JP2011025294A - Device and method for flux coating - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a device for flux coating which can reliably coat a necessary amount of a flux, onto a coating area to be coated with the flux, without causing breakage of a frame material or damage to a plate material. <P>SOLUTION: A flux is coated on a coating area 55 in a coating object substrate P using a stencil 20. In the stencil 20, an opening 31 is formed and when moving squeezes 11, 12a, 12b relative to the coating object substrate P pressed against the stencil 20, both ends in a widthwise direction of a rim 33a positioned in a direction of an arrow A in which the squeezes 11, 12a, 12b are moved relative to the stencil 20 pressed against a coating surface Pa are most protruded on the near side in the direction of the arrow A and are concaved in the direction of the arrow A toward the center part in the widthwise direction. <P>COPYRIGHT: (C)2011,JPO&amp;INPIT

Description

  The present invention relates to a flux application apparatus and a flux application method for applying a flux to a substrate to be applied using a frame material such as a stencil and a plate material such as a squeegee.

  As this type of flux coating apparatus and flux coating method, there are a coating apparatus and a coating method for coating a solder paste mixed with flux and low melting point solder on a printed circuit board to be coated (hereinafter also referred to as “coating board”). This is disclosed in Japanese Utility Model Laid-Open No. 8-116165. In the coating method using this coating apparatus, first, the solder paste supplied on the stencil is applied to the doctor in a state where a stencil having a plurality of small holes formed in each region where the solder paste is to be applied is pressed against the substrate to be coated. -Solder paste is imprinted in each small hole by spreading with a blade (hereinafter also simply referred to as "blade"). Next, the stencil is peeled from the application target substrate. At this time, the solder paste imprinted in each small hole of the stencil remains on the substrate to be coated. Thereby, a solder paste is apply | coated to the desired area | region in a board | substrate to be apply | coated.

JP-A-8-116165 (page 4-5, FIG. 5)

  However, the following problems exist in the conventional coating apparatus and its coating method. That is, in the conventional coating apparatus and coating method, in a state where a stencil having a plurality of small holes formed according to each region to which the solder paste is to be applied is pressed against the substrate to be coated, the solder paste is put in each small hole. The solder paste is applied only to a desired region on the substrate to be applied by imprinting. In this case, among the application target substrates, for example, as in the application target substrate P shown in FIG. 15, a plurality of recesses 53 are formed on the application surface Pa, and a pad 54 is formed on the bottom surface of each recess 53. Exists. This application target substrate P can be formed with solder bumps on each pad 54 by performing a reflow process in a state where a solder ball (not shown) is supplied onto each pad 54 after the application of flux is completed. It is configured. Therefore, when applying the flux, it is necessary to apply a prescribed amount of flux on each pad 54 (in each recess 53).

  When flux is applied to such an application target substrate P by a conventional application apparatus (application method), a stencil having a plurality of small holes corresponding to the positions of the pads 54 (recesses 53) is used. Will be used. However, in today's application target substrate P, where fine pitches are being advanced, the respective pads 54 (recesses 53: areas where flux should be applied) tend to be smaller. Therefore, when applying the flux to the fine-pitch application target substrate P using a conventional application apparatus (application method), very small holes are formed according to the small pads 54 (recesses 53). It is necessary to use a stencil. For this reason, it is difficult to reliably imprint the flux into each small hole of the stencil with the blade, and even if the flux can be imprinted into each small hole, the imprinted flux is applied to the pad 54 in the recess 53. When the stencil is peeled off from the application target substrate P without adhering, it may be peeled off from the application target substrate P together with the stencil. For this reason, the conventional coating apparatus (coating method) has a problem that it is difficult to reliably apply a sufficient amount of flux to the coating target substrate P whose fine pitch has been advanced.

  On the other hand, the inventor has developed a coating apparatus and a coating method for coating a flux by defining a wide region including a plurality of pads 54 (concave portions 53) to be coated with a flux as a coating region. Specifically, first, as shown in FIG. 16, a wide opening 31x having a plan view shape corresponding to the application region is formed, and the thickness T (FIG. 17) is set according to the amount of flux to be applied. The stencil 20x that defines the reference) is manufactured. At this time, the edge portion 33ax located in the moving direction (direction of arrow A) in which the squeegee 12x moves with respect to the stencil 20x during the flux application process, and the reverse direction (direction of arrow B) to the moving direction described above. The opening 31x is formed so that both of the mouth edge portions 33bx positioned at the right angle are orthogonal to the moving direction and the opposite direction in a plan view. Next, the manufactured stencil 20x is pressed against the application surface Pa of the application target substrate P, and as an example, the tip of the squeegee 12x is pressed against the lip 33bx side of the surface (upper surface in the figure) of the stencil 20x. Subsequently, after supplying the flux F to the surface of the stencil 20x, as shown in FIG. 17, the squeegee 12x is moved in the direction of the arrow A toward the mouth edge 33ax.

  At this time, as the squeegee 12x moves, the application area is such that the flux F supplied to the surface of the stencil 20x (in this example, on the lip 33bx) is rubbed against the application surface Pa of the application target substrate P. 55x (a region exposed from the opening 31x of the stencil 20x on the coating surface Pa of the coating target substrate P). Therefore, according to the coating process using the stencil 20x, unlike the conventional coating apparatus and coating method using a stencil in which a plurality of small holes are formed for each pad 54 (concave portion 53), an extremely small pad 54 ( It is possible to reliably apply the flux F to the recess 53). In addition, since the flux F in the recess 53 and the flux F corresponding to the thickness T of the stencil 20x can be left on each pad 54, the application target substrate P having a small recess 53 is sufficient. An amount of flux F can be applied.

  However, the inventor, in the stencil 20x in which the wide openings 31x are formed according to the plurality of pads 54 (concave portions 53), as shown in FIG. In the lip portions 33ax, 33bx and the like, the stencil 20x is deformed so that the central portion in the width direction is separated from the coating surface Pa of the substrate P to be coated (hereinafter, this state is referred to as “floating” ”). In the figure, a state in which the float generated in the stencil 20x is exaggerated and greatly deformed is illustrated. In this case, as described above, in the stencil 20x, the opening 31x is formed so that both the mouth edge portions 33ax and 33bx are orthogonal to the moving direction of the squeegee 12x and the opposite direction in plan view. Therefore, for example, when the flux F is applied according to the above procedure in a state where the lip 33ax is lifted, the squeegee 12x is moved in the direction of the arrow A, and as shown in FIG. When it reaches, the tip of the squeegee 12x is hooked on the mouth edge 33ax where the float is generated.

  If the squeegee 12x is further moved in the direction of arrow A in this state, the stencil 20x may be bent or broken, or the tip of the squeegee 12x may be damaged. In this case, when the stencil 20x is damaged, the flux F may be applied to areas other than the application area 55x, and when the squeegee 12x is damaged, more than a prescribed amount of flux is applied. There is a risk of being applied to the substrate P. In addition to moving the squeegee 12x in the direction of the arrow A to apply the flux F, the flux F is applied by moving the squeegee 12x in the opposite direction of the arrow A (the direction of the arrow B shown in FIG. 16). When the configuration (method) is employed, the stencil 20x may be damaged or the squeegee 12x may be damaged during the coating process performed in a state where the lip portion 33bx located in the direction of the arrow B is lifted. is there. As described above, in the coating apparatus and the coating method developed by the inventor, the stencil 20x (frame material) may be damaged or the squeegee 12x (plate material) may be damaged. It may be difficult to apply a prescribed amount of flux only inside, and it is preferable to improve this point.

  The present invention has been made in view of such improvements, and flux application that can reliably apply a necessary amount of flux to an application region to which the flux is to be applied without causing damage to the frame material or damage to the plate material. The main object is to provide an apparatus and a flux coating method.

  In order to achieve the above object, the flux coating apparatus according to claim 1 is a plate material for spreading the supplied flux on the coating surface of the substrate to be coated, and the flux on the coating surface in a state of being pressed against the coating surface. An opening is provided so that the application region is exposed, and a frame material whose thickness is defined according to the application thickness of the flux to be applied to the application region, and the application target substrate against which the frame material is pressed, and A moving mechanism for moving at least one of the plate members relative to the other, and the moving mechanism in a state in which a front end portion of the plate member linearly pressed against the surface of the frame member pressed against the application surface The flux applying apparatus applies the flux to the application region by moving the at least one with respect to the other. In both cases, both ends in the width direction of the first mouth edge located in the movement direction in which the plate material moves relative to the frame member pressed against the coating surface during one movement are in front of the movement direction. The opening is formed so as to protrude most toward the side and to be recessed in the moving direction toward the center in the width direction.

  The flux coating apparatus according to claim 2 is the flux coating apparatus according to claim 1, wherein the frame material passes through the central portion in the width direction of the first mouth edge portion and is along the moving direction. The opening is formed so that the first mouth edge is line-symmetric in plan view with reference to the virtual line.

  Furthermore, the flux application device according to claim 3 is the flux application device according to claim 1 or 2, wherein the frame member has both end portions in the width direction in the second mouth portion located in the direction opposite to the moving direction. Is formed so as to protrude most toward the front side in the reverse direction and to be recessed in the reverse direction toward the center in the width direction.

  The flux coating apparatus according to claim 4 is a plate material that spreads the supplied flux on the coating surface of the substrate to be coated, and the flux coating area on the coating surface is exposed when pressed against the coating surface. At least of the frame material provided with an opening and having a thickness defined according to the application thickness of the flux to be applied to the application region, and the application target substrate and the plate material to which the frame material is pressed A moving mechanism that moves one of the plates relative to the other, and the moving mechanism presses the at least one of the plate members against the surface of the frame member pressed against the coating surface. A flux application device that applies the flux to the application region by moving the frame material relative to the other, wherein the frame material is the at least one transfer material. In this case, one of the widthwise ends of the first mouth edge located in the moving direction in which the plate moves relative to the frame member pressed against the application surface is the front in the moving direction. The opening is formed so as to protrude most toward the side and to be recessed in the moving direction toward the other of the both ends.

  Furthermore, the flux application device according to claim 5 is the flux application device according to claim 4, wherein the frame member is included in both end portions in the width direction of the second mouth edge located in the direction opposite to the moving direction. The opening is formed so that one of the two protrudes most toward the near side in the opposite direction and is recessed in the opposite direction toward the other of the two end portions.

  Further, the flux coating apparatus according to claim 6 is the flux coating apparatus according to any one of claims 1 to 5, wherein the frame member is formed such that each corner of the opening has a curved shape in plan view. Has been.

  A flux application method according to a seventh aspect applies the flux to the application region of the application target substrate using the flux application apparatus according to any one of the first to sixth aspects.

  According to the flux application apparatus according to claim 1 and the flux application method according to claim 7, the first lip located in the moving direction in which the plate material moves relative to the frame member pressed against the application surface. By using a frame member in which both end portions in the width direction of the portion protrude most toward the front side in the moving direction and are recessed in the moving direction toward the center portion in the width direction, for example, the first mouth Even if the substrate with respect to the application target (application surface) is lifted at the center in the width direction at the edge, the first mouth edge when the plate material is moved in the movement direction relative to the frame material Since the tip of the plate material is moved so as to come into contact with each part between the both end parts and the central part in the width direction sequentially from the both end parts side, the part where the above-mentioned floating occurs is directed toward the central part. To move It can be brought into close contact with the first rim of the timber to the application surface. Thereby, according to this flux application device and flux application method, it is possible to avoid a situation in which the front end portion of the plate material is caught by the first mouth edge portion during the application of the flux, so that the frame material is damaged or the plate material is damaged. The required amount of flux can be reliably applied to the application region where the flux is to be applied.

  Further, according to the flux application device according to claim 2 and the flux application method according to claim 7, with reference to an imaginary line along the moving direction while passing through the central portion in the width direction of the first mouth edge portion, By using a frame material in which an opening is formed so that the first mouth edge portion is line-symmetrical in plan view, the front end portion of each plate material sequentially contacts each portion in the width direction of the first mouth edge portion. When each plate member is moved as described above, the force to move the frame member in the direction from one end portion in the width direction to the other end portion in the first mouth edge portion, and the first mouth edge A situation in which the force of moving the frame material in the direction from the other end portion to the one end portion in the portion cancels out, so that the displacement of the frame material in the width direction with respect to the substrate to be coated occurs. Can be avoided.

  Furthermore, according to the flux application apparatus according to claim 3 and the flux application method according to claim 7, both ends in the width direction of the second mouth edge located in the opposite direction to the moving direction are on the near side in the opposite direction. Applying flux by moving the plate material in the opposite direction instead of the above moving direction by using the frame material that has the most protruding and recessed in the opposite direction toward the center in the width direction In this case, it is possible to avoid a situation in which the leading edge of each plate material is caught with respect to the second mouth edge portion. Therefore, even when the flux is applied by moving in the opposite direction, the frame material is damaged or the plate material is damaged. The required amount of flux can be reliably applied to the application region where the flux is to be applied without causing sticking.

  Moreover, according to the flux application device according to claim 4 and the flux application method according to claim 7, the first position located in the moving direction in which the plate material moves relative to the frame material pressed against the application surface. Use a frame material in which an opening is formed so that one of both end portions in the width direction at the mouth edge protrudes most forward in the moving direction and is recessed in the moving direction toward the other of the both end portions. Thus, for example, even if a floating with respect to the application target substrate (application surface) occurs in the center portion in the width direction at the first edge portion, when the plate material is moved in the movement direction relative to the frame material Since the front end of the plate material is sequentially moved from one end side to each part between one and the other of the both ends in the width direction of the first mouth edge, the above-mentioned Other parts where floating occurs The first rim of possible to move the frame member toward the end can be brought into close contact with the coated surface of the. As a result, it is possible to avoid a situation in which the front end of the plate material is caught by the first mouth edge during the application of the flux, so that the application region where the flux should be applied without causing damage to the frame material or damage to the plate material. The required amount of flux can be reliably applied.

  Furthermore, according to the flux application apparatus according to claim 5 and the flux application method according to claim 7, one of the two end portions in the width direction in the second mouth edge located in the opposite direction to the moving direction is in the reverse direction. By using a frame material that has an opening formed so as to protrude most forward and toward the other of both ends, the plate material is moved in the opposite direction instead of the above moving direction. When the flux is applied, it is possible to avoid a situation in which the front end portion of each plate member is caught with respect to the second mouth edge portion. The required amount of flux can be reliably applied to the application region where the flux is to be applied without causing damage to the material or damage to the plate material.

  Moreover, according to the flux application apparatus of Claim 6, and the flux application method of Claim 7, by using the frame material formed so that each corner | angular part of an opening part may become a planar view curve shape, an opening part is used. In the first mouth edge (or the second mouth edge), the plate material in contact with both mouth edges formed along the moving direction is not caught at each corner. It can be moved smoothly to the state of contact.

1 is a configuration diagram showing a configuration of a flux application device 1. FIG. 3 is a cross-sectional view of a substrate to be coated P, a stencil 20 and a coating unit 2 in a state in which tips of squeegees 11, 12a and 12b are in contact with a stencil 20. It is a top view of stencil 20, application unit 2, and application object substrate P. It is the XX sectional view taken on the line in FIG. FIG. 3 is a cross-sectional view of a coating target substrate P, a stencil 20 and a coating unit 2 in a state where a flux F is supplied from nozzles 14a and 14b in the state shown in FIG. FIG. 6 is a cross-sectional view of the application target substrate P, the stencil 20 and the application unit 2 in a state where the application unit 2 is moved in the direction of arrow A from the state shown in FIG. 5. It is the figure which looked at the front-end | tip part vicinity in the squeegee 11 from the moving direction near side. It is the figure which looked at the front-end | tip part vicinity in squeegee 12a, 12b from the moving direction near side. FIG. 7 is a cross-sectional view of the application target substrate P, the stencil 20 and the application unit 2 in a state where the application unit 2 is further moved in the direction of arrow A from the state shown in FIG. 6. FIG. 10 is a cross-sectional view of the coating target substrate P, the stencil 20 and the coating unit 2 in a state where the coating unit 2 is further moved in the direction of arrow A from the state shown in FIG. 9. 10 is a cross-sectional view of the application target substrate P, the stencil 20 and the application unit 2 in a state where the application unit 2 is further moved from the state shown in FIG. 10 in the direction of arrow A and the tip of the squeegee 12a reaches the lip 33a. is there. It is a top view of the flux application | coating apparatus 1 of the state shown in FIG. FIG. 12 is a cross-sectional view of the coating target substrate P, the stencil 20 and the coating unit 2 in a state in which the coating unit 2 is further moved from the state shown in FIG. It is a top view of stencil 20A, application unit 2, and application object substrate P concerning other embodiments. It is sectional drawing of the application | coating target board | substrate P. FIG. It is a top view of the stencil 20x, the squeegee 12, and the application | coating target board | substrate P in the coating device which the inventor developed. It is sectional drawing of the stencil 20x, the squeegee 12, and the application | coating target board | substrate P for demonstrating application | coating of the flux F using the stencil 20x by the coating device which the inventor developed. It is sectional drawing which shows the state which floated in the edge part 33ax in the stencil 20x. It is sectional drawing which shows the state in which the front-end | tip part of the squeegee 12 was hooked on the edge part 33ax which the float produced.

  Hereinafter, embodiments of a flux coating apparatus and a flux coating method will be described with reference to the accompanying drawings.

  A flux coating apparatus 1 shown in FIG. 1 is an apparatus configured to allow flux to be applied to a substrate to be coated P according to a coating method using a stencil and a plurality of squeegees, and includes a coating unit 2, a flux supply unit 3, and an XY. A -Z moving mechanism 4, a substrate transport mechanism 5, a control unit 6, and a stencil 20 are provided.

  The coating unit 2 includes squeegees 11, 12a, 12b, springs 13, and nozzles 14a, 14b. The squeegee 11 is an example of a plate material. As an example, the squeegee 11 is formed in a flat plate shape with a resin material (polyurethane or the like). The tip of the squeegee 11 has a linear shape in plan view, and the tip is sharpened so as to come into linear contact with the stencil 20 and the application target substrate P. The squeegees 12a and 12b (hereinafter also referred to as “squeegee 12” when not distinguished from each other) are other examples of the plate material. It is formed in a flat plate shape with a polyurethane harder than the polyurethane forming the squeegee 11. The squeegee 12 is pointed so that the tip thereof is linear in plan view and is in linear contact with the stencil 20. Thereby, in this flux application device 1, the squeegees 12a and 12b are harder than the squeegee 11 (the squeegee 11 is softer than the squeegees 12a and 12b).

  In this flux coating apparatus 1, the squeegee 11 and the squeegees 12a and 12b are made different in hardness by being formed of the same kind of resin material having different hardness (in this example, polyurethane), but the types are different. It is also possible to adopt a configuration in which the squeegee 11 and the squeegees 12a and 12b have different hardnesses by being formed of various materials. Further, in the flux applying device 1, the squeegees 11, 12a, and 12b are arranged on the XYZ moving mechanism 4 with the squeegees 11 being sandwiched between the squeegees 12a and 12b. In this case, in this application unit 2, the squeegee 11 is directly attached so as not to move up and down with respect to the moving mechanism 4, whereas both the squeegees 12 move up and down with respect to the moving mechanism 4. It is movably attached via a spring 13. As shown in FIG. 1, in the coating unit 2, when the squeegees 11, 12 a, 12 b are not in contact with the stencil 20, etc. It is attached to the moving mechanism 4 so as to protrude downward (to the coating target substrate P side).

  The nozzle 14 a is disposed between the squeegees 11 and 12 a and is connected to the flux supply unit 3 to discharge (supply) the flux F supplied from the flux supply unit 3 between the squeegees 11 and 12 a. The nozzle 14b is disposed between the squeegees 11 and 12b and is connected to the flux supply unit 3, and discharges (supplies) the flux F supplied from the flux supply unit 3 between the squeegees 11 and 12b. The flux supply unit 3 pumps a prescribed amount of flux F toward the coating unit 2 under the control of the control unit 6, thereby applying the coating surface Pa of the coating target substrate P via the nozzles 14 a and 14 b (see FIG. 2: coating). Flux F is supplied to the surface of the stencil 20 pressed against the surface Pa. The XYZ moving mechanism 4 is an example of a moving mechanism, and moves the coating unit 2 with respect to the coating target substrate P transported to the coating processing position by the substrate transport mechanism 5 (“the frame material is An example of a configuration in which at least one of the pressed application target substrate and plate material is a coating unit 2 having squeegees 11, 12a, 12b as “plate material”).

  The substrate transport mechanism 5 transports the coating target substrate P to which the flux F is to be applied to the coating processing position according to the control of the control unit 6 and unloads the coating target substrate P on which the flux F has been applied from the coating processing position. The control unit 6 controls the flux coating apparatus 1 as a whole. Specifically, the control unit 6 controls the substrate transport mechanism 5 to transport the coating target substrate P to the coating processing position. In this case, in this flux coating apparatus 1, as an example, the stencil 20 is fixed at the coating processing position, and the substrate transport mechanism 5 presses the coating surface Pa against the back surface of the stencil 20 to apply the coating target substrate P. A configuration for positioning is adopted. Further, the control unit 6 controls the XYZ moving mechanism 4 to move the coating unit 2 onto the coating target substrate P (on the stencil 20), and also controls the flux supply unit 3 to supply the flux F. Supply. Further, the control unit 6 controls the XYZ moving mechanism 4 to move the coating unit 2 to perform a coating process that applies (spreads) the flux F to the coating surface Pa of the coating target substrate P. .

  In this case, as shown in FIG. 15, the application target substrate P has a plurality of bump forming portions 52 formed on one surface of the substrate main body 51 (upper surface shown in FIG. 15: application surface Pa of the flux F). Further, in this application target substrate P, a plurality of recesses 53 are formed on one surface of the substrate body 51, and a pad 54 is provided on the bottom of the recesses 53 to constitute the bump formation portion 52. In other words, in this application target substrate P, the bump forming portion 52 is formed in a concave shape so that the pad 54 for forming the bump is lower than one surface of the substrate body 51. In this case, in this flux coating apparatus 1, a wide region including each bump forming portion 52 is defined as a coating region 55 and the flux F is applied only to the coating region 55 by restricting the region where the flux F is applied by the stencil 20. The composition to apply is adopted.

  On the other hand, the stencil 20 is an example of a frame material, which is formed into a thin plate shape with a metal material such as stainless steel, and applies a flux F on the application surface Pa of the application target substrate P as shown in FIG. Openings 31 are formed corresponding to the application regions 55 to be applied (that is, the regions where the bump forming portions 52 are formed). Further, the thickness T (see FIG. 2) of the stencil 20 is defined according to the application thickness of the flux F to be applied to the application region 55 (the amount of the flux F to be applied). In addition, the stencil used at the time of the application | coating process of the flux F is not limited to said stencil 20, The resin stencil (resin stencil) can also be used.

  In this case, as shown in FIG. 3, in this stencil 20, as an example, the edge portions 32a and 32b along the moving direction (direction of arrow A) of the coating unit 2 by the moving mechanism 4 are parallel to the moving direction. Thus, an opening 31 is formed. Further, in this stencil 20, the lip squeegees 11, 12 a, 12 b are provided at the lip portions 33 a (an example of “first lip portions”) positioned in the moving direction (direction of arrow A) of the coating unit 2 by the moving mechanism 4. The opening 31 is formed so as to be non-parallel in a plan view with respect to the tip of the plate (direction perpendicular to the moving direction of the coating unit 2). Specifically, in the stencil 20, both end portions in the width direction (vertical direction in FIG. 3: a direction orthogonal to the moving direction) in the mouth edge portion 33a protrude most toward the near side in the moving direction (moving). (In this example, so as to be recessed toward the downstream side in the direction of arrow A from the both ends in the width direction of the lip portion 33a toward the center portion in the width direction of the lip portion 33a) The opening 31 is formed so that the central portion in the width direction of the mouth edge 33a is most recessed. Further, in the stencil 20, the lip portion 33a is line-symmetrical with respect to a one-dot chain line L (an example of a “virtual line”) passing through the central portion (center in this example) of the lip portion 33a in plan view. An opening 31 is formed so as to have a shape.

  Furthermore, in this stencil 20, a mouth edge 33b (an example of a “second mouth edge”) located in the opposite direction (the direction of arrow B) to the moving direction (the direction of arrow A) is the mouth edge. In the same manner as 33a, an opening 31 is formed so as to be non-parallel in plan view with respect to the tip of each squeegee 11, 12a, 12b (a direction orthogonal to the reverse direction). Specifically, in the stencil 20, both end portions in the width direction (vertical direction in FIG. 3: a direction orthogonal to the reverse direction in FIG. 3) of the lip portion 33b protrude most forward in the reverse direction (reverse). In addition, the opening 31 is formed so as to be recessed toward the downstream side in the direction of the arrow B from the both end portions in the width direction of the mouth edge portion 33b toward the center portion in the width direction of the mouth edge portion 33b. Has been. Further, in the stencil 20, the lip 33b is symmetrical with respect to a one-dot chain line L (an example of a “virtual line”) passing through the central portion (center in this example) of the lip 33b in a plan view. An opening 31 is formed so as to have a shape.

  In the stencil 20, the opening 31 is formed so that the mouth edge portions 33 a and 33 b are line-symmetrical with respect to a direction orthogonal to the moving direction of the coating unit 2. Thereby, in this stencil 20, the opening part 31 becomes a substantially hexagonal shape in planar view. The above-mentioned lip portion 33b is formed when the moving mechanism 4 moves the coating unit 2 in the direction of arrow B and spreads the flux F when applying the flux F by the flux applying apparatus 1. This corresponds to the “first lip portion positioned in the moving direction in which the plate member moves relative to the frame member pressed against the coating surface during one movement”. Moreover, in this stencil 20, each corner | angular part 34 of the opening part 31 is rounded so that it may become a planar view curve shape.

  In this case, as shown in FIGS. 3 and 4, in the flux applying apparatus 1, the stencil 20 is sandwiched between the frame members 21 a and 21 b so that the stencil 20 is not greatly strained. Specifically, first, the stencil 20 is sandwiched between the frame members 21a and 21b, and the stencil 20 protruding from the frame members 21a and 21b is sandwiched at the notches formed in the outer edge portions of the frame members 21a and 21b. It is clamped by the members 22a and 22b. Next, bolts (not shown) are screwed into the holding members 22a and 22b holding the stencil 20, respectively, so that the tip ends of the bolts are pressed against the outer peripheral surfaces of the frame members 21a and 21b, thereby holding the holding members 22a and 22b. Are moved toward the outside of the frame members 21a and 21b. At this time, the distortion is corrected so that the stencil 20 with the outer edge held between the holding members 22a and 22b is stretched. In this state, the frame members 21a and 21b are brought into close contact with the bolts. Thus, the stencil 20 is held by the frame members 21a and 21b in a state where the distortion is corrected.

  Next, a flux coating method using the flux coating apparatus 1 will be described with reference to the attached drawings.

  In the flux coating apparatus 1, when an instruction to start the coating process is given, the control unit 6 first controls the substrate transport mechanism 5 to transport the coating target substrate P to the coating processing position. At this time, the substrate transport mechanism 5 raises the application target substrate P such that the application surface Pa of the application target substrate P is pressed against the back surface of the stencil 20. Next, the control unit 6 controls the XYZ moving mechanism 4 to move the coating unit 2 to the outside of the opening 31 in the stencil 20 (for example, on the outer edge on the mouth edge 33b side). Subsequently, the control unit 6 controls the moving mechanism 4 to lower the application unit 2 toward the surface of the stencil 20 (application surface Pa of the application target substrate P) as shown in FIG. , 12a, 12b are pressed against the surface of the stencil 20.

  At this time, as the coating unit 2 is lowered, first, both the squeegees 12 come into contact with the surface of the stencil 20, and the coating unit 2 is further lowered in this state, so that both springs 13 are compressed. Due to elastic deformation, the tip portions of both squeegees 12 are urged toward the surface of the stencil 20. When the application unit 2 is further lowered, both springs 13 are further elastically deformed, and the tip of the squeegee 11 is pressed against the surface of the stencil 20 with a predetermined contact pressure. It will be in the state elastically deformed. In FIG. 4 and FIG. 5 referred later, the deformation state of the squeegee 11 is not shown. Subsequently, the control unit 6 controls the flux supply unit 3 to pump the flux F toward the nozzles 14a and 14b. At this time, as shown in FIG. 5, the flux F is supplied between the squeegees 11 and 12a by the nozzle 14a, and the flux F is supplied between the squeegees 11 and 12b by the nozzle 14b.

  Next, the control unit 6 controls the XYZ moving mechanism 4 to apply the coating from the lip 33b toward the lip 33a along the coating surface Pa (the surface of the stencil 20) of the substrate P to be coated. The unit 2 is moved in the direction of arrow A. At this time, as shown in FIG. 6, the flux F supplied from the nozzle 14 a is moved in the direction of arrow A by the squeegee 11 along with the movement of the coating unit 2, and the lip 33 b of the opening 31. In FIG. 4, the substrate is moved from the stencil 20 to the application surface Pa of the application target substrate P. At this time, since the squeegee 11 is formed to be softer than the squeegees 12 a and 12 b, the squeegee 11 is positioned above the opening 31 as the squeegee 11 is moved by the XYZ moving mechanism 4. 7, the tip portion is brought into contact with the application surface Pa (application region 55) by being elastically deformed by the pressing force of the XYZ moving mechanism 4. As a result, as shown in FIG. 9, the flux F moved onto the application surface Pa along with the movement of the squeegee 11 is pushed into the recess 53 by the squeegee 11, and in the recess 53 by the pushed flux F. Air is pushed out. Further, the flux F overflowing from the recess 53 is pushed into the other recess 53 as shown in FIG. 10 by further moving the squeegee 11 in the direction of arrow A by the XYZ moving mechanism 4. In this way, the coating is spread on the application surface Pa.

  On the other hand, the flux F supplied from the nozzle 14b is moved in the direction of the arrow A by the squeegee 12b as the coating unit 2 moves, and the lip stencil 20 on the coating target substrate P at the lip 33b of the opening 31 is applied. It is moved to the coating surface Pa. At this time, since the squeegee 12b is formed to be harder than the squeegee 11, in a state where the squeegee 12b is positioned above the opening 31 in accordance with the movement by the XYZ moving mechanism 4, FIG. As shown, the squeegee 12b is not greatly elastically deformed by the pressing force of the XYZ moving mechanism 4, and its tip is maintained at substantially the same height as the surface of the stencil 20 and separated from the application surface Pa. Yes. As a result, as shown in FIG. 9, the flux F moved on the application surface Pa with the movement of the squeegee 12 b is uniformly flattened so as to remain on the application surface Pa by the thickness T of the stencil 20. The When the squeegee 12b is moved onto the recess 53, as shown in FIG. 10, the flux F that is moved on the application target substrate P along with the movement of the squeegee 12b is caused by the squeegee 11. The coating surface Pa is spread so as to cover the flux F pushed into the recess 53.

  In this case, in the stencil 20 used in the flux coating apparatus 1, wide openings 31 are formed according to the plurality of pads 54 (concave portions 53) in the same manner as the stencil 20x in the coating apparatus developed by the inventors. ing. Accordingly, in the stencil 20 as well, as in the case of the stencil 20x, when the stencil 20 is pressed against the application surface Pa of the application target substrate P, the center part in the width direction of the lip portions 33a, 33b and the like is the application target substrate P. The deformation may occur so as to be separated from the coating surface Pa of the film (floating occurs). However, in the coating process using the stencil 20, even if the lip portion 33a or the like is lifted, the flux F is generated without causing the squeegees 11, 12a and 12b to be caught on the lip portion 33a or the like. It can be applied.

  Specifically, as described above, in the stencil 20, the corners 34 of the opening 31 are rounded so as to be curved in plan view. Therefore, as the coating unit 2 is moved in the direction of the arrow A from the side of the lip 33b, the squeegees 11, 12a, 12b in contact with the lip 32a, 32b in the opening 31 are The opening 31 can be smoothly moved toward the position in contact with the mouth edge 33a without being caught at the corner.

  In this case, as described above, when the coating unit 2 (each squeegee 11, 12a, 12b) is moved from the mouth edge 33b side to the mouth edge 33a, the mouth edge formed along the moving direction. 32a and 32b are pressed against the application surface Pa of the application target substrate P by the squeegees 11, 12a and 12b. Therefore, both end portions in the width direction in contact with the lip portions 32a and 32b in the lip portion 33a (near both corner portions 34 where the lip portions 32a and 32b contact the lip portion 33a) are shown in FIG. As described above, the squeegees 11, 12 a, 12 b are pressed against the application surface Pa together with the lip portions 32 a, 32 b pressed against the application surface Pa. Therefore, for example, even if the lip 33a is lifted, at least when the coating unit 2 (squeegee 12a) contacts both ends of the lip 33a in the width direction, at least the rim 33a in the width direction. Both ends are in close contact with the application surface Pa of the application target substrate P. As a result, a situation in which the squeegee 12a or the like is caught at both end portions in the width direction of the lip portion 33a is avoided.

  In the stencil 20, both end portions of the mouth edge portion 33 a located in the moving direction (the direction of arrow A) of the coating unit 2 by the moving mechanism 4 protrude most toward the front side in the moving direction of the coating unit 2. An opening 31 is formed so as to be recessed toward the downstream side in the moving direction of the coating unit 2 from both ends of the edge 33a toward the center, and the lip 33a with respect to the tip of each squeegee 11, 12a, 12b. Are non-parallel. Therefore, as shown in FIG. 12, when the coating unit 2 is moved by the moving mechanism 4 and the squeegee 12a reaches the vicinity of the lip 33a, first, the squeegee 12a is provided at both ends of the lip 33a in the width direction. When the coating unit 2 is further moved in the direction of the arrow A after the leading end of the squeegee is in contact, the leading end of the squeegee 12a is directed from the both end portions in the width direction of the lip portion 33a toward the central portion in the width direction. Sequential contact will be made.

  Therefore, even if the tip portion of the squeegee 12a is moved so as to sequentially contact from both ends in the width direction of the mouth edge portion 33a toward the center portion in the width direction, the mouth edge portion 33a may be lifted. As the squeegee 12a moves, the part where the float is generated moves toward the center in the width direction of the mouth edge 33a as indicated by arrows Ca and Cb in FIG. The central portion in the width direction of the edge portion 33a is also pressed against the application surface Pa of the application target substrate P to be in close contact therewith. As a result, a situation where the squeegee 12a is caught on the mouth edge 33a is avoided. As for the squeegee 11 and the squeegee 12b moved together with the squeegee 12a, the situation where the squeegee 12a is caught on the mouth edge 33a is avoided in the same manner as the squeegee 12a.

  Subsequently, by further moving the coating unit 2 in the direction of the arrow A, as shown in FIG. 13, the inside of each recess 53 of the flux F moved on the coating surface Pa with the movement of the squeegee 11. The excess flux F that has not been pushed in, and the excess flux F of the flux F that has been moved on the application surface Pa with the movement of the squeegee 12b are moved from the application surface Pa onto the stencil 20. It is done. Thereby, the application | coating process of the flux F with respect to the application | coating area | region 55 in the application surface Pa of the application | coating board | substrate P is completed. Thereafter, the control unit 6 controls the substrate transport mechanism 5 to carry out the coating target substrate P for which the coating process has been completed from the coating processing position, and next sets the coating target substrate P to which the flux F is to be applied to the coating processing position. Transport.

  In this case, when applying the flux F to the application target substrate P transported following the application target substrate P, the application unit 2 is moved in the direction of arrow B shown in FIGS. In this case, instead of the squeegee 12b, the squeegee 12a functions as a squeegee for flattening the flux F. Specifically, the control unit 6 first controls the flux supply unit 3 to pump the flux F to the nozzles 14a and 14b. In this case, in addition to the flux F moved onto the stencil 20 by the squeegee 12b when the flux F is applied immediately before, the flux to be applied to the application surface Pa (concave portion 53) of the new application target substrate P. F is supplied between the squeegees 11 and 12b from the nozzle 14b, and in addition to the flux F moved onto the stencil 20 by the squeegee 11 when the flux F was applied immediately before, a new coating target substrate P A flux F to be spread on the application surface Pa is supplied between the squeegees 11 and 12a from the nozzle 14a.

  Next, the control unit 6 controls the XYZ moving mechanism 4 to move the coating unit 2 in the direction of arrow B along the coating surface Pa (the surface of the stencil 20) of the coating target substrate P. At this time, as shown in FIG. 7, the squeegee 11 is pushed into the recess 53 to spread the flux F on the application surface Pa, and the squeegee 12a is applied to the application target substrate P as shown in FIG. The surface of the surface Pa and the flux F in the concave portion 53 are uniformly flattened while spreading the flux F for the thickness T. At this time, in the stencil 20, as described above, each corner 34 of the opening 31 is rounded so as to have a curved shape in plan view. Therefore, as the coating unit 2 is moved in the direction of arrow B from the side of the lip 33a, each squeegee 11, 12a, 12b in contact with the lip 32a, 32b in the opening 31 is The opening 31 can be smoothly moved toward the position in contact with the mouth edge 33b without causing a catch.

  In this case, when the coating unit 2 (each squeegee 11, 12a, 12b) is moved from the mouth edge 33a side to the mouth edge 33b, the mouth edges 32a, 32b formed along the moving direction are Each squeegee 11, 12a, 12b is pressed against the application surface Pa of the application target substrate P. Therefore, both end portions in the width direction of the lip portion 33b in contact with the lip portions 32a and 32b (near both corner portions 34 where the lip portions 32a and 32b and the lip portion 33b are in contact) 12a and 12b are pressed against the coating surface Pa together with the lip portions 32a and 32b pressed against the coating surface Pa. Therefore, for example, even if the lip 33b is lifted, at least when the coating unit 2 (squeegee 12b) is in contact with both ends in the width direction of the lip 33b, at least in the width direction of the lip 33b. Both ends are in close contact with the application surface Pa of the application target substrate P. As a result, a situation in which the squeegee 12b or the like is caught at both end portions in the width direction of the mouth edge portion 33b is avoided.

  Further, in this stencil 20, both ends of the lip portion 33 b located in the moving direction of the coating unit 2 by the moving mechanism 4 (the direction of the arrow B: the direction opposite to the direction of the arrow A described above) are the moving direction of the coating unit 2. The squeegee 11, 12a, 12b is formed so as to protrude most toward the front side of the lip squeeze and to be recessed toward the downstream side in the moving direction of the coating unit 2 from the both ends of the lip 33b toward the center. The edge portion 33b is non-parallel to the tip portion of the. Therefore, when the coating unit 2 is moved by the moving mechanism 4 and the squeegee 12b reaches the vicinity of the lip 33b, first, the tip of the squeegee 12b comes into contact with both ends of the lip 33b in the width direction. When the coating unit 2 is further moved in the direction of the arrow B, the tip of the squeegee 12b comes into contact with the edge 33b sequentially from both ends in the width direction toward the center in the width direction.

  Therefore, even if the tip end portion of the squeegee 12b is moved so as to be sequentially contacted from the both end portions in the width direction of the mouth edge portion 33b toward the center portion in the width direction, the mouth edge portion 33b may be lifted. With the movement of the squeegee 12b, the part where the float is generated moves toward the center portion in the width direction of the mouth edge portion 33b, and finally the center portion in the width direction of the mouth edge portion 33b is also applied. The target substrate P is pressed against the application surface Pa and comes into close contact. As a result, a situation where the squeegee 12b is caught on the mouth edge 33b is avoided. Note that the squeegee 11 and the squeegee 12a moved together with the squeegee 12b are also prevented from being caught by the mouth edge 33b in the same manner as the squeegee 12b. As a result, in the same manner as in the above-described coating process on the coating target substrate P, the flux F is coated on the coating region 55 on the coating target substrate P by moving the coating unit 2 once along the coating surface Pa. Is completed.

  Thus, according to the flux applying apparatus 1 and the flux applying method by the flux applying apparatus 1, the moving direction in which the squeegees 11, 12a, 12b move relative to the stencil 20 pressed against the application surface Pa. Opening portions so that both end portions in the width direction of the lip portion 33a located in the direction of the arrow A shown in FIG. 3 protrude most toward the front side in the moving direction and are recessed in the moving direction toward the center portion in the width direction. By using the stencil 20 in which the stencils 31 are formed, the squeegee 11, When the 12a and 12b are moved in the moving direction, the scanning is performed with respect to the respective portions between the both end portions in the width direction and the central portion of the mouth edge portion 33a. The tips of the dies 10, 12 a, 12 b are moved so as to come into contact with each other sequentially from both ends. 33a can be adhered to the application surface Pa. Thus, according to the flux applying apparatus 1 and the flux applying method by the flux applying apparatus 1, it is possible to avoid a situation in which the tips of the squeegees 11, 12a, 12b are caught on the lip 33a when the flux F is applied. Therefore, the required amount of flux F can be reliably applied to the application region 55 where the flux F is to be applied without causing damage to the stencil 20 or scratching the squeegees 11, 12a, 12b.

  Further, according to the flux applying apparatus 1 and the flux applying method by the flux applying apparatus 1, the phantom line (the one-dot chain line L shown in FIG. ) As a reference, the stencil 20 having the opening 31 formed so that the mouth edge 33a is line-symmetrical in plan view is used so that the tip of each squeegee 11, 12a, 12b can be connected to the mouth 33a. When the squeegees 11, 12a, 12b are moved so as to be in contact with the respective parts in the width direction sequentially, the stencil 20 is moved in the direction from one end in the width direction to the other end of the lip 33a. And the force to move the stencil 20 in the direction from the other end of the lip 33a toward the one end. It is therefore possible to avoid a situation where displacement in the width direction of the stencil 20 in a coating target substrate P occurs.

  Furthermore, according to the flux applying apparatus 1 and the flux applying method by the flux applying apparatus 1, both end portions in the width direction of the lip portion 33b located in the direction opposite to the moving direction (the direction of arrow B shown in FIG. 3) are By using the stencil 20 having the opening 31 formed so as to protrude most toward the near side in the reverse direction and to be recessed in the reverse direction toward the center in the width direction, the moving direction (the direction of the arrow A) is changed. When the flux F is applied by moving the squeegee 11, 12a, 12b in the opposite direction (direction of arrow B), the situation where the tip of the squeegee 11, 12a, 12b is caught on the lip 33b is avoided. Therefore, even when the flux F is applied by moving in the reverse direction, the stencil 20 is broken or the squeegees 11, 12a, 12 are applied. Of without causing scratches, it is possible to reliably apply the flux F in the required amount in the coating region 55 to be coated with flux F.

  Further, according to the flux applying apparatus 1 and the flux applying method by the flux applying apparatus 1, the opening portion is formed by using the stencil 20 formed so that each corner portion 34 of the opening portion 31 has a curved shape in plan view. The squeegees 11, 12 a, 12 b in contact with the lip portions 32 a, 32 b in 31 are smoothly brought into contact with the lip portion 33 a (or lip portion 33 b) without causing the corner portions 34 to be caught. Can be moved to.

  Further, according to the flux coating apparatus 1, as a plate material, the squeegee 11 is elastically deformed so that the tip portion thereof is in contact with the coating surface Pa when pressed against the stencil 20 in a state of being positioned above the opening 31. And two squeegees 12a and 12b, which are formed to be harder than the squeegee 11 and the tip portion is separated from the application surface Pa when pressed against the stencil 20 in a state of being positioned above the opening 31. In a state where the squeegee 11 is sandwiched between the squeegees 12a and 12b, and the distal ends of the squeegee 11 and the squeegees 12a and 12b are pressed against the surface of the stencil 20, the moving mechanism 4 is Each squeegee 11, in the direction of arrow A toward the mouth edge 33a and in the direction of arrow B toward the mouth edge 33b, 2a, and 12b to move to adopt a configuration for applying the flux F.

  Therefore, in this flux application device 1 and the flux application method by the flux application device 1, when moving each squeegee 11, 12a, 12b in the direction of arrow A, and in the direction of arrow B, each squeegee 11, 12a, 12b. Since the flux F can be applied to the application target substrate P in both cases of movement, a plurality of application target substrates P are compared with the configuration in which the flux is applied only when the squeegee is moved in any one direction. In addition to shortening the time required to apply the flux F to the stencil 20, the flux F is applied by the squeegees 11 and 12b by using the stencil 20 (the coating unit 2 is indicated by an arrow). The tip of the squeegee 12a, which is essentially unnecessary when it is moved in the direction A) Even if the stencil 20 is not separated from the stencil 20 and the squeegee 12a is damaged, the flux F is applied by the squeegees 11 and 12a (the application unit 2 is moved in the direction of arrow B). Even when the tip of the squeegee 12b, which is essentially unnecessary, is not separated from the stencil 20 during the movement, damage to the stencil 20 and damage to the squeegee 12b can be avoided. Therefore, according to this flux application device 1, the manufacturing cost can be sufficiently reduced by the amount that the mechanism for moving the squeegees 12a and 12b separately from the squeegee 11 becomes unnecessary.

  The configuration of the flux applying apparatus and the flux applying method are not limited to the above configuration and method. For example, although the example which uses the stencil 20 in which the opening part 31 of planar view substantially hexagonal shape was used was demonstrated, the planar shape of the opening part formed in a frame material is not limited to this. Specifically, the stencil 20A shown in FIG. 14 is another example of the frame material, and is formed into a thin plate shape with a metal material such as stainless steel, for example, and the flux F on the application surface Pa of the application target substrate P. An opening 31A is formed corresponding to the application region 55A to be applied (that is, the region where each of the bump forming portions 52 is formed). Similarly to the stencil 20 described above, the thickness of the stencil 20A is defined according to the application thickness of the flux F to be applied to the application region 55A (the amount of the flux F to be applied).

  In this case, in this stencil 20A, as an example, the opening 31A is formed so that the mouth edge portions 35a and 35b along the moving direction (direction of arrow A) of the coating unit 2 by the moving mechanism 4 are parallel to the moving direction. Has been. Specifically, the stencil 20A is one of the two end portions in the width direction (vertical direction in FIG. 14: the direction perpendicular to the moving direction) in the mouth edge 36a (in this example, the upper side in the figure). End) protrudes most forward in the moving direction (positioned upstream in the moving direction) and one of the width directions of the lip 36a (in this example, the upper end in the figure) ) To the other of the both ends in the width direction (in this example, the lower end in the figure), an opening 31A is formed so as to be recessed downstream in the direction of arrow A.

  Further, in this stencil 20A, the mouth edge 36b (an example of “second mouth edge”) located in the opposite direction (the direction of arrow B) to the moving direction (the direction of arrow A) is the mouth edge. Similarly to 36a, an opening 31A is formed so as to be non-parallel in a plan view with respect to the tip portions (directions orthogonal to the opposite directions) of the squeegees 11, 12a, 12b. Specifically, in this stencil 20A, one of the both end portions in the width direction (vertical direction in FIG. 14: the direction orthogonal to the moving direction) in the mouth edge 36b (in this example, the lower side in the figure) ) End most protruding forward in the direction of arrow B (located upstream in the moving direction) and one of the width directions of the lip 36b (in this example, the lower side in the figure) The opening 31A is formed so as to be recessed toward the downstream side in the direction of the arrow B toward the other of the end portions in the width direction from the end portion (in this example, the upper end portion in the figure).

  Thereby, in this stencil 20A, the opening 31A has a substantially parallelogram shape in plan view. The above-mentioned lip portion 36b is formed when the moving mechanism 4 moves the coating unit 2 in the direction of the arrow B and spreads the flux F when applying the flux F by the flux applying apparatus 1. This corresponds to the “first lip portion positioned in the moving direction in which the plate member moves relative to the frame member pressed against the coating surface during one movement”. It should be noted that the lower end of the widthwise ends of the lip 36a protrudes most forward in the direction of arrow A, or the upper end of the widthwise ends of the lip 36b. Can be protruded most forward in the direction of arrow B. Moreover, in this stencil 20A, each corner | angular part 37 of 31 A of opening parts is rounded and formed so that it may become a planar view curve shape. Even when such a stencil 20A is used, the same effects as when the stencil 20 is used can be obtained.

  Specifically, at the lip 36a located in the moving direction (direction of arrow A shown in FIG. 14) in which the squeegees 11, 12a, 12b move relative to the stencil 20A pressed against the application surface Pa. By using the stencil 20A in which the opening 31A is formed so that one of the both ends in the width direction protrudes most forward in the moving direction and is recessed in the moving direction toward the other of the both ends. Even if the squeegee 11, 12 a, 12 b is moved in the movement direction with respect to the stencil 20 </ b> A, even if the floating with respect to the application target substrate P (application surface Pa) occurs at the center in the width direction of the lip 36 a, The front ends of the squeegees 11, 12 a, 12 b with respect to the respective portions between one end and the other end in the width direction of the mouth edge 36 a are from one end side. Order to be moved as follows in contact, can be brought into close contact with rim 36a of the stencil 20A coated surface Pa so as to move toward a portion above the float has occurred at the other end. As a result, it is possible to avoid a situation in which the tips of the squeegees 11, 12a, 12b are caught by the mouth edge 36a during the application of the flux F. This causes damage to the stencil 20A or damage to the squeegees 11, 12a, 12b. The required amount of flux F can be reliably applied to the application region 55 where the flux F is to be applied.

  In addition, one of the both end portions in the width direction of the lip portion 36b located in the reverse direction (the direction of arrow B shown in FIG. 14) with respect to the moving direction protrudes to the near side in the reverse direction and By using the stencil 20A in which the opening 31A is formed so as to be recessed in the opposite direction toward the other side, the squeegee 11 in the opposite direction (the direction of the arrow B) instead of the moving direction (the direction of the arrow A), Since it is possible to avoid a situation in which the tip of each squeegee 11, 12a, 12b is caught on the lip 36b when the flux F is applied by moving 12a, 12b, it is moved in the reverse direction described above. Even when the flux F is applied, the stencil 20A is not damaged and the squeegees 11, 12a, 12b are not damaged. The flux F of a main amount can be reliably applied.

  Furthermore, by using the stencil 20A formed so that each corner portion 37 of the opening 31A has a curved shape in plan view, the squeegees 11, 12a in contact with the mouth edges 35a, 35b in the opening 31A, 12b can be smoothly moved to the state in contact with the mouth edge 36a (or the mouth edge 36b) without causing the corners 37 to be caught.

  Further, the flux coating apparatus 1 including the coating unit 2 having three squeegees 11, 12 a, and 12 b has been described as an example. However, the flux coating apparatus may be configured by including two or less squeegees. it can. Specifically, as an example, when the flux F is applied only when the squeegee is moved in the direction of arrow A (when the flux F is not applied when moved in the direction of arrow B), the application unit described above is used. The squeegee 12a in FIG. 2 is not provided and only the squeegees 11 and 12b are provided, and the flux F is applied only when the squeegee is moved in the direction of the arrow B (the flux F is applied when the squeegee is moved in the direction of the arrow A). In such a case, the squeegee 12b in the coating unit 2 is not required, and only the squeegees 11 and 12a can be provided.

  Further, for example, one of the squeegees 12a and 12b (hereinafter, either one is also referred to as “squeegee 12”) and the squeegee 11 are attached to the moving mechanism 4, and the moving mechanism 4 is attached to the coating surface Pa. Further, it is possible to adopt a configuration in which the moving mechanism 4 is pivotally supported so as to be rotatable about a vertical rotation axis and the squeegee 12 is positioned so that the squeegee 12 is positioned on the front side in the movement direction during the application process of the flux F. . Moreover, the structure which apply | coats the flux F using only one squeegee 12x can also be employ | adopted like the coating device which the inventor developed. Even when any of these configurations is employed, the same effects as those of the flux applying apparatus 1 can be obtained by using the stencils 20 and 20A.

  In this case, when adopting a configuration in which the flux F is applied only when the plate material is moved to the arrow A described above, the mouth edges 33b and 36b of the openings 31 and 31A in the stencils 20 and 20A are formed in the mouth of the stencil 20x. You may form so that it may become in parallel with a board | plate material similarly to the edge part 33bx. Further, in the case of adopting the configuration in which the flux F is applied only when the plate material is moved to the arrow B described above, the mouth edges 33a and 36a of the openings 31 and 31A in the stencils 20 and 20A are replaced with the edges of the stencil 20x. Similarly to the portion 33ax, it may be formed to be parallel to the plate material.

  Further, the flux applying apparatus 1 described above employs a configuration in which the three squeegees 11, 12a, 12b are fixed to the XYZ moving mechanism 4 and the squeegees 11, 12a, 12b are simultaneously moved in the same direction. However, it is also possible to employ a configuration in which a moving mechanism for moving the squeegee 11, a moving mechanism for moving the squeegee 12a, and a moving mechanism for moving the squeegee 12b are provided separately, and each squeegee is moved independently. it can. Further, in the above-described flux coating apparatus 1, the substrate to be coated P is transported by the substrate transport mechanism 5 to the stencil 20 fixed at the coating processing position, and the stencil 20 is moved by the XYZ moving mechanism 4. And a configuration in which the stencil 20 and the coating target substrate P are moved toward the coating unit 2 fixed at a predetermined position, and a coating target in which the stencil 20 is pressed. A configuration in which both the substrate P and the coating unit 2 are moved can also be adopted.

DESCRIPTION OF SYMBOLS 1 Flux application | coating apparatus 2 Application | coating unit 4 XYZ moving mechanism 5 Substrate conveyance mechanism 11, 12a, 12b Squeegee 20, 20A Stencil 31, 31A Opening part 32a, 32b, 33a, 33b, 35a, 35b, 36a, 36b Edge 34, 37 Corner 55, 55A Application area F Flux L Dash-dot line P Application target substrate Pa Application surface T Thickness

Claims (7)

A plate material that spreads the supplied flux on the application surface of the substrate to be applied, and an opening is provided so that the application region of the flux on the application surface is exposed when pressed against the application surface. A frame material having a thickness defined in accordance with an application thickness of the flux to be applied, and a moving mechanism for moving at least one of the substrate to be coated and the plate material against which the frame material is pressed against the other. The application area by moving the at least one with respect to the other by the moving mechanism in a state where the front end portion of the plate member linearly pressed against the surface of the frame member pressed against the application surface A flux application device for applying the flux to
The frame member has both end portions in the width direction at the first mouth edge located in the moving direction in which the plate member moves relative to the frame member pressed against the application surface during the movement of the at least one of the frame members. Is a flux coating apparatus in which the opening is formed so as to protrude most toward the front side in the moving direction and to be recessed in the moving direction toward the center in the width direction.   The frame member passes through a central portion in the width direction of the first mouth edge portion, and the first mouth edge portion has a line-symmetric shape in plan view with reference to an imaginary line along the moving direction. The flux coating apparatus according to claim 1, wherein the opening is formed so as to be.   The frame member has opposite ends in the width direction of the second mouth edge located in the opposite direction with respect to the moving direction and protrudes most toward the near side in the opposite direction and toward the center in the width direction. The flux application device according to claim 1, wherein the opening is formed so as to be recessed. A plate material that spreads the supplied flux on the application surface of the substrate to be applied, and an opening is provided so that the application region of the flux on the application surface is exposed when pressed against the application surface. A frame material having a thickness defined in accordance with an application thickness of the flux to be applied, and a moving mechanism for moving at least one of the substrate to be coated and the plate material against which the frame material is pressed against the other. The application area by moving the at least one with respect to the other by the moving mechanism in a state where the front end portion of the plate member linearly pressed against the surface of the frame member pressed against the application surface A flux application device for applying the flux to
The frame member has both end portions in the width direction at the first mouth edge located in the moving direction in which the plate member moves relative to the frame member pressed against the application surface during the movement of the at least one of the frame members. A flux coating apparatus in which one of the protrusions protrudes most forward in the moving direction and the opening is formed so as to be recessed in the moving direction toward the other of the both ends.   The frame member has one of the two end portions in the width direction of the second mouth edge located in the opposite direction to the moving direction most protrudes to the near side in the opposite direction, and the other of the two end portions. The flux application apparatus according to claim 4, wherein the opening is formed so as to be recessed in the opposite direction as it goes.   The flux coating apparatus according to any one of claims 1 to 5, wherein the frame member is formed such that each corner of the opening has a curved shape in plan view.   The flux application | coating method which apply | coats the said flux to the said application | coating area | region of the said board | substrate to be applied using the flux application | coating apparatus in any one of Claim 1 to 6.

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