JP2010153506A - Conductive bump forming composition and printed wiring board using the same - Google Patents

Conductive bump forming composition and printed wiring board using the same Download PDF

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JP2010153506A
JP2010153506A JP2008328490A JP2008328490A JP2010153506A JP 2010153506 A JP2010153506 A JP 2010153506A JP 2008328490 A JP2008328490 A JP 2008328490A JP 2008328490 A JP2008328490 A JP 2008328490A JP 2010153506 A JP2010153506 A JP 2010153506A
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epoxy resin
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Kunihiko Odagiri
邦彦 小田切
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DNP Fine Chemicals Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a conductive bump forming composition which can obtain hardness enough for penetration of a bump through an insulating layer of a printed wiring board, has a small change in bump height due to continuous printing, can reduce the frequency of exchange of the conductive bump forming composition and a print plate and improving productivity of the printed wiring board. <P>SOLUTION: The conductive bump forming composition includes at least an epoxy resin, a curing agent, a conductive powder and a solvent, wherein the epoxy resin contains a biphenylaralkyl epoxy resin (A) and an epoxy resin (B) of not less than 2 functional groups of 50-300 epoxy equivalent, the content is 40-95 mass% biphenylaralkyl epoxy resin (A) in the epoxy resin, the softening point of the epoxy resin is less than 80°C, the total resin amount in the composition is 5-20 mass%. The printed wiring board using the composition is provided. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、導電性バンプ形成用組成物に関し、特に、十分な硬度が得られると共にプリント配線基板の生産性を向上させることができる導電性バンプ形成用組成物及びそれを用いてなるプリント配線基板に関するものである。   The present invention relates to a conductive bump forming composition, and in particular, a conductive bump forming composition capable of obtaining sufficient hardness and improving the productivity of a printed wiring board, and a printed wiring board using the same. It is about.

プリント配線基板の製造方法として、一方の面の所定位置に導電性ペーストで作った円錐状の導電バンプが設けられた第一の基板と、少なくとも一方の面に配線パターンが設けられた第二の基板とを、前記導電バンプが設けられた面及び前記配線パターンが設けられた面を内側にして対向させ、前記第一の基板と前記第二の基板との間に絶縁体層を配置して積層体を構成し、該積層体を積層プレスすることにより絶縁体層の厚さ方向に前記バンプを貫通させて導電配線部を形成するプリント配線基板の製造方法が提案されている。(特許文献1参照)   As a method of manufacturing a printed wiring board, a first board provided with a conical conductive bump made of a conductive paste at a predetermined position on one side and a second board provided with a wiring pattern on at least one side A substrate is opposed to the surface on which the conductive bumps are provided and the surface on which the wiring pattern is provided, and an insulator layer is disposed between the first substrate and the second substrate. There has been proposed a method for manufacturing a printed wiring board, in which a laminated body is configured and a conductive wiring portion is formed by penetrating the bump in the thickness direction of an insulator layer by laminating and pressing the laminated body. (See Patent Document 1)

また、基板との接着力、耐熱性や硬度の要求に対応すべく、エポキシ樹脂、潜在性硬化剤、導電粉末及び溶剤を含み、官能数の異なるエポキシ樹脂を混合し、該エポキシ樹脂の軟化点が80〜130℃であるプリント配線板層間接続のための導電性バンプ形成用組成物が提案されている。(特許文献2参照)   In addition, in order to meet the requirements for adhesive strength, heat resistance and hardness with the substrate, epoxy resin, latent curing agent, conductive powder and solvent are mixed, and epoxy resins with different functional numbers are mixed, and the softening point of the epoxy resin A composition for forming conductive bumps for connecting printed wiring boards having a temperature of 80 to 130 ° C. has been proposed. (See Patent Document 2)

特開平6−350258号公報JP-A-6-350258 特開2000−261116号公報JP 2000-261116 A

上記技術では、特定の多官能エポキシ樹脂を一定量以上使用することで、上記特性を達成させてはいるものの、導電性バンプ形成用組成物を使用してバンプを形成する印刷時においては、多官能であるために反応性が高く、時間の経過とともに導電性バンプ形成用組成物粘度が上昇し、安定した高さのバンプを得ることが困難であった。   Although the above technology achieves the above-mentioned characteristics by using a specific polyfunctional epoxy resin in a certain amount or more in the above technique, at the time of printing to form bumps using the conductive bump forming composition, Since it is functional, the reactivity is high, the viscosity of the conductive bump forming composition increases with time, and it is difficult to obtain a bump having a stable height.

本発明は、このような状況下で、プリント配線基板の絶縁層のバンプ貫通に十分な硬度が得られると共に、連続印刷によるバンプ高さの変化が小さく、導電性バンプ形成用組成物及び印刷版の交換を削減することができ、プリント配線基板の生産性を向上させることができる導電性バンプ形成用組成物を提供することを課題とする。   Under such circumstances, the present invention can obtain sufficient hardness for the penetration of bumps in the insulating layer of the printed wiring board, and the change in bump height due to continuous printing is small. It is an object of the present invention to provide a composition for forming a conductive bump that can reduce the replacement of the printed wiring board and can improve the productivity of the printed wiring board.

本発明者は、前記課題を達成するために鋭意研究を重ねた結果、特定のエポキシ樹脂を混合して所定量用いることにより上記課題を達成し得ることを見出した。本発明は、かかる知見に基づいて完成したものである。
すなわち、本発明は、
(1)少なくともエポキシ樹脂、硬化剤、導電性粉末及び溶剤からなる導電性バンプ形成用組成物であって、該エポキシ樹脂がビフェニルアラルキル型エポキシ樹脂(A)及びエポキシ当量50〜300の2官能以上のエポキシ樹脂(B)を含み、該エポキシ樹脂中に該ビフェニルアラルキル型エポキシ樹脂(A)を40〜95質量%含み、該エポキシ樹脂の軟化点が80℃未満であり、且つ該組成物中の全樹脂量が5〜20質量%であることを特徴とする導電性バンプ形成用組成物、
(2)前記組成物中の前記導電性粉末の含有量が70〜90質量%であり、且つ該導電性粉末の中心粒径が0.1〜5.0μmである上記(1)に記載の導電性バンプ形成用組成物、
(3)前記硬化剤が潜在性イミダゾール化合物を含むものである上記(1)又は(2)に記載の導電性バンプ形成用組成物、
(4)前記組成物の粘度がシアレート4.0sec-1、25℃のときに100〜500Pa・sであり、粘度比{(シアレート2.0sec-1、25℃のときの該組成物の粘度)/(シアレート4.0sec-1、25℃のときの該組成物の粘度)}が1.2〜1.9である上記(1)〜(3)のいずれかに記載の導電性バンプ形成用組成物、及び
(5)上記(1)〜(4)のいずれかに記載の導電性バンプ形成用組成物を用いてなるプリント配線基板である。
As a result of intensive studies to achieve the above object, the present inventor has found that the above object can be achieved by mixing a specific epoxy resin and using a predetermined amount. The present invention has been completed based on such findings.
That is, the present invention
(1) A conductive bump forming composition comprising at least an epoxy resin, a curing agent, a conductive powder, and a solvent, wherein the epoxy resin is a biphenyl aralkyl type epoxy resin (A) and an epoxy equivalent of 50 to 300 or more. The epoxy resin (B), 40 to 95% by mass of the biphenyl aralkyl type epoxy resin (A) in the epoxy resin, the softening point of the epoxy resin is less than 80 ° C., and A composition for forming a conductive bump, wherein the total resin amount is 5 to 20% by mass;
(2) The content of the conductive powder in the composition is 70 to 90% by mass, and the central particle size of the conductive powder is 0.1 to 5.0 μm as described in (1) above. Conductive bump forming composition,
(3) The composition for forming a conductive bump according to the above (1) or (2), wherein the curing agent contains a latent imidazole compound,
(4) The viscosity of the composition is 100 to 500 Pa · s when the shear rate is 4.0 sec −1 and 25 ° C., and the viscosity ratio {(the viscosity of the composition when the shear rate is 2.0 sec −1 and 25 ° C. ) / (Viscosity of the composition at a shear rate of 4.0 sec −1 at 25 ° C.)} is 1.2 to 1.9, the conductive bump formation according to any one of the above (1) to (3) And (5) a printed wiring board using the conductive bump forming composition according to any one of (1) to (4).

本発明の導電性バンプ形成用組成物は、プリント配線基板の絶縁層のバンプ貫通に十分な硬度を得ることができ、連続印刷によるバンプ高さの変化を小さくして、導電性バンプ形成用組成物及び印刷版の交換を削減することができた。これにより、プリント配線基板の生産性を向上させることができた。   The conductive bump forming composition of the present invention can obtain sufficient hardness for the bump penetration of the insulating layer of the printed wiring board, and the change in the bump height due to continuous printing can be reduced. It was possible to reduce the exchange of materials and printing plates. Thereby, the productivity of the printed wiring board could be improved.

本発明の導電性バンプ形成用組成物は、少なくともエポキシ樹脂、硬化剤、導電性粉末及び溶剤からなる導電性バンプ形成用組成物であって、該エポキシ樹脂がビフェニルアラルキル型エポキシ樹脂(A)及びエポキシ当量50〜300の2官能以上のエポキシ樹脂(B)を含み、該エポキシ樹脂中該ビフェニルアラルキル型エポキシ樹脂(A)を40〜95質量%含み、該エポキシ樹脂の軟化点が80℃未満であり、且つ該組成物中の全樹脂量が5〜20質量%であることを特徴とする。ここで、「少なくともエポキシ樹脂、硬化剤、導電性粉末及び溶剤からなる」とは、上記の必須成分(即ち、エポキシ樹脂、硬化剤、導電性粉末及び溶剤)以外の他の成分を含む導電性バンプ形成用組成物をも本発明に包含するものである。また、「エポキシ樹脂がビフェニルアラルキル型エポキシ樹脂(A)及びエポキシ当量50〜300の2官能以上のエポキシ樹脂(B)を含み、」とは、エポキシ樹脂がエポキシ樹脂(A)及びエポキシ樹脂(B)以外の他のエポキシ樹脂(C)を1種以上含んでも良いことをいう。さらに、上記において「導電性」とは、体積抵抗値が1×10-3cm・Ω以下であることを意味する。 The composition for forming a conductive bump of the present invention is a composition for forming a conductive bump comprising at least an epoxy resin, a curing agent, a conductive powder and a solvent, and the epoxy resin is a biphenyl aralkyl type epoxy resin (A) and A bifunctional or higher functional epoxy resin (B) having an epoxy equivalent of 50 to 300 is contained, the biphenyl aralkyl type epoxy resin (A) is contained in the epoxy resin in an amount of 40 to 95% by mass, and the softening point of the epoxy resin is less than 80 ° C. And the total resin content in the composition is 5 to 20% by mass. Here, “consisting of at least an epoxy resin, a curing agent, a conductive powder and a solvent” means a conductive material including other components than the above essential components (ie, epoxy resin, curing agent, conductive powder and solvent). A bump forming composition is also included in the present invention. In addition, “the epoxy resin includes a biphenyl aralkyl type epoxy resin (A) and a bifunctional or higher functional epoxy resin (B) having an epoxy equivalent of 50 to 300,” means that the epoxy resin is an epoxy resin (A) and an epoxy resin (B It means that one or more other epoxy resins (C) other than) may be included. Further, in the above, “conductive” means that the volume resistance value is 1 × 10 −3 cm · Ω or less.

本発明の導電性バンプ形成用組成物の粘度は、シアレート4.0sec-1、25℃のときに100〜500Pa・sであることが好ましい。100Pa・s以上であればパターンのにじみがなく、印刷したバンプ形状を保持でき、500Pa・s以下であればメタルマスクの孔が目詰まりしにくく、良好な吐出を得られるからである。ここで、この粘度は、マルコム社製スパイラル粘度計で測定したときのものである。
また、本発明の導電性バンプ形成用組成物の粘度比{(シアレート2.0sec-1、25℃のときの該組成物の粘度)/(シアレート4.0sec-1、25℃のときの該組成物の粘度)}は、1.2〜1.9であることが好ましい。粘度比が1.2以上であればチクソトロピー性が高く、印刷時に塗工し易くなるからであり、1.9以下であれば十分なバンプ高さが得られるからである。
The viscosity of the conductive bump forming composition of the present invention is preferably 100 to 500 Pa · s at a shear rate of 4.0 sec −1 and 25 ° C. If it is 100 Pa · s or more, there is no pattern blur and the printed bump shape can be maintained, and if it is 500 Pa · s or less, the holes of the metal mask are not easily clogged, and good discharge can be obtained. Here, this viscosity is measured with a spiral viscometer manufactured by Malcolm.
Further, the viscosity ratio of the composition for forming an electrically conductive bump of the present invention {(the viscosity of the composition at a shear rate of 2.0 sec −1 at 25 ° C.) / (The viscosity at a shear rate of 4.0 sec −1 at 25 ° C. The viscosity of the composition)} is preferably 1.2 to 1.9. This is because if the viscosity ratio is 1.2 or more, the thixotropy is high and it is easy to apply during printing, and if it is 1.9 or less, a sufficient bump height can be obtained.

本発明の導電性バンプ形成用組成物に含まれるエポキシ樹脂は、ビフェニルアラルキル型エポキシ樹脂(A)及びエポキシ当量50〜300の2官能以上のエポキシ樹脂(B)を混合して得られるものであり、そのエポキシ樹脂の軟化点は、十分な接着力を得る観点から80℃未満であることを要し、10〜75℃が好ましく、30〜70℃が特に好ましい。
このエポキシ樹脂中、ビフェニルアラルキル型エポキシ樹脂(A)は40〜95質量%含まれる。残余はエポキシ当量50〜300の2官能以上のエポキシ樹脂(B)のみであっても良く、エポキシ樹脂(B)に加えて他のエポキシ樹脂(C)が含まれていても良い。エポキシ樹脂中、エポキシ樹脂(A)が40質量%未満であると、バンプ形状が不良となり、95質量%を超えるとバンプの硬度が不足する。
本発明の導電性バンプ形成用組成物においては、必要に応じてエポキシ樹脂以外の樹脂が含まれていても良い。
また、本発明の導電性バンプ形成用組成物中の全樹脂量が5〜20質量%であることを要し、好ましくは5〜15質量%である。5質量%未満であると、接着力が不足し、20質量%を超えると導電性が低下する。
The epoxy resin contained in the conductive bump forming composition of the present invention is obtained by mixing a biphenyl aralkyl type epoxy resin (A) and a bifunctional or higher functional epoxy resin (B) having an epoxy equivalent of 50 to 300. The softening point of the epoxy resin needs to be less than 80 ° C. from the viewpoint of obtaining sufficient adhesive force, preferably 10 to 75 ° C., and particularly preferably 30 to 70 ° C.
In this epoxy resin, 40 to 95% by mass of the biphenyl aralkyl type epoxy resin (A) is contained. The remainder may be only a bifunctional or higher functional epoxy resin (B) having an epoxy equivalent of 50 to 300, and may contain other epoxy resin (C) in addition to the epoxy resin (B). When the epoxy resin (A) is less than 40% by mass in the epoxy resin, the bump shape becomes poor, and when it exceeds 95% by mass, the hardness of the bump is insufficient.
In the composition for forming conductive bumps of the present invention, a resin other than an epoxy resin may be included as necessary.
Moreover, it is required that the total resin amount in the composition for forming conductive bumps of the present invention is 5 to 20% by mass, and preferably 5 to 15% by mass. If it is less than 5% by mass, the adhesive strength is insufficient, and if it exceeds 20% by mass, the conductivity is lowered.

上記ビフェニルアラルキル型エポキシ樹脂(A)は、ビフェニルアラルキル型であれば良く、限定されないが、下記式(1)に示す構造を有するビフェニルアラルキル型エポキシ樹脂が好ましく、具体的には、日本化薬(株)製、商品名「NC3000」(エポキシ当量274)、商品名「NC3000H」(エポキシ当量290)等が例示される。   The biphenyl aralkyl type epoxy resin (A) is not particularly limited as long as it is a biphenyl aralkyl type resin, but is preferably a biphenyl aralkyl type epoxy resin having a structure represented by the following formula (1). Specifically, Nippon Kayaku ( The product name "NC3000" (epoxy equivalent 274), the product name "NC3000H" (epoxy equivalent 290), etc. are illustrated.

Figure 2010153506
ここで、nは1〜5の整数を示す。
エポキシ樹脂(A)は、二種以上併用することができる。
Figure 2010153506
Here, n shows the integer of 1-5.
Two or more epoxy resins (A) can be used in combination.

エポキシ当量50〜300の2官能以上のエポキシ樹脂(B)において、エポキシ当量を50以上と限定するのは、50未満では連続印刷性が低下するからであり、300以下と限定するのは、300を超えると十分な硬度が得られないからである。エポキシ当量が100〜200であればより好ましい。
このエポキシ樹脂(B)の内、二官能エポキシ樹脂の好ましい具体例としては、例えばビスフェノールA型、ビスフェノールF型、ビフェニル型、ナフタレン型、フルオレン型等のエポキシ樹脂を挙げることができる。
また、三官能以上のエポキシ樹脂の好ましい具体例としては、例えばフェノールノボラック型、ビスフェノールAノボラック型、オルソクレゾールノボラック型等の多官能タイプエポキシ樹脂を挙げることができる。
これらの二官能エポキシ樹脂及び三官能以上のエポキシ樹脂は、二種以上併用することができる。
なお、エポキシ当量とは、1当量のエポキシ基を含む樹脂の質量をいい、JIS K 7236:2001に基づき測定される。
また、エポキシ樹脂の軟化点は、メイテック社製環球式自動軟化点試験器ASP−MG型によって1℃/minの条件にて測定されたときのものである。
In the bifunctional or higher epoxy resin (B) having an epoxy equivalent of 50 to 300, the epoxy equivalent is limited to 50 or more because the continuous printability is reduced when the epoxy equivalent is less than 50, and 300 or less is limited. This is because sufficient hardness cannot be obtained when the ratio exceeds. More preferably, the epoxy equivalent is 100 to 200.
Among the epoxy resins (B), preferred specific examples of the bifunctional epoxy resins include bisphenol A type, bisphenol F type, biphenyl type, naphthalene type, fluorene type epoxy resins and the like.
Specific examples of the tri- or higher functional epoxy resin include polyfunctional epoxy resins such as phenol novolac type, bisphenol A novolak type, and orthocresol novolak type.
These bifunctional epoxy resins and trifunctional or higher functional epoxy resins can be used in combination of two or more.
In addition, an epoxy equivalent means the mass of resin containing 1 equivalent of epoxy groups, and is measured based on JISK7236: 2001.
Moreover, the softening point of an epoxy resin is a thing when it measures on the conditions of 1 degree-C / min with the ring-and-ball type automatic softening point tester ASP-MG type | mold made by Meitec.

本発明の導電性バンプ形成用組成物のエポキシ樹脂中に必要に応じて含まれる他のエポキシ樹脂(C)としては特に限定されず、エポキシ当量300を超える2官能以上のエポキシ樹脂や1官能のエポキシ樹脂等が挙げられる。
また、本発明の導電性バンプ形成用組成物に所望により含まれるエポキシ樹脂以外の樹脂としては、例えば、メラミン樹脂、フェノール樹脂、アクリル樹脂等を挙げることができる。
The other epoxy resin (C) contained as necessary in the epoxy resin of the conductive bump forming composition of the present invention is not particularly limited, and is a bifunctional or higher functional epoxy resin having an epoxy equivalent of 300 or a monofunctional epoxy resin. An epoxy resin etc. are mentioned.
Examples of the resin other than the epoxy resin that is optionally included in the conductive bump forming composition of the present invention include a melamine resin, a phenol resin, and an acrylic resin.

本発明の導電性バンプ形成用組成物に用いられる硬化剤としては、エポキシ樹脂との配合状態において室温にて安定して貯蔵でき、熱、光あるいは圧力などによって硬化反応を生じさせる潜在性硬化剤を用いることが好ましい。そのような硬化剤としては、ジシアンジアミド、イミダゾール化合物、三フッ化ホウ素‐アミン錯体、有機酸ヒドラジット等を挙げることができる。本発明において特に好ましい硬化剤の具体例としては、ジシアンジアミド、2‐フェニル‐4,5‐ジヒドロキシメチルイミダゾール、2‐フェニル‐4‐メチル‐5‐ヒドロキシメチルイミダゾールを挙げることができる。これらの硬化剤は、二種以上併用することができる。
硬化剤の含有量は、エポキシ樹脂100質量部に対し、好ましくは1〜60質量部、より好ましくは1〜50質量部、特に好ましくは5〜40質量部である。含有量が1質量部以上であれば十分な架橋密度が得られ、また60質量部以下では硬化後の制御がし易くなり好ましい。
The curing agent used in the conductive bump forming composition of the present invention is a latent curing agent that can be stably stored at room temperature in a compounded state with an epoxy resin and causes a curing reaction by heat, light, pressure, or the like. Is preferably used. Examples of such a curing agent include dicyandiamide, imidazole compound, boron trifluoride-amine complex, organic acid hydragit, and the like. Specific examples of particularly preferred curing agents in the present invention include dicyandiamide, 2-phenyl-4,5-dihydroxymethylimidazole, and 2-phenyl-4-methyl-5-hydroxymethylimidazole. Two or more of these curing agents can be used in combination.
The content of the curing agent is preferably 1 to 60 parts by mass, more preferably 1 to 50 parts by mass, and particularly preferably 5 to 40 parts by mass with respect to 100 parts by mass of the epoxy resin. If the content is 1 part by mass or more, a sufficient crosslinking density is obtained, and if it is 60 parts by mass or less, it is easy to control after curing.

本発明で用いられる導電性粉末としては、各種の導電性微粉末、例えば銀粉、金粉、銅粉、ニッケル粉、白金粉、パラジウム粉、はんだ粉、前記金属の合金粉末等の金属粉末等を使用することができる。これらの導電性粉末は二種以上併用することもできる。また、金属以外の導電性粉末、例えばカーボン粉末、を使用することもできる。導電性粉末は、表面処理されたものであっても良い。   As the conductive powder used in the present invention, various conductive fine powders such as silver powder, gold powder, copper powder, nickel powder, platinum powder, palladium powder, solder powder, metal powder such as the above alloy powder of metal, etc. are used. can do. Two or more kinds of these conductive powders can be used in combination. Moreover, electroconductive powder other than a metal, for example, carbon powder, can also be used. The conductive powder may be surface-treated.

上記導電性粉末の形態及び大きさは、本発明の目的に反しない限り任意である。本発明では、例えば樹枝状、りん片状、球状、フレーク状の形態のもの、特に好ましくはりん片状と球状の混合物、を使用することができる。導電性粉末の中心粒径は、0.1〜5.0μmのものが好ましく、さらに0.5〜5.0μmのものが好ましく、特に1.0〜5.0μmのものが好ましい。0.1μm以上であれば十分な帯電性が得られ、5.0μm以下であればスクリーン版の目詰まりが発生しにくいので好ましい。
本発明においては、レーザー回折散乱粒度分布測定装置(例えば、米国ベックマン・インスツルメンツ・インク製、高精度型レーザー回折散乱法 粒度分布測定装置、商品名「LS 13 320」)により導電性粉末の粒度分布を測定し、その粒度分布の最頻値(モード)の粒径を中心粒径とした。
The form and magnitude | size of the said electroconductive powder are arbitrary unless it is contrary to the objective of this invention. In the present invention, for example, dendritic, flaky, spherical and flaky forms, particularly preferably a mixture of flaky and spherical forms can be used. The center particle diameter of the conductive powder is preferably from 0.1 to 5.0 μm, more preferably from 0.5 to 5.0 μm, particularly preferably from 1.0 to 5.0 μm. When the thickness is 0.1 μm or more, sufficient chargeability is obtained, and when the thickness is 5.0 μm or less, clogging of the screen plate hardly occurs, which is preferable.
In the present invention, the particle size distribution of the conductive powder is measured by a laser diffraction / scattering particle size distribution measuring device (for example, a high precision laser diffraction / scattering particle size distribution measuring device, trade name “LS 13 320” manufactured by Beckman Instruments Inc., USA). Was measured, and the particle size of the mode (mode) of the particle size distribution was defined as the center particle size.

導電性粉末の含有量は、本発明の導電性バンプ形成用組成物中に好ましくは70〜90質量%、より好ましくは75〜90質量%、特に好ましくは80〜90質量%である。含有量が90質量%以下であれば導電性バンプ形成用組成物の流動性が良好であり好ましい。また、含有量が70質量%以上であれば必要な導電性が得られる。   The content of the conductive powder is preferably 70 to 90% by mass, more preferably 75 to 90% by mass, and particularly preferably 80 to 90% by mass in the conductive bump forming composition of the present invention. If content is 90 mass% or less, the fluidity | liquidity of the composition for electroconductive bump formation is favorable, and it is preferable. Moreover, if content is 70 mass% or more, required electroconductivity will be obtained.

本発明で使用される溶剤としては、例えば上記のエポキシ樹脂並びに導電性粉末と共に導電性バンプ形成用組成物を形成可能な各種の有機溶剤を用いることができる。そのような有機溶剤の好ましい具体例としては、例えばジエチレングリコールモノブチルエーテルアセテート(ブチルカルビトールアセテート)、テトラエチレングリコールモノメチルエーテル、トリエチレングリコールモノメチルエーテル、ポリエチレングリコールモノメチルエーテル、トリプロピレングリコールn‐ブチルエーテル、ベンジルグリコール、メチルポリグリコール、トリプロピレングリコールモノメチルエーテル、酢酸エチル、酢酸ブチル、エチルセロソルブ、ブチルセロソルブ、エチルカルビトール、ブチルカルビトール、イソプロパノール、ブタノール、テルピネオール、チキサノール、ブチルセロソルブアセテート、イソホロンの単独又はこれらの混合溶剤を挙げることができる。
溶剤の含有量は、目標とする粘度等に応じて適宜調整することが可能である。通常は導電性バンプ形成用組成物中に2〜15質量%程度を配合する。
As a solvent used by this invention, the various organic solvent which can form the composition for electroconductive bump formation with said epoxy resin and electroconductive powder can be used, for example. Preferable specific examples of such an organic solvent include, for example, diethylene glycol monobutyl ether acetate (butyl carbitol acetate), tetraethylene glycol monomethyl ether, triethylene glycol monomethyl ether, polyethylene glycol monomethyl ether, tripropylene glycol n-butyl ether, benzyl glycol , Methyl polyglycol, tripropylene glycol monomethyl ether, ethyl acetate, butyl acetate, ethyl cellosolve, butyl cellosolve, ethyl carbitol, butyl carbitol, isopropanol, butanol, terpineol, thixanol, butyl cellosolve acetate, isophorone alone or a mixed solvent thereof Can be mentioned.
The content of the solvent can be appropriately adjusted according to the target viscosity or the like. Usually, about 2-15 mass% is mix | blended in the composition for electroconductive bump formation.

本発明の導電性バンプ形成用組成物は、必要に応じて各種の成分を含むことができる。そのような必要に応じて含むことが可能な成分の具体例としては、各種の有機又は無機の顔料や、チクソトロピー付与剤、消泡剤、分散剤、防錆剤、還元剤等を挙げることができる。例えば、有機又は無機の顔料を含有することによって導電性バンプ形成用組成物の塗膜補強、機能付加、作業性改良、着色及び増量等を図ることが可能になる。
本発明では特に体質顔料、例えばマイクロシリカ、炭酸カルシウム、硫酸バリウム、炭酸マグネシウム、アルミナ等を単独又はこれらに混合物を用いることができる。
The composition for forming conductive bumps of the present invention can contain various components as required. Specific examples of components that can be included as needed include various organic or inorganic pigments, thixotropic agents, antifoaming agents, dispersants, rust inhibitors, reducing agents, and the like. it can. For example, by containing an organic or inorganic pigment, it becomes possible to reinforce the coating film, add functions, improve workability, color and increase the amount of the conductive bump forming composition.
In the present invention, extender pigments such as microsilica, calcium carbonate, barium sulfate, magnesium carbonate, and alumina can be used alone or as a mixture thereof.

本発明の導電性バンプ形成用組成物は、プリント配線基板の絶縁層のバンプ貫通に十分な硬度が得られると共に、良好な導電性を有するものであり、例えばスクリーン印刷法などの公知の印刷法によって基板上に印刷可能なものである。従って、本発明の導電性バンプ形成用組成物は、従来同様に広範な分野において利用可能なものである。
そして、本発明の導電性バンプ形成用組成物は、印刷条件下(例えば、温度25℃、湿度55%)で長時間印刷を続けたとしても連続印刷によるバンプ高さの変化が小さく、良好な導電性バンプを安定的かつ効率的に形成できるものである。これにより、導電性バンプ形成用組成物及び印刷版の交換を削減することができ、プリント配線基板の生産性を向上させることができる。
さらに、本発明の導電性バンプ形成用組成物は、1回の印刷作業当たりの塗膜厚さが厚いものであることから、十分な厚さの導電性層を効率的に形成可能なものである。
The conductive bump forming composition of the present invention has sufficient hardness to penetrate the bump of the insulating layer of the printed wiring board and has good conductivity. For example, a known printing method such as a screen printing method is used. Can be printed on the substrate. Therefore, the conductive bump forming composition of the present invention can be used in a wide range of fields as in the prior art.
The composition for forming a conductive bump of the present invention has a small change in bump height due to continuous printing even if printing is continued for a long time under printing conditions (for example, a temperature of 25 ° C. and a humidity of 55%). Conductive bumps can be formed stably and efficiently. Thereby, replacement | exchange of the composition for conductive bump formation and a printing plate can be reduced, and the productivity of a printed wiring board can be improved.
Furthermore, since the conductive bump forming composition of the present invention has a thick coating film thickness per printing operation, it can efficiently form a sufficiently thick conductive layer. is there.

本発明を実施例により、更に詳細に説明するが、本発明は、これらの例によってなんら限定されるものではない。
なお、所定樹脂比率でエポキシ樹脂(A)及び(B)を混合した後のエポキシ樹脂の軟化点、導電性バンプ形成用組成物の粘度及び粘度比、導電性バンプ形成用組成物硬化物の電気抵抗値及び塗膜硬さ、導電性バンプ形成用組成物を硬化して得た導電性バンプのバンプ高さ、バンプ形状及び連続印刷性の評価は、下記の方法に従って実施した。
Examples The present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples.
In addition, the softening point of the epoxy resin after mixing the epoxy resins (A) and (B) at a predetermined resin ratio, the viscosity and the viscosity ratio of the conductive bump forming composition, and the electricity of the cured product of the conductive bump forming composition Evaluation of the resistance value, the coating film hardness, the bump height of the conductive bump obtained by curing the conductive bump forming composition, the bump shape and the continuous printability was carried out according to the following methods.

(1)軟化点
上記記載の方法により行った。
(2)粘度及び粘度比
上記記載の方法により行った。
(3)電気抵抗値
ガラス板に導電性バンプ形成用組成物を塗布し、180℃のオーブン内で20分間放置して該組成物を硬化させた。硬化した該組成物の体積抵抗値を測定した。1×10-3Ω・cm以下のものを「良」とし、1×10-3Ω・cmを超えるものを「不良」と判定した。
(1) Softening point It was performed by the method described above.
(2) Viscosity and viscosity ratio It was performed by the method described above.
(3) Electrical resistance value The composition for forming conductive bumps was applied to a glass plate, and was left in an oven at 180 ° C. for 20 minutes to cure the composition. The volume resistance value of the cured composition was measured. A sample having 1 × 10 −3 Ω · cm or less was determined as “good”, and a sample exceeding 1 × 10 −3 Ω · cm was determined as “defective”.

(4)バンプ高さ
スクリーン印刷機で1回印刷操作に付して形成したバンプをレーザー顕微鏡にて測定した。
(5)バンプ形状
スクリーン印刷機にて印刷したバンプの形状をレーザー顕微鏡にて観察して、バンプ先端が尖ってなく砲弾状であるものを「良」とし、バンプ先端が尖っており細いものや曲がっているものを「不良」と判定した。
(4) Bump height Bumps formed by a printing operation once with a screen printer were measured with a laser microscope.
(5) Bump shape The shape of the bump printed on the screen printing machine is observed with a laser microscope. The bent one was judged as “bad”.

(6)塗膜硬さ
ガラス板に導電性ペーストを塗布し、185℃のオーブン内で20分間加熱し、導電性バンプ形成用組成物を硬化させた。この硬化した塗膜のビッカース硬度を測定した。硬度が30以上のものを「良」とし、30未満のものを「不良」と判定した。
(7)連続印刷性
スクリーン印刷機で1000ショット印刷した時のバンプ高さの変化をレーザー顕微鏡にて測定した。1000ショット/1ショットの高さの変化率が15%以下であるものを「良」とし、15%を超えるものを「不良」と判定した。
(6) Coating film hardness A conductive paste was applied to a glass plate and heated in an oven at 185 ° C. for 20 minutes to cure the conductive bump forming composition. The Vickers hardness of this cured coating film was measured. A sample having a hardness of 30 or more was determined as “good”, and a sample having a hardness of less than 30 was determined as “bad”.
(7) Continuous printability The change in bump height when 1000 shots were printed on a screen printer was measured with a laser microscope. When the rate of change in the height of 1000 shots / 1 shot was 15% or less, it was judged as “good”, and when it exceeded 15%, it was judged as “bad”.

実施例1〜2及び比較例1〜3
第1表に示す配合処方により3本ロールで混練して導電性バンプ形成用組成物を調製した。次に、銅箔上にスクリーン印刷機でバンプを印刷した(開口径:φ220μm)。印刷後に185℃のオーブン内にて20分間加熱し導電性組成物を硬化し、導電性バンプを形成した。得られた実施例1〜2及び比較例1〜3の所定樹脂比率でエポキシ樹脂(A)及び(B)を混合した後のエポキシ樹脂の軟化点、導電性バンプ形成用組成物の粘度及び粘度比、導電性バンプ形成用組成物硬化物の電気抵抗値及び塗膜硬さ、導電性バンプ形成用組成物を硬化して得た導電性バンプのバンプ高さ、バンプ形状及び連続印刷性を上記方法に従って評価した。結果を第1表に示す。
Examples 1-2 and Comparative Examples 1-3
A composition for forming conductive bumps was prepared by kneading with three rolls according to the formulation shown in Table 1. Next, bumps were printed on the copper foil with a screen printer (opening diameter: φ220 μm). After printing, the conductive composition was cured by heating in an oven at 185 ° C. for 20 minutes to form conductive bumps. The softening point of the epoxy resin after mixing the epoxy resins (A) and (B) at the predetermined resin ratios of the obtained Examples 1-2 and Comparative Examples 1-3, the viscosity and the viscosity of the conductive bump forming composition Ratio, electrical resistance value and cured film hardness of the conductive bump forming composition, bump height, bump shape and continuous printability of the conductive bump obtained by curing the conductive bump forming composition Evaluation was made according to the method. The results are shown in Table 1.

Figure 2010153506
[注]
*1: ビフェニルアラルキル型エポキシ樹脂(エポキシ当量290、軟化点70℃)、日本化薬(株)製、商品名「NC−3000H」
*2: ノボラック型エポキシ樹脂(多官能、エポキシ当量180、軟化点70℃)、DIC(株)製、商品名「N−775」
*3: ビスフェノールA型エポキシ樹脂(2官能、エポキシ当量500、軟化点65℃)、ジャパン エポキシ レジン(株)製、商品名「1001」
*4: 2−フェニル−4−メチル−5−ヒドロキシメチルイミダゾール、四国化成(株)製、商品名「2P4MHZ」
*5: マイクロシリカ、日本アエロジル社製、商品名「AEROSIL 200」
*6: ジエチレングリコールモノブチルエーテルアセテート
*7: 銀粉(中心粒径:3.0μm)
Figure 2010153506
[note]
* 1: Biphenyl aralkyl type epoxy resin (epoxy equivalent 290, softening point 70 ° C.), manufactured by Nippon Kayaku Co., Ltd., trade name “NC-3000H”
* 2: Novolac type epoxy resin (polyfunctional, epoxy equivalent 180, softening point 70 ° C.), manufactured by DIC Corporation, trade name “N-775”
* 3: Bisphenol A type epoxy resin (bifunctional, epoxy equivalent 500, softening point 65 ° C.), manufactured by Japan Epoxy Resin Co., Ltd., trade name “1001”
* 4: 2-Phenyl-4-methyl-5-hydroxymethylimidazole, manufactured by Shikoku Kasei Co., Ltd., trade name “2P4MHZ”
* 5: Microsilica, manufactured by Nippon Aerosil Co., Ltd., trade name “AEROSIL 200”
* 6: Diethylene glycol monobutyl ether acetate * 7: Silver powder (center particle size: 3.0 μm)

第1表から明らかなように、実施例1及び2の本発明の導電性バンプ形成用組成物は、十分な硬度が得られ、電気抵抗値及びバンプ形状が良好であり、バンプ高さも高く連続印刷性も良好であった。一方、比較例1及び3の導電性バンプ形成用組成物は、プリント配線基板の絶縁層のバンプ貫通に十分な硬度を得ることができなかった。また、比較例2及び3の導電性バンプ形成用組成物は、バンプ形状が不良であり、比較例2の導電性バンプ形成用組成物は連続印刷性も不良であった。   As is apparent from Table 1, the conductive bump forming compositions of Examples 1 and 2 of the present invention have sufficient hardness, good electrical resistance value and good bump shape, and high bump height. The printability was also good. On the other hand, the conductive bump forming compositions of Comparative Examples 1 and 3 were unable to obtain a hardness sufficient for bump penetration of the insulating layer of the printed wiring board. Further, the conductive bump forming compositions of Comparative Examples 2 and 3 had poor bump shapes, and the conductive bump forming composition of Comparative Example 2 had poor continuous printability.

本発明の導電性バンプ形成用組成物は、プリント配線板層間接続バンプの形成にて特に有用なものであり、高品質で生産性の高いプリント配線基板を得ることができる。   The conductive bump forming composition of the present invention is particularly useful in the formation of printed wiring board interlayer connection bumps, and a high-quality and highly productive printed wiring board can be obtained.

Claims (5)

少なくともエポキシ樹脂、硬化剤、導電性粉末及び溶剤からなる導電性バンプ形成用組成物であって、該エポキシ樹脂がビフェニルアラルキル型エポキシ樹脂(A)及びエポキシ当量50〜300の2官能以上のエポキシ樹脂(B)を含み、該エポキシ樹脂中に該ビフェニルアラルキル型エポキシ樹脂(A)を40〜95質量%含み、該エポキシ樹脂の軟化点が80℃未満であり、且つ該組成物中の全樹脂量が5〜20質量%であることを特徴とする導電性バンプ形成用組成物。   A composition for forming a conductive bump comprising at least an epoxy resin, a curing agent, a conductive powder and a solvent, wherein the epoxy resin is a biphenyl aralkyl type epoxy resin (A) and an epoxy resin having a bifunctional or higher functionality having an epoxy equivalent of 50 to 300 (B), 40 to 95% by mass of the biphenyl aralkyl type epoxy resin (A) in the epoxy resin, the softening point of the epoxy resin is less than 80 ° C., and the total resin amount in the composition Is a composition for forming a conductive bump, wherein the composition is 5 to 20% by mass. 前記組成物中の前記導電性粉末の含有量が70〜90質量%であり、且つ該導電性粉末の中心粒径が0.1〜5.0μmである請求項1に記載の導電性バンプ形成用組成物。   2. The conductive bump formation according to claim 1, wherein the content of the conductive powder in the composition is 70 to 90 mass%, and the central particle size of the conductive powder is 0.1 to 5.0 μm. Composition. 前記硬化剤が潜在性イミダゾール化合物を含むものである請求項1又は2に記載の導電性バンプ形成用組成物。   The composition for forming a conductive bump according to claim 1, wherein the curing agent contains a latent imidazole compound. 前記組成物の粘度がシアレート4.0sec-1、25℃のときに100〜500Pa・sであり、粘度比{(シアレート2.0sec-1、25℃のときの該組成物の粘度)/(シアレート4.0sec-1、25℃のときの該組成物の粘度)}が1.2〜1.9である請求項1〜3のいずれかに記載の導電性バンプ形成用組成物。 The viscosity of the composition is 100 to 500 Pa · s when the shear rate is 4.0 sec −1 and 25 ° C., and the viscosity ratio {(viscosity of the composition when the shear rate is 2.0 sec −1 and 25 ° C.) / ( The composition for forming conductive bumps according to any one of claims 1 to 3, wherein the viscosity of the composition at a shear rate of 4.0 sec -1 and 25 ° C is from 1.2 to 1.9. 請求項1〜4のいずれかに記載の導電性バンプ形成用組成物を用いてなるプリント配線基板。   The printed wiring board formed using the composition for conductive bump formation in any one of Claims 1-4.
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012005089A1 (en) 2010-07-05 2012-01-12 オリンパスメディカルシステムズ株式会社 Coupler for endoscope cleaning and disinfecting device, fluid supply device
JP2012119549A (en) * 2010-12-02 2012-06-21 Sumitomo Bakelite Co Ltd Conductive resin composition for bump formation
JP2013021019A (en) * 2011-07-07 2013-01-31 Sumitomo Bakelite Co Ltd Conductive paste and multilayer wiring board
WO2014208737A1 (en) * 2013-06-28 2014-12-31 太陽インキ製造株式会社 Heat-curable composition, dry film, and printed wiring board
JP2020123634A (en) * 2019-01-29 2020-08-13 Dic株式会社 Composition for forming conductive bump

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012005089A1 (en) 2010-07-05 2012-01-12 オリンパスメディカルシステムズ株式会社 Coupler for endoscope cleaning and disinfecting device, fluid supply device
JP2012119549A (en) * 2010-12-02 2012-06-21 Sumitomo Bakelite Co Ltd Conductive resin composition for bump formation
JP2013021019A (en) * 2011-07-07 2013-01-31 Sumitomo Bakelite Co Ltd Conductive paste and multilayer wiring board
WO2014208737A1 (en) * 2013-06-28 2014-12-31 太陽インキ製造株式会社 Heat-curable composition, dry film, and printed wiring board
US9796810B2 (en) 2013-06-28 2017-10-24 Taiyo Ink Mfg. Co., Ltd. Heat-curable composition, dry film, and printed wiring board
JP2020123634A (en) * 2019-01-29 2020-08-13 Dic株式会社 Composition for forming conductive bump

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