIG. 13). And the time required for the data DPB 33 to be processed by the data processor 10b1e2a (see FIG. 13), the time required for the data DPB 34 to be processed by the data processor 10b1e2b (see FIG. 13), and the data processing Block 10b1e3a (see FIG. 13) and the time required for data DPB35 to be processed by the data processor 10b1e3b (see FIG. 13) are equal to the time required for data DPB36 to be processed by the data processor 10b1e3b (see FIG. 13). Frame B31, B32, B3 , B34, B35, B36 is created. Furthermore, the distributed processing management module 10b1c (see FIG. 2) assigns the block frame B31 to the data processing unit 10b1e1a, the block frame B32 to the data processing unit 10b1e1b, and the block frame B33 to the data processing unit 10b1e2a. The block frame B34 is assigned to the data processing unit 10b1e2b, the block frame B35 is assigned to the data processing unit 10b1e3a, and the block frame B36 is assigned to the data processing unit 10b1e3b.

7 to 13 show data DPB01, DPB02,..., DPB35, DPB36 by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, 10b1e3b of the converter module 10b1e of the charged particle beam drawing apparatus 10 of the first embodiment. It is a figure for demonstrating a process. FIG. 14 is a diagram showing the time required for data processing of the data DPB01, DPB02,..., DPB35, DPB36 by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, 10b1e3b.
In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 7, for example, it corresponds to the entire drawing area DA (see FIGS. 5 and 6) on the sample M (see FIGS. 5 and 6). When the drawing data D is input to the control computer 10b1, it is read by the reading module 10b1a and stored in the input buffer 10b1b. Next, for example, drawing data D corresponding to the entire drawing area DA on the sample M stored in the input buffer 10b1b is transferred by the distributor (localizer) 10b1d to a plurality of block frames B01, B02,..., B11, B12,. (See FIG. 6) The data is divided into unit data DPB01, DPB02,..., DPB11, DPB12,. Next, as shown in FIG. 8, for example, the data DPB01, DPB02, DPB03, DPB04, DPB05, DPB06 are distributed from the distributor 10b1d to the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3b, 10b1e3b, The data processing is started at time t0 (see FIG. 14).

  Next, as shown in FIG. 8, for example, the data DPB01, DPB02, DPB03, DPB04, DPB05, DPB06 are processed in parallel by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, 10b1e3b. The data is converted into format data, and the data processing ends at time t1 (see FIG. 14). Next, as shown in FIG. 9, for example, the drawing apparatus internal format data DPB01, DPB02, DPB03, DPB04, DPB05, DPB06 generated by parallel data processing by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, 10b1e3b Is stored in the output buffer 10b1f. Further, for example, the data DPB07, DPB08, DPB09, DPB10, DPB11, DPB12 are distributed from the distributor 10b1d to the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, 10b1e3b of the converter module 10b1e. The

  Next, as shown in FIG. 9, for example, the data DPB07, DPB08, DPB09, DPB10, DPB11, DPB12 are processed in parallel by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, and 10b1e3b. The data is converted into format data, and the data processing ends at time t2 (see FIG. 14). Next, as shown in FIG. 10, for example, the drawing apparatus internal format data DPB07, DPB08, DPB09, DPB10, DPB11, DPB12 generated by parallel data processing by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, 10b1e3b Is stored in the output buffer 10b1f. Further, for example, the drawing apparatus internal format data DPB01, DPB02, DPB03, DPB04, DPB05, DPB06 (see FIG. 9) stored in the output buffer 10b1f are grouped into the stripe frame STR1 (see FIG. 6) as shot data. The data is transferred to the generation unit 10b1g. Further, for example, the data DPB13, DPB14, DPB15, DPB16, DPB17, DPB18 are distributed from the distributor 10b1d to the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, 10b1e3b of the converter module 10b1e. The

  Next, as shown in FIG. 10, for example, the data DPB13, DPB14, DPB15, DPB16, DPB17, and DPB18 are processed in parallel by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, and 10b1e3b. The data is converted into format data, and the data processing ends at time t3 (see FIG. 14). Next, as shown in FIG. 11, for example, the rendering apparatus internal format data DPB13, DPB14, DPB15, DPB16, DPB17, DPB18 generated by parallel data processing by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, 10b1e3b Is stored in the output buffer 10b1f. Further, for example, the drawing apparatus internal format data DPB07, DPB08, DPB09, DPB10, DPB11, DPB12 (see FIG. 10) stored in the output buffer 10b1f are grouped into the stripe frame STR2 (see FIG. 6) as shot data. The data is transferred to the generation unit 10b1g. Further, for example, the data DPB19, DPB20, DPB21, DPB22, DPB23, DPB24 are distributed from the distributor 10b1d to the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, 10b1e3b of the converter module 10b1e. The

  Next, as shown in FIG. 11, for example, the data DPB19, DPB20, DPB21, DPB22, DPB23, and DPB24 are processed in parallel by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, and 10b1e3b. The data is converted into format data, and the data processing ends at time t4 (see FIG. 14). Next, as shown in FIG. 12, for example, the drawing apparatus internal format data DPB19, DPB20, DPB21, DPB22, DPB23, DPB24 generated by parallel data processing by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, 10b1e3b Is stored in the output buffer 10b1f. Further, for example, the drawing apparatus internal format data DPB13, DPB14, DPB15, DPB16, DPB17, DPB18 (see FIG. 11) stored in the output buffer 10b1f are grouped into the stripe frame STR3 (see FIG. 6) as shot data. The data is transferred to the generation unit 10b1g. Further, for example, the data DPB25, DPB26, DPB27, DPB28, DPB29, and DPB30 are distributed from the distributor 10b1d to the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, and 10b1e3b of the converter module 10b1e. The

  Next, as shown in FIG. 12, for example, the data DPB25, DPB26, DPB27, DPB28, DPB29, and DPB30 are processed in parallel by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, and 10b1e3b. The data is converted into format data, and the data processing ends at time t5 (see FIG. 14). Next, as shown in FIG. 13, for example, the drawing apparatus internal format data DPB25, DPB26, DPB27, DPB28, DPB29, DPB30 generated by parallel data processing by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, 10b1e3b Is stored in the output buffer 10b1f. Further, for example, the drawing apparatus internal format data DPB19, DPB20, DPB21, DPB22, DPB23, and DPB24 (see FIG. 12) stored in the output buffer 10b1f are grouped into the stripe frame STR4 (see FIG. 6) as shot data. The data is transferred to the generation unit 10b1g. Further, for example, the data DPB31, DPB32, DPB33, DPB34, DPB35, DPB36 are distributed from the distributor 10b1d to the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, 10b1e3b of the converter module 10b1e. The

  Next, as shown in FIG. 13, for example, the data DPB31, DPB32, DPB33, DPB34, DPB35, and DPB36 are processed in parallel by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, and 10b1e3b. The data is converted into format data, and the data processing ends at time t6 (see FIG. 14).

  That is, in the charged particle beam drawing apparatus 10 of the first embodiment, for example, the data processing speed of the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b (see FIG. 2) is the same as that of the data processing units 10b1e3a, 10b1e3b (see FIG. 2). When the data processing speed is faster, the data processing load of the graphic data DPB01, DPB02, DPB03, DPB04 (see FIG. 14) located in the block frames B01, B02, B03, B04 (see FIG. 6) The block frames B01, B02, B03, B04 and the block frames B05, B06 are set so as to be higher than the data processing load of the graphic data DPB05, DPB06 (see FIG. 14) located in B05, B06 (see FIG. 6). It is created and block frames B01, B02, B0 , B04 data processing unit 10b1e1a, 10b1e1b, 10b1e2a, assigned to 10B1e2b, block frame B05, B06 are assigned data processing unit 10B1e3a, the 10B1e3b.

  Therefore, according to the charged particle beam drawing apparatus 10 of the first embodiment, the data processing speed of the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b (see FIG. 2) and the data processing units 10b1e3a, 10b1e3b (see FIG. 2) Even when the data processing speed is different, the graphic data DPB01, DPB02, DPB02, B03, B04 (see FIG. 6) allocated to the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b Time t0 to t1 (see FIG. 14) required for data processing of DPB03 and DPB04 (see FIG. 14), and data of figures located in the block frames B05 and B06 (see FIG. 6) allocated to the data processing units 10b1e3a and 10b1e3b DPB0 It can be equal to the DPB06 time required for the data processing (see FIG. 14) t0 to t1 (see FIG. 14).

  In the example shown in FIGS. 7 to 14, the stripe frame STR1 (see FIG. 6) is divided by the distributed processing management module 10b1c (see FIG. 2), and the block frames B01, B02, B03, B04, B05, B06 (see FIG. 6). ) Is estimated when data DPB01, DPB02, DPB03, DPB04, DPB05, DPB06 (see FIG. 14) is processed, and data DPB01, DPB02, DPB03, DPB04, DPB05, DPB06 However, in the charged particle beam drawing apparatus 10 according to the first embodiment, the stripe frame STR1 is divided by the distributed processing management module 10b1c. Block frames B01, B02, B03, B04 The time required for data processing of the data DPB01, DPB02, DPB03, DPB04, DPB05, DPB06 estimated when the B05, B06 is created and the data processing of the data DPB01, DPB02, DPB03, DPB04, DPB05, DPB06 are actually The time required may not match.

  15 and 16 show the time required for data processing of the estimated data DPB01, DPB02, DPB03, DPB04, DPB05, and DPB06, and the actual processing required for data processing of the data DPB01, DPB02, DPB03, DPB04, DPB05, and DPB06. FIG. 10 is a diagram illustrating the time required for data processing of data DPB01, DPB02,..., DPB35, DPB36 by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, 10b1e3b when the times do not match. Specifically, FIG. 15 shows data processing units 10b1e1a, 10b1e1b in the case where the time actually required for data processing of data DPB05, DPB06 is longer than the time t0-t1 required for data processing of estimated data DPB05, DPB06. , 10b1e2a, 10b1e2b, 10b1e3a, 10b1e3b are diagrams showing the time required for data DPB01, DPB02, ..., DPB35, DPB36 to be processed. FIG. 16 shows data processing when the time actually required for data processing of data DPB01, DPB02, DPB03, and DPB04 is longer than the time t0 to t1 required for data processing of estimated data DPB01, DPB02, DPB03, and DPB04. FIG. 7 is a diagram illustrating a time required for data processing of data DPB01, DPB02,..., DPB35, DPB36 by the units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, 10b1e3b.

  In the example shown in FIG. 15, for example, the data DPB01, DPB02, DPB03, DPB04, DPB05, DPB06 are changed from the distributor 10b1d (see FIG. 2) to the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b of the converter module 10b1e (see FIG. 2). , 10b1e3a, 10b1e3b, and when the data processing is started at time t0, the data DPB01, DPB02, DPB03, DPB04, DPB05, DPB06 are converted into data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e3b, 10b1e3b, 10b1e3b, 10b1e3b Data is processed in parallel and converted into drawing apparatus internal format data, and data DPB01, DPB02, DP at time t1 03, the data processing of DPB04 is completed, the data processing of data DPB05, DPB06 is continued. Next, for example, rendering apparatus internal format data DPB01, DPB02, DPB03, and DPB04 generated by parallel data processing by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, and 10b1e2b are stored in the output buffer 10b1f (see FIG. 2). Further, for example, the data DPB07, DPB08, DPB09, DPB10 are distributed from the distributor 10b1d to the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b of the converter module 10b1e, and their data processing is started.

  Next, in the example shown in FIG. 15, for example, the data DPB07, DPB08, DPB09, DPB10 are processed in parallel by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b and converted into the internal format data of the drawing apparatus, and the time t2 These data processing ends, and the data processing of the data DPB05 and DPB06 is continued. Next, for example, rendering apparatus internal format data DPB07, DPB08, DPB09, and DPB10 generated by parallel data processing by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, and 10b1e2b are stored in the output buffer 10b1f (see FIG. 2). Since the data processing of the data DPB05 and DPB06 is not completed at this time (time t2), in the charged particle beam drawing apparatus 10 of the first embodiment, for example, by the distributed processing management module 10b1c (see FIG. 2). It is determined that the data processing by the data processing units 10b1e3a, 10b1e3b is delayed compared to the data processing by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b. Next, in the example illustrated in FIG. 15, for example, the allocation of the block frame B11 so that the block frame B11 (see FIG. 6) allocated to the data processing unit 10b1e3a by the distributed processing management module 10b1c is allocated to the data processing unit 10b1e1a. Is changed. Further, for example, the allocation of the block frame B12 is changed so that the block frame B12 (see FIG. 6) allocated to the data processing unit 10b1e3b by the distributed processing management module 10b1c is allocated to the data processing unit 10b1e1b. Next, in the example shown in FIG. 15, the data DPB11, DPB12, DPB13, DPB14 are distributed from the distributor 10b1d (see FIG. 2) to the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b of the converter module 10b1e (see FIG. 2). Those data processing is started.

  Next, in the example shown in FIG. 15, the data processing of the data DPB05, DPB06, DPB11, DPB12 is completed, and the data processing of the data DPB13, DPB14 is continued. Next, for example, drawing apparatus internal format data DPB05, DPB06, DPB11, and DPB12 generated by parallel data processing by the data processing units 10b1e1a, 10b1e1b, 10b1e3a, and 10b1e3b are stored in the output buffer 10b1f (see FIG. 2). Further, for example, the data DPB15, DPB16, DPB17, DPB18 are distributed from the distributor 10b1d (see FIG. 2) to the data processing units 10b1e1a, 10b1e1b, 10b1e3a, 10b1e3b of the converter module 10b1e (see FIG. 2). Be started.

  Next, in the example illustrated in FIG. 15, for example, the data processing of the data DPB13 and DPB14 ends at time t3, and the data processing of the data DPB15, DPB16, DPB17, and DPB18 is continued. Next, for example, drawing apparatus internal format data DPB13 and DPB14 generated by parallel data processing by the data processing units 10b1e2a and 10b1e2b are stored in the output buffer 10b1f (see FIG. 2). Further, for example, drawing apparatus internal format data DPB01, DPB02, DPB03, DPB04, DPB05, and DPB06 stored in the output buffer 10b1f (see FIG. 2) are collected in units of the stripe frame STR1 (see FIG. 6) and shot data. The data is transferred to the generation unit 10b1g. Further, for example, the drawing apparatus internal format data DPB07, DPB08, DPB09, DPB10, DPB11, DPB12 stored in the output buffer 10b1f are collected in units of the stripe frame STR2 (see FIG. 6) and transferred to the shot data generation unit 10b1g. Is done.

  In other words, in the charged particle beam drawing apparatus 10 of the first embodiment, first, for example, the drawing area DA (see FIG. 6) on the sample M (see FIG. 6) by the distributed processing management module 10b1c (see FIG. 2). striped frame STR2 frame of reference) (see FIG. 6) is divided, the block frame B11, B12 (see FIG. 6) is created. Next, for example, by the distributed processing management module 10b1c, the data processing units 10b1e3a, 10b1e3b (FIG. 2) having data processing speeds slower than the data processing speeds of the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b (see FIGS. 2 and 15). And block frames B11 and B12 are assigned to the frame. Next, for example, during the data processing of the data DPB05 and DPB06 regarding the block frames B05 and B06 in the stripe frame STR1 (see FIG. 6) by the data processing units 10b1e3a and 10b1e3b, the data processing units 10b1e1a, 10b1e1b, 10b1e2a, and 10b1e2b stripe frame STR 2 (see FIG. 6) block frame in B07, B08, B09, B10 on the data DPB07, DPB08, DPB09, when the data processing DPB10 is completed (time t2 (see FIG. 15)), the distributed processing management module 10b1c indicates that the data processing by the data processing units 10b1e3a, 10b1e3b is delayed compared to the data processing by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b. It is. Then, for example, by the distributed processing management module 10B1c, the data processing unit 10B1e3a, block frame B11, which was assigned to 10B1e3b, B12 data processing unit 10B1e1a, as allocated to 10B1e1b, is changed allocation of the block frame B11, B12 The

  Therefore, according to the charged particle beam drawing apparatus 10 of the first embodiment, data processing by the data processing units 10b1e3a, 10b1e3b (see FIGS. 2 and 15) is performed by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b (FIG. 2 and FIG. 2). The data processing unit 10b1e1a is compared with the case where the allocation of the block frames (for example, B11, B12 (see FIG. 6)) allocated to the data processing units 10b1e3a and 10b1e3b is not changed when compared with the data processing by (see FIG. 15). , 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, 10b1e3b, the total processing time of data DPB01, DPB02,..., DPB35, DPB36 (see FIG. 15) can be shortened, and the output buffer 10b1f (FIG. 2). It is possible to reduce the capacity of irradiation).

  In the example shown in FIG. 16, for example, the data DPB01, DPB02, DPB03, DPB04, DPB05, DPB06 are changed from the distributor 10b1d (see FIG. 2) to the data processing units 10b1e1a, 10b1e1b, 10b1e2a of the converter module 10b1e (see FIG. 2). , 10b1e2b, 10b1e3a, 10b1e3b, and when the data processing is started at time t0, the data DPB01, DPB02, DPB03, DPB04, DPB05, DPB06 are converted into data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e2b in parallel by 10b1e3b converted is data processing to the drawing device internal format data, data DPB05, DPB06 time t1 Data processing is completed, the data processing of the data DPB01, DPB02, DPB03, DPB04 is continued. Next, for example, drawing apparatus internal format data DPB05 and DPB06 generated by parallel data processing by the data processing units 10b1e3a and 10b1e3b are stored in the output buffer 10b1f (see FIG. 2). For example, the data DPB11 and DPB12 are distributed from the distributor 10b1d to the data processing units 10b1e3a and 10b1e3b of the converter module 10b1e, and their data processing is started.

  Next, in the example shown in FIG. 16, for example, the data DPB11 and DPB12 are processed in parallel by the data processing units 10b1e3a and 10b1e3b to be converted into drawing apparatus internal format data, and the data processing ends at time t2. The data processing of the data DPB01, DPB02, DPB03, DPB04 is continued. Next, for example, drawing apparatus internal format data DPB11 and DPB12 generated by parallel data processing by the data processing units 10b1e3a and 10b1e3b are stored in the output buffer 10b1f (see FIG. 2). Since the data processing of the data DPB01, DPB02, DPB03, DPB04 has not been completed at this time (time t2), in the charged particle beam drawing apparatus 10 of the first embodiment, for example, the distributed processing management module 10b1c (FIG. 2), it is determined that the data processing by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, and 10b1e2b is delayed compared to the data processing by the data processing units 10b1e3a and 10b1e3b. Next, in the example illustrated in FIG. 16, for example, the block frame B13 is allocated so that the block frame B13 (see FIG. 6) allocated to the data processing unit 10b1e1a by the distributed processing management module 10b1c is allocated to the data processing unit 10b1e3a. Is changed. Further, for example, the allocation of the block frame B14 is changed so that the block frame B14 (see FIG. 6) allocated to the data processing unit 10b1e1b by the distributed processing management module 10b1c is allocated to the data processing unit 10b1e3b. Next, in the example shown in FIG. 16, the data DPB13 and DPB14 are distributed from the distributor 10b1d (see FIG. 2) to the data processing units 10b1e3a and 10b1e3b of the converter module 10b1e (see FIG. 2), and their data processing is started. .

  Next, in the example shown in FIG. 16, the data processing of the data DPB01, DPB02, DPB03, DPB04 is completed, and the data processing of the data DPB13, DPB14 is continued. Next, for example, rendering apparatus internal format data DPB01, DPB02, DPB03, and DPB04 generated by parallel data processing by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, and 10b1e2b are stored in the output buffer 10b1f (see FIG. 2). Further, for example, the data DPB07, DPB08, DPB09, and DPB10 are allocated from the distributor 10b1d (see FIG. 2) to the data processing units 10b1e1a, 10b1e1b, 10b1e2a, and 10b1e2b of the converter module 10b1e (see FIG. 2). Be started.

  Next, in the example illustrated in FIG. 16, for example, the data processing of the data DPB07, DPB08, DPB09, and DPB10 ends, and the data processing of the data DPB13 and DPB14 is continued. Next, for example, rendering apparatus internal format data DPB07, DPB08, DPB09, and DPB10 generated by parallel data processing by the data processing units 10b1e1a, 10b1e1b, 10b1e2a, and 10b1e2b are stored in the output buffer 10b1f (see FIG. 2). Further, for example, drawing apparatus internal format data DPB01, DPB02, DPB03, DPB04, DPB05, and DPB06 stored in the output buffer 10b1f (see FIG. 2) are collected in units of the stripe frame STR1 (see FIG. 6) and shot data. The data is transferred to the generation unit 10b1g.

  In other words, in the charged particle beam drawing apparatus 10 of the first embodiment, first, for example, the drawing area DA (see FIG. 6) on the sample M (see FIG. 6) by the distributed processing management module 10b1c (see FIG. 2). Stripe frame STR3 (see FIG. 6) is divided to create block frames B13 and B14 (see FIG. 6). Next, for example, by the distributed processing management module 10b1c, the data processing units 10b1e1a and 10b1e1b (see FIGS. 2 and 16) having a data processing speed higher than the data processing speed of the data processing units 10b1e3a and 10b1e3b (see FIGS. 2 and 16). ) Are assigned block frames B13 and B14. Next, for example, during data processing of the data DPB01 and DPB02 related to the block frames B01 and B02 in the stripe frame STR1 (see FIG. 6) by the data processing units 10b1e1a and 10b1e1b, the next stripe frame STR2 by the data processing units 10b1e3a and 10b1e3b ( Data processing by the data processing units 10b1e1a and 10b1e1b is performed by the distributed processing management module 10b1c when the data processing of the data DPB11 and DPB12 related to the block frames B11 and B12 in (in FIG. 6) is completed (time t2 (see FIG. 16)). Is delayed from the data processing by the data processing units 10b1e3a and 10b1e3b. Next, for example, the allocation of the block frames B13 and B14 is changed by the distributed processing management module 10b1c so that the block frames B13 and B14 allocated to the data processing units 10b1e1a and 10b1e1b are allocated to the data processing units 10b1e3a and 10b1e3b. The

  Hereinafter, a third embodiment of the charged particle beam drawing apparatus of the present invention will be described. FIG. 17 is a detailed view of the shot data generation unit 10b1g of the charged particle beam drawing apparatus 10 according to the third embodiment. The shot data generation unit 10b1g (see FIG. 17) of the charged particle beam drawing apparatus 10 of the third embodiment is the same as the shot data generation unit 10b1g (see FIG. 2) of the charged particle beam drawing apparatus 10 of the first embodiment. It is configured. Specifically, the data processing status of the shot data generation unit 10b1g of the charged particle beam drawing apparatus 10 of the third embodiment shown in FIG. 17 is the shot of the charged particle beam drawing apparatus 10 of the first embodiment shown in FIG. This roughly corresponds to the data processing status of the data generation unit 10b1g.

  In the charged particle beam drawing apparatus 10 of the third embodiment, as shown in FIG. 17, for example, as in the charged particle beam drawing apparatus 10 of the first embodiment, for example, data processing of the node 10b1g1 of the shot data generation unit 10b1g The drawing apparatus internal format data DPB01 in units of the block frame B01 (see FIG. 6) transferred to the unit 10b1g1a is processed by the data processing unit 10b1g1a to generate shot data. In addition, the rendering apparatus internal format data DPB02 of the block frame B02 (see FIG. 6) transferred to the data processing unit 10b1g1b of the shot data generation unit 10b1g is parallel to the data processing by the data processing unit 10b1g1a, and the data processing unit 10b1g1b. Is processed to generate shot data. Further, the drawing device internal format data DPB03 in units of the block frame B03 (see FIG. 6) transferred to the data processing unit 10b1g2a of the node 10b1g2 of the shot data generation unit 10b1g is parallel to the data processing by the data processing units 10b1g1a and 10b1g1b. The data processing unit 10b1g2a performs data processing to generate shot data. In addition, drawing device internal format data DPB04 transferred to the data processing unit 10b1g2b of the shot data generation unit 10b1g in units of the block frame B04 (see FIG. 6) is parallel to the data processing by the data processing units 10b1g1a, 10b1g1b, and 10b1g2a. Data processing is performed by the data processing unit 10b1g2b to generate shot data. Further, the rendering apparatus internal format data DPB05 in units of the block frame B05 (see FIG. 6) transferred to the data processing unit 10b1g3a of the node 10b1g3 of the shot data generation unit 10b1g is processed by the data processing units 10b1g1a, 10b1g1b, 10b1g2a, and 10b1g2b. In parallel, the data processing unit 10b1g3a performs data processing to generate shot data. Further, the rendering device internal format data DPB06 transferred to the data processing unit 10b1g3b of the shot data generation unit 10b1g in units of the block frame B06 (see FIG. 6) is subjected to data processing by the data processing units 10b1g1a, 10b1g1b, 10b1g2a, 10b1g2b, and 10b1g3a. In parallel, the data processing unit 10b1g3b performs data processing to generate shot data.

  In the charged particle beam drawing apparatus 10 of the first embodiment, for example, based on the data processing speed of the data processing units 10b1e1a, 10b1e1b, 10b1e2a, 10b1e2b, 10b1e3a, and 10b1e3b (see FIG. 2) of the converter module 10b1e. 10b1c (see FIG. 2) divides the stripe frames STR1, STR2, STR3, STR4, STR5, STR6 (see FIG. 6) to create block frames B01, B02,..., B35, B36 (see FIG. 6). However, in the charged particle beam drawing apparatus 10 of the third embodiment, instead, for example, the data processing units 10b1g1a, 10b1g1b, 10b1g2a, 10b1g2b, 10b1g3a, 10b1g3b (see FIG. 17) of the shot data generation unit 10b1g. ) Is divided into strip frames STR1, STR2, STR3, STR4, STR5, STR6 (see FIG. 6) by the distributed processing management module 10b1c (see FIG. 2), and block frames B01, B02,. B35 and B36 (see FIG. 6) are created.

  In the charged particle beam drawing apparatus 10 according to the third embodiment, for example, the data processing units 10b1g1a, 10b1g1b, 10b1g2a, and 10b1g2b (see FIG. 17) having a high data processing speed and the data processing units 10b1g3a, 10b1g3a, 10b1g3b (see FIG. 17) is provided in the shot data generation unit 10b1g (see FIG. 17). Specifically, in the example illustrated in FIGS. 6 and 17, for example, the data processing speeds of the data processing units 10b1g1a, 10b1g1b, 10b1g2a, and 10b1g2b are equal to each other, and the data processing speeds of the data processing units 10b1g3a and 10b1g3b are equal to each other. It has become.

  Therefore, in the charged particle beam drawing apparatus 10 according to the third embodiment, for example, the data processing load of the drawing apparatus internal format data DPB01 (see FIG. 17) in units of the block frame B01 (see FIG. 6) (that is, within the block frame B01). Data processing load of graphic data located in FIG. 6), data processing load of drawing device internal format data DPB02 (see FIG. 17) in units of block frame B02 (see FIG. 6), drawing device in units of block frame B03 (see FIG. 6) The data processing load of the internal format data DPB03 (see FIG. 17) and the data processing load of the drawing apparatus internal format data DPB04 (see FIG. 17) in units of the block frame B04 (see FIG. 6) are the block frame B05 (see FIG. 6). ) Data processing of unit drawing device internal format data DPB05 (see FIG. 17) The stripe frame STR1 (see FIG. 6) is divided into block frames so as to be higher than the load and the data processing load of the drawing apparatus internal format data DPB06 (see FIG. 17) in units of the block frame B06 (see FIG. 6). B01, B02, B03, B04, B05, B06 are created. Specifically, in the example shown in FIG. 17, for example, the time required for the data processing unit 10b1g1a to process the drawing device internal format data DPB01 and the data processing unit 10b1g1b process the drawing device internal format data DPB02. Required for the data processing unit 10b1g2a to process the drawing device internal format data DPB03, and the data processing unit 10b1g2b to process the drawing device internal format data DPB04. The time required for the data processing unit 10b1g3a to process the drawing device internal format data DPB05 and the data processing unit 10b1g3b to convert the drawing device internal format data DPB06 As the time required for being data processed is equal, block frame B01, B02, B03, B04, B05, B06 are created. Furthermore, the distributed processing management module 10b1c (see FIG. 2) assigns the block frame B01 to the data processing unit 10b1g1a, the block frame B02 to the data processing unit 10b1g1b, and the block frame B03 to the data processing unit 10b1g2a. The block frame B04 is allocated to the data processing unit 10b1g2b, the block frame B05 is allocated to the data processing unit 10b1g3a, and the block frame B06 is allocated to the data processing unit 10b1g3b.

  Hereinafter, a fourth embodiment of the charged particle beam drawing apparatus of the present invention will be described. Figure 18 is a correction module 10B1j, detailed view of such an output buffer 10B1f 'of the charged particle beam drawing apparatus 10 of the fourth embodiment. In the charged particle beam drawing apparatus 10 of the fourth embodiment, as shown in FIG. 18, for example, the proximity effect, fogging and / or loading effect (see paragraph [0004] of Japanese Patent Laid-Open No. 2007-220728) is corrected. The correction module 10b1j is provided separately from the converter module 10b1d (see FIG. 2). Further, for example, based on the data processing speed of the data processing units 10b1j1a, 10b1j1b, 10b1j2a, 10b1j2b, 10b1j3a, and 10b1j3b (see FIG. 18) of the correction module 10b1j, the distributed processing management module 10b1c (see FIG. 2) The block frames B01, B02,..., B35, B36 (see FIG. 6) for the correction module 10b1j are created separately from the block frames B01, B02,.

  In the charged particle beam drawing apparatus 10 according to the fourth embodiment, for example, the data processing units 10b1j1a, 10b1j1b, 10b1j2a, and 10b1j2b (see FIG. 18) having a high data processing speed, and the data processing units 10b1j3a, 10b1j3a, 10b1j3b (see FIG. 18) is provided in the correction module 10b1j (see FIG. 18). Specifically, in the example illustrated in FIG. 18, for example, the data processing speeds of the data processing units 10b1j1a, 10b1j1b, 10b1j2a, and 10b1j2b are equal to each other, and the data processing speeds of the data processing units 10b1j3a and 10b1j3b are equal to each other. .

  Therefore, in the charged particle beam drawing apparatus 10 according to the fourth embodiment, for example, the data processing load of the data DPB01 (see FIG. 18) in units of the block frame B01 (see FIG. 6) (that is, the figure positioned in the block frame B01) Data processing load), data processing load of data DPB02 (see FIG. 18) in block frame B02 (see FIG. 18), data processing of data DPB03 (see FIG. 18) in block frame B03 (see FIG. 6) The load and the data processing load of the data DPB04 (see FIG. 18) in the unit of the block frame B04 (see FIG. 18) are the data processing load of the data DPB05 (see FIG. 18) in the unit of the block frame B05 (see FIG. 6). The data processing load of the data DPB06 (see FIG. 18) in units of the block frame B06 (see FIG. 6) is higher than the data processing load. Ripe frame STR 1 (see FIG. 6) is divided block frame B01, B02, B03, B04, B05, B06 are created. Specifically, for example, the time required for the data DPB01 to be processed by the data processor 10b1j1a (see FIG. 18) and the time required for the data DPB02 to be processed by the data processor 10b1j1b (see FIG. 18). And the time required for the data DPB03 to be processed by the data processor 10b1j2a (see FIG. 18), the time required for the data DPB04 to be processed by the data processor 10b1j2b (see FIG. 18), and the data processing Block 10b1j3a (see FIG. 18) and the time required for data DPB05 to be processed by the data processor 10b1j3b (see FIG. 18) are equal to the time required for data DPB06 to be processed by the data processor 10b1j3b (see FIG. 18). Frames B01, B02, B0 , B04, B05, B06 is created. Further, the distributed processing management module 10b1c (see FIG. 2) assigns the block frame B01 to the data processing unit 10b1j1a, the block frame B02 to the data processing unit 10b1j1b, and the block frame B03 to the data processing unit 10b1j2a. The block frame B04 is allocated to the data processing unit 10b1j2b, the block frame B05 is allocated to the data processing unit 10b1j3a, and the block frame B06 is allocated to the data processing unit 10b1j3b.

  Specifically, in the charged particle beam drawing apparatus 10 of the fourth embodiment, for example, drawing data D corresponding to the entire drawing area DA (see FIGS. 5 and 6) on the sample M (see FIGS. 5 and 6). When (see FIG. 7) is input to the control computer 10b1 (see FIG. 7), it is read by the reading module 10b1a (see FIG. 7) and stored in the input buffer 10b1b (see FIG. 7). Next, for example, the distributor (localizer) 10b1d ′ (see FIG. 18) provided separately from the distributor (localizer) 10b1d (see FIG. 7) draws the drawing data D into a plurality of block frames B01, B02,. B18, ... (see FIG. 6) unit of data DPB01, DPB02, ..., DPB17, DPB18, read is divided into ... (see Figure 18). Next, as shown in FIG. 18, for example, the data DPB01, DPB02, DPB03, DPB04, DPB05, DPB06 are distributed from the distributor 10b1d ′ to the data processing units 10b1j1a, 10b1j1b, 10b1j2b2 of the nodes 10b1j1, 10b1j2, 10b1j3 of the correction module 10b1j. , 10b1j3a, 10b1j3b, and data processing thereof is started.

  In the charged particle beam drawing apparatus 10 according to the fourth embodiment, as shown in FIG. 18, for example, data DPB01 in units of a block frame B01 (see FIG. 6) is processed by the data processing unit 10b1j1a. And / or a loading effect correction process is performed. Further, the data DPB02 in units of the block frame B02 (see FIG. 6) is processed by the data processing unit 10b1j1b in parallel with the data processing by the data processing unit 10b1j1a, and the proximity effect, fogging and / or loading effect is corrected. Is called. Further, the data DPB03 of the block frame B03 (see FIG. 6) unit is processed by the data processing unit 10b1j2a in parallel with the data processing by the data processing units 10b1j1a and 10b1j1b to correct the proximity effect, fogging and / or loading effect. Is done. Further, the data DPB04 in units of the block frame B04 (see FIG. 6) is processed by the data processing unit 10b1j2b in parallel with the data processing by the data processing units 10b1j1a, 10b1j1b, 10b1j2a, and the proximity effect, fogging and / or loading effect Is corrected. Further, the data DPB05 in units of the block frame B05 (see FIG. 6) is processed by the data processing unit 10b1j3a in parallel with the data processing by the data processing units 10b1j1a, 10b1j1b, 10b1j2a, 10b1j2b, and the proximity effect, fog and / or The loading effect is corrected. Further, the data DPB06 of the block frame B06 (see FIG. 6) unit is processed by the data processing unit 10b1j3b in parallel with the data processing by the data processing units 10b1j1a, 10b1j1b, 10b1j2a, 10b1j2b, 10b1j3a, and the proximity effect, fogging and / Or correction of loading effect.

  In the fifth embodiment, the above-described first to fourth embodiments can be appropriately combined.

10 charged particle beam drawing apparatus 10a1b charged particle beam 10b1e converter module 10b1e1, 10b1e2, 10b1e3 data processing unit 10b1e4, 10b1e5, 10b1e6 data processing unit D drawing data DA drawing area B01, B02, B03, B04, B05, B06 block frame DPB01, DPB02, DPB03 data DPB04, DPB05, DPB06 data

Claims (5)

A block frame creation unit that creates at least a first block frame and a second block frame by dividing a drawing region on a sample on which a pattern corresponding to a figure included in the drawing data is drawn;
A first data processing unit for data processing the data in the figure located in the first block frame and one block frame of the second block frame,
In parallel with the data processing by the first data processing unit, a second data processing unit for processing data of a graphic located in the other block frame of the first block frame and the second block frame;
A block frame assigning unit that assigns one of the first block frame and the second block frame to the first data processing unit and assigns the other of the first block frame and the second block frame to the second data processing unit;
A drawing unit for drawing the drawing area on the sample by the charged particle beam a pattern corresponding to a figure included in the drawing data,
A graphic in which the data processing load of data of a graphic located in the first block frame is located in the second block frame when the data processing speed of the first data processing unit is faster than the data processing speed of the second data processing unit The first block frame and the second block frame are created so as to be higher than the data processing load of the data, the first block frame is assigned to the first data processing unit, and the second block frame is assigned to the second data processing unit. A charged particle beam drawing apparatus comprising: a management unit to be assigned.   A third block frame is created by dividing the drawing region on the sample, and after the third block frame is assigned to one of the first data processing unit and the second data processing unit, the first data processing unit and the second data processing unit When it is determined that data processing by one of the data processing units is delayed compared to data processing by the other of the first data processing unit and the second data processing unit, the allocation of the third block frame is assigned to the first data processing unit. The charged particle beam drawing apparatus according to claim 1, further comprising a changing unit that changes from one of the second data processing unit to the other of the first data processing unit and the second data processing unit. Creating at least a first block frame and a second block frame by dividing a drawing area on a sample on which a pattern corresponding to a figure included in the drawing data is drawn;
Assigning the first block frame to one of the first data processing unit and the second data processing unit and assigning the second block frame to the other of the first data processing unit and the second data processing unit;
The graphic data located in the block frame assigned to the first data processing unit is processed by the first data processing unit, and the graphic data located in the block frame assigned to the second data processing unit is Data processing by the second data processing unit in parallel with the data processing by one data processing unit,
In a charged particle beam drawing method for drawing a pattern corresponding to a figure included in drawing data on a drawing region on a sample by a charged particle beam,
A graphic in which the data processing load of data of a graphic located in the first block frame is located in the second block frame when the data processing speed of the first data processing unit is faster than the data processing speed of the second data processing unit The first block frame and the second block frame are created so as to be higher than the data processing load of the data, the first block frame is assigned to the first data processing unit, and the second block frame is assigned to the second data processing unit. A charged particle beam writing method characterized by assigning. After the third block frame is created by dividing the drawing area on the sample, and the third block frame is assigned to the second data processing unit having a data processing speed slower than the data processing speed of the first data processing unit , when the data processing by the second data processing unit is determined to be delayed as compared with the data processing by the first data processing unit,
4. The charged particle beam drawing method according to claim 3, wherein the assignment of the third block frame is changed from the second data processing unit to the first data processing unit. After the fourth block frame is created by dividing the drawing area on the sample and the fourth block frame is assigned to the first data processing unit having a data processing speed higher than the data processing speed of the second data processing unit. , when the data processing by the first data processing unit is determined to be delayed as compared with the data processing by the second data processing unit,
5. The charged particle beam drawing method according to claim 3, wherein the assignment of the fourth block frame is changed from the first data processing unit to the second data processing unit.

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