JP2010029871A5 - - Google Patents
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- JP2010029871A5 JP2010029871A5 JP2008191531A JP2008191531A JP2010029871A5 JP 2010029871 A5 JP2010029871 A5 JP 2010029871A5 JP 2008191531 A JP2008191531 A JP 2008191531A JP 2008191531 A JP2008191531 A JP 2008191531A JP 2010029871 A5 JP2010029871 A5 JP 2010029871A5
- Authority
- JP
- Japan
- Prior art keywords
- bonding film
- bonding
- film
- metal atom
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229910052751 metal Inorganic materials 0.000 claims 18
- 239000002184 metal Substances 0.000 claims 18
- 125000004429 atom Chemical group 0.000 claims 17
- 238000000034 method Methods 0.000 claims 17
- 239000000758 substrate Substances 0.000 claims 13
- 239000000463 material Substances 0.000 claims 6
- 125000002524 organometallic group Chemical group 0.000 claims 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 2
- 229910052782 aluminium Inorganic materials 0.000 claims 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 229910052802 copper Inorganic materials 0.000 claims 2
- 239000010949 copper Substances 0.000 claims 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- 238000003795 desorption Methods 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 229910052738 indium Inorganic materials 0.000 claims 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000011133 lead Substances 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 1
- 125000004437 phosphorous atom Chemical group 0.000 claims 1
- 229910052698 phosphorus Inorganic materials 0.000 claims 1
- 229910052709 silver Inorganic materials 0.000 claims 1
- 239000004332 silver Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 125000004434 sulfur atom Chemical group 0.000 claims 1
- 229910052725 zinc Inorganic materials 0.000 claims 1
- 239000011701 zinc Substances 0.000 claims 1
Claims (16)
前記第1の接合膜および前記第2の接合膜に対してエネルギーを付与して、前記第1の接合膜および前記第2の接合膜の表面付近に存在する前記脱離基をこれら接合膜から脱離させることにより、前記第1の接合膜および前記第2の接合膜に接着性を発現させる工程と、
前記第1の接合膜と前記第2の接合膜とが密着するように、前記第1の接合膜付き基材と前記第2の接合膜付き基材とを貼り合わせて、前記第1の接合膜と前記第2の接合膜とが接合された接合体を得る工程とを有することを特徴とする接合方法。 A first junction including a first metal atom, a second metal atom having a higher ionization tendency than the first metal atom, and a leaving group composed of an organic component on the first substrate. Forming a film to obtain a first substrate with a bonding film, and comprising a second substrate containing the first metal atom, the second metal atom, and the leaving group on a second substrate; Forming a second bonding film to obtain a second substrate with a bonding film;
Energy is imparted to the first bonding film and the second bonding film, and the leaving group existing near the surfaces of the first bonding film and the second bonding film is removed from these bonding films. Causing the first bonding film and the second bonding film to exhibit adhesion by desorption, and
The first bonding film and the second bonding film-attached substrate are bonded together so that the first bonding film and the second bonding film are in close contact with each other, and the first bonding is performed. And a step of obtaining a bonded body in which the film and the second bonding film are bonded.
前記第1の接合膜と前記第2の接合膜とが密着するように、前記第1の接合膜付き基材と前記第2の接合膜付き基材とを重ね合わせて、積層体を得る工程と、
前記第1の接合膜および前記第2の接合膜に対してエネルギーを付与して、前記第1の接合膜および前記第2の接合膜の表面付近に存在する前記脱離基を、これら接合膜から脱離させることにより、前記第1の接合膜および前記第2の接合膜に接着性を発現させて、前記第1の接合膜と前記第2の接合膜とが接合された接合体を得る工程とを有することを特徴とする接合方法。 A first junction including a first metal atom, a second metal atom having a higher ionization tendency than the first metal atom, and a leaving group composed of an organic component on the first substrate. Forming a film to obtain a first substrate with a bonding film, and comprising a second substrate containing the first metal atom, the second metal atom, and the leaving group on a second substrate; Forming a second bonding film to obtain a second substrate with a bonding film;
A step of obtaining a laminate by superimposing the first substrate with a bonding film and the second substrate with a bonding film so that the first bonding film and the second bonding film are in close contact with each other. When,
Energy is imparted to the first bonding film and the second bonding film, and the leaving group present in the vicinity of the surfaces of the first bonding film and the second bonding film is converted into these bonding films. By desorbing from the first bonding film, the first bonding film and the second bonding film are made to exhibit adhesiveness, and a bonded body in which the first bonding film and the second bonding film are bonded is obtained. A bonding method comprising the steps of:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008191531A JP2010029871A (en) | 2008-07-24 | 2008-07-24 | Joining method and joined body |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008191531A JP2010029871A (en) | 2008-07-24 | 2008-07-24 | Joining method and joined body |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010029871A JP2010029871A (en) | 2010-02-12 |
JP2010029871A5 true JP2010029871A5 (en) | 2011-09-08 |
Family
ID=41735006
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008191531A Withdrawn JP2010029871A (en) | 2008-07-24 | 2008-07-24 | Joining method and joined body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2010029871A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6710707B2 (en) * | 2016-02-16 | 2020-06-17 | 株式会社 東北テクノアーチ | Method for producing nanocomposite metal member and method for joining phase-separated metallic solids |
-
2008
- 2008-07-24 JP JP2008191531A patent/JP2010029871A/en not_active Withdrawn
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