JP2010115353A - Lifting and polishing device - Google Patents

Lifting and polishing device Download PDF

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JP2010115353A
JP2010115353A JP2008290875A JP2008290875A JP2010115353A JP 2010115353 A JP2010115353 A JP 2010115353A JP 2008290875 A JP2008290875 A JP 2008290875A JP 2008290875 A JP2008290875 A JP 2008290875A JP 2010115353 A JP2010115353 A JP 2010115353A
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polishing
path portion
lifting
polishing cloth
game ball
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JP5395408B2 (en
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Takashi Takeda
隆司 武田
Masatoshi Michimata
将俊 道又
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Ace Denken KK
Shinko Seisakusho KK
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Ace Denken KK
Shinko Seisakusho KK
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a lifting and polishing device capable of preventing the breakage of a polishing cloth, improving durability, surely preventing faults and smudge due to broken fiber waste of the polishing cloth without inviting cost increase and improving polishing efficiency and lifting capability by mitigating the impact of game balls discharged by the centrifugal force of a lower roller. <P>SOLUTION: The lifting and polishing device includes an introducing path cover 40 which is disposed along the lower side of the lower roller 22 and forms a round introducing path 40a for introducing game balls with a lifting belt 30 circulated around the lower roller 22. An aligning path part 50 extended in a prescribed length in an upward direction along the rising surface 30a of the lifting belt 30 and connected to the lower end of the polishing cloth 80, for mitigating the impact of the game balls led out from the terminating end of the introducing path cover 40 and leading them to the polishing cloth 80 in an aligned state, is provided on a part connected to the terminating end of the introducing path cover 40. <P>COPYRIGHT: (C)2010,JPO&amp;INPIT

Description

本発明は、遊技機島に設置されるものであり、本体の上下位置にそれぞれ軸支された上ローラおよび下ローラと、該上下ローラの間に巻き掛けられた無端の揚送ベルトと、該揚送ベルトの上昇面に対向させて上下方向に張設した研磨布とを備え、前記揚送ベルトの上昇面と前記研磨布との間に遊技球を挟持させることにより、遊技球の揚送および研磨を行う揚送研磨装置に関する。   The present invention is installed on a gaming machine island, an upper roller and a lower roller respectively pivotally supported at the upper and lower positions of the main body, an endless feeding belt wound between the upper and lower rollers, A polishing cloth stretched in the vertical direction facing the rising surface of the lifting belt, and lifting the gaming ball by sandwiching the gaming ball between the rising surface of the lifting belt and the polishing cloth Further, the present invention relates to a lift polishing apparatus that performs polishing.

従来、この種の揚送研磨装置としては、例えば、特許文献1に開示されたものが知られている。すなわち、本体に軸支された上ローラおよび下ローラの間に巻き掛けられた揚送ベルトと、該揚送ベルトの上昇面に対面して設けられた直送路カバーに貼設された研磨マットと、前記下ローラと対向して配置され遊技球が搬送されるアール路カバーとを備え、前記アール路カバーの終端が直ぐに前記研磨マットの下端に連なるように形成されている(図2参照。)。   Conventionally, as this type of lift polishing apparatus, for example, the one disclosed in Patent Document 1 is known. That is, a lifting belt that is wound between an upper roller and a lower roller that are pivotally supported by the main body, and a polishing mat that is attached to a direct path cover that is provided to face the rising surface of the lifting belt; A rounded road cover that is disposed opposite to the lower roller and through which a game ball is conveyed, and is formed so that the end of the rounded road cover is immediately connected to the lower end of the polishing mat (see FIG. 2). .

また、特許文献2に開示されたものも知られている。すなわち、上下に周回する搬送ベルトと、該搬送ベルトの上昇面に対向させて配置したガイドレール溝と、該ガイドレール溝の形成面側に張架させた研磨布とを備え、前記ガイドレール溝は、下部に配設される遊技球の整列溝部と、その上部に連なる研磨溝部とによって形成されている。前記整列溝部は、多少の弾性変形が可能な浅溝によって形成されるため、その入口部で遊技球同士が競り合っても、玉詰まりによる停滞が起きにくくなる。   Moreover, what was disclosed by patent document 2 is also known. In other words, the guide rail groove includes a conveyor belt that circulates up and down, a guide rail groove that is disposed to face the rising surface of the conveyor belt, and a polishing cloth that is stretched on the surface on which the guide rail groove is formed. Is formed by an alignment groove portion of game balls disposed at a lower portion and a polishing groove portion continuous with the upper portion thereof. Since the alignment groove portion is formed by a shallow groove that can be somewhat elastically deformed, even if game balls compete with each other at the entrance portion, it is difficult for stagnation due to clogging.

特開平8−299571号公報JP-A-8-299571 特開2007−313275号公報JP 2007-313275 A

しかしながら、前記特許文献1に開示された従来技術では、アール路カバーの終端から排出された遊技球は、下ローラの遠心力によって研磨マットの下端部に強い力で衝突することが推定される。このため、特に研磨マットが研磨布等の繊維材質からなる場合は、その表面が破損して繊維屑が浮遊し、周辺機器に混入して故障の原因となったり、パチンコ機の盤面を汚す原因にもなり、この対策として集塵機を別途付設するとなると、余計なコスト高を招いてしまう。さらには、研磨マット自体の耐久性が著しく損なわれるという問題もあった。   However, in the prior art disclosed in Patent Document 1, it is estimated that the game ball discharged from the end of the rounded road cover collides with the lower end of the polishing mat with a strong force due to the centrifugal force of the lower roller. For this reason, especially when the polishing mat is made of a fiber material such as a polishing cloth, the surface is damaged and the fiber waste floats, which may cause malfunctions by mixing with peripheral devices and soiling the surface of the pachinko machine. In addition, if a dust collector is additionally provided as a countermeasure, an extra cost is incurred. Furthermore, there is a problem that the durability of the polishing mat itself is significantly impaired.

また、前記特許文献2に開示された従来技術では、ガイドレール溝の形成面の全面を覆う研磨布が、研磨溝部のみならず整列溝部の下端まで覆う状態に保持されていた(段落0018参照。)。このため、下ローラの遠心力によって排出された遊技球は、整列溝部に張架させた研磨布の下端部に強い力で衝突することが推定される。従って、前述した特許文献1の従来技術と同様の問題が考えられる。   In the prior art disclosed in Patent Document 2, the polishing cloth that covers the entire surface of the guide rail groove forming surface is held so as to cover not only the polishing groove but also the lower end of the alignment groove (see paragraph 0018). ). For this reason, it is estimated that the game ball discharged by the centrifugal force of the lower roller collides with a lower end portion of the polishing cloth stretched on the alignment groove portion with a strong force. Therefore, the same problem as the prior art of Patent Document 1 described above can be considered.

本発明は、以上のような従来技術が有する問題点に着目してなされたものであり、下ローラの遠心力によって排出された遊技球の衝撃を緩和することにより、研磨布の破損を防止して耐久性を高めると共に、研磨布の破損した繊維屑を原因とする故障や汚れをコスト高を招くことなく確実に防止することができ、研磨効率や揚送能力を高めることができる揚送研磨装置を提供することを目的としている。   The present invention has been made paying attention to the above-mentioned problems of the prior art, and prevents damage to the polishing cloth by reducing the impact of the game ball discharged by the centrifugal force of the lower roller. In addition to improving durability, it is possible to reliably prevent failure and dirt caused by damaged fiber scraps of the polishing cloth without incurring high costs, and to improve polishing efficiency and lifting capacity The object is to provide a device.

前述した目的を達成するための本発明の要旨とするところは、以下の各項の発明に存する。
[1]本体(11)の上下位置にそれぞれ軸支した上ローラ(21)および下ローラ(22)と、該上下ローラ(21,22)の間に巻き掛けた無端の揚送ベルト(30)と、該揚送ベルト(30)の上昇面(30a)に対向させて上下方向に張設した研磨布(80)とを備え、前記揚送ベルト(30)の上昇面(30a)と前記研磨布(80)との間に遊技球を挟持させることにより、遊技球の揚送および研磨を行う揚送研磨装置(10)において、
前記下ローラ(22)の下側に沿って配置され、前記下ローラ(22)を周回する前記揚送ベルト(30)との間に遊技球を受け入れる導入路(40a)を形成する導入路カバー(40)を備え、
前記導入路カバー(40)の終端(43)に連なる部位に、前記揚送ベルト(30)の上昇面(30a)に沿って上方向に所定長さで延びて前記研磨布(80)の下端に連なり、前記導入路カバー(40)の終端(43)から導出される遊技球の衝撃を緩和し整列させた状態で前記研磨布(80)に導く整列路部(50)を設けたことを特徴とする揚送研磨装置(10)。
The gist of the present invention for achieving the object described above resides in the inventions of the following items.
[1] An upper roller (21) and a lower roller (22) pivotally supported at the upper and lower positions of the main body (11), and an endless lifting belt (30) wound between the upper and lower rollers (21, 22) And a polishing cloth (80) stretched vertically so as to face the rising surface (30a) of the lifting belt (30), and the rising surface (30a) of the lifting belt (30) and the polishing In the lifting and polishing apparatus (10) for lifting and polishing the game ball by sandwiching the game ball with the cloth (80),
An introduction path cover that is disposed along the lower side of the lower roller (22) and forms an introduction path (40a) for receiving a game ball with the lifting belt (30) that goes around the lower roller (22). (40)
The lower end of the polishing pad (80) extends to the portion connected to the terminal end (43) of the introduction path cover (40) by a predetermined length upward along the rising surface (30a) of the lifting belt (30). An alignment path portion (50) that leads to the polishing cloth (80) in a state where the impact of the game balls led out from the end (43) of the introduction path cover (40) is reduced and aligned. Feature lift polishing machine (10).

[2]前記研磨布(80)は、前記揚送ベルト(30)の上昇面(30a)に対向させて上下方向に延びる状態に配設された研磨路部(60)であって、該研磨路部(60)において遊技球を上方に導く複数のガイドレール溝(61)が形成された研磨面側を覆うように張設され、
前記研磨布(80)は、前記研磨面の両側方向に延伸可能な材質からなることを特徴とする[1]に記載の揚送研磨装置(10)。
[2] The polishing cloth (80) is a polishing path (60) disposed in a state extending in the up-down direction so as to face the rising surface (30a) of the lifting belt (30). The road portion (60) is stretched so as to cover the polished surface side where the plurality of guide rail grooves (61) for guiding the game ball upward are formed,
The polishing cloth (80) according to [1], wherein the polishing cloth (80) is made of a material that can be stretched in both directions of the polishing surface.

[3]前記整列路部(50)は、前記揚送ベルト(30)の上昇面(30a)に対向する表面側に、前記研磨路部(60)の研磨面にある複数のガイドレール溝(61)にそれぞれ連なる複数のガイドレール溝(51)が形成されていることを特徴とする[2]に記載の揚送研磨装置(10)。   [3] The alignment path portion (50) has a plurality of guide rail grooves (on the polishing surface of the polishing path portion (60)) on the surface side facing the rising surface (30a) of the lifting belt (30). 61) The lift polishing apparatus (10) according to [2], wherein a plurality of guide rail grooves (51) respectively connected to 61) are formed.

[4]前記整列路部(50)の下端は、前記下ローラ(22)の中心軸と同じ高さ位置にて前記導入路カバー(40)の終端(43)に連設され、前記整列路部(50)の上端は、前記下ローラ(22)の外径上端と同じ高さ位置より上方で、かつ前記下ローラ(22)の直径の3倍の高さ位置より下方にて前記研磨路部(60)の下端に連設されることを特徴とする[2]または[3]に記載の揚送研磨装置(10)。   [4] The lower end of the alignment path portion (50) is connected to the end (43) of the introduction path cover (40) at the same height as the central axis of the lower roller (22), and the alignment path The upper end of the section (50) is above the same height position as the upper end of the outer diameter of the lower roller (22) and below the height position three times the diameter of the lower roller (22). The lift polishing apparatus (10) according to [2] or [3], wherein the lift polishing apparatus (10) is connected to the lower end of the section (60).

前記本発明は次のように作用する。
前記[1]に記載の揚送研磨装置(10)によれば、遊技機で使用された遊技球は、下ローラ(22)の下側に沿って配置された導入路カバー(40)内側の導入路(40a)に供給され、下ローラ(22)の遠心力によって導入路カバー(40)の終端(43)から勢い良く排出される。
The present invention operates as follows.
According to the lift polishing apparatus (10) described in [1] above, the game balls used in the gaming machine are located inside the introduction path cover (40) arranged along the lower side of the lower roller (22). It is supplied to the introduction path (40a) and is discharged vigorously from the end (43) of the introduction path cover (40) by the centrifugal force of the lower roller (22).

導入路カバー(40)の終端(43)に連なる部位には、未だ研磨布(80)は配置されておらず、その代わり整列路部(50)があり、遊技球は先ずは整列路部(50)に導入される。この整列路部(50)によって、遊技球の衝撃は緩和されて整列した状態となり、整列路部(50)の上端ないし研磨布(80)の下端より、揚送ベルト(30)の上昇面(30a)と研磨布(80)との間に受け渡される。   The polishing cloth (80) is not yet arranged at the portion connected to the terminal end (43) of the introduction path cover (40), and instead there is an alignment path part (50). 50). Due to the alignment path portion (50), the impact of the game balls is relaxed and aligned, and the rising surface of the transport belt (30) (from the upper end of the alignment path portion (50) or the lower end of the polishing pad (80) ( 30a) and the polishing pad (80).

このように、下ローラ(22)の遠心力によって勢い良く排出された遊技球は、そのまま直ぐに研磨布(80)に衝突することはない。遊技球はいったん整列路部(50)に導入されることで、前記遠心力による衝撃が緩和された後に研磨および揚送されることになる。従って、研磨布(80)の早期破損を防止して研磨布(80)の耐久性を高めることができ、さらに、研磨布(80)の破損した繊維屑を原因とする周辺機器の故障やパチンコ機盤面の汚れを未然に防止することが可能となる。   In this way, the game ball discharged with vigorous force by the centrifugal force of the lower roller (22) does not immediately collide with the polishing cloth (80). The game balls are once introduced into the alignment path portion (50), so that the impact due to the centrifugal force is alleviated and then polished and transported. Therefore, it is possible to prevent the polishing cloth (80) from being damaged early and to improve the durability of the polishing cloth (80). Further, the peripheral cloth may be damaged due to the broken fiber scraps of the polishing cloth (80). It is possible to prevent contamination of the machine surface.

前記[2]に記載の揚送研磨装置(10)によれば、前記研磨布(80)は、前記揚送ベルト(30)の上昇面(30a)に対向させて上下方向に延びる状態に配設された研磨路部(60)であって、該研磨路部(60)において遊技球を上方に導く複数のガイドレール溝(61)が形成された研磨面側を覆うように張設される。このように、導入路カバー(40)の終端(43)から揚送ベルト(30)の上昇面(30a)に沿って上方向に所定長さ延びた整列路部(50)は、その上方に延びる研磨路部(60)に連なることになる。   According to the lift polishing apparatus (10) described in [2], the polishing cloth (80) is arranged in a state extending in the vertical direction so as to face the rising surface (30a) of the lift belt (30). The polishing path portion (60) provided is stretched so as to cover the polishing surface side in which a plurality of guide rail grooves (61) for guiding the game ball upward are formed in the polishing path portion (60). . Thus, the alignment path portion (50) extending a predetermined length upward from the terminal end (43) of the introduction path cover (40) along the rising surface (30a) of the lifting belt (30) It will be connected to the extending polishing path (60).

研磨路部(60)において研磨布(80)を張設する研磨面は、単に平滑な面ではなく、遊技球を上方に導く複数のガイドレール溝(61)が形成してある。これにより、前記整列路部(50)から研磨路部(60)に導かれた遊技球は、互いに競り合うことなく各々が複数のガイドレール溝(61)に導かれて効率良く揚送され、揚送方向とは関係ない研磨布(80)の幅方向への余計な転動も防止される。   The polishing surface on which the polishing cloth (80) is stretched in the polishing path portion (60) is not simply a smooth surface, but is formed with a plurality of guide rail grooves (61) for guiding the game ball upward. Accordingly, the game balls guided from the alignment path portion (50) to the polishing path portion (60) are guided to the plurality of guide rail grooves (61) without being competed with each other, and are efficiently transported. Excessive rolling in the width direction of the polishing pad (80), which is not related to the feeding direction, is also prevented.

ここで研磨布(80)には、複数のガイドレール溝(61)内に凹入する方向に力がかかることになり、その結果として本来の横幅が減縮することになるが、前記研磨布(80)は、前記研磨路部(60)の研磨面の両側方向に延伸可能な材質からなる。従って、研磨布(80)の本来の横幅が減縮する代わりに、研磨布(80)は両側方向に延伸することができ、前記研磨面の両端部分から研磨布(80)の両端側が外れて中央に寄ってしまう事態を防止することができる。   Here, a force is applied to the polishing cloth (80) in a direction to be recessed into the plurality of guide rail grooves (61), and as a result, the original lateral width is reduced. 80) consists of a material which can be extended | stretched in the both directions of the grinding | polishing surface of the said grinding | polishing path part (60). Accordingly, instead of reducing the original width of the polishing cloth (80), the polishing cloth (80) can be extended in both directions, and both end sides of the polishing cloth (80) are separated from both ends of the polishing surface. It is possible to prevent the situation where the user approaches.

前記[3]に記載の揚送研磨装置(10)によれば、前記整列路部(50)の具体的な構成として、前記揚送ベルト(30)の上昇面(30a)に対向する表面側に、前記研磨路部(60)の研磨面にある複数のガイドレール溝(61)にそれぞれ連なる複数のガイドレール溝(51)を形成する。   According to the lift polishing apparatus (10) described in [3], as a specific configuration of the alignment path portion (50), a surface side facing the rising surface (30a) of the lift belt (30). Then, a plurality of guide rail grooves (51) respectively connected to the plurality of guide rail grooves (61) on the polishing surface of the polishing path portion (60) are formed.

これにより、下ローラ(22)の遠心力によって排出された遊技球は、整列路部(50)の複数のガイドレール溝(51)内に振り分けられて揚送される過程で勢いが確実に減殺され、衝撃が緩和された状態で各ガイドレール溝(51)を通り、前記研磨路部(60)側に揚送されることになる。   Accordingly, the game balls discharged by the centrifugal force of the lower roller (22) are surely reduced in the process of being distributed and transported into the plurality of guide rail grooves (51) of the alignment path portion (50). Then, in a state where the impact is mitigated, it passes through each guide rail groove (51) and is transported to the polishing path (60) side.

特に、整列路部(50)の各ガイドレール溝(51)は、研磨路部(60)の各ガイドレール溝(61)にそれぞれ連なるため、整列路部(50)から研磨路部(60)にかけて遊技球を円滑に連続して受け渡すことができる。また、研磨路部(60)の入口となる下端付近では、なおさら遊技球同士が競り合う事態が生じないことになる。   In particular, since each guide rail groove (51) of the alignment path portion (50) is connected to each guide rail groove (61) of the polishing path portion (60), the alignment path portion (50) to the polishing path portion (60). The game balls can be delivered smoothly and continuously. Further, in the vicinity of the lower end serving as the entrance of the polishing path portion (60), a situation in which game balls compete with each other does not occur.

前記[4]に記載の揚送研磨装置(10)によれば、前記整列路部(50)の具体的な所定長さとして、整列路部(50)の下端を、下ローラ(22)の中心軸と同じ高さ位置にて導入路カバー(40)の終端(43)に連設し、また、整列路部(50)の上端は、下ローラ(22)の外径上端と同じ高さ位置より上方で、かつ下ローラ(22)の直径の3倍の高さ位置より下方にて研磨路部(60)の下端に連設する長さに設定する。   According to the lifting and polishing apparatus (10) described in [4], the lower end of the alignment path portion (50) is set to the lower roller (22) as a specific predetermined length of the alignment path portion (50). It is connected to the end (43) of the introduction path cover (40) at the same height as the central axis, and the upper end of the alignment path (50) is the same height as the upper end of the outer diameter of the lower roller (22). The length is set to be continuous with the lower end of the polishing path (60) above the position and below the height of three times the diameter of the lower roller (22).

整列路部(50)と研磨路部(60)との長さの比率は非常に重要な問題となるが、前述した整列路部(50)の長さと配置にすれば、下ローラ(22)の遠心力によって勢い良く排出された遊技球の衝撃を十分に緩和することができることが実験により確かめられている。   The ratio of the length of the alignment path portion (50) and the polishing path portion (60) is a very important problem. However, if the length and arrangement of the alignment path portion (50) are set as described above, the lower roller (22) It has been confirmed by experiments that the impact of the game ball ejected vigorously by the centrifugal force can be sufficiently mitigated.

また、整列路部(50)の長さを最小限に留めることにより、整列路部(50)の通過により揚送力が過度に減殺されたり、研磨路部(60)の全長が相対的に短くなって研磨力が過度に減殺されることも防止され、結果として研磨効率や揚送能力を向上させることができる。   Further, by keeping the length of the alignment path portion (50) to a minimum, the lifting force is excessively reduced by the passage of the alignment path portion (50), or the overall length of the polishing path portion (60) is relatively reduced. It is prevented that the polishing power is shortened and the polishing power is excessively reduced. As a result, the polishing efficiency and the lifting ability can be improved.

本発明に係る揚送研磨装置によれば、導入路カバーの終端に連なる部位に、遊技球の衝撃を緩和し整列させた状態で研磨布に導く整列路部を設けたから、下ローラの遠心力によって排出された遊技球の衝撃を緩和することができ、その後に遊技球を研磨布に受け渡すから、研磨布の破損を防止して耐久性を高めることができると共に、研磨布の破損した繊維屑を原因とする故障や汚れをコスト高を招くことなく確実に防止することができ、研磨効率や揚送能力を高めることができる。   According to the lift polishing apparatus according to the present invention, the alignment path portion that leads to the polishing cloth in a state in which the impact of the game balls is relaxed and aligned is provided at a portion connected to the end of the introduction path cover. The impact of the game ball discharged by the can be reduced, and then the game ball is transferred to the polishing cloth, so that the polishing cloth can be prevented from being damaged and the durability can be improved. Failures and dirt caused by scraps can be reliably prevented without incurring high costs, and polishing efficiency and lifting capacity can be increased.

以下、図面に基づき、本発明を代表する実施の形態を説明する。
図1〜図21は、本発明の一実施の形態に係る揚送研磨装置10を示している。
図1は、揚送研磨装置10の側面図であり、図2は、揚送研磨装置10の正面図であり、図3は、揚送研磨装置10の研磨路部60を開いた状態の正面図である。図4は、揚送研磨装置10の下部の縦断面図であり、図5は、研磨路部60の下部を示す内面図であり、図6および図7は、揚送研磨装置10の下部の横断面図である。
DESCRIPTION OF EMBODIMENTS Hereinafter, an embodiment that represents the present invention will be described based on the drawings.
1 to 21 show a lift polishing apparatus 10 according to an embodiment of the present invention.
1 is a side view of the lift polishing apparatus 10, FIG. 2 is a front view of the lift polishing apparatus 10, and FIG. 3 is a front view of the lift polishing apparatus 10 with the polishing path 60 opened. FIG. 4 is a vertical cross-sectional view of the lower part of the lift polishing apparatus 10, FIG. 5 is an inner surface view showing the lower part of the polishing path 60, and FIGS. 6 and 7 show the lower part of the lift polishing apparatus 10. It is a cross-sectional view.

本実施の形態に係る揚送研磨装置10は、図示省略した遊技機島の内部に立設されて、遊技機島を構成する各遊技機(パチンコ機)で使用されたパチンコ球である遊技球を揚送しながら研磨する装置である。遊技機島において、揚送研磨装置10の下端には、遊技機島の下部に回収された使用済みの遊技球が供給され、揚送研磨装置10の上端から、研磨済みの遊技球が遊技機島の上部を流下し、再び各遊技機や遊技媒体貸出機に供給される。   A lifting and polishing apparatus 10 according to the present embodiment is a pachinko ball that is installed in a gaming machine island (not shown) and is used in each gaming machine (pachinko machine) constituting the gaming machine island. It is a device to polish while lifting. In the gaming machine island, the used gaming balls collected at the lower part of the gaming machine island are supplied to the lower end of the lifting and polishing apparatus 10, and the polished gaming balls are fed from the upper end of the lifting and polishing apparatus 10 to the gaming machine. It flows down the upper part of the island and is supplied again to each game machine and game media lending machine.

図1〜図3および図4に示すように、揚送研磨装置10は、垂直方向に延びる長尺な筺体状の本体11と、該本体11の上下位置にそれぞれ軸支した上ローラ21および下ローラ22と、該上下ローラ21,22の間に巻き掛けた無端の揚送ベルト30と、該揚送ベルト30の上昇面30aに対向させて上下方向に張設した研磨布80とを備え、前記揚送ベルト30の上昇面30aと前記研磨布80との間に遊技球を挟持させることにより、遊技球の揚送および研磨を行うように構成されている。   As shown in FIG. 1 to FIG. 3 and FIG. 4, the lifting and polishing apparatus 10 includes an elongated casing-like main body 11 extending in the vertical direction, an upper roller 21 and a lower roller that are pivotally supported at the vertical positions of the main body 11. A roller 22, an endless lifting belt 30 wound between the upper and lower rollers 21 and 22, and a polishing cloth 80 stretched in the vertical direction so as to face the rising surface 30 a of the lifting belt 30, The game ball is lifted and polished by sandwiching the game ball between the rising surface 30 a of the lifting belt 30 and the polishing pad 80.

本体11の上下位置には、図1に示すように、従動側の上ローラ21と駆動側の下ローラ22とが互いに平行となるように水平に軸支されており、下ローラ22が動力源である電動モータ20によって回転駆動される。本体11の背面側の下部には、電動モータ20が一体に取り付けられており、電動モータ20の出力軸は、下ローラ22の回転軸に図示省略した減速機構を介して動力伝達可能に連結されている。   As shown in FIG. 1, the upper roller 21 of the driven side and the lower roller 22 of the driving side are horizontally supported at the vertical position of the main body 11 so as to be parallel to each other. It is rotationally driven by the electric motor 20. An electric motor 20 is integrally attached to the lower part of the back side of the main body 11, and the output shaft of the electric motor 20 is connected to the rotating shaft of the lower roller 22 through a reduction mechanism (not shown) so that power can be transmitted. ing.

揚送ベルト30は、図4に示すように、下ローラ22から上ローラ21に向かって回転する上昇面30aが、本体11の正面側を向くように回転駆動される。図8に示すように、揚送ベルト30は、心体31はポリエステルであって、表層32および裏層33はポリウレタンから構成され、表裏の面形状は平滑である。かかる揚送ベルト30は、ポリエステルとポリウレタンとの2層構造の2枚のベルトを、それぞれポリエステル側の面で貼り合わせて構成すると良い。   As shown in FIG. 4, the lifting belt 30 is rotationally driven so that a rising surface 30 a that rotates from the lower roller 22 toward the upper roller 21 faces the front side of the main body 11. As shown in FIG. 8, in the feeding belt 30, the core body 31 is made of polyester, the front layer 32 and the back layer 33 are made of polyurethane, and the surface shape of the front and back surfaces is smooth. Such a lifting belt 30 is preferably constructed by bonding two belts having a two-layer structure of polyester and polyurethane on the polyester side.

また、図4に示すように、上ローラ21と下ローラ22の間には、上下方向に所定間隔おきに複数のガイドローラ23,23…が軸支されている。各ガイドローラ23は、揚送ベルト30の上昇面30aの裏面側に回転可能に当接するように配置され、搬送ベルト30の上昇面30aを裏面側から支持している。   4, a plurality of guide rollers 23, 23... Are pivotally supported between the upper roller 21 and the lower roller 22 at predetermined intervals in the vertical direction. Each guide roller 23 is disposed so as to be rotatable in contact with the back surface side of the rising surface 30a of the transport belt 30, and supports the rising surface 30a of the transport belt 30 from the back surface side.

下ローラ22の背面側の上方には、テンションローラ24が軸方向を水平に向けた状態で軸支されている。テンションローラ24は、揚送ベルト30の途中を裏面側へ押す状態で回転可能に軸支されており、揚送ベルト30に張力を付加し、揚送ベルト30の上昇面30aが垂直方向に延びる平坦面を維持するように設定されている。   Above the back side of the lower roller 22, a tension roller 24 is pivotally supported with its axial direction oriented horizontally. The tension roller 24 is pivotally supported so as to be able to rotate in a state where the middle of the feeding belt 30 is pushed to the back surface side. The tension roller 24 applies tension to the feeding belt 30, and the rising surface 30a of the feeding belt 30 extends in the vertical direction. It is set to maintain a flat surface.

また、下ローラ22の傍らには、遊技球の回収樋16が延びており、下ローラ22の下側には、回収樋16に連通して遊技球を受け入れる導入路カバー40が設けられている。なお、上ローラ21の傍らには、研磨揚送した遊技球を遊技機島の上部より排出するための排出口13が設けられている(図1参照。)。   A game ball collection basket 16 extends alongside the lower roller 22, and an introduction path cover 40 that communicates with the collection basket 16 and receives game balls is provided below the lower roller 22. . A discharge port 13 for discharging the ground and lifted game balls from the upper part of the gaming machine island is provided beside the upper roller 21 (see FIG. 1).

導入路カバー40は、下ローラ22の外周に沿う円弧形に湾曲させた樋状の部材からなり、下ローラ22の下側に沿って配置されて、下ローラ22を周回する揚送ベルト30との間に遊技球が導入されるアール状の導入路40aを形成している。導入路カバー40の始端41は、前記回収樋16の下方へ向かって延出しており、始端41の上側には、前記回収樋16の終端縁に連なるガイド板42が、遊技球を導入路40aに導くように下方へ傾斜する状態に配設されている。   The introduction path cover 40 is made of a bowl-shaped member that is curved in an arc shape along the outer periphery of the lower roller 22, is disposed along the lower side of the lower roller 22, and moves up the lower belt 22. A round-shaped introduction path 40a through which a game ball is introduced is formed. A start end 41 of the introduction path cover 40 extends downward of the collection basket 16, and a guide plate 42 connected to a terminal edge of the collection basket 16 is provided above the start end 41 to introduce the game ball into the introduction path 40a. So as to be inclined downward.

本体11には、揚送ベルト30の上昇面30aに対面するように 長尺の支持カバー12が取り付けられている。支持カバー12は、その全長に亘って本体11の幅と同様の幅を有する縦長の平面部と、この平面部の左右両側縁から揚送ベルト30の側に延設した側面部とを有する樋状の部材からなり、下から順に下支持カバー12aと、中支持カバー12bと、上支持カバー12cとに分割されている。   A long support cover 12 is attached to the main body 11 so as to face the rising surface 30 a of the lifting belt 30. The support cover 12 has a vertically long plane portion having a width similar to the width of the main body 11 over its entire length, and a side surface portion extending from the left and right side edges of the plane portion toward the lifting belt 30. It is divided into a lower support cover 12a, an intermediate support cover 12b, and an upper support cover 12c in order from the bottom.

下支持カバー12aは、本体11に対してネジ止めされており、通常は開かないように固定されている。一方、中支持カバー12bと上支持カバー12cは、それぞれ本体11に対して蝶番15を介して開閉可能に取り付けられている。なお、閉じた状態の中支持カバー12bや上支持カバー12cは、それぞれ止め金具(図示せず。)によって固定される。   The lower support cover 12a is screwed to the main body 11, and is usually fixed so as not to open. On the other hand, the middle support cover 12b and the upper support cover 12c are attached to the main body 11 through hinges 15 so as to be opened and closed. Note that the middle support cover 12b and the upper support cover 12c in the closed state are each fixed by a stopper (not shown).

図4に示すように、下支持カバー12aの内側には、揚送ベルト30の上昇面30aと対面配置される整列路部50が内装されている。また、中支持カバー12bの内側には、同じく揚送ベルト30の上昇面30aと対面配置される研磨路部60が内装されており、上支持カバー12cの内側には、同じく揚送ベルト30の上昇面30aと対面配置される揚送路部70が内装されている。   As shown in FIG. 4, an alignment path portion 50 is arranged inside the lower support cover 12 a so as to face the rising surface 30 a of the lifting belt 30. In addition, a polishing path 60 that is also disposed facing the rising surface 30a of the lifting belt 30 is provided inside the middle support cover 12b, and the lifting belt 30 is also positioned inside the upper support cover 12c. A lifting path portion 70 arranged facing the rising surface 30a is internally provided.

ここで本体11側にある揚送ベルト30の上昇面30aと、支持カバー12側の下から順に整列路部50、研磨路部60、揚送路部70において上昇面30aと対向する表面との間に、遊技球が挟持されて揚送される間隙が形成される。また、研磨路部60の表面には、遊技球を研磨する研磨布80が上下方向に延びる状態に張設されている。   Here, the rising surface 30a of the lifting belt 30 on the main body 11 side and the surface facing the rising surface 30a in the alignment path portion 50, the polishing path portion 60, and the lifting path portion 70 in order from the bottom of the support cover 12 side. In the meantime, a gap is formed in which game balls are held and lifted. A polishing cloth 80 for polishing the game ball is stretched on the surface of the polishing path portion 60 so as to extend in the vertical direction.

導入路カバー40の終端43は、整列路部50の下端に連なっている。ここで整列路部50の下端は、下ローラ22の中心軸22aと同じ高さ位置にて導入路カバー40の終端43に連設されている。なお、導入路カバー40の終端43は、ばね付きネジ44により下ローラ22に対して弾発的に離隔可能に支持されている。   The terminal end 43 of the introduction path cover 40 is continuous with the lower end of the alignment path portion 50. Here, the lower end of the alignment path portion 50 is connected to the terminal end 43 of the introduction path cover 40 at the same height as the central axis 22 a of the lower roller 22. The terminal end 43 of the introduction path cover 40 is supported by a spring-loaded screw 44 so as to be elastically separated from the lower roller 22.

整列路部50は、揚送ベルト30の上昇面30aに沿って上方向に所定長さで延び、研磨布80(研磨路部60)の下端に連なり、導入路カバー40の終端43から導出される遊技球の衝撃を緩和し整列させた状態で研磨布80に導くための部位である。整列路部50の上端は、下ローラ22の外径上端と同じ高さ位置より上方で、かつ下ローラ22の直径の3倍の高さ位置より下方にて研磨路部60の下端に連設されている。本実施の形態では整列路部50の上端は、図4に示すように、下ローラ22の直径の約2.3倍の高さ位置に設定されている。   The alignment path portion 50 extends upward along the rising surface 30 a of the lifting belt 30 by a predetermined length, continues to the lower end of the polishing cloth 80 (polishing path portion 60), and is led out from the terminal end 43 of the introduction path cover 40. This is a part for guiding the abrasive balls 80 to the polishing cloth 80 in a state where the impacts of the game balls are reduced and aligned. The upper end of the alignment path portion 50 is connected to the lower end of the polishing path portion 60 above the same height position as the upper end of the outer diameter of the lower roller 22 and below a height position three times the diameter of the lower roller 22. Has been. In the present embodiment, the upper end of the alignment path 50 is set at a height position that is approximately 2.3 times the diameter of the lower roller 22 as shown in FIG.

整列路部50は、ウレタンゴム等に代表される弾性を有する合成樹脂により成形されており、揚送ベルト30の上昇面に対向する表面側には、遊技球を上方に導くための複数のガイドレール溝51,51…が形成されている。図6に示したように、各ガイドレール溝51は、深さが遊技球の半径より小さい横断面円弧状の縦溝であり、互いに上下方向に平行に延びるように形成されている。なお、各ガイドレール溝51間の間隔は、遊技球の半径よりも短い距離に設定されている。   The alignment path part 50 is formed of a synthetic resin having elasticity typified by urethane rubber or the like, and a plurality of guides for guiding the game balls upward on the surface side facing the rising surface of the lifting belt 30. Rail grooves 51, 51... Are formed. As shown in FIG. 6, each guide rail groove 51 is a vertical groove having a circular cross section whose depth is smaller than the radius of the game ball, and is formed so as to extend parallel to each other in the vertical direction. In addition, the space | interval between each guide rail groove | channel 51 is set to the distance shorter than the radius of a game ball.

研磨路部60は、前記整列路部50の上端より揚送ベルト30の上昇面30aに沿って上方向に所定長さで延び、前記整列路部50より揚送されてきた遊技球を主に研磨するための部位である。研磨路部60は、前記整列路部50と同様にウレタンゴム等の弾性を有する合成樹脂により成形されており、揚送ベルト30の上昇面30aに対向する研磨面には、遊技球を上方に導くための複数のガイドレール溝61,61…が形成されている。ここで各研磨路部60は、前記整列路部50と同様の構成であり、各ガイドレール溝61は、それぞれ前記各ガイドレール溝51と一対一で対応しており、互いに直線状に連なっている。   The polishing path portion 60 extends upward from the upper end of the alignment path portion 50 by a predetermined length along the rising surface 30a of the lifting belt 30 and mainly plays game balls lifted from the alignment path portion 50. This is a part for polishing. The polishing path portion 60 is formed of a synthetic resin having elasticity, such as urethane rubber, like the alignment path portion 50, and a game ball is placed upward on the polishing surface facing the rising surface 30a of the lifting belt 30. A plurality of guide rail grooves 61, 61... For guiding are formed. Here, each polishing path portion 60 has the same configuration as that of the alignment path portion 50, and each guide rail groove 61 corresponds to each guide rail groove 51 on a one-to-one basis, and is linearly connected to each other. Yes.

各ガイドレール溝61がある研磨面には、揚送ベルト30の上昇面30aに対向する研磨布80が上下方向に延びる状態に張設されている。研磨布80は、前記研磨面の両側方向に延伸可能な材質からなる。研磨布80としては具体的に例えば、ポリエチレンテレフタラート(PET)55%、パルプ45%であって、目付61g/m2〜71g/m2、厚さ0.3mm〜0.5mmのスパンレース不織布が適している。なお「目付」とは、1m2あたりの重さをgで表現した不織布の厚みを表現する単位である。 A polishing cloth 80 facing the rising surface 30a of the lifting belt 30 is stretched on the polishing surface where each guide rail groove 61 is provided so as to extend in the vertical direction. The polishing cloth 80 is made of a material that can be extended in both directions of the polishing surface. Specifically, the polishing cloth 80 is, for example, 55% polyethylene terephthalate (PET), 45% pulp, and a spunlace nonwoven fabric having a basis weight of 61 g / m 2 to 71 g / m 2 and a thickness of 0.3 mm to 0.5 mm. Is suitable. The “weight per unit” is a unit expressing the thickness of the nonwoven fabric in which the weight per 1 m 2 is expressed in g.

スパンレース不織布は、木材パルプと合成有機繊維からなる集合体を、細かい金鋼等で支持しながら、高圧の水流を当てて繊維同士を絡ませて乾燥させたものである。このようなスパンレース不織布は、ランダムな方向に並んだ数百万の木材パルプ繊維と合成有機繊維とが絡み合っており、汚れの吸着性に優れるだけでなく、引張強度や耐水圧、吸水性、柔軟性においても優れている。合成有機繊維としてポリエチレンテレフタラートを含ませることにより、吸液しても高強度を維持することができる。   The spunlace nonwoven fabric is an aggregate made of wood pulp and synthetic organic fibers, supported by fine gold steel or the like, applied with a high-pressure water stream to entangle the fibers and dried. These spunlace nonwoven fabrics are intertwined with random millions of millions of wood pulp fibers and synthetic organic fibers, which not only excels in dirt adsorption, but also has tensile strength, water pressure resistance, water absorption, Also excellent in flexibility. By including polyethylene terephthalate as a synthetic organic fiber, high strength can be maintained even when liquid is absorbed.

本実施の形態に係る研磨布80は、前記スパンレース不織布のうち、さらに具体的には摩擦係数が0.50μs〜0.62μsであって、かつ厚さ0.3mm〜0.5mmのポリエステルナノファイバー繊維構造体により構成している。かかる構成により、前記揚送ベルト30(図8参照。)の摩擦係数と研磨布80との摩擦係数の比率は、1:2.5となる。また、前記整列路部50の表面や前記研磨路部60の研磨面における摩擦抵抗は、研磨布80の表面の摩擦抵抗より大きい。   The polishing cloth 80 according to the present embodiment is more specifically a polyester nanofiber having a friction coefficient of 0.50 μs to 0.62 μs and a thickness of 0.3 mm to 0.5 mm among the spunlace nonwoven fabric. It is composed of a fiber fiber structure. With this configuration, the ratio of the friction coefficient of the transport belt 30 (see FIG. 8) and the friction coefficient of the polishing pad 80 is 1: 2.5. Further, the friction resistance on the surface of the alignment path portion 50 and the polishing surface of the polishing path portion 60 is larger than the friction resistance on the surface of the polishing pad 80.

また、図5〜図7に示すように、前記整列路部50の上端と、研磨路部60の下端における各ガイドレール溝61の始端との間には、遊技球を導入する遊技球ガイドローラ62が設けられている。遊技球ガイドローラ62は、研磨路部60の下端面に沿って両側に延びる状態で水平に軸支されている。   As shown in FIGS. 5 to 7, a game ball guide roller for introducing a game ball between the upper end of the alignment path portion 50 and the start end of each guide rail groove 61 at the lower end of the polishing path portion 60. 62 is provided. The game ball guide roller 62 is horizontally supported in a state of extending to both sides along the lower end surface of the polishing path portion 60.

遊技球ガイドローラ62は、整列路部50の上端から導出された遊技球が導入されるように、外周が部分的に全周に亘って縮径する凹溝63が軸方向に複数並ぶように連設されている。ここで各凹溝63は、整列路部50や研磨路部60にある各ガイドレール溝51,61に対応する数と位置に設けられている。
この時、各ガイドレール溝51,61間の凸部の高さは、該ガイドレール溝51,61の底を基準として同じ5.5mmであるが、ガイドレール溝61の下端(始端)側の凸部の高さを、5.5mmより低い4.5mmから徐々に5.5mmの高さになるよう僅かに勾配を持たせると良い。
The game ball guide roller 62 is arranged such that a plurality of concave grooves 63 whose outer circumferences are partially reduced in diameter over the entire circumference are arranged in the axial direction so that game balls derived from the upper ends of the alignment path portions 50 are introduced. It is connected continuously. Here, the concave grooves 63 are provided at the numbers and positions corresponding to the guide rail grooves 51 and 61 in the alignment path portion 50 and the polishing path portion 60.
At this time, the height of the convex portion between the guide rail grooves 51 and 61 is the same 5.5 mm with respect to the bottom of the guide rail grooves 51 and 61, but on the lower end (starting end) side of the guide rail grooves 61. It is preferable to give a slight gradient so that the height of the convex portion gradually becomes 4.5 mm from 4.5 mm lower than 5.5 mm.

これにより、研磨路部60において複数のガイドレール溝61が形成された研磨面側を覆うように研磨布80を張設したとき、研磨布80はガイドレール溝61間の凸部に載っているだけで、整列路部50の上端から導出された遊技球が遊技球ガイドローラ62を介して研磨路部60に導入されて、初めて研磨布80はガイドレール溝61の底部に押圧されることになるが、前記勾配を持たせることによって、遊技球とガイドレール溝61の底部に押圧された研磨布80とが馴染む助走区間を設けることになり、研磨布80の幅方向への急激な伸びを抑えることができる。   Thus, when the polishing cloth 80 is stretched so as to cover the polishing surface side where the plurality of guide rail grooves 61 are formed in the polishing path portion 60, the polishing cloth 80 is placed on the convex portion between the guide rail grooves 61. Only when the game balls led out from the upper end of the alignment path portion 50 are introduced into the polishing path portion 60 via the game ball guide rollers 62, the polishing cloth 80 is pressed against the bottom of the guide rail groove 61 for the first time. However, by providing the above-mentioned gradient, a running section where the game ball and the polishing cloth 80 pressed to the bottom of the guide rail groove 61 are fitted is provided, and the polishing cloth 80 is rapidly stretched in the width direction. Can be suppressed.

遊技球ガイドローラ62は、その外周のほぼ全幅に亘り研磨路部60の下端を周回させる研磨布80が巻き掛けられた状態で自由に回転するように軸支されている。かかる遊技球ガイドローラ62は、研磨路部60の下端に掛け回される研磨布80が研磨路部60の下端のエッジに直接触れて損傷することを防ぐ役割を果す他、整列路部50の上端から導出された遊技球を研磨路部60の下端における各ガイドレール溝61の始端に円滑に受け渡す役割も果している。   The game ball guide roller 62 is pivotally supported so as to freely rotate in a state in which a polishing cloth 80 that wraps around the lower end of the polishing path portion 60 is wound over substantially the entire width of the outer periphery thereof. The game ball guide roller 62 serves to prevent the polishing cloth 80 wound around the lower end of the polishing path portion 60 from directly touching and damaging the lower end edge of the polishing path portion 60, and the alignment path portion 50. It also plays a role of smoothly delivering the game ball derived from the upper end to the start end of each guide rail groove 61 at the lower end of the polishing path portion 60.

図6および図7に示すように、遊技球ガイドローラ62は、その各凹溝63の最底周面が、研磨路部60にあるガイドレール溝61の底より、さらに奧方向すなわち背面側に位置する状態に軸支されている。ガイドレール溝61の底と遊技球ガイドローラ62の凹溝63の最底周面との距離は、研磨布80の厚さ並びに遊技球の外径を考慮して決められる。   As shown in FIG. 6 and FIG. 7, the gaming ball guide roller 62 is such that the bottom peripheral surface of each concave groove 63 is further in the saddle direction, that is, the back side from the bottom of the guide rail groove 61 in the polishing path portion 60. It is pivotally supported in a position. The distance between the bottom of the guide rail groove 61 and the bottom peripheral surface of the concave groove 63 of the game ball guide roller 62 is determined in consideration of the thickness of the polishing pad 80 and the outer diameter of the game ball.

本実施の形態では、ガイドレール溝61の底と凹溝63の最底周面との距離は1mmであって、研磨布80の厚さは0.3mmであり、研磨布80の表面からガイドレール溝61の底までの距離は10mmであり、遊技球の外径は11mmである。すなわち、ガイドレール溝61と揚送ベルト30に挟持された遊技球の押圧によって、ガイドレール溝61を覆うように張設された研磨布80は溝内に沈み込み、かかる状態で遊技球が揚送ベルト30と研磨布80との摩擦力で研磨部路60を揚送されるように設定されている。   In the present embodiment, the distance between the bottom of the guide rail groove 61 and the bottom peripheral surface of the concave groove 63 is 1 mm, and the thickness of the polishing pad 80 is 0.3 mm. The distance to the bottom of the rail groove 61 is 10 mm, and the outer diameter of the game ball is 11 mm. That is, the polishing cloth 80 stretched so as to cover the guide rail groove 61 sinks into the groove due to the pressure of the game ball held between the guide rail groove 61 and the lifting belt 30, and the game ball is lifted in this state. The polishing section path 60 is set to be fed by the frictional force between the feeding belt 30 and the polishing cloth 80.

さらに、図4に示すように、前記遊技球ガイドローラ62の後方(中支持カバー12bの外面側)には、研磨布ガイドローラ65が水平に軸支されている。研磨布ガイドローラ65は細径の丸棒状の部材であり、研磨布80を研磨路部60の下端に周回させる時に、研磨布80が研磨路部60の下端エッジに接触することを防ぐための部材であり、研磨布80は、研磨路部60の下端において前記遊技球ガイドローラ62ないし研磨布ガイドローラ65に掛け渡された状態で張設される。   Further, as shown in FIG. 4, a polishing cloth guide roller 65 is horizontally supported behind the game ball guide roller 62 (on the outer surface side of the intermediate support cover 12b). The polishing cloth guide roller 65 is a small-diameter round bar-shaped member for preventing the polishing cloth 80 from coming into contact with the lower end edge of the polishing path 60 when the polishing cloth 80 is rotated around the lower end of the polishing path 60. The polishing cloth 80 is a member and is stretched at the lower end of the polishing path 60 in a state where it is stretched over the game ball guide roller 62 or the polishing cloth guide roller 65.

図1〜図3に示すように、揚送路部70は、前記研磨路部60の上端より揚送ベルト30の上昇面30aに沿ってさらに上方向に所定長さで延び、前記研磨路部60より研磨揚送されてきた遊技球をさらに遊技機島の上端まで揚送するための部位である。揚送路部70は、前記整列路部50や研磨路部60と同様にウレタンゴム等の弾性を有する合成樹脂により成形されている。   As shown in FIGS. 1 to 3, the lifting path portion 70 extends from the upper end of the polishing path portion 60 by a predetermined length further upward along the rising surface 30 a of the lifting belt 30. This is a part for further lifting the game ball that has been polished and lifted from 60 to the upper end of the gaming machine island. Similarly to the alignment path portion 50 and the polishing path portion 60, the lifting path portion 70 is formed of a synthetic resin having elasticity such as urethane rubber.

揚送路部70において、揚送ベルト30の上昇面30aに対向する表面には、遊技球を上方に導くための複数のガイドレール溝71,71…が形成されている。ここで各揚送路部70は、前記研磨路部60と同様の構成であり、各ガイドレール溝71は、それぞれ前記各ガイドレール溝61と一対一で対応しており、互いに直線状に連なっている。   In the lifting path portion 70, a plurality of guide rail grooves 71, 71,... For guiding the game ball upward are formed on the surface of the lifting belt 30 that faces the rising surface 30a. Here, each feed path section 70 has the same configuration as that of the polishing path section 60, and each guide rail groove 71 is in one-to-one correspondence with each guide rail groove 61, and is linearly connected to each other. ing.

あるいは、揚送路部70において揚送ベルト30の上昇面30aに対向する表面には、前記各ガイドレール溝71を形成することなく、前記揚送ベルト30と同一の材質を貼り付けて構成しても良い。かかる場合には、図8に示したポリエステルとポリウレタンとの2層構造の1枚のベルトのみを、そのポリエステル側が表面となるように貼り合わせても良い。なお、図示省略したが、揚送路部70の上端にも、前記遊技球ガイドローラ62および研磨布ガイドローラ65が前後平行に並んだ状態で水平に軸支されているが、ここで遊技球ガイドローラ62は、主に研磨布ガイドローラ65としての役目を果すことになる。   Alternatively, the same material as that of the transport belt 30 is attached to the surface of the transport path portion 70 facing the rising surface 30a of the transport belt 30 without forming the guide rail grooves 71. May be. In such a case, only one belt having a two-layer structure of polyester and polyurethane shown in FIG. 8 may be bonded so that the polyester side is the surface. Although not shown, the game ball guide roller 62 and the polishing pad guide roller 65 are also horizontally supported at the upper end of the transport path portion 70 in a state where they are arranged in parallel in the front-rear direction. The guide roller 62 mainly serves as the polishing pad guide roller 65.

次に、前記研磨路部60の研磨面を覆う状態に前記研磨布80を張設するための装着構造について説明する。かかる装着構造は、図1〜図3に示すように、前記研磨路部60の側端部に着脱可能に取り付けるホルダー110と、該ホルダー110に連結されたガイド120と、前記研磨路部60の背面側の上下位置にそれぞれ設けられた一対のクランプ130,130とから構成されている。   Next, a mounting structure for stretching the polishing cloth 80 so as to cover the polishing surface of the polishing path 60 will be described. As shown in FIGS. 1 to 3, the mounting structure includes a holder 110 that is detachably attached to a side end portion of the polishing path portion 60, a guide 120 connected to the holder 110, and the polishing path portion 60. It is composed of a pair of clamps 130 and 130 provided at the upper and lower positions on the back side.

ホルダー110は、円筒状に巻かれたロール研磨布80a(図15参照。)を縦置き状態で回転可能に保持し、前記研磨路部60の側端部の側方にロール研磨布80aが位置する状態で、該側端部に着脱可能に取り付けるものである。前記研磨布80は、円筒状に巻かれてロール研磨布80aをなす。研磨布80の横幅は、前記研磨路部60における研磨面のうち全てのガイドレール溝61を覆い得る大きさであり、延伸可能な繊維方向が横幅方向に一致している。   The holder 110 holds a roll polishing cloth 80a (see FIG. 15) wound in a cylindrical shape so that the roll polishing cloth 80a can be rotated in a vertically placed state, and the roll polishing cloth 80a is positioned on the side of the side end of the polishing path 60. In such a state, it is detachably attached to the side end. The polishing cloth 80 is wound into a cylindrical shape to form a roll polishing cloth 80a. The width of the polishing pad 80 is large enough to cover all the guide rail grooves 61 in the polishing surface of the polishing path 60, and the stretchable fiber direction coincides with the width direction.

図9〜図12に示すように、ホルダー110は、垂直面をなす縦長の長方形の側板111と、該側板111の下端縁に直角に連設されて水平面をなす底板114と、該底板114上に立設されて前記ロール研磨布80aの筒芯内に挿入させる回転軸115とを備えてなる。側板111の一側端縁には、所定幅で上下に延びる縦長側壁112が側板111の正面より後方へ直角に折曲されており、さらに縦長側壁112の側端縁には、上下に並ぶ2つのフック113,113が側方かつ下方に向かって突設されている。   As shown in FIGS. 9 to 12, the holder 110 includes a vertically long rectangular side plate 111 that forms a vertical surface, a bottom plate 114 that is connected to the lower end edge of the side plate 111 at a right angle to form a horizontal plane, and the bottom plate 114. And a rotating shaft 115 inserted into the cylindrical core of the roll polishing cloth 80a. On one side edge of the side plate 111, a vertically long side wall 112 extending vertically with a predetermined width is bent at a right angle rearward from the front of the side plate 111. Further, on the side edge of the vertical side wall 112, two side by side are arranged vertically. Two hooks 113, 113 project from the side and downward.

図15に示すように、研磨路部60を内側に囲む中支持カバー12bの一側端部には、上下に並ぶ2つのフック孔14,14が穿設されている。ホルダー110は、後述するガイド120が一体に組み合わされた状態で、各フック113を各フック孔14に差し込み掛止することにより、各フック113を回転中心として、研磨路部60の側端部に対して水平方向に回転可能に支持される。   As shown in FIG. 15, two hook holes 14, 14 arranged vertically are formed in one side end portion of the middle support cover 12 b that surrounds the polishing path portion 60 inside. The holder 110 is inserted into the hook holes 14 and engaged with the hooks 113 in a state where guides 120 to be described later are integrally assembled. On the other hand, it is supported rotatably in the horizontal direction.

図9〜図12に示すように、ホルダー110の底板114は、前方の一端側の角が削られてアールをなす正方形に形成されており、前記側板111の下端縁より前方へ直角に折曲されている。この底板114の略中央に、ロール研磨布80aの筒芯を通す回転軸115が垂直に立設されている。なお、回転軸115の外径は、ロール研磨布80aの筒芯の内径より小さく設定されており、回転軸115自体が回転しなくても、ロール研磨布80aを回転可能に装着できれば良い。   As shown in FIGS. 9 to 12, the bottom plate 114 of the holder 110 is formed into a rounded square shape with a corner on one front side thereof being cut, and is bent at a right angle forward from the lower end edge of the side plate 111. Has been. A rotating shaft 115 that allows the cylindrical core of the roll polishing cloth 80a to pass through is erected vertically at substantially the center of the bottom plate 114. The outer diameter of the rotating shaft 115 is set to be smaller than the inner diameter of the cylindrical core of the roll polishing cloth 80a, and it is only necessary that the roll polishing cloth 80a can be rotatably mounted even if the rotating shaft 115 itself does not rotate.

ホルダー110に一体に組み合わされるガイド120は、垂直面をなす縦長の長方形の側板121と、該側板121の下端縁に直角に連設されて水平面をなし、前記ホルダー110の底板114の下側に重なる状態で回転可能に軸支される底板122と、前記側板121の側端縁に直角に連設されて垂直面をなす案内板124とを備えてなる。   The guide 120 integrally combined with the holder 110 is a vertically long rectangular side plate 121 that forms a vertical surface, and is connected to the lower end edge of the side plate 121 at a right angle to form a horizontal surface. A bottom plate 122 that is rotatably supported in an overlapping state, and a guide plate 124 that is connected to the side edge of the side plate 121 at a right angle to form a vertical surface.

側板121は、前記ホルダー110の側板111に対して、その縦長側壁112のある側端縁より前方へ向かって直角となるように配置される。底板122は、正方形に形成されており、前記側板121の下端縁より、前記ホルダー110の底板114の下側に重なるように直角に折曲されている。底板122は、前記ホルダー110の底板114上に回転軸115を立設するネジにより、底板114に対して回転可能に連結されている。なお、底板122の前端縁に沿って、所定幅で下方へ延びるフランジ123が直角に折曲されている。   The side plate 121 is disposed so as to be perpendicular to the side plate 111 of the holder 110 from the side edge with the vertically long side wall 112 toward the front. The bottom plate 122 is formed in a square shape and is bent at a right angle from the lower end edge of the side plate 121 so as to overlap the bottom side of the bottom plate 114 of the holder 110. The bottom plate 122 is rotatably connected to the bottom plate 114 by screws that erect a rotation shaft 115 on the bottom plate 114 of the holder 110. A flange 123 extending downward with a predetermined width is bent at a right angle along the front edge of the bottom plate 122.

側板121にて後方を向く一側端縁には、案内板124がさらに側方へ直角に折曲されている。案内板124は、直角三角形に形成されており、研磨路部60を囲む中支持カバー12bの正面に沿うように配置される。案内板124の下端から上端に向かって延びる斜めの端縁は、前記ホルダー110上のロール研磨布80aから中支持カバー12bの正面(研磨路部60の背面)に重なる側方に引き出した研磨布80の途中を、直角に折り曲げた状態で中支持カバー12bの正面に沿わせて上方に案内する傾斜端縁125をなしている。   A guide plate 124 is further bent at a right angle to the side edge of the side plate 121 facing backward. The guide plate 124 is formed in a right triangle and is disposed along the front surface of the middle support cover 12 b that surrounds the polishing path portion 60. An oblique edge extending from the lower end to the upper end of the guide plate 124 is a polishing cloth drawn from the roll polishing cloth 80a on the holder 110 to the side overlapping the front surface of the middle support cover 12b (the back surface of the polishing path portion 60). In the middle of 80, an inclined edge 125 is formed that guides upward along the front surface of the middle support cover 12b in a state of being bent at a right angle.

図13に示すように、水平面に対する傾斜端縁125の角度は、正確には45度ではなく多少緩やかとなる42度に設定されている。かかる角度は実験データに基づく値であり、角度が42度より大きくなると、研磨布80を引き上げる際に図中のA矢印方向へ研磨布80がずれてしまい、逆に角度が42度より小さくなると、研磨布80を引き上げる際に図中のB矢印方向へ研磨布80がずれてしまうという結果に基づき定められている。   As shown in FIG. 13, the angle of the inclined edge 125 with respect to the horizontal plane is set to 42 degrees, which is not 45 degrees but is slightly more accurate. Such an angle is a value based on experimental data. When the angle is larger than 42 degrees, the polishing cloth 80 is displaced in the direction of arrow A in the drawing when the polishing cloth 80 is pulled up, and conversely, when the angle is smaller than 42 degrees. It is determined based on the result that the polishing cloth 80 is displaced in the direction of arrow B in the drawing when the polishing cloth 80 is pulled up.

図16に示すように、ホルダー110の側板121と、ガイド120の案内板124との相対向する側縁同士の間は、ロール研磨布80aから引き出された研磨布80の途中が挿通し、ホルダー110の底板114に対するガイド120の底板122の回転に伴い幅が拡縮する隙間となっている。なお、図9に示すように、案内板124の上端縁に沿って、所定幅で前方へ延びるフランジ126が直角に折曲されている。   As shown in FIG. 16, between the side edges of the side plate 121 of the holder 110 and the guide plate 124 of the guide 120 facing each other, the middle of the polishing cloth 80 drawn out from the roll polishing cloth 80a is inserted. A gap whose width expands or contracts with the rotation of the bottom plate 122 of the guide 120 with respect to the bottom plate 114 of 110. As shown in FIG. 9, along the upper edge of the guide plate 124, a flange 126 extending forward with a predetermined width is bent at a right angle.

図19および図20に示すように、クランプ130は、中支持カバー12bの正面(研磨路部60の背面)に沿って取り付けられる抵抗板131と、該抵抗板131に対向した状態に配置される押圧部材135と、前記抵抗板131と前記押圧部材135との間に研磨布80を挿通させた状態で、前記押圧部材135を前記抵抗板131に押圧させた固定位置と前記抵抗板131から離隔した開放位置とに変位させる操作部材137とを備えてなる。   As shown in FIGS. 19 and 20, the clamp 130 is disposed in a state of facing the resistance plate 131 and the resistance plate 131 attached along the front surface of the middle support cover 12 b (the back surface of the polishing path portion 60). In a state where the polishing pad 80 is inserted between the pressing member 135, the resistance plate 131 and the pressing member 135, the fixed position where the pressing member 135 is pressed against the resistance plate 131 and the resistance plate 131 are separated from each other. And an operating member 137 that is displaced to the opened position.

抵抗板131は、図14に示すように、研磨路部60の背面をなす中支持カバー12bに固定された台座132上に貼り付けられている。台座132は、中支持カバー12bの横幅と同じ幅のベース板133と、該ベース板133の左右両端縁を折曲して立設した一対の支持片134,134とからなり、ベース板133の表面全体に前記抵抗板131は貼り付けられている。なお、抵抗板131の材質は、ある程度の摩擦抵抗を有するものであれば何でも良く、ゴム板や合成樹脂板、あるいはキャンバス地等で構成することができる。   As shown in FIG. 14, the resistance plate 131 is affixed on a pedestal 132 fixed to the middle support cover 12 b that forms the back surface of the polishing path portion 60. The pedestal 132 includes a base plate 133 having the same width as the lateral width of the middle support cover 12b and a pair of support pieces 134 and 134 which are erected by bending the left and right end edges of the base plate 133. The resistance plate 131 is attached to the entire surface. The resistance plate 131 may be made of any material as long as it has a certain amount of frictional resistance, and may be composed of a rubber plate, a synthetic resin plate, canvas, or the like.

押圧部材135は、図20に示すように、前記台座132の左右の支持片134,134の間に一対に分かれて回転可能に軸支されている。押圧部材135は、前記抵抗板131と接触する部分の断面が円弧状に形成されており、前記研磨路部60の背面の幅方向のうち両側部に離隔する状態で、それぞれ偏心軸136を介して回転可能に軸支された一対のカムからなる。   As shown in FIG. 20, the pressing member 135 is split into a pair between the left and right support pieces 134 of the pedestal 132 and is rotatably supported. The pressing member 135 has an arcuate section in contact with the resistance plate 131, and is separated from both sides in the width direction of the back surface of the polishing path 60 via the eccentric shaft 136. And a pair of cams rotatably supported.

操作部材137は、前記一対のカムである各押圧部材135の間を一体に連結するハンドルからなる。図14に示すように、操作部材137の操作により回転する押圧部材135は、偏心した状態で軸支されているので、操作部材137を押し下げると、押圧部材135の円弧状である先端部が抵抗板131の側を向き、この先端部で抵抗板131を所定圧力で押圧する固定位置に変位する。一方、操作部材137を引き上げると、押圧部材135の円弧状をなした先端部は、抵抗板131から所定距離離れた開放位置に変位する。   The operation member 137 includes a handle that integrally connects the pressing members 135 that are the pair of cams. As shown in FIG. 14, the pressing member 135 rotated by the operation of the operation member 137 is pivotally supported in an eccentric state. Therefore, when the operation member 137 is pressed down, the arcuate tip of the pressing member 135 is resisted. The plate 131 is directed to the side and is displaced to a fixed position at which the resistance plate 131 is pressed with a predetermined pressure at the tip. On the other hand, when the operation member 137 is pulled up, the arcuate tip of the pressing member 135 is displaced to an open position that is a predetermined distance away from the resistance plate 131.

抵抗板131と押圧部材135の間に研磨布80を挟持した時、固定位置に変位させた押圧部材135から研磨布80および抵抗板131が受ける押圧力によって、研磨布80と抵抗板131との間に静止摩擦力が生じる。この静止摩擦力が、遊技球を揚送する際に研磨布80に加わる最大張力より大きくなるように、押圧部材135の押圧力と抵抗板131の表面状態が設定してある。なお、ハンドル(操作部材)137の両側のアーム部分の長さによって、操作時のトルクを任意に設定することができる。   When the polishing cloth 80 is sandwiched between the resistance plate 131 and the pressing member 135, the polishing cloth 80 and the resistance plate 131 are pressed by the pressing force received by the polishing cloth 80 and the resistance plate 131 from the pressing member 135 displaced to the fixed position. A static friction force is generated between them. The pressing force of the pressing member 135 and the surface state of the resistance plate 131 are set so that the static friction force is larger than the maximum tension applied to the polishing pad 80 when the game ball is lifted. In addition, the torque at the time of operation can be arbitrarily set by the lengths of the arm portions on both sides of the handle (operation member) 137.

次に、揚送研磨装置本体10の作用について説明する。
各遊技機で使用された遊技球は遊技機島の下部に回収された後、図4に示すように、回収樋16を経て揚送研磨装置10の下端にある導入路カバー40に供給される。導入路カバー40において、遊技球は先ずガイド板42を自重により流下し、そのまま下ローラ22の下側に沿った導入路40aに導かれる。このとき、遊技球が上下に重なり合っていたとしても、導入路40aの入口に導入されつつ徐々に均されて、自然と上下一列に整列させられる。
Next, the operation of the lifting polishing apparatus main body 10 will be described.
After the game balls used in each gaming machine are collected at the lower part of the gaming machine island, they are supplied to the introduction path cover 40 at the lower end of the lifting and polishing apparatus 10 via the collection basket 16 as shown in FIG. . In the introduction path cover 40, the game ball first flows down the guide plate 42 by its own weight, and is directly guided to the introduction path 40 a along the lower side of the lower roller 22. At this time, even if the game balls overlap vertically, they are gradually leveled while being introduced into the inlet of the introduction path 40a and are naturally aligned in a vertical line.

電動モータ20が駆動されると、減速機構を介して下ローラ22が回転し、該下ローラ22が揚送ベルト30を繰り込み繰り出して揚送ベルト30は循環する。この揚送ベルト30の本体11の正面を向く側が上昇面30aとなる。導入路40aに供給された遊技球は、下ローラ22の外周に沿った揚送ベルト30と導入路カバー40の内周面との間に挟まれた状態で、下ローラ22の遠心力によって導入路40aを高速で移動し、導入路カバー40の終端から勢い良く排出される。   When the electric motor 20 is driven, the lower roller 22 rotates through the speed reduction mechanism, and the lower roller 22 retracts and feeds the lifting belt 30 so that the lifting belt 30 circulates. A side of the lifting belt 30 facing the front of the main body 11 is a rising surface 30a. The game ball supplied to the introduction path 40 a is introduced by the centrifugal force of the lower roller 22 while being sandwiched between the feeding belt 30 along the outer periphery of the lower roller 22 and the inner peripheral surface of the introduction path cover 40. It moves along the path 40a at a high speed and is discharged from the end of the introduction path cover 40 vigorously.

導入路カバー40の終端に連なる部位には、図4に示すように、未だ研磨布80は配置されておらず、その代わり整列路部50が配設されており、遊技球は先ず整列路部50に導入される。複数の遊技球が整列路部50の下端付近で競り合ったとしても、導入路カバー40の終端43は、ばね付きネジ44によって下ローラ22に対し弾発的に離隔可能である。従って、導入路カバー40から排出される遊技球は、整列路部50にある複数のガイドレール溝51内にスムーズに振り分けられて受け渡される。   As shown in FIG. 4, the polishing cloth 80 has not yet been disposed at the portion connected to the terminal end of the introduction path cover 40, and instead the alignment path portion 50 is disposed. 50. Even if a plurality of game balls compete in the vicinity of the lower end of the alignment path portion 50, the end 43 of the introduction path cover 40 can be elastically separated from the lower roller 22 by the spring-loaded screw 44. Therefore, the game balls discharged from the introduction path cover 40 are smoothly distributed and delivered into the plurality of guide rail grooves 51 in the alignment path portion 50.

整列路部50において、遊技球は各ガイドレール溝51内で整列した状態となり、そのまま各ガイドレール溝51と揚送ベルト30の上昇面30aとの間に挟持された状態で揚送される。かかる過程で遊技球は勢いが確実に減殺され、最終的には揚送ベルト30の循環速度とほぼ等速で揚送される。このように遊技球は衝撃が緩和された後に、整列路部50の上端より研磨路部60に受け渡される。   In the alignment path portion 50, the game balls are aligned in the guide rail grooves 51 and are lifted as they are sandwiched between the guide rail grooves 51 and the rising surface 30 a of the lifting belt 30. In this process, the game ball is surely reduced in momentum, and finally, the game ball is transported at a speed substantially equal to the circulation speed of the transport belt 30. In this way, the game balls are transferred from the upper end of the alignment path portion 50 to the polishing path portion 60 after the impact is reduced.

以上のように、下ローラ22の遠心力によって、導入路カバー40から勢い良く排出された遊技球は、直ぐに研磨布80に衝突することはなく、いったん整列路部50に導入されることで、前記遠心力による衝撃が緩和された後に研磨および揚送されることになる。従って、研磨布80の早期破損を防止して研磨布80の耐久性を高めることができ、さらに、研磨布80の破損した繊維屑を原因とする周辺機器の故障やパチンコ機盤面の汚れを未然に防止することが可能となる。   As described above, the game balls that are vigorously discharged from the introduction path cover 40 by the centrifugal force of the lower roller 22 do not immediately collide with the polishing cloth 80, and are once introduced into the alignment path unit 50. After the impact due to the centrifugal force is alleviated, it is polished and lifted. Accordingly, it is possible to prevent the polishing cloth 80 from being damaged early and to improve the durability of the polishing cloth 80. Further, it is possible to prevent peripheral equipment failure and dirt on the pachinko machine board surface caused by the broken fiber waste of the polishing cloth 80. Can be prevented.

ところで、本実施の形態では、整列路部50の具体的な所定長さとして、図4に示すように、整列路部50の下端を、下ローラ22の中心軸と同じ高さ位置にて導入路カバー40の終端に連設し、また、整列路部50の上端は、下ローラ22の直径の約2.3倍の高さ位置に設定している。整列路部50と研磨路部60との長さの比率は非常に重要な問題となるが、本実施の形態で採用した整列路部50の長さと配置によれば、結果として研磨効率や揚送能力を向上させることができる。   By the way, in the present embodiment, as the specific predetermined length of the alignment path portion 50, the lower end of the alignment path portion 50 is introduced at the same height as the central axis of the lower roller 22, as shown in FIG. The upper end of the alignment path portion 50 is set at a height position that is approximately 2.3 times the diameter of the lower roller 22. The ratio of the length of the alignment path portion 50 and the polishing path portion 60 is a very important problem. However, according to the length and arrangement of the alignment path portion 50 employed in the present embodiment, as a result, the polishing efficiency and the lift rate are increased. The sending ability can be improved.

詳しく言えば、整列路部50の下端を、下ローラ22の中心軸と同じ高さ位置とするのは、最も大きな遠心力を受ける位置だからである。また、整列路部50の上端を、下ローラ22の外径上端と同じ高さ位置より上方とするのは、かかる高さ位置までの長さが遠心力を減殺する上では最小限必要だからである。かつ整列路部50の下端を、下ローラ22の直径の3倍の高さ位置より下方とするのは、整列路部50の全長がこれ以上に長くなれば、揚送力が過度に減殺されると共に、研磨路部60の全長が相対的に短くなって研磨力が減殺されることが、実験的に確かめられている。   Specifically, the reason why the lower end of the alignment path portion 50 is set at the same height as the central axis of the lower roller 22 is the position that receives the largest centrifugal force. Also, the reason why the upper end of the alignment path portion 50 is located above the same height position as the upper end of the outer diameter of the lower roller 22 is that the length to such a height position is the minimum necessary to reduce the centrifugal force. is there. The reason why the lower end of the alignment path portion 50 is set below the height position of three times the diameter of the lower roller 22 is that the lifting force is excessively reduced if the total length of the alignment path portion 50 is longer than this. At the same time, it has been experimentally confirmed that the polishing path 60 is relatively shortened to reduce the polishing power.

整列路部50から研磨路部60に受け渡された遊技球は、揚送ベルト30の上昇面30aと研磨布80との間に挟持された状態で揚送されながら同時に研磨される。研磨路部60において研磨布80が張設してある研磨面は、単なる平滑な面ではなく、遊技球を上方に導く複数のガイドレール溝61が形成されている。これにより、研磨路部60の遊技球は、互いに競り合うことなく各々が複数のガイドレール溝61に導かれて効率良く揚送される。また、揚送方向とは関係ない研磨布80の幅方向への余計な転動も防止される。   The game balls transferred from the alignment path portion 50 to the polishing path portion 60 are simultaneously polished while being transported while being sandwiched between the rising surface 30a of the transport belt 30 and the polishing cloth 80. The polishing surface on which the polishing cloth 80 is stretched in the polishing path portion 60 is not a simple smooth surface, but is formed with a plurality of guide rail grooves 61 that guide the game ball upward. Thereby, the game balls of the polishing path 60 are guided to the plurality of guide rail grooves 61 without being competed with each other, and are efficiently lifted. Further, unnecessary rolling in the width direction of the polishing pad 80, which is not related to the lifting direction, is also prevented.

研磨布80には、複数のガイドレール溝61内に凹入する方向に力がかかり、その結果として本来の横幅が減縮することになるが、研磨布80は、研磨路部60の研磨面の両側方向に延伸可能な材質からなる。従って、研磨布80の本来の横幅が減縮する代わりに、研磨布80は両側方向に延伸して、前記研磨面の両端部分から研磨布80が外れるような事態を防止することができる。また、遊技球が研磨布80を延伸させつつガイドレール溝61内に凹入することにより、遊技球と研磨布80とは面接触の状態となり、遊技球の表面全体を満遍なく研磨することが可能となる。   A force is applied to the polishing cloth 80 in a direction to be recessed into the plurality of guide rail grooves 61. As a result, the original lateral width is reduced. However, the polishing cloth 80 is formed on the polishing surface of the polishing path portion 60. Made of a material that can be stretched in both directions. Therefore, instead of reducing the original width of the polishing pad 80, the polishing pad 80 can be extended in both directions to prevent the polishing pad 80 from being detached from both ends of the polishing surface. Further, the game ball is recessed into the guide rail groove 61 while extending the polishing cloth 80, so that the game ball and the polishing cloth 80 are in surface contact, and the entire surface of the game ball can be uniformly polished. It becomes.

また、研磨路部60の各ガイドレール溝61は、前述した整列路部50の各ガイドレール溝51にそれぞれ連なるため、整列路部50から研磨路部60にかけて遊技球を円滑に連続して受け渡すことができる。さらに、図4に示すように、整列路部50と研磨路部60との間には遊技球ガイドローラ62が設けられており、整列路部50から排出された遊技球は、遊技球ガイドローラ62の凹溝63に沿って研磨路部60のガイドレール溝61に導かれる。これにより、整列路部50から研磨路部60へ遊技球をスムーズに移動させることができる。   Further, since each guide rail groove 61 of the polishing path portion 60 is connected to each guide rail groove 51 of the alignment path portion 50 described above, the game balls are received smoothly and continuously from the alignment path portion 50 to the polishing path portion 60. Can pass. Further, as shown in FIG. 4, a game ball guide roller 62 is provided between the alignment path portion 50 and the polishing path portion 60, and the game ball discharged from the alignment path portion 50 is a game ball guide roller. It is guided along the concave groove 63 of 62 to the guide rail groove 61 of the polishing path 60. Thereby, the game balls can be smoothly moved from the alignment path portion 50 to the polishing path portion 60.

詳しく言えば、図5〜図7に示すように、遊技球ガイドローラ62は、その軸方向に並ぶ各凹溝63の最底周面が、研磨路部60にある各ガイドレール溝61の最奧面より、さらに奧方向すなわち背面側に位置する状態に軸支されている。これにより、研磨布80が掛け回された状態の遊技球ガイドローラ62は、研磨布80の下端を各ガイドレール溝61の下端に馴染むように沿わせて、遊技球が導入されやすい状態にすると共に、遊技球が最初にぶつかる研磨布80の下端の衝撃を緩和する。   More specifically, as shown in FIGS. 5 to 7, the game ball guide roller 62 is configured such that the bottom peripheral surface of each of the concave grooves 63 aligned in the axial direction is the outermost of each guide rail groove 61 in the polishing path portion 60. It is pivotally supported in a state positioned further in the heel direction, that is, on the back side than the ridge surface. As a result, the game ball guide roller 62 in a state in which the polishing cloth 80 is wound is placed so that the lower end of the polishing cloth 80 fits the lower end of each guide rail groove 61 so that the game ball is easily introduced. At the same time, the impact at the lower end of the polishing cloth 80 that the game ball first hits is reduced.

また、図6に示すように、ガイドレール溝61の底と遊技球ガイドローラ62の凹溝63の最底周面との前述した具体的な距離設定によって、ガイドレール溝61と揚送ベルト30に挟持された遊技球の押圧により、ガイドレール溝61を覆うように張設された研磨布80は溝内に沈み込む。かかる状態で遊技球は、揚送ベルト30と研磨布80との摩擦力で研磨路部60を揚送される。   Further, as shown in FIG. 6, the guide rail groove 61 and the lifting belt 30 are set by the above-described specific distance setting between the bottom of the guide rail groove 61 and the bottom peripheral surface of the concave groove 63 of the game ball guide roller 62. The polishing cloth 80 stretched so as to cover the guide rail groove 61 sinks into the groove by the pressing of the game ball held between the two. In this state, the game ball is lifted along the polishing path 60 by the frictional force between the lifting belt 30 and the polishing pad 80.

このとき、揚送ベルト30の摩擦係数より研磨布80の摩擦係数が大きいと、遊技球の表面に付着した汚れは研磨布80に多く付着する。これにより、揚送ベルト30の揚送面の汚れが少なくなり、遊技球に再付着することを防止することができる。研磨布80が前述したようにポリエステルナノファイバー繊維構造体であって、揚送ベルト30と研磨布80との摩擦係数の比率が1:2.5の場合、特に本装置における遊技球の研磨効率や揚送能力をいっそう高めることができる。   At this time, if the friction coefficient of the polishing pad 80 is larger than the friction coefficient of the feeding belt 30, a lot of dirt attached to the surface of the game ball adheres to the polishing pad 80. Thereby, the dirt of the feeding surface of the feeding belt 30 is reduced, and it is possible to prevent reattachment to the game ball. As described above, when the polishing cloth 80 is a polyester nanofiber fiber structure and the ratio of the friction coefficient between the feeding belt 30 and the polishing cloth 80 is 1: 2.5, the polishing efficiency of the game ball in the present apparatus is particularly good. And the lifting capacity can be further increased.

摩擦係数等に関する具体的な数値としては、前述したように、揚送ベルト30の摩擦係数を0.20μs〜0.25μsとし、研磨布80の摩擦係数を0.50μs〜0.62μsとし、かつ厚さ0.3mm〜0.5mmのポリエステルナノファイバー繊維構造体により構成すると良い。これらの数値の材質を採用することにより、特に遊技球の研磨前の輝度値より大きな輝度値が得られることが本件発明者らの実験データにより確かめられている。   Specific numerical values relating to the friction coefficient, etc., as described above, the friction coefficient of the conveying belt 30 is 0.20 μs to 0.25 μs, the friction coefficient of the polishing pad 80 is 0.50 μs to 0.62 μs, and It is good to comprise by the polyester nanofiber fiber structure of thickness 0.3mm-0.5mm. It has been confirmed by the experimental data of the present inventors that a luminance value larger than the luminance value before polishing of the game ball can be obtained by adopting these numerical materials.

実験データの一例を以下に示す。実験方法としては、揚送研磨装置10の上端にある排出口13に、研磨された遊技球を受ける空箱を取り付け、揚送研磨装置10に投入前の遊技球の輝度と、空箱に回収された研磨済みの遊技球の輝度をそれぞれ測定する。研磨回数としては、1回のみならず、5回投入後と10回投入後における遊技球の輝度も測定する。また、最後にアルコールで拭いた遊技球の輝度も、理想の研磨後の目標値として測定する。   An example of experimental data is shown below. As an experimental method, an empty box that receives the ground game balls is attached to the discharge port 13 at the upper end of the lifting and polishing apparatus 10, and the brightness of the game balls before being thrown into the lifting and polishing apparatus 10 and collected in the empty box. The brightness of each polished game ball is measured. As the number of times of polishing, not only once but also the luminance of the game ball after 5 times and after 10 times is measured. Further, the luminance of the game ball wiped with alcohol at the end is also measured as an ideal target value after polishing.

採用した研磨布80は、市販のポリエステルナノファイバー繊維構造体(例えば、帝人ファイバー社製)であって、摩擦係数は0.50μs、厚さは0.3mmのものを用いる。なお、摩擦係数に関しては、ポリエステルナノファイバー繊維構造体の製造工程において、不織布を構成するウェブの結合方法の相違により、あるいは既存の不織布の表面を擦って毛羽立たせることにより、任意の数値に容易に適宜調整することができる。   The employed polishing cloth 80 is a commercially available polyester nanofiber fiber structure (for example, manufactured by Teijin Fibers Ltd.) having a friction coefficient of 0.50 μs and a thickness of 0.3 mm. Regarding the coefficient of friction, in the production process of the polyester nanofiber fiber structure, it can be easily set to any numerical value by the difference in the bonding method of the webs constituting the nonwoven fabric or by rubbing the surface of the existing nonwoven fabric. It can be adjusted appropriately.

また、採用した揚送ベルト30は、図8に示すように、心体31はポリエステルであって、表層32および裏層33はポリウレタンから構成され、表裏の面形状は平滑である市販のものであり(例えば、バンドー化学社製。)、摩擦係数は0.20μsである。また、研磨路部60の具体的な構成は図7に示すものであり、研磨路部60の全長は900mmとする。なお、測定対象である遊技球は一般のパチンコ玉を用いて、輝度を測定する機器は一般の分光測色計を使用した。   Further, as shown in FIG. 8, the adopted lifting belt 30 is a commercially available one in which the core body 31 is polyester, the surface layer 32 and the back layer 33 are made of polyurethane, and the surface shape of the front and back surfaces is smooth. Yes (for example, manufactured by Bando Chemical Co., Ltd.) and the friction coefficient is 0.20 μs. The specific configuration of the polishing path portion 60 is shown in FIG. 7, and the total length of the polishing path portion 60 is 900 mm. In addition, the game ball which is a measurement object used a general pachinko ball, and the apparatus which measures brightness used a general spectrocolorimeter.

図21は、実験データを示している。実験においては、遊技球1個ごとに3箇所において輝度を測定する。このとき、遊技球の取り扱いにはピンセットを用いる。図21(a)は、5個の遊技球ごとに、研磨回数として、0回、1回、5回、10回、それにアルコール拭き後に測定した3箇所における輝度のデータである。図21(b)は、3箇所における輝度の平均値と、アルコール拭き後と10回研磨後における輝度の差を示している。この差が少ないほど研磨効率が高いことになる。   FIG. 21 shows experimental data. In the experiment, the luminance is measured at three locations for each game ball. At this time, tweezers are used for handling the game balls. FIG. 21 (a) shows the luminance data at three locations measured after wiping alcohol with 0, 1, 5, 10, and 5 times of polishing for every five game balls. FIG. 21B shows the average value of the luminance at three locations, and the difference in luminance after wiping alcohol and polishing 10 times. The smaller this difference, the higher the polishing efficiency.

このような図21に示す実験データのみならず、揚送ベルト30や研磨布80の材質ないし摩擦係数を異ならせて数多の実験を行いデータを比較した結果、前述したように、揚送ベルト30は摩擦係数が0.20μs〜0.25μsであり、研磨布80は摩擦係数が0.50μs〜0.62μsであって、かつ厚さ0.3mm〜0.5mmのポリエステルナノファイバー繊維構造体であることが、本装置に採用するものとして最適であることが検証された。   In addition to the experimental data shown in FIG. 21, as a result of comparing a number of experiments with different materials and friction coefficients of the lifting belt 30 and the polishing pad 80 and comparing the data, as described above, the lifting belt No. 30 has a friction coefficient of 0.20 μs to 0.25 μs, and the polishing cloth 80 has a friction coefficient of 0.50 μs to 0.62 μs, and a polyester nanofiber fiber structure having a thickness of 0.3 mm to 0.5 mm. It has been verified that this is optimal for use in the present apparatus.

また、研磨布80の具体的な組成として、ポリエチレンテレフタラート(PET)55%、パルプ45%であって、目付61g/m2〜71g/m2、厚さ0.3mm〜0.5mmのスパンレース不織布を採用する。このようなスパンレース不織布を用いることにより、遊技球の研磨効率を高めることができるばかりでなく、高い耐久性によって遊技球との摩擦による破損も緩和され、しかも、研磨布80自体のコストも極力抑えることが可能となる。 The polishing cloth 80 has a specific composition of 55% polyethylene terephthalate (PET), 45% pulp, span of 61 g / m 2 to 71 g / m 2 and a thickness of 0.3 mm to 0.5 mm. Adopt lace nonwoven fabric. By using such a spunlace nonwoven fabric, not only the polishing efficiency of the game ball can be increased, but also damage due to friction with the game ball is reduced by high durability, and the cost of the polishing cloth 80 itself is as much as possible. It becomes possible to suppress.

また、研磨路部60は、研磨布80より大きい摩擦抵抗を有するウレタンゴム等の弾性体から構成される。これにより、遊技球が揚送ベルト30によって揚送される際に、研磨布80が上方にずれることなく研磨路部60の研磨面側に密着することになり、ガイドレール溝61に沿って回転する遊技球の表面の輝度を向上させることができる。   The polishing path 60 is made of an elastic material such as urethane rubber having a friction resistance larger than that of the polishing pad 80. As a result, when the game ball is lifted by the lifting belt 30, the polishing cloth 80 comes into close contact with the polishing surface side of the polishing path portion 60 without shifting upward, and rotates along the guide rail groove 61. The brightness of the surface of the game ball to be played can be improved.

さらにまた、揚送ベルト30は、図8に示すように、心体31をポリエステルとして表裏をポリウレタンから構成し、表裏の面形状を平滑とする。これにより、適度な弾性を得ることができると共に耐久性にも優れ、優れた揚送能力を担保することができる。また、表裏の面形状を平滑とすることにより、揚送ベルト30に対する汚れの付着を防止することができると共に、付着した汚れは簡単に拭き取ることができる。   Furthermore, as shown in FIG. 8, the lifting belt 30 has a core body 31 made of polyester and front and back surfaces made of polyurethane, and the front and back surface shapes are made smooth. Thereby, while being able to obtain moderate elasticity, it is excellent also in durability and it can ensure the outstanding lifting capability. Further, by making the front and back surface shapes smooth, it is possible to prevent the dirt from adhering to the transport belt 30 and to easily wipe off the adhering dirt.

ところで、研磨布80が汚れた場合には、新たな研磨布80と交換することになる。以下に、研磨路部60の研磨面を覆う状態に研磨布80を張設するための装着方法について説明する。研磨布80は、円筒状に巻かれたロール研磨布80aから引き出されて用いられる。図2に示すように、ロール研磨布80aは、ホルダー110によって研磨路部60の側端部の側方に取り付けられる。図12に示すように、ホルダー110の回転軸115にロール研磨布80aの筒芯を挿通させて底板114上に載せるだけで、ロール研磨布80aは縦置き状態で回転可能に保持される。   By the way, when the polishing cloth 80 becomes dirty, it is replaced with a new polishing cloth 80. Hereinafter, a mounting method for stretching the polishing cloth 80 so as to cover the polishing surface of the polishing path portion 60 will be described. The polishing cloth 80 is used by being drawn out from a roll polishing cloth 80a wound in a cylindrical shape. As shown in FIG. 2, the roll polishing cloth 80 a is attached to the side of the side end portion of the polishing path portion 60 by the holder 110. As shown in FIG. 12, the roll polishing cloth 80a is rotatably held in the vertical state only by inserting the cylindrical core of the roll polishing cloth 80a through the rotating shaft 115 of the holder 110 and placing it on the bottom plate 114.

図15に示すように、ホルダー110の側板111(正確には縦長側壁112)の側端縁にある2つのフック113を、研磨路部60(正確には中支持カバー12b)の側端部に穿設された2つのフック孔14に差し込むことにより、ホルダー110をロール研磨布80aを保持した状態で研磨路部60の側方に取り付けることができる。ホルダー110は、フック113を回転中心として研磨路部60の側端部に対して水平方向に回転可能に支持される。これにより、ホルダー110の位置を適宜調整することも可能となる。   As shown in FIG. 15, two hooks 113 at the side edge of the side plate 111 (exactly, the longitudinal side wall 112) of the holder 110 are attached to the side end of the polishing path 60 (exactly, the middle support cover 12b). The holder 110 can be attached to the side of the polishing path 60 while holding the roll polishing cloth 80a by being inserted into the two hook holes 14 that are drilled. The holder 110 is supported so as to be rotatable in the horizontal direction with respect to the side end portion of the polishing path portion 60 around the hook 113 as a rotation center. Thereby, the position of the holder 110 can be adjusted as appropriate.

新たに研磨布80を研磨路部60に張設する場合には、先ずホルダー110上のロール研磨布80aから研磨布80の端部を引っ張り、研磨路部60の背面に重なる側方へと引き出す。図16に示すように、ホルダー110の側板111とガイド120の案内板124との相対向する側縁同士の間の隙間に、研磨布80の端部を挿通させることで、研磨布80をホルダー110から研磨路部60の背面に重なる側方に引き出すことになる。このとき、図12に示すように、ホルダー110の底板114に対してガイド120の底板122を回転させれば、前記隙間の幅が自在に拡縮する。これにより、ロール研磨布80aの端部を側方に引き出す作業を容易に行うことができる。   When a polishing cloth 80 is newly stretched on the polishing path portion 60, the end of the polishing cloth 80 is first pulled from the roll polishing cloth 80a on the holder 110 and pulled out to the side overlapping the back surface of the polishing path portion 60. . As shown in FIG. 16, the polishing pad 80 is inserted into the gap between the opposing side edges of the side plate 111 of the holder 110 and the guide plate 124 of the guide 120 by inserting the end portion of the polishing pad 80. It is pulled out from 110 to the side overlapping the back surface of the polishing path section 60. At this time, as shown in FIG. 12, if the bottom plate 122 of the guide 120 is rotated with respect to the bottom plate 114 of the holder 110, the width of the gap is freely expanded and reduced. Thereby, the operation | work which pulls out the edge part of the roll polishing cloth 80a to a side can be performed easily.

次に、図17に示すように、引き出した研磨布80の途中に、ホルダー110に連結されているガイド120の案内板124を重ね合せて中支持カバー12bの正面に沿わせる。案内板124には傾斜端縁125が形成されており、図18に示すように、研磨布80の途中を、前記傾斜端縁125に沿わせて直角に折り曲げた状態とし、研磨路部60の背面に沿う上方へ引き出す。このような簡易な構成により、研磨布80の途中を、側方から上方へと直角に方向転換させた状態に案内することができ、そのまま円滑に引き出すことが可能となる。   Next, as shown in FIG. 17, the guide plate 124 of the guide 120 connected to the holder 110 is overlapped in the middle of the pulled polishing cloth 80 and is placed along the front surface of the middle support cover 12 b. An inclined edge 125 is formed on the guide plate 124, and as shown in FIG. 18, the middle of the polishing pad 80 is bent at a right angle along the inclined edge 125, so that the polishing path 60 Pull upward along the back. With such a simple configuration, the middle of the polishing pad 80 can be guided to a state in which the direction is changed from the side to the top at a right angle, and can be smoothly drawn out as it is.

前述したが図13に示すように、傾斜端縁125の水平面に対する角度は、正確には45度ではなく多少緩やかとなる42度に設定されている。かかる角度は実験データに基づく値であり、角度が42度より大きくなると、研磨布80を引き上げる際に図中のA矢印方向へずれてしまうことになる。逆に角度が42度より小さくなると、研磨布80を引き上げる際に図中のB矢印方向へずれてしまうことになる。   As described above, as shown in FIG. 13, the angle of the inclined edge 125 with respect to the horizontal plane is set to 42 degrees, which is not 45 degrees but is slightly more precise. Such an angle is a value based on experimental data. When the angle is larger than 42 degrees, when the polishing pad 80 is pulled up, the angle shifts in the direction of the arrow A in the figure. On the contrary, if the angle is smaller than 42 degrees, the polishing cloth 80 is displaced in the direction of the arrow B in the drawing when it is pulled up.

ガイド120より引き延ばした研磨布80は、研磨路部60の上端側を周回させてから、研磨面の全長に亘り上下方向に張った状態で沿わせた後、再び研磨路部60の下端側より背面側に周回させる。ここで研磨布80を研磨路部60の上端に周回させる際に、研磨布80は遊技球ガイドローラ62ないし研磨布ガイドローラ65に掛け渡された状態となり、研磨路部60の下端エッジに直接接触することはない。これにより、研磨布80の損傷を防止することができると共に、円滑に研磨布80を周回させることができる。研磨布80を研磨路部60の下端に周回させる場合も同様である。   The polishing cloth 80 extended from the guide 120 circulates the upper end side of the polishing path portion 60, and then extends along the vertical direction over the entire length of the polishing surface, and then again from the lower end side of the polishing path portion 60. Circulate to the back side. Here, when the polishing cloth 80 is circulated to the upper end of the polishing path portion 60, the polishing cloth 80 is stretched over the game ball guide roller 62 or the polishing cloth guide roller 65, and directly on the lower end edge of the polishing path portion 60. There is no contact. Thereby, the polishing cloth 80 can be prevented from being damaged, and the polishing cloth 80 can be smoothly circulated. The same applies to the case where the polishing cloth 80 is rotated around the lower end of the polishing path 60.

そして、図19に示すように、本体11の上端側にあるクランプ130によって、研磨布80の上端部を固定する。同様に、本体11の下端側にあるクランプ130によって、研磨布80の下端部を固定する。これによって研磨布80の張設は完了する。ロール研磨布80aから延びる研磨布80の途中は切断しておくと良い。なお、研磨布80には、ロール研磨布80aの製造工程において、所定の長さ単位で切断し易いようにミシン目を入れておくと良い。   Then, as shown in FIG. 19, the upper end portion of the polishing pad 80 is fixed by the clamp 130 on the upper end side of the main body 11. Similarly, the lower end portion of the polishing pad 80 is fixed by the clamp 130 on the lower end side of the main body 11. Thereby, the tensioning of the polishing pad 80 is completed. The polishing cloth 80 extending from the roll polishing cloth 80a may be cut halfway. In the manufacturing process of the roll polishing cloth 80a, the polishing cloth 80 may be perforated so that it can be easily cut by a predetermined length unit.

クランプ130に関しては、図19に示すように、抵抗板131と一対の押圧部材135,135との間に研磨布80を挿通させた状態で、図14に示すように、操作部材137を押し下げて一対の押圧部材135,135を固定位置にすると、抵抗板131と各押圧部材135の円弧状部位とにより研磨布80が挟持される。このとき、研磨布80と抵抗板131との間に働く静止摩擦力を、研磨揚送時に研磨布80に加わる最大張力よりも大きくすることで、研磨布80が位置ずれを起こしたり、外れたりすることを防止することができる。   With respect to the clamp 130, as shown in FIG. 14, the operating member 137 is pushed down as shown in FIG. 14 with the polishing pad 80 inserted between the resistance plate 131 and the pair of pressing members 135, 135. When the pair of pressing members 135 and 135 are set to the fixed positions, the polishing pad 80 is sandwiched between the resistance plate 131 and the arc-shaped portion of each pressing member 135. At this time, by making the static friction force acting between the polishing cloth 80 and the resistance plate 131 larger than the maximum tension applied to the polishing cloth 80 at the time of polishing lifting, the polishing cloth 80 is displaced or detached. Can be prevented.

また、一対の押圧部材135,135は互いに離隔しているため、押圧部材135と抵抗板131との間の隙間が狭くても、かかる隙間は研磨路部60の幅方向の全域に亘ることなく両側部と局所的であり、研磨布80を操作部材137の内側に通してから研磨布80の両側縁を挿通させて挟持させれば良い。これにより、研磨布80を狭いスリット状溝等に差し込むような手間を要しないので、研磨布80を固定する作業を容易に行うことができ、あるいは外す操作も容易に行うことができる。   Further, since the pair of pressing members 135 and 135 are separated from each other, even if the gap between the pressing member 135 and the resistance plate 131 is narrow, the gap does not extend over the entire width direction of the polishing path portion 60. It is local to both sides, and the polishing cloth 80 may be passed through the inside of the operation member 137 and then the both side edges of the polishing cloth 80 may be inserted and clamped. This eliminates the need to insert the polishing cloth 80 into a narrow slit-like groove, so that the work of fixing the polishing cloth 80 can be easily performed, or the operation of removing it can be easily performed.

以上のような研磨布80の装着構造によれば、ホルダー110によって、先ずは新たに交換する研磨布80の保管場所を確保することができ、遊技球の研磨により汚れた研磨布80は切捨てて廃棄し、新たに交換する研磨布80はホルダー110から随時引き出す。そして、前述したガイド120や一対のクランプ130,130との相互関係に基づく工程によって、研磨布80の交換作業を一人でも容易に行うことが可能となり、迅速かつ容易に研磨布80を引き延ばした状態に張設することができる。   According to the mounting structure of the polishing cloth 80 as described above, the holder 110 can first secure a storage location for the polishing cloth 80 to be newly replaced, and the polishing cloth 80 that has become dirty due to the polishing of the game ball is discarded. The polishing cloth 80 to be discarded and newly replaced is pulled out from the holder 110 as needed. The process based on the mutual relationship between the guide 120 and the pair of clamps 130 and 130 described above makes it possible for one person to easily replace the polishing cloth 80, and the polishing cloth 80 is quickly and easily extended. Can be stretched.

さらにまた、本揚送研磨装置10によれば、図1〜図3に示すように、研磨路部60の上端に連なる部位に、揚送ベルト30の上昇面30aに沿って上方向に所定長さで延び、研磨布80を通過した遊技球をさらに上方へ揚送する揚送路部70が設けられている。この揚送路部70により、揚送研磨装置10を設置する遊技機島の全高が高い場合に、研磨路部60の余計な延長を避けて適正な全長に保った上で、さらに揚送する高さを稼ぐことができる。   Furthermore, according to the present lifting polishing apparatus 10, as shown in FIGS. 1 to 3, a portion having a predetermined length in the upward direction along the rising surface 30 a of the lifting belt 30 is formed at a portion continuous with the upper end of the polishing path portion 60. A lifting path portion 70 is provided to lift the game ball that has passed through the polishing cloth 80 and further upward. When the overall height of the gaming machine island where the lifting polishing apparatus 10 is installed is high, the lifting path unit 70 avoids excessive extension of the polishing path unit 60 and keeps it at an appropriate total length, and further lifts. You can earn height.

揚送路部70は、整列路部50や研磨路部60と同様にウレタンにより成形して、揚送ベルト30の上昇面30aに対向する揚送面に、遊技球を上方に導く複数のガイドレール溝71を形成しても良い。これにより、部品の共用化を図ることができ、コスト低減が可能となる。あるいは、揚送面側を覆うように揚送ベルト30と同じ材質のものを張設して揚送路部70を構成しても良い。   The lifting path unit 70 is formed of urethane in the same manner as the alignment path unit 50 and the polishing path unit 60, and a plurality of guides that guide the game balls upward to the lifting surface facing the rising surface 30a of the lifting belt 30. A rail groove 71 may be formed. As a result, the parts can be shared, and the cost can be reduced. Or you may comprise the thing of the same material as the raising belt 30 so that the raising surface side may be covered, and the conveyance path part 70 may be comprised.

揚送路部70を揚送ベルト30と同一の摩擦係数に設定すると、遊技球の研磨後に再度表面に揚送ベルト30の汚れが付着することを軽減することができる。なお、図1において、揚送路部70の上端まで揚送された遊技球は、排出口13から排出された後、図示省略した供給路を通って遊技機島の上部を流下し、再び各遊技機や遊技媒体貸出機に供給される。   If the lifting path 70 is set to the same friction coefficient as that of the lifting belt 30, it is possible to reduce the contamination of the lifting belt 30 on the surface again after the game ball is polished. In FIG. 1, the game balls lifted up to the upper end of the transfer path portion 70 are discharged from the discharge port 13 and then flow down the upper part of the gaming machine island through a supply path (not shown). Supplied to gaming machines and game media lending machines.

以上、本発明の実施の形態を図面によって説明してきたが、具体的な構成はこれらの実施の形態に限られるものではなく、本発明の要旨を逸脱しない範囲における変更や追加があっても本発明に含まれる。例えば、本発明は、パチンコ遊技機で使用するパチンコ球を研磨ないし揚送するものに限定されるものではなく、遊技球であればどの様な遊技球でも研磨ないし揚送することができる。   As described above, the embodiments of the present invention have been described with reference to the drawings. However, the specific configuration is not limited to these embodiments, and the present invention can be modified or added without departing from the scope of the present invention. Included in the invention. For example, the present invention is not limited to one that polishes or lifts a pachinko ball used in a pachinko gaming machine, and any game ball can be ground or lifted as long as it is a game ball.

また、前記実施の形態では、支持カバー12のうち下支持カバー12aは、本体11に対してネジ止めしたが、下支持カバー12aも、中支持カバー12bや上支持カバー12cと同様に本体11に対して開閉可能に取り付けても良い。すなわち、整列路部50も研磨路部60や揚送路部70と同様に開閉可能に取り付けても良い。   In the embodiment, the lower support cover 12a of the support cover 12 is screwed to the main body 11. However, the lower support cover 12a is also attached to the main body 11 like the middle support cover 12b and the upper support cover 12c. You may attach so that opening and closing is possible. That is, the alignment path portion 50 may be attached so as to be openable and closable similarly to the polishing path portion 60 and the lifting path portion 70.

また、整列路部50におけるガイドレール溝51や、研磨路部60におけるガイドレール溝61は、それぞれ直線状に上下方向に延びるように形成したが、ガイドレール溝51やガイドレール溝61を蛇行させることにより、移動距離を長く設定しても良い。また、揚送ベルト30の上昇面30aを清掃する手段を、揚送ベルト30が循環する経路の途中に設けても良い。それにより、装置の運転中に研磨面の清掃を同時にでき、保守性が良くなる。   Further, the guide rail groove 51 in the alignment path portion 50 and the guide rail groove 61 in the polishing path portion 60 are formed so as to extend in the vertical direction in a straight line, but the guide rail groove 51 and the guide rail groove 61 are meandered. Thus, the moving distance may be set longer. Further, a means for cleaning the rising surface 30a of the lifting belt 30 may be provided in the middle of the path through which the lifting belt 30 circulates. Thereby, the polishing surface can be simultaneously cleaned during operation of the apparatus, and the maintainability is improved.

また、前記実施の形態では、縦長側壁112の側端縁に上下に並ぶ2つのフック113,113を設け、研磨路部60の側端部に同じく上下に並ぶ2つのフック孔14,14を穿設したが、フック113とフック孔14の数は2つに限られるものではなく、ホルダー110の高さに応じて3つあるいは4つ以上設けても良い。   Further, in the embodiment, two hooks 113, 113 arranged in the vertical direction are provided on the side edge of the vertically long side wall 112, and two hook holes 14, 14 aligned in the vertical direction are drilled in the side edge of the polishing path 60. However, the number of hooks 113 and hook holes 14 is not limited to two, and three or four or more may be provided depending on the height of the holder 110.

また、前記実施の形態では、研磨路部60の上端に連なる部位に、さらに揚送ベルト30の上昇面30aに沿って上方向に延びる揚送路部70を設けたが、この揚送路部70を省略して、上下方向に下から順に導入路カバー40、整列路部50、そして研磨路部60が並ぶように構成してもかまわない。特に、遊技機島の全高がさほど高くないような場合に有効となる。   Moreover, in the said embodiment, although the pumping path part 70 extended further upward along the raising surface 30a of the pumping belt 30 was provided in the site | part connected to the upper end of the grinding | polishing path part 60, this pumping path part is provided. 70 may be omitted, and the introduction path cover 40, the alignment path section 50, and the polishing path section 60 may be arranged in order from the bottom in the vertical direction. This is particularly effective when the total height of the gaming machine island is not so high.

さらにまた、前記実施の形態では、ロール研磨布80aの途中を、先ずガイド120にある案内板124に沿わせて直角に折り曲げて上方へ導いていたが、案内板124の傾斜端縁125を上下逆の形とすることで、先ず下方へ導いてから研磨路部60の研磨面に沿わせて上方へ周回させるように、本実施の形態とは上下逆の態様で研磨布80を張設するように構成しても良い。   Furthermore, in the embodiment, the middle of the roll polishing cloth 80a is first bent at a right angle along the guide plate 124 in the guide 120 and guided upward, but the inclined edge 125 of the guide plate 124 is moved up and down. By adopting the reverse shape, the polishing cloth 80 is stretched upside down from the present embodiment so that it is first guided downward and then circulated upward along the polishing surface of the polishing path portion 60. You may comprise as follows.

本発明の実施の形態に係る揚送研磨装置の全体を示す右側面図である。It is a right view which shows the whole lifting polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置の全体を示す正面図である。It is a front view which shows the whole lift polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置の研磨路部を開いた状態を示す正面図である。It is a front view which shows the state which opened the grinding | polishing path part of the lifting polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置の下部の内部構造を示す縦断面図である。It is a longitudinal cross-sectional view which shows the internal structure of the lower part of the raising polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置の研磨路部の下部を示す内面図である。It is an internal view which shows the lower part of the grinding | polishing path part of the lifting polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置の下部の内部構造を示す横断面図である。It is a cross-sectional view which shows the internal structure of the lower part of the lifting polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置の下部の研磨布を含む内部構造を示す横断面図である。It is a cross-sectional view which shows the internal structure containing the polishing cloth of the lower part of the raising polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置の揚送ベルトを示す横断面図である。It is a cross-sectional view which shows the conveyance belt of the conveyance polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置のホルダーおよびガイドの組み合わせを示す平面図である。It is a top view which shows the combination of the holder and guide of the lifting polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置のホルダーおよびガイドの組み合わせを示す正面図である。It is a front view which shows the combination of the holder and guide of the raising polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置のホルダーおよびガイドの組み合わせを示す左側面図である。It is a left view which shows the combination of the holder and guide of the lifting polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置のホルダーおよびガイドの組み合わせに研磨布ローラを保持した状態を示す説明図である。It is explanatory drawing which shows the state which hold | maintained the abrasive cloth roller in the combination of the holder and guide of the lifting polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置のホルダーおよびガイドにおける研磨布の引き方向を示す説明図である。It is explanatory drawing which shows the pulling direction of the polishing cloth in the holder and guide of the lifting polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置のクランプを示す縦断面図である。It is a longitudinal cross-sectional view which shows the clamp of the lifting polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置において研磨布を張設する際にホルダーを本体に支持する工程を示す斜視図である。It is a perspective view which shows the process of supporting a holder to a main body, when extending | stretching polishing cloth in the lifting polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置において研磨布を張設する際にホルダーから研磨布を引き出す工程を示す斜視図である。It is a perspective view which shows the process of pulling out polishing cloth from a holder, when extending | stretching polishing cloth in the lifting polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置において研磨布を張設する際にホルダーから引き出した研磨布をガイドで押える工程を示す斜視図である。It is a perspective view which shows the process of pressing the polishing cloth pulled out from the holder with a guide, when extending | stretching polishing cloth in the lifting polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置において研磨布を張設する際にホルダーから引き出した研磨布をガイドに沿わせて直角に折り曲げる工程を示す斜視図である。It is a perspective view which shows the process of bend | folding the polishing cloth pulled out from the holder at right angles along a guide, when extending | stretching polishing cloth in the lifting polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置において研磨布を張設する際に本体の上部のクランプで研磨布の途中を固定する工程を示す斜視図である。It is a perspective view which shows the process of fixing the middle of a polishing cloth with the clamp of the upper part of a main body, when extending | stretching polishing cloth in the lifting polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置において研磨布を張設する際に本体の下部のクランプで研磨布の途中を固定する工程を示す斜視図である。It is a perspective view which shows the process of fixing the middle of a polishing cloth with the clamp of the lower part of a main body, when extending | stretching polishing cloth in the lifting polishing apparatus which concerns on embodiment of this invention. 本発明の実施の形態に係る揚送研磨装置において研磨後の遊技球の輝度を測定した実験データを示すグラフである。It is a graph which shows the experimental data which measured the brightness | luminance of the game ball after grinding | polishing in the lift grinding apparatus which concerns on embodiment of this invention.

符号の説明Explanation of symbols

10…揚送研磨装置
11…本体
12…支持カバー
12a…下支持カバー
12b…中支持カバー
12c…上支持カバー
13…排出口
14…フック孔
15…蝶番
16…回収樋
20…電動モータ
21…上ローラ
22…下ローラ
23…ガイドローラ
24…テンションローラ
30…揚送ベルト
30a…上昇面
31…心体
32…表層
33…裏層
40…導入路カバー
40a…導入路
41…始端
42…ガイド板
43…終端
44…ばね付きネジ
50…整列路部
51…ガイドレール溝
60…研磨路部
61…ガイドレール溝
62…遊技球ガイドローラ
63…凹溝
65…研磨布ガイドローラ
70…揚送路部
71…ガイドレール溝
80…研磨布
80a…ロール研磨布
110…ホルダー
111…側板
112…縦長側壁
113…フック
114…底板
115…回転軸
120…ガイド
121…側板
122…底板
123…フランジ
124…案内板
125…傾斜端縁
126…フランジ
130…クランプ
131…抵抗板
132…台座
133…ベース板
134…支持片
135…押圧部材
136…偏心軸
137…操作部材
DESCRIPTION OF SYMBOLS 10 ... Lifting polisher 11 ... Main body 12 ... Support cover 12a ... Lower support cover 12b ... Middle support cover 12c ... Upper support cover 13 ... Discharge port 14 ... Hook hole 15 ... Hinge 16 ... Recovery rod 20 ... Electric motor 21 ... Upper Roller 22 ... Lower roller 23 ... Guide roller 24 ... Tension roller 30 ... Lifting belt 30a ... Ascending surface 31 ... Core body 32 ... Surface layer 33 ... Back layer 40 ... Introduction path cover 40a ... Introduction path 41 ... Start end 42 ... Guide plate 43 ... Termination 44 ... Screw with spring 50 ... Alignment path part 51 ... Guide rail groove 60 ... Polishing road part 61 ... Guide rail groove 62 ... Game ball guide roller 63 ... Concave groove 65 ... Abrasive cloth guide roller 70 ... Feeding path part 71 ... Guide rail groove 80 ... Abrasive cloth 80a ... Roll abrasive cloth 110 ... Holder 111 ... Side plate 112 ... Vertical side wall 113 ... Hook 114 ... Plate 115 ... Rotating shaft 120 ... Guide 121 ... Side plate 122 ... Bottom plate 123 ... Flange 124 ... Guide plate 125 ... Inclined edge 126 ... Flange 130 ... Clamp 131 ... Resistance plate 132 ... Base 133 ... Base plate 134 ... Supporting piece 135 ... Pressing Member 136 ... Eccentric shaft 137 ... Operating member

Claims (4)

本体の上下位置にそれぞれ軸支した上ローラおよび下ローラと、該上下ローラの間に巻き掛けた無端の揚送ベルトと、該揚送ベルトの上昇面に対向させて上下方向に張設した研磨布とを備え、前記揚送ベルトの上昇面と前記研磨布との間に遊技球を挟持させることにより、遊技球の揚送および研磨を行う揚送研磨装置において、
前記下ローラの下側に沿って配置され、前記下ローラを周回する前記揚送ベルトとの間に遊技球を受け入れる導入路を形成する導入路カバーを備え、
前記導入路カバーの終端に連なる部位に、前記揚送ベルトの上昇面に沿って上方向に所定長さで延びて前記研磨布の下端に連なり、前記導入路カバーの終端から導出される遊技球の衝撃を緩和し整列させた状態で前記研磨布に導く整列路部を設けたことを特徴とする揚送研磨装置。
An upper roller and a lower roller that are pivotally supported at the upper and lower positions of the main body, an endless lifting belt wound between the upper and lower rollers, and a polishing stretched in the vertical direction so as to face the rising surface of the lifting belt A lift polishing apparatus for lifting and polishing a game ball by sandwiching the game ball between a rising surface of the lift belt and the polishing cloth,
An introduction path cover which is disposed along the lower side of the lower roller and forms an introduction path for receiving a game ball between the lowering roller and the lifting belt;
A game ball extending from the end of the introduction path cover to a portion connected to the end of the introduction path cover, extending upward along the rising surface of the lifting belt by a predetermined length and continuing to the lower end of the polishing pad. A lift polishing apparatus characterized by comprising an alignment path portion that leads to the polishing cloth in a state in which the impact is reduced and aligned.
前記研磨布は、前記揚送ベルトの上昇面に対向させて上下方向に延びる状態に配設された研磨路部であって、該研磨路部において遊技球を上方に導く複数のガイドレール溝が形成された研磨面側を覆うように張設され、
前記研磨布は、前記研磨面の両側方向に延伸可能な材質からなることを特徴とする請求項1に記載の揚送研磨装置。
The polishing cloth is a polishing path portion disposed in a vertically extending state so as to face the rising surface of the lifting belt, and a plurality of guide rail grooves for guiding the game ball upward in the polishing path portion. It is stretched to cover the formed polished surface side,
The lift polishing apparatus according to claim 1, wherein the polishing cloth is made of a material that can be stretched in both directions of the polishing surface.
前記整列路部は、前記揚送ベルトの上昇面に対向する表面側に、前記研磨路部の研磨面にある複数のガイドレール溝にそれぞれ連なる複数のガイドレール溝が形成されていることを特徴とする請求項2に記載の揚送研磨装置。   The alignment path portion is formed with a plurality of guide rail grooves respectively connected to a plurality of guide rail grooves on the polishing surface of the polishing path portion on the surface side facing the rising surface of the lifting belt. The lift polishing apparatus according to claim 2. 前記整列路部の下端は、前記下ローラの中心軸と同じ高さ位置にて前記導入路カバーの終端に連設され、前記整列路部の上端は、前記下ローラの外径上端と同じ高さ位置より上方で、かつ前記下ローラの直径の3倍の高さ位置より下方にて前記研磨路部の下端に連設されることを特徴とする請求項2または3に記載の揚送研磨装置。   The lower end of the alignment path portion is connected to the end of the introduction path cover at the same height position as the central axis of the lower roller, and the upper end of the alignment path portion is the same height as the outer diameter upper end of the lower roller. 4. The lift polishing according to claim 2, wherein the polishing is continued to a lower end of the polishing path portion above a height position and below a height position that is three times the diameter of the lower roller. apparatus.
JP2008290875A 2008-11-13 2008-11-13 Lift polishing machine Expired - Fee Related JP5395408B2 (en)

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Publication number Priority date Publication date Assignee Title
JP2012100985A (en) * 2010-11-12 2012-05-31 Shinko Seisakusho Co Ltd Pumping polishing device
JP2019213731A (en) * 2018-06-13 2019-12-19 株式会社ニューギン Lifting device
JP2019213730A (en) * 2018-06-13 2019-12-19 株式会社ニューギン Lifting device
JP2019213732A (en) * 2018-06-13 2019-12-19 株式会社ニューギン Lifting device

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Publication number Priority date Publication date Assignee Title
JP2008079718A (en) * 2006-09-26 2008-04-10 Chukyo Yugi:Kk Pachinko ball lifting/polishing device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008079718A (en) * 2006-09-26 2008-04-10 Chukyo Yugi:Kk Pachinko ball lifting/polishing device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012100985A (en) * 2010-11-12 2012-05-31 Shinko Seisakusho Co Ltd Pumping polishing device
JP2019213731A (en) * 2018-06-13 2019-12-19 株式会社ニューギン Lifting device
JP2019213730A (en) * 2018-06-13 2019-12-19 株式会社ニューギン Lifting device
JP2019213732A (en) * 2018-06-13 2019-12-19 株式会社ニューギン Lifting device

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