JP2010196100A - Black plated film and method for forming the same - Google Patents
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Abstract
Description
本発明は、6価クロムを含有しないめっき液による6価クロムフリーの黒色めっき皮膜及びその皮膜形成方法に関するものであり、特に、防錆性等の皮膜特性に優れた黒色めっき皮膜及びその皮膜を安定して形成する方法に関するものである。 The present invention relates to a hexavalent chromium-free black plating film using a plating solution containing no hexavalent chromium and a method for forming the film, and in particular, a black plating film excellent in film characteristics such as rust prevention and the film. The present invention relates to a method of forming stably.
従来の六価クロム化合物含有めっき液による黒色めっき皮膜は、めっき皮膜に残留するめっき液成分の六価クロム分を除去する必要があり、めっき後の処理工程で温水洗や還元処理などで対応しているが、余分なコストが掛る上、複雑な形状の被めっき部品等は手間が掛かり効率が悪い。また、完全に除去したかを全数確認することも実質不可能であり、六価クロム残留のリスクはぬぐい切れない。更に、生産設備においては六価クロムを含有するミストや洗浄排水が発生するため、無害化して放出する環境汚染防止対策が必要であり、これらの放出についても災害などの非常時の場合等、完全にリスクを回避しきれないといった問題があった。そこで、六価クロムを含有しない三価クロムを主体としためっき液を用いた黒色クロムめっき皮膜についての研究開発が活発に行なわれている。 The conventional black plating film with a hexavalent chromium compound-containing plating solution needs to remove the hexavalent chromium content of the plating solution component remaining on the plating film. However, extra cost is required, and complex parts to be plated are troublesome and inefficient. In addition, it is virtually impossible to confirm the complete removal, and the risk of residual hexavalent chromium cannot be wiped out. In addition, mist containing hexavalent chromium and washing wastewater are generated in production facilities, so measures to prevent environmental pollution that are detoxified and released are necessary, and these releases are also complete in the event of an emergency such as a disaster. However, there was a problem that the risk could not be avoided. Therefore, research and development on a black chromium plating film using a plating solution mainly composed of trivalent chromium not containing hexavalent chromium has been actively conducted.
具体的には、例えば、特許文献1においては、3価クロムの供給源として塩化クロム(CrCl3)を200〜600g/l、触媒として炭酸バリウムを10g/l、錯化剤としてギ酸アンモニウムを10〜30g/l使用しためっき液を作製し、陽極に白金めっきのチタンを用い、陰極すなわち被めっき部材として薄肉鋼板を使用して、液温を0℃〜−4℃とし、電圧15V、電流値1.54A〜2.09A、電解時間1.5分〜5分で電解めっきしたところ、無光沢の黒色皮膜が得られた、としている。 Specifically, for example, in Patent Document 1, 200 to 600 g / l of chromium chloride (CrCl 3 ) as a source of trivalent chromium, 10 g / l of barium carbonate as a catalyst, and 10 of ammonium formate as a complexing agent. Prepare a plating solution using ~ 30 g / l, use platinum-plated titanium as the anode, use a thin steel plate as the cathode, that is, the member to be plated, set the liquid temperature to 0 ° C to -4 ° C, voltage 15V, current value When electroplating was performed at 1.54 A to 2.09 A and an electrolysis time of 1.5 minutes to 5 minutes, a matte black film was obtained.
また、特許文献2においては、塩化クロムを150〜300g/l、亜硫酸ナトリウムを0〜50g/l、亜硫酸カリウムを0〜100g/l、ヨウ化カリウムを10〜20g/l使用しためっき液を作製し、陽極に不溶性アノードを用い、陰極すなわち被めっき部材として鋼板を使用して、液温を30℃〜50℃とし、電流密度2〜50A/dm2、電解時間5分で電解めっきしたところ、均一で緻密な無光沢の黒色皮膜が得られた、としている。 In Patent Document 2, a plating solution using 150 to 300 g / l of chromium chloride, 0 to 50 g / l of sodium sulfite, 0 to 100 g / l of potassium sulfite, and 10 to 20 g / l of potassium iodide is prepared. Then, using an insoluble anode as an anode, using a steel plate as a cathode, that is, a member to be plated, the liquid temperature was set to 30 ° C. to 50 ° C., the current density was 2 to 50 A / dm 2 , and electroplating was performed at an electrolysis time of 5 minutes. It is said that a uniform and dense matte black film was obtained.
更に、特許文献3においては、塩化クロムを200g/dm3(0.75mol/dm3)、塩化アンモニウムを30g/dm3(0.56mol/dm3)、シュウ酸を3g/dm3(0.024mol/dm3)、炭酸バリウムを5g/dm3(0.025mol/dm3)、ホウ酸を30g/dm3(0.49mol/dm3)、フッ化バリウムを10g/dm3(0.057mol/dm3)使用しためっき液を作製し、陽極にグラファイト電極を用い、陰極すなわち被めっき部材として鋼板を使用して、液温を−10℃〜10℃とし、電流密度33A/dm2で電解めっきしたところ、黒色度が高く均一で密着力も良好な黒色めっき膜が得られた、としている。 Further, in Patent Document 3, chromium chloride is 200 g / dm 3 (0.75 mol / dm 3 ), ammonium chloride is 30 g / dm 3 (0.56 mol / dm 3 ), and oxalic acid is 3 g / dm 3 (0. 024 mol / dm 3 ), barium carbonate 5 g / dm 3 (0.025 mol / dm 3 ), boric acid 30 g / dm 3 (0.49 mol / dm 3 ), and barium fluoride 10 g / dm 3 (0.057 mol). / Dm 3 ) The used plating solution is prepared, a graphite electrode is used as the anode, a steel plate is used as the cathode, that is, a member to be plated, the temperature of the solution is −10 ° C. to 10 ° C., and electrolysis is performed at a current density of 33 A / dm 2 . When plated, a black plating film having high blackness, uniformity, and good adhesion was obtained.
しかしながら、本発明者らが確認試験を行なったところ、上記特許文献1に記載の技術においては、出来栄えが不安定で、黒色部と銀白部とが斑に存在する不均一なめっき膜となり、均一な黒色皮膜を生成できない場合があり、やや不安定であった。また、上記特許文献2に記載の技術においては、黒色皮膜は生成するが、めっき液組成に起因する亜硫酸ガスの発生があり、かつその成分の消耗が激しいのか黒色皮膜の生成も2、3回目まででめっき液の安定性にも問題あるのではないかと思われる。更に、上記特許文献3に記載の技術においては、均一なめっき膜が得られたものの、やや灰色がかった色調で黒色度が従来の六価クロム液での皮膜のレベルまでには再現できなかった。このように、上記の従来技術においては、均一な黒色皮膜を繰り返して確実に得ることができないという問題点があった。 However, when the present inventors conducted a confirmation test, in the technique described in Patent Document 1 described above, the quality is unstable, and the black portion and the silver-white portion are unevenly plated, resulting in a uniform plating film. Some black films could not be produced, which was somewhat unstable. In the technique described in Patent Document 2, a black film is formed, but there is generation of sulfurous acid gas due to the composition of the plating solution, and the consumption of the components is severe, or the black film is also generated for the second and third times. It seems that there is a problem with the stability of the plating solution. Furthermore, in the technique described in Patent Document 3, although a uniform plating film was obtained, the blackness with a slightly grayish color tone could not be reproduced to the level of the film with the conventional hexavalent chromium solution. . As described above, the above-described conventional technique has a problem that a uniform black film cannot be obtained reliably and repeatedly.
そこで、本発明は、かかる課題を解決すべくなされたものであって、6価クロムフリーの条件下において、黒色度が高く均一で再現性良く繰り返し処理することができ、防錆性等の皮膜特性に優れた黒色めっき皮膜及びその皮膜形成方法を提供することを目的とするものである。 Therefore, the present invention has been made to solve such problems, and can be repeatedly processed with high blackness, uniformity and good reproducibility under a hexavalent chromium-free condition, and a film having antirust properties, etc. An object of the present invention is to provide a black plating film having excellent characteristics and a method for forming the film.
請求項1の発明に係る黒色めっき皮膜は、クロム金属及び/または3価クロム酸化物及び/または3価クロム水和物と、コバルト金属及び/またはコバルト酸化物及び/またはコバルト水和物とを含有し、6価クロム化合物を含有しないものである。 The black plating film according to the invention of claim 1 comprises chromium metal and / or trivalent chromium oxide and / or trivalent chromium hydrate, cobalt metal and / or cobalt oxide and / or cobalt hydrate. Contains, and does not contain a hexavalent chromium compound.
ここで、「クロム金属及び/または3価クロム酸化物及び/または3価クロム水和物を含有し」とは、クロム金属、3価クロム酸化物、3価クロム水和物のうちいずれか1つを含有する場合、いずれか2つを含有する場合、3つとも含有する場合を全て含む意味であり、同様に「コバルト金属及び/またはコバルト酸化物及び/またはコバルト水和物を含有し」とは、コバルト金属、コバルト酸化物、コバルト水和物のうちいずれか1つを含有する場合、いずれか2つを含有する場合、3つとも含有する場合を全て含む意味である。 Here, “containing chromium metal and / or trivalent chromium oxide and / or trivalent chromium hydrate” means any one of chromium metal, trivalent chromium oxide and trivalent chromium hydrate. In the case of containing any two, it means that all three are contained, and similarly contains "cobalt metal and / or cobalt oxide and / or cobalt hydrate". The term "means" includes any one of cobalt metal, cobalt oxide, and cobalt hydrate, all two, and all three.
請求項2の発明に係る黒色めっき皮膜は、請求項1の構成において、前記クロム金属及び/または3価クロム酸化物及び/または3価クロム水和物を合計で15重量%〜85重量%の範囲内で含有し、前記コバルト金属及び/またはコバルト酸化物及び/またはコバルト水和物を合計で15重量%〜85重量%の範囲内で含有するものである。 According to a second aspect of the present invention, there is provided the black plating film according to the first aspect, wherein the chromium metal and / or the trivalent chromium oxide and / or the trivalent chromium hydrate is a total of 15% by weight to 85% by weight. The cobalt metal and / or cobalt oxide and / or cobalt hydrate is contained within a total range of 15% by weight to 85% by weight.
請求項3の発明に係る黒色めっき皮膜の形成方法は、被めっき部材に脱脂または脱脂及び酸洗浄の前処理等を施した後にめっき液に浸漬して電解めっきすることによって前記被めっき部材に黒色めっき皮膜を形成させる方法であって、前記めっき液は、塩化クロムを150g/l以上飽和溶液量の範囲内、より好ましくは180g/l以上飽和溶液量の範囲内で、水酸化カリウム及び/または水酸化ナトリウムを合計で5g/l〜100g/lの範囲内、より好ましくは合計で10g/l〜50g/lの範囲内で、塩基性炭酸コバルトを3g/l〜100g/lの範囲内、より好ましくは8g/l〜100g/lの範囲内で、それぞれ含有し、前記めっき液の温度が0℃〜60℃、電流密度が3A/dm2〜40A/dm2の範囲内の条件において電解めっきするものである。 According to a third aspect of the present invention, there is provided a method for forming a black plating film, comprising subjecting a member to be plated to degreasing or degreasing and pretreatment for acid cleaning, etc. A method of forming a plating film, wherein the plating solution comprises chromium chloride in a saturated solution amount range of 150 g / l or more, more preferably in a range of 180 g / l or more saturated solution amount, potassium hydroxide and / or Sodium hydroxide in the range of 5 g / l to 100 g / l, more preferably in the range of 10 g / l to 50 g / l, and basic cobalt carbonate in the range of 3 g / l to 100 g / l, more preferably in the range of 8 g / to 100 g / l, respectively containing, temperature 0 ° C. to 60 ° C. of the plating solution, the conditions within a current density of 3A / dm 2 ~40A / dm 2 Is intended to electrolytic plating have.
請求項4の発明に係る黒色めっき皮膜の形成方法は、請求項3の構成において、前記めっき液は、更に炭酸バリウムまたは水酸化バリウムを1g/l〜30g/lの範囲内、より好ましくは3g/l〜10g/lの範囲内で含有するものである。 The method for forming a black plating film according to the invention of claim 4 is the structure of claim 3, wherein the plating solution further contains barium carbonate or barium hydroxide in the range of 1 g / l to 30 g / l, more preferably 3 g. / L to 10 g / l.
請求項5の発明に係る黒色めっき皮膜の形成方法は、請求項3または請求項4の構成において、前記めっき液は、更に二酸化マンガンを30g/l〜120g/lの範囲内、より好ましくは50g/l〜80g/lの範囲内で含有するものである。 The method for forming a black plating film according to the invention of claim 5 is the structure of claim 3 or claim 4, wherein the plating solution further contains manganese dioxide in a range of 30 g / l to 120 g / l, more preferably 50 g. / L to 80 g / l.
請求項1の発明に係る黒色めっき皮膜は、クロム金属及び/または3価クロム酸化物及び/または3価クロム水和物と、コバルト金属及び/またはコバルト酸化物及び/またはコバルト水和物とを含有し、6価クロム化合物を含有しないことから、6価クロムフリーの条件下において、均一で黒色度に優れた黒色めっき皮膜を繰り返し得ることができる。 The black plating film according to the invention of claim 1 comprises chromium metal and / or trivalent chromium oxide and / or trivalent chromium hydrate, cobalt metal and / or cobalt oxide and / or cobalt hydrate. Since it contains and does not contain a hexavalent chromium compound, a uniform black plating film excellent in blackness can be obtained repeatedly under conditions of hexavalent chromium free.
すなわち、本発明者らは、黒色めっき皮膜の形成方法について、実験研究を重ねた結果、3価クロム化合物とコバルト化合物とをめっき液に含有させて電解めっきを実施することによって、クロムとコバルトとを含有する均一なめっき皮膜が得られ、このめっき皮膜は無光沢の黒色を示すことを見出し、この知見に基づいて本発明を完成させたものである。 That is, as a result of repeated experimental research on the method for forming a black plating film, the present inventors have carried out electroplating by adding a trivalent chromium compound and a cobalt compound to a plating solution, thereby providing chromium and cobalt. The present invention has been completed based on this finding, and it was found that this plating film exhibits a matte black color.
このようにして、6価クロムフリーの条件下において、黒色度が高く均一で再現性良く繰り返し製造することができ、防錆性等の皮膜特性に優れた黒色めっき皮膜となる。 In this way, under black hexavalent chromium-free conditions, the blackness is high and can be repeatedly produced with high uniformity and reproducibility, resulting in a black plating film excellent in film properties such as rust prevention.
請求項2の発明に係る黒色めっき皮膜は、クロム金属及び/または3価クロム酸化物及び/または3価クロム水和物を合計で15重量%〜85重量%の範囲内で含有し、コバルト金属及び/またはコバルト酸化物及び/またはコバルト水和物を合計で15重量%〜85重量%の範囲内で含有することから、クロムとコバルトとによる均一で黒色度に優れた黒色めっき皮膜を、より確実に得ることができる。 The black plating film according to the invention of claim 2 contains chromium metal and / or trivalent chromium oxide and / or trivalent chromium hydrate in a total amount of 15 wt% to 85 wt%, cobalt metal And / or cobalt oxide and / or cobalt hydrate in a total amount within the range of 15 wt% to 85 wt%, a more uniform black plating film with excellent blackness due to chromium and cobalt is obtained. You can definitely get it.
請求項3の発明に係る黒色めっき皮膜の形成方法について、本発明者らは、実験研究を重ねた結果、塩化クロムを150g/l以上飽和溶液量の範囲内で、水酸化カリウム及び/または水酸化ナトリウムを合計で5g/l〜100g/lの範囲内で、塩基性炭酸コバルトを3g/l〜100g/lの範囲内で、それぞれ含有するめっき液を用いて、めっき液の温度が0℃〜60℃、電流密度が3A/dm2〜40A/dm2の範囲内の条件において電解めっきすることによって、安定してクロムとコバルトとを含有する均一なめっき皮膜が得られ、このめっき皮膜は無光沢の黒色を示すことを見出し、この知見に基づいて本発明を完成させたものである。 As for the method for forming a black plating film according to the invention of claim 3, the present inventors have conducted experimental research, and as a result, have made chromium chloride and / or water within a range of 150 g / l or more of saturated solution. The temperature of the plating solution is 0 ° C. using a plating solution containing sodium oxide within a total range of 5 g / l to 100 g / l and basic cobalt carbonate within a range of 3 g / l to 100 g / l. A uniform plating film containing chromium and cobalt can be stably obtained by electrolytic plating under the conditions of ˜60 ° C. and current density within the range of 3 A / dm 2 to 40 A / dm 2. The present invention has been completed on the basis of the finding of matte black.
なお、塩化クロムを180g/l以上飽和溶液量の範囲内で、水酸化カリウム及び/または水酸化ナトリウムを合計で10g/l〜50g/lの範囲内で、塩基性炭酸コバルトを8g/l〜100g/lの範囲内で、それぞれ含有するめっき液を用いることによって、より確実に安定して均一な黒色度に優れた黒色めっき皮膜を得ることができるため、より好ましい結果が得られる。 Note that chromium chloride is within a range of 180 g / l or more of saturated solution, potassium hydroxide and / or sodium hydroxide is within a total range of 10 g / l to 50 g / l, and basic cobalt carbonate is 8 g / l to By using a plating solution contained within the range of 100 g / l, a more preferable result can be obtained because a black plating film having excellent and uniform blackness can be obtained more reliably and stably.
このようにして、6価クロムフリーの条件下において、安定して黒色度が高く均一で再現性良く繰り返し製造することができ、防錆性等の皮膜特性に優れた黒色めっき皮膜の形成方法となる。 In this way, under the condition of hexavalent chromium free, a method for forming a black plating film that can be stably and repeatedly produced with high blackness, uniformity, and reproducibility, and excellent in film properties such as rust prevention, Become.
請求項4の発明に係る黒色めっき皮膜の形成方法においては、めっき液が更に炭酸バリウムまたは水酸化バリウムを1g/l〜30g/lの範囲内で含有することから、めっき液の導電性が向上し、請求項3に係る発明の効果に加えて、より確実に、繰り返し黒色めっき皮膜を形成することができる。なお、炭酸バリウムまたは水酸化バリウムを3g/l〜10g/lの範囲内で含有するめっき液を用いることによって、より確実に均一で黒色度に優れた黒色めっき皮膜を得ることができるため、より好ましい。 In the method for forming a black plating film according to the invention of claim 4, since the plating solution further contains barium carbonate or barium hydroxide in the range of 1 g / l to 30 g / l, the conductivity of the plating solution is improved. And in addition to the effect of the invention which concerns on Claim 3, a black plating film can be formed more reliably and more reliably. In addition, since the plating solution containing barium carbonate or barium hydroxide in the range of 3 g / l to 10 g / l can be used, a black plating film having more uniform and excellent blackness can be obtained more reliably. preferable.
請求項5の発明に係る黒色めっき皮膜の形成方法においては、めっき液が更に二酸化マンガンを30g/l〜120g/lの範囲内で含有することから、請求項3または請求項4に係る発明の効果に加えて、より黒色度に優れた黒色めっき皮膜を繰り返し製造することができる。なお、二酸化マンガンを50g/l〜80g/lの範囲内で含有するめっき液を用いることによって、より確実に均一で黒色度に優れた黒色めっき皮膜を得ることができるため、より好ましい。 In the method for forming a black plating film according to the invention of claim 5, since the plating solution further contains manganese dioxide within the range of 30 g / l to 120 g / l, the invention according to claim 3 or claim 4 is used. In addition to the effect, it is possible to repeatedly produce a black plating film with more excellent blackness. In addition, it is more preferable to use a plating solution containing manganese dioxide in the range of 50 g / l to 80 g / l because a black plating film having more uniform and excellent blackness can be obtained more reliably.
以下、本発明の実施の形態について説明する。まず、本発明の実施の形態に係る黒色めっき皮膜の形成方法について、図1を参照して説明する。図1は、本発明の実施の形態に係る黒色めっき皮膜の形成方法の概略を示すフローチャートである。 Hereinafter, embodiments of the present invention will be described. First, a method for forming a black plating film according to an embodiment of the present invention will be described with reference to FIG. FIG. 1 is a flowchart showing an outline of a black plating film forming method according to an embodiment of the present invention.
図1に示されるように、まず、黒色めっき皮膜で被覆する被めっき部材10を、アルカリ系脱脂洗浄剤に浸漬させて脱脂洗浄し、被めっき部材10に付着する油分・汚れの除去を行う(ステップS10)。続いて、水洗して被めっき部材10に付着するアルカリ系脱脂洗浄剤を一旦除去し(ステップS11)、再びアルカリ系脱脂洗浄剤に浸漬させて、直流電源装置を使用して電解脱脂し、被めっき部材10に付着する油分・汚れを更に除去する(ステップS12)。 As shown in FIG. 1, first, a member to be plated 10 to be coated with a black plating film is immersed in an alkaline degreasing cleaner and degreased to remove oil and dirt attached to the member to be plated 10 ( Step S10). Subsequently, the alkaline degreasing cleaner adhering to the member to be plated 10 is removed by washing with water (step S11), dipped in the alkaline degreasing cleaner again, electrolytically degreased using a DC power supply device, Oil and dirt adhering to the plating member 10 are further removed (step S12).
次に、再び水洗して(ステップS13)、被めっき部材10に付着するアルカリ系脱脂洗浄剤を除去した後、塩酸に浸漬して酸洗浄し被めっき部材10の錆・酸化皮膜等の除去を行い(ステップS14)、水洗して(ステップS15)、被めっき部材10に付着する酸洗浄剤を除去した後、めっき槽内のめっき液11(塩化クロム、炭酸コバルト、水酸化カリウム、水酸化ナトリウム、炭酸バリウムを含有する)に浸漬して直流電流を一定時間流して電解めっきを実施する(ステップS16)。 Next, after washing again with water (step S13) and removing the alkaline degreasing cleaner adhering to the member to be plated 10, it is immersed in hydrochloric acid and washed with acid to remove the rust, oxide film, etc. of the member to be plated 10. After performing (Step S14), washing with water (Step S15) and removing the acid cleaning agent adhering to the member to be plated 10, the plating solution 11 (chromium chloride, cobalt carbonate, potassium hydroxide, sodium hydroxide in the plating tank) Then, it is immersed in (containing barium carbonate) and a direct current is allowed to flow for a certain period of time to perform electroplating (step S16).
電解めっきが完了したら、めっき済み部材12をめっき槽から取り出して水洗し(ステップS17)、更に湯洗して(ステップS18)、付着しているめっき液11を除去する。そして、温風発生装置を使用してめっき済み部材12を乾燥し(ステップS19)、めっき済み部材11に付着している水分を除去する。これによって、黒色めっき製品13が完成する。 When the electroplating is completed, the plated member 12 is removed from the plating tank, washed with water (step S17), and further rinsed with hot water (step S18) to remove the attached plating solution 11. And the plated member 12 is dried using a warm air generator (step S19), and the moisture adhering to the plated member 11 is removed. Thereby, the black plating product 13 is completed.
次に、本実施の形態に係るめっき液の具体的な配合について、詳細に説明する。実施例1の配合として、塩化クロム六水和物220g/l、水酸化カリウム10g/l、水酸化ナトリウム10g/l、二酸化マンガン80g/l、炭酸バリウム3g/l、塩基性炭酸コバルト8g/lの濃度で純水に溶解して、めっき液を調製した。また、実施例2の配合として、塩化クロム六水和物220g/l、水酸化カリウム10g/l、水酸化ナトリウム10g/l、炭酸バリウム3g/l、塩基性炭酸コバルト8g/lの濃度で純水に溶解して、めっき液を調製した。 Next, a specific composition of the plating solution according to the present embodiment will be described in detail. As a formulation of Example 1, chromium chloride hexahydrate 220 g / l, potassium hydroxide 10 g / l, sodium hydroxide 10 g / l, manganese dioxide 80 g / l, barium carbonate 3 g / l, basic cobalt carbonate 8 g / l A plating solution was prepared by dissolving in pure water at a concentration of 5%. In addition, the composition of Example 2 was pure at concentrations of chromium chloride hexahydrate 220 g / l, potassium hydroxide 10 g / l, sodium hydroxide 10 g / l, barium carbonate 3 g / l, basic cobalt carbonate 8 g / l. A plating solution was prepared by dissolving in water.
更に、実施例3の配合として、塩化クロム六水和物220g/l、水酸化カリウム10g/l、水酸化ナトリウム10g/l、二酸化マンガン60g/l、炭酸バリウム3g/l、塩基性炭酸コバルト6g/l、シュウ酸50g/lの濃度で純水に溶解して、めっき液を調製した。 Further, the composition of Example 3 was as follows: chromium chloride hexahydrate 220 g / l, potassium hydroxide 10 g / l, sodium hydroxide 10 g / l, manganese dioxide 60 g / l, barium carbonate 3 g / l, basic cobalt carbonate 6 g / L and oxalic acid at a concentration of 50 g / l were dissolved in pure water to prepare a plating solution.
また、実施例4の配合として、塩化クロム六水和物160g/l、水酸化カリウム10g/l、水酸化ナトリウム10g/l、二酸化マンガン80g/l、炭酸バリウム3g/l、塩基性炭酸コバルト8g/lの濃度で純水に溶解して、めっき液を調製した。更に、実施例5の配合として、塩化クロム六水和物150g/l、水酸化カリウム10g/l、水酸化ナトリウム10g/l、二酸化マンガン80g/l、炭酸バリウム3g/l、塩基性炭酸コバルト8g/lの濃度で純水に溶解して、めっき液を調製した。 Further, the composition of Example 4 was as follows: chromium chloride hexahydrate 160 g / l, potassium hydroxide 10 g / l, sodium hydroxide 10 g / l, manganese dioxide 80 g / l, barium carbonate 3 g / l, basic cobalt carbonate 8 g A plating solution was prepared by dissolving in pure water at a concentration of / l. Further, the composition of Example 5 was as follows: chromium chloride hexahydrate 150 g / l, potassium hydroxide 10 g / l, sodium hydroxide 10 g / l, manganese dioxide 80 g / l, barium carbonate 3 g / l, basic cobalt carbonate 8 g A plating solution was prepared by dissolving in pure water at a concentration of / l.
比較のため、比較例1〜比較例3の配合のめっき液をも作製して、電解めっきを行った。比較例1は塩化クロム濃度限界確認実験の配合例で、塩化クロム六水和物140g/l、水酸化カリウム10g/l、水酸化ナトリウム10g/l、二酸化マンガン80g/l、炭酸バリウム3g/l、塩基性炭酸コバルト8g/lの濃度で純水に溶解して、めっき液を調製した。 For comparison, a plating solution having the composition of Comparative Examples 1 to 3 was also prepared and electroplated. Comparative Example 1 is a blending example of the chromium chloride concentration limit confirmation experiment, chromium chloride hexahydrate 140 g / l, potassium hydroxide 10 g / l, sodium hydroxide 10 g / l, manganese dioxide 80 g / l, barium carbonate 3 g / l. A plating solution was prepared by dissolving in pure water at a concentration of 8 g / l of basic cobalt carbonate.
また、比較例2は黒色膜形成基本組成検証実験の配合として、塩化クロム六水和物220g/l、水酸化カリウム10g/l、水酸化ナトリウム10g/lの濃度で純水に溶解してめっき液を調製した。更に黒色膜形成基本組成検証実験となる、比較例3の配合として、塩化クロム六水和物220g/l、及び塩基性炭酸コバルト8g/lの濃度で純水に溶解してめっき液を調製した。実施例1〜実施例5及び比較例1〜比較例3の配合について、表1の上段に示す。 Further, Comparative Example 2 was prepared by dissolving in pure water at a concentration of 220 g / l of chromium chloride hexahydrate, 10 g / l of potassium hydroxide, and 10 g / l of sodium hydroxide as a composition for the basic composition verification experiment for forming a black film. A liquid was prepared. Further, as a composition of Comparative Example 3, which is a black film formation basic composition verification experiment, a plating solution was prepared by dissolving in pure water at a concentration of 220 g / l of chromium chloride hexahydrate and 8 g / l of basic cobalt carbonate. . About the mixing | blending of Example 1- Example 5 and Comparative Example 1- Comparative Example 3, it shows in the upper stage of Table 1. FIG.
表1の上段に示されるように、実施例2の配合は、実施例1の配合から二酸化マンガンを除いたものであり、実施例3の配合は、実施例1の配合に対して塩基性炭酸コバルト及び二酸化マンガンの量を減らすとともに、還元剤としてシュウ酸を加えたものである。更に、実施例4の配合は、実施例1の配合に対して塩化クロム六水和物の量を160g/lと減らしたものであり、実施例5の配合は塩化クロム六水和物の量を更に150g/lと減らしたものである。 As shown in the upper part of Table 1, the formulation of Example 2 is obtained by removing manganese dioxide from the formulation of Example 1, and the formulation of Example 3 is a basic carbonate with respect to the formulation of Example 1. While reducing the amount of cobalt and manganese dioxide, oxalic acid is added as a reducing agent. Further, the formulation of Example 4 is obtained by reducing the amount of chromium chloride hexahydrate to 160 g / l with respect to the formulation of Example 1, and the formulation of Example 5 is the amount of chromium chloride hexahydrate. Is further reduced to 150 g / l.
また、比較例1の配合は、実施例1の配合に対して塩化クロム六水和物の量を更に140g/lと減らしたものである。更に、比較例2の配合は、実施例1の配合から塩基性炭酸コバルト、二酸化マンガン、炭酸バリウムを除いたものであり、比較例3の配合は、実施例1の配合から水酸化カリウム、水酸化ナトリウム、二酸化マンガン、炭酸バリウムを除いたものであり、塩化クロム六水和物及び塩基性炭酸コバルトのみからなるものである。 Further, the blend of Comparative Example 1 is obtained by further reducing the amount of chromium chloride hexahydrate to 140 g / l with respect to the blend of Example 1. Further, the formulation of Comparative Example 2 was obtained by removing the basic cobalt carbonate, manganese dioxide, and barium carbonate from the formulation of Example 1, and the formulation of Comparative Example 3 was the same as that of Example 1 with potassium hydroxide and water. It excludes sodium oxide, manganese dioxide and barium carbonate, and consists only of chromium chloride hexahydrate and basic cobalt carbonate.
これらのめっき液をめっき浴として、被めっき部材10として軟鋼鉄板(50mm×67mm×0.3mm)を用いて、めっき液に電流密度20A/dm2で直流電流を流して、10分間電解めっきを行った。陽極材質としては、グラファイト・カーボンを使用した。また、めっき液の温度を測定したが、10分間の電解めっきの間、めっき液の温度は10℃〜30℃の範囲内に保たれた。その結果得られためっき皮膜を、図2〜図9に示す。 Using these plating solutions as a plating bath, using a mild steel plate (50 mm × 67 mm × 0.3 mm) as the member to be plated 10, a direct current is passed through the plating solution at a current density of 20 A / dm 2 and electrolytic plating is performed for 10 minutes. went. Graphite carbon was used as the anode material. Moreover, although the temperature of the plating solution was measured, the temperature of the plating solution was kept within a range of 10 ° C. to 30 ° C. during the electroplating for 10 minutes. The obtained plating film is shown in FIGS.
図2は、実施例1に係るめっき液を用いて電解めっきして得られためっき皮膜の表面を示す写真である。図3は、実施例2に係るめっき液を用いて電解めっきして得られためっき皮膜の表面を示す写真である。図4は、実施例3に係るめっき液を用いて電解めっきして得られためっき皮膜の表面を示す写真である。図5は、実施例4に係るめっき液を用いて電解めっきして得られためっき皮膜の表面を示す写真である。図6は、実施例5に係るめっき液を用いて電解めっきして得られためっき皮膜の表面を示す写真である。図7は、比較例1のめっき液を用いて電解めっきして得られためっき皮膜の表面を示す写真である。図8は、比較例2のめっき液を用いて電解めっきして得られためっき皮膜の表面を示す写真である。図9は、比較例3のめっき液を用いて電解めっきして得られためっき皮膜の表面を示す写真である。 FIG. 2 is a photograph showing the surface of the plating film obtained by electrolytic plating using the plating solution according to Example 1. 3 is a photograph showing the surface of a plating film obtained by electrolytic plating using the plating solution according to Example 2. FIG. FIG. 4 is a photograph showing the surface of the plating film obtained by electrolytic plating using the plating solution according to Example 3. FIG. 5 is a photograph showing the surface of the plating film obtained by electrolytic plating using the plating solution according to Example 4. FIG. 6 is a photograph showing the surface of the plating film obtained by electrolytic plating using the plating solution according to Example 5. FIG. 7 is a photograph showing the surface of a plating film obtained by electrolytic plating using the plating solution of Comparative Example 1. FIG. 8 is a photograph showing the surface of the plating film obtained by electrolytic plating using the plating solution of Comparative Example 2. FIG. 9 is a photograph showing the surface of the plating film obtained by electrolytic plating using the plating solution of Comparative Example 3.
これらのめっき皮膜の評価を、表1の下段にまとめて示す。図2,図3,図4に示されるように、実施例1乃至実施例3に係るめっき液を用いて電解めっきして得られためっき皮膜は、いずれも黒色度・均一性ともに非常に優れており、◎の評価である。なお、これらのめっき液を繰り返し用いて、図1のフローチャートにしたがって電解めっきを行ったところ、めっき液を10回使用しても、得られるめっき皮膜の黒色度・均一性は変化しなかった。 The evaluation of these plating films is summarized in the lower part of Table 1. As shown in FIGS. 2, 3, and 4, the plating films obtained by electrolytic plating using the plating solutions according to Examples 1 to 3 are both excellent in blackness and uniformity. It is evaluated as ◎. In addition, when these plating solutions were repeatedly used and electrolytic plating was performed according to the flowchart of FIG. 1, even when the plating solution was used 10 times, the blackness and uniformity of the resulting plating film did not change.
また、図5,図6に示されるように、実施例4及び実施例5に係るめっき液を用いて電解めっきして得られためっき皮膜は、いずれも黒色度・均一性ともにまずまずであり、○の評価である。実施例4及び実施例5に係るめっき皮膜を、実施例1に係るめっき皮膜と比較すると、やはり塩化クロム六水和物の濃度は180g/l以上であることがより好ましいことが分かる。実施例4及び実施例5に係るめっき液を繰り返し用いて、図1のフローチャートにしたがって電解めっきを行ったところ、めっき液を10回使用しても、得られるめっき皮膜の黒色度・均一性は変化しなかった。 In addition, as shown in FIGS. 5 and 6, the plating films obtained by electrolytic plating using the plating solutions according to Example 4 and Example 5 are all reasonable in blackness and uniformity. It is an evaluation of ○. When the plating films according to Example 4 and Example 5 are compared with the plating film according to Example 1, it is found that the concentration of chromium chloride hexahydrate is more preferably 180 g / l or more. When the plating solution according to Example 4 and Example 5 was repeatedly used and electrolytic plating was performed according to the flowchart of FIG. 1, the blackness / uniformity of the obtained plating film was obtained even when the plating solution was used 10 times. It did not change.
これに対して、図7に示されるように、比較例1のめっき液を用いて電解めっきして得られためっき皮膜は、全体に皮膜が付着しておらず、黒色度はあるが均一ではなく、塩化クロム六水和物の量が不足していることが分かる。また、図8に示されるように、比較例2のめっき液を用いて電解めっきして得られためっき皮膜は、茶褐色である上にムラが生じている。更に、図9に示されるように、比較例3のめっき液を用いて電解めっきして得られためっき皮膜は、やはり茶褐色である上にムラが生じており、黒色度・均一性ともに劣っている。 On the other hand, as shown in FIG. 7, the plating film obtained by electroplating using the plating solution of Comparative Example 1 does not adhere to the whole and has a blackness but is not uniform. It can be seen that the amount of chromium chloride hexahydrate is insufficient. As shown in FIG. 8, the plating film obtained by electrolytic plating using the plating solution of Comparative Example 2 is brown and has unevenness. Furthermore, as shown in FIG. 9, the plating film obtained by electroplating using the plating solution of Comparative Example 3 is still brown and uneven, and the blackness and uniformity are inferior. Yes.
また、防錆性を評価するために、実施例1に係るめっき液を用いて電解めっきして得られためっき皮膜について、塩水噴霧試験を実施した。試験方法は、JIS−Z−2371塩水噴霧試験方法の7.2.1「中性塩水噴霧試験」に準拠して実施した。その結果、12時間経過後までは全く錆が発生せず、めっき皮膜が密着性及び防錆性に優れていることが明らかになった。 Moreover, in order to evaluate rust prevention property, the salt spray test was implemented about the plating film obtained by electroplating using the plating solution which concerns on Example 1. FIG. The test method was carried out in accordance with 7.2.1 “Neutral salt spray test” of JIS-Z-2371 salt spray test method. As a result, it was clarified that no rust was generated at all after 12 hours and the plating film was excellent in adhesion and rust prevention.
このようにして、本実施の形態に係る黒色めっき皮膜及びその形成方法においては、6価クロムフリーの条件下において、黒色度が高く均一で再現性良く繰り返し製造することができ、防錆性等の皮膜特性に優れた黒色めっき皮膜を得ることができる。 In this way, in the black plating film and the method for forming the same according to the present embodiment, it can be repeatedly produced with high blackness, uniformity and good reproducibility under hexavalent chromium-free conditions, rust prevention, etc. A black plating film having excellent film properties can be obtained.
本実施の形態においては、めっき液に炭酸バリウムを含有する実施例1乃至実施例5に係る配合のみについて説明したが、炭酸バリウムを全く使用しない配合においても、同様に黒色度が高く均一な黒色めっき皮膜を得ることができる。 In the present embodiment, only the formulations according to Examples 1 to 5 containing barium carbonate in the plating solution have been described. However, even in a formulation that does not use barium carbonate at all, the blackness is similarly high and uniform black. A plating film can be obtained.
また、本実施の形態においては、水酸化カリウムと水酸化ナトリウムを1リットル当たり10gずつ使用した場合について説明したが、水酸化カリウムと水酸化ナトリウムとを同量使用する必要はなく、更には水酸化カリウムと水酸化ナトリウムのいずれか一方のみを使用しても良い。 In the present embodiment, the case where 10 g of potassium hydroxide and sodium hydroxide are used per liter has been described. However, it is not necessary to use the same amount of potassium hydroxide and sodium hydroxide. Only one of potassium oxide and sodium hydroxide may be used.
本発明を実施するに際しては、黒色めっき皮膜のその他の部分の構成、組成、配合、成分、形状、数量、材質、大きさ、製造方法等についても、また黒色めっき皮膜の製造方法のその他の工程についても、本実施の形態及び各実施例に限定されるものではない。 In practicing the present invention, the composition, composition, composition, component, shape, quantity, material, size, manufacturing method, etc. of other parts of the black plating film, and other steps of the black plating film manufacturing method are also included. The present invention is not limited to this embodiment and each example.
なお、本発明の実施の形態で挙げている数値は、臨界値を示すものではなく、実施に好適な好適値を示すものであるから、上記数値を若干変更してもその実施を否定するものではない。 In addition, since the numerical value quoted in the embodiment of the present invention does not indicate a critical value but indicates a preferable value suitable for implementation, even if the numerical value is slightly changed, the implementation is denied. is not.
Claims (5)
コバルト金属及び/またはコバルト酸化物及び/またはコバルト水和物とを含有し、
6価クロム化合物を含有しないことを特徴とする黒色めっき皮膜。 Chromium metal and / or trivalent chromium oxide and / or trivalent chromium hydrate,
Containing cobalt metal and / or cobalt oxide and / or cobalt hydrate,
A black plating film characterized by not containing a hexavalent chromium compound.
前記めっき液は、塩化クロムを150g/l以上飽和溶液量の範囲内で、水酸化カリウム及び/または水酸化ナトリウムを合計で5g/l〜100g/lの範囲内で、塩基性炭酸コバルトを3g/l〜100g/lの範囲内で、それぞれ含有し、
前記めっき液の温度が0℃〜60℃、電流密度が3A/dm2〜40A/dm2の範囲内の条件において電解めっきすることを特徴とする黒色めっき皮膜の形成方法。 A method of forming a black plating film on the member to be plated by immersing the member to be plated in a plating solution and performing electrolytic plating,
The plating solution includes chromium chloride within a range of 150 g / l or more of saturated solution, potassium hydroxide and / or sodium hydroxide within a total range of 5 g / l to 100 g / l, and 3 g of basic cobalt carbonate. Within the range of / l to 100 g / l,
A method for forming a black plating film, characterized in that electroplating is carried out under conditions where the temperature of the plating solution is in the range of 0 to 60 ° C. and the current density is in the range of 3 A / dm 2 to 40 A / dm 2 .
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Cited By (7)
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JP2012154991A (en) * | 2011-01-24 | 2012-08-16 | Kyocera Document Solutions Inc | Developing device and image forming apparatus |
WO2013168528A1 (en) * | 2012-05-09 | 2013-11-14 | 奥野製薬工業株式会社 | BLACKENING TREATMENT SOLUTION FOR BLACK Cr-Co ALLOY PLATING FILM |
CN104254642A (en) * | 2012-05-09 | 2014-12-31 | 奥野制药工业株式会社 | Blackening treatment solution for black cr-co alloy plating film |
KR20150009966A (en) * | 2012-05-09 | 2015-01-27 | 오꾸노 케미칼 인더스트리즈 컴파니,리미티드 | BLACKENING TREATMENT SOLUTION FOR BLACK Cr-Co ALLOY PLATING FILM |
JPWO2013168528A1 (en) * | 2012-05-09 | 2016-01-07 | 奥野製薬工業株式会社 | Blackening solution for black Cr-Co alloy plating film |
KR101692262B1 (en) * | 2012-05-09 | 2017-01-17 | 오꾸노 케미칼 인더스트리즈 컴파니,리미티드 | BLACKENING TREATMENT SOLUTION FOR BLACK Cr-Co ALLOY PLATING FILM |
US9920416B2 (en) | 2012-05-09 | 2018-03-20 | Okuno Chemical Industries Co., Ltd. | Blackening treatment solution for black Cr—Co alloy plating film |
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