JP2010117368A - X-ray diffraction apparatus and x-ray adjusting method - Google Patents

X-ray diffraction apparatus and x-ray adjusting method Download PDF

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JP2010117368A
JP2010117368A JP2010033218A JP2010033218A JP2010117368A JP 2010117368 A JP2010117368 A JP 2010117368A JP 2010033218 A JP2010033218 A JP 2010033218A JP 2010033218 A JP2010033218 A JP 2010033218A JP 2010117368 A JP2010117368 A JP 2010117368A
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JP5163667B2 (en
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Kanji Kobayashi
寛治 小林
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Shimadzu Corp
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<P>PROBLEM TO BE SOLVED: To provide an X-ray diffraction apparatus with a smaller amount of movement required for X-ray adjustment and with a smaller amount of time required for X-ray adjustment. <P>SOLUTION: The X-ray diffraction apparatus including a horizontal goniometer to carry out θ-θ scanning is configured to include a rolling mechanism 5 that rotates an X-ray source 2 on an axis of rotation orthogonal to a direction in which the X-ray source 2 emits X rays, wherein X-ray adjustment is carried out through the rotation of the X-ray source 2 by the rolling mechanism 5. The rolling mechanism 5 changes the direction of X-ray radiation by rotating the X-ray source 2. By changing the direction of X-ray radiation through rotational movements, the amount of movement required for X-ray adjustment and the amount of adjusting time required for X-ray adjustment are reduced. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、X線回折装置に関し、特にゴニオメータの調整に関する。 The present invention relates to an X-ray diffractometer, and more particularly to adjustment of a goniometer.

X線回折装置では、X線源から発せられたX線を試料の分析位置に照射し、該分析位置で回折されたX線を検出器で検出する。この分析位置に対するX線源と検出器のそれぞれの入射角を等しくする機構として水平ゴニオメータ等の機構が用いられている。通常、このような水平ゴニオメータによって試料上を走査するX線回折装置はθ−θスキャン型X線装置と呼ばれており、試料を試料取付け部上において水平ゴニオメータのゴニオメータ中心軸の位置に固定し、X線源から照射されたX線が試料上の分析位置を通るようにゴニオメータを調整している。 In an X-ray diffractometer, X-rays emitted from an X-ray source are irradiated to an analysis position of a sample, and X-rays diffracted at the analysis position are detected by a detector. A mechanism such as a horizontal goniometer is used as a mechanism for equalizing the incident angles of the X-ray source and the detector with respect to the analysis position. Usually, such an X-ray diffractometer that scans a sample with a horizontal goniometer is called a θ-θ scan type X-ray device, and the sample is fixed on the goniometer central axis of the horizontal goniometer on the sample mounting portion. The goniometer is adjusted so that the X-rays irradiated from the X-ray source pass through the analysis position on the sample.

従来、ゴニオメータによるX線調整は、入射X線が試料分析位置を通るようにX線源自体を上下方向に移動させて行っている。そのため、従来のX線回折装置に設けられたゴニオメータは、X線源を上下方向に移動させる上下機構を備えている。 Conventionally, X-ray adjustment by a goniometer is performed by moving the X-ray source itself up and down so that incident X-rays pass through the sample analysis position. Therefore, the goniometer provided in the conventional X-ray diffractometer is provided with a vertical mechanism that moves the X-ray source in the vertical direction.

従来のX線回折装置では、上下機構によってX線源を上下方向に移動させることによって、X線源からのX線が試料の分析位置に照射されるようにX線調整を行っている。この上下機構はX線を並行移動させることによって位置調整を行うため、上下方向に大きな動作量を必要とし、また、調整時間も長くなるという問題がある。 In the conventional X-ray diffractometer, the X-ray adjustment is performed so that the X-ray from the X-ray source is irradiated to the analysis position of the sample by moving the X-ray source in the vertical direction by the vertical mechanism. Since the vertical mechanism performs position adjustment by moving X-rays in parallel, there is a problem that a large amount of movement is required in the vertical direction and that the adjustment time becomes long.

そこで、本発明は前記した従来の問題点を解決し、X線回折装置において、X線調整に要する動作量を減少させることを目的とし、また、X線調整に要する調整時間を減少させることを目的とする。 Accordingly, the present invention aims to solve the above-described conventional problems, and to reduce the amount of operation required for X-ray adjustment in an X-ray diffraction apparatus, and to reduce the adjustment time required for X-ray adjustment. Objective.

本発明は、X線源とを回転させる回転機構を備え、この回転機構によってX線源と該X線源から放出されるX線を通すスリットとを回転させることによってX線の照射方向を変更する。X線の照射方向の変更を回転動作で行うことによって、X線調整に要する動作量、及びX線調整に要する調整時間を減少させる。本発明のX線回折装置は、水平ゴニオメータを備えθ−θスキャンを行うX線回折装置において、X線源のX線放出方向と直交する方向を回転軸方向としてX線源と該X線源から放出されるX線を通すスリットとを回転させる回転機構を備えた構成とし、回転機構によるX線源と該X線源から放出されるX線を通すスリットとの回転によってX線調整を行う。 The present invention includes a rotation mechanism that rotates an X-ray source , and changes the X-ray irradiation direction by rotating the X-ray source and a slit through which X-rays emitted from the X-ray source are rotated by the rotation mechanism. To do. By changing the irradiation direction of X-rays by a rotation operation, the operation amount required for X-ray adjustment and the adjustment time required for X-ray adjustment are reduced. X-ray diffraction apparatus of the present invention provides an X-ray diffraction apparatus for performing theta-theta scan includes a horizontal goniometer, an X-ray source and a direction perpendicular to the X-ray emission direction of the X-ray source as a rotation axis direction and the X-ray source And a rotation mechanism that rotates a slit through which X-rays emitted from the X-ray are rotated, and X-ray adjustment is performed by rotation of the X-ray source by the rotation mechanism and a slit through which X-rays emitted from the X-ray source pass. .

回転機構は、X線源と該X線源から放出されるX線を通すスリットとを回転させることによってX線の放出方向を変更し、これによって、試料の分析位置に対するX線の照射位置を調整する。X線源の回転は、X線源のX線放出方向と直交する方向を回転軸方向として行う。X線の照射位置におけるX線の移動量は、X線源の回転角度と、X線源と照射位置との距離の積で定まる。従来の上下機構による上下動では、調整量とほぼ同じ量だけ移動させる必要があるのに対して、本発明のX線回折装置では、X線源と該X線源から放出されるX線を通すスリットの回転角度をわずかに調整することによってX線の位置調整を行うことができる。回転機構の一形態は、X線源を回転軸回りで調節ねじによって回転させることによって行う構成とすることができ、調節ねじとして例えばマイクロメータを用いることができ、微調整も可能である。 The rotation mechanism changes the X-ray emission direction by rotating the X-ray source and the slit through which the X-rays emitted from the X-ray source pass , thereby changing the X-ray irradiation position with respect to the analysis position of the sample. adjust. The X-ray source is rotated with the direction orthogonal to the X-ray emission direction of the X-ray source as the rotation axis direction. The amount of X-ray movement at the X-ray irradiation position is determined by the product of the rotation angle of the X-ray source and the distance between the X-ray source and the irradiation position. In the vertical movement by the conventional vertical mechanism, it is necessary to move by almost the same amount as the adjustment amount, whereas in the X-ray diffraction apparatus of the present invention, the X-ray source and the X-ray emitted from the X-ray source are transmitted. The X-ray position can be adjusted by slightly adjusting the rotation angle of the slit to be passed. One form of the rotation mechanism can be configured by rotating the X-ray source around the rotation axis with an adjustment screw. For example, a micrometer can be used as the adjustment screw, and fine adjustment is also possible.

本発明のX線回折装置のX線調整方法は、X線の一部を遮蔽する治具を分析位置に配置し、この治具を分析位置において、入射X線と直交し、且つ、前記水平ゴニオメータのゴニオメータ中心軸と同一方向の回転軸回りで180度異なる2つの回転位置とし、それぞれの回転位置において治具を通過するX線量を測定する。X線源と試料分析位置と検出器が一直線上に位置合わせされている場合には、治具の180度異なる2つの回転位置における測定X線量は等しくなる。そこで、X線放出方向と直交する方向を回転軸方向としてX線源を回転させ、2つの治具の回転位置におけるX線測定量が所定関係となるようX線源の回転位置を調整する。 In the X-ray adjustment method of the X-ray diffractometer according to the present invention, a jig for shielding a part of the X-ray is disposed at the analysis position, and the jig is orthogonal to the incident X-ray at the analysis position and the horizontal Two rotational positions differing by 180 degrees around the rotational axis in the same direction as the goniometer central axis of the goniometer, and the X-ray dose passing through the jig is measured at each rotational position. When the X-ray source, the sample analysis position, and the detector are aligned on a straight line, the measured X-ray doses at two rotation positions different by 180 degrees of the jig are equal. Therefore, the X-ray source is rotated with the direction orthogonal to the X-ray emission direction as the rotation axis direction, and the rotational position of the X-ray source is adjusted so that the X-ray measurement amounts at the rotational positions of the two jigs have a predetermined relationship.

本発明の態様によれば、従来の上下機構と比較して、少ない動作量で調整することができ、また、調整時間も短縮することができる。また、本発明による回転機構は、従来の上下機構と比較して部品点数を少なくすることができるため軽量とすることができ、ゴニオメータを駆動する駆動部に対する負担を軽減することができる。 According to the aspect of the present invention, it is possible to perform adjustment with a small amount of operation and to shorten the adjustment time as compared with the conventional vertical mechanism. Further, the rotation mechanism according to the present invention can reduce the number of parts as compared with the conventional vertical mechanism, so that the rotation mechanism can be reduced in weight, and the burden on the drive unit that drives the goniometer can be reduced.

以上説明したように、本発明のX線回折装置によれば、X線調整に要する動作量を減少させることができ、また、X線調整に要する調整時間を減少させることができる。 As described above, according to the X-ray diffraction apparatus of the present invention, the amount of operation required for X-ray adjustment can be reduced, and the adjustment time required for X-ray adjustment can be reduced.

本発明のX線回折装置を説明するための概略図である。It is the schematic for demonstrating the X-ray-diffraction apparatus of this invention. 本発明の回転機構による動作、及び回転機構を用いたX線調整に用いる治具を説明するための図である。It is a figure for demonstrating the operation | movement by the rotation mechanism of this invention, and the jig | tool used for X-ray adjustment using a rotation mechanism. 本発明の回転機構による動作、及び回転機構を用いたX線調整に用いる治具を説明するための図である。It is a figure for demonstrating the operation | movement by the rotation mechanism of this invention, and the jig | tool used for X-ray adjustment using a rotation mechanism. 本発明によるX線回折装置のX線調整方法を説明するためのフローチャートである。It is a flowchart for demonstrating the X-ray adjustment method of the X-ray-diffraction apparatus by this invention.

以下、本発明の実施の形態を、図を参照しながら詳細に説明する。図1は本発明のX線回折装置を説明するための概略図であり、水平ゴニオメータを後方に見る位置を示している。X線回折装置1は、試料ステージ(図示していない)上に配置した試料Sに対してX線を照射するX線源2と、試料Sで回折された回折X線を検出する検出器3とが水平ゴニオメータ4に取付けられた構成であり、本発明は、X線源2を回転させる回転機構5を備える。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. FIG. 1 is a schematic view for explaining an X-ray diffraction apparatus of the present invention, and shows a position where a horizontal goniometer is viewed backward. The X-ray diffractometer 1 includes an X-ray source 2 that irradiates a sample S placed on a sample stage (not shown) with X-rays, and a detector 3 that detects diffracted X-rays diffracted by the sample S. Are configured to be attached to the horizontal goniometer 4, and the present invention includes a rotation mechanism 5 that rotates the X-ray source 2.

回転機構5は、X線源2及び該X線源2から放出されるX線を絞って通すスリット2aを回転軸Rの回りで回転させる機構であり、ゴニオメータ4に設けた回転軸の回りに回転可能に軸支する構成とすることができ、任意の駆動手段によって回転駆動させることができる。回転機構5の駆動手段としては、例えば、回転軸Rから外れた位置をマイクロメータ等の調整ネジ6によって押すあるいは引き、調整ネジ6に移動量に応じて回転量を定める構成としたり、あるいは、回転軸Rを直接あるいは歯車を介して回転させる構成とすることができる。 The rotation mechanism 5 is a mechanism that rotates the X-ray source 2 and the slit 2a through which the X-rays emitted from the X-ray source 2 are narrowed and passed around the rotation axis R, around the rotation axis provided in the goniometer 4. It can be set as the structure supported so that rotation is possible, and it can be rotationally driven by arbitrary drive means. As the driving means of the rotation mechanism 5, for example, a position deviated from the rotation axis R is pushed or pulled by an adjustment screw 6 such as a micrometer, and the rotation amount is determined according to the amount of movement of the adjustment screw 6, or It can be set as the structure which rotates the rotating shaft R directly or via a gearwheel.

回転機構5の回転軸Rは、X線源2から放出されるX線AのX線放出方向と直交する方向を回転軸方向とし、例えばX線源2上でX線の放出軸上に設ける。なお、回転軸Rは必ずしもX線源2上やX線放出軸上に配置する必要はなく、X線源2から外れた位置に配置する構成や、X線放出軸から外れた位置に配置する構成とすることもできる。この回転機構5を回転動作させると、X線源2から放出されるX線Aの照射方向が変更し、試料S上におけるX線の照射位置Pを調整することができる。 The rotation axis R of the rotation mechanism 5 is a direction perpendicular to the X-ray emission direction of the X-ray A emitted from the X-ray source 2, and is provided on the X-ray emission axis on the X-ray source 2, for example. . Note that the rotation axis R is not necessarily arranged on the X-ray source 2 or the X-ray emission axis, and is arranged at a position away from the X-ray source 2 or at a position away from the X-ray emission axis. It can also be configured. When the rotating mechanism 5 is rotated, the irradiation direction of the X-ray A emitted from the X-ray source 2 is changed, and the irradiation position P of the X-ray on the sample S can be adjusted.

次に、本発明の回転機構による動作、及び回転機構を用いたX線調整に用いる治具について図2、図3を用いて説明する。本発明のX線回折装置のX線調整方法では、半割治具7を用いて回転機構の回転量を調整する。半割治具7は、回転支持体7dに遮蔽体7aを設けて構成され、回転支持体7dを180度回転させることによって、第1面7bを上方位置に、あるいは第2面7cを上方位置として位置決めすることができる。半割治具7は試料の分析位置に取り付け、X線源2と検出器3との間に配置する。X線源2から放出されたX線Aの一部は半割治具7の遮蔽体7aで遮蔽されるが、一部のX線は遮蔽体7aで遮蔽されることなく検出器3で検出される。 Next, the operation | movement by the rotation mechanism of this invention and the jig | tool used for the X-ray adjustment using a rotation mechanism are demonstrated using FIG. 2, FIG. In the X-ray adjustment method of the X-ray diffractometer of the present invention, the rotation amount of the rotation mechanism is adjusted using the half jig 7. The half jig 7 is configured by providing a rotating support 7d with a shield 7a. By rotating the rotating support 7d 180 degrees, the first surface 7b is set to the upper position or the second surface 7c is set to the upper position. Can be positioned as The half jig 7 is attached to the sample analysis position, and is arranged between the X-ray source 2 and the detector 3. A part of the X-ray A emitted from the X-ray source 2 is shielded by the shield 7a of the halving jig 7, but a part of the X-ray is detected by the detector 3 without being shielded by the shield 7a. Is done.

ここで、第1面7bの面の高さを試料の分析位置の高さに設定すると、遮蔽体7aを通過するX線量は分析位置に依存することになり、放出X線の分析位置に対する入射状態を知ることができる。 Here, when the height of the surface of the first surface 7b is set to the height of the analysis position of the sample, the X-ray dose that passes through the shield 7a depends on the analysis position, and the incident X-rays are incident on the analysis position. You can know the state.

図2(a),(b)及び図3(a),(b)は、X線源からの放出X線の分析位置に対する向きが位置合わせされている場合を示し、図2(c)及び図3(c),(d)は、X線源からの放出X線の分析位置に対する向きが位置合わせされていない場合を示している。放出X線の向きが分析位置に対して正しく設定されている場合には、図2(a)及び図3(a)に示すように、半割治具7の回転支持体7dを回転させ、第1面7bが上方を向くように位置決めすると、検出器3は分析位置を境として分析位置から上方を通過するX線を検出する。検出されるX線量は、図3(a)中のd1で示される幅に比例した量となる。 2 (a), 2 (b) and 3 (a), 3 (b) show the case where the direction of the emission X-ray from the X-ray source with respect to the analysis position is aligned, and FIG. 3C and 3D show a case where the direction of the emission X-ray from the X-ray source with respect to the analysis position is not aligned. When the direction of the emitted X-ray is correctly set with respect to the analysis position, as shown in FIGS. 2 (a) and 3 (a), the rotary support 7d of the half jig 7 is rotated, When the first surface 7b is positioned so as to face upward, the detector 3 detects X-rays passing upward from the analysis position with the analysis position as a boundary. The detected X-ray dose is an amount proportional to the width indicated by d1 in FIG.

他方、図2(b)及び図3(b)に示すように、半割治具7の回転支持体7dをさらに180度回転させ、第1面7bが下方を向くように位置決めすると、検出器3は分析位置を境として分析位置から下方を通過するX線を検出する。検出されるX線量は、図3(b)中のd2で示される幅に比例した量となる。放出X線の向きが分析位置に対して正しく設定されている場合には、2つの検出されるX線量(d1に比例する量及びd2に比例する量)は等しくなる。したがって、半割治具7の回転位置を異ならせて検出される図3(a)と図3(b)で検出されるX線量が等しい場合には、X線源の放出X線の向きが分析位置に対して正しく設定されていると判断することができる。 On the other hand, as shown in FIGS. 2B and 3B, when the rotation support 7d of the half jig 7 is further rotated 180 degrees and positioned so that the first surface 7b faces downward, the detector 3 detects X-rays passing downward from the analysis position with the analysis position as a boundary. The detected X-ray dose is an amount proportional to the width indicated by d2 in FIG. If the direction of the emitted X-ray is correctly set with respect to the analysis position, the two detected X-ray doses (a quantity proportional to d1 and a quantity proportional to d2) are equal. Therefore, when the X-ray dose detected in FIG. 3A and FIG. 3B detected by changing the rotational position of the half jig 7 is equal, the direction of the emitted X-ray of the X-ray source is It can be determined that the analysis position is set correctly.

これに対して、X線源の放出X線の向きが分析位置に対して正しく設定されていない場合には、図2(c)及び図3(c)に示すように、第1面7bが上方を向くように位置決めしたときには、検出器3は分析位置を境として分析位置から上方を通過するX線を検出する。このとき、X線源の放出X線の向きがずれているため、検出されるX線量は、図3(c)中のd3で示される幅に比例した量となる。 On the other hand, when the direction of the emitted X-ray of the X-ray source is not correctly set with respect to the analysis position, as shown in FIGS. 2 (c) and 3 (c), the first surface 7b is When the detector 3 is positioned so as to face upward, the detector 3 detects X-rays passing upward from the analysis position with the analysis position as a boundary. At this time, since the direction of the emitted X-ray of the X-ray source is deviated, the detected X-ray dose becomes an amount proportional to the width indicated by d3 in FIG.

他方、図3(d)に示すように、半割治具7の回転支持体7dを180度回転させ、第1面7bが下方を向くように位置決めしたときには、検出器3は分析位置を境として分析位置から下方を通過するX線を検出する。このとき、X線源の放出X線の向きがずれているため、検出されるX線量は、図3(d)中のd4で示される幅に比例した量となる。放出X線の向きが分析位置に対して正しく設定されていない場合には、2つの検出されるX線量(d3に比例する量及びd4に比例する量)には差が生じる。 On the other hand, as shown in FIG. 3 (d), when the rotary support 7d of the half jig 7 is rotated 180 degrees and positioned so that the first surface 7b faces downward, the detector 3 is located at the analysis position. X-rays passing below from the analysis position are detected. At this time, since the direction of the emitted X-ray of the X-ray source is deviated, the detected X-ray dose is an amount proportional to the width indicated by d4 in FIG. If the direction of the emitted X-ray is not set correctly with respect to the analysis position, there is a difference between the two detected X-ray doses (a quantity proportional to d3 and a quantity proportional to d4).

したがって、半割治具7の回転位置を異ならせて検出される図3(c)と図3(d)で検出されるX線量(d3に比例する量及びd4に比例する量)が異なる場合には、X線源の放出X線の向きが分析位置に対して正しく設定されていない判断することができる。 Therefore, when the X-ray dose (amount proportional to d3 and a proportion proportional to d4) detected in FIG. 3 (c) and FIG. 3 (d) detected by varying the rotation position of the half jig 7 is different. Therefore, it can be determined that the direction of the emitted X-ray of the X-ray source is not set correctly with respect to the analysis position.

図2(d)及び図3(e),(f)は、本発明によってX線源からの放出X線の分析位置に対する向きを位置合わせした場合を示している。上記の図2(c)及び図3(c),(d)ように、X線源の放出X線の向きが分析位置に対して正しく設定されていない場合において、本発明の回転機構はX線源を回転させることによって、X線源の放出X線の向きを分析位置に対して正しく設定する。 FIGS. 2D, 3E, and 3F show the case where the direction of the emission X-ray from the X-ray source with respect to the analysis position is aligned according to the present invention. As shown in FIGS. 2 (c), 3 (c) and 3 (d) above, when the direction of the emitted X-ray of the X-ray source is not set correctly with respect to the analysis position, the rotation mechanism of the present invention is By rotating the radiation source, the direction of the emitted X-ray of the X-ray source is correctly set with respect to the analysis position.

放出X線の向きが分析位置に対して正しく設定されていない場合、図2(d)及び図3(e),(f)に示すように、回転機構5を回転させてX線の放出方向を変更する。この回転によって、放出X線の半割治具7に対する入射角度が変わる。半割治具7の回転支持体7dを第1面7bが上方を向くように位置決めして、検出器3によって分析位置を境として分析位置から上方を通過するX線を検出すると、検出されるX線量は、図3(c)中のd3で示される幅に比例した量から、図3(e)中のd5で示される幅に比例した量に変化する。 When the direction of the emission X-ray is not set correctly with respect to the analysis position, the rotation mechanism 5 is rotated as shown in FIGS. 2D, 3E, and 3F to release the X-ray emission direction. To change. This rotation changes the incident angle of the emitted X-ray with respect to the half jig 7. This is detected when the rotary support 7d of the half jig 7 is positioned so that the first surface 7b faces upward, and the detector 3 detects X-rays passing upward from the analysis position with the analysis position as a boundary. The X-ray dose changes from an amount proportional to the width indicated by d3 in FIG. 3C to an amount proportional to the width indicated by d5 in FIG.

他方、図3(f)に示すように、半割治具7の回転支持体7dを第1面7bが下方を向くように位置決めすると、検出器3によって分析位置を境として分析位置から下方を通過するX線を検出すると、検出されるX線量は、図3(d)中のd4で示される幅に比例した量から、図3(e)中のd6で示される幅に比例した量に変化する。 On the other hand, as shown in FIG. 3 (f), when the rotation support 7d of the half jig 7 is positioned so that the first surface 7b faces downward, the detector 3 moves downward from the analysis position with the analysis position as a boundary. When the passing X-ray is detected, the detected X-ray dose is changed from an amount proportional to the width indicated by d4 in FIG. 3D to an amount proportional to the width indicated by d6 in FIG. Change.

次に、本発明によるX線回折装置のX線調整方法について、図4のフローチャートを用いて説明する。本発明によるX線回折装置のX線調整方法では、はじめに、試料を取り付けない状態において、試料の分析位置に半割治具7を取り付け(ステップS1)、回転支持体7dを表面(第1面7b(あるいは第1面7c))が上方を向くように位置決めしてセットした後(ステップS2)、X線源2からX線を放出し、半割治具7の遮蔽体7aを通過したX線を検出器3で検出し、カウント数n1を測定する(ステップS3)。 Next, an X-ray adjustment method of the X-ray diffraction apparatus according to the present invention will be described with reference to the flowchart of FIG. In the X-ray adjustment method of the X-ray diffraction apparatus according to the present invention, first, in a state where the sample is not attached, the half jig 7 is attached to the analysis position of the sample (Step S1), and the rotary support 7d is placed on the surface (first surface). 7b (or the first surface 7c) is positioned and set to face upward (step S2), then X-rays are emitted from the X-ray source 2 and passed through the shield 7a of the halving jig 7. The line is detected by the detector 3, and the count number n1 is measured (step S3).

次に、回転支持体7dを180度回転させて裏面(第1面7c(あるいは第1面7b))が上方を向くように位置決めしてセットした後(ステップS4)、X線源2からX線を放出し、半割治具7の遮蔽体7aを通過したX線を検出器3で検出し、カウント数n2を測定する(ステップS5)。測定したカウント数n1及びn2を比較し、n1とn2に差異があると判断される場合には(ステップS6)、回転機構によってX線源を回転し(ステップS7)、前記したステップS2〜ステップS6を繰り返す。 Next, the rotary support 7d is rotated 180 degrees and positioned and set so that the back surface (the first surface 7c (or the first surface 7b)) faces upward (step S4). The detector 3 detects the X-rays that have been emitted and passed through the shield 7a of the half jig 7, and the count number n2 is measured (step S5). When the measured count numbers n1 and n2 are compared and it is determined that there is a difference between n1 and n2 (step S6), the X-ray source is rotated by the rotation mechanism (step S7), and the above-described steps S2 to S2 are performed. Repeat S6.

測定したカウント数n1及びn2を比較し、n1とn2が等しいと判断される場合には、放出X線の分析位置に対する向きの位置合わせが完了する(ステップS6)。放出X線の分析位置に対する向きの位置合わせが完了した後、ステップS8〜ステップS10によって、ゴニオメータによってX線の試料に対する入射角度を設定する。図3(g)はこの角度設定を示している。 When the measured count numbers n1 and n2 are compared and it is determined that n1 and n2 are equal, the alignment of the direction of the emission X-ray with respect to the analysis position is completed (step S6). After the alignment of the direction of the emitted X-ray with respect to the analysis position is completed, the incident angle of the X-ray with respect to the sample is set by the goniometer in steps S8 to S10. FIG. 3 (g) shows this angle setting.

前記各ステップで使用した半割治具を取り外した後(ステップS8)、ゴニオメータを調整してX線の試料に対する入射角θsを調整し(ステップS9)、検出器によって検出強度を測定し(ステップS10)、検出強度がピーク値となるように(ステップS11)、ステップS9,10を繰り返す。検出強度がピーク値となったとき、X線の試料に対する入射角θsは最適な角度に設定される。なお、このとき、検出器に対する入射角θdは、ゴニオメータの機能によって、θsと同角度に設定される。 After removing the halving jig used in each step (step S8), the goniometer is adjusted to adjust the incident angle θs to the X-ray sample (step S9), and the detection intensity is measured by the detector (step S9). S10) Steps S9 and S10 are repeated so that the detected intensity becomes a peak value (step S11). When the detected intensity reaches a peak value, the incident angle θs with respect to the X-ray sample is set to an optimum angle. At this time, the incident angle θd with respect to the detector is set to the same angle as θs by the function of the goniometer.

1…X線回折装置、2…X線源、2a…スリット、3…検出器、4…水平ゴニオメータ、5…回転機構、6…調整ネジ、7…半割治具、7a…遮蔽部、7b…第1面、7c…第2面、A…X線、P…分析位置、R…回転軸、S…試料。 DESCRIPTION OF SYMBOLS 1 ... X-ray-diffraction apparatus, 2 ... X-ray source, 2a ... Slit, 3 ... Detector, 4 ... Horizontal goniometer, 5 ... Rotation mechanism, 6 ... Adjustment screw, 7 ... Half jig, 7a ... Shielding part, 7b ... 1st surface, 7c ... 2nd surface, A ... X-ray, P ... Analysis position, R ... Rotating shaft, S ... Sample.

Claims (2)

水平ゴニオメータを備えθ−θスキャンを行うX線回折装置において、
前記X線回折装置は、X線源と該X線源から放出されるX線を通すスリットと、
試料の分析位置に配置し、前記X線源が放出する放出X線と直交し、且つ、前記水平ゴニオメータのゴニオメータ中心軸と同一方向の回転軸回りで180度異なる2つの回転位置において前記放出X線の一部を遮蔽する半割治具と、
前記半割治具の前記異なる2つの回転位置において検出器が検出するX線量が所定関係となるように前記X線源および前記スリットの位置調整を行なう機構を備え、
前記位置調整を行なう機構は、前記X線源と前記スリットとを、前記水平ゴニオメータのゴニオメータ中心軸とは異なる位置で前記X線源のX線放出方向と直交する方向を回転軸方向として回転可能に支持する回転機構であって、
前記回転機構による前記X線源と前記スリットの回転によって、前記スリットを通るX線の照射位置を調整するX線調整を行うことを特徴とするX線回折装置。
In an X-ray diffractometer that includes a horizontal goniometer and performs a θ-θ scan ,
The X-ray diffractometer includes an X-ray source and a slit through which X-rays emitted from the X-ray source pass.
The emission X at two rotational positions which are arranged at the sample analysis position, orthogonal to the emission X-rays emitted by the X-ray source, and different by 180 degrees around the rotation axis in the same direction as the goniometer central axis of the horizontal goniometer A half jig that shields part of the wire;
A mechanism for adjusting the position of the X-ray source and the slit so that the X-ray dose detected by the detector at the two different rotational positions of the half jig has a predetermined relationship;
The mechanism for adjusting the position can rotate the X-ray source and the slit at a position different from the goniometer central axis of the horizontal goniometer, with the direction orthogonal to the X-ray emission direction of the X-ray source as the rotation axis direction. A rotating mechanism that supports
An X-ray diffraction apparatus for performing X-ray adjustment for adjusting an irradiation position of X-rays passing through the slit by rotation of the X-ray source and the slit by the rotating mechanism.
X線の一部を遮蔽する治具を分析位置に配置し、
前記治具を入射X線と直交し、且つ、前記水平ゴニオメータのゴニオメータ中心軸と同一方向の回転軸回りで180度異なる2つの回転位置において、前記治具によって入射X線の少なくとも一部が遮蔽されて通過するX線を測定し、
前記測定を、前記水平ゴニオメータのゴニオメータ中心軸とは異なる位置でX線源のX線放出方向と直交する方向を回転軸方向として、前記X線源とX線源から放出されるX線を通すスリットとを回転させて行い、
前記治具の2つの回転位置におけるX線測定量が所定関係となるようにX線源の回転位置を調整することによって、前記スリットを通るX線の照射位置を調整するX線調整を行うことを特徴とするX線回折装置のX線調整方法。
Place a jig to shield part of the X-rays at the analysis position,
The jig shields at least a part of the incident X-rays at two rotation positions that are orthogonal to the incident X-ray and are 180 degrees around the rotation axis in the same direction as the goniometer central axis of the horizontal goniometer. Measure the X-rays that pass through
The X-ray source and the X-ray emitted from the X-ray source are passed through the measurement, with the direction orthogonal to the X-ray emission direction of the X-ray source at a position different from the goniometer central axis of the horizontal goniometer. Rotate the slit and perform
X-ray adjustment is performed to adjust the irradiation position of the X-ray passing through the slit by adjusting the rotation position of the X-ray source so that the X-ray measurement amount at the two rotation positions of the jig has a predetermined relationship. An X-ray adjustment method for an X-ray diffractometer characterized by the above.
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