JP2009539622A - マイクロメカニカル素子装置 - Google Patents
マイクロメカニカル素子装置 Download PDFInfo
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- JP2009539622A JP2009539622A JP2009512400A JP2009512400A JP2009539622A JP 2009539622 A JP2009539622 A JP 2009539622A JP 2009512400 A JP2009512400 A JP 2009512400A JP 2009512400 A JP2009512400 A JP 2009512400A JP 2009539622 A JP2009539622 A JP 2009539622A
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- micromechanical
- micro
- electrodes
- electrode
- elements
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- 230000005670 electromagnetic radiation Effects 0.000 claims abstract description 17
- 230000000694 effects Effects 0.000 claims abstract description 11
- 238000006073 displacement reaction Methods 0.000 claims description 18
- 230000003287 optical effect Effects 0.000 abstract description 28
- 239000000758 substrate Substances 0.000 description 5
- 239000000969 carrier Substances 0.000 description 2
- 239000002800 charge carrier Substances 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0035—Constitution or structural means for controlling the movement of the flexible or deformable elements
- B81B3/0051—For defining the movement, i.e. structures that guide or limit the movement of an element
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/04—Optical MEMS
- B81B2201/042—Micromirrors, not used as optical switches
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/04—Electrodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/05—Type of movement
- B81B2203/053—Translation according to an axis perpendicular to the substrate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/05—Type of movement
- B81B2203/058—Rotation out of a plane parallel to the substrate
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
Abstract
このため、電極は隣接するマイクロ光学素子のギャップの領域に配置される。
【選択図】図1
Description
Claims (14)
- それぞれがスプリング素子によって保持され、静電力効果によって少なくとも一つの回転軸線の周りに旋回または並進変位することができるマイクロメカニカル素子と、該マイクロメカニカル素子の下方に配置されマイクロメカニカル素子を静電変位する電極とを備え、それぞれの電極(2、2’)が、互いに隣接して配置された少なくとも二つのマイクロメカニカル素子(1)を静電変位するために設けられていることを特徴とするマイクロメカニカル素子装置。
- 前記電極(2、2’)の面および幾何学的設計は、隣接して配置されたマイクロメカニカル素子(1)のギャップ寸法およびギャップ(3)を通して入射する電磁放射の開口を考慮して選択され、入射する電磁放射の少なくとも50%が電極の面に入射されることを特徴とする請求項1記載のマイクロメカニカル素子装置。
- それぞれの電極(2、2’)は、隣接して配置されたマイクロメカニカル素子(1)間のギャップ領域の下方に、該ギャップ領域を覆うように形成されていることを特徴とする請求項1または2のいずれかに記載のマイクロメカニカル素子装置。
- 前記マイクロメカニカル素子(1)は、電圧源に接続されていることを特徴とする前記請求項の一つに記載のマイクロメカニカル素子装置。
- 静電変位のため前記電極(2、2’)および/またはマイクロメカニカル素子(1)は、それぞれ個々に電気的に制御可能であることを特徴とする前記請求項の一つに記載のマイクロメカニカル素子装置。
- 電極は、マイクロメカニカル素子(1)の半径方向外縁領域に形成され、その領域に、最も大きい角度変位が発生することを特徴とする前記請求項の一つに記載のマイクロメカニカル素子装置。
- 面が、該面に入射する電磁放射のために少なくとも局部的に且つ光学的に有効であることを特徴とする前記請求項の一つに記載のマイクロメカニカル素子装置。
- 面が電磁放射を反射することを特徴とする請求項7記載のマイクロメカニカル素子装置。
- 一つまたはそれ以上の電極(2、2’)が光学的活性面をもって対向する側面に配置されていることを特徴とする請求項7または8のいずれかに記載のマイクロメカニカル素子装置。
- 前記電極(2、2’)は、これら電極に組み込まれるマイクロメカニカル素子(1)の外縁領域の設計および/または回転軸線の整列を考慮して設定されていることを特徴とする前記請求項の一つに記載のマイクロメカニカル素子装置。
- 前記電極(2、2’)は、二つの隣接するマイクロメカニカル素子(1)に組み込まれ、その回転軸線は互いに平行に整列されていることを特徴とする前記請求項の一つに記載のマイクロメカニカル素子装置。
- 前記電極(2、2’)は、二つの隣接するマイクロメカニカル素子(1)に組み込まれ、その回転軸線は互いに平行に整列されていないことを特徴とする前記請求項の一つに記載のマイクロメカニカル素子装置。
- 前記電極(2、2’)は、少なくとも三つの隣接するマイクロメカニカル素子(1)に組み込まれ、その回転軸線は互いに平行に整列されていないことを特徴とする前記請求項の一つに記載のマイクロメカニカル素子装置。
- 前記電極(2、2’)は、少なくとも三つの隣接するマイクロメカニカル素子(1)に組み込まれ、二つの回転軸線は互いに平行に整列され、一つの回転軸線は、平行に整列されていないことを特徴とする前記請求項の一つに記載のマイクロメカニカル素子装置。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/DE2006/000997 WO2007140731A1 (de) | 2006-06-03 | 2006-06-03 | Anordnung von elektroden zu beweglichen mikromechanischen elementen |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009539622A true JP2009539622A (ja) | 2009-11-19 |
JP5265530B2 JP5265530B2 (ja) | 2013-08-14 |
Family
ID=37806254
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009512400A Active JP5265530B2 (ja) | 2006-06-03 | 2006-06-03 | マイクロメカニカル素子装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8254005B2 (ja) |
EP (1) | EP2024271B1 (ja) |
JP (1) | JP5265530B2 (ja) |
DE (1) | DE112006003986A5 (ja) |
WO (1) | WO2007140731A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101941169B1 (ko) * | 2011-09-16 | 2019-01-23 | 삼성전자주식회사 | 광 스위칭 소자, 이를 포함한 영상 표시 장치 및 그 제조 방법 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04230724A (ja) * | 1988-03-16 | 1992-08-19 | Texas Instr Inc <Ti> | 空間光変調器の画素をリセットする方法 |
JP2005529377A (ja) * | 2002-06-19 | 2005-09-29 | ミラディア インク | 反射型空間光変調器の構造 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3886310A (en) * | 1973-08-22 | 1975-05-27 | Westinghouse Electric Corp | Electrostatically deflectable light valve with improved diffraction properties |
US5142405A (en) | 1990-06-29 | 1992-08-25 | Texas Instruments Incorporated | Bistable dmd addressing circuit and method |
US7206110B2 (en) * | 2002-06-19 | 2007-04-17 | Miradia Inc. | Memory cell dual protection |
JP2005121906A (ja) * | 2003-10-16 | 2005-05-12 | Fuji Photo Film Co Ltd | 反射型光変調アレイ素子及び露光装置 |
US8228593B2 (en) * | 2003-11-01 | 2012-07-24 | Silicon Quest Kabushiki-Kaisha | System configurations and method for controlling image projection apparatuses |
US20090033878A1 (en) * | 2003-11-01 | 2009-02-05 | Akira Shirai | System configurations and methods for controlling image projection apparatuses and mirror device |
US7502159B2 (en) * | 2005-02-23 | 2009-03-10 | Pixtronix, Inc. | Methods and apparatus for actuating displays |
US7782524B2 (en) * | 2007-10-02 | 2010-08-24 | Silicon Quest Kabushiki-Kaisha | System configurations and methods for controlling image projection apparatuses |
-
2006
- 2006-06-03 US US12/301,287 patent/US8254005B2/en active Active
- 2006-06-03 WO PCT/DE2006/000997 patent/WO2007140731A1/de active Application Filing
- 2006-06-03 JP JP2009512400A patent/JP5265530B2/ja active Active
- 2006-06-03 DE DE112006003986T patent/DE112006003986A5/de not_active Withdrawn
- 2006-06-03 EP EP06753265.5A patent/EP2024271B1/de active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04230724A (ja) * | 1988-03-16 | 1992-08-19 | Texas Instr Inc <Ti> | 空間光変調器の画素をリセットする方法 |
JP2005529377A (ja) * | 2002-06-19 | 2005-09-29 | ミラディア インク | 反射型空間光変調器の構造 |
Also Published As
Publication number | Publication date |
---|---|
WO2007140731A1 (de) | 2007-12-13 |
JP5265530B2 (ja) | 2013-08-14 |
DE112006003986A5 (de) | 2009-05-07 |
EP2024271B1 (de) | 2013-09-18 |
US8254005B2 (en) | 2012-08-28 |
US20090310204A1 (en) | 2009-12-17 |
EP2024271A1 (de) | 2009-02-18 |
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