JP2010157586A5 - - Google Patents

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Publication number
JP2010157586A5
JP2010157586A5 JP2008334532A JP2008334532A JP2010157586A5 JP 2010157586 A5 JP2010157586 A5 JP 2010157586A5 JP 2008334532 A JP2008334532 A JP 2008334532A JP 2008334532 A JP2008334532 A JP 2008334532A JP 2010157586 A5 JP2010157586 A5 JP 2010157586A5
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Japan
Prior art keywords
substrate
drying apparatus
station
transfer
heating furnace
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JP2008334532A
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Japanese (ja)
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JP2010157586A (en
JP5144492B2 (en
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Priority to JP2008334532A priority Critical patent/JP5144492B2/en
Priority claimed from JP2008334532A external-priority patent/JP5144492B2/en
Publication of JP2010157586A publication Critical patent/JP2010157586A/en
Publication of JP2010157586A5 publication Critical patent/JP2010157586A5/ja
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Publication of JP5144492B2 publication Critical patent/JP5144492B2/en
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Claims (7)

基板に塗布された塗膜を乾燥する乾燥装置において、
基板ホルダに基板を保持する基板保持ステーションと、
基板受け渡しステーションと、
該基板受け渡しステーションを挟んで前記基板保持ステーションの反対側に位置して、水平で直線的に配置された加熱炉と、
前記基板ホルダを、前記基板保持ステーションから前記基板受け渡しステーションを経て前記加熱炉内に搬出入する搬送手段と、
前記受け渡しステーションの上方に配置された冷却装置と、
前記基板受け渡しステーションで基板を前記基板ホルダから受け取り、前記冷却装置に移動する移載装置と、
前記移載装置から基板を側方の取り出し位置まで移動する取り出しテーブルとを具備することを特徴とする乾燥装置。
In a drying device for drying a coating film applied to a substrate,
A substrate holding station for holding the substrate in the substrate holder;
A board transfer station;
A heating furnace positioned horizontally and linearly on the opposite side of the substrate holding station across the substrate delivery station;
Said substrate holder, conveying means for loading and unloading the heating furnace from the substrate holding station through said substrate transfer station,
A cooling device disposed above the delivery station;
A transfer device that receives the substrate from the substrate holder at the substrate transfer station and moves to the cooling device;
A drying apparatus comprising: a take-out table that moves the substrate from the transfer device to a side take-out position .
前記基板ホルダは、基台に水平に設けられたレールに沿って前記基板保持ステーションおよび前記基板受け渡しステーションおよび前記加熱炉を移動するシャトルアームと、The substrate holder includes a shuttle arm that moves the substrate holding station, the substrate transfer station, and the heating furnace along a rail horizontally provided on a base;
基板の周縁部をクランプすることで保持するクリップと、を備え、A clip that holds by clamping the peripheral edge of the substrate,
前記クリップは、前記基台に固定された支持台上に配設されたクリップ開閉用シリンダにより自動開閉されることを特徴とする請求項1に記載の乾燥装置。The drying apparatus according to claim 1, wherein the clip is automatically opened and closed by a clip opening and closing cylinder disposed on a support base fixed to the base.
前記加熱炉は、前記基板受け渡しステーション側に搬送口を備え、The heating furnace includes a transfer port on the substrate transfer station side,
前記搬送口は、前記基板ホルダが前記加熱炉に進入できる最小の大きさに形成されていることを特徴とする請求項1〜2いずれか1項に記載の乾燥装置。The drying apparatus according to claim 1, wherein the transfer port is formed in a minimum size that allows the substrate holder to enter the heating furnace.
前記取り出しテーブルは、回転軸と、前記回転軸を中心に水平面内で回動する回動アームとを備え、前記冷却装置の下方位置と該下方位置の側方となる側方位置との間を移動することを特徴とする請求項1〜3いずれか1項に記載の乾燥装置。The take-out table includes a rotating shaft and a rotating arm that rotates in a horizontal plane around the rotating shaft, and is provided between a lower position of the cooling device and a side position that is a side of the lower position. The drying apparatus according to claim 1, wherein the drying apparatus moves. 前記加熱炉は、前記基板を加熱する加熱装置を備え、前記加熱装置は、熱風吹き出しノズルと赤外線ヒータとからなることを特徴とする請求項1〜4いずれか1項に記載の乾燥装置。The drying apparatus according to claim 1, wherein the heating furnace includes a heating device that heats the substrate, and the heating device includes a hot air blowing nozzle and an infrared heater. 前記冷却装置は、前記移載装置を兼ねる可動部と、冷却空気が導入される固定部からなることを特徴とする請求項1〜5いずれか1項に記載の加熱装置。The heating device according to any one of claims 1 to 5, wherein the cooling device includes a movable portion that also serves as the transfer device and a fixed portion into which cooling air is introduced. 請求項1〜6いずれか1項に記載の乾燥装置において、In the drying apparatus according to any one of claims 1 to 6,
前記乾燥装置と隣接して配設される塗布装置をさらに具備し、Further comprising a coating device disposed adjacent to the drying device;
前記塗布装置における基板入出口と前記乾燥装置における基板投入口とが隣接して位置するように、かつ、前記乾燥装置における基板取り出し位置と前記塗布装置における基板入出口とが隣接して位置するように複数の前記乾燥装置および前記塗布装置が併設されていることを特徴とする乾燥装置。The substrate inlet / outlet in the coating apparatus and the substrate inlet / outlet in the drying apparatus are positioned adjacent to each other, and the substrate take-out position in the drying apparatus and the substrate inlet / outlet in the coating apparatus are positioned adjacent to each other. A drying apparatus characterized in that a plurality of the drying apparatus and the coating apparatus are provided together.
JP2008334532A 2008-12-26 2008-12-26 Drying equipment Active JP5144492B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008334532A JP5144492B2 (en) 2008-12-26 2008-12-26 Drying equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008334532A JP5144492B2 (en) 2008-12-26 2008-12-26 Drying equipment

Publications (3)

Publication Number Publication Date
JP2010157586A JP2010157586A (en) 2010-07-15
JP2010157586A5 true JP2010157586A5 (en) 2011-11-10
JP5144492B2 JP5144492B2 (en) 2013-02-13

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ID=42575286

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008334532A Active JP5144492B2 (en) 2008-12-26 2008-12-26 Drying equipment

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JP (1) JP5144492B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101353247B1 (en) * 2011-03-25 2014-01-24 삼성전기주식회사 IR dryer, and the method for PSR(Photo Solder Resist of printed circuit boards using the same
US11300356B2 (en) * 2017-12-06 2022-04-12 Qualicaps Co., Ltd. Drying device for columnar structure, and method for manufacturing columnar structure
CN115479456B (en) * 2022-09-20 2023-09-12 常州光迅工业设备有限公司 Dust-free and oxygen-free PI oven water-cooling circulation system
CN117685754A (en) * 2024-02-04 2024-03-12 江西农业大学 Superheated steam heat pump chinese-medicinal material evaporates and shines device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3517121B2 (en) * 1998-08-12 2004-04-05 東京エレクトロン株式会社 Processing equipment
JP2001110793A (en) * 1999-10-12 2001-04-20 Dainippon Screen Mfg Co Ltd Heat treatment device and substrate treatment device
JP4274736B2 (en) * 2002-03-28 2009-06-10 大日本スクリーン製造株式会社 Substrate processing equipment
JP3963846B2 (en) * 2003-01-30 2007-08-22 東京エレクトロン株式会社 Thermal processing method and thermal processing apparatus

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