JP2010131572A - Coating film forming method and glass substitute - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a coated product comprising a substrate made of a polymeric material, an electric conductor thin film, and a coating film, and a coating film forming method. <P>SOLUTION: Electromagnetic waves are radiated to a coating liquid film 23 of an object 20<SB>2</SB>to be coated obtained by forming the electric conductor thin film 22 on the surface of the substrate 21 made of the polymeric material and then forming the coating liquid film 23 on the surface of the electric conductor thin film 22. When the electromagnetic waves are radiated, an eddy current is generated in the coating liquid film 23 of the electric conductor thin film 22 by an induction heating effect, and the generated eddy current generates Joule heat to heat the electric conductor thin film 22. The coating liquid film 23 is heated by heat conduction from the electric conductor thin film 22, so that the temperature of the coating liquid film 23 is increased. A solvent in the coating liquid film 23 is heated to its evaporation temperature or higher to be evaporated, whereby the coating liquid film 23 is dried and a coating film 24 is formed to obtain the coated product 20<SB>3</SB>. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a technical field of functional resins, and relates to a coating material including a polymer material made of paper or plastic, an electric conductor thin film, and a coating film, and a coating film forming method.

Olefin-based resins such as polyethylene and polypropylene are difficult to obtain adhesion to thermosetting paints, and the surface of the substrate made of olefin-based resin is plasma treated to modify the surface of the substrate before thermosetting. Mold paint is applied.
In order to dry the base material to which the thermosetting paint is applied, the base material is placed in a drying chamber, and in the drying chamber, hot air of about the curing temperature of the thermosetting paint is supplied to the base material. The solvent is evaporated and the paint is cured.

It is known that when an electromagnetic wave is irradiated on a metal plate, an eddy current is generated inside the metal plate, and the inside of the metal plate is heated. Irradiation of an electromagnetic wave to a metal is performed by nitriding and oxidizing metal particles or between metal particles. It is used for the purpose of sintering.
A method for irradiating a water-based paint with an electromagnetic wave having an output of 20 W to 20 KW to dry the water-based paint is described in the following literature. However, a high-temperature curable paint of 120 ° C. or more is difficult to dry and harden.
JP 2004-344860 A

  The present invention was created to solve the above-mentioned disadvantages of the prior art, and its purpose is to dry and harden the coating liquid film without thermally deforming and dissolving the base material, and to apply the coating film and the electric conductor. It is to increase the adhesion between the thin film and the electric conductor thin film and the substrate.

In order to solve the above problems, the present invention provides an electric conductor thin film forming step for forming an electric conductor thin film on the surface of a base material made of a polymer material, and a coating liquid film on the surface of the electric conductor thin film. A coating liquid film forming step of forming a film, and radiating an electromagnetic wave toward the coating liquid film to generate heat on the surface of the electric conductor thin film on the coating liquid film side, thereby causing the electric conduction on the coating liquid film side. An electromagnetic wave heating step of heating the coating liquid film by heat conduction from the surface of the body thin film, and drying and curing the coating liquid film.
In the present invention, the base material is a film, and the base material drawn out from an original roll on which the base material is wound is wound on a take-up roll, and the base material is stationary or moved. In the coating film forming method, the electric conductor thin film forming step, the coating liquid film forming step, and the electromagnetic wave heating step are performed.
The present invention is the coating film forming method in which the electric conductor thin film forming step forms the electric conductor thin film by sputtering.
In the present invention, the substrate is a plate-like polycarbonate, the electrical conductor thin film is transparent Ni—Cr, the coating film is a hard coat paint, and the glass obtained by the coating film forming method is used. Is an alternative.

  According to the present invention, the adhesion between the coating film and the electric conductor thin film and the adhesion between the electric conductor thin film and the substrate is higher than the adhesion between the conventional coating film and the substrate, and the time is shorter than the conventional baking coating. The coating liquid film can be dried and cured. In addition, the glass substitute of the present invention has a long life because it has a higher adhesion to the coating film than polycarbonate.

<First example of the present invention>
A first example of the coating film forming method of the present invention will be described.
The code | symbol 21 of Fig.1 (a) is a base material which consists of polymeric materials, and is a process target object.
Reference numeral 10 in FIG. 2 denotes an electric conductor thin film forming apparatus. The electric conductor thin film forming apparatus 10 includes a vacuum chamber 11, and a target 12 made of a conductive material is disposed on a ceiling portion inside the vacuum chamber 11. A target power supply 25 is connected to the target 12, and a gas introduction system 26 and a vacuum exhaust system 27 are connected to the vacuum chamber 11. The inside of the vacuum chamber 11 is evacuated by the evacuation system 27 to make a vacuum atmosphere, and the base material 21 is arranged inside the vacuum chamber 11. When a sputtering gas is introduced from the gas introduction system 26 into the vacuum chamber 11, a voltage is applied to the target 12, a plasma of the sputtering gas is formed, and the target 12 is sputtered, the electric conductor thin film 22 is formed on the surface of the substrate 21. Is formed.

Figure 1 reference numeral 20 ₁ (b) comprises a substrate 21, a coating object made of electrically conductive thin film 22 which is deposited on the substrate 21.
After the electrical conductor thin film 22 having a predetermined thickness is formed, and introducing the atmosphere into the vacuum chamber 11, taken out coating object 20 ₁ to the outside of the vacuum chamber 11.

  In the above example, sputtering was used for the method of manufacturing the electric conductor thin film 22, but the method is not limited to this, and the electric conductor thin film 22 is formed using a method such as vacuum deposition, electrolysis, and electroless plating. It may be formed. Sputtering is suitable for forming the thin electric conductor thin film 22 that can provide transparency.

The coating object 20 ₁ taken out to the outside of the vacuum chamber 11, disposed below the coating solution film forming apparatus 31 of FIG. 3, the ejection portion of the coating solution film forming apparatus 31 (not shown) and the electrical conductor The surface of the thin film 22 is made to face.
The coating liquid film forming apparatus 31 is configured to spray the droplets of the coating liquid from the ejection portion and land on the surface of the electric conductor thin film 22 to form the coating liquid film 23. Reference numeral 36 denotes a sprayed droplet.

The film formation method of the coating liquid film 23 is not limited to this, and the liquid droplets oozed out from the ejection part may be disposed on the electric conductor thin film 22 or the coating liquid may be applied by screen printing or the like. Alternatively, a film-like coating liquid film 23 may be attached to the surface of the electric conductor thin film 22. Further, the coating liquid film forming apparatus 31 of the present invention also includes an apparatus for removing an excess coating liquid in order to adjust the film thickness after coating the coating liquid on the electric conductor thin film 22.
The coating liquid and the coating liquid film 23 are composed of a solvent and a coating substance dissolved or dispersed in the solvent. The solvent and the coating substance are substances that do not chemically react with the base material 21, and the electric conductor thin film 22 is thin. Thus, the substrate 21 is not dissolved even when the holes are formed and the substrate 21 and the coating liquid come into contact with each other.

Reference numeral 20 ₂ in FIG. 1 (c), the coating comprising a base material 21, the electrically conductive thin film 22 which is deposited on the substrate 21, the coating liquid film 23 is deposited on the electrically conductive thin film 22 It is a work object.
When the electrical conductor thin film 22 and the base material 21 are heated and the temperature is increased, the thermal expansion coefficient of the base material 21 is larger than that of the electrical conductor thin film 22. The base material 21 extends. When the electric conductor thin film 22 formed on the base material 21 is irradiated with electromagnetic waves, the strength of the electric conductor thin film 22 when it is thicker is larger than when the electric conductor thin film 22 is thin. The stress applied to the interface to which the substrate 21 is bonded increases. From Table 1 to be described later, when the thickness of the electric conductor thin film 22 exceeds 60.0 nm, the interface where the base material 21 and the electric conductor thin film 22 are in close contact with each other is subjected to stress greater than the adhesive force and peels off. Electric charge accumulates in the peeled portion and charges up to discharge.
When the thickness of the electric conductor thin film 22 is 1.7 nm, which is less than 3.3 nm, the electric conductor thin film 22 cannot be heated sufficiently by irradiation with electromagnetic waves.

On the coating object 20 _2, placing the electromagnetic wave irradiation device 35 of FIG. 4. When an electromagnetic wave is irradiated toward the coating liquid film 23, an eddy current is generated inside the electric conductor thin film 22, and Joule heat is generated. It is considered that the electric conductor thin film 22 can be heated by the induction heating effect when the frequency of the electromagnetic wave is in the range of 300 MHz to 30 GHz.

On the coating object 20 _2, placing the electromagnetic wave irradiation device 35 of FIG. 4. When an electromagnetic wave is irradiated toward the coating liquid film 23, an eddy current is generated inside the electric conductor thin film 22, and Joule heat is generated.
When the frequency of electromagnetic waves is 2.45 GHz, the skin depth where eddy currents are concentrated is about 3 μm for nickel, and the thickness of the electric conductor thin film 22 is sufficiently smaller than this. Then, it is considered that eddy currents are generated almost uniformly.

When a portion close to the surface irradiated with electromagnetic waves in the electric conductor thin film 22 is a coating liquid side region 22 ₁ and a portion close to the base material 21 is a base material side region 22 ₂ , the coating liquid side region 22 ₁ and the base material In the side region 22 ₂ , eddy current Joule heat is generated.

The coating liquid side area 22 ₁ is in contact with the coating liquid film 23, and the heat generated in the coating liquid side area 22 ₁ heats the coating liquid film 23 to evaporate the solvent in the coating liquid film.
Since the coating liquid film 23 is cooled by the evaporation of the solvent, heat is easily conducted from the coating liquid side region 22 ₁ to the coating liquid film 23.
When the solvent in the coating liquid film 23 is heated above the evaporation temperature, the solvent evaporates, the coating liquid film 23 is dried and cured, and a coating film 24 is formed on the electric conductor thin film 22.

The base material side region 22 ₂ is in contact with the base material 21, and the heat generated in the base material side region 22 ₂ heats the surface of the base material 21 by heat conduction. However, the region of the base material 21 to be heated is in the range of a depth of several μm from the contact surface with the base material side region 22 _2, and is sufficiently small from the thickness of the whole base material 21. Since the whole is not overheated, it is not thermally deformed.

When the solvent in the coating liquid film 23 is heated above the evaporation temperature, the solvent evaporates, the coating liquid film 23 is dried and cured, and a coating film 24 is formed on the electric conductor thin film 22.
Reference numeral 37 indicates an irradiated electromagnetic wave.
Numeral 20 of FIG. 1 (d) ₃ includes a substrate 21, an electrically conductive thin film 22 which is deposited on the substrate 21, the coating comprising a coating film 24 which is deposited on the electrically conductive thin film 22 It is a product.
Adhesion between the electrically conductive thin film 22 and the substrate 21 of the coating article 20 ₃ is stronger than before microwave irradiation, because the surface of the base material 21 is considered because modified.
In the present invention, the number of times of electromagnetic wave irradiation is not limited to one time, and irradiation may be performed in a plurality of times.

In a first example of the present invention, instead dried by irradiating the coating liquid film electromagnetic waves to the drying by hot air, was cured, the electromagnetic wave coating object 20 ₂ as temporarily dried prior to the drying by hot air It may be irradiated.

<Example 1>
In the first example of the present invention, a plate-like polyethylene having a thickness of 1 mm, a length of 5 cm, and a width of 5 cm is used for the base material 21 and the electric conductor thin film 22 is 3.3 nm, 13.3 nm, 20.0 nm, or 26.7 nm. A Ni-Cr film is formed, CL-200 manufactured by Okitsumo Co., Ltd. is used as the coating liquid, the film thickness of the coating liquid film 23 is 5 μm, and the irradiation power of electromagnetic waves is 100 W, 150 W, 300 W, 500 W, irradiation time as 30 seconds, to obtain a coated article 20 _3.
The weight of the coating liquid film 23 was measured in advance before the electromagnetic wave irradiation, the weight of the coating film 24 was measured after the irradiation, and the weight change rate of the coating liquid film 23 before and after the electromagnetic wave irradiation was obtained.

In FIG. 5, the measurement results when the film thickness of the Ni—Cr film is 3.3 nm, 13.3 nm, 20.0 nm, and 26.7 nm are indicated by symbols ◆, ■, ●, and ▲ on the graph.
As a comparative example, the coating liquid film 23 on the Ni—Cr film having a film thickness of 3.3 nm, 13.3 nm, 20.0 nm, and 26.7 nm is replaced with heating of the coating liquid film 23 by electromagnetic wave irradiation, and the temperature is changed. The sample was heated by exposure to warm air at 70 ° C. for 10 minutes, and the other conditions were the same as in Example 1. The results obtained are the same (♦, ■, ●, ▲).

Also, the weight of the coating liquid film before and after drying when a coating liquid film made of CL-200 having a film thickness of 5 μm is formed on glass and exposed to hot air of 180 ° C. for 20 minutes in a drying chamber. A rate of change (about -30%) was obtained. In FIG. 5, a reference line K passing through the value of the weight change rate and parallel to the horizontal axis is indicated by a dotted line.
CL-200 is composed of xylene, N-butanol, cyclohexane, silicone, and the like, and is a thermosetting paint that dries and hardens when exposed to hot air of about 180 ° C. for 20 minutes, and is heated at 180 ° C. However, it is not desirable for the polymer material of the base material 21 made of plastic to be deformed or peeled off.
From FIG. 5, when the weight change rate of Example 1 of the present invention is closer to the reference line K than the weight change rate of the comparative example, it is considered that the coating liquid film was heated at a temperature close to 180 ° C. It does not occur and is desirable.
On the other hand, the absolute value of the weight change rate is larger than 30% when the electromagnetic wave of 300 W is irradiated with the film thickness of 13.3 nm and when the electromagnetic wave of 500 W is irradiated with the film thickness of 13.3 nm and 26.7 nm. The Ni—Cr film is heated too much and the temperature of the coating film 24 rises, and the coating film 24 is considered to be decomposed, which is not desirable.

<Example 2>
In the first example of the present invention, a plate-like polyethylene having a thickness of 1 mm, a length of 5 cm, and a width of 5 cm is used as the base material 21, and a 20.0 nm Ni—Cr film is formed as the electric conductor thin film 22. The coated product 20 ₃ was obtained using CL-200 for the irradiation power of 150 W for the electromagnetic wave.
The surface temperature of the coating film 24 was measured after irradiation with electromagnetic waves. In FIG. 6, the measurement result is indicated by a symbol M on the graph.
On the other hand, in order to measure the surface temperature of the electric conductor thin film 22, a Ni—Cr film having a thickness of 0 nm or 20.0 nm is formed on the polyethylene substrate 21 and then irradiated toward the Ni—Cr film. An electromagnetic wave having a power of 100 W to 300 W was irradiated, and the surface temperature of the Ni—Cr film was measured after the irradiation of the electromagnetic wave.

In FIG. 6, the measurement results of the temperature of the Ni—Cr film having a film thickness of 0 nm or 20.0 nm are indicated by symbols L ₁ and L ₂ .
From FIG. 5, the absolute value of the weight change rate obtained under the same conditions as the Ni—Cr film thickness condition and heating condition of Example 2 is close to 30%. If the temperature is 180 ° C. or higher, CL-200 can be dried and cured.

In FIG. 6, when the temperature of the coating film 24 of Example 2 and the temperature of the Ni—Cr film under the same conditions as in Example 2 are compared except that the coating liquid film 23 is not formed, the temperature difference is 10 Since it is about 0 ° C., even if the coating liquid film 23 is not formed, the surface temperature of the coating film 24 when the coating film 24 is formed can be estimated from the symbol L ₂ .
Although not shown in FIG. 6, it was confirmed that the surface of the Ni—Cr film rose to 250 ° C. or higher.

<Example 3>
In the first example of the present invention, polyethylene or polypropylene is used as the base material 21 and the electric conductor thin film 22 is 3.3 nm, 6.7 nm, 13.3 nm, 20.0 nm, 26.7 nm, 33.3 nm, 40 A Ni—Cr film having a thickness of 0.0 nm, 50.0 nm, or 60.0 nm is formed, CL-200 is used as a coating solution, the irradiation power of electromagnetic waves is 100 W, the irradiation time is 30 seconds, and the coated product. 20 ₃ was obtained.
Table 1 showing the heating state of the coating liquid film 23 with respect to the Ni-Cr film thickness condition was obtained.

The circles in Table 1 indicate that the Ni—Cr film is heated to a desired temperature (about the curing temperature of the coating solution) by electromagnetic wave irradiation. B in Table 1 indicates that a spark has occurred. The spark was generated because the base material 21 and the Ni—Cr film were separated, and electric discharge occurred between them.
As a comparative example, a Ni—Cr film having a thickness of 0 nm, 1.7 nm, 66.7 nm, 105 nm, 133 nm, and 200 nm is formed as the electric conductor thin film 22, and an electromagnetic wave is irradiated after the coating liquid film 23 is formed. Then, the heating state of the coating liquid film 23 was examined.

A in Table 1 indicates that the Ni—Cr film is not heated and the coating liquid film 23 is not heated.
The reason why the surface of the electric conductor thin film 22 does not generate heat when the film thickness of the Ni—Cr film is 1.7 nm is thought to be because the film thickness is thin and the induction heating effect due to electromagnetic waves hardly occurs.
From Example 3, the thickness of the Ni—Cr film is preferably in the range of 3.3 nm to 60.0 nm.
The sputtering time in Table 1 indicates the time required for forming the Ni—Cr film, and the light transmittance of the Ni—Cr film in Table 1 indicates the light (wavelength is 2000 nm) for each film thickness of the Ni—Cr film. Transmittance. Since the light transmittance when the film thickness of the Ni—Cr film is 3.3 nm is close to 80%, it can be used for the production of the glass substitute of the second example of the present invention described later.

Separately from Table 1, when 300 W electromagnetic waves were used and the coating liquid film 23 was irradiated under the same conditions as the Ni—Cr film of 0 nm to 1.7 nm in Table 1, the Ni—Cr film was heated. The temperature was not raised to the desired temperature. When the electromagnetic wave irradiation power is increased, an eddy current is generated on the surface of the electric conductor thin film, but the coating liquid film 23 cannot be dried. When the film thickness is 105 nm and 200 nm, the volume resistivity of the Ni—Cr film is 2.17 × 10 −4 Ωcm and 1.62 × 10 −4 Ωcm, respectively.
When the film thickness of the Ni—Cr film is 13.3 nm, the coating liquid film 23 is irradiated with an electromagnetic wave of 100 W, and from the weight of the coating liquid film measured before the electromagnetic wave irradiation, the electromagnetic wave is irradiated. When the reduction amount of the weight of the coating film was measured, the reduction amount was saturated in 30 seconds. Therefore, the electromagnetic wave irradiation time when the coating solution is CL-200 is preferably 30 seconds.

<Example 4>
In the first example of the present invention, polyethylene having a surface area of 25 cm ² is used as the base material 21, a Ni—Cr film having a thickness of 13.3 nm is formed as the electric conductor thin film 22, and CL-200 is applied to the coating liquid. The coating liquid film forming apparatus 31 has a rotation speed of 200 r. p. m. And 2000r. p. m. The coating liquid film 23 having a weight of 0.1203 g or 0.0174 g and a film thickness of 30.0 μm or 5.0 μm was formed using the above spin coat. The irradiation power of the electromagnetic wave 100W, 150 W, 300 W, 500 W, irradiation time of 30 seconds to obtain a coating product 20 _3.

The weight change rate of the coating liquid film 23 was obtained in advance from the weight of the coating liquid film 23 measured before the electromagnetic wave irradiation and the weight of the coating film 24 after the electromagnetic wave irradiation. The weight of the coating liquid film 23 before electromagnetic wave irradiation was measured after exposure to the atmosphere for 10 minutes at room temperature.
Table 2 was obtained by changing the condition of the irradiation power of the electromagnetic wave and the condition of the weight of the coating liquid film 23.

PE1 and PE2 in Table 2 represent polyethylene.
As a comparative example, a coating liquid film 23 made of CL-200 having a weight of 0.014 g is formed on a glass surface by spin coating, and the coating liquid film 23 is dried by being exposed to hot air of 180 ° C. for 20 minutes to be cured. I let you.

G1 in Table 2 indicates glass. A rotational speed of 2000 r.s. is used to form the coating liquid film 23 on G1. p. m. Spin coating was used.
From the comparative example, the absolute value of the weight change rate when the coating liquid film 23 is dried and cured by warm air is about 30%.

  Since the absolute value of the weight change rate when PE1 is irradiated with electromagnetic waves of 100 W, 150 W, 300 W, and 500 W is smaller than 30%, it can be seen that the coating liquid film 23 is not sufficiently heated to dry. . The reason why PE1 is not heated is considered to be that heat is not easily transmitted from the surface of the Ni—Cr film to the surface of the coating liquid film 23 because the coating liquid film 23 is thicker than in the first embodiment. Since the absolute value of the weight change rate of PE1 when the irradiation power of electromagnetic waves is 100 W is smaller than 30%, the coating liquid film 23 is not sufficiently heated and is not desirable. It is considered that PE1 is not heated because the coating liquid film 23 is thicker and heavier than PE2 in the case of 100 W, so that it is difficult to transfer heat from the surface of the Ni—Cr film to the surface of the coating liquid film 23. . The absolute value of the weight change rate of PE2 in the case of 150 W is close to 30%, and the coating liquid film 23 is considered to be dried and hardened, which is desirable. The absolute value of the weight change rate of PE2 in the case of 300 W and 500 W is larger than 30%, the electric conductor thin film 22 is excessively heated, the base material 21 is thermally deformed, the coating film 24 is heated, and the coating is performed. It is believed that the membrane 24 has degraded and is undesirable.

From Example 4, it is considered that the irradiation power of the electromagnetic wave applied to the coating liquid film 23 is in the range of 4 W to ²⁰ W per 1 cm ² by heating the electric conductor thin film 22 and drying and curing the coating liquid film 23. .

<Second example of the present invention>
Coated article 20 ₃ of the first example of the present invention can be used as a replacement for automobiles and electric and electronic components and resin or glass that is used in industrial products and daily commodities such as houses.
For example, when used as a window glass of an automobile, a plate-like polycarbonate is used for the base material 21 in the process of the first example of the present invention, and a transparent Ni—Cr film is formed as the electric conductor thin film 22 and applied. coating material of the liquid film 23, as a hard coating composition consisting of SiO _2, an electromagnetic wave is irradiated to the coating solution film 23, the coating product 20 ₃ obtained by forming a coating film 24, as a window glass for automobiles and buildings Is available. As the electric conductor thin film 22, a transparent conductor thin film such as ITO may be used.

<Third example of the present invention>
A second example of the coating film forming method of the present invention will be described.
Reference numeral 60 in FIG. 7 denotes a resin film coating apparatus, which includes a roll 55, an electric conductor thin film forming apparatus 16, a coating liquid film forming apparatus 31, and an electromagnetic wave irradiation apparatus 35.
A substrate 51 made of paper or film-like resin is wound around the roll 55.
The electric conductor thin film forming apparatus 16 has a front chamber 17, a film forming chamber 18, and a rear chamber 19, and each chamber is connected by elongated holes 15 ₂ and 15 ₃ through which the substrate 51 passes. ing.

The front chamber 17 is disposed upstream of the film formation chamber 18, and the rear chamber 19 is disposed downstream of the film formation chamber 18. The roll 55 is disposed in the front stage of the front chamber 17, and is configured such that when the base material 51 is pulled out from the roll 55, the roll 55 can be pulled out from the rear chamber 19 through the film formation chamber 18.
A coating liquid film forming apparatus 31 and an electromagnetic wave irradiation apparatus 35 are arranged in this order at the rear stage of the rear chamber 19, and the drawn base material 51 is placed under the coating liquid film forming apparatus 31 and electromagnetic waves. It passes under the irradiation device 35 and is configured to be wound around the winding device 39.
The chambers 17 to 19 are evacuated by evacuation systems 27 to 29, and the pressure in the film forming chamber 18 is configured to be lower than the pressure in the front chamber 17 and the rear chamber 19.

When the leading end of the base material 51 is held by the winding device 39 and the winding device 39 is operated, the base material 51 is pulled out from the roll 55. Substrate 51 drawn in through the elongated hole 15 ₁ while moving, into the interior of the front chamber 17. Through the elongated hole 15 ₂ between the front chamber 17 and the film-forming chamber 18 the substrate 51 enters the inside of the film forming chamber 18.
The target 12 is disposed on the ceiling portion inside the film forming chamber 18. When the sputtering gas is introduced into the film forming chamber 18 to form plasma of the sputtering gas and the target is sputtered, the substrate 51 moves while moving. A film-like electric conductor thin film 52 is formed on the surface of the film.
The base material 51 on which the electric conductor thin film 52 is formed passes through the elongated hole 15 ₃ between the film forming chamber 18 and the rear chamber 19 and enters the rear chamber 19.

Substrate 51 passes through the elongated hole 15 ₄ serving as the outlet of the substrate 51 while moving inside the rear chamber 19 and exits to the outside of the rear chamber 19.
The base material 51 reaches the bottom of the coating liquid film forming apparatus 31. When a droplet of the coating liquid is ejected from the ejection portion of the coating liquid film forming apparatus 31 from the electric conductor thin film 52 side of the base material 51 toward the electric conductor thin film 52, the base material 51 is electrically moved while moving. The droplets land on the surface of the conductor thin film 52, and a film-like coating liquid film 53 is formed.

  The substrate 51 on which the coating liquid film 53 is formed on the outermost layer passes under the coating liquid film forming apparatus 31 and reaches below the electromagnetic wave irradiation apparatus 35. When the electromagnetic wave is irradiated to the coating liquid film 53 side of the base material 51, the surface of the electric conductor thin film 52 on the coating liquid film 53 side is heated by the induction heating effect while the base material 51 moves, and the coating liquid film is heated. When the temperature rises, the coating liquid film 53 becomes a film-like coating film 54. After the coating film 54 is formed, the substrate 51 passes under the electromagnetic wave irradiation device 35.

  Reference numeral 57 denotes a coating film obtained by this manufacturing method. When the coating film 57 is wound around the winding device 39, a coating film roll 59 is generated. In the second example of the coating film forming method described above, the base material 51 is subjected to the process while moving. However, while the substrate 51 is stationary, the process of forming the electric conductor thin film and the process of heating by electromagnetic wave irradiation may be performed. .

  Reference numeral 56 denotes an adhesive film roll composed of a release film 58 on which an adhesive is disposed. The release film 58 is pulled out from the adhesive film roll 56, contacts the back surface of the substrate 51 on the bonding roller 38, and peels off. An adhesive layer can be formed on the coating film 57 by laminating the film 58.

  In addition, instead of attaching the release film 58, it is irradiated with electromagnetic waves, and after the coating liquid film 53 is dried, the produced coating film 57 is turned over, and the adhesive film is formed on the surface where the coating liquid film 54 is not formed. An adhesive layer may be formed by applying a coating solution. After the adhesive layer is formed, the adhesive can be cured by irradiating the electromagnetic wave toward the adhesive layer.

<Fourth Example of the Present Invention>
The coating film 57 of the third example of the present invention can be used by being affixed to a film formation target, and can also be used by being affixed to a film formation target having a three-dimensional curved shape that is difficult to form a film. is there. The coating film 57 obtained by using SiO ₂ or SiN as a coating material of the coating liquid film 53 in the coating liquid film forming process of the third example of the present invention is protected by being attached to an aluminum sash, a gasoline tank or the like. The coating film 57 obtained by using a coating material as a coating liquid can be used for decoration of a mobile phone casing and the like, and can be obtained by using a functional film as the coating film 54. The coated film 57 can be used for various purposes such as antifouling, mold prevention, and deodorization.

<Others>
In the above example, the coating liquid films 23 and 53 are dried and cured by electromagnetic wave irradiation, but the coating liquid films 23 and 53 may be cured by evaporating the solvent of the coating liquid and causing a chemical reaction by electromagnetic wave irradiation. .

(A)-(c): The figure for demonstrating the coating target object of this invention, (d): The figure for demonstrating the coated article of this invention Example of film forming apparatus for forming a film on a substrate of the present invention Example of coating liquid film forming apparatus for forming coating liquid film on coating object and electric conductor thin film of the present invention An example of an electromagnetic wave irradiation apparatus for heating an object to be coated and an electric conductor thin film of the present invention Graph for explaining the rate of change in weight of coating liquid film Graph for explaining temperature characteristics of coating liquid film and electric conductor thin film Other examples of the present invention

Explanation of symbols

20 _1, 20 ₂ ...... coating object 20 ₃ ...... coated article 21, 51 ...... substrate 22, 52 ...... electrically conductive thin film 23, 53 ...... coating liquid film 24, 54 ...... coating film 10 , 16 ... Electric conductor thin film deposition apparatus 31 ... Coating liquid film deposition apparatus 35 ... Electromagnetic wave irradiation apparatus 57 ... Coating film

Claims (4)

An electric conductor thin film forming step of forming an electric conductor thin film on the surface of a base material made of a polymer material;
A coating liquid film forming step of forming a coating liquid film on the surface of the electric conductor thin film;
The coating liquid film is irradiated with electromagnetic waves toward the coating liquid film to cause heat generation on the surface of the electric conductor thin film on the coating liquid film side, and the coating liquid film by heat conduction from the surface of the electric conductor thin film on the coating liquid film side. And an electromagnetic wave heating step of drying and curing the coating liquid film. The base material is a film, and the base material drawn out from an original roll on which the base material is wound is wound on a take-up roll, and the electric power is transferred while the base material is stationary or moving. A conductor thin film forming step;
A coating liquid film forming step;
The coating film formation method of Claim 1 which performs an electromagnetic wave heating process.   2. The coating film forming method according to claim 1, wherein the electric conductor thin film forming step forms the electric conductor thin film by sputtering.   The said base material is a plate-shaped polycarbonate, the said electrical conductor thin film is transparent Ni-Cr, the said coating film is a hard-coat paint, It is obtained by the coating film film-forming method of Claim 1 Glass substitute.

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