JP2010066492A5 - - Google Patents
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- JP2010066492A5 JP2010066492A5 JP2008232443A JP2008232443A JP2010066492A5 JP 2010066492 A5 JP2010066492 A5 JP 2010066492A5 JP 2008232443 A JP2008232443 A JP 2008232443A JP 2008232443 A JP2008232443 A JP 2008232443A JP 2010066492 A5 JP2010066492 A5 JP 2010066492A5
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008232443A JP5141458B2 (en) | 2008-09-10 | 2008-09-10 | Positive radiation-sensitive resin composition and resist pattern forming method using the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008232443A JP5141458B2 (en) | 2008-09-10 | 2008-09-10 | Positive radiation-sensitive resin composition and resist pattern forming method using the same |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2010066492A JP2010066492A (en) | 2010-03-25 |
JP2010066492A5 true JP2010066492A5 (en) | 2010-05-06 |
JP5141458B2 JP5141458B2 (en) | 2013-02-13 |
Family
ID=42192134
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008232443A Active JP5141458B2 (en) | 2008-09-10 | 2008-09-10 | Positive radiation-sensitive resin composition and resist pattern forming method using the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5141458B2 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5729180B2 (en) * | 2010-07-14 | 2015-06-03 | Jsr株式会社 | Radiation sensitive resin composition |
KR101907705B1 (en) * | 2010-10-22 | 2018-10-12 | 제이에스알 가부시끼가이샤 | Pattern-forming method and radiation-sensitive composition |
JP5978137B2 (en) | 2012-02-23 | 2016-08-24 | 東京応化工業株式会社 | Resist composition and resist pattern forming method |
US11347147B2 (en) | 2016-11-07 | 2022-05-31 | Toyo Gosei Co., Ltd. | Metal-containing onium salt compound, photodegradable base, resist composition, and method for manufacturing device using said resist composition |
JP7250422B2 (en) * | 2017-12-28 | 2023-04-03 | 東京応化工業株式会社 | Resist composition and resist pattern forming method |
JP7394591B2 (en) | 2019-11-14 | 2023-12-08 | 東京応化工業株式会社 | Resist composition and resist pattern forming method |
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2008
- 2008-09-10 JP JP2008232443A patent/JP5141458B2/en active Active
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