JP2009539064A - 光学計測装置に使用するための汚染モニタおよび制御技術 - Google Patents
光学計測装置に使用するための汚染モニタおよび制御技術 Download PDFInfo
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- JP2009539064A JP2009539064A JP2009507685A JP2009507685A JP2009539064A JP 2009539064 A JP2009539064 A JP 2009539064A JP 2009507685 A JP2009507685 A JP 2009507685A JP 2009507685 A JP2009507685 A JP 2009507685A JP 2009539064 A JP2009539064 A JP 2009539064A
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Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
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- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Optics & Photonics (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Chemical Kinetics & Catalysis (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US79546706P | 2006-04-27 | 2006-04-27 | |
| US11/600,414 US7622310B2 (en) | 2006-04-27 | 2006-11-16 | Contamination monitoring and control techniques for use with an optical metrology instrument |
| US11/600,477 US7663747B2 (en) | 2006-04-27 | 2006-11-16 | Contamination monitoring and control techniques for use with an optical metrology instrument |
| US11/600,413 US7342235B1 (en) | 2006-04-27 | 2006-11-16 | Contamination monitoring and control techniques for use with an optical metrology instrument |
| PCT/US2007/006765 WO2007126612A2 (en) | 2006-04-27 | 2007-03-19 | Contamination monitoring and control techniques for use with an optical metrology instrument |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009539064A true JP2009539064A (ja) | 2009-11-12 |
| JP2009539064A5 JP2009539064A5 (ko) | 2010-05-06 |
Family
ID=38655975
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009507685A Pending JP2009539064A (ja) | 2006-04-27 | 2007-03-19 | 光学計測装置に使用するための汚染モニタおよび制御技術 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2009539064A (ko) |
| KR (1) | KR20090004959A (ko) |
| WO (1) | WO2007126612A2 (ko) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7126131B2 (en) | 2003-01-16 | 2006-10-24 | Metrosol, Inc. | Broad band referencing reflectometer |
| US8564780B2 (en) | 2003-01-16 | 2013-10-22 | Jordan Valley Semiconductors Ltd. | Method and system for using reflectometry below deep ultra-violet (DUV) wavelengths for measuring properties of diffracting or scattering structures on substrate work pieces |
| US7804059B2 (en) | 2004-08-11 | 2010-09-28 | Jordan Valley Semiconductors Ltd. | Method and apparatus for accurate calibration of VUV reflectometer |
| US7663097B2 (en) * | 2004-08-11 | 2010-02-16 | Metrosol, Inc. | Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement |
| US7511265B2 (en) * | 2004-08-11 | 2009-03-31 | Metrosol, Inc. | Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement |
| US20080129986A1 (en) | 2006-11-30 | 2008-06-05 | Phillip Walsh | Method and apparatus for optically measuring periodic structures using orthogonal azimuthal sample orientations |
| US8867041B2 (en) | 2011-01-18 | 2014-10-21 | Jordan Valley Semiconductor Ltd | Optical vacuum ultra-violet wavelength nanoimprint metrology |
| US8565379B2 (en) | 2011-03-14 | 2013-10-22 | Jordan Valley Semiconductors Ltd. | Combining X-ray and VUV analysis of thin film layers |
| AT523187A1 (de) | 2019-11-28 | 2021-06-15 | Anton Paar Gmbh | Bestimmung einer Beeinträchtigung einer optischen Oberfläche für IR-Spektroskopie |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0822129A (ja) * | 1994-07-06 | 1996-01-23 | Nikon Corp | 真空紫外域の光学装置 |
| JPH10160572A (ja) * | 1996-12-02 | 1998-06-19 | Nikon Corp | 紫外領域用分光光度計 |
| JP2003214980A (ja) * | 2002-01-29 | 2003-07-30 | Nikon Corp | 真空紫外光散乱率測定装置 |
| WO2005031315A1 (en) * | 2003-09-23 | 2005-04-07 | Metrosol, Inc. | Vacuum ultraviolet referencing reflectometer |
-
2007
- 2007-03-19 WO PCT/US2007/006765 patent/WO2007126612A2/en active Application Filing
- 2007-03-19 JP JP2009507685A patent/JP2009539064A/ja active Pending
- 2007-03-19 KR KR1020087024989A patent/KR20090004959A/ko not_active Application Discontinuation
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0822129A (ja) * | 1994-07-06 | 1996-01-23 | Nikon Corp | 真空紫外域の光学装置 |
| JPH10160572A (ja) * | 1996-12-02 | 1998-06-19 | Nikon Corp | 紫外領域用分光光度計 |
| JP2003214980A (ja) * | 2002-01-29 | 2003-07-30 | Nikon Corp | 真空紫外光散乱率測定装置 |
| WO2005031315A1 (en) * | 2003-09-23 | 2005-04-07 | Metrosol, Inc. | Vacuum ultraviolet referencing reflectometer |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20090004959A (ko) | 2009-01-12 |
| WO2007126612A2 (en) | 2007-11-08 |
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