JP2010225411A - Electron source - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an electron source which has the function of plasma generation, which is not deteriorated, and includes a simple structure. <P>SOLUTION: An inner structure material 4 disposed between an inner wall 9 and a collector electrode 3 in a plasma generation chamber 1 can prevent deposition of a conductive material on the inner wall 9 in the plasma formation chamber 1. Accordingly, a high-frequency electric field from a high-frequency antenna 2 is not shielded, and therefore initial plasma of a capacity coupling type can be generated by the high-frequency electric field. Even when the conductive material is deposited on the inner structure material 4 to shield the high-frequency electric field, the deposit is deposited on a side closer to the collector electrode 3 in the inner structure material 4, and therefore the high-frequency electric field from the inner structure material 4 into the plasma generation chamber 1 is shielded, but the high-frequency electric field from the inner wall 9 to the inner structure material 4 is shielded. Because a distance d is set between the inner structure material 4 and the inner wall 9, the initial plasma of the capacity coupling type can be generated in a region between the inner structure material 4 and the inner wall 9 by the high-frequency electric field. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to an electron source that emits electrons.

  As techniques used for manufacturing semiconductor devices and optical lenses, film forming techniques such as plasma ion plating and ion beam sputtering are known. In these film forming techniques, an electron gun that irradiates an object with an electron beam is often used.

  As an electron gun, an electron gun using a high-frequency induction coil connected to a high-frequency power source is known. In such an electron gun, the cathode electrode provided inside the discharge tube is sputtered by ions in the plasma, and the ejected conductive material may adhere to the inner wall of the discharge tube. When this conductive deposit is deposited, the deposited deposit shields the high-frequency electric field from the high-frequency induction coil electrostatically, and plasma due to capacitive coupling, which is the initial stage of plasma generation, is not generated. That is, if the electron gun is used for a long time, there is a problem that plasma is not generated when the stopped electron source is started again. As a countermeasure against this problem, for example, as disclosed in Patent Document 1, there is a technique in which a trigger electrode is provided in a cathode electrode inside a discharge tube, and plasma is generated in the discharge tube by the trigger electrode.

Japanese Patent No. 3606842 (paragraphs [0033] and [0043], FIG. 3)

  However, if the trigger electrode is installed inside the discharge tube, the structure of the electron gun becomes complicated, and foreign matter is generated from the insulating portion of the trigger electrode and the inside of the discharge tube is contaminated.

  In view of the circumstances as described above, an object of the present invention is to provide an electron source having a simple structure in which the function of plasma generation does not deteriorate.

In order to achieve the above object, an electron source according to an embodiment of the present invention includes a plasma generation chamber, a high-frequency antenna, a collector electrode, and an internal structure material.
The plasma generation chamber has an opening and an inner wall.
The high frequency antenna is provided outside the plasma generation chamber in order to generate plasma in the plasma generation chamber.
The collector electrode is provided inside the plasma generation chamber in order to collect ions in the plasma and discharge electrons in the plasma to the outside of the plasma generation chamber through the opening.
The inner structural member is made of a dielectric, and is provided between the inner wall of the plasma generation chamber and the collector electrode at a distance from the inner wall so as to face the inner wall.

An electron source according to another aspect of the present invention includes a plasma generation chamber, a high frequency antenna, a collector electrode, and a trigger electrode.
The plasma generation chamber has an opening.
The high frequency antenna is provided outside the plasma generation chamber in order to generate plasma in the plasma generation chamber.
The collector electrode is provided inside the plasma generation chamber in order to collect ions in the plasma and discharge electrons in the plasma to the outside of the plasma generation chamber through the opening.
The trigger electrode is provided outside the plasma generation chamber, and generates a trigger discharge in the plasma generation chamber.

It is typical sectional drawing which shows the electron source which concerns on one Embodiment of this invention. It is a figure for demonstrating the positional relationship of the plasma production chamber of the electron source shown in FIG. 1, a collector electrode, and an internal structure material. It is typical sectional drawing which shows the electron source which concerns on another embodiment of this invention. It is a figure for demonstrating the drawer opening of the electron source which concerns on another embodiment of this invention, and the installation position of a trigger electrode. It is the figure which showed the modification of the internal structure material provided in the inside of the plasma generation chamber shown in FIG. It is the figure which showed the modification of the extraction electrode shown in FIG.

An electron source according to an embodiment of the present invention includes a plasma generation chamber, a high-frequency antenna, a collector electrode, and an internal structure material.
The plasma generation chamber has an opening and an inner wall.
The high frequency antenna is provided outside the plasma generation chamber in order to generate plasma in the plasma generation chamber.
The collector electrode is provided inside the plasma generation chamber in order to collect ions in the plasma and discharge electrons in the plasma to the outside of the plasma generation chamber through the opening.
The inner structural member is made of a dielectric, and is provided between the inner wall of the plasma generation chamber and the collector electrode at a distance from the inner wall so as to face the inner wall.

  In the electron source of this embodiment, since the internal structural material is provided between the inner wall of the plasma generation chamber and the collector electrode, it is possible to prevent the conductive material from being deposited on the inner wall of the plasma generation chamber. Accordingly, since the high frequency electric field from the high frequency antenna is not shielded, capacitively coupled plasma can be generated by this high frequency electric field. In addition, it is assumed that a conductive substance is deposited on the internal structure material and a high-frequency electric field into the plasma generation chamber is shielded. Even in this case, since the deposit is deposited on the collector electrode side of the internal structural material, the high-frequency electric field from the internal structural material to the plasma generation chamber is shielded, but the high-frequency electric field from the inner wall to the internal structural material is not shielded. Since there is a distance between the internal structural material and the inner wall, capacitively coupled plasma can be generated by a high-frequency electric field in a region between the internal structural material and the inner wall. As described above, it is possible to realize an electron source having a simple structure in which the function of generating plasma does not deteriorate.

  The high frequency antenna may be wound around the plasma generation chamber. In this case, the internal structure material may have a slit formed in a direction crossing the winding direction of the high-frequency antenna.

  The plasma generated in the plasma generation chamber is maintained by the induction electromagnetic field by the high frequency antenna. Here, if the conductive material is continuously deposited on the internal structure material over the winding direction of the high-frequency antenna, an eddy current that cancels the induction electromagnetic field of the high-frequency antenna flows in the conductive material. . As a result, induction loss occurs and it becomes difficult to maintain the plasma. However, in the electron source of the present embodiment, it is possible to prevent the conductive material from being continuously deposited by the slits provided in the internal structure material, so that the flow of eddy current can be suppressed. As a result, induction loss can be prevented, and plasma generated in the plasma generation chamber can be maintained.

  The electron source may further include a trigger electrode provided outside the plasma generation chamber and generating a trigger discharge in the plasma generation chamber. Thereby, the reliability of plasma generation can be improved without complicating the structure of the electron source and without contaminating the plasma generation chamber.

The electron source may further include an extraction electrode for extracting the electrons.
The extraction electrode has a tapered extraction opening whose opening area increases as the distance from the opening increases, and is provided outside the plasma generation chamber so that the extraction opening faces the opening. In this case, the trigger electrode may generate the trigger discharge toward the extraction port.

  Since the extraction port is formed in a taper shape, the trigger discharge generated toward the extraction port by the trigger electrode is efficiently guided into the plasma generation chamber. For example, when the installation position of the trigger electrode is limited so as not to hinder the progress of electrons emitted from the plasma generation chamber through the extraction port, the above effect is effective.

  The trigger electrode may be provided in a region not included in a cylindrical region obtained by projecting an opening surface located on the plasma generation chamber side of the extraction port to the opposite side of the plasma generation chamber. In this case, the tip of the trigger electrode may be disposed in a region that is inside the extraction port and not included in the cylindrical region. Thereby, the trigger discharge can be reliably generated in the plasma generation chamber without hindering the progress of the electrons emitted from the plasma generation chamber.

An electron source according to another aspect of the present invention includes a plasma generation chamber, a high frequency antenna, a collector electrode, and a trigger electrode.
The plasma generation chamber has an opening.
The high frequency antenna is provided outside the plasma generation chamber in order to generate plasma in the plasma generation chamber.
The collector electrode is provided inside the plasma generation chamber in order to collect ions in the plasma and discharge electrons in the plasma to the outside of the plasma generation chamber through the opening.
The trigger electrode is provided outside the plasma generation chamber, and generates a trigger discharge in the plasma generation chamber.

  Thereby, it is possible to provide an electron source having a simple structure in which the function of generating plasma does not deteriorate.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following description, materials, dimensions, and the like are illustrated, but this does not mean that the materials, dimensions, and the like are limited.

  FIG. 1 is a schematic cross-sectional view showing an electron source according to an embodiment of the present invention. The electron source 100 includes a plasma generation chamber 1, a high-frequency antenna 2 wound in a coil shape outside the plasma generation chamber 1, a collector electrode 3 and an internal structural member 4 provided inside the plasma generation chamber 1. Have.

The plasma generation chamber 1 has a substantially cylindrical shape, and an opening 6 is formed in the front surface 5. Electrons are irradiated to the irradiation object through the opening 6. A gas introduction portion 8 is provided on the rear surface 7 of the plasma generation chamber 1, and a gas such as Ar, N, O _2, or Xe is introduced into the plasma generation chamber 1 by the gas introduction portion 8. As the plasma generation chamber 1, for example, a dielectric material such as quartz, alumina, or aluminum nitride is used.

  The high frequency antenna 2 is connected to a high frequency power source (not shown), and a high frequency voltage of, for example, 10 kHz to 100 MHz is applied by the high frequency power source, so that plasma 10 is generated in the plasma generation chamber 1.

  The collector electrode 3 has a hollow, substantially cylindrical shape, and is provided so that the central axis is substantially equal to the central axis of the plasma generation chamber 1. The collector electrode 3 is disposed in the vicinity of the opening 6 and is provided so as to converge the plasma 10 generated in the plasma generation chamber 1 inside. The collector electrode 3 is connected to the negative electrode of the variable DC power source 12. As the collector electrode 3, for example, a conductive material such as copper or aluminum is used.

  The internal structural member 4 also has a hollow and substantially cylindrical shape, and its central axis is substantially equal to the central axis of the plasma generation chamber 1. The internal structural member 4 is disposed between the inner wall 9 of the plasma generation chamber 1 and the collector electrode 3. Here, the positional relationship among the plasma generation chamber 1, the collector electrode 3, and the internal structural member 4 will be described in detail with reference to FIG. In FIG. 2, the front surface 5 of the plasma generation chamber 1 is omitted for easy understanding.

  As shown in FIG. 2, an internal structural member 4 is provided along the inner wall 9 of the plasma generation chamber 1. A collector electrode 3 is provided inside the internal structural member 4. A gap d is provided between the inner wall 9 and the inner structural member 4, and the size of the gap is, for example, in the range of 1 mm to 5 mm. The length in the central axis direction of the internal structural member 4 is typically substantially equal to the length in the central axis direction of the plasma generation chamber 1. However, the length of the internal structural member 4 may be appropriately set in a range from a quarter length of the plasma generation chamber 1 to the length of the plasma generation chamber 1.

  As shown in FIG. 2, the internal structural member 4 has a slit 11 formed in a direction crossing the winding direction of the high-frequency antenna 2. In the present embodiment, the slit 11 having the same length as the length of the internal structural member 4 is formed. However, the length of the slit 11 is appropriately set within a range of one half or more of the length of the internal structural member 4. You can do it. As the internal structure material 4, as in the plasma generation chamber 1, for example, a dielectric material such as quartz, alumina, or aluminum nitride is used. The plasma generation chamber 1 and the internal structure material 4 may be formed of the same material, or may be formed of different materials.

  An extraction electrode 13 for extracting electrons from the plasma generation chamber 1 is provided outside the plasma generation chamber 1. The extraction electrode 13 is formed with an extraction port 14 that faces the opening 6.

  The operation of the electron source 100 will be described. A gas is introduced into the plasma generation chamber 1 from a gas supply source (not shown) through the gas introduction unit 8. Further, a high frequency voltage is applied to the high frequency antenna 2. Thereby, the plasma 10 is generated in the plasma generation chamber 1 as described below. Since the collector electrode 3 is at a negative potential, ions in the plasma 10 are collected by the collector electrode 3, and electrons paired with the collected ions are passed through the opening 6 by the grounded extraction electrode 13. Withdrawn. The extracted electrons are irradiated to the irradiation object through the extraction port 14 of the extraction electrode 13.

  A mechanism for generating the plasma 10 will be described. When a high frequency voltage is applied to the high frequency antenna 2, a high frequency electric field is generated in the plasma generation chamber 1. Due to this high frequency electric field, capacitively coupled plasma is generated as an initial plasma in the generation of the plasma 10. This initial plasma becomes a plasma with a higher density by the induction electromagnetic field generated by the high-frequency antenna 2 and is maintained in the plasma generation chamber 1.

  For example, when the collector electrode 3 collects ions in the plasma 10, it may be sputtered by the ions and a conductive substance may jump out into the plasma generation chamber 1. Conventionally, when the ejected conductive material is deposited on the inner wall 9 of the plasma generation chamber 1, the high frequency electric field by the high frequency antenna 2 is electrostatically shielded, and the generation of capacitively coupled plasma as the initial plasma is prevented. End up.

  However, in the electron source 100 of the present embodiment, since the internal structural material 4 is provided between the inner wall 9 of the plasma generation chamber 1 and the collector electrode 3, a conductive substance is present on the inner wall 9 of the plasma generation chamber 1. Accumulation can be prevented. Accordingly, since the high frequency electric field from the high frequency antenna 2 is not shielded, capacitively coupled initial plasma can be generated by this high frequency electric field. Further, it is assumed that a conductive substance is deposited on the internal structural member 4 and the high frequency electric field into the plasma generation chamber 1 is shielded. Even in this case, the deposit is deposited on the collector electrode 3 side of the internal structural material 4, so that a high-frequency electric field from the internal structural material 4 into the plasma generation chamber 1 is shielded, but from the inner wall 9 to the internal structural material 4. High frequency electric fields are not shielded. Since the distance d is provided between the internal structural member 4 and the inner wall 9, a capacitively coupled initial plasma can be generated by a high frequency electric field in a region between the inner structural member 4 and the inner wall 9. . As described above, it is possible to realize the electron source 100 having a simple structure in which the function of generating plasma does not deteriorate.

  The plasma 10 generated in the plasma generation chamber 1 is maintained by an induction electromagnetic field generated by the high frequency antenna 2. Here, if a conductive substance is continuously deposited on the internal structural member 4 over the winding direction of the high-frequency antenna 2, an eddy current that cancels the induction electromagnetic field of the high-frequency antenna 2 is generated in the conductive substance. It will flow. As a result, induction loss occurs and it becomes difficult to maintain the plasma 10. However, in the electron source 100 of the present embodiment, the conductive material can be prevented from being continuously deposited by the slits 11 provided in the internal structural member 4, so that the flow of eddy current is suppressed. Can do. As a result, induction loss can be prevented, so that the plasma 10 generated in the plasma generation chamber 1 can be maintained.

  FIG. 3 is a schematic cross-sectional view showing an electron source according to another embodiment of the present invention. In the following description, the description of the same part as the configuration and operation of the electron source 100 described in the above embodiment will be omitted or simplified.

  The electron source 200 is obtained by providing the trigger electrode 15 outside the plasma generation chamber 1 in the electron source 100. The trigger electrode 15 generates a trigger discharge in the plasma generation chamber 1.

  In the present embodiment, the trigger electrode 15 is provided in the vicinity of the extraction port 14 of the extraction electrode 13. However, it may be provided at any position outside the plasma generation chamber 1 as long as the trigger discharge can be generated in the plasma generation chamber 1.

  The trigger electrode 15 is connected to an AC power supply 17 via an ignition coil 16, and a high voltage of 1000 V or more made up of, for example, a rectangular wave or a sine wave is applied by the AC power supply 17. Thereby, the trigger discharge can be generated in the plasma generation chamber 1 by the trigger electrode 15. The method of applying a high voltage to the trigger electrode 15 is not limited to this. For example, the trigger electrode 15 may be connected to a DC power supply, and a DC high voltage may be applied to the trigger electrode 15. As a material of the trigger electrode 15, for example, Ta is used.

  In the electron source 200 of the present embodiment, since the trigger electrode 15 is provided outside the plasma generation chamber 1, the plasma is generated without complicating the structure of the electron source 200 and without contaminating the plasma generation chamber 1. The reliability of occurrence of 10 can be improved.

  An electron source according to another embodiment of the present invention will be described. This electron source is provided with an extraction electrode 313 having an extraction port 314 described below in place of the extraction electrode 13 in the electron source 200. In the present embodiment, the trigger electrode 15 generates a trigger discharge toward the extraction port 314.

  FIG. 4 is a view for explaining the installation positions of the extraction port 314 and the trigger electrode 15 of the electron source 300 according to the present embodiment. The extraction port 314 is formed in the extraction electrode 313 so as to face the opening 6. The drawer port 314 has an opening surface 320 located on the opening 6 side and an opening surface 330 on the opposite side. As shown in FIG. 4, the drawer port 314 is formed so that the opening area increases from the opening surface 320 toward the opening surface 330. That is, the drawer port 314 is tapered.

  The opening surface 320 is typically circular and has a diameter of, for example, 5 mm. The shape and size of the opening surface 320 may be the same as or different from the opening surface 306 of the opening 6 facing the opening surface 320. Moreover, the shape of the opening surface 320 and the opening surface 330 may be the same, and may differ.

  Since the extraction port 314 is formed in a taper shape, the trigger discharge generated by the trigger electrode 15 toward the extraction port 314 is efficiently guided into the plasma generation chamber 1. For example, this effect is effective when the installation position of the trigger electrode 15 is limited so as not to hinder the progress of electrons emitted from the plasma generation chamber 1 through the extraction port 314.

  The installation position of the trigger electrode 15 in this embodiment will be described. A region obtained by projecting the opening surface 320 in the direction opposite to the opening 6 is defined as a cylindrical region 340. The trigger electrode 15 is provided so as not to enter the cylindrical region 340. Further, the tip 315 of the trigger electrode 15 is disposed in an area inside the extraction port 314 and not included in the cylindrical area 340. Thereby, trigger discharge can be generated in the plasma generation chamber 1 with high reliability without hindering the progress of electrons emitted from the plasma generation chamber 1.

  The distance between the tip 315 of the trigger electrode and the tapered surface 360 of the extraction port 314 is, for example, 1 mm. The trigger electrode 15 may be provided along the tapered surface 360 or may not be provided along the tapered surface 360.

  The present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the scope of the present invention.

  FIG. 5 is a view showing a modification of the internal structural member 4 provided in the plasma generation chamber 1 shown in FIG. As shown in FIG. 5, a plurality of slits 411 may be formed in the internal structural member 4. The slit 411 is provided with a length that does not divide the internal structural member 4. The lengths of the plurality of slits 411 may be the same or different.

  FIG. 6 is a view showing a modification of the extraction electrode 313 shown in FIG. As shown in FIG. 6, a through hole 513 may be formed in the extraction electrode 313. The through hole 513 is formed so as to penetrate between the surface 520 opposite to the opening 6 of the extraction electrode 313 and the tapered surface 360 of the extraction port 314. A trigger discharge is generated from the surface 520 side toward the through hole 513 by the trigger electrode 15.

  Examples of the irradiation object irradiated with electrons from the electron source according to the embodiment described above include a substrate and a target member used in sputtering technology. Examples of the substrate include a semiconductor wafer or a glass substrate.

  In addition, the electron source according to the embodiment of the present invention can be used for etching, cleaning or surface modification of a substrate in a treatment apparatus such as a thin film forming apparatus. In addition, it may be used as a neutralizer that neutralizes positive charges accumulated on the substrate or the target member.

DESCRIPTION OF SYMBOLS 1 ... Plasma production chamber 2 ... High frequency antenna 3 ... Collector electrode 4 ... Internal structure material 6 ... Opening 9 ... Inner wall 10 ... Plasma 11, 411 ... Slit 13, 313 ... Extraction electrode 14, 314 ... Extraction port 15 ... Trigger electrode 100, 200, 300 ... electron source 315 ... tip of trigger electrode 320, 330 ... opening surface of extraction port 340 ... cylindrical region

Claims (6)

A plasma generation chamber having an opening and an inner wall;
A high-frequency antenna provided outside the plasma generation chamber to generate plasma in the plasma generation chamber;
A collector electrode provided inside the plasma generation chamber in order to collect ions in the plasma and discharge electrons in the plasma to the outside of the plasma generation chamber through the opening;
An electron source comprising: an inner structural member made of a dielectric material provided between the inner wall of the plasma generation chamber and the collector electrode so as to face the inner wall at a distance from the inner wall. The electron source according to claim 1,
The high frequency antenna is wound around the plasma generation chamber,
The internal structural member is an electron source having a slit formed in a direction crossing a winding direction of the high-frequency antenna. The electron source according to claim 1 or 2,
An electron source further comprising a trigger electrode provided outside the plasma generation chamber and generating a trigger discharge in the plasma generation chamber. The electron source according to claim 3,
A drawer for extracting the electrons, which is provided outside the plasma generation chamber so as to have a taper-shaped drawer opening so that an opening area increases as the distance from the opening increases. Further comprising an electrode,
The trigger electrode is an electron source that generates the trigger discharge toward the extraction port. The electron source according to claim 4,
The trigger electrode is provided in a region not included in a cylindrical region obtained by projecting an opening surface located on the plasma generation chamber side of the extraction port to the opposite side of the plasma generation chamber,
An electron source in which a tip portion of the trigger electrode is disposed in an area inside the extraction port and not included in the cylindrical area. A plasma generation chamber having an opening;
A high-frequency antenna provided outside the plasma generation chamber to generate plasma in the plasma generation chamber;
A collector electrode provided inside the plasma generation chamber in order to collect ions in the plasma and discharge electrons in the plasma to the outside of the plasma generation chamber through the opening;
An electron source comprising: a trigger electrode provided outside the plasma generation chamber and generating a trigger discharge in the plasma generation chamber.

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