JP2010121977A5 - - Google Patents

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JP2010121977A5
JP2010121977A5 JP2008293851A JP2008293851A JP2010121977A5 JP 2010121977 A5 JP2010121977 A5 JP 2010121977A5 JP 2008293851 A JP2008293851 A JP 2008293851A JP 2008293851 A JP2008293851 A JP 2008293851A JP 2010121977 A5 JP2010121977 A5 JP 2010121977A5
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Japan
Prior art keywords
phase
light
light intensity
relative phase
maximum point
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JP2008293851A
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Japanese (ja)
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JP5124424B2 (en
JP2010121977A (en
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Priority to JP2008293851A priority Critical patent/JP5124424B2/en
Priority claimed from JP2008293851A external-priority patent/JP5124424B2/en
Priority to US12/607,357 priority patent/US8102537B2/en
Publication of JP2010121977A publication Critical patent/JP2010121977A/en
Publication of JP2010121977A5 publication Critical patent/JP2010121977A5/ja
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Claims (5)

検出光を生成する検出光生成手段と、
上記検出光の一部を反射し、検出光の他の一部を検査対象物側に透過させる基準面と、
上記基準面による反射光及び上記検査対象物による反射光からなる干渉光を分光する分光手段と、
分光後の上記干渉光を受光し、干渉光の波数に関する光強度分布を生成する光強度分布生成手段と、
上記波数に関する光強度分布を波数に対する光強度の空間周波数に関する光強度分布に変換し、上記空間周波数に関する光強度分布の極大点を抽出することを一定の時間間隔で繰返す光強度極大点抽出手段と、
上記波数に関する光強度分布の上記極大点の空間周波数に対応する周波数成分の位相を決定する位相決定手段と、
上記位相に基づいて、上記検査対象物の変位量を判定する変位量判定手段とを備え、
上記位相決定手段が、上記周波数成分の相対位相を３６０度の範囲内で判定する相対位相判定手段と、
上記相対位相判定手段による判定結果及び過去の判定結果に基づいて上記相対位相をつなぎ合わせ、絶対位相を求める絶対位相算出手段と、
リセット指示に基づいて、上記絶対位相の基準点を更新する位相基準更新手段とを有し、
上記変位量判定手段が、上記絶対位相に基づいて変位量を判定することを特徴とする光学式変位計。 Detection light generating means for generating detection light;
A reference surface that reflects a part of the detection light and transmits another part of the detection light to the inspection object side;
A spectroscopic means for splitting interference light composed of reflected light from the reference surface and reflected light from the inspection object;
A light intensity distribution generating means for receiving the interference light after the spectroscopy and generating a light intensity distribution related to the wave number of the interference light;
A light intensity maximum point extracting means for converting the light intensity distribution related to the wave number into a light intensity distribution related to the spatial frequency of the light intensity relative to the wave number, and extracting the maximum point of the light intensity distribution related to the spatial frequency at regular time intervals; ,
Phase determining means for determining the phase of the frequency component corresponding to the spatial frequency of the maximum point of the light intensity distribution relating to the wave number;
A displacement amount determination means for determining a displacement amount of the inspection object based on the phase;
The phase determining means determines the relative phase of the frequency component within a range of 360 degrees;
Based on the determination result by the relative phase determination unit and the past determination result, the relative phase is connected, and an absolute phase calculation unit for obtaining an absolute phase;
Phase reference update means for updating the reference point of the absolute phase based on a reset instruction,
The optical displacement meter, wherein the displacement amount determining means determines a displacement amount based on the absolute phase. 上記絶対位相算出手段は、最後に得られた相対位相とその直前に得られた相対位相との差が第１閾値を越えていれば、上限又は下限を跨いで得られた相対位相であると判断し、これらの相対位相をつなぎ合わせることを特徴とする請求項１に記載の光学式変位計。 If the difference between the last obtained relative phase and the immediately preceding relative phase exceeds the first threshold, the absolute phase calculating means is a relative phase obtained over the upper limit or the lower limit. 2. The optical displacement meter according to claim 1, wherein the relative phase is judged and connected. 最後に得られた相対位相とその直前に得られた相対位相との差が第１閾値よりも小さな第２閾値を越えた場合に、警告表示を行う表示手段を備えたことを特徴とする請求項２に記載の光学式変位計。 A display means for displaying a warning when a difference between the last obtained relative phase and the immediately preceding relative phase exceeds a second threshold smaller than the first threshold is provided. Item 3. The optical displacement meter according to Item 2. 上記光強度極大点抽出手段が、上記空間周波数ごとの強度データを重心処理して上記極大点を決定することを特徴とする請求項１に記載の光学式変位計。 2. The optical displacement meter according to claim 1, wherein the light intensity maximum point extracting means determines the maximum point by performing a gravity center process on the intensity data for each spatial frequency. 上記極大点の空間周波数に基づいて、上記絶対位相の検出範囲を推定する検出範囲推定手段を備え、
上記絶対位相算出手段が、上記検出範囲推定手段による推定結果に基づいて、絶対位相を求めることを特徴とする請求項１に記載の光学式変位計。 Based on the spatial frequency of the local maximum point, comprising a detection range estimation means for estimating the detection range of the absolute phase,
2. The optical displacement meter according to claim 1, wherein the absolute phase calculation means obtains an absolute phase based on an estimation result by the detection range estimation means.
JP2008293851A 2008-11-17 2008-11-17 Optical displacement meter Active JP5124424B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008293851A JP5124424B2 (en) 2008-11-17 2008-11-17 Optical displacement meter
US12/607,357 US8102537B2 (en) 2008-11-17 2009-10-28 Optical displacement gage

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008293851A JP5124424B2 (en) 2008-11-17 2008-11-17 Optical displacement meter

Publications (3)

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JP2010121977A JP2010121977A (en) 2010-06-03
JP2010121977A5 true JP2010121977A5 (en) 2011-11-10
JP5124424B2 JP5124424B2 (en) 2013-01-23

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JP2008293851A Active JP5124424B2 (en) 2008-11-17 2008-11-17 Optical displacement meter

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US (1) US8102537B2 (en)
JP (1) JP5124424B2 (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5382038B2 (en) * 2011-03-23 2014-01-08 パルステック工業株式会社 Thickness measuring device for translucent tubular object
JP5961938B2 (en) * 2011-07-15 2016-08-03 国立大学法人山梨大学 Monospectral marker and method and apparatus for detecting the same
JP5674701B2 (en) * 2012-03-22 2015-02-25 株式会社東芝 Information processing terminal device
JP2014013150A (en) * 2012-07-03 2014-01-23 Shimadzu Corp Light irradiation device
EP3111833A1 (en) * 2014-01-31 2017-01-04 The General Hospital Corporation Method and apparatus for performing multidimensional velocity measurements based on amplitude and phase signals in the field of optical interferometry
DE102015200034A1 (en) 2014-03-31 2015-10-01 Micro-Epsilon Optronic Gmbh spectrometer
CN106471332B (en) 2014-06-27 2019-07-09 株式会社基恩士 Multi-wavelength confocal measuring device
JP6309366B2 (en) * 2014-06-30 2018-04-11 株式会社ホロン Height measuring device and autofocus device in charged particle beam device
JP6767753B2 (en) * 2015-03-02 2020-10-14 株式会社ミツトヨ Chromatic confocal sensor and measurement method
JP6725988B2 (en) 2016-01-26 2020-07-22 大塚電子株式会社 Thickness measuring device and thickness measuring method
JP6692651B2 (en) * 2016-02-05 2020-05-13 株式会社ミツトヨ Chromatic confocal sensor
JP7143057B2 (en) 2016-12-28 2022-09-28 株式会社キーエンス Three-dimensional measuring device
JP6859098B2 (en) 2016-12-28 2021-04-14 株式会社キーエンス Optical scanning height measuring device
JP6829992B2 (en) 2016-12-28 2021-02-17 株式会社キーエンス Optical scanning height measuring device
JP6829993B2 (en) 2016-12-28 2021-02-17 株式会社キーエンス Optical scanning height measuring device
JP7018098B2 (en) * 2020-08-13 2022-02-09 株式会社ホロン Autofocus device
CN112556579A (en) * 2020-12-25 2021-03-26 深圳市中图仪器股份有限公司 Six-degree-of-freedom space coordinate position and attitude measuring device

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3148001B2 (en) * 1992-06-05 2001-03-19 オリンパス光学工業株式会社 Wavefront phase joining method by fringe scanning interferometry
JP3382011B2 (en) 1993-04-06 2003-03-04 株式会社東芝 Film thickness measuring device, polishing device and semiconductor manufacturing device
JPH09210628A (en) * 1996-01-30 1997-08-12 Sefuto Kenkyusho:Kk Position measuring device
US5610716A (en) * 1995-08-28 1997-03-11 Hewlett-Packard Company Method and apparatus for measuring film thickness utilizing the slope of the phase of the Fourier transform of an autocorrelator signal
JP2001093885A (en) * 1999-09-22 2001-04-06 Olympus Optical Co Ltd Monitoring device for etching
JP2003279324A (en) * 2002-03-22 2003-10-02 Toppan Printing Co Ltd Film thickness measuring method and device thereof
WO2005015149A1 (en) * 2003-08-12 2005-02-17 Bussan Nanotech Research Institute, Inc. Detection device, optical path length measurement device, measurement instrument, optical member evaluation method, and temperature change detection method
JP4398277B2 (en) * 2004-01-15 2010-01-13 株式会社山武 3D measuring device, 3D measuring method, and 3D measuring program
US7158240B2 (en) * 2004-06-16 2007-01-02 The United States Of America As Represented By The Secretary Of The Army Measurement device and method
TWI278682B (en) * 2004-11-23 2007-04-11 Ind Tech Res Inst Fiber optic interferometric position sensor and measuring method thereof
US7187816B2 (en) * 2004-12-13 2007-03-06 Purdue Research Foundation In-fiber whitelight interferometry using long-period fiber grating
US7515275B2 (en) * 2006-07-18 2009-04-07 Institut National D'optique Optical apparatus and method for distance measuring

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