JP2010199607A5 - - Google Patents

Claims (32)

In an immersion exposure apparatus that exposes a substrate,
An exposure apparatus comprising a functional liquid supply device that supplies an alkaline functional liquid to a liquid contact surface that contacts the liquid supplied on the substrate.   The exposure apparatus according to claim 1, wherein the functional liquid supplied to the liquid contact surface reduces acidity of the liquid contact surface.   The exposure apparatus according to claim 1, wherein the functional liquid supplied to the liquid contact surface neutralizes acidity of the liquid contact surface. A substrate stage for holding the substrate;
The exposure apparatus according to claim 1, wherein the liquid contact surface includes an upper surface of the substrate stage. A nozzle member disposed so that the substrate faces the substrate,
The exposure apparatus according to claim 1, wherein the liquid contact surface includes a lower surface of the nozzle member facing the substrate.   The exposure apparatus according to claim 5, wherein the functional liquid is supplied through a supply flow path of the nozzle member.   The exposure apparatus according to claim 6, wherein the functional liquid supply device causes the functional liquid to flow through a liquid supply unit that sends out a liquid through which exposure light applied to the substrate passes.   The exposure apparatus according to claim 6, wherein the functional liquid supply unit is connected downstream of a liquid supply unit that sends out a liquid through which exposure light applied to the substrate passes. The nozzle member has a liquid supply port on a lower surface facing the substrate,
The exposure apparatus according to claim 5, wherein the functional liquid is supplied from the liquid supply port. The nozzle member has a liquid recovery port on a lower surface facing the substrate,
The exposure apparatus according to claim 5, wherein the functional liquid is recovered from the liquid recovery port.   The exposure apparatus according to claim 10, wherein the liquid supplied to the substrate is recovered from the liquid recovery port during the exposure of the substrate.   The exposure apparatus according to claim 10, further comprising a liquid recovery mechanism having the liquid recovery port.   The exposure apparatus according to any one of claims 1 to 11, further comprising a liquid recovery mechanism that recovers the liquid.   The exposure apparatus according to claim 13, wherein the liquid recovery mechanism has a liquid recovery port for recovering the liquid supplied onto the substrate during exposure of the substrate.   The exposure apparatus according to claim 14, wherein the functional liquid is recovered from the liquid recovery port.   The exposure apparatus according to any one of claims 12 to 15, wherein the liquid recovery mechanism includes a removal device for reducing or removing a predetermined substance contained in the recovered liquid.   The exposure apparatus according to claim 16, wherein the removing apparatus includes a filter member provided at a predetermined position of a flow path through which the collected liquid flows.   The exposure apparatus according to claim 12, further comprising a measuring device that measures the acidity of the liquid recovered by the liquid recovery mechanism.   The exposure apparatus according to claim 18, further comprising a control device that controls the functional liquid supply device based on a measurement result of the measurement device. A liquid supply method in an immersion exposure apparatus for exposing a substrate,
A liquid supply method comprising supplying an alkaline functional liquid to a liquid contact surface in contact with a liquid supplied on the substrate.   The liquid supply method according to claim 20, wherein the functional liquid supplied to the liquid contact surface reduces acidity of the liquid contact surface.   The liquid supply method according to claim 20 or 21, wherein the functional liquid supplied to the liquid contact surface neutralizes acidity of the liquid contact surface. The immersion exposure apparatus includes a substrate stage that supports the substrate,
23. The liquid supply method according to claim 20, wherein the functional liquid is in contact with the substrate stage. The immersion exposure apparatus includes a nozzle member arranged so that the substrate faces the substrate,
The liquid supply method according to any one of claims 20 to 23, wherein the functional liquid contacts the nozzle member.   The liquid supply method according to claim 24, wherein the functional liquid is supplied via a supply flow path of the nozzle member. The nozzle member has a liquid supply port on a lower surface facing the substrate,
26. The liquid supply method according to claim 24 or 25, wherein the functional liquid is supplied from the liquid supply port. The nozzle member has a liquid recovery port on a lower surface facing the substrate,
27. The liquid supply method according to claim 24, wherein the functional liquid is recovered from the liquid recovery port.   28. The liquid supply method according to claim 27, comprising measuring the acidity of the liquid recovered from the liquid recovery port.   29. The liquid supply method according to claim 28, wherein supplying the functional liquid is performed based on a measurement result of the measurement.   30. The liquid supply method according to claim 20, wherein the functional liquid is supplied onto a dummy substrate.   A device manufacturing method using the exposure apparatus according to claim 1.   A device manufacturing method using the liquid supply method according to any one of claims 20 to 30.