JP2010157586A5 - - Google Patents
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- Publication number
- JP2010157586A5 JP2010157586A5 JP2008334532A JP2008334532A JP2010157586A5 JP 2010157586 A5 JP2010157586 A5 JP 2010157586A5 JP 2008334532 A JP2008334532 A JP 2008334532A JP 2008334532 A JP2008334532 A JP 2008334532A JP 2010157586 A5 JP2010157586 A5 JP 2010157586A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- drying apparatus
- station
- transfer
- heating furnace
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000758 substrate Substances 0.000 claims 24
- 238000001035 drying Methods 0.000 claims 14
- 238000010438 heat treatment Methods 0.000 claims 9
- 239000011248 coating agent Substances 0.000 claims 5
- 238000000576 coating method Methods 0.000 claims 5
- 238000001816 cooling Methods 0.000 claims 5
- 229920002456 HOTAIR Polymers 0.000 claims 1
- 238000007664 blowing Methods 0.000 claims 1
- 230000002093 peripheral Effects 0.000 claims 1
Claims (7)
基板ホルダに基板を保持する基板保持ステーションと、
基板受け渡しステーションと、
該基板受け渡しステーションを挟んで前記基板保持ステーションの反対側に位置して、水平で直線的に配置された加熱炉と、
前記基板ホルダを、前記基板保持ステーションから前記基板受け渡しステーションを経て前記加熱炉内に搬出入する搬送手段と、
前記受け渡しステーションの上方に配置された冷却装置と、
前記基板受け渡しステーションで基板を前記基板ホルダから受け取り、前記冷却装置に移動する移載装置と、
前記移載装置から基板を側方の取り出し位置まで移動する取り出しテーブルとを具備することを特徴とする乾燥装置。 In a drying device for drying a coating film applied to a substrate,
A substrate holding station for holding the substrate in the substrate holder;
A board transfer station;
A heating furnace positioned horizontally and linearly on the opposite side of the substrate holding station across the substrate delivery station;
Said substrate holder, conveying means for loading and unloading the heating furnace from the substrate holding station through said substrate transfer station,
A cooling device disposed above the delivery station;
A transfer device that receives the substrate from the substrate holder at the substrate transfer station and moves to the cooling device;
A drying apparatus comprising: a take-out table that moves the substrate from the transfer device to a side take-out position .
基板の周縁部をクランプすることで保持するクリップと、を備え、A clip that holds by clamping the peripheral edge of the substrate,
前記クリップは、前記基台に固定された支持台上に配設されたクリップ開閉用シリンダにより自動開閉されることを特徴とする請求項1に記載の乾燥装置。The drying apparatus according to claim 1, wherein the clip is automatically opened and closed by a clip opening and closing cylinder disposed on a support base fixed to the base.
前記搬送口は、前記基板ホルダが前記加熱炉に進入できる最小の大きさに形成されていることを特徴とする請求項1〜2いずれか1項に記載の乾燥装置。The drying apparatus according to claim 1, wherein the transfer port is formed in a minimum size that allows the substrate holder to enter the heating furnace.
前記乾燥装置と隣接して配設される塗布装置をさらに具備し、Further comprising a coating device disposed adjacent to the drying device;
前記塗布装置における基板入出口と前記乾燥装置における基板投入口とが隣接して位置するように、かつ、前記乾燥装置における基板取り出し位置と前記塗布装置における基板入出口とが隣接して位置するように複数の前記乾燥装置および前記塗布装置が併設されていることを特徴とする乾燥装置。The substrate inlet / outlet in the coating apparatus and the substrate inlet / outlet in the drying apparatus are positioned adjacent to each other, and the substrate take-out position in the drying apparatus and the substrate inlet / outlet in the coating apparatus are positioned adjacent to each other. A drying apparatus characterized in that a plurality of the drying apparatus and the coating apparatus are provided together.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008334532A JP5144492B2 (en) | 2008-12-26 | 2008-12-26 | Drying equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008334532A JP5144492B2 (en) | 2008-12-26 | 2008-12-26 | Drying equipment |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2010157586A JP2010157586A (en) | 2010-07-15 |
JP2010157586A5 true JP2010157586A5 (en) | 2011-11-10 |
JP5144492B2 JP5144492B2 (en) | 2013-02-13 |
Family
ID=42575286
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008334532A Active JP5144492B2 (en) | 2008-12-26 | 2008-12-26 | Drying equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5144492B2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101353247B1 (en) * | 2011-03-25 | 2014-01-24 | 삼성전기주식회사 | IR dryer, and the method for PSR(Photo Solder Resist of printed circuit boards using the same |
US11300356B2 (en) * | 2017-12-06 | 2022-04-12 | Qualicaps Co., Ltd. | Drying device for columnar structure, and method for manufacturing columnar structure |
CN115479456B (en) * | 2022-09-20 | 2023-09-12 | 常州光迅工业设备有限公司 | Dust-free and oxygen-free PI oven water-cooling circulation system |
CN117685754A (en) * | 2024-02-04 | 2024-03-12 | 江西农业大学 | Superheated steam heat pump chinese-medicinal material evaporates and shines device |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3517121B2 (en) * | 1998-08-12 | 2004-04-05 | 東京エレクトロン株式会社 | Processing equipment |
JP2001110793A (en) * | 1999-10-12 | 2001-04-20 | Dainippon Screen Mfg Co Ltd | Heat treatment device and substrate treatment device |
JP4274736B2 (en) * | 2002-03-28 | 2009-06-10 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
JP3963846B2 (en) * | 2003-01-30 | 2007-08-22 | 東京エレクトロン株式会社 | Thermal processing method and thermal processing apparatus |
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2008
- 2008-12-26 JP JP2008334532A patent/JP5144492B2/en active Active
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