JP2010103269A5 - - Google Patents

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Publication number
JP2010103269A5
JP2010103269A5 JP2008272631A JP2008272631A JP2010103269A5 JP 2010103269 A5 JP2010103269 A5 JP 2010103269A5 JP 2008272631 A JP2008272631 A JP 2008272631A JP 2008272631 A JP2008272631 A JP 2008272631A JP 2010103269 A5 JP2010103269 A5 JP 2010103269A5
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Japan
Prior art keywords
liquid crystal
crystal polymer
circuit board
thermoplastic liquid
forming
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Pending
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JP2008272631A
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Japanese (ja)
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JP2010103269A (en
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Priority to JP2008272631A priority Critical patent/JP2010103269A/en
Priority claimed from JP2008272631A external-priority patent/JP2010103269A/en
Publication of JP2010103269A publication Critical patent/JP2010103269A/en
Publication of JP2010103269A5 publication Critical patent/JP2010103269A5/ja
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Claims (9)

光学的異方性の溶融相を形成する熱可塑性液晶ポリマーを押出成形して熱可塑性液晶ポリマーフィルムを形成するフィルム形成工程と、
前記熱可塑性液晶ポリマーフィルムの少なくとも一方の表面に対して、物理的な研磨または紫外線照射を行うことにより、このフィルム表面が、ナノインデンテーション法によって測定された硬度0.01〜0.1GPaを有するように軟化させて、接着面を形成する軟化工程と、
前記接着面を、光学的異方性の溶融相を形成する熱可塑性液晶ポリマーフィルムの少なくとも一方の面に導体回路が形成された基板の回路形成面に対向させ、全体を熱圧着により接着させる熱圧着工程と、
を含む多層回路基板の製造方法。
A film forming step of forming a thermoplastic liquid crystal polymer film by extruding a thermoplastic liquid crystal polymer that forms an optically anisotropic melt phase;
By subjecting at least one surface of the thermoplastic liquid crystal polymer film to physical polishing or ultraviolet irradiation, the film surface has a hardness of 0.01 to 0.1 GPa measured by a nanoindentation method. Softening step to form an adhesive surface,
The adhesive surface is opposed to the circuit forming surface of the substrate on which the conductor circuit is formed on at least one surface of the thermoplastic liquid crystal polymer film forming the optically anisotropic molten phase, and the whole is bonded by thermocompression bonding. Crimping process;
A method for manufacturing a multilayer circuit board comprising:
請求項1の多層回路基板の製造方法において、軟化工程で、(i)フィルム表面から0.01〜1μmの厚さを物理的研磨により除去して接着面を形成するか、または(ii)185nmおよび254nmの波長の紫外線を同時に照射して接着面を形成する製造方法。 2. The method of manufacturing a multilayer circuit board according to claim 1, wherein in the softening step, (i) a thickness of 0.01 to 1 [mu] m is removed from the film surface by physical polishing to form an adhesive surface , or (ii) 185 nm And a method of forming an adhesive surface by simultaneously irradiating ultraviolet rays having a wavelength of 254 nm . 請求項1または2の多層回路基板の製造方法において、熱圧着の温度が、接着性ポリマー層を形成する熱可塑性液晶ポリマーの融点(Ta:℃)より15℃低い温度以上であり、且つこの融点(Ta)より15℃高い温度以下の範囲から選択されるとともに、さらに前記熱圧着の温度は、基板層を形成する熱可塑性液晶ポリマーの融点(Tb:℃)より20℃低い温度以上であり、且つこの融点(Tb)より10℃高い温度以下の範囲を充足する製造方法。 3. The method of manufacturing a multilayer circuit board according to claim 1, wherein the thermocompression bonding temperature is at least 15 ° C. lower than the melting point (Ta: ° C.) of the thermoplastic liquid crystal polymer forming the adhesive polymer layer. The temperature is selected from the range of 15 ° C. or higher than (Ta), and the thermocompression bonding temperature is 20 ° C. or more lower than the melting point (Tb: ° C.) of the thermoplastic liquid crystal polymer forming the substrate layer. And the manufacturing method which satisfies the range below 10 degreeC temperature higher than this melting | fusing point (Tb). 請求項1〜3のいずれか一項の多層回路基板の製造方法において、接着性フィルム層を形成する熱可塑性液晶ポリマーの融点(Ta:℃)と、基板層を形成する熱可塑性液晶ポリマーの融点(Tb:℃)とが  In the manufacturing method of the multilayer circuit board as described in any one of Claims 1-3, melting | fusing point (Ta: degreeC) of the thermoplastic liquid crystal polymer which forms an adhesive film layer, and melting | fusing point of the thermoplastic liquid crystal polymer which forms a board | substrate layer (Tb: ° C)
Ta≦Tb+5     Ta ≦ Tb + 5
を満たす製造方法。Manufacturing method that satisfies.
光学的異方性の溶融相を形成する熱可塑性液晶ポリマーフィルムの少なくとも一方の面に導体回路が形成された基板層と、
前記基板層の回路形成面に対して、接着面を対向させて熱圧着されている接着性フィルム層と、
を少なくとも含む多層回路基板であって、
前記接着性フィルム層が、光学的異方性の溶融相を形成する熱可塑性液晶ポリマーフィルムであり、この接着性フィルム層の接着面が、ナノインデンテーション法によって測定された硬度0.01〜0.1GPaを有する多層回路基板。
A substrate layer having a conductor circuit formed on at least one surface of a thermoplastic liquid crystal polymer film forming an optically anisotropic molten phase;
An adhesive film layer that is thermocompression-bonded with the adhesive surface facing the circuit forming surface of the substrate layer;
A multilayer circuit board comprising at least
The adhesive film layer is a thermoplastic liquid crystal polymer film forming an optically anisotropic melt phase, and the adhesive surface of the adhesive film layer has a hardness of 0.01 to 0 measured by a nanoindentation method. A multilayer circuit board having 1 GPa.
請求項5の多層回路基板において、接着性フィルム層の接着面が、物理的研磨または紫外線照射により形成されている多層回路基板。   6. The multilayer circuit board according to claim 5, wherein an adhesive surface of the adhesive film layer is formed by physical polishing or ultraviolet irradiation. 請求項5または6の多層回路基板において、接着性フィルム層の厚みが、10〜100μmである多層回路基板。   The multilayer circuit board according to claim 5 or 6, wherein the adhesive film layer has a thickness of 10 to 100 µm. 請求項5から7のいずれか一項の多層回路基板において、接着性フィルム層が、カバーレイフィルムおよびボンディングフィルムからなる群から選択される少なくとも1種である多層回路基板。   The multilayer circuit board according to any one of claims 5 to 7, wherein the adhesive film layer is at least one selected from the group consisting of a coverlay film and a bonding film. 請求項5から8のいずれか一項の多層回路基板において、接着性フィルム層を形成する熱可塑性液晶ポリマーの融点(Ta:℃)と、基板層を形成する熱可塑性液晶ポリマーの融点(Tb:℃)とが
Ta≦Tb+5
を満たす多層回路基板。
The multilayer circuit board according to any one of claims 5 to 8, wherein the thermoplastic liquid crystal polymer forming the adhesive film layer has a melting point (Ta: ° C) and the thermoplastic liquid crystal polymer forming the substrate layer (Tb: ° C) Ta ≦ Tb + 5
Multilayer circuit board that meets.
JP2008272631A 2008-10-23 2008-10-23 Multilayer circuit board and manufacturing method thereof Pending JP2010103269A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008272631A JP2010103269A (en) 2008-10-23 2008-10-23 Multilayer circuit board and manufacturing method thereof

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Application Number Priority Date Filing Date Title
JP2008272631A JP2010103269A (en) 2008-10-23 2008-10-23 Multilayer circuit board and manufacturing method thereof

Related Child Applications (1)

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JP2013206424A Division JP5893596B2 (en) 2013-10-01 2013-10-01 Adhesive thermoplastic liquid crystal polymer film, multilayer circuit board, and manufacturing method thereof

Publications (2)

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JP2010103269A JP2010103269A (en) 2010-05-06
JP2010103269A5 true JP2010103269A5 (en) 2011-11-04

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Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5942641B2 (en) * 2012-07-02 2016-06-29 日立化成株式会社 Resin sheet and manufacturing method thereof, cured resin sheet, and member for heat dissipation
JP5893596B2 (en) * 2013-10-01 2016-03-23 株式会社クラレ Adhesive thermoplastic liquid crystal polymer film, multilayer circuit board, and manufacturing method thereof
CN110628059A (en) 2013-10-03 2019-12-31 株式会社可乐丽 Thermoplastic liquid crystal polymer film and circuit board
CN105683266B (en) * 2013-11-01 2020-04-03 株式会社可乐丽 Method for producing thermoplastic liquid crystal polymer film, and circuit board and method for producing same
JP6044592B2 (en) 2014-05-29 2016-12-14 トヨタ自動車株式会社 Multilayer wiring board and manufacturing method thereof
JP6414419B2 (en) * 2014-09-03 2018-10-31 株式会社村田製作所 Multilayer substrate and light receiving module
JP6632541B2 (en) 2014-11-07 2020-01-22 株式会社クラレ Circuit board and method of manufacturing the same
CN113580690B (en) * 2016-03-08 2023-12-08 株式会社可乐丽 Metal-clad laminate
US10668697B2 (en) * 2016-05-20 2020-06-02 Panasonic Intellectual Property Management Co., Ltd. Method for manufacturing metal clad laminated board, method for manufacturing electronic circuit board, and rigid body pendulum type viscoelasticity measuring device

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JPH01236246A (en) * 1988-03-17 1989-09-21 Agency Of Ind Science & Technol Surface activation of thermotropic liquid crystal polymer
JP2000233448A (en) * 1998-12-16 2000-08-29 Sumitomo Chem Co Ltd Method for thermally welding molten liquid crystal polyester resin molded object and metal
JP4138995B2 (en) * 1999-03-31 2008-08-27 株式会社クラレ Circuit board and manufacturing method thereof
JP4064897B2 (en) * 2002-08-28 2008-03-19 株式会社クラレ Multilayer circuit board and manufacturing method thereof

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