JP2010212695A5 - - Google Patents
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- JP2010212695A5 JP2010212695A5 JP2010064312A JP2010064312A JP2010212695A5 JP 2010212695 A5 JP2010212695 A5 JP 2010212695A5 JP 2010064312 A JP2010064312 A JP 2010064312A JP 2010064312 A JP2010064312 A JP 2010064312A JP 2010212695 A5 JP2010212695 A5 JP 2010212695A5
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- substrate
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- flat
- exposure apparatus
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- 239000000758 substrate Substances 0.000 claims 56
- 239000007788 liquid Substances 0.000 claims 31
- 230000003287 optical Effects 0.000 claims 10
- 230000001678 irradiating Effects 0.000 claims 6
- 238000005259 measurement Methods 0.000 claims 5
- 238000007654 immersion Methods 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 2
- 230000002940 repellent Effects 0.000 claims 2
- 239000005871 repellent Substances 0.000 claims 2
- -1 polytetrafluoroethylene Polymers 0.000 claims 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims 1
- 239000004810 polytetrafluoroethylene Substances 0.000 claims 1
- 238000011084 recovery Methods 0.000 claims 1
Claims (24)
前記基板を保持する基板ホルダ、及び前記基板ホルダに保持された前記基板の周囲に配置される第１平坦部を有する基板ステージと、
前記基板ステージに設けられ、前記第１平坦部とほぼ面一の第２平坦部を有する計測部材と、を備え、
前記第１平坦部の表面の前記液体に対する親和性が、前記第２平坦部の表面の前記液体に対する親和性とほぼ同一である露光装置。 In an exposure apparatus that exposes the substrate by irradiating the substrate with exposure light via a projection optical system and a liquid,
A substrate holder that holds the substrate, and a substrate stage that has a first flat portion disposed around the substrate held by the substrate holder;
A measurement member provided on the substrate stage and having a second flat part substantially flush with the first flat part,
An exposure apparatus in which the affinity of the surface of the first flat portion to the liquid is substantially the same as the affinity of the surface of the second flat portion to the liquid.
前記第１、第２平坦部の表面の前記液体に対する親和性が、前記基板の表面の前記液体に対する親和性とほぼ同一である請求項１に記載の露光装置。 The first and second flat portions are substantially flush with the surface of the substrate;
2. The exposure apparatus according to claim 1, wherein the affinity of the surfaces of the first and second flat portions with respect to the liquid is substantially the same as the affinity of the surface of the substrate with respect to the liquid.
前記基板を保持する基板ホルダ、及び前記基板ホルダに保持された前記基板の周囲に配置される第１平坦部を有する基板ステージと、
前記基板ステージに設けられ、前記第１平坦部とほぼ面一の第２平坦部を有する計測部材と、を備え、
前記第１平坦部の表面の前記液体に対する接触角が、前記第２平坦部の表面の前記液体に対する接触角とほぼ同一である露光装置。 In an exposure apparatus that exposes the substrate by irradiating the substrate with exposure light via a projection optical system and a liquid,
A substrate holder that holds the substrate, and a substrate stage that has a first flat portion disposed around the substrate held by the substrate holder;
A measurement member provided on the substrate stage and having a second flat part substantially flush with the first flat part,
An exposure apparatus, wherein a contact angle of the surface of the first flat part with the liquid is substantially the same as a contact angle of the surface of the second flat part with the liquid.
前記第１、第２平坦部の表面の前記液体に対する接触角が、前記基板の表面の前記液体に対する接触角とほぼ同一である請求項３に記載の露光装置。 The first and second flat portions are substantially flush with the surface of the substrate;
4. The exposure apparatus according to claim 3, wherein a contact angle of the surfaces of the first and second flat portions with respect to the liquid is substantially the same as a contact angle of the surface of the substrate with respect to the liquid.
前記第１基準マークは、前記基準部材上に液体の液浸領域が形成されない状態で計測され、
前記第２基準マークは、前記基準部材上に液体の液浸領域が形成された状態で計測される請求項５に記載の露光装置。 The reference mark includes a first reference mark measured by a first alignment system and a second reference mark measured by a second alignment system,
The first reference mark is measured in a state where a liquid immersion area is not formed on the reference member,
6. The exposure apparatus according to claim 5, wherein the second reference mark is measured in a state where a liquid immersion area is formed on the reference member.
前記第３平坦部の表面の前記液体に対する親和性が、前記第１、第２平坦部の表面の前記液体に対する親和性とほぼ同一である請求項１〜９のいずれか一項に記載の露光装置。 An interferometer moving mirror provided on the substrate stage and having a third flat portion substantially flush with the first and second flat portions;
The exposure according to any one of claims 1 to 9, wherein the affinity of the surface of the third flat portion with respect to the liquid is substantially the same as the affinity of the surfaces of the first and second flat portions with respect to the liquid. apparatus.
前記第３平坦部の表面の前記液体に対する接触角が、前記第１、第２平坦部の表面の前記液体に対する接触角とほぼ同一である請求項１〜９のいずれか一項に記載の露光装置。 An interferometer moving mirror provided on the substrate stage and having a third flat portion substantially flush with the first and second flat portions;
The exposure angle according to any one of claims 1 to 9, wherein a contact angle of the surface of the third flat portion with respect to the liquid is substantially the same as a contact angle of the surfaces of the first and second flat portions with respect to the liquid. apparatus.
前記ノズル部材の下面は、前記液体に対して前記第１、第２平坦部より親液性である請求項１〜１２のいずれか一項に記載の露光装置。 A nozzle member having a supply port for supplying the liquid;
The exposure apparatus according to any one of claims 1 to 12, wherein a lower surface of the nozzle member is more lyophilic than the first and second flat portions with respect to the liquid.
前記ノズル部材の下面は、前記液体に対して前記第１、第２平坦部より親液性である請求項１〜１２のいずれか一項に記載の露光装置。 A nozzle member having a recovery port for recovering the liquid;
The exposure apparatus according to any one of claims 1 to 12, wherein a lower surface of the nozzle member is more lyophilic than the first and second flat portions with respect to the liquid.
前記基板の表面、前記第１平坦部、及び前記第２平坦部の少なくとも一つに対する前記第２下面の相対角度を調整する調整機構と、を備える請求項１〜１４のいずれか一項に記載の露光装置。 A second lower surface adjacent to the first lower surface of the nozzle member to which at least one of the surface of the substrate, the first flat portion, and the second flat portion can be opposed;
The adjustment mechanism which adjusts the relative angle of the 2nd undersurface to at least one of the surface of the substrate, the 1st flat part, and the 2nd flat part. Exposure equipment.
前記基板を保持する基板ステージと、
前記液体に接する前記投影光学系の光学素子の周囲の少なくとも一部に配置され、前記基板の表面の少なくとも一部が対向可能な第１下面を有するノズル部材と、
前記基板の表面の少なくとも一部が対向可能であり、前記第１下面に隣接する第２下面と、
前記基板の表面に対する前記第２下面の相対角度を調整する調整機構と、を備える露光装置。 In an exposure apparatus that exposes the substrate by irradiating the substrate with exposure light via a projection optical system and a liquid,
A substrate stage for holding the substrate;
A nozzle member disposed on at least a part of the periphery of the optical element of the projection optical system in contact with the liquid, and having a first lower surface capable of facing at least a part of the surface of the substrate;
A second lower surface adjacent to the first lower surface, wherein at least a part of the surface of the substrate can be opposed;
An adjustment mechanism that adjusts a relative angle of the second lower surface with respect to the surface of the substrate.
前記シート状部材が、前記第２下面を有する請求項１５又は１６に記載の露光装置。 A sheet-like member having one end connected to the nozzle member;
The exposure apparatus according to claim 15 or 16, wherein the sheet-like member has the second lower surface.
投影光学系と液体とを介して前記基板上に露光光を照射して前記基板を露光することと、を含み、
前記基板ステージは、前記基板ホルダに保持された前記基板の周囲に配置される第１平坦部を有し、
前記第１平坦部の表面の前記液体に対する親和性が、前記基板ステージに設けられ、前記第１平坦部とほぼ面一の計測部材の第２平坦部の表面の前記液体に対する親和性とほぼ同一である露光方法。 Holding the substrate in the substrate holder of the substrate stage;
Irradiating the substrate with exposure light through a projection optical system and a liquid to expose the substrate,
The substrate stage has a first flat portion arranged around the substrate held by the substrate holder,
The affinity of the surface of the first flat part with respect to the liquid is substantially the same as the affinity of the surface of the second flat part of the measuring member provided on the substrate stage and substantially flush with the first flat part. Is an exposure method.
投影光学系と液体とを介して前記基板上に露光光を照射して前記基板を露光することと、を含み、
前記基板ステージは、前記基板ホルダに保持された前記基板の周囲に配置される第１平坦部を有し、
前記第１平坦部の表面の前記液体に対する接触角が、前記基板ステージに設けられ、前記第１平坦部とほぼ面一の計測部材の第２平坦部の表面の前記液体に対する接触角とほぼ同一である露光方法。 Holding the substrate in the substrate holder of the substrate stage;
Irradiating the substrate with exposure light through a projection optical system and a liquid to expose the substrate,
The substrate stage has a first flat portion arranged around the substrate held by the substrate holder,
The contact angle of the surface of the first flat portion with respect to the liquid is substantially the same as the contact angle of the surface of the second flat portion of the measuring member provided on the substrate stage and substantially flush with the first flat portion. Is an exposure method.
投影光学系と液体とを介して前記基板上に露光光を照射して前記基板を露光することと、
前記液体に接する前記投影光学系の光学素子の周囲の少なくとも一部に配置され、前記基板の表面の少なくとも一部が対向可能なノズル部材の第１下面に隣接し、前記基板の表面の少なくとも一部が対向可能な第２下面の、前記基板の表面に対する相対角度を調整することと、を含む露光方法。 Holding the substrate on the substrate stage;
Irradiating the substrate with exposure light via a projection optical system and a liquid to expose the substrate;
At least a part of the periphery of the optical element of the projection optical system in contact with the liquid, at least a part of the surface of the substrate is adjacent to the first lower surface of the nozzle member that can be opposed, and at least one of the surfaces of the substrate Adjusting the relative angle of the second lower surface that can be opposed to the surface with respect to the surface of the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010064312A JP4973754B2 (en) | 2004-03-04 | 2010-03-19 | Exposure method, exposure apparatus, and device manufacturing method |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004060599 | 2004-03-04 | ||
| JP2004060599 | 2004-03-04 | ||
| JP2010064312A JP4973754B2 (en) | 2004-03-04 | 2010-03-19 | Exposure method, exposure apparatus, and device manufacturing method |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004188109A Division JP4622340B2 (en) | 2004-03-04 | 2004-06-25 | Exposure apparatus and device manufacturing method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010212695A JP2010212695A (en) | 2010-09-24 |
| JP2010212695A5 true JP2010212695A5 (en) | 2011-07-21 |
| JP4973754B2 JP4973754B2 (en) | 2012-07-11 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010064312A Active JP4973754B2 (en) | 2004-03-04 | 2010-03-19 | Exposure method, exposure apparatus, and device manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4973754B2 (en) |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100568101C (en) * | 2002-11-12 | 2009-12-09 | Asml荷兰有限公司 | Lithographic equipment and device making method |
| TWI467634B (en) * | 2003-06-13 | 2015-01-01 | 尼康股份有限公司 | An exposure method, a substrate stage, an exposure apparatus, and an element manufacturing method |
| JP4729876B2 (en) * | 2003-07-09 | 2011-07-20 | 株式会社ニコン | Exposure apparatus, exposure method, and device manufacturing method |
| KR20180120816A (en) * | 2003-08-21 | 2018-11-06 | 가부시키가이샤 니콘 | Exposure apparatus, exposure method, and device producing method |
| EP2624282B1 (en) * | 2004-06-10 | 2017-02-08 | Nikon Corporation | Immersion exposure apparatus and method, and methods for producing a device |
| JP4515335B2 (en) * | 2004-06-10 | 2010-07-28 | 株式会社ニコン | Exposure apparatus, nozzle member, and device manufacturing method |
| JP5130609B2 (en) * | 2004-06-10 | 2013-01-30 | 株式会社ニコン | Exposure apparatus, exposure method, and device manufacturing method |
-
2010
- 2010-03-19 JP JP2010064312A patent/JP4973754B2/en active Active
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