JP2010107878A - Transfer device for concavo-convex structure pattern - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a transfer device capable of simultaneously producing a comparatively large concavo-convex structure pattern that is difficult to produce by an EB drawing device and a minute concavo-convex structure pattern by EB drawing. <P>SOLUTION: A press device 1 includes a lower press part 4 on which a transfer substrate 3 is placed, and an upper press part 5 disposed opposed to the lower press part 4 such that it can move up and down. A stamper 6 is removably fitted to the undersurface of the upper press part 5. The stamper 6 has a fitting surface 6A which is fitted to the upper press part 5 and a transfer surface 6B which is located opposite to the fitting surface 6A and on which a first concavo-convex structure pattern 7a to be transferred to the transfer substrate 3 is formed. A second concavo-convex structure pattern 7b which differs from the first concavo-convex structure pattern 7a and is transferred to the transfer substrate 3 together with the first concavo-convex structure pattern 7a when the first concavo-convex structure pattern 7a is transferred is provided on either the section of the upper press part 5 to which the fitting surface 6A is fitted, or the fitting surface 6A, or an intermediary member provided between the upper press part 5 and the fitting surface 6A. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a transfer apparatus that transfers a concavo-convex structure pattern to a transfer substrate such as a resin.

In recent years, OVD (Optical Variable Device) has been developed to facilitate the determination of authenticity in order to prevent counterfeiting of securities such as gift certificates and checks, banknotes, cash cards, cards such as ID cards, passports and licenses. ) Has been used (for example, Patent Document 1).
However, the technology for counterfeiting OVD itself has become more sophisticated, and counterfeiting and counterfeiting have become possible relatively easily, and the function as an anti-counterfeiting effect has been weakened. Therefore, a display body with higher security is demanded, and a display body that can be clearly differentiated from the conventional technology and difficult to forge or imitate, and an information printed matter using the display body have been developed.

  As a display with high security, there is one in which an electron beam is controlled in nano units (EB drawing apparatus) and an image having a visual effect is created by drawing diffraction gratings one by one. In this way, a display body having a visual effect can be produced with an EB drawing apparatus, but it requires a lot of running costs and drawing time. Further, the EB drawing apparatus is a device for producing a fine concavo-convex structure pattern on a plane, and has a drawback that it is not suitable for drawing a resist having a relatively large structure or poor flatness (for example, a spherical shape).

In order to mass-produce diffraction gratings drawn by the EB drawing apparatus, a stamper is produced from the diffraction grating drawn by the EB drawing apparatus, and the stamper is used to transfer to the resin. However, if a design is added even a little, a drawing process by an EB drawing apparatus must be performed and a stamper must be manufactured, which requires cost and time.
In other words, in the conventional stamper manufacturing process, each time a design (pattern or the like) is added, the concavo-convex structure pattern must be drawn using an EB drawing apparatus to manufacture the stamper.
JP 2007-223100 A

  The present invention has been made in view of such circumstances, and an object thereof is to simultaneously produce a relatively large concavo-convex structure pattern of about 1 mm and a fine concavo-convex structure pattern by EB drawing, which are difficult with an EB drawing apparatus. . Another object of the present invention is to eliminate the EB drawing process that occurs due to the conventional design addition.

  The invention of claim 1 has a press part and a flexible stamper, and the flexible stamper is mounted on the transfer part, mounted on the pressing part, opposite to the mounting surface. A transfer device having a transfer surface on which a first concavo-convex structure pattern to be transferred is formed, wherein the portion of the press portion on which the mounting surface is mounted, the mounting surface, or the press portion and the mounting surface. A second concavo-convex structure pattern different from the first concavo-convex structure pattern transferred to the transfer substrate together with the first concavo-convex structure pattern when the first concavo-convex structure pattern is transferred. It is characterized by being.

  The invention according to claim 2 is characterized in that the second concavo-convex structure pattern is provided on the mounting surface.

  The invention according to claim 3 is characterized in that the intermediate member is a metal plate, and the second uneven structure pattern is provided on the metal plate.

  The invention according to claim 4 is characterized in that the second concavo-convex structure pattern is provided in a portion of the press portion to which the mounting surface is mounted.

  The invention of claim 5 is characterized in that the thickness of the stamper is 40 μm to 250 μm.

  According to a sixth aspect of the present invention, the second concavo-convex structure pattern has a conical shape, a pyramid shape, an elliptical cone shape, a columnar shape or a cylindrical shape, a prism shape, a rectangular tube shape, a hemisphere, a semi-ellipsoid, and a bowl shape. It is characterized by that.

  According to a seventh aspect of the present invention, the convex portion constituting the second concavo-convex structure pattern is a prism having a rectangular cross section, one side of the prism is 100 μm or more, and the height of the prism is 100 μm to 1000 μm. Features.

  The invention according to claim 8 is characterized in that the first concavo-convex structure pattern has a sawtooth shape, a sine wave shape, or a short shape.

  The invention according to claim 9 is characterized in that a pitch of the first concavo-convex structure pattern is 650 nm to 2000 nm.

  A tenth aspect of the present invention is a transfer product formed using the transfer device according to any one of the first to ninth aspects.

  By using the transfer device of the present invention, it is possible to transfer the first concavo-convex structure pattern on the stamper surface to the resin, and simultaneously transfer the second concavo-convex structure pattern at the boundary of the mounting portion of the transfer device. In addition, since the design can be added even after the stamper is manufactured, the cost and manufacturing time can be reduced by omitting the EB drawing process generated by the design addition.

  Moreover, it is possible to produce a concavo-convex structure pattern on a spherical surface (poor planarity) that is difficult to produce with an EB lithography apparatus. Further, it is possible to produce a relatively large uneven structure pattern of about 1 mm, which is difficult with an EB drawing apparatus.

  In addition, by creating a concavo-convex structure pattern at the boundary of the mounting portion of the transfer device in advance, it is possible to transfer a pattern to which a new pattern is given relatively easily and in a short time.

  Further, when another uneven structure pattern is adhered to the stamper surface, a step is generated in the transferred material. However, by using the apparatus of the present invention, it is possible to transfer without such a step.

  In addition, the uneven structure pattern at the boundary of the transfer device mounting part is not for precise light control like a diffraction grating, so it can be made in a relatively rough shape and can be easily produced. Is possible.

  When light is incident on the transfer surface side of the transfer material produced by the transfer method of the present invention, it can be diffusely reflected by the surface transferred by the concavo-convex structure pattern at the boundary of the mounting portion of the transfer device. . Also, by changing the uneven structure pattern at the boundary of the mounting portion of the transfer device, the state of irregular reflection can be changed, and the visual effect can be changed.

(Embodiment 1)
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
FIG. 1 is an explanatory diagram showing an example of an apparatus according to an embodiment of the present invention.
The press device 1 includes a lower press portion 4 on which the transfer base material 3 is placed, and an upper press portion 5 that faces the lower press portion 4 and that can be moved up and down via a column 2. 6 is detachably attached to the lower surface of the upper press portion 5.
In the present embodiment, the transfer device of the present invention includes the press device 1 and the stamper 6.

FIG. 2 shows a stamper 6 (flexible stamper) used in the present invention.
The stamper 6 has a first uneven structure pattern 7a having a diffraction function on the transfer surface. As the first concavo-convex structure pattern 7a, various conventionally known shapes such as a sawtooth shape, a sine wave shape, and a rectangular shape can be employed.
On the other hand, the second concavo-convex structure pattern 7b is also provided on the back side (non-transfer side) of the transfer surface.
More specifically, the stamper 6 has a mounting surface 6A that is mounted on the upper press portion 5, and a transfer surface 6B on which a first concavo-convex structure pattern 7a that is positioned opposite to the mounting surface 6A and is transferred to the transfer substrate 3 is formed. And have.
Then, the first concavo-convex structure pattern 7a is transferred to the portion of the upper press portion 5 to which the mounting surface 6A is mounted, the mounting surface 6a, or an intermediate member provided between the upper press portion 5 and the mounting surface 6A. A second concavo-convex structure pattern 7b different from the first concavo-convex structure pattern 7a transferred to the transfer substrate 3 is sometimes provided together with the first concavo-convex structure pattern 7a.

  FIG. 3 shows the time of transfer when the stamper of FIG. 2 is used. At the time of transfer, pressure is applied to the second concavo-convex structure pattern 7b, so that the stamper 6 is deformed, and a second concavo-convex structure pattern 7b (a shape corresponding to the second concavo-convex structure pattern 7b) is formed on the surface of the transfer surface 6B. Therefore, as shown in FIG. 4, the first uneven structure pattern 7 a and the second uneven structure pattern 7 b are simultaneously transferred to the transfer substrate 3.

As said 2nd uneven | corrugated structure pattern 7b, the recessed part or convex part, such as a cone shape, a pyramid shape, an elliptical cone shape, a column shape, a cylindrical shape, prismatic shape, is shape | molded. Alternatively, as the second concavo-convex structure pattern 7b, a concave or convex portion such as a hemisphere, a semi-ellipsoid, or a bowl shape is formed.
The structure transferred by transferring in such a shape is a shape in which the corners of each pattern are gently changed.
As an example, a plan view of the transfer surface shape of the transfer substrate 3 when the transfer is performed using a stamper 6 in which the convex portions constituting the second concavo-convex structure pattern 7b are rectangular pillars having a rectangular cross section as shown in FIG. Sectional views are shown in FIGS. 6 (A) and 6 (B). When parallel light is incident on the transfer substrate 3 transferred by each second concavo-convex structure pattern, the reflection direction differs depending on the difference between the respective formed second concavo-convex structure patterns 7b, which may cause a difference in visual effect. Is possible.

The stamper 6 having the second uneven structure pattern 7b as described above is manufactured, for example, by the following method.
That is, an original plate having the first concavo-convex structure pattern 7a is produced by electron beam drawing or the like, a stamper 6 is produced by electroforming using the original plate, and etching is performed on the back side (mounting surface 6A) of the stamper 6 or gold The second concavo-convex structure pattern 7b is formed using a die cutting machine or the like.
It is not always necessary to have the uneven structure on the front and back of the stamper, so the stamper mounting part of the transfer device has an uneven structure pattern, or two stampers can be made or stacked, or a metal such as a mesh can be stacked on the stamper. Similar effects can be obtained.
In addition, by providing a spherical metal between the stamper mounting portion and the stamper, it is possible to produce a transfer product on the spherical surface.
In other words, the second concavo-convex structure pattern 7b may be provided in the portion of the press portion where the mounting surface 6A of the stamper 6 is mounted. Or the 2nd uneven structure pattern 7b may be provided in the intermediate member provided between a press part and the said mounting surface 6A.
Further, the intermediate member may be a metal plate, and the second uneven structure pattern 7b may be provided on the metal plate.

  According to the transfer device of the present invention, the stamper 6 has a thickness of 40 μm to 250 μm. When the thickness is 40 μm or less, there is a high possibility that the stamper 6 is damaged by the second uneven structure pattern 7b. In addition, the thickness of the stamper 6 as described above is set because it is difficult to transfer the shape corresponding to the second uneven structure pattern 7b to the transfer substrate 3 at 250 μm or more.

According to the transfer device of the present invention, the convex portion constituting the second concavo-convex structure pattern 7b is a prism having a rectangular cross section, one side of the prism is 100 μm or more, and the height of the prism is 100 μm to 1000 μm.
Unless one side of the prism is 100 μm or more, it is difficult to visually recognize the shape change of the surface of the transfer base 3 due to the second uneven structure pattern 7b.
The upper limit value of one side of the prism is not limited as long as it is equal to or smaller than the size of the second concavo-convex structure pattern 7b transferred to the transfer substrate 3.
Further, if the height of the prism is not 100 μm or more, it is difficult to visually recognize the shape change on the surface of the transfer base 3 due to the second uneven structure pattern 7b. Moreover, since it becomes difficult to transfer the 1st uneven structure pattern 7a that the height of a prism is 1000 micrometers or more, the size of the above 2nd uneven structure pattern 7b is set.

  According to the transfer device of the present invention, the pitch of the first concavo-convex structure pattern 7a is 650 nm to 2000 nm. If the pitch exceeds 2000 nm, the light diffraction effect by the first concavo-convex structure pattern 7a cannot be sufficiently obtained. In addition, when the incident light is 45 degrees or less from the normal line of the first concavo-convex structure pattern surface, the diffracted light is emitted at a steep angle with respect to the concavo-convex structure pattern surface. It becomes difficult to confirm from the normal direction of the surface of the first concavo-convex structure pattern. Further, since it is difficult to maintain the transfer rate, the above pitch is set.

  FIG. 7 shows regular reflection when light is incident on the transfer substrate 3 transferred using the stamper 6 of FIG. While the diffracted light is emitted from the transfer portion 7d by the first concavo-convex structure pattern 7a, the transfer portion 7c by the second concavo-convex structure pattern 7b has a large structure, so that no diffracted light is generated with respect to the incident light and regular reflection is performed. Only is injected. In addition, irregular reflection occurs because the surface shape is not flat.

  In the transfer apparatus according to the present invention, after the first uneven structure pattern 7a is formed on the stamper 6, it is possible to relatively easily form a wide variety of patterns as the second uneven structure pattern 7b.

(Embodiment 2)
FIG. 8 is an explanatory diagram showing an example of a transfer product obtained by the transfer device according to the embodiment of the present invention.

9A is a perspective view of the stamper 6, and FIG. 9B is a cross-sectional view of FIG. 9A, corresponding to a cross section taken along the line II of FIG.
The stamper 6 includes a first concavo-convex structure pattern 8d, a second concavo-convex structure pattern 8a, b, c, and a non-concave structure pattern 8e.
The first concavo-convex structure pattern 8d is produced with a width of 2000 nm and a height of 200 nm, and the second concavo-convex structure pattern 8a has prisms with a base of 100 μm square and a height of 100 μm. In the second concavo-convex structure pattern 8c, cones having a base diameter of 200 μm and a height of 200 μm are arranged, and in the second concavo-convex structure pattern 8b, a cylindrical shape having an outer diameter of 20 mm, an inner diameter of 10 mm and a height of 200 μm is formed. ing.

  As a result of the transfer using the stamper 6, a transfer product (transfer base material 3) as shown in FIG. 8 is obtained. When parallel light is incident on the transfer substrate 3 transferred by the second concavo-convex structure patterns 8a, 8b, it is irregularly reflected. In the second concavo-convex structure pattern 8c, in the portion having the structure from the inner diameter to the outer diameter, the transferred base material surface is relatively flat, so that irregular reflection hardly occurs. However, on the inner side of the inner diameter or the outer side of the outer diameter, since there is no structure, a curved shape is transferred to the substrate surface, and irregular reflection occurs when parallel light is incident. Therefore, a surface structure in which irregular reflection is difficult to occur and a surface structure in which irregular reflection is likely to occur are formed, so that the English “O” character can be visually confirmed. Further, different optical effects can be visually recognized at the transfer portions in the second uneven structure patterns 7a and 7c. Since the irregular reflection is less likely to occur at the transfer portion by the non-concave structure pattern 8e, it has an optical effect like a mirror.

It is a figure showing roughly the transfer device of the present invention. It is the figure which showed the cross section of the stamper used for the transfer apparatus shown in FIG. It is the figure which showed the outline at the time of transcription | transfer. It is the figure which showed the cross section of the transferred base material. It is the figure which showed an example of the 2nd uneven structure pattern. (A) is a top view of the transfer base material 3 when it transfers using the stamper of FIG. 5, (B) is sectional drawing of (A). It is the figure which showed the reflected light at the time of illuminating the incident light 9 on the transfer surface of FIG. It is the figure which showed an example of the transcription | transfer material in embodiment of this invention. (A) is a perspective view of stamper 6, (B) is a sectional view of (A).

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Press apparatus, 2 ... Column, 3 ... Transfer base material, 4 ... Lower press part, 5 ... Upper press part, 6 ... Stamper, 7a ... 1st uneven structure pattern, 7b ... 2nd uneven structure pattern, 7c ... 1st Transfer part by 2 uneven structure patterns, 7d ... Transfer part by 1st uneven structure pattern, 8a ... 2nd uneven structure pattern, 8b ... 2nd uneven structure pattern, 8c ... 2nd uneven structure pattern, 8d ... 1st uneven structure pattern (Diffraction grating), 8e ... Non-concave structure pattern, 9 ... Incident light, 10 ... Regular reflection light.

Claims (10)

Having a press part and a flexible stamper,
The flexible stamper is a transfer device having a mounting surface to be mounted on the press portion and a transfer surface on which a first concavo-convex structure pattern that is positioned opposite to the mounting surface and is transferred to a transfer substrate is formed. And
When the first concavo-convex structure pattern is transferred to the portion of the press portion to which the mounting surface is mounted, the mounting surface, or an intermediate member provided between the press portion and the mounting surface. A second concavo-convex structure pattern different from the first concavo-convex structure pattern transferred to the transfer substrate together with the concavo-convex structure pattern is provided,
A transfer device characterized by that. The second uneven structure pattern is provided on the mounting surface.
The transfer apparatus according to claim 1, wherein The intermediate member is a metal plate, and the second uneven structure pattern is provided on the metal plate.
The transfer apparatus according to claim 1, wherein The second concavo-convex structure pattern is provided in a portion of the press portion to which the mounting surface is mounted;
The transfer apparatus according to claim 1, wherein The stamper has a thickness of 40 μm to 250 μm.
The transfer device according to claim 1, wherein The second concavo-convex structure pattern has a conical shape, a pyramid shape, an elliptical cone shape, a columnar shape or a cylindrical shape, a prism shape, a rectangular tube shape, a hemisphere, a semi-ellipsoid, a bowl shape,
The transfer device according to claim 1, wherein The convex part constituting the second concavo-convex structure pattern is a prism having a rectangular cross section, one side of the prism is 100 μm or more, and the height of the prism is 100 μm to 1000 μm.
The transfer device according to claim 1, wherein The first uneven structure pattern has a sawtooth shape, a sine wave shape, and a rectangular shape.
The transfer device according to claim 1, wherein The pitch of the first uneven structure pattern is 650 nm to 2000 nm.
The transfer device according to claim 1, wherein   A transfer product formed by using the transfer device according to claim 1.

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