JP2010084119A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2010084119A5 JP2010084119A5 JP2009052082A JP2009052082A JP2010084119A5 JP 2010084119 A5 JP2010084119 A5 JP 2010084119A5 JP 2009052082 A JP2009052082 A JP 2009052082A JP 2009052082 A JP2009052082 A JP 2009052082A JP 2010084119 A5 JP2010084119 A5 JP 2010084119A5
- Authority
- JP
- Japan
- Prior art keywords
- pigment
- nitrogen atom
- basic nitrogen
- polymer compound
- processed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Description
前記課題を解決するための手段は以下の通りである。
<1> 塩基性窒素原子を有する高分子化合物で顔料を被覆してなる加工顔料。
<2>前記塩基性窒素原子を有する高分子化合物が、下記(1)〜(4)から選択されるから選択される少なくとも1種の高分子化合物である<1>に記載の加工顔料。
(1)炭素数2〜6のアルキレン基を有するポリ(アルキレンイミン)
(2)ポリアリルアミン
(3)ポリビニルアミン
(4)エステル部に塩基性窒素原子を有する(メタ)アクリル酸エステル、ビニルピリジン、及びアミノスチレンから選択される1種以上のモノマー成分を有する高分子化合物
<3> 平均1次粒子径が5nm〜25nmの範囲である<1>又は<2>に記載の加工顔料。
<4> 前記顔料が、ポリハロゲン化亜鉛フタロシアニンを含む顔料である<1>〜<3>のいずれか1項に記載の加工顔料。
<5> 前記塩基性窒素原子を有する高分子化合物が、数平均分子量500〜1,000,000であるオリゴマー鎖又はポリマー鎖を側鎖に有する<1>〜<4>のいずれか1項に記載の加工顔料。
<6> 前記塩基性窒素原子を有する高分子化合物に含まれるオリゴマー鎖又はポリマー鎖が、ポリカプロラクトンである<5>に記載の加工顔料。
<7> <1>〜<6>のいずれか1項に記載の加工顔料を、有機溶剤中に分散してなる顔料分散組成物。
<8> 更に、顔料分散剤を含む<7>に記載の顔料分散組成物。
<9> <7>又は<8>に記載の顔料分散組成物と、重合性化合物と、光重合開始剤と、を含有する光硬化性組成物。
<10> <9>に記載の光硬化性組成物を用いて形成された着色領域を有するカラーフィルタ。
<11> <9>に記載の光硬化性組成物を直接又は他の層を介して基板上に付与して感光性膜を形成する工程と、前記形成された感光性膜にパターン露光及び現像を順次行なうことにより着色領域を形成する工程と、を含むことを特徴とするカラーフィルタの製造方法。
Means for solving the above-mentioned problems are as follows.
<1> A processed pigment obtained by coating a pigment with a polymer compound having a basic nitrogen atom.
<2> The processed pigment according to <1>, wherein the polymer compound having a basic nitrogen atom is at least one polymer compound selected from the following (1) to (4).
(1) Poly (alkyleneimine) having an alkylene group having 2 to 6 carbon atoms
(2) Polyallylamine (3) Polyvinylamine (4) Polymer compound having one or more monomer components selected from (meth) acrylic acid ester having a basic nitrogen atom in the ester part, vinylpyridine, and aminostyrene <3> The processed pigment according to <1> or <2>, wherein the average primary particle diameter is in the range of 5 nm to 25 nm.
<4> The processed pigment according to any one of <1> to <3>, wherein the pigment is a pigment containing polyhalogenated zinc phthalocyanine.
<5> In any one of <1> to <4>, the polymer compound having a basic nitrogen atom has an oligomer chain or a polymer chain having a number average molecular weight of 500 to 1,000,000 in a side chain. The described processed pigment.
<6> The processed pigment according to < 5 >, wherein the oligomer chain or polymer chain contained in the polymer compound having a basic nitrogen atom is polycaprolactone.
<7> A pigment dispersion composition obtained by dispersing the processed pigment according to any one of <1> to <6> in an organic solvent.
<8> The pigment dispersion composition according to <7>, further comprising a pigment dispersant.
<9> A photocurable composition comprising the pigment dispersion composition according to <7> or <8>, a polymerizable compound, and a photopolymerization initiator.
<10> A color filter having a colored region formed using the photocurable composition according to < 9 >.
<11> A step of applying the photocurable composition according to <9> directly or via another layer onto a substrate to form a photosensitive film, and pattern exposure and development on the formed photosensitive film Forming a colored region by sequentially performing the steps described above.
本発明の加工顔料の他の好ましい態様は以下の通りである。
<12> 1−メトキシ−2−プロパノールで洗浄したときの塩基性窒素原子を有する高分子化合物の遊離量が30質量%以下である<1>〜<6>のいずれかに記載の加工顔料。
<13> 前記塩基性窒素原子を有する高分子化合物を、顔料の微細化工程で添加して製造したことを特徴とする<1>〜<6>、及び<12>のいずれか1項に記載の加工顔料。
<14> 前記塩基性窒素原子を有する高分子化合物の重量平均分子量が、1,000〜100,000の範囲であることを特徴とする<1>〜<6>、<12>及び<13>のいずれか1項に記載の加工顔料。
Other preferred embodiments of the processed pigment of the present invention are as follows.
<12> The processed pigment according to any one of <1> to <6>, wherein a liberated amount of the polymer compound having a basic nitrogen atom when washed with 1-methoxy-2-propanol is 30% by mass or less.
<13>, wherein the polymer compound having a basic nitrogen atom, and added pigment micronization step is characterized in that produced <1> to <6>, and any one of <12> Processed pigments.
<14> The polymer compound having a basic nitrogen atom has a weight average molecular weight in the range of 1,000 to 100,000. <1> to <6>, <1 2 > and <1 processed pigment according to any one of 3>.
さらに、顔料としてポリハロゲン化亜鉛フタロシアニンを適用した本発明の加工顔料を含む顔料分散組成物は、その優れた分散性及び分散安定性は保持されたままに、該顔料分散組成物を含む光硬化性組成物を用いてカラーフィルタを作製した際には、輝度及びコントラストにより優れたカラーフィルタを得ることができる。 Furthermore, the pigment dispersion composition containing the processed pigment of the present invention in which polyhalogenated zinc phthalocyanine is applied as a pigment is a photocurable composition containing the pigment dispersion composition while maintaining its excellent dispersibility and dispersion stability. with sexual composition in the case of preparing a color filter can be obtained an excellent color filter by the brightness and contrast.
<グラフト型高分子>
特定高分子化合物が、グラフト型高分子である場合、該高分子化合物としては、数平均分子量500〜1,000,000であるオリゴマー鎖又はポリマー鎖を側鎖に有するものであることが好ましい。また、該オリゴマー鎖又はポリマー鎖としては、良好な分散性を得られるという観点から、ポリカプロラクトンであることが好ましい。
オリゴマー鎖又はポリマー鎖の数平均分子量はGPC法によるポリスチレン換算値により測定することができる。
<Graft polymer>
When the specific polymer compound is a graft polymer, the polymer compound preferably has an oligomer chain or a polymer chain having a number average molecular weight of 500 to 1,000,000 in the side chain . Also, examples of the oligomer chain or polymer chain, from the viewpoint of obtaining favorable dispersibility is preferably polycaprolactone.
The number average molecular weight of the oligomer chain or polymer chain can be measured by a polystyrene conversion value by GPC method.
<B5.光硬化性組成物によるカラーフィルタの作製及び評価>
(1)パターン形成性の評価
上記のように調製した光硬化性組成物を、前記B2.で得られた下塗り層付シリコンウエハの下塗り層上に塗布し、着色層(塗布膜)を形成した。そして、この塗布膜の乾燥膜厚が0.5μmになるように、100℃のホットプレートを用いて120秒間加熱処理(プリベーク)を行なった。
次いで、i線ステッパー露光装置FPA−3000i5+(Canon(株)製)を使用して365nmの波長でパターンが2μm四方のIslandパターンマスクを通して50〜1200mJ/cm2の種々の露光量で露光した。
その後、照射された塗布膜が形成されているシリコンウエハ基板をスピン・シャワー現像機(DW−30型、(株)ケミトロニクス製)の水平回転テーブル上に載置し、CD−2000(富士フイルムエレクトロニクスマテリアルズ(株)製)を用いて23℃で60秒間パドル現像を行ない、シリコンウエハ基板に着色パターンを形成した。
<B5. Production and Evaluation of Color Filter with Photocurable Composition>
(1) Evaluation of pattern formation property The photocurable composition prepared as described above was prepared using the B2. The colored layer (coating film) was formed by coating on the undercoat layer of the silicon wafer with the undercoat layer obtained in (1). Then, heat treatment (pre-baking) was performed for 120 seconds using a hot plate at 100 ° C. so that the dry film thickness of the coating film became 0.5 μm.
Next, using an i-line stepper exposure apparatus FPA-3000i5 + (manufactured by Canon Inc.), exposure was performed at various exposure doses of 50 to 1200 mJ / cm 2 through an Island pattern mask having a pattern of 2 μm square at a wavelength of 365 nm.
Thereafter, irradiated coated film silicon is formed upper blade board spin-shower developing machine (DW-30 type, Ltd. Chemitronics) was mounted on a horizontal rotary table of, CD-2000 ( FUJIFILM electronic performs Materials Co., Ltd.) for 60 seconds and puddle developed at 23 ° C. was used to form a colored pattern on the silicon wafer wafer board.
着色パターンが形成されたシリコンウエハを真空チャック方式で前記水平回転テーブルに固定し、回転装置によって該シリコンウエハ基板を回転数50r.p.m.で回転させつつ、その回転中心の上方より純水を噴出ノズルからシャワー状に供給してリンス処理を行ない、その後スプレー乾燥した。
パターン形成性は、以上のようにして形成された着色パターンの断面形状を観察することにより評価した。パターン断面形状は矩形が好ましく、逆テーパーは好ましくない。
結果を表7に示す。
The silicon wafer on which the colored pattern was formed was fixed to the horizontal rotary table by a vacuum chuck method, the rotational speed 50r the silicon wafer wafer board by a rotary device. p. m. While being rotated, pure water was supplied from the upper part of the rotation center in the form of a shower through a spray nozzle, followed by rinsing treatment, and then spray drying.
The pattern formability was evaluated by observing the cross-sectional shape of the colored pattern formed as described above. The pattern cross-sectional shape is preferably rectangular, and reverse taper is not preferable.
The results are shown in Table 7.
Claims (11)
(1)炭素数2〜6のアルキレン基を有するポリ(アルキレンイミン)
(2)ポリアリルアミン
(3)ポリビニルアミン
(4)エステル部に塩基性窒素原子を有する(メタ)アクリル酸エステル、ビニルピリジン、及びアミノスチレンから選択される1種以上のモノマーに由来する構成単位を含む高分子化合物 The processed pigment according to claim 1, wherein the polymer compound having a basic nitrogen atom is at least one polymer compound selected from the following (1) to (4).
(1) Poly (alkyleneimine) having an alkylene group having 2 to 6 carbon atoms
(2) Polyallylamine (3) Polyvinylamine (4) A structural unit derived from one or more monomers selected from (meth) acrylic acid ester having a basic nitrogen atom in the ester part, vinylpyridine, and aminostyrene Including polymer compounds
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009052082A JP5611531B2 (en) | 2008-09-02 | 2009-03-05 | Processed pigment, pigment dispersion composition, photocurable composition, color filter, and method for producing color filter |
KR20090058435A KR101511202B1 (en) | 2008-09-02 | 2009-06-29 | Processed pigment, pigment dispersion composition, photocurable composition, color filter, and method of manufacturing color filter |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008224642 | 2008-09-02 | ||
JP2008224642 | 2008-09-02 | ||
JP2009052082A JP5611531B2 (en) | 2008-09-02 | 2009-03-05 | Processed pigment, pigment dispersion composition, photocurable composition, color filter, and method for producing color filter |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2010084119A JP2010084119A (en) | 2010-04-15 |
JP2010084119A5 true JP2010084119A5 (en) | 2011-10-20 |
JP5611531B2 JP5611531B2 (en) | 2014-10-22 |
Family
ID=42248387
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009052082A Active JP5611531B2 (en) | 2008-09-02 | 2009-03-05 | Processed pigment, pigment dispersion composition, photocurable composition, color filter, and method for producing color filter |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5611531B2 (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5826464B2 (en) * | 2010-06-01 | 2015-12-02 | 大日精化工業株式会社 | Processed pigment manufacturing method and pigment dispersion manufacturing method |
JP2012031276A (en) * | 2010-07-30 | 2012-02-16 | Dic Corp | Pigment dispersion composition for color filter, and color filter |
KR102491715B1 (en) | 2015-03-27 | 2023-01-25 | 미쯔비시 케미컬 주식회사 | Coloring resin composition, color filter and image display device |
TWI769146B (en) | 2016-01-08 | 2022-07-01 | 日商富士軟片股份有限公司 | Colored composition, method for producing coloring composition, color filter, pattern forming method, solid-state imaging element, and image display device |
JP6744002B1 (en) | 2019-12-09 | 2020-08-19 | Dic株式会社 | Zinc halide phthalocyanine pigment for color filter and method for producing zinc halide phthalocyanine pigment for color filter |
WO2020204210A1 (en) * | 2019-12-09 | 2020-10-08 | Dic株式会社 | Halogenated zinc phthalocyanine pigment for color filters, and method for manufacturing halogenated zinc phthalocyanine pigment for color filters |
WO2021236883A2 (en) * | 2020-05-20 | 2021-11-25 | Ennis-Flint, Inc. | Ketone functionalized polymers, methods of making ketone functionalized polymers, and compositions including the same |
WO2021235373A1 (en) * | 2020-05-22 | 2021-11-25 | 富士フイルム株式会社 | Resin composition, film, optical filter, solid image pickup element, and image display apparatus |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01138271A (en) * | 1987-11-24 | 1989-05-31 | Nippon Shokubai Kagaku Kogyo Co Ltd | Production of surface-treated organic pigment |
JPH01138270A (en) * | 1987-11-24 | 1989-05-31 | Nippon Shokubai Kagaku Kogyo Co Ltd | Production of surface-treated organic pigment |
BE1003999A3 (en) * | 1990-03-14 | 1992-09-08 | Colour Res Company Coreco Ltd | Improved organic pigments, process for their preparation and use in paints. |
JPH04149277A (en) * | 1990-10-12 | 1992-05-22 | Kao Corp | Stabilized colored composite pigment |
TW237471B (en) * | 1992-09-03 | 1995-01-01 | Ciba Geigy | |
EP0717086B1 (en) * | 1994-12-15 | 2000-04-26 | Ciba SC Holding AG | Organic pigments coated with metalphosphate complexes and amines |
DE69802430T2 (en) * | 1997-01-09 | 2002-07-18 | Ciba Sc Holding Ag | composite pigment |
CN101163752A (en) * | 2005-04-21 | 2008-04-16 | 西巴特殊化学品控股有限公司 | Pigment formulations |
JP5219408B2 (en) * | 2006-06-02 | 2013-06-26 | 富士フイルム株式会社 | Pigment dispersion composition, photocurable composition, color filter using the same, and method for producing color filter |
AR061138A1 (en) * | 2006-06-09 | 2008-08-06 | Omya Development Ag | COMPOUNDS OF INORGANIC AND / OR ORGANIC MICROPARTICLES AND DOLOMITA NANOPARTICLES |
JP4992321B2 (en) * | 2006-07-18 | 2012-08-08 | Dic株式会社 | Polyhalogenated zinc phthalocyanine, photosensitive composition and color filter |
JP4306736B2 (en) * | 2007-01-31 | 2009-08-05 | 凸版印刷株式会社 | Color filter, coloring composition for color filter, and liquid crystal display device |
JP5191194B2 (en) * | 2007-09-06 | 2013-04-24 | 富士フイルム株式会社 | Processed pigment, pigment dispersion composition using the same, colored photosensitive composition, and color filter |
JP2011506635A (en) * | 2007-12-07 | 2011-03-03 | キャボット コーポレイション | Method for preparing pigment composition |
-
2009
- 2009-03-05 JP JP2009052082A patent/JP5611531B2/en active Active
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2010084119A5 (en) | ||
CN105264642B (en) | The polymer blocks of the height etch resistant in block copolymer for orienting self assembly | |
CN109789644B (en) | Dielectric film forming composition | |
TWI619201B (en) | Method of forming contact hole pattern | |
TWI470354B (en) | Photosensitive composition in which photo-polymerizable polymer having fluorene skeleton is used | |
JP5993654B2 (en) | Method for forming pattern of layer containing block copolymer and base material | |
JP6775304B2 (en) | Infrared transmissive photosensitive resin composition | |
CN108137313A (en) | For the composition and method of Self-Assembling of Block Copolymer | |
TWI669287B (en) | Alkali-soluble resin, photosensitive resin composition and use thereof | |
TW201701075A (en) | Colored photosensitive resin composition, color filter, and image display apparatus comprising the same containing a colorant, an alkali soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent | |
TWI416254B (en) | Photosensitive resin composition | |
TW200804975A (en) | Radiation sensitive composition for forming a colored layer and color filter | |
JP7074051B2 (en) | Polymer manufacturing method, negative photosensitive resin composition manufacturing method, resin film manufacturing method, electronic device manufacturing method and polymer | |
JP2015176152A (en) | colored photosensitive resin composition | |
CN109715746A (en) | Polymer composition for self assembly application | |
TW201540732A (en) | Resin composition | |
JP6587068B2 (en) | Color filter underlayer film forming resin composition | |
JP2016109763A (en) | Photosensitive composition, solid state image sensor prepared therewith and method for producing the same | |
TW201925918A (en) | Negative photosensitive resin composition, method for producing said composition, and method for producing cured relief pattern | |
JP4327616B2 (en) | Photosensitive coating resin composition | |
TWI710855B (en) | Photosensitive resin composition and photo-cured pattern prepared from the same | |
TW202117446A (en) | Negative photosensitive resin composition and method for producing cured relief pattern | |
TWI805554B (en) | Resin, curable resin composition and cured film | |
JP2021120741A (en) | Photosensitive resin composition, polymer, pattern, color filter, black matrix, display device, and imaging element | |
TWI662069B (en) | Photosensitive composition, color filter and method for preparing the color filter |