JP2011057467A - Single crystal pulling apparatus - Google Patents

Single crystal pulling apparatus Download PDF

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JP2011057467A
JP2011057467A JP2009205754A JP2009205754A JP2011057467A JP 2011057467 A JP2011057467 A JP 2011057467A JP 2009205754 A JP2009205754 A JP 2009205754A JP 2009205754 A JP2009205754 A JP 2009205754A JP 2011057467 A JP2011057467 A JP 2011057467A
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single crystal
observation window
observation
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pulling apparatus
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JP5409215B2 (en
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Fukuo Ogawa
福生 小川
Toshimichi Kubota
利通 久保田
Tsunenari Tomonaga
恒成 朝長
Yasuto Narushima
康人 鳴嶋
Masayuki Utsu
雅之 宇都
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Sumco Techxiv Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To observe a semiconductor crystal or a specified observing position in a crucible from the outside of a chamber without reducing the quality of a semiconductor single crystal by the occurrence of a turbulent flow in a laminar flow tube. <P>SOLUTION: At least one flat plate-shaped observing window 31 is set on the laminar flow tube 15 in a single crystal pulling apparatus 10. The observing window 31 is made of the same quartz glass material as the laminar flow tube 15. The unification of the laminar flow tube 15 and the observing window 31 is performed by welding. The observing window 31 is arranged at a position where an inspection window 18 in the single crystal pulling apparatus 10 and a specified observing position 25 are in series, and the specified observing position 25 is observed from the outside of the chamber 11. <P>COPYRIGHT: (C)2011,JPO&amp;INPIT

Description

本発明は、チョクラルスキー法による単結晶引上装置に関し、特に、チャンバ内に不活性ガスを誘導する整流筒を有する単結晶引上装置に関する。   The present invention relates to a single crystal pulling apparatus according to the Czochralski method, and more particularly to a single crystal pulling apparatus having a rectifying cylinder for inducing an inert gas in a chamber.

チョクラルスキー法を利用して、半導体単結晶を製造する単結晶引上装置においては、融液表面から蒸発するSiOが、単結晶の表面や、坩堝周辺の部品に凝縮、固着する現象が生じる。このため、その固着したSiOがまた剥離してシリコン融液に混入し、成長中のシリコン単結晶が多結晶化し、結果としてシリコン単結晶の収率が低下するという問題が知られている。   In a single crystal pulling apparatus for manufacturing a semiconductor single crystal using the Czochralski method, a phenomenon occurs in which SiO evaporated from the surface of the melt condenses and adheres to the surface of the single crystal and parts around the crucible. . For this reason, there is a problem that the fixed SiO is peeled off and mixed into the silicon melt, and the growing silicon single crystal is polycrystallized, resulting in a decrease in the yield of the silicon single crystal.

この問題に対処するため、坩堝に収容されたシリコン融液の上方に整流筒を配置して、単結晶成長時にこの整流筒内を通して単結晶を引上げるとともに、Ar等の不活性ガスを上方よりシリコン融液に向けて誘導して、この融液面上に流入させるようにした構成が知られている(例えば、特許文献1、2参照)。この構成によれば、融液表面から蒸発するSiOを不活性ガスに取り込み、排出口からチャンバ外に効率良く排出することができる。   In order to cope with this problem, a rectifying cylinder is disposed above the silicon melt contained in the crucible, and the single crystal is pulled up through the rectifying cylinder during single crystal growth, and an inert gas such as Ar is introduced from above. A configuration is known in which it is guided toward the silicon melt and allowed to flow onto the melt surface (see, for example, Patent Documents 1 and 2). According to this configuration, SiO evaporated from the melt surface can be taken into the inert gas and efficiently discharged out of the chamber through the discharge port.

一方、単結晶引上の絞り工程においては、種結晶を無転位化させるために直径を細く絞りつつ、引き上げられる単結晶の重量に耐えうるように所定の太さの直径を確保することが必要である。したがって、結晶の絞り直径を精度良く測定し、適切に制御することが重要である。このため、従来の単結晶引上装置では、整流筒が無い場合、チャンバの肩部に覗き窓を設け、この覗き窓の外側にCCDカメラ等のカメラを配置し、チャンバ内の絞り直径を測定することが行われている。また、チャンバには、坩堝内のシリコン材料加熱時のシリコンの溶融状況を確認する等の種々の目的でも、覗き窓が設けられている。   On the other hand, in the drawing process of pulling a single crystal, it is necessary to secure a diameter of a predetermined thickness so as to withstand the weight of the pulled single crystal while narrowing the diameter to make the seed crystal dislocation-free. It is. Therefore, it is important to accurately measure the aperture diameter of the crystal and control it appropriately. For this reason, in the conventional single crystal pulling apparatus, when there is no rectifying cylinder, a viewing window is provided on the shoulder of the chamber, and a camera such as a CCD camera is arranged outside the viewing window, and the aperture diameter in the chamber is measured. To be done. The chamber is also provided with a viewing window for various purposes such as checking the melting state of silicon when the silicon material in the crucible is heated.

しかしながら、上述のように整流筒を設けた場合、整流筒が透明な素材ではない場合は、覗き窓から整流筒の下方の所望の位置を観察できないという問題点がある。また、整流筒が例えば石英ガラス等の透明素材で形成される場合も、整流筒の湾曲した形状や歪みにより所望の位置の正確な測定や観察が困難になるという問題がある。   However, when the rectifying cylinder is provided as described above, there is a problem in that a desired position below the rectifying cylinder cannot be observed from the viewing window if the rectifying cylinder is not a transparent material. Further, even when the rectifying cylinder is formed of a transparent material such as quartz glass, there is a problem that accurate measurement and observation of a desired position becomes difficult due to the curved shape and distortion of the rectifying cylinder.

このため、カーボン製の整流筒に窓部を設けて、この窓部に透明な石英ガラス部材を嵌め込んで、覗き窓から整流筒の内部を観察できるようにした単結晶引上装置が知られている(例えば、特許文献3参照)。しかし、特許文献3に開示された整流筒では、整流筒と窓部に嵌め込まれる部材との接合部分に隙間や段差等が生じ、整流筒内に乱流を発生させSiOの除去性能を低下させるという問題点を有する。また、石英ガラスがカーボンの整流筒と同じ径で曲がっているので、石英ガラスに歪みが生じ所望の位置の正確な測定や観測が困難になるという問題がある。   For this reason, there is known a single crystal pulling apparatus in which a window portion is provided in a rectifying cylinder made of carbon, and a transparent quartz glass member is fitted into the window section so that the inside of the rectifying cylinder can be observed from the viewing window. (For example, refer to Patent Document 3). However, in the rectifying cylinder disclosed in Patent Document 3, a gap, a step, or the like is generated at a joint portion between the rectifying cylinder and a member fitted into the window portion, and turbulent flow is generated in the rectifying cylinder to reduce SiO removal performance. Has the problem. Further, since the quartz glass is bent with the same diameter as the carbon rectifying cylinder, there is a problem that the quartz glass is distorted and it is difficult to accurately measure and observe a desired position.

特開2007−112663号公報JP 2007-112663 A 特開2008−179515号公報JP 2008-179515 A 特開平10−158091号公報Japanese Patent Laid-Open No. 10-158091

したがって、これらの点に着目してなされた本発明の目的は、整流筒内の乱流発生を抑制することで、半導体単結晶の品質を低下させることなく、チャンバの外部から半導体結晶または坩堝内の所定の観察位置を正確に観察することができる単結晶引上装置を提供することにある。   Accordingly, the object of the present invention, which has been focused on these points, is to suppress the generation of turbulent flow in the rectifying cylinder, so that the quality of the semiconductor single crystal is not reduced, and the semiconductor crystal or crucible is externally supplied from the outside of the chamber. An object of the present invention is to provide a single crystal pulling apparatus capable of accurately observing a predetermined observation position.

上記目的を達成するため、本発明に従う単結晶引上装置は、
斜め上方に位置する覗き窓を有するチャンバと、
このチャンバの上部に設けられ、前記チャンバ内部に不活性ガスを導入する不活性ガス導入部と、
前記チャンバ内に配置され単結晶の原料の融液を収納可能な坩堝と、
該坩堝に対して種結晶および融液から成長させた単結晶を相対的に昇降可能な引上げ機構と、
前記引上げ機構により引上げられる単結晶が上昇可能な内部空間を持ち、下端が前記融液の表面近傍に位置し、前記不活性ガス導入部から導入される不活性ガスを融液表面に案内する円筒状の整流筒とを備え、
前記整流筒は、透明で且つ平板状の観察窓を有し、該観察窓は前記整流筒と同一の材料により構成され、前記覗き窓および所定の観察位置と直列となる位置に配置されていることを特徴とするものである。
In order to achieve the above object, a single crystal pulling apparatus according to the present invention comprises:
A chamber having a viewing window located obliquely above;
An inert gas introduction part that is provided in an upper portion of the chamber and introduces an inert gas into the chamber;
A crucible disposed in the chamber and capable of storing a melt of a single crystal raw material;
A pulling mechanism capable of moving up and down relatively the single crystal grown from the seed crystal and the melt with respect to the crucible;
A cylinder having an internal space in which a single crystal pulled by the pulling mechanism can be lifted and having a lower end positioned in the vicinity of the surface of the melt and guiding the inert gas introduced from the inert gas introduction portion to the melt surface And a straight rectifying cylinder,
The rectifying tube has a transparent and flat plate-like observation window, and the observation window is made of the same material as the rectifying tube, and is arranged at a position in series with the viewing window and a predetermined observation position. It is characterized by this.

また、前記整流筒および前記観察窓は、ともに石英ガラスにより構成され、一体化されていることが好ましく、加えて、前記整流筒と前記観察窓との一体化は、溶接によって行われていることがより好適である。   The rectifying cylinder and the observation window are preferably both made of quartz glass and integrated, and in addition, the rectification cylinder and the observation window are integrated by welding. Is more preferred.

さらに、前記観察窓は、前記整流筒の横断面の外周における前記観察窓が設けられている部分の中心角が45度以下となる横幅を有することが好ましい。   Furthermore, it is preferable that the observation window has a lateral width in which a central angle of a portion where the observation window is provided on an outer periphery of a cross section of the rectifying cylinder is 45 degrees or less.

また、前記整流筒の内側面の前記観察窓との接合部は、R加工が施されていることを特徴とするものである。   In addition, the joint portion between the inner side surface of the rectifying cylinder and the observation window is subjected to R processing.

本発明の実施形態としては、前記覗き窓の外方であって、前記所定の観察位置、観察窓および覗き窓とともに直列となる位置に測定用のカメラを設け、前記単結晶の絞り工程における絞り直径を測定するか、あるいは、前記単結晶引上装置の熱遮蔽板の下端と前記坩堝内の融液表面との間の距離であるギャップを測定することが好ましい。   As an embodiment of the present invention, a measurement camera is provided outside the viewing window and in a position in series with the predetermined observation position, the observation window and the viewing window, and the diaphragm in the single crystal diaphragming step It is preferable to measure the diameter or to measure the gap, which is the distance between the lower end of the heat shielding plate of the single crystal pulling apparatus and the melt surface in the crucible.

本発明の他の実施形態としては、少なくともそれぞれ2つの前記覗き窓と前記観察窓とを有し、前記覗き窓の1つに向けてカメラが設けられ前記所定の観察位置を観測するとともに、他の覗き窓からは前記所定の位置を目視できるように構成されていることが好ましい。   Another embodiment of the present invention includes at least two viewing windows and an observation window, and a camera is provided for one of the viewing windows to observe the predetermined observation position. It is preferable that the predetermined position is visible from the viewing window.

また、前記チャンバは他の覗き窓を有し、且つ、前記整流筒は透明で平板状の他の観察窓を有し、該他の観察窓は、前記整流筒と同一の材料により構成され、前記他の覗き窓および前記所定の観察位置と直列となる位置に配置することもできる。   In addition, the chamber has another viewing window, and the flow straightening tube has another transparent and flat observation window, and the other observation window is made of the same material as the flow straightening tube, It can also be arranged at a position in series with the other viewing window and the predetermined observation position.

その場合、前記覗き窓の外方であって、前記所定の観察位置、観察窓および覗き窓とともに直列となる位置に測定用のカメラを設け、前記所定の観察位置を観察するとともに、前記他の覗き窓からは前記所定の位置を目視できるようにすることが好適である。   In that case, a camera for measurement is provided at a position outside the viewing window and in series with the predetermined observation position, the observation window and the observation window, and the other observation position is observed. It is preferable that the predetermined position can be seen from the viewing window.

あるいは、前記チャンバは他の覗き窓を有し、前記整流筒は透明で平板状の他の観察窓を有し、該他の観察窓は前記整流筒と同一の材料により構成され、前記他の覗き窓および他の所定の観察位置と直列となる位置に配置される。   Alternatively, the chamber has another viewing window, the flow straightening tube has another observation plate that is transparent and has a flat plate shape, and the other observation window is made of the same material as the flow straightening tube, It is arranged at a position that is in series with the viewing window and other predetermined observation positions.

または、前記チャンバは他の覗き窓を有し、該他の覗き窓は前記観察窓および他の所定の観察位置と直列となる位置に配置する。   Alternatively, the chamber has another viewing window, and the other viewing window is arranged at a position in series with the observation window and another predetermined observation position.

あるいは、前記整流筒は透明で且つ平板状の他の観察窓を有し、該他の観察窓は前記整流筒と同一の材料により構成され、前記覗き窓および他の所定の観察位置と直列となる位置に配置する。   Alternatively, the rectifying cylinder has another observation window that is transparent and has a flat plate shape, and the other observation window is made of the same material as the rectification cylinder, and is in series with the observation window and other predetermined observation positions. Place at the position.

本発明によれば、整流筒は、透明で且つ平板状の観察窓を有し、この観察窓は整流筒と同一の材料により構成され、覗き窓および所定の観察位置と直列となる位置に配置されているので、整流筒内の乱流発生を抑制しつつ、チャンバの外部から半導体結晶または坩堝内の所定の観察位置を正確に観察することができる。   According to the present invention, the rectifying cylinder has a transparent and flat plate-like observation window, and this observation window is made of the same material as the rectifying cylinder and is arranged at a position in series with the observation window and a predetermined observation position. Therefore, it is possible to accurately observe a predetermined observation position in the semiconductor crystal or the crucible from the outside of the chamber while suppressing the generation of turbulent flow in the rectifying cylinder.

本発明の第1実施の形態に係る単結晶引上げ装置の概略構成を示す模式図である。It is a mimetic diagram showing a schematic structure of a single crystal pulling device concerning a 1st embodiment of the present invention. 図1の整流筒を示したものであって、(a)は斜視図、(b)は平面図である。FIGS. 2A and 2B illustrate the flow straightening cylinder of FIG. 1, in which FIG. 1A is a perspective view and FIG. 図1の整流筒の観察窓の接合部の形状を示したものであって、(a)は観察窓位置での横断面図、(b)は、(a)に示す二点鎖線の円で囲まれた部分Xの拡大断面図である。It shows the shape of the junction part of the observation window of the rectifying cylinder of FIG. 1, (a) is a cross-sectional view at the position of the observation window, (b) is a circle of a two-dot chain line shown in (a) It is an expanded sectional view of the enclosed part X. 図1の整流筒の寸法を示す説明図である。It is explanatory drawing which shows the dimension of the rectification | straightening cylinder of FIG. 本発明の第2実施の形態に係る単結晶引上げ装置の整流筒を示したものであって、(a)は斜視図、(b)は平面図である。The rectification | straightening cylinder of the single crystal pulling apparatus which concerns on 2nd Embodiment of this invention is shown, Comprising: (a) is a perspective view, (b) is a top view. 本発明の第2実施の形態に係る単結晶引上げ装置の整流筒を示す斜視図である。It is a perspective view which shows the rectification | straightening cylinder of the single crystal pulling apparatus which concerns on 2nd Embodiment of this invention.

(第1実施の形態)
以下、本発明の実施の形態について、図面を参照して説明する。
(First embodiment)
Embodiments of the present invention will be described below with reference to the drawings.

図1は、本発明の第1実施の形態に係る単結晶引上げ装置の概略構成を示す模式図である。この単結晶引上げ装置10は、チャンバ11と、坩堝12と、ヒータ13と、断熱体14と、整流筒15と、熱遮蔽板16と、引上げ機構(図示せず)とで主として構成される。   FIG. 1 is a schematic diagram showing a schematic configuration of a single crystal pulling apparatus according to a first embodiment of the present invention. This single crystal pulling apparatus 10 is mainly composed of a chamber 11, a crucible 12, a heater 13, a heat insulator 14, a rectifying cylinder 15, a heat shielding plate 16, and a pulling mechanism (not shown).

チャンバ11は、上部は径が小さく下部は径が大きな外部雰囲気から密閉された容器であり、径の大きな下部には、坩堝12、ヒータ13、断熱体14等が収容されている。チャンバ11の上部には、チャンバ内部に不活性ガスを導入する図示しない不活性ガス導入部が設けられ、整流筒15内に不活性ガスを流入させるように構成されている。また、チャンバ11の下部には不活性ガスの排出口17が設けられ、図示しない排気管路を介して真空ポンプに接続される。また、チャンバ11の径の小さい上部と径の大きい下部との間に位置する肩部には、単結晶引上の絞り工程におけるシリコンの径を測定するための覗き窓18が設けられ、チャンバの外部には、この覗き窓18に撮像レンズを向けてCCD等の撮像素子を有するカメラ19が配置される。   The chamber 11 is a container sealed from an external atmosphere having a small diameter at the top and a large diameter at the bottom, and a crucible 12, a heater 13, a heat insulator 14 and the like are accommodated in the large diameter bottom. An upper portion of the chamber 11 is provided with an inert gas introduction portion (not shown) for introducing an inert gas into the chamber so that the inert gas flows into the rectifying cylinder 15. Further, an inert gas discharge port 17 is provided at the lower portion of the chamber 11 and is connected to a vacuum pump via an exhaust pipe (not shown). In addition, a viewing window 18 for measuring the diameter of silicon in the drawing process on the single crystal pulling is provided on the shoulder located between the upper portion having a small diameter and the lower portion having a large diameter. Outside, a camera 19 having an imaging element such as a CCD is disposed with the imaging lens facing the viewing window 18.

坩堝12は、石英ガラス材料からなり、チャンバ11内に配置され、有底の略円筒形の形状をしており、多結晶シリコンを融解させた半導体単結晶の原料のシリコン融液20を貯留する。この坩堝12は、所定の速度で中心軸周りに回転するとともに、上下に昇降駆動可能なシャフト21により支持される。また、坩堝12の周りにはヒータ13が配置され、さらにこのヒータ13の周りには断熱体14が坩堝12およびヒータを取り囲むように配置される。   The crucible 12 is made of a quartz glass material, is disposed in the chamber 11, has a bottomed substantially cylindrical shape, and stores a silicon melt 20 that is a raw material of a semiconductor single crystal obtained by melting polycrystalline silicon. . The crucible 12 rotates around a central axis at a predetermined speed and is supported by a shaft 21 that can be driven up and down. A heater 13 is disposed around the crucible 12, and a heat insulator 14 is disposed around the heater 13 so as to surround the crucible 12 and the heater.

引上げ機構は、引上ワイヤ22を含んで構成され、単結晶引上装置10の上部に設けられた図示しない引き上げ駆動部により、速度を制御しつつ引上ワイヤ22を上昇させることができる。単結晶の引き上げを行う際には、引上ワイヤ22の下端に設けたシードホルダ24に種結晶23を取り付け、坩堝内の融液に浸漬した後、シードホルダ24を回転させながら引き上げを行う。   The pulling mechanism is configured to include the pulling wire 22, and the pulling wire 22 can be lifted while controlling the speed by a pulling drive unit (not shown) provided on the upper part of the single crystal pulling apparatus 10. When pulling up the single crystal, the seed crystal 23 is attached to the seed holder 24 provided at the lower end of the pull-up wire 22, immersed in the melt in the crucible, and then pulled up while rotating the seed holder 24.

整流筒15は、例えば石英ガラス材料による円筒形の部材であり、チャンバ11の径の小さい上部からシリコン融液20の表面近傍まで延びている。単結晶引き上げ時には、引上げられる単結晶は、この整流筒15内部を通るように配置される。また、上述の不活性ガス導入部から流入された不活性ガスは、この整流筒15の内部を通過して、シリコン融液20の表面に導かれる。直径200mmの単結晶引上げ装置において使用される整流筒の典型的な寸法は、例えば、半径130mm、高さ300mm、厚さ4mmである。   The rectifying cylinder 15 is a cylindrical member made of, for example, a quartz glass material, and extends from an upper portion having a small diameter of the chamber 11 to the vicinity of the surface of the silicon melt 20. At the time of pulling up the single crystal, the pulled up single crystal is arranged so as to pass through the inside of the rectifying cylinder 15. Further, the inert gas introduced from the above-described inert gas introduction part passes through the inside of the rectifying cylinder 15 and is guided to the surface of the silicon melt 20. Typical dimensions of a flow straightening cylinder used in a single crystal pulling apparatus having a diameter of 200 mm are, for example, a radius of 130 mm, a height of 300 mm, and a thickness of 4 mm.

熱遮蔽板16は、単結晶引上げの際に、単結晶が坩堝12内の融液から受ける輻射熱を抑制するために設けられ、下方に向けて径が狭まるテーパー形状を有し、その下端部は、シリコン単結晶の引上げ時において、シリコン融液表面の近傍に延び、整流筒15の下端部と結合している。   The heat shielding plate 16 is provided to suppress the radiant heat that the single crystal receives from the melt in the crucible 12 when the single crystal is pulled, and has a tapered shape whose diameter narrows downward, and its lower end is When the silicon single crystal is pulled, it extends near the surface of the silicon melt and is coupled to the lower end of the rectifying cylinder 15.

図2は、図1の整流筒15の一例を示したものであり、(a)はその斜視図、(b)は平面図である。この整流筒15は、側面の略中央部に観察窓31を備える。この観察窓31は、整流筒15の湾曲している側面の一部を矩形に切断、除去し、当該箇所に整流筒と同じ石英ガラス材料からなり、透明であって、平板部を有する部材を結合させたものである。図2(b)に示すように、観察窓31の平板部は、上部および下部の中央位置で整流筒15の側面に接し、且つ平板部の外周は、整流筒15との間で隙間の無いように結合している。   FIG. 2 shows an example of the rectifying cylinder 15 of FIG. 1, in which (a) is a perspective view and (b) is a plan view. The rectifying cylinder 15 includes an observation window 31 at a substantially central portion of the side surface. This observation window 31 is formed by cutting and removing a part of the curved side surface of the rectifying cylinder 15 into a rectangular shape, and is made of the same quartz glass material as that of the rectifying cylinder at that location, transparent, and having a flat plate portion It is a combination. As shown in FIG. 2B, the flat plate portion of the observation window 31 is in contact with the side surface of the rectifying cylinder 15 at the upper and lower center positions, and the outer periphery of the flat plate portion has no gap with the rectifying cylinder 15. Are so coupled.

さらに、整流筒15の観察窓31は、シリコン融液20から単結晶の引き上げを行っている所望の観察位置25および覗き窓18と直列する位置に配置される。これによって、覗き窓18および観察窓31を通して、観察位置25をカメラ19で撮像することが可能となる。   Further, the observation window 31 of the rectifying cylinder 15 is arranged at a desired observation position 25 where the single crystal is pulled from the silicon melt 20 and a position in series with the observation window 18. As a result, the observation position 25 can be imaged by the camera 19 through the observation window 18 and the observation window 31.

図3は、図1の整流筒15の観察窓31の接合部の形状を示したものであって、(a)は観察窓位置での横断面図、(b)は、(a)に示す二点鎖線の円で囲まれた部分Xの拡大断面図である。整流筒15と観察窓31とは、溶接によって、すなわち、石英溶接用バーナーにより溶接箇所を加熱するとともに、相互に圧力を加え、隙間無く結合される。このため、図3(b)に示すように、整流筒15と観察窓31とは一体化している。さらに、整流筒15と観察窓31との結合箇所は、内側面にR加工(半径R=約3mm)を施し、整流筒15内を通る不活性ガスに乱流が生じないようにする。   FIG. 3 shows the shape of the joint portion of the observation window 31 of the flow straightening cylinder 15 in FIG. 1, wherein (a) is a cross-sectional view at the observation window position, and (b) is shown in (a). It is an expanded sectional view of the part X enclosed with the circle | dot of the dashed-two dotted line. The rectifying cylinder 15 and the observation window 31 are joined together by heating, that is, by heating the welded portion with a quartz welding burner, applying pressure to each other and without any gaps. For this reason, as shown in FIG.3 (b), the rectification | straightening cylinder 15 and the observation window 31 are integrated. Further, at the connecting portion between the rectifying cylinder 15 and the observation window 31, the inner surface is subjected to R processing (radius R = about 3 mm) so that turbulent flow is not generated in the inert gas passing through the rectifying cylinder 15.

なお、平板部を有する観察窓31が大きくなると、整流筒15の回転対称性が失われるため、乱流が発生して、整流筒15の不活性ガスの整流効果が失われることが懸念される。このため、整流効果の点からは、観察窓31の横幅は小さくすることが望ましい。具体的には、整流筒15の横断面の外周における観察窓が設けられている部分の中心角を45度以下とすると、整流筒15の整流効果を維持し、結晶の有転移化を招くことなく、引き上げができることを確認している。   If the observation window 31 having a flat plate portion is enlarged, the rotational symmetry of the rectifying cylinder 15 is lost, so that turbulence occurs and the rectifying effect of the inert gas in the rectifying cylinder 15 is lost. . For this reason, from the viewpoint of the rectifying effect, it is desirable to reduce the lateral width of the observation window 31. Specifically, if the central angle of the portion provided with the observation window on the outer periphery of the cross section of the rectifying cylinder 15 is 45 degrees or less, the rectifying effect of the rectifying cylinder 15 is maintained and the transition of the crystal is caused. It is confirmed that it can be lifted.

以上のような構成によって、単結晶引上装置10は、種結晶23をシリコン融液20に接触させた後に引上げることによって単結晶を引上げる際に、不活性ガス導入部から整流筒15に不活性ガスを流入させるとともに、真空ポンプによってチャンバ11内を排気することによって、シリコン融液20の表面から発生するSiOを不活性ガスとともに、排出口17から排出する。その際、各工程において、カメラ19を用いて覗き窓18と観察窓31とを通して、観察位置25を観察することができる。また、観察窓31は、平板の透明な石英ガラスにより構成されているため、カメラ19は歪みの影響を受けずに正確な画像を得ることができる。とくに、結晶引上げの絞り工程においては、カメラ画像に基づいて絞り直径を測定し、測定された絞り直径に応じて、図示しない制御装置によって、引き上げ駆動部を制御することができる。   With the configuration as described above, the single crystal pulling apparatus 10 allows the rectifying cylinder 15 to be moved from the inert gas introduction portion when pulling up the single crystal by pulling the seed crystal 23 after contacting the silicon melt 20. The inert gas is introduced, and the inside of the chamber 11 is exhausted by the vacuum pump, so that SiO generated from the surface of the silicon melt 20 is exhausted together with the inert gas from the exhaust port 17. At that time, the observation position 25 can be observed through the observation window 18 and the observation window 31 using the camera 19 in each step. Further, since the observation window 31 is made of flat transparent quartz glass, the camera 19 can obtain an accurate image without being affected by distortion. In particular, in the crystal pulling diaphragm step, the diaphragm diameter is measured based on the camera image, and the pulling drive unit can be controlled by a control device (not shown) according to the measured diaphragm diameter.

さらに、観察窓31と整流筒15とが同じ石英ガラス素材であり、溶接によって結合しているため、熱膨張率の差異による応力により観察窓31または整流筒15が変形または破損することがなく、観察窓31と整流筒15との間に隙間や段差も無いため、整流筒15内を通過する不活性ガスに、乱流が発生することも抑制することができる。   Furthermore, since the observation window 31 and the rectifying cylinder 15 are made of the same quartz glass material and are joined by welding, the observation window 31 or the rectifying cylinder 15 is not deformed or damaged by the stress due to the difference in thermal expansion coefficient. Since there are no gaps or steps between the observation window 31 and the rectifying cylinder 15, it is possible to suppress the occurrence of turbulent flow in the inert gas passing through the rectifying cylinder 15.

さらに、整流筒15と観察窓31との結合部の内側面にR加工を施したこと、および、整流筒15の横断面の外周における観察窓が設けられている部分の中心角を45度以下としたことによって、整流筒内の乱流の発生をさらに抑えることができる。   Further, the inner surface of the coupling portion between the rectifying cylinder 15 and the observation window 31 is subjected to R processing, and the central angle of the portion where the observation window is provided on the outer periphery of the cross section of the rectifying cylinder 15 is 45 degrees or less. As a result, the occurrence of turbulent flow in the flow straightening cylinder can be further suppressed.

また、単結晶の引上げの際に、シャフト21を回転させるとともに、シリコン融液20の減少に応じてシャフト21を上昇させることによって、シリコン融液20と単結晶との界面である測定位置25を継続して観察することが可能である。   Further, when the single crystal is pulled, the shaft 21 is rotated, and the shaft 21 is raised in accordance with the decrease of the silicon melt 20, whereby the measurement position 25 that is the interface between the silicon melt 20 and the single crystal is set. It is possible to observe continuously.

以上説明したように、本実施の形態によれば、整流筒に整流筒と同じ石英ガラス材料からなる透明な平板状の観察窓を設け、覗き窓から前記観察窓を介して半導体結晶または坩堝内の所定の観察位置、例えば、絞り工程における絞り部を観察可能に構成されているので、整流筒内に乱流を発生させることなく、チャンバの外部から半導体結晶または坩堝内の所定の観察位置を観察することが可能になる。これによって、半導体単結晶の収率を低下させることなく、単結晶引き上げ時の制御の精度を向上させることが可能になる。   As described above, according to the present embodiment, the rectifying cylinder is provided with a transparent flat plate-like observation window made of the same quartz glass material as that of the rectifying cylinder, and the semiconductor crystal or the crucible inside the rectifying cylinder through the observation window. Therefore, a predetermined observation position in the semiconductor crystal or the crucible can be set from the outside of the chamber without generating turbulent flow. It becomes possible to observe. This makes it possible to improve the accuracy of control when pulling up the single crystal without reducing the yield of the semiconductor single crystal.

(第2実施の形態)
図5は、本発明の第2実施の形態に係る単結晶引上げ装置の整流筒を示したものであって、(a)は斜視図、(b)は平面図である。本実施の形態では、整流筒15の観察窓31と90度回転した位置に観察窓31と同様の他の観察窓41を設け、さらに、図1で示したチャンバ11にも、観察窓41の対応する位置に他の覗き窓(図示せず)を設けたものである。その他の構成は、上述の第1実施の形態と同様である。
(Second Embodiment)
FIG. 5 shows a rectifying cylinder of a single crystal pulling apparatus according to a second embodiment of the present invention, where (a) is a perspective view and (b) is a plan view. In the present embodiment, another observation window 41 similar to the observation window 31 is provided at a position rotated 90 degrees with respect to the observation window 31 of the rectifying cylinder 15, and the chamber 11 shown in FIG. Another viewing window (not shown) is provided at the corresponding position. Other configurations are the same as those in the first embodiment.

これによって、測定場所25をカメラ19で測定するだけではなく、他の覗き窓および観察窓41を通して、目視により確認することも可能になる。したがって、装置による判断に、人による判断が加わり、単結晶引き上げの制御の精度を向上させることができる。   As a result, it is possible not only to measure the measurement location 25 with the camera 19 but also to visually confirm it through another viewing window and observation window 41. Therefore, the judgment by the person is added to the judgment by the apparatus, and the accuracy of the control for pulling the single crystal can be improved.

(第3実施の形態)
また、図6は、本発明の第3実施の形態に係る単結晶引上げ装置の整流筒を示す斜視図である。図に示すように、整流筒15には、上記第2実施形態の構成に加え、さらに、平板状の観察窓42を設けている。また、チャンバ11にも対応する図示しない覗き窓が設けられ、坩堝12および整流筒15内部の他の所定の位置の観察ができるようになっている。
(Third embodiment)
FIG. 6 is a perspective view showing a rectifying cylinder of the single crystal pulling apparatus according to the third embodiment of the present invention. As shown in the figure, the rectifying cylinder 15 is further provided with a flat observation window 42 in addition to the configuration of the second embodiment. A corresponding viewing window (not shown) corresponding to the chamber 11 is also provided so that other predetermined positions inside the crucible 12 and the rectifying cylinder 15 can be observed.

このように、整流筒15の側面に平板状の観察窓42を設けることによって、測定位置25と異なる所望の位置を精度良く観察することが可能になる。これによって、例えば、前記単結晶引上装置の熱遮蔽板16の下端とシリコン融液20の液面との間の距離であるギャップを測定することも可能である。   Thus, by providing the flat observation window 42 on the side surface of the rectifying cylinder 15, a desired position different from the measurement position 25 can be accurately observed. Thereby, for example, it is possible to measure a gap which is a distance between the lower end of the heat shielding plate 16 of the single crystal pulling apparatus and the liquid surface of the silicon melt 20.

本実施の形態では、覗き窓と観察窓とを複数設けることにより、異なる位置の観察を可能にしたが、複数の位置の観察を行う方法はこれに限られない。例えば、第1実施の形態において、他の覗き窓を観察窓31および他の所定の観察位置と直列となる位置に設けることによって、2つの除き窓と1つの観察窓とにより2つの観察位置の観察が可能となる。また、整流筒15の覗き窓18および他の所定の観察位置と直列となる位置に透明で且つ平板状の整流筒15と同一材料により構成される他の観察窓を設けることによって、1つの覗き窓と2つの観察窓とにより2つの観察位置の観察が可能になる。   In this embodiment, a plurality of observation windows and observation windows are provided to enable observation at different positions. However, the method for observing a plurality of positions is not limited thereto. For example, in the first embodiment, by providing another viewing window in a position that is in series with the observation window 31 and another predetermined observation position, two observation windows and two observation windows can be used for two observation positions. Observation becomes possible. Further, by providing another observation window made of the same material as that of the flat plate-like rectifying cylinder 15 at a position in series with the sighting window 18 of the rectifying cylinder 15 and another predetermined observation position, one observation window is provided. Two observation positions can be observed by the window and the two observation windows.

なお、本発明は、上記実施の形態にのみ限定されるものではなく、幾多の変形または変更が可能である。たとえば、観察窓の形状は矩形であるとしたがこれに限られず、丸型等任意の形状とすることができる。また、整流筒と観察窓との石英ガラスの接合は、バーナーによらず、レーザー光の照射により加熱し溶着させるようにしても良い。   In addition, this invention is not limited only to the said embodiment, Many deformation | transformation or a change is possible. For example, although the shape of the observation window is rectangular, the shape is not limited to this, and may be any shape such as a round shape. Further, the quartz glass may be joined to the rectifying cylinder and the observation window by heating with laser light irradiation without using a burner.

本発明によれば、整流筒内の乱流発生を抑制しつつ、チャンバの外部から単結晶または坩堝内の定の観察位置を正確に観察することができる。   According to the present invention, it is possible to accurately observe a fixed observation position in the single crystal or the crucible from the outside of the chamber while suppressing generation of turbulent flow in the flow straightening cylinder.

10 単結晶引上装置
11 チャンバ
12 坩堝
13 ヒータ
14 断熱体
15 整流筒
16 熱遮蔽板
17 排出口
18 覗き窓
19 カメラ
20 シリコン融液
21 シャフト
22 引上ワイヤ
23 種結晶
24 シードホルダ
25 観察位置
31,41,42 観察窓
DESCRIPTION OF SYMBOLS 10 Single crystal pulling apparatus 11 Chamber 12 Crucible 13 Heater 14 Heat insulator 15 Current-carrying tube 16 Heat shielding board 17 Exhaust port 18 Viewing window 19 Camera 20 Silicon melt 21 Shaft 22 Pulling wire 23 Seed crystal 24 Seed holder 25 Observation position 31 , 41, 42 Observation window

Claims (12)

斜め上方に位置する覗き窓を有するチャンバと、
このチャンバの上部に設けられ、前記チャンバ内部に不活性ガスを導入する不活性ガス導入部と、
前記チャンバ内に配置され単結晶の原料の融液を収納可能な坩堝と、
該坩堝に対して種結晶および融液から成長させた単結晶を相対的に昇降可能な引上げ機構と、
前記引上げ機構により引上げられる単結晶が上昇可能な内部空間を持ち、下端が前記融液の表面近傍に位置し、前記不活性ガス導入部から導入される不活性ガスを融液表面に案内する円筒状の整流筒を備え、
前記整流筒は、透明で且つ平板状の観察窓を有し、該観察窓は前記整流筒と同一の材料により構成され、前記覗き窓および所定の観察位置と直列となる位置に配置されていることを特徴とする単結晶引上装置。
A chamber having a viewing window located obliquely above;
An inert gas introduction part that is provided in an upper portion of the chamber and introduces an inert gas into the chamber;
A crucible arranged in the chamber and capable of storing a melt of a single crystal raw material;
A pulling mechanism capable of moving up and down relatively the single crystal grown from the seed crystal and the melt with respect to the crucible;
A cylinder having an internal space in which a single crystal pulled by the pulling mechanism can be lifted and having a lower end positioned in the vicinity of the surface of the melt and guiding the inert gas introduced from the inert gas introduction portion to the melt surface A straight rectifier,
The rectifying tube has a transparent and flat plate-like observation window, and the observation window is made of the same material as the rectifying tube, and is arranged at a position in series with the viewing window and a predetermined observation position. A single crystal pulling apparatus.
前記整流筒および前記観察窓は、ともに石英ガラスにより構成され、一体化されていることを特徴とする請求項1に記載の単結晶引上装置。   The single crystal pulling apparatus according to claim 1, wherein the rectifying cylinder and the observation window are both made of quartz glass and integrated. 前記整流筒と前記観察窓との一体化は、溶接によって行われていることを特徴とする請求項2に記載の単結晶引上装置。   The single crystal pulling apparatus according to claim 2, wherein the rectifying cylinder and the observation window are integrated by welding. 前記観察窓は、前記整流筒の横断面の外周における前記観察窓が設けられている部分の中心角が45度以下となる横幅を有することを特徴とする請求項1−3のいずれか一項に記載の単結晶引上げ装置。   The said observation window has a horizontal width | variety in which the central angle of the part in which the said observation window is provided in the outer periphery of the cross section of the said rectification | straightening cylinder becomes 45 degrees or less. A single crystal pulling apparatus according to claim 1. 前記整流筒の内側面の前記観察窓との接合部は、R加工が施されていることを特徴とする請求項1−4のいずれか一項に記載の単結晶引上装置。   The single crystal pulling apparatus according to any one of claims 1 to 4, wherein a joint portion of the inner surface of the flow straightening tube with the observation window is subjected to R processing. 前記覗き窓の外方であって、前記所定の観察位置、観察窓および覗き窓とともに直列となる位置に測定用のカメラを設け、前記単結晶の絞り工程における絞り直径を測定することを特徴とする請求項1−5のいずれか一項に記載の単結晶引上装置。   A measuring camera is provided outside the observation window and in a position in series with the predetermined observation position, the observation window and the observation window, and the diameter of the diaphragm in the single crystal diaphragming step is measured. The single crystal pulling apparatus according to any one of claims 1 to 5. 前記覗き窓の外方であって、前記所定の観察位置、観察窓および覗き窓とともに直列となる位置に測定用のカメラを設け、前記単結晶引上装置の熱遮蔽板の下端と前記坩堝内の融液表面との間の距離であるギャップを測定することを特徴とする請求項1−5のいずれか一項に記載の単結晶引上装置。   A camera for measurement is provided outside the viewing window and in a position in series with the predetermined observation position, the observation window and the viewing window, and the lower end of the heat shield plate of the single crystal pulling apparatus and the crucible The single crystal pulling apparatus according to claim 1, wherein a gap that is a distance between the melt surface and the melt surface is measured. 前記チャンバは他の覗き窓を有し、且つ、前記整流筒は透明で平板状の他の観察窓を有し、該他の観察窓は、前記整流筒と同一の材料により構成され、前記他の覗き窓および前記所定の観察位置と直列となる位置に配置されていることを特徴とする請求項1−5のいずれか一項に記載の単結晶引上装置。   The chamber has another viewing window, and the rectifying cylinder has another observation plate that is transparent and has a flat plate shape. The other observation window is made of the same material as the rectifying cylinder, and the other The single crystal pulling apparatus according to claim 1, wherein the single crystal pulling apparatus is disposed at a position that is in series with the viewing window and the predetermined observation position. 前記覗き窓の外方であって、前記所定の観察位置、観察窓および覗き窓とともに直列となる位置に測定用のカメラを設け、前記所定の観察位置を観察するとともに、前記他の覗き窓からは前記所定の位置を目視できるように構成されていることを特徴とする請求項8に記載の単結晶引上装置。   A camera for measurement is provided outside the viewing window and in a position in series with the predetermined observation position, the observation window, and the observation window, to observe the predetermined observation position, and from the other observation window The single crystal pulling apparatus according to claim 8, wherein the predetermined position is visible. 前記チャンバは他の覗き窓を有し、前記整流筒は透明で平板状の他の観察窓を有し、該他の観察窓は前記整流筒と同一の材料により構成され、前記他の覗き窓および他の所定の観察位置と直列となる位置に配置されていることを特徴とする請求項1−5のいずれか一項に記載の単結晶引上装置。   The chamber has another viewing window, the flow straightening tube has another observation plate that is transparent and has a flat plate shape, and the other observation window is made of the same material as the flow straightening tube, and the other viewing window The single crystal pulling apparatus according to any one of claims 1 to 5, wherein the single crystal pulling apparatus is disposed at a position in series with another predetermined observation position. 前記チャンバは他の覗き窓を有し、該他の覗き窓は前記観察窓および他の所定の観察位置と直列となる位置に配置されていることを特徴とする請求項1−5のいずれか一項に記載の単結晶引上げ装置。   The said chamber has another observation window, This other observation window is arrange | positioned in the position which is in series with the said observation window and another predetermined observation position, The one of Claims 1-5 characterized by the above-mentioned. The single crystal pulling apparatus according to one item. 前記整流筒は透明で且つ平板状の他の観察窓を有し、該他の観察窓は前記整流筒と同一の材料により構成され、前記覗き窓および他の所定の観察位置と直列となる位置に配置されていることを特徴とする請求項1−5のいずれか一項に記載の単結晶引上装置。   The rectifying cylinder is transparent and has a flat plate-like other observation window, and the other observation window is made of the same material as the rectification cylinder, and is positioned in series with the observation window and other predetermined observation positions. The single crystal pulling apparatus according to any one of claims 1 to 5, wherein the single crystal pulling apparatus is arranged.
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