JP2010022884A - Apparatus for cleaning object to be treated - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an apparatus for cleaning an object to be treated, capable of reducing the loss of a cleaning liquid used in the cleaning treatment, of reducing the amount of the consumed cleaning liquid, and of reducing the cost therefor. <P>SOLUTION: Upon subjecting the object A to be treated to a submerged cleaning treatment using an apparatus 1 for cleaning an object to be treated, vapor Ca of a fluorinated solvent C released into a first treatment tank 1B is cooled to a temperature lower than its boiling point by virtue of the cooling action of a cooling jacket 3 disposed below a second treatment tank 2B. The object A is subjected to a submerged cleaning treatment by submerging the same in a fluorinated solvent C stored in the second treatment tank 2B disposed in the first treatment tank 1B. Upon proceeding to a vapor-cleaning treatment from the submerged cleaning treatment, the object A is kept stored in the second treatment tank 2B without changing its position, and is subjected to a vapor-cleaning treatment by replacing the fluorinated solvent C stored in the second treatment tank 2B with its vapor Ca. Upon returning to the submerged cleaning treatment from the vapor-cleaning treatment, the vapor Ca released into the second treatment tank 2B is replaced with the fluorinated solvent C to carry out the subsequent submerged cleaning treatment. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention cleans an object to be processed such as a semiconductor substrate, a liquid crystal substrate, a plasma display panel substrate (PDP substrate), an electronic component such as an electroluminescence substrate (EL substrate), a machined component or a precision component. It is related with the to-be-processed object cleaning apparatus used when performing.

  Conventionally, as a cleaning device for cleaning the object to be processed, for example, there is a rotary cleaning device disclosed in Patent Document 1. In this apparatus, the cleaning liquid stored in the outer casing is heated and evaporated by a heater, and the vaporized gas of the cleaning liquid is discharged into the outer casing. After the object to be cleaned is immersed and cleaned in the cleaning liquid stored in the inner casing of the outer casing, the cleaning target vaporized gas discharged from the cleaning liquid in the inner casing is discharged above the inner casing. Then, the substrate is subjected to a steam cleaning process, and a cleaning liquid remaining on the object to be cleaned is dropped and dried.

However, since the vaporized gas of the cleaning liquid released into the outer casing is condensed and liquefied by the cooling action of the cooling pipe provided on the inner wall near the opening of the outer casing, the vaporized gas becomes closer to the cooling pipe. The concentration of increases. The amount of vaporized gas released between the liquid level of the cleaning liquid and the cooling pipe is larger than the amount of vaporized gas required when cleaning the cleaning liquid remaining on the object to be cleaned with steam. Since the vaporized gas in the board is saturated, the vaporized gas in the cleaning liquid flows out of the apparatus together with the object to be cleaned when the object to be cleaned is taken out from the outer casing. For this reason, since the loss of the cleaning liquid is large and the consumption amount increases, the cost for cleaning the object to be cleaned increases.
Japanese Utility Model Publication No. 51-53767

  An object of the present invention is to provide an apparatus for cleaning an object to be processed which can reduce the loss of the cleaning liquid used for the cleaning process and can reduce the consumption and cost.

The present invention is a processing object cleaning apparatus for cleaning processing by immersing the processing object in a cleaning liquid stored in a processing tank,
The treatment tank is composed of a first treatment tank sealed in an airtight state and a second treatment tank provided inside the first treatment tank, and the first treatment tank is located near the first treatment tank. A distillation tank for generating vapor of the cleaning liquid supplied to the tank, and a liquid storage tank for storing the cleaning liquid supplied to the second processing tank, and between the first processing tank and the distillation tank, A vapor path for supplying the vapor of the cleaning liquid generated in the distillation tank to the first processing tank; and an exhaust path for exhausting the vapor of the cleaning liquid released into the first processing tank to the distillation tank; 2 between the treatment tank and the liquid storage tank, a discharge path for discharging the cleaning liquid stored in the second processing tank to the liquid storage tank, and the cleaning liquid stored in the liquid storage tank to the second processing tank A supply path for supplying the steam, and the steam of the cleaning liquid discharged into the first processing tank below the second processing tank inside the first processing tank. Characterized in that it is a object to be processed cleaning device having a steam cooling means for cooling to a temperature below the boiling point of.

  As an aspect of this invention, the steam cooling means can be provided along the lower inner wall of the first processing tank below the bottom of the second processing tank.

  Further, as an aspect of the present invention, a space in which the flow of the cleaning liquid vapor is allowed can be provided between the inner wall surface of the first treatment tank and the outer wall surface of the second treatment tank.

  As an aspect of the present invention, one end of the steam path can be connected to the upper part of the distillation tank, and the other end of the steam path can be connected to the bottoms of the first processing tank and the second processing tank.

  The cleaning liquid may be composed of, for example, a fluorine-based solvent, a hydrocarbon-based solvent, a chlorine-based solvent, a bromine-based solvent, a volatile solvent, pure water, or the like. One type of solvent selected from among system solvents and volatile solvents is used as the cleaning liquid. Further, the steam cooling means can be constituted by, for example, a cooling jacket, a cooling coil, or the like in which a refrigerant cooled by a refrigerator is circulated and supplied.

  The rectifying screen can be constituted by a plate-like screen formed by punching a large number of holes in a metal plate, for example. As a substitute for the plate-shaped screen, for example, a net, a nonwoven fabric, a cotton-like entangled body, a porous body, or the like may be used as long as it has a rectifying function equivalent to that of the plate-shaped screen.

  According to the present invention, when the processed object to be cleaned is taken out of the first processing tank, the amount of steam leaked out of the tank together with the target object is reduced. Thereby, the loss of the cleaning liquid used for the cleaning process can be reduced, and the consumption and cost can be reduced.

  As shown in FIGS. 1 to 4, the object cleaning apparatus 1 of the present invention includes an immersion cleaning process using a liquid fluorinated solvent C and a fluorine-based process inside a first processing tank 1B that is hermetically sealed. The 2nd processing tank 2B used together with the vapor | steam washing process by the vapor | steam Ca of the solvent C is arrange | positioned. When the immersion cleaning process is performed, the workpiece A is immersed in the fluorinated solvent C stored in the second processing tank 2B to perform the immersion cleaning process. When shifting from the immersion cleaning process to the steam cleaning process, the fluorine-based solvent C in the second processing tank 2B is changed to the vapor Ca without changing the position while the workpiece A is accommodated in the second processing tank 2B. Replace and steam clean. Further, when returning from the steam cleaning process to the immersion cleaning process, the single solvent cleaning apparatus replaces the vapor Ca released to the second processing tank 2B with the fluorine-based solvent C and performs the immersion cleaning process.

  At the center of the upper surface of the first treatment tank 1B, an opening 1a formed in a size and shape that allows the workpiece A to be taken in and out is provided. In addition, the opening 1a is provided with a lid 1b formed in a size and shape so as to close the opening 1a so as to be freely opened and closed. That is, since the opening 1a of the first treatment tank 1B is closed with the lid 1b and the cleaning process is performed, it is possible to prevent the vapor Ca of the fluorine-based solvent C from flowing out of the tank. Loss can be reduced.

  One end of an exhaust passage 1e for exhausting the vapor Ca of the fluorinated solvent C discharged into the first treatment tank 1B is connected to the lower left wall of the first treatment tank 1B via a valve 1d. . The other end of the exhaust path 1e is connected to the upper side wall of the liquid storage tank 7 described later. That is, the vapor Ca of the fluorine-based solvent C released into the first treatment tank 1B is extracted from the exhaust passage 1e and supplied to the liquid storage tank 7.

  A discharge path 1g for discharging the fluorinated solvent C stored in the first treatment tank 1B is connected to the right bottom of the first treatment tank 1B via a valve 1f.

  A thermo-type temperature sensor 1h for detecting the temperature of the vapor Ca stored in the first processing tank 1B is provided on the inner lower side wall of the first processing tank 1B. That is, based on the detection by the temperature sensor 1h, the cooling temperature of the cooling jacket 3 described later is raised and lowered to a temperature at which the vapor Ca of the fluorinated solvent C released into the first treatment tank 1B is condensed and liquefied. Control.

  The second processing tank 2B is formed in a quadrangle when viewed from above, is formed in a size and shape that allows the object A to be accommodated, and the first processing tank 1B has an inner center in the first processing tank 1B. It arrange | positions directly under the opening part 1a of the processing tank 1B. Further, a space D in which the flow of the vapor Ca of the fluorinated solvent C generated in the distillation tank 8 described later is allowed between the inner wall surface of the first treatment tank 1B and the outer wall surface of the second treatment tank 2B. Is provided.

  In the center of the upper surface of the second treatment tank 2B, there is provided an opening 2a that communicates with the opening 1a of the first treatment tank 1B and has the same size and shape as the opening 1a. In addition, a lid body 2b indicated by a virtual line in the figure formed in a size and shape that closes the opening 2a may be provided in the opening 2a of the second treatment tank 2B so as to be freely opened and closed. When subjecting the object to be processed A to the steam cleaning process in the second processing tank 2B, if the opening 2a of the second processing tank 2B is closed with the lid 2b, the fluorine-based solvent C is removed from the second processing tank 2B. Can be prevented from flowing out, and loss of the fluorine-based solvent C can be reduced.

  On the inner bottom of the second treatment tank 2B, a plate-shaped rectifying screen 2c formed by punching holes 2d with the same hole diameter on the entire surface of the metal plate is horizontally installed. The holes 2d are formed as round holes having a diameter of about 1 mm to 2 mm when viewed from above, and are arranged in large numbers at predetermined equal intervals with respect to the entire surface of the rectifying screen 2c and stored in the second treatment tank 2B. The passage of the fluorinated solvent C and the vapor Ca is allowed.

  Further, when the fluorine-based solvent C stored in the second treatment tank 2B passes through the holes 2d of the rectifying screen 2c, it is evenly directed toward the discharge path 2f connected to the right bottom of the second treatment tank 2B. Therefore, the fluorine-based solvent C can be prevented from staying at the corners in the second treatment tank 2B (see FIG. 3).

  Ultrasonic vibrators 2e for inducing ultrasonic vibrations in the fluorinated solvent C stored in the second processing tank 2B are provided on the lower outer walls on all sides of the second processing tank 2B. That is, the ultrasonic vibrator 2e induces ultrasonic vibration in the fluorinated solvent C stored in the second treatment tank 2B, thereby separating and removing foreign matters such as oil and residual liquid adhering to the workpiece A. (See FIG. 2).

  One end of a discharge path 2f for taking out the fluorinated solvent C and the vapor Ca from the second processing tank 2B is connected to the right bottom of the second processing tank 2B. The other end of the discharge path 2f is branched into two branch discharge paths 2g and 2i. One branch discharge path 2g is connected to the upper side wall corresponding to the liquid storage area of the liquid storage tank 7 via the air valve 2h. It is connected. The other branch discharge path 2i is connected to the downstream side from the junction of the discharge paths 2u through a valve 2j. That is, the fluorinated solvent C and the vapor Ca taken out from the second treatment tank 2B are supplied to the liquid storage tank 7 through the discharge path 2f and the branch discharge paths 2g and 2i.

  If the number of the discharge passages 2f and the branch discharge passages 2g, 2i is increased, the outflow amount of the fluorinated solvent C and the vapor Ca taken out from the second treatment tank 2B is increased, so that the time for taking out is shortened, The work of replacing the fluorine-based solvent C and the vapor Ca can be performed efficiently.

  One end of a discharge path 2m for taking out the fluorinated solvent C and the vapor Ca from the second processing tank 2B is connected to the lower right wall of the second processing tank 2B via a valve 2k. The other end of the discharge path 2m is connected to the lower right wall of the first treatment tank 1B. That is, the fluorine-based solvent C and the vapor Ca taken out from the second processing tank 2B are supplied to the first processing tank 1B through the discharge path 2m.

  A liquid level indicator 2q for displaying the liquid level of the fluorinated solvent C stored in the second treatment tank 2B is provided on the right outer wall of the second treatment tank 2B via the valve 2n and the bypass 2p. Connected. Float switches 2r and 2r for detecting the liquid level of the fluorinated solvent C stored in the second treatment tank 2B are provided at the upper and lower ends of the liquid level indicator 2q. That is, the storage amount of the fluorinated solvent C stored in the second treatment tank 2B is controlled based on the detection by the float switch 2r.

  A storage tank 2s for storing the fluorinated solvent C overflowed from the second processing tank 2B is provided on the four upper outer walls of the second processing tank 2B. That is, when the storage amount of the fluorinated solvent C stored in the second processing tank 2B exceeds the upper limit storage level, the V-shaped, U-shaped, etc. formed on the upper ends of the four side walls of the second processing tank 2B Overflow from a groove (not shown) to the storage tank 2s.

  One end of a discharge path 2u for taking out the fluorinated solvent C from the storage tank 2s is connected to the bottom of the storage tank 2s through a valve 2t. The other ends of the discharge passages 2u are joined together and connected to the ceiling of the liquid storage tank 7 through a valve 2v and an air valve 2w. That is, the fluorinated solvent C overflowed into the storage tanks 2s is taken out from the discharge passages 2u and supplied to the liquid storage tank 7.

  A discharge path 2x for taking out the fluorinated solvent C from the storage tank 2s is connected to the lower side wall of the storage tank 2s. That is, the fluorinated solvent C overflowed into the storage tanks 2s is taken out from the discharge passages 2u, and flows down to its bottom in the first treatment tank 1B.

  On the lower inner wall near the liquid level of the fluorinated solvent C stored in the bottom of the first treatment tank 1B below the bottom of the second treatment tank 2B, the fluorine-based solvent C released into the first treatment tank 1B The cooling jacket 3 for cooling the vapor | steam Ca to the temperature lower than a boiling point is arrange | positioned (refer FIG. 4). That is, since the cooling jacket 3 can be provided near the liquid surface of the fluorinated solvent C stored in the bottom of the first treatment tank 1B, the concentrated vapor Ca drifting near the liquid surface can be efficiently condensed and liquefied. Can do. For example, the vapor Ca released into the first treatment tank 1B can be kept at a low concentration during idling when the cleaning process is suspended.

  One outport of the cooling jacket 3 is connected to the import side of the refrigerator 4 via the expansion valve 4a and the recovery path 4b, and the other import includes a dryer 4c, a valve 4d, a sight glass 4e, It is connected to the outport side of the refrigerator 4 through the supply path 4f. That is, the cooling jacket 3 is cooled to a temperature lower than the boiling point of the fluorinated solvent C by the refrigerant supplied from the refrigerator 4, and the vapor Ca of the fluorinated solvent C released into the first treatment tank 1B is condensed and liquefied. Temperature. In addition, the cooling jacket 3 condenses and liquefies atmospheric moisture flowing into the first treatment tank 1B.

  The refrigerator 4 includes a compressor, a condenser, a liquid receiving tank, and the like (not shown), and compresses the evaporated and evaporated refrigerant supplied from the cooling jacket 3 by the compressor. The refrigerant compressed to a high pressure by the compressor is liquefied by the condenser and received in the liquid receiving tank. The high-pressure refrigerant received in the liquid receiving tank is squeezed and expanded by the expansion valve 4a. The refrigerant which has been expanded by the expansion valve 4 a and has become a low pressure is supplied to the cooling jacket 3. The refrigerant supplied to the cooling jacket 3 takes heat from the vapor Ca released into the first treatment tank 1B and evaporates. The refrigerant evaporated in the cooling jacket 3 is supplied again to the refrigerator 4 (see FIG. 1).

  The lower right wall of the first treatment tank 1B is for collecting the fluorinated solvent C stored at the bottom of the first treatment tank 1B via a valve 5a, an air valve 5b, and a collection path 5c. A buffer tank 5 is connected. That is, the fluorinated solvent C stored at the bottom of the first treatment tank 1B is extracted from the recovery path 5c and supplied to the buffer tank 5.

  A float switch 5 d for detecting the liquid level of the fluorinated solvent C stored in the buffer tank 5 is connected to the lower right wall of the buffer tank 5. That is, the storage amount of the fluorinated solvent C stored in the buffer tank 5 is controlled based on the detection by the float switch 5d.

  An exhaust passage 5 e for extracting air from the buffer tank 5 is connected to the ceiling of the buffer tank 5. Further, one end of a liquid feed path 5j is connected to the bottom of the buffer tank 5 through valves 5f and 5i, a liquid feed pump 5g, and a check valve 5h. The other end of the liquid feed path 5j is connected to the upper right wall of the first tank 6a formed in the water separation tank 6 described later. Further, a discharge path 5m for discharging the liquid stored in the buffer tank 5 is connected to one end of the liquid feed path 5j through a valve 5k.

  The water separation tank 6 is composed of a first tank 6a, a second tank 6b, and a third tank 6c, and partition walls 6d and 6e that are suspended from the ceiling of the water separation tank 6 and are erected at the bottom. The divided walls 6f and 6g are divided into three tanks.

  A drainage path 6i is connected to each of the side walls corresponding to the right and left liquid levels of the first tank 6a partitioned by the partition wall 6d via a valve 6h. That is, light water with a specific gravity that floats on the right and left liquid surfaces of the first tank 6a is extracted from the drainage channel 6i and separated.

  The fluorine-based solvent C supplied from the buffer tank 5 is temporarily stored in the first tank 6a of the water separation tank 6, and the solvent stored in the first tank 6a is a low-specific gravity fluorine-based solvent C and a specific gravity. Separated into heavy solvent. The solvent having a high specific gravity flows from the lower right portion of the first tank 6a to the lower left portion.

  In addition, fine foreign matter is likely to be collected due to the surface tension of the solvent at the boundary portion between the lower specific gravity side solvent stored in the first tank 6a and the lower specific gravity side solvent. Since the accumulated foreign matter can prevent the passage of foreign matter larger than the fine foreign matter, a filtering action as a filter can be obtained. The foreign matter accumulated at the boundary portion is periodically removed.

  The heavy solvent having flowed into the left side of the first tank 6a gets over the partition wall 6f and overflows to the right side of the second tank 6b. The heavy solvent having flowed into the left side of the second tank 6b gets over the partition wall 6g and overflows into the third tank 6c. As a result, water and solvent having a low specific gravity are separated, and a solvent having a high specific gravity can be supplied to the liquid storage tank 7 via a liquid feed path 6p described later.

  A discharge path 6k for discharging the liquid stored in each tank 6a to 6c is connected to the bottom of each tank 6a to 6c via a valve 6j. Moreover, the exhaust path 6m for extracting air from each tank 6a-6c is connected to the ceiling part of each tank 6a-6c, respectively.

  One end of a liquid feed path 6p is connected to the lower left wall of the third tank 6c via a valve 6n. The other end of the liquid feeding path 6p is connected to the upper right wall of the liquid storage tank 7 described later.

  The liquid storage tank 7 is disposed outside the first processing tank 1B below the bottom of the second processing tank 2B. Further, on the inner bottom portion of the liquid storage tank 7, a sheath type heater 7a for heating the fluorinated solvent C stored in the liquid storage tank 7, and a fluorinated solvent C and steam Ca for cooling. The cooling coil 7b is arranged at a predetermined interval.

  The cooling coil 7b is connected to the refrigerator 4 through the expansion valve 7c, and is cooled to a temperature lower than the boiling point of the fluorinated solvent C by the refrigerant supplied from the refrigerator 4 to condense the vapor Ca. Liquefaction.

  A thermo-type temperature sensor 7 d for detecting the liquid temperature of the solvent stored in the liquid storage tank 7 is provided on the inner wall corresponding to the liquid storage area of the liquid storage tank 7. That is, based on the detection by the temperature sensor 7d, the heating temperature by the heater 7a and the cooling temperature by the cooling coil 7b are raised and lowered, and the fluorinated solvent C is controlled to a temperature suitable for the cleaning process.

  One end of a supply path 7h is connected to the left bottom of the liquid storage tank 7 through valves 7e and 7g and a liquid feed pump 7f. The other end of the supply path 7h is connected to the upper right wall of the distillation tank 8 described later, and supplies the fluorinated solvent C stored in the liquid storage tank 7 to the distillation tank 8.

  In addition, one end of the supply path 7p is connected to the tank bottom on the left side of the supply path 7h via valves 7i, 7j, 7m, a Y-type strainer 7k, and a circulation pump 7n. The other end of the supply path 7p is above the opening 2a of the second treatment tank 2B via the air valve 7r and first and second filtration devices 9, 9 described later, and the first treatment tank 1B. It is connected to a supply port 1c provided on the upper side wall. A discharge passage 7t for discharging liquid from the supply passage 7p is connected to the supply passage 7p upstream and downstream of the circulation pump 7n via a valve 7s.

  A liquid level indicator 7w for displaying the liquid level of the fluorinated solvent C stored in the liquid storage tank 7 is provided on the left outer wall of the liquid storage tank 7 through a valve 7u and a bypass 7v. Is connected. A water supply port 7y is connected to the left upper outer wall via a valve 7x.

  A plurality of float switches 7z for detecting the liquid level of the solvent stored in the liquid storage tank 7 are arranged on the left central inner wall at predetermined intervals in the vertical direction. That is, the storage amount of the solvent stored in the liquid storage tank 7 is controlled based on detection by the float switch 7z.

  A discharge path 7a2 for discharging the solvent stored in the liquid storage tank 7 is connected to the tank bottom on the right side of the supply path 7h via a valve 7a1.

  At the inner bottom of the distillation tank 8, seed-type heaters 8a and 8a for heating the fluorinated solvent C stored in the distillation tank 8 to the boiling point or a temperature close to the boiling point are arranged at a predetermined interval. Yes. On the inner wall corresponding to the liquid storage area of the distillation tank 8, a temperature sensor 8b for detecting the liquid temperature of the fluorinated solvent C stored in the distillation tank 8 is provided. That is, based on detection by the temperature sensor 8b, the heating temperature by the heater 8a is raised and lowered, and controlled to a temperature at which the fluorinated solvent C stored in the distillation tank 8 evaporates.

  A liquid level indicator 8e for displaying the liquid level of the fluorinated solvent C stored in the distillation tank 8 is connected to the left outer wall of the distillation tank 8 through a valve 8c and a bypass 8d. Yes.

  Float switches 8f for detecting the liquid level of the fluorinated solvent C stored in the distillation tank 8 are arranged on the left central inner wall at an upper, middle, and lower positions at a predetermined interval. That is, the storage amount of the fluorinated solvent C stored in the distillation tank 8 is controlled based on detection by the float switch 8f.

  Moreover, the discharge path 8h for discharging the liquid stored in the distillation tank 8 is connected to the left bottom part of the distillation tank 8 through the valve 8g.

  The upper outer wall of the distillation tank 8 is provided with one end of a vapor path 8i for supplying the vapor Ca of the fluorinated solvent C evaporated in the distillation tank 8 to the second treatment tank 2B and the first treatment tank 1B. Connected. The other end of the steam path 8i is branched into one branch steam path 8j and the other branch steam path 8n. The one branch steam path 8j is connected to the second treatment tank 2B via a valve 8k and an air valve 8m. Connected to the bottom side wall corresponding to the liquid storage area. The other branch steam path 8n is connected to the bottom side wall below the cooling jacket 3 corresponding to the liquid storage area of the first treatment tank 1B via the valve 8p and the air valve 8q. That is, the vapor Ca of the fluorinated solvent C evaporated in the distillation tank 8 is supplied from the lower region side to the inside of the second processing tank 2B and the first processing tank 1B.

  The filtration device 9 includes filters 9a and 9a for filtering the fluorinated solvent C, and valves 9b for variably adjusting the amount of the fluorinated solvent C passing through the filter 9a. That is, when supplying the fluorine-based solvent C stored in the liquid storage tank 7 to the second treatment tank 2B, the fluorine-based solvent C is supplied after being purified and filtered by the pair of filters 9a and 9a.

  Further, a pressure sensor 9d and a sensor control device 9e are connected to the supply path 7p immediately before the first and second filtration devices 9 via a valve 9c. That is, based on the detection by the pressure sensor 9d, the transfer pressure of the fluorinated solvent C supplied to the filtration device 9 is controlled.

  In addition, one end of a return path 9i is connected to the supply path 7p immediately after the second filtration device 9 via valves 9f and 9h and an air valve 9g. The other end of the return path 9 i is connected to the ceiling of the liquid storage tank 7, and returns the fluorinated solvent C filtered by the filtration device 9 to the liquid storage tank 7.

  The illustrated embodiment is configured as described above, and a method for cleaning the object to be processed A by the object cleaning apparatus 1 will be described below.

  First, as shown in FIG. 1, when the workpiece A is subjected to immersion cleaning, the lid 1b of the first treatment tank 1B and the lid 2b of the second treatment tank 2B are opened, and the treatment tank 1B, After opening the opening portions 1a and 2a of 2B, the workpiece A is carried into the first processing tank 1B by an elevating device (not shown) and immersed in the fluorinated solvent C stored in the second processing tank 2B in advance. Alternatively, it is passed through the vapor Ca discharged onto the liquid surface of the fluorinated solvent C stored in the second treatment tank 2B and immersed in the fluorinated solvent C stored in the second treatment tank 2B.

  When the entire workpiece A is immersed in the fluorinated solvent C in the second treatment tank 2B, the openings 1a and 2a of the treatment tanks 1B and 2B are closed in an airtight state with the lids 1b and 2b. Thereafter, the ultrasonic vibrator 2e is vibrated ultrasonically to separate foreign matter such as oil and residual liquid adhering to the workpiece A by ultrasonic vibration of the fluorinated solvent C stored in the second treatment tank 2B. And removed (see FIG. 2).

  When the immersion cleaning process for the object to be processed A is completed, the fluorine-based solvent C stored in the second processing tank 2B is stored in the second processing tank 2B without changing the position while the object A is accommodated in the second processing tank 2B. Since the steam cleaning process is performed in one tank by replacing with the steam Ca, a cleaning effect equivalent to that of a multi-tank type cleaning device is obtained, drying loss is reduced, and diffusion of the fluorinated solvent C and the steam Ca is prevented. be able to.

  That is, after the supply of the fluorine-based solvent C to the second processing tank 2B is stopped, the fluorine-based solvent C stored in the second processing tank 2B is not repelled by gravity using its own weight. Since the liquid is discharged downward from the discharge path 2f and the branch discharge path 2g connected to the bottom of the second treatment tank 2B and supplied to the liquid storage tank 7, gravity is applied between the second treatment tank 2B and the liquid storage tank 7. The flow of the fluorinated solvent C along the line can be made (see FIG. 3). As a result, the fluorine-based solvent C and the foreign matter can be smoothly moved out of the tank without resistance, and can be efficiently supplied to the liquid storage tank 7 without staying in the corners of the second treatment tank 2B. it can. The fluorine-based solvent C stored in the liquid storage tank 7 is temporarily stored until the next immersion cleaning process is performed.

  Subsequently, the vapor Ca of the fluorine-based solvent C generated in the distillation tank 8 is taken out from the vapor path 8i and the branch vapor paths 8j and 8n and supplied to the first treatment tank 1B and the second treatment tank 2B, and the second treatment is performed. The workpiece A is subjected to a steam cleaning process with the steam Ca of the fluorine-based solvent C released into the tank 2B (see FIG. 4). Further, when the liquid level of the fluorinated solvent C discharged from the second treatment tank 2B is lowered, the atmospheric pressure in the second treatment tank 2B is also lowered. Therefore, by using the negative pressure, the vapor Ca of the fluorinated solvent C is used. Can be efficiently supplied into the second treatment tank 2B. Moreover, since the pressure of the vapor | steam Ca supplied to the 1st processing tank 1B is added to the liquid level of the fluorine-type solvent C stored in the 2nd processing tank 2B, rather than discharging | emitting only with its own weight, a fluorine-type solvent The time required for discharging C is shortened, and can be efficiently discharged from the second treatment tank 2B.

  Since the temperature of the fluorinated solvent C used for the immersion cleaning process is lower than the temperature of the vapor Ca used for the steam cleaning process, the steam Ca comes into contact with the surface of the workpiece A subjected to the immersion cleaning process. It is condensed and liquefied and adheres to the surface of the workpiece A. The fluorinated solvent C remaining on the workpiece A is dissolved in the condensed fluorinated solvent C and dropped together with the fluorinated solvent C onto the bottom of the second treatment tank 2B. Thereby, the fluorinated solvent C remaining on the workpiece A can be removed by washing with the vapor Ca of the fluorinated solvent C.

  The fluorinated solvent C containing the fluorinated solvent C dropped at the bottom of the second treatment tank 2B is taken out from the discharge path 2f and the branch discharge path 2g and supplied to the liquid storage tank 7. The fluorinated solvent C overflowed from the second treatment tank 2B to the storage tank 2s ... is taken out from the discharge path 2u ..., supplied to the liquid storage tank 7, and then temporarily stored in the liquid storage tank 7 until the immersion cleaning process is performed. Store it. A part of the fluorinated solvent C overflowed into the storage tanks 2s is taken out from the discharge passages 2u, and flows down to its bottom in the first treatment tank 1B.

  Since the fluorine-based solvent C stored in the liquid storage tank 7 is taken out from the supply path 7p and filtered by the filtering devices 9, 9, it is supplied to the second processing tank 2B and used for the next immersion cleaning process. The entire fluorine-based solvent C can be reliably filtered. Further, the fluorinated solvent C filtered in a clean state can be used for the immersion cleaning treatment.

  When supplying the fluorine-based solvent C stored in the liquid storage tank 7 to the second processing tank 2B, the supply amount of the fluorine-based solvent C is adjusted by a valve or the like, so that the liquid storage tank 7 transfers to the second processing tank 2B. If the amount of liquid supplied is increased, foreign substances such as light moisture, oil, and particles floating on the liquid surface of the second treatment tank 2B can overflow into the storage tank 2s together with the fluorinated solvent C. Thereby, the fluorine-based solvent C can be efficiently filtered without leaving starch in a short period of time. Further, if the amount of liquid supplied to the second processing tank 2B and the amount of liquid discharged from the second processing tank 2B are adjusted to increase or decrease, turbulent flow occurs in the solvent stored in the second processing tank 2B. It is easy to obtain an effect of efficiently discharging foreign substances without causing them to stay.

  When the steam cleaning process of the processing object A is completed, the lids 1b and 2b of the processing tanks 1B and 2B are opened, the openings 1a and 2a of the processing tanks 1B and 2B are opened, and then the processing object A Is lifted upward from the opening 2a of the second processing tank 2B by an elevating device (not shown) while passing through the vapor Ca of the fluorinated solvent C released above the opening 2a of the second processing tank 2B. Unload from the opening 1a of the 1 treatment tank 1B. Thereby, the immersion cleaning process and the steam cleaning process of the workpiece A are completed.

  The vapor Ca of the fluorine-based solvent C released into the first treatment tank 1B is cooled to a temperature lower than the boiling point by the cooling action of the cooling jacket 3 disposed below the bottom of the second treatment tank 2B, and the first treatment It is stored at the bottom of the tank 1B (see FIG. 4). That is, the closer to the cooling jacket 3, the higher the concentration of the vapor Ca of the fluorinated solvent C and the higher the specific gravity, so that the high concentration of vapor Ca is stored near the cooling jacket 3.

  The farther away from the cooling jacket 3, the lower the density of the vapor Ca of the fluorinated solvent C and the lower the specific gravity, so that the free board portion above the liquid level of the fluorinated solvent C stored in the second treatment tank 2B is saturated. Vapor Ca having a lower concentration is released.

  Compared with the concentration of the vapor Ca discharged downward from the bottom of the second treatment tank 2B, the concentration of the vapor Ca discharged upward from the opening 2a of the second treatment tank 2B is low, so When the processing object A is taken out from the second processing tank 2B and carried out from the opening 1a of the first processing tank 1B to the outside of the tank, the leakage amount of the vapor Ca taken out of the tank together with the processing object A is small. Become. Thereby, there is little loss of the fluorine-type solvent C used for a washing | cleaning process, and reduction of consumption and cost can be aimed at. In particular, even if the cleaning process is performed with the opening 1a of the first processing tank 1B being opened, the steam taken out of the tank is larger than that of a cleaning apparatus provided with a cooling pipe near the opening of the conventional example. Ca leakage is small and solvent consumption is reduced.

  On the other hand, the fluorinated solvent C stored at the bottom of the first treatment tank 1B is extracted from the recovery path 5c and supplied to the buffer tank 5. The fluorine-based solvent C once stored in the buffer tank 5 is taken out from the liquid feed path 5j and supplied to the water separation tank 6.

  The fluorine-based solvent C supplied to the water separation tank 6 is separated by specific gravity into a solvent having a low specific gravity and water having a low specific gravity. Only the fluorinated solvent C from which water has been separated is taken out from the liquid feed path 6p and supplied to the liquid storage tank 7.

  Subsequently, when returning from the steam cleaning process to the immersion cleaning process, the steam Ca stored in the second processing tank 2B is replaced with the fluorinated solvent C, and the target object A is subjected to the immersion cleaning process.

  That is, after stopping the supply of the vapor Ca to the second treatment tank 2B, the vapor Ca of the fluorinated solvent C stored near the bottom of the second treatment tank 2B is taken out from the discharge path 2f and the branch discharge path 2i. Supply to the storage tank 7. Further, the vapor Ca of the fluorinated solvent C stored above the bottom of the second treatment tank 2B is taken out from the discharge path 2m and supplied to the bottom of the first treatment tank 1B. The vapor Ca of the fluorine-based solvent C stored at the bottom of the first treatment tank 1B is taken out from the exhaust path 1e and supplied to the liquid storage tank 7.

  The vapor Ca of the fluorinated solvent C supplied to the liquid storage tank 7 is condensed and liquefied by the cooling action of the cooling coil 7b. The liquid fluorine-based solvent C stored in the liquid storage tank 7 is taken out from the supply path 7h, supplied to the distillation tank 8, and stored in the distillation tank 8 until the next steam cleaning process is performed.

  As described above, the vapor Ca of the fluorinated solvent C released into the first treatment tank 1B is cooled to a temperature lower than the boiling point by the cooling action of the cooling jacket 3 disposed below the bottom of the second treatment tank 2B. Therefore, the concentration of the vapor Ca of the fluorinated solvent C released between the opening 1a of the first treatment tank 1B and the opening 2a of the second treatment tank 2B is reduced, and the object to be treated which has been subjected to the steam cleaning process When A is taken out of the first treatment tank 1B, the leakage amount of the vapor Ca taken out of the tank together with the workpiece A is reduced. Thereby, there is little loss of the fluorine-type solvent C and vapor | steam Ca used for a washing | cleaning process, and reduction of consumption and cost can be aimed at.

  Further, the size of the opening 1a of the first processing tank 1B and the concentration of vapor Ca cooled by the liquid surface of the fluorinated solvent C stored in the bottom of the first processing tank 1B or the cooling jacket 3 are obtained. The free board ratio with the distance to the opening 1a of the 1 treatment tank 1B is large, and the volatilization loss of the fluorinated solvent C is less than the case where the cooling means such as the cooling jacket 3 is disposed above the second treatment tank 2B. Can be reduced.

In the correspondence between the configuration of the present invention and the embodiment,
The cleaning liquid of the present invention corresponds to the fluorinated solvent C of the embodiment,
Similarly,
The steam cooling means corresponds to the cooling jacket 3,
The present invention is not limited only to the configuration of the above-described embodiment, and many embodiments can be obtained.

  For example, the cooling jacket 3 may be provided on the lower inner wall below the opening 1a of the first treatment tank 1B, and the vapor Ca of the fluorinated solvent C can be prevented from flowing out of the tank. Further, since moisture in the air that has entered the tank is condensed and dripped onto the bottom of the first processing tank 1B, it is possible to prevent moisture from being mixed into the fluorinated solvent C stored in the second processing tank 2B. be able to.

  Further, depending on the type of the solvent used for the immersion cleaning process, it is not necessary to perform the steam cleaning process, so whether or not to perform the steam cleaning process can be selected according to the solvent.

  Further, if the number of treatment tanks is increased, the cleaning treatment can be performed using other solvent such as a hydrocarbon solvent or a plurality of solvents in addition to the fluorine-based solvent C.

The whole block diagram which shows the washing | cleaning method of the to-be-processed object by a to-be-processed object cleaning apparatus. Explanatory drawing which shows the immersion cleaning process of the to-be-processed object accommodated in the 2nd processing tank. Explanatory drawing which shows the discharge state of the fluorine-type solvent stored in the 2nd processing tank. Explanatory drawing which shows the steam cleaning process of the to-be-processed object accommodated in the 2nd processing tank.

Explanation of symbols

DESCRIPTION OF SYMBOLS A ... To-be-processed object C ... Fluorine-type solvent Ca ... Vapor 1 ... To-be-processed object cleaning apparatus 1B ... 1st process tank 1e ... Exhaust path 2B ... 2nd process tank 2e ... Ultrasonic vibrator 2f ... Discharge path 3 ... Cooling jacket 7 ... Liquid storage tank 7p ... Supply path 8 ... Distillation tank 8i ... Steam path

Claims (4)

A processing object cleaning device that performs a cleaning process by immersing the processing object in a cleaning liquid stored in a processing tank,
The treatment tank comprises a first treatment tank sealed in an airtight state and a second treatment tank provided inside the first treatment tank,
In the vicinity of the first processing tank, a distillation tank for generating vapor of the cleaning liquid supplied to the first processing tank and a liquid storage tank for storing the cleaning liquid supplied to the second processing tank are provided.
Between the first treatment tank and the distillation tank,
A vapor path for supplying the vapor of the cleaning liquid generated in the distillation tank to the first processing tank, and an exhaust path for exhausting the vapor of the cleaning liquid released in the first processing tank to the distillation tank;
Between the second treatment tank and the liquid storage tank,
A discharge path for discharging the cleaning liquid stored in the second processing tank to the liquid storage tank and a supply path for supplying the cleaning liquid stored in the liquid storage tank to the second processing tank;
An object cleaning apparatus provided with a vapor cooling means for cooling the vapor of the cleaning liquid released in the first treatment tank to a temperature lower than the boiling point, inside the first treatment tank, below the second treatment tank. The workpiece cleaning apparatus according to claim 1, wherein the vapor cooling means is provided along a lower inner wall of the first processing tank below the bottom of the second processing tank. The to-be-processed object cleaning apparatus of Claim 1 or 2 which provided the space where distribution | circulation of the vapor | steam of the said washing | cleaning liquid is permitted between the inner wall surface of the said 1st processing tank, and the outer wall surface of the said 2nd processing tank. The one end of the steam path is connected to the upper part of the distillation tank, and the other end of the steam path is connected to the bottoms of the first processing tank and the second processing tank. Processing object cleaning equipment.

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