JP2010254685A5 - - Google Patents
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- JP2010254685A5 JP2010254685A5 JP2010084284A JP2010084284A JP2010254685A5 JP 2010254685 A5 JP2010254685 A5 JP 2010254685A5 JP 2010084284 A JP2010084284 A JP 2010084284A JP 2010084284 A JP2010084284 A JP 2010084284A JP 2010254685 A5 JP2010254685 A5 JP 2010254685A5
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- JP
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- Prior art keywords
- acrylate
- unsaturated
- composition
- alkoxyalkyl
- unsaturated alkoxyalkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Claims (12)
該酸化防止剤は、フェノール系酸化防止剤及び/又はリン系酸化防止剤を含み、
該酸化防止剤の含有量は、該α−(不飽和アルコキシアルキル)アクリレート100質量%に対して0.03〜0.5質量%であることを特徴とするα−(不飽和アルコキシアルキル)アクリレート組成物。 The following general formula (I):
The antioxidant includes a phenolic antioxidant and / or a phosphorus antioxidant,
The content of the antioxidant is 0.03 to 0.5% by mass with respect to 100% by mass of the α- (unsaturated alkoxyalkyl) acrylate, and the α- (unsaturated alkoxyalkyl) acrylate is characterized in that Composition.
該製造方法は、粗α−(不飽和アルコキシアルキル)アクリレートから精製α−(不飽和アルコキシアルキル)アクリレートを得る精製工程後に、精製α−(不飽和アルコキシアルキル)アクリレートに酸化防止剤を添加する工程を含むことを特徴とするα−(不飽和アルコキシアルキル)アクリレート組成物の製造方法。 The following general formula (I):
The production method comprises a step of adding an antioxidant to the purified α- (unsaturated alkoxyalkyl) acrylate after the purification step of obtaining the purified α- (unsaturated alkoxyalkyl) acrylate from the crude α- (unsaturated alkoxyalkyl) acrylate. A process for producing an α- (unsaturated alkoxyalkyl) acrylate composition.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010084284A JP5520116B2 (en) | 2009-03-31 | 2010-03-31 | α- (Unsaturated alkoxyalkyl) acrylate composition and method for producing the same |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009087219 | 2009-03-31 | ||
JP2009087219 | 2009-03-31 | ||
JP2010084284A JP5520116B2 (en) | 2009-03-31 | 2010-03-31 | α- (Unsaturated alkoxyalkyl) acrylate composition and method for producing the same |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2010254685A JP2010254685A (en) | 2010-11-11 |
JP2010254685A5 true JP2010254685A5 (en) | 2013-11-14 |
JP5520116B2 JP5520116B2 (en) | 2014-06-11 |
Family
ID=43316019
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010084284A Active JP5520116B2 (en) | 2009-03-31 | 2010-03-31 | α- (Unsaturated alkoxyalkyl) acrylate composition and method for producing the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5520116B2 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5591543B2 (en) * | 2010-01-04 | 2014-09-17 | 株式会社日本触媒 | Reactive diluent |
JP5583378B2 (en) * | 2009-09-29 | 2014-09-03 | 株式会社日本触媒 | Method for producing α- (alkoxyalkyl) acrylate |
JP5496534B2 (en) * | 2009-03-31 | 2014-05-21 | 株式会社日本触媒 | Process for producing α- (unsaturated alkoxyalkyl) acrylate |
JP5977063B2 (en) * | 2012-04-05 | 2016-08-24 | 株式会社日本触媒 | Polymerizable compound |
JP6125933B2 (en) * | 2012-07-13 | 2017-05-10 | 株式会社日本触媒 | Stabilizer composition |
JP2016160387A (en) * | 2015-03-04 | 2016-09-05 | 株式会社クラレ | Polymer composition |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4142913A1 (en) * | 1991-12-24 | 1993-07-01 | Basf Ag | METHOD FOR PRODUCING OXADIMETHACRYLIC ACID |
DE4142909A1 (en) * | 1991-12-24 | 1993-07-01 | Basf Ag | OXADIMETHACRYLIC COMPOUNDS AND METHOD FOR THEIR PRODUCTION |
JP3907738B2 (en) * | 1995-03-24 | 2007-04-18 | 株式会社日本触媒 | Method for producing allyl ethers |
JP3943180B2 (en) * | 1997-02-18 | 2007-07-11 | 株式会社日本触媒 | Method for producing allyl ether compound |
KR100281903B1 (en) * | 1998-12-24 | 2001-03-02 | 윤종용 | Photosensitive polymer having a cyclic structure of the backbone and a resist composition comprising the same |
JP3953712B2 (en) * | 1999-07-12 | 2007-08-08 | 三菱レイヨン株式会社 | Resin resin and chemically amplified resist composition |
JP2002131900A (en) * | 2000-10-25 | 2002-05-09 | Fuji Photo Film Co Ltd | Original plate for forming mask |
JP2004123819A (en) * | 2002-09-30 | 2004-04-22 | Nippon Shokubai Co Ltd | Resin having leaving group by proton and photosensitive resin composition |
-
2010
- 2010-03-31 JP JP2010084284A patent/JP5520116B2/en active Active
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