JP2011031156A - Washing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a washing apparatus which efficiently performs washing operation and suppresses uneven washing. <P>SOLUTION: The washing apparatus 1 includes: a washing tank 2 for putting a washing liquid 4 in; a holding part 3 for objects to be washed which part immerses the objects 20 in the washing liquid 4 in the washing tank 2 and holds them; an ultrasonic vibrator 5 for emitting an ultrasonic wave S into the washing liquid 4; and ultrasonic reflection plates 7A, 7B, 7C, 7D which are arranged with an inclined angle relative to the emitting direction of the ultrasonic wave S, facing an ultrasonic wave emission region 5a. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a cleaning apparatus that performs ultrasonic cleaning by immersing an object to be cleaned in a cleaning liquid.

2. Description of the Related Art Conventionally, a cleaning apparatus is known that removes dirt by immersing an object to be cleaned in a cleaning liquid and irradiating ultrasonic waves. In such a cleaning apparatus, it is necessary to change the relative position between the ultrasonic wave and the object to be cleaned in order to uniformly apply ultrasonic waves to the object to be cleaned in the cleaning liquid. However, moving the object to be cleaned causes an increase in the size of the cleaning device. In addition, depending on the size and shape of the cleaning holder that holds the object to be cleaned and the object to be cleaned, unevenness is likely to occur in the way the ultrasonic wave hits.
Therefore, conventionally, a cleaning apparatus has been proposed that can change the way in which the ultrasonic wave strikes without changing the position of the object to be cleaned.
Patent Document 1 discloses an ultrasonic cleaner that immerses an object to be cleaned in a cleaning liquid in a cleaning tank and emits ultrasonic waves into the cleaning liquid from an ultrasonic vibrator to ultrasonically clean the object to be cleaned. An ultrasonic cleaner comprising: a reflector that is immersed in the cleaning liquid and that is disposed opposite to the ultrasonic transducer; and a reflector driving device that moves the reflector during cleaning. Is described.
Further, Patent Document 2 is a cleaning device for immersing an article in a cleaning liquid and irradiating with ultrasonic waves for cleaning, and a liquid level elevating means is provided in a cleaning tank in which the cleaning liquid is put, and the cleaning liquid level is used during the cleaning operation. A cleaning apparatus is described that can be moved up and down within a range including 1/2 or more of the wavelength of ultrasonic waves.

JP 58-81475 A JP-A-7-185485

However, the conventional cleaning apparatus as described above has the following problems.
In the technique described in Patent Document 1, the state of the standing wave of the ultrasonic wave generated in the cleaning liquid is changed by vibrating (swinging) the reflecting plate up and down with respect to the object to be cleaned in the cleaning liquid. Cleaning unevenness due to generation of a constant standing wave depending on the water depth of the cleaning liquid is suppressed.
However, with this technology, the unevenness of the ultrasonic wave is improved only in the direction of movement of the reflector, and the ultrasonic wave does not efficiently hit in the direction parallel to the traveling direction of the ultrasonic wave. Depending on the case, there is a problem that uneven cleaning remains. In order to improve this, there is a problem that the efficiency of the cleaning work is deteriorated because it is necessary to further clean by changing the arrangement posture of the object to be cleaned.
In addition, since it is necessary to arrange the reflector in a positional relationship covering the object to be cleaned, it takes time to replace the object to be cleaned because it interferes with the removal and insertion of the object to be cleaned, and the efficiency of the cleaning work is deteriorated. There is also a problem.
In the technique described in Patent Document 2, the position of the ultrasonic standing wave nodes and antinodes is moved above and below the liquid level by raising and lowering the liquid level in the cleaning tank in a range including 1/2 or more of the wavelength of the ultrasonic wave. Move in the direction. Thereby, since the node position of the standing wave in which the ultrasonic cleaning ability is lowered moves in the vertical direction, the unevenness of cleaning can be suppressed to some extent.
In this case, the object to be cleaned can be easily exchanged because it does not have a reflector that obstructs the removal and insertion of the object to be cleaned, but since the free end reflection of the liquid level is used instead of the reflector, In the direction parallel to the traveling direction, the cleaning unevenness remains depending on the shape of the object to be cleaned, just as in Patent Document 1.

  The present invention has been made in view of the above problems, and an object of the present invention is to provide a cleaning apparatus that can efficiently perform a cleaning operation and suppress cleaning unevenness.

  In order to solve the above-described problems, the cleaning device of the present invention includes a cleaning tank in which a cleaning liquid is put, a holding unit that holds an object to be cleaned in the cleaning liquid in the cleaning tank, and the cleaning liquid An ultrasonic emission unit that emits ultrasonic waves, and a reflection unit that is disposed opposite to the ultrasonic emission region and is inclined with respect to the ultrasonic wave emission direction.

  Further, the cleaning device of the present invention is configured to include a reflection unit moving unit that movably supports the reflection unit in the ultrasonic wave emission direction of at least the ultrasonic wave emission unit.

  In the cleaning device of the present invention, the reflection portion is plate-shaped and includes a plurality of pieces, and each of the plurality of reflection portions corresponds to each of the plurality of partial regions in the ultrasonic wave emission region. Thus, it is possible to have a portion facing the partial region.

  Further, in the cleaning device having a plurality of sheets in which the reflection portion of the present invention is plate-shaped, each of the surfaces of the plurality of reflection portions facing the ultrasonic wave emission region is separated from the ultrasonic wave emission portion. Has a large area

  Moreover, in the cleaning apparatus of the present invention, an angle changing unit that changes the inclination angle of the reflecting unit can be provided.

  According to the cleaning device of the present invention, since the ultrasonic wave emitted from the ultrasonic wave emission unit by the reflection unit can be reflected in an oblique direction with respect to the emission direction, the irradiation position on the object to be cleaned can be changed. The work can be performed efficiently and cleaning unevenness can be suppressed.

It is the typical front view and top view which show schematic structure of the washing | cleaning apparatus which concerns on the 1st Embodiment of this invention. It is a schematic diagram which shows the mode of the standing wave between an ultrasonic oscillation surface and a reflective surface or a liquid level reflective surface. It is a typical top view which shows schematic structure of the washing | cleaning apparatus which concerns on the 1st modification of the 1st Embodiment of this invention, and a 2nd modification. It is a typical front view which shows schematic structure of the washing | cleaning apparatus which concerns on the 3rd modification of the 1st Embodiment of this invention. It is the typical top view which shows schematic structure of the washing | cleaning apparatus which concerns on the 2nd Embodiment of this invention, and its KK sectional drawing. It is a typical front view which shows schematic structure of the washing | cleaning apparatus which concerns on the 3rd Embodiment of this invention.

  Embodiments of the present invention will be described below with reference to the accompanying drawings. In all the drawings, even if the embodiments are different, the same or corresponding members are denoted by the same reference numerals, and common description is omitted. Moreover, all the drawings are schematic diagrams, and the dimensions and shapes are exaggerated for easy viewing.

[First Embodiment]
A cleaning apparatus according to a first embodiment of the present invention will be described.
1A and 1B are a schematic front view and a plan view showing a schematic configuration of a cleaning apparatus according to a first embodiment of the present invention.

As shown in FIGS. 1A and 1B, the cleaning apparatus 1 of the present embodiment performs ultrasonic cleaning in the cleaning liquid 4 by immersing the cleaning object 20 in the cleaning liquid 4.
The schematic configuration of the cleaning apparatus 1 includes a cleaning tank 2, an object-to-be-cleaned holding unit 3 (holding unit), an ultrasonic transducer 5 (ultrasonic wave emitting unit), and ultrasonic reflectors 7A, 7B, 7C, and 7D (reflecting unit). And a moving mechanism 8 (reflecting part moving part).
As the object to be cleaned 20, an appropriate object to be cleaned that can be ultrasonically cleaned can be adopted. Examples of the object to be cleaned 20 include a lens.
The object to be cleaned 20 may be dipped in the cleaning liquid 4 as a single item, but may be plural. In the present embodiment, an example in which a plurality of objects to be cleaned 20 are held by an object holding jig 21 will be described. The cleaning object holding jig 21 is constituted by, for example, a frame body that exposes and holds each cleaning surface of the cleaning object 20.
As the cleaning liquid 4, an appropriate liquid that can be used for ultrasonic cleaning, for example, a detergent solution, a solvent, water, or the like can be used.

The cleaning tank 2 contains the cleaning liquid 4, and in this embodiment, as an example, the cleaning tank 2 includes a rectangular parallelepiped container having an opening on the upper side constituted by a bottom surface portion 2a and four side surface portions 2b.
The cleaning liquid 4 is put in the cleaning tank 2 by a volume smaller than the volume of the cleaning tank 2, and thus the liquid level 4 a is formed at a position lower than the opening of the cleaning tank 2.

The object-to-be-cleaned holding unit 3 is configured to immerse and hold the object to be cleaned 20 in the cleaning liquid 4 placed in the cleaning tank 2. In the present embodiment, in the approximate center of the bottom surface portion 2a of the cleaning tank 2, a net-like placement surface 3a having a rectangular shape in plan view disposed at a height lower than the liquid surface 4a of the cleaning liquid 4, and four corners of the net-like placement surface 3a And four leg portions 3b supported from below.
The net-like placement surface 3a is composed of a member having a large number of through-holes that can transmit ultrasonic waves well. For example, it can be constituted by a net-like member knitted with a wire or a wire, or a thin plate member provided with a large number of through holes.
The net-like placement surface 3a is provided in a range wider than the area of the cleaning object holding jig 21 in plan view. A cleaning liquid region filled only with the cleaning liquid 4 is formed above and below the net-like mounting surface 3a. For this reason, the cleaning object holding jig 21 and the cleaning object 20 can be taken in and out from the opening of the cleaning tank 2 at an arbitrary position above the net-like placement surface 3a.

The ultrasonic transducer 5 transmits ultrasonic vibrations to the cleaning tank 2, and in this embodiment, is attached to the approximate center of the lower surface of the bottom surface portion 2a.
Further, the ultrasonic transducer 5 of the present embodiment has a vibration surface that is rectangular in plan view. Therefore, when the ultrasonic transducer 5 is driven, a rectangular shape inside the bottom surface portion 2a of the cleaning tank 2 is obtained. The ultrasonic wave S is emitted from the ultrasonic wave emission region 5a. The emission direction of the ultrasonic wave S is a direction from the bottom surface portion 2a toward the upper side (the liquid surface 4a side) because of its straightness.
As the frequency ν of the ultrasonic wave S generated by the ultrasonic vibrator 5, an appropriate frequency can be adopted depending on the degree and type of dirt on the object 20 to be cleaned. As an example of a suitable frequency, ν = 40 (kHz) can be adopted.

The ultrasonic reflection plates 7A, 7B, 7C, and 7D are rectangular flat plate members that are disposed at an inclination angle with respect to the emission direction of the ultrasonic wave S so as to face the ultrasonic emission region 5a in the cleaning liquid 4.
The material of the ultrasonic reflectors 7A, 7B, 7C, and 7D is not particularly limited as long as it can efficiently reflect ultrasonic waves and has durability to ultrasonic irradiation. For example, a stainless steel plate having a thickness of about 1 mm can be suitably employed.
In the present embodiment, in order to hold these ultrasonic reflectors 7A, 7B, 7C, and 7D, in the vertical direction from the cleaning liquid 4 to the upper side of the cleaning tank 2 at positions facing each other with the object holding unit 3 interposed therebetween. The extended reflecting plate holding members 6 are respectively arranged.
The moving shaft 6b formed on the upper end side of each reflector holding member 6 is supported above the cleaning tank 2 so as to be movable in the vertical direction by a moving mechanism 8 fixed to a support member (not shown).
In addition, on the lower end side of each reflection plate holding member 6, there are provided ultrasonic reflection plates 7A and 7B and reflection plate fixing portions 6a for fixing the ultrasonic reflection plates 7C and 7D, respectively.

The ultrasonic reflection plates 7A and 7B are fixed to each other in the vertical direction in the reflection plate fixing portion 6a on the left side of FIG. 1A. However, the positional relationship in the vertical direction is such that the ultrasonic reflection plate 7B is disposed below the ultrasonic reflection plate 7A (side closer to the ultrasonic transducer 5).
The ultrasonic reflection plate 7A is an area between the reflection plate holding member 6 and the left side of the object to be cleaned 3 shown in the drawing, from the upper side of the object to be cleaned holding jig 21 to the reflection plate holding member 6. None the inclination angle theta _a, are provided so as to protrude obliquely upward from the reflector holding member 6.
The ultrasonic reflection plate 7B is reflected from a position near the lower end on the side of the cleaning object holding jig 21 in an intermediate region between the reflection plate holding member 6 and the left side surface of the cleaning object holding unit 3 in the drawing. No inclination angle theta _B to the plate holding member 6 is provided so as to protrude obliquely upward from the reflector holding member 6.
Here, the ultrasonic reflector 7B has a smaller inclination angle than the ultrasonic reflector 7A (θ _B <θ _A ), and the projecting range from the reflector holding member 6 is narrower than the projecting range of the ultrasonic reflector 7A. It has become.
For this reason, as shown in FIG.1 (b), in the area | region between the reflection plate holding member 6 and the illustration left side of the to-be-cleaned object holding | maintenance part 3, the ultrasonic emission area | region 5a opposes the ultrasonic reflection board 7B. a partial area a _B that can be divided into the partial region a _a facing the ultrasonic reflector plate 7A projecting beyond the ultrasonic reflector 7B. In other words, the ultrasonic reflector 7B has a facing portion corresponding to the partial region A _B, ultrasonic reflector 7A may have a facing portion corresponding to the partial region A _A. The partial area A _B is a different area from the partial area A _A.

The inclination angles θ _A and θ _B of the ultrasonic reflectors 7A and 7B reflect the ultrasonic waves S _A and S _B emitted from the partial areas A _A and A _B , respectively, in the appropriate direction. The angle at which the object 20 can be irradiated is set.
For example, the inclination angle θ _A of the present embodiment is set to an angle larger than 45 ° so that the ultrasonic wave S _A can be reflected obliquely downward and reflected toward the object 20 to be cleaned. In the example shown in FIG. 1A, the inclination angle θ _A is set to about 50 ° so that it can be reflected toward the upper surface side of the article 20 to be cleaned.
Further, the inclination angle θ _B of the present embodiment is an angle smaller than the inclination angle θ _A and 45 ° so that the ultrasonic wave S _B can be reflected in the substantially horizontal direction and reflected toward the object 20 to be cleaned. The angle is set close to.

The ultrasonic reflection plates 7C and 7D are fixed to each other in the vertical direction in the reflection plate fixing portion 6a on the right side of FIG. 1A. However, the positional relationship in the vertical direction is such that the ultrasonic reflection plate 7D is disposed below the ultrasonic reflection plate 7D (the side closer to the ultrasonic transducer 5).
The ultrasonic reflection plate 7 </ b> C is inclined with respect to the reflection plate holding member 6 from the upper side of the cleaning object holding jig 21 in a region between the reflection plate holding member 6 and the right side surface of the cleaning object holding unit 3. The angle θ _C is formed and is provided so as to project obliquely upward from the reflector holding member 6.
Further, the ultrasonic reflection plate 7 </ b> D is located in the middle region between the reflection plate holding member 6 and the right side surface of the object-to-be-cleaned holding unit 3, from the position near the lower end on the side of the object-to-be-cleaned holding jig 21. No inclination angle theta _D with respect to the holding member 6 is provided so as to protrude obliquely upward from the reflector holding member 6.
Here, the ultrasonic reflecting plate 7D has a smaller inclination angle than the ultrasonic reflecting plate 7C (θ _D <θ _C ), and the protruding range from the reflecting plate holding member 6 is narrower than the protruding range of the ultrasonic reflecting plate 7C. It has become.
For this reason, as shown in FIG.1 (b), in the area | region between the reflector holding member 6 and the right side surface of the to-be-cleaned object holding part 3, the ultrasonic emission area | region 5a opposes the ultrasonic reflector 7D. a partial area a _D, can be divided into a portion facing the region a _C ultrasonic reflector 7C projecting beyond the ultrasonic reflector 7D. In other words, the ultrasonic reflector 7D has a facing portion corresponding to the partial region A _D, ultrasound reflector 7C may have the opposite portion corresponding to the partial region A _C. Incidentally, the partial area _{A D,} an area different from the partial region _{A C.}

The inclination angles θ _C and θ _D of the ultrasonic reflectors 7C and 7D reflect the ultrasonic waves S _C and S _D emitted from the partial areas A _C and A _{D of the} ultrasonic wave S in appropriate directions, respectively. The angle at which the object 20 can be irradiated is set.
For example, the inclination angle theta _C of this embodiment reflects the ultrasonic wave S _C obliquely downward, so that it can be reflected towards the object to be cleaned 20, an angle greater than 45 °, e.g., about 50 ° Is set.
Further, the inclination angle θ _D of the present embodiment is an angle smaller than the inclination angle θ _A and 45 ° so that the ultrasonic wave _SD can be reflected in the substantially horizontal direction and reflected toward the object 20 to be cleaned. The angle is set close to.

  Here, the positional relationship and the shape of the ultrasonic reflectors 7A and 7B and the ultrasonic reflectors 7C and 7D may be in a plane-symmetrical relationship, but are not limited to plane symmetry. . For this reason, the size, positional relationship, inclination angle, and the like of each ultrasonic reflector can be set to appropriate conditions as necessary. These conditions can be theoretically obtained by, for example, simulating a reflected wave of the ultrasonic wave S, but an actual washing experiment is performed to obtain a condition that can be satisfactorily washed. Also good.

The moving mechanism 8 supports the moving shaft portion 6b of the reflector holding member 6 so as to be movable along at least the emission direction of the ultrasonic wave S during the cleaning of the article 20 to be cleaned. Is supported above the opening of the cleaning tank 2. In this embodiment, it is possible to move in the vertical direction, which is the emission direction of the ultrasonic wave S.
As a structure of the moving mechanism 8, for example, a guide part that guides the movement of the moving shaft part 6b along the vertical direction and a drive part that moves the moving shaft part 6b in the vertical direction are provided. Examples of the driving unit include a single-axis moving mechanism such as a screw feed mechanism and a linear motor.
According to such a moving mechanism 8, the ultrasonic wave reflection plates 7A and 7B and the ultrasonic wave reflection plates 7C and 7D fixed to the reflection plate fixing portion 6a of each reflection plate holding member 6 are ultrasonicated during cleaning. It can be moved along the emission direction of S.

Next, the operation of the cleaning apparatus 1 will be described.
FIG. 2 is a schematic diagram showing a standing wave between the ultrasonic oscillation surface and the reflection surface or the liquid surface reflection surface.

In order to clean the object 20 to be cleaned by the cleaning device 1, first, the object to be cleaned is placed on the net-like placement surface 3 a of the object holding unit 3 disposed in the cleaning tank 2 filled with the cleaning liquid 4. 20 is placed. In the present embodiment, a plurality of objects to be cleaned 20 are placed on the net-like placement surface 3a while being held by the objects to be cleaned holding jig 21. For this reason, in this embodiment, mounting the cleaning object holding jig 21 on the mesh placement surface 3a is the same as placing the cleaning object 20 on the mesh placement surface 3a.
In the following, for the sake of simplicity, unless otherwise specified, placing or moving the “object to be cleaned 20 held by the object to be cleaned holding jig 21” or simply moving the “object to be cleaned 20” I will say that it will be placed or moved.

Only the cleaning liquid 4 is filled above the mesh placement surface 3a and on the side of the mesh placement surface 3a in the direction orthogonal to the opposing direction of each reflector holding member 6 (vertical direction in FIG. 1B). Since it is the cleaning liquid region, the object to be cleaned 20 can be easily arranged or moved through any of these regions.
For this reason, the placing work and the taking work of the article to be cleaned 20 are not limited to the upper side of the net-like placing surface 3a. For example, the object to be cleaned 20 is immersed in the cleaning liquid 4 on one side in a direction orthogonal to the opposing direction of each reflector holding member 6, moved in the cleaning liquid 4 in the horizontal direction, and placed on the net-like mounting surface 3 a. The object to be cleaned 20 that has been placed and cleaned is moved to the other side in the direction perpendicular to the opposing direction of each reflector holding member 6 and then lifted from the cleaning liquid 4 to place the work, A take-out operation may be performed. In this case, it is efficient when continuously cleaning a plurality of sets of objects 20 held by different objects to be cleaned holding jigs 21.

When the ultrasonic transducer 5 is driven, the ultrasonic wave S is emitted vertically upward from the ultrasonic wave emission region 5a at the bottom surface portion 2a below the mesh placement surface 3a.
The ultrasonic wave S _A (S _C ) emitted from the partial area A _A (A _C ) of the ultrasonic wave emission area 5 a is reflected obliquely downward by the ultrasonic reflection plate 7 A (7 C), and Irradiates the top side.
Further, the ultrasonic wave S _B (S _D ) emitted from the partial area A _B (A _D ) of the ultrasonic wave emission area 5a is reflected in a substantially horizontal direction by the ultrasonic reflection plate 7B (7D), and is cleaned. Irradiates the side of the object 20.

The ultrasonic S _U emitted from the partial area A _U of the ultrasound output area 5a below the net-like mounting surface 3a passes through the net-like mounting surface 3a, to be washed on the mesh placement surface 3a 20 Directly irradiates to the lower surface side. The ultrasonic S _U is partially, or through between the cleaning object 20 and the object to be cleaned holding jig 21, or by transmitting the object to be cleaned 20 or the cleaning object holding jig 21, the liquid It reaches the surface 4a, is reflected downward by the liquid surface 4a, and is irradiated onto the object 20 to be cleaned from the upper side.
On the surface of the object to be cleaned 20 These ultrasound _{S A, S B, S C} , S D, and a part of the ultrasonic wave _{S U} reaches, dirty object to be cleaned 20 is cleaned by these ultrasonic waves.

  According to the present embodiment, the ultrasonic waves S are applied to the upper surface and the side surface of the object to be cleaned 20 from the direction opposite to each other with the object 20 to be cleaned, and from the lower surface side of the object to be cleaned 20 to the lower surface of the object to be cleaned 20. Since the irradiation is performed, the ultrasonic wave S having a strong cleaning power is irradiated from at least four directions to the object 20 to be cleaned, and the cleaning can be performed efficiently.

Further, in the present embodiment, the reflector holding member 6 is reciprocated along the vertical direction (straight forward swing) by the moving mechanism 8 during cleaning.
As a result, the distance between the ultrasonic reflectors 7A, 7B, 7C, and 7D and the bottom surface portion 2a changes, and the ultrasonic waves S _A , S _B , S _C , and S _D reflected by the ultrasonic reflectors 7A, 7B, 7C, and 7D in the vertical direction. Is translated periodically along. For this reason, the incident angles of the ultrasonic waves S _A , S _B , S _C , and _SD with respect to the object to be cleaned 20 are constant, and only the irradiation position changes. Thereby, the irradiation unevenness of the ultrasonic waves S _A , S _B , S _C , and _{SD on} the object to be cleaned 20 is less likely to occur, and the cleaning unevenness can be reduced.

Meanwhile, the portion not irradiated to the object to be cleaned 20 of the ultrasound S _U, and the partial region _{A A, A B, A C} , A other ultrasonic S emitted from the partial area other than _D, the straightness is Due to the strong nature of the ultrasonic wave, it travels substantially straight along the vertical direction, reaches the liquid surface 4a, and is reflected downward. For this reason, these ultrasonic waves hardly contribute to cleaning the article 20 to be cleaned.
As described above, the ultrasonic reflectors 7A, 7B, 7C, and 7D reflect the ultrasonic waves S _A , S _B , S _C , and _SD toward the object 20 to be cleaned, thereby cleaning the object 20 to be cleaned. It has the effect of increasing the amount of ultrasound that contributes.
For this reason, the to-be-cleaned object 20 can be wash | cleaned efficiently.

  Further, the ultrasonic reflection plates 7A, 7B, 7C, and 7D reflect the ultrasonic waves S so as to have a substantially constant incident angle with respect to the object to be cleaned 20 according to their inclination angles. For this reason, even if the ultrasonic wave S is difficult to hit depending on the shape and arrangement of the object to be cleaned 20, the ultrasonic wave S can be irradiated at an incident angle at which irradiation unevenness due to the shape and arrangement of the object to be cleaned 20 is unlikely to occur in advance. The inclination angles of the ultrasonic reflectors 7A, 7B, 7C, and 7D can be adjusted. As a result, cleaning unevenness can be reduced.

The ultrasonic wave S in the cleaning liquid 4 forms a standing wave in the cleaning liquid 4 when the height of the liquid surface 4a is constant and the positions of the ultrasonic reflectors 7A, 7B, 7C, and 7D are constant. There is a case. In this case, by moving the ultrasonic reflectors 7A, 7B, 7C, and 7D by the moving mechanism 8 during cleaning, it is possible to reflect a strong portion and a weak portion of the standing wave. Cleaning unevenness can be reduced by preventing the object to be cleaned 20 from being irradiated only with a weak wave portion.
FIG. 2 shows a standing wave between the reflecting surfaces R ₀ and R _{1 serving} as the fixed reflecting end, a standing wave between the reflecting surface R ₀ and the liquid surface L serving as the free reflecting end, and the reflecting surface R ₀ and the fixed surface. the state of the standing wave between the reflective surface R ₂ to be a reflecting end shown schematically. Between the reflecting surfaces R ₀ and R ₁ (R ₂ ), a standing wave is formed when the distance is an integral multiple of λ / 2 where λ is the wavelength of the ultrasonic wave S, and the reflecting surface R ₀ and the liquid surface L In the meantime, when the distance is an integral multiple of λ / 2 + λ / 4, a standing wave is formed.
When such a standing wave is formed, the cleaning power of the ultrasonic wave S decreases at the vibration node, and the cleaning power increases at the vibration antinode. For this reason, λ / 2 pitch cleaning unevenness is likely to occur on the surface of the object 20 to be cleaned.
In this embodiment, the moving mechanism 8 moves the ultrasonic reflectors 7A, 7B, 7C, and 7D along the emission direction of the ultrasonic wave S during the cleaning, so that the standing wave is temporarily generated. Even if the state becomes, the state does not persist in time, and the strong wave portion and the weak wave portion of the standing wave can be reflected, and only the weak wave portion of the standing wave is to be cleaned 20. The unevenness of cleaning can be reduced by preventing the irradiation.

  As described above, according to the cleaning apparatus 1, the ultrasonic wave S emitted from the ultrasonic transducer 5 is reflected by the ultrasonic reflectors 7A, 7B, 7C, and 7D in an oblique direction with respect to the emission direction. Since the incident angle and the irradiation position can be changed with respect to the object 20 to be cleaned, the cleaning operation can be performed efficiently and uneven cleaning can be suppressed.

Next, a first modification of the present embodiment will be described.
FIG. 3A is a schematic plan view showing a schematic configuration of a cleaning apparatus according to a first modification of the first embodiment of the present invention.

As shown in FIG. 3A, the cleaning device 1A according to the present modification includes the ultrasonic reflectors 7C and 7D and the reflection plate holding member 6 that holds them in the cleaning device 1 of the first embodiment. The arrangement position of the moving mechanism 8 in plan view is rotated by 90 °, and faces the two adjacent side surfaces of the object holding unit 3 so as to face the ultrasonic reflection plates 7A and 7B and the ultrasonic reflection plates 7C and 7D. And are arranged.
By such a change in the positional relationship, the partial areas A _C and _{AD of the} ultrasonic wave emission area 5a from which the ultrasonic waves S _C and _SD reflected by the ultrasonic wave reflection plates 7C and 7D are emitted are similarly moved.
Hereinafter, a description will be given centering on differences from the first embodiment.

According to the cleaning apparatus 1 </ b> _A , the ultrasonic waves S _A , S _B , S _C , and S _D can be irradiated toward the object to be cleaned 20 from the two adjacent side surfaces of the object holding unit 3. .
As described above, the arrangement positions of the ultrasonic reflecting plates 7A and 7B and the ultrasonic reflecting plates 7C and 7D are not limited to the positional relationship facing each other, and the cleaning is satisfactorily performed according to the shape of the article 20 to be cleaned. What is necessary is just to arrange | position in the direction which can be performed.
In addition, the arrangement positions of the ultrasonic reflection plates 7A and 7B and the ultrasonic reflection plates 7C and 7D are not limited to the positional relationship that forms 90 ° as in the present modification, for example, 120 ° or the like. It may be arranged at other angles.

Next, a second modification of the present embodiment will be described.
FIG. 3B is a schematic plan view showing a schematic configuration of the cleaning apparatus according to the second modification of the first embodiment of the present invention.

As shown in FIG. 3B, the cleaning apparatus 1B according to the present modified example holds the object to be cleaned in a direction orthogonal to the direction in which the respective reflector holding members 6 face each other in the cleaning apparatus 1 of the first embodiment. On the side surfaces of the part 3, the ultrasonic reflectors 7E and 7F (reflecting parts), the reflecting plate holding member 6 that holds them, the moving mechanism 8, the ultrasonic reflecting plates 7G and 7H (reflecting parts), and these, respectively. Is provided with a reflection plate holding member 6 and a moving mechanism 8.
Here, the ultrasonic reflection plates 7E, 7F, 7G, and 7H are provided in shapes and positional relationships respectively corresponding to the ultrasonic reflection plates 7A, 7B, 7C, and 7D of the first embodiment.
Hereinafter, a description will be given centering on differences from the first embodiment.

  According to the cleaning apparatus 1B, it is possible to irradiate ultrasonic waves uniformly from the four side surfaces of the cleaning object holding unit 3 toward the cleaning object 20. For this reason, the quantity of the ultrasonic wave S irradiated to the to-be-cleaned object 20 is increased, and a quick and efficient cleaning can be performed. Moreover, cleaning unevenness can be further reduced.

Next, a third modification of the present embodiment will be described.
FIG. 4 is a schematic front view showing a schematic configuration of a cleaning apparatus according to a third modification of the first embodiment of the present invention.

As shown in FIG. 4, the cleaning device 1 </ b> C according to the present modified example replaces the ultrasonic reflection plates 7 </ b> A, 7 </ b> B, 7 </ b> C, and 7 </ b> D of the cleaning device 1 according to the first embodiment with the ultrasonic curved reflection plates 17 </ b> A and 17 </ b> B. , 17C, 17D (reflection part).
The ultrasonic curved reflectors 17A, 17B, 17C, and 17D of the present modification have at least the portions where the ultrasonic waves S _A , S _B , S _C , and S _D are incident, and are curved in a concave shape. The only difference from the ultrasonic reflectors 7A, 7B, 7C, and 7D is that the curved shape has a shape that extends in the depth direction of FIG.
Hereinafter, a description will be given centering on differences from the first embodiment.

According to the cleaning apparatus 1C, the ultrasonic waves S _A , S _B , S _C , and _SD incident on the ultrasonic curved reflectors 17A, 17B, 17C, and 17D are converged according to the curvature of the concave surface, respectively. The object to be cleaned 20 is irradiated.
Therefore, since the vibration energy per unit area of the ultrasonic waves S _A , S _B , S _C , and S _D irradiated to the object to be cleaned 20 can be increased, the cleaning power can be improved.
In addition, when the sizes of the objects to be cleaned 20 are the same, the areas of the partial areas A _A , A _B , A _C , and _AD of the ultrasonic emission area 5a corresponding to the ultrasonic curved reflectors 17A, 17B, 17C, and 17D. Therefore, the ultrasonic wave S generated by the ultrasonic transducer 5 can be more efficiently irradiated onto the object to be cleaned 20 as compared with the cleaning device 1 of the first embodiment.

[Second Embodiment]
A cleaning apparatus according to a second embodiment of the present invention will be described.
FIG. 5A is a schematic plan view showing a schematic configuration of a cleaning apparatus according to the second embodiment of the present invention. FIG.5 (b) is KK sectional drawing in Fig.5 (a).

  As shown in FIGS. 5A and 5B, the cleaning device 30 of the present embodiment is arranged such that the position of the ultrasonic transducer 5 of the cleaning device 1 of the first embodiment is set to the bottom surface portion 2 a of the cleaning tank 2. The ultrasonic transducer 5 is changed from the rear surface to one rear surface of the side surface portion 2b of the cleaning tank 2, and is thus opposed to the ultrasonic transducer 5 whose arrangement position is changed in the same manner as in the first embodiment. The directions of the ultrasonic reflectors 7A, 7B, 7C, and 7D are changed, and in accordance with these changes, the reflector holding member 6 and the moving mechanism 8 of the first embodiment are replaced with the reflector holding members, respectively. The member 16 and the moving mechanism 18 (reflecting part moving part) are provided. Hereinafter, a description will be given centering on differences from the first embodiment.

The reflection plate holding member 16 is a member that holds the ultrasonic reflection plates 7A and 7B and the ultrasonic reflection plates 7C and 7D in the cleaning liquid 4. In this embodiment, the ultrasonic transducer 5 is provided. It consists of two plate-shaped members extended in the perpendicular direction along the inner side of the two side surface parts 2b adjacent to the side surface part 2b.
Each reflector holding member 16 is immersed in the cleaning liquid 4 at the lower end side to at least a height lower than the net-like mounting surface 3 a, and the upper end side protrudes above the cleaning tank 2.
Ultrasonic reflection plates 7A and 7B and ultrasonic reflection plates 7C and 7D are provided on the lower end side of each reflection plate holding member 16, respectively.
Further, the upper end portion of each reflector holding member 16 is connected to the moving mechanism 18.

The ultrasonic reflectors 7A, 7B, 7C, and 7D of the present embodiment are disposed at an inclination angle with respect to the emission direction of the ultrasonic wave S, facing the ultrasonic wave emission region 5a of the ultrasonic wave S in the cleaning liquid 4. ing.
That is, since the ultrasonic transducer 5 of the present embodiment is provided on the back side of the side surface portion 2b extending in the vertical direction, the ultrasonic wave S from the ultrasonic transducer 5 is provided by the ultrasonic transducer 5. The light is emitted in the horizontal direction toward the side surface portion 2b facing the side surface portion 2b. In the example shown in FIG. 5A, the ultrasonic transducer 5 is attached to the side surface 2b on the left side in the figure, and the ultrasonic wave S is emitted in the horizontal direction from the left side to the right side in the figure.

The ultrasonic reflection plates 7A and 7B are fixed at the lower end portion of the reflection plate holding member 16 with a gap in the horizontal direction. However, the positional relationship in the horizontal direction is such that the ultrasonic reflector 7B is closer to the ultrasonic transducer 5 than the ultrasonic reflector 7A.
Ultrasonic reflector plate 7A is, reflection plate and the holding member 16 in the middle region of the upper surface shown in the object to be cleaned holder 3, oblique right shown at an inclination angle phi _A to the reflecting plate holding member 16 It is provided so as to project downward.
Further, the ultrasonic reflection plate 7B is illustrated in an intermediate region between the reflection plate holding member 16 and the upper side of the object holding unit 3 shown in the drawing with an inclination angle φ _B with respect to the reflection plate holding member 16. It is provided so as to project obliquely to the lower right side.
Here, the ultrasonic reflecting plate 7B has a smaller size in the protruding direction than the ultrasonic reflecting plate 7A, and the protruding range from the reflecting plate holding member 6 is narrower than the protruding range of the ultrasonic reflecting plate 7A.
Therefore, as shown in FIG. 5 (b), an intermediate region of the reflector holding member 16 and the upper surface shown in the object to be cleaned holder 3 includes a partial area A _B facing the ultrasonic reflector plate 7B it can be divided into a partial area a _a facing the ultrasonic reflector plate 7A projecting beyond the ultrasonic reflector 7B.

The inclination angles φ _A and φ _B of the ultrasonic reflectors 7A and 7B reflect the ultrasonic waves S _A and S _B emitted from the partial areas A _A and A _{B of the} ultrasonic wave S in appropriate directions, respectively. The angle at which the object 20 can be irradiated is set.
For example, the inclination angle φ _A of the present embodiment is set to an angle larger than 45 ° so that the ultrasonic wave S _A can be reflected toward the ultrasonic transducer 5 and reflected toward the object 20 to be cleaned. Yes.
In addition, the inclination angle φ _B of the present embodiment is set to an angle smaller than the inclination angle φ _A and close to 45 ° so that the ultrasonic wave S _B can be reflected toward the side surface of the object 20 to be cleaned. ing.

  The positional relationship and the shape of the ultrasonic reflectors 7C and 7D are in a plane symmetry or close to plane symmetry, as in the first embodiment. Therefore, the description is omitted because it is easily understood from the above description.

The moving mechanism 18 supports the upper end portion of the reflection plate holding member 16 so as to be movable along at least the emission direction of the ultrasonic wave S during the cleaning of the article 20 to be cleaned, and is cleaned by a support member (not shown). It is supported outside the tank 2. In this embodiment, it can move along the horizontal direction which is the emission direction of the ultrasonic wave S.
The moving mechanism 18 includes a slider 18 a that supports the upper end portion of the reflector holding member 16, and a drive unit 18 b that moves the slider 18 a along the emission direction of the ultrasonic wave S. As the drive unit 18b, for example, a single-axis moving mechanism such as a screw feed mechanism or a linear motor can be cited.
According to such a moving mechanism 18, the ultrasonic wave reflection plates 7 </ b> A and 7 </ b> B and the ultrasonic wave reflection plates 7 </ b> C and 7 </ b> D fixed to the lower end portions of the respective reflection plate holding members 16 are respectively emitted from the ultrasonic waves S during cleaning. It can be moved along the direction.

According to such a cleaning device 30, the ultrasonic wave S that travels in the horizontal direction between the side surface portion 2 b provided with the ultrasonic transducer 5 and the side surface portion 2 b that faces the side surface portion 2 b is converted into the cleaning object holding unit 3. Can be reflected toward the object to be cleaned 20 by the ultrasonic reflectors 7A, 7B, 7C, and 7D. Then, the object to be cleaned 20 can be irradiated with the ultrasonic wave S for cleaning. Further, during the cleaning, the ultrasonic reflectors 7A, 7B, 7C, and 7D are moved in the direction of emission of the ultrasonic wave S by the moving mechanism 18 to change the irradiation position of the ultrasonic wave S and perform efficient cleaning. Can do. Thereby, the cleaning unevenness of the article to be cleaned 20 can be suppressed.
In addition, since the ultrasonic reflectors 7A, 7B, 7C, and 7D are arranged on the side of the object-to-be-cleaned holding unit 3, the work for placing and removing the object to be cleaned 20 is placed on the net-like placement surface 3a. The work to be cleaned and the work to be taken out can be easily carried out from the upper side of the net-like placement surface 3a without hindering the work.
The cleaning device 30 of the present embodiment is an example of the case where the same effect as that of the first embodiment can be obtained even when the emission direction of the ultrasonic waves S is different from that of the cleaning device 1 of the first embodiment. Yes.

[Third Embodiment]
A cleaning apparatus according to a third embodiment of the present invention will be described.
FIG. 6 is a schematic front view showing a schematic configuration of a cleaning apparatus according to the third embodiment of the present invention.

  The cleaning device 33 of the present embodiment can change the inclination angles of the ultrasonic reflectors 7A, 7B, 7C, and 7D of the cleaning device 1 of the first embodiment even during cleaning. Instead of the reflecting plate holding member 6 and the moving mechanism 8 of the cleaning apparatus 1, a reflecting plate holding member 36 and a moving mechanism 38 (reflecting portion moving portion) are provided, respectively, and a link 35 and a link driving portion 37 are added. Hereinafter, a description will be given centering on differences from the first embodiment.

The reflection plate holding member 36 is a member that holds the ultrasonic reflection plates 7A and 7B and the ultrasonic reflection plates 7C and 7D in the cleaning liquid 4. In the present embodiment, the reflection plate holding member 36 includes two members that extend in the vertical direction. It consists of a rod-shaped member.
On the lower end side of each reflector holding member 36, ultrasonic reflectors 7A and 7B and ultrasonic reflectors 7C and 7D are provided in the same positional relationship as in the first embodiment. However, in the present embodiment, each ultrasonic reflection plate is rotatably attached to the reflection plate holding member 36 via the hinge portion 34.
In addition, the ultrasonic wave reflectors 7A, 7B, 7C, and 7D are connected to the upper surface of the ultrasonic wave reflectors 7A, 7B, 7C, and 7D through a joint 35a. Here, the joint 35a converts the linear motion in the vertical direction of the link 35 into a rotational motion around the hinge portion 34 of each corresponding ultrasonic reflector, and for example, along the upper surface of each ultrasonic reflector. A slidable rotary joint, an elastic hinge, or the like can be employed.

Moreover, the upper end part of each reflecting plate holding member 36 is supported by the moving mechanism 38 which supports each reflecting plate holding member 36 so that a movement to a perpendicular direction is possible. As the moving mechanism 38, a uniaxial moving mechanism in which the moving direction is set to the vertical direction, for example, a screw feed mechanism, a linear motor, or the like can be adopted. A uniaxial moving mechanism similar to the moving mechanism 18 can be employed.
Further, a link driving unit 37 is fixed to the upper end of each reflector holding member 36 to support the link 35 connected to each ultrasonic reflector so as to be movable in the vertical direction.

According to the cleaning device 33 having such a configuration, the ultrasonic wave reflectors 7A, 7B, 7C, and 7D can be moved to the base-side hinges 34 by changing the amount of movement of the links 35 by the link driving units 37. It is possible to change the magnitudes of the inclination angles θ _A , θ _B , θ _C , and θ _D with respect to the respective reflector holding members 36 by rotating them around.
For this reason, since the inclination angles θ _A , θ _B , θ _C , and θ _D of the ultrasonic reflectors 7A, 7B, 7C, and 7D can be changed independently, even in a state where the moving position of the moving mechanism 38 is fixed. The reflection direction of the ultrasonic waves S _A , S _B , S _C , and S _D , that is, the irradiation position with respect to the object to be cleaned 20 can be changed.
In this embodiment, the link 35 is driven by the link drive unit 37, and each inclination angle is changed in accordance with the vertical movement by the moving mechanism 38 during cleaning. For this reason, the link 35 and the link driving unit 37 constitute an angle changing unit that changes the inclination angle of the ultrasonic reflection plates 7A, 7B, 7C, and 7D during cleaning.
In the cleaning device 33, the irradiation range of the ultrasonic wave S can be changed more easily or more finely than the cleaning device 1 of the first embodiment by changing the tilt angle of the reflector during such cleaning. It can be changed.

For example, when the size of the object to be cleaned 20 is small, the irradiation position of the ultrasonic wave S cannot be changed so much only by the parallel movement of the ultrasonic reflector as in the cleaning device 1. According to the present embodiment, by combining the rotation and swing of each ultrasonic reflector and the vertical translation by the moving mechanism 38, the incident angle onto the object to be cleaned 20 can be efficiently changed. The ultrasonic wave S can be applied to the object 20 to be cleaned.
Thus, even when the size of the article 20 to be cleaned is small, the ultrasonic waves S can be irradiated from various directions, and cleaning unevenness can be reduced.
Further, for example, by rotating and oscillating each ultrasonic reflector at a cycle shorter than the reciprocating cycle in the vertical direction by the moving mechanism 38, the irradiation position on the cleaning target 20 is finely moved up and down in the vertical direction. Can be moved upward or downward as a whole. In addition, the incident angle of the ultrasonic wave S changes in the range of the tilt angle at which the ultrasonic wave S is rotated and oscillated at any irradiation position of the cleaning object 20.
In this case, since the manner in which the ultrasonic wave S hits the object 20 to be cleaned changes more finely, the irradiation unevenness is reduced, and the cleaning unevenness can be further reduced as compared with the case where the rotation is not swung.
In addition, for example, the vertical reciprocation by the moving mechanism 38 and the rotation and swing of the ultrasonic reflector by the link driving unit 37 are synchronized to change the incident angle with respect to the cleaning object 20, and the irradiation position is substantially constant. Can be in range.
In this case, since the irradiation efficiency of the ultrasonic wave S is improved, the cleaning power can be improved. Even if the ultrasonic wave S is irradiated in a substantially constant range, the incident angle and the path length of the ultrasonic wave S change, so that cleaning unevenness is suppressed.

  According to the cleaning device 33, each ultrasonic reflector can be rotated and oscillated independently, but the rotation and oscillation of each ultrasonic reflector may be performed synchronously. In this case, one link 35 may be provided for each of the ultrasonic reflecting plates 7A and 7B and the ultrasonic reflecting plates 7C and 7D.

In the above description, the movement of each reflecting part by the reflecting part moving part is described as a continuous reciprocating movement in order to prevent only the portion having a weak standing wave from being irradiated to the object to be cleaned. However, depending on the occurrence of standing waves, it may be preferable to positively generate a certain standing wave because the effect of improving the cleaning power is greater than the occurrence of cleaning unevenness.
In such a case, you may move the position of a reflection part intermittently by a fixed movement width.
For example, when the frequency ν of the ultrasonic wave S is 40 (kHz), the wavelength λ of the ultrasonic wave S in the cleaning liquid such as a detergent is about 4 mm. In this case, if the movement width of the reflecting portion is an integral multiple of λ / 2, the standing wave is maintained in a substantially similar state. For this reason, for example, when an arrangement position of the reflecting portion having particularly good detergency is found by an experiment or the like, if it is intermittently moved from that position by the movement width λ / 2, the substantially same detergency is maintained and the object to be cleaned is maintained. The irradiation position and incident angle on the object can be changed.

In the above description, the movement of each reflecting part by the reflecting part moving part has been described as continuous reciprocating movement, but this reciprocating movement does not necessarily follow a regular cycle. For example, the period of reciprocation may be changed stepwise and continuously.
Moreover, you may change a movement position at random. In this case, since the irradiation position and incident angle of the ultrasonic wave S to the object to be cleaned change randomly, the way the ultrasonic wave strikes changes sharply, and the cleaning power can be improved.

In the above description, the movement direction of each reflection unit moving unit is described as an example in the case of the vertical direction or the horizontal direction, which is a direction along the emission direction of the ultrasonic wave. It is not limited to, It can be moved to arbitrary directions according to the emission direction of an ultrasonic wave.
Moreover, the movement direction of each reflection part moving part may be movable in a direction different from the emission direction of the ultrasonic waves. For example, in the cleaning apparatus 1 of the first embodiment, each ultrasonic reflector is held so as to be movable in the horizontal direction, and the horizontal distance between the object to be cleaned 20 and each ultrasonic reflector is variable. You may be able to do it. Even in this case, since the distance from the emission position of the ultrasonic wave S to the object to be cleaned 20 changes, it is possible to suppress the generation of standing waves or change the state of the generated standing waves.

  In the above description, an example in which there are two reflecting parts moved by one reflecting part moving unit has been described, but the number of reflecting parts is not limited to two. For example, it may be one or three or more.

  In the description of the third modification of the first embodiment, the ultrasonic curved reflector is described as having a shape that is curved in one direction and converges the ultrasonic wave in one direction, but is orthogonal to each other. It is good also as a structure which is curved to a biaxial direction and converges an ultrasonic wave in two directions orthogonal to each other.

In addition, all the constituent elements described in the above embodiments and modifications can be implemented in appropriate combination within the scope of the technical idea of the present invention.
For example, each modification of the first embodiment can be applied to the second and third embodiments as well.
Further, for example, the configuration of the angle changing unit in the cleaning device of the third embodiment is a mechanism for adjusting the tilt angle of each reflecting unit in the cleaning device of the first embodiment that does not change the tilt angle of the reflecting unit during cleaning. Can be adopted. In this case, for example, the inclination angle of the reflecting portion can be easily adjusted according to the shape and size of the object to be cleaned, and an efficient cleaning operation is performed even when cleaning is performed by changing the object to be cleaned. Can do.

1, 1A, 1B, 1C, Cleaning device 2 Cleaning tank 3 Washed object holding part (holding part)
3a Reticulated mounting surface 4 Cleaning liquid 4a Liquid surface 5 Ultrasonic vibrator (ultrasonic wave emitting part)
5a Ultrasonic emission area (ultrasonic emission area)
6, 16, 36 Reflector holding member 7A, 7B, 7C, 7D, 7E, 7F, 7G, 7H Ultrasonic reflector (reflecting part)
8, 18, 38 Moving mechanism (reflecting part moving part)
17A, 17B, 17C, 17D Ultrasonic curved reflector (reflector)
20 Object to be cleaned 21 Object to be cleaned holding jig 30, 33 Cleaning device 35 Link (angle changing part)
37 Link drive unit (angle changing unit)
A _A , A _B , A _C , A _D , A _U Partial Area S, S _A , S _B , S _C , S _D , S _U Ultrasound

Claims (5)

A cleaning tank for storing the cleaning liquid;
A holding unit for immersing and holding an object to be cleaned in a cleaning liquid placed in the cleaning tank;
An ultrasonic wave emitting unit for emitting ultrasonic waves in the cleaning liquid;
A cleaning device, comprising: a reflection portion disposed opposite to the ultrasonic wave emission region at an inclination angle with respect to the ultrasonic wave emission direction. The cleaning device according to claim 1,
A cleaning apparatus, comprising: a reflection unit moving unit that movably supports the reflection unit in the ultrasonic wave emission direction of at least the ultrasonic wave emission unit. The cleaning apparatus according to claim 1 or 2,
The reflection part is plate-shaped and consists of a plurality of sheets,
Each of the plurality of reflecting portions has a portion facing the partial region in accordance with each of the plurality of partial regions in the ultrasonic wave emission region. The cleaning apparatus according to claim 3,
Each of the surfaces of the plurality of reflecting portions facing the emission region of the ultrasonic waves is
A cleaning device having a larger area as it is farther from the ultrasonic wave emitting portion. In the washing | cleaning apparatus in any one of Claims 1-4,
A cleaning apparatus, comprising: an angle changing unit that changes an inclination angle of the reflecting unit.

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