JP2010022920A - Vacuum processing device - Google Patents

Vacuum processing device Download PDF

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JP2010022920A
JP2010022920A JP2008186030A JP2008186030A JP2010022920A JP 2010022920 A JP2010022920 A JP 2010022920A JP 2008186030 A JP2008186030 A JP 2008186030A JP 2008186030 A JP2008186030 A JP 2008186030A JP 2010022920 A JP2010022920 A JP 2010022920A
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processed
vacuum
unit
processing apparatus
workpiece
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JP5633771B2 (en
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Tomoharu Kobayashi
智晴 小林
Hiroki Nishikawa
弘樹 西河
Masahiro Tadokoro
昌宏 田所
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Sinfonia Technology Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a vacuum processing device capable of additionally charging a required amount of a material to be processed rapidly and repeatedly, when the material to be processed is processed inside a vacuum vessel. <P>SOLUTION: The vacuum processing device 1 comprises a vacuum vessel 10, an evacuation means 20 for vacuumizing the interior 10a of the vacuum vessel 10 to create a vacuum atmosphere, a processing means 30 for processing a material to be processed W as specified inside the vacuum vessel 10, and a feeder mechanism 40 to feed the material W to the processing means 30. The feeder mechanism 40 is installed in the interior 10a of the vacuum vessel 10 and is equipped with a storage part 41 for the material W to be stored and a conveying means 43 for unloading as much the material W as required from the storage part 41 and conveys it to the processing means 30. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、真空雰囲気内で被処理物に所定の処理を行う真空処理装置に関する。   The present invention relates to a vacuum processing apparatus that performs predetermined processing on an object to be processed in a vacuum atmosphere.

真空雰囲気内で被処理物に物理的あるいは化学的な処理を行う装置としては、例えば、真空雰囲気内で金属や合金を加熱して溶解させる真空誘導溶解炉などがある。このような真空誘導溶解炉は、外気に対して気密にされた真空槽と、該真空槽内で交流電力が供給される誘導加熱コイルと、該誘導加熱コイルの内側に被処理物である被溶解金属を収容するルツボと、追加装入される被処理物が載置された材料載置台と、真空槽の外部から操作して材料載置台上の被処理物を押し込んでルツボに落下させるプッシャーとを備えている(例えば、特許文献1参照)。このような真空誘導溶解炉では、真空槽内部を真空雰囲気として、誘導加熱コイルに交流電力を供給すれば、ルツボの内部の被処理物は、発熱して溶解することとなる。さらに、プッシャーを操作することで、真空槽内部を真空雰囲気としたままルツボの内部に被処理物を追加装入することができ、真空槽内部の雰囲気を汚染することなく、簡単且つ短時間に被処理物の追加装入をすることができるとされている。
特開平6−330203号公報
As an apparatus for performing a physical or chemical treatment on an object to be processed in a vacuum atmosphere, for example, there is a vacuum induction melting furnace that heats and melts a metal or an alloy in a vacuum atmosphere. Such a vacuum induction melting furnace includes a vacuum chamber that is airtight with respect to the outside air, an induction heating coil that is supplied with AC power in the vacuum chamber, and a workpiece that is an object to be processed inside the induction heating coil. A crucible for storing molten metal, a material placing table on which an object to be additionally charged is placed, and a pusher that operates from outside the vacuum chamber to push the object to be treated on the material placing table into the crucible. (For example, refer to Patent Document 1). In such a vacuum induction melting furnace, if an AC power is supplied to the induction heating coil with the vacuum chamber as a vacuum atmosphere, the object to be processed inside the crucible will generate heat and melt. Furthermore, by operating the pusher, it is possible to add an object to be processed into the crucible while the vacuum chamber is kept in a vacuum atmosphere, and easily and quickly without contaminating the atmosphere inside the vacuum chamber. It is said that an additional charge can be added to the workpiece.
JP-A-6-330203

しかしながら、特許文献1の真空誘導溶解炉では、真空槽の内部を真空雰囲気とした状態で追加装入を行うことが可能であるものの、一回の追加装入に限られ、追加装入する量は、予め材料載置台に載置された被処理物の量に限られていて微調整することができなかった。   However, in the vacuum induction melting furnace of Patent Document 1, although it is possible to perform additional charging with the inside of the vacuum chamber in a vacuum atmosphere, the amount of additional charging is limited to one additional charging. Is limited to the amount of the object to be processed previously placed on the material placing table, and could not be finely adjusted.

この発明は、上述した事情に鑑みてなされたものであって、真空槽の内部で被処理物の処理を行うに際して、速やかにかつ繰り返して、所望の量の被処理物を追加装入することが可能な真空処理装置を提供するものである。   The present invention has been made in view of the above-described circumstances, and when processing an object to be processed inside a vacuum chamber, a desired amount of the object to be processed is additionally charged promptly and repeatedly. A vacuum processing apparatus capable of satisfying the requirements is provided.

上記課題を解決するために、この発明は以下の手段を提案している。
本発明は、真空槽と、該真空槽の内部を真空雰囲気に排気可能な排気手段と、前記真空槽の内部で被処理物に所定の処理を行う処理手段と、該処理手段に前記被処理物を供給する供給機構とを備えた真空処理装置であって、前記供給機構は、前記真空槽の内部に設けられ、前記被処理物が貯蔵された貯蔵部と、該貯蔵部から前記被処理物を所望の量だけ取り出して前記処理手段へ搬送する搬送手段とを備えることを特徴としている。
In order to solve the above problems, the present invention proposes the following means.
The present invention includes a vacuum chamber, an exhaust unit capable of exhausting the inside of the vacuum chamber to a vacuum atmosphere, a processing unit that performs a predetermined process on an object to be processed inside the vacuum chamber, and the processing unit including the processing target A vacuum processing apparatus including a supply mechanism for supplying an object, wherein the supply mechanism is provided inside the vacuum chamber, and stores a storage part in which the object to be processed is stored; And a conveying unit that takes out a desired amount of the item and conveys it to the processing unit.

この構成によれば、真空雰囲気で被処理物に対して所定の処理を行う場合には、まず、排気手段によって真空槽の内部を排気して真空雰囲気にする。そして、この状態で真空槽の内部で処理手段によって処理を行うことで、真空雰囲気での被処理物の処理を可能としている。そして、この処理の際に、被処理物の追加装入が必要である場合には、供給機構を駆動させる。すなわち、貯蔵部に貯蔵された被処理物から搬送手段によって必要な量の被処理物を取り出して処理手段まで搬送する。これより処理手段は、搬送手段によって搬送された分だけ追加された被処理物について処理を行うことができる。ここで、供給機構において、貯蔵部が真空槽の内部に設けられていることで、処理手段に被処理物を供給するに際して、弁の切替や排気手段による再排気などをする必要がないので、貯蔵部の被処理物を速やかに処理手段へ供給することができる。また、搬送手段は、貯蔵部の被処理物を、必要となる量だけ取り出して搬送することが可能であり、貯蔵部の被処理物全てを一度に搬送するわけではないので、必要に応じて繰り返し処理手段に被処理物を供給することができる。   According to this configuration, when a predetermined process is performed on the workpiece in a vacuum atmosphere, first, the inside of the vacuum chamber is evacuated to a vacuum atmosphere by the exhaust unit. In this state, processing is performed by the processing means inside the vacuum chamber, thereby enabling processing of the object to be processed in a vacuum atmosphere. In this process, when it is necessary to add an object to be processed, the supply mechanism is driven. That is, a necessary amount of the object to be processed is taken out from the object to be processed stored in the storage unit by the conveying means and conveyed to the processing means. Thus, the processing means can perform processing on the workpieces added by the amount conveyed by the conveying means. Here, in the supply mechanism, since the storage section is provided inside the vacuum chamber, when supplying the object to be processed to the processing means, there is no need to switch valves or re-exhaust by the exhaust means. The object to be processed in the storage unit can be quickly supplied to the processing means. In addition, the transport means can take out the necessary amount of the object to be processed in the storage unit and convey it, and does not necessarily convey all the objects to be processed in the storage part at one time. An object to be processed can be supplied to the repetitive processing means.

また、前記搬送手段は、一方側が前記貯蔵部の前記被処理物を受け取り可能に配置されるとともに、他方側が前記処理手段に前記被処理物を供給可能に配置されたトラフと、 該トラフ上の前記被処理物を前記一方側から前記他方側に向かって移動可能に前記トラフに振動を与える起振部とを有することが好ましい。   In addition, the conveying means is arranged such that one side can receive the object to be processed of the storage unit and the other side is arranged to supply the object to be processed to the processing means, and a trough on the trough It is preferable to have a vibration generating unit that vibrates the trough so that the workpiece can be moved from the one side toward the other side.

この構成によれば、貯蔵部からトラフの一方側に受け渡される被処理物は、起振部から与えられる振動により、他方側に向かって順次搬送されていくことになる。このため、他方側に位置する処理手段には、被処理物が連続して供給されることとなり、搬送速度や搬送時間によって、被処理物の供給量を調整することが可能となる。   According to this configuration, the object to be processed delivered from the storage unit to one side of the trough is sequentially conveyed toward the other side by the vibration given from the vibration generating unit. For this reason, the object to be processed is continuously supplied to the processing means located on the other side, and the supply amount of the object to be processed can be adjusted according to the conveying speed and the conveying time.

また、前記搬送手段は、前記トラフ上の前記被処理物が所望の搬送量となるように前記起振部による振動を制御する制御部を有することが好ましい。
この構成によれば、制御部によって振動を制御、例えば、振動の振幅や周波数を制御することによって、被処理物を好適な搬送速度で搬送することができ、これにより自動的に被処理物の供給量を調整することができる。
Moreover, it is preferable that the said conveyance means has a control part which controls the vibration by the said vibration part so that the said to-be-processed object on the said trough may become a desired conveyance amount.
According to this configuration, by controlling the vibration by the control unit, for example, by controlling the amplitude and frequency of the vibration, the object to be processed can be transported at a suitable transport speed. The supply amount can be adjusted.

また、前記供給機構は、前記貯蔵部内の前記被処理物の重量を計測する計測手段を備え、前記搬送手段の前記制御部は、前記計測手段によって計測される前記被処理物の重量の変化に応じて前記起振部による振動を制御することが好ましい。   In addition, the supply mechanism includes a measuring unit that measures the weight of the object to be processed in the storage unit, and the control unit of the transport unit is configured to change the weight of the object to be processed measured by the measuring unit. Accordingly, it is preferable to control the vibration by the vibration generating unit.

この構成によれば、計測手段によって貯蔵部内の被処理物の重量を計測することで、搬送手段によって貯蔵部から被処理物を取り出すことによる貯蔵されている被処理物の重量の変化を監視することができる。そして、制御部が計測手段による計測結果に基づいて起振部による振動を制御することによって、より正確に搬送手段によって所望の量の被処理物を処理手段に供給することができる。   According to this configuration, by measuring the weight of the object to be processed in the storage unit by the measuring unit, the change in the weight of the stored object to be processed by taking out the object to be processed from the storage unit by the transport unit is monitored. be able to. And a control part can supply the desired amount of to-be-processed object to a process means more correctly by a conveyance means by controlling the vibration by a vibration part based on the measurement result by a measurement means.

また、前記処理手段として、前記被処理物を収容するルツボと、該ルツボの外側に設けられて電源の供給により該ルツボ内の前記被処理物の加熱を行う誘導加熱コイルとを有し、前記ルツボ内の前記被処理物を溶解させる真空誘導溶解炉であることが好ましい。
この構成によれば、供給機構によって必要に応じて速やかにかつ繰り返しルツボ内に被処理物を供給しつつ、真空雰囲気において、誘導加熱コイルによって被処理物を加熱し、溶解させることができる。
In addition, the processing means includes a crucible for storing the object to be processed, and an induction heating coil that is provided outside the crucible and heats the object to be processed in the crucible by supplying power. A vacuum induction melting furnace for melting the object to be processed in the crucible is preferable.
According to this configuration, the object to be processed can be heated and dissolved by the induction heating coil in a vacuum atmosphere while supplying the object to be processed into the crucible quickly and repeatedly as necessary by the supply mechanism.

本発明の真空処理装置によれば、供給機構を備えることで、真空槽の内部で被処理物の処理を行うに際して、速やかにかつ繰り返して、被処理物を追加装入することができる。   According to the vacuum processing apparatus of the present invention, when the processing object is processed inside the vacuum chamber, the processing object can be additionally charged promptly and repeatedly when the supply mechanism is provided.

図1は、この発明に係る実施形態を示していて、真空雰囲気で被処理物を処理する真空処理装置の一例として、金属等を溶解する真空誘導溶解炉を示している。図1に示すように、真空誘導溶解炉1は、内部10aを気密に閉塞する真空槽10と、真空槽10の内部10aを所定の圧力となるまで排気可能な排気手段である真空ポンプ20と、処理手段として、金属等の被処理物Wを加熱溶解する溶解処理部30と、溶解処理部30に被処理物Wを供給する供給機構40とを備える。真空槽10は、溶解処理部30が収容された本体部11と、供給機構40が収容された供給部12とを有する。本体部11と供給部12とは、連絡部13によって連通している。本体部11には、覗き窓11aが設けられていて、外部から内部10aを観察可能となっている。また、真空槽10の本体部11には、真空ポンプ20が外部から接続されているとともに、内部10aを大気開放するための開放弁14が設けられている。真空ポンプ20は、本実施形態では到達圧力が例えば、10−5Pa以下の高真空雰囲気となるまで排気可能な性能を有している。 FIG. 1 shows an embodiment according to the present invention, and shows a vacuum induction melting furnace for melting metal or the like as an example of a vacuum processing apparatus for processing an object to be processed in a vacuum atmosphere. As shown in FIG. 1, a vacuum induction melting furnace 1 includes a vacuum chamber 10 that hermetically closes an interior 10a, and a vacuum pump 20 that is an exhaust means that can exhaust the interior 10a of the vacuum chamber 10 until a predetermined pressure is reached. As a processing means, a dissolution processing unit 30 that heats and dissolves the workpiece W such as metal and a supply mechanism 40 that supplies the workpiece W to the dissolution processing unit 30 are provided. The vacuum chamber 10 includes a main body 11 in which the dissolution processing unit 30 is accommodated, and a supply unit 12 in which the supply mechanism 40 is accommodated. The main body 11 and the supply unit 12 are communicated with each other by a communication unit 13. The main body 11 is provided with a viewing window 11a so that the inside 10a can be observed from the outside. In addition, a vacuum pump 20 is connected to the main body 11 of the vacuum chamber 10 from the outside, and an open valve 14 for opening the inside 10a to the atmosphere is provided. In this embodiment, the vacuum pump 20 has a performance capable of being exhausted until the ultimate pressure becomes a high vacuum atmosphere of 10 −5 Pa or less, for example.

また、溶解処理部30は、被処理物Wが収容されるルツボ31を有する溶解炉32と、ルツボ31を加熱する加熱手段33とを有する。溶解炉32のルツボ31は、底付きの筒状の部材で、例えば黒鉛などによって形成されている。加熱手段33は、ルツボ31に断熱材34を介して外装された誘導加熱コイル35と、真空槽10の外部に設けられ、誘導加熱コイル35に高周波電流を供給する図示しない高周波電源とで構成されている。そして、図示しない高周波電源から誘導加熱コイル35に高周波電流を供給すれば、交流磁界を生じ、特に磁束密度の大きいルツボ31の内部に収容された金属等の被処理物Wには誘導電流(渦電流)が発生することになる。このため、被処理物Wは、誘導電流により発熱して溶解することとなる。   Further, the melting processing unit 30 includes a melting furnace 32 having a crucible 31 in which the workpiece W is accommodated, and a heating means 33 for heating the crucible 31. The crucible 31 of the melting furnace 32 is a cylindrical member with a bottom, and is formed of, for example, graphite. The heating means 33 includes an induction heating coil 35 that is externally mounted on the crucible 31 via a heat insulating material 34, and a high-frequency power source (not shown) that is provided outside the vacuum chamber 10 and supplies a high-frequency current to the induction heating coil 35. ing. When a high-frequency current is supplied from a high-frequency power source (not shown) to the induction heating coil 35, an alternating magnetic field is generated. Current) is generated. For this reason, the to-be-processed object W will generate | occur | produce and melt | dissolve with an induced current.

供給機構40は、真空槽10において供給部12内に設けられて被処理物Wが貯蔵された貯蔵部41と、貯蔵部41の重量を計測する計測手段であるロードセル42と、貯蔵部41から被処理物Wを取り出して溶解処理部30のルツボ31内部に被処理物Wを投入する搬送手段43とを備える。貯蔵部41は、被処理物Wが粒状または粉状となって貯蔵されているホッパーであり、上部開口41a及び下部開口41bが形成されている。下部開口41bは、上部開口41aに対して縮径して形成されており、上部開口41aから供給された被処理物Wを、略一定の排出量で下部開口41bから排出することを可能としている。なお、真空槽10の供給部12において、貯蔵部41の上部開口41aの上方には、外部から被処理物Wを供給可能に供給用窓12aが設けられている。また、ロードセル42は、予め貯蔵部41の空重量がキャンセルされており、これにより貯蔵部41内部の被処理物Wの実重量を計測することが可能となっている。   The supply mechanism 40 includes a storage unit 41 that is provided in the supply unit 12 in the vacuum chamber 10 and stores the workpiece W, a load cell 42 that is a measuring unit that measures the weight of the storage unit 41, and the storage unit 41. Conveying means 43 that takes out the workpiece W and puts the workpiece W into the crucible 31 of the dissolution processing section 30 is provided. The storage unit 41 is a hopper in which the workpiece W is stored in a granular or powder form, and has an upper opening 41a and a lower opening 41b. The lower opening 41b is formed with a reduced diameter with respect to the upper opening 41a, and allows the workpiece W supplied from the upper opening 41a to be discharged from the lower opening 41b with a substantially constant discharge amount. . In the supply unit 12 of the vacuum chamber 10, a supply window 12 a is provided above the upper opening 41 a of the storage unit 41 so that the workpiece W can be supplied from the outside. In addition, the empty weight of the storage unit 41 is canceled in advance in the load cell 42, whereby the actual weight of the workpiece W inside the storage unit 41 can be measured.

搬送手段43は、貯蔵部41からの被処理物Wを搬送するフィーダ44と、フィーダ44によって搬送された被処理物Wを溶解炉32のルツボ31に投入するシュート45と、フィーダ44を制御する制御部46とで構成されている。フィーダ44は、搬送される被処理物Wが載置されるトラフ47と、トラフ47を支持するとともに、トラフ47に被処理物Wを搬送させるための振動を与える起振部48とを有している。トラフ47は、一端47aが貯蔵部41の下方に配置されていて、貯蔵部41の下部開口41bから被処理物Wの供給を受けることが可能となっているとともに、他端47bが真空槽10の連絡部13近傍となるように延設されている。起振部48は、トラフ47を直接支持する可動部48aと、可動部48aの下方に位置する固定部48bとを有していて、可動部48aと固定部48bとの間には、トラフ47の他端47b側から一端47a側へ傾倒した一対の板バネ48cが取り付けられている。また、可動部48aと固定部48bとの間において、可動部48aからは、固定部48bに向かって可動鉄心48dが突出している。また、固定部48bには、トラフ47が延設される方向で可動鉄心48dと対向配置された電磁石47eが設けられている。   The conveying means 43 controls the feeder 44 that conveys the workpiece W from the storage unit 41, the chute 45 that throws the workpiece W conveyed by the feeder 44 into the crucible 31 of the melting furnace 32, and the feeder 44. It is comprised with the control part 46. FIG. The feeder 44 includes a trough 47 on which the workpiece W to be transported is placed, and a vibration generator 48 that supports the trough 47 and applies vibrations to transport the workpiece W to the trough 47. ing. One end 47 a of the trough 47 is disposed below the storage unit 41 so that the workpiece W can be supplied from the lower opening 41 b of the storage unit 41, and the other end 47 b of the vacuum tank 10. It is extended so that it may become the connection part 13 vicinity. The vibration generating part 48 has a movable part 48a that directly supports the trough 47 and a fixed part 48b positioned below the movable part 48a, and the trough 47 is interposed between the movable part 48a and the fixed part 48b. A pair of leaf springs 48c tilted from the other end 47b side to the one end 47a side are attached. Further, between the movable part 48a and the fixed part 48b, a movable iron core 48d protrudes from the movable part 48a toward the fixed part 48b. In addition, the fixed portion 48b is provided with an electromagnet 47e arranged to face the movable iron core 48d in the direction in which the trough 47 extends.

ここで、制御部46は、フィーダ44の電磁石48eと接続されているとともに、ロードセル42と接続されている。そして、制御部46は、ロードセル42によって計測された貯蔵部41内の被処理物Wの重量の変化に基づいて、電磁石48eに供給する交流電流の振幅、周波数を制御することが可能となっている。そして、制御部46によって振幅、周波数を設定してフィーダ44の電磁石48eに交流電流を供給すれば、電磁石48eには磁界が発生し、これにより可動鉄心48dには、入力された交流電流と対応する振幅、周波数の振動が与えられることとなる。ここで、電磁石48eが設けられた固定部48bと、可動鉄心48dが設けられた可動部48aとの間には板バネ48cが設けられていることから、トラフ47には、板バネ48cの傾斜に対応して、トラフ47に平行な成分と、トラフ47に垂直な成分とを有する振動が伝達されることとなり、これによりトラフ47上の被処理物Wを、一端47a側から他端47b側へ搬送させることが可能となっている。   Here, the control unit 46 is connected to the electromagnet 48e of the feeder 44 and to the load cell 42. And the control part 46 can control the amplitude and frequency of the alternating current supplied to the electromagnet 48e based on the change of the weight of the to-be-processed object W in the storage part 41 measured by the load cell 42. FIG. Yes. When the controller 46 sets the amplitude and frequency and supplies an alternating current to the electromagnet 48e of the feeder 44, a magnetic field is generated in the electromagnet 48e, and the movable iron core 48d corresponds to the input alternating current. The vibration of the amplitude and frequency to be given will be given. Here, since the leaf spring 48c is provided between the fixed portion 48b provided with the electromagnet 48e and the movable portion 48a provided with the movable iron core 48d, the trough 47 has an inclination of the leaf spring 48c. Accordingly, vibration having a component parallel to the trough 47 and a component perpendicular to the trough 47 is transmitted, whereby the workpiece W on the trough 47 is transferred from the one end 47a side to the other end 47b side. It is possible to transport to.

また、シュート45は、真空槽10内部において、供給部12から本体部11まで連絡部13の内部に挿通されている。シュート45において、供給部12側に位置する上端部45aは、フィーダ44のトラフ47の他端47b下方に配置されていて、大きく開口している。また、本体部11側に位置する下端部45bは、溶解炉32のルツボ31の上方に配置されていて、シュート45の内部を通過する被処理物Wをルツボ31内部に投入可能に下方に向かって開口している。   In addition, the chute 45 is inserted into the communication unit 13 from the supply unit 12 to the main body unit 11 inside the vacuum chamber 10. In the chute 45, an upper end portion 45a located on the supply unit 12 side is disposed below the other end 47b of the trough 47 of the feeder 44, and is greatly opened. The lower end 45b located on the main body 11 side is disposed above the crucible 31 of the melting furnace 32 and faces downward so that the workpiece W passing through the inside of the chute 45 can be put into the crucible 31. Open.

次に、この実施形態の真空誘導溶解炉1によって被処理物Wの真空溶解処理を行う工程の詳細について説明する。
図1に示すように、真空槽10の内部には、被処理物Wを溶解するに際して、大気圧の状態で、予め溶解炉32のルツボ31の内部に被処理物Wを所定量投入しておくとともに、供給機構40の貯蔵部41にも追加装入するのに十分な量だけ被処理物Wを貯蔵しておく。次に、真空ポンプ20によって真空槽10の内部を所定の気圧となるまで排気する。この際、必要に応じて図示しない加熱装置によって真空槽10の内部を加熱して、ベーキングを行っても良い。そして、溶解処理部30において、誘導加熱コイル35に所定の交流電力を供給することで、ルツボ31内部の被処理物Wを加熱し、溶解させる。さらに、被処理物Wの溶解に応じてルツボ31の内部に被処理物Wの追加装入を行う。
Next, the detail of the process of performing the vacuum melting process of the to-be-processed object W by the vacuum induction melting furnace 1 of this embodiment is demonstrated.
As shown in FIG. 1, when the workpiece W is melted into the vacuum chamber 10, a predetermined amount of the workpiece W is charged into the crucible 31 of the melting furnace 32 in advance under atmospheric pressure. In addition, the workpiece W is stored in an amount sufficient to be additionally charged in the storage unit 41 of the supply mechanism 40. Next, the inside of the vacuum chamber 10 is evacuated by the vacuum pump 20 to a predetermined atmospheric pressure. At this time, if necessary, the inside of the vacuum chamber 10 may be heated by a heating device (not shown) to perform baking. And in the melt | dissolution process part 30, the to-be-processed object W inside the crucible 31 is heated and melt | dissolved by supplying predetermined alternating current power to the induction heating coil 35. FIG. Further, the workpiece W is additionally charged into the crucible 31 according to the dissolution of the workpiece W.

すなわち、例えば図示しない操作部により所定量の追加装入を指令すると、制御部46は、フィーダ44の電磁石48eに、指令値に対応する所定の振幅、周波数の交流電流を入力する。これによりトラフ47は、入力された交流電流と対応する振幅、周波数で振動することとなる。このため、貯蔵部41の下部開口41bからトラフ47に供給されている被処理物Wは、与えられた振動振幅及び周波数と対応する搬送速度で、トラフ47上を一端47aから他端47bに向かって搬送されることとなる。また、下部開口41bからトラフ47に供給されている被処理物Wがトラフ47上を搬送されることにより、貯蔵部41内部の被処理物Wは、自重によって下部開口41bからトラフ47へ順次供給されることとなる。   That is, for example, when a predetermined amount of additional charging is commanded by an operation unit (not shown), the control unit 46 inputs an alternating current having a predetermined amplitude and frequency corresponding to the command value to the electromagnet 48e of the feeder 44. As a result, the trough 47 vibrates with an amplitude and a frequency corresponding to the input alternating current. For this reason, the workpiece W supplied to the trough 47 from the lower opening 41b of the storage unit 41 moves from the one end 47a to the other end 47b on the trough 47 at a conveyance speed corresponding to the given vibration amplitude and frequency. Will be transported. In addition, the workpiece W supplied to the trough 47 from the lower opening 41b is transported on the trough 47, so that the workpiece W in the storage unit 41 is sequentially supplied from the lower opening 41b to the trough 47 by its own weight. Will be.

そして、トラフ47上で搬送される被処理物Wは、トラフ47上における搬送速度と対応する時間当たりの供給量で、他端47b側に位置するシュート45の上端部45aに投入されることとなる。シュート45の上端部45aに投入された被処理物Wは、内部を通過して下端部45bから落下し、ルツボ31の内部に供給されることとなる。この際、制御部46は、電磁石48eに入力する交流電流を制御するとともに、ロードセル42で計測される貯蔵部41内部の被処理物Wの重量の変化を監視している。すなわち、計測される被処理物Wの重量変化から、ルツボ31の内部に供給された被処理物Wの重量を算出し、供給された被処理物Wの時間当たりの供給量と、総供給量とを算出している。そして、算出した時間当たりの供給量が、予め設定された目標値と異なる場合には、電磁石48eに入力する交流電流の振幅、周波数を調整し、被処理物Wの時間当たりの供給量が目標値となるようにフィードバック制御を行う。また、算出された総供給量が目標値に達した場合には、電磁石48eへの交流電流の供給を停止させる。これにより、貯蔵部41内の被処理物Wをフィーダ44によって必要な量だけ取り出してシュート45を介して溶解処理部30のルツボ31に供給することができ、溶解処理部30によって最適な量の被処理物Wを溶解処理することができる。   The workpiece W conveyed on the trough 47 is supplied to the upper end portion 45a of the chute 45 located on the other end 47b side with a supply amount per time corresponding to the conveying speed on the trough 47. Become. The workpiece W put into the upper end 45a of the chute 45 passes through the inside and falls from the lower end 45b, and is supplied to the inside of the crucible 31. At this time, the control unit 46 controls the alternating current input to the electromagnet 48 e and monitors the change in the weight of the workpiece W inside the storage unit 41 measured by the load cell 42. That is, the weight of the workpiece W supplied into the crucible 31 is calculated from the measured change in the weight of the workpiece W, and the supply amount of the supplied workpiece W per time and the total supply amount are calculated. And are calculated. When the calculated supply amount per hour is different from a preset target value, the amplitude and frequency of the alternating current input to the electromagnet 48e are adjusted, and the supply amount per hour of the workpiece W is set as the target. Feedback control is performed so as to obtain a value. Further, when the calculated total supply amount reaches the target value, the supply of the alternating current to the electromagnet 48e is stopped. As a result, a necessary amount of the workpiece W in the storage unit 41 can be taken out by the feeder 44 and supplied to the crucible 31 of the dissolution processing unit 30 via the chute 45, and an optimal amount can be obtained by the dissolution processing unit 30. The workpiece W can be dissolved.

ここで、供給機構40において、貯蔵部41が真空槽10の内部に設けられていることで、溶解処理部30に被処理物Wを供給するに際して、弁の切替や排気手段による再排気などをする必要がないので、貯蔵部41の被処理物Wを速やかに溶解処理部30へ供給することができる。また、被処理物Wの供給に際して、大気開放する必要がないことから、真空槽10の内部が汚染されてしまうことを防止することができ、被処理物Wの溶解物について、品質を向上させることができる。また、搬送手段43は、設定された搬送速度及び搬送時間に応じて、貯蔵部41の被処理物Wを必要となる量だけ取り出して搬送することが可能であり、貯蔵部41の被処理物W全てを一度に搬送するわけではない。このため、必要に応じて繰り返し溶解処理部30に被処理物Wを所望の供給量となるように正確に供給することができる。   Here, in the supply mechanism 40, since the storage unit 41 is provided inside the vacuum chamber 10, when the workpiece W is supplied to the dissolution processing unit 30, switching of the valve, re-evacuation by an exhaust unit, and the like are performed. Therefore, the workpiece W in the storage unit 41 can be quickly supplied to the dissolution processing unit 30. In addition, since it is not necessary to release the atmosphere when supplying the workpiece W, the inside of the vacuum chamber 10 can be prevented from being contaminated, and the quality of the dissolved matter of the workpiece W can be improved. be able to. Moreover, the conveyance means 43 can take out the to-be-processed object W of the storage part 41 by the required quantity according to the set conveyance speed and conveyance time, and can convey it. Not all W is transported at once. For this reason, the to-be-processed object W can be correctly supplied so that it may become a desired supply amount to the melt | dissolution process part 30 repeatedly as needed.

なお、上記においては、予め溶解処理部30のルツボ31の内部に被処理物Wを収容しておくものとしたが、これに限ることは無く、真空槽10の内部を真空雰囲気とした後に、供給機構40から必要な量の被処理物Wを供給するものとしても良い。また、供給機構40から溶解処理部30へ被処理物Wを供給する際には、制御部46によって制御を行い、所望の量となるまで被処理物Wを供給して停止させた後に、溶解処理を行うものとしたが、これに限ることは無い。予め設定した時間当たりの供給量で被処理物Wを連続供給しながら溶解処理を行うものとしても良い。   In the above, the workpiece W is previously stored in the crucible 31 of the dissolution processing unit 30, but this is not a limitation, and after the inside of the vacuum chamber 10 is in a vacuum atmosphere, A necessary amount of workpiece W may be supplied from the supply mechanism 40. In addition, when the workpiece W is supplied from the supply mechanism 40 to the dissolution processing unit 30, the control unit 46 performs control, and after supplying the workpiece W to a desired amount and stopping it, the dissolution is performed. Although processing is performed, the present invention is not limited to this. It is good also as what performs a melt | dissolution process, supplying the to-be-processed object W continuously with the supply amount per time set beforehand.

また、上記においては、搬送手段として、フィーダ44、特に電磁石48eで駆動する電磁フィーダを例に挙げたが、これに限るものでは無い。例えば、振動フィーダとしては、圧電素子による振動で搬送させる圧電フィーダなどとしても良い。あるいは、ベルトコンベアなどを搬送手段として利用しても良い。しかしながら、本実施形態で説明した電磁フィーダを利用することで、圧電フィーダと比較して高い搬送能力を確保することができる。また、ベルトコンベアと比較して小型化を図ることができる。また、搬送手段の一部として、貯蔵部41からの被処理物Wの供給量を制御するために、貯蔵部41の下部開口41bに開閉可能な弁を設けるものとしても良い。   In the above description, the feeder 44, in particular, the electromagnetic feeder driven by the electromagnet 48e has been described as an example of the conveying means, but is not limited thereto. For example, the vibration feeder may be a piezoelectric feeder that is conveyed by vibration by a piezoelectric element. Or you may utilize a belt conveyor etc. as a conveyance means. However, by using the electromagnetic feeder described in the present embodiment, it is possible to ensure a high transport capability as compared with the piezoelectric feeder. Moreover, size reduction can be achieved compared with a belt conveyor. Further, as a part of the conveying means, a valve that can be opened and closed may be provided in the lower opening 41 b of the storage unit 41 in order to control the supply amount of the workpiece W from the storage unit 41.

また、真空槽10において、溶解処理部30の溶解炉32が設けられた本体部11と、供給機構40の貯蔵部41が設けられた供給部12とは、ともに真空ポンプ20で排気されるものとしたが、これに限るものでは無い。本体部11と供給部12とは、隔離されていて、別々の排気系統で排気するものとしても良い。また、真空槽10を本体部11と供給部12とに分けずに、溶解処理部30の溶解炉32と供給機構40の貯蔵部41とを一つのエリア内に配置するものとしても良い。   Further, in the vacuum chamber 10, both the main body part 11 provided with the melting furnace 32 of the melting processing part 30 and the supply part 12 provided with the storage part 41 of the supply mechanism 40 are exhausted by the vacuum pump 20. However, it is not limited to this. The main body 11 and the supply unit 12 may be isolated and exhausted by separate exhaust systems. Moreover, it is good also as what arrange | positions the melting furnace 32 of the melting process part 30, and the storage part 41 of the supply mechanism 40 in one area, without dividing the vacuum chamber 10 into the main-body part 11 and the supply part 12. FIG.

また、本実施形態では、真空処理装置の一例として、真空誘導溶解炉を例として挙げたが、これに限るものでは無く、真空槽を有し、真空雰囲気で被処理物に対して物理的あるいは化学的な処理を行う様々な装置に適用可能である。   In the present embodiment, a vacuum induction melting furnace is given as an example of a vacuum processing apparatus. However, the present invention is not limited to this, and a vacuum tank is provided to physically or against a workpiece in a vacuum atmosphere. The present invention can be applied to various apparatuses that perform chemical treatment.

以上、本発明の実施形態について図面を参照して詳述したが、具体的な構成はこの実施形態に限られるものではなく、本発明の要旨を逸脱しない範囲の設計変更等も含まれる。   As mentioned above, although embodiment of this invention was explained in full detail with reference to drawings, the concrete structure is not restricted to this embodiment, The design change etc. of the range which does not deviate from the summary of this invention are included.

この発明の実施形態の真空誘導溶解炉の概要を示す全体図である。1 is an overall view showing an outline of a vacuum induction melting furnace according to an embodiment of the present invention.

符号の説明Explanation of symbols

1 真空誘導溶解炉(真空処理装置)
10 真空槽
10a 内部
20 真空ポンプ(排気手段)
30 溶解処理部(処理手段)
31 ルツボ
35 誘導加熱コイル
40 供給機構
41 貯蔵部
42 ロードセル(計測手段)
43 搬送手段
46 制御部
47 トラフ
48 起振部
W 被処理物
1 Vacuum induction melting furnace (vacuum processing equipment)
10 Vacuum chamber 10a Inside 20 Vacuum pump (exhaust means)
30 Dissolution treatment part (treatment means)
31 crucible 35 induction heating coil 40 supply mechanism 41 storage unit 42 load cell (measuring means)
43 Conveying means 46 Control unit 47 Trough 48 Shaking unit W Workpiece

Claims (5)

真空槽と、該真空槽の内部を真空雰囲気に排気可能な排気手段と、前記真空槽の内部で被処理物に所定の処理を行う処理手段と、該処理手段に前記被処理物を供給する供給機構とを備えた真空処理装置であって、
前記供給機構は、前記真空槽の内部に設けられ、前記被処理物が貯蔵された貯蔵部と、
該貯蔵部から前記被処理物を所望の量だけ取り出して前記処理手段へ搬送する搬送手段とを備えることを特徴とする真空処理装置。
A vacuum chamber; an evacuation unit capable of evacuating the inside of the vacuum chamber to a vacuum atmosphere; a processing unit that performs a predetermined process on the processing object inside the vacuum chamber; and supplying the processing object to the processing unit A vacuum processing apparatus comprising a supply mechanism,
The supply mechanism is provided inside the vacuum chamber, and a storage unit in which the object to be processed is stored;
A vacuum processing apparatus comprising: a transport unit that takes out a desired amount of the object to be processed from the storage unit and transports the processed product to the processing unit.
請求項1に記載の真空処理装置において、
前記搬送手段は、一方側が前記貯蔵部の前記被処理物を受け取り可能に配置されるとともに、他方側が前記処理手段に前記被処理物を供給可能に配置されたトラフと、
該トラフ上の前記被処理物を前記一方側から前記他方側に向かって移動可能に前記トラフに振動を与える起振部とを有することを特徴とする真空処理装置。
The vacuum processing apparatus according to claim 1,
The transporting means is arranged such that one side can receive the object to be processed of the storage unit, and the other side is arranged to be able to supply the object to be processed to the processing means,
A vacuum processing apparatus, comprising: a vibration generating unit that vibrates the trough so that the workpiece on the trough can move from the one side toward the other side.
請求項2に記載の真空処理装置において、
前記搬送手段は、前記トラフ上の前記被処理物が所望の搬送量となるように前記起振部による振動を制御する制御部を有することを特徴とする真空処理装置。
The vacuum processing apparatus according to claim 2,
The vacuum processing apparatus, wherein the transport unit includes a control unit that controls vibration by the vibration generating unit so that the object to be processed on the trough has a desired transport amount.
請求項3に記載の真空処理装置において、
前記供給機構は、前記貯蔵部内の前記被処理物の重量を計測する計測手段を備え、
前記搬送手段の前記制御部は、前記計測手段によって計測される前記被処理物の重量の変化に応じて前記起振部による振動を制御することを特徴とする真空処理装置。
The vacuum processing apparatus according to claim 3.
The supply mechanism includes a measuring unit that measures the weight of the object to be processed in the storage unit,
The vacuum processing apparatus according to claim 1, wherein the control unit of the transport unit controls vibration by the vibration generating unit in accordance with a change in the weight of the workpiece measured by the measurement unit.
請求項1から請求項4のいずれかに記載の真空処理装置において、
前記処理手段として、前記被処理物を収容するルツボと、該ルツボの外側に設けられて電源の供給により該ルツボ内の前記被処理物の加熱を行う誘導加熱コイルとを有し、前記ルツボ内の前記被処理物を溶解させる真空誘導溶解炉であることを特徴とする真空処理装置。
In the vacuum processing apparatus in any one of Claims 1-4,
The processing means includes: a crucible that accommodates the object to be processed; and an induction heating coil that is provided outside the crucible and that heats the object to be processed in the crucible by supplying power. A vacuum processing apparatus characterized by being a vacuum induction melting furnace for melting the object to be processed.
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Cited By (4)

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Publication number Priority date Publication date Assignee Title
US8684151B2 (en) 2011-03-09 2014-04-01 Sinfonia Technology Co., Ltd. Raw material loading apparatus and pipe unit for raw material loading apparatus
US8881885B2 (en) 2010-08-09 2014-11-11 Sinfonia Technology Co., Ltd. Raw material loading apparatus
CN105772659A (en) * 2016-05-31 2016-07-20 重庆钢铁(集团)有限责任公司 Casting system for vacuum induction furnace
ITUA20162690A1 (en) * 2016-04-18 2017-10-18 Fonderia Ghirlandina Spa FOUNDRY PLANT FOR CASTING CAST IRONS

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JPS5211109A (en) * 1975-07-17 1977-01-27 Ishikawajima Harima Heavy Ind Co Ltd Continuous raw material feed apparatus in vacuum melting furnaces
JPS62285824A (en) * 1986-06-02 1987-12-11 Akatake Eng Kk Oscillating type granular material supply device
JP2003021470A (en) * 2001-07-05 2003-01-24 Shinko Electric Co Ltd System and method for feeding material

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JPS5211109A (en) * 1975-07-17 1977-01-27 Ishikawajima Harima Heavy Ind Co Ltd Continuous raw material feed apparatus in vacuum melting furnaces
JPS62285824A (en) * 1986-06-02 1987-12-11 Akatake Eng Kk Oscillating type granular material supply device
JP2003021470A (en) * 2001-07-05 2003-01-24 Shinko Electric Co Ltd System and method for feeding material

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8881885B2 (en) 2010-08-09 2014-11-11 Sinfonia Technology Co., Ltd. Raw material loading apparatus
US8684151B2 (en) 2011-03-09 2014-04-01 Sinfonia Technology Co., Ltd. Raw material loading apparatus and pipe unit for raw material loading apparatus
ITUA20162690A1 (en) * 2016-04-18 2017-10-18 Fonderia Ghirlandina Spa FOUNDRY PLANT FOR CASTING CAST IRONS
CN105772659A (en) * 2016-05-31 2016-07-20 重庆钢铁(集团)有限责任公司 Casting system for vacuum induction furnace

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