JP2011039415A - Spatial light modulator and pattern drawing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a spatial light modulator having a high extinction ratio and to provide a pattern drawing apparatus, capable of drawing a pattern with an excellent drawing quality by mounting the spatial light modulator. <P>SOLUTION: Five lines of first electrodes 333 are arrayed on one side principal surface 332 of an electro-optical crystalline substrate 331, while they are separated from one another in the X direction that is substantially vertical to the traveling direction Z of incident light L1 which travels in a periodically polarization-reversed structure of the electro-optical crystalline substrate 331. Respective first electrode 333 is electrically connected to a potential imparting part 336, the voltage applied to the first electrode 333 by the potential imparting part 336 is controlled; thereby the generation of electric field between each of the first electrodes 333 and a second electrode 335 is controlled; and the diffraction efficiency in the periodically polarization-reversed structure is modulated by each first electrode 333. Respective first electrode 333 is arranged obliquely with respect to the electro-optical crystalline substrate 331, and that the diffraction gratings produced inside the periodically polarization-reversed structure satisfy the Bragg conditions of diffraction, and Bragg diffracted beam BL or the 0-th order beam is emitted. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a spatial light modulator using an electro-optic crystal and a pattern drawing apparatus equipped with the spatial light modulator.

Conventionally, a method of performing spatial light modulation using an electro-optic crystal whose refractive index changes with an electric field such as lithium niobate (LiNbO ₃ ) is known. For example, in Patent Document 1, the electro-optic crystal is finished in a thin plate shape (slab shape). On one main surface (or both main surfaces) of the electro-optic crystal, a plurality of electrode elements are arranged at a constant pitch to form a lattice electrode. By applying a potential difference between these electrode elements, an electric field generated in the electro-optic crystal causes a periodic refractive index change inside the electro-optic crystal, thereby forming a diffraction grating. Spatial light modulation is performed by causing light to enter the electro-optic crystal almost in parallel with the length direction of the lattice electrode and mainly causing Raman-Nas diffraction.

JP 2009-31732 A (FIGS. 4 and 7)

  As described above, in the conventional spatial light modulator, the electro-optic crystal has a thin plate shape, and light is propagated in the arrangement direction of the electrode elements constituting the lattice electrode. Therefore, the mutual distance between the light and the electric field is reduced. The spatial light modulator can be driven at high speed with a low voltage. However, the spatial light modulator has the following problems because it uses Raman-Nas diffraction. That is, since the diffraction efficiency of higher-order diffracted light is lower than that of first-order diffracted light in Raman / Nas diffraction, when the above-described conventional spatial light modulator is applied to a pattern drawing device or the like, pattern drawing using zero-order light is performed. It was common to do. Therefore, when light is not irradiated on the drawing surface, that is, when extinction occurs, a Raman-Nath diffraction is generated by generating a potential difference between the electrode elements. There is a problem that it is difficult to obtain a high extinction ratio (ON / OFF light quantity ratio). In addition, in order to increase the resolution of the spatial light modulator while simultaneously obtaining a sufficient amount of light for pattern drawing, the electrode elements must be provided with a narrow pitch (higher resolution of the grating period) and the electrode elements must be lengthened. As a result, the diffraction efficiency is lowered, which is a cause of lowering the extinction ratio (ON / OFF light quantity ratio).

  The present invention has been made in view of the above-described problems, and provides a spatial light modulator having a high extinction ratio and a pattern drawing apparatus equipped with the spatial light modulator and capable of drawing a pattern with excellent drawing quality. The purpose is to do.

  In order to achieve the above object, the spatial light modulator according to the present invention is configured so that the first polarization unit and the second polarization unit, which are opposite to each other in the direction of polarization generated by receiving an electric field, alternately in the first direction at a predetermined cycle. An electro-optic crystal substrate having arranged periodic domain-inverted structures and traveling along a second direction inclined with respect to the first direction, and one main surface of the electro-optic crystal substrate; A plurality of first electrodes provided above, a second electrode provided on the other main surface of the electro-optic crystal substrate, and control of electric field generation between the plurality of first electrodes and the second electrodes, respectively. A modulation unit that modulates the diffraction efficiency in the periodically poled structure, and the plurality of first electrodes are arranged apart from each other in a third direction that is substantially perpendicular to the traveling direction of the light traveling in the periodically poled structure, Each of the plurality of first electrodes is generated between the first electrode and the second electrode. Diffraction grating generated by receiving an electric field periodically poled structure which is to satisfy the condition of Bragg diffraction, it is characterized in that it is arranged.

  The pattern drawing apparatus according to the present invention is a pattern drawing apparatus for drawing a pattern on a recording material, and in order to achieve the above object, a light source unit and light from the light source unit are incident thereon. The spatial light modulator according to any one of the above, and one of zero-order light and Bragg diffracted light, which is disposed between the spatial light modulator and the recording material and passes through the periodically poled structure, is a recording material. And an optical system leading to

  In the invention thus configured (spatial light modulator and pattern drawing apparatus including the spatial light modulator), a plurality of first electrodes are substantially perpendicular to the traveling direction of light traveling through the periodically poled structure. They are arranged on one main surface of the electro-optic crystal substrate so as to be spaced apart from each other in the direction. In addition, the electric field generation between each of the first electrodes and the second electrode is controlled by the modulation unit, and the diffraction efficiency in the periodically poled structure is modulated for each first electrode. Thus, spatial light modulation is possible with the number of channels corresponding to the number of first electrodes. That is, as in the first embodiment and the third embodiment described later, when the first electrodes are controlled independently, light modulation can be performed with the same number of channels as the first electrodes. In addition, when a plurality of adjacent first electrodes are controlled as a unit as in the second embodiment described later, light modulation can be performed with the number of channels determined by the number of first electrodes and the number of units.

  In the present invention, each first electrode is arranged so that the diffraction grating generated in the periodically poled structure satisfies the Bragg diffraction condition as described above. Therefore, Bragg diffracted light can be generated by the generation of an electric field by the modulation unit. The diffraction efficiency of the Bragg diffracted light thus obtained is high, and as a result, a high extinction ratio is obtained. Further, drawing quality can be improved by drawing one of the 0th-order light and the Bragg diffracted light to the recording material using this spatial light modulator to draw a pattern.

  Here, the third direction can be a direction substantially orthogonal to the traveling direction of the incident light incident on the periodically poled structure, for example. In this case, when the plurality of first electrodes are each extended in the direction in which the incident light travels, the incident light is subjected to Bragg diffraction by the diffraction grating over a long distance, so that the voltage applied to the first electrode can be set low. High-speed modulation is possible. Further, the third direction may be a direction substantially orthogonal to the traveling direction of the Bragg diffracted light that is Bragg diffracted in the periodically poled structure. In this case as well, each of the first electrodes is set in the traveling direction of the Bragg diffracted light. By extending, high-speed modulation can be performed as described above.

  Further, the width of the first electrode in the third direction is arbitrary, but it is configured to be wider than a predetermined period, that is, more than a polarization pair composed of a first polarization part and a second polarization part arranged adjacent to each other. You may comprise so that it may have a big width | variety. In this case, the first electrode can be easily manufactured as compared with the manufacture of the periodically poled structure, and an effective diffraction angle can be obtained and highly efficient light modulation can be achieved.

  Further, when the polarization part is inclined, the extinction ratio can be further increased. That is, the periodic polarization inversion structure may be configured such that the boundary surfaces between the first polarization portion and the second polarization portion arranged adjacent to each other are inclined with respect to the one main surface and the other main surface of the electro-optic crystal substrate. When configured in this way, the diffraction region is limited and recombination in Bragg diffraction is prevented compared to the case where the boundary surface is arranged so as to be orthogonal to the one main surface and the other main surface of the electro-optic crystal substrate. The Thus, it is possible to suppress the occurrence of the ghost light, it is possible to perform further enhanced by high contrast optical modulation extinction ratio. Moreover, drawing quality can be further improved by using such a spatial light modulator.

  In addition, the electro-optic crystal substrate may be provided with a slab waveguide in a part of the thickness direction from the one main surface to the other main surface, whereby light is confined and propagated in the slab waveguide. Light loss in the optical crystal substrate can be reduced. Such a slab waveguide can be formed by, for example, an annealing proton exchange method, and can be used at a shorter wavelength (for example, in the ultraviolet region) than the Ti (titanium) diffusion method. It is also possible to form the slab waveguide in the center of the thickness direction, in this case, it is possible to further reduce light loss.

  Furthermore, when the thickness from one main surface to the other main surface of the electro-optic crystal substrate is 30 μm or less, the spatial light modulator can be driven at a low voltage, and high-speed light modulation can be performed.

  According to the spatial light modulator according to the present invention, the plurality of first electrodes are provided on one main surface of the electro-optic crystal substrate having the periodically poled structure, and the second electrode provided on the other main surface and each first electrode. By controlling the electric field generation between the electrodes, Bragg diffraction can be generated for each first electrode, and a high extinction ratio can be obtained. Further, by using such a spatial light modulator, a pattern can be drawn on a recording material with excellent drawing quality.

1 is a perspective view showing a first embodiment of a pattern drawing apparatus equipped with a spatial light modulator according to the present invention. It is a side view of the pattern drawing apparatus shown in FIG. It is a block diagram which shows the electrical structure of the pattern drawing apparatus of FIG. It is a figure which simplifies and shows the internal structure of an optical head. It is a figure which shows 1st Embodiment of the spatial light modulator concerning this invention. It is a figure which shows typically operation | movement of the spatial light modulator shown in FIG. It is a figure which shows 2nd Embodiment of this invention. It is a figure which shows 3rd Embodiment of this invention. It is a figure which shows 4th Embodiment of this invention. It is a figure which shows 5th Embodiment of this invention. It is a figure which shows 6th Embodiment of this invention. It is a figure which shows the spatial light modulator used with the pattern drawing apparatus shown in FIG. It is a contrast diagram of 1st Embodiment and 6th Embodiment.

<First Embodiment>
FIG. 1 is a perspective view showing a first embodiment of a pattern drawing apparatus equipped with a spatial light modulator according to the present invention, FIG. 2 is a side view of the pattern drawing apparatus shown in FIG. 1, and FIG. It is a block diagram which shows the electrical structure of the pattern drawing apparatus of this. In this pattern drawing apparatus 1, one end side region (the left hand side region in FIGS. 1 and 2) of the base 2 is a substrate delivery region for delivering the substrate W, whereas the other end side region (FIG. 1 and the right hand side region in FIG. 2 is a pattern drawing region for pattern drawing on the substrate W. On the base 2, a head support portion 21 is provided at the boundary position between the substrate delivery area and the pattern drawing area. In the head support portion 21, two leg members 211 and 212 are erected upward from the base 2, and a beam member 213 is horizontally provided so as to bridge the top portions of the leg members 211 and 212. Yes. The optical head 3 is mounted on the pattern drawing area side of the head support portion 21 configured in this manner so as to be movable in the vertical direction Z. The head moving mechanism 30 is operated according to an operation command from the exposure control portion 41. By operating, the distance between the substrate W held on the stage 5 described later and the optical head 3 can be adjusted with high accuracy. The optical head 3 is equipped with a spatial light modulator according to the present invention and irradiates the substrate W with light for exposure, and its configuration and operation will be described in detail later.

  In the substrate delivery area of the base 2, two leg members 221 and 222 are erected on the end opposite to the pattern drawing area. And the box which accommodated the illumination optical system of the optical head 3 is provided so that the top part of the leg members 221 and 222 and the upper surface of the beam member 213 may be bridged. Further, as shown in FIG. 2, the camera (imaging unit) 6 is fixed to the side surface of the beam delivery member 213 on the side of the substrate delivery region, and the surface of the substrate W (the drawing surface and the exposed surface) held on the stage 5 is imaged. It is possible.

  This in the vicinity of the substrate transfer area, substrate storage cassette CS, the prealignment unit PA and the substrate carrying robot 7 is arranged. The substrate transfer robot 7 has such a hand moving mechanism 72 for moving the hand 71 and the hand 71 to handle the substrate W such as a wafer. Then, the hand moving mechanism 72 is actuated in response to a command from the exposure control unit 41, whereby the substrate W is transported between the substrate storage cassette CS, the pre-alignment unit PA, and the stage 5 located in the substrate delivery region. . That is, the substrate W unprocessed is conveyed from the cassette CS to prealignment unit PA, subjected to so-called pre-alignment process. Thereafter, the substrate is transferred from the pre-alignment section PA to the stage 5 by the substrate transfer robot 7. Further, the substrate W on which the pattern is drawn in the pattern drawing region as described later is moved to the substrate delivery region together with the stage 5 and is carried into the cassette CS by the substrate transfer robot 7.

  The stage 5 is moved in the X direction, the Y direction and the θ direction by the stage moving mechanism 51 on the base 2. That is, the stage moving mechanism 51 is formed by stacking a Y-axis drive unit (not shown), an X-axis drive unit (not shown), and a θ-axis drive unit (not shown) on the upper surface of the base 2 in this order. The stage 5 is positioned by moving it two-dimensionally in a horizontal plane. Further, the stage 5 is rotated around the θ axis (vertical axis) to adjust the relative angle with respect to the optical head 3 described later and to be positioned. As such a stage moving mechanism 51, a conventionally used XY-θ axis moving mechanism can be used.

  Next, the configuration and operation of the optical head 3 will be described. In this embodiment, as described above, the optical head 3 is attached to the head support portion 21 so as to be movable in the vertical direction Z, and emits light to the substrate W moving immediately below the optical head 3. The substrate W held on the stage 5 is exposed by being reflected and a pattern is drawn. In the present embodiment, the optical head 3 can simultaneously irradiate light in a plurality of channels in the X direction, and the X direction corresponds to the “sub-scanning direction”. Further, by moving the stage 5 in the Y direction, a pattern can be drawn two-dimensionally on the substrate W, and the Y direction corresponds to the “main scanning direction”.

  FIG. 4 is a diagram showing the internal configuration of the optical head in a simplified manner. FIG. 4A shows the optical head 3 along the optical axis OA and the sub-scanning direction X of the optical head 3 (that is, in FIG. 1). The (+ Y) side) shows the internal configuration of the optical head 3, and FIG. 5B shows the optical head 3 side from the pre-alignment PA side (lower left side) in FIG. 2 shows the internal configuration of the optical head 3 when viewed in the (+ X) direction from the (−X) side of the optical head 3.

  The optical head 3 shown in FIG. 4 includes a light source unit 31 configured by a semiconductor laser or the like that emits a light beam having a predetermined wavelength (for example, 830, 635, 405, or 355 nanometers (nm)). Yes. When a 355 nm laser beam is used, a solid-state laser light source using a third harmonic of a YAG (Yttrium Aluminum Garnet) laser is used. The light source unit 31 has a collimator lens (not shown), and the light beam emitted from the semiconductor laser is converted into parallel light through the collimator lens and enters the illumination optical system 32 through a mirror (not shown). To do.

  The illumination optical system 32 includes three cylindrical lenses 321 to 323, and the light beam emitted from the light source unit 31 passes through the cylindrical lenses 321 to 323 in this order and enters the spatial light modulator 33. Of these, the cylindrical lens 321 has a negative power only in the X direction, and the light passing through the cylindrical lens 321 changes from a circular cross section perpendicular to the optical axis OA to an ellipse having a longer length in the X direction. . On the other hand, with respect to the optical axis OA and the Y direction perpendicular to the X direction, the width of the light beam cross section of the light passing through the cylindrical lens 321 is (almost) constant. The cylindrical lens 322 has a positive power only in the X direction, and the light beam that has passed through the cylindrical lens 321 is shaped by the cylindrical lens 322. In other words, the light that has passed through the cylindrical lens 322 is made into an elliptical shape having a constant cross-section with a long cross section in the X direction, and is incident on the cylindrical lens 323. The cylindrical lens 323 has a positive power only in the Y direction. When attention is paid only to the Y direction, as shown in FIG. 4B, the light passing through the cylindrical lens 323 is condensed and electrically The light enters an end surface (hereinafter referred to as “incident surface”) 331 a of the optical crystal substrate 331 on the (−Z) side. Regarding the X direction, as shown in FIG. 4A, the light beam from the cylindrical lens 323 enters the spatial light modulator 33 as a parallel light beam.

  FIG. 5 is a view showing the spatial light modulator, FIG. 5A is an exploded perspective view of the spatial light modulator 33, and FIG. 5B is a partial view of the spatial light modulator 33. FIG. 6 is a diagram schematically showing the operation of the spatial light modulator shown in FIG. This spatial light modulator 33 corresponds to the first embodiment of the spatial light modulator according to the present invention, and is formed on a thin plate-like or slab-like electro-optic crystal substrate 331 and an upper main surface 332 of the electro-optic crystal substrate 331. Potential application for applying a desired potential independently to each of the first electrode 333 disposed, the second electrode 335 disposed on the lower main surface 334 of the electro-optic crystal substrate 331, and the first electrode 333 Part 336.

In this embodiment, the electro-optic crystal substrate 331 is formed of a single crystal of lithium niobate (LiNbO ₃ ) (that is, lithium niobate, abbreviated as LN), and its thickness (in the direction Y) The height is, for example, several tens of microns, preferably 30 microns or less. In the electro-optic crystal substrate 331, first polarization portions 3311 and second polarization portions 3312 whose polarization directions generated by receiving an electric field are opposite to each other are alternately arranged, and the electro-optic crystal substrate 331 has a polarization inversion structure. have. In this embodiment, in particular, as shown in FIG. 6, each of the first polarization portion 3311 and the second polarization portion 3312 has a strip shape extending in the direction WD perpendicular to the arrangement direction AD, and has the same width in the arrangement direction AD. And a polarization pair 3313 composed of a first polarization part 3311 and a second polarization part 3312 arranged adjacent to each other are arranged in the arrangement direction AD at a predetermined period (lattice period RC in the XY section), and the electro-optic crystal substrate 331 has a so-called periodic polarization inversion structure. As described above, the arrangement direction AD corresponds to the “first direction” of the present invention. In this embodiment, the light beam incident on the spatial light modulator 33 travels in the direction Z (the “second direction” of the present invention). Equivalent to the angle θb.

Further, in the electro-optic crystal substrate 331, the crystal axes of the first polarization portion 3311 and the second polarization portion 3312 have directions opposite to each other, and the first electrode 333 and the second electrode 335 will be described as will be described below. When a potential difference is generated between them to generate an electric field in the periodically poled structure, the directions of polarization generated by receiving the electric field are opposite to each other. The electro-optic crystal 331 used here includes lithium tantalate (LiTaO ₃ : LT) in addition to LN, and the crystal inversion direction (direction in which an electric field is applied) is the value of the Pockels constant (electro-optic constant). The large r33 is in the Z-axis direction.

  In addition, the first polarization unit 3311 and the second polarization unit 3312 have crystal axis orientations (+ Z) opposite to each other. However, the first polarization unit 3311 and the second polarization unit 3312 have, for example, a portion corresponding to the second polarization unit (periodically) in a crystal having a uniform orientation. It is produced by partially (periodically) reversing the crystal axis orientation (+ Z) by temporarily applying a polarization reversal voltage inherent in the electro-optic crystal. A crystal subjected to this processing is used. Therefore, in the case of this embodiment, the 1st polarization part 3311 is an axial direction of the original crystal | crystallization, and the 2nd polarization part has the axial direction by which the polarization inversion process was carried out.

  In this embodiment, as shown in FIGS. 5 and 6, the plurality of (“5” in the present embodiment) first electrodes 333 each have a slab shape extending in a direction parallel to the direction Z in which the incident light LI travels. The electrode width EW1 in the direction X substantially perpendicular to the direction Z in which the incident light LI travels is about three times the grating period RC. The first electrodes 333 having such a shape are arranged in parallel on the upper main surface 332 of the electro-optic crystal substrate 331 in the X direction at intervals EW2 shorter than the lattice period RC. On the other hand, a second electrode 335 is disposed on the lower main surface 334 of the electro-optic crystal substrate 331 so as to cover the entire lower main surface 334, and functions as a common electrode for the plurality of first electrodes 333.

  In the spatial light modulator 33 configured as described above, the second electrode 335 is grounded, while the plurality of first electrodes 333 are connected to the potential applying unit 336 and correspond to an operation command from the exposure control unit 41. Independently, potential is applied from the potential applying unit 336. Therefore, in the periodic polarization reversal structure of the electro-optic crystal substrate 331, the first electrode 333 and the first electrode 333 are only in the region corresponding to the first electrode 333 to which the predetermined potential V1 (potential other than 0V) is applied from the potential applying unit 336. 2 electrode 335 by the electric field diffraction refractive index changes in accordance with the polarization direction is generated lattice generated between the (common electrode) are formed. Moreover, in this embodiment, the angle θb is set so as to satisfy the conditions for causing Bragg diffraction by the diffraction grating formed as described above. Therefore, for example, as shown in FIG. 6, when the potential V1 is applied only to the first electrode 333 (2ch) corresponding to the second channel among the five first electrodes 333, the first electrode 333 (2ch). A diffraction grating due to a change in refractive index is formed only in the internal region of the periodically poled structure corresponding to, and only the light beam traveling between the first electrode 333 (2ch) and the second electrode 335 out of the incident light LI is Bragg diffracted. Then, it is tilted by an angle (2θb) with respect to the direction Z in the horizontal plane (XZ plane) and emitted from the spatial light modulator 33 as Bragg diffracted light BL. On the other hand, when no potential is applied to the first electrode 333 and the potential difference between the first electrode 333 and the second electrode 335 is zero and no electric field is generated, the refractive index distribution between the electrodes 333 and 335 is one. The diffraction grating is not formed. Accordingly, the light beam in this case goes straight through the electro-optic crystal substrate 331 as it is, and is emitted from the electro-optic crystal substrate 331 as the 0th-order light L0. In this manner, by controlling the potential application to the five first electrodes 333, light modulation for five channels can be performed. In addition, it goes without saying that intermediate diffraction efficiency modulation (halftone modulation / grayscale modulation) can be performed by applying a voltage lower than the voltage causing diffraction of 100%.

  Returning to FIG. 4, the description of the configuration of the optical head 3 will be continued. A cylindrical lens 34 having a positive power only in the Y direction, a lens 351, an aperture plate 352 having an aperture 3521, and a lens 353 on the emission side (right-hand side in FIG. 4) of the spatial light modulator 33 configured as described above. Are arranged in this order. The cylindrical lens 34 has a positive power only in the Y direction, and the zero-order light L0 or the Bragg diffracted light BL from the spatial light modulator 33 is transmitted by the cylindrical lens 34 as shown in FIG. The light is substantially parallel to the Y direction and is incident on a lens 351 having a positive power.

  Here, the front focal point of the lens 351 is a position in the electro-optic crystal substrate 331 in the vicinity of the (+ Z) side end of the first electrode 333, and the aperture plate so that the aperture 3521 is positioned at the rear focal point of the lens 351. 352 is arranged. Therefore, the zero-order light L0 that is not diffracted in the electro-optic crystal substrate 331, passes through the lens 34, and is substantially parallel to both the X direction and the Y direction is indicated by a thin solid line in FIG. As shown, the light is condensed on the aperture 3521 through the lens 351, passes through the aperture 3521, and enters the lens 353. The lens 353 is arranged such that the front focal point is located in the vicinity of the aperture 3521 and the rear focal point is on the surface of the substrate W held on the stage 5, and the 0th-order light L 0 passes through the lens 353. Irradiation is performed on the surface of the substrate W. For example, as shown in FIG. 6A, when the voltage V1 is applied only to the first electrode 333 (2ch) of the second channel, the 0th-order light L0 corresponding to the other channels (1, 3 to 5ch) is In this way, the surface of the substrate W is irradiated and exposed in a spot shape corresponding to each channel (1, 3 to 5ch). On the other hand, the Bragg diffracted light BL is emitted from the electro-optic crystal substrate 331 at an angle (2θb) with respect to the optical axis OA as shown by a broken line in FIG. , Ie, the surface of the aperture plate 352.

  Thus, in the present embodiment, the so-called Schlieren optical system 35 is configured by the lens 351, the aperture plate 352, and the lens 353. The schlieren optical system 35 has the same arrangement as the double-sided telecentric optical system. As shown in FIG. 4, even when the substrate W is exposed with the optical head 3 having a plurality of channels, the exposure surface (surface of the substrate W). ), The principal ray of the zero-order light LO in each channel (the two-dot chain line in FIG. 4) is vertical, and is not affected by the change in magnification with respect to the change in the focus direction Z of the exposure surface. As a result, highly accurate exposure is possible. As described above, in the first embodiment, pattern drawing on the substrate W is performed using 0th-order light. Further, the lens 34 and the schlieren optical system 35 arranged as described above function as the “optical system” of the present invention, and the light from the spatial light modulator 33 is transmitted to the surface of the substrate W (exposed surface, drawing surface). Screen).

  The pattern drawing apparatus 1 configured as described above has a computer 8 for controlling the entire apparatus. The computer 8 has a CPU and a memory 81, etc., are arranged in electric rack (not shown) in conjunction with the exposure control unit 41. Further, the rasterization unit 82, the expansion / contraction rate calculation unit 83, the data correction unit 84, and the data generation unit 85 are realized by the CPU in the computer 8 performing arithmetic processing according to a predetermined program. For example, pattern data corresponding to one LSI is data generated by an external CAD or the like, and is prepared in advance in the memory 81 as LSI data 811. Based on the LSI data 811, the LSI pattern is as follows. Is drawn on the substrate W.

  The rasterizing unit 82 divides and rasterizes the unit area indicated by the LSI data 811, generates raster data 812, and stores it in the memory 81. Thus, after preparing the raster data 812 or in parallel with the preparation of the raster data 812, the unprocessed substrate W stored in the cassette CS as described above is carried out by the robot 7 and pre-aligned by the pre-alignment unit PA. After receiving the alignment process, it is placed on the stage 5 by the robot.

  Thereafter, the stage 5 is moved to a position immediately below the camera 6 by the stage moving mechanism 51, and the alignment marks (reference marks) on the substrate W are sequentially positioned at the imageable positions of the camera 6, and mark imaging by the camera 6 is executed. Is done. The image signal output from the camera 6 is processed by an image processing circuit (not shown in FIG. 3) in the electrical rack, and the position of the alignment mark on the stage 5 is accurately obtained. Based on the positional information, the θ-axis drive unit 51T is operated to slightly rotate the stage 5 about the vertical axis, and alignment (positioning) is performed in a direction suitable for pattern drawing on the substrate W. Here, the alignment may be performed after the stage 5 is moved to a position directly below the optical head 3.

  The stretch rate calculation unit 83 shown in FIG. 3 acquires the alignment mark position on the substrate W and the correction amount of the orientation of the substrate W obtained by the image processing circuit, and the alignment mark position after alignment, The expansion / contraction ratio of the substrate W with respect to the main scanning direction Y and the sub-scanning direction X (that is, the expansion ratio of the main surface) is obtained.

  On the other hand, the data correcting section 84 acquires the raster data 812, corrects the data based on the scaling factor is the detection result of the stretching. For this data correction, for example, the method described in Japanese Patent No. 40020248 can be adopted. When the data correction of one divided area is completed, the corrected raster data 812 is sent to the data generation unit 85. . The data generating unit 85, the drawing data corresponding to the divided region of the changed, i.e., data corresponding to one stripe is generated.

  The drawing data generated in this way is sent from the data generation unit 85 to the exposure control unit 41, and the exposure control unit 41 controls each part of the potential applying unit 336, the head moving mechanism 30, and the stage moving mechanism 51, thereby producing one stripe. Minutes are drawn. The exposure operation is performed by the electric field generation control by the potential applying unit 336 as described above. When the exposure recording for one stripe is completed, the same processing is performed for the next divided region, and drawing for each stripe is repeated. Thus, when drawing of all stripes on the substrate W is completed and drawing of a desired pattern on the surface of the substrate W is completed, the stage 5 is placed on the substrate delivery position (FIGS. 1 and 2 in FIG. 1 and FIG. 2). After the movement to the left region, the substrate W is returned to the cassette CS by the substrate transfer robot 7, the next substrate W is taken out, and the same series of processing as described above is repeated. Further, when the pattern drawing on all the substrates W stored in the cassette CS is completed, the cassette CS is unloaded from the pattern drawing apparatus 1.

  As described above, according to the above-described embodiment, the five first electrodes 333 are separated from each other in the X direction substantially perpendicular to the traveling direction Z of the incident light LI traveling in the periodic polarization reversal structure of the electro-optic crystal substrate 331. Are arranged on one main surface 332 of the electro-optic crystal substrate 331. Each first electrode 333 is electrically connected to the potential applying unit 336, and the voltage applied by the potential applying unit 336 to the first electrode 333 is controlled between each of the first electrodes 333 and the second electrode 335. The diffraction efficiency in the periodically poled structure is modulated for each first electrode 333. Thus, in the present embodiment, the potential applying unit 336 functions as the “modulation unit” of the present invention, and light modulation can be performed with the same number of channels as the first electrode 333.

  In addition, in the present embodiment, each first electrode 333 is arranged so that the diffraction grating generated in the periodically poled structure as described above satisfies the Bragg diffraction condition. More specifically, in the present embodiment, the arrangement direction AD of the first polarization unit 3311 and the second polarization unit 3312 is inclined by an angle (90 ° −θb) with respect to the incident light LI. This angle θb is the diffraction angle when the incident light LI is Bragg diffracted. For example, when the grating period RC in the periodically poled structure is 10 μm and the wavelength of the incident light LI is 635 nm, the diffraction angle θb is set to 3.18 mrad (about 1.8 °). The Bragg diffracted light BL is emitted from the electro-optic crystal substrate 331 at a separation angle 2θb, that is, 63.5 mrad (about 3.6 °) by the generated diffraction grating. Thus, the Bragg diffracted light BL can be generated by controlling the electric field generation by the potential applying unit 336, and the diffraction efficiency of the Bragg diffracted light BL is high. As a result, a high extinction ratio is obtained. In addition, the spatial light modulator 33 can be used to guide the 0th-order light L0 to the substrate W (recording material) to draw a pattern corresponding to the LSI data, and the drawing quality can be greatly improved.

  Each first electrode 333 is formed such that the electrode width EW1 of the first electrode 333 in the X direction is wider than the lattice period RC, for example, about three times the lattice period RC. For this reason, the first electrode 333 can be easily manufactured as compared with the manufacture of the periodically poled structure, and an effective diffraction angle can be obtained, thereby enabling highly efficient light modulation. However, since the exposure width increases as the electrode width EW1 increases, it is preferable to set it to about 3 to 5 times the grating period RC from the viewpoint of performing pattern drawing on the substrate W with high resolution.

Second Embodiment
By the way, in 1st Embodiment, although the electrode width EW1 of the 1st electrode 333 is wider than the lattice period RC, you may make the electrode width EW1 of the 1st electrode 333 in a X direction thin.

  FIG. 7 is a diagram showing a second embodiment of the present invention. In the second embodiment, as shown in the figure, a plurality of first electrodes 333 having an electrode width EW1 substantially equal to the grating period RC and extending in parallel with the optical axis OA are substantially perpendicular to the incident light LI. They are arrayed in the direction X to be spaced apart from each other. Also in the second embodiment, a voltage is applied independently for each first electrode 333, and the number of channels and exposure are controlled by controlling the voltage application mode from the potential applying unit 336 (not shown). The width can be finely adjusted. In this second embodiment, 15 first electrodes 333 are provided. However, when voltage application is controlled for every three adjacent electrodes as shown in FIG. As shown in FIG. 4B, the exposure position can be set finely by performing control to shift the position of the diffracted light BL by one electrode. That is, as shown in FIG. 3C, the position of the second channel (2ch) can be finely controlled in units of electrodes. In the embodiment shown in the figure, control can be performed in units obtained by dividing one channel into three. Of course, as in the first embodiment, each first electrode 333 is arranged on one main surface 332 so that the diffraction grating generated in the periodically poled structure satisfies the Bragg diffraction condition. Then, by adjusting the voltage application from the potential applying unit 336 to the first electrode 333 in units of a plurality (in the second embodiment, “3”), the electric field generation is controlled to generate the Bragg diffracted light BL. Yes. Therefore, similarly to the first embodiment, the diffraction efficiency of the Bragg diffracted light BL is high, and as a result, a high extinction ratio is obtained. In addition, the spatial light modulator 33 can be used to guide the 0th-order light L0 to the substrate W (recording material) to draw a pattern corresponding to the LSI data, and the drawing quality can be greatly improved.

<Third Embodiment>
FIG. 8 is a diagram showing a third embodiment of the present invention. The third embodiment is greatly different from the first embodiment in the arrangement of the first electrode 333. That is, the plurality of first electrodes 333 are arranged in the direction X substantially perpendicular to the direction Z of the incident light LI in the first embodiment, whereas the Bragg diffracted light BL advances in the third embodiment. They are spaced apart from each other in a direction ND substantially perpendicular to the direction BD (corresponding to the “second direction” of the present invention). As described above, even when the plurality of first electrodes 333 are arranged apart from each other in the direction ND corresponding to the “third direction” of the present invention, the same effect as the first embodiment can be obtained. In the second embodiment, the first electrode 333 extends in the traveling direction BD of the Bragg diffracted light BL.

  Further, in the third embodiment, it is possible to perform light modulation with the same number of channels as the first electrode 333 using the relatively wide first electrode 333 as in the first embodiment. Even in the case of using the relatively narrow first electrode 333 as in the second embodiment, the first electrode 333 is arranged by being spaced apart from each other in the direction ND substantially perpendicular to the direction BD in which the Bragg diffracted light BL travels. Effects similar to those of the second embodiment can be obtained.

<Fourth embodiment>
FIG. 9 is a diagram showing a fourth embodiment of the present invention. The fourth embodiment is largely different from the first embodiment in which exposure recording is performed using the 0th-order light LO in that a pattern is drawn on the surface of the substrate W using the Bragg diffracted light BL. That is, as shown in FIG. 9, the characteristic part of the fourth embodiment is that the optical system (cylindrical lens 34 + schlieren optical system 35) provided on the emission side of the spatial light modulator 33 travels in the incident light LI on the XZ plane. This is that the optical axis OA on the incident side of the spatial light modulator 33 is inclined at an angle 2θb.

  In the pattern drawing apparatus configured as described above, as indicated by a broken line in FIG. 5A, the Bragg diffracted light BL is diffracted by the spatial light modulator 33 and the Bragg diffracted light BL is emitted from the exit surface of the spatial light modulator 33. Through the aperture 3521, passes through the aperture 3521, and enters the lens 353. Then, the Bragg diffracted light BL is irradiated onto the surface of the substrate W through the lens 353 by the lens 353. For example, when the voltage V1 is applied to the first electrodes 333 of the first and third to fifth channels, the Bragg diffracted light BL corresponding to these channels (1, 3 to 5ch) is formed on the surface of the substrate W as described above. Irradiated and exposed in a spot shape corresponding to each channel (1, 3 to 5 ch). On the other hand, the two-channel light, that is, the 0th-order light LO is emitted from the electro-optic crystal substrate 331 in parallel with the optical axis OA as shown by the solid line in FIG. The position is blocked by the surface of the aperture plate 352.

  As described above, in the fourth embodiment, the Bragg diffracted light BL can be generated by controlling the electric field generation in the periodically poled structure by the potential applying unit 336, and the diffraction efficiency of the Bragg diffracted light BL is as follows. As a result, a high extinction ratio is obtained. Further, by using the spatial light modulator 33, the Bragg diffracted light BL can be guided to the substrate W (recording material) to draw a pattern corresponding to LSI data, and the drawing quality can be greatly improved.

  In the fourth embodiment, the spatial light modulator 33 shown in FIGS. 5 and 6 is used. However, the usable spatial light modulator 33 is not limited to this. For example, FIG. The spatial light modulator 33 shown may be used.

<Fifth Embodiment>
FIG. 10 is a diagram showing a fifth embodiment of the present invention, and shows a specific configuration of the spatial light modulator 33. The spatial light modulator 33 shown in the figure is greatly different from the spatial light modulator 33 of the first embodiment (see FIG. 5B) in that a slab waveguide 3314 is provided in the electro-optic crystal substrate 331. That is, in the fifth embodiment, as shown in FIG. 10A, the entire one main surface 332 of the electro-optic crystal substrate 331 is subjected to a treatment by the annealing proton exchange method. Thereby, in the cross section of the electro-optic crystal substrate 331 perpendicular to the Z direction, which is the traveling direction of light, the refractive index (first electrode) increases in the (−Y) direction from the position of the one main surface 322 (the upper position in the figure). A refractive index distribution in which the refractive index in a state where no electric field is generated between 333 and the second electrode 335 is reduced is similarly formed in the entire electro-optic crystal substrate 331. In FIG. 10, gradation is given to the cross section perpendicular to the light traveling direction Z, and the refractive index gradually decreases with increasing distance from the main surface 332 to the (−Y) side. . With this configuration, the light LI incident on the periodically poled structure of the electro-optic crystal substrate 331 via the incident surface 331a is only in a portion (thin plate-shaped portion) having a high refractive index in the vicinity of the one main surface 332. And is guided in the Z direction. As described above, in the spatial light modulator 33 in FIG. 10A, a portion in the vicinity of the one main surface 332 of the electro-optic crystal substrate 331 is a slab waveguide. Therefore, light loss during propagation in the electro-optic crystal substrate 331 is negligible, and light can be efficiently propagated.

  In order to further reduce the optical loss, the first electrode 333 is separated from the one main surface 322 of the electro-optic crystal substrate 331 by a distance H1 (a slight distance of about 1 μm) as shown in FIG. An air layer may be formed, or a thin film layer 337 such as SiO 2 may be interposed between the one main surface 322 of the electro-optic crystal substrate 331 and the first electrode 333 as shown in FIG. In the spatial light modulator 33 configured as described above, light (evanescent wave) is not absorbed by the metal first electrode 333, and as a result, light loss can be reduced.

  Further, as shown in FIG. 4D, by providing a slab waveguide 3314 at the center of the electro-optic crystal substrate 331 in the Y direction, the refractive index distribution is in the (+ Y) direction and (− The light loss during the propagation in the electro-optic crystal substrate 331 can be further reduced by being substantially symmetrical in the Y) direction. The electro-optic crystal substrate 331 shown in FIG. 4D can be produced as follows. As described above, when both main surfaces of the electro-optic crystal substrate 331 are processed by the annealing proton exchange method, a slab waveguide 3314 is formed in the vicinity of each main surface. Then, after dividing the substrate 331 into two along the central portion of the electro-optic crystal substrate 331 in the Y direction, the slab waveguides 3314 are bonded to each other as shown in FIG. An electro-optic crystal substrate 331 having a slab waveguide 3314 in the center is obtained. By using the electro-optic crystal substrate 331 formed in this way, the light loss in the spatial light modulator 33 can be greatly reduced.

  Further, the electro-optic crystal substrate 331 itself shown in FIG. 5 may be further thinned in the Y direction, for example, thinned to 5 μm or less, so that the electro-optic crystal substrate 331 itself is entirely made into a slab waveguide. In this case, the optical loss is larger than that of the electro-optic crystal substrate 331 shown in FIG. 10, but the distance between the first electrode 333 and the second electrode 335 is shortened, and the strength of the electric field generated in the periodically poled structure is increased. The electro-optic effect is also increased. As a result, light modulation can be performed at a low voltage.

<Sixth Embodiment>
FIG. 11 is a diagram showing a sixth embodiment of the present invention. FIG. 12 is a diagram showing a spatial light modulator used in the pattern drawing apparatus shown in FIG. Further, FIG. 13 is a comparison diagram between the first embodiment and the sixth embodiment. The spatial light modulator 33 according to the sixth embodiment is different from the first embodiment in that the periodic polarization inversion structure formed on the electro-optic crystal substrate 331, and between the spatial light modulator 33 and the cylindrical lens 34 are different. The other configuration is basically the same as that of the first embodiment. Hereinafter, the difference will be mainly described.

  In the slit plate 36 used in the sixth embodiment, a slit 361 extending in the X direction is formed, and the zero-order light LO can pass through the slit 361. On the other hand, in the sixth embodiment, since the first polarization portion 3311 and the second polarization portion 3312 have a tilted periodically poled structure as will be described below, one main surface from the central portion of the electro-optic crystal substrate 331 is obtained. The Bragg diffracted light BL and the recombination light described below that are emitted while being inclined toward the side 332 or the other main surface 334 are shielded by the slit plate 36.

  Next, the difference between the periodically poled structures in the first embodiment and the sixth embodiment, and the specific operational effects in the sixth embodiment will be described with reference to FIGS. 12 and 13. In the first embodiment, as shown in FIG. 5, the boundary surface 3315 of the first polarization portion 3311 and the second polarization portion 3312 arranged adjacent to each other with respect to the one main surface 332 and the other main surface 334 of the electro-optic crystal substrate 331. The incident light LI is configured to be perpendicularly incident on the first polarization unit 3311 and the second polarization unit 3312. For this reason, as shown in the column “First Embodiment” in FIG. 13, the diffraction surface of the Bragg diffraction is parallel to the one main surface 332 and the other main surface 334, and is located approximately in the middle between them. Therefore, when the incident light LI incident on the electro-optic crystal substrate 331 is Bragg diffracted, the Bragg diffracted light BL travels along the diffracting surface and recombination occurs. The recombined light travels along the diffraction plane and parallel to the incident light LI, and is emitted from the electro-optic crystal substrate 331. Such recombination light is a factor for reducing the extinction ratio, and it is important to suppress this to increase the extinction ratio and obtain high contrast.

  On the other hand, in the sixth embodiment, as shown in FIG. 12, the first polarization portion 3311 and the second polarization portion 3312 are inclined, more specifically, the boundary surface between the first polarization portion 3311 and the second polarization portion 3312. First polarization portion 3311 and second polarization portion 3312 are formed such that 3315 is inclined with respect to one main surface 332 and the other main surface 334 of electro-optic crystal substrate 331. Therefore, the incident light LI is obliquely incident on the first polarization unit 3311 and the second polarization unit 3312, and the diffraction surface of the Bragg diffraction is a boundary surface 3315 as shown in the column “Sixth Embodiment” in FIG. It is inclined corresponding to the inclination angle. Therefore, when the incident light LI is Bragg diffracted, the Bragg diffracted light BL travels toward the one main surface 3311 (or the other main surface 3312 depending on the inclination) along the diffraction surface. Therefore, coupling of light is less likely to occur necessary for diffraction, the amount of recombination light is reduced as compared with the first embodiment. Further, by appropriately setting the inclination angles of the first polarization portion 3311 and the second polarization portion 3312 (that is, the inclination angle of the boundary surface 3315 with respect to both main surfaces 332 and 334), recombination is prevented and recombination light is generated. Itself can be eliminated.

  As described above, according to the sixth embodiment, not only the same effects as the first embodiment can be obtained, but also the recombination light is generated by inclining the first polarization unit 3311 and the second polarization unit 3312. Can be suppressed and further prevented, and a higher extinction ratio can be obtained.

  The present invention is not limited to the above-described embodiment, and various modifications other than those described above can be made without departing from the spirit of the present invention. For example, in the first, second, and fourth to sixth embodiments, the first electrode 333 is extended in the direction Z in which the incident light LI travels. As long as the adjacent channels in the arrangement direction X of the one electrode 333 do not overlap each other, it is arbitrary. In the third embodiment, the first electrode 333 is extended to the BD in the direction in which the Bragg diffracted light BL travels. However, in the same embodiment, the first electrode 333 is shaped in the arrangement direction ND of the first electrode 333. As long as adjacent channels do not overlap with each other, it is optional.

  In the above embodiment, the head moving mechanism 30 is provided in the optical head 3 equipped with the spatial light modulator 33 according to the present invention to adjust the distance between the substrate W and the optical head 3. The above-mentioned distance may be adjustable by providing an elevating drive unit. Further, the configuration for moving the substrate W relative to the optical head 3 is not limited to the above embodiment. That is, spatial light modulation is performed in accordance with drawing (LSI) data while moving the position at which the plurality of lights emitted from the spatial light modulator 33 are irradiated on the substrate W held on the stage 5 relative to the substrate W. The present invention can be applied to any pattern drawing apparatus that controls the device 33 to draw a pattern.

  The recording material for drawing the pattern may be a photosensitive material such as a printed wiring board or a semiconductor substrate, or may be another photosensitive material, and is a material that reacts to heat due to light irradiation. It may be.

  Furthermore, the spatial light modulator 33 configured as described above may be used for purposes other than pattern drawing. In this case, the object to be irradiated with light may be other than the recording material.

DESCRIPTION OF SYMBOLS 1 ... Pattern drawing apparatus 31 ... Light source part 32 ... Illumination optical system 33 ... Spatial light modulator 34 ... Cylindrical lens (optical system)
35 ... Schlieren optical system (optical system)
331: Electro-optic crystal substrate 3311: First polarization unit 3312 ... Second polarization unit 3313 ... Polarization pair 3314 ... Slab waveguide 3315 ... Interface surface 331a ... Incident surface 332 ... One main surface (of the electro-optic crystal substrate) 334 ( The other main surface (of the electro-optic crystal substrate) 336... Potential application unit (modulation unit)
337 ... thin film layer AD ... arrangement direction (first direction)
BD: Direction of travel of Bragg diffracted light (second direction)
BL: Bragg diffracted light LI: incident light ND: arrangement direction (third direction)
OA ... optical axis RC ... lattice period W ... substrate X ... arrangement direction (third direction)
Z: Direction in which incident light travels (second direction)

Claims (12)

Having a periodic polarization reversal structure in which first and second polarization parts having opposite directions of polarization generated by receiving an electric field are alternately arranged in a first direction at a predetermined period, with respect to the first direction; An electro-optic crystal substrate through which light traveling along the inclined second direction passes through the periodic domain-inverted structure;
A plurality of first electrodes provided on one main surface of the electro-optic crystal substrate;
A second electrode provided on the other main surface of the electro-optic crystal substrate;
A modulation unit that controls electric field generation between the plurality of first electrodes and the two electrodes, respectively, and modulates diffraction efficiency in the periodically poled structure,
The plurality of first electrodes are spaced apart from each other in a third direction substantially perpendicular to a traveling direction of light traveling in the periodically poled structure,
Each of the plurality of first electrodes receives the electric field generated between the first electrode and the second electrode so that a diffraction grating generated in the periodically poled structure satisfies the Bragg diffraction condition. A spatial light modulator characterized by being arranged with respect to an electro-optic crystal substrate.   2. The spatial light modulator according to claim 1, wherein the third direction is a direction substantially orthogonal to a traveling direction of incident light incident on the periodically poled structure.   The spatial light modulator according to claim 2, wherein each of the plurality of first electrodes extends in a direction in which the incident light travels.   2. The spatial light modulator according to claim 1, wherein the third direction is a direction substantially orthogonal to a traveling direction of Bragg diffracted light that is Bragg diffracted in the periodically poled structure.   The spatial light modulator according to claim 4, wherein each of the plurality of first electrodes extends in a direction in which the Bragg diffracted light travels.   The spatial light modulator according to claim 1, wherein a width of the first electrode in the third direction is wider than the predetermined period.   7. The boundary surface between the first polarization part and the second polarization part arranged adjacent to each other is inclined with respect to the one main surface and the other main surface of the electro-optic crystal substrate. The spatial light modulator according to one item.   8. The spatial light modulator according to claim 1, wherein the electro-optic crystal substrate is provided with a slab waveguide in a part in a thickness direction from the one main surface to the other main surface. 9. .   The spatial light modulator according to claim 1, wherein the slab waveguide is formed at a center in the thickness direction.   The spatial light modulator according to claim 8 or 9, wherein the slab waveguide is formed by an annealing proton exchange method.   The spatial light modulator according to any one of claims 1 to 10, wherein a thickness from the one main surface to the other main surface of the electro-optic crystal substrate is 30 µm or less. A pattern drawing apparatus for drawing a pattern on a recording material,
A light source unit;
The spatial light modulator according to any one of claims 1 to 11, wherein light from the light source unit is incident;
An optical system arranged between the spatial light modulator and the recording material and guiding one of zero-order light and Bragg diffracted light passing through the periodic polarization reversal structure to the recording material. A characteristic pattern drawing apparatus.

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