JP2010238782A - Substrate processing apparatus and substrate processing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing method, which can shorten the time required for etching process by suppressing the deterioration of an etching rate during etching processing. <P>SOLUTION: After the start of a hydrofluoric-nitric acid processing, a motor 20 for lifting a base is controlled and a suction base 10 is lifted according to a lapse of the processing time. The suction base 10 is lifted so that the interval between the upper surface of a wafer W and a ring upper surface 28 is kept in a constant range. Although the wafer W becomes thin as a result of hydrofluoric-nitric acid processing, since the suction base 10 is lifted, the thickness of the liquid film of hydrofluoric-nitric acid formed on the upper surface of the wafer W can be kept to be almost constant. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a substrate processing apparatus and a substrate processing method for performing an etching process using an etchant on an upper surface of a substrate. Examples of substrates to be etched include semiconductor wafers, glass substrates for liquid crystal display devices, plasma display substrates, FED (Field Emission Display) substrates, optical disk substrates, magnetic disk substrates, and magneto-optical disk substrates. And substrates such as photomask substrates.

  In a semiconductor device manufacturing process, a liquid processing using a processing liquid is performed on a semiconductor wafer (hereinafter simply referred to as a “wafer”). One of such liquid processes is an etching process performed by supplying an etching liquid to the main surface of the wafer. In this etching process, in addition to an etching process for forming a pattern on the main surface of the wafer (the wafer itself or a thin film formed on the wafer), foreign substances on the main surface of the wafer are removed using an etching action. A cleaning process is included.

  There are two types of substrate processing apparatuses for processing a main surface of a wafer with a processing solution: a batch type for processing a plurality of wafers at once, and a single wafer type for processing wafers one by one. There is a thing. A single-wafer type substrate processing apparatus supplies, for example, a substrate holding member that rotates a wafer around a vertical axis while holding the wafer in a substantially horizontal position, and a processing liquid toward the main surface of the wafer held by the substrate holding member. And a nozzle moving mechanism for moving the processing liquid nozzle on the wafer.

  In the etching process, the wafer is held by the substrate holding member with the surface to be subjected to the etching process facing upward. Then, the etching liquid is discharged from the processing liquid nozzle onto the upper surface of the wafer held by the substrate holding member, and the processing liquid nozzle is moved by the nozzle moving mechanism. With the movement of the processing liquid nozzle, the position of the etchant landing on the upper surface of the wafer moves. Further, the wafer held on the substrate holding means is rotated. Thereby, the etching solution can be spread over the entire upper surface of the wafer.

JP 2007-88381 A

In the etching process on the wafer, it is desirable that an etchant liquid film having a uniform thickness is formed on the upper surface of the wafer. Further, it is desirable that the liquid film of the etching liquid has a predetermined thickness.
For this reason, the inventor of the present application is considering to provide an annular restricting member on the side of the spin chuck, and hold the liquid film of the etching solution on the upper surface of the wafer by the restricting member. Specifically, the regulating member is formed in an annular shape surrounding the side of the wafer, and a cylindrical regulating surface facing the circumferential end surface of the wafer is formed on the inner circumferential surface thereof. The height of the upper end of the regulation surface is set slightly higher than the upper surface of the wafer. For this reason, the etching liquid supplied to the upper surface of the wafer is restricted on the outflow of the etching liquid from the upper surface of the wafer by the restriction surface, and remains on the upper surface of the wafer. Thereby, the liquid film of the etching solution is held on the upper surface of the wafer. The thickness of the etchant film is defined by the distance between the height of the upper end of the regulating surface and the upper surface of the wafer.

  However, the thickness of the wafer changes with the progress of etching, and the upper surface of the wafer is lowered. When the upper surface of the wafer is lowered, the distance between the upper surface of the wafer and the upper end of the regulation surface is increased, and the liquid film of the etching solution formed on the upper surface of the wafer is thickened (in other words, the regulation surface The depth of the liquid reservoir stored in the recess formed by the inner wall surface and the upper surface of the wafer is increased). As the etchant film becomes thicker, the wafer is deprived of heat from the etchant film and, as a result, the temperature of the etchant in contact with the upper surface of the wafer also decreases. ") Will decrease. That is, as the etching process proceeds, the etching rate decreases. For this reason, the time required for the etching process becomes long, and the throughput may be reduced.

  Accordingly, an object of the present invention is to provide a substrate processing apparatus and a substrate processing method capable of reducing the time required for the etching process by suppressing a decrease in the etching rate during the etching process.

  In order to achieve the above object, the invention according to claim 1 includes a substrate holding member (10; 205; 309) for supporting the lower surface of the substrate (W) to hold the substrate in a horizontal position, and the substrate holding member. An etching solution supply means (4) for supplying an etching solution to the upper surface of the held substrate, and the peripheral end surface of the substrate held by the substrate holding member are opposed to restrict the outflow of the etching solution from the upper surface of the substrate. A regulating member (6; 201; 311) having a cylindrical regulating surface (27; 221; 317), and a lifting mechanism for moving up and down relative to the lower surface of the substrate held by the substrate holding member and the regulating member. (20; 230; 322), and an elevating control means (61; 261; 361) for controlling the elevating mechanism so that the substrate holding member rises relative to the upper end of the regulating surface of the regulating member. Including It is (300, 400 1; 200) processor.

In addition, the alphanumeric characters in parentheses represent corresponding components in the embodiments described later. The same applies hereinafter.
According to this invention, the liquid film of the etching solution is formed on the upper surface of the substrate. The thickness of the liquid film is defined by the distance between the upper end of the regulating surface and the upper surface of the substrate. Further, the substrate holding member is raised relative to the upper end of the regulating surface.

  Therefore, even if the thickness of the substrate decreases with the progress of etching, the distance between the upper surface of the substrate held by the substrate holding member and the upper end of the regulating surface can be kept small. Therefore, since the temperature drop of the etching solution can be suppressed by keeping the thickness (depth of the liquid reservoir) of the etching solution formed on the upper surface of the substrate small, it is possible to suppress the reduction of the etching rate. As a result, the time required for the etching process can be shortened, and the throughput can be improved.

According to a second aspect of the present invention, the lift control means is configured to move toward the upper end of the regulating surface of the regulating member as the etching progresses from the upper surface of the substrate held by the substrate holding member. The elevating mechanism may be controlled so that the substrate holding member is relatively raised.
In this case, the substrate holding member is raised relative to the upper end of the regulating surface as the etching progresses. Therefore, even if the thickness of the substrate decreases with the progress of etching, the distance between the upper surface of the substrate held by the substrate holding member and the upper end of the regulating surface is within a certain range regardless of the progress of etching. Can keep. Thereby, the process using the liquid film of the etchant having a substantially constant thickness can be performed on the upper surface of the substrate throughout the entire period of the process. As a result, variation in the etching rate can be suppressed, so that the etching amount can be accurately controlled. A third aspect of the present invention is the substrate processing apparatus according to the first or second aspect, wherein the elevating mechanism includes a substrate holding member elevating mechanism (20) for elevating the substrate holding member.

According to this invention, the substrate holding member is moved up and down by the substrate holding member lifting mechanism. For this reason, the distance between the upper surface of the substrate and the upper end of the regulating surface can be kept small by raising the substrate holding member as the etching proceeds. Thereby, the thickness of the liquid film of the etching solution formed on the upper surface of the substrate can be kept small.
A fourth aspect of the present invention is the substrate processing apparatus according to any one of the first to third aspects, wherein the elevating mechanism includes a regulating member elevating mechanism (230) that elevates and lowers the regulating member.

According to this invention, the regulating member is raised and lowered by the regulating member lifting mechanism. For this reason, the space | interval between the upper surface of a board | substrate and the upper end of a control surface can be kept small by dropping a control member with progress of etching. Thereby, the thickness of the liquid film of the etching solution formed on the upper surface of the substrate can be kept small.
According to a fifth aspect of the invention, the substrate holding member includes a base (303), a shrinkable support member (325) provided on the base and supporting the lower surface of the substrate, the base and the lower surface of the substrate, The decompression means (320, 323) for decompressing the space between the two, and the elevating mechanism includes a decompression adjustment means (322) for adjusting the amount of decompression by the decompression means. The substrate processing apparatus according to the item.

According to this invention, the support member that supports the lower surface of the substrate can be shrunk. For this reason, when the amount of decompression in the space between the base and the substrate changes, the amount of contraction of the support member changes, and the distance between the substrate and the base changes. Accordingly, the space between the upper surface of the substrate and the base is adjusted by adjusting the amount of pressure reduction in the space between the substrate and the base.
As the etching progresses, the amount of reduced pressure in the space between the base and the substrate is reduced (the pressure is increased), so that the distance between the upper surface of the substrate and the upper end of the regulating surface can be kept small. . Thereby, the thickness of the liquid film of the etching solution formed on the upper surface of the substrate can be kept small.

According to a sixth aspect of the present invention, the apparatus further includes a liquid film thickness detecting means (401) for measuring the thickness of the liquid film of the etching liquid formed on the upper surface of the substrate, wherein the elevation control means includes The elevating mechanism may be controlled based on the thickness of the etchant liquid film detected by the film thickness detecting means.
According to this invention, the thickness of the liquid film of the etching liquid formed on the upper surface of the substrate is detected by the liquid film thickness detecting means. Based on the thickness of the liquid film, the distance between the upper surface of the substrate and the upper end of the regulating surface is adjusted. Thereby, the thickness of the liquid film of the etching solution formed on the upper surface of the substrate can be controlled more accurately.

  When the present invention is combined with the invention according to claim 3 or 5, the liquid film thickness detecting means detects the height of the upper surface of the substrate for detecting the height of the upper surface of the substrate held by the substrate holding member. Means (401) may be included. If the height of the upper end of the regulating member hardly changes, the liquid film of the etching solution formed on the upper surface of the substrate can be detected by detecting the height of the upper surface of the substrate.

According to a seventh aspect of the present invention, the substrate held by the substrate holding member includes a silicon substrate (W), and the etching solution supply means supplies a hydrofluoric acid nitric acid mixture supply device ( It is a substrate processing apparatus as described in any one of Claims 1-6 containing 4).
By supplying the hydrofluoric acid nitric acid mixed solution to the upper surface of the silicon substrate, the silicon material in the surface layer portion on the upper surface is removed by etching. For this reason, the upper surface of the substrate is lowered as the etching progresses. When the upper surface of the substrate is lowered, the distance between the upper surface of the substrate and the upper end of the regulating surface is increased, and the liquid film of the hydrofluoric acid nitric acid mixture formed on the upper surface of the substrate may be thickened.

  The etching reaction between the silicon substrate and the hydrofluoric acid / nitric acid mixture is an exothermic reaction, and the upper surface of the silicon substrate becomes hot. On the other hand, if the liquid film of the hydrofluoric acid-nitric acid mixture formed on the upper surface of the silicon substrate is thick, the wafer may be deprived of heat from the liquid film, and the upper surface temperature of the silicon substrate may decrease, leading to a decrease in etching rate. is there. For this reason, the time required for the etching process becomes long, and the throughput may be reduced.

  On the other hand, according to the invention of claim 7, an etching solution liquid film is formed on the upper surface of the substrate. The thickness of the liquid film is defined by the distance between the upper end of the regulating surface and the upper surface of the substrate. As the etching progresses, the substrate holding member is raised relative to the upper end of the regulating surface. Therefore, the distance between the upper surface of the substrate held by the substrate holding member and the upper end of the regulating surface can be kept small. For this reason, the thickness of the liquid film of the hydrofluoric acid nitric acid mixture formed on the upper surface of the substrate can be kept small. Thereby, the temperature fall of a hydrofluoric acid nitric acid liquid mixture can be suppressed, and the fall of an etching rate can be suppressed.

  According to the eighth aspect of the present invention, the step of holding the substrate by the substrate holding member (10; 205; 309) that supports the lower surface of the substrate (W), and the tubular shape for regulating the outflow of the liquid from the upper surface of the substrate Disposing a regulating member (6; 201; 311) having a regulating surface (27; 221; 317) such that the regulating surface faces a peripheral end surface of the substrate held by the substrate holding member; In parallel with the etching solution supplying step (S2) for supplying an etching solution to the upper surface of the substrate held by the substrate holding member, and the etching solution supplying step, the substrate holding member is relative to the upper end of the regulating surface. And a step of raising the substrate.

  According to the present invention, it is possible to achieve the same effect as the effect described in relation to the invention of claim 1.

It is sectional drawing which shows typically the structure of the substrate processing apparatus which concerns on 1st Embodiment of this invention. It is a top view which shows typically the structure of the substrate processing apparatus shown in FIG. It is a block diagram which shows the electric constitution of the substrate processing apparatus shown in FIG. It is process drawing which shows an example of the process in the substrate processing apparatus shown in FIG. It is a graph which shows the relationship between the processing time of a nitric acid treatment, and the raise amount of an adsorption base. It is sectional drawing for demonstrating the nitric acid nitric acid process included in the process of FIG. It is an illustration sectional view showing the composition of the substrate processing device concerning a 2nd embodiment of the present invention. FIG. 8 is a block diagram showing an electrical configuration of the substrate processing apparatus shown in FIG. 7. FIG. 8 is a cross-sectional view for explaining the nitric acid treatment in the substrate processing apparatus shown in FIG. 7. It is an illustration sectional view showing the composition of the substrate processing device concerning a 3rd embodiment of the present invention. It is a block diagram which shows the electrical structure of the substrate processing apparatus shown in FIG. It is sectional drawing for demonstrating the nitrofluoric acid process in the substrate processing apparatus shown in FIG. It is an illustrative sectional view showing the composition of the substrate processing apparatus concerning a 4th embodiment of the present invention. FIG. 14 is a block diagram showing an electrical configuration of the substrate processing apparatus shown in FIG. 13. It is a flowchart of the upper surface height adjustment process performed at the time of a nitric acid treatment.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a cross-sectional view schematically showing a configuration of a substrate processing apparatus 1 according to one embodiment (first embodiment) of the present invention. FIG. 2 is a plan view schematically showing the configuration of the substrate processing apparatus 1.
The substrate processing apparatus 1 performs an etching process for thinning (thinning) the wafer W on the back surface (upper surface) opposite to the surface on the device forming region side of the circular wafer W made of, for example, a silicon wafer. It is a single-wafer type device. In this embodiment, for example, a hydrofluoric acid nitric acid mixed liquid (hereinafter referred to as “fluoronitric acid”) is used as the etching liquid.

  The substrate processing apparatus 1 supports a lower surface of a wafer W in a processing chamber 2 partitioned by a partition wall (not shown), and holds the wafer W in a horizontal posture while moving around the vertical axis passing through the center of the wafer W. A spin chuck 3 for rotating the wafer W, a slit nozzle (hydrofluoric acid / nitric acid mixed solution supplying means) 4 for supplying hydrofluoric acid to the upper surface of the wafer W held by the spin chuck 3, and the spin chuck 3. A DIW nozzle 5 for supplying DIW (deionized water) toward the upper surface of the wafer W, and a liquid film of the processing liquid on the upper surface of the wafer W held by the spin chuck 3 The outer peripheral ring member (regulating member) 6 is provided.

  The spin chuck 3 is a vacuum suction chuck. The spin chuck 3 includes a spin motor 7 fixedly disposed on a side wall, a spin shaft 8 extending in a vertical direction, to which a rotational driving force of the spin motor 7 is input, coaxial with the spin shaft 8, and A lifting shaft 9 connected so as to be integrally rotatable, and a suction base 10 attached to the upper end of the lifting shaft 9 and serving as a substrate holding member for sucking and holding the lower surface (surface) of the wafer W in a substantially horizontal posture. It has. In this embodiment, the spin shaft 8 is fixed to the spin motor 7. Further, the elevating shaft 9 is provided so as to be able to move up and down relatively with respect to the spin shaft 8. Therefore, the suction base 10 is provided so as to be movable up and down.

In this embodiment, a wafer W integrated with the glass substrate S is used. The wafer W is reinforced by bonding the glass substrate S to the surface (device forming surface) of the wafer W.
The spin shaft 8 is formed in a hollow cylindrical shape, and a flange member 11 is fixed coaxially with the spin shaft 8 at an intermediate portion in the vertical direction. The flange member 11 has a bottom, and a through hole 13 that penetrates the upper and lower surfaces of the bottom wall 12 is formed at the center of the bottom wall 12. The spin shaft 8 is inserted into the through hole 13 with the opening of the flange member 11 facing upward (that is, the cylinder of the flange member 11 extending in the vertical direction).

  The elevating shaft 9 is formed in a cylindrical shape, and a lower end portion thereof is fitted into the flange member 11. A spin shaft 8 is inserted in the lifting shaft 9. A predetermined interval is provided between the inner peripheral surface of the lifting shaft 9 and the outer peripheral surface of the spin shaft 8. The outer peripheral surface of the lifting shaft 9 and the inner peripheral surface of the flange member 11 are allowed to be displaced in the vertical direction relative to the flange member 11 of the lifting shaft 9, but the relative displacement in the rotational direction of the lifting shaft 9 relative to the flange member 11 is Splined to prevent it. Specifically, a spline groove extending in the vertical direction is formed on at least one of the outer peripheral surface of the lifting shaft 9 and the inner peripheral surface of the flange member 11, and the outer peripheral surface of the lifting shaft 9 and the inner periphery of the flange member 11. The surface is splined. Therefore, the lifting shaft 9 rotates integrally with the rotation of the flange member 11, but the lifting shaft 9 can move up and down with respect to the flange member 11.

As the spin shaft 8 rotates, the flange member 11 rotates and the elevating shaft 9 rotates. Accordingly, the spin shaft 8 and the lift shaft 9 can be integrally rotated about the same axis by the rotational drive of the spin motor 7.
A disk-shaped lifting plate 15 that extends horizontally is fitted and fixed to the lifting shaft 9. An inner ring of a bearing 16 is fixed to the lifting plate 15 on the outer periphery thereof. A ball nut 22 of the ball screw mechanism 17 is fixed to the outer ring of the bearing 16. The screw shaft 18 of the ball screw mechanism 17 is disposed along the vertical direction. The screw shaft 18 is fixedly disposed on a peripheral member such as a cover member 33 described later. That is, the lifting shaft 9 is held by the ball screw mechanism 17.

  A gear 19 is fixed to the lower end portion of the screw shaft 18. The gear 19 meshes with a drive gear 21 fixed to the output shaft of a base lifting / lowering motor (substrate holding member lifting / lowering mechanism) 20. With this configuration, the ball nut 22 can be raised and lowered by rotationally driving the base raising / lowering motor 20. Since the elevating shaft 9 is provided so as to be movable up and down with respect to the flange member 11, the elevating shaft 9 fixed to the ball nut 22 via the bearing 16 and the elevating plate 15 is raised and lowered by raising and lowering the ball nut 22. The suction base 10 can be moved up and down. Since the bearing 16 is interposed between the ball nut 22 and the elevating plate 15, the elevating shaft 9 and the suction base 10 which are both in a rotating state can be raised and lowered. In this way, the suction base lifting mechanism 14 that lifts and lowers the suction base 10 is configured by the base lifting motor 20, the ball screw mechanism 17, the bearing 16, and the like.

  The outer peripheral ring member 6 is provided on a substantially disc-shaped bottom wall 25 extending horizontally below the suction base 10 and radially outward of the bottom wall 25 and supported by the suction base 10 and the suction base 10. A cylindrical ring portion 26 surrounding the outer periphery of the wafer W is integrally provided. The outer peripheral ring member 6 is made of a resin material having chemical resistance against nitrous acid, for example, polyvinyl chloride.

  The bottom wall portion 25 has substantially the same diameter as the suction base 10. The ring portion 26 is connected to a vertical cylindrical surface (regulating surface) 27 facing the peripheral end surface of the wafer W held by the suction base 10, and an upper surface of the ring formed of a horizontal annular surface that is continuous with the upper end of the cylindrical surface 27. The upper end of the regulating surface) 28. By setting the positional relationship between the suction base 10 and the outer peripheral ring member 6 so that the height of the ring upper surface 28 is higher than the upper surface of the wafer W held on the suction base 10, the cylindrical surface 27 and the wafer W Nitric acid can be stored in a groove formed by the upper surface. At this time, the cylindrical surface 27 restricts the outflow of nitrous acid from the upper surface of the wafer W. Thereby, a liquid film of fluoric acid is formed on the upper surface of the wafer W. The distance between the ring upper surface 28 and the upper surface of the wafer W defines the thickness of the liquid film of nitrous acid formed on the upper surface of the wafer W (see FIGS. 6A and 6B). .

  The bottom wall portion 25 of the outer peripheral ring member 6 is supported by a plurality of support pins 30 (only two are shown in FIG. 1). The upper end of each support pin 30 is fixed to the lower surface of the bottom wall portion 25. Each support pin 30 is inserted through an insertion hole 31 formed through the elevating plate 15 in the vertical direction, and a lower end thereof is formed on an upper surface of an annular fixing plate 32 fixed to the upper surface of the flange member 11. It is fixed. That is, the outer peripheral ring member 6 is fixedly held by the flange member 11. For this reason, the outer peripheral ring member 6 rotates integrally with the spin shaft 8 as the spin shaft 8 rotates. Further, the outer peripheral ring member 6 does not move up and down depending on the rotational drive of the base lifting motor 20. Thereby, the adsorption base 10 can be moved up and down relatively with respect to the outer ring member 6.

The periphery of the spin shaft 8, the lift shaft 9, the spin motor 7, and the suction base lift mechanism 14 is surrounded by a cover member 33. The cover member 33 includes a cylindrical side wall 34 that surrounds the sides of the spin shaft 8, the lift shaft 9, the spin motor 7, and the suction base lift mechanism 14, and a circle that extends along the lower surface below the outer peripheral ring member 6. And an annular upper wall portion 35.
In addition, the structure which connects the outer periphery ring member 6 and the fixing plate 32 is not restricted to the several support pin 30, For example, a cylindrical support member can also be employ | adopted.

  An opening (not shown) communicating with the inside of the spin shaft 8 is formed in the central portion of the adsorption base 10. A lift pusher 37 for raising and lowering the wafer W is accommodated in the opening and the upper end portion of the spin shaft 8. The lift pusher 37 includes a main body having a substantially cylindrical outer shape, and a cylindrical portion that is provided at an upper end portion of the main body and has a larger diameter than the main body portion. The upper surface of the cylindrical portion has a long flat mounting surface extending in a predetermined direction (a direction orthogonal to the paper surface shown in FIG. 1), and a lower surface that is one step lower than the mounting surface. . The mounting surface is a flat surface and lifts the wafer W in contact with the lower surface of the wafer W (the lower surface of the glass substrate S). A plurality of suction ports are formed on the upper surface of the cylindrical portion.

  The lift pusher 37 is coupled to a lift pusher lifting drive mechanism 38 for lifting the lift pusher 37. By driving the lift pusher lifting / lowering drive mechanism 38, the lift pusher 37 is moved to a retreat position (a position indicated by a solid line in FIG. 1) where the mounting surface is flush with the upper surface of a deformation prevention plate 39 (described later). The mounting surface can be moved up and down between a protruding position (a position indicated by a two-dot chain line in FIG. 1) protruding above the upper surface (ring upper surface 28) of the ring portion 26.

  When a reverse support valve is provided in the lift pusher 38, an air supply means for supplying air (gas) to the lift pusher 37 can be employed as the lift pusher lifting drive mechanism 38. In this case, by supplying air into the lift pusher 37, the inside of the lift pusher 37 is pressurized, and the lift pusher 37 is raised to the protruding position. When the supply of air is stopped, the lift pusher 37 is sucked by a vacuum generator 44 described later, the inside of the lift pusher 37 is decompressed, and the lift pusher 37 is lowered to the retracted position. Further, as the lift pusher lifting mechanism 38, other mechanisms such as a ball screw mechanism and a motor can be used.

A ring-shaped seal member 40 is disposed along the periphery of the bottom wall portion 25 in the peripheral region on the upper surface of the suction base 10. The seal member 40 supports the lower surface of the wafer W. As the sealing member 40, for example, a surface packing type that seals with a surface is adopted, but a lip packing type that seals with a lip portion may be adopted.
On the upper surface of the suction base 10, a deformation preventing plate 39 for preventing the deformation of the wafer W is disposed. The deformation prevention plate 39 is formed in a substantially disk shape, and is disposed in an area above the suction base 10 excluding the peripheral area and the area where the lift pusher 37 is disposed. On the upper surface of the deformation preventing plate 39, a multiple (for example, 15-fold) annular groove 41 (see FIGS. 6A and 6B) centering on the center of the suction base 10 is formed. The upper surface height of the deformation preventing plate 39 is set to be slightly lower than the upper end of the seal member 40 when the wafer W is held.

  As described above, on the lower surface of the cylindrical portion of the lift pusher 37, for example, a plurality of suction ports for sucking between the lower surface of the wafer W and the suction base 10 are opened. Each suction port is connected to the tip of a suction tube 43 (not shown) inserted through the spin shaft 8 through the inside of the lift pusher 37. The proximal end of the suction tube 43 is connected to a vacuum generator 44. A suction valve 45 for opening and closing the suction pipe 43 is interposed in the middle of the suction pipe 43.

When the suction valve 45 is opened while the vacuum generator 44 is driven, the inside of each annular groove 41 of the deformation prevention plate 39 is sucked by the suction port. As a result, the wafer W is sucked and held on the suction base 10. At this time, since the deformation preventing plate 39 is provided, it is possible to prevent deformation of the central portion of the wafer W due to suction.
The slit nozzle 4 includes a main body 50 having a rectangular parallelepiped shape along a predetermined horizontal direction. A slit discharge port 51 that opens linearly along the horizontal direction is formed on the lower surface of the main body 50. The length (length in the longitudinal direction) of the slit discharge port 51 is larger than the diameter of the wafer W. The slit outlet 51 discharges nitric acid in a strip shape along the longitudinal direction of the main body 50.

  A rectangular flexible first sheet 52 is attached in a vertical posture on one side surface (left side shown in FIG. 1) of the main body 50. A rectangular flexible second sheet 53 is attached to the opposite side surface (right side shown in FIG. 1) of the main body 50 in a vertical posture. The sheet width of the first and second sheets 52 and 53 (the length in the normal direction of the wafer W) is such that the edge of the front end abuts against the upper surface of the wafer W supported by the suction base 10. The width is set such that the sheets 52 and 53 are bent.

  The slit nozzle 4 is attached to a nozzle arm 54 that extends substantially horizontally. The nozzle arm 54 is supported by a nozzle arm support shaft 55 extending substantially vertically on the side of the spin chuck 3. A nozzle arm swing drive mechanism 56 is coupled to the nozzle arm support shaft 55, and the nozzle arm support shaft 55 is rotated by the driving force of the nozzle arm swing drive mechanism 56 to swing the nozzle arm 54. It can be moved.

To the slit nozzle 4, a nitric acid supply pipe 57 communicating with the slit discharge port 51 is connected. The nitric acid supply pipe 57 is supplied with nitric acid from a nitric acid supply source, and in the middle of the nitric acid supply pipe 57 is a nitric acid for switching between supply and stop of supply of the nitric acid to the slit nozzle 4. A valve 58 is interposed.
The DIW nozzle 5 is, for example, a straight nozzle that discharges DIW in a continuous flow state, and is disposed above the spin chuck 3 with its discharge port directed toward the center of the wafer W. A DIW supply pipe 59 is connected to the DIW nozzle 5, and DIW from the DIW supply source is supplied through the DIW supply pipe 59. A DIW valve 60 for switching between supply and stop of supply of DIW to the DIW nozzle 5 is interposed in the middle portion of the DIW supply pipe 59.

  By driving the nozzle arm swing drive mechanism 56, the nozzle arm 54 is swung so that the slit nozzle 4 is outside the region above the spin chuck 3 (shown by a solid line in FIG. 2); Between the first scan position P1 and the second scan position P2 (shown by a two-dot chain line in FIG. 2) that is 90 ° apart from the center of rotation of the wafer W and outside the upper region of the spin chuck 3. Reciprocates along the horizontal direction.

  For example, when the slit nozzle 4 moves from the first scan position P 1 toward the second scan position P 2, the first sheet 52 is on the front side in the traveling direction with respect to the nitrous acid landing position on the upper surface of the wafer W. Move while touching the area. Thereby, the deactivated hydrofluoric acid can be scraped off from the upper surface of the wafer W and removed. Further, the second sheet 53 moves while being in contact with a region on the rear side in the advancing direction from the position where the nitrous acid is deposited on the upper surface of the wafer W. Thereby, the nitric acid supplied to the upper surface of the wafer W can be leveled.

  Further, when the slit nozzle 4 returns from the second scan position P2 toward the first scan position P1, the second sheet 53 is located on the front side in the advancing direction with respect to the nitrous acid landing position on the upper surface of the wafer W. Move while touching the area. Thereby, the deactivated hydrofluoric acid can be scraped off from the upper surface of the wafer W and removed. Further, the first sheet 52 moves while being in contact with a region on the rear side in the traveling direction with respect to the position where the nitrous acid is deposited on the upper surface of the wafer W. Thereby, the nitric acid supplied to the upper surface of the wafer W can be leveled.

FIG. 3 is a block diagram showing an electrical configuration of the substrate processing apparatus 1. The substrate processing apparatus 1 includes a control device 61 configured by, for example, a microcomputer. The control device 61 includes a CPU (not shown) and a storage unit (not shown). A timer (not shown) for measuring time is connected to the control device 61.
The control device 61 is controlled by the spin motor 7, the nozzle arm swing drive mechanism 56, the vacuum generator 44, the nitric acid valve 58, the DIW valve 60, the suction valve 45, the base lift motor 20 and the lift pusher lift drive mechanism 38. Connected as a target.

  Further, a substrate thickness measuring device 80 having a known configuration is connected to the control device 61. The substrate thickness measuring device 80 is disposed outside the processing chamber 2 and measures the thickness of the wafer W before being loaded into the processing chamber 2. In the substrate thickness measuring apparatus 80, for example, the thickness of the wafer W is calculated based on the surface heights of the upper and lower surfaces of the wafer W detected by a non-contact laser sensor. An output signal from the substrate thickness measuring device 80 is input to the control device 61.

The control device 61 controls the operation of each part to be controlled so that each process step is executed according to the recipe stored in the memory.
FIG. 4 is a process diagram showing an example of processing in the substrate processing apparatus 1. FIG. 5 is a graph showing the relationship between the treatment time of the nitric acid treatment and the amount of increase of the adsorption base 10. FIG. 6 is a cross-sectional view for explaining the nitric acid treatment included in the treatment of FIG.

Prior to the processing of the wafer W, a glass substrate S as a reinforcing substrate for reinforcing the wafer W is bonded to the surface (device forming surface) of the unprocessed wafer W through an adhesive. The glass substrate S has a disk shape with the same diameter as the wafer W.
The bonding of the wafer W and the glass substrate S is performed manually by an operator, and then the wafer W and the glass substrate S are irradiated with ultraviolet rays, thereby interposing between the wafer W and the glass substrate S. The adhesive to be cured is cured, and the wafer W and the glass substrate S are firmly bonded. The term “substrate” in the claims is intended to include a wafer W and a glass substrate S bonded to the wafer W.

  Prior to the processing of the wafer W, the thickness of the wafer W (total thickness of the wafer W and the glass substrate) is measured by the substrate thickness measuring device 80 disposed outside the processing chamber 2. Then, the wafer W after the measurement of the thickness of the wafer W is loaded into the processing chamber 2. At this time, an output signal from the substrate thickness measuring device 80 is input to the control device 61. The thickness of the wafer W measured at this time is the thickness of the wafer after being integrated with the glass substrate S, but the thickness of only the wafer W may be measured.

Prior to the processing of the wafer W, the slit nozzle 4 is retracted to the retract position on the side of the spin chuck 3. Further, the lift pusher 37 is raised to a protruding position (a position indicated by a two-dot chain line in FIG. 1). Furthermore, both the nitric acid valve 58 and the DIW valve 60 are controlled to be closed.
When processing the wafer W, an unprocessed wafer W is carried into the processing chamber 2 by a transfer robot (not shown). Specifically, the wafer W is placed on the lift pusher 37 at the protruding position. Thereafter, the control device 61 drives the lift pusher lifting drive mechanism 38 to lower the lift pusher 37 to the retracted position. Thereby, the wafer W is delivered to the suction base 10 (step S1).

After the wafer W is delivered to the suction base 10, the controller 61 operates the vacuum generator 44. Thereby, the wafer W can be sucked and held on the suction base 10 (step S2).
In this state, the control device 61 controls the base lifting motor 20 to adjust the height of the suction base 10. Adjustment of the height position of the suction base 10 is performed based on the thickness of the wafer W measured by the substrate thickness measuring device 80. By adjusting the height position of the suction base 10, the interval between the upper surface of the wafer W and the ring upper surface 28 is set to a predetermined interval regardless of individual differences of the wafers W loaded into the processing chamber 2. Can do.

After sucking and holding the wafer W, the controller 61 drives the spin motor 7 to rotate the suction base 10 and the outer ring member 6 at a constant rotation speed at a low rotation speed (for example, 5 rpm). Further, the control device 61 drives the nozzle arm swing driving mechanism 56 to guide the slit nozzle 4 to the upper side of the wafer W.
When the slit nozzle 4 reaches above the wafer W, the control device 61 opens the nitric acid valve 58 and discharges the nitric acid from the slit discharge port 51 in a belt-like profile (S2: nitric acid treatment). Further, the control device 61 drives the nozzle arm swing driving mechanism 56 to cause the slit nozzle 4 to move to a first scan position P1 (shown by a solid line in FIG. 2) outside the upper region of the outer peripheral ring member 6; A reciprocating swing (reciprocating scan) is performed between a second scan position P2 (shown by a two-dot chain line in FIG. 2) outside the region above the spin chuck 3.

In the nitrous acid treatment (step S2), the silicon material on the surface layer of the back surface (upper surface) of the wafer W is removed by etching, so that the upper surface of the wafer W is lowered as the processing proceeds. When the upper surface of the wafer W is lowered, the distance between the upper surface of the wafer W and the upper end of the ring upper surface 28 is increased, and the liquid film of nitrous acid formed on the upper surface of the wafer W may become thick.
After the start of the nitric acid treatment, the control device 61 controls the base elevating motor 20 to raise the adsorption base 10 as the treatment time elapses. The suction base 10 is raised so that the distance between the upper surface of the wafer W and the ring upper surface 28 is kept within a certain range.

  Specifically, the recipe held in the memory of the control device 61 defines the relationship between the treatment time of the nitric acid treatment and the amount of increase in the adsorption base 10 as shown by the solid line in FIG. . In FIG. 5, it is defined that the adsorption base 10 rises stepwise as the processing time elapses. In the graph shown in FIG. 5, for example, the adsorption base 10 is defined to rise by a predetermined amount (for example, 100 μm). The relationship between the elapsed time of processing and the rising amount of the adsorption base 10 is based on experimental values or the like so that the distance between the upper surface of the wafer W and the ring upper surface 28 is always kept within a certain range (700 μm to 800 μm). It is determined.

  The control device 61 raises the suction base 10 based on the time measured by the timer and the recipe stored in the memory. 6A shows a state immediately after the start of the nitric acid treatment, and FIG. 6B shows a state immediately before the end of the nitric acid treatment. As shown in FIGS. 6 (a) and 6 (b), the wafer W becomes thinner as a result of the nitric acid treatment, but the adsorption base 10 is raised, so that the liquid nitric acid formed on the upper surface of the wafer W is removed. The film thickness can be kept substantially constant.

Further, as indicated by a two-dot chain line in FIG. 5, the adsorption base 10 can be intermittently raised as the processing time elapses.
After a predetermined processing time (for example, 30 minutes) has elapsed, the controller 61 closes the nitric acid valve 58 and stops the discharge of the nitric acid from the slit nozzle 4. Further, the control device 61 drives the nozzle arm swing drive mechanism 56 to retract the slit nozzle 4 to the retracted position on the side of the spin chuck 3.

  Next, the control device 61 controls the spin motor 7 to accelerate the rotation speed of the suction base 10 and the outer ring member 6 to a predetermined rinse processing rotation speed (about 100 rpm), and opens the DIW valve 60, DIW is supplied from the DIW nozzle 5 toward the center of rotation of the upper surface of the rotating wafer W. Thereby, the nitric acid on the back surface of the wafer W is washed away, and the wafer W is rinsed (step S3).

After performing this rinsing process for a predetermined time (for example, 60 seconds), the control device 61 closes the DIW valve 60 and ends the rinsing process.
The control device 61 further controls the spin motor 7 to accelerate the rotation speeds of the suction base 10 and the outer ring member 6 to a predetermined drying rotation speed (about 2500 rpm). As a result, the DIW on the upper surface of the wafer W is shaken off by the centrifugal force, and the wafer W is spin-dried (step S4).

After performing the spin dry process for a predetermined time (for example, 30 seconds), the control device 61 controls the spin motor 7 to stop the rotation of the suction base 10 and the outer peripheral ring member 6. Thereafter, the controller 61 stops the driving of the vacuum generator 44, the decompressed state of the space between the wafer W and the suction base 10 is released, and the suction holding of the wafer W is released.
Next, the control device 61 drives the lift pusher lifting drive mechanism 38 to raise the lift pusher 37 to the protruding position. As a result, the processed wafer W is detached upward from the outer peripheral ring member 6.

Thereafter, the processed wafer W is unloaded from the processing chamber 2 by the transfer robot (step S5).
As described above, according to this embodiment, in the nitric acid treatment, the adsorption base 10 is raised as the etching progresses. Therefore, the distance between the upper surface of the wafer W and the ring upper surface 28 can be kept within a certain range regardless of the progress of etching. For this reason, the thickness of the liquid film of nitric acid formed on the upper surface of the wafer W can be kept within a certain range throughout the entire period of the nitric acid treatment. As a result, the wafer W can be processed at a uniform rate throughout the entire period of the nitric acid treatment. As a result, variation in the etching rate can be suppressed, so that the etching amount can be accurately controlled.

Moreover, since the thickness of the liquid film of nitrous acid on the upper surface of the wafer W during the nitrous acid treatment can be kept small, the temperature decrease of the nitrous acid can be suppressed, and the decrease in the etching rate can be suppressed. Thereby, the time required for the nitric acid treatment can be shortened, and the throughput can be improved.
FIG. 7 is a schematic cross-sectional view showing a configuration of a substrate processing apparatus 200 according to another embodiment (second embodiment) of the present invention. In the second embodiment, the same reference numerals as those in FIGS. 1 to 6 are assigned to the portions corresponding to the respective parts shown in the above-described embodiment of FIGS. 1 to 6 (first embodiment). The description is omitted.

The difference between the substrate processing apparatus 200 of the second embodiment and the substrate processing apparatus 1 is that a configuration is adopted in which the outer peripheral ring member (regulating member) 201 can be moved up and down instead of the suction base 205.
The substrate processing apparatus 200 includes a substrate holding mechanism for rotating a wafer W around a vertical axis passing through the center of the wafer W while holding the wafer W in a substantially horizontal posture in a processing chamber 2 partitioned by a partition wall (not shown). 202.

  The substrate holding mechanism 202 includes a spin motor 203, a substantially disk-shaped spin base 204 that is rotated around a predetermined vertical axis C by the spin motor 203, and a substantially disk-shaped spin base that is fixed to the upper edge of the spin motor 203. 204, a disk-like suction base 205 as a substrate holding member fixed to the upper surface of the spin base 204 and sucking and holding the lower surface (surface) of the wafer W in a substantially horizontal posture, and held by the suction base 205 An outer peripheral ring member 201 for forming a liquid film on the upper surface of the wafer W is provided.

  The spin motor 203 includes a bottomed cylindrical rotor 206, for example. The rotor 206 includes a cylindrical side wall portion 207 and a horizontal lower wall portion 208 that connects the lower end portions of the side wall portion 207. The rotor 206 is provided to be rotatable around the vertical axis C. For example, a magnet is attached to the outer peripheral surface of the side wall portion 207, and the rotor 206 is rotated around the vertical axis C by driving a stator (not shown) arranged so as to surround the outer surface of the side wall portion 207. A spin base 204 is fixed to the upper end edge of the rotor 206. For this reason, the spin base 204 is rotated around the vertical axis C with the rotation of the rotor 206.

A cylindrical accommodation space 209 is formed inside the rotor 206. The accommodation space 209 does not rotate integrally with the rotation of the rotor 206 and is in a stationary state.
An annular seal member 210 (not shown in FIG. 7, refer to FIG. 9) is disposed along the periphery of the suction base 205 in the peripheral region on the upper surface of the suction base 205.
A suction nozzle 211 for suction is arranged in the center of the suction base 205. The tip (upper end) of the suction nozzle 211 has a suction port that opens on the upper surface of the suction base 205. A suction tube 212 extends from the suction nozzle 211 downward in the vertical direction. The suction tube 212 is connected to the vacuum generator 214 via a suction valve 213 for opening and closing the suction tube 212.

  A through hole 215 that penetrates the upper and lower surfaces of the spin base 204 is formed at the center of the spin base 204. A substantially cylindrical accommodating recess 216 is formed on the upper surface of the spin base 204. The bottom wall 217 of the housing recess 216 includes a support surface 218 that is a flat surface for supporting the suction base 205, and an annular groove 219 that is continuous with the support surface 218 and extends along the peripheral region of the bottom wall 217. Is formed. The annular groove 219 is formed in a size and a position that can accommodate the outer peripheral ring member 201.

  The outer peripheral ring member 201 has a cylindrical shape surrounding the outer periphery of the wafer W supported by the suction base 205 and the suction base 205, and a vertical cylindrical surface 221 facing the peripheral end surface of the wafer W held by the suction base 205. (Regulating surface) and a ring upper surface (upper end of the regulating surface) 222 that is continuous with the upper end of the cylindrical surface 221 and is formed of a horizontal annular surface. The outer peripheral ring member 201 is formed of a resin material having chemical resistance against nitrous acid, for example, polyvinyl chloride.

  By setting the positional relationship between the suction base 205 and the outer peripheral ring member 201 so that the height of the ring upper surface 222 is higher than the upper surface of the wafer W held on the suction base 205, the cylindrical surface 221 and the wafer W are aligned. Nitric acid can be stored in a groove formed by the upper surface. At this time, the cylindrical surface 221 regulates the outflow of nitrous acid from the upper surface of the wafer W. Thereby, a liquid film of fluoric acid is formed on the upper surface of the wafer W. Then, the thickness between the ring upper surface 222 and the upper surface of the wafer W defines the thickness of the liquid film of nitrous acid formed on the upper surface of the wafer W (see FIGS. 9A and 9B). .

  The substrate processing apparatus 200 is provided with a plurality of (for example, four) ring pins 223 for supporting the outer peripheral ring member 201 and raising and lowering the outer peripheral ring member 201 (in FIG. 7, two ring pins). Only 223 is shown). Each ring pin 223 is inserted through a through-hole 215 formed vertically through the spin base 204 so as to be movable up and down with respect to the spin base 204. The lower end of each ring pin 223 is fixed to the upper end of an annular first elevating ring 224 accommodated in the accommodating space 209.

  The first elevating ring 224 is fitted and fixed to the outer ring of the first bearing 225. A first ball nut 228 of a first ball screw mechanism 226 housed in the housing space 209 is fixed to the inner ring of the first bearing 225. The first screw shaft 227 of the first ball screw mechanism 226 is arranged along the vertical direction. The first screw shaft 227 is fixedly disposed on a peripheral member (not shown) accommodated in the accommodation space 209.

  A first gear 229 is fixed to the lower end portion of the first screw shaft 227. The first gear 229 meshes with a first drive gear 231 fixed to the output shaft of a ring pin lifting / lowering motor (regulating member lifting / lowering mechanism) 230 housed in the housing space 209. With this configuration, the first ball nut 228 can be raised and lowered by rotationally driving the ring pin raising and lowering motor 230, whereby a plurality of ring pins 223 can be raised and lowered collectively. ing.

  The substrate processing apparatus 200 includes a plurality of (for example, four) lift pins 240 for moving up and down between a state in which the wafer W is surrounded by the outer peripheral ring member 201 and a state in which the wafer W is detached upward from the outer peripheral ring member 201. (Only two lift pins 240 are shown in FIG. 7). Each lift pin 240 is inserted into a through hole 250 formed so as to penetrate the suction base 205 and the spin base 204 in the vertical direction, and is provided so as to be movable up and down with respect to the suction base 205 and the spin base 204. Each lift pin 240 passes through the inside of the first elevating ring 224, and its lower end is fixed to the upper end of an annular second elevating ring 241 accommodated in the accommodating space 209.

  The second elevating ring 241 is fitted and fixed to the inner ring of the second bearing 242. A second ball nut 244 of a second ball screw mechanism 243 housed in the housing space 209 is fixed to the outer ring of the second bearing 242. The second screw shaft 245 of the second ball screw mechanism 243 is disposed along the vertical direction. The second screw shaft 245 is fixedly disposed on a peripheral member (not shown) accommodated in the accommodation space 209.

  A second gear 246 is fixed to the lower end portion of the second screw shaft 245. The second gear 246 meshes with a second drive gear 247 fixed to the output shaft of the lift pin lifting / lowering motor 248 housed in the housing space 209. With this configuration, the second ball nut 244 can be moved up and down by rotationally driving the lift pin lifting motor 248, whereby the tips of the plurality of lift pins 240 protrude above the ring upper surface 222. The protruding position (position indicated by a two-dot chain line in FIG. 7) and the tip thereof are collectively raised and lowered between a retreat position (position indicated by a solid line in FIG. 7) where the tip is retracted flush with the upper surface of the suction base 205. Be able to.

FIG. 8 is a block diagram showing an electrical configuration of the substrate processing apparatus 200. The substrate processing apparatus 200 includes a control device 261 configured with a microcomputer, for example. The control device 261 includes a CPU (not shown) and a storage unit (not shown). A timer (not shown) for measuring time is connected to the control device 261.
The control device 261 is controlled by a spin motor 203, a nozzle arm swing drive mechanism 56, a vacuum generator 214, a nitric acid valve 58, a DIW valve 60, a suction valve 213, a ring pin lifting motor 230 and a lift pin lifting motor 248. Connected as a target. Further, an output signal from the substrate thickness measuring device 80 is input to the control device 261.

In the substrate processing apparatus 200, the same processing as that in the substrate processing apparatus 1 (see FIG. 4) is performed on the wafer W.
When processing the wafer W, the unprocessed wafer W bonded to the glass substrate S is carried into the processing chamber 2 by the transfer robot, and the wafer W is placed on the plurality of lift pins 240 at the protruding positions. Thereafter, the control device 261 drives the lift pin lifting / lowering motor 248 to lower the lift pin 240 to the retracted position. As a result, the wafer W is delivered to the suction base 205 (corresponding to step S1 in FIG. 4).

Thereafter, the wafer W is subjected to a nitric acid nitric acid process corresponding to step S2 in FIG. 4, a rinsing process corresponding to step S3, and a spin dry process corresponding to step S4.
FIG. 9 is a cross-sectional view for explaining the nitric acid treatment in the substrate processing apparatus 200.
In such a nitric acid treatment (corresponding to step S2 in FIG. 4), the control device 261 controls the ring pin elevating motor 230 to lower the outer peripheral ring member 201 as the treatment time elapses. The lowering of the outer peripheral ring member 201 can keep the distance between the upper surface of the wafer W and the ring upper surface 222 within a certain range.

  Specifically, the recipe stored in the memory of the control device 261 defines the relationship between the treatment time of the nitric acid treatment and the descending amount of the outer ring member 201. Specifically, it is defined that the outer peripheral ring member 201 is lowered step by step by a predetermined amount (for example, 100 μm). The relationship between the processing time and the descending amount of the outer peripheral ring member 201 is based on experimental values or the like so that the distance between the upper surface of the wafer W and the ring upper surface 222 is always kept within a certain range (700 μm to 800 μm). It is determined.

  The control device 261 lowers the outer ring member 201 based on the time measured by the timer and the recipe stored in the memory. FIG. 9A shows a state immediately after the start of the nitric acid treatment, and FIG. 9B shows a state immediately before the end of the nitric acid treatment. As shown in FIGS. 9A and 9B, the wafer W is thinned as a result of the nitric acid treatment, but a liquid of nitric acid formed on the upper surface of the wafer W is used to lower the outer peripheral ring member 201. The film thickness can be kept substantially constant.

Note that the control device 261 can also control the ring pin lifting motor 230 so that the outer ring member 201 is intermittently lowered as the processing time elapses.
Therefore, the distance between the upper surface of the wafer W and the ring upper surface 222 can be kept within a certain range regardless of the progress of etching. For this reason, the thickness of the liquid film of hydrofluoric acid formed on the upper surface of the wafer W can be kept within a certain range throughout the entire processing period. As a result, the wafer W can be processed at a uniform rate throughout the entire period of the nitric acid treatment. As a result, variation in the etching rate can be suppressed, so that the etching amount can be accurately controlled.

Moreover, since the thickness of the liquid film of nitrous acid on the upper surface of the wafer W during the nitrous acid treatment can be kept small, the temperature decrease of the nitrous acid can be suppressed, and the decrease in the etching rate can be suppressed. Thereby, the time required for the nitric acid treatment can be shortened, and the throughput can be improved.
Prior to the rinsing process (corresponding to step S3 in FIG. 4), the control device 261 drives the lift pin lifting motor 248 to raise the plurality of lift pins 240 to the protruding position. Then, DIW from the DIW nozzle 5 is supplied to the wafer W at a position above the outer peripheral ring member 201, and the wafer W is rinsed. Further, DIW from the DIW nozzle 5 is also supplied onto the suction base 205. Thereby, the nitric acid adhering to the adsorption base 205 or the cylindrical surface 221 of the outer peripheral ring member 201 is washed away.

After the spin dry process, after the rotation of the suction base 205 and the outer peripheral ring member 201 is stopped, the decompressed state of the space between the wafer W and the suction base 205 is released, and the suction holding of the wafer W is released.
Next, the control device 261 drives the lift pin raising / lowering motor 248 to raise the lift pin 240 to the protruding position. As a result, the processed wafer W is detached upward from the outer peripheral ring member 201 and unloaded from the processing chamber 2 by the transfer robot (corresponding to step S5 in FIG. 4).

FIG. 10 is a schematic sectional view showing the configuration of a substrate processing apparatus 300 according to still another embodiment (third embodiment) of the present invention. In this third embodiment, the same reference numerals as those in FIGS. 1 to 6 are assigned to the portions corresponding to the respective parts shown in the above-described embodiment of FIGS. 1 to 6 (first embodiment). The description is omitted.
The substrate processing apparatus 300 has a substrate holding mechanism for rotating a wafer W around a vertical axis passing through the center of the wafer W while holding the wafer W in a substantially horizontal posture in a processing chamber 2 partitioned by a partition wall (not shown). 301 is provided.

The substrate holding mechanism 301 includes a spin motor 302, a substantially disk-shaped spin base (base) 303 that is rotated around a predetermined vertical axis C by the spin motor 302, and a substrate support member 304 that is fixed to the upper surface of the spin base 303. And.
The spin motor 302 includes a bottomed cylindrical rotor 305, for example. The rotor 305 includes a cylindrical side wall portion 306 and a horizontal lower wall portion 307 that connects the lower end portions of the side wall portion 306. The rotor 305 is provided to be rotatable around the vertical axis C. Magnets are attached to the outer peripheral surface of the side wall portion 306, and the rotor 305 is rotated about the vertical axis C by driving a stator (not shown) arranged so as to surround the outer surface of the side wall portion 207. A spin base 303 is fixed to the upper end edge of the rotor 305. For this reason, the spin base 303 is rotated around the vertical axis C as the rotor 305 rotates.

A cylindrical accommodation space 308 is formed inside the rotor 305. The accommodation space 308 does not rotate integrally with the rotation of the rotor 305 and is in a stationary state.
The substrate support member 304 is a substantially disk-shaped bottom wall portion (substrate holding member) 309 that extends horizontally, and an outer periphery of the wafer W that is provided radially outward of the bottom wall portion 309 and supported by the bottom wall portion 309. A cylindrical outer ring part (regulating member) 311 surrounding the outer peripheral ring part 311, a plurality of cylindrical fixing parts 312 which are provided radially outward from the outer ring part 311 and fixed to the spin base 303, and a bottom wall part 309 and a connecting portion 313 for connecting each fixing portion 312 are integrally provided. The fixing portion 312 is fixed to the spin base 303 by a plurality of bolts 314. A through-hole 315 that penetrates the upper and lower surfaces of the spin base 303 is formed at the center of the spin base 303. The wafer W is accommodated and held in a cylindrical accommodation recess 316 defined by the upper surface of the bottom wall portion 309 and the inner peripheral surface of the outer peripheral ring portion 311. The outer peripheral ring portion 311 surrounds the outer peripheral end of the wafer W accommodated in the accommodating recess 316. The substrate support member 304 is formed of a resin material having chemical resistance against nitrous acid, for example, polyvinyl chloride.

The bottom wall portion 309 has substantially the same diameter as the wafer W. The outer peripheral ring portion 311 is continuous with a cylindrical surface (regulating surface) 317 composed of a vertical cylindrical surface facing the peripheral end surface of the wafer W held by the bottom wall portion 309 and an upper end of the cylindrical surface 317, and is a horizontal ring. A ring upper surface (upper end of a regulating surface) 318 made of a surface.
The height of the ring upper surface 318 is set to be higher than the upper surface of the wafer W held by the bottom wall portion 309. As a result, the nitric acid can be stored in the groove portion constituted by the cylindrical surface 317 and the upper surface of the wafer W. At this time, the cylindrical surface 317 restricts the outflow of nitrous acid from the upper surface of the wafer W. Thereby, a liquid film of fluoric acid is formed on the upper surface of the wafer W. The thickness between the ring upper surface 318 and the upper surface of the wafer W defines the thickness of the liquid film of nitrous acid formed on the upper surface of the wafer W (see FIGS. 12A and 12B). .

  A suction nozzle 319 for suction is disposed in the center of the bottom wall portion 309. The tip (upper end) of the suction nozzle 319 has a suction port that opens on the upper surface of the bottom wall 309. From the suction nozzle 319, a suction pipe (decompression unit) 320 extends vertically downward. The suction tube 320 is inserted through the through hole 315 of the spin base 303, and the other end is connected to the vacuum generator (decompression unit) 323. In the middle of the suction pipe 320, a suction valve 321 for opening and closing the suction pipe 320, an opening degree adjusting mechanism (decompression adjusting means) 322 such as a flow rate adjustment valve, and a degree of vacuum in the suction pipe 320 are measured. A vacuum degree sensor 324 is interposed in this order from the vacuum generator 323 side. The opening adjustment mechanism 322 is for adjusting the opening of the suction pipe 320. For this reason, in a state where the wafer W is accommodated in the accommodating recess 316, the degree of vacuum (the amount of reduced pressure) of the space SP between the glass substrate S and the bottom wall portion 309 is adjusted by controlling the opening adjustment mechanism 322. can do.

  On the upper surface of the bottom wall portion 309, a ring-shaped seal member (support member) 325 (see FIGS. 12A and 12B in addition to FIG. 10) extends along the periphery of the bottom wall portion 309. Has been placed. The seal member 325 supports the lower surface of the wafer W. As the sealing member 325, for example, a surface packing type that seals with a surface is adopted, but a lip packing type that seals with a lip portion may be adopted.

The seal member 325 is selected for material and designed in shape so that the amount of shrinkage per unit stress is relatively large. Therefore, the seal member 325 contracts / expands and the thickness (size in the vertical direction) changes with the change in the degree of vacuum (the amount of reduced pressure) of the space SP between the bottom wall portion 309 and the glass substrate S. Thus, the interval between the wafer W and the bottom wall portion 309 changes.
The substrate holding mechanism 301 has a plurality of (for example, four) lift pins 326 for moving up and down between a state in which the wafer W is accommodated in the accommodation recess 316 and a state in which the wafer W is detached upward from the accommodation recess 316. (Only two lift pins 326 are shown in FIG. 10). Each lift pin 326 is inserted into a through hole 350 formed so as to penetrate the spin base 303 in the vertical direction, and is provided so as to be able to move up and down with respect to the spin base 303. Each lift pin 326 passes through the inside of the elevating ring 330 and its lower end is fixed to the upper end of the annular elevating ring 330 accommodated in the accommodating space 308.

  The elevating ring 330 is fitted and fixed to the inner ring of the bearing 331. A ball nut 333 of a ball screw mechanism 332 housed in the housing space 308 is fixed to the outer ring of the bearing 331. The screw shaft 334 of the ball screw mechanism 332 is disposed along the vertical direction. The screw shaft 334 is fixedly disposed on a peripheral member (not shown) accommodated in the accommodation space 308.

  A gear 335 is fixed to the lower end portion of the screw shaft 334. The gear 335 meshes with a drive gear 337 fixed to the output shaft of the lift pin lifting motor 336 housed in the housing space 308. With this configuration, the ball nut 333 can be moved up and down by rotationally driving the lift pin lift motor 336, whereby the plurality of lift pins 326 are protruded at positions where their tips protrude above the ring upper surface 318. (The position indicated by the two-dot chain line in FIG. 10) and the tip thereof is moved up and down in a lump in a lump position (the position indicated by the solid line in FIG. 10) withdrawing flush with the upper surface of the bottom wall portion 309. Can be done.

FIG. 11 is a block diagram showing an electrical configuration of the substrate processing apparatus 300. The substrate processing apparatus 300 includes a control device 361 configured with a microcomputer, for example. The control device 361 includes a CPU (not shown) and a storage unit (not shown). A timer (not shown) for measuring time is connected to the control device 361.
The control device 361 includes a spin motor 302, a nozzle arm swing drive mechanism 56, a vacuum generator 323, a nitric acid valve 58, a DIW valve 60, a suction valve 321, an opening adjustment mechanism 322, and a lift pin lift motor 336. Connected as.

In addition, a detection signal output from the substrate thickness measurement device 80 and a detection signal output from the vacuum degree sensor 324 are input to the control device 361. Based on the detection signal output from the vacuum degree sensor 324, the control device 361 controls the opening degree of the opening degree adjusting mechanism 322.
The control device 361 controls the operation of each part to be controlled so that each process step is executed in accordance with the recipe stored in the memory.

In the substrate processing apparatus 300, the same process as that in the substrate processing apparatus 1 (see FIG. 4) is performed on the wafer W. In this embodiment, the space between the upper surface of the wafer W and the ring upper surface 318 is adjusted by adjusting the degree of vacuum (the amount of reduced pressure) of the space SP between the glass substrate S and the bottom wall portion 309. .
When processing the wafer W, the unprocessed wafer W bonded to the glass substrate S is carried into the processing chamber 2 by the transfer robot, and the wafer W is placed on the plurality of lift pins 336 at the protruding positions. Thereafter, the control device 361 drives the lift pin raising / lowering motor 326 to lower the lift pin 336 to the retracted position. As a result, the wafer W is delivered to the bottom wall portion 309 (corresponding to step S1 in FIG. 4).

Thereafter, the wafer W is subjected to a nitric acid nitric acid process corresponding to step S2 in FIG. 4, a rinsing process corresponding to step S3, and a spin dry process corresponding to step S4.
FIG. 12 is a cross-sectional view for explaining the nitric acid treatment in the substrate processing apparatus 300. In this nitric acid treatment (corresponding to step S2 in FIG. 4), the control device 361 controls the opening adjustment mechanism 322 so that the distance between the upper surface of the wafer W and the ring upper surface 318 is kept within a certain range. By controlling, the degree of vacuum of the space SP between the bottom wall portion 309 and the glass substrate S is reduced (the pressure is increased). Specifically, the recipe stored in the memory of the control device 361 defines the relationship between the treatment time of the nitric acid treatment and the degree of vacuum of the space SP between the bottom wall portion 309 and the glass substrate S. ing.

  When the degree of vacuum in the space SP between the bottom wall portion 309 and the glass substrate S changes, the size of the seal member 325 in the thickness direction (height direction) changes. Therefore, the distance between the upper surface of the wafer W and the ring upper surface 318 can be adjusted by increasing the thickness of the seal member 325. The recipe stipulates that the distance between the upper surface of the wafer W and the ring upper surface 318 is gradually reduced by a predetermined amount (for example, 100 μm).

The relationship between the processing time and the degree of vacuum in the space SP is determined based on experimental values so that the distance between the upper surface of the wafer W and the ring upper surface 318 is always kept within a certain range (700 μm to 800 μm). ing.
The control device 361 raises the suction base 310 based on the time measured by the timer and the recipe stored in the memory. 12A shows a state immediately after the start of the nitric acid treatment, and FIG. 12B shows a state immediately before the end of the nitric acid treatment. As shown in FIG. 12A and FIG. 12B, the wafer W is thinned as a result of the nitric acid treatment, but is formed on the upper surface of the wafer W in order to increase the size of the seal member 325 in the thickness direction. The thickness of the liquid film of rufunitric acid can be kept almost constant.

  With the progress of the nitric acid treatment, the degree of vacuum in the space SP between the bottom wall portion 309 and the glass substrate S is reduced, and the distance between the wafer W and the bottom wall portion 309 is changed. The distance between the ring upper surface 318 is kept within a certain range. For this reason, the thickness of the liquid film of nitric acid formed on the upper surface of the wafer W can be kept within a certain range throughout the entire period of the nitric acid treatment. As a result, the wafer W can be processed at a uniform rate throughout the entire period of the nitric acid treatment. As a result, variation in the etching rate can be suppressed, so that the etching amount can be accurately controlled.

Moreover, since the thickness of the liquid film of nitrous acid on the upper surface of the wafer W during the nitrous acid treatment can be kept small, the temperature decrease of the nitrous acid can be suppressed, and the decrease in the etching rate can be suppressed. Thereby, the time required for the nitric acid treatment can be shortened, and the throughput can be improved.
After the spin dry process, after the rotation of the substrate support member 304 is stopped, the reduced pressure state of the space between the wafer W and the bottom wall portion 309 is released, and the adsorption holding of the wafer W is released.

Next, the control device 361 drives the lift pin raising / lowering motor 336 to raise the lift pin 326 to the protruding position. As a result, the processed wafer W is detached upward from the substrate support member 304 and unloaded from the processing chamber 2 by the transfer robot (corresponding to step S5 in FIG. 4).
FIG. 13 is a schematic cross-sectional view showing the configuration of a substrate processing apparatus 400 according to another embodiment (fourth embodiment) of the present invention. FIG. 14 is a block diagram showing an electrical configuration of the substrate processing apparatus 400. In the fourth embodiment, the same reference numerals as those in FIGS. 1 to 6 are assigned to the portions corresponding to the respective parts shown in the above-described embodiment of FIGS. 1 to 6 (first embodiment). The description is omitted.

  The substrate processing apparatus 400 of the fourth embodiment is different from the substrate processing apparatus 1 in that an upper surface height sensor (substrate upper surface height detecting means) 401 for measuring the upper surface height of the wafer W is provided. is there. A detection signal output from the upper surface height sensor 401 is input to the control device 61. As the upper surface height sensor 401, a displacement sensor of a laser non-contact type (for example, a CCD laser type or a blue laser focus type) can be employed.

The control device 61 can determine the upper surface height of the wafer W based on the detection signal input from the upper surface height sensor 401. During the nitric acid treatment, an upper surface height adjustment process for adjusting the height of the upper surface of the wafer W is executed.
FIG. 15 is a flowchart of the upper surface height adjustment process executed during the nitric acid treatment.
During the nitric acid treatment (corresponding to step S2 in FIG. 4), the control device 61 constantly monitors the detection signal input from the upper surface height sensor 401 (YES in step S10). When the height of the upper surface of wafer W (that is, the thickness of the liquid film of hydrofluoric acid) exceeds a preset upper limit value (YES in step S11), control device 61 raises adsorption base 10 to a predetermined height ΔH (for example, 100 [mu] m) (step S12). Thereafter, monitoring of the height of the upper surface of the wafer W is continued until the nitric acid treatment is completed (YES in step S13).

Thereby, the thickness of the liquid film of nitrous acid formed on the upper surface of the wafer W can be more reliably maintained within a certain range.
As mentioned above, although four embodiment of this invention was described, this invention can also be implemented with another form.
For example, the upper surface height sensor 400 employed in the fourth embodiment can be employed in the substrate processing apparatus 300 of the third embodiment. In this case, the opening adjustment mechanism 322 is controlled based on the detection signal input from the upper surface height sensor 400.

  Further, instead of the upper surface height sensor 401 of the substrate processing apparatus 400 of the fourth embodiment, a liquid film thickness sensor that directly measures the thickness of the liquid film of fluoric acid formed on the upper surface of the wafer W can be adopted. . In this case, the base lifting motor 20 is controlled based on the detection signal input from the liquid film thickness sensor. Moreover, this liquid film thickness sensor can also be applied to the substrate processing apparatus 200 of the second embodiment and the substrate processing apparatus of the third embodiment. In this case, the ring pin lifting / lowering motor 230 is controlled based on the detection signal input from the liquid film thickness sensor, and the opening adjustment mechanism 322 is controlled based on the detection signal input from the liquid film thickness sensor. .

Further, the deformation prevention plate 39 employed in the first and fourth embodiments may be employed in the second embodiment. That is, the deformation preventing plate 39 may be disposed between the suction base 205 and the wafer W (glass substrate S). In this case, the deformation preventing plate is preferably formed with a through hole through which the lipto pin is inserted so as to penetrate the upper and lower surfaces thereof.
Further, instead of the slit nozzle 4, one or a plurality of straight nozzles that discharge hydrofluoric acid in a continuous flow state may be used. In addition, an etching process may be performed by moving (scanning) the nozzle (preferably the slit nozzle 4) while supplying fluoric nitric acid to the wafer W in a stopped state without rotating.

  In each of the above-described embodiments, a description has been given of an example in which the distance between the upper surface of the wafer W and the ring upper surfaces 28, 222, and 318 is reduced by, for example, 100 μm during the nitric acid treatment. The shortening amount per hit may be about 200 μm or about 300 μm. In these cases, if the thickness of the wafer W before the etching process is about 725 μm, the interval between the upper surface of the wafer W and the ring upper surfaces 28, 222, and 318 is three times or more during the nitric acid treatment. Although it is shortened only twice, even in this case, a decrease in the etching rate of the nitric acid treatment can be sufficiently suppressed.

Further, the amount of shortening per time may not be constant. Specifically, the first shortening amount may be about 200 μm, and the next shortening amount may be about 300 μm.
Of course, the interval between the upper surface of the wafer W and the ring upper surfaces 28, 222, 318 may be shortened only once during the nitric acid treatment. Even in this case, a decrease in the etching rate of the nitric acid treatment can be suppressed.

The ring upper surfaces 28, 222, and 318 have been described as flat surfaces, but may be formed with tapered surfaces that become lower toward the outside in the rotational radius direction of the wafer W.
Further, the substrate processing apparatuses 1, 200, 300, and 400 that perform the etching process for thinning have been described as an example. For example, the device formation surface (upper surface or lower surface) of the disk-shaped wafer W made of an oxide film silicon wafer. On the other hand, the structure which performs the etching process for the removal of an oxide film may be sufficient. In such a case, it is desirable to use, for example, hydrofluoric acid as an etchant. In addition, when performing an etching process for removing the nitride film of the wafer W, phosphoric acid can be used as an etching solution.

  In addition, various design changes can be made within the scope of matters described in the claims.

4 Slit nozzle (fluoric acid nitric acid mixture supply means)
6 Outer ring member (regulating member)
10 Adsorption base (substrate holding member)
20 Base lifting motor (Board holding member lifting mechanism)
27 Cylindrical surface (regulatory surface)
28 Ring upper surface (upper end of regulating surface)
61 Controller 201 Outer ring member (regulator member)
205 Adsorption base (substrate holding member)
221 Cylindrical surface (regulatory surface)
222 Upper surface of ring (upper end of regulating surface)
230 Ring Pin Lifting Motor (Regulating Member Lifting Mechanism)
261 Control device 300 Substrate processing device 303 Spin base (base)
309 Bottom wall (substrate holding member)
311 Outer ring part (regulating member)
317 Cylindrical surface (regulatory surface)
318 Ring upper surface (upper end of regulating surface)
320 Suction tube (pressure reduction means)
322 Opening / closing mechanism (pressure reduction adjusting means)
323 Vacuum generator (pressure reduction means)
325 Seal member (support member)
361 Control device 400 Substrate processing device 401 Upper surface height sensor (Substrate upper surface height detection means)
S glass substrate (substrate)
W wafer (silicon substrate)

Claims (8)

A substrate holding member that supports the lower surface of the substrate and holds the substrate in a horizontal position;
Etching solution supply means for supplying an etching solution to the upper surface of the substrate held by the substrate holding member;
A regulating member that has a cylindrical regulating surface that faces the peripheral end surface of the substrate held by the substrate holding member and regulates the outflow of the etching solution from the upper surface of the substrate;
An elevating mechanism that relatively elevates and lowers the lower surface of the substrate held by the substrate holding member and the regulating member;
A substrate processing apparatus, comprising: an elevating control unit that controls the elevating mechanism so that the substrate holding member is relatively raised with respect to an upper end of the regulating surface of the regulating member.   The lift control means moves the substrate holding member relative to the upper end of the regulating surface of the regulating member as etching progresses from the upper surface of the substrate held by the substrate holding member. The substrate processing apparatus according to claim 1, wherein the lift mechanism is controlled.   The substrate processing apparatus according to claim 1, wherein the lifting mechanism includes a substrate holding member lifting mechanism that lifts and lowers the substrate holding member.   The substrate processing apparatus according to claim 1, wherein the elevating mechanism includes a regulating member elevating mechanism that elevates and lowers the regulating member. The substrate holding member is
Base and
A shrinkable support member provided on the base and supporting a lower surface of the substrate;
Decompression means for decompressing the space between the base and the lower surface of the substrate,
The substrate processing apparatus according to claim 1, wherein the elevating mechanism includes a decompression adjustment unit that regulates an amount of decompression by the decompression unit. A liquid film thickness detecting means for measuring the thickness of the liquid film of the etching liquid formed on the upper surface of the substrate;
The substrate processing apparatus according to claim 1, wherein the lifting control unit controls the lifting mechanism based on the thickness of the liquid film detected by the liquid film thickness detection unit. The substrate held by the substrate holding member includes a silicon substrate,
The substrate processing apparatus according to claim 1, wherein the etching solution supply unit includes a hydrofluoric acid nitric acid mixture supply unit that supplies a hydrofluoric acid nitric acid mixture. Holding the substrate with a substrate holding member that supports the lower surface of the substrate;
Disposing a regulating member having a cylindrical regulating surface for regulating the outflow of liquid from the upper surface of the substrate so that the regulating surface faces the peripheral end surface of the substrate held by the substrate holding member;
An etching solution supplying step of supplying an etching solution to the upper surface of the substrate held by the substrate holding member;
And a step of raising the substrate holding member relative to the upper end of the regulating surface in parallel with the etching solution supplying step.

Images