JP2010031222A - Coating liquid for silica coating film formation and method for its preparation - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a coating liquid for silica coating film formation comprising a liquid composition for the formation of a silica coating film having patterning characteristics, relatively high coating film intensity, relatively low relative dielectric constant, good surface flatness, good crack resistance, and the like and to provide a method for preparing such coating liquid. <P>SOLUTION: The coating liquid for silica coating film formation comprises a liquid composition for forming a silica coating film with patterning characteristics, which contains at least silica particulates containing a basic catalytic component, a silicon compound obtained by hydrolysis of a specific organosilicon compound, and an acid generator that generates acid by ultraviolet radiation. A method for preparing the coating liquid for silica coating film formation is also provided herein. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention is a liquid for forming a silica-based coating film having patterning characteristics, having a relatively high coating film strength and a relatively low relative dielectric constant, and having excellent surface flatness and crack resistance. The present invention relates to a coating liquid for forming a silica-based coating film comprising a composition and a method for preparing the same.

  In recent years, in the manufacturing industry of semiconductor devices, liquid crystal devices, sensor devices, display devices, etc., on a semiconductor substrate, a wiring layer having a multilayer wiring structure, an element surface and / or a PN junction, a liquid crystal substrate, etc. In addition, a silica-based coating film is often used as an insulating film.

The liquid composition for forming such a silica-based coating film, for example, a) the general formula _{R n Si (OR ') 4} -n ( wherein, R, R' is from 1 to 8 carbon atoms An alkyl group, an aryl group, or a vinyl group, and n is an integer of 0 to 3.) Reaction of silica sol obtained by hydrolytic polycondensation of alkoxysilane represented by the above and a partial hydrolyzate of the alkoxysilane coating forming coating liquid containing an object (described in Patent Document 1.) and, b) silica fine particles, and the general formula _{X n Si (oR) 4-} n ( wherein, X is, H, F or carbons 1 -8 represents an alkyl group, aryl group or vinyl group, R represents H or an alkyl group having 1 to 8 carbon atoms, aryl group or vinyl group, and n is an integer of 0 to 3). during alkoxysilane and / or the general formula X _n SiX _'4-n (wherein, X is , F or an alkyl group having 1 to 8 carbon atoms, an aryl group or a vinyl group, X ′ represents a halogen atom, and n is an integer of 0 to 3) or a hydrolysis thereof. And a coating liquid for forming a low dielectric constant silica-based coating film (described in Patent Document 2) characterized by containing a reaction product with the product.

However, the present inventors use these compositions and conventionally known coating film forming methods (spin coating method and other coating methods) to apply silica-based coatings on substrates and other bonding surfaces constituting various devices. When the test to form was repeated, a coating film having the above characteristics was obtained, but the silica fine particles were partially localized in the coating film, or the silica fine particles and the alkoxysilane were partially hydrolyzed. If the reaction with the decomposed product and / or hydrolyzed product is insufficient, a coating film having a uniform and stable strength (compressive strength and tensile strength) is not necessarily obtained over the entire film. May cause pinholes and cracks in the coating.

Moreover, naturally the silica-type coating film formed using these coating liquids is not equipped with the patterning characteristic itself.
Usually, in order to pattern such a silica-based coating film, a photoresist is coated on the coating film, and then a patterning mask is placed thereon, exposed and developed to form a resist pattern. Then, generally, dry etching or the like is used to transfer the resist pattern to obtain an insulating layer having a necessary pattern.
However, the patterning method using a photoresist has a large number of steps and is extremely complicated.

In order to eliminate such process complexity, a method of forming a pattern by exposing and developing itself using an insulating material having photosensitivity is known. However, since a relatively high heat resistance is required for an insulating material used for a semiconductor device or the like, a photosensitive organic material generally used for a photoresist or the like cannot be used.
In view of this, a number of silicone-based coating film forming compositions having relatively high heat resistance and photosensitivity have been proposed.
For example, Patent Document 3 discloses a photosensitive silicone resin composition containing a poly ladder siloxane and / or a terminal hydroxy poly ladder siloxane and an aromatic azide compound and / or an aromatic sulfonyl azide compound. Document 4 discloses a photosensitive material composition containing a poly ladder siloxane and a disilane derivative.

Further, Patent Document 5 describes (i) a siloxane polymer, (ii) a compound that generates an acid or a base by exposure to crosslink the siloxane polymer, and (iii) vaporizes by heat treatment and / or undergoes a fading reaction by light. A negative photosensitive resin composition containing a sensitizer is disclosed, and Patent Document 6 discloses a positive photosensitive siloxane composition containing (i) a siloxane polymer, (ii) a quinonediazide compound, and (iii) a solvent. Is disclosed.
However, if these silicone-based coating film-forming compositions are applied onto a substrate, and further exposed and developed using a xenon-mercury lamp, excimer leather light, ultra-high pressure mercury lamp, etc., an appropriate pattern is formed on the insulating film. Although it can be formed, it has a relatively high heat resistance, a relatively high coating strength, and a relatively low dielectric constant, like the coatings described in Patent Document 1 and Patent Document 2 above. Furthermore, it was difficult to obtain a silica-based coating film excellent in surface flatness and crack resistance.

Japanese Patent No. 3163579 Japanese Patent No. 3813268 Japanese Patent Publication No. 1-36983 Japanese Patent No. 2850460 JP 2006-154037 A JP 2006-178436 A

The inventors of the present invention have conducted intensive research for the purpose of solving the above problems, and found that a coating solution for forming a silica-based coating film as shown below may be used to complete the present invention. It came to. That is, the present invention is intended to solve the above problems, and can be patterned with the characteristics of the coating film itself without using a photoresist. A coating solution for forming a silica-based coating film comprising a liquid composition for forming a silica-based coating film having a low relative dielectric constant and excellent surface flatness, crack resistance, heat resistance, and the like, and a method for preparing the same The purpose is to provide.

The coating liquid for forming a silica-based coating film according to the present invention is a coating liquid composed of a liquid composition for forming a silica-based coating film having patterning characteristics,
At least one organic silicon compound selected from silica-based fine particles containing a basic catalyst component, an alkoxysilane represented by the following general formula (I) and a halogenated silane represented by the following general formula (II) is added. It includes a silicon compound obtained by decomposition and an acid generator that generates an acid upon irradiation with ultraviolet rays.
_{R n Si (OR ') 4} -n ··· (I)
R _n SiX _4-n (II)
(In the formula, R represents a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 8 carbon atoms, a fluorine-substituted alkyl group, an aryl group, a vinyl group, or a phenyl group, and R ′ represents a hydrogen atom or 1 to 8 carbon atoms. An alkyl group, an aryl group, a vinyl group or a phenyl group, and X represents a halogen atom, and n is an integer of 0 to 3.)

The basic catalyst component contained in the silica-based fine particles is preferably at least one selected from ammonia, ammonium hydroxide and a quaternary ammonium compound.
Moreover, it is preferable that the said silica type fine particle contains the said basic catalyst component in the range of 200-1100 weight ppm.
Further, the silica-based fine particles are silica-based fine particles obtained by hydrolysis / condensation polymerization of an alkoxysilane represented by the following general formula (I) in the presence of the basic catalyst component, and the silica-based fine particles It is preferable to adjust the amount of the basic catalyst component contained therein.
_{R n Si (OR ') 4} -n ··· (I)
(In the formula, R represents a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 8 carbon atoms, a fluorine-substituted alkyl group, an aryl group, a vinyl group, or a phenyl group, and R ′ represents a hydrogen atom or 1 to 8 carbon atoms. Represents an alkyl group, an aryl group, a vinyl group or a phenyl group, and n is an integer of 0 to 3.)

The silicon compound is a reaction product obtained by hydrolyzing the organosilicon compound by at least the basic catalyst component released from the silica-based fine particles, and at least a part of the reaction product is an outer surface of the silica-based fine particles. And preferably bonded to the inner surface of the pore.
Moreover, it is preferable that the said silicon compound has a number average molecular weight of 400-3000 on a polystyrene conversion standard.

The acid generator may be at least one selected from triphenylsulfonium trifluoromethanesulfonate, 2,4,6-trimethylphenyldiphenylsulfonium p-toluenesulfonate, and bis (4-t-butylphenylsulfonyl) diazomethane. preferable.
Further, when the acid generator is represented by X and the basic catalyst component contained in the silica-based fine particles is represented by Y, the molar ratio (X / Y) is 0.02 to 0.02. It is preferable to include in the range which becomes 0.50.

The liquid composition preferably further contains at least one organic solvent selected from propylene glycol monopropyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate and hexylene glycol.
The liquid composition preferably further contains at least one amine compound selected from triethanolamine, triethylamine, and tri-n-butylamine.
Furthermore, when the amine compound is represented by Z and the acid generator is represented by X, the amine compound may contain a molar ratio (Z / X) of 0.01 to 1.0. preferable.

The liquid composition was further selected from anthracene, 9,10-diphenylanthracene, 9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 9,10-dipropoxyanthracene, and 9,10-dibutoxyanthracene. It is preferable to include at least one sensitizer.
In addition, the sensitizer includes the sensitizer in a range where the molar ratio (W / X) is 0.05 to 0.7 when the sensitizer is represented by W and the acid generator is represented by X. It is preferable.

A method for preparing a coating liquid for forming a silica-based coating film according to the present invention is a method for preparing a coating liquid comprising a liquid composition for forming a silica-based coating film having patterning characteristics,
(A) A water-alcohol dispersion of silica-based fine particles obtained by hydrolysis / condensation polymerization of an alkoxysilane represented by the following general formula (I) in the presence of a basic catalyst component is passed through an ultrafiltration device. A step of preparing a water-alcohol dispersion of silica-based fine particles in which the content of the basic catalyst component is adjusted,
(B) In the water-alcohol dispersion containing the silica-based fine particles, at least one selected from an alkoxysilane represented by the following general formula (I) and a halogenated silane represented by the following general formula (II): After mixing an aqueous dispersion containing an organosilicon compound or a partial hydrolyzate thereof, the organosilicon compound is heated at a temperature of 30 to 80 ° C., and at least the organosilicon compound is released by the basic catalyst component released from the silica-based fine particles. A step of preparing an aqueous mixed solution containing a silicon compound obtained by hydrolysis and silica-based fine particles containing the basic catalyst component;
(C) Solvent substitution with water and alcohol components contained in the aqueous mixture with at least one organic solvent selected from propylene glycol monopropyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate and hexylene glycol A step of preparing an organic solvent mixture, and (d) mixing an acid generator that generates an acid upon irradiation with ultraviolet light into the organic solvent mixture, so that at least the silica fine particles, the silicon compound, and It includes a step of preparing a liquid composition containing the acid generator.
_{R n Si (OR ') 4} -n ··· (I)
R _n SiX _4-n (II)
(In the formula, R represents a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 8 carbon atoms, a fluorine-substituted alkyl group, an aryl group, a vinyl group, or a phenyl group, and R ′ represents a hydrogen atom or 1 to 8 carbon atoms. An alkyl group, an aryl group, a vinyl group or a phenyl group, and X represents a halogen atom, and n is an integer of 0 to 3.)

The basic catalyst component used in the step (a) is preferably at least one selected from ammonia, ammonium hydroxide and a quaternary ammonium compound.
Moreover, it is preferable that the silica type fine particle obtained from the said process (a) contains the said basic catalyst component in the range of 200-1100 weight ppm.
Furthermore, the silica-based fine particles obtained from the step (c) preferably contain the basic catalyst component in a range of 10 to 800 ppm by weight.

The acid generator used in the step (d) is selected from triphenylsulfonium trifluoromethanesulfonate, 2,4,6-trimethylphenyldiphenylsulfonium p-toluenesulfonate, and bis (4-t-butylphenylsulfonyl) diazomethane. Preferably, at least one kind is used.
Furthermore, when the acid generator in the step (d) represents the acid generator by X, and the basic catalyst component contained in the silica-based fine particles obtained from the step (b) is represented by Y, It is preferable to mix in such a ratio that the molar ratio (X / Y) is 0.02 to 0.50.

It is preferable that the liquid composition obtained from the step (d) is further mixed with at least one amine compound selected from triethanolamine, triethylamine and tri-n-butylamine.
The amine compound is mixed in such a ratio that when the amine compound is represented by Z and the acid generator is represented by X, the molar ratio (Z / X) is 0.01 to 1.0. It is preferable to do.

The liquid composition obtained from the step (d) further includes anthracene, 9,10-diphenylanthracene, 9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 9,10-dipropoxyanthracene, 9,10. -It is preferable to mix at least one sensitizer selected from dibutoxyanthracene.
The sensitizer is a ratio such that when the sensitizer is represented by W and the acid generator is represented by X, the molar ratio (W / X) is 0.05 to 0.7. It is preferable to mix with.

According to the coating liquid for forming a silica-based coating film according to the present invention, it is possible to form a silica-based coating film that itself has patterning characteristics without adopting a patterning method using a photoresist. A silica-based coating film having a relatively high coating film strength and a relatively low relative dielectric constant and excellent in surface flatness, crack resistance, heat resistance, and the like can be formed.
More specifically, a silica-based coating film having the following characteristics, particularly a silica-based insulating film, can be easily formed on the substrate.

(1) If the coating liquid for forming a silica-based coating film is used, a patterning mask is placed on the silica-based coating film obtained by applying the coating liquid onto a substrate and dried, and then irradiated with ultraviolet rays. When developing with heat treatment, a silica-based coating film having a desired patterning can be obtained without using a conventional photoresist. Thereby, it is possible to omit the complicated photoresist forming operation, removal / cleaning operation, and coating film etching operation, which have been employed in a conventionally known method, and it is extremely economical.
(2) When the silica-based coating film forming coating solution is used, a relatively high coating film strength with Young's modulus of 3.0 GPa or more, preferably 5.0 GPa or more, and 4.0 or less, preferably 3 A silica-based coating film having a relatively low relative dielectric constant of 5 or less (particularly, a coating film in an ultraviolet non-irradiated region) can be obtained.

(3) If the coating liquid for forming a silica-based coating film is used, a silica-based surface having a smooth surface with a surface roughness (Rms) of 5.0 nm or less without subjecting the surface of the coating film to polishing treatment or the like. A coating film (particularly, a coating film in an ultraviolet non-irradiated region) can be obtained.
(4) If the silica-based coating film forming coating solution is used, even if a relatively thick coating film (5 μm or less) is formed on the substrate, cracks or pinholes are observed on the surface. A silica-based coating film (particularly, a coating film in an ultraviolet non-irradiated region) can be obtained.

(5) If the coating liquid for forming a silica-based coating film is used, even if the coating film is exposed to an atmosphere at a relatively high temperature (400 ° C. or less), the coating film is not deteriorated. A system coating film (particularly, a coating film in an ultraviolet non-irradiated region) can be obtained.
(6) If the above-mentioned coating liquid for forming a silica-based coating film is used, in addition to the above properties, it has excellent chemical resistance such as adhesion to a coating film-forming surface such as a semiconductor substrate and alkali resistance, and oxygen resistance. A silica-based coating film (particularly, a coating film in an ultraviolet non-irradiated region) having excellent characteristics in process compatibility such as plasma property and etching processability can be obtained.

  Hereinafter, the coating liquid for forming a silica-based coating film and the preparation method thereof according to the present invention will be specifically described.

[Coating liquid for forming silica-based coating film]
The coating liquid for forming a silica-based coating film according to the present invention is a coating liquid composed of a liquid composition for forming a silica-based coating film having patterning characteristics,
At least one organic silicon compound selected from silica-based fine particles containing a basic catalyst component, alkoxysilane represented by the following general formula (I) and halogenated silane represented by the following general formula (II) is added. It contains a silicon compound obtained by decomposition and an acid generator that generates an acid upon irradiation with ultraviolet rays.
_{R n Si (OR ') 4} -n ··· (I)
R _n SiX _4-n (II)
(In the formula, R represents a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 8 carbon atoms, a fluorine-substituted alkyl group, an aryl group, a vinyl group, or a phenyl group, and R ′ represents a hydrogen atom or 1 to 8 carbon atoms. An alkyl group, an aryl group, a vinyl group or a phenyl group, and X represents a halogen atom, and n is an integer of 0 to 3.)

As the basic catalyst component contained in the silica-based fine particles, it is preferable to use at least one compound selected from ammonia, ammonium hydroxide and a quaternary ammonium compound. Among these, ammonia or ammonium hydroxide is preferably used. It is desirable to use it. This is because when the silica-based fine particles containing these basic catalyst components are heated, the basic catalyst components are easily released from the silica-based fine particles.
The silica-based fine particles preferably include the basic catalyst component in a range of 10 to 800 ppm by weight. Here, when the content of the basic catalyst component is less than 10 ppm by weight, it can react with the acid generated from the acid generator in the ultraviolet irradiation region when the coating film is irradiated with ultraviolet rays in the patterning process described later. Since the amount of the basic catalyst component is too small, the generated acid remains in the coating film in the ultraviolet irradiation region, and as a result, the residual acid promotes the crosslinking of the silicon compound contained in the coating film. In some cases, it becomes difficult to form a clear pattern on the substrate. In addition, when the content exceeds 800 ppm by weight, the basic catalyst component is too much. Therefore, in order to prevent the basic catalyst component from proceeding crosslinking of the silicon compound in the ultraviolet irradiation region, the basic catalyst component This is not economically preferable because an acid capable of sufficiently reacting with the acid generator is required, and as a result, the amount of the acid generator needs to be increased. Further, since the amount of the acid generator remaining in the ultraviolet non-irradiation amount region increases, there is a possibility of increasing the dielectric constant of the finally obtained coating film, and the amount of the acid generator was not increased. In such a case, it is necessary to generate an acid capable of sufficiently reacting with the basic catalyst component with a small amount of an acid generator.

Furthermore, the silica-based fine particles are silica-based fine particles obtained by hydrolysis / condensation polymerization of an alkoxysilane represented by the following general formula (I) in the presence of the basic catalyst component, and the silica-based fine particles. It is preferable to adjust the amount of the basic catalyst component contained therein.
_{R n Si (OR ') 4} -n ··· (I)
(In the formula, R represents a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 8 carbon atoms, a fluorine-substituted alkyl group, an aryl group, a vinyl group, or a phenyl group, and R ′ represents a hydrogen atom or 1 to 8 carbon atoms. Represents an alkyl group, an aryl group, a vinyl group or a phenyl group, and n is an integer of 0 to 3.)

The basic catalyst component contained in the silica-based fine particles is preferably adjusted so as to be in the range of 200 to 1100 ppm by weight. Here, when the content is less than 200 ppm by weight, the partial hydrolysis reaction or hydrolysis reaction of the organosilicon compound does not proceed so much in the vicinity of the outer surface of the silica-based fine particles or the surface of the pores (that is, Therefore, when a silica-based coating is formed using the coating solution thus obtained, sufficient coating strength cannot be obtained, and if it exceeds 1100 ppm by weight, the partial hydrolysis reaction or Since the hydrolysis reaction proceeds excessively, the storage stability of the resulting coating solution is deteriorated, which is not preferable.
The silica-based fine particles preferably have an average particle diameter in the range of 5 to 500 nm. Here, when the average particle diameter is less than 5 nm, the effect as a filler cannot be sufficiently exhibited, so that there is a problem in terms of improving the strength of the coating film, and when the average particle diameter exceeds 500 nm, Since it becomes difficult to preserve | save in a uniform dispersion state, it is not preferable.

Examples of the alkoxysilane represented by the general formula (I) include methyltrimethoxysilane, methyltriethoxysilane, methyltriisopropoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, ethyltriisopropoxysilane, and octyltrisilane. Methoxysilane, octyltriethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, trimethoxysilane, triethoxysilane, triisopropoxysilane, fluorotrimethoxysilane, fluorotriethoxysilane , Dimethyldimethoxysilane, dimethyldiethoxysilane, diethyldimethoxysilane, diethyldiethoxysilane, dimethoxysilane, diethoxysilane, difluorodimeth Examples include xylsilane, difluorodiethoxysilane, trifluoromethyltrimethoxysilane, trifluoromethyltriethoxysilane, tetraethoxysilane, and tetramethoxysilane. Among these, it is preferable to use methyltrimethoxysilane, methyltriethoxysilane or a mixture thereof.

Examples of the halogenated silane represented by the general formula (II) include tetrachlorosilane, trichlorosilane, methyltrichlorosilane, methyldichlorosilane, vinyltrichlorosilane, ethyltrichlorosilane, dimethyldichlorosilane, dimethylchlorosilane, 3 , 3,3-trifluoropropyltrichlorosilane, methylvinyldichlorosilane, n-propyltrichlorosilane, trimethylchlorosilane, methyl-3,3,3-trifluoropropyldichlorosilane, dimethylvinylchlorosilane, methylpropyldichlorosilane, phenyltri Examples include chlorosilane, t-butyldimethylchlorosilane, methylphenyldichlorosilane, heptadecafluorodecyltrichlorosilane, and diphenyldichlorosilane. Among these, it is preferable to use trichlorosilane, methyltrichlorosilane, or a mixture thereof.

The silicon compound is obtained by hydrolyzing at least one organic silicon compound selected from the above alkoxysilanes and halogenated silanes.
Further, the silicon compound is a reaction product obtained by hydrolyzing the organosilicon compound by at least the basic catalyst component released from the silica-based fine particles, and at least a part of the reaction product is formed of the silica-based fine particles. It is preferably bonded to the outer surface and the inner surface of the pore. In this case, the hydrolysis of the organosilicon compound is carried out by adding a desired basic catalyst component from the outside into the water-alcohol dispersion containing the organosilicon compound in addition to the basic catalyst component contained in the silica-based fine particles. And / or an acidic catalyst component may be added.
Moreover, it is preferable that the said silicon compound has a number average molecular weight of 400-3000 on a polystyrene conversion standard.

The content ratio of the silica-based fine particles and the silicon compound is expressed by the weight of the silica-based fine particles (SiO ₂ conversion standard) as A, and the weight of the silicon compound (SiO ₂ conversion standard) as B, The weight ratio (A / B) is preferably in the range of 1/9 to 9/1, preferably 4/6 to 6/4. Here, when the weight ratio is less than 1/9, crack resistance of the finally obtained coating film (non-irradiated portion of ultraviolet rays) is deteriorated, and when the weight ratio exceeds 9/1, Since the dielectric constant of a coating film will increase, it is not preferable.

  As the acid generator, any acid generator can be used without particular limitation as long as it decomposes when the coating film containing the acid generator is irradiated with ultraviolet rays to generate an acid, and specific examples thereof include triphenylsulfonium. Trifluoromethanesulfonate, triphenylsulfonium nonafluoro-n-butanesulfonate, triphenylsulfonium perfluoro-n-octanesulfonate, triphenylsulfonium 2- (bicyclo [2.2.1] heptan-2-yl) -1,1 2,2-tetrafluoroethanesulfonate, triphenylsulfonium pyrenesulfonate, triphenylsulfonium n-dodecylbenzenesulfonate, triphenylsulfonium 4-toluenesulfonate, triphenylsulfoniumbenzenesulfonate, triphenyls Honium 10-camphorsulfonate, triphenylsulfonium n-octanesulfonate, triphenylsulfonium 2-trifluoromethylbenzenesulfonate, triphenylsulfonium 4-trifluoromethylbenzenesulfonate, triphenylsulfonium naphthalenesulfonate, triphenylsulfonium perfluorobenzenesulfonate, (4-Fluorophenyl) diphenylsulfonium trifluoromethanesulfonate, (4-fluorophenyl) diphenylsulfonium nonafluoro-n-butanesulfonate, (4-fluorophenyl) diphenylsulfonium 10-camphor sulfonate, tris (4-fluorophenyl) sulfonium trifluoro Lomethanesulfonate, tris (4-fluoroph Nyl) sulfonium nonafluoro-n-butanesulfonate, tris (4-fluorophenyl) sulfonium 10-camphor sulfonate, tris (4-fluorophenyl) sulfonium 4-toluenesulfonate, 2,4,6-trimethylphenyldiphenylsulfonium trifluoromethanesulfonate 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate, 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate, 2,4,6-trimethylphenyldiphenylsulfonium p-toluene Sulfonate, bis (trifluoromethanesulfonyl) diazomethane, bis (cyclohexanesulfonyl) diazomethane, bis (phenylsulfonyl) ) Diazomethane, bis (4-toluenesulfonyl) diazomethane, bis (2,4-dimethylbenzenesulfonyl) diazomethane, bis (4-t-butylphenylsulfonyl) diazomethane, bis (4-chlorobenzenesulfonyl) diazomethane, methylsulfonyl 4- Toluenesulfonyldiazomethane, cyclohexanesulfonyl, 4-toluenesulfonyldiazomethane, cyclohexanesulfonyl, 1,1-dimethylethanesulfonyldiazomethane, bis (1,1-dimethylethanesulfonyl) diazomethane, bis (1-methylethanesulfonyl) diazomethane, bis (1 , 4-dioxaspiro [4.5] decane-7-sulfonyl) diazomethane. Among these, it is preferable to use at least one selected from triphenylsulfonium trifluoromethanesulfonate, 2,4,6-trimethylphenyldiphenylsulfonium p-toluenesulfonate, and bis (4-t-butylphenylsulfonyl) diazomethane.

  Further, when the acid generator is represented by X and the basic catalyst component contained in the silica-based fine particles is represented by Y, the molar ratio (X / Y) is 0.02 to 0.02. It is desirable to include in the range of 0.50, preferably 0.05 to 0.3. Here, when the molar ratio is less than 0.02, the amount of acid generated even when the dried coating film is irradiated with ultraviolet rays is small, so that a silicon compound that has undergone cross-linking remains in the ultraviolet irradiation region. It is difficult to form a simple pattern on the substrate, and when the molar ratio exceeds 0.5, the amount of acid generated is excessive, so that the acid oozes out into the non-irradiated region, Further, even in the ultraviolet irradiation region, it is not preferable because crosslinking of the silicon compound is promoted by the remaining acid without reacting with the basic catalyst component or the amine compound.

The liquid composition preferably further contains an organic solvent. The organic solvent can be used without particular limitation as long as it evaporates at a temperature of 250 ° C. or lower, and is selected from propylene glycol monopropyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate and hexylene glycol. Preferably, at least one selected from the above is used.

The liquid composition preferably further contains an amine compound. The amine compound can be used without particular limitation as long as the acid generated from the acid generator upon irradiation with ultraviolet rays can be prevented from diffusing into the coating film in the non-irradiated region of ultraviolet rays. -Hexylamine, n-heptylamine, n-octylamine, n-nonylamine, n-decylamine, di-n-butylamine, di-n-pentylamine, di-n-hexylamine, di-n-heptylamine, di -N-octylamine, di-n-nonylamine, di-n-decylamine, triethanolamine, triethylamine, tri-n-propylamine, tri-n-butylamine, tri-n-pentylamine, tri-n-hexylamine , Tri-n-heptylamine, tri-n-octylamine, tri-n-nonylamine, tri-n-decylami , Aniline, N- methylaniline, N, N- dimethylaniline, 2-methylaniline, 3-methylaniline, 4-methylaniline, 4-nitroaniline, diphenylamine, triphenylamine, and 1-naphthylamine. Among these, it is preferable to use at least one amine compound selected from triethanolamine, triethylamine, and tri-n-butylamine. That is, if this amine compound is contained in the liquid composition, the acid generated from the acid generator can be prevented from diffusing into the non-irradiated region of ultraviolet light located under the patterning mask. A clear pattern can be formed on the coating film.

The amine compound is represented by Z, and when the acid generator is represented by X, the molar ratio (Z / X) is 0.01 to 1.0, preferably 0.05 to It is desirable to include in the range which becomes 0.5. Here, when the molar ratio is less than 0.01, it becomes impossible to prevent the acid generated in the ultraviolet irradiation region from oozing into the non-ultraviolet irradiation region, and it becomes difficult to form a clear pattern on the substrate. In addition, when the molar ratio exceeds 1.0, the amount of acid generated even when the dried coating film is irradiated with ultraviolet rays is insufficient, so that a silicon compound with advanced crosslinking remains in the ultraviolet irradiation region, which is clear. It becomes difficult to form a pattern on a substrate.
More specifically, the amine compound is in such an amount that the acid generated from the acid generator in the ultraviolet irradiation region is just neutralized by the basic catalyst component released from the silica-based fine particles and the amine compound. It is desirable to add. This is because if the acid is present in excess, the excess acid will cause crosslinking of the silicon compound contained in the coating film in the ultraviolet irradiation region, and if the amine compound is present in excess, this excess This is because crosslinking of the silicon compound contained in the coating film in the ultraviolet irradiation region is promoted by the amine compound, so that a desired clear pattern cannot be formed on the coating film.

Moreover, it is preferable that a sensitizer is further contained in the liquid composition. As this sensitizer, it can be used without particular limitation as long as it absorbs ultraviolet rays in a wavelength range of at least 300 to 480 nm and has an electron donating property to the acid generator. Biphenyl, 1,4-dimethylnaphthalene, 9-fluorenone, fluorene, phenanthrene, triphenylene, pyrene, anthracene, 9,10-diphenylanthracene, 9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 9,10-di Examples thereof include aromatic compounds such as propoxyanthracene, 9,10-dibutoxyanthracene, benzophenone, 4,4′-dimethoxybenzophenone, acetophenone, 4-methoxyacetophenone, and benzaldehyde. Among these, at least one selected from anthracene, 9,10-diphenylanthracene, 9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 9,10-dipropoxyanthracene, and 9,10-dibutoxyanthracene. Preference is given to using aromatic compounds.

Further, when the sensitizer is represented by W and the acid generator is represented by X, the molar ratio (W / X) is 0.05 to 0.7, preferably 0.8. It is desirable to include in the range which becomes 1-0.5. Here, when the molar ratio is less than 0.05, the sensitizing function of the sensitizer (that is, the ultraviolet light having a wavelength range of at least 300 to 480 nm is absorbed and the acid generator is absorbed by the energy of the ultraviolet light. In this case, it may be difficult to form a clear pattern on the substrate. However, this is not the case when an ultraviolet lamp described below is used. Further, if the molar ratio exceeds 0.7, the amount of ultraviolet light absorbed by the sensitizer is excessively increased, and the acid generator is excessively decomposed by the energy of ultraviolet light absorbed in this manner, thereby Since the generated amount may be larger than necessary, the acid oozes out into the ultraviolet non-irradiated region, or the amount of acid remaining in the coating increases, resulting in a clear pattern on the substrate. It may be difficult to form on top.
However, in the liquid composition according to the present invention, it is not always necessary to include the sensitizer in the liquid composition. That is, an ultraviolet lamp capable of irradiating ultraviolet rays including a low wavelength region of less than 300 nm, particularly including a wavelength region of about 254 nm (for example, an ultraviolet lamp in which ultraviolet rays of about 254 nm wavelength are not cut by a filter, a low pressure mercury lamp, a mercury xenon lamp) Etc.), a clear pattern can be formed on the substrate even if the sensitizer is not included in the liquid composition.

The solid content (mainly silicon-containing component) contained in the liquid composition varies depending on the intended use, but is 2 to 60% by weight, preferably 10 to 50% by weight based on the weight of the composition. It is desirable to adjust so that it may become the range of%. Here, when the content exceeds 60% by weight, the temporal stability of the composition is deteriorated, and when the content is less than 2% by weight, a uniform coating film can be formed on the substrate. It becomes difficult.
Furthermore, in the present invention, a surfactant as a leveling agent, a polysilicon resin, or the like may be added to the liquid composition. Examples of the surfactant include silicone-based surfactants such as polyoxyalkylene dimethylpolysiloxane and fluorine-based surfactants such as perfluoroalkylcarboxylates and perfluoroalkylethylene oxide adducts. Examples of silicone resins include polyether-modified silicone resins, amino-modified silicone resins, epoxy-modified silicone resins, and alkoxy-modified resins. Among these, it is preferable to use a polysilicone resin.

Although the preparation method of the coating liquid for silica-type coating film formation concerning this invention is demonstrated concretely below, this invention is not necessarily limited to this.
[Method for preparing coating solution for forming silica-based coating film]
A method for preparing a coating liquid for forming a silica-based coating film according to the present invention is a method for preparing a coating liquid comprising a liquid composition for forming a silica-based coating film having patterning characteristics,
(A) A water-alcohol dispersion of silica-based fine particles obtained by hydrolysis / condensation polymerization of an alkoxysilane represented by the following general formula (I) in the presence of a basic catalyst component is passed through an ultrafiltration device. A step of preparing a water-alcohol dispersion of silica-based fine particles in which the content of the basic catalyst component is adjusted,
(B) In the water-alcohol dispersion containing the silica-based fine particles, at least one selected from an alkoxysilane represented by the following general formula (I) and a halogenated silane represented by the following general formula (II): After mixing an aqueous dispersion containing an organosilicon compound or a partial hydrolyzate thereof, the organosilicon compound is heated at a temperature of 30 to 80 ° C., and at least the organosilicon compound is released by the basic catalyst component released from the silica-based fine particles. A step of preparing an aqueous mixed solution containing a silicon compound obtained by hydrolysis and silica-based fine particles containing the basic catalyst component;
(C) Solvent substitution with water and alcohol components contained in the aqueous mixture with at least one organic solvent selected from propylene glycol monopropyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate and hexylene glycol A step of preparing an organic solvent mixture, and (d) mixing an acid generator that generates an acid upon irradiation with ultraviolet light into the organic solvent mixture, so that at least the silica fine particles, the silicon compound, and The method includes a step of preparing a liquid composition containing the acid generator.
_{R n Si (OR ') 4} -n ··· (I)
R _n SiX _4-n (II)
(In the formula, R represents a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 8 carbon atoms, a fluorine-substituted alkyl group, an aryl group, a vinyl group, or a phenyl group, and R ′ represents a hydrogen atom or 1 to 8 carbon atoms. An alkyl group, an aryl group, a vinyl group or a phenyl group, and X represents a halogen atom, and n is an integer of 0 to 3.)

The above steps will be specifically described as follows.
Step (a )
In this step, a water-alcohol dispersion containing silica-based fine particles obtained by hydrolyzing and polycondensating the alkoxysilane in the presence of the basic catalyst component is prepared. The method can be adopted. That is, 1) a method in which an aqueous solution of a basic catalyst component (for example, ammonia) is added to a water-alcohol dispersion containing the alkoxysilane, and then the resulting hydrolyzed / condensed product is aged, or 2) the above 1) There is a method in which the silica-based fine particles obtained in (1) are further aged by hydrothermal treatment in a pressure vessel such as an autoclave. However, the average particle diameter of the silica-based fine particles is preferably in the range of 5 to 500 nm.

However, in the method of the present invention, it is necessary to adjust the content of the basic catalyst component contained in the silica-based fine particles. Specifically, the method is as follows. However, the method of the present invention is not limited to the method described herein.
(1) First, the water-alcohol-based dispersion containing silica-based fine particles obtained by the above method is subjected to an ultrafiltration device and concentrated until the volume becomes about 1/2 to about 1/5. Then, unreacted or intermediate reactants of the alkoxysilane contained in the dispersion are removed. In this case, a part of water, alcohol and basic catalyst components (for example, ammonia) contained in the dispersion is removed.

(2) Next, about 1 to 3 times the volume of pure water (the temperature is 5 to 25 ° C., the same shall apply hereinafter) is added to the water-alcohol dispersion obtained in (1) above. After stirring, the mixture is concentrated on an ultrafiltration device until the volume is reduced to about 1/2 to remove a part of the basic catalyst component contained in the dispersion. Further, if necessary, after adding the same volume of pure water as the obtained water-alcohol dispersion and stirring, the same operation is repeated through an ultrafiltration device. By repeating this operation, the basic catalyst component is gradually released from the silica-based fine particles into the dispersion, so that the content of the basic catalyst component contained in the silica-based fine particles is adjusted. be able to. The number of operations performed here is preferably 2 to 5 times, although it varies depending on the basic catalyst component contained in the silica-based fine particles, the content thereof, and the properties of the silica-based fine particles.

(3) Next, the water-alcohol dispersion obtained in (1) or (2) above (with a low alcohol concentration) is used with the same volume of alcohol (temperature is 5 to 25 ° C.) The same is applied), and the mixture is stirred and then concentrated on an ultrafiltration apparatus until the volume is reduced to about one half, and water and alcohol contained in the dispersion are solvent-substituted. Further, if necessary, after adding the same volume of alcohol as the obtained water-alcohol dispersion and stirring, the same operation is repeated through an ultrafiltration device. By repeating this operation about 2 to 4 times, the alcohol concentration contained in the water-alcohol dispersion is adjusted to about 60 to 90% by weight. As a result, a water-alcohol dispersion suitable for mixing with the aqueous dispersion of the organosilicon compound is obtained. The concentration of the silica-based fine particles contained in the water-alcohol dispersion is preferably adjusted to about 5 to 20% by weight.

As a result, a water-alcohol-based dispersion containing silica-based fine particles in which the content of the basic catalyst component is adjusted to a range of 200 to 1100 ppm by weight is obtained.
However, the required amount of the basic catalyst component is the type and amount of the organosilicon compound used in the subsequent step (b), or the type of catalyst component contained in the dispersion obtained by mixing them. Since it varies depending on the content thereof, it is desirable to adjust the content of the basic catalyst component contained in the silica-based fine particles in the above range in consideration of these conditions.
The water-alcohol dispersion contains the basic catalyst component used in the hydrolysis / condensation polymerization reaction. That is, the dispersion contains a basic catalyst component that is not removed by the ultrafiltration operation and a basic catalyst component that is partially released from the silica-based fine particles after the operation is completed. Since it can be used for the hydrolysis reaction performed in the step (b), it may be contained as it is.

The alkoxysilane used in this step can be used without particular limitation as long as the silica-based fine particles can be obtained, but it is preferable to use ethyl silicate or methyl silicate.
In addition, as the basic catalyst component, at least one selected from ammonia, ammonium hydroxide and quaternary ammonium compounds can be used. Among them, ammonia or ammonium hydroxide is preferably used.
Further, as the alcohol, at least one selected from methyl alcohol, ethyl alcohol, propyl alcohol, isopropyl alcohol, and n-butyl alcohol can be used. Among them, methyl alcohol or ethyl alcohol can be used. preferable.

Step (b )
In this step, a water-alcohol dispersion containing the silica-based fine particles obtained in the step (a), an alkoxysilane represented by the following general formula (I), and a halogen represented by the following general formula (II) And an aqueous dispersion containing at least one organosilicon compound selected from silane silane and its partial hydrolyzate. As a result, an aqueous mixed liquid containing the silica-based fine particles, the organosilicon compound, and the like is obtained.
Here, the alkoxysilane and / or halogenated silane may be mixed after being partially hydrolyzed in advance in the presence of an acidic catalyst component. This is because, in the initial stage, the organosilicon compound is partially hydrolyzed and / or hydrolyzed in the presence of an acidic catalyst component, and then the silicon compound obtained by further hydrolyzing with the basic catalyst component described below is used. This is because a dense silica-based coating film can be obtained when a coating film is formed using the composition containing the same.
Examples of the acidic catalyst component include nitric acid, hydrochloric acid, acetic acid, and sulfuric acid. Of these, nitric acid or hydrochloric acid is preferably used.

In this step, a basic catalyst component can be further contained in the aqueous mixed solution from the outside. As the basic catalyst component, the same components as described above can be used.
As described above, the water-alcohol dispersion obtained in the step (a) often contains a basic catalyst component. However, when the amount of the basic catalyst component contained in the silica-based fine particles obtained in the step (a) is less than a desired value, the basic catalyst component can be added from the outside into the aqueous mixed solution. Such cases include the following cases.

(1) This is a case of using a water-alcohol dispersion containing silica-based fine particles obtained by hydrothermally treating and aging the silica-based fine particles obtained by hydrolyzing and condensation-polymerizing the alkoxysilane in a pressure vessel such as an autoclave. In this case, since the silica-based fine particles obtained have a relatively dense structure, the basic catalyst component contained in the silica-based fine particles may be somewhat reduced.
(2) Ultrafine water-alcohol dispersion containing silica fine particles hydrolyzed and polycondensed from the alkoxysilane, or silica fine particles aged by hydrothermal treatment in a pressure vessel such as an autoclave When filtering, the content of the basic catalyst component contained in the silica-based fine particles or water-alcohol dispersion obtained by performing wrong operation (for example, excessive number of operations, etc.) is lower than the desired value. In such a case, it may be necessary to supplement the basic catalyst component from the outside.

Furthermore, in this step, the organic silicon compound is hydrolyzed by at least the basic catalyst component released from the silica-based fine particles by heating the aqueous mixed solution to a temperature of 30 to 80 ° C.
The aqueous mixed solution varies depending on the basic catalyst component contained in the silica-based fine particles, but it is desired to heat to a temperature of 30 to 80 ° C., preferably 40 to 70 ° C. Here, when the temperature is less than 30 ° C., the release rate of the basic catalyst component contained in the silica-based fine particles is slow, and therefore the time for partial hydrolysis and / or hydrolysis of the organosilicon compound is slow. If the temperature is longer and the temperature exceeds 80 ° C., the diffusion of the basic catalyst component contained in the silica-based fine particles occurs rapidly or rapidly, which is not preferable because the stability of the dispersion is deteriorated.
As described above, by heating the aqueous mixture, the basic catalyst component contained in the silica-based fine particles is gradually released from the silica-based fine particles. You can go there.

As a result, the organosilicon compound is partially hydrolyzed and / or hydrolyzed near the outer surface of the silica-based fine particles and the inner surface of the pores by the basic catalyst component released from the silica-based fine particles. A silicon compound sufficiently bonded to the silica-based fine particles can be obtained. In this case, the organosilicon compound is also hydrolyzed by the basic catalyst component contained in the mixed solution, but in the method of the present invention, at least the basic catalyst component released from the silica-based fine particles is used. It is important to hydrolyze.
The basic catalyst component contained in the silica-based fine particles and the basic catalyst component contained in the dispersion may be the same or different, but the same ones should be used as much as possible. desirable.

The silica-based fine particles contained in the aqueous mixture thus obtained are determined depending on the content of the basic catalyst component adjusted in the step (a) and the amount of the basic catalyst component released in the step (b). Although it differs, it is preferable that the said basic catalyst component is included in the range of 200-1100 weight ppm.
The silicon compound preferably has a number average molecular weight of 400 to 3000, preferably 800 to 2000, on a polystyrene basis. If this number average molecular weight is in the above range, the finally obtained silica-based coating film-forming coating solution can exhibit excellent temporal stability and good coating properties.

Step (c)
In this step, the aqueous mixture obtained in the step (b) is subjected to a conventionally known solvent substitution step such as a rotary evaporator, and water and alcohol components contained in the dispersion are converted into propylene glycol monopropyl ether. Then, at least one organic solvent selected from propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, hexylene glycol and the like is used for solvent substitution to prepare an organic solvent mixed solution.
A specific example thereof (example using propylene glycol monopropyl ether (PGP) as an organic solvent for solvent replacement) is as follows. However, the present invention is not limited to the method described here.

(I) The aqueous mixture obtained above is put into a flask of a rotary evaporator, and further propylene glycol monopropyl ether is put into the flask.
(Ii) Next, the rotary evaporator is driven, and the temperature is 50 to 90 ° C., preferably 60 to 80 ° C., −0.05 to −0.1 MPa, preferably −0.08 to −0.1 MPa. Under reduced pressure, the flask is rotated at a speed of 30-120 rpm, preferably 60-90 rpm. Then, since water and alcohol contained in the aqueous mixed solution are evaporated, this is cooled and discharged out of the system.
(Iii) By performing the operation (ii) continuously for a necessary time, an organic solvent-based mixed solution in which the water and alcohol and propylene glycol monopropyl ether are solvent-substituted can be obtained.

By performing such solvent substitution, water and alcohol contained in the aqueous mixture, and alcohols by-produced by hydrolysis of the alkoxysilane and the like are separated and removed. In addition, if said operation is performed using a rotary evaporator, the said solvent substitution can also be performed almost completely, However, In this invention, this does not necessarily need to be performed completely.
Thereby, the content of the solid content (mainly silicon-containing component) contained in the organic solvent-based mixed solution is in the range of 2 to 60% by weight, preferably 10 to 50% by weight, based on the weight of the mixed solution. Can be adjusted.
Furthermore, it is preferable that the silica-based fine particles contained in the organic solvent-based mixed solution contain the basic catalyst component in a range of 10 to 800 ppm by weight.

Step (d )
In this step, the organic solvent mixture obtained in the step (c) is mixed with an acid generator that generates an acid upon irradiation with ultraviolet rays, so that at least the silica-based fine particles, the silicon compound, and the acid generator are mixed. A liquid composition is prepared.
As described above, the acid generator is selected from triphenylsulfonium trifluoromethanesulfonate, 2,4,6-trimethylphenyldiphenylsulfonium p-toluenesulfonate, and bis (4-t-butylphenylsulfonyl) diazomethane. It is preferable to use at least one selected from the above. In this case, the acid generator may be mixed as it is in the organic solvent-based mixed solution, but an organic solvent such as propylene glycol monopropyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, hexylene glycol or the like. It is desirable to mix after dissolving and dispersing in a solvent. In this case, as the organic solvent for dissolving and dispersing the acid generator, it is preferable to use the same type of organic solvent as that contained in the organic solvent mixture.

If the acid generator is added to the organic solvent-based mixture under stirring and further sufficiently stirred at room temperature, a liquid composition in which the acid generator is dispersed can be obtained.
Here, when the acid generator is represented by X and the basic catalyst component contained in the silica-based fine particles is represented by Y, the molar ratio (X / Y) is 0.02. It is preferable to add at a ratio of ˜0.50, preferably 0.05 to 0.3. The reason is as described above.

Other Steps In this step, the acid generated from the acid generator by the irradiation of ultraviolet rays is further diffused into the coating film in the non-irradiated region of the ultraviolet rays, if necessary, in the liquid composition obtained in the step (d). A liquid composition containing at least the silica-based fine particles, the silicon compound, the acid generator, and the amine compound is prepared by mixing an amine compound for preventing the above.
However, the basic catalyst component contained in the silica-based fine particles present in the coating film in the non-irradiated region of the ultraviolet ray can also play its role (however, depending on the content and release amount). In the invention, it is not always necessary to add the amine compound.
As described above, the amine compound is preferably at least one amine compound selected from triethanolamine, triethylamine, and tri-n-butylamine. In this case, the amine compound may be mixed in the organic solvent-based mixed solution as it is, but an organic solvent such as propylene glycol monopropyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, hexylene glycol or the like. It is desirable to mix after dissolving and dispersing in. In this case, as the organic solvent for dissolving and dispersing the amine compound, it is preferable to use the same type of organic solvent as that contained in the organic solvent mixture.

The amine compound can be mixed with the liquid composition obtained in the step (d) under stirring, and further stirred at room temperature to obtain a liquid composition in which the amine compound is dispersed. .
Here, when the amine compound is represented by Z and the acid generator is represented by X, the molar ratio (Z / X) is 0.01 to 1.0, preferably 0.05. It is desirable to include in the range which becomes -0.5. The reason is as described above. More specifically, the amine compound is in such an amount that the acid generated from the acid generator in the ultraviolet irradiation region is just neutralized by the basic catalyst component released from the silica-based fine particles and the amine compound. It is desirable to add.

In this step, if necessary, the liquid composition obtained in the step (d) absorbs ultraviolet rays in a wavelength region of at least 300 to 480 nm when the coating film is irradiated with ultraviolet rays. A liquid composition containing at least the silica-based fine particles, the silicon compound, the acid generator and the sensitizer by mixing a sensitizer having a function capable of decomposing the acid generator, or at least the above-mentioned A liquid composition containing silica-based fine particles, the silicon compound, the acid generator, the amine compound, and the sensitizer is prepared.
However, in the present invention, it is not always essential to mix the sensitizer with the liquid composition obtained in the step (d). However, when the sensitizer is not mixed in the liquid composition, an ultraviolet lamp capable of irradiating ultraviolet rays including a low wavelength region of less than 300 nm, particularly a wavelength region near 254 nm, when the coating film is irradiated with ultraviolet rays (for example, It is necessary to use an ultraviolet lamp in which ultraviolet rays having a wavelength of around 254 nm are not cut by a filter, a low-pressure mercury lamp, a mercury xenon lamp, or the like.

As described above, the sensitizer includes anthracene, 9,10-diphenylanthracene, 9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 9,10-dipropoxyanthracene and 9,10. It is desirable to use at least one aromatic compound selected from dibutoxyanthracene. In this case, the sensitizer may be mixed as it is in the organic solvent-based mixed solution, but organic compounds such as propylene glycol monopropyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, and hexylene glycol are used. It is desirable to mix after dissolving and dispersing in a solvent. In this case, as the organic solvent for dissolving and dispersing the sensitizer, it is preferable to use the same type of organic solvent as that contained in the organic solvent mixture.

The sensitizer is mixed with the liquid composition obtained in the step (d) under stirring, and further stirred at room temperature to obtain a liquid composition in which the sensitizer is dispersed. Can do.
Here, when the sensitizer is represented by W and the acid generator is represented by X, the molar ratio (W / X) is 0.05 to 0.7, preferably 0. It is desirable to include within a range of 1 to 0.5. The reason is as described above.
Thus, for forming a silica-based coating film having patterning characteristics, having a relatively high coating film strength and a relatively low relative dielectric constant, and having excellent surface flatness and crack resistance. A coating liquid for forming a silica-based coating film made of a liquid composition can be prepared.

[Method for forming patterned silica-based coating film]
Next, a method of forming a patterned silica-based coating film on a substrate using the silica-based coating film forming coating solution according to the present invention will be described. The method includes the following, but the present invention is not necessarily limited to this.
This method is a method of forming a patterned silica-based coating film on a substrate,
(1) The process of apply | coating the said composition for silica-type coating film formation on a board | substrate,
(2) A step of drying the coating film formed on the substrate in the step,
(3) A step of placing a patterning mask on the coating film dried in the step,
(4) A step of irradiating the coating film masked in the step with ultraviolet rays,
(5) A step of heating the coating film irradiated with ultraviolet rays in the step,
(6) a step of immersing the coating film baked in the step in a developer; and (7) a step of cleaning the coating film immersed in the developer in the step.
The above steps will be specifically described as follows.

Process (1 )
In general, in order to apply a coating liquid for forming a coating film on a substrate, a coating method such as a spin coating method, a dip coating method, a roll coating method, a slit coating method, or a transfer method is employed. Moreover, the said coating liquid for silica-type coating film formation can be apply | coated on a board | substrate using such a conventionally well-known method. Among these, when the coating film forming coating solution is applied on a semiconductor substrate or the like, the spin coating method is suitable, and the coating film thickness uniformity and low dust generation are excellent. Accordingly, in the coating solution of the present invention, it is desirable to employ this spin coating method. However, for example, when coating on a large-diameter liquid crystal substrate, a slit coating method or the like may be employed. .
In the coating solution of the present invention, the meaning of “coating the composition on the substrate” means not only directly coating the composition on a substrate such as a silicon wafer, but also processing the semiconductor formed on the substrate. It also includes applying to the upper part of the protective film and other coating films.

Process (2 )
In this step, the coating film applied in the step (1) is dried at a temperature of 25 to 120 ° C, preferably 40 to 100 ° C. Here, when this operation is performed at a temperature of less than 25 ° C., the coating film is insufficiently dried, and therefore, when a patterning mask is placed in the subsequent step (3), If the desired patterning cannot be performed and the temperature exceeds 120 ° C., crosslinking of the silicon compound may proceed due to the basic catalyst component contained in the coating film. It becomes difficult to form a clear pattern on the substrate in the process.

Further, this drying treatment is performed for 10 to 300 seconds, preferably 30 to 180 seconds, although it varies depending on the film thickness of the coating film. Here, if this operation is performed in less than 10 seconds, the patterning mask is deposited on the surface of the coating film in the subsequent step (3), so that the desired patterning cannot be performed and 300 seconds. When the above is performed, the silicon compound may be cross-linked by the basic catalyst component contained in the coating film, so that it becomes difficult to form a clear pattern on the substrate in the process described later. .
Further, the drying treatment can be performed in an air atmosphere or an inert gas atmosphere such as nitrogen gas, but it is preferable to perform the drying process in an air atmosphere. This is because the process is performed for a short time under a low temperature condition of 120 ° C. or lower, so that even if heat treatment is performed in an air atmosphere containing a relatively large amount of oxygen, it is disposed on the top of the semiconductor substrate or the like. This is because the metal wiring or the like is not damaged by metal oxidation or the like.
In addition, it is preferable to perform this drying process by mounting the board | substrate obtained at the said application | coating process on a single wafer type hotplate.

Process (3 )
In this step, a patterning mask is placed on the coating film dried in the step (2).
Here, as long as the mask for patterning is made of a material that does not transmit ultraviolet rays except for the opening and can withstand ultraviolet irradiation, the mask used for conventional photoresists is used as it is. can do. For example, a conventionally known patterning mask used for an insulating film for a semiconductor interlayer insulating film, an insulating film for element isolation, an insulating film for a liquid crystal TFT element, and the like can be appropriately selected and used according to the application.

Process (4 )
In this step, the coating film masked in the step (3) is irradiated with ultraviolet rays.
The irradiation amount of ultraviolet rays used in this step is not particularly limited because it may vary depending on the type of coating film to be patterned and the slit interval of the patterning mask, but the unit area of the coating film It is preferable that the amount of irradiation per unit area be in the range of ² to 1000 mJ / cm ² (including a value near the wavelength 254 nm and a value near the wavelength 405 nm defined below). More specifically, in the case of using an ultraviolet lamp capable of irradiating ultraviolet rays including a low wavelength region of less than 300 nm, particularly a wavelength region of about 254 nm, the integrated irradiation amount is in the range of ² to 140 mJ / cm ² (a value in the vicinity of a wavelength of 254 nm). In addition, when an ultraviolet lamp capable of irradiating ultraviolet rays having a wavelength region of 300 to 480 nm is used, the integrated irradiation amount is preferably in the range of 10 to 1000 mJ / cm ² (value in the vicinity of a wavelength of 405 nm). . Here, the integrated irradiation amount, is less than 2 mJ / cm ² with the former UV lamp (a value in the vicinity of a wavelength of 254 nm), is less than more 10 mJ / cm ² in the latter the ultraviolet lamp (value around a wavelength of 405 nm) In this case, the acid generated from the acid generator becomes insufficient, and when the integrated irradiation amount exceeds 140 mJ / cm ² (value near the wavelength of 254 nm) with the former ultraviolet lamp, further 1000 mJ with the latter ultraviolet lamp. If it exceeds / cm ² (value in the vicinity of a wavelength of 405 nm), the amount of acid generated from the acid generator may be excessive, and the time required for ultraviolet irradiation will be relatively long, which is not preferable.
In the above, “ultraviolet ray irradiation amount” means the amount of ultraviolet ray irradiated per unit area (cm ² ) of the coating film, and “cumulative irradiation amount” means that the coating film is applied per second. It means a value obtained by multiplying the amount of irradiated ultraviolet light (hereinafter sometimes referred to as “illuminance”) by the irradiation time (seconds). In addition, in the above, “value near wavelength 254 nm” means a value obtained by measuring the amount of ultraviolet light near wavelength 254 nm (approximately 240 to 270 nm) with a sensor, and “value near wavelength 405 nm” Means a value obtained by measuring the amount of ultraviolet rays in the vicinity of a wavelength of 405 nm (approximately 360 to 480 nm) with a sensor. In addition, these shall be interpreted similarly in the following.

In order to achieve the above-mentioned ultraviolet irradiation amount, when the former ultraviolet lamp is used, the illuminance on the coating film surface is set to 0.5 to 5.0 mW / cm ² (a value near a wavelength of 254 nm). It is preferable to carry out for 0.4 to 280 seconds. In the case of using the latter ultraviolet lamp, the illuminance on the coating film surface is set to 5 to 50 mW / cm ² (a value in the vicinity of a wavelength of 405 nm). It is preferable to carry out over 2 to 200 seconds.
Thereby, the acid generator contained in the coating film in the region irradiated with the ultraviolet rays (located below the opening of the patterning mask) decomposes to generate an acid. For example, an example of using a sulfonium salt acid generator is as follows.

In the present invention, if a malfunction occurs in any of the above steps, that is, any of the steps (1) to (4), the next heating step, that is, the step (5) It is desirable to directly apply to the following steps, that is, steps (6) and (7), without being subjected to the above). This is because when the silica-based coating film formed on the substrate in the steps (1) to (4) is immersed in a developer, the crosslinking of the silicon compound contained in the coating film has not progressed. This is because it elutes into the developer.
As a result, a relatively expensive substrate, such as a semiconductor substrate or a liquid crystal TFT substrate, can be easily reproduced, resulting in a high yield and extremely economical. That is, if the substrate regenerated in this manner is subjected again to each of the above steps, a substrate having a patterned silica-based coating film can be easily obtained. Therefore, this is also an advantage of the present invention.

Process (5 )
In this step, the coating film irradiated with ultraviolet rays in the step (4) is heat-treated at a temperature of 100 to 200 ° C, preferably 130 to 190 ° C. Here, if this operation is performed at a temperature lower than 100 ° C., the progress of crosslinking of the silicon compound contained in the coating film in the ultraviolet non-irradiated region becomes insufficient, so that it is immersed in the developer in the subsequent step (6). When these are dissolved, and when performed at a temperature exceeding 200 ° C., crosslinking of the silicon compound contained in the coating film in the ultraviolet irradiation region proceeds by heat, so that the subsequent step (6) However, these are not preferred because they will not dissolve even when immersed in a developer.
Moreover, although this heat processing changes with film thickness etc. of a coating film, it is desirable to carry out for 10 to 300 seconds, Preferably it takes 30 to 180 seconds. Here, if this operation is performed in less than 10 seconds, the progress of the crosslinking of the silicon compound contained in the coating film in the ultraviolet non-irradiated region becomes insufficient, so when immersed in the developer in the subsequent step (6) If these are dissolved, and if it is carried out for 300 seconds or more, the crosslinking of the silicon compound contained in the coating film in the ultraviolet irradiation region proceeds by heat, the developer in the subsequent step (6) These are not preferred because they will not dissolve even when immersed.

Further, the heat treatment can be performed in an air atmosphere or an inert gas atmosphere such as nitrogen gas, but it is preferable to perform the heat treatment in an air atmosphere. This is because the treatment is performed for a short time under a low temperature condition of 200 ° C. or less, so that even if heat treatment is performed in an air atmosphere containing a relatively large amount of oxygen, the metal wiring disposed on the semiconductor substrate is used. This is because no damage is caused by metal oxidation or the like.
In addition, it is preferable to perform this heat processing by mounting the board | substrate obtained at the said application | coating process on a single wafer type hotplate.

Thereby, the basic catalyst component (for example, ammonia) contained in the silica-based fine particles is released to the outside of the particles and reacts with the acid. Further, since the amine compound also reacts with the acid, the acid compound or alkali compound capable of promoting the crosslinking of the silicon compound is hardly present alone or in a small amount in the coating film irradiated with ultraviolet rays. It will only exist.
On the other hand, since the acid generator is not decomposed and generated in the coating film in the non-irradiated region of ultraviolet rays, the above neutralization reaction does not occur, and as a result, the basic catalyst component released from the silica-based fine particles. The crosslinking of the silicon compound can be promoted by the action and effect of (for example, ammonia) and the amine compound. Therefore, in this region, a silica-based coating film having a certain degree of cross-linking of —O—Si—O— bonds is formed. The amine compound reacts with and diffuses into the coating film when the acid generated in the coating film irradiated with ultraviolet rays oozes out into the coating film not irradiated with ultraviolet rays. It plays a role to prevent

Process (6 )
In this step, the coating film heat-treated in the step (4) is immersed in a developing solution to dissolve the coating film in the ultraviolet irradiation region (that is, the portion where the crosslinking of the silicon compound has not progressed).
The developer used in this step can be appropriately selected from conventionally known commercially available products. That is, it can be used without particular limitation as long as it can dissolve and wash away the coating film in the ultraviolet irradiation region, but at least one selected from tetraalkylammonium hydroxide, sodium hydroxide and potassium hydroxide. An aqueous solution of a seed alkali compound is preferred. Among these, it is particularly preferable to use an alkali compound made of tetraalkylammonium hydroxide such as tetramethylammonium hydroxide or tetraethylammonium hydroxide.
Further, the immersion time in the developer is preferably 1 to 20 minutes, although it varies depending on the type of the developer. Here, if the immersion time is less than 1 minute, the coating film may be insufficiently dissolved in the ultraviolet irradiation region. If the immersion time exceeds 20 minutes, the ultraviolet irradiation region is not irradiated. This is not preferable because the developer enters the coating film and may dissolve the uncrosslinked component which is present in a very small amount.

Process (7 )
In this step, the coating film and the substrate immersed in the developer in the step (6) are washed. As a result, the residue (neutralization reaction product, etc.) after dissolving the silicon compound or silica-based fine particles that are hardly cross-linked with the developer is washed away, and the developer is removed from the coating film or the substrate. Wash and remove.
The cleaning liquid used in this step varies depending on the use of the silica-based coating film to be formed (for example, a coating film for a semiconductor interlayer insulating film), but pure water (ion exchange water), ultrapure water, or the like may be used. This washing operation is preferably performed until the developer or the like is completely removed.
As a result, a desired pattern can be formed on the coating film, and a groove (concave portion) can be applied without performing an operation of patterning and etching a conventional positive resist and removing the positive resist. Can be built on a membrane.

The method for forming a patterned silica coating film using the coating solution of the present invention is as described above, but it is desirable to further perform the following steps.
Immersion step As described above, when a patterning mask is placed on the coating film dried in the step (2) and irradiated with ultraviolet rays, the acid generator decomposes to generate an acid. If this coating film is processed in the subsequent steps (5) to (7), a silica-based coating film having a desired patterning can be obtained. However, if the degree of drying of the coating film in the step (2) is too high, a desired pattern may not be formed on the coating film.
Then, the present inventors repeated earnest examination, and after immersing the coating film dried at the said process (2) in a pure water or ultrapure water etc., this is followed by subsequent process (3)-(7 ), It was found that such a problem does not occur. Although the reason is not necessarily clear, it is considered that moisture is involved in the decomposition of the acid generator or the generation of acid that occurs when the dried coating film is irradiated with ultraviolet rays.

Therefore, in the method for forming a silica-based coating film, it is preferable that the coating film dried in the step (2) is further dipped in pure water or ultrapure water to wet the coating film. However, when the dry coating film contains a certain amount of moisture, it is not always necessary to perform this immersion treatment. Here, pure water refers to ion-exchanged water, and ultrapure water refers to water from which impurities contained in pure water are further removed, and an impurity content of 0.01 μg / L or less.
In addition, although the immersion time of the said dried coating film changes also with the drying degree of the coating film in the said process (2) etc., it is preferable that it is 5 to 30 minutes. Here, when the immersion time is less than 5 minutes, the dried coating film cannot be sufficiently moistened, and when the immersion time exceeds 30 minutes, a baking treatment is performed by a method such as a baking step described later. Since there is a possibility of increasing the relative dielectric constant of the coated film, it is not preferable.

Firing step If each of the steps (1) to (6) (and the immersion step if necessary) is performed, a silica-based coating film having a desired patterning on the surface can be obtained.
However, this silica-based coating film (the coating film in the non-irradiated region of the ultraviolet rays) can be obtained as a result of the crosslinking of the silicon compound being advanced to some extent as described in the step (4). In the step (4), since the heating is performed only at a temperature of 100 to 200 ° C., a silica-based coating film having sufficiently advanced crosslinking cannot be obtained. Therefore, this silica-based coating film cannot be used as it is for applications requiring relatively high coating strength, relatively low dielectric constant, and relatively high hygroscopic resistance (hydrophobicity).
Therefore, when used in such applications (for example, semiconductor interlayer insulating film, etc.), the silica-based coating film obtained in the step (6) is further dried and then 300 to 450 ° C., preferably 350 to It is desirable to perform a baking treatment at a temperature of 400 ° C. Here, when this operation is performed at a temperature of less than 300 ° C., crosslinking of the silicon compound does not proceed well, so that a coating film having sufficient coating strength cannot be obtained, and when performed at a temperature exceeding 450 ° C., For example, it is not preferable because aluminum wiring, copper wiring, etc. constituting the semiconductor substrate may be oxidized or melted to cause fatal damage to the wiring layer.

Moreover, although this baking process changes also with the kind of said silicon compound, the film thickness of a coating film, It is desirable to carry out for 5 to 90 minutes, preferably 10 to 60 minutes. Here, do this operation If it is performed in less than 5 minutes, the silicon compound is not sufficiently cross-linked, so that a coating film having sufficient coating strength cannot be obtained. Or copper wiring may be oxidized or melted, which may cause fatal damage to the wiring layer.
Furthermore, it is preferable to perform this baking process in inert gas atmosphere, such as nitrogen gas. However, an inert gas (described in International Application WO01 / 48806 A1) containing a small amount of oxygen (for example, oxygen of about 500 to 10,000 ppm by volume) can be used by adding oxygen gas or air thereto. This is because if this firing process is performed in an air atmosphere at a relatively high temperature (for example, 400 ° C. or higher), metal wiring or the like disposed on the semiconductor substrate is damaged by metal oxidation or the like. It is.
In addition, it is preferable to perform this heat processing by mounting the board | substrate obtained at the said application | coating process on a single wafer type hotplate.

[Patterned silica-based coating film]
Next, the silica-type coating film obtained from said method is demonstrated.
As described above, if the coating liquid for forming a silica-based coating film according to the present invention is used, the silica-based coating film itself has patterning characteristics without adopting a patterning method using a photoresist. It is possible to form a silica-based coating film having a relatively high coating strength and a relatively low relative dielectric constant, and having excellent surface flatness, crack resistance, heat resistance, etc. it can.
That is, if the silica-based coating film-forming coating solution is used, a desired photoresist forming operation, removal / cleaning operation, and coating film etching operation, which have been conventionally employed, can be performed as desired. A patterned silica coating film can be easily obtained.

Further, the silica-based coating film (particularly, the coating film in the ultraviolet non-irradiated region) obtained from the baking step has a relatively high coating film strength having a Young's modulus of 3.0 GPa or more, preferably 5.0 GPa or more. It has a relatively low relative dielectric constant of 4.0 or less, preferably 3.5 or less, and even if the surface of the coating film is not subjected to polishing treatment, the surface roughness (Rms) is 5 It has a smooth surface of 0.0 nm or less.
Furthermore, even if the silica-based coating film (particularly, the coating film in the ultraviolet non-irradiated region) is a relatively thick film (5 μm or less), generation of cracks, pinholes, etc. is recognized on the surface of the coating film. In addition, even when exposed to an atmosphere at a relatively high temperature (400 ° C. or lower), the coating film has a characteristic that no deterioration is observed.
In addition to the above properties, the silica-based coating film (particularly, a coating film in an ultraviolet non-irradiated region) is excellent in chemical resistance such as adhesion to a coating film forming surface such as a semiconductor substrate and alkali resistance, Furthermore, it has excellent characteristics in process compatibility such as oxygen plasma resistance and etching processability.
The coating solution of the present invention capable of forming a silica-based coating film having such characteristics is provided on a semiconductor substrate, on a wiring layer having a multilayer wiring structure, on a device surface and / or on a substrate having a PN junction, or on the substrate. It is used to form a silica-based coating film, particularly a silica-based insulating film, between the multilayer wiring layers provided on the substrate. Among these, it is preferable to use for the purpose of forming an interlayer insulating film for a semiconductor, an insulating film for a liquid crystal TFT element, an insulating film for a sensor device, an insulating film for a display device, and the like.

〔Measuring method〕
Next, the measurement methods employed in the examples and others of the present invention will be specifically described as follows.
(1) Average particle diameter of silica-based fine particles A 100,000 times magnified image of the silica-based fine particles contained in the water-alcohol dispersion (sample) was taken with a transmission electron microscope (TEM) (H-Hitachi High-Tech, Ltd.). 800) is parsed with a Luzex automatic image processing analyzer (LUZEX-AP manufactured by Nicole), and the average particle diameter of the silica fine particles is calculated using the attached analysis software.

(2) Content of basic catalyst component contained in silica-based fine particles (a) Basic catalyst component contained in water-alcohol dispersion (sample) in which silica-based fine particles containing basic catalyst component are dispersed In order to measure the total amount (for example, the amount of ammonia), after adding the aqueous sodium hydroxide solution to dissolve the silica-based fine particles, the basic gas generated by heating is diluted with dilute sulfuric acid (H ₂ SO ₄ : 0.05 mol / Absorb in aqueous solution containing L). Next, 2 to 3 drops of methyl red solution are added thereto, and titrated with an aqueous sodium hydroxide solution (NaOH: 0.1 mol / L), and the total amount (Q1) of the basic catalyst component contained in the dispersion is determined. taking measurement.
(B) Next, the water-alcohol dispersion (sample) is centrifuged at a rotational speed of 3000 rpm (centrifugal concentrator: VS2001 manufactured by ASONE, centrifuge: KUBOTA 6930 manufactured by KUBOTA) The contained silica-based fine particles are separated. Next, the amount of the basic catalyst component (for example, the amount of ammonia) contained in the obtained dispersion medium is changed to the total amount of the basic catalyst component (Q2) contained in the dispersion medium in the same manner as in the above (a). ).
(C) The basic catalyst component contained in the silica-based fine particles by subtracting the basic catalyst component amount (Q2) measured in (b) from the basic catalyst component amount (Q1) measured in (a). The amount (Q) of the component is calculated.

(3) pH measurement of liquid composition The pH is measured using a pH meter (manufactured by HORIBA: D-54). An aqueous solution having a known hydrogen ion concentration is filled in an electrode glass tube, the electrode is brought into contact with a liquid composition that is a measurement sample, and the aqueous composition is filled in the electrode glass tube. Measure the potential difference between. Next, the pH is obtained by calculating the hydrogen ion concentration in the liquid composition from the measured potential difference.

(4) The number average molecular weight of the silicon compound is measured by a GPC (Gel Phase Chromatography) method using a device for measuring the molecular weight (GPC8020 manufactured by Tosoh Corporation). That is, 1 mL of a liquid composition as a sample is placed on an eluent, and passed through a gel column (manufactured by Tosoh Corporation: TSKgel, Tosoh Corporation: G5000Hxl, TSKgel G3000Hxl connected) to hydrodynamically remove the molecular components in the sample. They are separated according to the size of the volume, and the molecular weight distribution is measured by the refractive index difference from the reference every time. Next, the number average molecular weight in terms of polystyrene is calculated by converting the measured molecular weight distribution in comparison with the distribution of polystyrene having a known molecular weight measured in advance.

(5) 10 mL of a liquid composition as a sample for measuring the ionic concentration of the liquid composition is mixed with 90 mL of purified pure water and stirred at room temperature for 1 hour, and then the mixture is filtered. Collect the filtrate through purified water. Next, the concentration of cations such as metal ions contained in the recovered filtrate is measured by atomic absorption, and the concentration of anions such as basic catalyst components is measured by ion chromatography.

(6) A liquid composition as a relative dielectric constant sample of a silica-based coating is applied on a silicon wafer by a spin coating method at a rotational speed of 4000 rpm, dried at a temperature of 120 ° C. for 5 minutes, and then in a nitrogen atmosphere. Baked at 350 ° C. for 30 minutes to form a coating film (silica-based coating film). Subsequently, it measures by the mercury probe method (SSM495 by Solid State Measurements, frequency 1MHz). That is, a mercury electrode is brought into contact with the coating film, the electric capacity of the coating film is measured by changing the voltage, and the relative dielectric constant of the coating film is calculated from the obtained electric capacity and film thickness.

(7) A liquid composition as a coating strength sample of a silica-based coating is applied on a silicon wafer by a spin coating method at a rotational speed of 4000 rpm, dried at a temperature of 120 ° C. for 5 minutes, and then in a nitrogen atmosphere. Baked at 350 ° C. for 30 minutes to form a coating film (silica-based coating film). Next, Young's Modulus is measured by the nanoindentation method (Nanoindenter XP manufactured by MTS Systems Corp). That is, a diamond indenter is pressed into the coating film, and the contact area and the pressing strength between the indenter and the coating film are measured to calculate the Young's elastic modulus.

(8) After applying a liquid composition as a crack resistant limit film thickness sample of a silica-based coating film on a silicon wafer at a rotational speed of 300 to 700 rpm by a spin coat method and drying at 120 ° C. for 5 minutes. Then, it is baked at a temperature of 350 ° C. for 30 minutes in a nitrogen atmosphere to form a coating film (silica-based coating film). Next, the obtained coating film is observed with a microscope (magnification: 50 times) to confirm the presence or absence of cracks. Furthermore, the limit film thickness which does not generate | occur | produce a crack is measured by the contact-type level | step difference film thickness measuring method (SURFCOM1400D by ACCRETECH).

(9) Surface roughness of silica-based coating film A liquid composition as a sample was applied on a silicon wafer by a spin coating method at a rotation speed of 4000 rpm and dried at a temperature of 120C for 5 minutes. Then, it is baked at a temperature of 350 ° C. for 30 minutes in a nitrogen atmosphere to form a coating film (silica-based coating film). Next, a cantilever with a probe (Nippon Biko Co., Ltd. NCH-10V) in which conductivity is imparted to the coating film is scanned, and the surface shape is observed from the intermolecular force between the probe and the coating film. (Rms) is calculated.

EXAMPLES Hereinafter, although this invention is demonstrated in detail based on an Example, this invention is not limited to these Examples.
[Preparation Example 1]
1268 g of bedding water consisting of 508 g of 99.9% by weight methanol (manufactured by Kanto Chemical Co., Inc.) and 760 g of pure water was prepared. 16052 g of 99.9% strength by weight methanol and 8452 g of ethyl silicate (manufactured by Tama Chemical Industry Co., Ltd.) were added and 24500 g of a stirred ethyl silicate solution was prepared.
Next, 1268 g of the floor water was heated to 65 ° C. and held, and 24500 g of the ethyl silicate solution and 9490 g of 1.9 wt% ammonia water were simultaneously added to the mixture over 5 hours with stirring. After completion of the addition, the mixture was further aged for 3 hours while maintaining the above temperature to obtain 35258 g of a water-methanol dispersion (hereinafter referred to as “water-methanol dispersion”) containing 7.4% by weight of silica fine particles. .

Next, the obtained water-methanol dispersion was cooled to room temperature, and after adding 20340 g of pure water to 31860 g of the water-methanol dispersion, the mixture was stirred and then subjected to an ultrafiltration filter (Asahi Kasei) at 25 ° C. Using ACP-2013), it was concentrated until its weight reached 18711 g. As a result, 18711 g of a water-methanol dispersion (hereinafter referred to as “water-methanol purified solution”) from which the unreacted or intermediate reactants of the ethyl silicate contained in the water-methanol dispersion were removed was obtained. .

Subsequently, 13860 g of ethanol (manufactured by Wako Pure Chemical Industries, Ltd.) 13860 g was added to 10395 g of the purified water-methanol solution obtained above, and the mixture was stirred, and then at a temperature of 25 ° C. The ultrafiltration filter was used to concentrate until the weight reached 10395 g. Further, 13860 g of ethanol was added to the obtained dispersion and stirred, and then concentrated again using the ultrafiltration filter until the weight became 10395 g. As a result, 10395 g of a water-ethanol dispersion liquid (hereinafter referred to as “water-ethanol dispersion liquid”) containing silica fine particles in which water and methanol contained in the water-methanol purified liquid were replaced with a solvent was obtained.

2703 g of ethanol was added to this water-ethanol dispersion to adjust the concentration of silica-based fine particles contained in the dispersion to 10% by weight, and further concentrated using a rotary evaporator (RE20EU manufactured by Shibata Kagaku Co., Ltd.). Sample 1A6752g of a water-ethanol dispersion containing 19.4% by weight of silica fine particles was obtained.
The average particle diameter of the silica-based fine particles contained in the sample 1A thus obtained was measured and found to be approximately 20 nm.
Furthermore, when the total content of ammonia contained in the sample 1A and the content of ammonia contained in the silica-based fine particles were measured, the results were as shown in Table 1.

[Preparation Example 2]
In the same manner as in Preparation Example 1, 18711 g of a purified water-methanol solution was prepared.
Next, 10150 g of the prepared water-methanol purified solution was taken out, 47 g of 29 wt% ammonia water was added and stirred, and then placed in an autoclave (Pressure Glass Industry Co., Ltd., TAS-13 type). The silica fine particles contained in the water-methanol purified liquid were aged by treatment at a temperature of 15 ° C. for 15 hours.
Next, 10045 g of a water-methanol purified solution (ripening solution) obtained by cooling this to room temperature was taken out, 13020 g of pure water was added and stirred, and then using an ultrafiltration filter at 25 ° C. And concentrated to 9998 g. Further, after adding 13020 g of pure water and stirring, the operation of concentrating until the weight became 9998 g using the ultrafiltration filter was repeated twice. As a result, 9998 g of a purified water-methanol solution from which ammonia contained in the silica-based fine particles was partially removed was obtained.

Next, 13331 g of ethanol (manufactured by Wako Pure Chemical Industries, Ltd.) 13331 g was added to 9998 g of the water-methanol purified solution obtained above and stirred, followed by filtration using an ultrafiltration filter under a temperature condition of 25 ° C. And concentrated to 9998 g. Further, 13331 g of ethanol was added and stirred, and then concentrated again using the ultrafiltration filter until the weight became 9998 g. As a result, 9998 g of a water-ethanol dispersion in which water and methanol contained in the water-methanol dispersion were replaced with a solvent was obtained.
2600 g of ethanol is added to this water-ethanol dispersion to adjust the concentration of silica-based fine particles contained in the dispersion to 10% by weight, and further concentrated using a rotary evaporator (RE20EU, manufactured by Shibata Kagaku Co., Ltd.). In addition, 6494 g of a water-ethanol dispersion sample 2A containing 19.4% by weight of silica fine particles was obtained.
The average particle size of the silica-based fine particles contained in the sample 2A thus obtained was measured and found to be approximately 25 nm.
Further, in the same manner as in Preparation Example 1, the total ammonia content contained in the sample 2A and the ammonia content contained in the silica-based fine particles were measured.

[Preparation Example 3]
Until a water-methanol purified solution was obtained, 18711 g of a water-methanol purified solution was obtained in the same manner as in Preparation Example 1.
Subsequently, 9998 g of the obtained water-methanol purified solution was taken out, and 13331 g of pure water was again added and stirred in order to reduce the ammonia concentration. Was concentrated to 9998 g. Next, 13331 g of ethanol (manufactured by Wako Pure Chemical Industries, Ltd.) was added and stirred, and then concentrated using an ultrafiltration filter under a temperature condition of 25 ° C. until its weight reached 9998 g. Furthermore, after adding 13331g of ethanol and stirring, it concentrated until the weight became 9998g again using the said ultrafiltration filter. As a result, 9998 g of a water-ethanol dispersion in which water and methanol contained in the water-methanol purified solution were substituted by solvent was obtained.

2600 g of ethanol is added to this water-ethanol dispersion to adjust the concentration of silica-based fine particles contained in the dispersion to 10% by weight, and further concentrated using a rotary evaporator (RE20EU, manufactured by Shibata Kagaku Co., Ltd.). As a result, 6494 g of a water-ethanol dispersion sample 3A containing 19.4% by weight of silica fine particles was obtained.
The average particle diameter of the silica-based fine particles contained in the sample 3A thus obtained was measured and found to be approximately 25 nm.
Further, as in the case of Preparation Example 1, the total content of ammonia contained in the sample 3A and the content of ammonia contained in the silica-based fine particles were measured, and as shown in Table 1.

[Preparation Example 4]
Until a water-methanol purified solution was obtained, 18711 g of a water-methanol purified solution was prepared in the same manner as in Preparation Example 1.
Next, 10150 g of the water-methanol purified solution was taken, and in order to increase the ammonia concentration in the sample, 190 g of 29 wt% ammonia water was added to the water-methanol purified solution and stirred, and then the autoclave ( It was put into a pressure-resistant glass industry, TAS-13 type), and treated at a temperature of 150 ° C. for 15 hours to mature the silica fine particles contained in the water-methanol purified solution.
Next, 10045 g of 10340 g of the water-methanol purified solution (ripening solution) obtained by cooling this to room temperature was taken out, 13020 g of pure water was added and stirred, and then ultrafiltration was performed at a temperature of 25 ° C. Using a filter, the solution was concentrated to 9861 g. Further, after adding 13020 g of pure water and stirring, the operation of concentrating until the weight became 9861 g using the ultrafiltration filter was repeated twice. As a result, 9861 g of a purified water-methanol solution from which ammonia contained in the silica-based fine particles was partially removed was obtained.

Next, 13147 g of ethanol (manufactured by Wako Pure Chemical Industries, Ltd.) 13147 g was added to 9861 g of the purified water-methanol solution obtained above, and the mixture was stirred, and then the ultrafiltration filter was used under a temperature condition of 25 ° C. Concentrated to a weight of 9861 g. Furthermore, after adding 13147g of ethanol and stirring, it concentrated again using the said ultrafiltration filter until the weight became 9861g. As a result, 9861 g of a water-ethanol dispersion obtained by substituting the water and methanol contained in the purified water-methanol solution with a solvent was obtained.
2564 g of ethanol is added to this water-ethanol dispersion to adjust the concentration of silica-based fine particles contained in the dispersion to 10% by weight, and further concentrated using a rotary evaporator (RE20EU manufactured by Shibata Kagaku Co., Ltd.). Thus, 6404 g of a water-ethanol dispersion sample 4A containing 19.4% by weight of silica fine particles was obtained.
The average particle size of the silica-based fine particles contained in the sample 4A thus obtained was measured and found to be approximately 25 nm.
Further, as in the case of Preparation Example 1, the total content of ammonia contained in the sample 4A and the content of ammonia contained in the silica-based fine particles were measured, and as shown in Table 1.

[Example 1]
6050 g each of the sample 1A prepared in Preparation Example 1 and the sample 2A prepared in Preparation Example 2 (both water-ethanol dispersions containing 19.4% by weight of silica fine particles) were taken out and added to methyltrimethoxy. 1778 g of silane (MTMS, manufactured by Shin-Etsu Chemical Co., Ltd.) and 1409 g of 0.44 wt% nitric acid (manufactured by Kanto Chemical Co., Ltd.) were mixed and heated gradually from room temperature to a temperature of 50 ° C. . Further, the methyltrimethoxysilane was partially hydrolyzed and / or hydrolyzed with stirring at a speed of 200 rpm for 15 hours while maintaining this temperature (50 ° C.).
When the pH of the mixed solution at this time was measured, the sample using the sample 1A was initially (before heating) and had a pH of 2.1 due to the influence of nitric acid added as an acidic catalyst component. .8 and stabilized in that state. In addition, the sample using the sample 2A initially (before heating) had a pH of 2.4 due to the influence of nitric acid added as an acidic catalyst component, but became pH 8.0 as the temperature increased, and stabilized in that state. . That is, it was found that ammonia as a basic catalyst component was released from the silica-based fine particles contained in the sample and contributed to the partial hydrolysis reaction and / or hydrolysis reaction of the methyltrimethoxysilane.

Next, the obtained water-ethanol dispersion was subjected to a rotary evaporator (RE20EU, manufactured by Shibata Kagaku Co., Ltd.), and water and ethanol contained in the dispersion were mixed with propylene glycol monomethyl ether (PGM, Daicel Chemical Industries, Ltd.). )) And solvent substitution. Furthermore, the content of the silicon compound contained in the solvent-substituted PGM solution was adjusted to 25% by weight on the basis of SiO ₂ to prepare an organic solvent-based mixed solution 1B (prepared using the sample 1A). ) And an organic solvent-based mixed solution 2B (prepared using the sample 2A).
Next, 200 g of these organic solvent mixed liquids 1B and 2B was collected, and 0.05 g of triphenylsulfonium trifluoromethanesulfonate (manufactured by Wako Pure Chemical Industries, Ltd.) was dispersed in 0.45 g of propylene glycol monomethyl ether. 0.5 g of the acid generator solution was added with stirring. Next, the mixture was sufficiently stirred and mixed to obtain liquid compositions 1C and 2C.
The number average molecular weight (polystyrene conversion standard) of the silicon compound (hydrolyzate) contained in the liquid composition thus obtained, the content of the basic catalyst component (ammonia) in the silica-based fine particles, and the acid generator When the molar ratio of (X) / basic catalyst component (Y) was measured and calculated, it was as shown in Table 2.

[Example 2]
Sample 2A prepared in Preparation Example 2, phenyltrimethoxysilane (PhTMS, manufactured by Shin-Etsu Chemical Co., Ltd.) and phenyltrichlorosilane (PhTCS, manufactured by Shin-Etsu Chemical Co., Ltd.) instead of methyltrimethoxysilane In the same manner as in Example 1, except that each was used, an organic solvent mixed solution 3B containing 25% by weight of a silicon compound as a reactant based on SiO ₂ (using the above sample 2A and phenyltrimethoxysilane) And an organic solvent mixed solution 4B (prepared using the sample 2A and phenyltrichlorosilane).
Next, 200 g of these organic solvent-based mixed liquids 3B and 4B was collected, and 0.5 g of an acid generator solution in which 0.05 g of triphenylsulfonium trifluoromethanesulfonate was dispersed in 0.45 g of propylene glycol monomethyl ether was added thereto. Added under stirring. Next, the mixture was sufficiently stirred and mixed to obtain liquid compositions 3C and 4C.
The number average molecular weight (polystyrene conversion standard) of the silicon compound (hydrolyzate) contained in the liquid composition thus obtained, the content of the basic catalyst component (ammonia) in the silica-based fine particles, and the acid generator When the molar ratio of (X) / basic catalyst component (Y) was measured and calculated, it was as shown in Table 2.

[Example 3]
In the same manner as in Example 1, the organic solvent mixture 5B (prepared using the sample 1A) and the organic solvent mixture 6B (prepared using the sample 2A) Got.
Next, 200 g of these organic solvent mixture liquids 5B and 6B was collected, and 0.05 g of 2,4,6-trimethylphenyldiphenylsulfonium p-toluenesulfonate was dispersed in 0.45 g of propylene glycol monomethyl ether. 0.5 g of acid generator solution was added with stirring. Next, the mixture was sufficiently stirred and mixed to obtain liquid compositions 5C and 6C.
The number average molecular weight (polystyrene conversion standard) of the silicon compound (hydrolyzate) contained in the liquid composition thus obtained, the content of the basic catalyst component (ammonia) in the silica-based fine particles, and the acid generator When the molar ratio of (X) / basic catalyst component (Y) was measured and calculated, it was as shown in Table 2.

[Example 4]
In the same manner as in Example 1, the organic solvent mixture 7B (prepared using the sample 1A) and the organic solvent mixture 8B (prepared using the sample 2A) Got.
Next, 200 g of these organic solvent-based mixed liquids 7B and 8B were collected, and 0.05 g of bis (4-t-butylphenylsulfonyl) diazomethane was dispersed in 0.45 g of propylene glycol monomethyl ether. 0.5 g of solution was added under stirring. Next, the mixture was sufficiently stirred and mixed to obtain liquid compositions 7C and 8C.
The number average molecular weight (polystyrene conversion standard) of the silicon compound (hydrolyzate) contained in the liquid composition thus obtained, the content of the basic catalyst component (ammonia) in the silica-based fine particles, and the acid generator When the molar ratio of (X) / basic catalyst component (Y) was measured and calculated, it was as shown in Table 2.

[Comparative Example 1]
The methyltrimethoxysilane was partially hydrolyzed and / or hydrolyzed in the same manner as in Example 1 except that the sample 3A prepared in Preparation Example 3 was used.
When the pH of the mixed solution in the case of using the sample 3A was measured, it was initially 2.2 (because of the influence of nitric acid added as an acidic catalyst component), but gradually increased as the temperature increased. PH was 4.1. That is, it is found that the amount of ammonia released from the silica-based fine particles as a basic catalyst component is insufficient, and there are few basic catalysts that contribute to the partial hydrolysis reaction and / or hydrolysis reaction of the methyltrimethoxysilane. It was.

Next, the obtained water-ethanol dispersion was subjected to a rotary evaporator (RE20EU, manufactured by Shibata Kagaku Co., Ltd.), and water and ethanol contained in the dispersion were mixed with propylene glycol monomethyl ether (PGM, Nippon Emulsifier Co., Ltd.). And the solvent was replaced. Further, the content of the silicon compound contained in the solvent-substituted PGM solution was adjusted to 25% by weight on the basis of SiO ₂ to prepare an organic solvent-based mixed solution 9B (prepared using the sample 3A). )
Next, 200 g of these organic solvent-based mixed solutions 9B were collected, and 0.5 g of an acid generator solution in which 0.05 g of triphenylsulfonium trifluoromethanesulfonate was dispersed in 0.45 g of propylene glycol monomethyl ether was stirred. Added at. Next, the mixture was sufficiently stirred and mixed to obtain a liquid composition 9C.
The number average molecular weight (polystyrene conversion standard) of the silicon compound (hydrolyzate) contained in the liquid composition thus obtained, the content of the basic catalyst component (ammonia) in the silica-based fine particles, and the acid generator When the molar ratio of (X) / basic catalyst component (Y) was measured and calculated, it was as shown in Table 2.

[Comparative Example 2]
The methyltrimethoxysilane was partially hydrolyzed and / or hydrolyzed in the same manner as in Example 1 except that the sample 4A prepared in Preparation Example 4 was used.
When the pH of the mixed solution in the case of using the sample 4A was measured, the initial value (before heating) was pH 8.3, and increased slightly as the temperature increased to pH 8.5. Thus, despite the fact that the same amount of nitric acid as an acidic catalyst was mixed, the pH value was high from the beginning, and the value did not substantially change. This is because not only a large amount of ammonia is contained, but also a large amount of ammonia as a basic catalyst component is present in the silica-based fine particles. Thereby, it is expected that the hydrolysis reaction of the methyltrimethoxysilane proceeds too much due to excess ammonia (basic catalyst component).

Next, the obtained water-ethanol dispersion was subjected to a rotary evaporator (RE20EU, manufactured by Shibata Kagaku Co., Ltd.), and water and ethanol contained in the dispersion were mixed with propylene glycol monomethyl ether (PGM, Nippon Emulsifier Co., Ltd.). The product was replaced with a solvent. Furthermore, the content of the silicon compound contained in the solvent-substituted PGM solution was adjusted to 25% by weight on the basis of SiO ₂ , and an organic solvent mixed solution 10B (prepared using the above sample 4A) )
Next, 200 g of these organic solvent-based mixed solution 10B was collected, and 0.5 g of an acid generator solution in which 0.05 g of triphenylsulfonium trifluoromethanesulfonate was dispersed in 0.45 g of propylene glycol monomethyl ether was stirred. Added at. Next, the mixture was sufficiently stirred and mixed to obtain a liquid composition 10C.
The number average molecular weight (polystyrene conversion standard) of the silicon compound (hydrolyzate) contained in the liquid composition thus obtained, the content of the basic catalyst component (ammonia) in the silica-based fine particles, and the acid generator When the molar ratio of (X) / basic catalyst component (Y) was measured and calculated, it was as shown in Table 2. Moreover, it turned out that this liquid composition will gelatinize and will lack stability if it preserve | saves for a long period of time.

[Example 5 and Comparative Example 3]
In the same manner as in Example 1, organic solvent-based mixed liquids 11B, 12B, 13B, and 14B (both prepared using Sample 2A) were obtained.
Next, 200 g of each of these organic solvent-based mixed liquids 11B, 12B, 13B and 14B was sampled, and the acid generator solution (5 g of triphenylsulfonium trifluoromethanesulfonate was dispersed in 45 g of propylene glycol monomethyl ether). Liquid compositions 11C, 12C, 13C and 14C were obtained in the same manner as in Example 1 except that 0.03 g, 0.38 g, 1.26 g and 9.47 g were added respectively.
The number average molecular weight (polystyrene conversion standard) of the silicon compound (hydrolyzate) contained in the liquid composition thus obtained, the content of the basic catalyst component (ammonia) in the silica-based fine particles, and the acid generator When the molar ratio of (X) / basic catalyst component (Y) was measured and calculated, it was as shown in Table 3.

[Example 6]
In the same manner as in Example 1, the organic solvent mixture 15B (prepared using the sample 1A) and the organic solvent mixture 16B (prepared using the sample 2A) Got.
Next, 200 g of these organic solvent mixture liquids 15B and 16B was collected, and 0.5 g of an acid generator solution in which 0.05 g of triphenylsulfonium trifluoromethanesulfonate was dispersed in 0.45 g of propylene glycol monomethyl ether was added thereto. Added under stirring. Next, the mixture was sufficiently stirred and mixed to obtain liquid compositions 15C and 16C.
Next, 0.5 g of an amine compound solution in which 0.5 g of triethanolamine was dispersed in 49.5 g of propylene glycol monomethyl ether was added to these liquid compositions 15C and 16C with stirring. Subsequently, it fully stirred and mixed and liquid composition 15D and 16D were obtained.
Content of basic catalyst component (ammonia) in silica-based fine particles contained in the liquid composition thus obtained, molar ratio of acid generator (X) / basic catalyst component (Y), and amine compound When the molar ratio of (Z) / acid generator (X) was measured and calculated, it was as shown in Table 4.

[Example 7 and Comparative Example 4]
In the same manner as in Example 1, organic solvent mixed liquids 17B, 18B, 19B and 20B (both prepared using Sample 2A) were obtained.
Next, 200 g each of these organic solvent-based mixed liquids 17B, 18B, 19B and 20B was collected, and the acid generator solution (0.5 g of triphenylsulfonium trifluoromethanesulfonate was added to 4.5 g of propylene glycol monomethyl ether). 0.5 g of the dispersion was added. Next, the mixture was sufficiently stirred and mixed to obtain liquid compositions 17C, 18C, 19C and 20C.
Next, 0.01 g of the amine compound solution (0.5 g of triethanolamine dispersed in 49.5 g of propylene glycol monomethyl ether) is added to each of these liquid compositions 17C, 18C, 19C and 20C. Liquid compositions 17D, 18D, 19D and 20D were obtained in the same manner as in Example 6 except that 0.11 g, 0.37 g and 2.76 g were added.
Content of basic catalyst component (ammonia) in silica-based fine particles contained in the liquid composition thus obtained, molar ratio of acid generator (X) / basic catalyst component (Y), and amine compound When the molar ratio of (Z) / acid generator (X) was measured and calculated, it was as shown in Table 4.

[Example 8 and Comparative Example 5]
In the same manner as in Example 1, organic solvent-based mixed liquids 21B, 22B, 23B, 24B, and 25B (both prepared using the sample 2A) were obtained.
Next, 200 g of each of these organic solvent-based mixed liquids 21B, 22B, 23B, 24B and 25B was collected, and 0.5 g of the acid generator solution (0.5 g of triphenylsulfonium trifluoromethanesulfonate was added to propylene glycol monomethyl ether. 0.5 g) was added in increments of 0.5 g. Next, the mixture was sufficiently stirred and mixed to obtain liquid compositions 21C, 22C, 23C, 24C and 25C.
Next, 0.5 g of the amine compound solution (0.5 g of triethanolamine dispersed in 49.5 g of propylene glycol monomethyl ether) was added. Next, the mixture was sufficiently stirred and mixed to obtain liquid compositions 21D, 22D, 23D, 24D and 25D.
Next, a sensitizer solution obtained by dispersing 0.3 g of 9,10-dipropoxyanthracene in 9.7 g of propylene glycol monomethyl ether as a sensitizer in these liquid compositions 21D, 22D, 23D, 24D and 25D. 0.02 g, 0.15 g, 0.24 g, 0.5 g and 1.07 g were added respectively. Next, the mixture was sufficiently stirred and mixed to obtain liquid compositions 21E, 22E, 23E, 24E and 25E.
The content of the basic catalyst component (ammonia) in the silica-based fine particles contained in the liquid composition thus obtained, the molar ratio of acid generator (X) / basic catalyst component (Y), amine compound The molar ratio of (Z) / acid generator (X) and the sensitizer (W) / acid generator (X) were measured and calculated as shown in Table 5.

[Example 9]
In the same manner as in Example 1, an organic solvent mixed solution 26B (prepared using the sample 2A) was obtained.
Subsequently, in the same manner as in Example 8, 0.5 g of the acid generator solution (0.5 g of triphenylsulfonium trifluoromethanesulfonate dispersed in 4.5 g of propylene glycol monomethyl ether) and the amine compound solution (triglyceride) (Liquid composition 26D containing 0.5 g of ethanolamine dispersed in 49.5 g of propylene glycol monomethyl ether) 0.5 g.
Next, 9,10-dibutoxyanthracene as a sensitizer is added to the liquid composition 26D. 0.26 g of a sensitizer solution in which 0.3 g was dispersed in 9.7 g of propylene glycol monomethyl ether was added. Next, the mixture was sufficiently stirred and mixed to obtain a liquid composition 26E.
The content of the basic catalyst component (ammonia) in the silica-based fine particles contained in the liquid composition thus obtained, the molar ratio of acid generator (X) / basic catalyst component (Y), amine compound The molar ratio of (Z) / acid generator (X) and the sensitizer (W) / acid generator (X) were measured and calculated as shown in Table 5.

[Example 10 and Comparative Example 6]
The liquid compositions 1C to 8C, 12C, 13C, 15D, 16D, 18D and 19D prepared in Examples 1 to 6, and the liquid compositions 9C, 10C and 11C prepared in Comparative Examples 1 to 4, 14C, 17D, and 20D were each dropped on a 6-inch silicon wafer substrate using a conventionally known spin coat method (Mikasa Co., Ltd .: 1H-360S) at a rate of 5 ml, and the coating treatment was performed at a speed of 500 rpm for 15 seconds. went. Such operations were repeated to obtain substrates 1C to 8C, 12C, 13C, 15D, 16D, 18D and 19D, and substrates 9C, 10C, 11C, 14C, 17D and 20D which had been subjected to the coating treatment.
Subsequently, these substrates were placed on a hot plate (IUCHI: EC-1200) and dried at 100 ° C. for 1 minute in an air atmosphere. In this drying process, the organic solvent (PGM) contained in the coating film evaporates and was discharged out of the system.

Next, the obtained substrate with a dry coating film was immersed in ultrapure water for 20 minutes to obtain a silica-based coating film (film thickness: about 1.5 μm).
Next, a patterning mask (manufactured by Dai Nippon Printing Co., Ltd.) for forming a 50 μm wide line-and-space 1: 1 pattern was placed on this silica-based coating film, and G-line (wavelength 435 nm) UV rays were applied onto the coating film using an ultraviolet lamp (AHD200, manufactured by Oak Seisakusho Co., Ltd.) having wavelength ranges of H rays (wavelength 405 nm), I rays (wavelength 365 nm), and germicidal rays (wavelength 254 nm). Irradiated for 2 seconds. At this time, two sensors attached to the ultraviolet lamp, that is, a sensor for measuring the amount of ultraviolet rays in the vicinity of a wavelength of 405 nm (manufactured by Iwasaki Electric Co., Ltd., UVPF-A1 PD-405) and the amount of ultraviolet rays in the vicinity of a wavelength of 254 nm. When the illuminance of UV rays and the integrated irradiation dose on the coating film surface were measured using a sensor (Iwasaki Electric Co., Ltd., UVPF-A1 PD-254) for measuring the illuminance, the former sensor had an illuminance of 7.6 mW. / Cm ² , the integrated dose (illuminance x irradiation time) is 152 mJ / cm ² , and the latter sensor has an illuminance of 1.0 mW / cm ² and an integrated dose (illuminance x irradiation time) of 20 mJ / cm ^2. Met. Thereby, the acid generator contained in the silica-based coating film (dry coating film) is decomposed to generate an acid.
Next, the obtained substrate with a silica-based coating film was heat-treated at a temperature of 180 ° C. for 1 minute in an air atmosphere. As a result, the basic catalyst component (ammonia) in the silica-based fine particles contained in the silica-based coating film is released out of the particles, and the reaction with the acid (neutralization reaction) occurs in the ultraviolet irradiation region. In addition, in the non-irradiated region of the ultraviolet ray, the silicon compound contained in the silica-based coating is cross-linked. Further, in the silica-based coating film formed on the substrates 15D to 20D, the amine compound contained in the coating film further promotes the neutralization reaction and crosslinking, and the acid is not irradiated with ultraviolet rays. It will suppress bleeding.

Subsequently, the obtained substrate with a silica-based coating film was prepared by mixing 11.9 g of tetramethylammonium hydroxide (TMAH (25%), manufactured by Tama Chemical Co., Ltd.) and 488.1 g of ultrapure water 2 The silica-based coating film was developed by immersing in 500 g of a 38 wt% TMAH aqueous solution (developer) for 5 minutes. Thereby, at least in the silica-based coating film formed on the substrate based on the embodiment, the silicon compound or neutralization reaction product existing in the ultraviolet irradiation region is dissolved and washed away by the developer.
Next, Example substrates 1C to 8C, 12C, 13C, 15D, 16D, and 18D having silica-based coatings obtained by washing the substrate with silica-based coatings for 1 minute using ultrapure water and performing patterning, and 19D and further comparative substrates 9C, 10C, 11C, 14C, 17D and 20D were obtained.

Table 6 shows the results obtained by observing and evaluating these substrates thus obtained using a scanning electron microscope (manufactured by JEOL Datum Co., Ltd., JSM-5600). These results were evaluated based on the following evaluation criteria.
(A) Presence / absence of pattern formation ○ A pattern is formed without any problem.
Δ Some foreign matter is seen in the ultraviolet irradiation region, but a pattern is formed.
x No pattern is formed.
(B) Presence or absence of acid oozing out to the ultraviolet non-irradiated region ○ No acid oozing is observed.
Δ Some exudation of acid is observed.
X Acid oozing is often observed.

In addition, photographs of 500 times magnification obtained by photographing the surface of the silica-based coating film patterned using the comparative example substrate 9C and the example substrate 16D with an optical microscope (manufactured by Olympus Corporation, MX50) are shown in FIG. As shown in FIG.
Furthermore, a photograph (SEM photograph) at a magnification of 1500 times obtained by photographing a cross section of the silica-based coating film patterned using the example substrate 16D with a scanning electron microscope (JSM-5600, manufactured by JEOL Datum Co., Ltd.). As shown in FIG.

[Example 11 and Comparative Example 7]
5 ml each of the liquid compositions 22E to 24E prepared in Example 8, the liquid composition 26E prepared in Example 9, and the liquid compositions 21E and 25E prepared in Comparative Example 5 are conventionally known. The spin coating method (manufactured by MIKASA: 1H-360S) was dropped onto a 6-inch silicon wafer substrate, and coating treatment was performed at a speed of 500 rpm for 15 seconds. Such operations were repeated to obtain substrates 22E to 24E, substrate 26E, and substrates 21E and 25E that were subjected to the coating process.
Further, in the same manner as in Example 10, substrates 16D and 19D subjected to coating treatment using the liquid compositions 16D and 19D were obtained.
Subsequently, these substrates were placed on a hot plate (IUCHI: EC-1200) and dried at 100 ° C. for 1 minute in an air atmosphere. In this drying process, the organic solvent (PGM) contained in the coating film evaporates and was discharged out of the system.

Next, the obtained substrate with a dry coating film was immersed in ultrapure water for 20 minutes to obtain a silica-based coating film (film thickness: about 1.5 μm).
Next, a patterning mask (manufactured by Dai Nippon Printing Co., Ltd.) for forming a 50 μm wide line-and-space 1: 1 pattern was placed on this silica-based coating film, and G-line (wavelength 435 nm) UV lamp having a wavelength range of H ray (wavelength 405 nm) and I ray (wavelength 365 nm) (that is, UV light having a wavelength of less than 300 nm, particularly around 254 nm, cut by a filter) (manufactured by Oak Manufacturing Co., Ltd.) , AHD200) was used to irradiate the coating film with ultraviolet rays for 26.3 seconds. At this time, two sensors attached to the ultraviolet lamp, that is, a sensor (UVPF-A1 PD-405 manufactured by Iwasaki Electric Co., Ltd.) for measuring the amount of ultraviolet rays in the vicinity of a wavelength of 405 nm and the amount of ultraviolet rays in the vicinity of a wavelength of 254 nm. When the illuminance of UV rays and the integrated irradiation dose on the coating film surface were measured using a sensor (Iwazaki Electric Co., Ltd., UVPF-A1 PD-254) for measuring the illuminance, the former sensor had an illuminance of 7.6 mW. / Cm ² , the integrated dose (illuminance x irradiation time) is 200 mJ / cm ² , and the latter sensor has an illuminance of 0 mW / cm ² and an integrated dose (illuminance x irradiation time) of 0 mJ / cm ^2. It was.
Thereby, the sensitizer contained in the silica-based coating film (dried coating film) reaches an excited state by irradiation with ultraviolet rays, and the excited electrons propagate to the acid generator, thereby being contained in the silica-based coating film. The acid generator is decomposed to generate an acid. On the other hand, on the substrates (that is, the substrates 16D and 19D) in which no sensitizer is contained in the silica-based coating film (dry coating film), the ultraviolet lamp (mainly in the wavelength range of 300 to 480 nm) is irradiated. Even when irradiated with ultraviolet rays using the above-mentioned product, decomposition of the acid generator did not proceed and generation of acid was not observed.

  Next, the obtained substrate with a silica-based coating film was heat-treated at 180 ° C. for 1 minute in an air atmosphere. As a result, the basic catalyst component (ammonia) in the silica-based fine particles contained in the silica-based coating film is released out of the particles, and the reaction with the acid (neutralization reaction) occurs in the ultraviolet irradiation region. In addition, in the non-irradiated region of the ultraviolet ray, the silicon compound contained in the silica-based coating film is cross-linked. However, in the silica-based coating film formed on the substrates 16D and 19D, the silicon compound contained in the silica-based coating film is cross-linked in the ultraviolet irradiation region as well as in the ultraviolet irradiation non-irradiation region. Will go on. This is because even when the ultraviolet rays are irradiated, no acid is generated based on the decomposition of the acid generator, so that the neutralization reaction with the basic catalyst component (ammonia) released from the silica-based fine particles does not proceed. is there.

Subsequently, the obtained substrate with a silica-based coating film was prepared by mixing 11.9 g of tetramethylammonium hydroxide (TMAH (25%), manufactured by Tama Chemical Co., Ltd.) and 488.1 g of ultrapure water 2 The silica-based coating film was developed by immersing in 500 g of a 38 wt% TMAH aqueous solution (developer) for 5 minutes. As a result, at least in the silica-based coating film formed using the sensitizer, the silicon compound or neutralization reaction product existing in the ultraviolet irradiation region is dissolved and washed away by the developer.
Next, Example substrates 22E to 24E, Example substrate 26E, and Comparative Example substrate having silica-based coating films that were washed with ultrapure water for 1 minute and patterned. 21E and 25E were obtained. Furthermore, comparative substrates 16D and 19D having silica-based coatings that could not be patterned were obtained.
Table 7 shows the results of observation and evaluation of these substrates thus obtained using a scanning electron microscope (JSM-5600, manufactured by JEOL Datum Co., Ltd.). These results were evaluated based on the same evaluation criteria as the evaluation criteria shown in Example 10.

[Example 12]
5 ml each of the liquid composition 2C prepared in Example 1 and the liquid composition 16D prepared in Example 6 were dropped on a 6-inch silicon wafer substrate using a conventionally known spin coating method, and 300 rpm The coating process was performed at a speed of 15 seconds. Such operations were repeated to obtain substrates 27C and 28D subjected to the coating treatment.
Next, these substrates were placed on a hot plate and dried for 1 minute at a temperature of 100 ° C. in an air atmosphere. In this drying process, the organic solvent (PGM) contained in the coating film evaporates and was discharged out of the system.
Next, the obtained substrate with a dry coating film was immersed in ultrapure water for 20 minutes to obtain a silica-based coating film (film thickness: about 3.2 μm). Next, the silica-based coating film was heat-treated at a temperature of 180 ° C. for 1 minute in an air atmosphere. Next, the obtained substrate with a silica coating film was prepared by mixing 11.9 g of tetramethylammonium hydroxide (TMAH (25%)) and 488.1 g of ultrapure water (development) (Liquid) After being immersed in 500 g for 5 minutes, it was washed with ultrapure water for 1 minute to obtain Example substrates 27X and 28Y having silica-based coating films.

Thus, in order to easily measure the relative dielectric constant, coating film strength, and surface roughness of the silica-based coating film obtained using the coating solution of the present invention, Example 10 and Under the same conditions, a substrate with a silica-based coating film having the same properties as the ultraviolet non-irradiated region when a patterning mask was placed and irradiated with ultraviolet rays was produced.
Further, while these substrates were placed on a hot plate, the processing environment was changed from an atmospheric atmosphere to a nitrogen gas atmosphere, and a baking treatment was performed at 350 ° C. for 30 minutes. Next, these substrates were cooled to a temperature close to room temperature and then taken out of the system.
In addition, the film thickness of the silica type coating film obtained in this way was about 3.1 μm.
Next, the relative dielectric constant, coating film strength (Young's elastic modulus) and surface roughness of the silica-based coating film formed on the substrate were measured by the above methods. Furthermore, it was observed whether or not cracks occurred in the coating film. These measurement results and observation results are shown in Table 8.
In addition, it turned out that the limit film thickness at the time of using the said liquid composition 2C is about 4.5 micrometers.

FIG. 1 is a photograph at a magnification of 500 times of the surface of a silica-based coating film patterned using the comparative substrate 9C taken with an optical microscope. FIG. 2 is a 500 × magnification photograph obtained by photographing the surface of the silica-based coating film patterned using the example substrate 16D with an optical microscope. FIG. 3 is a photograph (SEM photograph) at a magnification of 1500 times taken with a scanning electron microscope of a cross section of a silica-based coating film patterned using the example substrate 16D.

Claims (23)

A coating liquid for forming a silica-based coating film comprising a liquid composition for forming a silica-based coating film having patterning characteristics,
At least one organic silicon compound selected from silica-based fine particles containing a basic catalyst component, an alkoxysilane represented by the following general formula (I) and a halogenated silane represented by the following general formula (II) is added. A coating liquid for forming a silica-based coating film, comprising a silicon compound obtained by decomposition and an acid generator that generates an acid upon irradiation with ultraviolet rays.
_{R n Si (OR ') 4} -n ··· (I)
R _n SiX _4-n (II)
(In the formula, R represents a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 8 carbon atoms, a fluorine-substituted alkyl group, an aryl group, a vinyl group, or a phenyl group, and R ′ represents a hydrogen atom or 1 to 8 carbon atoms. An alkyl group, an aryl group, a vinyl group or a phenyl group, and X represents a halogen atom, and n is an integer of 0 to 3.) The silica-based coating film formation according to claim 1, wherein the basic catalyst component contained in the silica-based fine particles is at least one selected from ammonia, ammonium hydroxide, and a quaternary ammonium compound. Coating liquid. The silica-based coating film-forming coating solution according to claim 1 or 2, wherein the silica-based fine particles contain the basic catalyst component in a range of 10 to 800 ppm by weight. The silica-based fine particles are silica-based fine particles obtained by hydrolysis / condensation polymerization of an alkoxysilane represented by the following general formula (I) in the presence of the basic catalyst component, and in the silica-based fine particles, The coating liquid for forming a silica-based coating film according to any one of claims 1 to 3, wherein the amount of the basic catalyst component contained is adjusted.
_{R n Si (OR ') 4} -n ··· (I)
(In the formula, R represents a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 8 carbon atoms, a fluorine-substituted alkyl group, an aryl group, a vinyl group, or a phenyl group, and R ′ represents a hydrogen atom or 1 to 8 carbon atoms. Represents an alkyl group, an aryl group, a vinyl group or a phenyl group, and n is an integer of 0 to 3.) The silicon compound is a reaction product obtained by hydrolyzing the organosilicon compound by at least the basic catalyst component released from the silica-based fine particle, and at least a part of the reaction product is an outer surface of the silica-based fine particle. And a coating liquid for forming a silica-based coating film according to any one of claims 1 to 4, wherein the coating liquid is bonded to an inner surface of the pore. 6. The coating liquid for forming a silica-based coating film according to claim 1, wherein the silicon compound has a number average molecular weight of 400 to 3000 on a polystyrene conversion basis.   The acid generator is at least one selected from triphenylsulfonium trifluoromethanesulfonate, 2,4,6-trimethylphenyldiphenylsulfonium p-toluenesulfonate, and bis (4-t-butylphenylsulfonyl) diazomethane. The coating liquid for forming a silica-based coating film according to any one of claims 1 to 6.   When the acid generator is represented by X and the basic catalyst component contained in the silica-based fine particles is represented by Y, the molar ratio (X / Y) is 0.02 to 0.00. The coating liquid for forming a silica-based coating film according to any one of claims 1 to 7, which is contained in a range of 50.   9. The liquid composition according to claim 1, further comprising at least one organic solvent selected from propylene glycol monopropyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate and hexylene glycol. The coating liquid for forming a silica-based coating film according to any one of the above.   The silica-based coating film according to any one of claims 1 to 9, wherein the liquid composition further contains at least one amine compound selected from triethanolamine, triethylamine, and tri-n-butylamine. Coating liquid for forming.   When the amine compound is represented by Z and the acid generator is represented by X, the amine compound is included in a range where the molar ratio (Z / X) is 0.01 to 1.0. The coating liquid for forming a silica-based coating film according to claim 10.   The liquid composition was further selected from anthracene, 9,10-diphenylanthracene, 9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 9,10-dipropoxyanthracene, and 9,10-dibutoxyanthracene. The coating liquid for forming a silica-based coating film according to any one of claims 1 to 11, comprising at least one sensitizer.   When the sensitizer is represented by W and the acid generator is represented by X, the sensitizer includes a molar ratio (W / X) in a range of 0.05 to 0.7. The coating liquid for forming a silica-based coating film according to claim 12, A method for preparing a coating liquid for forming a silica-based coating film comprising a liquid composition for forming a silica-based coating film having patterning characteristics,
(A) A water-alcohol dispersion of silica-based fine particles obtained by hydrolysis / condensation polymerization of an alkoxysilane represented by the following general formula (I) in the presence of a basic catalyst component is passed through an ultrafiltration device. A step of preparing a water-alcohol dispersion of silica-based fine particles in which the content of the basic catalyst component is adjusted,
(B) In the water-alcohol dispersion containing the silica-based fine particles, at least one selected from an alkoxysilane represented by the following general formula (I) and a halogenated silane represented by the following general formula (II): After mixing an aqueous dispersion containing an organosilicon compound or a partial hydrolyzate thereof, the organosilicon compound is heated at a temperature of 30 to 80 ° C., and at least the organosilicon compound is released by the basic catalyst component released from the silica-based fine particles. A step of preparing an aqueous mixed solution containing a silicon compound obtained by hydrolysis and silica-based fine particles containing the basic catalyst component;
(C) Solvent substitution with water and alcohol components contained in the aqueous mixture with at least one organic solvent selected from propylene glycol monopropyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate and hexylene glycol A step of preparing an organic solvent mixture, and (d) mixing an acid generator that generates an acid upon irradiation with ultraviolet light into the organic solvent mixture, so that at least the silica fine particles, the silicon compound, and A method for preparing a coating solution for forming a silica-based coating film, comprising a step of preparing a liquid composition containing the acid generator.
_{R n Si (OR ') 4} -n ··· (I)
R _n SiX _4-n (II)
(In the formula, R represents a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 8 carbon atoms, a fluorine-substituted alkyl group, an aryl group, a vinyl group, or a phenyl group, and R ′ represents a hydrogen atom or 1 to 8 carbon atoms. An alkyl group, an aryl group, a vinyl group or a phenyl group, and X represents a halogen atom, and n is an integer of 0 to 3.) The silica-based coating film according to claim 14, wherein the basic catalyst component used in the step (a) is at least one selected from ammonia, ammonium hydroxide, and a quaternary ammonium compound. Preparation method of forming coating solution. The silica-based coating film-forming coating solution according to claim 14 or 15, wherein the silica-based fine particles obtained from the step (a) contain the basic catalyst component in a range of 200 to 1100 ppm by weight. Preparation method. The silica-based coating film forming coating solution according to claim 14 or 15, wherein the silica-based fine particles obtained from the step (c) contain the basic catalyst component in a range of 10 to 800 ppm by weight. Preparation method.   The acid generator used in the step (d) is selected from triphenylsulfonium trifluoromethanesulfonate, 2,4,6-trimethylphenyldiphenylsulfonium p-toluenesulfonate and bis (4-t-butylphenylsulfonyl) diazomethane. The method for preparing a coating liquid for forming a silica-based coating film according to any one of claims 14 to 17, wherein the coating liquid is at least one kind.   In the step (d), when the acid generator is represented by X, the basic catalyst component contained in the silica-based fine particles obtained from the step (b) is represented by Y, the mole thereof The method for preparing a coating liquid for forming a silica-based coating film according to any one of claims 14 to 18, wherein mixing is performed at a ratio such that the ratio (X / Y) is 0.02 to 0.50.   The liquid composition obtained from the step (d) is further mixed with at least one amine compound selected from triethanolamine, triethylamine and tri-n-butylamine. A method for preparing a coating liquid for forming a silica-based coating film according to claim 1.   The amine compound is mixed in such a ratio that when the amine compound is represented by Z and the acid generator is represented by X, the molar ratio (Z / X) is 0.01 to 1.0. The method for preparing a coating solution for forming a silica-based coating film according to claim 20.   To the liquid composition obtained from the step (d), anthracene, 9,10-diphenylanthracene, 9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 9,10-dipropoxyanthracene, 9,10- The method for producing a coating liquid for forming a silica-based coating film according to any one of claims 14 to 21, wherein at least one sensitizer selected from dibutoxyanthracene is mixed.   When the sensitizer is represented by W and the acid generator is represented by X, the sensitizer is mixed in such a ratio that the molar ratio (W / X) is 0.05 to 0.7. The method for producing a coating liquid for forming a silica-based coating film according to claim 22.