JP2010197628A5

JP2010197628A5 -

Info

Publication number: JP2010197628A5
Application number: JP2009041585A
Authority: JP
Filing date: 2009-02-25
Publication date: 2012-08-30
Anticipated expiration: 2029-02-25

Claims

A first stage mechanism that holds a photosensitive substrate and moves in a first direction;
A second stage mechanism that holds a mask having a pattern and moves in a second direction crossing the first direction in synchronization with the movement of the first stage mechanism in the first direction;
A projection optical system that receives light from the pattern and forms a projected image of the pattern on the substrate so that the second direction on the mask and the first direction on the substrate optically correspond to each other An exposure apparatus comprising:

The exposure apparatus according to claim 1, wherein the first direction and the second direction are orthogonal to each other.

The projection optical system includes: a first imaging system for forming a first projection image of the pattern in a first imaging region; and a second projection image of the pattern in at least the second direction from the first imaging region. The exposure apparatus according to claim 1, further comprising: a second imaging system formed in a second imaging region spaced apart.

The projection optical system includes: a first imaging system that forms a first imaging region on the substrate that is optically conjugate with an illumination region on the pattern by the light; and a first optical system that is optically conjugate with the illumination region. 3. A second imaging system that forms two imaging regions on the substrate at least in the second direction from the first imaging region. 3. Exposure device.

5. The exposure apparatus according to claim 3, wherein the first imaging region and the second imaging region are provided in alignment in the second direction. 6.

The projection optical system forms a line pattern image along the first direction on the substrate based on the light from a line pattern provided along the second direction among the patterns. The exposure apparatus according to any one of claims 1 to 5.

The projection optical system is an intermediate imaging optical system in which at least a part is provided in common to the first imaging system and the second imaging system to form a first intermediate image and a second intermediate image of the pattern A first imaging optical system that forms the first projection image based on the light from the first intermediate image, and a second projection image based on the light from the second intermediate image. The exposure apparatus according to claim 3, further comprising a second imaging optical system.

The projection optical system is at least partially provided in common to the first imaging system and the second imaging system, and forms intermediate imaging optics for forming a first intermediate image and a second intermediate image of the illumination area. A system, a first imaging optical system that optically conjugates the formation position of the first intermediate image and the first imaging region, the formation position of the second intermediate image, and the second imaging region, The exposure apparatus according to claim 4, further comprising: a second imaging optical system that optically conjugates.

The intermediate imaging optical system includes a positive lens group on which the light from the pattern is incident and first light that travels the light from the positive lens group in different directions across the optical axis of the positive lens group. And a divided reflection section that divides the light and the second light and reflects the first light and the second light toward the positive lens group. Exposure equipment.

The divisional reflector is disposed at or near the focal position of the positive lens group, and reflects the light incident from the positive lens group in a first direction to generate the first light. The exposure apparatus according to claim 9, further comprising: a reflection unit and a plurality of second reflection units that generate the second light by reflecting in a second direction.

The exposure apparatus according to claim 10, wherein the first reflection unit and the second reflection unit are alternately provided along the second direction.

12. The exposure according to claim 10, wherein the plurality of first reflecting portions and the plurality of second reflecting portions have a plurality of mirror elements that are two-dimensionally arranged and individually changeable in posture. apparatus.

A plurality of light sources are formed at positions that are optically conjugate with the positions of the divided reflectors in correspondence with the arrangement of the plurality of first reflectors and the plurality of second reflectors, and the pattern is irradiated with the light An exposure apparatus according to any one of claims 10 to 12, further comprising an illumination optical system.

The split reflector is disposed at a focal point of the positive lens group or in the vicinity thereof, a split unit that splits the light from the positive lens group into the first light and the second light, and the split The exposure apparatus according to claim 9, further comprising: a reflection unit that reflects the light from the unit and re-enters the positive lens group through the division unit.

The dividing unit has a polarization beam splitter,
The reflection unit reflects the first light generated through the polarization beam splitter toward the polarization beam splitter and the first member generated by reflecting the polarization beam splitter. The exposure apparatus according to claim 14, further comprising: a second reflecting member that reflects the second light toward the polarizing beam splitter.

The projection optical system includes a first group of deflecting members that sequentially deflect the first light in the first direction, the second direction, and a direction parallel to the optical axis of the intermediate imaging optical system; And a second group of deflecting members for sequentially deflecting the second light in the first direction, the second direction, and a direction parallel to the optical axis of the intermediate imaging optical system. The exposure apparatus according to any one of -15.

The projection optical system includes a first group of deflecting members arranged in an optical path between the intermediate imaging optical system and the first imaging optical system, the intermediate imaging optical system, and the second imaging The exposure apparatus according to claim 9, further comprising: a second group of deflecting members disposed in an optical path between the optical system and the optical system.

The first group of deflecting members includes a first deflecting member that deflects the first light in the second direction, and a second deflecting the first light from the first deflecting member in the first direction. 17. A deflecting member, and a third deflecting member that deflects the first light from the second deflecting member in a direction parallel to the optical axis of the intermediate imaging optical system. 18. An exposure apparatus according to item 17.

The first group of deflecting members includes a first deflecting member that deflects the first light in the first direction, and a second deflecting the first light from the first deflecting member in the second direction. 17. A deflecting member, and a third deflecting member that deflects the first light from the second deflecting member in a direction parallel to the optical axis of the intermediate imaging optical system. 18. An exposure apparatus according to item 17.

The second group of deflection members includes a fourth deflection member that deflects the second light in the second direction, and a fifth deflector that deflects the second light from the fourth deflection member in the first direction. 17. A deflecting member, and a sixth deflecting member for deflecting the second light from the fifth deflecting member in a direction parallel to the optical axis of the intermediate imaging optical system. 20. The exposure apparatus according to any one of 19 above.

The second group of deflecting members includes a fourth deflecting member that deflects the second light in the first direction, and a fifth deflecting the second light from the fourth deflecting member in the second direction. 17. A deflecting member, and a sixth deflecting member for deflecting the second light from the fifth deflecting member in a direction parallel to the optical axis of the intermediate imaging optical system. 20. The exposure apparatus according to any one of 19 above.

The second group of deflection members includes a fourth deflection member that deflects the second light in a direction opposite to a deflection direction of the first light by the first deflection member, and the first deflection member by the second deflection member. A fifth deflecting member for deflecting the second light from the fourth deflecting member in a direction opposite to the deflecting direction of the light, and the same direction as the deflecting direction of the first light by the third deflecting member. The exposure apparatus according to claim 18, further comprising a sixth deflecting member that deflects the second light from the five deflecting members.

The first deflection member is disposed in an optical path between the intermediate imaging optical system and the formation position of the first intermediate image, and the second deflection member is disposed between the formation position of the first intermediate image and the first intermediate image. The third deflection member is disposed in an optical path between the second imaging member and the first imaging optical system, and the third deflection member is disposed in an optical path between the second deflection member and the first imaging optical system. The exposure apparatus according to claim 18 or 19.

The fourth deflection member is disposed in an optical path between the intermediate imaging optical system and the formation position of the second intermediate image, and the fifth deflection member is disposed between the formation position of the second intermediate image and the second intermediate image. The sixth deflection member is disposed in an optical path between the second imaging optical system and the sixth deflection member is disposed in an optical path between the fifth imaging member and the second imaging optical system. The exposure apparatus according to any one of claims 20 to 22.

Holding and moving the photosensitive substrate in the first direction;
Holding a mask having a pattern and moving the substrate in a second direction crossing the first direction in synchronization with the movement of the substrate in the first direction;
Receiving light from the pattern, and forming a projected image of the pattern on the substrate such that the second direction on the mask and the first direction on the substrate optically correspond to each other; An exposure method comprising:

26. The exposure method according to claim 25, wherein the first direction and the second direction are orthogonal to each other.

The step of forming the projected image forms a line pattern image along the first direction on the substrate based on the light from the line pattern provided along the second direction among the patterns. 27. The exposure method according to claim 25 or 26.

A step of transferring the pattern to the substrate using the exposure apparatus according to any one of claims 1 to 24;
Developing the substrate to which the pattern has been transferred, and forming a transfer pattern layer having a shape corresponding to the pattern;
Processing the substrate via the transfer pattern layer;
A device manufacturing method comprising:

An exposure apparatus that projects and exposes an image of a mask pattern existing in a rectangular illumination area on a mask onto a predetermined area of a photosensitive substrate,
An illumination system for illuminating an illumination area on the mask with light from a light source;
A first lens unit that forms a pupil plane on which an imaged light beam generated from within an illumination region on the mask is incident and that forms an image of the light source by the imaged light beam;
A reflective light splitting member that splits the imaging light beam into a first imaging light beam and a second imaging light beam that reflect the imaging light beam at mutually different angles and returns them to the first lens group on the pupil plane;
Deflecting the first imaging light beam and the second imaging light beam between the first lens group and the mask in a direction crossing a traveling direction of the imaging light beam generated from the illumination area of the mask; A light deflecting member for deflecting toward different areas on the photosensitive substrate;
A first projection optical system that enters the first imaging light beam from the light deflecting member and projects an image of the mask pattern onto a first region on the photosensitive substrate;
A second projection optical system that enters the second imaging light beam from the light deflection member and projects an image of the mask pattern onto a second region different from the first region on the photosensitive substrate; An exposure apparatus comprising:

The reflection-type light splitting member is disposed at or near the focal position of the first lens group, and reflects the imaging light beam incident from the first lens group in a first direction so as to reflect the first imaging light beam. 30. The exposure apparatus according to claim 29, further comprising: a plurality of first reflecting portions that generate the second reflecting portion and a plurality of second reflecting portions that are reflected in a second direction to generate the second imaging light flux.

31. The exposure apparatus according to claim 30, wherein the first reflecting portion and the second reflecting portion are alternately provided along the intersecting direction.

32. The exposure apparatus according to claim 30, wherein the plurality of first reflection units and the plurality of second reflection units have a plurality of mirror elements that are two-dimensionally arranged and individually changeable in posture.

A rectangular illumination area on the mask is disposed at the center in a circular incident-side field of view of the first lens group, and the first imaging light flux and the second are between the mask and the first lens group. The reflection-type light splitting member is separated so that an imaging light beam is generated in the illumination area on the mask and is incident on the first lens group with the imaging light beam sandwiched therebetween. The exposure apparatus according to any one of claims 30 to 32, wherein each angle of the first reflecting portion and the second reflecting portion is set.

The reflective light splitting member includes a splitting unit that splits the imaging light beam from the first lens group into the first imaging light beam and the second imaging light beam, and a focal position of the first lens group or A reflection unit disposed in the vicinity thereof for reflecting the first imaging light beam and the second imaging light beam from the division unit and re-entering the first lens group through the division unit. Item 30. The exposure apparatus according to Item 29.

The dividing unit has a polarization beam splitter,
The reflection unit is configured to reflect the first imaging light beam generated by passing through the polarization beam splitter toward the polarization beam splitter, and the reflection member generated by reflecting the polarization beam splitter. The exposure apparatus according to claim 34, further comprising: a second reflecting member that reflects the second imaging light beam toward the polarizing beam splitter.

A rectangular illumination area on the mask is disposed at the center in a circular incident-side field of view of the first lens group, and the first imaging light flux and the second are between the mask and the first lens group. The first light of the reflecting portion is separated from the imaging light flux in the short direction of the illumination area with the imaging light flux generated from the illumination area on the mask and incident on the first lens group. 36. The exposure apparatus according to claim 35, wherein each angle of the reflecting member and the second reflecting member is set.

The reflective light splitting member reflects the imaging light beam from the first lens group in a first direction to generate the first imaging light beam and reflects it in a second direction to reflect the second light beam. 30. The exposure apparatus according to claim 29, further comprising a diffractive optical surface that generates an image light beam.

38. The exposure apparatus according to any one of claims 29 to 37, wherein a longitudinal direction of the rectangular illumination area intersects with a longitudinal direction of the first area and the second area.

39. The exposure apparatus according to claim 38, wherein a longitudinal direction of the illumination area is orthogonal to a longitudinal direction of the first area and the second area.

40. The exposure apparatus according to any one of claims 29 to 39, wherein the first projection optical system and the second projection optical system have an enlargement magnification.