JP2010176115A - Display plate, thin-film transistor display plate, and method of repairing substrate - Google Patents
Display plate, thin-film transistor display plate, and method of repairing substrate Download PDFInfo
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- JP2010176115A JP2010176115A JP2009209910A JP2009209910A JP2010176115A JP 2010176115 A JP2010176115 A JP 2010176115A JP 2009209910 A JP2009209910 A JP 2009209910A JP 2009209910 A JP2009209910 A JP 2009209910A JP 2010176115 A JP2010176115 A JP 2010176115A
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- 239000000758 substrate Substances 0.000 title claims abstract description 68
- 238000000034 method Methods 0.000 title claims abstract description 50
- 239000010409 thin film Substances 0.000 title claims abstract description 21
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- 230000002209 hydrophobic effect Effects 0.000 claims description 26
- 230000002950 deficient Effects 0.000 claims description 16
- 230000007547 defect Effects 0.000 claims description 14
- 238000004519 manufacturing process Methods 0.000 claims description 14
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- 238000002508 contact lithography Methods 0.000 claims description 9
- 239000010408 film Substances 0.000 claims description 8
- 238000007641 inkjet printing Methods 0.000 claims description 7
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 6
- 238000011282 treatment Methods 0.000 claims description 5
- 238000009832 plasma treatment Methods 0.000 claims description 4
- 230000008439 repair process Effects 0.000 claims description 4
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 3
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims description 3
- -1 polydimethylsiloxane Polymers 0.000 claims description 3
- 230000008859 change Effects 0.000 abstract description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 25
- 239000003566 sealing material Substances 0.000 description 4
- 230000005684 electric field Effects 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
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- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 210000002858 crystal cell Anatomy 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 230000003760 hair shine Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
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- 125000005373 siloxane group Chemical group [SiH2](O*)* 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/50—Protective arrangements
- G02F2201/506—Repairing, e.g. with redundant arrangement against defective part
- G02F2201/508—Pseudo repairing, e.g. a defective part is brought into a condition in which it does not disturb the functioning of the device
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Liquid Crystal (AREA)
- Optical Filters (AREA)
- Printing Methods (AREA)
Abstract
Description
本発明は、表示板、薄膜トランジスター表示板および基板の修理方法に関する。 The present invention relates to a display panel, a thin film transistor display panel, and a method for repairing a substrate.
液晶表示装置は、現在最も広く使用されている平板表示装置のうちの一つであって、画素電極及び共通電極などの電場生成電極（ｆｉｅｌｄ ｇｅｎｅｒａｔｉｎｇ ｅｌｅｃｔｒｏｄｅ）が形成されている二枚の表示板と、その間に注入されている液晶層とを含む。液晶表示装置は、電場生成電極に電圧を印加して液晶層に電場を生成し、これを通じて液晶層の液晶分子の方向を決定して入射光の偏光を制御することによって、映像を表示する。 The liquid crystal display device is one of the most widely used flat panel display devices, and includes two display plates on which field generating electrodes such as a pixel electrode and a common electrode are formed. And a liquid crystal layer injected therebetween. The liquid crystal display device displays an image by applying a voltage to the electric field generating electrode to generate an electric field in the liquid crystal layer, thereby determining the direction of liquid crystal molecules in the liquid crystal layer and controlling the polarization of incident light.
また、液晶表示装置は、各画素電極と連結されているスイッチング素子と、スイッチング素子を制御して、画素電極に電圧を印加するためのゲート線及びデータ線などの多数の信号線とを含む。 The liquid crystal display device includes a switching element connected to each pixel electrode, and a number of signal lines such as a gate line and a data line for controlling the switching element to apply a voltage to the pixel electrode.
このような液晶表示装置を製造する工程で発生する多様な原因によって、画素が常に明るく表示されるホワイト不良が発生するが、これは目に付きやすい。したがって、目に付かないように、画素が常に暗く表示される黒色不良に変える修理を行なう。 Due to various causes that occur in the process of manufacturing such a liquid crystal display device, a white defect in which pixels are always displayed brightly occurs, which is easily noticeable. Therefore, in order not to be noticed, repair is performed to change the pixel to a black defect in which the pixel is always displayed dark.
現在は、黒色不良に変えるために、画素内に形成された修理用信号線または維持電極線及び画素電極をレーザーで短絡させる方法を利用している。 At present, in order to change to a black defect, a method of short-circuiting a repair signal line or a storage electrode line formed in a pixel and a pixel electrode with a laser is used.
しかし、信号線の幅が狭くなることによって、レーザーを利用した短絡の成功率が低下するという問題点がある。 However, there is a problem that the success rate of the short circuit using the laser is lowered due to the narrowing of the signal line.
したがって、本発明が解決しようとする技術的課題は、レーザーを利用せずに黒色不良に変える修理を容易に行なうことができる表示板、薄膜トランジスター表示板および基板の修理方法を提供することにある。 Therefore, a technical problem to be solved by the present invention is to provide a display panel, a thin film transistor display panel, and a method for repairing a substrate, which can be easily repaired to a black defect without using a laser. .
本発明の課題を達成するための表示板は、第１絶縁基板、第１絶縁基板に位置する複数の第１カラーフィルタおよび第１カラーフィルタと同一の層に形成された黒色第２カラーフィルタを含んだカラーフィルタを含む複数の画素からなる。
第１絶縁基板と向かい合う第２絶縁基板、第２絶縁基板上に位置する複数のゲート線、ゲート線と交差する複数のデータ線、ゲート線およびデータ線と連結されている複数の薄膜トランジスターをさらに含むことができる。
A display panel for achieving the object of the present invention includes a first insulating substrate, a plurality of first color filters located on the first insulating substrate, and a black second color filter formed in the same layer as the first color filter. It consists of a plurality of pixels including the included color filter.
A second insulating substrate facing the first insulating substrate; a plurality of gate lines located on the second insulating substrate; a plurality of data lines intersecting the gate lines; and a plurality of thin film transistors connected to the gate lines and the data lines Can be included.
第１および第２カラーフィルタは、隔壁によって取り囲まれる。
第２カラーフィルタからなる画素は、ホワイト不良を修理した画素である。
第２カラーフィルタを取り囲む隔壁の表面は疎水性であり、第２カラーフィルタを取り囲む隔壁の表面にシロキサンを含む疎水性膜が位置することができる。
The first and second color filters are surrounded by a partition wall.
A pixel formed of the second color filter is a pixel in which a white defect is repaired.
The surface of the partition wall surrounding the second color filter is hydrophobic, and the hydrophobic film containing siloxane can be located on the surface of the partition wall surrounding the second color filter.
前記課題を達成するための薄膜トランジスター表示板は、絶縁基板、絶縁基板上に位置する複数のゲート線、ゲート線と交差する複数のデータ線、ゲート線およびデータ線と連結されている複数の薄膜トランジスター、絶縁基板上に位置する複数の第１カラーフィルタおよび第１カラーフィルタと同一な層に形成された黒色第２カラーフィルタを含んだカラーフィルタを含む複数の画素からなる。 A thin film transistor array panel for achieving the above object includes an insulating substrate, a plurality of gate lines positioned on the insulating substrate, a plurality of data lines intersecting the gate lines, a plurality of thin films connected to the gate lines and the data lines It comprises a plurality of pixels including a transistor, a plurality of first color filters located on an insulating substrate, and a color filter including a black second color filter formed in the same layer as the first color filter.
第１および第２カラーフィルタは、隔壁によって取り囲まれ、第２カラーフィルタからなる画素は、ホワイト不良を修理した画素である。
第２カラーフィルタを取り囲む隔壁の表面は疎水性であり、第２カラーフィルタを取り囲む隔壁の表面にシロキサンを含む疎水性膜が位置することができる。
The first and second color filters are surrounded by a partition wall, and the pixel formed of the second color filter is a pixel in which a white defect is repaired.
The surface of the partition wall surrounding the second color filter is hydrophobic, and the hydrophobic film containing siloxane can be located on the surface of the partition wall surrounding the second color filter.
前記他の課題を達成するための本発明による基板の製造方法は、カラーフィルタを含む基板を製造する工程、複数の第１カラーフィルタのうちの一部を除去して空き空間を形成する工程、および空き空間に黒色インクを満たして第２カラーフィルタを形成する工程を含む。 A method of manufacturing a substrate according to the present invention for achieving the other object includes a step of manufacturing a substrate including a color filter, a step of removing a part of the plurality of first color filters to form an empty space, And a step of filling the empty space with black ink to form a second color filter.
空き空間の周辺を疎水化処理する工程をさらに含むことができ、疎水化処理は、プラズマ処理、インクジェット印刷、および接触印刷のうちの少なくとも一つである。
プラズマ処理は、ＳＦ６またはＣＦ４を使用して行なうことができる。
接触印刷は、疎水性溶液を準備する工程、疎水性溶液にスタンピング部材（ｓｔａｍｐｉｎｇ ｍｅｍｂｅｒ）を接触する工程、および空き空間の周辺に疎水性溶液が付着しているスタンピング部材を接触させる工程を含むことができる。
The method may further include a step of hydrophobizing the periphery of the empty space, and the hydrophobizing treatment is at least one of plasma processing, ink jet printing, and contact printing.
The plasma treatment can be performed using SF 6 or CF 4 .
Contact printing includes a step of preparing a hydrophobic solution, a step of bringing a stamping member into contact with the hydrophobic solution, and a step of bringing a stamping member having the hydrophobic solution attached around the empty space into contact with the stamping member. Can do.
カラーフィルタを含む基板を製造する工程は、基板を複数の領域に分離する隔壁を形成する工程と、隔壁によって分離された領域にカラーフィルタを形成する工程とを含み、スタンピング部材の平面形状は、空き空間を取り囲む隔壁の平面形状と同一である。
疎水性溶液は、シロキサンを含むことができ、疎水性溶液は、ポリジメチルシロキサンである。
The step of manufacturing the substrate including the color filter includes a step of forming a partition for separating the substrate into a plurality of regions, and a step of forming a color filter in the region separated by the partition, and the planar shape of the stamping member is It is the same as the planar shape of the partition wall surrounding the empty space.
The hydrophobic solution can include siloxane, and the hydrophobic solution is polydimethylsiloxane.
カラーフィルタを含む基板を製造する工程は、基板を複数の領域に分離する隔壁を形成する工程、および隔壁によって分離された領域にカラーフィルタを形成する工程を含むことができる。 The step of manufacturing a substrate including a color filter can include a step of forming a partition that separates the substrate into a plurality of regions, and a step of forming a color filter in a region separated by the partition.
空き空間の周辺を疎水化処理する工程において、疎水化処理は隔壁に行なうことができる。
カラーフィルタを含む表示板を製造する工程は、絶縁基板上にゲート線、ゲート線と交差するデータ線、そしてゲート線およびデータ線と連結される薄膜トランジスターを形成する工程、薄膜トランジスター上にカラーフィルタを形成する工程、およびカラーフィルタ上に画素電極を形成する工程を含むことができる。
In the process of hydrophobizing the periphery of the empty space, the hydrophobizing process can be performed on the partition walls.
The process of manufacturing the display panel including the color filter includes forming a gate line on the insulating substrate, a data line intersecting the gate line, and a thin film transistor connected to the gate line and the data line, and a color filter on the thin film transistor. And forming a pixel electrode on the color filter.
薄膜トランジスター上にカラーフィルタを形成する工程は、絶縁基板を複数の領域に分離する隔壁を形成する工程、および隔壁によって分離された領域にカラーフィルタを形成する工程を含むことができる。
空き空間の周辺を疎水化処理する工程において、疎水化処理は隔壁に行なうことができる。
The step of forming a color filter over the thin film transistor can include a step of forming a partition that separates the insulating substrate into a plurality of regions and a step of forming a color filter in a region separated by the partition.
In the process of hydrophobizing the periphery of the empty space, the hydrophobizing process can be performed on the partition walls.
本発明の実施例でのように、黒色インクを利用すれば、信号線の幅が狭くなっても失敗せずに容易に画素の不良を修理することができる。
また、本発明でのような方法で黒色画素を形成すれば、黒色インクによって隣接画素が汚染されるのを防止することができて、高品質の液晶表示装置を提供することができる。
As in the embodiment of the present invention, when black ink is used, defective pixels can be easily repaired without failure even if the width of the signal line is reduced.
Further, when black pixels are formed by the method of the present invention, it is possible to prevent the adjacent pixels from being contaminated by black ink, and to provide a high-quality liquid crystal display device.
以下、添付図面を参考にして、本発明の実施例について、本発明の属する技術分野で通常の知識を有する者が容易に実施することができるように詳しく説明する。しかしながら、本発明は、様々な相異した形態で具現でき、ここで説明する実施例に限られない。
図面においては、多様な層および領域を明確に表現するために、厚さを拡大して示した。明細書全体にわたって類似した部分には、同一な符号を付けた。層、膜、領域、板などの部分が他の部分の「上に」あるとする時、これは他の部分の「直上に」ある場合だけでなく、その中間にまた他の部分がある場合も含む。逆に、ある部分が他の部分の「直上に」あるとする時、これはその中間に他の部分がないことを意味する。
Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art to which the present invention pertains can easily implement the embodiments. However, the present invention can be embodied in various different forms and is not limited to the embodiments described here.
In the drawings, the thickness is shown enlarged to clearly represent various layers and regions. Similar parts throughout the specification have been given the same reference numerals. When a layer, membrane, region, plate, etc. is “on top” of another part, this is not only when it is “on top” of the other part, but also when there is another part in the middle Including. Conversely, when a part is “just above” another part, this means that there is no other part in between.
図１から図３は、本発明の一実施例による不良画素を含む液晶表示装置の画素を修理する方法を順に示した断面図である。図４および図５は、本発明の一実施例による接触印刷方法を説明するための図である。 1 to 3 are cross-sectional views sequentially illustrating a method of repairing a pixel of a liquid crystal display device including a defective pixel according to an embodiment of the present invention. 4 and 5 are diagrams for explaining a contact printing method according to an embodiment of the present invention.
図１に示したように、赤色フィルタ（Ｒ）、緑色フィルタ（Ｇ）、青色フィルタ（Ｂ）が複数個形成された基板を準備する。複数のカラーフィルタ（Ｒ、Ｇ、Ｂ）は、行列をなすように配列されている（図示省略）。それぞれのカラーフィルタ（Ｒ、Ｇ、Ｂ）は、隔壁３６１によって区分される画素内に形成される。隔壁３６１が省略されて、カラーフィルタ（Ｒ、Ｇ、Ｂ）が互いに直接接触してもよい。本発明の実施例では、赤色、緑色、および青色を例に挙げたが、白色などのように表示装置の画素を形成することができる全ての色のうちのいずれか一つであればよい。
As shown in FIG. 1, a substrate on which a plurality of red filters (R), green filters (G), and blue filters (B) are formed is prepared. The plurality of color filters (R, G, B) are arranged in a matrix (not shown). Each color filter (R, G, B) is formed in a pixel partitioned by a
基板１００に形成されたカラーフィルタ（Ｒ、Ｇ、Ｂ）のうちのいずれか一つの画素は、ゲート線またはデータ線と画素電極とが短絡（図示省略）して、表示装置がブラックを表示するブラック画面である時に、明るく光るホワイト不良である。説明を容易にするために、本発明の実施例では、緑色フィルタ（Ｇ）を含む画素を不良画素とする。
In any one pixel of the color filters (R, G, B) formed on the
図２に示したように、レーザーを利用して緑色フィルタ（Ｇ）が形成された画素のカラーフィルタを除去する。
その後、カラーフィルタが除去された空き画素３０の隔壁３６１に疎水化処理を行なう。疎水化処理は、プラズマ処理、接触印刷（ｃｏｎｔａｃｔ ｐｒｉｎｔｉｎｇ）、およびインクジェット印刷などを利用することができる。
As shown in FIG. 2, the color filter of the pixel on which the green filter (G) is formed is removed using a laser.
Thereafter, the
プラズマ処理は、ＣＦ４またはＳＦ６のようなフッ素（Ｆ）を含む気体のプラズマを発生させて隔壁３６１の表面を処理することによって、疎水性に変えることができる。
The plasma treatment can be made hydrophobic by generating a plasma of a gas containing fluorine (F) such as CF 4 or SF 6 to treat the surface of the
そして、接触印刷方法は、図４に示したように、疎水性を有する溶液にスタンピング部材１０を浸した後、溶液１２が付着しているスタンピング部材１０を空き画素３０をなす隔壁３６１の表面に接触させて、隔壁３６１の表面に疎水性を有する溶液が残るようにする。疎水性溶液は、シロキサン基を含み、例えば、ポリジメチルシロキサン（ＰＭＤＳ）を使用することができる。
In the contact printing method, as shown in FIG. 4, after the
スタンピング部材１０の平面形状は、図５に示したように、空き画素３０を取り囲んでいる隔壁（斜線部分）と同一の平面形状である。
As shown in FIG. 5, the planar shape of the stamping
インクジェット印刷方法は、インクジェット用ヘッドを移動させながら疎水性溶液を滴下して乾燥させる方式であって、空き画素３０を取り囲む隔壁３６１の表面にだけ局所的に印刷されるようにする。
The inkjet printing method is a method in which a hydrophobic solution is dropped and dried while moving the inkjet head, and printing is performed locally only on the surface of the
図３に示したように、空き画素３０にインクジェット印刷方法で修正用カラーフィルタ（Ｉ）を形成する。修正用カラーフィルタ（Ｉ）は、黒色顔料を含む。
As shown in FIG. 3, the correction color filter (I) is formed in the
本発明の実施例では、図２に示したように、空き画素３０の隔壁に疎水化処理を行なうことによって、修正用カラーフィルタ（Ｉ）を滴下する時に、隔壁３６１と修正用カラーフィルタ（Ｉ）との間の反発力によって修正用カラーフィルタ（Ｉ）が隣接画素に広がって、隣接画素が汚染されて色再現性が低下するのを防止することができる。
In the embodiment of the present invention, as shown in FIG. 2, when the correction color filter (I) is dropped by performing the hydrophobic treatment on the partition of the
以下、このような修理方法を利用して表示板を製造する方法について説明する。
まず、図６を参照して、本発明の一実施例による表示板について説明する。
図６は、本発明の液晶表示装置を簡略に示した断面図である。
本発明による液晶表示装置は、向かい合う下部表示板１００及び上部表示板２００、二枚の表示板１００、２００の間に充填されている液晶層（図示省略）からなる。液晶層は、密封材３１０によって密封されている。
下部表示板１００は、透明な絶縁基板上にゲート線、データ線、および薄膜トランジスター（Ｑ）が形成されており、これらと連結されている画素電極１９１を含む。
Hereinafter, a method for manufacturing a display panel using such a repair method will be described.
First, a display panel according to an embodiment of the present invention will be described with reference to FIG.
FIG. 6 is a cross-sectional view schematically showing the liquid crystal display device of the present invention.
The liquid crystal display device according to the present invention includes a
The
そして、下部表示板１００の各画素は、インクジェット印刷方法で形成された複数のカラーフィルタ２３０を含む。カラーフィルタ２３０は赤色、緑色および青色のうちのいずれか一つである。この時、いずれか一つの画素は、修理された画素で、画素電極１９１を含まずに修正用カラーフィルタ（Ｉ）を含み、修正用カラーフィルタ（Ｉ）は、黒色インクで形成されている。
上部表示板２００は、下部表示板１００と同様な透明な絶縁基板からなり、絶縁基板２００上に共通電極２７０などが形成されている。
Each pixel of the
The
以上で説明した図６の液晶表示装置の製造方法について、図７を参照して説明する。
図７は、液晶表示装置を製造する方法を説明するためのフローチャートである。
まず、図７に示したように、下部および上部母基板をそれぞれの工程で形成する（Ｓ１００、Ｓ２００）。下部母基板は、図６の下部表示板を複数個に形成することができる基板であり、上部母基板は、図６の上部表示板を複数個に形成することができる基板である。
A method of manufacturing the liquid crystal display device of FIG. 6 described above will be described with reference to FIG.
FIG. 7 is a flowchart for explaining a method of manufacturing the liquid crystal display device.
First, as shown in FIG. 7, the lower and upper mother substrates are formed in respective steps (S100, S200). The lower mother board is a board on which a plurality of lower display panels of FIG. 6 can be formed, and the upper mother board is a board on which a plurality of upper display boards of FIG. 6 can be formed.
下部母基板に形成された各画素の不良を検出するための検査を実施する（Ｓ１０２）。検査は、黒色画面になるように信号を入力して行なうことができ、画素電極またはチャンネル不良による短絡による不良は、光がもれるホワイト不良と検出される。 An inspection for detecting a defect of each pixel formed on the lower mother substrate is performed (S102). The inspection can be performed by inputting a signal so as to obtain a black screen, and a defect due to a short circuit due to a pixel electrode or a channel defect is detected as a white defect in which light leaks.
次に、不良画素の検出有無を判断し（Ｓ１０４）、不良画素が検出されなければ、次の工程である配向膜形成工程に進む（Ｓ１０８）。不良画素が検出されれば、検出された不良画素を修理する工程に進む（Ｓ１０６）。 Next, it is determined whether or not a defective pixel is detected (S104), and if a defective pixel is not detected, the process proceeds to an alignment film forming process which is the next process (S108). If a defective pixel is detected, the process proceeds to a process of repairing the detected defective pixel (S106).
検出された不良画素は、図１から図５に示した液晶表示装置の画素を修理する方法で修理することができる。
つまり、検出された不良画素に形成されている画素電極、絶縁膜およびカラーフィルタを、レーザーを利用して全て除去する。そして、図２に示したように、疎水化工程を行なって、不良画素を取り囲んだ隔壁の表面が疎水性を有するようにする。その後、図３に示したように、インクジェット印刷方法で空き画素に修正用カラーフィルタ（Ｉ）を形成する。
修正用カラーフィルタ（Ｉ）は、黒色顔料を含むことによって、ホワイト不良が発生しても黒色に認識されるようにする。
その後、修理された基板上に配向膜を形成する（Ｓ１０８）。
The detected defective pixel can be repaired by the method of repairing the pixel of the liquid crystal display device shown in FIGS.
That is, the pixel electrode, the insulating film, and the color filter formed on the detected defective pixel are all removed using a laser. Then, as shown in FIG. 2, a hydrophobic process is performed so that the surface of the partition wall surrounding the defective pixel has hydrophobicity. Thereafter, as shown in FIG. 3, the correction color filter (I) is formed in the empty pixels by the ink jet printing method.
The correction color filter (I) includes a black pigment so that it is recognized as black even if a white defect occurs.
Thereafter, an alignment film is formed on the repaired substrate (S108).
一方、準備された上部母基板は、共通電極および配向膜を含む。その後、上部母基板上に液晶が充填される位置を規定するための密封材を形成する（Ｓ２０２）。
密封材は、光、例えばＵＶによって硬化する物質から形成することができる。
次に、密封材内に液晶物質を滴下する（Ｓ２０４）。
Meanwhile, the prepared upper mother substrate includes a common electrode and an alignment film. Thereafter, a sealing material for defining a position where the liquid crystal is filled on the upper mother substrate is formed (S202).
The sealant can be formed from a material that is cured by light, such as UV.
Next, a liquid crystal substance is dropped into the sealing material (S204).
その後、上下部母基板を整列させる（Ｓ３００）。その後、ＵＶ照射で密封材を硬化させて、上、下部母基板を合着する（Ｓ３０２）。
結合した二枚の母基板を切断して、液晶セル単位に分離する（Ｓ３０４）。
Thereafter, the upper and lower mother substrates are aligned (S300). Thereafter, the sealing material is cured by UV irradiation, and the upper and lower mother substrates are bonded together (S302).
Two bonded mother substrates are cut and separated into liquid crystal cell units (S304).
以上の実施例では、カラーフィルタが下部母基板に形成されることを例に挙げたが、カラーフィルタは上部表示板に形成することもできる。したがって、下部母基板で不良画素が検出されれば、上部母基板から下部母基板の不良画素と対応するカラーフィルタを除去して、修正用カラーフィルタを上部母基板に形成する。 In the above embodiment, the color filter is formed on the lower mother substrate. However, the color filter may be formed on the upper display panel. Therefore, if a defective pixel is detected on the lower mother substrate, the color filter corresponding to the defective pixel on the lower mother substrate is removed from the upper mother substrate, and a correction color filter is formed on the upper mother substrate.
以上で、本発明の望ましい実施例について詳細に説明したが、本発明の権利範囲はこれに限定されるのではなく、以下の請求の範囲で定義している本発明の基本概念を利用した当業者の様々な変形および改良形態も本発明の権利範囲に属する。 The preferred embodiments of the present invention have been described in detail above. However, the scope of the present invention is not limited to these, and the basic concept of the present invention defined in the following claims is used. Various modifications and improvements of the merchants are also within the scope of the present invention.
１０ スタンピング部材
３０ 空き画素
１００ 基板
１９１ 画素電極
２３０ カラーフィルタ
２７０ 共通電極
３１０ 密封材
３６１ 隔壁
Ｂ 青色フィルタ
Ｇ 緑色フィルタ
Ｉ 修正用カラーフィルタ
Ｒ 赤色フィルタ
10 Stamping
Claims (24)
前記第１絶縁基板に位置する複数の第１色フィルタおよび前記第１色フィルタと同一の層に形成された黒色第２色フィルタを含んだ色フィルタを含む複数の画素からなることを特徴とする表示板。 A first insulating substrate;
A plurality of pixels including a plurality of first color filters located on the first insulating substrate and a color filter including a black second color filter formed in the same layer as the first color filter. Display board.
前記第２絶縁基板上に位置する複数のゲート線、
前記ゲート線と交差する複数のデータ線、
前記ゲート線およびデータ線と連結されている複数の薄膜トランジスターをさらに含む請求項１に記載の表示板。 A second insulating substrate facing the first insulating substrate;
A plurality of gate lines located on the second insulating substrate;
A plurality of data lines intersecting the gate line;
The display panel of claim 1, further comprising a plurality of thin film transistors connected to the gate lines and the data lines.
前記絶縁基板上に位置する複数のゲート線、
前記ゲート線と交差する複数のデータ線、
前記ゲート線およびデータ線と連結されている複数の薄膜トランジスター、
前記絶縁基板上に位置する複数の第１色フィルタおよび前記第１色フィルタと同一な層に形成された黒色第２色フィルタを含んだ色フィルタを含む複数の画素からなることを特徴とする薄膜トランジスター表示板。 Insulating substrate,
A plurality of gate lines located on the insulating substrate;
A plurality of data lines intersecting the gate line;
A plurality of thin film transistors connected to the gate line and the data line;
A thin film comprising a plurality of pixels including a plurality of first color filters located on the insulating substrate and a color filter including a black second color filter formed in the same layer as the first color filter. Transistor display board.
前記複数の第１色フィルタのうちの一部を除去して、空き空間を形成する工程、
前記空き空間に黒色インクを満たして第２色フィルタを形成する工程を含むことを特徴とする基板の修理方法。 Manufacturing a substrate including a color filter;
Removing a part of the plurality of first color filters to form an empty space;
A method for repairing a substrate, comprising: filling the empty space with black ink to form a second color filter.
疎水性溶液を準備する工程、
前記疎水性溶液にスタンピング部材を接触する工程、
前記空き空間の周辺に前記疎水性溶液が付着している前記スタンピング部材を接触させる工程を含む請求項１５に記載の基板の修理方法。 The contact printing is
Preparing a hydrophobic solution;
Contacting a stamping member with the hydrophobic solution;
The method for repairing a substrate according to claim 15, further comprising a step of bringing the stamping member on which the hydrophobic solution is attached around the empty space into contact.
前記隔壁によって分離された領域に色フィルタを形成する工程とを含み、
前記スタンピング部材の平面形状は、前記空き空間を取り囲む隔壁の平面形状と同一である請求項１６に記載の基板の修理方法。 The step of manufacturing the substrate including the color filter includes the step of forming a partition that separates the substrate into a plurality of regions,
Forming a color filter in a region separated by the partition,
The method for repairing a substrate according to claim 16, wherein a planar shape of the stamping member is the same as a planar shape of a partition wall surrounding the empty space.
前記基板を複数の領域に分離する隔壁を形成する工程、
前記隔壁によって分離された領域に色フィルタを形成する工程を含む請求項１３に記載の基板の修理方法。 The step of manufacturing the substrate including the color filter includes:
Forming a partition for separating the substrate into a plurality of regions;
The method for repairing a substrate according to claim 13, comprising a step of forming a color filter in a region separated by the partition wall.
絶縁基板上にゲート線、前記ゲート線と交差するデータ線、そして前記ゲート線およびデータ線と連結される薄膜トランジスターを形成する工程、
前記薄膜トランジスター上に色フィルタを形成する工程、
前記色フィルタ上に画素電極を形成する工程を含む請求項１３に記載の基板の修理方法。 The step of manufacturing the substrate including the color filter includes:
Forming a gate line on the insulating substrate, a data line intersecting with the gate line, and a thin film transistor connected to the gate line and the data line;
Forming a color filter on the thin film transistor;
The method for repairing a substrate according to claim 13, further comprising forming a pixel electrode on the color filter.
前記絶縁基板を複数の領域に分離する隔壁を形成する工程と、
前記隔壁によって分離された領域にカラーフィルタを形成する工程とを含む請求項２２
に記載の基板の修理方法。 The step of forming a color filter on the thin film transistor includes:
Forming a partition for separating the insulating substrate into a plurality of regions;
And a step of forming a color filter in a region separated by the partition wall.
Repair method of the board described in 1.
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- 2009-01-30 KR KR1020090007697A patent/KR101566429B1/en active IP Right Grant
- 2009-07-22 US US12/507,309 patent/US8339544B2/en not_active Expired - Fee Related
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| WO2012018130A1 (en) | 2010-08-05 | 2012-02-09 | Nec Corporation | Group security in machine-type communication |
Also Published As
| Publication number | Publication date |
|---|---|
| US20100195026A1 (en) | 2010-08-05 |
| KR20100088456A (en) | 2010-08-09 |
| KR101566429B1 (en) | 2015-11-06 |
| US8339544B2 (en) | 2012-12-25 |
| JP5368220B2 (en) | 2013-12-18 |
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