JP2010253753A - Mold for imprint and method of manufacturing the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a mold for an imprint having flexibility and excellent mold release performance, responding to large area transfer such as a display screen, having economic advantages and usable for a thermal imprint to cyclic olefin copolymers useful as a material of an optical member, and to provide a method of manufacturing the same. <P>SOLUTION: The mold for the imprint comprises a fibrous structure and cured resin. At least in a region where a transfer pattern is present, air gaps of the fibrous structure are filled with the cured resin, and the three-dimensional shaped transfer pattern comprising the cured resin is formed on the surface of the fibrous structure. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to an imprint mold and a method for manufacturing the same, and more particularly to an imprint mold useful for manufacturing a display and an optical member and a method for manufacturing the same.

  Conventionally, as a fine processing technique, a semiconductor lithography technique developed from a photoengraving technique is industrially used. However, this semiconductor lithography technology is expensive in terms of manufacturing equipment and the like, so in actual industrial production, it is limited to uses that are economically suitable for semiconductor manufacturing and the like, and for other uses such as optical member manufacturing. However, the actual situation is that a cheaper processing technique is required.

Also in semiconductor manufacturing applications, with the extension of current semiconductor lithography technology, it is difficult to meet the demand for further miniaturization due to the limit of optical resolution.
Therefore, in recent years, as another fine processing technique, a nanoimprint technique for transferring and molding a desired fine structure (pattern) by pressing a plastic resin with a mold or the like has attracted attention.

  Since this nanoimprint technique does not use an optical system technique such as a semiconductor lithography technique, in principle, there is no limit to the resolution, and the limit of shape transfer depends on the accuracy of mold fabrication. In addition, since a high-precision lens system transfer device (stepper) like the semiconductor lithography technology is unnecessary, the cost of the device in the nanoimprint technology can be suppressed to 1/10 or less.

  In other words, as long as an appropriate mold can be manufactured, it is possible to manufacture an ultrafine structure more easily and at a lower cost by using nanoimprint technology than when using conventional semiconductor lithography technology.

There are two types of nanoimprint technology described above: thermal nanoimprint technology using a thermoplastic resin as a transfer target, and optical nanoimprint technology using a photocurable resin as a transfer target (Patent Documents 1 and 2).
The thermal nanoimprint technology is a technology for imprinting by pressing a mold in a state where a thermoplastic resin is heated to a glass transition temperature or higher, releasing the mold after cooling, and transferring / molding the pattern. There is an advantage that the material selectivity is wide for both the mold and the transfer target.
On the other hand, optical nanoimprinting is a technique for transferring and molding a pattern by irradiating light with a mold pressed against a photocurable resin and photocuring it. Although heating at a high temperature is not required, the mold or transferred object needs to be transparent to light. Practically, ultraviolet light is used as light.

Here, as the above-mentioned nanoimprint mold, a mold obtained by processing a substrate made of quartz or silicon by using a semiconductor lithography technique is mainly used.
However, because of the application of semiconductor lithography technology, the size of the mold is currently only compatible with a small area of about 6 inches square or less, and in order to transfer and mold a desired fine structure (pattern) on a large area, There is a problem that it is necessary to repeat the process of imprinting in a region having a size corresponding to the transfer area of the mold, and then moving to the next region and imprinting there again, which takes time (Patent Document 3). ).

Furthermore, since a quartz substrate or a silicon substrate, which is an expensive semiconductor member, is used as the mold material, and a complicated and expensive semiconductor lithography technique is used as the mold manufacturing method, there is a problem of high costs.
Therefore, the mold as described above is not suitable for use in industrial production of optical members such as a large screen display.

In addition, the mold described above is precise and robust, but has a problem that it lacks flexibility.
Currently, in the example of transfer / molding proposed in the nanoimprint technology, the transferred object to be imprinted is often a substrate having poor flexibility such as a silicon substrate or a compound semiconductor substrate.
However, when both the mold and the transfer target lack flexibility, it is difficult to release the closely attached mold without damaging the transfer pattern fitted in the male-female relationship after imprinting. In many cases, there are problems such as generation of defects in the mold release process and damage to the mold.
In addition, if a foreign matter is mixed in the interface between the two during imprinting, both the mold lacking flexibility and the transferred material are seriously damaged. And a damaged mold is usually not reusable. In general, the larger the transfer area, the higher the risk of contamination.

Therefore, a flexible polymer mold has been proposed as a mold that gives flexibility to the mold and can cope with a larger area (Patent Document 4).
Since this mold is made of a cyclic olefin copolymer and has flexibility, it is relatively fragile like a compound semiconductor substrate, and can be easily released from an inflexible transferred material, thereby reducing physical damage. Can do.

US Pat. No. 5,772,905 Special Table 2002-539604 JP 2005-508075 gazette JP 2007-55235 A

Here, as the material of the mold, a cyclic olefin copolymer (for example, ZEONOR (registered trademark) manufactured by Nippon Zeon Co., Ltd.) is used. It is a thermoplastic resin developed for optical member molding. That is, the cyclic olefin copolymer has a glass transition temperature in a temperature range suitable for molding, has excellent optical properties (particularly transparency), and has excellent dimensional stability. These characteristics are suitable as materials for optical members.
Therefore, the cyclic olefin copolymer can be used as a material for a mold, but is more preferably used as a material for an object to be transferred that becomes an optical member.

However, when the cyclic olefin copolymer is used as a material for a transfer object, there is a problem that the same cyclic olefin copolymer cannot be used as a material for the imprint mold.
In order to process a cyclic olefin copolymer, which is a thermoplastic resin, into a desired shape, it is necessary to use a thermal imprint technique that presses the mold under conditions above its glass transition temperature. In the case of the same cyclic olefin copolymer, the shape of the mold to be transferred cannot be deformed by pressing to maintain the original shape above the glass transition temperature, and cannot function as a mold.

  This is the same when other materials are used as optical members, and the glass transition temperature becomes a problem when transfer is performed using the thermal imprint technique. Further, when the structure is molded using the photoimprint technique, erosion due to the solvent contained in the ultraviolet curable resin becomes a problem. For this reason, the material used as the mold for imprinting needs to be appropriately selected from many material groups depending on the transfer target.

  The present invention has been made in view of the above-described problems, and the object of the present invention is to have flexibility, excellent releasability, and can cope with a large area transfer such as a display screen. It is also economically advantageous, and is an imprint mold that matches the material to be transferred, and is also useful for materials that are useful as materials for optical members, particularly thermal imprints on cyclic olefin copolymers. An object of the present invention is to provide an imprint mold that can be used and a method for manufacturing the same.

  As a result of various studies, the inventor has included a curable resin in the fibrous structure, and after filling the voids of the fibrous structure with the curable resin, the crosslinking reaction is caused to the hard resin. The present invention has been completed by finding that the above-mentioned problems can be solved if the mold has a cured hybrid structure.

  That is, the invention according to claim 1 of the present invention is composed of a fibrous structure and a cured resin, and at least in the region where the transfer pattern exists, the void of the fibrous structure is filled with the cured resin. The imprint mold is characterized in that a three-dimensional transfer pattern made of the cured resin is formed on the surface of the fibrous structure.

  The invention according to claim 2 of the present invention is characterized in that the fibrous structure is a structure composed of one or more of plant fiber, animal fiber, carbon fiber, or glass fiber. The imprint mold according to claim 1.

  The invention according to claim 3 of the present invention is the imprint mold according to any one of claims 1 and 2, wherein the glass transition temperature of the cured resin is 140 ° C or higher. is there.

  The invention according to claim 4 of the present invention is the imprint mold according to any one of claims 1 to 3, wherein the cured resin is a resin cured by ultraviolet rays.

  In the invention according to claim 5 of the present invention, the fibrous structure provided on the release support includes an ultraviolet curable resin, and at least in the region where the transfer pattern is formed. After filling the voids in the structure with the ultraviolet curable resin, a mold original made of a material that transmits ultraviolet rays is brought into close contact with the fibrous structure, pressed with a predetermined pressure, and a predetermined amount of ultraviolet rays is applied. Irradiating to form a three-dimensional transfer pattern on the surface of the fibrous structure, a method for producing an imprint mold.

  Moreover, the invention according to claim 6 of the present invention is the imprint according to claim 5, wherein in the method for manufacturing the imprint mold, the fibrous structure is irradiated with ultraviolet rays from both front and back sides. It is a manufacturing method of the mold.

  According to the present invention, since the voids of the fibrous structure constituting the imprint mold are configured to be filled with the cured resin, the imprint mold according to the present invention has flexibility and a mold release. This is an imprint mold that is excellent in performance, can be used for batch transfer of large areas such as display screens, and is economically advantageous, and further to a cyclic olefin copolymer useful as a material for optical members This produces an effect that it can be used for imprinting.

More specifically, since the imprint mold according to the present invention is reinforced with fibers, it can be manufactured with a thin film and can be manufactured with a thin film even in a large area size such as a display screen. For example, it can be wound up like paper and film.
Also, in the mold release process after imprinting, even if the transfer target is poor in flexibility, the mold has flexibility, so that it is easy to release and the occurrence of physical damage can be reduced. it can.

  Furthermore, since the mold for imprint according to the present invention is integrated so that the cured resin and the fibrous structure cannot be physically separated, the cured resin is not detached from the fibrous structure, Excellent releasability from transfer target. In addition, since the physical bonding is performed by the structure, the selection range of the resin to be used is large.

  In addition, the imprint mold according to the present invention does not use a quartz substrate or a silicon substrate, which is an expensive semiconductor member, as a molding material, and the production method also uses the optical imprint technology for mass production. Therefore, it can be manufactured at low cost and is economically advantageous.

Furthermore, if a resin having a glass transition temperature in the cured state of the cured resin of 140 ° C. or higher is used, a substance useful as a material for an optical member, in particular, a cyclic olefin copolymer is imprinted as a transfer target. You can also And since a thing with small surface energy can be used for a cyclic olefin copolymer, the more excellent effect can be exhibited in the mold release property with the said hardened resin.
In addition, an ultraviolet curable resin can be used as the cured resin. In this case, a high-temperature heating or the like is not required for curing, and the crosslinking reaction is caused by irradiating ultraviolet rays even near room temperature. It can be made to cure the resin.

It is a schematic sectional drawing which shows an example of a structure of the mold for imprint which concerns on this invention. It is a typical schematic diagram showing a manufacturing method of an imprint mold concerning the present invention. It is a schematic sectional drawing which shows the interface state with the mold original plate in the manufacturing process of the mold for imprinting concerning this invention.

  Embodiments of the present invention will be described below with reference to the drawings.

(Imprint mold)
For example, as shown in FIG. 1, the imprint mold according to the present invention includes a fibrous structure 2 and a cured resin 3, and at least a gap in the fibrous structure 2 in a region where the transfer pattern 10 exists. Is filled with the cured resin 3, and a three-dimensional transfer pattern 10 made of the cured resin 3 is formed on the surface of the fibrous structure 2.

  The imprint mold according to the present invention is such that the voids of the fibrous structure 2 are filled with the cured resin 3, and the cured resin 3 and the fibrous structure 2 are physically integrated. It has become. Therefore, only the cured resin 3 can cope with an increase in mold area, which has been difficult from the viewpoint of strength, and can also be made thin, so that it can have flexibility. For example, if paper that is currently industrially used is used for the fibrous structure 2, an imprint mold having an area and film thickness that is industrially realized with the paper can be manufactured.

  In addition, in an imprint mold having a structure in which a transfer pattern layer made of a cured resin is laminated on a substrate made of a resin film or the like, due to insufficient adhesion between the substrate and the cured resin, the imprint mold can be Although there may be a problem that the cured resin layer is detached from the substrate while repeating imprinting, in the imprint mold according to the present invention, the fibrous structure 2 and the cured resin 3 and However, since they are integrated so that they cannot be physically separated, there is no concern that the cured resin 3 is detached from the fibrous structure 2 even if imprinting is repeated.

  In addition, the imprint mold according to the present invention is basically composed of a fibrous structure 2 and a cured resin 3, and compared with a mold using a quartz substrate or a silicon substrate, which is an expensive semiconductor member, as a material. It's cheap. And since the mold for imprinting according to the present invention can be manufactured in large numbers from the mold original plate using the in-mold technique, the manufacturing cost can be suppressed lower than the case of manufacturing using the semiconductor lithography technique, which is economically advantageous. Become.

Further, if a resin having a cured glass transition temperature higher than the glass transition temperature of the cyclic olefin copolymer is used as the cured resin 3, the cyclic olefin copolymer useful as a material for the optical member is heated. Imprinting is also possible.
Further, the cyclic olefin copolymer may be one having a small surface energy, and can exhibit more excellent effects in releasability from the cured resin 3.

  Next, each material which comprises the imprint mold which concerns on this invention, a manufacturing method, etc. are demonstrated.

(Fibrous structure)
The fibrous structure 2 constituting the imprint mold according to the present invention is, for example, a paper or cloth made of plant-derived fibers such as wood pulp or cotton, or animal-derived fibers such as raw silk or wool. It can be used as long as it has flexibility and can handle a large area such as a display screen, and various other film-like structures made of carbon fiber or glass fiber can be used. .

  However, in order to perform thermal imprinting using the mold for imprinting according to the present invention, this fibrous structure is melted or sublimated below the glass transition temperature of the thermoplastic resin to be transferred. Must not be. Further, it should not be dissolved by the ultraviolet curable resin according to the present invention.

  As the fibrous structure 2, for example, dust-free paper used in a clean room such as a semiconductor manufacturing factory can be used. Plant-derived fibers are preferable because the fibers themselves are porous and rich in liquid absorbency, and are physically integrated with the ultraviolet curable resin by immersing the ultraviolet curable resin and curing it by ultraviolet irradiation. be able to. The thickness of the fibrous structure 2 is about 10 to 300 μm.

(Cured resin)
Next, the cured resin 3 constituting the imprint mold according to the present invention will be described. The cured resin in the present invention has fluidity in a state before curing, and can be included in the fibrous structure by a treatment such as dripping or dipping, but in the state after curing, a curing process is performed by a crosslinking reaction. A curable resin having a function of retaining the shape molded in, for example, a resin cured by heating, a resin cured by irradiation of electromagnetic waves such as ultraviolet rays, a charged particle beam such as an electron beam A resin cured by irradiation can be used. Among these, a resin cured by ultraviolet rays is preferable as the cured resin in the present invention because it does not require high temperature overheating or vacuum.
Ultraviolet (Ultra Violet) is an electromagnetic wave having a wavelength of 10 to 400 nm, and a resin cured by ultraviolet is a synthetic resin cured by causing a crosslinking reaction when irradiated with ultraviolet, and for optical nanoimprinting. As such, various commonly known ultraviolet curable resins can be used. Further, the ultraviolet curable resin may be a mixture composed of a plurality of different types of resins.

  For example, acrylate resins such as urethane (meth) acrylate, epoxy (meth) acrylate, polyester (meth) acrylate, and combinations thereof can be used. In addition, if necessary, a mixture to which a mold release agent, a softening agent and the like are added can also be used.

However, when thermal imprinting is performed using the imprint mold according to the present invention, the cured resin needs to have a glass transition temperature higher than the glass transition temperature of the thermoplastic resin to be transferred. is there.
For example, in the case of using a ZEONOR (registered trademark) film ZF14 (manufactured by Nippon Zeon Co., Ltd., glass transition temperature 136 ° C.), which is a cyclic olefin copolymer, as the thermoplastic resin to be transferred, The glass transition temperature needs to be 140 ° C. or higher.
More preferably, the glass transition temperature after curing of the cured resin is higher by 10 ° C. or more than the glass transition temperature of the thermoplastic resin to be transferred, in terms of controllability and stability of the thermal imprint process. Therefore, it is preferable.

  In general, a resin cured by causing a crosslinking reaction has a glass transition temperature higher than that of a normal thermoplastic resin.

(Method for producing imprint mold)
Next, a method for producing the imprint mold according to the present invention will be described.
In the present invention, first, a mold original plate is manufactured, and an imprint mold according to the present invention is manufactured by an imprint technique using the mold original plate.

First, a method for producing a mold master for forming a transfer pattern on an imprint mold according to the present invention will be described.
As the mold master, various types of molds generally known as optical nanoimprint molds can be used. For example, a mold made of an inorganic material such as quartz or a metal oxide, or a mold made of an organic material such as an ultraviolet transmissive resin can be used. Can be used.

In the case where high accuracy is required for the transfer shape, it is preferable as the mold original plate that a quartz substrate is used as a material and a transfer pattern is formed by a semiconductor lithography technique.
The transfer pattern formed on the mold original plate has a sex relationship with the imprint mold according to the present invention, and is an inverted pattern. A three-dimensional pattern of several tens of nm level can be formed by beam processing and etching processing using an electron beam or the like in the lithography technology for semiconductors.

Next, a method for producing an imprint mold according to the present invention by optical imprinting using the mold original plate will be described.
For the imprint, a technique generally known as optical nanoimprint can be used. For example, as shown in FIG. 2, a mold is formed on the fibrous structure 2 containing the ultraviolet curable resin according to the present invention. The imprint mold 1 according to the present invention can be manufactured by pressing the original 4 to irradiate the ultraviolet rays 6 and then releasing the mold original 4.

More specifically, by pressing the mold original plate 4 against the fibrous structure 2, the fibrous structure 2 is compressed in the pressing direction, and the pre-curing ultraviolet curable resin contained in the fibrous structure 2 is a fiber. It acts to ooze out on the surface of the structure 2 and fill the interface with the mold original plate 4. Then, the ultraviolet curable resin is cured by causing a crosslinking reaction by the ultraviolet irradiation, and a three-dimensional transfer pattern 10 made of the cured ultraviolet curable resin 3 is formed on the surface of the fibrous structure 2.
In the present invention, ultraviolet rays may be irradiated from the back side of the fibrous structure 2 for the purpose of completely curing the ultraviolet curable resin contained in the fibrous structure 2.

  Here, the thickness (diameter) of the fibers constituting the fibrous structure 2 is usually larger than the nano level. For example, the surface of the dust-free paper has a roughness (surface roughness) of about several tens of μm. Nevertheless, the reason why a transfer pattern having a nano-level three-dimensional shape can be formed is that the nano-level transfer pattern is formed only by the ultraviolet curable resin 3 as shown in FIG.

  That is, even if the surface of the fibrous structure 2 does not have nano-level flatness, an ultraviolet curable resin is included, and at least in the region where the transfer pattern exists, the fibrous structure. If the gap of 2 is filled with the ultraviolet curable resin, the fibrous structure 2 is compressed in the pressing direction by being pressed against the mold original plate 4 having nano-level surface flatness, At this stage, the uncured ultraviolet curable resin oozes out to fill the interface with the mold original plate.

  Then, by UV irradiation, the UV curable resin undergoes a crosslinking reaction and is cured, and the UV curable resin at the interface described above accurately forms all the shapes of the mold original surface including the nano-level transfer pattern. The transfer pattern 10 is hardened in the following state, and the transfer pattern 10 having a male-female relationship with the pattern of the mold original plate 4 is faithfully formed.

  In addition, since the ultraviolet curable resin inside the fibrous structure 2 is cured by causing a cross-linking reaction by irradiation with ultraviolet rays, the fibrous structure 2 is integrated with the fibrous structure 2 so that it cannot be physically separated. Thereafter, when the hybridized imprint mold according to the present invention is released from the mold master 4, the resin cured by the ultraviolet rays is not detached from the fibrous structure, and can be easily removed from the mold master 4. Can be released.

  In the present invention, as shown in FIG. 2, the fibrous structure is used to prevent the device and the like from being contaminated by the ultraviolet curable resin that has oozed out from the back surface of the fibrous structure 2 due to the pressing of the mold original plate 4. It is preferable to provide a release support 5 on the back surface of the body 2 in advance. The release support 5 is provided on the back surface of the fibrous structure 2 before including the ultraviolet curable resin in the fibrous structure 2, and is peeled from the imprint mold 1 after the transfer pattern 10 is formed. The

The mold release support 5 is made of a material that is not dissolved by the ultraviolet curable resin, is not affected by the solvent contained in the uncured ultraviolet curable resin, and is a fiber that is integrated with the cured ultraviolet curable resin. Any material that can be peeled off from the structure 2 may be used. For example, polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, ethylene glycol-terephthalic acid-isophthalic acid copolymer, ethylene glycol-1,4 hexamethylene dimethanol-terephthalic acid copolymer Polymer, polyester resin such as polyester thermoplastic elastomer, polyethylene, polypropylene, polybutene, polymethylpentene, ethylene-propylene-butene copolymer, polyolefin resin such as olefin thermoplastic elastomer, nylon 6, nylon 66, etc. Polyamide resins, polyvinyl chloride and the like can be used.
The thickness of the release support 5 is not particularly limited, but is preferably about 5 to 200 μm from the viewpoint of reliability that there is no film defect and workability such as lamination and peeling.

Heretofore, the case where the transfer pattern of the mold original plate 4 is mainly applied has been described so far. However, in the present invention, the transfer pattern of the mold original plate 4 is applied to the fibrous structure 2 in a large number of directions. An imprint mold according to the present invention with an area can also be produced.
In this case, for example, it is possible to use a method of repeating imprinting in an area having a size corresponding to the transfer area of the mold original plate, then moving to the next area, and then imprinting there again.

  The imprint mold according to the present invention can also be manufactured using an imprint technique using a resin mold manufactured from the quartz mold original using the imprint technique as an original. In this case, a process for producing a resin mold master is required. However, when a resin mold master is produced from a quartz mold master, a large-area resin product is prepared by applying multiple faces as described above. If the mold master is manufactured, then, when the imprint mold according to the present invention is manufactured, a transfer pattern with a large area can be formed by batch transfer without requiring multiple imposition. When a large number of imprint molds according to the present invention are replicated, mass production can be performed in a short time, which is beneficial, compared with the case of directly manufacturing from a quartz mold master. In addition, if the mold master is made of resin, the imprint mold according to the present invention can be manufactured by a roll-to-roll method used in the printing industry or the like.

(Thermal imprint method using the imprint mold according to the present invention)
Next, a method for performing thermal imprinting on a thermoplastic resin using the imprint mold according to the present invention will be described.
In the present invention, it is not particularly limited, and various known thermal imprinting methods can be used. For example, the imprint mold according to the present invention and the thermoplastic resin to be transferred are in close contact with each other in a vacuum state, and the ultraviolet ray of the imprint mold according to the present invention is equal to or higher than the glass transition temperature of the thermoplastic resin. The imprint mold according to the present invention is pressed against the thermoplastic resin while being heated below the glass transition temperature after curing of the curable resin, and the imprint mold according to the present invention is separated from the thermoplastic resin after cooling. By molding, a fine three-dimensional shape having a male-female relationship with the transfer pattern of the imprint mold according to the present invention can be transferred and formed on the surface of the thermoplastic resin.

  When a cyclic olefin copolymer is used for the thermoplastic resin, a material having a glass transition temperature of 130 ° C. to 170 ° C. can be used, and therefore the heating temperature is preferably 140 ° C. to 190 ° C. The pressing pressure depends on the viscosity of the thermoplastic resin, but is preferably 20 to 80 bar from the viewpoint of the apparatus configuration and subsequent mold release.

  Further, when a cyclic olefin copolymer is used for the thermoplastic resin, a material having a small surface energy advantageous for mold release, for example, a material of less than 40 mN / m can be used. Due to the synergistic effect of the flexibility of the mold for imprinting, the imprint mold and the thermoplastic resin according to the present invention can be easily released after imprinting.

  In general, an imprint mold is expensive, such as a quartz mold, and takes time to manufacture. Therefore, the same mold is repeatedly used in an industrial imprint process. However, by repeating imprinting, there is a problem that defects are easily generated in the mold, particularly in the mold release process, and all transferred objects using the mold in which defects are generated become defective products.

  On the other hand, since the imprint mold according to the present invention can be produced in large quantities with inexpensive materials compared to a quartz mold or the like, it is expected to be economically compatible even if discarded after one to several uses. The Further, when disposed at a time, the imprint mold according to the present invention may be chemically extinguished, for example, dissolved in a solution without being physically released from the transfer target. Is possible. If the use is as described above, it is difficult for defects to occur in the transfer object, and an effect that a large amount can be stably produced can be obtained.

  EXAMPLES Next, although an Example is given and this invention is demonstrated more concretely, this invention is not limited by these Examples.

(1) Mold Master First, a mold master for forming a transfer pattern on the imprint mold according to the present invention was manufactured. A quartz substrate used for a photomask was used as a material for the mold original plate, and a transfer pattern was formed by a lithography technique for semiconductors.
Specifically, a novolac resin-based electron beam resist (ZEP-520, manufactured by Nippon Zeon Co., Ltd.) having a thickness of 100 nm is formed on the surface of a quartz substrate having an outer shape of 6 inches long, 6 inches wide, and 0.25 inches thick. It was applied as described above, drawn with an electron beam, and then developed to form a line-and-space resist pattern having a width of 100 nm, a depth of 100 nm, and a pitch of 400 nm.
Next, the quartz substrate is dry-etched using carbon tetrafluoride (CF ₄ ) as an etching gas, and then the unnecessary electron beam resist is removed by ashing with oxygen gas to obtain a width of 100 nm, a depth of 500 nm, A mold master having a three-dimensional line and space pattern with a pitch of 400 nm was obtained.

(2) Ultraviolet curable resin Next, as shown in Table 1, urethane acrylate (manufactured by Nippon Synthetic Chemical Industry Co., Ltd., GOSELAC (registered trademark)) as an ultraviolet curable resin constituting the imprint mold according to the present invention. UV-7500B) 35 parts by weight, 1,6-hexanediol diacrylate (Nippon Kayaku Co., Ltd.) 35 parts by weight, pentaerythritol triacrylate (Toa Gosei Co., Ltd.) 10 parts by weight, vinylpyrrolidone (Toa Gosei Co., Ltd.) 15 parts by weight, 1-hydroxycyclohexyl phenyl ketone (Ciba Specialty Chemicals Co., Ltd., Irgacure (registered trademark) 184) 2 parts by weight, benzophenone (Nippon Kayaku Co., Ltd.) 2 parts by weight, poly 1 weight of ether-modified silicone (GE Toshiba Silicone Co., Ltd., TSF4440) A composition consisting of parts was prepared.

(3) Preparation of imprint mold Next, as a fibrous structure constituting the imprint mold according to the present invention, dust-free paper for clean rooms (manufactured by Oji Specialty Paper Co., Ltd., OK Clean RN) was used, and polyethylene terephthalate The clean room dust-free paper was placed on a resin film, the ultraviolet curable resin was dropped, and the ultraviolet curable resin was immersed in the fibrous structure by being left for 5 minutes.
Next, using the mold original plate, pressing was performed at a pressure of 500 kN / m ² , and ultraviolet imprinting with a wavelength of 365 nm was applied under the condition of an exposure amount of 100 mJ / cm ² to perform photoimprinting.
Thereafter, the mold master is released, and then the surface opposite to the transfer surface is irradiated with ultraviolet light having a wavelength of 365 nm under the condition of an exposure amount of ² J / cm ² to completely cure the ultraviolet curable resin. The polyethylene terephthalate resin film was peeled off to obtain an imprint mold according to the present invention.
In the obtained imprint mold according to the present invention, the ultraviolet curable resin is cured by a crosslinking reaction and integrated with clean room dust-free paper, and the mold original plate is formed on the surface of the cured ultraviolet curable resin. A three-dimensional pattern having a male and female relationship with the line and space pattern was transferred and formed.

(4) Thermal imprint onto the transfer object Using the imprint mold according to the present invention obtained as described above, a ZEONOR (registered trademark) film ZF14 (a cyclic olefin copolymer) is used as the transfer object. Using a glass transition temperature of 136 ° C. manufactured by Nippon Zeon Co., Ltd., pressing was performed at a temperature of 150 ° C. and a pressure of 50 bar for 3 minutes to perform thermal imprinting.
Then, when it cooled to room temperature and the mold for imprints was released, the pattern of the three-dimensional shape used as the male and female relationship with the pattern of the imprint mold was transcription-molded on the surface of the ZF14 film.

DESCRIPTION OF SYMBOLS 1 Imprint mold 2 Fibrous structure 3 Hardened resin 4 Mold original plate 5 Release support body 6 Ultraviolet ray 10 Transfer pattern

Claims (6)

It consists of a fibrous structure and a cured resin,
At least in the area where the transfer pattern exists,
The voids of the fibrous structure are filled with the cured resin,
3. A mold for imprinting, wherein a three-dimensional transfer pattern made of the cured resin is formed on a surface of the fibrous structure.   2. The imprint mold according to claim 1, wherein the fibrous structure is a structure composed of one or more of plant fiber, animal fiber, carbon fiber, and glass fiber.   The mold for imprinting according to any one of claims 1 to 2, wherein a glass transition temperature of the cured resin is 140 ° C or higher.   The imprint mold according to claim 1, wherein the cured resin is a resin cured by ultraviolet rays. Including the UV curable resin in the fibrous structure provided on the release support,
At least the voids of the fibrous structure in the region where the transfer pattern is formed,
After filling with the UV curable resin,
Adhering to the fibrous structure, a mold original plate made of a material that transmits ultraviolet rays,
Press with a predetermined pressure and irradiate a predetermined amount of ultraviolet rays,
On the surface of the fibrous structure,
A method for producing an imprint mold, wherein a three-dimensional transfer pattern is formed. 6. The method for manufacturing an imprint mold according to claim 5, wherein the fibrous structure is irradiated with ultraviolet rays from both front and back sides.

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